JPH08112862A - Stereolithography - Google Patents
StereolithographyInfo
- Publication number
- JPH08112862A JPH08112862A JP6251071A JP25107194A JPH08112862A JP H08112862 A JPH08112862 A JP H08112862A JP 6251071 A JP6251071 A JP 6251071A JP 25107194 A JP25107194 A JP 25107194A JP H08112862 A JPH08112862 A JP H08112862A
- Authority
- JP
- Japan
- Prior art keywords
- light
- liquid crystal
- light source
- crystal shutter
- shutter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Liquid Crystal (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
Abstract
(57)【要約】
【目的】 造形に長時間を要せず、しかも、大型化する
ことなく、かつ、液晶シャッタの昇温によるコントラス
ト低下やシャッタ性能の劣化を抑制し、光源照度分布を
均一化する。
【構成】 液状の光硬化性樹脂２の上方であって巾方向
に走行自在に配置した線状光源１１からの光線を、液晶
シャッタ及び等倍結像素子１５を経て、前記光硬化性樹
脂２の液面に照射して目的立体モデルの断面パターンに
対応する薄膜の硬化樹脂層２ａを形成し、この樹脂層を
順次積層して立体モデルを形成する光造形装置におい
て、線状光源１１と液晶シャッタ５との間に、該液晶シ
ャッタ５に入射する光を遮光によって選択的に規制する
遮光板組立体１３を装着したことを特徴とするものであ
る。
(57) [Abstract] [Purpose] It does not require a long time for modeling, does not increase the size, and suppresses the contrast deterioration and shutter performance deterioration due to the temperature rise of the liquid crystal shutter, and makes the light source illuminance distribution uniform. Turn into. [Structure] A light beam from a linear light source 11 which is arranged above a liquid photocurable resin 2 so as to be movable in the width direction is passed through a liquid crystal shutter and an equal-magnification imaging element 15, and the photocurable resin 2 is then passed. In the stereolithography apparatus for irradiating the liquid surface of No. 3 to form the cured resin layer 2a of a thin film corresponding to the cross-sectional pattern of the target three-dimensional model, and successively laminating the resin layers to form the three-dimensional model, the linear light source 11 and the liquid crystal A light-shielding plate assembly 13 that selectively restricts the light incident on the liquid crystal shutter 5 by blocking light is mounted between the shutter 5 and the shutter 5.
Description
【０００１】[0001]
【産業上の利用分野】本発明は、液状の光硬化性樹脂に
光を照射し、所望の形状を持つ立体モデルを形成する光
造形装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photolithography apparatus for irradiating a liquid photocurable resin with light to form a three-dimensional model having a desired shape.
【０００２】[0002]
【従来の技術】光造形装置としては、液状の光硬化性樹
脂の表面にスポット状のレーザ光を平面的に走査させて
目的造形物の断面パターンを描く露光を行って、レーザ
光が当たった部分に位置する光硬化性樹脂のみを硬化さ
せて薄膜の硬化樹脂層を形成し、この硬化樹脂層を連続
的に幾層にも積層することで、立体モデルを形成するよ
うにしたものが一般に知られている。2. Description of the Related Art As a stereolithography apparatus, the surface of a liquid photo-curable resin is exposed to a laser beam by exposing the surface of a liquid photocurable resin in a plane to scan a spot-shaped laser beam to draw a cross-sectional pattern of the target sculpture. In general, a solid model is formed by curing only a photo-curable resin located in a portion to form a thin cured resin layer, and continuously laminating this cured resin layer in several layers. Are known.
【０００３】しかしながら、このようなレーザ光による
露光方式を採用した光造形装置の場合、レーザ光での走
査は、一筆書きによる長い線を描くのと同様の工程とな
るため、造形に長時間が必要であった。However, in the case of an optical molding apparatus that employs such an exposure method using laser light, scanning with laser light is the same process as drawing a long line by one stroke, and therefore it takes a long time to form. Was needed.
【０００４】このため、レーザ光の代わりに、平行光を
用いた光造形装置、即ち、平行光の光源と光硬化性樹脂
との間に液晶シャッタを配置し、この液晶シャッタ上に
表示した立体モデル（目的造形物）の断面パターンをマ
スクパターン（露光マスクパターン）として使用して、
このマスクパターンを介した平行光による一括露光で高
速に光硬化性樹脂を硬化させるようにしたものが広く知
られている（例えば、特開昭６２−２８８８４４号公
報、特開平３−２２７２２２号公報、実開平２−３１７
２６号公報等参照）。Therefore, instead of the laser light, a stereolithography apparatus using parallel light, that is, a liquid crystal shutter is arranged between a light source of parallel light and a photocurable resin, and a stereoscopic image displayed on the liquid crystal shutter is displayed. Using the cross-sectional pattern of the model (objective object) as a mask pattern (exposure mask pattern),
It is widely known that the photocurable resin is cured at a high speed by collective exposure with parallel light through the mask pattern (for example, JP-A-62-288844 and JP-A-3-227222). , Actual Kaihei 2-317
26).
【０００５】しかし、液晶シャッタと平行光を用いた従
来例の場合、一括露光を行うためには、液晶シャッタの
サイズと少なくとも同じだけの面積を照射する照射強度
の均一な平行光が必要となり、液晶シャッタのサイズが
大きいほど、高圧水銀ランプ等の光源から均一な平行光
を得るために、大型のレンズや反射板等を使用し、しか
も長い光路長が必要となって、光源、ひいては装置全体
が大型化してしまうといった問題があった。However, in the case of the conventional example using parallel light with a liquid crystal shutter, in order to perform collective exposure, parallel light with uniform irradiation intensity for irradiating an area at least as large as the size of the liquid crystal shutter is required. The larger the size of the liquid crystal shutter, the larger the lens and the reflector used in order to obtain uniform parallel light from the light source such as the high pressure mercury lamp, and the longer optical path length is required. Had the problem of becoming larger.
