JPH08183778A - Surface-protecting agent of metal and production using the same - Google Patents
Surface-protecting agent of metal and production using the sameInfo
- Publication number
- JPH08183778A JPH08183778A JP34093494A JP34093494A JPH08183778A JP H08183778 A JPH08183778 A JP H08183778A JP 34093494 A JP34093494 A JP 34093494A JP 34093494 A JP34093494 A JP 34093494A JP H08183778 A JPH08183778 A JP H08183778A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- compound
- benzimidazole
- methylbenzimidazole
- metal surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 20
- 239000002184 metal Substances 0.000 title claims abstract description 20
- 239000003223 protective agent Substances 0.000 title claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 239000000126 substance Substances 0.000 claims abstract description 39
- 239000007864 aqueous solution Substances 0.000 claims abstract description 26
- 150000001875 compounds Chemical class 0.000 claims abstract description 24
- 150000002736 metal compounds Chemical class 0.000 claims abstract description 5
- 150000007524 organic acids Chemical class 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 11
- 239000004480 active ingredient Substances 0.000 claims description 6
- 238000005476 soldering Methods 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 150000002739 metals Chemical class 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 239000012299 nitrogen atmosphere Substances 0.000 claims 1
- -1 zinc acetate Chemical class 0.000 abstract description 27
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract description 17
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 abstract description 7
- 239000006071 cream Substances 0.000 abstract description 6
- 238000002844 melting Methods 0.000 abstract description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 abstract description 4
- 235000011114 ammonium hydroxide Nutrition 0.000 abstract description 4
- VTHPJRVHNSHKNZ-UHFFFAOYSA-N 2-(2-phenoxyethyl)-1h-benzimidazole Chemical compound N=1C2=CC=CC=C2NC=1CCOC1=CC=CC=C1 VTHPJRVHNSHKNZ-UHFFFAOYSA-N 0.000 abstract description 2
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 abstract description 2
- 235000006408 oxalic acid Nutrition 0.000 abstract description 2
- 239000004246 zinc acetate Substances 0.000 abstract description 2
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000002947 alkylene group Chemical group 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 150000002460 imidazoles Chemical class 0.000 abstract 1
- 229910000679 solder Inorganic materials 0.000 description 23
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 14
- 230000004907 flux Effects 0.000 description 14
- 238000009736 wetting Methods 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical class CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 8
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 7
- QTMDXZNDVAMKGV-UHFFFAOYSA-L copper(ii) bromide Chemical compound [Cu+2].[Br-].[Br-] QTMDXZNDVAMKGV-UHFFFAOYSA-L 0.000 description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 229960000583 acetic acid Drugs 0.000 description 5
- 238000007739 conversion coating Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 4
- LDZYRENCLPUXAX-UHFFFAOYSA-N 2-methyl-1h-benzimidazole Chemical compound C1=CC=C2NC(C)=NC2=C1 LDZYRENCLPUXAX-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 229960003280 cupric chloride Drugs 0.000 description 4
- OXQGTIUCKGYOAA-UHFFFAOYSA-N 2-Ethylbutanoic acid Chemical compound CCC(CC)C(O)=O OXQGTIUCKGYOAA-UHFFFAOYSA-N 0.000 description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical class CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229910021590 Copper(II) bromide Inorganic materials 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical class CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 3
- 235000019253 formic acid Nutrition 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical class CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical class OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 2
- 229940106681 chloroacetic acid Drugs 0.000 description 2
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 230000001804 emulsifying effect Effects 0.000 description 2
- WBJINCZRORDGAQ-UHFFFAOYSA-N ethyl formate Chemical compound CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- VNDYJBBGRKZCSX-UHFFFAOYSA-L zinc bromide Chemical compound Br[Zn]Br VNDYJBBGRKZCSX-UHFFFAOYSA-L 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- GAWAYYRQGQZKCR-REOHCLBHSA-N (S)-2-chloropropanoic acid Chemical compound C[C@H](Cl)C(O)=O GAWAYYRQGQZKCR-REOHCLBHSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- YKYIFUROKBDHCY-ONEGZZNKSA-N (e)-4-ethoxy-1,1,1-trifluorobut-3-en-2-one Chemical group CCO\C=C\C(=O)C(F)(F)F YKYIFUROKBDHCY-ONEGZZNKSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- LXOLJRITACRNID-UHFFFAOYSA-N 2-(1-phenoxyethyl)-1h-benzimidazole Chemical compound N=1C2=CC=CC=C2NC=1C(C)OC1=CC=CC=C1 LXOLJRITACRNID-UHFFFAOYSA-N 0.000 description 1
- MWSGKCXYQKCSFO-UHFFFAOYSA-N 2-(2,3-dimethoxyphenyl)-1h-benzimidazole Chemical compound COC1=CC=CC(C=2NC3=CC=CC=C3N=2)=C1OC MWSGKCXYQKCSFO-UHFFFAOYSA-N 0.000 description 1
- PZVOOQWTHPOFEB-UHFFFAOYSA-N 2-(2,3-dimethoxyphenyl)-4-methyl-1H-benzimidazole Chemical compound COC1=CC=CC(C=2NC3=CC=CC(C)=C3N=2)=C1OC PZVOOQWTHPOFEB-UHFFFAOYSA-N 0.000 description 1
- KTJNJKWSROSOFX-UHFFFAOYSA-N 2-(2,4-dimethoxyphenyl)-1h-benzimidazole Chemical compound COC1=CC(OC)=CC=C1C1=NC2=CC=CC=C2N1 KTJNJKWSROSOFX-UHFFFAOYSA-N 0.000 description 1
- IBBUVKYVJSZEAA-UHFFFAOYSA-N 2-(2,4-dimethoxyphenyl)-4-methyl-1h-benzimidazole Chemical compound COC1=CC(OC)=CC=C1C1=NC2=C(C)C=CC=C2N1 IBBUVKYVJSZEAA-UHFFFAOYSA-N 0.000 description 1
- OSMYIIXPXBEXRJ-UHFFFAOYSA-N 2-(2,5-dimethoxyphenyl)-1h-benzimidazole Chemical compound COC1=CC=C(OC)C(C=2NC3=CC=CC=C3N=2)=C1 OSMYIIXPXBEXRJ-UHFFFAOYSA-N 0.000 description 1
- NCQMIWWWNBEKQK-UHFFFAOYSA-N 2-(2,6-dimethoxyphenyl)-4-methyl-1h-benzimidazole Chemical compound COC1=CC=CC(OC)=C1C1=NC2=C(C)C=CC=C2N1 NCQMIWWWNBEKQK-UHFFFAOYSA-N 0.000 description 1
- DWXSYDKEWORWBT-UHFFFAOYSA-N 2-(2-bromophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC=C1Br DWXSYDKEWORWBT-UHFFFAOYSA-N 0.000 description 1
