JPH0841330A - Composition for active optical waveguide, production of active optical waveguide therefrom and active optical waveguide - Google Patents
Composition for active optical waveguide, production of active optical waveguide therefrom and active optical waveguideInfo
- Publication number
- JPH0841330A JPH0841330A JP17582494A JP17582494A JPH0841330A JP H0841330 A JPH0841330 A JP H0841330A JP 17582494 A JP17582494 A JP 17582494A JP 17582494 A JP17582494 A JP 17582494A JP H0841330 A JPH0841330 A JP H0841330A
- Authority
- JP
- Japan
- Prior art keywords
- optical waveguide
- active optical
- composition
- formula
- electro
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 67
- 239000000203 mixture Substances 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000000463 material Substances 0.000 claims abstract description 22
- 150000001875 compounds Chemical class 0.000 claims abstract description 13
- 230000009477 glass transition Effects 0.000 claims abstract description 4
- 229920005575 poly(amic acid) Polymers 0.000 claims description 26
- 239000004642 Polyimide Substances 0.000 claims description 17
- 229920001721 polyimide Polymers 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 16
- 239000000126 substance Substances 0.000 claims description 9
- 150000003949 imides Chemical group 0.000 claims description 6
- 150000000000 tetracarboxylic acids Chemical class 0.000 abstract description 11
- 239000002253 acid Substances 0.000 abstract description 8
- 125000001153 fluoro group Chemical group F* 0.000 abstract description 7
- 230000005693 optoelectronics Effects 0.000 abstract description 7
- 239000000758 substrate Substances 0.000 abstract description 5
- 238000002156 mixing Methods 0.000 abstract description 3
- 239000003495 polar organic solvent Substances 0.000 abstract description 3
- 238000004528 spin coating Methods 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 18
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 9
- 239000012792 core layer Substances 0.000 description 9
- 150000004985 diamines Chemical group 0.000 description 9
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 7
- 230000005684 electric field Effects 0.000 description 5
- 125000003709 fluoroalkyl group Chemical group 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- -1 ester compound Chemical class 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 239000002861 polymer material Substances 0.000 description 3
- 238000006798 ring closing metathesis reaction Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- JLLLOESJMWEAAO-UHFFFAOYSA-N 4-[3,4-dicarboxy-2-(trifluoromethyl)phenyl]-3-(trifluoromethyl)phthalic acid Chemical compound FC(F)(F)C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1C(F)(F)F JLLLOESJMWEAAO-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000011162 core material Substances 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- NIBPOLCJVLDFRX-UHFFFAOYSA-N 1-(trifluoromethyl)cyclohexa-3,5-diene-1,3-diamine Chemical compound FC(C1(CC(=CC=C1)N)N)(F)F NIBPOLCJVLDFRX-UHFFFAOYSA-N 0.000 description 1
- PPZSWPLBRNFKRP-UHFFFAOYSA-N 1-fluorocyclohexa-3,5-diene-1,3-diamine Chemical compound FC1(CC(=CC=C1)N)N PPZSWPLBRNFKRP-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical group C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- ZQQOGBKIFPCFMJ-UHFFFAOYSA-N 2-(trifluoromethyl)benzene-1,4-diamine Chemical compound NC1=CC=C(N)C(C(F)(F)F)=C1 ZQQOGBKIFPCFMJ-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- FXFTWEVIIHVHDS-UHFFFAOYSA-N 2-fluorobenzene-1,4-diamine Chemical compound NC1=CC=C(N)C(F)=C1 FXFTWEVIIHVHDS-UHFFFAOYSA-N 0.000 description 1