【０００６】そこで、大型のレンズや反射板、長い光路
長を必要としない造形方法として、平行光による一括露
光を用いる代わりに、ロングアークの水銀ランプ等を使
用した線状光源と液晶シャッタ等を組み合わせ、線状光
源を移動させることにより、液晶シャッタのマスクパタ
ーンを介した線露光で光硬化性樹脂を硬化させるように
したものが一般に知られている（特開平４−２８４２２
７号公報、特開平４−３０５４３８号公報、特願平６−
８８３３７号、特願平６−１２０２５７号) 。Therefore, as a modeling method that does not require a large lens, a reflector, or a long optical path length, instead of using collective exposure by parallel light, a linear light source using a long arc mercury lamp or the like and a liquid crystal shutter or the like are used. It is generally known to combine and move a linear light source to cure a photocurable resin by linear exposure through a mask pattern of a liquid crystal shutter (JP-A-4-28422).
No. 7, Japanese Patent Application Laid-Open No. 4-305438, Japanese Patent Application No. 6-
88337, Japanese Patent Application No. 6-120257).
【０００７】[0007]
【発明が解決しようとする課題】しかしながら、線状光
源を用いた従来例の場合、光源からミラー等で反射集光
され液晶シャッタ面に入射する線状光は、平行光でなく
シャッタ面に対して様々な角度成分を有するが、実際に
液晶シャッタのマスクパターンに忠実な光硬化性樹脂の
硬化層形成に利用できる光は、液晶シャッタの視野角依
存性の為に、液晶シャッタ面から垂直に近い角度で出射
する平行光に近い光成分のみで、この光を等倍結像素子
等の光学系で選択的に利用する。この結果、液晶シャッ
タ面に入射する光の大半は非利用光となり、この非利用
光が液晶シャッタの急激な昇温を招き、コントラストを
著しく低下させるばかりか、液晶シャッタを劣化させ、
寿命を短くするという問題があった。However, in the case of the conventional example using the linear light source, the linear light reflected and condensed by the mirror or the like from the light source and incident on the liquid crystal shutter surface is not parallel light but is directed to the shutter surface. Although it has various angle components, the light that can actually be used to form a cured layer of photo-curable resin that is faithful to the mask pattern of the liquid crystal shutter is perpendicular to the surface of the liquid crystal shutter due to the viewing angle dependence of the liquid crystal shutter. Only the light component close to the parallel light emitted at a close angle is used to selectively utilize this light in an optical system such as an equal-magnification imaging element. As a result, most of the light incident on the liquid crystal shutter surface becomes non-use light, and this non-use light causes a rapid temperature rise of the liquid crystal shutter, which not only significantly lowers the contrast but also deteriorates the liquid crystal shutter.
There was a problem of shortening the life.
【０００８】また、線状光源は使用する光源自体あるい
は光源種類やロットの違いによっても光源長さ方向の発
光強度に分布があり、且つその分布がばらつくため、そ
の結果、光硬化性樹脂を硬化する際、硬化樹脂の膜厚が
不均一となり、造形精度の低下を招くという問題があっ
た。In addition, the linear light source has a distribution of light emission intensity in the length direction of the light source depending on the light source itself, the type of light source used, and the lot, and the distribution varies. As a result, the photocurable resin is cured. In that case, there is a problem that the film thickness of the cured resin becomes non-uniform and the molding accuracy is lowered.
【０００９】本発明は上記問題点を解消すべくなされた
もので、液晶シャッタの昇温によるコントラスト低下や
シャッタ性能の劣化を抑制し、光源照度分布を均一化し
得る光造形装置を提供することを目的とする。The present invention has been made to solve the above problems, and it is an object of the present invention to provide a stereolithography apparatus capable of suppressing the contrast reduction and the shutter performance deterioration due to the temperature rise of the liquid crystal shutter and making the light source illuminance distribution uniform. To aim.
【００１０】[0010]
【課題を解決するための手段】上記目的を達成するた
め、本発明は、液状の光硬化性樹脂の上方であって巾方
向に走行自在に配置した線状光源からの光線を、光透過
部と遮光部とからなる液晶シャッタ及び該液晶シャッタ
の透過光を光硬化性樹脂面に結像する等倍結像素子を経
て、前記光硬化性樹脂の液面に照射して、目的立体モデ
ルの断面パターンに対応する薄膜の硬化樹脂層を形成
し、この樹脂層を順次積層して立体モデルを形成するよ
うにした光造形装置において、線状光源と液晶シャッタ
との間に、該液晶シャッタに入射する光を遮光によって
選択的に規制する遮光板組立体を装着したことを特徴と
するものである。In order to achieve the above object, the present invention provides a light transmitting section for transmitting a light beam from a linear light source which is arranged above a liquid photocurable resin so as to be movable in the width direction. The liquid surface of the photocurable resin is irradiated through a liquid crystal shutter composed of a light-shielding part and an equal-magnification imaging element that forms an image of transmitted light of the liquid crystal shutter on the photocurable resin surface, and the liquid crystal shutter In a stereolithography apparatus in which a thin cured resin layer corresponding to a cross-sectional pattern is formed and the resin layers are sequentially laminated to form a three-dimensional model, a liquid crystal shutter is provided between the linear light source and the liquid crystal shutter. It is characterized in that a shading plate assembly for selectively restricting incident light by shading is mounted.
