JPH08189794A - Heat exchanger manufacturing method - Google Patents

Abstract

PURPOSE: To suppress a frosting phenomenon on the surface of a heat exchanger by forming a chemical adsorption monomolecular film composed of a chlorosilane surface active agent on the entire surface of the air side heat transfer face of the heat exchanger. CONSTITUTION: A fin tube type heat exchanger used for a heat pump type air conditioner is prepared, cleaned in an organic solvent, then, a material including carbon fluoride group and chlorosilane group is sprayed and applied onto the heat exchanger in a dry nitrogen atmosphere. Then, when the heat exchanger is left alone, for examle, about 30 minutes, a dehydrochloride group is produced on the surface of the heat transfer fin 1 of the fin tube type heat exchanger, since a natural oxide film is originally formed on the surface of the heat transfer fin 1 and many hydroxide groups are included in the surface of the oxide film. Then, when the fin tube type heat exchanger is cleaned in a nonaqueous solvent and it is taken out in air, a dehydrochloric reaction with water in the air is generated so that a bridging reaction proceeds and a fluorocarbon monomolecular film 5, is formed, which is chemically bonded (covalent bond) to the surface of the heat transfer fin 1 of the fin tube type heat exchanger.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION The present invention relates to an air conditioner, a refrigerator,
The present invention relates to a method for forming a coating on an air-side heat transfer surface of a heat exchanger used for a showcase or the like.

[0002]

2. Description of the Related Art Conventionally, for example, when a heat pump type air conditioner is operated for heating, when the outside air temperature becomes low, frost adheres and grows on the surface of the heat transfer surface on the air side of the heat exchanger used on the outside, Since the heating capacity is reduced, the defrosting operation must be frequently performed to remove the frost, which causes a problem of reduced comfort of heating and reduced energy efficiency.

By making the surface of the air-side heat transfer surface of the heat exchanger water-repellent, the frosting phenomenon can be suppressed. Therefore, the surface of the air-side heat transfer surface of the heat exchanger is coated with a fluororesin or the like. The method of doing was used.

[0004]

However, in the conventional method of forming a coating film such as a fluororesin on the surface of the heat transfer surface on the air side of the heat exchanger, the coating film is easy but the coating film is thin. The problem is that pinholes are apt to occur and sufficient water repellency cannot be obtained, and even if coating is performed without pinholes, the adhesion strength of the coating film is low and the effect of water repellency cannot be obtained for a long time. Had.

It is also conceivable to form a chemisorption monomolecular film by immersion in a liquid tank. In this case, however, since the heat exchanger is immersed in the liquid tank in which the adsorption reagent is diluted with a solvent, a large size is required. There is a problem that a tank and a large amount of reagents are required.

The present invention solves the above-mentioned problems of the conventional example, and makes the surface of the air-side heat transfer surface of the heat exchanger, which is the heat transfer surface for exchanging heat with the air, uniformly water-repellent to provide a density. It is intended to efficiently form a chemisorption film having a high adhesion and a high adhesion strength with a small amount of a reagent, and an object thereof is to suppress the frosting phenomenon on the surface of the heat exchanger.

[0007]

In order to solve the above problems, the first aspect of the present invention is to provide a chlorosilyl group (SiCl) at one end in a dry atmosphere after the step of cleaning the air side heat transfer surface of the heat exchanger. _n X _3-n group, n = 1, 2, 3, and X is a functional group)
, A step of applying a solution containing a chlorosilane-based surfactant having a linear fluorocarbon group to the other end to react with a hydroxyl group on the surface of the heat transfer surface on the air side of the heat exchanger, and a non-aqueous organic solvent And a step of washing and removing a solution containing the unreacted chlorosilane-based surfactant remaining on the air-side heat transfer surface of the heat exchanger, and a step of reacting the remaining chlorosilyl group with water, A method of manufacturing a heat exchanger, wherein a chemisorption monomolecular film made of the chlorosilane-based surfactant is formed on the entire surface of the heat transfer surface on the air side of the heat exchanger.

In a second aspect of the present invention, after the step of cleaning the heat transfer surface on the air side of the heat exchanger, a chlorosilyl group (SiCl _n X _3-n group, n = 1, 2, 3, X is a functional group) and a solution containing a chlorosilane-based surfactant having a linear fluorocarbon group is applied to the other end to react with the hydroxyl group on the air-side heat transfer surface of the heat exchanger. And a step of reacting the remaining chlorosilyl group with water after the solution is evaporated, and a polymer-like chemical adsorption film made of the chlorosilane-based surfactant is attached to the heat transfer surface on the air side of the heat exchanger. Is a method for manufacturing a heat exchanger formed over the entire surface of the.

In a third aspect of the present invention, after the step of cleaning the air-side heat transfer surface of the heat exchanger, a solution containing a substance containing a plurality of chlorosilyl groups in its molecule is applied in a dry atmosphere to apply the heat treatment. A step of reacting with a hydroxyl group on the surface of the heat transfer surface on the air side of the exchanger, and washing and removing a solution containing the unreacted substance remaining on the heat transfer surface of the air on the heat exchanger using a non-aqueous organic solvent. After that, a step of reacting with water to change the chlorosilyl group on the surface of the heat transfer surface on the air side of the heat exchanger to a silanol group to form a siloxane-based monomolecular film, and under a dry atmosphere, chlorosilyl group at one end Group (SiCl _n X
_3-n group, n = 1, 2, 3, and X is a functional group), and a solution containing a chlorosilane-based surfactant having a linear fluorocarbon group at the other end is applied to the air in the heat exchanger. A step of reacting with the siloxane-based monomolecular film on the surface of the side heat-transfer surface, and a non-reacted chlorosilane-based surfactant remaining on the air-side heat-transfer surface of the heat exchanger using a non-aqueous organic solvent. It comprises a step of washing and removing the solution containing, and a step of reacting the remaining chlorosilyl group with water, the chemisorption monomolecular film consisting of the chlorosilane-based surfactant on the surface of the air side heat transfer surface of the heat exchanger. It is a method of manufacturing a heat exchanger that is cumulatively formed on the entire siloxane-based monomolecular film.

