JPH08197675A - Silicon oxide vapor deposition film and method for producing the same - Google Patents

Abstract

(57) [Abstract] [Purpose] The bonding state of silicon (Si) atoms and oxygen (O) atoms in a silicon oxide vapor deposition film vapor-deposited on a plastic film is more completely adjusted, and a stable and sufficient silicon oxide vapor deposition film is obtained. It is to obtain oxygen barrier property and water vapor barrier property and to obtain higher transparency. [Structure] Low oxygen permeability and low water vapor permeability are imparted by coating hydrogen peroxide 3 on the surface of a vapor-deposited film 2 of a plastic film or sheet 1 on which silicon oxide is vapor-deposited.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a silicon oxide vapor deposition film having a plastic film or sheet provided with a vapor deposition surface of silicon oxide and a method for producing the same.

[0002]

2. Description of the Related Art The above-mentioned silicon oxide vapor deposition film is a barrier film (a film having a low gas permeability of oxygen and the like and a low water vapor permeability) of a polyester film vacuum deposited on a polyester film. Is used as a packaging material film for hermetic packaging, and a barrier film obtained by vacuum-depositing transparent silicon oxide on a transparent polyester film is used as a packaging material film for hermetic packaging having a transparent and barrier property. ing.

The above-mentioned silicon oxide vapor-deposited film is, for example, a packaging material for medical and pharmaceutical products which requires high oxygen barrier property, water vapor barrier property or high transparency, snack food,
It is widely used as a packaging material for retort foods, foods for microwave ovens, etc., or as a packaging material requiring a delicate color tone in printing or the like.

[0004]

The conventional silicon oxide vapor-deposited film described above is obtained by vacuum-depositing silicon oxide in a thin film onto a polyester film to form silicon oxide (SiO _x ; eg x).
= 1.5 to 1.6), a vapor deposition film of
If the silicon (Si) atoms and the oxygen (O) atoms are vapor-deposited in an incompletely bonded state in the silicon oxide vapor-deposited film, the vapor-deposited film may not have sufficient oxygen barrier properties and water vapor barrier properties. .

As described above, the conventional vapor-deposited silicon oxide film has an incompletely bonded vapor-deposited film, and has, for example, an oxygen permeability of 1.5 to 3.0 cc / m ² / day and a water vapor permeability of 1. The barrier property is likely to become unstable due to variations in the range of 5 to 3.5 g / m ² / day,
For example, it is not suitable for packaging materials such as bonito flakes and seaweed, which require extremely high barrier properties.

Further, when a silicon (Si) atom and an oxygen (O) atom are vapor-deposited on a transparent polyester film in an incompletely bonded state, the transparent silicon oxide vapor-deposited film 2 is slightly colored such as yellowish. However, there is a problem in that the transparency of the silicon oxide vapor-deposited film is lowered, and therefore the advantages of a transparent barrier film having both high transparency and high barrier property cannot be fully utilized.

It is an object of the present invention to more completely adjust the bonding state of silicon (Si) atoms and oxygen (O) atoms in a silicon oxide vapor deposition film vapor-deposited on a film, thereby providing a stable and sufficient silicon oxide vapor deposition film. To obtain high oxygen barrier property and water vapor barrier property and to obtain higher transparency.

[0008]

The present invention has a low oxygen permeability and a low water vapor permeability by coating hydrogen peroxide 3 on the surface of a vapor-deposited film 2 of a plastic film or sheet 1 on which silicon oxide is vapor-deposited. It is a silicon oxide vapor deposition film characterized in that.

Further, the present invention is characterized in that after depositing silicon oxide on a plastic film or sheet 1 to obtain a silicon oxide vapor deposition film 2, the surface of the vapor deposition film 2 is coated with hydrogen peroxide 3. It is a manufacturing method of a silicon oxide vapor deposition film.

[0010]

EXAMPLE As shown in the side sectional view of FIG. 1, the silicon oxide vapor deposition film of the present invention has a silicon oxide (SiO _x ) vapor deposition film 2 formed on at least one surface of a plastic film 1 (or sheet). Is.

The silicon oxide vapor deposition film of the present invention will be described below.
A detailed description will be given according to examples.