【００１１】[0011]
【作用】巾方向に走行する光源から出た光は、液晶シャ
ッタに向かうが、この際、遮光板組立体の調節により、
等倍結像素子の開口角よりも大きい角度をもって液晶シ
ャッタに入射する光、すなわち、光硬化性樹脂の硬化に
利用されない光を遮光することができ、これにより、液
晶シャッタの昇温が防止される。また、遮光板組立体の
調節により光源の長さ方向の光量を均一化することがで
き、この結果、光源の照度分布が均一化される。The light emitted from the light source traveling in the width direction is directed to the liquid crystal shutter, and at this time, by adjusting the light shielding plate assembly,
It is possible to block light that enters the liquid crystal shutter at an angle larger than the aperture angle of the equal-magnification imaging element, that is, light that is not used to cure the photocurable resin, and thus prevent the temperature rise of the liquid crystal shutter. It Further, the light amount in the length direction of the light source can be made uniform by adjusting the light shielding plate assembly, and as a result, the illuminance distribution of the light source can be made uniform.
【００１２】[0012]
【実施例】以下、本発明の実施例を図面を参照して説明
する。図１において、付番１は、上方に開口した矩形ボ
ックス状の容器（樹脂槽）で、この容器１の内部には、
光が当たると液体から固体に硬化する液状の光硬化性樹
脂２が満たされている。この光硬化性樹脂２は、光エネ
ルギーによって重合反応を起こして、液体が固体に変化
するという特性を持った樹脂で、例えば光重合性ポリマ
ー、光開始剤、特性改善のための添加剤等を含むことが
できる。Embodiments of the present invention will be described below with reference to the drawings. In FIG. 1, number 1 is a rectangular box-shaped container (resin tank) that opens upward, and inside this container 1,
A liquid photocurable resin 2 that is cured from a liquid to a solid when exposed to light is filled. The photocurable resin 2 is a resin having a characteristic that a liquid undergoes a polymerization reaction by light energy to change into a solid. For example, a photopolymerizable polymer, a photoinitiator, an additive for improving characteristics, etc. Can be included.
【００１３】前記容器１の一側方には、前記容器１内に
位置して上下に昇降する平板状のエレベータ３を備えた
位置制御可能なエレベータ昇降機構４が配置され、この
エレベータ３の上に光硬化樹脂２が硬化することによっ
て得られる硬化樹脂層２ａが順次積層されるようになっ
ている。On one side of the container 1, a position-controllable elevator elevating mechanism 4 having a flat plate-shaped elevator 3 which is located in the container 1 and moves up and down is arranged. Further, a cured resin layer 2a obtained by curing the photocurable resin 2 is sequentially laminated.
【００１４】また、前記容器１の他側方には、平面状に
拡がって前記容器１内に収容された光硬化性樹脂２の液
面のほぼ全域を覆う液晶シャッタ５を、その一端におい
て水平に保持する液晶シャッタ保持機構６が立設されて
いる。On the other side of the container 1, a liquid crystal shutter 5 that spreads in a plane and covers almost the entire liquid surface of the photocurable resin 2 housed in the container 1 is horizontally provided at one end thereof. A liquid crystal shutter holding mechanism 6 for holding the liquid crystal shutter is provided upright.
【００１５】前記液晶シャッタ５は、目的立体モデルの
断面パターンを透過部と遮断部で表示できるものであれ
ば良く、例えば、ＳＴＮ型液晶パネル、ＴＮ型液晶パネ
ル、ポリマー分散型液晶パネル等を使用することができ
る。The liquid crystal shutter 5 may be of any type as long as it can display the cross-sectional pattern of the target stereoscopic model at the transmission part and the blocking part. can do.
【００１６】更に、前記容器１の該容器１を挟んだ両側
には、図２に示すように、レール７上をエアー圧やステ
ッピングモータ等の駆動装置によって走行する支柱８を
備えた位置制御可能な一対の直線移動機構９が平行かつ
水平に配置され、この支柱８の上端に、容器１を跨がっ
て直線状に延びる光源ユニット１０の端部が連結されて
いる。そして、前記光源ユニット１０の内部には、前記
液晶シャッタ５が挿通する矩形枠状の窓部１０ａが形成
されている。Further, as shown in FIG. 2, on both sides of the container 1 between which the container 1 is sandwiched, columns 8 which run on rails 7 by a driving device such as air pressure or a stepping motor can be position-controlled. A pair of linear moving mechanisms 9 are arranged in parallel and horizontally, and an end of a light source unit 10 extending linearly across the container 1 is connected to an upper end of the column 8. Inside the light source unit 10, a rectangular frame-shaped window 10a through which the liquid crystal shutter 5 is inserted is formed.
【００１７】これにより、光源ユニット１０は、容器１
の上方に位置し、液晶シャッタ５を挟んだ状態で、直線
移動機構９の駆動に伴う支柱８の互いに同期した移動に
伴って、その幅方向に水平に走行し、しかもこの走行が
液晶シャッタ５によって阻害されないようになってい
る。As a result, the light source unit 10 includes the container 1
Is positioned above the liquid crystal shutter 5 and moves horizontally in the width direction of the liquid crystal shutter 5 as the pillars 8 move in synchronization with each other when the linear movement mechanism 9 is driven. It is not blocked by.
【００１８】なお、この実施例では、直線移動機構とし
て、位置及び速度の制御が比較的容易なエアー圧やステ
ッピングモータ等を使用した例を示しているが、油圧シ
リンダ等、任意のものを使用しても良いことは勿論であ
る。In this embodiment, as the linear movement mechanism, an example in which air pressure or a stepping motor whose position and speed are relatively easy to control is used is shown, but an arbitrary one such as a hydraulic cylinder is used. Of course, you can do that.
