JPH08105000A - Method for electropolishing aluminum - Google Patents
Method for electropolishing aluminumInfo
- Publication number
- JPH08105000A JPH08105000A JP24120994A JP24120994A JPH08105000A JP H08105000 A JPH08105000 A JP H08105000A JP 24120994 A JP24120994 A JP 24120994A JP 24120994 A JP24120994 A JP 24120994A JP H08105000 A JPH08105000 A JP H08105000A
- Authority
- JP
- Japan
- Prior art keywords
- aluminum
- stirring
- liquid
- polishing
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 15
- 238000000034 method Methods 0.000 title claims abstract description 14
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 13
- 238000005498 polishing Methods 0.000 claims abstract description 33
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 10
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 5
- 239000007788 liquid Substances 0.000 claims description 38
- 238000003756 stirring Methods 0.000 claims description 24
- 230000005484 gravity Effects 0.000 claims description 8
- 238000005868 electrolysis reaction Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- 238000013019 agitation Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000008094 contradictory effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明はアルミニウムおよびアル
ミニウム合金の電解研摩方法に関する。FIELD OF THE INVENTION The present invention relates to a method for electrolytic polishing aluminum and aluminum alloys.
【０００２】[0002]
【従来の技術】アルミニウムおよびアルミニウム合金は
従来、次のような処理条件、攪拌方法で電解研摩されて
いた。すなわち、（１）液組成：リン酸（比重１．７
４）：８００ｃｃ、硫酸（比重１．８０）：２００ｃ
ｃ、無水クロム酸：５０ｇの配合比、（２）液温度：４
０〜５０℃、（３）電圧：２０〜４０Ｖ、（４）攪拌方
法：（イ）無攪拌（自然対流）、（ロ）マグネチックス
ターラー攪拌、（ハ）スクリュー攪拌、（ニ）ポンプ攪
拌、（ホ）エアー攪拌。2. Description of the Related Art Aluminum and aluminum alloys have been conventionally electrolytically polished under the following processing conditions and stirring methods. That is, (1) liquid composition: phosphoric acid (specific gravity 1.7)
4): 800 cc, sulfuric acid (specific gravity 1.80): 200 c
c, mixing ratio of chromic anhydride: 50 g, (2) liquid temperature: 4
0 to 50 ° C., (3) voltage: 20 to 40 V, (4) stirring method: (a) non-stirring (natural convection), (b) magnetic stirrer stirring, (c) screw stirring, (d) pump stirring, (E) Air stirring.
【０００３】[0003]
【発明が解決しようとする課題】従来の方法には次のよ
うな問題点があった。すなわち、（１）純アルミでは良
好な光沢面が得られるが、アルミニウム合金では十分な
光沢が得られにくい。（２）研摩面に気泡の付着による
ピットが発生し易い。（３）小型部品用の電解研摩技術
であり、大型部品への適用が困難である。その理由は良
好な光沢面を得るには電解研摩中被研摩面に生成する粘
着層を破壊しないことが必須条件であるため、強い液攪
拌はできない。一方、被研摩面には多量の電解熱が発生
するのでこの熱を除去するために十分な液攪拌を要す
る。従って、従来の攪拌法ではこれら２つの相反する要
求を大型部品の処理で満すのは難かしいからである。
（４）処理電圧が高いので大電力を要し、設備上不利で
ある。The conventional method has the following problems. That is, (1) pure aluminum provides a good glossy surface, but aluminum alloys do not provide sufficient gloss. (2) Pits are likely to occur on the polished surface due to the adhesion of bubbles. (3) Electrolytic polishing technology for small parts, which is difficult to apply to large parts. The reason is that in order to obtain a good glossy surface, it is an essential condition not to destroy the adhesive layer formed on the surface to be polished during electrolytic polishing, so strong liquid stirring cannot be performed. On the other hand, since a large amount of electrolytic heat is generated on the surface to be polished, sufficient liquid stirring is required to remove this heat. Therefore, it is difficult for the conventional stirring method to satisfy these two contradictory requirements in processing large parts.
(4) Since the processing voltage is high, a large amount of power is required, which is disadvantageous in terms of equipment.
