JPH0830140B2 - Photosensitive lithographic printing plate - Google Patents
Photosensitive lithographic printing plateInfo
- Publication number
- JPH0830140B2 JPH0830140B2 JP62203831A JP20383187A JPH0830140B2 JP H0830140 B2 JPH0830140 B2 JP H0830140B2 JP 62203831 A JP62203831 A JP 62203831A JP 20383187 A JP20383187 A JP 20383187A JP H0830140 B2 JPH0830140 B2 JP H0830140B2
- Authority
- JP
- Japan
- Prior art keywords
- lithographic printing
- printing plate
- photosensitive
- photosensitive lithographic
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007639 printing Methods 0.000 title claims description 62
- 229920005989 resin Polymers 0.000 claims description 43
- 239000011347 resin Substances 0.000 claims description 43
- -1 sulfonic acid ester compound Chemical class 0.000 claims description 22
- 150000002989 phenols Chemical class 0.000 claims description 13
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 239000004094 surface-active agent Substances 0.000 claims description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 239000011737 fluorine Substances 0.000 claims description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 claims 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 33
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Natural products OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 32
- 238000000576 coating method Methods 0.000 description 27
- 238000011161 development Methods 0.000 description 27
- 239000011248 coating agent Substances 0.000 description 26
- 239000000203 mixture Substances 0.000 description 24
- 150000001875 compounds Chemical class 0.000 description 17
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 17
- 230000035945 sensitivity Effects 0.000 description 17
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 15
- 239000007864 aqueous solution Substances 0.000 description 14
- 239000000243 solution Substances 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 10
- 238000009833 condensation Methods 0.000 description 10
- 230000005494 condensation Effects 0.000 description 10
- 238000001035 drying Methods 0.000 description 10
- 239000007788 liquid Substances 0.000 description 10
- 238000011282 treatment Methods 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 150000001299 aldehydes Chemical class 0.000 description 9
- 229930003836 cresol Natural products 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 7
- 229920003986 novolac Polymers 0.000 description 7
- 229910052913 potassium silicate Inorganic materials 0.000 description 7
- 235000019353 potassium silicate Nutrition 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 6
- 230000003628 erosive effect Effects 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 5
- 238000006068 polycondensation reaction Methods 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 229940118056 cresol / formaldehyde Drugs 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 125000000129 anionic group Chemical group 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- MGSRCZKZVOBKFT-UHFFFAOYSA-N thymol Chemical compound CC(C)C1=CC=C(C)C=C1O MGSRCZKZVOBKFT-UHFFFAOYSA-N 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 description 2
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- MLUCVPSAIODCQM-NSCUHMNNSA-N crotonaldehyde Chemical compound C\C=C\C=O MLUCVPSAIODCQM-NSCUHMNNSA-N 0.000 description 2
- MLUCVPSAIODCQM-UHFFFAOYSA-N crotonaldehyde Natural products CC=CC=O MLUCVPSAIODCQM-UHFFFAOYSA-N 0.000 description 2
- MIHINWMALJZIBX-UHFFFAOYSA-N cyclohexa-2,4-dien-1-ol Chemical class OC1CC=CC=C1 MIHINWMALJZIBX-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- 229960001755 resorcinol Drugs 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 150000003459 sulfonic acid esters Chemical class 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- XSXWOBXNYNULJG-UHFFFAOYSA-N 2-(2,4,4-trimethylpentan-2-yl)phenol Chemical compound CC(C)(C)CC(C)(C)C1=CC=CC=C1O XSXWOBXNYNULJG-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- DKHZGIKPBFMBBY-UHFFFAOYSA-N 2-cyano-n-[4-(diethylamino)phenyl]-2-phenylacetamide Chemical compound C1=CC(N(CC)CC)=CC=C1NC(=O)C(C#N)C1=CC=CC=C1 DKHZGIKPBFMBBY-UHFFFAOYSA-N 0.000 description 1
- MVRPPTGLVPEMPI-UHFFFAOYSA-N 2-cyclohexylphenol Chemical compound OC1=CC=CC=C1C1CCCCC1 MVRPPTGLVPEMPI-UHFFFAOYSA-N 0.000 description 1
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- SJKCJPDAYQKMHU-UHFFFAOYSA-N 2-methyl-3-(2-methylbutan-2-yl)phenol Chemical compound CCC(C)(C)C1=CC=CC(O)=C1C SJKCJPDAYQKMHU-UHFFFAOYSA-N 0.000 description 1
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- JUQPZRLQQYSMEQ-UHFFFAOYSA-N CI Basic red 9 Chemical compound [Cl-].C1=CC(N)=CC=C1C(C=1C=CC(N)=CC=1)=C1C=CC(=[NH2+])C=C1 JUQPZRLQQYSMEQ-UHFFFAOYSA-N 0.000 description 1
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- 238000009835 boiling Methods 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
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- 125000002091 cationic group Chemical group 0.000 description 1
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- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 229940061607 dibasic sodium phosphate Drugs 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- IINNWAYUJNWZRM-UHFFFAOYSA-L erythrosin B Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 IINNWAYUJNWZRM-UHFFFAOYSA-L 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- PBRIXADXGMHVMW-UHFFFAOYSA-N formaldehyde;4-(2,4,4-trimethylpentan-2-yl)phenol Chemical compound O=C.CC(C)(C)CC(C)(C)C1=CC=C(O)C=C1 PBRIXADXGMHVMW-UHFFFAOYSA-N 0.000 description 1
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical class OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 1
- VANNPISTIUFMLH-UHFFFAOYSA-N glutaric anhydride Chemical compound O=C1CCCC(=O)O1 VANNPISTIUFMLH-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- WYXXLXHHWYNKJF-UHFFFAOYSA-N isocarvacrol Natural products CC(C)C1=CC=C(O)C(C)=C1 WYXXLXHHWYNKJF-UHFFFAOYSA-N 0.000 description 1
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- DWCZIOOZPIDHAB-UHFFFAOYSA-L methyl green Chemical compound [Cl-].[Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)[N+](C)(C)C)=C1C=CC(=[N+](C)C)C=C1 DWCZIOOZPIDHAB-UHFFFAOYSA-L 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- NRZWYNLTFLDQQX-UHFFFAOYSA-N p-tert-Amylphenol Chemical compound CCC(C)(C)C1=CC=C(O)C=C1 NRZWYNLTFLDQQX-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229960000790 thymol Drugs 0.000 description 1
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical class C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- 150000004961 triphenylmethanes Chemical class 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、ポジ型感光性平版印刷版に関し、更に詳し
くは、o−ナフトキノンジアジド化合物を含有し、セー
フライト性及びボールペン適性に優れたポジ型感光性平
版印刷版に関する。TECHNICAL FIELD The present invention relates to a positive-working photosensitive lithographic printing plate, and more specifically, it contains a positive naphthoquinonediazide compound and is excellent in safelight property and ball-point pen suitability. Type photosensitive lithographic printing plate.
[発明の背景と従来技術] 通常、ポジ型の感光性平版印刷版の感光層には、感光
成分としてo−キノンジアジド化合物、及び皮膜強度と
アルカリ溶解性とを高めるための成分としてアルカル可
溶性樹脂が含有されている。[Background of the Invention and Prior Art] Usually, in a photosensitive layer of a positive type photosensitive lithographic printing plate, an o-quinonediazide compound is used as a photosensitive component, and an alcal-soluble resin is used as a component for enhancing film strength and alkali solubility. It is contained.
こうしたo−キノンジアジド化合物を用いた感光層を
有する感光性平版印刷版に複数のフィルム原稿を位置を
変えて次々と焼き付けするいわゆる“多面焼付け”を行
う際、フィルム原稿間の位置合せのため、原稿の位置を
感光層にマークすることがある。この際、マークする筆
記具には通常油性ボールペンが用いられているが、ボー
ルペンのインキの溶剤が、有機溶媒、特にグリコール系
等の高沸点溶媒の場合、そのインキによって感光性平版
印刷版の感光層が侵食され、溶解してしまう。マークし
た箇所が画像部である場合、このまま現像処理すると画
像部のマーク跡の感光層が除去されて、このマーク跡が
印刷時に印刷物に再現されてしまうという故障が生じる
ことがある。このため、ボールペンのインキに対して侵
食されにくい性質(以下「ボールペン適性」と呼ぶ)を
有する感光性平版印刷版が望まれている。When performing so-called "multi-sided printing" in which a plurality of film originals are printed at different positions one after another on a photosensitive lithographic printing plate having a photosensitive layer using such an o-quinonediazide compound, the originals are aligned for alignment between the film originals. Position may be marked on the photosensitive layer. At this time, an oil-based ballpoint pen is usually used as the writing instrument to mark, but when the solvent of the ink of the ballpoint pen is an organic solvent, especially a high-boiling point solvent such as a glycol system, the photosensitive layer of the photosensitive lithographic printing plate is Are eroded and dissolved. When the marked portion is the image portion, if the development processing is performed as it is, the photosensitive layer of the mark trace of the image portion is removed, and this mark trace may be reproduced on the printed matter at the time of printing, which may cause a failure. Therefore, a photosensitive lithographic printing plate having a property of being less likely to be eroded by the ink of the ballpoint pen (hereinafter referred to as "ballpoint pen suitability") is desired.
また、前記o−キノンジアジド化合物を用いた感光性
平版印刷版は、製版作業を白色蛍光灯の下で行うと、光
カブリを被って、次に現像処理されると、画像部の感光
層が侵食されて膜減りし、印刷時の耐刷力が低下する故
障を度々引起している。このため白色蛍光灯の光カブリ
に対する抵抗性(以下「セーフライト性」と呼ぶ)が改
善された感光層を有する感光性平版印刷版が望まれてい
る。Further, the photosensitive lithographic printing plate using the o-quinonediazide compound suffers from light fog when the plate making operation is performed under a white fluorescent lamp, and when it is subsequently developed, the photosensitive layer of the image area is eroded. As a result, the film thickness is reduced and the printing durability at the time of printing is often reduced. Therefore, there is a demand for a photosensitive lithographic printing plate having a photosensitive layer with improved resistance to light fog of a white fluorescent lamp (hereinafter referred to as "safelight property").