【００１９】前記光源ユニット１０の内部の前記液晶シ
ャッタ５の上方位置には、この長さ方向に沿ってこのほ
ぼ全長に亘って直線状に延びる線状光源１１が前記光硬
化性樹脂２の液面と水平に配置されて収容されている。At a position above the liquid crystal shutter 5 inside the light source unit 10, a linear light source 11 extending linearly along the length direction over substantially the entire length is provided as a liquid of the photocurable resin 2. It is housed in a horizontal plane.
【００２０】この線状光源１１としては、例えば、クリ
プトンロングアークランプ、キセノンロングアークラン
プ、メタルハライドロングアークランプ、水銀ロングア
ークランプ等を使用することができる。As the linear light source 11, for example, a krypton long arc lamp, a xenon long arc lamp, a metal halide long arc lamp, a mercury long arc lamp or the like can be used.
【００２１】前記線状光源１１の上方には、図３に示す
ようにこの線状光源１１から出た光を反射して、この反
射光を前記液晶シャッタ５上に集光させる円弧状の反射
ミラー１２が、この反射ミラー１２の下方で前記液晶シ
ャッタ５の上方位置には、前記線状光源１１からの光の
内、等倍結像素子１６を通過できない入射角を有する光
成分を遮断し、光量を調節する遮光板組立体１３と光硬
化性樹脂の硬化反応に寄与しない波長域の熱エネルギー
や光エネルギーを遮光し、液晶へのダメージを防止する
ための熱線吸収フィルタ１４と光の透過と遮光を切り替
えるためのメカニカルシャッタ１５とが上下に平行に順
に配置されて前記光源ユニット１０内に収容されてい
る。Above the linear light source 11, as shown in FIG. 3, an arc-shaped reflection for reflecting the light emitted from the linear light source 11 and condensing the reflected light on the liquid crystal shutter 5. At a position below the reflection mirror 12 and above the liquid crystal shutter 5, the mirror 12 blocks a light component of the light from the linear light source 11 having an incident angle that cannot pass through the equal-magnification imaging element 16. , A light-shielding plate assembly 13 for adjusting the amount of light and a heat ray absorption filter 14 for blocking heat energy and light energy in a wavelength range that does not contribute to the curing reaction of the photocurable resin and preventing damage to the liquid crystal, and light transmission. And a mechanical shutter 15 for switching the light blocking are arranged in parallel vertically and are housed in the light source unit 10.
【００２２】前記遮光板組立体１３は、複数の長方形の
薄板１３ａから構成され、等倍結像素子の開口角より大
きな角度成分光を遮光するもので、図４（ａ）、（ｂ）
に示すように、高さｌの長方形の薄板を垂直に立て、該
薄板のそれぞれの面が平行になるように間隔ｄを置い
て、線状光源の長さ方向にスリット状に、或いは線状光
源の長さ方向と幅方向に格子状に配列され、前記薄板の
高さｌと間隔ｄを調節して、入射角ｔａｎ-1（ｄ／ｌ）
以上の光線成分を遮光する。The light-shielding plate assembly 13 is composed of a plurality of rectangular thin plates 13a, and shields the angular component light larger than the aperture angle of the equal-magnification imaging element, as shown in FIGS. 4 (a) and 4 (b).
, A rectangular thin plate having a height of 1 is set upright and spaced at intervals d so that the respective surfaces of the thin plate are parallel to each other, and a slit or linear shape is formed in the length direction of the linear light source. The light sources are arranged in a lattice shape in the length direction and the width direction, and the height l and the interval d of the thin plates are adjusted to adjust the incident angle tan −1 (d / l).
The above light ray components are shielded.
【００２３】また、遮光体組立体１３は、線状光源の長
さ方向の光量を均一化する機能をも果たし、高さｌの長
方形の薄板を垂直に立て、該薄板のそれぞれの面が平行
になるように間隔ｄを置いて、線状光源の長さ方向にス
リット状に、或いは線状光源の長さ方向と幅方向に格子
状に配列され、線状光源の長さ方向に並んだ前記薄板の
間隔ｄを部分的に変えることにより、遮光板を透過する
光量を部分的に調節することができる。Further, the light shield assembly 13 also has a function of equalizing the amount of light in the lengthwise direction of the linear light source, vertically arranging a rectangular thin plate having a height l, and the respective faces of the thin plates are parallel to each other. Are arranged in a slit shape in the lengthwise direction of the linear light source or in a grid shape in the lengthwise and widthwise directions of the linear light source, and are arranged in the lengthwise direction of the linear light source. By partially changing the distance d between the thin plates, the amount of light transmitted through the light shield plate can be partially adjusted.
【００２４】通常、光量の調節は間隔ｄを変えることに
より行うが、高さｌを単独で変えることにより行うこと
も可能であり、あるいは間隔ｄと高さｌとの双方を変え
ることにより行うことも可能である。Normally, the amount of light is adjusted by changing the distance d, but it is also possible to change the height l independently, or by changing both the distance d and the height l. Is also possible.
【００２５】また、遮光板組立体１３の配列は、スリッ
ト状又は格子状に限らず、ハニカム状であってもよい。
すなわち、本発明においては、遮光板組立体は、液晶シ
ャッタへの入射光を遮光によって選択的に規制するので
あるが、これはより具体的には以下の実施態様のいずれ
かによって達成される。 （１）線状光源から液晶シャッタへ入射する光線のう
ち、入射角が等倍結像素子の開口角より大きな角度成分
を遮光する。 （２）遮光板組立体の調節により、線状光源の長さ方向
の光量を均一化する。 （３）線状光源から液晶シャッタ面へ入射する光線のう
ち、入射角が等倍結像素子の開口角より大きな角度成分
を遮光し、かつ遮光板組立体の調節により、線状光源の
長さ方向の光量を均一化する。The arrangement of the light shielding plate assembly 13 is not limited to the slit shape or the grid shape, but may be a honeycomb shape.
