JPH0799433B2 - Method of removing pellicle film - Google Patents
Method of removing pellicle filmInfo
- Publication number
- JPH0799433B2 JPH0799433B2 JP15820790A JP15820790A JPH0799433B2 JP H0799433 B2 JPH0799433 B2 JP H0799433B2 JP 15820790 A JP15820790 A JP 15820790A JP 15820790 A JP15820790 A JP 15820790A JP H0799433 B2 JPH0799433 B2 JP H0799433B2
- Authority
- JP
- Japan
- Prior art keywords
- pellicle film
- film
- reticle
- pellicle
- ionizer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Description
【発明の詳細な説明】 〔概要〕 レチクルまたはマスク表面に装着されたペリクル膜の除
去方法に関し， 静電気による遮光膜パターンの破壊を防止するようにし
た除去方法を提供することを目的とし， イオナイザにより発生しイオンが存在する雰囲気中でペ
リクル膜をレチクルまたはマスクより引き剥がすように
構成する。DETAILED DESCRIPTION OF THE INVENTION [Outline] A method for removing a pellicle film mounted on the surface of a reticle or a mask is provided with an ionizer for the purpose of providing a removal method for preventing destruction of a light-shielding film pattern due to static electricity. The pellicle film is peeled off from the reticle or mask in an atmosphere in which generated ions are present.
本発明はレチクルまたはマスク表面に装着されたペリク
ル膜の除去方法に関する。The present invention relates to a method for removing a pellicle film mounted on the surface of a reticle or mask.
ペリクルは透明な薄膜からなるペリクル膜を枠（フレー
ム）に貼ったもので（第１図参照），防塵のためにレチ
クル（またはマスク）の表面に装着し，レチクルはペリ
クルを装着したまま投影露光等に使用されている。The pellicle is a pellicle film consisting of a transparent thin film attached to a frame (see Fig. 1), and is attached to the surface of the reticle (or mask) to prevent dust, and the reticle is projected and exposed with the pellicle attached. It is used for etc.
ペリクル膜は，ペリクル膜面やレチクルに塵埃が付着し
た場合等に除去して新しく貼り替えられる。The pellicle film is removed and replaced when dust adheres to the pellicle film surface or the reticle.
従来，レチクル表面に装着されたペリクル膜の除去は，
レチクルを剥離液（酢酸ブチル等の有機溶剤，例えば東
京応化のOMRリンス液）の中に浸漬し，ペリクル膜とフ
レームに付着した接着剤を溶解していた。Conventionally, the removal of the pellicle film mounted on the reticle surface is
The reticle was immersed in a stripping solution (an organic solvent such as butyl acetate, for example, an OMR rinse solution from Tokyo Ohka) to dissolve the adhesive on the pellicle film and the frame.
この際，ペリクル膜がレチクル面に付着すると容易にペ
リクル膜が溶けず，溶解に長時間を必要とし，また除去
が不完全であった。At this time, if the pellicle film adhered to the reticle surface, the pellicle film was not easily melted, it took a long time to dissolve, and the removal was incomplete.
そのため，前もってペリクル膜をレチクルから引き剥が
す方法がとられた。Therefore, the method of peeling off the pellicle film from the reticle in advance was adopted.
溶剤に浸漬する前にペリクル膜をレチクルから引き剥が
す際に，大気中で行う場合にペリクル膜がレチクルの遮
光膜（Cr膜）に接触すると，静電気により遮光膜のパタ
ーンが破壊されるという問題があった。When peeling the pellicle film from the reticle before immersing it in a solvent, if the pellicle film comes into contact with the light-shielding film (Cr film) of the reticle when performed in the atmosphere, static electricity may destroy the pattern of the light-shielding film. there were.
本発明はペリクル膜の除去に際し，静電気による遮光膜
パターンの破壊を防止した除去方法を提供することを目
的とする。It is an object of the present invention to provide a method of removing the pellicle film from being prevented from destroying the light-shielding film pattern due to static electricity.
上記課題の解決は，イオナイザにより発生したイオンが
存在する雰囲気中でペリクル膜をレチクルまたはマスク
より引き剥がすペリクル膜の除去方法により達成され
る。The above problem can be solved by a method of removing the pellicle film by peeling the pellicle film from the reticle or mask in an atmosphere in which ions generated by the ionizer exist.
本発明はペリクル膜の除去に際し，イオナイザにより発
生したイオンが存在する雰囲気中で剥離することによ
り，ペリクル膜に帯電した電荷をイオンの存在により導
電性を持つ雰囲気中に逃がして遮光膜の静電破壊を防止
するようにしたものである。According to the present invention, when the pellicle film is removed, the charges generated in the pellicle film are released into the conductive atmosphere due to the existence of the ions by exfoliating in the atmosphere in which the ions generated by the ionizer exist. It is designed to prevent destruction.