- NKOUTJDIYHCZMB-UHFFFAOYSA-N 2-(2-ethoxyphenyl)-1h-benzimidazole Chemical compound CCOC1=CC=CC=C1C1=NC2=CC=CC=C2N1 NKOUTJDIYHCZMB-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JNFBDHNAZPBWTF-UHFFFAOYSA-N 2-(2-methoxyphenyl)-1h-benzimidazole Chemical compound COC1=CC=CC=C1C1=NC2=CC=CC=C2N1 JNFBDHNAZPBWTF-UHFFFAOYSA-N 0.000 description 1
- IGZWNUGQABGXEZ-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-1h-benzimidazole Chemical compound C1=C(OC)C(OC)=CC=C1C1=NC2=CC=CC=C2N1 IGZWNUGQABGXEZ-UHFFFAOYSA-N 0.000 description 1
- SBULUSWVFJOAMS-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-4-methyl-1H-benzimidazole Chemical compound C1=C(OC)C(OC)=CC=C1C1=NC2=C(C)C=CC=C2N1 SBULUSWVFJOAMS-UHFFFAOYSA-N 0.000 description 1
- GXEORPRUXNSCMX-UHFFFAOYSA-N 2-(3,5-dimethoxyphenyl)-1h-benzimidazole Chemical compound COC1=CC(OC)=CC(C=2NC3=CC=CC=C3N=2)=C1 GXEORPRUXNSCMX-UHFFFAOYSA-N 0.000 description 1
- KYNNBXCGXUOREX-UHFFFAOYSA-N 2-(3-bromophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1 KYNNBXCGXUOREX-UHFFFAOYSA-N 0.000 description 1
- XAMZPXRUPPCGFJ-UHFFFAOYSA-N 2-(3-methoxyphenyl)-1h-benzimidazole Chemical compound COC1=CC=CC(C=2NC3=CC=CC=C3N=2)=C1 XAMZPXRUPPCGFJ-UHFFFAOYSA-N 0.000 description 1
- SKPDHKLHYVESEU-UHFFFAOYSA-N 2-(3-methoxyphenyl)-4-methyl-1h-benzimidazole Chemical compound COC1=CC=CC(C=2NC3=CC=CC(C)=C3N=2)=C1 SKPDHKLHYVESEU-UHFFFAOYSA-N 0.000 description 1
- PLOBBBOEFBMXTN-UHFFFAOYSA-N 2-(4-butoxyphenyl)-1h-benzimidazole Chemical compound C1=CC(OCCCC)=CC=C1C1=NC2=CC=CC=C2N1 PLOBBBOEFBMXTN-UHFFFAOYSA-N 0.000 description 1
- GEYBHMVTAJEVPU-UHFFFAOYSA-N 2-(4-butoxyphenyl)-4-methyl-1H-benzimidazole Chemical compound C1=CC(OCCCC)=CC=C1C1=NC2=C(C)C=CC=C2N1 GEYBHMVTAJEVPU-UHFFFAOYSA-N 0.000 description 1
- LWNYTMFTHNAURG-UHFFFAOYSA-N 2-(4-chloro-2-methoxyphenyl)-1h-benzimidazole Chemical compound COC1=CC(Cl)=CC=C1C1=NC2=CC=CC=C2N1 LWNYTMFTHNAURG-UHFFFAOYSA-N 0.000 description 1
- SQFPPQMOGHWXLU-UHFFFAOYSA-N 2-(4-ethoxyphenyl)-1h-benzimidazole Chemical compound C1=CC(OCC)=CC=C1C1=NC2=CC=CC=C2N1 SQFPPQMOGHWXLU-UHFFFAOYSA-N 0.000 description 1
- HYXHMHWPHUMEJM-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4-methyl-1h-benzimidazole Chemical compound C1=CC(OC)=CC=C1C1=NC2=C(C)C=CC=C2N1 HYXHMHWPHUMEJM-UHFFFAOYSA-N 0.000 description 1
- QDVCOIQHTAYVOM-UHFFFAOYSA-N 2-(5-chloro-2-methoxyphenyl)-1h-benzimidazole Chemical compound COC1=CC=C(Cl)C=C1C1=NC2=CC=CC=C2N1 QDVCOIQHTAYVOM-UHFFFAOYSA-N 0.000 description 1
- XATKRQREMKIRLA-UHFFFAOYSA-N 2-(phenoxymethyl)-1h-benzimidazole Chemical compound N=1C2=CC=CC=C2NC=1COC1=CC=CC=C1 XATKRQREMKIRLA-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- IZUNHOUXVBCJCD-UHFFFAOYSA-N 2-[(2,3-dichlorophenoxy)methyl]-1h-benzimidazole Chemical compound ClC1=CC=CC(OCC=2NC3=CC=CC=C3N=2)=C1Cl IZUNHOUXVBCJCD-UHFFFAOYSA-N 0.000 description 1
- CXKZUNIQSJXPPO-UHFFFAOYSA-N 2-[(2,4-dichlorophenoxy)methyl]-1h-benzimidazole Chemical compound ClC1=CC(Cl)=CC=C1OCC1=NC2=CC=CC=C2N1 CXKZUNIQSJXPPO-UHFFFAOYSA-N 0.000 description 1
- QIMKZCCXUIBJCE-UHFFFAOYSA-N 2-[(2-methoxyphenyl)methyl]-1h-benzimidazole Chemical compound COC1=CC=CC=C1CC1=NC2=CC=CC=C2N1 QIMKZCCXUIBJCE-UHFFFAOYSA-N 0.000 description 1
- ITCRYYSSWFKZJM-UHFFFAOYSA-N 2-[(4-chlorophenoxy)methyl]-1h-benzimidazole Chemical compound C1=CC(Cl)=CC=C1OCC1=NC2=CC=CC=C2N1 ITCRYYSSWFKZJM-UHFFFAOYSA-N 0.000 description 1
- JOPZJEAGGYIFBP-UHFFFAOYSA-N 2-[(4-chlorophenoxy)methyl]-4-methyl-1h-benzimidazole Chemical compound N1C=2C(C)=CC=CC=2N=C1COC1=CC=C(Cl)C=C1 JOPZJEAGGYIFBP-UHFFFAOYSA-N 0.000 description 1
- NNAQVPUEPHRSKJ-UHFFFAOYSA-N 2-[(4-ethoxyphenyl)methyl]-1h-benzimidazole Chemical compound C1=CC(OCC)=CC=C1CC1=NC2=CC=CC=C2N1 NNAQVPUEPHRSKJ-UHFFFAOYSA-N 0.000 description 1
- RRZBJTKIOFNONP-UHFFFAOYSA-N 2-[(4-methoxyphenyl)methyl]-1h-benzimidazole Chemical compound C1=CC(OC)=CC=C1CC1=NC2=CC=CC=C2N1 RRZBJTKIOFNONP-UHFFFAOYSA-N 0.000 description 1
- DZLOMEIRRMNCDX-UHFFFAOYSA-N 2-[2-(4-methoxyphenyl)ethyl]-1h-benzimidazole Chemical compound C1=CC(OC)=CC=C1CCC1=NC2=CC=CC=C2N1 DZLOMEIRRMNCDX-UHFFFAOYSA-N 0.000 description 1
- IVCCYLMOMPQERQ-UHFFFAOYSA-N 2-[3-(4-methoxyphenyl)propyl]-1h-benzimidazole Chemical compound C1=CC(OC)=CC=C1CCCC1=NC2=CC=CC=C2N1 IVCCYLMOMPQERQ-UHFFFAOYSA-N 0.000 description 1
- WCOCCXZFEJGHTC-UHFFFAOYSA-N 2-[4-(bromomethyl)phenyl]acetic acid Chemical compound OC(=O)CC1=CC=C(CBr)C=C1 WCOCCXZFEJGHTC-UHFFFAOYSA-N 0.000 description 1
- XXSPGBOGLXKMDU-UHFFFAOYSA-N 2-bromo-2-methylpropanoic acid Chemical compound CC(C)(Br)C(O)=O XXSPGBOGLXKMDU-UHFFFAOYSA-N 0.000 description 1
- WAKFRZBXTKUFIW-UHFFFAOYSA-N 2-bromo-2-phenylacetic acid Chemical compound OC(=O)C(Br)C1=CC=CC=C1 WAKFRZBXTKUFIW-UHFFFAOYSA-N 0.000 description 1
- BLGVDCMNIAOLHA-UHFFFAOYSA-N 2-bromo-3-methylbutane Chemical compound CC(C)C(C)Br BLGVDCMNIAOLHA-UHFFFAOYSA-N 0.000 description 1
- YAQLSKVCTLCIIE-UHFFFAOYSA-N 2-bromobutyric acid Chemical compound CCC(Br)C(O)=O YAQLSKVCTLCIIE-UHFFFAOYSA-N 0.000 description 1
- DPRAYRYQQAXQPE-UHFFFAOYSA-N 2-bromohexadecanoic acid Chemical compound CCCCCCCCCCCCCCC(Br)C(O)=O DPRAYRYQQAXQPE-UHFFFAOYSA-N 0.000 description 1
- HZTPKMIMXLTOSK-UHFFFAOYSA-N 2-bromohexanoic acid Chemical compound CCCCC(Br)C(O)=O HZTPKMIMXLTOSK-UHFFFAOYSA-N 0.000 description 1
- GTGTXZRPJHDASG-UHFFFAOYSA-N 2-bromooctanoic acid Chemical compound CCCCCCC(Br)C(O)=O GTGTXZRPJHDASG-UHFFFAOYSA-N 0.000 description 1
- WMFATTFQNRPXBQ-UHFFFAOYSA-N 2-bromopentanoic acid Chemical compound CCCC(Br)C(O)=O WMFATTFQNRPXBQ-UHFFFAOYSA-N 0.000 description 1
- MONMFXREYOKQTI-UHFFFAOYSA-N 2-bromopropanoic acid Chemical compound CC(Br)C(O)=O MONMFXREYOKQTI-UHFFFAOYSA-N 0.000 description 1
- GBBKJNDQLLKTCX-UHFFFAOYSA-N 2-bromotetradecanoic acid Chemical compound CCCCCCCCCCCCC(Br)C(O)=O GBBKJNDQLLKTCX-UHFFFAOYSA-N 0.000 description 1
- RVBUZBPJAGZHSQ-UHFFFAOYSA-N 2-chlorobutanoic acid Chemical compound CCC(Cl)C(O)=O RVBUZBPJAGZHSQ-UHFFFAOYSA-N 0.000 description 1
- DWYHDSLIWMUSOO-UHFFFAOYSA-N 2-phenyl-1h-benzimidazole Chemical compound C1=CC=CC=C1C1=NC2=CC=CC=C2N1 DWYHDSLIWMUSOO-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- QQZJWQCLWOQDQV-UHFFFAOYSA-N 3-bromo-2-(bromomethyl)propanoic acid Chemical compound OC(=O)C(CBr)CBr QQZJWQCLWOQDQV-UHFFFAOYSA-N 0.000 description 1