- QILZDWMMWFCBPW-UHFFFAOYSA-N 3,4-difluorobenzene-1,2-diamine Chemical compound NC1=CC=C(F)C(F)=C1N QILZDWMMWFCBPW-UHFFFAOYSA-N 0.000 description 1
- BGWXNCSHDYSSRH-UHFFFAOYSA-N 3,4-difluorocyclohexa-1,5-diene-1,4-diamine Chemical compound FC1C=C(C=CC1(N)F)N BGWXNCSHDYSSRH-UHFFFAOYSA-N 0.000 description 1
- PQFRTJPVZSPBFI-UHFFFAOYSA-N 3-(trifluoromethyl)benzene-1,2-diamine Chemical compound NC1=CC=CC(C(F)(F)F)=C1N PQFRTJPVZSPBFI-UHFFFAOYSA-N 0.000 description 1
- DFSUKONUQMHUKQ-UHFFFAOYSA-N 3-[2-(2,3-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phthalic acid Chemical compound OC(=O)C1=CC=CC(C(C=2C(=C(C(O)=O)C=CC=2)C(O)=O)(C(F)(F)F)C(F)(F)F)=C1C(O)=O DFSUKONUQMHUKQ-UHFFFAOYSA-N 0.000 description 1
- OJSCBKGRGMBEEW-UHFFFAOYSA-N 3-fluorobenzene-1,2-diamine Chemical compound NC1=CC=CC(F)=C1N OJSCBKGRGMBEEW-UHFFFAOYSA-N 0.000 description 1
- DFWOMRPNOZASKM-UHFFFAOYSA-N 4-(3,4-dicarboxy-2-fluorophenyl)-3-fluorophthalic acid Chemical compound FC1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1F DFWOMRPNOZASKM-UHFFFAOYSA-N 0.000 description 1
- LSJAPRRUOIMQSN-UHFFFAOYSA-N 4-(4-amino-2-fluorophenyl)-3-fluoroaniline Chemical group FC1=CC(N)=CC=C1C1=CC=C(N)C=C1F LSJAPRRUOIMQSN-UHFFFAOYSA-N 0.000 description 1
- RQWJHUJJBYMJMN-UHFFFAOYSA-N 4-(trifluoromethyl)benzene-1,2-diamine Chemical compound NC1=CC=C(C(F)(F)F)C=C1N RQWJHUJJBYMJMN-UHFFFAOYSA-N 0.000 description 1
- ZCTYGKMXWWDBCB-UHFFFAOYSA-N 4-(trifluoromethyl)benzene-1,3-diamine Chemical compound NC1=CC=C(C(F)(F)F)C(N)=C1 ZCTYGKMXWWDBCB-UHFFFAOYSA-N 0.000 description 1
- PSMDTBKTSLWKRN-UHFFFAOYSA-N 4-(trifluoromethyl)cyclohexa-1,5-diene-1,4-diamine Chemical compound NC1=CCC(N)(C(F)(F)F)C=C1 PSMDTBKTSLWKRN-UHFFFAOYSA-N 0.000 description 1
- DXPDSWSYCBNHTO-UHFFFAOYSA-N 4-[4-(3,4-dicarboxy-2,5,6-trifluorophenoxy)-2,3,5,6-tetrafluorophenoxy]-3,5,6-trifluorophthalic acid Chemical compound FC1=C(C(O)=O)C(C(=O)O)=C(F)C(F)=C1OC(C(=C1F)F)=C(F)C(F)=C1OC1=C(F)C(F)=C(C(O)=O)C(C(O)=O)=C1F DXPDSWSYCBNHTO-UHFFFAOYSA-N 0.000 description 1
- KWEWNOOZQVJONF-UHFFFAOYSA-N 4-fluorobenzene-1,2-diamine Chemical compound NC1=CC=C(F)C=C1N KWEWNOOZQVJONF-UHFFFAOYSA-N 0.000 description 1
- QNDFYLBDUWCFJO-UHFFFAOYSA-N 4-fluorobenzene-1,3-diamine Chemical compound NC1=CC=C(F)C(N)=C1 QNDFYLBDUWCFJO-UHFFFAOYSA-N 0.000 description 1
- QCHDFYMNTIJXOF-UHFFFAOYSA-N 4-fluorocyclohexa-1,5-diene-1,4-diamine Chemical compound NC1(CC=C(N)C=C1)F QCHDFYMNTIJXOF-UHFFFAOYSA-N 0.000 description 1
- FOQABOMYTOFLPZ-ISLYRVAYSA-N Disperse Red 1 Chemical compound C1=CC(N(CCO)CC)=CC=C1\N=N\C1=CC=C([N+]([O-])=O)C=C1 FOQABOMYTOFLPZ-ISLYRVAYSA-N 0.000 description 1
- XQZYTTMMXYHEMH-UHFFFAOYSA-N FC1(CC(=CC=C1F)N)N Chemical compound FC1(CC(=CC=C1F)N)N XQZYTTMMXYHEMH-UHFFFAOYSA-N 0.000 description 1
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 101100098973 Mus musculus Cct5 gene Proteins 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 150000002148 esters Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Landscapes
- Optical Integrated Circuits (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、アクティブ光導波路用
組成物、これを用いたアクティブ光導波路の製造法及び
アクティブ光導波路に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a composition for active optical waveguide, a method for producing an active optical waveguide using the same, and an active optical waveguide.
