JPH08273580A - Electronic probe micro analyzer with automatic focusing mechanism - Google Patents

Electronic probe micro analyzer with automatic focusing mechanism

Info

Publication number
JPH08273580A
JPH08273580A JP7075905A JP7590595A JPH08273580A JP H08273580 A JPH08273580 A JP H08273580A JP 7075905 A JP7075905 A JP 7075905A JP 7590595 A JP7590595 A JP 7590595A JP H08273580 A JPH08273580 A JP H08273580A
Authority
JP
Japan
Prior art keywords
sample
automatic focusing
control signal
reflected light
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7075905A
Other languages
Japanese (ja)
Other versions
JP3217637B2 (en
Inventor
Tomohito Notoya
能登谷智史
Masaki Saito
斉藤昌樹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP07590595A priority Critical patent/JP3217637B2/en
Publication of JPH08273580A publication Critical patent/JPH08273580A/en
Application granted granted Critical
Publication of JP3217637B2 publication Critical patent/JP3217637B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

(57)【要約】 【目的】 測定時間の増大やステージの無用な発散を防
いで測定を行えるようにする。 【構成】 試料面に光を入射させてその反射光を検出す
る検出手段と、検出手段による位置制御信号、及び追従
制御信号により試料ステージ駆動機構を制御して試料を
合焦位置に移動させる自動焦点合わせ手段と、合焦点位
置において電子線を試料に照射したときに発生する特性
X線を検出する測定手段とを備えた自動焦点合わせ機構
付き電子プローブマイクロアナライザにおいて、前記自
動焦点合わせ手段は、追従制御信号により、試料からの
反射光のレベルに応じて試料ステージ駆動機構の制御を
ON/OFFすることを特徴とする。
(57) [Abstract] [Purpose] To prevent the increase of measurement time and unnecessary divergence of the stage so that measurement can be performed. [Constitution] Automatically moving a sample to a focus position by controlling a sample stage drive mechanism by a detection means for making light incident on a sample surface and detecting the reflected light, and a position control signal and a tracking control signal by the detection means. In an electronic probe microanalyzer with an automatic focusing mechanism, which comprises a focusing means and a measuring means for detecting a characteristic X-ray generated when the sample is irradiated with an electron beam at a focus position, the automatic focusing means comprises: The tracking control signal turns on / off the control of the sample stage drive mechanism according to the level of the reflected light from the sample.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、自動焦点合わせ機構を
備えた電子プローブマイクロアナライザに関する。
FIELD OF THE INVENTION The present invention relates to an electronic probe microanalyzer having an automatic focusing mechanism.

【0002】[0002]

【従来の技術】波長分散型X線分光器(WDS)を備え
た電子プローブマイクロアナライザ(EPMA)におい
ては、分析点、分光結晶の中心、検出器スリットがロー
ランド円と呼ばれる一つの円上に位置している必要があ
る。このため、試料(分析点)を上下させてローランド
円上に乗せるために、光学顕微鏡を用いて位置合わせす
る方法が取られている。また近年、この光学顕微鏡を用
いた試料合わせのために、自動焦点合わせ機構を組み込
み、試料表面の合焦位置からのズレの向きや量などを計
り、その情報を基に試料の上下位置(Z位置)を自動で
調節し、試料の高さの変化に応じて常に試料表面(分析
点)をX線光学系の集光位置に合わせ続ける(追従動作
をする)ものがある。これにより、試料を水平方向
(X,Y方向)に駆動しながら、連続的に測定信号をサ
ンプリングし、試料上の直線的(線分析)または二次元
的(面分析)な信号の分布を得ることができる。
2. Description of the Related Art In an electron probe microanalyzer (EPMA) equipped with a wavelength dispersive X-ray spectrometer (WDS), an analysis point, a center of a dispersive crystal, and a detector slit are located on one circle called a Roland circle. Need to be For this reason, in order to move the sample (analysis point) up and down and place it on the Rowland circle, a method of aligning with an optical microscope is adopted. Further, in recent years, for the purpose of aligning a sample using this optical microscope, an automatic focusing mechanism is incorporated to measure the direction and amount of deviation from the in-focus position of the sample surface, and based on this information, the vertical position of the sample (Z There is a method in which the position) is automatically adjusted, and the sample surface (analysis point) is always kept aligned (following operation) with the focus position of the X-ray optical system according to the change in the height of the sample. As a result, the measurement signal is continuously sampled while driving the sample in the horizontal direction (X, Y directions) to obtain a linear (line analysis) or two-dimensional (area analysis) signal distribution on the sample. be able to.

