JPH0818328A - Small antenna manufacturing method - Google Patents
Small antenna manufacturing methodInfo
- Publication number
- JPH0818328A JPH0818328A JP14672894A JP14672894A JPH0818328A JP H0818328 A JPH0818328 A JP H0818328A JP 14672894 A JP14672894 A JP 14672894A JP 14672894 A JP14672894 A JP 14672894A JP H0818328 A JPH0818328 A JP H0818328A
- Authority
- JP
- Japan
- Prior art keywords
- metal conductor
- conductor film
- ceramic substrate
- dielectric ceramic
- small antenna
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- Waveguide Aerials (AREA)
Abstract
(57)【要約】
【目的】 電気的損失を低減すると共に量産に適した製
造方法を提案することを目的とする。
【構成】 所定形状の誘電体セラミック基板1の表面全
体にメッキにより金属導体膜2を被着し、その後エッチ
ングにより不用部分のこの金属導体膜2を除去して所定
の金属導体膜パターン2a,2b,3を形成するように
したものである。
(57) [Abstract] [Purpose] It is an object to propose a manufacturing method suitable for mass production while reducing electrical loss. A metal conductor film 2 is deposited on the entire surface of a dielectric ceramic substrate 1 having a predetermined shape by plating, and then the unnecessary metal conductor film 2 is removed by etching to remove predetermined metal conductor film patterns 2a and 2b. , 3 are formed.
Description
【0001】[0001]
【産業上の利用分野】本発明は携帯電話機、GPS(衛
星測位システム)装置等の移動体通信に使用して好適な
小型アンテナの製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a small antenna suitable for mobile communication such as a mobile phone and a GPS (Satellite Positioning System) device.
【0002】[0002]
【従来の技術】近年、携帯電話機、GPS装置等の移動
体通信機器の小型化に伴いアンテナの小型化を図るた
め、高い誘電率(εr≧10)の誘電体セラミック基板
を使用した図2に示す如き小型アンテナが提案されてい
る。2. Description of the Related Art In recent years, in order to miniaturize an antenna with the miniaturization of mobile communication devices such as mobile phones and GPS devices, a dielectric ceramic substrate having a high dielectric constant (εr ≧ 10) is used in FIG. A small antenna as shown has been proposed.
【0003】この、図2につき説明するに、図2におい
て、1は(Mg1-X CaX )TiO 3 (X=0.05)
組成の粉末をプレス成形し、1350℃で焼成した、比
誘電率が20の誘電体セラミック基板を示し、この誘電
体セラミック基板1の形状は例えば12.5mm×1
2.5mm×6mmである。To explain FIG. 2, the description of FIG.
And 1 is (Mg1-XCaX) TiO 3(X = 0.05)
The composition powder was press-molded and fired at 1350 ° C.,
A dielectric ceramic substrate having a dielectric constant of 20 is shown.
The shape of the body ceramic substrate 1 is, for example, 12.5 mm × 1.
It is 2.5 mm × 6 mm.
【0004】この誘電体セラミック基板1の上面及び下
面に例えばCuの如き金属導体膜2a及び2bを被着す
ると共にこの上面及び下面の金属導体膜2a及び2bを
短絡する金属導体膜3を形成する。Metallic conductor films 2a and 2b such as Cu are deposited on the upper and lower surfaces of the dielectric ceramic substrate 1, and a metallic conductor film 3 is formed to short-circuit the upper and lower metal conductor films 2a and 2b. .
【0005】この小型アンテナを使用するときには図2
に示す如く、この小型アンテナの一面例えば下面の金属
導体膜2bを例えば携帯電話機の金属シャーシ4上に載
置する如くして、受信専用アンテナとして使用する。こ
の場合マイクロストリップ形の逆Fアンテナとして動作
する。When using this small antenna, FIG.
As shown in, the metal conductor film 2b on one surface, for example, the lower surface of this small antenna is mounted on the metal chassis 4 of the mobile phone, for example, and used as a reception-only antenna. In this case, it operates as a microstrip type inverted F antenna.
