JPH08377Y2 - Plating equipment - Google Patents
Plating equipmentInfo
- Publication number
- JPH08377Y2 JPH08377Y2 JP8603490U JP8603490U JPH08377Y2 JP H08377 Y2 JPH08377 Y2 JP H08377Y2 JP 8603490 U JP8603490 U JP 8603490U JP 8603490 U JP8603490 U JP 8603490U JP H08377 Y2 JPH08377 Y2 JP H08377Y2
- Authority
- JP
- Japan
- Prior art keywords
- anode
- plating
- holding member
- plating tank
- plated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007747 plating Methods 0.000 title claims description 56
- 125000006850 spacer group Chemical group 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910001431 copper ion Inorganic materials 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910000457 iridium oxide Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- -1 platinum group metal oxide Chemical class 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
Description
【考案の詳細な説明】 [産業上の利用分野] 本考案は、メッキ装置に関する。詳しくは陽極を不溶
解性電極から形成しメッキ対象物との極間距離を無段階
的に微調整できるメッキ装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial application] The present invention relates to a plating apparatus. More specifically, the present invention relates to a plating apparatus in which an anode is formed of an insoluble electrode and a distance between electrodes and an object to be plated can be finely adjusted steplessly.
[従来の技術] メッキ装置には、溶解性陽極を用いる型と不溶解性陽
極を用いる型とがある。[Prior Art] Plating apparatuses include a mold using a soluble anode and a mold using an insoluble anode.
前者は、第4図に示す如く、例えばチタン製メッシュ
状有底筒体に多数の銅ボールを収納させて陽極2′を形
成し、メッキ対象物5の幅方向に複数配設している。し
たがって、銅イオンは自動供給されるが濃度管理等は難
しく、電流分布を均一とするには極間距離lが大きく槽
長Lも長大となる。また、陽極2′の交換作業が煩わし
い。In the former, as shown in FIG. 4, for example, a large number of copper balls are housed in a titanium mesh-like bottomed cylindrical body to form an anode 2 ′, and a plurality of plating objects 5 are arranged in the width direction. Therefore, although copper ions are automatically supplied, it is difficult to control the concentration and the like, and in order to make the current distribution uniform, the inter-electrode distance 1 is large and the tank length L is also large. Further, the replacement work of the anode 2'is troublesome.
後者は、第5図に示す如く、例えばチタン製平板に白
金族金属酸化物をコーティングした陽極2を用いる。し
たがって、銅イオンは別槽で調製し補給する必要がある
が、陽極の厚さを薄くでき極面積を大きくとれるので極
間距離lを小さく槽長Lも小さく小型化でき経済的であ
る。もとより陽極2自体の交換作業が不要となる。さら
に、両極2,5間に隔膜6を介在させることにより高価な
添加剤等の分解も防止できる。As the latter, as shown in FIG. 5, for example, an anode 2 in which a platinum plate is coated with a platinum group metal oxide is used. Therefore, it is necessary to prepare and replenish copper ions in a separate tank, but since the thickness of the anode can be made small and the pole area can be made large, the interelectrode distance 1 can be made small and the tank length L can also be made small, which is economical. Of course, the replacement work of the anode 2 itself becomes unnecessary. Further, by interposing the diaphragm 6 between the electrodes 2 and 5, it is possible to prevent decomposition of expensive additives and the like.
ここに、双方の型ともにメッキ対象物5は搬送枠4に
吊下され搬送される。また、陽極2′,2は給電バー乃至
支持棒3に吊下保持され、支持棒3をメッキ槽1の上端
部にボルト締めして所定位置に固定配設されている。Here, the plating object 5 is hung and conveyed by the conveyance frame 4 in both types. Further, the anodes 2 ', 2 are suspended and held by a power supply bar or a support rod 3, and the support rod 3 is fixed to a predetermined position by bolting the support rod 3 to the upper end portion of the plating tank 1.