- ZFJOMUKPDWNRFI-UHFFFAOYSA-N 3-bromo-4-methylbenzoic acid Chemical compound CC1=CC=C(C(O)=O)C=C1Br ZFJOMUKPDWNRFI-UHFFFAOYSA-N 0.000 description 1
- DHXNZYCXMFBMHE-UHFFFAOYSA-N 3-bromopropanoic acid Chemical compound OC(=O)CCBr DHXNZYCXMFBMHE-UHFFFAOYSA-N 0.000 description 1
- QOWSWEBLNVACCL-UHFFFAOYSA-N 4-Bromophenyl acetate Chemical compound OC(=O)CC1=CC=C(Br)C=C1 QOWSWEBLNVACCL-UHFFFAOYSA-N 0.000 description 1
- NKVXEXBFJUACKT-UHFFFAOYSA-N 4-benzyl-5-methyl-2-phenyl-1h-imidazole Chemical compound CC=1NC(C=2C=CC=CC=2)=NC=1CC1=CC=CC=C1 NKVXEXBFJUACKT-UHFFFAOYSA-N 0.000 description 1
- GRHQDJDRGZFIPO-UHFFFAOYSA-N 4-bromobutanoic acid Chemical compound OC(=O)CCCBr GRHQDJDRGZFIPO-UHFFFAOYSA-N 0.000 description 1
- JRXCIODJFWKQNG-UHFFFAOYSA-N 4-methyl-2-(phenoxymethyl)-1h-benzimidazole Chemical compound N=1C=2C(C)=CC=CC=2NC=1COC1=CC=CC=C1 JRXCIODJFWKQNG-UHFFFAOYSA-N 0.000 description 1
- OTLNPYWUJOZPPA-UHFFFAOYSA-N 4-nitrobenzoic acid Chemical compound OC(=O)C1=CC=C([N+]([O-])=O)C=C1 OTLNPYWUJOZPPA-UHFFFAOYSA-N 0.000 description 1
- WNXNUPJZWYOKMW-UHFFFAOYSA-N 5-bromopentanoic acid Chemical compound OC(=O)CCCCBr WNXNUPJZWYOKMW-UHFFFAOYSA-N 0.000 description 1
- RWXZXCZBMQPOBF-UHFFFAOYSA-N 5-methyl-1H-benzimidazole Chemical compound CC1=CC=C2N=CNC2=C1 RWXZXCZBMQPOBF-UHFFFAOYSA-N 0.000 description 1
- BKJFDZSBZWHRNH-UHFFFAOYSA-N 8-bromooctanoic acid Chemical compound OC(=O)CCCCCCCBr BKJFDZSBZWHRNH-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- JCLDHJXDJRYKRF-UHFFFAOYSA-N C(CCCCCCCCCCC)OC1=CC=C(C=C1)C1=NC2=C(N1)C=CC=C2 Chemical compound C(CCCCCCCCCCC)OC1=CC=C(C=C1)C1=NC2=C(N1)C=CC=C2 JCLDHJXDJRYKRF-UHFFFAOYSA-N 0.000 description 1
- NTBCYXGOJOKWMF-UHFFFAOYSA-N C1=CC(OC)=CC=C1CC1=NC2=C(C)C=CC=C2N1 Chemical compound C1=CC(OC)=CC=C1CC1=NC2=C(C)C=CC=C2N1 NTBCYXGOJOKWMF-UHFFFAOYSA-N 0.000 description 1
- WDPWXLWUMIYANY-UHFFFAOYSA-N CC1=C2C(=CC=C1)NC(=N2)CCC3=CC=CC=C3OC Chemical compound CC1=C2C(=CC=C1)NC(=N2)CCC3=CC=CC=C3OC WDPWXLWUMIYANY-UHFFFAOYSA-N 0.000 description 1
- NNXXCIVFAIHMEQ-UHFFFAOYSA-N CC1=C2C(=CC=C1)NC(=N2)CCCCCCCCCCOC3=CC=CC=C3 Chemical compound CC1=C2C(=CC=C1)NC(=N2)CCCCCCCCCCOC3=CC=CC=C3 NNXXCIVFAIHMEQ-UHFFFAOYSA-N 0.000 description 1
- JRLGVDVFATYQSR-UHFFFAOYSA-N CCC(C1=NC2=C(C=CC=C2N1)C)OC3=CC=CC=C3 Chemical compound CCC(C1=NC2=C(C=CC=C2N1)C)OC3=CC=CC=C3 JRLGVDVFATYQSR-UHFFFAOYSA-N 0.000 description 1
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
- 239000005750 Copper hydroxide Substances 0.000 description 1
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- CANRESZKMUPMAE-UHFFFAOYSA-L Zinc lactate Chemical compound [Zn+2].CC(O)C([O-])=O.CC(O)C([O-])=O CANRESZKMUPMAE-UHFFFAOYSA-L 0.000 description 1
- RAOSIAYCXKBGFE-UHFFFAOYSA-K [Cu+3].[O-]P([O-])([O-])=O Chemical compound [Cu+3].[O-]P([O-])([O-])=O RAOSIAYCXKBGFE-UHFFFAOYSA-K 0.000 description 1
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KDPAWGWELVVRCH-UHFFFAOYSA-N bromoacetic acid Chemical compound OC(=O)CBr KDPAWGWELVVRCH-UHFFFAOYSA-N 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229940116318 copper carbonate Drugs 0.000 description 1
- 229910001956 copper hydroxide Inorganic materials 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 1
- HFDWIMBEIXDNQS-UHFFFAOYSA-L copper;diformate Chemical compound [Cu+2].[O-]C=O.[O-]C=O HFDWIMBEIXDNQS-UHFFFAOYSA-L 0.000 description 1
- 229940076286 cupric acetate Drugs 0.000 description 1
- 229960004643 cupric oxide Drugs 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- ZASWJUOMEGBQCQ-UHFFFAOYSA-L dibromolead Chemical compound Br[Pb]Br ZASWJUOMEGBQCQ-UHFFFAOYSA-L 0.000 description 1
- 229960005215 dichloroacetic acid Drugs 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000011087 fumaric acid Nutrition 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- JDNTWHVOXJZDSN-UHFFFAOYSA-N iodoacetic acid Chemical compound OC(=O)CI JDNTWHVOXJZDSN-UHFFFAOYSA-N 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229940046892 lead acetate Drugs 0.000 description 1
- ZPPSOOVFTBGHBI-UHFFFAOYSA-N lead(2+);oxido(oxo)borane Chemical compound [Pb+2].[O-]B=O.[O-]B=O ZPPSOOVFTBGHBI-UHFFFAOYSA-N 0.000 description 1
- 229910021514 lead(II) hydroxide Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 229940078494 nickel acetate Drugs 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000021313 oleic acid Nutrition 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-N picric acid Chemical compound OC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-N 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000003381 solubilizing effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- WGIWBXUNRXCYRA-UHFFFAOYSA-H trizinc;2-hydroxypropane-1,2,3-tricarboxylate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O WGIWBXUNRXCYRA-UHFFFAOYSA-H 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229940102001 zinc bromide Drugs 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 229960001939 zinc chloride Drugs 0.000 description 1
- 239000011746 zinc citrate Substances 0.000 description 1
- 235000006076 zinc citrate Nutrition 0.000 description 1
- 229940068475 zinc citrate Drugs 0.000 description 1
- SRWMQSFFRFWREA-UHFFFAOYSA-M zinc formate Chemical compound [Zn+2].[O-]C=O SRWMQSFFRFWREA-UHFFFAOYSA-M 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- 239000011576 zinc lactate Substances 0.000 description 1
- 229940050168 zinc lactate Drugs 0.000 description 1
- 235000000193 zinc lactate Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229960001296 zinc oxide Drugs 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- 229940077935 zinc phosphate Drugs 0.000 description 1
- JDLYKQWJXAQNNS-UHFFFAOYSA-L zinc;dibenzoate Chemical compound [Zn+2].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 JDLYKQWJXAQNNS-UHFFFAOYSA-L 0.000 description 1
- ZPEJZWGMHAKWNL-UHFFFAOYSA-L zinc;oxalate Chemical compound [Zn+2].[O-]C(=O)C([O-])=O ZPEJZWGMHAKWNL-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
Landscapes
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、金属表面に化成被膜を
形成する水溶性保護剤に関するものであり、特にプリン
ト配線板における金属表面の防錆性、耐熱性、耐湿性、
耐薬品性に優れた化成被膜を形成する保護剤として好適
なものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a water-soluble protective agent for forming a chemical conversion film on a metal surface, and particularly to a metal surface of a printed wiring board having rust-preventing property, heat resistance and moisture resistance.
