JPH08173777A - Reverse osmosis membrane and its surface treating method - Google Patents
Reverse osmosis membrane and its surface treating methodInfo
- Publication number
- JPH08173777A JPH08173777A JP31882094A JP31882094A JPH08173777A JP H08173777 A JPH08173777 A JP H08173777A JP 31882094 A JP31882094 A JP 31882094A JP 31882094 A JP31882094 A JP 31882094A JP H08173777 A JPH08173777 A JP H08173777A
- Authority
- JP
- Japan
- Prior art keywords
- reverse osmosis
- membrane
- osmosis membrane
- irradiation
- ultraviolet rays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012528 membrane Substances 0.000 title claims abstract description 148
- 238000001223 reverse osmosis Methods 0.000 title claims abstract description 60
- 238000000034 method Methods 0.000 title claims abstract description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 41
- 230000035699 permeability Effects 0.000 claims abstract description 29
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 19
- 238000012360 testing method Methods 0.000 claims abstract description 10
- 239000004952 Polyamide Substances 0.000 claims abstract description 8
- 229920002647 polyamide Polymers 0.000 claims abstract description 8
- 239000004760 aramid Substances 0.000 claims abstract description 6
- 229920003235 aromatic polyamide Polymers 0.000 claims abstract description 6
- 229920006037 cross link polymer Polymers 0.000 claims abstract 2
- 238000000926 separation method Methods 0.000 claims description 32
- 239000002131 composite material Substances 0.000 claims description 24
- 239000002346 layers by function Substances 0.000 claims description 20
- 238000001228 spectrum Methods 0.000 claims description 11
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 claims description 9
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 8
- 238000004381 surface treatment Methods 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 239000011780 sodium chloride Substances 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 10
- 150000003839 salts Chemical class 0.000 abstract description 8
- 239000000203 mixture Substances 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 239000007788 liquid Substances 0.000 abstract description 3
- 239000013535 sea water Substances 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 230000009977 dual effect Effects 0.000 abstract 2
- 239000013505 freshwater Substances 0.000 abstract 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 18
- 239000010410 layer Substances 0.000 description 15
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 12
- 229910052753 mercury Inorganic materials 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 238000010612 desalination reaction Methods 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 229910001873 dinitrogen Inorganic materials 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 229920002492 poly(sulfone) Polymers 0.000 description 6
- 239000011148 porous material Substances 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 4
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 4
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 4
- 229920002301 cellulose acetate Polymers 0.000 description 4
- 238000007385 chemical modification Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 229910017053 inorganic salt Inorganic materials 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- 239000005708 Sodium hypochlorite Substances 0.000 description 2
- 229920002125 Sokalan® Polymers 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- UWCPYKQBIPYOLX-UHFFFAOYSA-N benzene-1,3,5-tricarbonyl chloride Chemical compound ClC(=O)C1=CC(C(Cl)=O)=CC(C(Cl)=O)=C1 UWCPYKQBIPYOLX-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- -1 heavy metal ions Chemical class 0.000 description 2
- 239000012510 hollow fiber Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000002372 labelling Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000000108 ultra-filtration Methods 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- OXEZLYIDQPBCBB-UHFFFAOYSA-N 4-(3-piperidin-4-ylpropyl)piperidine Chemical compound C1CNCCC1CCCC1CCNCC1 OXEZLYIDQPBCBB-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 238000012696 Interfacial polycondensation Methods 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 150000004984 aromatic diamines Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- RUOKPLVTMFHRJE-UHFFFAOYSA-N benzene-1,2,3-triamine Chemical compound NC1=CC=CC(N)=C1N RUOKPLVTMFHRJE-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- KUFWTXSQQKDMAI-UHFFFAOYSA-N ethynylsilicon Chemical group [Si]C#C KUFWTXSQQKDMAI-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000008233 hard water Substances 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000001471 micro-filtration Methods 0.000 description 1
- 230000000813 microbial effect Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000000575 pesticide Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920012287 polyphenylene sulfone Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、液状混合物の成分を選
択透過分離するための高性能な逆浸透膜およびその表面
処理方法に関するものである。本発明によって得られる
逆浸透膜は特に海水の淡水化、カン水の脱塩、また半導
体の製造に利用される超純水の製造に用いることができ
る。さらには硬水の軟水化、河川水からの汚染物質の除
去、また染色排水、電着塗料排水などから、そのなかに
含まれる汚染物質あるいは有用物質を選択的に除去ある
いは回収し、ひいては排水のクロ−ズド化に寄与するこ
とができる。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high performance reverse osmosis membrane for selectively permeating and separating the components of a liquid mixture, and a surface treatment method thereof. The reverse osmosis membrane obtained by the present invention can be used particularly for desalination of seawater, desalination of canned water, and production of ultrapure water used for production of semiconductors. Furthermore, softening of hard water, removal of pollutants from river water, and selective removal or recovery of pollutants or useful substances contained therein from dyeing wastewater, electrodeposition paint wastewater, etc. -It can contribute to the conversion.
【0002】[0002]
【従来の技術】従来、工業的に利用されている逆浸透膜
の形態には、非対称膜型と複合膜型がある。2. Description of the Related Art Conventionally, reverse osmosis membranes which have been industrially used include asymmetric membrane type and composite membrane type.
【0003】このうち非対称膜の主たる例として酢酸セ
ルロ−ス膜があった(例えば、米国特許第3、133、
132号明細書、同第3、133、137号明細書)。
しかしこの膜は耐加水分解性、耐微生物性などに問題が
あり、塩排除率、水透過性も十分ではなかった。このた
め、酢酸セルロ−ス非対称膜は一部の用途には使用され
ているが、広範囲の用途に実用化されるには至っていな
い。Of these, a cellulose acetate membrane is a main example of the asymmetric membrane (see, for example, US Pat. No. 3,133,
No. 132, No. 3, 133, 137).
However, this membrane has problems in hydrolysis resistance, microbial resistance, etc., and the salt rejection and water permeability were not sufficient. Therefore, although the cellulose acetate asymmetric membrane is used for some applications, it has not been put to practical use in a wide range of applications.
【0004】これらの欠点を補うべく考案されたのが、
微多孔性支持膜上にこれと異なる素材で実質的に膜分離
機能を司る分離機能層を被覆した複合膜であった。複合
膜では分離機能層と微多孔性支持膜の各々に最適な素材
を選択することが可能であり、製膜技術も種々の方法を
選択できる。It was devised to make up for these drawbacks,
It was a composite membrane in which a separation function layer that substantially controls the membrane separation function was coated on a microporous support membrane with a different material. In the composite membrane, it is possible to select the optimum material for each of the separation functional layer and the microporous support membrane, and various methods can be selected for the membrane formation technology.
【0005】現在市販されている複合膜の大部分は微多
孔性支持膜上にゲル層とポリマーを架橋した活性層を有
するものと、微多孔性支持膜上でモノマーを界面重縮合
した活性層を有するものの2種類である。前者の具体例
としては、特開昭49−13282号公報、特公昭55
−38164号公報、PBレポート80−18209
0、特公昭59−27202号公報、同61−2710
2号公報などがある。後者の具体例としては米国特許第
3,744,942号明細書、同第3,926,798
号明細書、同第4,277,344号明細書、特開昭5
5−147106号公報、同58−24303号公報、
同62−121603号公報などがある。これらの複合
膜は透過性や選択分離性の高い膜として注目されてい
る。近年逆浸透膜と限外濾過膜の中間に位置するル−ス
RO膜が現れ、使用されるようになってきた。ル−スR
O膜は分子量数百〜数千程度以上の中〜高分子量の分子
や、カルシウム、マグネシウムなどの二価イオン、重金
属イオンなどの多価イオンの排除率は高いが、一価のイ
オンや低分子量物質は透過する性質をもった膜である。
また、このル−スRO膜は膜の透過速度が大きく、0.
1%程度の低濃度の水溶液では10atm以下の超低圧
で分離を行なうことができるのも特徴である。しかしな
がら複合膜に対する要求特性は年々高まっており、ル−
スRO膜に関しても、一部市販されているものはある
が、未だに十分満足できる性能の膜は得られていない。
特に低分子量有機物、例えばトリハロメタンやその前駆
物質および農薬などの有毒物質の除去性能に優れた膜、
無機塩類と有機化合物との分離が可能な膜、低圧運転で
かつ高透水性を有する膜など、さらに高性能の膜の開発
が要求されている。Most of the composite membranes currently on the market have an active layer obtained by crosslinking a gel layer and a polymer on a microporous support membrane, and an active layer obtained by interfacial polycondensing monomers on the microporous support membrane. There are two types. Specific examples of the former include Japanese Patent Application Laid-Open No. 49-13282 and Japanese Patent Publication No. 55-55.