したがって、第4図、第5図に示す状態において、陽
極2′(2)とメッキ対象物5との間に通電すれば、メ
ッキ対象物5上に所定のメッキ処理を施すことができ
る。Therefore, in the state shown in FIGS. 4 and 5, if a current is applied between the anode 2 '(2) and the object 5 to be plated, the object 5 to be plated can be subjected to a predetermined plating treatment.
かくして、例えは特開平1−297884号公報に示される
如く、別槽で調製した銅イオン等を補給することのでき
るメッキの場合には、装置小型化,電流分布均一化,煩
雑・重労働な陽極2′の交換作業の一掃化等の観点から
不溶解性陽極2を用いる方が有利とされている 特に、大型化,高品質化が益々求められるプリント基
板への銅メッキ等においては好適とされその普及が試み
られている。Thus, for example, as shown in JP-A-1-297884, in the case of plating capable of replenishing copper ions prepared in a separate tank, the apparatus is downsized, the current distribution is made uniform, and the anode is complicated and labor intensive. It is more advantageous to use the insoluble anode 2 from the viewpoint of cleaning the 2'replacement work, etc. In particular, it is suitable for copper plating on a printed circuit board, which is required to be large in size and high in quality. Its spread is being tried.
[考案が解決しようとする課題] ところで、不溶解性陽極2を用いると上記の通り極間
距離lを小さくできるが、極間距離lが小さいだけに適
正極間距離から多少なりとも位置づれがあると、電流分
布等に大きく変動を及ぼす。[Problems to be Solved by the Invention] By the way, if the insoluble anode 2 is used, the inter-electrode distance 1 can be reduced as described above, but since the inter-electrode distance 1 is small, the positional distance from the proper inter-electrode distance is somewhat small. If so, the current distribution and the like are greatly changed.
しかし、適正極間距離はメッキ対象物5の大きさ,形
態,メッキ厚分布等々によって微小とはいえ変化する。
また、一端メッキ処理しないとその適正極間距離を正確
に定めることが難しい。However, the appropriate inter-electrode distance varies depending on the size, shape, plating thickness distribution, etc. of the object 5 to be plated, although it is minute.
Further, it is difficult to accurately determine the proper inter-electrode distance without plating once.
ここに、従来は極間距離を平均的なものとし、大型の
一枚板構造のマスキングプレート等を交換等して電流分
布等を調整していたので手間ひまが掛り生産性を低下さ
せている。Here, conventionally, the distance between the electrodes has been averaged, and the current distribution and the like have been adjusted by replacing a masking plate having a large single-plate structure, etc., which is troublesome and reduces productivity. .
しかし、一掃の高品質化が求められる現今では、上記
手間や生産性を受忍したとしても、最早マスキングプレ
ート等の対策によってはその要請を満たすことができな
いとの指摘がなされつつある。However, nowadays, it is pointed out that even if the above labor and productivity are tolerated, it is no longer possible to meet the demand by countermeasures such as masking plates even if the above-mentioned high quality is required.
だからといって、その都度に全ボルトを取外し各支持
棒3を移動させることは、吊下した不溶解性陽極2を含
む支持棒3き大重量性等から大掛りな作業が必要であ
り、かつボルト締め構造等からして微調整ができないの
で、実際上は困難である。However, removing all bolts and moving each support rod 3 each time requires a large amount of work because of the large weight of the support rod 3 including the suspended insoluble anode 2 and tightening the bolt. Since it is not possible to make fine adjustments due to the structure, it is difficult in practice.
これがため、不溶解性陽極2を用いつつもセフティー
サイド設計として極間距離lを長大としたままとしてお
いたり、メッキ処理すべき対象物5を制限する等の主客
転倒的現象が生じているのが事情である。For this reason, there is a main customer overturning phenomenon such as using the insoluble anode 2 while keeping the inter-electrode distance 1 long as a safety side design and limiting the object 5 to be plated. Is the circumstance.