【0003】[0003]

【発明が解決しようとする課題】一般的に、自動焦点合
わせ機構は試料からの反射光を用いてZ位置を制御する
ので、試料を水平方向に駆動している際に、試料上の反
射率が変化して急激に低くなると、その点で自動焦点合
わせ機構が合焦位置やズレの方向と量を認識できなくな
る場合がある。この状態で焦点合わせ動作を続けようと
すると、合焦するまでに非常に時間がかかって、全体の
測定時間が不自然に長くなったり、場合によって自動焦
点合わせ動作が発散して、Z方向の移動可能な限界まで
達して危険な場合がある。したがって、試料上で反射率
が大きく変化している試料への対応は困難である。本発
明はかかる事情に鑑みてなされたもので、測定時間の増
大やステージの無用な発散を防ぐことのできる自動焦点
合わせ機構付き電子プローブマイクロアナライザを提供
することを目的とする。
Generally, since the automatic focusing mechanism controls the Z position by using the reflected light from the sample, when the sample is driven in the horizontal direction, the reflectance on the sample is reduced. If the value changes rapidly and the value drops sharply, the automatic focusing mechanism may not be able to recognize the focus position or the direction and amount of the shift at that point. If you try to continue the focusing operation in this state, it takes a very long time to focus, and the overall measurement time becomes unnaturally long, or in some cases the automatic focusing operation diverges, causing It may be dangerous to reach the limit of movement. Therefore, it is difficult to deal with a sample whose reflectance changes greatly on the sample. The present invention has been made in view of such circumstances, and an object of the present invention is to provide an electronic probe microanalyzer with an automatic focusing mechanism that can prevent an increase in measurement time and unnecessary divergence of a stage.

【0004】[0004]

【課題を解決するための手段】本発明は、試料面に光を
入射させてその反射光を検出する検出手段と、検出手段
による位置制御信号、及び追従制御信号により試料ステ
ージ駆動機構を制御して試料を合焦位置に移動させる自
動焦点合わせ手段と、合焦点位置において電子線を試料
に照射したときに発生する特性X線を検出する測定手段
とを備えた自動焦点合わせ機構付き電子プローブマイク
ロアナライザにおいて、前記自動焦点合わせ手段は、追
従制御信号により、試料からの反射光のレベルに応じて
試料ステージ駆動機構の制御をON/OFFすることを
特徴とする。
According to the present invention, a sample stage driving mechanism is controlled by a detecting means for making light incident on a sample surface and detecting the reflected light, a position control signal by the detecting means, and a follow-up control signal. Electron probe micro with an automatic focusing mechanism including automatic focusing means for moving the sample to the in-focus position and measuring means for detecting characteristic X-rays generated when the sample is irradiated with the electron beam at the in-focus position. In the analyzer, the automatic focusing means turns ON / OFF the control of the sample stage drive mechanism according to the level of the reflected light from the sample by the follow-up control signal.

【0005】[0005]

【作用】本発明は、自動焦点合わせ機構を持つEPMA
において、試料を駆動しながら連続的に測定信号をサン
プリングする際に、試料の反射率に応じて試料位置の追
従動作やステージのZ位置を制御し、測定時間の増大や
ステージ動作の無用な発散を防ぐことが可能となる。
The present invention is an EPMA having an automatic focusing mechanism.
In the case of continuously sampling the measurement signal while driving the sample, the sample position tracking operation and the Z position of the stage are controlled according to the reflectance of the sample to increase the measurement time and unnecessary divergence of the stage operation. Can be prevented.

【0006】[0006]

【実施例】図1は本発明の構成例を示す図である。図
中、1は電子線、2は試料、3は特性X線、4はWD
S、5は分光結晶、6は検出器、7はWDS測定系、8
は光学顕微鏡照明、9aは入射光、9bは反射光、10
は光学顕微鏡、11はセンサ、12は自動焦点装置、1
3はステージ駆動機構、14はステージ、15はコント
ローラ、16は測定制御装置である。図において、電子
線1を試料2に照射すると特性X線3が発生し、WDS
4に入射する。WDS4においては、特性X線3は分光
結晶5で分光され、検出器6で検出されてWDS測定系
7(増幅器、タイマ、カウンタ等で構成)で計数され
る。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a diagram showing a configuration example of the present invention. In the figure, 1 is an electron beam, 2 is a sample, 3 is a characteristic X-ray, and 4 is a WD.
S, 5 is a dispersive crystal, 6 is a detector, 7 is a WDS measurement system, 8
Is an optical microscope illumination, 9a is incident light, 9b is reflected light, 10
Is an optical microscope, 11 is a sensor, 12 is an autofocus device, 1
3 is a stage drive mechanism, 14 is a stage, 15 is a controller, and 16 is a measurement controller. In the figure, when the sample 2 is irradiated with the electron beam 1, the characteristic X-ray 3 is generated, and the WDS
It is incident on 4. In the WDS 4, the characteristic X-rays 3 are separated by the dispersive crystal 5, detected by the detector 6, and counted by the WDS measuring system 7 (composed of an amplifier, a timer, a counter, etc.).