No. 38164, PB Report 80-18209
0, Japanese Patent Publication No. 59-27202, 61-2710.
There is No. 2 publication, etc. Specific examples of the latter include US Pat. Nos. 3,744,942 and 3,926,798.
No. 4,277,344, JP-A-5
No. 5-147106, No. 58-24303,
No. 62-121603 is available. These composite membranes are attracting attention as membranes with high permeability and high selective separation. In recent years, a loose RO membrane, which is located between the reverse osmosis membrane and the ultrafiltration membrane, has appeared and has come into use. Loose R
The O film has a high exclusion rate of medium to high molecular weight molecules of several hundred to several thousand or more, divalent ions such as calcium and magnesium, and polyvalent ions such as heavy metal ions, but monovalent ions and low molecular weight. The substance is a membrane that has the property of being permeable.
In addition, this loose RO membrane has a high membrane permeation rate, and is 0.
Another feature is that a low-concentration aqueous solution of about 1% can be separated at an ultralow pressure of 10 atm or less. However, the required properties for composite membranes are increasing year by year, and
Some SRO membranes are also commercially available, but a membrane with sufficiently satisfactory performance has not yet been obtained.
In particular, low molecular weight organic substances, such as trihalomethane and its precursors and membranes with excellent performance in removing toxic substances such as pesticides,
Development of higher performance membranes such as membranes capable of separating inorganic salts and organic compounds and membranes having low water pressure and high water permeability is required.
【0006】一方、分離膜の性能を向上する手法として
光エネルギ−の利用が検討されている。気体分離膜で
は、膜表面に紫外線を照射することにより透過流束およ
び/または分離係数が向上する例がある。その具体例と
してはポリオルガノシロキサン−アセチレン複合膜に関
するもの(特開昭64−67210)、置換シリルアセ
チレン単量体単位からなる重合体の膜に関するもの(特
開昭64−20239)などが開示されている。また精
密濾過膜については、特開平2−59032において、
ポリサルフォン製多孔質膜に紫外線を照射することによ
り、膜表面が親水化され蛋白質の吸着による濾過速度の
急激な低下が抑制された例が挙げられている。しかしな
がら、逆浸透膜に応用した例は今のところ見当たらな
い。On the other hand, utilization of light energy is being studied as a method for improving the performance of the separation membrane. In the gas separation membrane, there is an example in which the permeation flux and / or the separation coefficient are improved by irradiating the surface of the membrane with ultraviolet rays. Specific examples thereof include those relating to a polyorganosiloxane-acetylene composite film (JP-A-64-67210), those relating to a polymer film comprising a substituted silylacetylene monomer unit (JP-A-64-20239), and the like. ing. Regarding the microfiltration membrane, in Japanese Patent Laid-Open No. 2-59032,
By irradiating a polysulfone porous membrane with ultraviolet rays, the surface of the membrane is hydrophilized and a rapid decrease in filtration rate due to adsorption of proteins is suppressed. However, no application to a reverse osmosis membrane has been found so far.
【0007】[0007]
【発明が解決しようとする課題】逆浸透膜の透過性およ
び選択分離性は年々向上している。しかしながら、低分
子量有機物の除去性能、無機塩類と有機化合物との分
離、低圧運転でかつ高透水性を有する膜など、逆浸透膜
と限外濾過膜の中間領域の分離性能を有する分離膜の開
発に関しては今だに十分満足できる性能の膜は得られて
いない。The permeability and selective separability of reverse osmosis membranes are improving year by year. However, the development of separation membranes that have the performance of removing low molecular weight organic substances, the separation of inorganic salts and organic compounds, the membranes that operate at low pressure and have high water permeability, etc., in the intermediate region between the reverse osmosis membrane and the ultrafiltration membrane. With respect to (1), a film with satisfactory performance has not yet been obtained.
【0008】特に0.5MPa程度以下の低圧で運転す
る際に、高い選択分離性と透水性とを両立することは困
難であった。この選択分離性と透水性の制御には非対称
膜、あるいは複合膜の分離機能層を形成するモノマ−の
種類や組成を変更するといった手法が取られてきたが、
この方法では両者のバランスをとることが非常に困難で
あった。すなわち高い透水性を望むと選択分離性が大幅
に低下したり、逆に選択分離性を優先させると透水性が
著しく低下するというように選択分離性と透水性とは相
反する関係にあった。It has been difficult to achieve both high selectivity and water permeability, especially when operating at a low pressure of about 0.5 MPa or less. To control the selective separability and water permeability, a method of changing the kind or composition of the monomer forming the separation functional layer of the asymmetric membrane or the composite membrane has been used.
With this method, it was very difficult to balance the two. That is, there is a contradictory relationship between the selective separability and the water permeability, such that the selective separability is significantly lowered when high water permeability is desired, and conversely the water permeability is remarkably lowered when the selective separability is prioritized.
【0009】本発明は低圧で運転した場合でも、高い選
択分離性と高透水性を発揮する逆浸透膜を提供すること
を目的とする。It is an object of the present invention to provide a reverse osmosis membrane which exhibits high selective separation and high water permeability even when operated at low pressure.
【0010】[0010]
【課題を解決するための手段】上記目的を達成するため
本発明は基本的には下記の構成から成る。To achieve the above object, the present invention basically has the following constitution.
【0011】すなわち、「膜表面を紫外線照射処理した
ことを特徴とする逆浸透膜。」である。That is, "a reverse osmosis membrane characterized in that the membrane surface is subjected to ultraviolet irradiation treatment."
【0012】本発明において、非対称膜とは脱塩性能を
有する緻密層と支持体としての多孔層を有し、緻密層、
多孔層ともに単一素材からなる逆浸透膜である。非対称
膜の素材には主として酢酸セルロ−スが使用される。製
膜方法として例えば、酢酸セルロ−スのホルムアミド溶
液をガラス板状に一定の厚さに流延し、溶媒を蒸発させ
た後、生成した膜を熱水に浸漬し熱処理するという方法
がある。この方法によって得た膜は、溶媒の蒸発面側に
脱塩性能を示す緻密層があり、その下に多数の孔を有し
支持体の役目をする多孔層を有する。In the present invention, the asymmetric membrane has a dense layer having desalination performance and a porous layer as a support,
Both porous layers are reverse osmosis membranes made of a single material. Cellulose acetate is mainly used as the material for the asymmetric membrane. As a film forming method, for example, there is a method in which a formamide solution of cellulose acetate is cast on a glass plate to a certain thickness to evaporate the solvent, and then the formed film is immersed in hot water for heat treatment. The membrane obtained by this method has a dense layer exhibiting desalination performance on the evaporation surface side of the solvent, and a porous layer having a large number of pores and serving as a support under the dense layer.
【0013】また、本発明において複合膜を形成してい
る微多孔性支持膜とは実質的には分離性能を有さない層
であり、実質的に分離性能を有する分離機能層に強度を
与えるために用いられるものである。微多孔性支持膜は
均一な微細な孔あるいは片面に緻密で微細な孔を持ち、
もう一方の面まで徐々に大きな微細な孔をもつ非対称構
造で、その微細孔の大きさはその緻密な片面の表面で1
00nm以下であるような構造が好ましい。また、微多
孔性支持膜の厚みは1μm〜数mmであり、膜強度の面
から10μm以上、扱いやすさモジュール加工のしやす
さの面で数100μm以下が好ましい。これら微多孔性
支持膜は、布あるいは不織布で補強されていても良い。In the present invention, the microporous support membrane forming the composite membrane is a layer having substantially no separation performance, and imparts strength to the separation functional layer having substantially separation performance. It is used for. The microporous support membrane has uniform fine pores or dense and fine pores on one side,
It has an asymmetric structure with gradually increasing fine pores to the other side, and the size of the fine pores is 1 on the dense surface of one side.
A structure having a thickness of 00 nm or less is preferable. The thickness of the microporous support film is 1 μm to several mm, preferably 10 μm or more from the viewpoint of film strength, and several 100 μm or less from the viewpoint of ease of handling and module processing. These microporous support membranes may be reinforced with cloth or non-woven fabric.