【０００４】特に、従来の攪拌方法の欠点や制約は次の
とおりである。（イ）無攪拌（自然対流）：被研摩面お
よびこれと接触している研摩液がオーバーヒートする。
（ロ）マグネチックスターラー攪拌：ビーカワークのみ
にしか適用できない。（ハ）スクリュー攪拌：攪拌が不
均一、キャビテーションが発生し易い。（ニ）ポンプ攪
拌：攪拌が不均一、エアーを巻き込み易い。（ホ）エア
ー攪拌：良好な研摩面が得られにくく通常使用されな
い。In particular, the drawbacks and restrictions of the conventional stirring method are as follows. (A) No stirring (natural convection): The surface to be polished and the polishing liquid in contact with it overheat.
(B) Magnetic stirrer stirring: Applicable only to beaker work. (C) Screw agitation: Agitation is non-uniform and cavitation is likely to occur. (D) Pump agitation: The agitation is non-uniform and it is easy to entrap air. (E) Air agitation: It is difficult to obtain a good polished surface and is not usually used.
【０００５】本発明は従来法がもつ以上のような問題点
を解消させ、アルミニウムおよびＡ２０２４（Ａｌ：９
９．３％以上、Ｃｕ：０．１％以下）クラッド材を初め
とするアルミニウム合金製部品をピットのない均一な光
沢面に仕上げることのできる電解研摩方法を提供しよう
とするものである。The present invention solves the above-mentioned problems of the conventional method, and aluminum and A2024 (Al: 9)
It is an object of the present invention to provide an electrolytic polishing method capable of finishing an aluminum alloy component such as a clad material including a 9.3% or more Cu: 0.1% or less) to a pitless and uniform glossy surface.
【０００６】[0006]
【課題を解決するための手段】本発明は （１）りん酸（比重１．７４）：７５０〜８５０ｃｃ、
硫酸（比重１．８０）：１５０〜２５０ｃｃ、無水クロ
ム酸：４５〜５５ｇの割合で調合した研摩液を用い、液
温：６０〜９０℃、電圧：５〜２０Ｖの条件で陽極電解
することを特徴とするアルミニウムおよびアルミニウム
合金製部品の電解研摩方法。 （２）アルミニウムクラッド材Ａ２０２４製部品を液
温：７５〜９０℃の条件で陽極電解することを特徴とす
る上記（１）記載の電解研摩方法。 （３）上下に振動する軸に取付けられた羽根板により研
摩液を攪拌しながら陽極電解することを特徴とする上記
（１）または（２）記載の電解研摩方法。である。The present invention provides (1) phosphoric acid (specific gravity 1.74): 750 to 850 cc,
Sulfuric acid (specific gravity 1.80): 150-250 cc, chromic anhydride: 45-55 g of the polishing liquid was used, and anodic electrolysis was performed under the conditions of liquid temperature: 60-90 ° C and voltage: 5-20V. A method for electrolytically polishing aluminum and aluminum alloy parts characterized. (2) The electrolytic polishing method according to (1) above, wherein the aluminum clad material A2024 component is subjected to anodic electrolysis under the condition of liquid temperature: 75 to 90 ° C. (3) The electrolytic polishing method according to the above (1) or (2), characterized in that the polishing liquid is stirred and anodic electrolyzed by a blade plate attached to a shaft that vibrates up and down. Is.
【０００７】[0007]
〔１〕液温度を高くすることにより次の作用が得られ
る。すなわち、（１）研摩液の酸化性が強まり、研摩能
力が増す。これにより、純アルミニウムのみならず、ア
ルミニウム合金においても良好な研摩面が得られるよう
になる。また、処理電圧も下げることができる。（２）
研摩液の粘度が低くなり、電解時の陰極ガス（水素ガ
ス）等の気泡が被研摩面に付着しにくくなり、気泡の付
着によるピットの発生が防止される。（３）研摩液の電
導度が増すことにより、処理電圧が小さくてすむ。[1] The following effects can be obtained by increasing the liquid temperature. That is, (1) the oxidizing property of the polishing liquid is enhanced, and the polishing ability is increased. As a result, a good polished surface can be obtained not only with pure aluminum but also with an aluminum alloy. Also, the processing voltage can be lowered. (2)
The viscosity of the polishing liquid becomes low, bubbles such as cathode gas (hydrogen gas) during electrolysis are less likely to adhere to the surface to be polished, and the formation of pits due to the adhesion of bubbles is prevented. (3) The processing voltage can be reduced by increasing the conductivity of the polishing liquid.