It is suitable as a protective agent for forming a chemical conversion film having excellent chemical resistance.
【0002】[0002]
【従来の技術】プリント配線板の金属表面に化成被膜を
形成する表面処理方法としては、アルキルイミダゾール
系プリフラックス、5−メチルベンズイミダゾール系プ
リフラックス、2−メルカプトベンズイミダゾール系プ
リフラックス、2−アルキルベンズイミダゾール系プリ
フラックス、2−フェニルイミダゾール系プリフラック
ス、2−フェニルアルキルベンズイミダゾール系プリフ
ラックス、2−アルキルフェニルベンズイミダゾール系
プリフラックスを用いる処理方法が公報に記載されてい
る。2. Description of the Related Art As a surface treatment method for forming a chemical conversion film on a metal surface of a printed wiring board, alkylimidazole preflux, 5-methylbenzimidazole preflux, 2-mercaptobenzimidazole preflux, 2-alkyl are used. The publication describes a treatment method using a benzimidazole-based preflux, a 2-phenylimidazole-based preflux, a 2-phenylalkylbenzimidazole-based preflux, and a 2-alkylphenylbenzimidazole-based preflux.
【0003】[0003]
【発明が解決しょうとする課題】近年プリント配線板に
電子部品をはんだ付けする方法として表面実装法が多く
採用されている。この表面実装法、電子部品の仮止め低
融点クリームはんだのリフロー等、プリント配線板が高
温に曝される機会が多くなり、プリント配線板のはんだ
付け性を保持するために用いられるプリフラックスの耐
熱性、即ちプリント配線板が高温に曝された後での低融
点クリームはんだの濡れ性、拡がり性、はんだ付け性が
優れていることがプリフラックスの性能に要求されるよ
うになった。ところが上記のプリフラックス処理では化
成被膜が高温に曝されるとはんだ付けに支障を生じる欠
点がある。そこで高温に曝された後でもクリームはんだ
の濡れ性、はんだ付け性の優れた安定した水溶性プリフ
ラックスの開発が切望されている。In recent years, the surface mounting method has been widely adopted as a method for soldering electronic components to a printed wiring board. Due to this surface mounting method, reflow of low melting point cream solder for temporary fixing of electronic parts, the printed wiring board is exposed to high temperatures frequently, and the heat resistance of the pre-flux used to maintain the solderability of the printed wiring board. Of the low melting point cream solder after the printed wiring board is exposed to a high temperature, the wettability, spreadability and solderability of the low melting point solder paste are required to be excellent in the performance of the preflux. However, the above-mentioned pre-flux treatment has a drawback that soldering is hindered when the chemical conversion film is exposed to high temperatures. Therefore, there is a strong demand for the development of a stable water-soluble preflux having excellent wettability and solderability of cream solder even after being exposed to high temperatures.
【0004】[0004]
【課題を解決するための手段】本発明者は、このような
事情に鑑み鋭意検討を重ねた結果、金属表面に、化1で
示される化合物を有効成分として含有する水溶液に接触
させることにより、防錆性、耐熱性、耐湿性、耐薬品性
に優れた化成被膜が形成されることを見い出し、本発明
を完遂するに至った。本発明の実施において用いられる
化1で示される代表的な化合物は2−(1−フェノキシ
メチル)ベンズイミダゾール、2−(2−フェノキシエ
チル)ベンズイミダゾール、2−(1−フェノキシエチ
ル)ベンズイミダゾール、2−(1−フェノキシプロピ
ル)ベンズイミダゾール、2−(10−フェノキシデシ
ル)ベンズイミダゾール、2−(2−メトキシフェニ
ル)ベンズイミダゾール、2−(3−メトキシフェニ
ル)ベンズイミダゾール、2−(4−メトキシフェニ
ル)ベンズイミダゾール、2−(2−エトキシフェニ
ル)ベンズイミダゾール、2−(4−エトキシフェニ
ル)ベンズイミダゾール、2−(4−ブトキシフェニ
ル)ベンズイミダゾール、2−(2−メトキシフェニル
メチル)ベンズイミダゾール、2−(3−メトキシフェ
ニルメチル)ベンズイミダゾール、2−(4−メトキシ
フェニルメチル)ベンズイミダゾール、2−(4−エト
キシフェニルメチル)ベンズイミダゾール、2−(4−
ドデシロキシフェニル)ベンズイミダゾール、2−[2
−(2−メトキシフェニル)エチル]ベンズイミダゾー
ル、2−[2−(4−メトキシフェニル)エチル]ベン
ズイミダゾール、2−[3−(4−メトキシフェニル)
プロピル]ベンズイミダゾール、2−(2,3−ジメト
キシフェニル)ベンズイミダゾール、2−(2,4−ジ
メトキシフェニル)ベンズイミダゾール、2−(2,5
−ジメトキシフェニル)ベンズイミダゾール、2−
(2,6−ジメトキシフェニル)ベンズイミダゾール、
2−(3,4−ジメトキシフェニル)ベンズイミダゾー
ル、2−(3,5−ジメトキシフェニル)ベンズイミダ
ゾール、2−(3,4−エトキシフェニル)ベンズイミ
ダゾール、2−(4−クロロフェノキシメチル)ベンズ
イミダゾール、2−[3−(2−メチル−4−クロロフ
ェノキシ)プロピル]ベンズイミダゾール、2−[1−
(2−メチル−4−クロロフェノキシ)エチル]ベンズ
イミダゾール、2−(2,3−ジクロロフェノキシメチ
ル)ベンズイミダゾール、2−(2,4−ジクロロフェ
ノキシメチル)ベンズイミダゾール、2−(3,4−ジ
クロロフェノキシメチル)ベンズイミダゾール、2−
(2−メトキシ−4−クロロフェニル)ベンズイミダゾ
ール、2−(2−メトキシ−5−クロロフェニル)ベン
ズイミダゾール、2−(1−フェノキシメチル)メチル
ベンズイミダゾール、2−(2−フェノキシエチル)メ
チルベンズイミダゾール、2−(1−フェノキシエチ
ル)メチルベンズイミダゾール、2−(1−フェノキシ
プロピル)メチルベンズイミダゾール、2−(10−フ
ェノキシデシル)メチルベンズイミダゾール、2−(2
−メトキシフェニル)メチルベンズイミダゾール、2−
(3−メトキシフェニル)メチルベンズイミダゾール、
2−(4−メトキシフェニル)メチルベンズイミダゾー
ル、2−(2−エトキシフェニル)メチルベンズイミダ
ゾール、2−(4−エトキシフェニル)メチルベンズイ
ミダゾール、2−(4−ブトキシフェニル)メチルベン
ズイミダゾール、2−(2−メトキシフェニルメチル)
メチルベンズイミダゾール、2−(3−メトキシフェニ
ルメチル)メチルベンズイミダゾール、2−(4−メト
キシフェニルメチル)メチルベンズイミダゾール、2−
(4−エトキシフェニルメチル)メチルベンズイミダゾ
ール、2−(4−ドデシロキシフェニル)メチルベンズ
イミダゾール、2−[2−(2−メトキシフェニル)エ
チル]メチルベンズイミダゾール、2−[2−(4−メ
トキシフェニル)エチル]メチルベンズイミダゾール、
2−[3−(4−メトキシフェニル)プロピル]メチル
ベンズイミダゾール、2−(2,3−ジメトキシフェニ
ル)メチルベンズイミダゾール、2−(2,4−ジメト
キシフェニル)メチルベンズイミダゾール、2−(2,
5−ジメトキシフェニル)メチルベンズイミダゾール、
2−(2,6−ジメトキシフェニル)メチルベンズイミ
ダゾール、2−(3,4−ジメトキシフェニル)メチル
ベンズイミダゾール、2−(3,5−ジメトキシフェニ
ル)メチルベンズイミダゾール、2−(3,4−エトキ
シフェニル)メチルベンズイミダゾール、2−(4−ク
ロロフェノキシメチル)メチルベンズイミダゾール、2
−[3−(2−メチル−4−クロロフェノキシ)プロピ
ル]メチルベンズイミダゾール、2−[1−(2−メチ
ル−4−クロロフェノキシ)エチル]メチルベンズイミ
ダゾール、2−(2,3−ジクロロフェノキシメチル)
メチルベンズイミダゾール、2−(2,4−ジクロロフ
ェノキシメチル)メチルベンズイミダゾール、2−
(3,4−ジクロロフェノキシメチル)メチルベンズイ
ミダゾール、2−(2−メトキシ−4−クロロフェニ
ル)メチルベンズイミダゾール、2−(2−メトキシ−
5−クロロフェニル)メチルベンズイミダゾール等であ
る。本発明の化1で示される化合物は、用途には特に限
定はないが、金属表面保護剤のほか、エポキシ樹脂の硬
化剤、染色助剤、有機合成中間体等に有用である。本発
明の化1で示される化合物を金属の表面保護剤として用
いる場合には、化1で示される化合物を可溶化または乳
化させるために用いられる有機酸としては、酢酸、ヨー
ド酢酸、ブロモ酢酸、ジメチル酢酸、ジエチル酢酸、α
−ブロモ酢酸、クロロ酢酸、ジクロロ酢酸、パラニトロ
安息香酸、パラトルエンスルホン酸、ピクリン酸、蓚
酸、蟻酸、コハク酸、マレイン酸、アクリル酸、フマー
ル酸、酒石酸、リンゴ酸、アジピン酸、乳酸、オレイン
酸、クエン酸、メタスルホン酸、スルファミン酸等であ
り、無機酸としては、塩酸、硫酸、亜りん酸、燐酸等で
ある。ハロゲン化芳香族カルボン酸としては、3−ブロ
モ−4メチル安息香酸、4−(ブロモメチル)フェニル
酢酸、α−ブロモフェニル酢酸、α−ブロモテトラデカ
ン酸、2−ブロモフェニル酢酸、3−ブロモフェニル酢
酸、4−ブロモフェニル酢酸等である。ハロゲン化脂肪
酸としては、ブロモ酢酸、3−ブロモ−2−(ブロモメ
チル)プロピオン酸、2−ブロモブタン酸、4−ブロモ
ブタン酸、2−ブロモヘキサデカン酸、2−ブロモヘキ