In a fourth aspect of the present invention, after the step of cleaning the air-side heat transfer surface of the heat exchanger, a solution in which a substance containing a plurality of chlorosilyl groups in its molecule is dissolved is applied in a dry atmosphere to apply the heat treatment. The chlorosilyl group on the surface of the air-side heat transfer surface of the heat exchanger is silanol by a step of reacting with a hydroxyl group on the surface of the air-side heat transfer surface of the exchanger and a step of evaporating the solution and then reacting with water. A step of forming a siloxane-based polymer-like chemical adsorption film by changing to a group, and a chlorosilyl group (SiCl _n X _3-n group, n = 1, at one end) in a dry atmosphere.
2, 3 and X are functional groups) and a solution containing a chlorosilane-based surfactant having a linear fluorocarbon group on the other end is applied to the siloxane on the surface of the heat transfer surface on the air side of the heat exchanger. And a step of reacting with a non-aqueous organic solvent to wash away a solution containing the unreacted chlorosilane-based surfactant remaining on the air-side heat transfer surface of the heat exchanger. And a step of reacting the remaining chlorosilyl group with water, and a chemisorption monomolecular film made of the chlorosilane-based surfactant is added to the siloxane-based polymer on the air-side heat transfer surface of the heat exchanger. Is a method for manufacturing a heat exchanger that is cumulatively formed on the entire surface of the chemisorption film.

In a fifth aspect of the present invention, after the step of cleaning the air-side heat transfer surface of the heat exchanger, a solution in which a substance containing a plurality of chlorosilyl groups in a molecule is dissolved is applied in a dry atmosphere to apply the heat treatment. A step of reacting with a hydroxyl group on the surface of the heat transfer surface on the air side of the exchanger, and washing and removing a solution containing the unreacted substance remaining on the heat transfer surface of the air on the heat exchanger using a non-aqueous organic solvent. After that, a step of reacting with water to change the chlorosilyl group on the surface of the heat transfer surface on the air side of the heat exchanger to a silanol group to form a siloxane-based monomolecular film, and under a dry atmosphere, chlorosilyl group at one end Group (SiCl _n X
_3-n group, n = 1, 2, 3, and X is a functional group), and a solution containing a chlorosilane-based surfactant having a linear fluorocarbon group at the other end is applied to the air in the heat exchanger. A polymer comprising the chlorosilane-based surfactant, which comprises a step of reacting with the siloxane-based monomolecular film on the surface of the side heat transfer surface and a step of reacting the remaining chlorosilyl group with water after evaporating the solution. Is a method for manufacturing a heat exchanger, in which a chemisorptive film having a uniform shape is cumulatively formed on the entire surface of the siloxane-based monomolecular film on the surface of the heat transfer surface on the air side of the heat exchanger.

In a sixth aspect of the present invention, after the step of cleaning the air-side heat transfer surface of the heat exchanger, a solution of a substance containing a plurality of chlorosilyl groups in the molecule is applied in a dry atmosphere to apply the heat treatment. The chlorosilyl group on the surface of the air-side heat transfer surface of the heat exchanger is silanol by a step of reacting with a hydroxyl group on the surface of the air-side heat transfer surface of the exchanger and a step of evaporating the solution and then reacting with water. A step of forming a siloxane-based polymer-like chemical adsorption film by changing to a group, and a chlorosilyl group (SiCl _n X _3-n group, n = 1, at one end) in a dry atmosphere.
2, 3 and X are functional groups) and a solution containing a chlorosilane-based surfactant having a linear fluorocarbon group on the other end is applied to the siloxane on the surface of the heat transfer surface on the air side of the heat exchanger. Polymer chemisorptive film comprising a chlorosilane-based surfactant, and a step of reacting with a water-based polymer chemisorptive film, and a step of reacting the remaining chlorosilyl group with water after evaporating the solution. Is a method for manufacturing a heat exchanger in which the above is cumulatively formed on the entire surface of the air-side heat transfer surface of the heat exchanger on the siloxane-based polymer chemical adsorption film.

As a chlorosilane-based surfactant having a chlorosilyl group at one end and a linear fluorocarbon group at the other end, CF _3- (CF ₂ ) _n --R _m --SiX _p Cl
_3-p (n is 0 or an integer, R is an alkyl group, a vinyl group (C = C group), an ethynyl group (C≡C group), an aryl group,
Or a substituent containing silicon or an oxygen atom, m is 0 or 1, X is H, a substituent such as an alkyl group, an alkoxyl group, a fluorine-containing alkyl group or a fluorine-containing alkoxyl group,
It is preferable to use 0 or 1 or 2) for p.

Further, as a substance containing a plurality of chlorosilyl groups in the molecule, SiCl ₄ , SiHCl ₃ , or SiH
₂ Cl ₂ , Cl- (SiCl ₂ O) n-SiCl ₃ (n
Is preferably an integer).

