JPH08314098A - Photosensitive material development processor - Google Patents

Abstract

(57) [Abstract] [Purpose] To reduce fatigue of the processing solution used for developing the photosensitive material, to keep the activity for a long time, to reduce the supply amount of the replenishing solution, to reduce the processing cost and to reduce the pollution load. Provided is a developing processing device having good operability. In a photosensitive material development processing apparatus for carrying out development processing while transporting a photosensitive material into one or more processing baths containing a required processing liquid, the photosensitive material development processing apparatus is in or outside the liquid in at least one of the processing baths. Alternatively, a light source is provided in a part of the liquid circulation path, and there is an irradiation means for irradiating the treatment liquid with the light wave of the light source,
At the same time, a photosensitive material detecting means is provided in the processing tank, and it is possible to stop the irradiation of the irradiating means for a predetermined time upon receiving the photosensitive material detecting signal.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive material developing and processing apparatus for developing a diazo type photosensitive material or a silver halide photosensitive material.

[0002]

2. Description of the Related Art A diazo type light-sensitive material is exposed and then developed by a development processing apparatus having various steps such as a vat-type developing tank, a pre-rinse shower tank, a gum solution shower tank and a drying section, and a silver halide light-sensitive material is also developed. Development is performed by a development processing apparatus having various steps of a tank, a fixing tank, a stabilizing tank, and a drying section.

However, as the development of the light-sensitive material is repeated, each processing solution becomes fatigued and the sensitivity is lowered, and a precipitate is generated. In order to prevent this, a predetermined amount of each replenisher is replenished each time a predetermined amount of the light-sensitive material is processed, and a means for avoiding contact of the processing liquid with air is adopted.

[0004]

Means for avoiding the fatigue of the processing solution is adopted, but it is not sufficient.

In particular, as a measure for avoiding contact with the air, there is a means for providing a lid such as a floating lid on the liquid surface, but the operability is not good. The present invention suppresses the generation of precipitates in the processing liquid,
It is an object of the present invention to provide a photosensitive material development processing apparatus which has a long service life of the processing solution and is excellent in maintainability because the frequency of the processing solution replacement is reduced.

[0006]

This object is achieved by any of the following technical means (1), (2), (3) and (4). (1) In a photosensitive material development processing apparatus for carrying out development processing while conveying a photosensitive material into one or more processing tanks containing a required processing solution and performing immersion while being immersed in the solution, at least one of the processing tanks is in or outside the solution. Alternatively, a photosensitive material development processing apparatus having a light source in a part of a liquid circulation path and provided with an irradiation unit for irradiating the processing liquid with a light wave of the light source.

(2) In a photosensitive material development processing apparatus for carrying out development processing while transporting a photosensitive material into one or more processing tanks containing a required processing solution and performing immersion development, at least one of the processing tanks Alternatively, a light source is provided outside the liquid or in a part of the circulation path of the liquid, and a photosensitive material detection unit is provided in the processing tank while having an irradiation unit that irradiates the processing liquid with a light wave of the light source,
A photosensitive material development processing apparatus, characterized in that it is possible to stop the irradiation of said irradiation means for a predetermined time upon receiving the photosensitive material detection signal.

(3) The light-sensitive material development processing apparatus according to (1) or (2), wherein the light source is provided with a wavelength varying means.

(4) The light-sensitive material development processing apparatus according to any one of (1) to (3), wherein the light source is provided with a reflecting member for reflecting a light wave to the processing liquid. .

[0010]

EXAMPLES The present invention will be described in detail below with reference to its working examples, but the embodiment of the present invention is not limited thereto.

First, an embodiment of the present invention will be described with reference to a schematic side view of a photosensitive material developing processing apparatus (hereinafter simply referred to as a developing processing apparatus) shown in FIG.

This developing processing apparatus uses a diazo type PS plate as an example of a photosensitive material, and it has a supply base 1, a developing tank inlet 28, a shallow bat type developing tank 29, a pre-rinse shower tank 46, and a finisher 52. A drying unit 58 is provided.

Then, the shallow vat type developing tank 29 is supplied with respective liquids from the developing replenishing liquid tank 37 and the diluting water tank 38, so that the developing liquid 6 having an appropriate concentration is maintained at an appropriate water level, and the heater is used. The circulation pump 33 keeps the developer in the liquid tank at a proper temperature and maintains the cleanliness of the developer through the filter 32 for filtration. Also, the liquid that is exhausted and whose activity has decreased is
It is discharged to 42 and replaced with a new developer.

