JPH0837208A - Semiconductor element mounting method and device - Google Patents

Semiconductor element mounting method and device

Info

Publication number
JPH0837208A
JPH0837208A JP6172888A JP17288894A JPH0837208A JP H0837208 A JPH0837208 A JP H0837208A JP 6172888 A JP6172888 A JP 6172888A JP 17288894 A JP17288894 A JP 17288894A JP H0837208 A JPH0837208 A JP H0837208A
Authority
JP
Japan
Prior art keywords
mounting
semiconductor element
film
bare
mounting surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6172888A
Other languages
Japanese (ja)
Inventor
Takeshi Sasaki
剛 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Development and Engineering Corp
Original Assignee
Toshiba Corp
Toshiba Electronic Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Electronic Engineering Co Ltd filed Critical Toshiba Corp
Priority to JP6172888A priority Critical patent/JPH0837208A/en
Publication of JPH0837208A publication Critical patent/JPH0837208A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistors
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by conductive adhesives
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/013Manufacture or treatment of die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/073Connecting or disconnecting of die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/10Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/15Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Wire Bonding (AREA)

Abstract

(57)【要約】 【目的】 膜状接着部材を用いて半導体素子を基板上の
所定位置に実装する半導体素子の実装装置に関する。 【構成】 実装ツール25は支持面が上向きの仮付け位置
にあり、ベアIC13の実装面の反対を載せ、バキューム
機構を動作させてベアIC13を吸着保持し、90℃〜1
30℃に加熱する。加圧ツール27を下降動作させ、支持
部材26により所定の張力によって支持されている異方性
導電膜12を押し下げ、ベアIC13の実装面に圧接させ
る。加熱状態の実装面に圧接した異方性導電膜12の一部
のみ残留する。実装ツール25による加熱、加圧すること
により、熱硬化性の異方性導電膜12は一旦溶融した後に
硬化する。ベアIC13を基板11上に機械的に固着させる
とともに、異方性導電膜12内の導電粒子により、ベアI
C13の接続電極と基板11上の配線パターンとの間を導電
接続して実装が完了する。
(57) [Summary] [Object] To provide a semiconductor element mounting apparatus for mounting a semiconductor element at a predetermined position on a substrate by using a film adhesive member. [Structure] The mounting tool 25 has a support surface at a temporary mounting position with the support surface facing upward, mounts the opposite side of the mounting surface of the bare IC13, operates a vacuum mechanism to suck and hold the bare IC13, and 90 ° C to 1 ° C.
Heat to 30 ° C. The pressurizing tool 27 is moved down to push down the anisotropic conductive film 12 supported by the support member 26 with a predetermined tension, so that the anisotropic conductive film 12 is pressed against the mounting surface of the bare IC 13. Only a part of the anisotropic conductive film 12 pressed against the mounting surface in the heated state remains. By heating and pressurizing by the mounting tool 25, the thermosetting anisotropic conductive film 12 is once melted and then cured. The bare IC 13 is mechanically fixed on the substrate 11, and the bare I
The mounting is completed by conductively connecting the connection electrode of C13 and the wiring pattern on the substrate 11.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、膜状接着部材を用いて
半導体素子を基板上の所定位置に実装するための半導体
素子の実装方法およびその装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor element mounting method and apparatus for mounting a semiconductor element at a predetermined position on a substrate using a film adhesive member.

【0002】[0002]

【従来の技術】一般に、ベアICのような半導体素子を
基板上の所定位置に、直接フェースダウンで実装する場
合、異方性導電膜(ACF)やシート状接着剤などの膜
状接着部材を用いて実装することが知られている。
2. Description of the Related Art Generally, when a semiconductor element such as a bare IC is directly mounted face down at a predetermined position on a substrate, a film adhesive member such as an anisotropic conductive film (ACF) or a sheet adhesive is used. It is known to be implemented using.

【0003】そして、この実装方法は、基板の実装部分
に実装される半導体素子より少し大きめに切り取った異
方性導電膜を位置決めしておき、この異方性導電膜上に
実装される半導体素子の実装面を重ね合せ、この半導体
素子を加熱、加圧することにより、異方性導電膜を溶
融、硬化させ、半導体素子を基板上に機械的および電気
的に一体に結合して実装するものである。
In this mounting method, an anisotropic conductive film cut out a little larger than the semiconductor device mounted on the mounting portion of the substrate is positioned, and the semiconductor device mounted on this anisotropic conductive film. The mounting surfaces are stacked and the semiconductor element is heated and pressed to melt and cure the anisotropic conductive film, and the semiconductor element is mechanically and electrically integrated and mounted on the substrate. is there.

【0004】この実装に際しては、まず、図6および図
7に示すように、基板11の所定の実装部分に、膜状接着
部材としての異方性導電膜12を位置決めしておく。そし
て、異方性導電膜12は図10および図11で示す半導体
素子としてのベアIC13の実装面面積より少し大きめに
切り取ったもので、この異方性導電膜12の上面にはセパ
レータ12a が貼り付けられており、セパレータ12a の反
対側が基板11上と接する状態で取り付けられる。
In this mounting, first, as shown in FIGS. 6 and 7, an anisotropic conductive film 12 as a film adhesive member is positioned on a predetermined mounting portion of the substrate 11. The anisotropic conductive film 12 is cut out to be slightly larger than the mounting surface area of the bare IC 13 as a semiconductor element shown in FIGS. 10 and 11, and the separator 12a is attached to the upper surface of the anisotropic conductive film 12. It is attached so that the opposite side of the separator 12a is in contact with the substrate 11.