【0014】上記の微多孔性支持膜は、例えばミリポア
社製“ミリポアフィルターVSWP”(商品名)や、東
洋ろ紙社製“ウルトラフィルターUK10”(商品名)
のような各種市販材料から選択することもできるが、通
常は、“オフィス・オブ・セイリーン・ウォーター・リ
サーチ・アンド・ディベロップメント・プログレス・レ
ポート”No.359(1968)に記載された方法に従
って製造できる。その微多孔性支持膜の素材にはポリス
ルホン、ポリアミド、ポリエステル、セルロース系ポリ
マ−、ビニルポリマ−、ポリフェニレンスルフィド、ポ
リフェニレンスルフィドスルホン、ポリフェニレンスル
ホン、ポリフェニレンオキシド等のホモポリマーまたは
コポリマーを単独であるいはこれらのポリマーをブレン
ドしたものを使用することができる。これらの素材の中
では化学的、機械的、熱的に安定性が高く、成型が容易
であることからポリスルホンが一般的に使用される。例
えば、ポリスルホンのジメチルホルムアミド(DMF)
溶液を密に織ったポリエステル布あるいは不織布の上に
一定の厚さに注型し、それをドデシル硫酸ソーダ0.5
重量%およびDMF2重量%を含む水溶液中で湿式凝固
させることによって、表面の大部分が直径数十nm以下
の微細な孔を有した微多孔性支持膜が得られる。The above-mentioned microporous support membrane is, for example, "Millipore Filter VSWP" (trade name) manufactured by Millipore, or "Ultra Filter UK10" (trade name) manufactured by Toyo Roshi Kaisha, Ltd.
You can also choose from a variety of commercially available materials, such as "Office of Saline Water Research and Development Progress Report," No. 359 (1968). The material of the microporous support membrane may be a homopolymer or a copolymer of polysulfone, polyamide, polyester, cellulosic polymer, vinyl polymer, polyphenylene sulfide, polyphenylene sulfide sulfone, polyphenylene sulfone, polyphenylene oxide, etc., alone or in combination with these polymers. Blends can be used. Among these materials, polysulfone is generally used because it has high chemical, mechanical and thermal stability and is easy to mold. For example, polysulfone dimethylformamide (DMF)
The solution is cast on a densely woven polyester cloth or non-woven cloth to a certain thickness, and it is poured into sodium dodecyl sulfate 0.5
By wet coagulation in an aqueous solution containing 2% by weight of DMF and 2% by weight of DMF, a microporous support membrane having most of the surface with fine pores having a diameter of several tens nm or less is obtained.
【0015】この微多孔性支持膜に分離機能層を被覆し
て複合膜を製造する。分離機能層とは複合膜の実質的に
分離を行なう部分であり、その素材としては架橋あるい
は線状の有機物のポリマ−を使用することができる。複
合膜が高い分離性能を発現するためには、ポリマ−はポ
リアミド、ポリウレタン、ポリエ−テル、ポリエステ
ル、セルロ−スエステル、ポリイミド、ポリアミック
酸、ビニルポリマ−が好ましく、さらに好ましくはポリ
アミド、とくに架橋ポリアミドが好ましい。The microporous support membrane is coated with a separation functional layer to produce a composite membrane. The separation functional layer is a portion that substantially separates the composite membrane, and as its material, a crosslinked or linear organic polymer can be used. In order for the composite membrane to exhibit high separation performance, the polymer is preferably polyamide, polyurethane, polyether, polyester, cellulose ester, polyimide, polyamic acid, vinyl polymer, more preferably polyamide, especially crosslinked polyamide. .
【0016】かかる架橋ポリアミドとして、特に限定さ
れるものではないが、架橋芳香族ポリアミドが好まし
く、架橋芳香族ポリアミドとしては、芳香族ジアミンと
芳香族トリアミンから選ばれる多官能芳香族アミンと2
官能および/または3官能の多官能芳香族酸ハライドの
反応によって得られる3次元架橋芳香族ポリアミドが好
ましい。The cross-linked polyamide is not particularly limited, but cross-linked aromatic polyamide is preferable, and as the cross-linked aromatic polyamide, a polyfunctional aromatic amine selected from aromatic diamine and aromatic triamine and 2
A three-dimensional crosslinked aromatic polyamide obtained by the reaction of a functional and / or trifunctional polyfunctional aromatic acid halide is preferred.
【0017】機能層の被覆はポリマ−をコ−ティングす
る方法、コ−ティングしたポリマ−をさらに架橋する方
法、モノマ−を微多孔性支持膜の表面で重合する方法、
あるいは微多孔性支持膜の膜面で界面重縮合する方法で
行なうことができる。The functional layer is coated by a method of coating a polymer, a method of further crosslinking the coated polymer, a method of polymerizing a monomer on the surface of a microporous support membrane,
Alternatively, it can be performed by a method of interfacial polycondensation on the surface of the microporous support film.
【0018】分離機能層の厚みは5〜1000nmであ
り、好ましくは10〜800nm、さらに好ましくは5
0〜500nmである。分離機能層の厚みが小さすぎる
と製膜時の欠点の発生が多くなったり取扱い時に傷がつ
きやすくなり、加圧した際にも欠点や傷が発生して排除
率の低下を招く恐れがある。また分離機能層の厚みが大
きすぎると水透過性が低くなり好ましくない。The thickness of the separation functional layer is 5 to 1000 nm, preferably 10 to 800 nm, more preferably 5.
It is 0 to 500 nm. If the thickness of the separation functional layer is too small, many defects will occur during film formation and scratches will be liable to occur during handling, and defects and scratches may occur even when pressure is applied, leading to a reduction in rejection rate. . On the other hand, if the thickness of the separation functional layer is too large, the water permeability becomes low, which is not preferable.
【0019】本発明において逆浸透膜の膜表面のカルボ
キシル基濃度(−COOH/C[tot al] )は0.015
以上、より好ましくは0.018以上、さらに好ましく
は0.020以上である。この値は膜表面に存在してい
る全炭素原子中のカルボキシル基に含まれている炭素の
割合を表している。膜表面の化学組成の分析手法として
X線光電子分光法(ESCA)が採用されている。該分
析法では、X線照射によって放出した光電子の結合エネ
ルギ−を測定する。C1s,O1s,N1sなどの内殻
電子のESCAスペクトルの位置と強度から元素の定性
分析や定量分析が、また化学シフトから結合状態につい
ての情報が得られる。具体的には光電子脱出角度変化法
による試料表面〜100オングストロ−ムでのデプスプ
ロファイリングや、気相化学修飾法を併用した詳細な官
能基分析が可能である。カルボキシル濃度の定量は光電
子脱出角度変化法に気相化学修飾法を併用して測定を行
う。装置としては例えば島津製作所株式会社製ESCA
750を使用し、X線源にMgKα1,2線(125
3.6eV)を用い、光電子脱出角度を90°に設定す
る。中性炭素のC1sピ−ク値を284.6eVとして
エネルギ−補正を行うと、膜の表面組成や原子の結合状
態が分かる。さらに気相化学修飾法によりカルボキシル
基濃度を求めるが、このときカルボキシル基のラベル化
にトリフルオロエタノ−ル(TFE)を、反応の際の脱
水触媒にジシクロヘキシルカルボジイミド(DCC)を
用いる。ポリアクリル酸(PAA)標準試料によりTF
Eの反応率(r)とDCCの残留率(m)を求め、各試
料のC1s,F1sピ−ク面積強度からrとmを考慮し
て、カルボキシル基濃度を得ることができる。本発明に
おける逆浸透膜については、紫外線照射により膜を形成
している分子間あるいは分子内の結合が切断されてカル
ボキシル基などの極性基が生成し、膜表面が親水化され
ていることが考えられる。In the present invention, the carboxyl group concentration (-COOH / C [tot al] ) on the membrane surface of the reverse osmosis membrane is 0.015.