【0006】斯る小型アンテナにおいては、図2に示す
如く縦の長さをa、横の長さをb、誘電体セラミック基
板1の比誘電率をεr、受信電波の波長をλとしたとき の関係が成立し、例えば800MHzの電波を12.5
mm×12.5mm×6mmの大きさの小型アンテナで
受信することができる。In such a small antenna, when the vertical length is a, the horizontal length is b, the relative dielectric constant of the dielectric ceramic substrate 1 is εr, and the wavelength of the received radio wave is λ, as shown in FIG. The relationship is established and, for example, a radio wave of 800 MHz is 12.5
It can be received by a small antenna having a size of mm × 12.5 mm × 6 mm.
【0007】[0007]
【発明が解決しようとする課題】従来、斯る図2に示す
如き小型アンテナを製造するときは、誘電体セラミック
基板を所定形状例えば12.5mm×12.5mm×6
mmに成形・加工した後に導体ペーストの焼付けや導体
板の接着により金属導体膜2a,2b及び3を被着して
いた。Conventionally, when manufacturing such a small antenna as shown in FIG. 2, a dielectric ceramic substrate has a predetermined shape, for example, 12.5 mm × 12.5 mm × 6.
After being formed and processed to have a thickness of mm, the metal conductor films 2a, 2b and 3 were adhered by baking a conductor paste or adhering a conductor plate.
【0008】この導体板を誘電体セラミック基板1に接
着する方法では量産に適さない不都合があると共に金属
導体膜2a,2b,3と誘電体セラミック基板1との間
に接着剤層が介在することになり、この接着剤層は誘電
体セラミック基板1に比し誘電率が小さくアンテナの特
性上で問題があり、また電気的損失が大きい不都合があ
った。The method of adhering this conductor plate to the dielectric ceramic substrate 1 is not suitable for mass production, and an adhesive layer is interposed between the metal conductor films 2a, 2b, 3 and the dielectric ceramic substrate 1. This adhesive layer has a small dielectric constant as compared with the dielectric ceramic substrate 1 and has a problem in antenna characteristics, and has a disadvantage that electric loss is large.
【0009】また誘電体セラミック基板1に導体ペース
トを焼付ける方法でも、導体ペースト中に含まれるガラ
スフリットの影響から導体損失が大きくなり、また導体
ペーストの印刷・焼付けの工程に非常に手間がかかり量
産に適さない不都合があった。Also in the method of baking the conductor paste on the dielectric ceramic substrate 1, the conductor loss becomes large due to the influence of the glass frit contained in the conductor paste, and the steps of printing and baking the conductor paste are very troublesome. There was an inconvenience that was not suitable for mass production.
【0010】本発明は斯る点に鑑み、電気的損失を低減
すると共に量産に適した製造方法を提案せんとするもの
である。In view of the above, the present invention proposes a manufacturing method that reduces electric loss and is suitable for mass production.
【0011】[0011]
【課題を解決するための手段】本発明小型アンテナの製
造方法は例えば図1に示す如く所定形状の誘電体セラミ
ック基板1の表面全体にメッキにより金属導体膜2を被
着し、その後エッチングにより不用部分のこの金属導体
膜2を除去して所定の金属導体膜パターン2a,2b,
3を形成するようにしたものである。The method for manufacturing a small antenna of the present invention is unnecessary, for example, by depositing a metal conductor film 2 on the entire surface of a dielectric ceramic substrate 1 having a predetermined shape by plating as shown in FIG. By removing the metal conductor film 2 in a portion, predetermined metal conductor film patterns 2a, 2b,
3 is formed.
【0012】[0012]
【作用】本発明によれば金属導体膜をメッキにより形成
するようにしているので誘電体セラミック基板1の表面
全体に同時に金属導体膜2を形成することができ、この
メッキ槽を拡大すること等により容易に量産することが
できると共にエッチングにより不用部分の金属導体膜を
除去して所定の金属導体膜パターンを形成するので、良
好な金属導体膜パターンを容易に得ることができ量産に
適している。According to the present invention, since the metal conductor film is formed by plating, the metal conductor film 2 can be simultaneously formed on the entire surface of the dielectric ceramic substrate 1, and the plating tank can be enlarged. Can be easily mass-produced, and since a predetermined metal conductor film pattern is formed by removing the unnecessary metal conductor film by etching, a good metal conductor film pattern can be easily obtained, which is suitable for mass production. .