【０００８】〔２〕上下に振動する軸に取付けられた羽
根板により次の作用が得られる。すなわち、このような
羽根板で研摩液を攪拌することによって、研摩液は均一
かつ必要十分な強さ、すなわち被研摩面上の粘着層を破
壊せず、かつ、発生した電解熱を有効に除去することが
できる程度の強さで攪拌することができる（羽根板の寸
法・強度、羽根板の配置、周波数、振幅等を処理槽およ
び処理部品に対して最適化する。）。また、この攪拌は
振動流であるので、陰極ガス（水素ガス）等の気泡が被
研摩面に付着しにくく、かつ、脱着し易いため、これ等
気泡の付着に起因するピットの発生がほゞ完全に防止さ
れる。更に、この攪拌はポンプ攪拌のようにエアーの巻
き込みやスクリュー攪拌のようにキャビテーションを起
こして自らピットの原因を作ることもない。また、この
攪拌は原理的に液槽や処理部品が大きくなっても均一で
マイルドな攪拌が可能である。[2] The following effects can be obtained by the vane plate attached to the vertically vibrating shaft. That is, by stirring the polishing liquid with such a vane plate, the polishing liquid has a uniform and sufficient strength, that is, it does not destroy the adhesive layer on the surface to be polished, and effectively removes the generated electrolysis heat. It can be agitated with a strength as high as possible (the size and strength of the blade plate, the arrangement of the blade plate, the frequency, the amplitude, etc. are optimized for the processing tank and the processing parts). Further, since this stirring is an oscillating flow, bubbles such as cathode gas (hydrogen gas) are less likely to adhere to the surface to be polished and are easily desorbed, so that the formation of pits due to the adherence of these bubbles is almost uniform. Completely prevented. Further, this stirring does not cause pits by causing cavitation like air stirring and screw stirring unlike pump stirring. In addition, this agitation can in principle be uniform and agile even if the liquid tank and the processing parts are large.
【０００９】[0009]
【実施例】以下、本発明の具体的な実施例をあげ、本発
明の効果を明らかにする。EXAMPLES The effects of the present invention will be clarified by giving concrete examples of the present invention.
【００１０】（実施例１）図１において、３．２ｍｍφ
の純アルミニウム線を被研摩体（陽極）１とし、リン酸
（比重１．７４）：８００ｃｃ、硫酸（比重１．８
０）：２００ｃｃ、無水クロム酸：５０ｇの割合で調合
した研摩液２中で電解研摩を行った。陰極３には純アル
ミニウムの板を用いた。研摩液２の量は５リットルと
し、液槽４はガラスビーカを用いた。攪拌はマグネチッ
クスターラー（回転子）５による攪拌とした。Example 1 In FIG. 1, 3.2 mmφ
Of pure aluminum wire as the object to be polished (anode) 1, phosphoric acid (specific gravity 1.74): 800 cc, sulfuric acid (specific gravity 1.8)
0): 200 cc, chromic anhydride: 50 g, and electrolytic polishing was performed in the polishing liquid 2. A plate of pure aluminum was used for the cathode 3. The amount of the polishing liquid 2 was 5 liters, and the liquid tank 4 was a glass beaker. Stirring was performed with a magnetic stirrer (rotor) 5.
【００１１】電解研摩の電圧、液温度、および時間は電
圧：２０Ｖ、液温度：４０℃、５０℃、６０℃、７０
℃、８０℃、８５℃、９０℃の各ケース、時間：３分と
し、研摩品質は次の３段階で評価した。クラス１：鏡面
が得られる。クラス２：光沢は増したが鏡面まではいか
なかった。クラス３：光沢は増さず逆にエッチングで粗
くなった。以上の試験結果を表１に示す。The voltage, liquid temperature, and time for electrolytic polishing are voltage: 20 V, liquid temperature: 40 ° C., 50 ° C., 60 ° C., 70
C., 80.degree. C., 85.degree. C., 90.degree. C., time: 3 minutes, and the polishing quality was evaluated according to the following three grades. Class 1: You can get a mirror surface. Class 2: The gloss increased, but it did not reach the mirror surface. Class 3: The gloss did not increase, but on the contrary it became rough by etching. The above test results are shown in Table 1.