更にo−キノンジアジド化合物を用いた感光性平版印
刷版の現像処理は通常アルカリ水溶液の現像液で行われ
るが、現像液の現像能力は種々の条件で変動を受けやす
く、多量処理による疲労や空気酸化による劣化で現像能
力が低下し、処理しても印刷版の非画像部の感光層が完
全に溶解されなくなる場合がある。これと反対に補充量
の過剰や気温の上昇に伴う浴温度の上昇等により現像能
力が規定以上になり、印刷版の画像部が侵されたり、網
点が消失したりする場合がある。このため、特に感光性
平版印刷版は、処理能力が低下した現像液でも、また処
理能力が標準より増強された現像液でも、標準現像液で
処理した場合と同様の現像性を示す幅広い現像許容性を
有することが望まれている。(以下、適正な現像結果が
得られる現像能力低下の許容範囲を「アンダー現像性」
といい、適正な現像結果が得られる現像能力上昇の許容
範囲を「オーバー現像性」という。) 上記のような問題点に対して特開昭61−6647号公報に
は、バインダーとして特定組成のノボラック樹脂を2種
以上、併用して、セーフライト性を改良した技術が記載
されているが、このような感光性平版印刷版ではボール
ペン適性は悪く、セーフライト性も不充分であった。更
に、特開昭61−243446号公報には、ピロガロール・アセ
トン樹脂のo−ナフトキノンジアジドスルホン酸エステ
ル、ノボラック樹脂及び特定量のアルカリ水溶液に不溶
のフェノールホルムアルデヒド樹脂のo−ナフトキノン
ジアジドスルホン酸エステルを含有する感光性組成物に
よって、セーフライト性及びオーバー現像性が改良され
たことが記載されているが、ボールペン適性は悪く、更
に感度、アンダ−現像性が劣化する。特開昭61−205933
号公報には、特定の分散度を有するノボラック樹脂をバ
インダーとして用いた感光性組成物によって、セーフラ
イト性、ボールペン適性及び現像許容性が改良されたこ
とが記載されているが、セーフライト性、ボールペン適
性についてはまだ不充分である。更に特開昭61−267043
号公報には、特定のm−クレゾール/p−クレゾール比を
有するノボラック樹脂をバインダーとして用いた感光性
組成物によって、セーフライト性、ボールペン適性及び
現像許容性が改良されたことが記載されている。しか
し、前例と同様に、セーフライト性及びボールペン適性
共にまだ不充分で、特に、現像能力が規定以上になった
現像液で処理した場合、ボールペン適性が大きく低下す
る欠点を有している。Further, the developing treatment of the photosensitive lithographic printing plate using the o-quinonediazide compound is usually carried out with a developing solution of an alkaline aqueous solution, but the developing ability of the developing solution is easily changed under various conditions, and fatigue and air oxidation due to a large amount of processing are caused. In some cases, the developing ability is deteriorated due to deterioration due to the above, and the photosensitive layer in the non-image area of the printing plate may not be completely dissolved even if processed. On the other hand, the developing capacity may exceed the specified level due to an excessive amount of replenishment or an increase in bath temperature due to an increase in temperature, and the image portion of the printing plate may be damaged or halftone dots may disappear. For this reason, in particular, the photosensitive lithographic printing plate has a wide development allowance showing the same developability as in the case of processing with a standard developing solution, even if the developing solution has a lower processing capacity or a developing solution having a higher processing capacity than the standard. It is desired to have sex. (Hereinafter, the allowable range of developing ability reduction that gives an adequate development result is defined as "underdevelopment".
That is, the permissible range of the increase in developing ability that can obtain a proper development result is called "over-developing property". With respect to the above problems, JP-A-61-6647 discloses a technique in which two or more kinds of novolac resins having a specific composition are used in combination as a binder to improve the safelight property. In such a photosensitive lithographic printing plate, the suitability for a ballpoint pen was poor, and the safelight property was insufficient. Further, JP-A-61-243446 contains an o-naphthoquinonediazide sulfonic acid ester of pyrogallol-acetone resin, a novolac resin and an o-naphthoquinonediazide sulfonic acid ester of a phenol formaldehyde resin insoluble in a specific amount of an alkaline aqueous solution. It is described that the photosensitive composition described above improves the safelight property and the over-developing property, but the suitability for a ballpoint pen is poor and the sensitivity and the under-developing property are deteriorated. JP 61-205933
The publication describes that a photosensitive composition using a novolac resin having a specific dispersity as a binder improves safelight property, ballpoint pen suitability and development acceptability, but has a safelight property, The suitability for ballpoint pens is still insufficient. Furthermore, JP-A-61-267043
The publication describes that a photosensitive composition using a novolac resin having a specific m-cresol / p-cresol ratio as a binder has improved safelight properties, ballpoint pen suitability, and development acceptability. . However, as in the previous example, the safelight property and the suitability for the ballpoint pen are still insufficient, and there is a drawback that the suitability for the ballpoint pen is greatly deteriorated particularly when treated with a developing solution having a developing ability higher than a prescribed level.
[発明の目的] 本発明の目的は、現像許容性及び感度の低下を伴うこ
となく、セーフライト性及びボールペン適性が改良され
たポジ型感光性平版印刷版を提供することにある。[Object of the Invention] An object of the present invention is to provide a positive-working photosensitive lithographic printing plate having improved safelight property and suitability for a ballpoint pen without deterioration in development acceptability and sensitivity.
[発明の構成] 本発明の上記目的は(A)o−キノンジアジド化合
物、(B)下記一般式[I]で表される置換フェノール
類とアルデヒド類との縮合樹脂および/または該樹脂の
o−ナフトキノンジアジドスルホン酸エステル化合物及
び(C)フッ素系界面活性剤、を含有することを特徴と
する感光性平版印刷版を提供することにより達成され
る。[Structure of the Invention] The above objects of the present invention include (A) an o-quinonediazide compound, (B) a condensation resin of a substituted phenol represented by the following general formula [I] and an aldehyde, and / or o- of the resin. It is achieved by providing a photosensitive lithographic printing plate characterized by containing a naphthoquinone diazide sulfonic acid ester compound and (C) a fluorosurfactant.
一般式[I] (式中、R1およびR2は各々水素原子、アルキル基また
はハロゲン原子を表し、R3は炭素数3〜8のアルキル基
または炭素数3〜8のシクロアルキル基を表す。) 以下に、本発明を更に詳しく説明する。General formula [I] (In the formula, R 1 and R 2 each represent a hydrogen atom, an alkyl group or a halogen atom, and R 3 represents an alkyl group having 3 to 8 carbon atoms or a cycloalkyl group having 3 to 8 carbon atoms.) The present invention will be described in more detail.
本発明において前記一般式[I]における、R1および
R2は各々水素原子、アルキル基(1ないし3個の水素原
子を含むものを包含する。炭素原子数1ないし2のアル
キル基は特に有用である。)またはハロゲン原子(例え
ばフッ素、塩素、臭素またはヨウ素、特に好ましくは塩
素または臭素)を表し、R3は炭素原子数3〜8のアルキ
ル基または炭素原子数3〜8のシクロアルキル基を表
す。In the present invention, R 1 in the above general formula [I] and
Each R 2 includes a hydrogen atom, an alkyl group (including those having 1 to 3 hydrogen atoms, an alkyl group having 1 to 2 carbon atoms is particularly useful) or a halogen atom (eg, fluorine, chlorine, bromine). Or iodine, particularly preferably chlorine or bromine), and R 3 represents an alkyl group having 3 to 8 carbon atoms or a cycloalkyl group having 3 to 8 carbon atoms.
上記一般式[I]で表わされる置換フェノール類の例
としては、イソプロピルフェノール、tert−ブチルフェ
ノール、tert−アミルフェノール、ヘキシルフェノー
ル、tert−オクチルフェノール、シクロヘキシルフェノ
ール、3−メチル−4−クロロ−5−tert−ブチルフェ
ノール、イソプロピルクレゾール、tert−ブチルクレゾ
ール、tert−アミルクレゾール、ヘキシルクレゾール、
tert−オクチルクレゾール、シクロヘキシルクレゾール
等であり、そのうち特に好ましくはtert−o−オクチル
フェノールおよびtert−ブチルフェノールである。Examples of the substituted phenols represented by the above general formula [I] include isopropylphenol, tert-butylphenol, tert-amylphenol, hexylphenol, tert-octylphenol, cyclohexylphenol, 3-methyl-4-chloro-5-tert. -Butylphenol, isopropylcresol, tert-butylcresol, tert-amylcresol, hexylresole,
tert-octyl cresol, cyclohexyl cresol and the like, of which tert-o-octylphenol and tert-butylphenol are particularly preferable.
また、本発明に用いられるアルデヒド類の例としては
ホルムアルデヒド、ベンズアルデヒド、アセトアルデヒ
ド、アクロレイン、クロトンアルデヒド、フルフラール
等の脂肪族アルデヒドまたは芳香族アルデヒドであり、
炭素原子数1ないし6のものを包含する。そのうち好ま
しくはホルムアルデヒドおよびベンズアルデヒドであ
る。Further, examples of aldehydes used in the present invention include formaldehyde, benzaldehyde, acetaldehyde, acrolein, crotonaldehyde, aliphatic aldehydes such as furfural, or aromatic aldehydes,
Including those having 1 to 6 carbon atoms. Of these, formaldehyde and benzaldehyde are preferred.
本発明における該置換フェノール類とアルデヒド類と
の縮合樹脂は、一般式[I]により表される置換フェノ
ールと、上記アルデヒド類とを酸性触媒の存在下で重縮
合して合成される。使用される酸性触媒としては、塩
酸、しゅう酸、硫酸、リン酸、等の無機酸や有機酸が用
いられ、置換フェノール類とアルデヒド類との配合比
は、置換フェノール類1モル部に対しアルデヒド類が0.
7〜1.0モル部用いられる。反応溶媒は、アルコール類、
アセトン、水、テトラヒドロフラン等が用いられる。The condensation resin of the substituted phenol and the aldehyde in the present invention is synthesized by polycondensing the substituted phenol represented by the general formula [I] and the aldehyde in the presence of an acidic catalyst. The acidic catalyst used is an inorganic or organic acid such as hydrochloric acid, oxalic acid, sulfuric acid, phosphoric acid, etc., and the mixing ratio of the substituted phenols and the aldehydes is 1 part by mole of the substituted phenols. Kind is 0.