When the solution containing a substance containing a plurality of chlorosilyl groups in the molecule or the solution containing a chlorosilane-based surfactant is removed by washing, the solvent of the solution containing a substance containing a plurality of chlorosilyl groups in the molecule is used. Boiling point, boiling point of solvent of solution containing chlorosilane-based surfactant is 100 ° C
It is preferable that it is above.

When evaporating a solution containing a substance containing a plurality of chlorosilyl groups in the molecule or a solution containing a chlorosilane-based surfactant, the boiling point of the solvent of the solution containing a substance containing a plurality of chlorosilyl groups in the molecule , The boiling point of the solvent of the solution containing the chlorosilane-based surfactant is room temperature or higher 1
It is preferably 00 ° C or lower.

Further, it is preferable that the chemical adsorption step is performed in a low humidity atmosphere having a relative humidity of 30% or less. A more preferable atmosphere is a relative humidity of 5% or less, and a particularly preferable atmosphere is a gas atmosphere such as nitrogen gas which is inert to moisture.

Further, water repellency can be further improved by forming irregularities of submicron or micron order on the surface of the heat transfer surface on the air side of the heat exchanger in advance.

[0019]

According to the present invention, a solution containing a chlorosilane-based surfactant containing a linear fluorocarbon group is applied to the surface of the heat transfer surface on the air side of the heat exchanger to perform chemical adsorption, thereby forming an adsorption tank. It is possible to efficiently form a fluorocarbon-based chemisorption monomolecular film or polymer-like chemisorption film on the surface of the heat transfer surface on the air side of the heat exchanger with a small amount of adsorbing reagent. Further, the surface of the air-side heat transfer surface of the heat exchanger is made uniformly water-repellent, and the chemisorption monomolecular film has high density and high adhesion strength. The frosting phenomenon on the surface of the can be suppressed for a long period of time.

[0020]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A heat exchanger and a method of manufacturing the same according to the present invention will be described below with reference to the drawings using a fin tube type heat exchanger generally used in a heat pump type air conditioner. In the following description,% means% by weight unless otherwise specified.

First, the first embodiment will be described.
First, the heat pump type air conditioner generally used
Prepare a tube heat exchanger (Fig. 1) and use an organic solvent.
After washing, in a dry nitrogen atmosphere,
Substances containing chlorosilane groups, eg CF₃(CF₂)
₇(CH₂)₂SiCl₃Hexadecane 8 containing 5%
5%, 10% chloroform solution [other hexadecane
Xylene, tetralin, etc. instead of
CF above ₃(CF₂)₇(CH₂)₂SiCl₃Melted
Any non-aqueous solvent may be used. ] To Finchu
Spray for 30 minutes and leave for about 30 minutes
Then, the surface of the heat transfer fin 1 of the fin-tube heat exchanger
A native oxide film was originally formed on the surface of the oxide film.
Since a large number of hydroxyl groups 2 are contained in (Fig. 2),
SiCl groups of substances containing carbon groups and chlorosilane groups and before
Hydroxyl groups react to generate dehydrochlorination groups, and fin-tube type heat exchange
Over the entire surface of the heat transfer fin 1 of the exchanger,

[0022]

Embedded image

The bond is formed and then in a non-aqueous solvent
Unwashed CF after washing₃(CF₂) ₇(CH₂)₂Si
Cl₃The fin tube type heat exchanger in the air.
When the converter is taken out, dehydrochlorination reaction occurs with moisture in the air.
Crosslinking progresses,

[0024]

Embedded image

A bond of is generated, as shown in FIG.
The fluorocarbon monolayer 5 can be formed with a film thickness of about 15Å in a state of being chemically bonded (covalently bonded) to the surface of the heat transfer fin 1 of the fin tube type heat exchanger.

At this time, CF ₃ (CF ₂ ) ₇ (CH
₂ ) As a solvent for a solution containing ₂ SiCl ₃ , the boiling point is 80 ° C.
Cyclohexane [others such as normal hexane and Fluorinert (3M Co.), and any non-aqueous solvent that dissolves CF ₃ (CF ₂ ) ₇ (CH ₂ ) ₂ SiCl ₃ at a boiling point of about 100 ° C. or less may be used. ], And the step of washing with a non-aqueous solvent after application is omitted and natural evaporation is performed,
As shown in FIG. 4, the fluorocarbon polymer film 5 '
Can be formed in a state of being chemically bonded (covalently bonded) to the surface of the heat transfer fin 1 of the fin tube type heat exchanger.

Further, the fluorocarbon monomolecular film 5 or the fluorocarbon polymer film 5'will not be peeled off at all even when the substrate test is conducted.