サン酸、2−ブロモ−3−メチルブタン酸、2−ブロモ
−2−メチルプロピオン酸、2−ブロモオクタン酸、8
−ブロモオクタン酸、2−ブロモプロピオン酸、3−ブ
ロモプロピオン酸、2−ブロモペンタン酸、5−プロモ
ペンタン酸、クロロ酢酸、クロロ酪酸、クロロプロピオ
ン酸等である。金属イオンとしては、リチウム、ベリリ
ウム、カリウム、マグネシウム、酢酸亜鉛、蟻酸亜鉛、
乳酸亜鉛、クエン酸亜鉛、安息香酸亜鉛、蓚酸亜鉛、水
酸化亜鉛、臭化亜鉛、リン酸亜鉛、酸化亜鉛、塩化亜
鉛、酢酸鉛、水酸化鉛、臭化鉛、ヨウ化鉛、蓚酸鉛、ほ
う酸鉛、塩化第一鉄、塩化第二鉄、臭化第一銅、臭化第
二銅、ヨウ化第一銅、蟻酸銅、塩化ニッケル、酢酸ニッ
ケル、塩化第一銅、塩化第二銅、酸化第一銅、酸化第二
銅、水酸化銅、リン酸銅、炭酸銅、酢酸銅、硫酸銅等の
金属化合物である。上記のいずれかの群から選ばれた少
なくとも1種と化1で示される化合物を1種類または2
種類以上を混合した水溶液として用いる。なお処理液に
は、アンモニア水あるいはアミン類等の緩衝作用を有す
る物質を添加することは、水溶液のPHの安定性を高め
るばかりでなく被膜形成速度を速めるために有効であ
る。また、従来から表面処理剤等に使用されている種々
の添加剤を、必要に応じて添加しても良い。本発明の実
施においては、化1で示される化合物及び有機酸、金属
化合物、ハロゲン化芳香族カルボン酸、ハロゲン化脂肪
酸の溶解が困難となる場合には、メタノール、エタノー
ル、イソプロピルアルコール、ブタノール、アセトン等
の水溶性溶媒を夫々単独に用いることができる他、任意
の割合で混合して使用することも可能である。また、界
面活性剤、乳化分散剤を添加することも有効である。本
発明方法の実施において使用される化1で示される化合
物及び有機酸、金属化合物を含む水溶液に、接触させる
ことによって、化成被膜の防錆性、耐熱性、耐薬品性、
はんだ濡れ性、はんだ広がり性がさらに高めることが出
来る。また、化成被膜を形成させたのち、熱可塑性樹脂
を塗布することにより耐熱性を向上させることも可能で
ある。本発明の金属表面保護剤により防錆性化成被膜、
耐薬品性化成被膜を金属表面に施すには、金属と処理液
とを接触させる。接触させる方法としては浸漬、噴霧、
塗布による方法を用いる。接触させる処理液の温度は、
0〜100℃の温度範囲で浸漬時間は数秒〜数十分の処
理が適当である。The present inventor has conducted extensive studies in view of such circumstances, and as a result, by bringing a metal surface into contact with an aqueous solution containing the compound represented by Chemical formula 1 as an active ingredient, It was found that a chemical conversion film having excellent rust resistance, heat resistance, moisture resistance and chemical resistance was formed, and the present invention was completed. Typical compounds represented by Chemical formula 1 used in the practice of the present invention are 2- (1-phenoxymethyl) benzimidazole, 2- (2-phenoxyethyl) benzimidazole, 2- (1-phenoxyethyl) benzimidazole, 2- (1-phenoxypropyl) benzimidazole, 2- (10-phenoxydecyl) benzimidazole, 2- (2-methoxyphenyl) benzimidazole, 2- (3-methoxyphenyl) benzimidazole, 2- (4-methoxy) Phenyl) benzimidazole, 2- (2-ethoxyphenyl) benzimidazole, 2- (4-ethoxyphenyl) benzimidazole, 2- (4-butoxyphenyl) benzimidazole, 2- (2-methoxyphenylmethyl) benzimidazole, 2- (3-methoxyphen Nirumechiru) benzimidazole, 2- (4-methoxyphenyl methyl) benzimidazole, 2- (4-ethoxyphenyl-methyl) benzimidazole, 2- (4-
Dodecyloxyphenyl) benzimidazole, 2- [2
-(2-Methoxyphenyl) ethyl] benzimidazole, 2- [2- (4-methoxyphenyl) ethyl] benzimidazole, 2- [3- (4-methoxyphenyl)
Propyl] benzimidazole, 2- (2,3-dimethoxyphenyl) benzimidazole, 2- (2,4-dimethoxyphenyl) benzimidazole, 2- (2,5
-Dimethoxyphenyl) benzimidazole, 2-
(2,6-dimethoxyphenyl) benzimidazole,
2- (3,4-dimethoxyphenyl) benzimidazole, 2- (3,5-dimethoxyphenyl) benzimidazole, 2- (3,4-ethoxyphenyl) benzimidazole, 2- (4-chlorophenoxymethyl) benzimidazole , 2- [3- (2-methyl-4-chlorophenoxy) propyl] benzimidazole, 2- [1-
(2-Methyl-4-chlorophenoxy) ethyl] benzimidazole, 2- (2,3-dichlorophenoxymethyl) benzimidazole, 2- (2,4-dichlorophenoxymethyl) benzimidazole, 2- (3,4- Dichlorophenoxymethyl) benzimidazole, 2-
(2-methoxy-4-chlorophenyl) benzimidazole, 2- (2-methoxy-5-chlorophenyl) benzimidazole, 2- (1-phenoxymethyl) methylbenzimidazole, 2- (2-phenoxyethyl) methylbenzimidazole, 2- (1-phenoxyethyl) methylbenzimidazole, 2- (1-phenoxypropyl) methylbenzimidazole, 2- (10-phenoxydecyl) methylbenzimidazole, 2- (2
-Methoxyphenyl) methylbenzimidazole, 2-
(3-methoxyphenyl) methylbenzimidazole,
2- (4-methoxyphenyl) methylbenzimidazole, 2- (2-ethoxyphenyl) methylbenzimidazole, 2- (4-ethoxyphenyl) methylbenzimidazole, 2- (4-butoxyphenyl) methylbenzimidazole, 2- (2-methoxyphenylmethyl)
Methylbenzimidazole, 2- (3-methoxyphenylmethyl) methylbenzimidazole, 2- (4-methoxyphenylmethyl) methylbenzimidazole, 2-
(4-Ethoxyphenylmethyl) methylbenzimidazole, 2- (4-dodecyloxyphenyl) methylbenzimidazole, 2- [2- (2-methoxyphenyl) ethyl] methylbenzimidazole, 2- [2- (4- Methoxyphenyl) ethyl] methylbenzimidazole,
2- [3- (4-methoxyphenyl) propyl] methylbenzimidazole, 2- (2,3-dimethoxyphenyl) methylbenzimidazole, 2- (2,4-dimethoxyphenyl) methylbenzimidazole, 2- (2,2
5-dimethoxyphenyl) methylbenzimidazole,
2- (2,6-dimethoxyphenyl) methylbenzimidazole, 2- (3,4-dimethoxyphenyl) methylbenzimidazole, 2- (3,5-dimethoxyphenyl) methylbenzimidazole, 2- (3,4-ethoxy) Phenyl) methylbenzimidazole, 2- (4-chlorophenoxymethyl) methylbenzimidazole, 2
-[3- (2-Methyl-4-chlorophenoxy) propyl] methylbenzimidazole, 2- [1- (2-methyl-4-chlorophenoxy) ethyl] methylbenzimidazole, 2- (2,3-dichlorophenoxy) Methyl)
Methylbenzimidazole, 2- (2,4-dichlorophenoxymethyl) methylbenzimidazole, 2-
(3,4-Dichlorophenoxymethyl) methylbenzimidazole, 2- (2-methoxy-4-chlorophenyl) methylbenzimidazole, 2- (2-methoxy-)
5-chlorophenyl) methylbenzimidazole and the like. The use of the compound represented by Chemical Formula 1 of the present invention is not particularly limited, but it is useful as a metal surface protective agent, a curing agent for epoxy resins, a dyeing assistant, an organic synthetic intermediate, and the like. When the compound represented by Chemical formula 1 of the present invention is used as a metal surface protective agent, the organic acid used for solubilizing or emulsifying the compound represented by Chemical formula 1 includes acetic acid, iodoacetic acid, bromoacetic acid, Dimethyl acetic acid, diethyl acetic acid, α