Or more, more preferably 0.018 or more, still more preferably 0.020 or more. This value represents the ratio of carbon contained in the carboxyl group in all carbon atoms existing on the film surface. X-ray photoelectron spectroscopy (ESCA) is adopted as a method of analyzing the chemical composition of the film surface. In this analysis method, the binding energy of photoelectrons emitted by X-ray irradiation is measured. Qualitative and quantitative analyzes of elements can be obtained from the positions and intensities of the ESCA spectra of core electrons such as C 1s , O 1s , and N 1s, and information on the bonding state can be obtained from chemical shifts. Specifically, depth profiling from the sample surface to 100 angstrom by the photoelectron escape angle change method and detailed functional group analysis using the gas phase chemical modification method are possible. The quantitative determination of the carboxyl concentration is performed by using the photoelectron escape angle changing method in combination with the gas phase chemical modification method. As the device, for example, ESCA manufactured by Shimadzu Corporation
750 is used, and the X-ray source is MgKα1,2 rays (125
3.6 eV) and set the photoelectron escape angle to 90 °. When the energy correction is performed with the C 1s peak value of neutral carbon being 284.6 eV, the surface composition of the film and the bonding state of atoms can be found. Further, the concentration of the carboxyl group is determined by the gas phase chemical modification method. At this time, trifluoroethanol (TFE) is used for labeling the carboxyl group, and dicyclohexylcarbodiimide (DCC) is used as the dehydration catalyst during the reaction. TF by polyacrylic acid (PAA) standard sample
The reaction rate (r) of E and the residual rate (m) of DCC are obtained, and the carboxyl group concentration can be obtained from the C 1s and F 1s peak area intensities of the respective samples in consideration of r and m. Regarding the reverse osmosis membrane in the present invention, it is considered that the intermolecular or intramolecular bond forming the membrane is cleaved by ultraviolet irradiation to generate a polar group such as a carboxyl group, and the membrane surface is hydrophilized. To be
【0020】分離機能層が架橋ポリアミドからなる逆浸
透膜を紫外線照射処理した後、0.05重量%食塩水を
使用して圧力0.34MPa、温度25℃の条件で逆浸
透テストしたとき、水の透過性は0.4m3/m2・日
以上、好ましくは0.7m3/m2・日以上、より好ま
しくは1.5m3/m2・日以上である。さらに分離機
能層が架橋芳香族ポリアミドからなる逆浸透膜について
は、紫外線照射後、0.15重量%食塩水を使用して圧
力1.47MPa、温度25℃の条件で逆浸透テストし
たとき、水の透過性は1m3/m2・日以上、好ましく
は1.5m3/m2・日以上、さらに好ましくは2m3
/m2・日以上である。紫外線照射処理後の分離機能層
の架橋部分の分解とカルボキシル基のような親水性基の
増加とともに、水の透過性も高くなることが考えられ
る。したがって、紫外線照射処理後のカルボキシル基濃
度と水の透過性の相関から、カルボキシル基濃度を水の
透過性の指標として用い、紫外線照射条件を選定するこ
とができる可能性がある。A reverse osmosis membrane having a separation functional layer made of crosslinked polyamide was subjected to ultraviolet irradiation treatment and then subjected to a reverse osmosis test using 0.05% by weight saline at a pressure of 0.34 MPa and a temperature of 25 ° C. Has a permeability of 0.4 m 3 / m 2 · day or more, preferably 0.7 m 3 / m 2 · day or more, more preferably 1.5 m 3 / m 2 · day or more. Further, regarding the reverse osmosis membrane whose separation functional layer is composed of cross-linked aromatic polyamide, when the reverse osmosis test is conducted under the conditions of pressure of 1.47 MPa and temperature of 25 ° C. using 0.15 wt% saline solution after irradiation with ultraviolet rays, Has a permeability of 1 m 3 / m 2 · day or more, preferably 1.5 m 3 / m 2 · day or more, more preferably 2 m 3
/ M 2 · day or more. It is conceivable that the permeability of water will increase with the decomposition of the cross-linked portion of the separation functional layer after the ultraviolet irradiation treatment and the increase of hydrophilic groups such as carboxyl groups. Therefore, from the correlation between the carboxyl group concentration after the UV irradiation treatment and the water permeability, it is possible to select the UV irradiation condition by using the carboxyl group concentration as an index of the water permeability.
【0021】本発明においては、逆浸透膜の表面に紫外
線を照射する。照射する面は脱塩性能を有する側であ
り、例えば、非対称膜では緻密層側、複合膜では分離機
能層側である。In the present invention, the surface of the reverse osmosis membrane is irradiated with ultraviolet rays. The surface to be irradiated is a side having desalination performance, for example, a dense layer side in an asymmetric membrane and a separation functional layer side in a composite membrane.
【0022】紫外線の波長は10〜400nm、好まし
くは100〜365nm、さらに好ましくは160〜2
60nmである。一般に紫外線も含めて電磁放射線の光
子エネルギ−は波長λに反比例するので、紫外線の光子
エネルギ−は短波長側ほど強く、長波長側では弱い。さ
らに長波長側ほど光の熱エネルギ−の影響で膜が乾燥し
水透過性が低下する。また、波長が短かすぎると、効率
のよい光源が入手し難くなる。使用する光源ランプ種類
には、低圧、高圧、超高圧水銀ランプおよびエキシマラ
ンプなどがある。水銀ランプは100〜300nm程度
の波長範囲を持つ光を発し、その範囲中に1〜数本の特
に強い線スペクトルを有するもので、低圧水銀ランプは
184.9nmと253.7nmに、高圧水銀ランプは
365〜579nmに、超高圧水銀灯は365、40
5、436nmに強い線スペクトルを持っている。これ
に対し、エキシマランプは比較的挟帯域のスペクトルが
高効率で得られ、使用する放電ガスの種類を選択するこ
とによって任意にスペクトルの波長を選ぶことができ
る。高圧水銀ランプ、超高圧水銀ランプは可視領域にも
線スペクトルを有するため、照射する際に発熱が大きく
膜が乾燥する恐れがある。したがって、比較的短波長側
に線スペクトルを持つ低圧水銀ランプ、あるいは172
nmにスペクトルを有するキセノンエキシマランプを使
用することが好ましいが、本発明の表面処理方法はこれ
らの光源で限定されるものではない。The wavelength of ultraviolet rays is 10 to 400 nm, preferably 100 to 365 nm, more preferably 160 to 2 nm.
It is 60 nm. In general, the photon energy of electromagnetic radiation including ultraviolet rays is inversely proportional to the wavelength λ, so that the photon energy of ultraviolet rays is stronger on the shorter wavelength side and weaker on the longer wavelength side. Further, the longer the wavelength side is, the more the film dries due to the influence of the heat energy of light and the water permeability decreases. Further, if the wavelength is too short, it becomes difficult to obtain an efficient light source. The types of light source lamps used include low pressure, high pressure, ultra high pressure mercury lamps and excimer lamps. A mercury lamp emits light having a wavelength range of about 100 to 300 nm, and has a particularly strong line spectrum of one to a few lines in the range. A low pressure mercury lamp has a high pressure mercury lamp at 184.9 nm and 253.7 nm. Is 365-579 nm, and ultra-high pressure mercury lamps are 365, 40 nm.
It has a strong line spectrum at 5,436 nm. On the other hand, the excimer lamp can obtain a spectrum in a relatively narrow band with high efficiency, and the wavelength of the spectrum can be arbitrarily selected by selecting the type of discharge gas to be used. Since the high-pressure mercury lamp and the ultra-high-pressure mercury lamp have a line spectrum even in the visible region, they generate a large amount of heat during irradiation and may cause the film to dry. Therefore, a low-pressure mercury lamp having a line spectrum on the relatively short wavelength side, or 172
It is preferable to use a xenon excimer lamp having a spectrum in nm, but the surface treatment method of the present invention is not limited to these light sources.
【0023】紫外線の照射時間t(sec)と光源から
膜表面までの距離l(cm)の二乗の関係A(sec/
cm2)=t/l2は0.001≦A≦500000、
好ましくは0.01≦A≦10000、より好ましくは
1≦A≦100である。光の強度は照射距離の二乗に反
比例するため、照射距離が長いと紫外線の光子エネルギ
−が減衰し照射処理に長時間を要する。また照射距離が
短い場合、長時間の紫外線照射を行なうと、緻密層ある
いは分離機能層を形成しているポリマ−が分解し、その
結果膜の塩や有機物の排除率が著しく低下する。このよ
うに照射時間と照射距離には相関関係があるため、最適
なA=t/l2の値を与える時間と距離の条件を選択す
る必要がある。例えば、光源からの距離2cm(=
l)、照射時間100秒(=t)で紫外線を照射した場
合、A=25となる。Aの値が大きすぎると膜の排除率
が小さくなり、Aの値が小さすぎると水の透過性が充分
でない。A relation A (sec / sec) of the square of the irradiation time t (sec) of the ultraviolet ray and the distance 1 (cm) from the light source to the film surface.
cm 2 ) = t / l 2 is 0.001 ≦ A ≦ 500,000,
It is preferably 0.01 ≦ A ≦ 10000, and more preferably 1 ≦ A ≦ 100. Since the intensity of light is inversely proportional to the square of the irradiation distance, if the irradiation distance is long, the photon energy of ultraviolet rays is attenuated and the irradiation process takes a long time. Further, when the irradiation distance is short, when the ultraviolet irradiation is carried out for a long time, the polymer forming the dense layer or the separation functional layer is decomposed, and as a result, the rejection rate of salts and organic substances in the membrane is remarkably lowered. Since there is a correlation between the irradiation time and the irradiation distance in this way, it is necessary to select the conditions of time and distance that give the optimum value of A = t / l 2 . For example, the distance from the light source is 2 cm (=
l), when the ultraviolet ray is irradiated with the irradiation time of 100 seconds (= t), A = 25. When the value of A is too large, the rejection rate of the membrane becomes small, and when the value of A is too small, the water permeability is insufficient.