【0013】また誘電体セラミック基板1の表面に直接
金属導体膜パターンを形成しているので金属導体膜パタ
ーンの電気的損失が低減できアンテナ利得が向上する。Further, since the metal conductor film pattern is formed directly on the surface of the dielectric ceramic substrate 1, the electric loss of the metal conductor film pattern can be reduced and the antenna gain can be improved.
【0014】[0014]
【実施例】以下図面を参照して本発明小型アンテナの製
造方法の一実施例につき説明しよう。先ず、図1Aに示
す如く所定の形状の誘電体セラミック基板1を用意す
る。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a method for manufacturing a small antenna of the present invention will be described below with reference to the drawings. First, as shown in FIG. 1A, a dielectric ceramic substrate 1 having a predetermined shape is prepared.
【0015】この誘電体セラミック基板1は、誘電体セ
ラミック材料として例えば(Mg1- X CaX )TiO3
(X=0.05)組成の粉末をプレス成形し、これを1
350℃で焼成してセラミック焼結体としたものより得
る如くする。この例の誘電体セラミック基板1の比誘電
率は20である。The dielectric ceramic substrate 1 is made of, for example, (Mg 1- x Ca x ) TiO 3 as a dielectric ceramic material.
The powder of the composition (X = 0.05) is press-molded and
It is obtained by firing at 350 ° C. to obtain a ceramic sintered body. The dielectric constant of the dielectric ceramic substrate 1 of this example is 20.
【0016】この誘電体セラミック基板1は上述セラミ
ック焼結体に研削・切断加工を施し、所定の形状例えば
縦及び横の長さが夫々12.5mmで且つ厚さが6mm
とする。この形状の寸法は使用する電波の波長λ、使用
する誘電体セラミック基板の誘電率εrにより決定され
る。This dielectric ceramic substrate 1 is formed by grinding and cutting the above-mentioned ceramic sintered body to have a predetermined shape, for example, the length and width are 12.5 mm and the thickness is 6 mm.
And The size of this shape is determined by the wavelength λ of the radio wave used and the dielectric constant εr of the dielectric ceramic substrate used.
【0017】次にメッキ工程により図1Bに示す如くこ
の誘電体セラミック基板1の表面全体に金属導体膜2を
形成する。この金属導体としてはCu,Ag,Ni,A
u等を用いることができる。この場合メッキ膜即ち金属
導体膜の厚さは高周波例えば800MHzでの表皮効果
を考慮して、20μm程度とする。Next, a metal conductor film 2 is formed on the entire surface of the dielectric ceramic substrate 1 by a plating process as shown in FIG. 1B. This metal conductor is Cu, Ag, Ni, A
u or the like can be used. In this case, the thickness of the plating film, that is, the metal conductor film is set to about 20 μm in consideration of the skin effect at high frequencies such as 800 MHz.
【0018】次にメッキ工程である無電解銅メッキ工程
の例につき説明する。先ず、この誘電体セラミック基板
1をエースクリーン A−220(奥野製薬工業製)を
使用してアルカリ脱脂を行い、その後水洗いをする。Next, an example of the electroless copper plating step which is a plating step will be described. First, this dielectric ceramic substrate 1 is alkali-degreased using A-screen A-220 (manufactured by Okuno Chemical Industries Co., Ltd.), and then washed with water.
【0019】次に、密着性を増す目的でこの誘電体セラ
ミック基板1の表面をでこぼこにするためフッ酸40
%、硝酸60%の混合溶液を使用してエッチングし、そ
の後水洗いをする。Next, hydrofluoric acid 40 is used to make the surface of the dielectric ceramic substrate 1 uneven in order to increase the adhesion.
%, 60% nitric acid mixed solution is used for etching, followed by washing with water.
【0020】次に塩酸35%の溶液を使用してプリディ
ップし、その後OPC80キャタリスト(奥野製薬工業
製)と塩酸35%の溶液の混合液を使用し、パラジウム
を表面に付着するキャタライジングを行う。このキャタ
ライジング後、水洗いを行なう。Next, a pre-dip was carried out using a solution of hydrochloric acid 35%, and then a mixture of OPC80 Catalyst (manufactured by Okuno Seiyaku Kogyo) and a solution of hydrochloric acid 35% was used to carry out catalyzing to attach palladium to the surface. To do. After this catalyzing, it is washed with water.