【００１２】[0012]
【表１】 [Table 1]
【００１３】（実施例２）図１において、２０ｍｍ×１
０ｍｍ×５ｍｍｔのＡ２０２４クラッド材平板を予め表
面粗度Ｒａ＝０．１μｍまでバフ研摩し、その後軽く酸
エッチングを施して梨地になったものを被研摩体（陽
極）１とし実施例１と同じ要領で電解研摩を行った。但
し、電解研摩の電圧および液温度は電圧：１０Ｖで液温
が９０℃、８５℃の各ケース、電圧：２０Ｖで液温度が
６０℃、７０℃、８０℃の各ケース、液温度：８０℃で
電圧が２０Ｖ、１０Ｖ、５Ｖの各ケース、電圧が７．５
Ｖで、液温度が７０℃、８０℃の各ケースとし、研摩品
質は鏡面が得られたか否か、およびピットが発生したか
否かについて評価した。以上の試験結果を表２に示す。(Embodiment 2) In FIG. 1, 20 mm × 1
A 020 mm × 5 mmt A2024 clad plate is buffed to a surface roughness Ra = 0.1 μm in advance, and then lightly acid-etched to give a satin finish. Electropolishing was performed. However, the voltage and the liquid temperature for electrolytic polishing are: voltage: 10 V, liquid temperature: 90 ° C. and 85 ° C., voltage: 20 V, liquid temperature: 60 ° C., 70 ° C., 80 ° C., liquid temperature: 80 ° C. In each case the voltage is 20V, 10V, 5V, the voltage is 7.5
In V, the liquid temperature was 70 ° C. and 80 ° C., and the polishing quality was evaluated as to whether a mirror surface was obtained and whether a pit was generated. Table 2 shows the above test results.
【００１４】[0014]
【表２】 （注）試験は数回くり返し行っており、６０℃および７
０℃のケースについてはピットのないものは得られなか
った。しかし、ピット数は液温度が高くなるにつれて少
なく、８０℃以上においてはピットのないものも得られ
た。[Table 2] (Note) The test is repeated several times at 60 ° C and 7
In the case of 0 ° C., no pit was obtained. However, the number of pits decreased as the liquid temperature increased, and those without pits were obtained at 80 ° C or higher.
【００１５】これらの試験結果から、Ａ２０２４クラッ
ド材においてピットのない鏡面を得るためには、液温度
は８０〜９０℃が最適値であると云える。また、電圧は
７．５〜２０Ｖが適正域であるが、より低い方が設備上
有利であるので、７．５Ｖが最適値と云える。このとき
の電流密度は１０〜１２Ａ／ｄｍ2 であった。From these test results, it can be said that the optimum value of the liquid temperature is 80 to 90 ° C. in order to obtain a pit-free mirror surface in the A2024 clad material. Further, the voltage is in a proper range of 7.5 to 20V, but a lower voltage is more advantageous in terms of equipment, so 7.5V can be said to be an optimum value. The current density at this time was 10 to 12 A / dm 2 .
【００１６】（実施例３）図２において、角型のステン
レス容器を液槽４とし、これに実施例２と同じ研摩液２
を入れ、上下に振動する軸６に取付けられたＳＵＳ３０
４製羽根板７による液攪拌を行ないながら、実施例２と
同じＡ２０２４クラッド材平板を被研摩体（陽極）１と
して電解研摩を行った。陰極３には純アルミニウム板を
使用した。羽根板７は図２に示すように被研摩体１およ
び陰極３の側方に配置した。液温度は８０℃、電圧は
７．５Ｖとした。(Embodiment 3) In FIG. 2, a rectangular stainless container is used as a liquid tank 4, and the same polishing liquid 2 as in Embodiment 2 is used therein.
SUS30 attached to the shaft 6 that vibrates vertically
Electrolytic polishing was performed by using the same flat plate of A2024 clad material as in Example 2 as the object to be polished (anode) 1 while stirring the liquid with the vane plate 7 made of No. 4. A pure aluminum plate was used for the cathode 3. The vane plate 7 was arranged laterally of the object to be polished 1 and the cathode 3 as shown in FIG. The liquid temperature was 80 ° C. and the voltage was 7.5V.