It is used in an amount of 7 to 1.0 mol. The reaction solvent is alcohols,
Acetone, water, tetrahydrofuran, etc. are used.
所定温度(−5〜120℃)、所定時間(3〜48時間)
反応後、減圧下加熱し、水洗して脱水させて得るか、又
は水結析させて反応物を得る。Specified temperature (-5 to 120 ° C), prescribed time (3 to 48 hours)
After the reaction, the reaction product is obtained by heating under reduced pressure, washing with water and dehydration, or by water precipitation.
本発明の置換フェノール類とアルデヒド類との重合樹
脂のo−ナフトキノンジアジドスルホン酸エステル化合
物は、前記縮合樹脂を適当な溶媒、例えば、ジオキサン
等に溶解させて、これにo−ナフトキノンジアジドスル
ホン酸クロライドを投入し、加熱攪拌しながら、炭酸ア
ルカリ等のアルカリを当量点まで滴下することによりエ
ステル化させて得られる。The o-naphthoquinone diazide sulfonic acid ester compound of the polymerized resin of the substituted phenols and aldehydes of the present invention is prepared by dissolving the condensation resin in a suitable solvent such as dioxane, and adding o-naphthoquinone diazide sulfonic acid chloride thereto. Is added, and the mixture is heated and stirred, and an alkali such as an alkali carbonate is added dropwise to the equivalent point to effect esterification.
前記エステル化物において、フェノール類の水酸基に
対するo−ナフトキノンジアジドスルホン酸クロライド
の縮合率(水酸基1個に対する反応率%)は、5〜80%
が好ましく、より好ましくは20〜70%、更に好ましくは
30〜60%である。該縮合率は、元素分析によりスルホニ
ル基の硫黄原子の含有量を求めて計算する。In the esterified product, the condensation rate of o-naphthoquinonediazide sulfonic acid chloride with respect to the hydroxyl groups of phenols (reaction rate% with respect to one hydroxyl group) is 5 to 80%.
Is preferred, more preferably 20-70%, and even more preferably
30-60%. The condensation rate is calculated by obtaining the sulfur atom content of the sulfonyl group by elemental analysis.
本発明の感光性組成物中に占める前記一般式[I]で
表される置換フェノール類とアルデヒド類との縮合樹脂
および該樹脂のo−ナフトキノンジアジドスルホン酸エ
ステル化合物(以下、これらを「本発明の感脂化剤」と
いう)の量は0.05〜15重量%が好ましく、特に好ましく
は0.5〜1.5重量%である。Condensation resins of the substituted phenols represented by the above general formula [I] and aldehydes in the photosensitive composition of the present invention and o-naphthoquinonediazide sulfonic acid ester compounds of the resins (hereinafter, these are referred to as “the present invention. The amount of "sensitizer" is preferably 0.05 to 15% by weight, particularly preferably 0.5 to 1.5% by weight.
本発明の感脂化剤は、重量平均分子量Mwが好ましく
は、5.0×102〜5.0×103の範囲であり、更に好ましくは
7.0×102〜3.0×103の範囲である。その数平均分子量Mn
は3.0×102〜2.5×103の範囲であることが好ましく、更
に好ましくは4.0×102〜2.0×103の範囲である。The oil sensitizer of the present invention has a weight average molecular weight Mw of preferably 5.0 × 10 2 to 5.0 × 10 3 , and more preferably
The range is 7.0 × 10 2 to 3.0 × 10 3 . Its number average molecular weight Mn
Is preferably in the range of 3.0 × 10 2 to 2.5 × 10 3 , and more preferably in the range of 4.0 × 10 2 to 2.0 × 10 3 .
該感脂化剤の分子量の測定は、GPC(ゲルパ−ミエ−
ションクロマトグラフィー法)によって行う。数平均分
子量Mn及び重量平均分子量Mwの算出は、柘植盛男、宮林
達也。田中誠之著“日本化学会誌"800頁〜805頁(1972
年)に記載の方法により、オリゴマー領域のピークを均
す(ピークの山と谷の中心を結ぶ)方法にて行うものと
する。The molecular weight of the sensitizer is measured by GPC (gel permeation method).
Chromatography method). The number average molecular weight Mn and the weight average molecular weight Mw are calculated by Morio Tsuge and Tatsuya Miyabayashi. Tanaka Masayuki, “Chemical Society of Japan”, pp. 800-805 (1972
Year), the peaks in the oligomer region are leveled (the peaks and valleys of the peaks are connected).
本発明に用いられるフッ素系界面活性剤としては、界
面活性剤の疎水性基の炭素原子に結合した水素原子が、
一部または全部フッ素原子で置換されたものであり、下
記のようなアニオン型、カチオン型、ノニオン型、両性
型及び高分子型のいずれも用いることができるが、ノニ
オン型フッ素系界面活性剤が好ましい。The fluorine-based surfactant used in the present invention, a hydrogen atom bonded to the carbon atom of the hydrophobic group of the surfactant,
Some or all of them are substituted with fluorine atoms, and any of the following anion type, cation type, nonion type, amphoteric type and polymer type can be used. preferable.
1)アニオン型フッ素系界面活性剤 親水性基として−COOM,−OSO3M,−SO3M, 等を含有するもので、例えば、 RfCOOM,RfSO2N(R′)2CH2COOM, RfBNR′C2H4OSO3M,RfSO3M, RfCH2OCmH2mSO3M, 等が挙げられる。1) Anionic fluorosurfactant As a hydrophilic group, -COOM, -OSO 3 M, -SO 3 M, Such as RfCOOM, RfSO 2 N (R ′) 2 CH 2 COOM, RfBNR′C 2 H 4 OSO 3 M, RfSO 3 M, RfCH 2 OCmH 2m SO 3 M, Etc.
(式中、Rfはアルキル基の水素原子の一部または全部
をフッ素原子でおきかえたフッ化炭素基(炭素原子数2
〜20)を表わし、BはCO、SO2を表わし、R′は水素原
子または低級アルキル基を表わし、Mは水素原子、アル
カリ金属、アルカリ土類金属を表わす。) 2)カチオン型フッ素系界面活性剤 親水性基として 等を含有するもの、例えば 等が挙げられる。(In the formula, Rf is a fluorocarbon group in which a part or all of the hydrogen atoms of the alkyl group are replaced by fluorine atoms (having 2 carbon atoms).
To 20), B represents CO and SO 2 , R'represents a hydrogen atom or a lower alkyl group, and M represents a hydrogen atom, an alkali metal or an alkaline earth metal. ) 2) Cationic fluorosurfactant As hydrophilic group Containing, for example, Etc.
(式中、R″は水素原子または低級アルキル基を表わ
し、Xはハロゲン酸根を表わし、HXは酸を表わす。Rf、
B及びR′はそれぞれアニオン型フッ素系界面活性剤に
おけるRf、B及びR′と同義である。(In the formula, R ″ represents a hydrogen atom or a lower alkyl group, X represents a halogen acid radical, and HX represents an acid. Rf,
B and R'have the same meanings as Rf, B and R'in the anionic fluorosurfactant, respectively.
3)両性型フッ素系界面活性剤 例えば、 RfBNH(C2H4)N (R′)2CmH2mCOO RfBNHCmH2mN (R′)3Cl (式中、Rf、B及びR′はそれぞれアニオン型界面活
性剤におけるRf、B及びR′と同義である。) 4)ノニオン型フッ素系界面活性剤 親水性基として−OH,−SH,−O−等を含有するもの
で、例えば、RfOH,RfSH,Rf−A−(C2H4O)nR等が挙げ
られる。3) Amphoteric fluorosurfactants such as RfBNH (C2HFour) N (R ')2CmH2mCOO RfBNHCmH2mN (R ')3Cl (In the formula, Rf, B, and R'are anionic type surfactants, respectively.
It has the same meaning as Rf, B and R'in the sex agent. ) 4) Nonionic fluorinated surfactant containing -OH, -SH, -O-, etc. as a hydrophilic group
And, for example, RfOH, RfSH, Rf-A- (C2HFourO) nR, etc.
Can be
(式中、AはCH2 mSO2NR1−,CH2 mO−,CH
2 mCONR2−,−SO3−,−CO2−,および−SO2N(R3)C
H2CO2−からなる群より選ばれる基であり、、nは0〜2
0の整数、mは0〜5の整数を表わし、R1、R2及びR3は
それぞれ水素原子、炭素原子数1〜6のアルキル基また
はCH2CH2OxR4を表わし、R1、R2及びR3は各々同一の
ものも異なるものも含む。xは1〜20の整数を表わし、
R4は炭素原子数1〜6のアルキル基を表わす。) 5)高分子型フッ素系界面活性剤 例えば の構造単位を含む高分子化合物等が挙げられる。(In the formula, A is CH 2 m SO 2 NR 1 −, CH 2 m O−, CH
2 m CONR 2 −, −SO 3 −, −CO 2 −, and −SO 2 N (R 3 ) C
Is a group selected from the group consisting of H 2 CO 2 —, and n is 0 to 2
An integer of 0, m represents an integer of 0 to 5, R 1 , R 2 and R 3 each represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or CH 2 CH 2 O x R 4 , and R 1 , R 2 and R 3 are the same or different. x represents an integer of 1 to 20,
R 4 represents an alkyl group having 1 to 6 carbon atoms. ) 5) Polymeric fluorosurfactant Polymer compounds containing the structural unit of
以下にノニオン型フッ素系界面活性剤の好ましい具体
例を例示する。Preferred specific examples of the nonionic fluorine-based surfactant are shown below.
[例示化合物] (1)CF3(CF2)7・(CH2CH2O)10H (2)CF3(CF2)7SO2N(C2H5)(CH2CH2O)14H (3)CF3(CF2)7SO2N(C2H5)CH2COO(CH2CH2O)10H (4)CF3(CF2)7・(CF2)3・CON(CH3)(CH2CH2O)10H (5)CF3(CF2)7SO2N(C2H5)C2H4(OC3H6)5OH 本発明に用いられるフッ素系界面活性剤の感光性組成
物中に占める量は0.05〜20重量%が好ましく、より好ま
しくは0.1〜1重量%である。[Exemplified Compound] (1) CF 3 (CF 2 ) 7 · (CH 2 CH 2 O) 10 H (2) CF 3 (CF 2 ) 7 SO 2 N (C 2 H 5 ) (CH 2 CH 2 O) 14 H (3) CF 3 (CF 2 ) 7 SO 2 N (C 2 H 5 ) CH 2 COO (CH 2 CH 2 O) 10 H (4) CF 3 (CF 2 ) 7・ (CF 2 ) 3・CON (CH 3 ) (CH 2 CH 2 O) 10 H (5) CF 3 (CF 2 ) 7 SO 2 N (C 2 H 5 ) C 2 H 4 (OC 3 H 6 ) 5 OH Used in the present invention The amount of the fluorinated surfactant in the photosensitive composition is preferably 0.05 to 20% by weight, more preferably 0.1 to 1% by weight.