【0005】次に、図8で示すように、仮付けツール14
を用いて異方性導電膜12をセパレータ12a の上から加圧
し、あるいは、加圧、加熱し、異方性導電膜12を基板11
上に貼り付ける。この後、図9で示すようにセパレータ
12a を異方性導電膜12から剥ぎ取る。
Next, as shown in FIG.
To press the anisotropic conductive film 12 from above the separator 12a, or to press and heat the anisotropic conductive film 12 to form the anisotropic conductive film 12 on the substrate 11a.
Paste on top. After this, as shown in FIG.
12a is stripped from the anisotropic conductive film 12.

【0006】次に、図10で示すように、実装ツール15
により、実装されるベアIC13の反実装面を吸着保持す
るとともに、このベアIC13を所定温度に加熱する。そ
して、この加熱されたベアIC13のバンプ16が設けられ
た実装面を、基板11上の異方性導電膜12が貼り付けられ
た所定の実装位置に圧接させる。このとき、ベアIC13
は所定温度に加熱されており、異方性導電膜12は熱硬化
性により一旦溶融後に硬化する。そして、この動作によ
り、ベアIC13は基板11上に機械的に固着されるととも
に、異方性導電膜12内の導電粒子によりバンプ16を介し
て、基板11上に形成された図示しない配線パターンに導
電接続される。
Next, as shown in FIG.
This sucks and holds the non-mounting surface of the bare IC 13 to be mounted and heats the bare IC 13 to a predetermined temperature. Then, the mounting surface of the heated bare IC 13 provided with the bumps 16 is brought into pressure contact with a predetermined mounting position on the substrate 11 where the anisotropic conductive film 12 is attached. At this time, bare IC13
Is heated to a predetermined temperature, and the anisotropic conductive film 12 is once hardened and then hardened due to the thermosetting property. By this operation, the bare IC 13 is mechanically fixed to the substrate 11, and the conductive particles in the anisotropic conductive film 12 form the wiring pattern (not shown) formed on the substrate 11 via the bumps 16. Conductive connection.

【0007】この後、図11で示すように、実装ツール
15をベアIC13から取り外すことにより実装動作が完了
する。
After that, as shown in FIG.
The mounting operation is completed by removing 15 from the bare IC 13.

【0008】しかしながら、上述の実装方法では、基板
11上に貼り付けられた異方性導電膜12上にベアIC13を
実装しているが、位置精度を考慮すると、異方性導電膜
12にはベアIC13の実装面より少し大きなものを使用す
る必要がある。このため、実装時に、加熱されたベアI
C13により異方性導電膜12を圧接した場合、ベアIC13
の真下に位置する部分は溶融後に硬化するが、ベアIC
13の実装面より外側にはみ出した部分は、ベアIC13か
らの熱が十分に伝わらないため、未硬化状態のまま残っ
てしまう。
However, in the mounting method described above, the substrate
The bare IC 13 is mounted on the anisotropic conductive film 12 pasted on 11. However, considering the positional accuracy, the anisotropic conductive film is
It is necessary to use a device 12 having a size slightly larger than the mounting surface of the bare IC 13. Therefore, when mounting, the bare I
When the anisotropic conductive film 12 is pressed by C13, bare IC13
The part directly below the IC hardens after melting, but bare IC
Since the heat from the bare IC 13 is not sufficiently transmitted, the portion of the portion 13 protruding outside the mounting surface remains in an uncured state.

【0009】このように、異方性導電膜12の一部が未硬
化のまま残ると、異方性導電膜12の樹脂の未硬化部分に
含まれる不純物が、基板11上の配線パターンを腐食させ
たり、あるいは、実装後にベアIC13上や周囲に塗布さ
れる保護樹脂との密着性を阻害したりする不具合が生じ
る。特に、基板11に対する異方性導電膜12の精密な位置
決めを省略した場合は、ベアIC13の外形よりかなり大
きな異方性導電膜12を貼る必要があり、上述した問題が
一層顕著になるとともに、大幅な材料の無駄が生じる。
As described above, when a portion of the anisotropic conductive film 12 remains uncured, impurities contained in the uncured portion of the resin of the anisotropic conductive film 12 corrode the wiring pattern on the substrate 11. However, there is a problem in that the adhesiveness with the protective resin applied on or around the bare IC 13 is hindered after mounting. In particular, when the precise positioning of the anisotropic conductive film 12 with respect to the substrate 11 is omitted, it is necessary to attach the anisotropic conductive film 12 that is considerably larger than the outer shape of the bare IC 13, and the above-mentioned problem becomes more remarkable. Significant waste of material occurs.