That is, in the present invention, the light shielding plate assembly selectively regulates the light incident on the liquid crystal shutters by light shielding, which is more specifically achieved by any of the following embodiments. (1) Among the light rays incident on the liquid crystal shutter from the linear light source, the angle component whose incident angle is larger than the aperture angle of the equal-magnification imaging element is shielded. (2) The light amount in the length direction of the linear light source is made uniform by adjusting the light shielding plate assembly. (3) Among the light rays incident on the liquid crystal shutter surface from the linear light source, the angle component having an incident angle larger than the aperture angle of the equal-magnification imaging element is shielded, and the length of the linear light source is adjusted by adjusting the shading plate assembly. The amount of light in the vertical direction is made uniform.
【００２６】なお、本発明において、遮光板とは光の反
射の少ない、即ち光を吸収し易く且つ透過光のロスを少
なくするためできるだけ薄板であればよく、例えば、黒
アルマイト処理したアルミ板や黒染めした薄い鉄板等が
使用できる。In the present invention, the light shielding plate may be as thin as possible in order to reduce light reflection, that is, to easily absorb light and reduce loss of transmitted light. For example, a black alumite treated aluminum plate or A black ironed thin iron plate can be used.
【００２７】更に、光源ユニット１０の前記液晶シャッ
タ５の下方位置には、光硬化性樹脂２の上方に位置して
前記液晶シャッタ５の透過光を光硬化性樹脂２の液面に
結像する等倍結像素子１６が配置されている。Further, the light source unit 10 is located below the liquid crystal shutter 5 and above the photocurable resin 2, and the light transmitted through the liquid crystal shutter 5 is focused on the liquid surface of the photocurable resin 2. An equal-magnification imaging element 16 is arranged.
【００２８】この等倍結像素子１６は、液晶シャッタ５
を透過した透過パターン光を効率良く光硬化性樹脂２の
液面に結像できる幅と長さを有するものであれば良く、
例えば、セルホックレンズを列状に並べたセルホックレ
ンズアレー等を使用することができる。The same-magnification image forming element 16 is provided with the liquid crystal shutter 5.
As long as it has a width and a length capable of efficiently forming an image of the transmission pattern light transmitted through the liquid surface of the photocurable resin 2,
For example, a cell hook lens array in which cell hook lenses are arranged in a row can be used.
【００２９】図１または図２に示すように、前記光源ユ
ニット１０の走行方向の前後面、即ち幅方向の両側に
は、光源ユニット１０の長さ方向に沿ってそのほぼ全長
に亘って直線状に延びて光硬化性樹脂２の液面を平滑化
する一対の平滑板１７が取り付けられている。As shown in FIG. 1 or 2, on the front and rear surfaces of the light source unit 10 in the traveling direction, that is, on both sides in the width direction, a linear shape is formed along the length direction of the light source unit 10 over substantially the entire length thereof. A pair of smooth plates 17 that extend to the surface and smooth the liquid surface of the photocurable resin 2 are attached.
【００３０】この平滑板１７は、それぞれ独立に駆動で
きる昇降機構を介して上下動自在に構成され、前記光源
ユニット１０の進行方向の前方側に位置する一方の平滑
板１７をこの下端が光硬化性樹脂２の液面に接触するま
で下降させることにより、光源ユニット１０の走行に伴
って、光硬化性樹脂２の液面の平滑化を行うようになっ
ている。The smooth plate 17 is configured to be movable up and down via an elevating mechanism that can be independently driven, and the lower end of one of the smooth plates 17 located on the front side in the traveling direction of the light source unit 10 is photocured. The liquid surface of the photocurable resin 2 is smoothed as the light source unit 10 travels by lowering the liquid surface of the photocurable resin 2 until it comes into contact with the liquid surface.
【００３１】図１に示すように、前記エレベータ昇降機
構４、直線移動機構９の位置と速度、液晶シャッタ５の
表示、メカニカルシャッタ１５のオン・オフ、平滑板１
７の昇降等をそれぞれ独立に制御する制御装置としての
コンピュータ１８が備えられ、このコンピュータ（制御
装置）１８は、目的立体モデルの断面パターン（造形デ
ータ）を格納したデータファイル１９に接続されてい
る。As shown in FIG. 1, the positions and speeds of the elevator elevating mechanism 4 and the linear moving mechanism 9, the display of the liquid crystal shutter 5, the turning on / off of the mechanical shutter 15, the smoothing plate 1
A computer 18 is provided as a control device for independently controlling the elevating and the like of 7 and the like, and this computer (control device) 18 is connected to a data file 19 storing a cross-sectional pattern (modeling data) of a target stereo model. .
【００３２】そして、このコンピュータ１８は、データ
ファイル１９から目的立体モデルの断面パターンを呼出
し、この断面パターンを図形として液晶シャッタ５上に
白黒の２階調のマスクパターンで表示させるようになっ
ている。Then, the computer 18 calls the cross-sectional pattern of the target stereo model from the data file 19 and displays the cross-sectional pattern as a figure on the liquid crystal shutter 5 in a black and white two-tone mask pattern. .
【００３３】このように、コンピュータ１８による制御
により、前記エレベータ３の表面に液状の光硬化性樹脂
２が硬化することによって得られる硬化樹脂層２ａを順
次積層して、この硬化樹脂層２ａからなる立体モデルを
形成するものであるが、これを以下のようにして行う。As described above, under the control of the computer 18, the cured resin layer 2a obtained by curing the liquid photocurable resin 2 on the surface of the elevator 3 is sequentially laminated, and the cured resin layer 2a is formed. A three-dimensional model is formed, which is performed as follows.