【0021】次に硫酸97%の溶液にアクセレートX
(奥野製薬工業製)を混合した液を使用して触媒を活性
化するためにアクセレーティングを行なう。このアクセ
レーティング後に水洗いを行なう。Next, an accelerator X was added to a solution of sulfuric acid 97%.
Acceleration is performed in order to activate the catalyst using a mixture of (Okuno Pharmaceutical Co., Ltd.). After accelerating, wash with water.
【0022】次に銅の無電解メッキ液として、OPCカ
ッパーT(奥野製薬工業製)を使用して銅の無電解メッ
キを行なう。この銅を所定厚例えば20μm厚メッキし
た後に水洗いを行なう。Next, electroless plating of copper is performed using OPC Copper T (produced by Okuno Chemical Industries Co., Ltd.) as a copper electroless plating solution. This copper is plated with a predetermined thickness, for example 20 μm, and then washed with water.
【0023】次にグリコートを使用して防錆処理を行
い、その後N2 雰囲気中、300℃×10分の条件で熱
処理を行い誘電体セラミック基板1と金属導体膜2であ
る銅メッキ膜との密着性を増す如くする。Next, a rust preventive treatment is performed using a glycoat, and then a heat treatment is performed in an N 2 atmosphere under the conditions of 300 ° C. × 10 minutes to form the dielectric ceramic substrate 1 and the copper plated film which is the metal conductor film 2. Try to increase the adhesion.
【0024】次に、図1Cに示す如く金属導体膜パター
ンとして残す部分にスクリーン印刷技術を使用してレジ
スト5を塗布し、その後このレジスト5を乾燥する。Next, as shown in FIG. 1C, a resist 5 is applied to a portion to be left as a metal conductor film pattern by using a screen printing technique, and then the resist 5 is dried.
【0025】この図1Cに示す如く、レジスト5を塗布
した誘電体セラミック基板1をエッチング液としての塩
化第2鉄溶液に浸し、このレジスト5の塗布されていな
い不用部分の金属導体膜2である銅メッキ膜をエッチン
グにより除去する(図1D)。このエッチング後に、十
分に水洗いして、このエッチング液を落とす如くする。As shown in FIG. 1C, the dielectric ceramic substrate 1 coated with the resist 5 is dipped in a ferric chloride solution as an etching solution to form an unnecessary portion of the metal conductor film 2 on which the resist 5 is not coated. The copper plating film is removed by etching (FIG. 1D). After this etching, it is washed sufficiently with water so that the etching solution is dropped.
【0026】その後、図1Dに示す如く、この誘電体セ
ラミック基板1上の金属導体膜上に塗布したレジスト5
をアセトン等の有機溶剤で除去し、図1Eに示す如く、
誘電体セラミック基板1の表面に所定の金属導体膜パタ
ーン2a,2b,3が形成された小型アンテナが得られ
る。Thereafter, as shown in FIG. 1D, a resist 5 applied on the metal conductor film on the dielectric ceramic substrate 1.
Is removed with an organic solvent such as acetone, and as shown in FIG. 1E,
A small antenna in which predetermined metal conductor film patterns 2a, 2b, 3 are formed on the surface of the dielectric ceramic substrate 1 can be obtained.
【0027】本例による小型アンテナの製造方法によれ
ば上述の如く、金属導体膜2をメッキにより形成するの
で、誘電体セラミック基板1の表面全体に同時に金属導
体膜2を形成することができ、このメッキ槽を拡大する
こと等により容易に量産することができると共にエッチ
ングにより不用部分の金属導体膜を除去して、所定の金
属導体膜パターン2a,2b,3を形成するので、良好
な金属導体膜パターン2a,2b,3を容易に得ること
ができ量産に適している。According to the method of manufacturing a small antenna according to this example, the metal conductor film 2 is formed by plating as described above, so that the metal conductor film 2 can be formed on the entire surface of the dielectric ceramic substrate 1 at the same time. The plating tank can be easily mass-produced by enlarging the plating tank, and the unnecessary metal conductor film is removed by etching to form the predetermined metal conductor film patterns 2a, 2b, 3 so that a good metal conductor can be formed. The film patterns 2a, 2b, 3 can be easily obtained, which is suitable for mass production.