【0024】逆浸透膜表面の紫外線照射量(紫外線照度
×時間)は、波長184nm、254nmに強い線スペ
クトルをもち電力が220Wである線状光源を反射板を
取り付けて使用する場合に、紫外線の照射時間と光源か
ら膜表面までの距離をAの値が0.001≦A≦500
000となるように設定した条件での紫外線照射量と同
等であることが好ましい。ただし、これは、光源が何等
限定されるものではなく、あくまで、紫外線照射量の好
ましい範囲を示すために例示したまでである。従って、
同じ紫外線照射量が得られるのなら、異なる波長の線ス
ペクトルや電力ワット数を有する光源や、その他点状や
面状光源、反射板無し等といった光源の条件が変わって
も紫外線照射量が同等の範囲に収まるのならば、この場
合、何ら影響されないものである。The UV irradiation amount (UV illuminance × time) on the surface of the reverse osmosis membrane is the same as that of a UV light when a linear light source having a strong line spectrum at wavelengths of 184 nm and 254 nm and an electric power of 220 W is attached to a reflecting plate. As for the irradiation time and the distance from the light source to the film surface, the value of A is 0.001 ≦ A ≦ 500.
It is preferable that the irradiation amount is equal to the ultraviolet irradiation amount under the condition set to be 000. However, this is not intended to limit the light source in any way, and is merely an example to show a preferable range of the ultraviolet irradiation amount. Therefore,
If the same UV irradiation dose can be obtained, the UV irradiation dose will be the same even if the light source conditions such as line spectra of different wavelengths or power wattages or other point or surface light sources or no reflector are changed. If it falls within the range, it is not affected in this case.
【0025】より好ましくは同じ光源の条件で換算して
0.01≦A≦10000、さらに好ましくは1≦A≦
100となるように照射条件を設定した場合の紫外線照
射量と同等である。紫外線照射量は逆浸透膜の性能が変
化するのに必要な紫外線露光量の単位であり、例えば、
紫外線照度(mW/cm2)×照射時間(sec)=紫
外線照射量(mJ)のような関係がある。したがってあ
る目的とする性能の逆浸透膜を得るのに要する紫外線照
射量が予め分っていれば、光源の電力や形状に関係なく
照射条件を決定できるものと考えられる。一例として、
図1、2にセン特殊光源株式会社製紫外線照射実験装置
(PL11−1102WS)の光源の低圧水銀灯部分と
装置全体の模式図を示した。該装置は110Wの線状光
源を2灯有しており、光源の上面には反射板が貼られて
いる。線状光源には直管型、U字型、環状型などがある
が、該装置の光源はU字型である。More preferably, it is 0.01 ≦ A ≦ 10000, more preferably 1 ≦ A ≦, calculated under the same light source conditions.
This is equivalent to the ultraviolet irradiation amount when the irradiation condition is set to 100. The ultraviolet irradiation amount is a unit of the ultraviolet exposure amount required to change the performance of the reverse osmosis membrane, and for example,
Ultraviolet illuminance (mW / cm 2 ) × irradiation time (sec) = UV irradiation amount (mJ). Therefore, it is considered that the irradiation conditions can be determined irrespective of the power and shape of the light source if the amount of UV irradiation required to obtain a reverse osmosis membrane having a certain desired performance is known in advance. As an example,
1 and 2 are schematic diagrams of a low pressure mercury lamp part of a light source of an ultraviolet irradiation experimental device (PL11-1102WS) manufactured by Sen Special Light Source Co., Ltd. and the entire device. The device has two 110 W linear light sources, and a reflector is attached to the upper surface of the light source. The linear light source includes a straight tube type, a U-shaped type, an annular type and the like, but the light source of the device is a U-shaped type.
【0026】紫外線の光源ランプの電力は1〜3000
W、好ましくは10〜500W、より好ましくは20〜
300Wである。ランプ出力が小さすぎると光の強度も
弱くなるため、照射に長時間を要するが、逆に出力が大
きすぎるとランプからの発熱も大きくなり、膜が乾燥し
水透過性が低下する。The power of the ultraviolet light source lamp is 1 to 3000
W, preferably 10 to 500 W, more preferably 20 to
It is 300W. If the lamp output is too low, the intensity of light will be weak, and thus irradiation will take a long time. On the contrary, if the output is too high, the heat generated from the lamp will be large, and the film will dry and the water permeability will decrease.
【0027】紫外線を照射する際の雰囲気温度は10〜
60℃、好ましくは15〜40℃、より好ましくは20
〜30℃である。雰囲気温度が高すぎると、照射の際に
膜が熱収縮し緻密層あるいは分離機能層の表面が閉塞し
て水の透過性が低下する。使用する光源ランプの出力が
大きかったり照射時間が長時間に及んだりする場合は、
照射中に系内の温度がしだいに上昇するため必要に応じ
てコ−ルドミラ−やコ−ルドフィルタ−、エア−ブロ−
などの冷却装置を設置し、温度上昇を抑制することが好
ましい。The ambient temperature when irradiating with ultraviolet rays is 10 to 10.
60 ° C, preferably 15-40 ° C, more preferably 20
~ 30 ° C. If the ambient temperature is too high, the membrane undergoes heat shrinkage during irradiation, and the surface of the dense layer or the separation functional layer is blocked, resulting in a decrease in water permeability. If the output of the light source lamp used is large or the irradiation time is long,
The temperature in the system rises gradually during irradiation, so a cold mirror, cold filter, air blower, etc. can be used as necessary.
It is preferable to install a cooling device such as to suppress the temperature rise.
【0028】紫外線を照射する際の雰囲気は酸素濃度が
≦20%であることが好ましく、雰囲気が不活性ガスで
あればさらに好ましい。不活性ガスとしては窒素、ヘリ
ウム、アルゴンなどがあげられるが、入手のしやすさ、
価格などの点から窒素が好ましい。酸素は短波長紫外線
を吸収しオゾンを生成する。オゾンはさらに紫外線を吸
収し、励起状態の酸素原子を生成する。この反応は光源
として低圧水銀ランプを使用した場合、式(4)で表さ
れる。本発明における逆浸透膜の紫外線照射処理の反応
機構は今のところ明確ではないが、光エネルギ−による
化学結合の生成・切断とこの原子状酸素の酸化作用によ
るものと考えられる。これらの作用により緻密層あるい
は分離機能層の架橋密度や膜表面の荷電状態が変化し、
その結果、塩の透過性や水透過性が変化するものと考え
られる。照射雰囲気はこの原子状酸素の酸化作用を妨げ
ないために、脱酸素雰囲気中で紫外線照射処理を行なう
のが効率がよいと考えられる。The atmosphere for irradiation with ultraviolet rays preferably has an oxygen concentration of ≤20%, and more preferably an inert gas. Examples of the inert gas include nitrogen, helium, argon, etc., which are easily available.
Nitrogen is preferable in terms of price. Oxygen absorbs short wavelength ultraviolet rays and produces ozone. Ozone further absorbs ultraviolet rays and produces excited oxygen atoms. This reaction is represented by formula (4) when a low-pressure mercury lamp is used as a light source. The reaction mechanism of the ultraviolet irradiation treatment of the reverse osmosis membrane in the present invention is not clear so far, but it is considered to be due to the generation / breakage of a chemical bond by light energy and the oxidizing action of this atomic oxygen. Due to these effects, the crosslink density of the dense layer or the separation functional layer and the charge state of the membrane surface change,
As a result, it is considered that salt permeability and water permeability change. Since the irradiation atmosphere does not interfere with the oxidizing action of atomic oxygen, it is considered efficient to perform the ultraviolet irradiation treatment in a deoxygenated atmosphere.