Next, a second embodiment will be described. First, in order to increase the number of hydroxyl groups 12 (FIG. 5) contained in the surface of the heat transfer fin 11 of the fin-tube heat exchanger after preparing a fin-tube heat exchanger (FIG. 1) and washing with an organic solvent. In addition, SiCl ₄ (tetrachlorosilane) [other substances containing a plurality of chlorosilyl groups in the molecule, such as S
iHCl ₃ , or SiH ₂ Cl ₂ , Cl- (SiCl
₂ O) _n -SiCl ₃ (n is an integer). In particular, SiCl ₄
Has a small molecule and a large activity for hydroxyl groups, and therefore has a large effect of uniformly hydrophilizing the surface of the heat transfer fins 11 of the fin-tube heat exchanger. Solution containing 85% of hexadecane and 10% of chloroform [other than xylene, tetralin, etc., boiling point 100
Any non-aqueous solvent having a temperature of ℃ or higher may be used. ] Was sprayed on the surface of the heat transfer fin 11 of the fin tube type heat exchanger in a room purged with dry nitrogen, and then left for about 30 minutes. As a result, as shown in FIG. Occurs, and the chlorosilane monomolecular film is fixed to the surface of the heat transfer fin 11 of the fin tube type heat exchanger through the —SiO— bond as shown in the following formula (Formula 3) or (Formula 4). At this time, since hexadecane has a boiling point of 287 ° C., it hardly evaporates.

[0029]

Embedded image

[0030]

[Chemical 4]

After that, when washed with a non-aqueous solvent such as chloroform and further washed with water, SiC that has not reacted with the surface of the heat transfer fins 11 of the fin tube type heat exchanger.
The l ₄ molecule is removed, and the adsorbed reagent reacts with water, and as shown in FIG. 7, the following formula (Formula 5) or (Formula 6) is formed on the surface of the heat transfer fin 11 of the fin-tube heat exchanger. )
A siloxane monolayer 14 containing a large number of silanol groups can be obtained.

[0032]

Embedded image

[0033]

[Chemical 6]

At this time, a solvent having a boiling point of 80 ° C. is used as a solvent for a solution in which a substance containing a plurality of chlorosilyl groups is dissolved.
Cyclohexane [others such as normal hexane and Fluorinert (manufactured by 3M), and any non-aqueous solvent having a boiling point of about 100 ° C. or less and capable of dissolving a substance containing a plurality of chlorosilyl groups in its molecule may be used. 8], the step of washing with a non-aqueous solvent after coating is omitted and spontaneous evaporation is performed.
As shown in, the polysiloxane film 14 ′ containing a large number of silanol groups can be formed.

The siloxane monomolecular film 14 or the polysiloxane film 14 ′ formed at this time is bonded to the surface of the heat transfer fin 11 of the fin-tube heat exchanger 1 through a chemical bond (covalent bond) of —SiO—. Since it is completely bonded, it never peels off.

Further, the obtained siloxane monomolecular film 14 or polysiloxane film 14 'has a large number of SiOH bonds on the surface, and the number of hydroxyl groups is about three times the initial number.

Then, further, in a dry nitrogen atmosphere, a substance containing a fluorocarbon group and a chlorosilane group, for example, C
Containing F ₃ (CF ₂ ) ₇ (CH ₂ ) ₂ SiCl ₃ 5%,
Hexadecane 85%, chloroform 10% solution [Other than hexadecane, xylene, tetralin, etc., CF ₃ (CF ₂ ) ₇ (CH ₂ ) ₂ S with a boiling point of 100 ° C. or higher.
Any non-aqueous solvent that dissolves iCl ₃ may be used. ]
30 after spray coating on a fin tube type heat exchanger
When left for about a minute, a siloxane film 14 or a polysiloxane film 14 'containing a large number of silanol groups is formed on the surface of the heat transfer fins 11 of the fin tube type heat exchanger, and the silanol groups contain hydroxyl groups. (Fig. 7
8), the SiCl group of the substance containing a fluorocarbon group and a chlorosilane group reacts with the hydroxyl group to generate a dehydrochlorination group, and the entire surface of the heat transfer fin 11 of the fin tube type heat exchanger is

[0038]

[Chemical 7]

The bond is formed and then in a non-aqueous solvent
Unwashed CF after washing₃(CF₂) ₇(CH₂)₂Si
Cl₃The fin tube type heat exchanger in the air.
When the converter is taken out, dehydrochlorination reaction occurs with moisture in the air.
Crosslinking progresses,

[0040]

Embedded image

A bond of is generated, and as shown in FIG.
With the fluorocarbon monolayer 15 chemically bonded (covalently bound) to the siloxane monolayer 14 or the polysiloxane layer 14 ', which is the inner layer on the surface of the heat transfer fin 11 of the fin-tube heat exchanger, the film thickness is about 20Å. Can be formed.

At this time, CF ₃ (CF ₂ ) ₇ (CH
₂ ) As a solvent for a solution containing ₂ SiCl ₃ , the boiling point is 80 ° C.
Cyclohexane [others such as normal hexane and Fluorinert (3M Co.), and any non-aqueous solvent that dissolves CF ₃ (CF ₂ ) ₇ (CH ₂ ) ₂ SiCl ₃ at a boiling point of about 100 ° C. or less may be used. ], And the step of washing with a non-aqueous solvent after application is omitted and natural evaporation is performed,
As shown in FIG. 10, the fluorocarbon polymer film 1
5'is approximately 2 in a state of being chemically bonded (covalently bonded) to the siloxane monomolecular film 14 or the polysiloxane film 14 'of the inner layer on the surface of the heat transfer fin 11 of the fin tube type heat exchanger.
It can be formed with a film thickness of 0Å.

The fluorocarbon monolayer 15
Alternatively, the fluorocarbon-based polymer film 15 'is not peeled at all even when the substrate test is performed.