換言すれば、不溶解性陽極を容易にかつ無段階的に微
調整可能とすれば、メッキ装置の一段の小型化,重労作
業の一掃を図りつつ高品質メッキ処理を円滑に行なえ飛
躍的に生産性を向上できると本出願人は認識する。In other words, if the insoluble anode can be easily and steplessly fine-tuned, the size of the plating apparatus can be further reduced and the high-quality plating process can be smoothly performed while dramatically eliminating heavy labor. The applicant recognizes that productivity can be improved.
ここに、本考案の目的は、不溶解性陽極を簡単かつ迅
速に無段階的に位置決めして極間距離の微調整を行なえ
るメッキ装置を提供することにある。SUMMARY OF THE INVENTION It is an object of the present invention to provide a plating apparatus capable of easily and quickly steplessly positioning an insoluble anode and finely adjusting the inter-electrode distance.
[課題を解決するための手段] 本考案は、メッキ槽両側の上縁部に上下方向位置が拘
束されかつメッキ槽の長手方向に無段階的に移動可能に
案内支持された移動保持部材と、この移動保持部材の移
動後の位置を固定する固定手段とを設け、陽極を不溶解
性陽極から形成するとともに陽極を該移動保持部材のメ
ッキ液中に延びる両側槽内に挿入してメッキ槽内に配設
し、移動保持部材の位置調整をすることにより陽極とメ
ッキ対象物との極間距離を微調整できるように構成した
ことを特徴とする。[Means for Solving the Problem] The present invention provides a movement holding member whose upper and lower positions on both sides of the plating tank are constrained in the vertical direction and which is guided and supported so as to be movable steplessly in the longitudinal direction of the plating tank. A fixing means for fixing the position of the movable holding member after the movement is provided, and the anode is formed of an insoluble anode, and the anode is inserted into both side tanks extending into the plating solution of the movable holding member to be inserted in the plating tank. It is characterized in that the distance between the anode and the object to be plated can be finely adjusted by adjusting the position of the movable holding member.
[作用] 本考案によれば、固定手段を解放し移動保持手段を手
動または自動でメッキ槽の長手方向に移動させる。する
と、移動保持手段に保持された不溶解性陽極をメッキ対
象物に離隔接近させることができる。[Operation] According to the present invention, the fixing means is released and the movement holding means is manually or automatically moved in the longitudinal direction of the plating tank. Then, the insoluble anode held by the moving holding means can be brought close to the object to be plated.
その後、固定手段を締付け等すれば、不溶解性陽極を
移動後の位置に固定することができる。After that, the insoluble anode can be fixed at the position after the movement by tightening the fixing means.
ここに、移動保持部材はメッキ槽に上下方向位置が拘
束されつつその長手方向に無段階的に移動案内支持され
ているので、不溶解性陽極を無段階的に移動調整でき
る。すなわち、メッキ対象物との極間距離を微調整でき
る。Since the movable holding member is supported by the plating bath in the vertical direction while being guided and moved steplessly in the longitudinal direction, the insoluble anode can be moved and adjusted steplessly. That is, the distance between the electrodes and the object to be plated can be finely adjusted.
[実施例] 以下、本考案の実施例を図面に基づいて説明する。Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
(第1実施例) 第1実施例は、第1図、第2図に示される。(First Embodiment) The first embodiment is shown in FIG. 1 and FIG.
このメッキ装置は、基本構成が前出第5図に示された
不溶解性陽極2を用いたメッキ装置の構成と同一とさ
れ、かつ極間距離調整装置10を設けた構成とされてい
る。This plating apparatus has the same basic structure as that of the plating apparatus using the insoluble anode 2 shown in FIG. 5, and is provided with the inter-electrode distance adjusting device 10.
ここに、極間距離調整装置10は不溶解性陽極2とメッ
キ対象物5との間隔(極間距離)を無段階かつ微妙に調
整する手段であって、移動保持部材11と固定手段21とか
ら形成されている。Here, the inter-electrode distance adjusting device 10 is a means for adjusting the distance (inter-electrode distance) between the insoluble anode 2 and the plating object 5 steplessly and subtly, and includes a moving holding member 11 and a fixing means 21. Are formed from.