【0029】 O2 185nm >O3 254nm >O2+O(1D)励起酸素原子 (4) 紫外線照射の前に、照射する膜表面は蒸留水等で洗浄し
てもよい。その後膜面に水分が存在した状態で照射処理
を行なっても、また、窒素ガスやエアガンなどで膜表面
の水分を除去した後に紫外線を照射してもよい。膜表面
に水が存在したままで紫外線を照射すると、水分を除去
した状態で照射した場合よりも、紫外線の影響は緩和さ
れ膜の性能変化は小さくなる。O 2 185 nm > O 3 254 nm > O 2 + O ( 1 D) excited oxygen atom (4) Before ultraviolet irradiation, the surface of the film to be irradiated may be washed with distilled water or the like. After that, the irradiation treatment may be carried out in the presence of moisture on the film surface, or the moisture may be removed from the film surface by nitrogen gas, an air gun or the like, and then the film may be irradiated with ultraviolet rays. When ultraviolet rays are irradiated with water on the surface of the film, the effect of ultraviolet rays is lessened and the change in the performance of the film is smaller than that in the case of irradiation with water removed.
【0030】紫外線で照射処理した後に、膜表面を蒸留
水などで洗浄してもよく、また、50℃〜95℃程度の
温水での洗浄あるいは熱処理を施すことにより処理を終
了してもよい。After the irradiation treatment with ultraviolet rays, the surface of the membrane may be washed with distilled water or the like, or the treatment may be terminated by washing with warm water of about 50 ° C. to 95 ° C. or heat treatment.
【0031】以上に照射条件を挙げたが、被照射物であ
る逆浸透膜の膜素材や使用する光源ランプの出力および
波長に応じて最適な照射時間や光源から膜表面までの距
離などの条件を選択する必要がある。The irradiation conditions have been described above. Conditions such as the optimum irradiation time and the distance from the light source to the film surface are determined according to the film material of the reverse osmosis film that is the object to be irradiated and the output and wavelength of the light source lamp used. Must be selected.
【0032】プラズマ放電処理に代表されるように表面
処理は複雑な装置、真空下での処理など処理操作が複雑
であり工業的生産に導入するのは困難であったが、本発
明における紫外線による膜の表面処理は常圧下において
行なうものであり、処理装置、処理工程も非常に簡便な
ものである。The surface treatment represented by the plasma discharge treatment is complicated and the treatment operation such as the treatment under vacuum is complicated and it is difficult to introduce it into the industrial production. The surface treatment of the membrane is carried out under normal pressure, and the treatment equipment and treatment steps are very simple.
【0033】本発明における逆浸透膜の形態は平膜で
も、中空糸でも構わない。また、得られた逆浸透膜は平
膜はスパイラル、チューブラー、プレート・アンド・フ
レームのモジュールに組み込んで、また中空糸は束ねた
上でモジュールに組み込んで使用することができるが、
本発明はこれらの膜の使用形態に左右されるものではな
い。The form of the reverse osmosis membrane in the present invention may be a flat membrane or a hollow fiber. The obtained reverse osmosis membrane can be used by incorporating a flat membrane into a spiral, tubular, or plate-and-frame module, or by bundling hollow fibers into a module and then incorporating them.
The present invention does not depend on the usage of these membranes.
【0034】本発明における逆浸透膜は低圧運転で高い
透水性が要求される用途に最適である。しかしながら、
本発明はこのような用途に限定されるものではない。The reverse osmosis membrane of the present invention is most suitable for applications requiring high water permeability at low pressure operation. However,
The present invention is not limited to such use.
【0035】[0035]
【実施例】以下に実施例により本発明を具体的に説明す
るが本発明は、これらに限定されるものではない。EXAMPLES The present invention will be described in detail below with reference to examples, but the present invention is not limited thereto.
【0036】なお、実施例において逆浸透膜の性能につ
いては、選択分離性能として無機塩(主として食塩)の
濃度を電気伝導度の測定によって決定した後、次式から
脱塩率を求めた。Regarding the performance of the reverse osmosis membrane in the examples, the concentration of the inorganic salt (mainly salt) was determined as the selective separation performance by measuring the electric conductivity, and then the desalination rate was calculated from the following equation.
【0037】脱塩率=(1−透過液の無機塩濃度/供給
液の無機塩濃度)×100[%] また、透過性能としての造水量は、単位面積、単位時間
当たりの水の透過量で決定した。Desalination ratio = (1-concentration of inorganic salt in permeate / concentration of inorganic salt in supply liquid) × 100 [%] Further, the amount of water produced as permeation performance is the amount of water permeation per unit area and unit time. Decided.
【0038】参考例1 タテ30cm、ヨコ20cmの大きさのポリエステル繊維か
らなるタフタ(タテ糸、ヨコ糸友150デニ−ルのマル
チフィラメント糸、織密度タテ90本/インチ、ヨコ6
7本/インチ、厚さ160μ)をガラス板上に固定し、
その上にポリスルホン(アモコ社製のUdel P−3
500)の15重量%ジメチルホルムアミド(DMF)
溶液を200μの厚みで室温(20℃)でキャストし、
ただちに純水中に浸漬して5分間放置することによって
繊維補強ポリスルホン支持膜(以下FR−PS支持膜と
略す)を作製する。このようにして得られたFR−PS
支持膜(厚さ210〜215μ)の純水透過係数は圧力
1kg/cm2 、温度25℃で測定して0.005〜0.
01g/cm2 ・sec・atmであつた。Reference Example 1 Taffeta (vertical yarn, multifilament yarn of 150 denier weft weft friend, length of 30 cm, weft of 20 cm), weft density 90 yarns / inch, weft 6
7 pieces / inch, thickness 160μ) is fixed on the glass plate,
Polysulfone (Udel P-3 manufactured by Amoco Co., Ltd.
500) 15% by weight of dimethylformamide (DMF)
Cast the solution at a thickness of 200μ at room temperature (20 ° C),
Immediately, it is immersed in pure water and left for 5 minutes to prepare a fiber-reinforced polysulfone support membrane (hereinafter abbreviated as FR-PS support membrane). FR-PS thus obtained
The pure water permeation coefficient of the support membrane (thickness 210 to 215μ) was 0.005 to 0.0.5 when measured at a pressure of 1 kg / cm 2 and a temperature of 25 ° C.
It was 01 g / cm 2 · sec · atm.
【0039】参考例2 参考例1によって得られたFR−PS支持膜をメタフェ
ニレンジアミン1.34重量%、トリアミノベンゼン
0.66重量%を含有する水溶液に1分間浸漬した。F
R−PS支持膜表面から余分な該水溶液を取り除いた
後、該膜にn−デカンにトリメシン酸クロライド0.0
675重量%、テレフタル酸クロライド0.0825重
量%を溶解した溶液を表面が完全に濡れるようにコ−テ
ィングして1分間静置した後、膜を垂直にして液切り
し、さらに風速10〜15m/s、温度30〜35℃の
風を当て余分な該溶液を除去した。次に該膜を洗浄した
後、pH7の次亜塩素酸ナトリウム水溶液に2分間浸漬
した。Reference Example 2 The FR-PS support film obtained in Reference Example 1 was immersed in an aqueous solution containing 1.34% by weight of metaphenylenediamine and 0.66% by weight of triaminobenzene for 1 minute. F
After removing the excess aqueous solution from the surface of the R-PS support membrane, the membrane was coated with n-decane and trimesic acid chloride 0.0.
A solution in which 675% by weight and 0.0825% by weight of terephthaloyl chloride were coated was coated so that the surface was completely wet and allowed to stand for 1 minute, then the membrane was made vertical and drained, and the wind speed was 10 to 15 m. / S, a temperature of 30 to 35 ° C was applied to remove excess solution. Next, the membrane was washed and then immersed in a sodium hypochlorite aqueous solution having a pH of 7 for 2 minutes.