In the present invention, the plastic film or sheet is not particularly limited, and polyesters such as polyethylene terephthalate (PET), polybutylene terephthalate, polyethylene-2,6-naphthalate, polyamide, polyimide, polyacrylonitrile, etc. There are films made of, for example, polycarbonate, polystyrene, polypropylene, saponified products of ethylene-vinyl acetate copolymer, polyvinyl alcohol, aromatic polyamide, and fluororesin, or laminated films containing one or more of these, and uniaxial It may be a stretched or biaxially stretched film.

The thickness of the plastic film 1 is not particularly limited and may be selected according to the intended use of the finally obtained silicon oxide vapor-deposited film of the present invention, for example, in the range of 12 to 300 μm. Is appropriate,
It is preferably 20 to 100 μm.

In the present invention, the silicon oxide vapor deposition film 2 formed on one surface of the plastic film (or sheet) is formed by a vapor deposition method such as vacuum vapor deposition, ion plating, sputtering and plasma CVD. There is.

The thickness of the silicon oxide vapor deposition film 2 is selected according to the thickness of the plastic film 1 and the purpose of use of the finally obtained silicon oxide vapor deposition film of the present invention. The range of 30 to 5000Å is desirable, and the range of 200 to 1000Å is preferable.

In this way, the silicon oxide vapor deposition film of the present invention in which the silicon oxide vapor deposition film 2 is formed on the surface of the plastic film 1 has the hydrogen peroxide 3 (hydrogen peroxide solution) on the vapor deposition surface of the silicon oxide vapor deposition film 2. Is a film (or sheet) having a further improved oxygen barrier property and water vapor barrier property by oxidizing the vapor-deposited film 2 by coating (1).

The hydrogen peroxide 3 used is an aqueous solution of hydrogen peroxide (boiling point 151.4 ° C.),
The hydrogen peroxide concentration of the aqueous solution is not particularly limited, but is, for example, a hydrogen peroxide concentration of 3 to 35% aqueous solution, and is preferably 20 to 30% aqueous solution from the viewpoint of both the coating effect with hydrogen peroxide and the handling and workability. Is appropriate.

In order to uniformly coat the hydrogen peroxide solution and to secure a predetermined coating film thickness, a viscous water-soluble resin liquid such as polyvinyl alcohol is added as a binder for coating. You may do it.

As the coating device, an appropriate coater such as a gravure coater, a roll coater, a reverse coater or a dipping dipping coater can be used.

Specific examples of the silicon oxide vapor deposition film of the present invention and the method for producing the same will be described below.

Example 1 First, on one surface of a polyethylene terephthalate film 1, a silicon oxide vapor deposition film 2 having a vapor deposition film thickness of 1000 Å was formed by a vacuum vapor deposition method using silicon oxide (eg, silicon monoxide) as a vapor deposition material source. (SiO _x vapor deposition film, x = 1.5 to 1.6) was deposited to obtain a silicon oxide vapor deposition film.

Next, the surface of the vapor-deposited film 2 of the vapor-deposited silicon oxide film was coated with hydrogen peroxide solution (30% hydrogen peroxide aqueous solution) using a roll coater.

Then, at a predetermined temperature (for example, 20 ° C. to 100 ° C.).
C.) for a predetermined time (for example, 1 day to several days) and left in a dark place (dark room) or a place with a predetermined brightness, and the silicon oxide vapor deposition film 2 is oxidized and aged with hydrogen peroxide (H ₂ O ₂ ). By doing so, a silicon oxide vapor deposition film of the present invention was obtained.

On the other hand, on one surface of the polyethylene terephthalate film 1, silicon oxide (for example,
Vapor deposition film thickness of 1 using silicon monoxide)
000Å silicon oxide vapor deposition film 2 (SiO _x vapor deposition film, x =
1.5 to 1.6), and the obtained silicon oxide vapor-deposited film is coated at a predetermined temperature (for example, 2
A conventional product was left at 0 ° C. to 100 ° C. for a predetermined time (for example, one day to several days) in a dark place (dark room) or a place having a predetermined brightness.