一般にフッ素系界面活性剤を感光性組成物中に含むこ
とにより、感光性平版印刷版の作製において塗布性を向
上させることは従来知られているが、本発明の感脂化剤
を組み合わせて用いることにより、本発明の目的とする
セーフライト性及びボールペン適性を改良し得ることは
本発明者等が鋭意研究の結果見出したものであり、驚く
べきことである。It is generally known that the coating property is improved in the preparation of a photosensitive lithographic printing plate by including a fluorine-based surfactant in the photosensitive composition, but the oil-sensitizing agent of the present invention is used in combination. It is surprising that the present inventors have found that the safelight property and the suitability for a ballpoint pen, which are the objects of the present invention, can be improved.
本発明の感光性組成物には、感光性成分として、o−
キノンジアジド化合物を含有する。該o−キノンジアジ
ド化合物は、o−ナフトキノンジアジドスルホン酸とフ
ェノール類とアルデヒド又はケトンとの重縮合樹脂との
エステル化合物であるのが好ましい。In the photosensitive composition of the present invention, o-
Contains a quinonediazide compound. The o-quinonediazide compound is preferably an ester compound of a polycondensation resin of o-naphthoquinonediazide sulfonic acid, a phenol and an aldehyde or a ketone.
該フェノール類としては、例えば、フェノール、o−
クレゾール、m−クレゾール、p−クレゾール、3、5
−キシレノール、カルバクロール、チモール等の一価フ
ェノール、カテコール、レゾルシン、ヒドロキノン等の
二価フェノール、ピロガロール、フロログルシン等の三
価フェノール等が挙げられる。これらのうち好ましいの
は一価フェノールである。該アルデヒドとしてはホルム
アルデヒド、ベンズアルデヒド、アセトアルデヒド、ク
ロトンアルデヒド、フルフラール等が挙げられる。これ
らのうち好ましいのはホルムアルデヒド及びベンズアル
デヒドである。更に該ケトンとしてはアセトン、メチル
エチルケトン等が挙げられる。Examples of the phenols include phenol and o-
Cresol, m-cresol, p-cresol, 3,5
Examples include monohydric phenols such as xylenol, carvacrol and thymol, dihydric phenols such as catechol, resorcinol and hydroquinone, and trihydric phenols such as pyrogallol and phloroglucin. Of these, preferred is monohydric phenol. Examples of the aldehyde include formaldehyde, benzaldehyde, acetaldehyde, crotonaldehyde, furfural and the like. Of these, formaldehyde and benzaldehyde are preferred. Further, examples of the ketone include acetone and methyl ethyl ketone.
前記重縮合樹脂の具体的な例としては、フェノール・
ホルムアルデヒド樹脂、m−クレゾール・ホルムアルデ
ヒド樹脂、m−,p−混合クレゾール・ホルムアルデヒド
樹脂、レゾルシン・ベンズアルデヒド樹脂、ピロガロー
ル・アセトン樹脂等が挙げられる。Specific examples of the polycondensation resin include phenol
Examples thereof include formaldehyde resin, m-cresol / formaldehyde resin, m-, p-mixed cresol / formaldehyde resin, resorcin / benzaldehyde resin, pyrogallol / acetone resin.
前記o−ナフトキノンジアジド化合物のフェノール類
のOH基に対するo−ナフトキノンジアジドスルホン酸の
縮合率(OH基1個に対する反応率)は、15〜80%が好ま
しく、より好ましくは20〜45%である。The condensation rate of o-naphthoquinonediazide sulfonic acid with respect to the OH group of the phenol of the o-naphthoquinonediazide compound (reaction rate with respect to one OH group) is preferably 15 to 80%, more preferably 20 to 45%.
該o−ナフトキノンジアジド化合物の感光性組成物中
に占める割合は、5〜60重量%が好ましく、特に好まし
くは、10〜50重量%である。The proportion of the o-naphthoquinonediazide compound in the photosensitive composition is preferably 5 to 60% by weight, particularly preferably 10 to 50% by weight.
本発明の感光性組成物には、アルカリ可溶性樹脂を含
有することが好ましい。アルカリ可溶性樹脂としては、
ノボラック樹脂、特公昭50−8658号公報に記載されてい
るようなフェノール性水酸基を有するビニル系共重合体
及び特開昭58−122533号公報に記載されているようなカ
ルボキシル基及び該カルボキシル基のエステル基を有す
る単位を分子構造中に有するアクリル系共重合体が好ま
しい。ノボラック樹脂としては、フェノール、m−クレ
ゾール、o−クレゾール及びp−クレゾールから選ばれ
る少なくとも1種とホルムアルデヒドとを共重縮合して
得られる樹脂が用いられ、このうち、フェノール・m−
クレゾール・p−クレゾール・ホルムアルデヒド樹脂、
m−クレゾール・p−クレゾール・ホルムアルデヒド樹
脂が好ましい。上記アルカリ可溶性樹脂は単独で用いて
もよいし、また2種以上組合わせて用いてもよい。The photosensitive composition of the present invention preferably contains an alkali-soluble resin. As an alkali-soluble resin,
Novolak resins, vinyl-based copolymers having a phenolic hydroxyl group as described in JP-B-50-8658 and carboxyl groups as described in JP-A-58-122533 and the carboxyl groups thereof. An acrylic copolymer having a unit having an ester group in the molecular structure is preferable. As the novolac resin, a resin obtained by copolycondensing at least one selected from phenol, m-cresol, o-cresol, and p-cresol with formaldehyde is used. Among them, phenol / m-
Cresol / p-cresol / formaldehyde resin,
Preference is given to m-cresol / p-cresol / formaldehyde resins. The above alkali-soluble resins may be used alone or in combination of two or more.
本発明の感光性組成物には、以上の説明した各素材の
ほか、必要に応じて他の添加剤を含むことができる。例
えば可塑剤としてフタル酸エステル類、トリフェニルホ
スフェート類、マレイン酸エステル類等の各種低分子化
合物類、更に露光により可視画像を形成させるためのプ
リントアウト材料等が挙げられる。プリントアウト材料
は露光により酸もしくは遊離基を生成する化合物と、こ
れと相互作用することによりその色調を変える有機染料
よりなるもので、露光により酸もしくは遊離基を生成す
る化合物としては、例えば特開昭50−36209号公報に記
載されているo−ナフトキノンジアジド−4−スルホン
酸ハロゲニド、特開昭53−36223号公報に記載されてい
るトリハロメチル−2−ピロンやトリハロメチル−トリ
アジン、特開昭55−6244号公報に記載されているo−ナ
フトキノンジアジド−4−スルホン酸のクロライドと電
子吸引性置換基を有するフェノール類又はアニリン類と
のエステル化合物、特開昭55−77742号公報に記載され
ているハロメチル−ビニル−オキサジアゾール化合物及
びジアゾニウム塩等が挙げられる。The photosensitive composition of the present invention may contain other additives, if necessary, in addition to the materials described above. Examples of the plasticizer include various low molecular weight compounds such as phthalic acid esters, triphenyl phosphates and maleic acid esters, and printout materials for forming a visible image by exposure. The printout material is composed of a compound that generates an acid or a free radical upon exposure to light and an organic dye that changes its color tone by interacting with the compound. Examples of the compound that generates an acid or a free radical upon exposure to light include O-naphthoquinonediazide-4-sulfonic acid halogenide described in JP-A-50-36209, trihalomethyl-2-pyrone and trihalomethyl-triazine described in JP-A-53-36223, An ester compound of a chloride of o-naphthoquinonediazide-4-sulfonic acid and a phenol or an aniline having an electron-withdrawing substituent described in JP-A-55-6244, described in JP-A-55-77742. And halomethyl-vinyl-oxadiazole compounds and diazonium salts.
これらのうち、ハロメチル−ビニル−オキサジアゾー
ル化合物が好ましく、特に特開昭60−138539号公報に記
載されている、ベンゾフリル基のような酸素を含む複素
環式基を直接又はビニル基を介して5位に有する2−ハ
ロメチル−1,3,4−オキサジアゾール化合物が更に好ま
しい。Among these, a halomethyl-vinyl-oxadiazole compound is preferable, and a heterocyclic group containing oxygen such as a benzofuryl group described in JP-A-60-138539 is directly or through a vinyl group. A 2-halomethyl-1,3,4-oxadiazole compound having a 5-position is more preferable.
又、前記の有機染料としては、例えば、ビクトリアピ
ュアーブルーBOH[保土ケ谷化学]、オイルブル−♯603
[オリエント化学]、パテントピュアーブルー[住友三
国化学製]、クリスタルバイオレット、ブリリアントグ
リーン、エチルバイオレット、メチルグリーン、エリス
ロシンB、ベイシックフクシン、マラカイトグリーン、
オイルレッド、m−クレゾールパープル、ローダミン
B、オーラミン、4−p−ジエチルアミノフェニルイミ
ノナフトキノン、シアノ−p−ジエチルアミノフェニル
アセトアニリド等に代表されるトリフェニルメタン系、
ジフェニルメタン系、オキサジン系、キサンテン系、イ
ミノナフトキノン系、アゾメチン系又はアントラキノン
系の色素が挙げられる。これらのうちトリフェニルメタ
ン系色素が好ましい。Examples of the organic dye include Victoria Pure Blue BOH [Hodogaya Kagaku], Oil Bull- # 603
[Orient Chemistry], Patent Pure Blue [Sumitomo Sangoku Chemical], Crystal Violet, Brilliant Green, Ethyl Violet, Methyl Green, Erythrosin B, Basic Fuchsin, Malachite Green,
Triphenylmethane series represented by oil red, m-cresol purple, rhodamine B, auramine, 4-p-diethylaminophenyliminonaphthoquinone, cyano-p-diethylaminophenylacetanilide, and the like,
Examples thereof include diphenylmethane-based, oxazine-based, xanthene-based, iminonaphthoquinone-based, azomethine-based or anthraquinone-based dyes. Of these, triphenylmethane dyes are preferable.