移動保持部材11は外観がコ字形状であり、その上部の
突出部12に設けられたローラ13を介し、メッキ槽1の上
縁部1aに上下方向位置が拘束されかつメッキ槽1の長手
方向(メッキ対象物5に向う方向)に無段階的に移動可
能に案内支持されている。The movement holding member 11 has a U-shaped appearance, and the vertical position of the movement holding member 11 is restricted by the upper edge portion 1a of the plating tank 1 via the roller 13 provided on the protrusion 12 at the upper portion of the movement holding member 11 and the longitudinal direction of the plating tank 1. It is guided and supported so as to be movable steplessly (toward the object 5 to be plated).
また、この移動保持部材11には、その両内側にメッキ
液中に延びるように配設された縦溝14、突出部12の上側
に水平溝15が設けられている。さらに、外側にはメッキ
槽1の内面壁に固設されたガイドバー1bに嵌装する外溝
16が設けられている。このガイドバー1bと外溝16との協
働により移動保持部材11は、メッキ槽1の長手方向に両
側とも同期平行移動される。移動保持部材11のメッキ槽
1に対する位置は、固定手段21によって拘束される。Further, the movement holding member 11 is provided with a vertical groove 14 arranged on both inner sides thereof so as to extend into the plating solution, and a horizontal groove 15 above the protruding portion 12. Further, on the outer side, an outer groove fitted to the guide bar 1b fixed to the inner wall of the plating tank 1
16 are provided. By the cooperation of the guide bar 1b and the outer groove 16, the movement holding member 11 is moved in parallel in the longitudinal direction of the plating tank 1 on both sides. The position of the movable holding member 11 with respect to the plating tank 1 is restricted by the fixing means 21.
この固定手段21は、上記突出部12に螺合されたボルト
部材からなり、このボルト部材を回動させることによ
り、その突出量を変化させ上縁部1aに係合させて移動保
持部材11をメッキ槽1(1a)に固定させることができ
る。The fixing means 21 is composed of a bolt member screwed into the projecting portion 12, and by rotating the bolt member, the projecting amount of the bolt member is changed to engage with the upper edge portion 1a so that the moving holding member 11 is retained. It can be fixed to the plating tank 1 (1a).
さて、不溶解性陽極2は、この実施例の場合、チタン
製平板に酸化イリジウムをコーティングしたものを使用
し、上部両側には移動保持部材11の水平溝15に嵌合係止
させる腕部2a,2aが設けられている。また、幅寸法を縦
溝14,14に嵌挿・引抜可能なものとした。In the case of this embodiment, the insoluble anode 2 is a titanium plate coated with iridium oxide, and the arm portions 2a are fitted and locked in the horizontal grooves 15 of the movement holding member 11 on both upper sides. , 2a are provided. Further, the width dimension is such that it can be inserted into and pulled out from the vertical grooves 14,14.
次に、作用を説明する。 Next, the operation will be described.
適用するメッキ対象物5の大きさ等々に最適な極間距
離とするためには、固定手段21を緩め移動保持部材11を
押して、または引張ってメッキ槽1の長手方向に移動さ
せればよい。この際、移動保持部材11はローラ13に回転
支持されかつ外溝16がガイドバー1bに嵌合されているの
で軽微な力で平行に移動させることができる。In order to obtain the optimum distance between the electrodes to be applied, such as the size of the object to be plated 5, the fixing means 21 may be loosened and the movement holding member 11 may be pushed or pulled to move the plating tank 1 in the longitudinal direction. At this time, since the movement holding member 11 is rotatably supported by the roller 13 and the outer groove 16 is fitted in the guide bar 1b, it can be moved in parallel with a slight force.
よって、予め水平溝15と縦溝14に嵌挿された不溶解性
陽極2を無段階的に移動し極間距離を微調整できる。こ
の微調整後の位置は、固定手段21を締付けることにより
安定固定される。Therefore, the insoluble anode 2 previously fitted in the horizontal groove 15 and the vertical groove 14 can be moved steplessly and the distance between the electrodes can be finely adjusted. The position after the fine adjustment is stably fixed by tightening the fixing means 21.
