JPH0837228A - Jig for semiconductor manufacturing - Google Patents

Jig for semiconductor manufacturing

Info

Publication number
JPH0837228A
JPH0837228A JP17385994A JP17385994A JPH0837228A JP H0837228 A JPH0837228 A JP H0837228A JP 17385994 A JP17385994 A JP 17385994A JP 17385994 A JP17385994 A JP 17385994A JP H0837228 A JPH0837228 A JP H0837228A
Authority
JP
Japan
Prior art keywords
wafer
handle
semiconductor
jig
convex portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17385994A
Other languages
Japanese (ja)
Inventor
Takao Kikuchi
隆雄 菊池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Eastern Japan Semiconductor Inc
Original Assignee
Hitachi Ltd
Hitachi Tohbu Semiconductor Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Tohbu Semiconductor Ltd filed Critical Hitachi Ltd
Priority to JP17385994A priority Critical patent/JPH0837228A/en
Publication of JPH0837228A publication Critical patent/JPH0837228A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

(57)【要約】 (修正有) 【目的】半導体装置製造におけるウエハ処理中のウエハ
洗浄において、洗浄槽からウエハを取りだした場合に発
生する水滴からの汚染を防止する。 【構成】半導体ウエハ6を処理する半導体製造用治具に
おいて、少なくとも対向する壁面を有するウエハ収納容
器部4と、前記収納容器4の壁面に係合するフック5を
有するハンドル2とからなり、前記ハンドルにはウエハ
上面となる部分にウエハ方向に向かって凸状部分がない
半導体製造用治具である。 【効果】ウエハ収納容器側に凸部が存在しないため、ハ
ンドルが液体で濡れていた場合でもハンドルの液体が凸
部から伝わり、半導体ウエハ上に滴下することがないた
め半導体ウエハの汚染を防止することが可能と成る。
(57) [Summary] (Correction) [Purpose] In wafer cleaning during wafer processing in semiconductor device manufacturing, to prevent contamination from water droplets generated when a wafer is taken out from a cleaning tank. In a semiconductor manufacturing jig for processing a semiconductor wafer 6, a wafer accommodating container portion 4 having at least opposing wall surfaces and a handle 2 having a hook 5 engaging with the wall surface of the accommodating container 4 are provided. This is a semiconductor manufacturing jig in which the handle has no convex portion in the wafer upper surface in the wafer direction. [Effect] Since the convex portion does not exist on the wafer storage container side, even if the handle is wet with liquid, the liquid of the handle is not transmitted from the convex portion and is not dropped on the semiconductor wafer, so that the contamination of the semiconductor wafer is prevented. It becomes possible.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体製造用治具に係
り、特に半導体ウエハの洗浄用に使用する半導体ウエハ
治具に適用して有効な技術に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor manufacturing jig, and more particularly to a technique effectively applied to a semiconductor wafer jig used for cleaning a semiconductor wafer.

【0002】[0002]

【従来の技術】半導体装置を製造するにあたっては、半
導体ウエハへの様々な処理が必要である。このような処
理のなかで半導体ウエハを洗浄する洗浄工程が有る。洗
浄工程は半導体ウエハを脱着自在のハンドルのついた治
具に入れ、純水の中で洗浄するものである。このような
半導体ウエハ洗浄のための治具の一例を示したものとし
て特開昭60−177642号がある。
2. Description of the Related Art In manufacturing a semiconductor device, various treatments on a semiconductor wafer are required. Among these processes, there is a cleaning step for cleaning the semiconductor wafer. In the cleaning step, the semiconductor wafer is put into a jig with a detachable handle and cleaned in pure water. Japanese Patent Application Laid-Open No. 60-177642 discloses an example of a jig for cleaning such a semiconductor wafer.