又、感度を向上させるための増感剤も本発明の感光性
組成物に添加することができる。このような増感剤とし
ては、特開昭57−118237号公報に記載されている没食子
酸誘導体。特開昭52−80022号公報に記載されているよ
うな5員環状酸無水物例えば、無水フタル酸、テトラヒ
ドロ無水フタル酸、ヘキサヒドロ無水フタル酸、無水マ
レイン酸、無水コハク酸、ピロメット酸、イタコン酸
等、及び特開昭58−11932号公報に記載されているよう
な6員環状酸無水物、例えば、無水グルタル酸及びその
誘導体等が挙げられる。これらのうち、好ましいのは環
状酸無水物であり、特に6員環状酸無水物が好ましい。Also, a sensitizer for improving sensitivity can be added to the photosensitive composition of the present invention. Examples of such sensitizers include gallic acid derivatives described in JP-A-57-118237. 5-membered cyclic acid anhydrides such as those described in JP-A-52-80022, for example, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, maleic anhydride, succinic anhydride, pyrometic acid, itaconic acid And 6-membered cyclic acid anhydrides such as those described in JP-A-58-11932, such as glutaric anhydride and its derivatives. Of these, cyclic acid anhydrides are preferable, and 6-membered cyclic acid anhydrides are particularly preferable.
本発明の感光性組成物を、上記各成分を溶解する溶媒
に溶解させ、これを適当な支持体表面に塗布乾燥させる
ことにより、ポジ型感光性平版印刷版を形成することが
できる。使用し得る溶媒としてはメチルセロソルブ、メ
チルセロソルブアセテート、エチルセロソルブ、エチル
セロソロブアセテート等のセロソルブ類、ジメチルホル
ムアミド、ジメチルスルホキシド、ジオキサン、アセト
ン、シクロヘキサノン、トリクロロエチレン、メチルエ
チルケトン等が挙げられる。これら溶媒は、単独である
いは2種以上混合して使用する。A positive photosensitive lithographic printing plate can be formed by dissolving the photosensitive composition of the present invention in a solvent that dissolves each of the above components, and coating and drying this on a suitable support surface. Examples of the solvent that can be used include cellosolves such as methyl cellosolve, methyl cellosolve acetate, ethyl cellosolve, and ethyl cellosolve acetate, dimethylformamide, dimethylsulfoxide, dioxane, acetone, cyclohexanone, trichloroethylene, and methylethylketone. These solvents may be used alone or in admixture of two or more.
塗布方法は、従来公知の方法、例えば、回転塗布、ワ
イヤーバー塗布、ディップ塗布、エアーナイフ塗布、ロ
ール塗布、ブレード塗布及びカーテン塗布等が可能であ
る。As the coating method, conventionally known methods such as spin coating, wire bar coating, dip coating, air knife coating, roll coating, blade coating and curtain coating can be used.
本発明の感光性組成物を用いた感光層を設ける支持体
としては、アルミニウム、亜鉛、銅、鋼等の金属板、及
びクロム、亜鉛、銅、ニッケル、アルミニウム及び鉄等
がめっき又は蒸着された金属板、紙、プラスチックフィ
ルム及び樹脂が塗布された紙、アルミニウム等の金属箔
が張られた紙、親水化処理したプラスチックフィルム等
が挙げられる。このうち好ましいのはアルミニウム板で
ある。支持体としてアルミニウム板を使用する場合、砂
目立て処理、陽極酸化処理及び必要に応じて封孔処理等
の表面処理が施されていることが好ましい。これらの処
理には公知の方法を適用することができる。As a support for providing a photosensitive layer using the photosensitive composition of the present invention, a metal plate such as aluminum, zinc, copper, steel, and chromium, zinc, copper, nickel, aluminum, iron, etc. are plated or vapor-deposited. Examples thereof include a metal plate, paper, a plastic film and a resin-coated paper, a paper covered with a metal foil such as aluminum, and a hydrophilized plastic film. Of these, the aluminum plate is preferable. When an aluminum plate is used as the support, it is preferable that surface treatment such as graining treatment, anodizing treatment and, if necessary, sealing treatment is performed. A known method can be applied to these treatments.
本発明の感光性組成物を適用したポジ型感光性平版印
刷版は、従来慣用のものと同じ方法で使用することがで
きる。例えば、透明陽画フィルムを通して超高圧水銀
灯、メタルハライドランプ、キセノンランプ、タングス
テンランプ等の光源により露光し、次いで、アルカル現
像液にて現像され、未露光部分のみが支持体表面に残
り、ポジ−ポジ型のレリーフ像ができる。The positive-working photosensitive lithographic printing plate to which the photosensitive composition of the present invention is applied can be used in the same manner as conventionally used. For example, through a transparent positive film, it is exposed by a light source such as an ultra-high pressure mercury lamp, a metal halide lamp, a xenon lamp, a tungsten lamp, and then developed with an alcal developer, and only the unexposed portion remains on the surface of the support, and a positive-positive type A relief image of
アルカリ現像液としては、例えば、水酸化ナトリウ
ム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、
メタケイ酸ナトリウム、メタケイ酸カリウム、第二リン
酸ナトリウム、第三リン酸ナトリウム等のアルカリ金属
塩の水溶液が挙げられる。アルカリ金属塩の濃度は0.1
〜10重量%が好ましい。又、該現像液中に必要に応じア
ニオン性界面活性剤、両性界面活性剤やアルコール等の
有機溶媒を加えることができる。Examples of the alkaline developer include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate,
Examples thereof include aqueous solutions of alkali metal salts such as sodium metasilicate, potassium metasilicate, dibasic sodium phosphate, and tribasic sodium phosphate. Alkali metal salt concentration is 0.1
~ 10 wt% is preferred. If necessary, an anionic surfactant, an amphoteric surfactant, or an organic solvent such as alcohol can be added to the developer.
実施例 以下、本発明を実施例により更に詳述するが、本発明
はこれらの態様に限定されるものではない。Examples The present invention will be described in more detail below with reference to Examples, but the present invention is not limited to these embodiments.
実施例1 [感脂化剤の合成] p−tert−オクチルフェノールとホルムアルデヒドと
の重縮合物であるノボラック樹脂(重量平均分子量Mw=
1300)20gをジオキサン240mlに溶解し、o−ナフトキノ
ンジアジド−5−スルホニルクロライド12.4gを投入
し、溶解後、水25ml中に3.84g溶解させた炭酸カリウム
水溶液を滴下し、40〜50℃で40分間縮合反応を行った。
反応後、反応液を希塩酸(濃塩酸1.2mlを水500mlで希
釈)中に注入し、沈殿した樹脂を濾取し乾燥した。Example 1 [Synthesis of Oil Sensitizer] Novolak resin (weight average molecular weight Mw =) which is a polycondensation product of p-tert-octylphenol and formaldehyde.
1300) 20 g was dissolved in 240 ml of dioxane, 12.4 g of o-naphthoquinonediazide-5-sulfonyl chloride was added, and after dissolution, a potassium carbonate aqueous solution prepared by dissolving 3.84 g in 25 ml of water was added dropwise at 40-50 ° C. A condensation reaction was performed for a minute.
After the reaction, the reaction solution was poured into diluted hydrochloric acid (1.2 ml of concentrated hydrochloric acid was diluted with 500 ml of water), and the precipitated resin was collected by filtration and dried.
このようにして、p−tert−オクチルフェノール・ホ
ルムアルデヒド樹脂のo−ナフトキノンジアジドスルホ
ン酸エステル化合物29gが得られた。分析の結果、OH基
の縮合率は50%であった。Thus, 29 g of o-naphthoquinonediazide sulfonic acid ester compound of p-tert-octylphenol-formaldehyde resin was obtained. As a result of the analysis, the condensation rate of OH groups was 50%.
以下、前記エステル化合物を「感脂化剤[I]」と呼
ぶ。Hereinafter, the ester compound will be referred to as "sensitizer [I]".
[感光性平版印刷版の作製] 厚さ0.24mmのアルミニウム板を5重量%水酸化ナトリ
ウム水溶液中で脱脂処理を行なった後、0.5モル塩酸水
溶液中において温度:25℃、電流密度;60A/dm2、処理時
間;30秒間の条件の電解エッチング処理を行った。次い
で、5重量%水酸化ナトリウム水溶液でデスマット処理
を施した後、硫酸溶液中で陽極酸化処理を行った。陽極
酸化皮膜量は20mg/dm2であった。次に90℃の熱水溶液に
浸漬し、封孔処理を行った。[Preparation of photosensitive lithographic printing plate] An aluminum plate having a thickness of 0.24 mm was degreased in a 5% by weight sodium hydroxide aqueous solution and then in a 0.5 molar hydrochloric acid aqueous solution at a temperature of 25 ° C and a current density of 60 A / dm. 2. The electrolytic etching treatment was performed under the treatment time of 30 seconds. Then, after performing desmutting treatment with a 5 wt% sodium hydroxide aqueous solution, anodizing treatment was performed in a sulfuric acid solution. The amount of anodized film was 20 mg / dm 2 . Next, it was immersed in a hot aqueous solution at 90 ° C. to perform a sealing treatment.
続いて、かかるアルミニウム支持体に下記の組成の感
光性塗布液を回転塗布機を用いて塗布し、100℃で4分
間乾燥し、感光性平版印刷版(A)を得た。Subsequently, a photosensitive coating solution having the following composition was applied to the aluminum support using a spin coater and dried at 100 ° C. for 4 minutes to obtain a photosensitive lithographic printing plate (A).