-Bromoacetic acid, chloroacetic acid, dichloroacetic acid, paranitrobenzoic acid, paratoluenesulfonic acid, picric acid, oxalic acid, formic acid, succinic acid, maleic acid, acrylic acid, fumaric acid, tartaric acid, malic acid, adipic acid, lactic acid, oleic acid , Citric acid, metasulfonic acid, sulfamic acid, and the like, and inorganic acids include hydrochloric acid, sulfuric acid, phosphorous acid, phosphoric acid, and the like. Examples of the halogenated aromatic carboxylic acid include 3-bromo-4methylbenzoic acid, 4- (bromomethyl) phenylacetic acid, α-bromophenylacetic acid, α-bromotetradecanoic acid, 2-bromophenylacetic acid, 3-bromophenylacetic acid, 4-bromophenylacetic acid and the like. Examples of the halogenated fatty acid include bromoacetic acid, 3-bromo-2- (bromomethyl) propionic acid, 2-bromobutanoic acid, 4-bromobutanoic acid, 2-bromohexadecanoic acid, 2-bromohexanoic acid, 2-bromo-3-methylbutane. Acid, 2-bromo-2-methylpropionic acid, 2-bromooctanoic acid, 8
-Bromooctanoic acid, 2-bromopropionic acid, 3-bromopropionic acid, 2-bromopentanoic acid, 5-bromopentanoic acid, chloroacetic acid, chlorobutyric acid, chloropropionic acid and the like. The metal ions include lithium, beryllium, potassium, magnesium, zinc acetate, zinc formate,
Zinc lactate, zinc citrate, zinc benzoate, zinc oxalate, zinc hydroxide, zinc bromide, zinc phosphate, zinc oxide, zinc chloride, lead acetate, lead hydroxide, lead bromide, lead iodide, lead oxalate, Lead borate, ferrous chloride, ferric chloride, cuprous bromide, cupric bromide, cuprous iodide, copper formate, nickel chloride, nickel acetate, cuprous chloride, cupric chloride, Metal compounds such as cuprous oxide, cupric oxide, copper hydroxide, copper phosphate, copper carbonate, copper acetate, and copper sulfate. At least one selected from any of the above groups and one or two compounds represented by Chemical formula 1
Used as an aqueous solution that is a mixture of more than one type. It should be noted that adding a substance having a buffering action such as aqueous ammonia or amines to the treatment liquid is effective not only for enhancing the stability of PH of the aqueous solution but also for accelerating the film formation rate. In addition, various additives which have been conventionally used as surface treatment agents and the like may be added as necessary. In the practice of the present invention, when it becomes difficult to dissolve the compound represented by Chemical formula 1, organic acid, metal compound, halogenated aromatic carboxylic acid, and halogenated fatty acid, methanol, ethanol, isopropyl alcohol, butanol, acetone Water-soluble solvents such as the above can be used alone, respectively, and can also be used by mixing them at an arbitrary ratio. It is also effective to add a surfactant and an emulsifying dispersant. By bringing into contact with an aqueous solution containing the compound represented by Chemical formula 1, an organic acid, and a metal compound used in the practice of the method of the present invention, the chemical conversion film has rust prevention, heat resistance, and chemical resistance,
Solder wettability and solder spreadability can be further enhanced. It is also possible to improve the heat resistance by applying a thermoplastic resin after forming the chemical conversion film. Rust-preventive conversion coating by the metal surface protective agent of the present invention,
To apply a chemical resistant chemical conversion coating to a metal surface, the metal and the treatment liquid are contacted. As a method of contacting, dipping, spraying,
A coating method is used. The temperature of the treatment liquid to be contacted is
It is suitable that the immersion time is in the range of 0 to 100 ° C. for several seconds to several tens of minutes.
【0005】[0005]
【作用】上記した処理方法によれば、金属たとえば銅、
銅合金、はんだ、無電解はんだ、ニッケル、銀、亜鉛等
の表面に有効な、化1を主体とする防錆化成被膜、耐薬
品性化成被膜が形成される。これらの化成被膜は揆水性
で耐湿性、耐熱性、耐薬品性にも優れ金属表面を長期間
保護すると共に、低融点クリームはんだの濡れ性、拡が
り性、リフロー後のはんだ上がり性、濡れ性が良好であ
る。且つ作業環境、安全性の面からも優れたプリント配
線板の製造ができる。According to the above processing method, a metal such as copper,
On the surface of copper alloy, solder, electroless solder, nickel, silver, zinc, etc., effective rust-preventive and chemical-resistant chemical conversion coatings mainly consisting of chemical formula 1 are formed. These chemical conversion coatings are water-repellent, have excellent moisture resistance, heat resistance, and chemical resistance, and protect the metal surface for a long period of time, as well as the wettability, spreadability, solder rise after reflow, and wettability of low melting point cream solder. It is good. In addition, it is possible to manufacture a printed wiring board excellent in terms of work environment and safety.