【0003】[0003]

【発明が解決しようとする課題】上記したような技術に
は詳しく記載されてはいないが、このような治具に取付
けられたハンドルをはずす場合、手軽に取外しができる
ようバネとなる部分がハンドル下に設けられており、そ
の形状はハンドルとほぼ並行に伸び、上向きにやや反り
そしてウエハ方向に握り易いように凸部を有するものが
一般的である。
Although not described in detail in the above-mentioned technique, when the handle attached to such a jig is removed, the handle serves as a spring so that the handle can be easily removed. It is provided below, and its shape is generally extended in parallel with the handle and is generally warped upward and has a convex portion so that it can be easily grasped in the wafer direction.

【0004】このような形状を持つバネ部は、半導体ウ
エハの純水洗浄中に純水の中に浸ると濡れてしまうた
め、純水から引上げ後、バネ部の形状に水滴が伝わり半
導体ウエハ上に水滴を落してしまい汚れを発生すること
があり、蒸着層の剥がれ、異物の発生あるいは異常酸化
等の問題を発生するという課題があった。
The spring portion having such a shape gets wet when it is immersed in pure water during cleaning of the semiconductor wafer with pure water. There is a problem that water droplets may drop on the surface and stains may be generated, and the vapor deposition layer may be peeled off, and foreign matter may be generated or abnormal oxidation may occur.

【0005】本願発明の目的は上記したような問題を解
決し、純水洗浄後でもこのような問題の発生しない半導
体製造治具を提供することにある。
An object of the present invention is to solve the above problems and to provide a semiconductor manufacturing jig which does not cause such problems even after cleaning with pure water.

【0006】[0006]

【課題を解決するための手段】本願において開示される
発明のうち代表的なものの手段について説明すれば下記
のとおりである。
Means for representing a typical one of the inventions disclosed in the present application will be described as follows.

【0007】すなわち半導体ウエハを処理する半導体製
造用治具において、ウエハを保持するウエハ収納容器部
と、前記収納容器に形成されたフックに系合する部分を
有するハンドルとからなり、前記ハンドルにはウエハ上
となる部分にウエハ方向に向かって凸状部分がないよう
な半導体製造用治具である。
That is, in a semiconductor manufacturing jig for processing a semiconductor wafer, it comprises a wafer storage container portion for holding a wafer and a handle having a portion which engages with a hook formed in the storage container. The semiconductor manufacturing jig is such that there is no convex portion in the wafer direction in the portion on the wafer.

【0008】[0008]

【作用】上記した手段によれば、純水洗浄中にハンドル
のバネ部が純水中に浸されたとしても、その形状から水
滴がハンドルに付着し中央に落ちることがない。
According to the above-mentioned means, even if the spring portion of the handle is immersed in pure water during washing with pure water, water drops will not adhere to the handle and fall to the center due to its shape.

【0009】[0009]

【実施例1】図1は本願発明の第1の実施例である半導
体製造用のウエハ処理治具を示した概略斜視図である。
図2は本実施例においてハンドルとウエハ収納容器が系
合した状態を示した概略側面断面図、図3は他の実施例
のハンドルを示した図、図4は本実施例のハンドルとウ
エハ収納容器を取り外す場合の構成の動きについて示し
た説明図である。
[Embodiment 1] FIG. 1 is a schematic perspective view showing a wafer processing jig for semiconductor manufacturing according to a first embodiment of the present invention.
FIG. 2 is a schematic side sectional view showing a state where the handle and the wafer storage container are combined in this embodiment, FIG. 3 is a view showing the handle of another embodiment, and FIG. 4 is a handle and the wafer storage of this embodiment. It is explanatory drawing which showed the movement of the structure at the time of removing a container.

【0010】本治具においてはハンドル1はU字を逆に
したように形成されたハンドル1と、前記ハンドル1に
接続して形成されたブリッジ状のバネ部2とからなり、
ハンドル1がウエハ収納容器4と系合する部分3近傍で
バネ2とハンドル1とが接続する構成と成っている。こ
のバネ部3のブリッジの中央の最も高い点がバネの力点
となり、フックに取り付けられる部分がバネの支点とい
う構成となる。
In this jig, the handle 1 comprises a handle 1 formed in a U-shape reversed, and a bridge-shaped spring portion 2 formed by connecting to the handle 1.
The handle 2 has a structure in which the spring 2 and the handle 1 are connected in the vicinity of a portion 3 where the handle 1 is connected to the wafer storage container 4. The highest point at the center of the bridge of the spring portion 3 is the force point of the spring, and the portion attached to the hook is the fulcrum of the spring.