【００３４】先ず、エレベータ昇降機構４を駆動させ
て、最上段に位置する硬化樹脂層２ａ（またはエレベー
タ４の表面）の上に位置する光硬化性樹脂２が所定の深
さΔｈになるようにする。First, the elevator elevating mechanism 4 is driven so that the photocurable resin 2 located on the uppermost cured resin layer 2a (or the surface of the elevator 4) has a predetermined depth Δh. To do.
【００３５】次に、データファイル１９に格納されてい
る目的立体モデルの断面パターン（断面形状データ）を
呼び出して、この断面パターンを図形として白黒の２階
調のマスクパターンで前記液晶シャッタ５に表示させ
る。Next, the cross-sectional pattern (cross-sectional shape data) of the target three-dimensional model stored in the data file 19 is called, and this cross-sectional pattern is displayed as a figure on the liquid crystal shutter 5 in a black and white two-tone mask pattern. Let
【００３６】この状態で、メカニカルシャッタ１５を開
き、光源ユニット１０を一方の端辺から他方の端辺ま
で、直線移動機構９の駆動によって一定の速度で平行移
動させることにより、光源ユニット１０内の線状光源１
１から出射され、遮光板組立体１３を介して液晶シャッ
タ５を透過した線状光で光硬化層樹脂２の液面を照射し
て、一層の硬化樹脂層２ａを形成する。In this state, the mechanical shutter 15 is opened, and the light source unit 10 is translated from one end side to the other end side at a constant speed by the driving of the linear movement mechanism 9, whereby the light source unit 10 inside the light source unit 10 is moved. Linear light source 1
The liquid surface of the photo-curing layer resin 2 is irradiated with the linear light emitted from No. 1 and passing through the liquid crystal shutter 5 through the light-shielding plate assembly 13 to form the one cured resin layer 2a.
【００３７】即ち、液晶シャッタ５に表示された白黒の
２諧調のマスクパターンによって、例えば白色の部分で
光を透過させ、黒色の部分で光を遮断することにより、
液晶シャッタ５に表示されたマスクパターン形状と同様
な形状の硬化樹脂層２ａを形成することができる。That is, by using a black and white two-tone mask pattern displayed on the liquid crystal shutter 5, for example, light is transmitted in the white portion and is blocked in the black portion,
The cured resin layer 2a having a shape similar to the mask pattern shape displayed on the liquid crystal shutter 5 can be formed.
【００３８】この光源ユニット１０の移動の際、光源ユ
ニット１０の進行方向の前面側に取り付けられた一方の
平滑板１７をこの下端が光硬化性樹脂２の液面に接触す
るよう下降させ、これによって、光源ユニット１０の平
行移動に伴って光硬化性樹脂２の液面の平滑化を行い、
この平滑化と同時に硬化樹脂層２ａを形成することがで
きる。When the light source unit 10 is moved, one smooth plate 17 attached to the front side in the traveling direction of the light source unit 10 is lowered so that its lower end comes into contact with the liquid surface of the photocurable resin 2. The liquid surface of the photocurable resin 2 is smoothed by the parallel movement of the light source unit 10,
At the same time as this smoothing, the cured resin layer 2a can be formed.
【００３９】そして、これと同様な操作を繰り返すこと
により、所定形状の硬化樹脂層２ａを順次積層し、所望
の立体像が得られた時に、これを容器１から取り出し、
洗浄し未硬化の光硬化性樹脂を取り除き、しかる後ポス
トキュアを施して立体像を完成させる。By repeating the same operation as above, the cured resin layers 2a having a predetermined shape are sequentially laminated, and when a desired three-dimensional image is obtained, it is taken out from the container 1,
It is washed to remove the uncured photocurable resin, and then post-cured to complete a three-dimensional image.
【００４０】ここで、遮光板による線状光の角度成分を
制御し光量を調節する方法について図１を参照して説明
する。線状光源下に、高さがｌの薄板を間隔ｄをおいて
スリット状に配列すれば、線状光源の長さ方向に発散す
る光に対して、このスリットを通過できる光の角度θは
およそｔａｎ-1（ｄ／ｌ）以下に制限でき、また、線光
源の長さ方向の照度分布に合わせて、薄板の間隔ｄを部
分的に変え光量を調節すれば遮光板通過後の光量を均一
化できる。更に、遮光板を光源の長さ及び幅方向に格子
状に配置し、薄板の高さｌ及び間隔ｄを光源の長さと幅
方向でそれぞれ調節すれば、光のロスは大きくなるもの
の、スリットを透過する光全般に亘って、つまり、液晶
シャッタへ入射する光の角度成分と光量をより精密に制
御できる。Here, a method of controlling the angle component of the linear light by the light shielding plate and adjusting the light quantity will be described with reference to FIG. If thin plates having a height of 1 are arranged in a slit shape at intervals d under the linear light source, the angle θ of the light that can pass through the slit with respect to the light diverging in the length direction of the linear light source is It can be limited to about tan -1 (d / l) or less, and the light amount after passing through the light shield plate can be adjusted by partially changing the distance d between the thin plates according to the illuminance distribution in the length direction of the linear light source. Can be made uniform. Further, if the light shielding plates are arranged in a grid pattern in the length and width directions of the light source and the height l and the interval d of the thin plates are adjusted in the length and width directions of the light source, respectively, the loss of light becomes large, but the slit It is possible to more accurately control the angle component and the light amount of the light incident on the liquid crystal shutter over the entire transmitted light.