【0028】また本例によれば誘電体セラミック基板1
の表面に直接金属導体膜パターン2a,2b,3を形成
しているので金属導体膜パターン2a,2b,3の電気
的損失が低減でき、アンテナ利得が向上する利益があ
る。Further, according to this example, the dielectric ceramic substrate 1
Since the metal conductor film patterns 2a, 2b and 3 are formed directly on the surface of the metal conductor film, the electric loss of the metal conductor film patterns 2a, 2b and 3 can be reduced, and there is an advantage that the antenna gain is improved.
【0029】尚、本発明は上述実施例に限らず本発明の
要旨を逸脱することなく、その他種々の構成が採り得る
ことは勿論である。The present invention is not limited to the above-described embodiments, and it goes without saying that various other configurations can be adopted without departing from the gist of the present invention.
【0030】[0030]
【発明の効果】本発明によれば誘電体セラミック基板1
にメッキにより金属導体膜2を形成すると共にエッチン
グにより金属導体膜パターン2a,2b,3を形成して
いるので、誘電体セラミック基板1の表面に良好な金属
導体膜パターン2a,2b,3を容易に得ることができ
量産に適している。According to the present invention, the dielectric ceramic substrate 1
Since the metal conductor film 2 is formed by plating and the metal conductor film patterns 2a, 2b, 3 are formed by etching, it is easy to form good metal conductor film patterns 2a, 2b, 3 on the surface of the dielectric ceramic substrate 1. It is suitable for mass production.
【0031】また、本発明によれば誘電体セラミック基
板1の表面に直接金属導体膜パターン2a,2b,3を
形成しているので、金属導体膜パターン2a,2b,3
の電気的損失が低減でき、アンテナ利得が向上する利益
がある。Further, according to the present invention, since the metal conductor film patterns 2a, 2b, 3 are formed directly on the surface of the dielectric ceramic substrate 1, the metal conductor film patterns 2a, 2b, 3 are formed.
There is an advantage that the electric loss of the antenna can be reduced and the antenna gain is improved.
【図1】本発明小型アンテナの製造方法の一実施例を示
す斜視図である。FIG. 1 is a perspective view showing an embodiment of a method for manufacturing a small antenna of the present invention.
【図2】小型アンテナの例を示す斜視図である。FIG. 2 is a perspective view showing an example of a small antenna.
1 誘電体セラミック基板 2 金属導体膜 2a,2b,3 金属導体膜パターン 4 金属シャーシ 5 レジスト 1 Dielectric Ceramic Substrate 2 Metal Conductor Film 2a, 2b, 3 Metal Conductor Film Pattern 4 Metal Chassis 5 Resist
Claims (1)
全体にメッキにより金属導体膜を被着し、その後エッチ
ングにより不用部分の前記金属導体膜を除去して所定の
金属導体膜パターンを形成するようにしたことを特徴と
する小型アンテナの製造方法。1. A metal conductor film is deposited on the entire surface of a dielectric ceramic substrate of a predetermined shape by plating, and then the unnecessary metal conductor film is removed by etching to form a predetermined metal conductor film pattern. A method for manufacturing a small antenna, characterized in that
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14672894A JPH0818328A (en) | 1994-06-28 | 1994-06-28 | Small antenna manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14672894A JPH0818328A (en) | 1994-06-28 | 1994-06-28 | Small antenna manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0818328A true JPH0818328A (en) | 1996-01-19 |
Family
ID=15414238
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14672894A Pending JPH0818328A (en) | 1994-06-28 | 1994-06-28 | Small antenna manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0818328A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008056476A1 (en) * | 2006-11-06 | 2008-05-15 | Murata Manufacturing Co., Ltd. | Patch antenna unit and antenna unit |
-
1994
- 1994-06-28 JP JP14672894A patent/JPH0818328A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008056476A1 (en) * | 2006-11-06 | 2008-05-15 | Murata Manufacturing Co., Ltd. | Patch antenna unit and antenna unit |
| US8089409B2 (en) | 2006-11-06 | 2012-01-03 | Murata Manufacturing Co., Ltd. | Patch antenna device and antenna device |
| CN103199343B (en) * | 2006-11-06 | 2016-08-10 | 株式会社村田制作所 | Patch antenna device and antenna assembly |
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