【0010】さらに、図8で示した仮付け時に、仮付け
ツール14に接する側にはセパレータ12a が貼り付いてい
る必要があり、ベアIC13を実装する直前にこのセパレ
ータ12a を剥がす工程が必要になる。しかし、セパレー
タ12a を剥がす工程は自動化が難しく、実装機への組み
込みも困難である。
Further, at the time of temporary attachment shown in FIG. 8, a separator 12a needs to be attached to the side in contact with the temporary attachment tool 14, and a step of peeling off the separator 12a immediately before mounting the bare IC 13 is required. Become. However, it is difficult to automate the process of peeling the separator 12a, and it is also difficult to incorporate it into the mounting machine.

【0011】[0011]

【発明が解決しようとする課題】上述のように、従来方
法では、実装されるベアIC13より大きな異方性導電膜
12が必要であり、このため異方性導電膜12に未硬化部分
が生じ、この異方性導電膜12が基板11上に残ることによ
り、配線パターンの腐食や保護樹脂の密着性の低下など
を招くとともに材料の無駄を生じている。また、仮付け
状態では異方性導電膜12にセパレータ12a を貼り付けて
おく必要があり、このため、このセパレータ12a を実装
直前に剥がさねばならず、装置全体の自動化を困難なも
のにしている。
As described above, according to the conventional method, the anisotropic conductive film larger than the bare IC 13 to be mounted is used.
12 is required. Therefore, an uncured portion is generated in the anisotropic conductive film 12, and the anisotropic conductive film 12 remains on the substrate 11, resulting in corrosion of the wiring pattern and deterioration of adhesion of the protective resin. And wastes material. Further, in the temporarily attached state, it is necessary to attach the separator 12a to the anisotropic conductive film 12, and therefore the separator 12a must be peeled off immediately before mounting, which makes automation of the entire device difficult. .

【0012】本発明の目的は、実装される半導体素子の
実装面とほぼ同じ大きさの膜状接着部材が使用可能で、
膜状接着部材の未硬化部分が生じたり、材料の無駄が生
じたりすることがなく、しかも実装作業直前のセパレー
タ剥がし作業が不要な半導体素子の実装方法およびその
装置を提供することにある。
An object of the present invention is to use a film adhesive member having a size substantially the same as the mounting surface of a semiconductor element to be mounted,
An object of the present invention is to provide a semiconductor element mounting method and an apparatus thereof, in which an uncured portion of the film-like adhesive member does not occur and materials are not wasted, and the separator peeling work immediately before the mounting work is unnecessary.

【0013】[0013]

【課題を解決するための手段】請求項1記載の半導体素
子の実装方法は、所定温度に加熱された半導体素子の実
装面に、一面にシート状のセパレータが貼り付けられて
いる膜状接着部材を前記セパレータの反対側から加圧
し、この加圧後に前記セパレータを含む膜状接着部材の
他の部分を実装面から分離することにより、前記膜状接
着部材を実装面上に転写し、この転写後に前記膜状接着
部材が転写された前記半導体素子の実装面を基板上の所
定の実装位置に加圧、加熱して結合するものである。
According to a first aspect of the present invention, there is provided a method for mounting a semiconductor element, wherein a sheet-shaped separator is attached to one surface of a mounting surface of the semiconductor element heated to a predetermined temperature. Is pressed from the opposite side of the separator, and after this pressure is applied, the other part of the film-shaped adhesive member including the separator is separated from the mounting surface to transfer the film-shaped adhesive member onto the mounting surface, and the transfer After that, the mounting surface of the semiconductor element to which the film-shaped adhesive member is transferred is pressed and heated at a predetermined mounting position on the substrate to be bonded.

【0014】請求項2記載の半導体素子の実装装置は、
半導体素子を膜状接着部材を介して基板上の所定位置に
実装する半導体素子の実装装置において、前記半導体素
子を着脱可能に保持し、この保持状態にて半導体素子を
所定温度に加熱するとともに、この半導体素子を基板上
の所定位置に圧接させる実装ツールと、この実装ツール
の所定の実装位置と異なる仮付け位置にて、一面にセパ
レータが貼り付けられた膜状接着部材のセパレータの反
対側を、この実装ツールによって保持された半導体素子
の実装面と所定の間隔で対向させる支持部材と、この支
持部材により支持された前記膜状接着部材を前記半導体
素子の実装面上に圧接させ、この実装面に対応する部分
を実装面上に転写させる加圧ツールとを具備したもので
ある。
A mounting device for a semiconductor element according to a second aspect is
In a semiconductor element mounting device for mounting a semiconductor element at a predetermined position on a substrate via a film-like adhesive member, the semiconductor element is detachably held, and the semiconductor element is heated to a predetermined temperature in this holding state, A mounting tool for pressing the semiconductor element to a predetermined position on the substrate and a temporary attachment position different from the predetermined mounting position of the mounting tool on the opposite side of the separator of the film-like adhesive member having the separator attached to one surface thereof. A supporting member facing the mounting surface of the semiconductor element held by the mounting tool at a predetermined interval, and the film-like adhesive member supported by the supporting member are pressed against the mounting surface of the semiconductor element, and the mounting is performed. And a pressing tool for transferring a portion corresponding to the surface onto the mounting surface.