なお，実験の結果，イオナイザにより発生したイオンは
直接ペリクル膜上に帯電することなく，ペリクル膜に帯
電した電荷を逃がすことにのみ有効に作用していること
がわかった。As a result of the experiment, it was found that the ions generated by the ionizer did not directly charge on the pellicle film, but effectively acted only on releasing the charges charged on the pellicle film.
第１図は本発明の実施例を説明する断面図である。 FIG. 1 is a sectional view for explaining an embodiment of the present invention.
図において,1はレチクル（またはマスク）,1Aは遮光膜
パターン,2はペリクル膜,3はフレーム,4はイオナイザで
ある。In the figure, 1 is a reticle (or mask), 1A is a light-shielding film pattern, 2 is a pellicle film, 3 is a frame, and 4 is an ionizer.
ここで，イオナイザ４は例えば， 品 名：オーバヘッドイオナイザ 製造社名:STATIC COTROL SERVICES 型 式:PDC-900 ENDSTAT CM 仕 様：入力電圧100V, 出力電圧 10KV, 出力電流 10A, 寸 法：シリンダ状ケース118mm×70mm 電極部保護傘 直径156mm 重 量:567g を用い，これにより発生したイオンの存在する雰囲気中
へペリクル膜２に帯電した電荷を逃がしている。Here, the ionizer 4 is, for example, product name: Overhead ionizer Manufacturer name: STATIC COTROL SERVICES Model: PDC-900 ENDSTAT CM Specifications: Input voltage 100V, output voltage 10KV, output current 10A, Dimensions: cylindrical case 118mm × 70mm Electrode part protection umbrella Diameter 156mm Weight: 567g is used, and the electric charges charged on the pellicle film 2 are released into the atmosphere in which the generated ions are present.
このようなイオンの存在する雰囲気中でペリクル膜２を
引き剥がすようにする。The pellicle film 2 is peeled off in the atmosphere in which such ions are present.
ペリクル膜２は通常ニトロセルローズ等の薄膜からな
り，測定の結果通常負に帯電することが分かった。The pellicle film 2 is usually made of a thin film such as nitrocellulose, and as a result of the measurement, it was found that the pellicle film 2 is usually negatively charged.
そこで，実施例ではイオナイザにより発生したイオンの
存在する雰囲気中ヘペリクル膜に帯電した電荷を逃が
し，遮光膜パターンの静電破壊を防止するようにした。Therefore, in the embodiment, the charges charged on the hepelicle film are released in the atmosphere in which the ions generated by the ionizer exist to prevent the electrostatic breakdown of the light shielding film pattern.
多数試料について実験の結果，静電破壊は認められなか
った。As a result of experiments on many samples, no electrostatic breakdown was observed.
なお，イオナイザはレチクルまたはマスクの遮光膜側に
貼られたペリクル膜の除去の時にだけ適用すればよい
が，遮光膜の無い側に適用しても特に問題はない。The ionizer may be applied only when the pellicle film attached to the light-shielding film side of the reticle or mask is removed, but there is no particular problem if it is applied to the side without the light-shielding film.
以上説明したように本発明によれば，ペリクル膜の除去
に際し，静電気による遮光膜パターンの破壊を防止した
除去方法が得られた。As described above, according to the present invention, there is obtained a removing method which prevents the light-shielding film pattern from being destroyed by static electricity when removing the pellicle film.
この結果，剥離液に浸漬する前に，ペリクル膜を引き剥
がすことができるようになり，除去の工数が大幅に低減
された。As a result, it became possible to peel off the pellicle film before dipping it in the stripping solution, and the man-hours for removal were greatly reduced.
第１図は本発明の実施例を説明する断面図である。 図において， １はレチクル（またはマスク）,1Aは遮光膜パターン,2
はペリクル膜,3はフレーム,4はイオナイザ である。FIG. 1 is a sectional view for explaining an embodiment of the present invention. In the figure, 1 is a reticle (or mask), 1A is a light-shielding film pattern, 2
Is a pellicle membrane, 3 is a frame, and 4 is an ionizer.
Claims (1)
る雰囲気中でペリクル膜をレチクルまたはマスクより引
き剥がすことを特徴とするペリクル膜の除去方法。1. A method for removing a pellicle film, which comprises peeling the pellicle film from a reticle or a mask in an atmosphere in which ions generated by an ionizer are present.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15820790A JPH0799433B2 (en) | 1990-06-15 | 1990-06-15 | Method of removing pellicle film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15820790A JPH0799433B2 (en) | 1990-06-15 | 1990-06-15 | Method of removing pellicle film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0450944A JPH0450944A (en) | 1992-02-19 |
| JPH0799433B2 true JPH0799433B2 (en) | 1995-10-25 |
Family
ID=15666625
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15820790A Expired - Fee Related JPH0799433B2 (en) | 1990-06-15 | 1990-06-15 | Method of removing pellicle film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0799433B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12271109B2 (en) * | 2019-12-13 | 2025-04-08 | Mitsui Chemicals, Inc. | Pellicle demounting method, and pellicle demounting device |
-
1990
- 1990-06-15 JP JP15820790A patent/JPH0799433B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0450944A (en) | 1992-02-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |