JPH08190882A - Electron beam writer - Google Patents

Abstract

(57) [Abstract] [Purpose] To provide an electron beam writing apparatus capable of writing arbitrary patterns and having improved throughput. [Structure] For example, a plate type light source 10 in which a large number of fine electron guns 15 are formed on a silicon substrate 11 is used, and an electron beam from this light source is magnified or reduced to expose a photoreceptor.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron beam drawing apparatus having improved throughput.

[0002]

2. Description of the Related Art The electron beam (EB) direct writing technique is a very excellent method for forming a fine pattern, but its application is limited to device trial production because of its extremely slow throughput, and it is not suitable for mass production. It was only used for special devices.

As a technique for improving this drawback, "cell
A technique called "projection" or "block drawing" has been attracting attention in recent years. These technologies are for devices with many repeating patterns.Prepare an aperture with holes in the shape of the repeating pattern, shape the electron beam into a pattern by passing an electron beam through the holes in the aperture, and remove the resist. It is a batch exposure. It is said that this can significantly improve the throughput.

However, it cannot be applied to a pattern having a small number of repetitions such as an ASIC, and even when there are a large number of repeating patterns such as a DRAM, the peripheral portion which is not repeated is inevitably drawn by a variable shaped beam. There is a problem that throughput decreases.

A method called beam blanking has also been proposed. This is to prepare an aperture with a large number of holes and to electrically turn on and off the beam passing through it.
By doing so, a beam of arbitrary shape is produced, but it has not yet reached the practical range.

[0006]

As described above, although the improvement of the throughput by the conventional electron beam direct writing technique has been considerably advanced, it is still insufficient, and there is a problem particularly in the drawing of an arbitrary pattern. Many.

The present invention has been made in view of the above circumstances, and an object of the present invention is to provide an electron beam drawing apparatus which can cope with drawing an arbitrary pattern and have improved throughput.

[0008]

In order to achieve the above object, the present invention provides the following electron beam drawing apparatus. (1) In an electron beam drawing apparatus that irradiates a photosensitive member with an electron beam having a desired pattern to transfer the desired pattern to the photosensitive member, a fine electron gun that generates an electron beam is attached to the photosensitive member. It is provided with a flat plate type light source in which a plurality of patterns are arranged in a plane so as to have the same shape and the same size as a desired pattern to be transferred, and an electron beam emitted from the flat plate type light source is applied to a photosensitive member. An electron beam drawing device, which is characterized by double transfer. (2) In an electron beam drawing apparatus for irradiating a photosensitive member with an electron beam having a desired pattern to transfer the desired pattern to the photosensitive member, a fine electron gun for generating an electron beam is attached to the photosensitive member. An electron characterized by comprising a plurality of flat plate type light sources arranged in a pattern similar to a desired pattern to be transferred, and reducing and transferring an electron beam emitted from the flat plate type light source to a photoreceptor. Beam drawing device. (3) In an electron beam drawing apparatus that irradiates a photoconductor with a desired pattern of an electron beam to transfer the desired pattern onto the photoconductor, fine electron guns each generating an electron beam are arranged in a matrix. A flat plate type light source; and a light source control circuit for controlling the flat plate type light source to generate electron beams from a plurality of electron guns having a pattern similar to a desired pattern to be transferred to a photoreceptor An electron beam drawing apparatus, which reduces and transfers an electron beam emitted from a mold light source onto a photosensitive member. (4) In any one of the above (1) to (3), the fine electron gun has cathodes arranged in a matrix on a substrate and a gate electrode for controlling an electron beam emitted from the cathode. The electron beam writing apparatus described.

[0009]

The electron beam drawing apparatus of the present invention uses, for example, a flat plate type light source in which a large number of fine electron guns are formed on a silicon substrate in order to expose a photosensitive body over a wide area.
This is an application of the micro electron gun array developed for FED (Field Emission display) in recent years. Whereas the conventional method is to expose an object such as a resist by shaping the electron beam emitted from the light source with an aperture, etc., the pattern to be transferred to the object when it is emitted from the light source. To obtain a beam in the shape of.

For this reason, it is possible to achieve a high throughput, such as a wide transfer range, and in some cases, a flat type light source having the same size as the wafer can be used to perform 1 × exposure in one shot. Further, if a flat plate type light source in which a plurality of fine electron guns are arranged in a pattern similar to the transfer pattern is used, the electron beam of that shape can be reduced by the lens system and transferred to the photosensitive member, which is also wide. The range can be exposed at once.

Further, by using a flat plate type light source in which a plurality of fine electron guns are arranged in a matrix, an electron beam is generated from the plurality of electron guns in a pattern similar to a desired pattern to be transferred to a photosensitive body. Similar effects can be obtained by controlling the flat light source in this manner. In this case, it is possible to deal with a random pattern such as a wiring of a portion other than the repeating pattern.

[0012]

Embodiments of the present invention will be specifically described below with reference to the drawings. FIG. 1 is a sectional view showing an example of a flat plate type light source used in the electron beam exposure apparatus of the present invention.

This flat type light source 10 uses a substrate 11 such as a silicon substrate (semiconductor substrate), and micro electron guns 15 are formed in a matrix on the surface thereof.
In this flat panel light source 10, an insulating film 12 made of, for example, a silicon oxide film is formed on a substrate 11, and a gate electrode film 13 made of, for example, a polysilicon film, a polycide film, a tungsten film, etc. is formed on the insulating film 12. Has been formed. Cathode (emitter) 1 having holes formed in a matrix between the gate electrode 13 and the insulating film 12 and having a sharp tip formed of, for example, molybdenum in the holes.
4 are provided respectively. The gate electrode 13 and the cathode 14 form an electron gun 15.

Since such a flat plate type light source 10 can be formed on a silicon substrate or the like by using a lithography technique or the like, it is an assembly of extremely fine electron guns 15, and each electron gun 15 is arbitrary. Can be placed in the position. <First Embodiment> The electron beam drawing apparatus 1A of the present invention directly forms a pattern of the same size as the light source on the photoconductor from the flat plate light source. As shown in FIG. 2, the flat plate light source 10A and this light source are used. It has a simple configuration in which a stage 22 on which a photosensitive member 21 facing 10A is placed, an alignment device (not shown), and the like are arranged in a vacuum device (not shown).

In FIG. 2, a plurality of flat light sources 10A having a size capable of collectively exposing the entire surface of a photosensitive body 21 such as a wafer or a substrate for an LCD and having the same shape and size as a desired pattern. An electron gun is used, which is suitable for mainly forming holes. The flat plate type light source 10A may have a size of one to several chips and may be exposed by step-and-repeat. Needless to say, it may be formed in a unit of a repetitive pattern below that, but it is mechanically step-and-repeat, which is disadvantageous in throughput.

In this apparatus, it is desirable to provide a mechanism capable of replacing the light source so that the device can be changed. In use, a photosensitive body such as a wafer is loaded and aligned so as to be parallel to the flat plate type light source. With this device, the normal E
Unlike the B drawing, it does not have the function of oscillating the beam, so it is desirable to install an optical alignment device. In this way, a voltage is applied and the electron beam is simultaneously extracted from the electron gun to expose the resist 21a provided on the wafer or the like. Since the voltage of the light source 10A is about 100 V, it is necessary to narrow the gap between the light source 10A and the photoconductor 21. It is also possible to adopt a method in which an extraction electrode is separately provided and extraction is performed with high acceleration, and irradiation is performed.

According to the electron beam drawing apparatus of this embodiment,
By making the light source large, it is possible to draw a large area, the throughput is improved, and by replacing the flat light source, it is possible to transfer an arbitrary pattern. <Second Embodiment> FIG. 3 shows a configuration example of an electron beam drawing apparatus 1B according to the second embodiment. The apparatus itself has almost the same structure as a normal electron beam drawing apparatus except that the flat plate type light source 10 shown in FIG. 1 is used.

The flat light source used in the second embodiment is one in which an electron gun is arranged according to the device pattern. In the apparatus of this embodiment, the flat light source can be replaced for each device or layer. The electron beam emitted from the electron gun is extracted with high acceleration by the extraction electrode, the accelerated electron beam is deflected and reduced by the lens system, and the resist or the like is exposed.

In the first embodiment, the target is mainly the hole pattern because the exposure is the same size exposure, and it is difficult to form a fine pattern even when the electron guns are arranged close to each other. However, in the second embodiment, it is reduced. Therefore, it is possible to draw an arbitrary fine pattern. The flat-plate light source is configured by arranging a plurality of electron guns on a plane in a pattern having an element isolation (LOCOS) pattern, an electrode (POLY) pattern, etc., which is several times to several tens of times larger than the actual size. FIG. 4 shows an arrangement example of the electron guns 15 in the flat panel light source 10B used in this example. As shown in FIG. 4, the arrangement pattern of the electron guns 15 of the flat panel light source 10B and the resist pattern have a mirror-symmetrical relationship. Using such a light source 10B, the resist is exposed by being reduced by a lens system to obtain a resist pattern having the shape of the arrangement pattern of the electron gun 15. The light source is set within a range of several chips from the minimum repeating unit. After forming, a light source is prepared for each pattern. In this case, it goes without saying that the replacement of the light source can be automated. It is desirable to provide a dedicated electron gun for alignment.

According to the electron beam drawing apparatus of this embodiment,
Since an arbitrary pattern can be formed and the light source is replaced and used as if the mask of the optical stepper is replaced, it can be manufactured with high accuracy by the existing electron beam drawing apparatus. <Third Embodiment> The electron beam drawing apparatus of this embodiment is shown in FIG.
A flat plate light source 10C in which a large number of electron guns 15 as shown in FIG.
A light source control circuit (not shown) is provided to control 0C and generate an electron beam from a portion of the electron gun 15 (shown by a white circle in the figure) that is similar in shape to the desired pattern to be transferred to the photosensitive body. Except for this, the configuration is almost the same as that of the second embodiment shown in FIG.

The light source control circuit controls the individual electron guns 15 of the flat panel light source 10C, and turns the electron guns on and off so that the device pattern is projected on the display.
Let it. Then, the beam shaped into a device pattern is reduced by a lens system to expose the resist.

According to the electron beam drawing apparatus of this embodiment,
Unlike the first and second embodiments, it is not necessary to replace the light source, rapid exposure is possible, and unlike the cell projection method described above, an arbitrary pattern can be collectively exposed. The present invention is not limited to the above embodiment. For example, the flat plate type light source is not limited to the one described above as long as a large number of fine electron guns can be arranged, and various modifications can be made without departing from the scope of the present invention.

[0023]

According to the electron beam exposure apparatus of the present invention,
A high throughput can be achieved, and a delayed electron beam writing apparatus can be put to practical use. Further, it can be applied to any pattern shape and can be applied not only to a memory but also to an ASIC or the like.

[Brief description of drawings]

FIG. 1 is a cross-sectional view showing an example of a flat plate type light source used in an electron beam drawing apparatus of the present invention.

FIG. 2 is a configuration diagram showing an example of an electron beam drawing apparatus according to a first embodiment of the present invention.

FIG. 3 is a configuration diagram showing an example of an electron beam drawing apparatus according to second and third embodiments of the present invention.

FIG. 4 is a plan view showing an arrangement example of electron guns in a flat plate type light source used in a second embodiment of the present invention.

FIG. 5 is a plan view showing an arrangement example of electron guns in a flat plate type light source used in a third embodiment of the present invention.

[Explanation of symbols]

 1A, 1B Electron beam drawing apparatus 10, 10A, 10B, 10C Flat type light source 11 Conductive substrate 12 Insulating film 13 Gate electrode 14 Cathode 15 Electron gun 21 Photosensitive body 22 Stage

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Claims (4)

[Claims] 1. In an electron beam drawing apparatus for irradiating a photoconductor with a desired pattern of an electron beam to transfer the desired pattern onto the photoconductor, fine electron guns each generating an electron beam are exposed to light. A plurality of flat plate type light sources are arranged in a plane in a pattern having the same shape and the same size as a desired pattern to be transferred to the body, and an electron beam emitted from the flat plate type light source is received. An electron beam drawing apparatus, which transfers the image to the same size. 2. An electron beam drawing apparatus for irradiating a photosensitive member with an electron beam having a desired pattern to transfer the desired pattern to the photosensitive member, each of which is provided with a fine electron gun which produces an electron beam. A plurality of flat-plate light sources arranged in a pattern similar to a desired pattern to be transferred to the body, and electron beams emitted from the flat-plate light sources are reduced and transferred to a photosensitive body. Electron beam writer. 3. An electron beam drawing apparatus for irradiating a photosensitive member with an electron beam having a desired pattern to transfer the desired pattern to the photosensitive member, wherein fine electron guns each generating an electron beam are arranged in a matrix. And a light source control circuit that controls the flat light source and generates an electron beam from a plurality of electron guns having a pattern similar to a desired pattern to be transferred to the photoconductor, An electron beam drawing apparatus characterized by reducing and transferring an electron beam emitted from the flat plate type light source onto a photosensitive body. 4. The fine electron gun has cathodes arranged in a matrix on a substrate, and a gate electrode for controlling an electron beam emitted from the cathode. Electron beam writer.