【0011】ウエハ収納容器4は一般に使われるウエハ
容器と同じものを用いることができる。ウエハ収納容器
4は側面にウエハ保持溝が形成され複数のウエハ6が収
納保持される構成となっており、その端部にフック5が
形成されハンドルと系合するようになっている。これら
ハンドルおよびウエハ収納容器ともフッ素系の樹脂によ
り構成されている。
The wafer container 4 may be the same as a commonly used wafer container. The wafer storage container 4 has a structure in which a wafer holding groove is formed on the side surface and a plurality of wafers 6 are stored and held, and a hook 5 is formed at an end of the wafer storage container 4 to interlock with a handle. Both the handle and the wafer storage container are made of fluorine resin.

【0012】図2に示したようにバネ部2はウエハ収納
容器4のフックにハンドル1を系合した場合、ウエハ収
納容器4側に向かってほぼ半円状となるブリッジ状をな
しているため、ウエハ収納容器側に向かって凸部はない
構成と成っている。図4に示したようにハンドルとウエ
ハ収納容器との取外しに関しては、バネ部中央の力点を
ウエハ収納器側に押し出すことにより、ハンドルのフッ
クに取り付けられる系合部が開き、取り外すことが可能
となる。
As shown in FIG. 2, when the handle 1 is engaged with the hook of the wafer container 4 as shown in FIG. 2, the spring portion 2 has a bridge shape which becomes a semicircle toward the wafer container 4 side. The wafer storage container side is not provided with a convex portion. As shown in FIG. 4, when detaching the handle from the wafer storage container, by pushing the force point at the center of the spring portion toward the wafer storage device, the connection part attached to the hook of the handle can be opened and removed. Become.

【0013】このように本実施例の治具にウエハを収納
し洗浄槽等で純水洗浄等の工程を行った場合、たとえバ
ネ部が濡れたとしても水滴はバネ部を伝いウエハ容器端
部で落ちるので、ハンドル下に収納されているウエハに
水滴が落ちることはない。またこのような構成のハンド
ルはハンドルを握り、収納容器を持ち運ぶ場合握ること
によりしっかりと固定されるという効果も有する。
In this way, when the wafer is stored in the jig of this embodiment and the steps such as cleaning with pure water are performed in the cleaning tank or the like, even if the spring portion gets wet, the water droplets travel along the spring portion and the end portion of the wafer container. Water drops do not fall on the wafers stored under the handle. Further, the handle having such a structure has an effect that it is firmly fixed by gripping the handle and holding the container when carrying the storage container.

【0014】以上本願発明を本実施例の対象となった技
術について説明したが、本願は上記実施例に限定される
ことなく、その技術範囲を逸脱しない範囲において種々
変更可能であることはいうまでもない。すなわち本発明
はウエハ収納時のウエハ用にの上方に凸部が形成されな
いようなものであれば良く、例えば図3に示したような
台形上のバネ部8を有するものでもかまわない。
Although the present invention has been described above with respect to the technology which is the subject of the present embodiment, it is needless to say that the present invention is not limited to the above-mentioned embodiment and can be variously modified without departing from the technical scope thereof. Nor. That is, the present invention only needs to be such that a convex portion is not formed above the wafer when the wafer is stored, and may have a trapezoidal spring portion 8 as shown in FIG. 3, for example.

【0015】[0015]

【発明の効果】本願において開示される発明によって得
られるものの効果を記載すれば下記の通りである。
The effects of the invention obtained by the invention disclosed in the present application are as follows.