Further, the pre-rinse shower tank 46 and the finisher tank 52 are filled with an appropriate amount of the processing liquid, and the circulating pumps 48 and 49 are used to supply the processing liquid to the shower nozzle 1
The gum solution is sprayed from 6 and 20 toward the PS plate conveyed from the developing tank to perform the processing.

The overflowed processing liquid and the fatigued processing liquid are put in the waste liquid tanks 50 and 55, respectively.

In this way, the exposed planographic printing plate 27 such as the PS plate placed on the supply table 1 and waiting is in the developing tank 29.
After being sandwiched by a pair of carry-in rollers 3 provided in a carry-in section 28 outside the liquid, carried into the developing tank, guided by the guide roller 7 and the brush roller 8 of the developing tank 29 and squeezed by the squeeze roller 12. The carry-out roller 14 is carried by the carry-in roller 14 to the next pre-rinse shower tank 46 and further to the finisher tank 52 to be subjected to a pre-rinse shower and a finishing shower, and is finished and recovered through the drying section 58.

In FIG. 1, the light source 61 and its protective cover 62 are attached to the developing solution in the developing tank 29 at two places, and the pre-rinse shower tank 46 and the finisher tank 5 are provided.
Similarly, the light source 61 and the protective cover 62 surrounding the light source 2
Are set one by one.

In this way, by installing a light source in each processing tank and irradiating each processing solution with a light wave, it is possible to suppress the generation of precipitates including sludge generated during the development processing. It was found that the phenomenon in which each treatment solution is fatigued and the activity is lowered is alleviated and the treatment is considerably improved.

FIG. 5 is a graph showing the relationship between the elapsed time of the developing solution and the pH change, that is, the state of precipitate formation. The developing solution was prepared by preparing a running developing solution as a model, and corresponds to the developing solution after processing 10 m ² of PS plate per liter.

The developer irradiated with the light wave by the light irradiation means has no generation of sludge-containing precipitates even after one month or more, and the pH value is sufficient for developing treatment. I understand.

On the other hand, the developing solution which was not irradiated with the light wave was 2
Generation of sludge-containing precipitates can be seen in about 0 days.

From this, it was found that the generation of precipitates can be suppressed by irradiating with light waves. Since the generation of precipitates is suppressed, the service life of the treatment liquid can be extended, and the activity has not decreased, so that the treatment liquid can be reused and the waste liquid can be reduced.
In addition, the work such as removal of precipitates is reduced.

In the side view of FIG. 2, the developing tank 29, the filter 32 for filtration, and the circulation pump 33 are connected in series by a vinyl chloride hose 66 to circulate the developer 6 while the developer 6 is being circulated. The one in which the light wave irradiation means 60 is provided between the circulation pumps 33 is shown.

The light wave irradiating means 60 is provided with a light source 61 at a focal position, and a reflection member such as a reflection mirror 63 for irradiating the treatment liquid efficiently with the light waves of the light source is provided around the light source 61. An intermediate storage portion 64 for the developing solution 6 is provided below the reference numeral 63 so as to be connected to the reflecting mirror. The developer 6 that has flowed in from the upper filter 32 and is temporarily stored in the storage portion 64 is irradiated with the light wave from the light source 61 directly and by the reflecting mirror 63, and flows out toward the circulation pump 33. It is done.

In the perspective view of FIG. 3, for example, a part of the transparent vinyl chloride hose 66 forming the flow path of the developing solution 6 between the filter 32 and the circulation pump 33 is used as the light wave irradiating means 70. A cylindrical reflecting mirror 73 is provided concentrically with the vinyl chloride hose 66, and a tube-shaped light source 71 is provided in the middle of the hose 66, so that the circulating developing solution passing through the transparent vinyl chloride hose 66 is uniformly irradiated with a light wave. It was made to do.

By installing such a light wave irradiating means not only in the developing solution but also in the circulation path of the pre-rinse shower solution or the finisher solution, it is possible to take the same solution fatigue deterioration preventing measures as the developing solution.

Further, the light wave irradiating means may be provided in each of the processing tanks described above, and the light wave irradiating means may be provided in the middle of the circulation path, or only one of them may be provided.

Further, the light sources 61 and 71 may be provided independently in each of the light wave irradiation means 60 and 70 at various places, but as shown in the partial side view of FIG. 4, the light source 81 and its reflection mirror 83 are provided. And a light wave irradiating means 80 having
The light wave emitted from the light source 81 is divided into a plurality of optical fiber tubes 85A, 85B and the like by direct and the light wave reflected by the reflecting mirror 83 around the light source 81, and the light is distributed and irradiated in each processing tank or in the middle of the circulation path. It can have such a structure.