【0015】[0015]

【作用】請求項1記載の半導体素子の実装方法は、半導
体素子の実装面に、膜状接着部材の実装面に対応する部
分のみを転写し、この転写された膜状接着部材を介して
半導体素子を基板上に実装するので、膜状接着部材の未
硬化部分が生じたり、材料の無駄が生じたりすることは
なく、転写において、セパレータは膜状接着部材から剥
がれるので、実装作業直前のセパレータ剥がし作業が不
要となり、容易に自動化する。
According to the method of mounting a semiconductor element of claim 1, only a portion corresponding to the mounting surface of the film adhesive member is transferred onto the mounting surface of the semiconductor element, and the semiconductor is transferred via the transferred film adhesive member. Since the element is mounted on the substrate, the uncured portion of the film-like adhesive member is not generated and the material is not wasted.The separator is peeled off from the film-like adhesive member during transfer. Eliminates the need for peeling work and facilitates automation.

【0016】請求項2に記載の半導体素子の実装装置
は、実装ツールに保持され、所定温度に加熱された半導
体素子の実装面に、膜状接着部材のセパレータの反対側
を、加圧ツールにより圧接させ、セパレータを含む膜状
接着部材の他の部分を実装面から分離させることによ
り、膜状接着部材の実装面に対応する部分のみを実装面
上に転写でき、この転写部分からセパレータを自動的に
剥ぎ取ることができる。このため、膜状接着部材の未硬
化部分や、材料の無駄が生じたりすることはなく、しか
も、実装作業直前でのセパレータ剥がし作業が不要とな
る。
According to a second aspect of the present invention, there is provided a mounting device for a semiconductor element, wherein the mounting surface of the semiconductor element, which is held by a mounting tool and heated to a predetermined temperature, is attached to the side opposite to the separator of the film-like adhesive member by a pressing tool. By pressing and separating the other part of the film adhesive member including the separator from the mounting surface, only the part corresponding to the mounting surface of the film adhesive member can be transferred onto the mounting surface, and the separator is automatically transferred from this transfer part. Can be stripped off. Therefore, the uncured portion of the film-like adhesive member and the waste of the material are not generated, and the separator peeling work immediately before the mounting work is unnecessary.

【0017】[0017]

【実施例】以下、本発明の半導体素子の実装装置の一実
施例を図面を参照して説明する。なお、従来例に対応す
る部分には、同一符号を付して説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a semiconductor element mounting apparatus of the present invention will be described below with reference to the drawings. The parts corresponding to the conventional example will be described with the same reference numerals.

【0018】図1ないし図3において、25は実装ツール
で、この実装ツール25は、半導体素子としてのベアIC
13を着脱可能に保持するものであり、このベアIC13
は、実装面に導電接続用のバンプ16を設けたものであ
る。また、実装ツール25は、基板11に対する所定の実装
位置とは異なる仮付け位置にあり、すなわち、実装ツー
ル25は、ベアIC13をバンプ16を有する実装面が上向き
となる状態の仮付け位置で保持している。
1 to 3, reference numeral 25 denotes a mounting tool, which is a bare IC as a semiconductor element.
This bare IC 13 holds the 13 detachably.
Are provided with bumps 16 for conductive connection on the mounting surface. The mounting tool 25 is at a temporary mounting position different from the predetermined mounting position on the substrate 11, that is, the mounting tool 25 holds the bare IC 13 at the temporary mounting position with the mounting surface having the bumps 16 facing upward. are doing.

【0019】また、この実装ツール25は、図示していな
いが、吸着保持されたベアIC13を所定温度に加熱する
ヒータを持っている。そして、ベアIC13に対する加熱
方式は、常時加熱方式、あるいは、必要な時に急速に加
熱するいわゆるパルスヒート方式のいずれでもよいが、
本実施例ではパルスヒート方式を使用する。
The mounting tool 25 has a heater (not shown) for heating the suction-held bare IC 13 to a predetermined temperature. The bare IC 13 may be heated by a constant heating method or a so-called pulse heating method that heats rapidly when necessary.
In this embodiment, the pulse heating method is used.

【0020】一方、26はローラ状の支持部材で、この支
持部材26は一面にセパレータ12a が貼り付けられ導電粒
子を有する熱硬化性の膜状接着部材となる異方性導電膜
(ACF)12を、そのセパレータ12a の反対側が、実装
ツール25によって保持されたベアIC13の実装面と所定
の間隔で対向するように支持する。ここで、異方性導電
膜12はシート状またはテープ状のいずれでもよいが、こ
こではテープ状のものを用いている。
On the other hand, 26 is a roller-shaped support member, and this support member 26 has an anisotropic conductive film (ACF) 12 which is a thermosetting film-like adhesive member having conductive particles having a separator 12a attached to one surface thereof. Is supported so that the opposite side of the separator 12a faces the mounting surface of the bare IC 13 held by the mounting tool 25 at a predetermined interval. Here, the anisotropic conductive film 12 may be in a sheet shape or a tape shape, but here, the tape shape is used.