【0040】実施例1〜4および比較例1 参考例2で得られた複合逆浸透膜に、UVサ−フェスプ
ロセッサ−PC11−1102WS(セン特殊光源製、
110W×2灯)を使用し、温度25℃、窒素ガス中で
中心波長185nm、254nmの紫外線を光源からの
距離5cmで照射した。このようにして得られた複合膜
を0.15重量%食塩水を使用して、圧力1.47MP
a、温度25℃の条件下で逆浸透テストした結果、照射
時間に応じて表1に示したような性能の膜が得られた。Examples 1 to 4 and Comparative Example 1 The composite reverse osmosis membrane obtained in Reference Example 2 was coated with UV surface processor PC11-1102WS (made by Sen Special Light Source,
(110 W × 2 lamps) was used, and ultraviolet rays having central wavelengths of 185 nm and 254 nm were irradiated at a temperature of 25 ° C. in nitrogen gas at a distance of 5 cm from the light source. The composite membrane thus obtained was treated with 0.15% by weight saline to a pressure of 1.47MP.
As a result of a reverse osmosis test under the conditions of a and a temperature of 25 ° C., a film having the performance shown in Table 1 was obtained depending on the irradiation time.
【0041】参考例3 参考例1によって得られたFR−PS支持膜をピペラジ
ン1.0重量%、1,3−ビス(4−ピペリジル)プロ
パン0.2重量%を含有する水溶液に1分間浸漬した。
FR−PS支持膜表面から余分な該水溶液を取り除いた
後、80℃の熱風乾燥機で1分間乾燥した。該膜に1,1,
2-トリクロロ-1,2,2,-トリフルオロエタンにトリメシン
酸クロライド0.90重量%を溶解した溶液を表面が完
全に濡れるようにコ−ティングして1分間静置した後、
膜を垂直にして液切りし余分な該溶液を除去した。次に
該膜を洗浄した後、pH6の次亜塩素酸ナトリウム水溶
液に2分間浸漬した。Reference Example 3 The FR-PS support membrane obtained in Reference Example 1 was immersed in an aqueous solution containing 1.0% by weight of piperazine and 0.2% by weight of 1,3-bis (4-piperidyl) propane for 1 minute. did.
After the excess aqueous solution was removed from the surface of the FR-PS support film, it was dried with a hot air dryer at 80 ° C for 1 minute. 1,1,
After coating a solution prepared by dissolving 0.90% by weight of trimesic acid chloride in 2-trichloro-1,2,2, -trifluoroethane and coating the solution so that the surface was completely wet, and leaving it for 1 minute,
The membrane was made vertical and drained to remove the excess solution. Next, the membrane was washed and then immersed in a sodium hypochlorite aqueous solution having a pH of 6 for 2 minutes.
【0042】実施例5〜7よび比較例2 参考例3で得られた複合逆浸透膜に、UVサ−フェスプ
ロセッサ−PC11−1102WS(セン特殊光源製、
110W×2灯)を使用し、温度25℃、窒素ガス中で
中心波長185nm、254nmの紫外線を光源からの
距離5cmで照射した。このようにして得られた紫外線
照射膜を0.05重量%食塩水を使用して、圧力0.3
4MPa、温度25℃の条件下で逆浸透テストした結
果、照射時間に応じて表1に示したような性能の膜が得
られた。Examples 5 to 7 and Comparative Example 2 The composite reverse osmosis membrane obtained in Reference Example 3 was coated with UV surface processor PC11-1102WS (made by Sen Special Light Source,
(110 W × 2 lamps) was used, and ultraviolet rays having central wavelengths of 185 nm and 254 nm were irradiated at a temperature of 25 ° C. in nitrogen gas at a distance of 5 cm from the light source. The ultraviolet irradiation film thus obtained was adjusted to a pressure of 0.3 by using 0.05 wt% saline.
As a result of a reverse osmosis test under the conditions of 4 MPa and a temperature of 25 ° C., a film having the performance as shown in Table 1 was obtained according to the irradiation time.
【0043】[0043]
【表1】 実施例8〜10および比較例3 実施例5〜7と同様の方法で処理した紫外線照射膜を
0.05重量%塩化マグネシウム、0.1重量%硫酸ナ
トリウム、0.1重量%硫酸マグネシウム水溶液を使用
して圧力0.34MPa、温度25℃の条件下で逆浸透
テストした結果、表2に示したような性能が得られた。[Table 1] Examples 8 to 10 and Comparative Example 3 An ultraviolet irradiation film treated in the same manner as in Examples 5 to 7 was treated with 0.05 wt% magnesium chloride, 0.1 wt% sodium sulfate and 0.1 wt% magnesium sulfate aqueous solution. As a result of performing reverse osmosis test under conditions of a pressure of 0.34 MPa and a temperature of 25 ° C., the performance as shown in Table 2 was obtained.
【0044】[0044]
【表2】 実施例11〜15および比較例4 参考例2と同様の方法で得た複合逆浸透膜に、UVサ−
フェスプロセッサ−PC11−1102WS(セン特殊
光源製、110W×2灯)を使用し、温度25℃、窒素
ガス中で波長185nm、254nmの紫外線を80秒
間照射した。このようにして得られた紫外線照射膜を
0.15重量%食塩水を使用して、圧力1.47MP
a、温度25℃の条件下で逆浸透テストした結果、照射
距離に応じて表3に示したような性能の膜が得られた。[Table 2] Examples 11 to 15 and Comparative Example 4 The composite reverse osmosis membrane obtained by the same method as in Reference Example 2 was UV-coated.
Using Fes Processor-PC11-1102WS (made by Sen Special Light Source, 110 W × 2 lamps), ultraviolet rays with wavelengths of 185 nm and 254 nm were irradiated for 80 seconds in nitrogen gas at a temperature of 25 ° C. The ultraviolet irradiation film thus obtained was washed with 0.15% by weight of saline solution at a pressure of 1.47MP.
As a result of reverse osmosis test under the conditions of a and temperature of 25 ° C., a film having performance as shown in Table 3 was obtained according to irradiation distance.
【0045】実施例16〜20 参考例3と同様の方法で得た複合逆浸透膜に、UVサ−
フェスプロセッサ−PC11−1102WS(セン特殊
光源製、110W×2灯)を使用し、温度25℃、窒素
ガス中で波長185nm、254nmの紫外線を60秒
間照射した。このようにして得られた紫外線照射膜を
0.05重量%食塩水を使用して、圧力0.34MP
a、温度25℃の条件下で逆浸透テストした結果、照射
距離に応じて表3に示したような性能の膜が得られた。Examples 16 to 20 A composite reverse osmosis membrane obtained by the same method as in Reference Example 3 was UV-coated.
Fes Processor-PC11-1102WS (made by Sen Special Light Source, 110 W × 2 lamps) was used and irradiated with ultraviolet rays having wavelengths of 185 nm and 254 nm for 60 seconds in nitrogen gas at a temperature of 25 ° C. The ultraviolet irradiation film thus obtained was used with 0.05 wt% saline, and the pressure was 0.34MP.
As a result of reverse osmosis test under the conditions of a and temperature of 25 ° C., a film having performance as shown in Table 3 was obtained according to irradiation distance.
【0046】[0046]
【表3】 実施例21〜25 参考例2と同様の方法で得た複合逆浸透膜に、ウシオ電
機社製エキシマ光照射装置UER20−172(172
nm単一波長、20W)およびUER20−222(2
22nm単一波長、20W)を使用し、温度25℃、窒
素ガス中で光源からの距離3cmで紫外線を照射した。
このようにして得られた紫外線照射膜を0.15重量%
食塩水を使用して、圧力1.47MPa、温度25℃の
条件下で逆浸透テストした結果、照射時間に応じて表4
に示したような性能の膜が得られた。[Table 3] Examples 21 to 25 On a composite reverse osmosis membrane obtained by the same method as in Reference Example 2, an excimer light irradiation device UER20-172 (172) manufactured by Ushio Inc.
nm single wavelength, 20 W) and UER20-222 (2
A single wavelength of 22 nm, 20 W) was used, and the ultraviolet rays were irradiated at a temperature of 25 ° C. in a nitrogen gas at a distance of 3 cm from the light source.
The ultraviolet irradiation film thus obtained was added in an amount of 0.15% by weight.
As a result of reverse osmosis test using saline solution under the conditions of pressure of 1.47 MPa and temperature of 25 ° C., the results are shown in Table 4 according to irradiation time.
A film having the performance as shown in was obtained.