In the above two examples, CF ₃ (CF ₂ ) ₇ (CH ₂ ) _{2 is} used as a chlorosilane-based surfactant having a chlorosilyl group at one end and a linear fluorocarbon group at the other end. the SiCl ₃ was used, but other _{CF 3 - (CF 2) n} -R m -Si
X _p Cl _3-p (n is 0 or an integer, R is an alkyl group, a vinyl group (C═C group), an ethynyl group (C≡C group), an aryl group, or a substituent containing a silicon atom or an oxygen atom, m Is 0
Alternatively, it is preferable that 1, X is H, a substituent such as an alkyl group, an alkoxyl group, a fluorine-containing alkyl group or a fluorine-containing alkoxyl group, and p is 0 or 1 or 2).

In particular, the vinyl group (C = C
Group) or an ethynyl group (C≡C group) is added or incorporated, it is possible to crosslink by electron beam irradiation of about 5 megarads after forming the chemisorption film, so that the hardness of the chemisorption film can be further improved. .

As a chlorosilane-based surfactant having a chlorosilyl group at one end and a linear fluorocarbon group at the other end, more specifically, CF ₃ CH ₂ other than the above-mentioned two examples. (CH ₂ ) ₁₅ SiCl ₃ CF ₃ (CH ₂ ) ₂ Si (CH ₃ ) ₂ (CH ₂ ) ₁₅ Si
Cl ₃ F (CF ₂ ) ₈ (CH ₂ ) ₂ Si (CH ₃ ) ₂ (C
_{H 2) 9 SiCl 3 CF 3} COO (CH 2) 15 SiCl 3 CF 3 (CF 2) 5 (CH 2) 2 SiCl 3 , etc. can be utilized.

In the second embodiment, SiCl ₄ was used as the substance containing a plurality of chlorosilyl groups in the molecule. However, SiCl ₄ is included, and SiHCl ₃ or SiH ₂ is included.
It is preferable to use one or more of Cl ₂ and Cl- (SiCl ₂ O) _n -SiCl ₃ (n is an integer).

In the above two examples, the chemisorption step was carried out in a dry nitrogen atmosphere. A gas atmosphere inert to water is most preferable, but a low relative humidity of 30% or less is preferable. It is preferable to perform in a humidity atmosphere, and if possible, an atmosphere having a relative humidity of 5% or less is preferable.

Further, in any of the above-mentioned two embodiments, irregularities of sub-micron or micron order are formed in advance on the surface of the air side heat transfer surface of the heat exchanger, which is the heat transfer surface for exchanging heat with air. If it is set, the water repellency can be further improved.

The sub-micron or micron-order irregularities on the air-side heat transfer surface of the heat exchanger have a diameter of 1
˜20 μm (preferably about 10 μm) silica fine particles and silicate glass (for example, Microshear gel DF10-60A or 120A manufactured by Asahi Glass Co., Ltd.)
And silicate glass (for example, Shin-Etsu Chemical Co., Ltd.)
Hard coating agent KP-1100A or 110
0B or Si-80000 from Tokyo Ohka Kogyo Co., Ltd.) at a concentration of about 1: 1 and applied on the air-side heat transfer surface of the heat exchanger by a casting method, and then baked at 500 ° C. for 30 minutes. Tari plasma ashing (300W for about 20 minutes)
By using a method of forming a glass film having irregularities of micron order (1 to 20 μm) or a sandblast method, an electrolytic etching method, or a chemical etching method using hydrofluoric acid. Submicron to micron order (0.1 to 1
It can be formed by a method of performing a rough surface treatment of 0 μm), a rough surface treatment method using a rubbing method with sandpaper, or the like.

[0051]

INDUSTRIAL APPLICABILITY As described above, the present invention provides heat exchange.
After the process of cleaning the air-side heat transfer surface of the converter, in a dry atmosphere
And a chlorosilyl group (SiCl_nX_3-nBase, n =
1, 2, 3, and X are functional groups, and the other end is a linear fluorocarbon
Applying a solution containing a chlorosilane-based surfactant
And react with the hydroxyl groups on the air-side heat transfer surface of the heat exchanger.
Of the heat exchanger using a non-aqueous organic solvent
The unreacted chlorosilane system boundary remaining on the air-side heat transfer surface
The step of washing and removing the solution containing the surface-active agent and the remaining black
The reaction of the silyl group with water.
The chemisorption monolayer consisting of a rosilane-based surfactant is described above.
Formed over the entire surface of the heat transfer surface on the air side of the heat exchanger.
Or of the process of cleaning the air side heat transfer surface of the heat exchanger
Then, in a dry atmosphere, one end of the chlorosilyl group (SiCl
_nX_3-nGroup, n = 1, 2, 3, X is a functional group) at the other end
Chlorosilane-based surfactant having linear fluorocarbon group
Is applied to the surface of the heat transfer surface on the air side of the heat exchanger.
The step of reacting with the hydroxyl groups on the surface and evaporating the solution
After that, from the step of reacting the remaining chlorosilyl group with water
And a polymer consisting of the chlorosilane-based surfactant
Of the chemisorption film on the air-side heat transfer surface of the heat exchanger.
Formed over the body or on the air side of the heat exchanger
After the step of cleaning the hot surface, under a dry atmosphere,
By applying a solution in which a substance containing multiple
React with the hydroxyl groups on the air-side heat transfer surface of the heat exchanger
And the air in the heat exchanger using a non-aqueous organic solvent.
Cleaning the solution containing unreacted substances remaining on the side heat transfer surface
After the removal, the step of reacting with water is carried out by the heat exchanger.
On the air-side heat transfer surface of the
To form a siloxane-based monolayer, and dry
In a dry atmosphere, a chlorsilyl group (SiCl_nX
_3-nGroup, n = 1, 2, 3, X is a functional group), and the other end is a straight chain
Containing a chlorosilane-based surfactant having a linear fluorocarbon group
The heat-exchanger surface on the air-side heat transfer surface of the heat exchanger.
A step of reacting with the siloxane-based monomolecular film;
Remain on the heat transfer surface on the air side of the heat exchanger using organic solvent
A solution containing the unreacted chlorosilane-based surfactant
Washing and removing process and remaining chlorosilyl group reacted with water
And a chlorosilane-based surfactant.
Of a chemisorption monolayer consisting of heat transfer on the air side of the heat exchanger
Accumulating on the entire surface of the siloxane-based monolayer on the surface
Cleaning the heat transfer surface on the air side of the heat exchanger.
After the step of
The heat exchanger by applying a solution in which a plurality of substances are dissolved
The step of reacting with the hydroxyl groups on the surface of the air-side heat transfer surface of
After evaporating the solution, reacting with water
The chlorosilyl group on the air-side heat transfer surface of the heat exchanger is
It is converted to a diol group and the chemical absorption of siloxane polymer
The process of forming a film and chlorination at one end in a dry atmosphere
Silyl group (SiCl_nX_3-nWhere n = 1, 2, 3, X is
Functional group), a chloro group having a linear fluorocarbon group at the other end
The heat exchanger by applying a solution containing a silane-based surfactant
The surface of the heat transfer surface on the air side of the
And the heat exchanger using a non-aqueous organic solvent
Unreacted chlorosilanes remaining on the air-side heat transfer surface of
Washing away the solution containing the surfactant and the remaining
Reacting the lorsilyl group with water.
In front of a chemisorption monolayer consisting of a lorosilane-based surfactant
The siloxane-based monolayer on the surface of the heat transfer surface on the air side of the heat exchanger.
What is cumulatively formed on the entire molecular film or heat exchanger
After the step of cleaning the air-side heat transfer surface of, in a dry atmosphere,
Solution in which substances containing multiple chlorosilyl groups in the molecule are dissolved
Apply the hydroxyl groups on the surface of the heat transfer surface on the air side of the heat exchanger.
And a heat treatment using a non-aqueous organic solvent.
Contains unreacted material remaining on the air-side heat transfer surface of the exchanger
After washing and removing the solution,
Remove the chlorosilyl group on the air-side heat transfer surface of the heat exchanger.
Chemistry of siloxane-based polymer by converting it to a ranol group
The process of forming an adsorption film
Rusilyl group (SiCl _nX_3-nGroup, n = 1, 2, 3, X
Is a functional group) and the other end has a linear fluorocarbon group
Applying a solution containing a rosilane-based surfactant to the heat exchange
A step of reacting with a hydroxyl group on the surface of the heat transfer surface on the air side of the vessel,
After evaporating the solution, the remaining chlorosilyl groups were replaced with water.
And a step of reacting the chlorosilane-based surface active agent.
A chemical adsorption film made of a chemical agent is applied to the heat transfer surface on the air side of the heat exchanger.
On the surface of the siloxane-based polymer chemisorption film
What is cumulatively formed on the whole or on the air side of the heat exchanger
After the step of cleaning the hot surface, chlorsil
By applying a solution in which a substance containing multiple
React with the hydroxyl groups on the air-side heat transfer surface of the heat exchanger
And the air in the heat exchanger using a non-aqueous organic solvent.
Cleaning the solution containing unreacted substances remaining on the side heat transfer surface
After the removal, the step of reacting with water is carried out by the heat exchanger.
On the air-side heat transfer surface of the
To form a siloxane-based monolayer, and dry
In a dry atmosphere, a chlorsilyl group (SiCl_nX
_3-nGroup, n = 1, 2, 3, X is a functional group), and the other end is a straight chain
Containing a chlorosilane-based surfactant having a linear fluorocarbon group
The heat-exchanger surface on the air-side heat transfer surface of the heat exchanger.
The step of reacting with the siloxane-based monolayer,
After evaporating the liquid, the remaining chlorosilyl group was reacted with water.
The chlorosilane-based surfactant
The polymer-like chemisorption film on the air side of the heat exchanger.
The siloxane-based monolayer on the surface of the heat transfer surface
The product is formed by stacking, eliminating the adsorption tank and using a small amount of adsorption reagent.
Efficiently and efficiently on the air-side heat transfer surface of the heat exchanger
System chemisorption monomolecular film or polymer-like chemisorption film
Can be formed. In addition, heat transfer on the air side of the heat exchanger
Makes the surface of the hot surface evenly water-repellent, and also chemisorption single molecule
The membrane has high density and high adhesion strength, and the heat exchanger of the present invention
The frost phenomenon on the air-side heat transfer surface of the
Compared with the cloth method, it can be suppressed over 3 times longer
it can.

[Brief description of drawings]

FIG. 1 is a perspective view of a general fin tube type heat exchanger.

FIG. 2 is a conceptual cross-sectional view in which the surface of the heat exchanger according to the first embodiment of the present invention after cleaning the air-side heat transfer surface is enlarged to the molecular level.

FIG. 3 is a conceptual cross-sectional view in which the surface of the heat transfer surface on the air side of the heat exchanger according to the first embodiment of the present invention is chemically adsorbed on the surface of the fluorocarbon-based monomolecular film and the surface is enlarged to the molecular level.