【0007】一方、自動焦点装置12は光学顕微鏡照明
8により入射光9aを試料2に入射し、反射した反射光
9bを光学顕微鏡10を通してセンサ11に導く。セン
サ11からは位置制御信号、追従制御信号が出力され、
自動焦点位置12はステージ駆動機構13を介してステ
ージ14を駆動する。位置制御信号は、試料の合焦位置
からのズレの方向やズレ量に基づき、試料ステージをど
ちらの方向にどれだけ動かすかを指定するための制御信
号である。また、追従制御信号は、試料からの反射光の
強さに応じて、あるスレッショルド以上だったら追従を
ONにし、未満だったら追従をOFFにするような制御
信号である。
On the other hand, the automatic focusing device 12 makes the incident light 9a incident on the sample 2 by the optical microscope illumination 8 and guides the reflected light 9b reflected to the sensor 11 through the optical microscope 10. A position control signal and a tracking control signal are output from the sensor 11,
The autofocus position 12 drives the stage 14 via the stage drive mechanism 13. The position control signal is a control signal for designating in which direction and how much the sample stage is moved, based on the direction and amount of deviation from the in-focus position of the sample. Further, the follow-up control signal is a control signal that turns on the follow-up when the threshold value is above a certain threshold and turns off the follow-up control signal when it is below a certain threshold according to the intensity of the reflected light from the sample.

【0008】位置制御信号と追従制御信号を出力するセ
ンサ11は、例えば、試料面からの反射光を2光路に分
割してラインセンサに入射させるようにし、試料が合焦
点位置にあるときの、一方の光路における光学系による
結像位置と、他方の光路における光学系による結像位置
が、互いにラインセンサの反対側で、同じ距離になるよ
うにしておき、試料面の高さの変化により、両光路にお
けるラインセンサへの入射光強度が、一方が増えれば他
方が減るように変化するので、その差信号を位置制御信
号とし、また、反射光強度の変化により両光路において
受光される光量は等しく変化するので、その信号を追従
制御信号とするもので構成することができる。また、セ
ンサ11としては、レーザビームを試料面に斜め入射さ
せて試料面の高さを反射ビームの角度変化に変換し、そ
の角度変化をラインセンサで検出して位置制御信号と
し、反射ビームの一部をフォトマルチプライヤで受光し
て反射光強度に応じた電気信号に変換して追従制御信号
とするものでもよい。
The sensor 11 which outputs a position control signal and a tracking control signal, for example, splits the reflected light from the sample surface into two optical paths and makes it enter the line sensor, and when the sample is at the in-focus position, The image forming position of the optical system in one optical path and the image forming position of the optical system in the other optical path are set to the same distance on the opposite side of the line sensor from each other, and the height of the sample surface changes. Since the intensity of light incident on the line sensor in both optical paths changes so that if one increases, the other decreases, the difference signal is used as a position control signal, and the amount of light received in both optical paths is changed by the change in reflected light intensity. Since it changes equally, the signal can be used as a tracking control signal. Further, as the sensor 11, the laser beam is obliquely incident on the sample surface, the height of the sample surface is converted into an angle change of the reflected beam, and the angle change is detected by a line sensor to be used as a position control signal. A part of the light may be received by a photomultiplier and converted into an electric signal according to the intensity of reflected light to be used as a tracking control signal.