(感光性塗布液組成) ・ナフトキノン−(1,2)−ジアジド−(2)−5−ス
ルホン酸クロライドとピロガロール・アセトン樹脂との
エステル化合物(特開昭60−143345号公報合成例2に記
載された化合物) 1.88g ・フェノールとm−,p−混合クレゾールとホルムアルデ
ヒドとの共重縮合樹脂(合成時のフェノール、m−クレ
ゾール及びp−クレゾールの各々の仕込みモル比が20:4
8:32、重量平均分子量Mw=7400、数平均分子量Mn=140
0) 6.32g ・フッ素系界面活性剤 (例示化合物(2)) 0.0164g ・感脂化剤[I] (縮合率=50モル%、重量平均分子量Mw=1700)0.08
2 g ・ビクトリアピュアブルーBOH [保土ケ谷化学(株)製] 0.072 g ・エチルセロソルブ 80ml ・メチルセロソルブ 20ml 乾燥後の塗布重量は約22mg/dm2であった。(Composition of photosensitive coating solution) -Ester compound of naphthoquinone- (1,2) -diazide- (2) -5-sulfonic acid chloride and pyrogallol-acetone resin (described in Synthesis Example 2 of JP-A-60-143345) Compound) 1.88g ・ Copolycondensation resin of phenol, m-, p-mixed cresol and formaldehyde (the molar ratio of phenol, m-cresol and p-cresol at the time of synthesis was 20: 4).
8:32, weight average molecular weight Mw = 7400, number average molecular weight Mn = 140
0) 6.32g-Fluorosurfactant (Exemplified compound (2)) 0.0164g-Sensitizer [I] (condensation rate = 50 mol%, weight average molecular weight Mw = 1700) 0.08
2 g-Victoria Pure Blue BOH [Hodogaya Chemical Co., Ltd.] 0.072 g-Ethyl cellosolve 80 ml-Methyl cellosolve 20 ml The coating weight after drying was about 22 mg / dm 2 .
かくして得られた感光性平版印刷版(A)上に感度測
定用ステップタブレット(イーストマン・コダック社製
No.2、濃度差0.15ずつ21段階のグレースケール)を密着
して、2KWメタルハライドランプ[岩崎電気(株)製ア
イドルフィン2000]を光源として8.0mW/cm2の条件で、7
0秒間露光した。On the photosensitive lithographic printing plate (A) thus obtained, a step tablet for sensitivity measurement (manufactured by Eastman Kodak Company)
No.2, in close contact gray scale) of each density difference 0.15 21 steps, the conditions of 2KW metal halide lamp [Iwasaki Electric Co., Ltd. idle fins 2000] 8.0mW / cm 2 as a light source, 7
It was exposed for 0 seconds.
この試料を4重量%メタケイ酸カリウム水溶液で25℃
にて45秒間現像したところ、非画像部は完全に除去され
て平版印刷版を得た。感度を前記ステップタブレットの
グレースケールで測定すると41/2段目が完全に現像され
て(クリアーとなって)いた。This sample was treated with a 4 wt% potassium metasilicate aqueous solution at 25 ° C.
After development for 45 seconds, the non-image area was completely removed to obtain a lithographic printing plate. When the sensitivity was measured with the gray scale of the step tablet, the 41 / 2th stage was completely developed (clear).
次に現像許容性(現像ラチチュード)を検討するため
に、標準の4重量%メタケイ酸カリウム水溶液よりもそ
のアルカル濃度が希釈された現像液、そしてそのアルカ
リ濃度が濃くなった現像液を各々用意し、前記70秒露光
した試料を使って、現像能力が低下した現像液に対する
現像性(アンダー現像性)及び現像能力が過剰になった
現像液に対する現像性(オーバー現像性)を検討した。
アンダー現像性の検討では、1.9重量%及び1.7重量%メ
タケイ酸カリウム水溶液で各々25℃、45秒間現像し非画
像部の溶解性を判定した。より希釈された現像液で非画
像部の感光層が溶解される程、アンダー現像性は良いこ
とになる。オーバー現像性の検討では6.0重量%のメタ
ケイ酸カリウム水溶液で25℃、60秒間及び、7.2重量%
のメタケイ酸カリウム水溶液で25℃、90秒間の条件で各
々現像し、そのベタ段数(前記ステップタブレットのグ
レースケールにおいて、感光層が完全に残存している最
低の段数)を測定し、これと標準現像(4重量%メタケ
イ酸カリウム水溶液、25℃、45秒間)した際のベタ段数
との差を求めた。このベタ段数差が小さく標準現像に近
い程、未露光部の侵食は少なくて、オーバー現像性は良
いことになる。現像許容性が良いとは、アンダー現像
性、オーバー現像性がともに良いことを意味する。Next, in order to examine the development acceptability (development latitude), a developer having a more concentrated alcal concentration than the standard 4% by weight potassium metasilicate aqueous solution and a developer having a higher alkali concentration are prepared. Using the sample exposed for 70 seconds, the developing property for a developing solution having a lowered developing ability (under developing property) and the developing property for a developing solution having an excessive developing ability (over developing property) were examined.
In the examination of under-development property, the solubility of non-image area was judged by developing with 1.9 wt% and 1.7 wt% potassium metasilicate aqueous solution at 25 ° C. for 45 seconds, respectively. The better the underdeveloping property is, the more the photosensitive layer in the non-image area is dissolved by the diluted developer. In the study of over-developing property, a 6.0 wt% potassium metasilicate aqueous solution was used at 25 ° C for 60 seconds and 7.2 wt%.
Each is developed with an aqueous solution of potassium metasilicate at 25 ° C. for 90 seconds, and the solid step number (the minimum step number in which the photosensitive layer is completely left in the gray scale of the step tablet) is measured. The difference from the number of solid steps at the time of development (4 wt% potassium metasilicate aqueous solution, 25 ° C., 45 seconds) was determined. The smaller the difference in the number of solid steps and the closer to standard development, the less the erosion of the unexposed area and the better the over-developing property. Good development tolerance means that both underdeveloping property and overdeveloping property are good.
又、セーフライト性を検討するために、前記感光性平
版印刷版(A)を露光及び現像処理する前に、白色蛍光
灯(310ルックス)で15分間さらして、光カブリを生じ
させ、次に前記標準現像処理を行い、感光層の膜減り率
を測定した。膜減り率は、光カブリを被らずに現像され
た感光性平版印刷版の感光層の膜厚に対して光カブリを
被って現像された場合、どれだけ膜厚が減少するかを示
す値であり、この値が小さい程セーフライト性は良いこ
とを意味する。光カブリによる耐刷力の低下を検討する
ために、前記の感光性平版印刷版(A)を前述のように
ポジ原稿フィルムを密着させて露光し、次に前述のよう
に白色蛍光灯によって光カブリを生じさせて後、標準現
像処理を行い平版印刷版[I]を得た。一方、光カブリ
を与えず、他の処理を同様にして別の平版印刷版[II]
を作製した。この2つの平版印刷版[I]及び[II]を
オフセット印刷機(ハマダスター900CDX)に並べて設置
し、印刷を行った。耐刷力の終点の判定は、画線部のベ
タ部がはく離して印刷できなくなるところとした。Further, in order to examine the safelight property, before exposing and developing the photosensitive lithographic printing plate (A), it is exposed to a white fluorescent lamp (310 lux) for 15 minutes to cause optical fog. The standard development processing was performed and the film reduction rate of the photosensitive layer was measured. The film reduction rate is a value that indicates how much the film thickness decreases when developed with light fog with respect to the film thickness of the photosensitive layer of a photosensitive lithographic printing plate developed without light fog. The smaller the value, the better the safelight property. In order to examine the reduction in printing durability due to light fog, the above-mentioned photosensitive lithographic printing plate (A) was exposed by adhering a positive original film as described above, and then exposed by a white fluorescent lamp as described above. After fog was generated, standard development processing was performed to obtain a lithographic printing plate [I]. On the other hand, another lithographic printing plate [II] was processed in the same way as the other processing without giving light fog.
Was produced. The two lithographic printing plates [I] and [II] were placed side by side on an offset printing machine (Hamaduster 900CDX) to perform printing. The end point of the printing durability was determined when the solid portion of the image area was peeled off and printing could not be performed.
次にボールペン適性を検討するために露光及び現像処
理前の前記感光性平版印刷版(A)上にボールペン
(I)[ゼブラ(株)社製、ZEBRAN5100黒色]、ボール
ペン(II)[トンボ鉛筆(株)社製、GOLF青]及びボー
ルペン(III)[パイロット万年筆(株)社製、BS−
青]の3種のボールペンを用いて20gの筆圧で線を描
き、1分間放置後、露光を行わず前述のオーバー現像条
件(6.0%、25℃、60秒間)で現像を行った。ボールペ
ン適性の評価は、筆跡後の感光層の侵食程度を各々3ラ
ンクで判定した。Next, in order to examine the suitability for a ballpoint pen, a ballpoint pen (I) [ZEBRAN5100 black manufactured by Zebra Corp.], a ballpoint pen (II) [Dragon Pencil ( Co., Ltd., GOLF Blue] and ballpoint pen (III) [Pilot Fountain Pen Co., Ltd., BS-
A line was drawn by using three ballpoint pens of [Blue] with a writing pressure of 20 g and left for 1 minute, and then developed under the above-mentioned over-developing conditions (6.0%, 25 ° C., 60 seconds) without exposure. To evaluate the suitability for a ballpoint pen, the degree of erosion of the photosensitive layer after handwriting was judged in 3 ranks.
以上得られた感度、現像許容性、セーフライト性及び
ボールペン適性の検討結果を表1に示す。Table 1 shows the examination results of the sensitivity, the developability, the safelight property, and the suitability for a ball-point pen obtained above.
比較例1 実施例1の感光性塗布液より、例示化合物(2)の界
面活性剤を除いたものを実施例1と同じ支持体に同様に
して塗布乾燥し、感光性平版印刷版(B)を得た。Comparative Example 1 A photosensitive lithographic printing plate (B) was prepared by removing the surfactant of Exemplified Compound (2) from the photosensitive coating liquid of Example 1 on the same support as in Example 1 and drying the same. Got
乾燥後の塗布重量は約22mg/dm2であった。The coating weight after drying was about 22 mg / dm 2 .
かかる感光性平版印刷版(B)を用いて、実施例1と
同様に、感度、現像許容性、セーフライト性及びボール
ペン適性の評価を行った。その結果を表1に示す。Using the photosensitive lithographic printing plate (B), the sensitivity, the development acceptability, the safelight property and the ballpoint pen suitability were evaluated in the same manner as in Example 1. Table 1 shows the results.