【0006】[0006]
【実施例1】表1の記載の化1で示される化合物を0.
5wt%、蟻酸、ジエチル酢酸、臭化第二銅、イオン交
換水等を含む水溶液にアンモニア水を添加してPH調整
した各種類の水溶液を作り、100ml容器に入れ、液
温を40°Cに加熱した。他方、1cm×5cm×
0.3mmの銅板、1cm×5cm×0.3mmのニ
ッケル板の試料片を準備し、次いで表面を洗浄して、上
記化1で示される化合物を有効成分とする各種類の0.
5wt%水溶液に60秒間浸漬した。その後水洗した後
ち、(1)〜の試料片を熱風乾燥機に入れ250℃
で5分間加熱後ポストフラックスに浸漬しはんだ濡れ性
試験機を用いて濡れ時間を測定した。(2)〜の試
料片を耐湿(MIL−STD−202F−M−106
D)処理後の試験片をポストフラックスに浸漬してはん
だ濡れ性試験機を用いて濡れ時間を測定した。(3)上
記化1で示される化合物を有効成分とする各種類の0.
5wt%水溶液を5℃の冷蔵庫に10日間入れて液の安
定性を確認した。以上の試験結果は表1に示した。Example 1 Compounds represented by the chemical formula 1 in Table 1 were added to
Ammonia water was added to an aqueous solution containing 5 wt%, formic acid, diethyl acetic acid, cupric bromide, ion-exchanged water, etc. to make pH-adjusted aqueous solutions, which were put in 100 ml containers and the liquid temperature was set to 40 ° C. Heated. On the other hand, 1 cm x 5 cm x
A sample piece of a 0.3 mm copper plate and a 1 cm × 5 cm × 0.3 mm nickel plate was prepared, and then the surface was washed to prepare each type of 0.1% containing the compound represented by the above chemical formula 1 as an active ingredient.
It was immersed in a 5 wt% aqueous solution for 60 seconds. Then, after washing with water, the sample pieces of (1) to
After being heated for 5 minutes, the sample was immersed in post flux and the wetting time was measured using a solder wettability tester. Moisture resistance (MIL-STD-202F-M-106
D) The treated test piece was dipped in post flux and the wetting time was measured using a solder wettability tester. (3) Each type of compound containing the compound represented by the above chemical formula 1 as an active ingredient.
The stability of the liquid was confirmed by putting the 5 wt% aqueous solution in a refrigerator at 5 ° C. for 10 days. The above test results are shown in Table 1.
【表1】 [Table 1]
【0007】[0007]
【実施例2】表1の記載の化1で示される化合物を0.
5wt%、蟻酸、ジエチル酢酸、臭化第二銅、イソプロ
ピルアルコール、イオン交換水等を含む水溶液にアンモ
ニア水を添加してPH調整した各種類の水溶液を作り、
100ml容器に入れ、液温を40°Cに加熱した。他
方、1cm×5cm×0.3mmの銅板、1cm×
5cm×0.3mmのニッケル板の試料片を準備し、次
いで表面を洗浄して、上記化1で示される化合物を有効
成分とする各種類の0.5wt%水溶液に60秒間浸漬
した。その後水洗した後ち、(1)〜の試料片を熱
風乾燥機に入れ250℃で5分間加熱後ポストフラック
スに浸漬しはんだ濡れ性試験機を用いて濡れ時間を測定
した。(2)〜の試料片を耐湿(MIL−STD−
202F−M−106D)処理後の試験片をポストフラ
ックスに浸漬してはんだ濡れ性試験機を用いて濡れ時間
を測定した。(3)上記化1で示される化合物を有効成
分とする各種類の0.5wt%水溶液を5℃の冷蔵庫に
10日間入れて液の安定性を確認した。以上の試験以上
の試験結果は表1に示した。Example 2 The compound represented by the chemical formula 1 in Table 1 was added to
Ammonia water is added to an aqueous solution containing 5 wt% of formic acid, diethyl acetic acid, cupric bromide, isopropyl alcohol, ion-exchanged water, etc. to prepare pH-adjusted aqueous solutions of various types,
The mixture was placed in a 100 ml container and the liquid temperature was heated to 40 ° C. On the other hand, 1 cm x 5 cm x 0.3 mm copper plate, 1 cm x
A sample piece of a nickel plate of 5 cm × 0.3 mm was prepared, and then the surface was washed and immersed for 60 seconds in each kind of 0.5 wt% aqueous solution containing the compound represented by the above chemical formula 1 as an active ingredient. Then, after washing with water, the sample pieces (1) to (1) were placed in a hot air dryer, heated at 250 ° C. for 5 minutes, immersed in post flux, and the wetting time was measured using a solder wettability tester. Moisture resistance (MIL-STD-
202F-M-106D) The test piece after the treatment was immersed in post flux and the wetting time was measured using a solder wettability tester. (3) Each type of 0.5 wt% aqueous solution containing the compound represented by Chemical Formula 1 as an active ingredient was placed in a refrigerator at 5 ° C. for 10 days to confirm the stability of the solution. The above test results are shown in Table 1.
【0008】[0008]
【比較例1】2−フェニル−4−ベンジル−5−メチル
イミダゾール0.40wt%、酢酸2.0wt%、酢酸
第二銅0.05wt%および臭化アンモニウム0.02
5wt%を含む水溶液を作り、100ml容器に入れ、
液温を50°Cに加熱した。他方、1cm×5cm×
0.3mmの銅板、1cm×5cm×0.3mmのニ
ッケル板の試料片を準備し、次いで表面を洗浄して、水
溶液に60秒間浸漬した。その後水洗した後ち、(1)
〜の試料片を熱風乾燥機に入れ250℃で5分間加
熱後ポストフラックスに浸漬しはんだ濡れ性試験機を用
いて濡れ時間を測定した。(2)〜の試料片を耐湿
(MIL−STD−202F−M−106D)処理後の
試験片をポストフラックスに浸漬してはんだ濡れ性試験
機を用いて濡れ時間を測定した。(3)上記の水溶液を
5℃の冷蔵庫に10日間入れて液の安定性を確認した。
以上の試験結果は表1に示した。Comparative Example 1 2-phenyl-4-benzyl-5-methylimidazole 0.40 wt%, acetic acid 2.0 wt%, cupric acetate 0.05 wt% and ammonium bromide 0.02
Make an aqueous solution containing 5wt%, put it in a 100ml container,
The liquid temperature was heated to 50 ° C. On the other hand, 1 cm x 5 cm x
A sample piece of a 0.3 mm copper plate and a 1 cm × 5 cm × 0.3 mm nickel plate was prepared, and then the surface was washed and immersed in an aqueous solution for 60 seconds. After that, after washing with water, (1)
The sample pieces (1) to (4) were placed in a hot air dryer, heated at 250 ° C. for 5 minutes, immersed in post flux, and the wetting time was measured using a solder wettability tester. The test pieces after the moisture resistance (MIL-STD-202F-M-106D) treatment of the sample pieces of (2) to (4) were immersed in post flux and the wetting time was measured using a solder wettability tester. (3) The above aqueous solution was placed in a refrigerator at 5 ° C for 10 days to confirm the stability of the solution.
The above test results are shown in Table 1.
【0009】[0009]
【比較例2】2−フェニルイ−ミダゾール1.0wt
%、酢酸2.0wt%、塩化第二銅0.05wt%およ
び臭化アンモニウムを含む水溶液を作り、100ml容
器に入れ、液温を50゜Cに加熱した。他方、1cm
×5cm×0.3mmの銅板、1cm×5cm×0.