しかして、この実施例によれば、無段階的に移動可能
な移動保持部材11と固定手段21とからなる極間距離調整
装置10を設ける、とともにこの移動保持部材11に不溶解
性平板電極からなる陽極2を装着した構成であるので、
メッキ対象物5との極間距離を無段階的に微調整できる
から、最適極間距離として高品質メッキ処理を施すこと
ができる、とともにメッキ槽1等を一段と小型かつ簡素
とすることができる。Therefore, according to this embodiment, the inter-electrode distance adjusting device 10 composed of the movable holding member 11 and the fixing means 21 that can be moved steplessly is provided, and the movable holding member 11 is provided with the insoluble flat plate electrode. Since it has a configuration in which the anode 2 is attached,
Since the inter-electrode distance to the object to be plated 5 can be finely adjusted in a stepless manner, high-quality plating treatment can be performed with an optimum inter-electrode distance, and the plating tank 1 and the like can be made smaller and simpler.
さらに、陽極2は移動保持部材11に各溝14,15に嵌挿
して装着する構成であるから、陽極2の点検作業も容易
となる。陽極2自体を薄型軽量化できる。Furthermore, since the anode 2 is configured to be fitted and mounted in the grooves 14 and 15 of the movement holding member 11, the inspection work of the anode 2 is facilitated. The anode 2 itself can be made thin and lightweight.
また、移動保持部材11は、ローラ13で回転保持され、
かつガイドバー1bに嵌合されているので、軽微な力で迅
速かつ容易に無段階的に平行移動させることができる。Further, the moving holding member 11 is rotatably held by the roller 13,
Moreover, since it is fitted to the guide bar 1b, it is possible to make parallel translation quickly and easily with a slight force.
(第2実施例) この第2実施例は、第3図に示す如く、不溶解性陽極
2,隔膜6,リブ体34等を一体的に形成し、全体を移動保持
部材11に装着するようにするとともに不溶解性陽極2を
採用したメッキ装置の実務的諸技術事項を一挙に解決す
ることができるよう構成したものである。(Second Embodiment) This second embodiment, as shown in FIG. 3, is an insoluble anode.
2, the diaphragm 6, the rib body 34, etc. are integrally formed so that the whole is mounted on the moving holding member 11, and the practical technical matters of the plating apparatus employing the insoluble anode 2 are solved at once. It is configured to be able to.
すなわち、第1実施例の場合には、軟弱な隔膜6が例
えば移動保持部材11との衝突により変形・破損された
り、隔膜6,陽極2等の点検作業が相当困難であったり、
また、極間距離が挟小のために電流廻込みが生ずる虞れ
もある。That is, in the case of the first embodiment, the weak diaphragm 6 is deformed / damaged due to, for example, the collision with the movement holding member 11, the inspection work of the diaphragm 6, the anode 2, etc. is considerably difficult,
Further, there is a possibility that current sneak may occur due to the small distance between the electrodes.
そこで、これら予測される不利不便を未然防止するた
めに、液密(収容)空間Sを形成する本体ケース30に不
溶解性陽極(2)と隔膜6とを一体的に組込み、しかも
隔膜6をリブ体34で外側から覆いボルト36で一体的に結
合した構成としている。なお、31はシールパッキン,32
はスペーサである。Therefore, in order to prevent these predicted disadvantages, the insoluble anode (2) and the diaphragm 6 are integrally incorporated in the main body case 30 forming the liquid-tight (housing) space S, and the diaphragm 6 is formed. The ribs 34 are covered from the outside by bolts 36 to be integrally connected. In addition, 31 is a seal packing, 32
Is a spacer.
ここに、本体ケース30は、横断面がコ字形とされ、塩
化ビニールの板材から形成されている。この本体ケース
30の役割は、不溶解性陽極2を収容する収容空間Sを形
成する、とともに隔膜6を保持するものである。また、
全体を移動保持部材11から引抜きメッキ槽1外へ持出し
容易としかつメッキ槽1内への取付け便宜を図るもので
ある。と同時に、全体の小型軽量化をも達成する。Here, the main body case 30 has a U-shaped cross section and is formed of a vinyl chloride plate material. This body case
The role of 30 is to form a housing space S for housing the insoluble anode 2 and to hold the diaphragm 6. Also,
The whole is easily pulled out of the moving holding member 11 to the outside of the plating tank 1 and is conveniently attached to the inside of the plating tank 1. At the same time, the overall size and weight can be reduced.