Further, as shown in the schematic side view of the photosensitive material development processing apparatus of the present invention in FIG. 1, a photosensitive material detection sensor is provided in front of the carry-in roller pair 3 composed of upper and lower rollers 3A and 3B to the developing tank 29. 2 can be provided. When the sensor 2 detects the tip of a photosensitive material, for example, a PS plate, fed from the supply table 1, at least the light source provided in each processing tank is turned off for a predetermined time. The time may be the time for the photosensitive material to pass through the tank,
The time may be set to pass through all the processing tanks.

Further, when the photosensitive material is continuously loaded, the light is turned off for a long time.

However, in the above-mentioned embodiment, the irradiation means provided in the circulation path is different from the irradiation in the processing tank.
Since the light-sensitive material is not directly irradiated with light, the light source may be continuously irradiated even during processing of the light-sensitive material without turning off the light source.

Further, depending on the selection of the wavelength of the irradiation light having low color sensitivity with respect to the light-sensitive material, it is not necessary to turn off the light. Especially for diazo type PS plates, photosensitive materials for printing as silver salt type photosensitive materials and X ray films,
It is possible to avoid extinction by selecting the wavelength of the light wave and irradiating it.

However, since a color-matching photosensitive material such as a color film for general photography or movie photography has a photosensitizing action for all wavelengths of visible light, the above-mentioned extinguishing treatment is indispensable.

Further, it is possible to provide a wavelength varying means for varying the wavelength of the emitted light wave. In FIG. 1, the transparent cover provided as the protective cover 62 provided on the light source is used as a specific wavelength band transmission filter. The filter is composed of a filter that transmits only wavelengths having low color sensitivity suitable for the photosensitive material to be used, and some of them can be prepared and converted according to the type of the photosensitive material.

As described above, in the present invention, it is possible to eliminate the fatigue of the processing solution for both diazo type and silver salt type photosensitive materials and to maintain the activity for a long time. Therefore, the amount of the processing waste liquid can be reduced, the waste pollution processing cost can be greatly reduced, and the processing cost of the laboratory can be reduced.

[0036]

According to the present invention, the fatigue of the processing solution used for the development processing of the light-sensitive material is reduced, the activity is maintained for a long time, the supply amount of the replenishing solution is reduced, the development processing cost is lowered, and the pollution load is also reduced. It has become possible. Further, it is not necessary to provide a floating lid or the like to the processing tank to block the air from the processing tank, and the operability is improved.

[Brief description of drawings]

FIG. 1 is a schematic side view of an embodiment of a photosensitive material development processing apparatus of the present invention.

FIG. 2 is a side view of an embodiment of a light wave irradiation unit provided in a developing solution circulation path.

FIG. 3 is a perspective view of another embodiment of the light wave irradiator provided in the developing solution circulation path.

FIG. 4 is a partial side view of an embodiment of an irradiating means for distributing light waves to each processing liquid.

FIG. 5 is a graph showing the relationship between elapsed time and pH change with and without light irradiation.

[Explanation of symbols]

 2 Photosensitive material detection sensor 6 Developer 29 Developer tank 32 Filtration filter 33 Circulation pump 46 Pre-rinse shower tank 52 Finisher tank 60, 70, 80 Light wave irradiation means 61, 71, 81 Light source 63, 73, 83 Reflector 64 Intermediate reservoir 66 vinyl chloride hose 85A, 85B optical fiber tube

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yusuke Kimura 1st Sakura-cho, Hino City, Tokyo Konica Stock Company In-house

Claims (4)

[Claims] 1. A photosensitive material development processing apparatus for carrying out development processing while transporting a photosensitive material into one or more processing baths containing a required processing liquid, and performing development processing while being immersed in the liquid, or in at least one of said processing baths. Having a light source outside the liquid or in a part of the liquid circulation path,
An apparatus for developing a photosensitive material, comprising: an irradiation means for irradiating the processing liquid with the light wave of the light source. 2. A photosensitive material development processing apparatus for carrying out development processing while transporting a photosensitive material into one or more processing tanks containing a required processing solution and soaking it in liquid, and Provide a light source outside the liquid or in a part of the liquid circulation path,
It has an irradiation means for irradiating the processing liquid with the light wave of the light source, and a photosensitive material detection means is provided in the processing tank, and the irradiation of the irradiation means is stopped for a predetermined time upon receiving the photosensitive material detection signal. A photosensitive material development processing apparatus, which is made possible. 3. The photosensitive material development processing apparatus according to claim 1 or 2, wherein the light source is provided with a wavelength varying means. 4. The light source is provided with a reflecting member for reflecting a light wave to the processing liquid.
4. The photosensitive material development processing apparatus according to any one of 3 to 3.