【0002】[0002]
【従来の技術】オプトエレクトロニクスIC(OEI
C)における光導波路には、従来からLiNbO3、L
iTaO3、PLZT、Sr2Nb2O7等の無機材料が用
いられている。しかしながら、これらの材料は潮解性や
低い被破壊しきい値、さらには高誘電率のため応答速度
が遅く、そのため適用できる周波数帯域が限定される問
題点がある。これに対して有機高分子材料は、一般に潮
解性もなく被破壊しきい値が高いなど無機材料に比べて
優れているが、このような高分子材料は一般には配向性
がなく、このままでは電気光学効果を利用した光スイッ
チや変調素子等の材料として用いることができない。一
般に配向性のない高分子材料に対し、加熱しながら直流
電場を印加し配向させる、すなわち、ポーリング処理に
より電気光学効果を発現させる手法が用いられるが、ポ
ーリング後常温に戻し放置すること及び使用することに
よって配向が失われ、電気光学効果が消失する重大な問
題点がある。従来、高分子系光導波路材料としてポリメ
チルメタクリレート(PMMA)などが精力的に研究さ
れているが、ガラス転移温度(Tg)が150℃程度と低
くOEIC製造中にかかる200℃以上の温度において
ポーリングによって発現した配向性が完全に消失する問
題点がある。2. Description of the Related Art Optoelectronic ICs (OEI)
The optical waveguide in C) is conventionally made of LiNbO 3 , L
Inorganic materials such as iTaO 3 , PLZT, Sr 2 Nb 2 O 7 are used. However, these materials have a problem that the response speed is slow due to deliquescent property, low threshold value for destruction, and high dielectric constant, which limits the applicable frequency band. On the other hand, organic polymer materials are generally superior to inorganic materials in that they have no deliquescent property and have a high threshold value for destruction, but such polymer materials generally have no orientation, and as-is It cannot be used as a material for optical switches and modulators that utilize the optical effect. In general, a polymer material having no orientation is applied with a DC electric field while being heated to orient, that is, a method of expressing an electro-optical effect by a poling treatment is used. As a result, the orientation is lost and the electro-optic effect is lost, which is a serious problem. Conventionally, polymethylmethacrylate (PMMA), etc., has been vigorously studied as a polymer-based optical waveguide material, but the glass transition temperature (Tg) is as low as about 150 ° C, and poling is performed at a temperature of 200 ° C or higher required during OEIC manufacturing. However, there is a problem that the orientation generated by the above is completely lost.
【0003】[0003]
【発明が解決しようとする課題】本発明は、上記のよう
な従来技術の問題点に鑑みてなされたものであり、耐熱
性、電気光学効果に優れ、広い周波数帯域に適用できる
アクティブ光導波路用組成物、これを用いたアクティブ
光導波路の製造法及びアクティブ光導波路を提供するも
のである。SUMMARY OF THE INVENTION The present invention has been made in view of the problems of the prior art as described above, and is excellent in heat resistance and electro-optical effect and for an active optical waveguide applicable to a wide frequency band. The present invention provides a composition, a method for producing an active optical waveguide using the composition, and an active optical waveguide.