【0009】分析点のステージ駆動機構13は、分析点
の入力時などに、コントローラ15からの手動操作によ
っても駆動される。なお、電子線1の光軸は光学顕微鏡
10の光軸と一致し、WDS4の焦点も光学顕微鏡10
の焦点と一致するように調整されている。測定制御装置
16は、自動焦点装置12を駆動制御し、また、自動焦
点装置12から合焦したか否かの信号を受け取り、合焦
するとWDS測定系7の計数を開始する。また、ステー
ジ駆動機構13の駆動制御をしている。
The analysis point stage drive mechanism 13 is also driven by a manual operation from the controller 15 when an analysis point is input. The optical axis of the electron beam 1 coincides with the optical axis of the optical microscope 10, and the focus of the WDS 4 is also the optical microscope 10.
Is adjusted to match the focus of the. The measurement control device 16 drives and controls the automatic focusing device 12, receives a signal indicating whether or not focusing is performed from the automatic focusing device 12, and starts counting of the WDS measuring system 7 when focusing is performed. Further, the drive control of the stage drive mechanism 13 is performed.

【0010】次に、図2を参照して面分析の場合を例に
とって本発明の動作について説明する。図2は自動焦点
装置による追従制御のタイミングを説明する図である。
実際の測定時には、ステージ駆動機構13によりステー
ジ14をある方向に駆動しながら、自動焦点装置12に
より常に試料2上の分析点と分光結晶5の中心と検出器
6のスリットの中心が成すローランド円上に位置するよ
うに制御を行い、同時にWDS測定系7により連続的に
サンプリングを行う。例えば、図2(a)に示すよう
に、試料表面上に斜線で示す2つの暗部領域があったと
し、測定走査ラインがこの領域を通るようなものであっ
たとすると、反射光強度に基づく追従制御用センサ信号
は、図2(b)に示すように変化する。この追従制御用
センサ信号が閾値より大きいか小さいかに応じて、図2
(c)に示すように、自動焦点合わせ装置は追従機能を
ON/OFFする。このような制御により、試料表面の
反射率が小さくなり、センサが位置を正しく読みとれな
くなっても自動焦点装置はZ位置を動かさない。試料の
反射率が回復し、センサへの信号が閾値を超えたら再び
追従動作を開始する。これにより、測定時間の増大やス
テージ動作の無用な発散を防ぎ、速やかで、かつ安全に
測定を行うことができる。
Next, the operation of the present invention will be described with reference to FIG. 2 by taking the case of surface analysis as an example. FIG. 2 is a diagram for explaining the timing of tracking control by the automatic focusing device.
At the time of actual measurement, while the stage driving mechanism 13 drives the stage 14 in a certain direction, the automatic focusing device 12 constantly forms the Roland circle formed by the analysis point on the sample 2, the center of the dispersive crystal 5, and the center of the slit of the detector 6. Control is performed so as to be positioned above, and at the same time, continuous sampling is performed by the WDS measurement system 7. For example, as shown in FIG. 2A, if there are two dark areas indicated by diagonal lines on the sample surface and the measurement scan line passes through these areas, the tracking based on the reflected light intensity is performed. The control sensor signal changes as shown in FIG. Depending on whether the sensor signal for tracking control is larger or smaller than the threshold value, FIG.
As shown in (c), the automatic focusing device turns on / off the tracking function. By such control, the reflectance of the sample surface becomes small, and even if the sensor cannot read the position correctly, the automatic focusing device does not move the Z position. When the reflectance of the sample is recovered and the signal to the sensor exceeds the threshold value, the tracking operation is started again. As a result, it is possible to prevent an increase in measurement time and unnecessary divergence of stage operation, and to perform measurement quickly and safely.

【0011】なお、上記説明では、追従制御用センサ信
号の閾値を固定値としたが、測定する試料や目的に応じ
て可変してもよい。また、上記例では、試料上の反射率
が低くなったときには、単純に追従動作をOFFとし、
ステージのZ位置を動かさないようにしたが、試料の反
射率がある閾値より低くなった時点で、ある1点(例え
ばZ方向の駆動範囲の中心など)に戻すように、動作開
始の位置を任意に選べるようにしてもよい。
In the above description, the threshold value of the tracking control sensor signal is a fixed value, but it may be varied according to the sample to be measured and the purpose. In the above example, when the reflectance on the sample becomes low, the tracking operation is simply turned off,
Although the Z position of the stage is not moved, when the reflectance of the sample becomes lower than a certain threshold value, the operation start position is set to return to a certain point (for example, the center of the driving range in the Z direction). You may choose arbitrarily.