【００１７】振動数は３２サイクルとし、振幅は実施例
２で把握した７．５Ｖにおける電流密度１０〜１２Ａ／
ｄｍ2 が得られる液攪拌強さになるよう予め調整した。
すなわち、振幅を大きくして液攪拌が過大になると被研
摩面に形成されている粘着層が破壊されて電流密度が大
きくなるので、電流密度をモニタし、実施例２で鏡面が
得られた時の値に電流密度がなるよう振幅を調整して攪
拌強さをセットした。試験は６回くり返したが、６回と
も全てピットのない鏡面を得ることができた。The frequency was 32 cycles, and the amplitude was 10 to 12 A / current density at 7.5 V as found in Example 2.
The liquid stirring strength was adjusted in advance so that dm 2 was obtained.
That is, when the amplitude is increased and the liquid agitation becomes excessively large, the adhesive layer formed on the surface to be polished is destroyed and the current density increases, so when the current density is monitored and the mirror surface is obtained in Example 2. The stirring strength was set by adjusting the amplitude so that the current density became the value of. The test was repeated 6 times, but all 6 times could obtain a pitless mirror surface.
【００１８】[0018]
【発明の効果】本発明により、次の効果を得ることがで
きる。 （１）Ａ２０２４クラッド材を始めとしてアルミニウム
合金を均一に光沢よく電解研摩できる。 （２）ほとんどピットのない研摩面が得られる。 （３）処理電圧を低くでき電源（整流器）および配線系
統の設備費が少なくてすむ。 （４）設備のスケールアップが可能で大型部品にも適用
できる。According to the present invention, the following effects can be obtained. (1) Aluminum alloys including A2024 clad material can be electrolytically polished with a uniform gloss. (2) A polished surface with almost no pits can be obtained. (3) The processing voltage can be lowered and the facility cost of the power supply (rectifier) and the wiring system can be reduced. (4) Equipment can be scaled up and can be applied to large parts.
【図１】本発明の実施例１および２の電解研摩の説明
図。FIG. 1 is an explanatory diagram of electrolytic polishing according to Examples 1 and 2 of the present invention.
【図２】本発明の実施例３の電解研摩の説明図。FIG. 2 is an explanatory diagram of electrolytic polishing according to Example 3 of the present invention.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 神畠 尚文 愛知県名古屋市港区大江町10番地 三菱重 工業株式会社名古屋航空宇宙システム製作 所内 (72)発明者 磯部 規也 愛知県名古屋市港区大江町10番地 三菱重 工業株式会社名古屋航空宇宙システム製作 所内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Naofumi Kanata 10 Oemachi, Minato-ku, Nagoya, Aichi Mitsubishi Heavy Industries, Ltd. Nagoya Aerospace Systems Works (72) Inventor Noriya Isobe, Minato-ku, Aichi 10 Oemachi Mitsubishi Heavy Industries Ltd. Nagoya Aerospace Systems Works
Claims (3)
０ｃｃ、硫酸（比重１．８０）：１５０〜２５０ｃｃ、
無水クロム酸：４５〜５５ｇの割合で調合した研摩液を
用い、液温：６０〜９０℃、電圧：５〜２０Ｖの条件で
陽極電解することを特徴とするアルミニウムおよびアル
ミニウム合金製部品の電解研摩方法。1. Phosphoric acid (specific gravity 1.74): 750-85
0 cc, sulfuric acid (specific gravity 1.80): 150 to 250 cc,
Chromic anhydride: Electropolishing of aluminum and aluminum alloy parts, characterized in that anodic electrolysis is performed under the conditions of a liquid temperature: 60 to 90 ° C. and a voltage: 5 to 20 V, using a polishing liquid prepared in a ratio of 45 to 55 g. Method.
品を液温：７５〜９０℃の条件で陽極電解することを特
徴とする請求項１記載の電解研摩方法。2. The electrolytic polishing method according to claim 1, wherein the aluminum clad material A2024 component is subjected to anodic electrolysis at a liquid temperature of 75 to 90 ° C.