【００４１】次に、本発明のより具体的な例につき、従
来例と比較しつつ説明する。図５は、遮光板組立体の有
無をパラメータとして、光源ユニットを一定のインター
バルで移動させたときの液晶シャッタ中央部で測定した
該シャッタ表面温度の時間変化を示し、図６は遮光板組
立体使用前と使用後における光源長さ方向の照度分布を
示すもので、以下に実施条件を示す。Next, a more specific example of the present invention will be described in comparison with a conventional example. FIG. 5 shows a time change of the shutter surface temperature measured at the central portion of the liquid crystal shutter when the light source unit is moved at a constant interval with the presence or absence of the light shielding plate assembly as a parameter, and FIG. 6 shows the light shielding plate assembly. It shows the illuminance distribution in the length direction of the light source before and after use, and the implementation conditions are shown below.
【００４２】図３に示した光源ユニット１０において、
線状光源１１に３．５ＫＷの長さ約３００ｍｍのメタル
ハライドロングアークランプおよび等倍結像素子１６と
して開口角（透過できる入射光の最大角度）が１２°の
セルホックアレーを使用し、この時の遮光板組立体１１
を使用例においては、該遮光板組立体は、液晶シャッタ
への入射光の角度成分がおよそ１２°以下になるよう高
さ１７ｍｍ、厚さ０．３ｍｍの黒染め鉄板を７ｍｍ間隔
で線状光源の長さ方向にスリット状に配列した。In the light source unit 10 shown in FIG. 3,
For the linear light source 11, a metal halide long arc lamp with a length of about 300 mm of 3.5 KW and a cell-hook array with an aperture angle (maximum angle of incident light that can be transmitted) of 12 ° are used as the equal-magnification imaging element 16. Shading plate assembly 11
In the example of use, the shading plate assembly is a linear light source with a black-dyed iron plate having a height of 17 mm and a thickness of 0.3 mm at 7 mm intervals so that the angle component of the light incident on the liquid crystal shutter is about 12 ° or less. Were arrayed in a slit shape in the longitudinal direction.
【００４３】図５の結果は上記条件で、光源ユニット１
０を連続的に速度１５ｍｍ／ｓで液晶シャッタ両端間を
それぞれの端で約２０秒のインターバルをおくようにし
て往復移動させた場合の室温雰囲気での液晶シャッタ中
央付近の表面温度を測定したもので、遮光板組立体のな
い場合、温度は経時的に液晶の等方性温度付近まで上昇
し、且つ光源の通過に伴い局所的に急激な温度上昇の為
に液晶シャッタのコントラストが低下するばかりか、シ
ャッタとして使用できなくなる一方、遮光板組立体を使
用した場合、温度上昇はほとんど見られず、局所的温度
上昇も穏やかである。遮光板組立体を用いずに造形をす
る場合、よりパワーの小さい光源を使用しなければなら
ず、造形に長時間を要していたが、簡便な遮光板を使用
するだけで、よりパワーの大きな光源の使用が可能にな
り造形時間短縮ができる。The result of FIG. 5 is the light source unit 1 under the above conditions.
Measurement of the surface temperature near the center of the liquid crystal shutter in a room temperature atmosphere when 0 was continuously moved at a speed of 15 mm / s and reciprocally moved between both ends of the liquid crystal shutter at intervals of about 20 seconds at each end. In the absence of the light-shielding plate assembly, the temperature rises to near the isotropic temperature of the liquid crystal with the passage of time, and the contrast of the liquid crystal shutter only decreases due to the local sharp rise in temperature with the passage of the light source. On the other hand, when it becomes impossible to use it as a shutter, when the shading plate assembly is used, almost no temperature rise is observed and the local temperature rise is moderate. When modeling without using the shading plate assembly, it was necessary to use a light source with lower power, and it took a long time to build. However, using a simple shading plate will reduce the power consumption. A large light source can be used, and the modeling time can be shortened.
【００４４】図６の結果は前記条件で、セルホックレン
ズを透過し光硬化性樹脂２の位置に届く光の照度分布を
光源の長さ方向で測定したもので、遮光板がある場合の
照度分布は、遮光板のない場合の照度分布に応じて、遮
光板の初期の間隔７ｍｍから場所により間隔を変え、光
量を調節することによって照度の均一化を実現したもの
で、全体的に照度は低下するもののこの実施例では約１
５％あった照度のばらつきを２％程度に抑えられた。The results of FIG. 6 are obtained by measuring the illuminance distribution of the light passing through the self-hook lens and reaching the position of the photocurable resin 2 in the lengthwise direction of the light source under the above conditions. As for the distribution, according to the illuminance distribution when there is no light shield, the distance is changed from the initial distance of 7 mm of the light shield depending on the location and the light intensity is adjusted to achieve uniform illuminance. Although reduced, it is about 1 in this embodiment.
The illuminance variation of 5% was suppressed to about 2%.
【００４５】[0045]
【発明の効果】以上説明したように、本発明では線状光
源と液晶シャッタの間に、簡便な、遮光板を用いた遮光
板組立体を配置することにより、光硬化性樹脂の硬化に
利用されない角度成分を有する光成分を遮光することに
よって、液晶シャッタの昇温によるコントラスト低下や
シャッタ性能の劣化を抑制し得るとともにより高出力光
源の使用が可能になるため、造形時間の短縮が実現でき
る。また、遮光板組立体を調節することにより、光源照
度分布を均一化し、目的立体モデルを精度よく造形する
ことができる。As described above, according to the present invention, a simple light-shielding plate assembly using a light-shielding plate is provided between the linear light source and the liquid crystal shutter to be used for curing the photocurable resin. By blocking the light component having the angle component that is not blocked, it is possible to suppress the deterioration of the contrast and the deterioration of the shutter performance due to the temperature rise of the liquid crystal shutter, and it is possible to use a higher output light source, so that the molding time can be shortened. . Further, by adjusting the light-shielding plate assembly, the light source illuminance distribution can be made uniform, and the target three-dimensional model can be accurately modeled.