【0021】また、この異方性導電膜12は図示しない供
給機構によりその長さ方向に順次間欠送りされるが、支
持部材26はこの異方性導電膜12を上方への所定の張力を
保った状態で、ベアIC13の実装面と所定間隔を保つよ
うに支持する。
Although the anisotropic conductive film 12 is intermittently fed in the lengthwise direction by a supply mechanism (not shown), the support member 26 keeps the anisotropic conductive film 12 upward by a predetermined tension. In this state, the bare IC 13 is supported so as to maintain a predetermined distance from the mounting surface of the bare IC 13.

【0022】さらに、27は加圧ツールで、この加圧ツー
ル27は支持部材26により支持された異方性導電膜12を、
張力に抗してベアIC13の実装面上に圧接させ、この実
装面に対応する異方性導電膜12の一部を実装面上に転写
させる。
Further, 27 is a pressurizing tool, which presses the anisotropic conductive film 12 supported by a supporting member 26.
The bare IC 13 is pressed against the mounting surface against the tension, and a part of the anisotropic conductive film 12 corresponding to the mounting surface is transferred onto the mounting surface.

【0023】そして、図4および図5において、ベアI
C13を吸着保持した実装ツール25は、図示しない反転機
構により、仮付け位置とは異なる実装位置に反転操作さ
れる。すなわち、吸着保持したベアIC13の実装面が、
実装先である基板11の所定の実装位置と対向する下向き
の状態にある。
Then, in FIG. 4 and FIG.
The mounting tool 25 that has suction-held C13 is reversed to a mounting position different from the temporary mounting position by a reversing mechanism (not shown). That is, the mounting surface of the bare IC 13 that has been sucked and held is
It is in a downward state facing a predetermined mounting position of the board 11 which is a mounting destination.

【0024】次に、上記実施例の実装について説明す
る。
Next, the mounting of the above embodiment will be described.

【0025】まず、実装作業にあたっては、図1で示す
ように、バンプ16付きのベアIC13を実装ツール25に装
着する。このとき、実装ツール25は支持面が上向きとな
った仮付け位置にあり、この支持面上にベアIC13の実
装面の反対を載せ、図示しないバキューム機構を動作さ
せ、このベアIC13を吸着保持する。そして、実装ツー
ル25は仮付け位置において、ベアIC13を90℃〜13
0℃に加熱する。
First, in the mounting work, as shown in FIG. 1, the bare IC 13 with the bumps 16 is mounted on the mounting tool 25. At this time, the mounting tool 25 is at a temporary mounting position with the supporting surface facing upward, the opposite side of the mounting surface of the bare IC 13 is placed on this supporting surface, and a vacuum mechanism (not shown) is operated to hold the bare IC 13 by suction. . Then, the mounting tool 25 holds the bare IC 13 at 90 ° C. to 13 ° C. at the temporary mounting position.
Heat to 0 ° C.

【0026】また、熱硬化性の異方性導電膜12はローラ
状の支持部材26により、セパレータ12a の反対側がベア
IC13の実装面と所定間隔で対向するように支持されて
いる。
The thermosetting anisotropic conductive film 12 is supported by a roller-shaped support member 26 so that the opposite side of the separator 12a faces the mounting surface of the bare IC 13 at a predetermined interval.

【0027】この状態において、加圧ツール27を下降動
作させ、支持部材26により所定の張力によって支持され
ている異方性導電膜12を押し下げ、図2で示すように、
実装ツール25上に保持され、所定温度に加熱されたベア
IC13の実装面に圧接させる。この後、加圧ツール27を
上昇させると、図3で示すように、セパレータ12a を含
む異方性導電膜12の全体は張力により上昇する。しか
し、加熱状態の実装面に圧接された異方性導電膜12の一
部のみはこの実装面上に残留する。すなわち、ベアIC
13の実装面上には、セパレータ12a を剥ぎ取った状態で
異方性導電膜12が転写されたこととなる。
In this state, the pressing tool 27 is moved down to push down the anisotropic conductive film 12 supported by the support member 26 with a predetermined tension, and as shown in FIG.
It is held on the mounting tool 25 and brought into pressure contact with the mounting surface of the bare IC 13 heated to a predetermined temperature. Thereafter, when the pressure tool 27 is raised, as shown in FIG. 3, the anisotropic conductive film 12 including the separator 12a is entirely raised by tension. However, only a part of the anisotropic conductive film 12 pressed against the mounting surface in the heated state remains on this mounting surface. That is, bare IC
This means that the anisotropic conductive film 12 was transferred onto the mounting surface of 13 with the separator 12a peeled off.

【0028】次に、実装ツール25を図示しない反転機構
により反転させ、ベアIC13の実装面が下向きとなるよ
うにする。そして、このベアIC13の実装面を、図4で
示すように、基板11上の所定の実装位置上に位置合わせ
する。この後、実装ツール25を下降させ、異方性導電膜
12が転写されているベアIC13の実装面を、基板11上の
所定の実装位置に圧接させ、加熱する。
Next, the mounting tool 25 is inverted by an inverting mechanism (not shown) so that the mounting surface of the bare IC 13 faces downward. Then, the mounting surface of the bare IC 13 is aligned with a predetermined mounting position on the substrate 11, as shown in FIG. After this, the mounting tool 25 is lowered to move the anisotropic conductive film.
The mounting surface of the bare IC 13 on which 12 is transferred is brought into pressure contact with a predetermined mounting position on the substrate 11 and heated.