【0004】[0004]
【課題を解決するための手段】本発明は、フッ素化ポリ
アミド酸及び電気光学材料を含むアクティブ光導波路用
組成物であって、電気光学材料が下記式(I)又は下記
式(II)The present invention is a composition for an active optical waveguide containing a fluorinated polyamic acid and an electro-optical material, wherein the electro-optical material is represented by the following formula (I) or (II)
【化6】 で表される化合物であるアクティブ光導波路用組成物。
に関する。[Chemical 6] A composition for an active optical waveguide, which is a compound represented by:
Regarding
【0005】また、本発明は、上記アクティブ光導波路
用組成物中のフッ素化ポリアミド酸を、イミド閉環して
フッ素化ポリイミドとし、電気光学材料を配向させるこ
とを特徴とするアクティブ光導波路の製造法に関する。Further, according to the present invention, the method for producing an active optical waveguide is characterized in that the fluorinated polyamic acid in the composition for active optical waveguide is imide ring-closed to give a fluorinated polyimide, and the electro-optical material is oriented. Regarding
【0006】また、本発明は、上記アクティブ光導波路
の製造法により製造されたアクティブ光導波路に関す
る。The present invention also relates to an active optical waveguide manufactured by the method for manufacturing an active optical waveguide described above.
【0007】以下本発明を詳細に説明する。本発明に用
いられるフッ素化ポリアミド酸は、フルオロ基、フルオ
ロアルキル基等を有するポリアミド酸であり、通常のポ
リアミド酸の製造と同様な条件で製造でき、一般的には
N−メチル−2−ピロリドン、N,N−ジメチルアセト
アミド、N,N−ジメチルホルムアミドなどの極性有機
溶媒中で、少なくとも一方がフルオロ基、フルオロアル
キル基で置換されたジアミンとテトラカルボン酸又はそ
の誘導体とを反応させて製造することができる。フルオ
ロ基、フルオロアルキル基等で置換されたジアミンとし
ては、例えば、3−フルオロ−1、2−フェニレンジア
ミン、4−フルオロ−1、2−フェニレンジアミン、
3、4−ジフルオロ−1、2−フェニレンジアミン、3
−フルオロ−1、3−フェニレンジアミン、4−フルオ
ロ−1、3−フェニレンジアミン、3、4−ジフルオロ
−1、3−フェニレンジアミン、3−フルオロ−1、4
−フェニレンジアミン、4−フルオロ−1、4−フェニ
レンジアミン、3、4−ジフルオロ−1、4−フェニレ
ンジアミン、3−トリフルオロメチル−1、2−フェニ
レンジアミン、4−トリフルオロメチル−1、2−フェ
ニレンジアミン、3−トリフルオロメチル−1、3−フ
ェニレンジアミン、4−トリフルオロメチル−1、3−
フェニレンジアミン、3−トリフルオロメチル−1、4
−フェニレンジアミン、4−トリフルオロメチル−1、
4−フェニレンジアミン、2、2′−(ビストリフルオ
ロメチル)−4、4′−ジアミノビフェニル、2、2′
−ジフルオロ−4、4′−ジアミノビフェニル等が挙げ
られる。The present invention will be described in detail below. The fluorinated polyamic acid used in the present invention is a polyamic acid having a fluoro group, a fluoroalkyl group, etc., and can be produced under the same conditions as in the production of ordinary polyamic acid, and generally N-methyl-2-pyrrolidone is used. , N, N-dimethylacetamide, N, N-dimethylformamide and the like, in a polar organic solvent, at least one of which is substituted with a fluoro group or a fluoroalkyl group, and a tetracarboxylic acid or a derivative thereof is reacted. be able to. Examples of the diamine substituted with a fluoro group, a fluoroalkyl group or the like include 3-fluoro-1,2-phenylenediamine, 4-fluoro-1,2-phenylenediamine,
3,4-difluoro-1,2-phenylenediamine, 3
-Fluoro-1,3-phenylenediamine, 4-fluoro-1,3-phenylenediamine, 3,4-difluoro-1,3-phenylenediamine, 3-fluoro-1,4
-Phenylenediamine, 4-fluoro-1,4-phenylenediamine, 3,4-difluoro-1,4-phenylenediamine, 3-trifluoromethyl-1,2-phenylenediamine, 4-trifluoromethyl-1,2 -Phenylenediamine, 3-trifluoromethyl-1,3-phenylenediamine, 4-trifluoromethyl-1,3-
Phenylenediamine, 3-trifluoromethyl-1,4
-Phenylenediamine, 4-trifluoromethyl-1,
4-Phenylenediamine, 2,2 '-(bistrifluoromethyl) -4,4'-diaminobiphenyl, 2,2'
-Difluoro-4,4'-diaminobiphenyl and the like.