Regarding the above-mentioned silicon oxide vapor-deposited film of the present invention to which hydrogen peroxide was applied and the above-mentioned conventional silicon oxide vapor-deposited film to which hydrogen peroxide was not applied, oxygen permeability (cc / m ₂ / day) and water vapor were respectively obtained. Transmittance (g / m
₂ / day) is shown below.

Oxygen permeability Water vapor permeability Product of the present invention 0.73 2.32 Conventional product 2.46 3.20

From the above, the silicon oxide vapor-deposited film of the present invention has an oxygen permeability improved by about 70% as compared with the conventional product and a water vapor permeability improved by about 28% as compared with the conventional product. It was confirmed that the sexuality was improved.

When hydrogen peroxide is applied to the silicon oxide vapor-deposited film after vapor deposition of silicon oxide in the above-mentioned Example 1, in-line printing is performed during the printing step for appropriately printing the silicon oxide vapor-deposited film. A hydrogen peroxide solution may be coated on the surface of the vapor-deposited film 2 of the silicon oxide vapor-deposited film by using a coating device provided (for example, a gravure printer).

[0029]

A silicon oxide vapor deposition film and a method for producing the same according to the present invention are provided by coating a surface of a silicon oxide vapor deposition film 2 of a plastic film 1 (or sheet) with hydrogen peroxide solution 3 and using the hydrogen peroxide to deposit the silicon oxide vapor deposition film. Oxidize two sides,
Since the bonded state of silicon (Si) and oxygen (O) in the vapor deposition film 2 is adjusted to a more complete bonded state, this has the effect of lowering the oxygen permeability and water vapor permeability of the silicon oxide vapor deposited film. Occurs.

The silicon oxide vapor-deposited film of the present invention is a high-barrier silicon oxide vapor-deposited film because the oxygen barrier property and the water vapor barrier property are further enhanced by the reduction of the oxygen permeability and the water vapor permeability.

The silicon oxide vapor deposition film 2 formed on the plastic film 1 (or sheet) is slightly yellow when the silicon (Si) atoms and the oxygen (O) atoms are vapor-deposited in an incompletely bonded state. Although exhibiting coloring such as taste, a transparent film (or sheet) is used as the plastic film 1 (or sheet), and a silicon oxide vapor deposition film 2 is formed on the surface thereof.
After forming the film, by applying hydrogen peroxide to the surface of the vapor-deposited film 2, the silicon (Si) atoms and the oxygen (O) atoms are arranged in a more complete bonded state. The coloring on the two surfaces is eliminated, which has the effect of increasing the transparency.

The silicon oxide vapor-deposited film of the present invention has a high transparency on the surface of the silicon oxide vapor-deposited film 2 as described above and becomes a highly transparent silicon oxide vapor-deposited film.

[0033]

INDUSTRIAL APPLICABILITY The silicon oxide vapor-deposited film and the method for producing the same of the present invention can have a higher gas barrier property and water vapor barrier property than conventional silicon oxide vapor-deposited films,
Eliminates the yellow tint of conventional silicon oxide vapor-deposited films, which could not fully utilize the advantages of a transparent barrier film packaging material because the contents of the package appear to be colored yellowish rather than the original color tone. Therefore, it has an effect of further improving transparency, and is effective as a packaging material that requires high gas barrier properties and water vapor barrier properties, and as a packaging material that requires high gas barrier properties, water vapor barrier properties, and high transparency.

[Brief description of drawings]

FIG. 1 is a side sectional view of a silicon oxide vapor deposition film of the present invention.

[Explanation of symbols]

1 ... Plastic film (or sheet) 2 ... Silicon oxide vapor deposition film 3 ... Hydrogen peroxide solution

Claims (2)

[Claims] 1. A silicon oxide vapor deposition, characterized by having a low oxygen permeability and a low water vapor permeability by coating hydrogen peroxide 3 on the vapor deposition film 2 surface of a plastic film or sheet 1 on which silicon oxide is vapor deposited. the film. 2. A silicon oxide vapor deposition film, characterized in that after depositing silicon oxide on a plastic film or sheet 1 to obtain a silicon oxide vapor deposition film 2, the surface of the vapor deposition film 2 is coated with hydrogen peroxide 3. Manufacturing method.