【0012】[0012]

【発明の効果】以上のように本発明によれば、自動焦点
合わせ機構を組み込んだEPMAにおいて、線分析や面
分析などのように、ステージを駆動しながらサンプリン
グを行う際に、試料の反射率に応じて追従動作やステー
ジのZ位置などを制御することにより、試料表面の反射
率が急激に変換して合焦位置のズレを正しく把握できな
い試料でも、測定時間を無駄に増やすことなく、かつ安
全に測定を行うことが可能となる。
As described above, according to the present invention, in the EPMA incorporating the automatic focusing mechanism, the reflectance of the sample is increased when sampling is performed while driving the stage, such as line analysis and surface analysis. By controlling the follow-up operation and the Z position of the stage according to the above, the reflectance of the sample surface is drastically changed and the deviation of the in-focus position cannot be accurately grasped, without increasing the measurement time unnecessarily, and It is possible to safely measure.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の構成例を示す図である。FIG. 1 is a diagram showing a configuration example of the present invention.

【図2】 追従制御のタイミングを説明する図である。FIG. 2 is a diagram illustrating the timing of follow-up control.

【符号の説明】[Explanation of symbols]

1…電子線、2…試料、3…特性X線、4…WDS、5
…分光結晶、6…検出器、7…WDS測定系、8…光学
顕微鏡照明、9a…入射光、9b…反射光、10…光学
顕微鏡、11…センサ、12…自動焦点装置、13…ス
テージ駆動機構、14…ステージ、15…コントロー
ラ、16…測定制御装置。
1 ... Electron beam, 2 ... Sample, 3 ... Characteristic X-ray, 4 ... WDS, 5
... dispersive crystal, 6 ... detector, 7 ... WDS measurement system, 8 ... optical microscope illumination, 9a ... incident light, 9b ... reflected light, 10 ... optical microscope, 11 ... sensor, 12 ... autofocus device, 13 ... stage drive Mechanism, 14 ... Stage, 15 ... Controller, 16 ... Measurement control device.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 試料面に光を入射させてその反射光を検
出する検出手段と、検出手段による位置制御信号、及び
追従制御信号により試料ステージ駆動機構を制御して試
料を合焦位置に移動させる自動焦点合わせ手段と、合焦
点位置において電子線を試料に照射したときに発生する
特性X線を検出する測定手段とを備えた自動焦点合わせ
機構付き電子プローブマイクロアナライザにおいて、前
記自動焦点合わせ手段は、追従制御信号により、試料か
らの反射光のレベルに応じて試料ステージ駆動機構の制
御をON/OFFすることを特徴とする自動焦点合わせ
機構付き電子プローブマイクロアナライザ。
1. A sample stage drive mechanism is controlled by a detection means for making light incident on a sample surface and detecting reflected light thereof, a position control signal by the detection means, and a follow-up control signal to move the sample to a focus position. In the electronic probe microanalyzer with an automatic focusing mechanism, the automatic focusing means is provided with an automatic focusing means for controlling and a measuring means for detecting a characteristic X-ray generated when the sample is irradiated with an electron beam at a focusing position. Is an electronic probe microanalyzer with an automatic focusing mechanism, which controls ON / OFF of the sample stage drive mechanism according to the level of reflected light from the sample by a tracking control signal.
JP07590595A 1995-03-31 1995-03-31 Electronic probe microanalyzer with automatic focusing mechanism Expired - Fee Related JP3217637B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP07590595A JP3217637B2 (en) 1995-03-31 1995-03-31 Electronic probe microanalyzer with automatic focusing mechanism

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Application Number Priority Date Filing Date Title
JP07590595A JP3217637B2 (en) 1995-03-31 1995-03-31 Electronic probe microanalyzer with automatic focusing mechanism

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JPH08273580A true JPH08273580A (en) 1996-10-18
JP3217637B2 JP3217637B2 (en) 2001-10-09

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008286735A (en) * 2007-05-21 2008-11-27 Jeol Ltd EDS head protection method and protection mechanism for fluorescent X-ray analyzer
CN105372275A (en) * 2015-11-16 2016-03-02 南京钢铁股份有限公司 Calibration method of martensite-austenite island in steel plate
JP2021068707A (en) * 2019-10-23 2021-04-30 ガタン インコーポレイテッドGatan,Inc. System and method for alignment of cathodoluminescence optics

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008286735A (en) * 2007-05-21 2008-11-27 Jeol Ltd EDS head protection method and protection mechanism for fluorescent X-ray analyzer
CN105372275A (en) * 2015-11-16 2016-03-02 南京钢铁股份有限公司 Calibration method of martensite-austenite island in steel plate
JP2021068707A (en) * 2019-10-23 2021-04-30 ガタン インコーポレイテッドGatan,Inc. System and method for alignment of cathodoluminescence optics
JP2022119864A (en) * 2019-10-23 2022-08-17 ガタン インコーポレイテッド System and method for alignment of cathode luminescence optics

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