【0008】またフルオロ基、フルオロアルキル基等で
置換されたテトラカルボン酸やその誘導体としての酸無
水物、酸塩化物、エステル化物としては、例えば、1−
フルオロピロメリット酸、1、4−ジフルオロピロメリ
ット酸、1−トリフルオロメチルピロメリット酸、2、
2−ビス(2、3−ジカルボキシフェニル)−ヘキサフ
ルオロプロパン、1、4−ビス(3、4−ジカルボキシ
トリフルオロフェノキシ)テトラフルオロベンゼン、
2、2′−ジフルオロ−3、3′、4、4′−ビフェニ
ルテトラカルボン酸、2、2′−ビス(トリフルオロメ
チル)−3、3′、4、4′−ビフェニルテトラカルボ
ン酸やこれらの酸無水物、酸塩化物、エステル化物等が
挙げられる。なお、上記以外のフルオロ基、フルオロア
ルキル基等で置換されていないジアミンやテトラカルボ
ン酸及びその誘導体を本発明の目的を阻害しない範囲で
用いてもよい。The tetracarboxylic acid substituted with a fluoro group, a fluoroalkyl group or the like, or an acid anhydride, an acid chloride or an ester compound as a derivative thereof is, for example, 1-
Fluoropyromellitic acid, 1,4-difluoropyromellitic acid, 1-trifluoromethylpyromellitic acid, 2,
2-bis (2,3-dicarboxyphenyl) -hexafluoropropane, 1,4-bis (3,4-dicarboxytrifluorophenoxy) tetrafluorobenzene,
2,2'-difluoro-3,3 ', 4,4'-biphenyltetracarboxylic acid, 2,2'-bis (trifluoromethyl) -3,3', 4,4'-biphenyltetracarboxylic acid and these Acid anhydrides, acid chlorides, ester compounds, and the like. It should be noted that diamines or tetracarboxylic acids and their derivatives which are not substituted with fluoro groups, fluoroalkyl groups and the like other than the above may be used within the range not impairing the object of the present invention.
【0009】本発明におけるフッ素化ポリアミド酸は、
電気光学効果、耐熱性等の点から、イミド閉環してフッ
素化ポリイミドとなった時、屈折率が1.4〜1.9
(589nm)、誘電率が2.6〜3.5(1MHz)及び
ガラス転移温度(Tg)が300℃以上となるものが好ま
しい。The fluorinated polyamic acid in the present invention is
From the viewpoint of electro-optical effect, heat resistance, etc., when the imide ring-closes to give a fluorinated polyimide, the refractive index is 1.4 to 1.9.
(589 nm), a dielectric constant of 2.6 to 3.5 (1 MHz) and a glass transition temperature (Tg) of 300 ° C. or higher are preferable.
【0010】本発明におけるフッ素化ポリアミド酸は、
電気光学効果、耐熱性等の点から、式(III−1)The fluorinated polyamic acid in the present invention is
From the viewpoint of electro-optic effect, heat resistance, etc., formula (III-1)
【化7】 で表される繰り返し単位及び式(III−2)[Chemical 7] A repeating unit represented by the formula (III-2)
【化8】 で表される繰り返し単位の少なくとも1つと式(IV−
1)Embedded image At least one of the repeating units represented by the formula (IV-
1)
【化9】 で表される繰り返し単位及び式(IV−2)[Chemical 9] And a repeating unit represented by the formula (IV-2)
【化10】 で表される繰り返し単位の少なくとも1つとを有するフ
ッ素化ポリアミド酸であることが好ましい。[Chemical 10] A fluorinated polyamic acid having at least one repeating unit represented by
【0011】フッ素化ポリアミド酸中に前記式(III−
1)で表される繰り返し単位又は前記式(III−2)で
表される繰り返し単位を与えるには、例えば、ジアミン
として2,2′−(ビストリフルオロメチル)−4,
4′−ジアミノビフェニルを用い、テトラカルボン酸無
水物としてピロメリット酸無水物を用いればよい。The above formula (III-
To provide the repeating unit represented by 1) or the repeating unit represented by the above formula (III-2), for example, 2,2 ′-(bistrifluoromethyl) -4, as a diamine,
4'-Diaminobiphenyl may be used, and pyromellitic acid anhydride may be used as the tetracarboxylic acid anhydride.