3mmのニッケル板の試料片を準備し、次いで表面を洗
浄して、水溶液に60秒間浸漬した。その後水洗した後
ち、(1)〜の試料片を熱風乾燥機に入れ250℃
で5分間加熱後ポストフラックスに浸漬しはんだ濡れ性
試験機を用いて濡れ時間を測定した。(2)〜の試
料片を耐湿(MIL−STD−202F−M−106
D)処理後の試験片をポストフラックスに浸漬してはん
だ濡れ性試験機を用いて濡れ時間を測定した。(3)上
記の水溶液を5℃の冷蔵庫に10日間入れて液の安定性
を確認した。以上の試験結果は表1に示した。COMPARATIVE EXAMPLE 2 2-Phenyl-imidazole 1.0 wt
%, Acetic acid 2.0 wt%, cupric chloride 0.05 wt% and ammonium bromide were prepared, put into a 100 ml container and heated to 50 ° C. On the other hand, 1 cm
× 5 cm × 0.3 mm copper plate, 1 cm × 5 cm × 0.
A sample piece of a 3 mm nickel plate was prepared, and then the surface was washed and immersed in the aqueous solution for 60 seconds. Then, after washing with water, the sample pieces of (1) to
After being heated for 5 minutes, the sample was immersed in post flux and the wetting time was measured using a solder wettability tester. Moisture resistance (MIL-STD-202F-M-106
D) The treated test piece was dipped in post flux and the wetting time was measured using a solder wettability tester. (3) The above aqueous solution was placed in a refrigerator at 5 ° C for 10 days to confirm the stability of the solution. The above test results are shown in Table 1.
【0010】[0010]
【比較例3】2−フェニル−ベンズイミダゾール1.0
wt%、酢酸2.5wt%、塩化第二銅0.05wt%
および臭化アンモニウムを含む水溶液を作り、100m
l容器に入れ、液温を50゜Cに加熱した。他方、1
cm×5cm×0.3mmの銅板、1cm×5cm×
0.3mmのニッケル板の試料片を準備し、次いで表面
を洗浄して、水溶液に60秒間浸漬した。その後水洗し
た後ち、(1)〜の試料片を熱風乾燥機に入れ25
0℃で5分間加熱後ポストフラックスに浸漬しはんだ濡
れ性試験機を用いて濡れ時間を測定した。(2)〜
の試料片を耐湿(MIL−STD−202F−M−10
6D)処理後の試験片をポストフラックスに浸漬しては
んだ濡れ性試験機を用いて濡れ時間を測定した。(3)
上記の水溶液を5℃の冷蔵庫に10日間入れて液の安定
性を確認した。以上の試験結果は表1に示した。Comparative Example 3 2-Phenyl-benzimidazole 1.0
wt%, acetic acid 2.5 wt%, cupric chloride 0.05 wt%
And make an aqueous solution containing ammonium bromide, 100m
The mixture was placed in a 1-liter container and heated to 50 ° C. On the other hand, 1
cm x 5 cm x 0.3 mm copper plate, 1 cm x 5 cm x
A sample piece of a 0.3 mm nickel plate was prepared, and then the surface was washed and immersed in the aqueous solution for 60 seconds. Then, after washing with water, the sample pieces of (1) to
After heating at 0 ° C. for 5 minutes, it was immersed in post flux and the wetting time was measured using a solder wettability tester. (2) ~
Moisture resistance (MIL-STD-202F-M-10
6D) The treated test piece was immersed in post flux and the wetting time was measured using a solder wettability tester. (3)
The above aqueous solution was placed in a refrigerator at 5 ° C. for 10 days to confirm the stability of the solution. The above test results are shown in Table 1.
【0011】[0011]
【比較例4】2−p−ウンデシルフェニルベンズイミダ
ゾール1.0wt%、氷酢酸6.0wt%、塩化第二銅
0.05wt%、イソプロパノール40wt%、イオン
交換水を含む水溶液を作り、100ml容器に入れ、液
温を50゜Cに加熱した。他方、1cm×5cm×
0.3mmの銅板、1cm×5cm×0.3mmのニ
ッケル板の試料片を準備し、次いで表面を洗浄して、水
溶液に60秒間浸漬した。その後水洗した後ち、(1)
〜の試料片を熱風乾燥機に入れ250℃で5分間加
熱後ポストフラックスに浸漬しはんだ濡れ性試験機を用
いて濡れ時間を測定した。(2)〜の試料片を耐湿
(MIL−STD−202F−M−106D)処理後の
試験片をポストフラックスに浸漬してはんだ濡れ性試験
機を用いて濡れ時間を測定した。(3)上記の水溶液を
5℃の冷蔵庫に10日間入れて液の安定性を確認した。
以上の試験結果は表1に示した。[Comparative Example 4] 2-p-undecylphenylbenzimidazole 1.0 wt%, glacial acetic acid 6.0 wt%, cupric chloride 0.05 wt%, isopropanol 40 wt%, an aqueous solution containing ion-exchanged water was prepared, and a 100 ml container was prepared. And heated to 50 ° C. On the other hand, 1 cm x 5 cm x
A sample piece of a 0.3 mm copper plate and a 1 cm × 5 cm × 0.3 mm nickel plate was prepared, and then the surface was washed and immersed in an aqueous solution for 60 seconds. After that, after washing with water, (1)
The sample pieces (1) to (4) were placed in a hot air dryer, heated at 250 ° C. for 5 minutes, immersed in post flux, and the wetting time was measured using a solder wettability tester. The test pieces after the moisture resistance (MIL-STD-202F-M-106D) treatment of the sample pieces of (2) to (4) were immersed in post flux and the wetting time was measured using a solder wettability tester. (3) The above aqueous solution was placed in a refrigerator at 5 ° C for 10 days to confirm the stability of the solution.
The above test results are shown in Table 1.
【0012】[0012]
【発明の効果】本発明の化合物を用いた非常に安定な水
溶液に浸漬処理することにより金属表面に、防錆性、耐
湿性、耐熱性、耐薬品性に優れた化成被膜が形成し長期
間保護すると共に、低融点クリームはんだの濡れ性、拡
がり性、また、リフロー後のはんだ上がり性、濡れ性が
良好で、且つ作業環境、安全性の面からも優れたプリン
ト配線板の表面実装に特に顕著な効果を発揮しうるもの
である。The compound of the present invention is soaked in a very stable aqueous solution to form a chemical conversion coating film having excellent rust resistance, moisture resistance, heat resistance and chemical resistance on the metal surface for a long period of time. Especially for surface mounting of a printed wiring board that is not only protected, but also has good wettability and spreadability of low melting point cream solder, solderability after reflow, good wettability, and excellent work environment and safety. It is possible to exert a remarkable effect.
Claims (5)
含有することを特徴とする金属の表面保護剤。2. A surface protecting agent for metals, comprising the compound represented by Chemical formula 1 as an active ingredient.
化合物を含む水溶液に、接触させることを特徴とする金
属の表面保護剤および使用方法。3. A metal surface protective agent, which comprises contacting with an aqueous solution containing a compound represented by Chemical formula 1, an organic acid, and a metal compound, and a method of using the same.
処理を行うことを特徴とするプリント配線板の製造方
法。4. A method for producing a printed wiring board, which comprises applying a soldering treatment after applying a metal surface protective agent.
護剤を塗布後、空気中または窒素雰囲気中で加熱する赤
外線リフロー、近赤外線リフロー、遠赤外線リフロー、
窒素リフロー、ベーパーリフロー処理を行うことを特徴
とするプリント配線板の製造方法。5. An infrared reflow, a near infrared reflow, a far infrared reflow in which the metal surface protective agent represented by Chemical formula 1 is applied to a metal surface and then heated in air or a nitrogen atmosphere.
A method for manufacturing a printed wiring board, which comprises performing a nitrogen reflow process and a vapor reflow process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34093494A JPH08183778A (en) | 1994-12-28 | 1994-12-28 | Surface-protecting agent of metal and production using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34093494A JPH08183778A (en) | 1994-12-28 | 1994-12-28 | Surface-protecting agent of metal and production using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08183778A true JPH08183778A (en) | 1996-07-16 |
Family
ID=18341649
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34093494A Pending JPH08183778A (en) | 1994-12-28 | 1994-12-28 | Surface-protecting agent of metal and production using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08183778A (en) |
-
1994
- 1994-12-28 JP JP34093494A patent/JPH08183778A/en active Pending
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