により研摩液を攪拌しながら陽極電解することを特徴と
する請求項１または２記載の電解研摩方法。3. The electrolytic polishing method according to claim 1, wherein the anodic electrolysis is performed while stirring the polishing liquid with a vane plate attached to a vertically oscillating shaft.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24120994A JPH08105000A (en) | 1994-10-05 | 1994-10-05 | Method for electropolishing aluminum |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24120994A JPH08105000A (en) | 1994-10-05 | 1994-10-05 | Method for electropolishing aluminum |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08105000A true JPH08105000A (en) | 1996-04-23 |
Family
ID=17070828
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24120994A Withdrawn JPH08105000A (en) | 1994-10-05 | 1994-10-05 | Method for electropolishing aluminum |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08105000A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6579439B1 (en) | 2001-01-12 | 2003-06-17 | Southern Industrial Chemicals, Inc. | Electrolytic aluminum polishing processes |
| KR100861021B1 (en) * | 2007-08-01 | 2008-09-30 | 김경희 | How to Clean Aluminum Foam with Sulfuric Acid |
| JP2013133507A (en) * | 2011-12-27 | 2013-07-08 | Nakano & Co Lab | Electrolytic polishing method of aluminum member, and aluminum member |
| JP2016128611A (en) * | 2016-03-07 | 2016-07-14 | 株式会社中野科学 | Electropolishing method for aluminum member and aluminum member |
-
1994
- 1994-10-05 JP JP24120994A patent/JPH08105000A/en not_active Withdrawn
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6579439B1 (en) | 2001-01-12 | 2003-06-17 | Southern Industrial Chemicals, Inc. | Electrolytic aluminum polishing processes |
| KR100861021B1 (en) * | 2007-08-01 | 2008-09-30 | 김경희 | How to Clean Aluminum Foam with Sulfuric Acid |
| JP2013133507A (en) * | 2011-12-27 | 2013-07-08 | Nakano & Co Lab | Electrolytic polishing method of aluminum member, and aluminum member |
| JP2016128611A (en) * | 2016-03-07 | 2016-07-14 | 株式会社中野科学 | Electropolishing method for aluminum member and aluminum member |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3046594B1 (en) | Anodizing system for metals utilizing vibrating flow agitation | |
| US4242417A (en) | Lithographic substrates | |
| CN1623013A (en) | Process and device for forming ceramic coatings on metals and alloys, and coatings produced by this process | |
| CN108754596A (en) | A kind of the environmental protection polishing electrolyte and polishing method of titanium alloy | |
| CN101173361B (en) | Non-equilibrium liquid compound pulse plasma polishing method | |
| US3389061A (en) | Anodization of a copper-nickelmanganese alloy | |
| US3699018A (en) | Method of electrodepositing coral copper on copper foil | |
| JP4124744B2 (en) | Method for electrolytic polishing of titanium or titanium alloy | |
| GB2117406A (en) | Electrolytic stripping | |
| JPH03267400A (en) | Production of lithographic printing plate supporting body | |
| US4201836A (en) | Aluminum substrates grained with a saturated solution of aluminum salts of mineral acids | |
| JPH11100700A (en) | Electrolytic polishing method for inside surface of hollow part of aluminum product | |
| JP6870389B2 (en) | How to remove the oxide film on the surface of metal material | |
| CN115917052B (en) | Method for applying a coating to an article made of valve metal and its alloys | |
| JPH0472098A (en) | Production of aluminum substrate for printing plate | |
| JP3202447B2 (en) | Method for forming anodized film on aluminum alloy parts | |
| SE511207C2 (en) | Method of electropolishing titanium-based coatings on cutting tools and wear parts to a high surface finish | |
| US2986499A (en) | Electropolishing steel | |
| JP2001288591A (en) | Chemical polishing of metal articles | |
| JPS6151396A (en) | Preparation of support for planographic printing plate | |
| JP3162115B2 (en) | Continuous electrolytic surface roughening method for aluminum support for offset printing plate | |
| JP2018188702A (en) | Removal method of oxide film on metal surface | |
| JPH03173800A (en) | Production of substrate for printing plate | |
| JP2630702B2 (en) | Method of peeling and recovering gold or platinum group metal coated on metal substrate and peeling and recovering apparatus | |
| JP2707339B2 (en) | Method for producing a lithographic printing plate support |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20020115 |