比較例2 実施例1の感光性塗布液より、感脂化剤[I]を除い
たものを、実施例1と同じ支持体に同様にして塗布乾燥
し、感光性平版印刷版(C)を得た。Comparative Example 2 The photosensitive coating liquid of Example 1 from which the oil sensitizer [I] was removed was coated on the same support as in Example 1 and dried to give a photosensitive lithographic printing plate (C). Obtained.
乾燥後の塗布重量は約22mg/dm2であった。The coating weight after drying was about 22 mg / dm 2 .
かかる感光性平版印刷版(C)を用いて、実施例1と
同様に、感度、現像許容性、セーフライト性及びボール
ペン適性の評価を行った。その結果を表1に示す。Using the photosensitive lithographic printing plate (C), the sensitivity, the development acceptability, the safelight property, and the ballpoint pen suitability were evaluated in the same manner as in Example 1. Table 1 shows the results.
比較例3 実施例1の支持体上に、以下の感光性塗布液を実施例
1と同様にして塗布乾燥し、感光性平版印刷版(D)を
得た。Comparative Example 3 On the support of Example 1, the following photosensitive coating liquid was applied and dried in the same manner as in Example 1 to obtain a photosensitive lithographic printing plate (D).
(感光性塗布液組成) ・ナフトキノン−(1,2)−ジアジド−(2)−5−ス
ルホン酸クロライドとピロガロール・アセトン樹脂との
エステル化合物(特開昭61−243446号公報合成例2に記
載された化合物) 1 g ・フェノールとm−,p−混合クレゾールとホルムアルデ
ヒドとの共重縮合樹脂(Mn=1.25×103,Mw=1.03×1
04、フェノールとクレゾールのモル比は4:6 3.5 g ・2−トリクロロメチル−5−[β−(2′−ベンゾフ
リル)ビニル]−1,3,4−オキサジアゾール 0.03g ・ビクトリアピュアブルーBOH p (保土ケ谷化学社製) 0.1 g ・感脂化剤[I] 0.17g ・メチルセロソルブ 50ml 乾燥後の塗布重量は約22mg/dm2であった。(Composition of photosensitive coating liquid) -Ester compound of naphthoquinone- (1,2) -diazide- (2) -5-sulfonic acid chloride and pyrogallol-acetone resin (described in JP-A-61-243446, Synthesis Example 2) Compound) 1 g ・ Copolycondensation resin of phenol, m-, p-mixed cresol and formaldehyde (Mn = 1.25 × 10 3 , Mw = 1.03 × 1
0 4 , the molar ratio of phenol to cresol is 4: 6 3.5 g 2-Trichloromethyl-5- [β- (2'-benzofuryl) vinyl] -1,3,4-oxadiazole 0.03 g-Victoria Pure Blue BOH p (manufactured by Hodogaya Chemical Co., Ltd.) 0.1 g-Sensitizer [I] 0.17 g-Methyl cellosolve 50 ml The coating weight after drying was about 22 mg / dm 2 .
この感光性平版印刷版(D)を用いて、実施例1と同
様に、感度、現像許容性、セーフライト性及びボールペ
ン適性の評価を行った。その結果を表1に示す。Using this photosensitive lithographic printing plate (D), the sensitivity, development acceptability, safelight property, and ball-point pen suitability were evaluated in the same manner as in Example 1. Table 1 shows the results.
比較例4 実施例1の支持体上に、以下に感光性塗布液を実施例
1と同様にして塗布乾燥し、感光性平版印刷版(E)を
得た。Comparative Example 4 The photosensitive coating liquid was applied and dried on the support of Example 1 in the same manner as in Example 1 to obtain a photosensitive lithographic printing plate (E).
(感光性塗布液組成) ・ナフトキノン−(1,2)−ジアジド−(2)−5−ス
ルホン酸クロライドとピロガロール・アセトン樹脂との
エステル化合物(米国特許第3,635,709号明細書の実施
例1に記載されている化合物) 1.7g ・フェノールとm−,p−混合クレゾールとホルムアルデ
ヒドとの共重縮合樹脂(住友デュレズ社製SK−102) (特開昭61−6647号公報実施例1に記載された化合物)
4.42g ・フェノールとm−,p−混合クレゾールとホルムアルデ
ヒドとの共重縮合樹脂(住友デュレズ社製SK−105) (特開昭61−6647号公報実施例1に記載された化合物)
2.08g ・感脂化剤[I] 0.082 g ・ビクトリアピュアブルーBOH (保土ケ谷化学(株)社製) 0.072 g ・エチルセロソルブ 80ml ・メチルセロソルブ 20ml 乾燥後の塗布重量は約22mg/dm2であった。(Photosensitive coating liquid composition) -Ester compound of naphthoquinone- (1,2) -diazide- (2) -5-sulfonic acid chloride and pyrogallol-acetone resin (described in Example 1 of US Pat. No. 3,635,709) Compound) 1.7 g-co-polycondensation resin of phenol, m-, p-mixed cresol and formaldehyde (SK-102 manufactured by Sumitomo Durez Co., Ltd.) (described in Example 1 of JP-A-61-6647). Compound)
4.42g ・ Copolycondensation resin of phenol, m-, p-mixed cresol and formaldehyde (SK-105 manufactured by Sumitomo Dures Co., Ltd.) (Compound described in Example 1 of JP-A No. 61-6647)
2.08g-Sensitizer [I] 0.082 g-Victoria Pure Blue BOH (Hodogaya Chemical Co., Ltd.) 0.072 g-Ethyl cellosolve 80 ml-Methyl cellosolve 20 ml The coating weight after drying was about 22 mg / dm 2 . .
この感光性平版印刷版(E)を用いて、実施例1と同
様に、感度、現像許容性、セーフライト性及びボールペ
ン適性の評価を行った。その結果を表1に示す。Using this photosensitive lithographic printing plate (E), the sensitivity, development acceptability, safelight property and ballpoint pen suitability were evaluated in the same manner as in Example 1. Table 1 shows the results.
比較例5 実施例1の支持体上に、以下の感光性塗布液を実施例
1と同様にして塗布乾燥し、感光性平版印刷版(F)を
得た。Comparative Example 5 The following photosensitive coating liquid was applied onto the support of Example 1 and dried in the same manner as in Example 1 to obtain a photosensitive lithographic printing plate (F).
(感光性塗布液組成) ・ナフトキノン−(1,2)−ジアジド−(2)−5−ス
ルホン酸クロライドとピロガロール・アセトン樹脂との
エステル化合物(Mn=1500,Mw=1700,縮合率50モル%)
1.67g ・フェノールとm−,p−混合クレゾールとホルムアルデ
ヒドとの共重縮合樹脂(Mw=9300,分散度=6.2)(特開
昭61−205933号公報実施例1に記載の樹脂) 6.53 g ・感脂化剤[I] 0.082 g ・ビクトリアピュアーブルーBOH [保土ケ谷化学(株)社製] 0.072 g ・エチルセロソルブ 80ml ・メチルセロソルブ 20ml 乾燥後の塗布重量は約22mg/dm2であった。(Photosensitive coating liquid composition) -Ester compound of naphthoquinone- (1,2) -diazide- (2) -5-sulfonic acid chloride and pyrogallol-acetone resin (Mn = 1500, Mw = 1700, condensation rate 50 mol% )
1.67 g-Copolycondensation resin of phenol, m-, p-mixed cresol and formaldehyde (Mw = 9300, dispersity = 6.2) (resin described in Example 1 of JP-A-61-205933) 6.53 g Sensitizer [I] 0.082 g-Victoria Pure Blue BOH [manufactured by Hodogaya Chemical Co., Ltd.] 0.072 g-Ethyl cellosolve 80 ml-Methyl cellosolve 20 ml The coating weight after drying was about 22 mg / dm 2 .
この感光性平版印刷版(F)を用いて、実施例1と同
様に、感度、現像許容性、セーフライト性及びボールペ
ン適性の評価を行った。その結果を表1に示す。Using this photosensitive lithographic printing plate (F), the sensitivity, development acceptability, safelight property and ballpoint pen suitability were evaluated in the same manner as in Example 1. Table 1 shows the results.
比較例6 実施例1の支持体上に、以下に感光性塗布液を実施例
1と同様にして塗布乾燥し、感光性平版印刷版(G)を
得た。Comparative Example 6 A photosensitive coating solution was applied and dried on the support of Example 1 in the same manner as in Example 1 to obtain a photosensitive lithographic printing plate (G).
(感光性塗布液組成) ・ナフトキノン−(1.2)−ジアジド−(2)−5−ス
ルホン酸クロライドとピロガロール・アセトン樹脂との
エステル化合物(ピロガロール・アセトン樹脂のMn=16
40,Mw=3010) (特開昭61−267043号公報実施例2に記載された化合
物) 1.88g ・m−クレゾールとp−クレゾールとホルムアルデヒド
との共重縮合樹脂(合成時のm−クレゾールとp−クレ
ゾールの重量比は75:25)(特開昭61−267043号公報実
施例2に記載された樹脂) 6.32g ・感脂化剤[I] 0.082 g ・ビクトリアピュアーブルーBOH [保土ケ谷化学(株)社製] 0.072 g ・メチルセロソルブ 60ml ・メチルセロソルブ 40ml 乾燥後の塗布重量は約22mg/dm2であった。(Composition of photosensitive coating liquid) -Ester compound of naphthoquinone- (1.2) -diazide- (2) -5-sulfonic acid chloride and pyrogallol-acetone resin (Mn = 16 of pyrogallol-acetone resin)
40, Mw = 3010) (Compound described in JP-A No. 61-267043, Example 2) 1.88 g-co-polycondensation resin of m-cresol, p-cresol and formaldehyde (m-cresol at the time of synthesis) The weight ratio of p-cresol is 75:25) (resin described in JP-A-61-267043, Example 2) 6.32 g-sensitizer [I] 0.082 g-Victoria Pure Blue BOH [Hodogaya Chemical ( Co., Ltd.] 0.072 g-methyl cellosolve 60 ml-methyl cellosolve 40 ml The coating weight after drying was about 22 mg / dm 2 .
この感光性平版印刷版(G)を用いて、実施例1と同
様に、感度、現像許容性、セーフライト性及びボールペ
ン適性の評価を行った。その結果を表1に示す。Using this photosensitive lithographic printing plate (G), the sensitivity, development acceptability, safelight property and ballpoint pen suitability were evaluated in the same manner as in Example 1. Table 1 shows the results.