【0029】そして、実装ツール25による加熱、加圧す
ることにより、熱硬化性の異方性導電膜12は一旦溶融し
た後に硬化し、ベアIC13を基板11上に機械的に固着さ
せるとともに、異方性導電膜12内の図示しない導電粒子
により、ベアIC13の接続電極と基板11上の配線パター
ンとの間を導電接続して実装が完了する。
Then, the thermosetting anisotropic conductive film 12 is once melted and hardened by heating and pressurizing by the mounting tool 25, and the bare IC 13 is mechanically fixed on the substrate 11, and anisotropically. Conductive connection between the connection electrode of the bare IC 13 and the wiring pattern on the substrate 11 is completed by conductive particles (not shown) in the conductive conductive film 12, and the mounting is completed.

【0030】ここで、図1ないし図3で示した仮付け工
程によりベアIC13の実装面に転写される異方性導電膜
12は、実装面の面積にほぼ等しい大きさであり、図4お
よび図5で示した実装ツール25による基板11への加熱、
加圧により、転写された異方性導電膜12の全てが溶融、
硬化する。すなわち、従来のように半導体素子の実装面
より大きなACFを基板側に設けておく必要はなく、し
たがって半導体素子の周囲にはみ出た部分が未硬化のま
ま残ることもない。このため、未硬化の異方性導電膜12
の部分に含まれる不純物により基板11の配線パターンが
腐食することはない。また、ベアIC13の実装後に基板
11に塗布される保護樹脂の密着性が、未硬化部分により
阻害されることはなく、良好な製品を得ることができ
る。
Here, the anisotropic conductive film transferred to the mounting surface of the bare IC 13 by the temporary attaching process shown in FIGS.
Reference numeral 12 has a size almost equal to the area of the mounting surface, and the mounting tool 25 shown in FIGS. 4 and 5 heats the substrate 11.
By pressing, all of the transferred anisotropic conductive film 12 is melted,
To cure. That is, it is not necessary to provide the ACF larger than the mounting surface of the semiconductor element on the substrate side as in the conventional case, and therefore the portion protruding around the semiconductor element does not remain uncured. Therefore, the uncured anisotropic conductive film 12
The wiring pattern of the substrate 11 will not be corroded by the impurities contained in the portion. After mounting the bare IC13, the board
The adhesion of the protective resin applied to 11 is not hindered by the uncured portion, and a good product can be obtained.

【0031】また、異方性導電膜12は必要最小限が使用
されるだけであり、高価な異方性導電膜12の節約にな
り、コストダウンが図れる。
Further, since the anisotropic conductive film 12 is used in the minimum necessary amount, the expensive anisotropic conductive film 12 can be saved and the cost can be reduced.

【0032】さらに、異方性導電膜12を転写する際にセ
パレータ12a も同時に剥離されるので、従来のように実
装直前にセパレータを剥ぎ取る必要はなく、工程の全自
動化を容易に達成できる。
Further, since the separator 12a is also peeled off at the same time when the anisotropic conductive film 12 is transferred, it is not necessary to peel off the separator just before mounting as in the conventional case, and the full automation of the process can be easily achieved.

【0033】また、実装ツール25にベアIC13の加熱機
能を持たせ、加圧ツール27を兼用したことにより、異方
性導電膜12の転写装置を実装機に容易に組み込むことが
可能となり、より一層の自動化を図ることができる。
Further, since the mounting tool 25 is provided with the function of heating the bare IC 13 and also serves as the pressing tool 27, the transfer device for the anisotropic conductive film 12 can be easily incorporated in the mounting machine. Further automation can be achieved.

【0034】なお、実装に当り、ベアIC13の実装面に
アライメントマークを設け、このアライメントマークに
より基板11側との位置合わせを行なうことがある。しか
し、実装面には異方性導電膜12が転写されるので、転写
後にこのアライメントマークを認識し易くするため、転
写された異方性導電膜12のアライメントマークに対応す
る部分に窓を形成したり、あるいは、この部分をくりぬ
いたりしてもよい。
In mounting, an alignment mark may be provided on the mounting surface of the bare IC 13, and the alignment mark may be used to align with the substrate 11. However, since the anisotropic conductive film 12 is transferred onto the mounting surface, a window is formed in a portion of the transferred anisotropic conductive film 12 corresponding to the alignment mark so that the alignment mark can be easily recognized after the transfer. Alternatively, you may cut out this part.

【0035】[0035]

【発明の効果】請求項1記載の半導体素子の実装方法
は、半導体素子の実装面に、膜状接着部材の実装面に対
応する部分のみを転写し、この転写された膜状接着部材
を介して半導体素子を基板上に実装するので、膜状接着
部材の大きさを、実装される半導体素子とほぼ同じ大き
さにすることができ、材料の無駄が生じたりすることは
なく、転写において、セパレータは膜状接着部材から剥
がれるので、膜状接着部材の未硬化部分が生じたり、材
料の無駄が生じたりすることがなく、さらに実装作業直
前のセパレータ剥がし作業が不要となり、全体の自動化
を容易に達成することができる。
According to the method of mounting a semiconductor element of the first aspect, only a portion corresponding to the mounting surface of the film adhesive member is transferred to the mounting surface of the semiconductor element, and the transferred film adhesive member is used. Since the semiconductor element is mounted on the substrate by means of the above, the size of the film-shaped adhesive member can be made substantially the same as the mounted semiconductor element, and no waste of material occurs. Since the separator is peeled off from the film adhesive member, there is no uncured portion of the film adhesive member and no waste of material.Furthermore, the separator peeling work just before mounting work is unnecessary, and the whole automation is easy. Can be achieved.