【0016】すなわちウエハ収納器側に凸部がないの
で、ハンドル部に水滴等の液体が付着した場合において
も、ウエハ上に液体が落下することがないので、液体に
よるウエハの汚染を防止することが可能と成る。またウ
エハに対する汚染がないので、蒸着層の剥がれ、異常酸
化といった問題が発生せず、歩留が向上するという効果
が得られる。
That is, since there is no convex portion on the side of the wafer container, even if liquid such as water droplets adheres to the handle portion, the liquid does not drop on the wafer, so that the contamination of the wafer by the liquid is prevented. Is possible. Further, since the wafer is not contaminated, there is no problem such as peeling of the vapor deposition layer and abnormal oxidation, and the yield is improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本願発明の第1の実施例である半導体製造用の
ウエハ処理治具である。
FIG. 1 is a wafer processing jig for manufacturing a semiconductor according to a first embodiment of the present invention.

【図2】本実施例においてハンドルとウエハ収納容器が
系合した状態を示した概略側面断面図、
FIG. 2 is a schematic side sectional view showing a state in which a handle and a wafer storage container are combined with each other in the present embodiment,

【図3】他の実施例であるハンドルを示した図FIG. 3 is a diagram showing a handle according to another embodiment.

【図4】ハンドルとウエハ収納容器を取り外す場合の構
成動きについて示した説明図である。
FIG. 4 is an explanatory diagram showing a structural movement when a handle and a wafer storage container are removed.

【符号の説明】[Explanation of symbols]

1、7..ハンドル、2、8..バネ部、3..系合
部、4..ウエハ収納容器、5..フック部、6..ウ
エハ、
1, 7. . Handle, 2, 8. . Spring part, 3. . Clerks, 4. . Wafer storage container, 5. . Hook part, 6. . Wafer,

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 // B08B 11/04 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Office reference number FI technical display area // B08B 11/04

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】半導体ウエハを処理する半導体製造用治具
において、ウエハを保持するウエハ収納容器部と、前記
収納容器に形成されたフックに系合する部分を有するハ
ンドルとからなり、前記ハンドルにはウエハ上となる部
分には保持されたウエハ方向に向かって凸状部分がない
ことを特徴とする半導体製造用治具。
1. A semiconductor manufacturing jig for processing a semiconductor wafer, comprising: a wafer storage container portion for holding a wafer; and a handle having a portion that engages with a hook formed in the storage container. Is a jig for semiconductor manufacturing, characterized in that there is no convex portion in the direction of the held wafer in the portion on the wafer.
JP17385994A 1994-07-26 1994-07-26 Jig for semiconductor manufacturing Pending JPH0837228A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17385994A JPH0837228A (en) 1994-07-26 1994-07-26 Jig for semiconductor manufacturing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17385994A JPH0837228A (en) 1994-07-26 1994-07-26 Jig for semiconductor manufacturing

Publications (1)

Publication Number Publication Date
JPH0837228A true JPH0837228A (en) 1996-02-06

Family

ID=15968472

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17385994A Pending JPH0837228A (en) 1994-07-26 1994-07-26 Jig for semiconductor manufacturing

Country Status (1)

Country Link
JP (1) JPH0837228A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100817716B1 (en) * 2003-11-04 2008-03-27 동부일렉트로닉스 주식회사 Robot device for semiconductor wafer transfer
CN105921461A (en) * 2016-06-20 2016-09-07 苏州市灵通玻璃制品有限公司 Glass cleaning equipment
CN105921473A (en) * 2016-06-20 2016-09-07 苏州市灵通玻璃制品有限公司 Device for cleaning glass

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100817716B1 (en) * 2003-11-04 2008-03-27 동부일렉트로닉스 주식회사 Robot device for semiconductor wafer transfer
CN105921461A (en) * 2016-06-20 2016-09-07 苏州市灵通玻璃制品有限公司 Glass cleaning equipment
CN105921473A (en) * 2016-06-20 2016-09-07 苏州市灵通玻璃制品有限公司 Device for cleaning glass

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