比較例7 実施例1の感光性塗布液より、感脂化剤[I]及び例
示化合物(2)のフッ素系界面活性剤を除いたものを、
実施例1と同じ支持体に同様にして塗布乾燥し、感光性
平版印刷版(H)を得た。Comparative Example 7 A composition obtained by removing the oil-sensitizing agent [I] and the fluorinated surfactant of the exemplified compound (2) from the photosensitive coating liquid of Example 1 was used.
The same support as in Example 1 was applied and dried in the same manner to obtain a photosensitive lithographic printing plate (H).
乾燥後の感光性層の塗布重量は約22mg/dm2であった。The coating weight of the photosensitive layer after drying was about 22 mg / dm 2 .
この感光性平版印刷版(H)を用いて、実施例1と同
様に、感度、現像許容性、セーフライト性及びボールペ
ン適性の評価を行った。その結果を表1に示す。Using this photosensitive lithographic printing plate (H), the sensitivity, development acceptability, safelight property and ballpoint pen suitability were evaluated in the same manner as in Example 1. Table 1 shows the results.
以上、実施例1及び比較例1〜7について行った感
度、現像許容性、セーフライト性及びボールペン適性の
測定結果をまとめると表1のようになる。The results of measurement of sensitivity, development tolerance, safelight property, and ballpoint pen suitability performed for Example 1 and Comparative Examples 1 to 7 are summarized in Table 1.
表1のボールペン適性において、 A印は画像部の侵食が僅かである。 In the suitability for the ballpoint pen of Table 1, the mark A has little erosion in the image area.
B印は同上侵食が認められ、感光層の下の支持体の砂目
がやや露出している。As for the mark B, erosion was observed as above, and the grain of the support under the photosensitive layer was slightly exposed.
C印は同上侵食が著しく認められ、感光層の下の支持体
の砂目が完全に露出している。As for the C mark, erosion was remarkably observed, and the grains of the support below the photosensitive layer were completely exposed.
ことを意味する。Means that.
アンダー現像性において、 ○印は非画像部の感光層が完全に溶解除去されている。 In the under-developing property, the mark ◯ indicates that the photosensitive layer in the non-image area is completely dissolved and removed.
△印は同上一部残存している。The part marked with Δ remains as above.
×印は同上ほとんど溶解していない。The mark x is almost the same as above, but not dissolved.
ことを意味する。Means that.
オーバー現像性において、数値は標準現像とのベタ段
数差を意味し、−印は画像部の侵食が著しく、ベタ段数
がほとんど判定できない程オーバー現像性が悪いという
ことを意味する。In the over-developing property, the numerical value means the difference in the number of solid steps from the standard development, and the-mark means that the erosion of the image area is remarkable and the over-developing property is so poor that the solid step number cannot be determined.
以上の実施例及び比較例の結果から、以下のことが明
らかである。The following is clear from the results of the above Examples and Comparative Examples.
すなわち、実施例1と比較例1または2の比較から、
フッ素系界面活性剤がなければ、セーフライト性、ボー
ルペン適性及びオーバー現像性に劣り、本発明の感脂化
剤[I]がなければ、セーフライト性、ボールペン適性
及びオーバー現像性に劣り、フッ素系界面活性剤及び本
発明の感脂化剤双方を含むことによって上記すべての特
性にすぐれた感光性平版印刷版が得られることがわか
る。比較例3の感光性平版印刷版(D)は、セーフライ
ト性及びオーバー現像性には優れているが、一方、感
度、アンダー現像性及びボールペン適性に大きく劣って
いる。比較例4の感光性平版印刷版(E)は、セーフラ
イト性を、比較例5及び6の感光性平版印刷版(F)及
び(G)は、ボールペン適性及びセーフライト性を改良
した従来技術であるが、前述の実験条件下で評価すると
ボールペン適性及びセーフライト性共に劣っている。
又、比較例1、2及び7と実施例1との比較より、フッ
素系界面活性剤の例示化合物(2)と本発明の感脂化剤
[I]を組み合わせることにより、オーバー現像性、ボ
ールペン適性、セーフライト性において相乗効果が認め
られる。That is, from the comparison between Example 1 and Comparative Example 1 or 2,
Without the fluorine-based surfactant, the safelight property, the ball-point pen suitability and the over-developing property are inferior. It can be seen that a photosensitive lithographic printing plate excellent in all of the above properties can be obtained by including both the surface active agent and the oil sensitizer of the present invention. The photosensitive lithographic printing plate (D) of Comparative Example 3 is excellent in safelight property and over-developing property, but is largely inferior in sensitivity, under-developing property and ballpoint pen suitability. The photosensitive lithographic printing plate (E) of Comparative Example 4 was improved in safelight property, and the photosensitive lithographic printing plates (F) and (G) of Comparative Examples 5 and 6 were improved in ballpoint pen suitability and safelight property. However, when evaluated under the above-mentioned experimental conditions, both the ballpoint pen suitability and the safelight property are poor.
Further, comparison between Comparative Examples 1, 2 and 7 and Example 1 reveals that the combination of the exemplified compound (2) which is a fluorosurfactant and the oil sensitizer [I] of the present invention makes it possible to improve over-developing property and ballpoint pen. A synergistic effect is observed in aptitude and safelight property.
感光性平版印刷版の性能は、1つの特性だけでは評価
することはできない。いくつかの特性で総合的に評価し
なくてはならない。実施例1の感光性平版印刷版(A)
以外の比較例1〜7の感光性平版印刷版(B)〜(H)
は、表1の少なくともどれか1つの特性において大きな
欠点を有しているか、又は、ボールペン適性及びセーフ
ライト性において感光性平版印刷版(A)よりも劣る。
本発明の感光性平版印刷版(A)は、オーバー現像性及
びアンダー現像性に優れ、幅広い現像許容性を有してお
り、感度、ボールペン適性及びセーフライト性において
も、総合的に優れたものである。The performance of the photosensitive lithographic printing plate cannot be evaluated by only one characteristic. Some characteristics must be comprehensively evaluated. Photosensitive lithographic printing plate (A) of Example 1
Photosensitive lithographic printing plates (B) to (H) of Comparative Examples 1 to 7 other than
Has a major drawback in at least one of the properties shown in Table 1, or is inferior to the photosensitive lithographic printing plate (A) in ballpoint pen suitability and safelight property.
The photosensitive lithographic printing plate (A) of the present invention is excellent in over-developing property and under-developing property and has a wide development tolerance, and is also excellent in sensitivity, ballpoint pen suitability and safelight property as a whole. Is.
[発明の効果] 以上説明したように、本発明の感光性組成物を用いる
ことにより、感度及び現像許容性の低下を伴うことな
く、セーフライト性及びボールペン適性が改良された感
光性平版印刷版が得られた。[Effects of the Invention] As described above, by using the photosensitive composition of the present invention, a photosensitive lithographic printing plate improved in safelight property and suitability for ballpoint pen without deterioration in sensitivity and development acceptability. was gotten.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 鈴木 則人 東京都日野市さくら町1番地 小西六写真 工業株式会社内 (72)発明者 富安 寛 神奈川県横浜市緑区鴨志田町1000番地 三 菱化成工業株式会社総合研究所内 (72)発明者 小林 佳子 神奈川県横浜市緑区鴨志田町1000番地 三 菱化成工業株式会社総合研究所内 (56)参考文献 特開 昭58−105143(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Norito Suzuki, No. 1 Sakura-cho, Hino-shi, Tokyo, Konishi Roku Photo Industrial Co., Ltd. Industrial Research Institute, Inc. (72) Inventor, Yoshiko Kobayashi, 1000, Kamoshida-cho, Midori-ku, Yokohama, Kanagawa Sanryo Kasei Industry Co., Ltd. (56) Reference JP-A-58-105143 (JP, A)
Claims (1)
下記一般式[I]で表される置換フェノール類とアルデ
ヒド類との縮合樹脂および/または該樹脂のO−ナフト
キノンジアジドスルホン酸エステル化合物及び(C)フ
ッ素系界面活性剤、を含有することを特徴とする感光性
平版印刷版。 一般式[I] (式中、R1およびR2は各々水素原子、アルキル基または
ハロゲン原子を表し、R3は炭素数3〜8のアルキル基ま
たは炭素数3〜8のシクロアルキル基を表す。)1. An (A) O-quinonediazide compound, (B)
Containing a condensed resin of a substituted phenol represented by the following general formula [I] and an aldehyde, and / or an O-naphthoquinonediazide sulfonic acid ester compound of the resin and (C) a fluorine-based surfactant. And a photosensitive lithographic printing plate. General formula [I] (In the formula, R 1 and R 2 each represent a hydrogen atom, an alkyl group or a halogen atom, and R 3 represents an alkyl group having 3 to 8 carbon atoms or a cycloalkyl group having 3 to 8 carbon atoms.)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62203831A JPH0830140B2 (en) | 1987-08-17 | 1987-08-17 | Photosensitive lithographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62203831A JPH0830140B2 (en) | 1987-08-17 | 1987-08-17 | Photosensitive lithographic printing plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6448849A JPS6448849A (en) | 1989-02-23 |
| JPH0830140B2 true JPH0830140B2 (en) | 1996-03-27 |
Family
ID=16480427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62203831A Expired - Fee Related JPH0830140B2 (en) | 1987-08-17 | 1987-08-17 | Photosensitive lithographic printing plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0830140B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2800217B2 (en) * | 1989-01-11 | 1998-09-21 | ジェイエスアール株式会社 | Radiation-sensitive resin composition for integrated circuit production |
| AU660882B1 (en) * | 1994-01-25 | 1995-07-06 | Morton International, Inc. | Waterborne photoresists having non-ionic fluorocarbon surfactants |
| WO2017126610A1 (en) * | 2016-01-20 | 2017-07-27 | 日産化学工業株式会社 | Positive photosensitive resin composition |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58105143A (en) * | 1981-12-17 | 1983-06-22 | Kanto Kagaku Kk | Positive type photoresist composition |
-
1987
- 1987-08-17 JP JP62203831A patent/JPH0830140B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6448849A (en) | 1989-02-23 |
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