FIG. 4 is a conceptual cross-sectional view in which the surface of the heat transfer surface on the air side of the heat exchanger in the first embodiment of the present invention is chemically adsorbed on the surface of the fluorocarbon-based polymer film and the surface is enlarged to a molecular level.

FIG. 5 is a conceptual cross-sectional view in which the air-side heat transfer surface of the heat exchanger according to the second embodiment of the present invention is cleaned and then the surface is enlarged to a molecular level.

FIG. 6 is a conceptual cross-sectional view in which the surface of the heat transfer surface of the heat exchanger in the second embodiment of the present invention is chemically adsorbed on the surface of the heat transfer surface on the air side and the surface is enlarged to the molecular level.

FIG. 7 is a conceptual cross-sectional view in which the inner layer film of the siloxane monomolecular film is chemically adsorbed on the surface of the heat transfer surface on the air side of the heat exchanger according to the second embodiment of the present invention, and the surface is enlarged to the molecular level.

FIG. 8 is a conceptual cross-sectional view in which the inner layer film of the polysiloxane film is chemically adsorbed on the surface of the heat transfer surface on the air side of the heat exchanger according to the second embodiment of the present invention, and the surface is enlarged to the molecular level.

FIG. 9 is a conceptual cross-sectional view in which the surface of the heat exchanger according to the second embodiment of the present invention is chemically adsorbed on the air-side heat transfer surface of the fluorocarbon-based monomolecular film to the molecular level.

FIG. 10 is a conceptual cross-sectional view in which the surface after the surface layer film of the fluorocarbon polymer film is chemically adsorbed on the heat transfer surface on the air side of the heat exchanger in the second embodiment of the present invention is enlarged to the molecular level.

[Explanation of symbols]

 5 Fluorocarbon type monomolecular film 5'Fluorocarbon type polymer film 13 Chlorosilane monomolecular film 14 Siloxane monomolecular film 14 'Polysiloxane film 15 Fluorocarbon type monomolecular film 15' Fluorocarbon type polymer film

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Norio Mino 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Kazumi Ogawa, 1006 Kadoma, Kadoma City Osaka Prefecture

Claims (14)