次に、不溶解性陽極2は、この実施例がプリント基板
に銅メッキを施すために供されることから、メッキ電流
分布一定化と有効極面積増大化のためにプリント基板
(5)に対応する形状とした。Next, the insoluble anode 2 corresponds to the printed circuit board (5) in order to make the plating current distribution constant and increase the effective pole area, since this embodiment is used to perform copper plating on the printed circuit board. The shape is set to
また、隔膜6として中性膜を用い、スペーサ32を介し
て本体ケース30のメッキ対象物5に対向する開口面33を
塞ぐように配設した。本体ケース30への固定は、この実
施例の場合、リブ体34を介し、複数のボルト36によって
一体的に締付けた。これによって収容空間Sをメッキ槽
1内のメッキ液から液密離隔することができる。つま
り、不溶解性陽極2とメッキ対象物5とを分離すること
ができる。Further, a neutral film is used as the diaphragm 6, and is arranged so as to close the opening surface 33 of the main body case 30 facing the object to be plated 5 via the spacer 32. In the case of this embodiment, the fixing to the main body case 30 is performed by integrally fastening the plurality of bolts 36 through the rib body 34. This allows the accommodation space S to be liquid-tightly separated from the plating liquid in the plating tank 1. That is, the insoluble anode 2 and the plating target 5 can be separated.
さて、リブ体34は、隔膜6の保護を第1義とするもの
であるが対極面積をできるだけ大きく取ることも考慮し
て、隔膜面を整数(この実施例では12コ)に仕切る格子
状のリブ体要素35から形成し、かつメッキ対象物5に向
かって突出するように形成した。なお、スペーサ32も対
応する格子状とした。The rib body 34 has a primary purpose of protecting the diaphragm 6, but in consideration of making the counter electrode area as large as possible, the rib surface 34 is divided into integers (12 in this embodiment) in a grid pattern. The rib body element 35 is formed so as to project toward the object to be plated 5. In addition, the spacer 32 is also in a corresponding lattice shape.
したがって、隔膜6は本体ケース30に確実に保持され
るとともに、メッキ槽1の内外においても異物衝突を回
避できる。Therefore, the diaphragm 6 is securely held by the main body case 30, and foreign matter collision can be avoided inside and outside the plating tank 1.
しかも、このリブ体34は、本体ケース30とともに全体
の機械的強度を増大するものであり、これにより不溶解
性陽極2自体に過度な機械的強度を求めなくてよいか
ら、陽極2を一段と薄型とし軽量化できる。また、メッ
キ品質面からの機能をも発揮させることができる構造と
した。Moreover, the rib body 34 increases the mechanical strength of the whole body together with the main body case 30. Therefore, the insoluble anode 2 itself does not need to have an excessive mechanical strength. And can be lightened. In addition, the structure is such that it can also exhibit functions from the aspect of plating quality.
すなわち、各リブ体要素35が形成する箱型空間S2はメ
ッキ対象物5に対して直角な導電路を形成する、換言す
れば電流廻込を防止し不溶解性陽極2(メッキ対象物
5)の単位面積当りの電流分布を均一化するように作用
する。That is, the box-shaped space S2 formed by each rib element 35 forms a conductive path at right angles to the object 5 to be plated, in other words, to prevent current sneak and to dissolve the insoluble anode 2 (object 5 to be plated). It works so as to make the current distribution per unit area of (1) uniform.