【0036】請求項2に記載の半導体素子の実装装置
は、実装ツールに保持され、所定温度に加熱された半導
体素子の実装面に、膜状接着部材のセパレータの反対側
を、加圧ツールにより圧接させ、セパレータを含む膜状
接着部材の他の部分を実装面から分離させることによ
り、膜状接着部材の実装面に対応する部分のみを実装面
上に転写でき、この転写部分からセパレータを自動的に
剥ぎ取ることができる。このため、膜状接着部材の未硬
化部分や、材料の無駄が生じたりすることはなく、実装
作業直前のセパレータ剥がし作業が不要となり、全体の
自動化を容易に達成することができる。
According to a second aspect of the present invention, there is provided a mounting device for a semiconductor element, wherein the mounting surface of the semiconductor element, which is held by a mounting tool and heated to a predetermined temperature, is attached to the side opposite to the separator of the film-like adhesive member by a pressing tool. By pressing and separating the other part of the film adhesive member including the separator from the mounting surface, only the part corresponding to the mounting surface of the film adhesive member can be transferred onto the mounting surface, and the separator is automatically transferred from this transfer part. Can be stripped off. Therefore, the uncured portion of the film-like adhesive member and the waste of the material are not generated, and the separator peeling work immediately before the mounting work is unnecessary, and the whole automation can be easily achieved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による半導体素子の実装装置の一実施例
の膜状接着部材を転写する仮付け工程を示す正面図であ
る。
FIG. 1 is a front view showing a temporary attaching step of transferring a film adhesive member of an embodiment of a semiconductor device mounting apparatus according to the present invention.

【図2】同上膜状接着部材を転写する工程の図1に示す
次の仮付け工程を示す正面図である。
FIG. 2 is a front view showing the next temporary attachment step shown in FIG. 1 of the step of transferring the above film-shaped adhesive member.

【図3】同上膜状接着部材を転写する工程の図2に示す
次の仮付け工程を示す正面図である。
FIG. 3 is a front view showing the next temporary attachment step shown in FIG. 2 of the step of transferring the above film-shaped adhesive member.

【図4】同上基板に対する半導体素子の実装工程の図3
に示す次の仮付け工程を示す正面図である。
FIG. 4 is a diagram showing a semiconductor element mounting process on the same substrate as FIG.
It is a front view which shows the next temporary attachment process shown in FIG.

【図5】同上基板に対する半導体素子の実装工程の図4
に示す次の仮付け工程を示す正面図である。
FIG. 5 is a view showing a mounting process of the semiconductor element on the substrate.
It is a front view which shows the next temporary attachment process shown in FIG.

【図6】従来例の膜状接着部材の基板への仮付け工程を
示す正面図である。
FIG. 6 is a front view showing a process of temporarily attaching a film-shaped adhesive member of a conventional example to a substrate.

【図7】同上膜状接着部材の基板への仮付け工程の図6
に示す次の工程を示す正面図である。
FIG. 7 is a diagram showing a temporary attaching step of the film adhesive member to a substrate.
It is a front view which shows the next process shown in FIG.

【図8】同上膜状接着部材の基板への仮付け工程の図7
に示す次の工程を示す正面図である。
FIG. 8 is a view showing a temporary attaching process of the film adhesive member to a substrate.
It is a front view which shows the next process shown in FIG.

【図9】同上セパレータ剥がし工程の図8に示す次の工
程を示す正面図である。
FIG. 9 is a front view showing the next step shown in FIG. 8 of the same separator peeling step.

【図10】同上半導体素子への実装工程の図9に示す次
の工程を示す正面図である。
FIG. 10 is a front view showing the next step shown in FIG. 9 in the step of mounting the semiconductor element on the same.

【図11】同上半導体素子への実装工程の図10に示す
次の工程を示す正面図である。
11 is a front view showing the next step shown in FIG. 10 in the step of mounting the semiconductor element on the same as above. FIG.