【図１】 本発明の一実施例を示す概要図。FIG. 1 is a schematic diagram showing an embodiment of the present invention.
【図２】 同じく、光源ユニットの移動機構を示す斜視
図。FIG. 2 is a perspective view showing a moving mechanism of the light source unit.
【図３】 同じく、光源ユニットの拡大断面図。FIG. 3 is an enlarged sectional view of the light source unit.
【図４】 図４（ａ）は、遮光板組立体による光量調整
方法を示すもので、図３の側面からみた説明図。図４
（ｂ）は、図３の正面からみた説明図。4 (a) is an explanatory view showing a light amount adjusting method by a light-shielding plate assembly, viewed from the side of FIG. 3. FIG. FIG.
(B) is explanatory drawing seen from the front of FIG.
【図５】 同じく、遮光板組立体による遮光の効果を示
す測定結果図。FIG. 5 is a measurement result diagram showing the effect of light shielding by the light shielding plate assembly.
【図６】 同じく、遮光体組立体による光源光均一化の
効果を示す測定結果図。FIG. 6 is a measurement result diagram showing the effect of making the light source light uniform by the light shield assembly in the same manner.
１…容器 ２…光硬化性樹脂 ２ａ…硬化樹脂層 ５…液晶シャッタ １０…光源ユニット １１…線状光源 １３…遮光板組立体 １５…等倍結像素子 DESCRIPTION OF SYMBOLS 1 ... Container 2 ... Photocurable resin 2a ... Cured resin layer 5 ... Liquid crystal shutter 10 ... Light source unit 11 ... Linear light source 13 ... Shading plate assembly 15 ... 1x imaging element
Claims (1)
向に走行自在に配置した線状光源からの光線を、光透過
部と遮光部とからなる液晶シャッタ及び該液晶シャッタ
の透過光を光硬化性樹脂面に結像する等倍結像素子を経
て、前記光硬化性樹脂の液面に照射して、目的立体モデ
ルの断面パターンに対応する薄膜の硬化樹脂層を形成
し、この樹脂層を順次積層して立体モデルを形成するよ
うにした光造形装置において、線状光源と液晶シャッタ
との間に、該液晶シャッタに入射する光を遮光によって
選択的に規制する遮光板組立体を装着したことを特徴と
する光造形装置。1. A liquid crystal shutter composed of a light transmitting portion and a light shielding portion, and a transmitted light of a light ray from a linear light source disposed above a liquid photocurable resin so as to run in the width direction. Through an equal-magnification imaging element for forming an image on the photocurable resin surface, and irradiating the liquid surface of the photocurable resin to form a cured resin layer of a thin film corresponding to the cross-sectional pattern of the target three-dimensional model. In a stereolithography apparatus in which resin layers are sequentially laminated to form a three-dimensional model, a shading plate assembly that selectively restricts light incident on the liquid crystal shutter between the linear light source and the liquid crystal shutter by shading A stereolithography device, which is equipped with.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25107194A JP3578176B2 (en) | 1994-10-17 | 1994-10-17 | Stereolithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25107194A JP3578176B2 (en) | 1994-10-17 | 1994-10-17 | Stereolithography |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08112862A true JPH08112862A (en) | 1996-05-07 |
| JP3578176B2 JP3578176B2 (en) | 2004-10-20 |
Family
ID=17217201
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25107194A Expired - Lifetime JP3578176B2 (en) | 1994-10-17 | 1994-10-17 | Stereolithography |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3578176B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007223192A (en) * | 2006-02-24 | 2007-09-06 | Aspect Inc | Apparatus for forming powder sintered laminate and method for forming the same |
| WO2009084550A1 (en) * | 2007-12-27 | 2009-07-09 | Sumitomo Chemical Company, Limited | Light control film manufacturing device and light control film manufacturing method |
| WO2020095453A1 (en) * | 2018-11-09 | 2020-05-14 | 三菱電機株式会社 | Layering/molding device |
| CN114932680A (en) * | 2021-07-08 | 2022-08-23 | 深圳市黑创科技有限公司 | Projection device, photocuring printer and projection method |
| WO2023280233A1 (en) * | 2021-07-08 | 2023-01-12 | 深圳市黑创科技有限公司 | Projection device, stereolithography printer and projection method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101766327B1 (en) * | 2015-07-03 | 2017-08-09 | 진광식 | three-dimensional printer with automatic exposure control |
-
1994
- 1994-10-17 JP JP25107194A patent/JP3578176B2/en not_active Expired - Lifetime
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007223192A (en) * | 2006-02-24 | 2007-09-06 | Aspect Inc | Apparatus for forming powder sintered laminate and method for forming the same |
| WO2009084550A1 (en) * | 2007-12-27 | 2009-07-09 | Sumitomo Chemical Company, Limited | Light control film manufacturing device and light control film manufacturing method |
| JP2009173018A (en) * | 2007-12-27 | 2009-08-06 | Sumitomo Chemical Co Ltd | Light control film manufacturing apparatus and manufacturing method thereof |
| WO2020095453A1 (en) * | 2018-11-09 | 2020-05-14 | 三菱電機株式会社 | Layering/molding device |
| JPWO2020095453A1 (en) * | 2018-11-09 | 2021-04-30 | 三菱電機株式会社 | Laminated modeling equipment |
| CN114932680A (en) * | 2021-07-08 | 2022-08-23 | 深圳市黑创科技有限公司 | Projection device, photocuring printer and projection method |
| WO2023280233A1 (en) * | 2021-07-08 | 2023-01-12 | 深圳市黑创科技有限公司 | Projection device, stereolithography printer and projection method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3578176B2 (en) | 2004-10-20 |
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