かかる構成の隔膜陽極構造では、本体ケース30,不溶
解性陽極2,スペーサ32,隔膜6,リブ体34をこの順で配設
し、ボルト36を締付けるだけで一体的に組立てることが
できるから、分解・組立を迅速かつ容易に行なえ、移動
保持部材11すなわちメッキ槽1内への装着作業が非常に
楽である。メッキ運転中は隔膜2は完全に保護され、電
流分布も一定となる。In the diaphragm anode structure having such a configuration, the main body case 30, the insoluble anode 2, the spacer 32, the diaphragm 6, and the rib body 34 are arranged in this order, and the bolt 36 can be integrally assembled by simply tightening the bolt 36. The disassembling and assembling can be performed quickly and easily, and the mounting work on the moving holding member 11, that is, the plating tank 1 is very easy. During the plating operation, the diaphragm 2 is completely protected and the current distribution becomes constant.
しかして、この第2実施例によれば、陽極構造を移動
保持部材11に装着すれば第1実施例と同様な作用効果を
奏する他、さらに、本体ケース30と不溶解性平板陽極2
と隔膜6とリブ体34とを一体的に組立てた構成であるか
ら、隔膜6等の保全が万全で取扱容易かつ小型・軽量で
ある。もって、極間距離の微調整ができるとともに隔膜
陽極採用による添加剤の分解防止等々の利点を享受でき
るメッキ装置を確立しその普及を拡大させることができ
る。Therefore, according to the second embodiment, if the anode structure is attached to the movement holding member 11, the same operational effect as that of the first embodiment is obtained, and further, the main body case 30 and the insoluble flat plate anode 2 are provided.
Since the diaphragm 6 and the rib body 34 are integrally assembled, the diaphragm 6 and the like are maintained perfectly, are easy to handle, and are compact and lightweight. Therefore, it is possible to establish a plating apparatus which can finely adjust the distance between the electrodes and can enjoy advantages such as prevention of decomposition of the additive by adopting the diaphragm anode, and to expand its spread.
また、全体が小型・軽量であるから、搬入・搬出作業
が簡単であり、また、収容空間Sが挟小であるから添加
剤等の初期的分解量を最小限に止められ経済的である。In addition, since the whole is small and lightweight, loading and unloading work is easy, and since the storage space S is small, the initial decomposition amount of additives and the like can be minimized, which is economical.
また、各構成要素はボルト36の緊締弛緩によって分解
・組立できるから、不溶解性陽極2や隔膜6の交換作業
を迅速かつ容易に行なえ、しかも、全体を少人数で搬出
して行なえるから能率的である。Further, since each component can be disassembled and assembled by tightening and loosening the bolt 36, the work of exchanging the insoluble anode 2 and the diaphragm 6 can be performed quickly and easily, and moreover, the whole can be carried out by a small number of people, which is efficient. Target.
さらに、リブ体34は格子状とされているので、全体の
機械的強度を高められ、その軽量化と不溶解性陽極2の
薄型化が図れる。Further, since the rib body 34 is formed in a lattice shape, the mechanical strength of the entire body can be increased, the weight thereof can be reduced, and the insoluble anode 2 can be thinned.
さらにまた、リブ体34の各リブ体要素35はメッキ対象
物5に直角な起立面35aを形成するので、電流廻込みを
防止でき均一メッキ膜を形成することに有利である。Furthermore, since each rib body element 35 of the rib body 34 forms an upright surface 35a perpendicular to the object 5 to be plated, it is advantageous to prevent current from flowing and to form a uniform plated film.
[考案の効果] 本考案によれば、メッキ槽の長手方向に無段階的に移
動案内された移動保持部材とこの移動保持部材の位置を
固定する固定手段を設けるとともに陽極に不溶解性陽極
を使用し移動保持部材に装着する構成としているので、
極間距離を軽力作業で迅速かつ容易に無段階的に微調整
することができる。よって、最適極間距離の下に高品質
メッキ処理を能率よく行なえ生産性を飛躍的に向上でき
る適用性の広いものとなる。[Advantages of the Invention] According to the present invention, a movable holding member that is guided steplessly in the longitudinal direction of the plating tank and a fixing means for fixing the position of this moving holding member are provided, and an insoluble anode is attached to the anode. Since it is configured to be used and attached to the moving holding member,
The distance between poles can be finely adjusted quickly and easily by light work in a stepless manner. Therefore, high-quality plating can be efficiently performed under the optimum distance between the electrodes, and the productivity can be dramatically improved, and the applicability is wide.