【0047】[0047]
【表4】 実施例26および比較例6 参考例2で得た複合逆浸透膜と実施例11の紫外線照射
膜について、気相化学修飾法によるカルボキシル基濃度
の定量を行なった。カルボキシル基のラベル化にTFE
を、反応の際の脱水触媒にDCCを用いた。ポリアクリ
ル酸(PAA)標準試料によりTFEの反応率(r)と
DCCの残留率(m)を求め(r=1.0,m=0.1
8)、各試料のC1s,F1sピ−ク面積強度からrと
mを考慮して、カルボキシル基濃度を算出した。その結
果、表7に示したように紫外線照射後、半透性膜表面の
カルボキシル基濃度が増加していることが分かった。[Table 4] Example 26 and Comparative Example 6 The carboxyl group concentration of the composite reverse osmosis membrane obtained in Reference Example 2 and the ultraviolet irradiation membrane of Example 11 was quantified by the gas phase chemical modification method. TFE for labeling carboxyl groups
Was used as a dehydration catalyst in the reaction. The reaction rate (r) of TFE and the residual rate (m) of DCC were determined using a polyacrylic acid (PAA) standard sample (r = 1.0, m = 0.1).
8), the carboxyl group concentration was calculated from the C 1s and F 1s peak area intensities of each sample in consideration of r and m. As a result, as shown in Table 7, it was found that the concentration of carboxyl groups on the surface of the semipermeable membrane increased after the irradiation of ultraviolet rays.
【0048】実施例27および比較例7 参考例3で得た複合逆浸透膜と実施例17の紫外線照射
膜について、実施例26および比較例6と同様の方法で
カルボキシル基濃度の定量を行なった。その結果、表5
に示したように紫外線照射後、半透性膜表面のカルボキ
シル基濃度が増加していることが分かった。Example 27 and Comparative Example 7 For the composite reverse osmosis membrane obtained in Reference Example 3 and the ultraviolet irradiation membrane in Example 17, the carboxyl group concentration was quantified in the same manner as in Example 26 and Comparative Example 6. . As a result, Table 5
As shown in, it was found that the concentration of carboxyl groups on the surface of the semipermeable membrane increased after ultraviolet irradiation.
【0049】[0049]
【表5】 [Table 5]
【0050】[0050]
【発明の効果】本発明により従来の逆浸透膜と比較し
て、低圧で使用する場合にも高い水透過性を発揮する膜
を提供することができる。また水透過性を向上する方法
として、紫外線照射による表面処理を採用することによ
って、処理設備、工程ともに簡便でコスト的にも安価な
方法で逆浸透膜の性能を向上することができる。According to the present invention, it is possible to provide a membrane exhibiting high water permeability even when used at a low pressure, as compared with a conventional reverse osmosis membrane. Further, by adopting a surface treatment by ultraviolet irradiation as a method for improving water permeability, the performance of the reverse osmosis membrane can be improved by a method that is simple in both treatment equipment and steps and inexpensive in cost.
【図面の簡単な説明】[Brief description of drawings]
【図1】低圧水銀灯の模式図(下から見た図)[Figure 1] Schematic diagram of a low-pressure mercury lamp (viewed from below)
【図2】紫外線照射装置の模式図(側面から見た図)FIG. 2 is a schematic diagram of an ultraviolet irradiation device (side view)
1:定圧水銀灯 2:反射板 3:膜サンプル 4:ラボジャッキ 1: Constant pressure mercury lamp 2: Reflector 3: Membrane sample 4: Lab jack
Claims (11)
とする逆浸透膜。1. A reverse osmosis membrane characterized in that the membrane surface is subjected to ultraviolet irradiation treatment.
する第1項記載の逆浸透膜。2. The reverse osmosis membrane according to claim 1, wherein the reverse osmosis membrane is an asymmetric membrane.
からなる複合膜であることを特徴とする第1項記載の逆
浸透膜。3. The reverse osmosis membrane according to claim 1, wherein the reverse osmosis membrane is a composite membrane composed of a microporous support membrane and a separation functional layer.
ポリマ−からなることを特徴とする第1項記載の逆浸透
膜。4. The reverse osmosis membrane according to claim 1, wherein the separation functional layer forming the composite membrane is composed of a crosslinked polymer.
芳香族ポリアミドからなることを特徴とする第1項記載
の逆浸透膜。5. The reverse osmosis membrane according to claim 1, wherein the separation functional layer forming the composite membrane is made of a crosslinked aromatic polyamide.
H/C[total] )が0.015以上であることを特徴と
する第1項記載の逆浸透膜。6. The carboxyl group concentration (-COO on the surface of the film
H / C [total] ) is 0.015 or more, The reverse osmosis membrane according to claim 1.
0.05重量%食塩水を使用して圧力0.34MPa、
温度25℃の条件で逆浸透テストしたとき、水の透過性
が0.4m3/m2・日以上であることを特徴とする第
1項記載の逆浸透膜。7. The separation functional layer comprises a crosslinked polyamide,
Pressure of 0.34 MPa using 0.05 wt% saline,
The reverse osmosis membrane according to claim 1, which has a water permeability of 0.4 m 3 / m 2 · day or more when subjected to a reverse osmosis test at a temperature of 25 ° C.
とを特徴とする逆浸透膜の表面処理方法。8. A method for treating a surface of a reverse osmosis membrane, which comprises irradiating ultraviolet rays having a wavelength of 10 to 400 nm.
度×照射時間)が、波長184nm、254nmに強い
線スペクトルを有し電力が220Wである線状光源を反
射板を取り付けて紫外線照射処理に使用する場合に、紫
外線の照射時間と光源から膜表面までの距離から計算さ
れるAの値が0.001≦A≦500000となるよう
に設定した条件での紫外線照射量と同等であることを特
徴とする第8項記載の逆浸透膜の表面処理方法。9. A linear light source having a strong line spectrum with wavelengths of 184 nm and 254 nm and an electric power of 220 W with respect to the amount of ultraviolet irradiation (UV illuminance × irradiation time) on the surface of the reverse osmosis membrane is attached with a reflector to perform ultraviolet irradiation treatment. When used for, the value of A calculated from the UV irradiation time and the distance from the light source to the film surface should be equivalent to the UV irradiation amount under the condition that 0.001 ≦ A ≦ 500,000 is set. 9. The surface treatment method for a reverse osmosis membrane according to claim 8.
0〜60℃とすることを特徴とする第8項記載の逆浸透
膜の表面処理方法。10. The ambient temperature when irradiating with ultraviolet rays is 1
9. The surface treatment method for a reverse osmosis membrane according to claim 8, wherein the temperature is 0 to 60 ° C.
度を20%以下とすることを特徴とする第8項記載の逆
浸透膜の表面処理方法。11. The method for surface treatment of a reverse osmosis membrane according to claim 8, wherein the oxygen concentration in the atmosphere when irradiating with ultraviolet rays is 20% or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31882094A JPH08173777A (en) | 1994-12-21 | 1994-12-21 | Reverse osmosis membrane and its surface treating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31882094A JPH08173777A (en) | 1994-12-21 | 1994-12-21 | Reverse osmosis membrane and its surface treating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08173777A true JPH08173777A (en) | 1996-07-09 |
Family
ID=18103321
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31882094A Pending JPH08173777A (en) | 1994-12-21 | 1994-12-21 | Reverse osmosis membrane and its surface treating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08173777A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014523340A (en) * | 2012-05-31 | 2014-09-11 | エルジー・ケム・リミテッド | Highly permeable reverse osmosis membrane containing carbodiimide compound and method for producing the same |
| CN112844075A (en) * | 2020-12-29 | 2021-05-28 | 宁波日新恒力科技有限公司 | Preparation method of high-flux polyamide reverse osmosis composite membrane |
| JP2022544364A (en) * | 2019-08-12 | 2022-10-18 | アクア メンブレインズ,インコーポレイテッド | Photocuring for film performance |
| JP2023011560A (en) * | 2018-04-30 | 2023-01-24 | インテグリス・インコーポレーテッド | Polyamide-coated filter membranes, filters, and methods |
-
1994
- 1994-12-21 JP JP31882094A patent/JPH08173777A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014523340A (en) * | 2012-05-31 | 2014-09-11 | エルジー・ケム・リミテッド | Highly permeable reverse osmosis membrane containing carbodiimide compound and method for producing the same |
| JP2023011560A (en) * | 2018-04-30 | 2023-01-24 | インテグリス・インコーポレーテッド | Polyamide-coated filter membranes, filters, and methods |
| JP2022544364A (en) * | 2019-08-12 | 2022-10-18 | アクア メンブレインズ,インコーポレイテッド | Photocuring for film performance |
| CN112844075A (en) * | 2020-12-29 | 2021-05-28 | 宁波日新恒力科技有限公司 | Preparation method of high-flux polyamide reverse osmosis composite membrane |
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