[Claims] 1. A chlorosilyl group (SiC) at one end in a dry atmosphere after the step of cleaning the air-side heat transfer surface of the heat exchanger.
1 _n X _3-n group, n = 1, 2, 3, and X is a functional group), and a solution containing a chlorosilane-based surfactant having a linear fluorocarbon group is applied to the other end to apply the heat exchange. A step of reacting with a hydroxyl group on the surface of the heat transfer surface on the air side of the reactor, and a solution containing the unreacted chlorosilane-based surfactant remaining on the heat transfer surface on the air side of the heat exchanger using a non-aqueous organic solvent And a step of reacting the remaining chlorosilyl group with water to form a chemisorption monomolecular film made of the chlorosilane-based surfactant over the entire surface of the heat transfer surface on the air side of the heat exchanger. Method for manufacturing heat exchanger. 2. After the step of cleaning the air-side heat transfer surface of the heat exchanger, a chlorosilyl group (SiC) is attached to one end in a dry atmosphere.
1 _n X _3-n group, n = 1, 2, 3, and X is a functional group), and a solution containing a chlorosilane-based surfactant having a linear fluorocarbon group is applied to the other end to apply the heat exchange. Consisting of a step of reacting with a hydroxyl group on the surface of the heat transfer surface on the air side of the vessel, a step of reacting the remaining chlorosilyl group with water after evaporating the solution, and comprising a polymer consisting of the chlorosilane-based surfactant. A method of manufacturing a heat exchanger, wherein a chemisorption film is formed over the entire surface of the heat transfer surface on the air side of the heat exchanger. 3. After the step of cleaning the air-side heat transfer surface of the heat exchanger, a solution of a substance containing a plurality of chlorosilyl groups in the molecule is applied in a dry atmosphere to coat the air side of the heat exchanger. A step of reacting with the hydroxyl group on the surface of the heat transfer surface, after washing and removing the solution containing the unreacted substance remaining on the air side heat transfer surface of the heat exchanger using a non-aqueous organic solvent, water The step of reacting to change the chlorosilyl group on the surface of the heat transfer surface on the air side of the heat exchanger to a silanol group to form a siloxane-based monomolecular film; and a chlorosilyl group (SiCl _n X _3-n group, n = 1, 2,
3, X is a functional group), and a solution containing a chlorosilane-based surfactant having a linear fluorocarbon group is applied to the other end, and the siloxane-based monolayer on the surface of the heat transfer surface on the air side of the heat exchanger is applied. A step of reacting with a molecular film, a step of washing and removing a solution containing the unreacted chlorosilane-based surfactant remaining on the air-side heat transfer surface of the heat exchanger using a non-aqueous organic solvent,
A step of reacting the remaining chlorosilyl group with water, and forming a chemisorption monolayer of the chlorosilane-based surfactant on the siloxane monolayer on the air-side heat transfer surface of the heat exchanger. Method for manufacturing a heat exchanger that is cumulatively formed in. 4. After the step of cleaning the air-side heat transfer surface of the heat exchanger, a solution of a substance containing a plurality of chlorosilyl groups in the molecule is applied in a dry atmosphere to coat the air side of the heat exchanger. The step of reacting with the hydroxyl groups on the surface of the heat transfer surface and the step of reacting with water after evaporating the solution change the chlorosilyl group on the surface of the heat transfer surface on the air side of the heat exchanger to a silanol group and form a siloxane. Step of forming a polymer-type chemical-adsorption film, and in a dry atmosphere, a chlorosilyl group (SiCl _n X _3-n group, n = 1, 2, 3, where X is a functional group) at one end, and the other end Applying a solution containing a chlorosilane-based surfactant having a linear fluorocarbon group to react with the siloxane-based polymeric chemisorption film on the surface of the air-side heat transfer surface of the heat exchanger, Air in the heat exchanger using a non-aqueous organic solvent Chemisorption consisting of the chlorosilane-based surfactant, which comprises a step of washing and removing a solution containing the unreacted chlorosilane-based surfactant remaining on the heat transfer surface and a step of reacting the remaining chlorosilyl group with water. A method for manufacturing a heat exchanger, wherein a monomolecular film is cumulatively formed on the entire surface of the air-side heat transfer surface of the heat exchanger on the chemisorption film of the siloxane-based polymer. 5. After the step of cleaning the air-side heat transfer surface of the heat exchanger, a solution of a substance containing a plurality of chlorosilyl groups in the molecule is applied in a dry atmosphere to coat the air side of the heat exchanger. A step of reacting with the hydroxyl group on the surface of the heat transfer surface, after washing and removing the solution containing the unreacted substance remaining on the air side heat transfer surface of the heat exchanger using a non-aqueous organic solvent, water The step of reacting to change the chlorosilyl group on the surface of the heat transfer surface on the air side of the heat exchanger to a silanol group to form a siloxane-based monomolecular film; and a chlorosilyl group (SiCl _n X _3-n group, n = 1, 2,
3, X is a functional group), and a solution containing a chlorosilane-based surfactant having a linear fluorocarbon group is applied to the other end, and the siloxane-based monolayer on the surface of the heat transfer surface on the air side of the heat exchanger is applied. Comprising a step of reacting with a molecular film and a step of reacting the remaining chlorosilyl group with water after evaporating the solution,
A method of manufacturing a heat exchanger, wherein a polymer-like chemical adsorption film made of the chlorosilane-based surfactant is cumulatively formed on the entire surface of the air-side heat transfer surface of the heat exchanger on the siloxane-based monomolecular film. 6. After the step of cleaning the air-side heat transfer surface of the heat exchanger, a solution of a substance containing a plurality of chlorosilyl groups in the molecule is applied in a dry atmosphere to coat the air side of the heat exchanger. The step of reacting with the hydroxyl groups on the surface of the heat transfer surface and the step of reacting with water after evaporating the solution change the chlorosilyl group on the surface of the heat transfer surface on the air side of the heat exchanger to a silanol group and form a siloxane. Step of forming a polymer-type chemical-adsorption film, and in a dry atmosphere, a chlorosilyl group (SiCl _n X _3-n group, n = 1, 2, 3, where X is a functional group) at one end, and the other end Applying a solution containing a chlorosilane-based surfactant having a linear fluorocarbon group to react with the siloxane-based polymeric chemisorption film on the surface of the air-side heat transfer surface of the heat exchanger, After evaporating the solution, the remaining chlorsili A step of reacting a group with water, wherein the polymer-based chemical adsorption film of the chlorosilane-based surfactant is formed on the air-side heat transfer surface of the heat exchanger. A method of manufacturing a heat exchanger that is cumulatively formed on the entire surface. 7. A chlorosilyl group at one end and a chlorosilyl group at the other end
Chlorosilane-based surfactant containing linear fluorocarbon group
As CF₃− (CF₂)_n-R_m-SiX _pCl
_3-p(N is 0 or an integer, R is an alkyl group or vinyl group
(C = C group), ethynyl group (C≡C group), aryl group,
Or a substituent containing silicon or an oxygen atom, m is 0 or
1, X is H, an alkyl group, an alkoxyl group, a fluorine-containing group
A substituent such as an alkyl group or a fluorine-containing alkoxyl group,
p is 0 or 1 or 2), any one of claims 1 to 6
A method for manufacturing a heat exchanger described therein. 8. A substance containing a plurality of chlorosilyl groups in the molecule, which may be SiCl4, SiHCl ₃ , or SiH ₂ C.
The method for manufacturing a heat exchanger according to claim 3, wherein one or more of l ₂ and Cl- (SiCl ₂ O) n-SiCl ₃ (n is an integer) is used. 9. The boiling point of the solvent of the solution containing a chlorosilane-based surfactant is 100 ° C. or higher, 1, 3, or 4.
A method for manufacturing the heat exchanger according to. 10. The boiling point of the solvent of the solution containing the chlorosilane-based surfactant is from room temperature to 100 ° C.
5. The method for manufacturing the heat exchanger according to 5 or 6. 11. The method for producing a heat exchanger according to claim 3, wherein the solvent of the solution for dissolving the substance containing a plurality of chlorosilyl groups in the molecule has a boiling point of 100 ° C. or higher. 12. The method for producing a heat exchanger according to claim 4, wherein the solvent of the solution for dissolving the substance containing a plurality of chlorosilyl groups in the molecule has a boiling point of room temperature or higher and 100 ° C. or lower. 13. The method for producing a heat exchanger according to claim 1, wherein the chemical adsorption step is performed in a low humidity atmosphere having a relative humidity of 30% or less. 14. The method of manufacturing a heat exchanger according to claim 1, further comprising the step of previously forming irregularities of submicron to micron order on the surface of the heat transfer surface on the air side of the heat exchanger.