第1図は本考案の第1実施例を示す外観斜視図、第2図
は第1図の矢視線II−IIに基づく断面図、第3図は第2
実施例を示す陽極構造の外観斜視図、第4図、第5図は
従来メッキ装置を示す図であって、第4図は溶解性陽極
を用いた場合および第5図は不溶解性陽極を用いた場合
である。 1……メッキ槽、1a……上縁部、1b……ガイドバー、2
……不溶解性陽極、2′……溶解性陽極、5……メッキ
対象物、6……隔膜、10……極間距離調整装置、11……
移動保持部材、13……ローラ、14……縦溝、15……水平
溝、16……外溝、21……固定手段、30……本体ケース、
32……スペーサ、34……リブ体、35……リブ体要素、36
……ボルト。FIG. 1 is an external perspective view showing a first embodiment of the present invention, FIG. 2 is a sectional view taken along the line II--II of FIG. 1, and FIG.
4 is an external perspective view of an anode structure showing an embodiment, FIGS. 4 and 5 are views showing a conventional plating apparatus, FIG. 4 shows a case where a soluble anode is used, and FIG. 5 shows an insoluble anode. This is the case when used. 1-plating tank, 1a-upper edge, 1b-guide bar, 2
…… Insoluble anode, 2´ …… Soluble anode, 5 …… Plate object, 6 …… Separating membrane, 10 …… Polar distance adjusting device, 11 ……
Movable holding member, 13 ... Roller, 14 ... Vertical groove, 15 ... Horizontal groove, 16 ... Outer groove, 21 ... Fixing means, 30 ... Main body case,
32 …… Spacer, 34 …… Rib body, 35 …… Rib body element, 36
……bolt.
───────────────────────────────────────────────────── フロントページの続き (72)考案者 平尾 和宏 神奈川県秦野市鶴巻666番地の1 0―101 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Creator Kazuhiro Hirao 10-101 at 666 Tsurumaki, Hadano City, Kanagawa Prefecture
Claims (1)
束されかつメッキ槽の長手方向に無段階的に移動可能に
案内支持された移動保持部材と、この移動保持部材の移
動後の位置を固定する固定手段とを設け、 陽極を不溶解性電極から形成するとともに陽極を該移動
保持部材のメッキ液中に延びる両側溝内に挿入してメッ
キ槽内に配設し、 移動保持部材の位置調整をすることにより陽極とメッキ
対象物との極間距離を微調整できるように構成したこと
を特徴とするメッキ装置。1. A movable holding member whose upper and lower positions on both sides of the plating tank are vertically supported and guided and supported so as to be movable steplessly in the longitudinal direction of the plating tank, and a movable holding member after the movement holding member is moved. Fixing means for fixing the position, the anode is formed from an insoluble electrode, and the anode is inserted into both side grooves extending into the plating solution of the moving holding member and disposed in the plating tank. The plating apparatus is characterized in that the distance between the anode and the object to be plated can be finely adjusted by adjusting the position of.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8603490U JPH08377Y2 (en) | 1990-08-15 | 1990-08-15 | Plating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8603490U JPH08377Y2 (en) | 1990-08-15 | 1990-08-15 | Plating equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0444376U JPH0444376U (en) | 1992-04-15 |
| JPH08377Y2 true JPH08377Y2 (en) | 1996-01-10 |
Family
ID=31817481
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8603490U Expired - Lifetime JPH08377Y2 (en) | 1990-08-15 | 1990-08-15 | Plating equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08377Y2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107190308A (en) * | 2017-07-12 | 2017-09-22 | 信丰迅捷兴电路科技有限公司 | Circuit board electroplating production system |
-
1990
- 1990-08-15 JP JP8603490U patent/JPH08377Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0444376U (en) | 1992-04-15 |
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