【符号の説明】[Explanation of symbols]

11 基板 12 膜状接着部材としての異方性導電膜(ACF) 12a セパレータ 13 半導体素子としてのベアIC 25 実装ツール 26 支持部材 27 加圧ツール 11 Substrate 12 Anisotropic Conductive Film (ACF) as Membrane Adhesive Member 12a Separator 13 Bare IC as Semiconductor Element 25 Mounting Tool 26 Supporting Member 27 Pressing Tool

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 所定温度に加熱された半導体素子の実装
面に、一面にシート状のセパレータが貼り付けられてい
る膜状接着部材を前記セパレータの反対側から加圧し、 この加圧後に前記セパレータを含む膜状接着部材の他の
部分を実装面から分離することにより、前記膜状接着部
材を実装面上に転写し、 この転写後に前記膜状接着部材が転写された前記半導体
素子の実装面を基板上の所定の実装位置に加圧、加熱し
て結合することを特徴とする半導体素子の実装方法。
1. A film-like adhesive member having a sheet-shaped separator attached to one surface of a mounting surface of a semiconductor element heated to a predetermined temperature is pressed from the opposite side of the separator, and after the pressing, the separator is separated. The film-shaped adhesive member is transferred onto the mounting surface by separating the other part of the film-shaped adhesive member from the mounting surface, and after the transfer, the film-shaped adhesive member is transferred onto the mounting surface of the semiconductor element. A method for mounting a semiconductor element, which comprises pressurizing and heating the semiconductor chips to a predetermined mounting position on the substrate to bond them.
【請求項2】 半導体素子を膜状接着部材を介して基板
上の所定位置に実装する半導体素子の実装装置におい
て、 前記半導体素子を着脱可能に保持し、この保持状態にて
半導体素子を所定温度に加熱するとともに、この半導体
素子を基板上の所定位置に圧接させる実装ツールと、 この実装ツールの所定の実装位置と異なる仮付け位置に
て、一面にセパレータが貼り付けられた膜状接着部材の
セパレータの反対側を、この実装ツールによって保持さ
れた半導体素子の実装面と所定の間隔で対向させる支持
部材と、 この支持部材により支持された前記膜状接着部材を前記
半導体素子の実装面上に圧接させ、この実装面に対応す
る部分を実装面上に転写させる加圧ツールとを具備した
ことを特徴とする半導体素子の実装装置。
2. A semiconductor element mounting apparatus for mounting a semiconductor element at a predetermined position on a substrate via a film adhesive member, wherein the semiconductor element is detachably held, and the semiconductor element is kept at a predetermined temperature in this holding state. Of the film-like adhesive member having a separator attached on one surface at a mounting tool that heats the semiconductor element to a predetermined position on the substrate and presses the semiconductor element at a temporary mounting position different from the predetermined mounting position of the mounting tool. A supporting member that makes the opposite side of the separator face the mounting surface of the semiconductor element held by the mounting tool at a predetermined interval, and the film adhesive member supported by the supporting member on the mounting surface of the semiconductor element. A mounting device for a semiconductor element, comprising: a pressing tool which is brought into pressure contact with and transfers a portion corresponding to the mounting surface onto the mounting surface.
JP6172888A 1994-07-25 1994-07-25 Semiconductor element mounting method and device Pending JPH0837208A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6172888A JPH0837208A (en) 1994-07-25 1994-07-25 Semiconductor element mounting method and device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6172888A JPH0837208A (en) 1994-07-25 1994-07-25 Semiconductor element mounting method and device

Publications (1)

Publication Number Publication Date
JPH0837208A true JPH0837208A (en) 1996-02-06

Family

ID=15950189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6172888A Pending JPH0837208A (en) 1994-07-25 1994-07-25 Semiconductor element mounting method and device

Country Status (1)

Country Link
JP (1) JPH0837208A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998030073A1 (en) * 1996-12-27 1998-07-09 Matsushita Electric Industrial Co., Ltd. Method and device for mounting electronic component on circuit board
JPH10310743A (en) * 1997-05-12 1998-11-24 Hitachi Chem Co Ltd Application of anisotropic electroconductive adhesive tape and apparatus therefor
US7193328B2 (en) 2001-07-05 2007-03-20 Sharp Kabushiki Kaisha Semiconductor device
JP2008243867A (en) * 2007-03-26 2008-10-09 Casio Comput Co Ltd Mounting method of electronic parts
JP2009283962A (en) * 1996-08-06 2009-12-03 Hitachi Chem Co Ltd Method of manufacturing chip with adhesive
EP2509400A4 (en) * 2009-12-01 2014-11-26 Dexerials Corp METHOD FOR MANUFACTURING ELECTRONIC COMPONENT, ELECTRONIC COMPONENT, AND CONDUCTIVE FILM

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009283962A (en) * 1996-08-06 2009-12-03 Hitachi Chem Co Ltd Method of manufacturing chip with adhesive
WO1998030073A1 (en) * 1996-12-27 1998-07-09 Matsushita Electric Industrial Co., Ltd. Method and device for mounting electronic component on circuit board
US6981317B1 (en) 1996-12-27 2006-01-03 Matsushita Electric Industrial Co., Ltd. Method and device for mounting electronic component on circuit board
JPH10310743A (en) * 1997-05-12 1998-11-24 Hitachi Chem Co Ltd Application of anisotropic electroconductive adhesive tape and apparatus therefor
US7193328B2 (en) 2001-07-05 2007-03-20 Sharp Kabushiki Kaisha Semiconductor device
JP2008243867A (en) * 2007-03-26 2008-10-09 Casio Comput Co Ltd Mounting method of electronic parts
EP2509400A4 (en) * 2009-12-01 2014-11-26 Dexerials Corp METHOD FOR MANUFACTURING ELECTRONIC COMPONENT, ELECTRONIC COMPONENT, AND CONDUCTIVE FILM

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