【0012】フッ素化ポリアミド酸中に前記式(IV−
1)で表される繰り返し単位又は前記式(IV−2)で表
される繰り返し単位を与えるには、例えば、ジアミンと
して2,2′−(ビストリフルオロメチル)−4,4′
−ジアミノビフェニルを用い、テトラカルボン酸無水物
として2,2′−ビス(トリフルオロメチル)−3,
3′,4,4′−ビフェニルテトラカルボン酸無水物を
用いればよい。The above formula (IV-
To provide the repeating unit represented by 1) or the repeating unit represented by the above formula (IV-2), for example, 2,2 ′-(bistrifluoromethyl) -4,4 ′ as a diamine is provided.
-Using diaminobiphenyl, as a tetracarboxylic acid anhydride, 2,2'-bis (trifluoromethyl) -3,
3 ', 4,4'-biphenyltetracarboxylic acid anhydride may be used.
【0013】本発明におけるフッ素化ポリアミド酸をイ
ミド閉環させることにより得られるフッ素化ポリイミド
の屈折率は、使用するジアミンやテトラカルボン酸及び
その誘導体の種類と使用量を適宜選択することにより容
易に調整することができる。例えば、フッ素化ポリアミ
ド酸において前記式(III−1)で表される繰り返し単
位又は前記式(III−2)で表される繰り返し単位の含
有量を増やすと、得られるフッ素化ポリイミドの屈折率
を増大させることができる。一方、フッ素化ポリアミド
酸において前記式(IV−1)で表される繰り返し単位又
は前記式(IV−2)で表される繰り返し単位の含有量を
増やすと、得られるフッ素化ポリイミドの屈折率を減少
させることができる。The refractive index of the fluorinated polyimide obtained by subjecting the fluorinated polyamic acid in the present invention to imide ring closure can be easily adjusted by appropriately selecting the type and amount of the diamine or tetracarboxylic acid and its derivative to be used. can do. For example, when the content of the repeating unit represented by the formula (III-1) or the repeating unit represented by the formula (III-2) in the fluorinated polyamic acid is increased, the refractive index of the obtained fluorinated polyimide is increased. Can be increased. On the other hand, when the content of the repeating unit represented by the formula (IV-1) or the repeating unit represented by the formula (IV-2) in the fluorinated polyamic acid is increased, the refractive index of the obtained fluorinated polyimide is increased. Can be reduced.
【0014】本発明においては、ジアミンやテトラカル
ボン酸又はその誘導体は、単一で用いるばかりでなく、
複数のジアミンやテトラカルボン酸又はその誘導体を組
み合わせて用いることができる。その場合は、複数又は
単一のジアミンのモル数の合計と複数または単一のテト
ラカルボン酸又はその誘導体のモル数の合計が等しいか
ほぼ等しくなるようにすることが好ましい。ジアミンと
テトラカルボン酸又はその誘導体の反応により得られた
フッ素化ポリアミド酸の溶液において、その溶液の固形
分濃度は5〜40重量%、特に10〜25重量%である
ことが好ましい。また、フッ素化ポリアミド酸は、固形
分濃度15重量%のとき、そのn−メチル−2−ピロリ
ドン溶液の回転粘度(20℃)が、2000〜8000
mPa・sであるものが好ましく、4000〜6000mPa・s
であるものがより好ましい。In the present invention, the diamine, tetracarboxylic acid or its derivative is not only used alone but
A plurality of diamines, tetracarboxylic acids or their derivatives can be used in combination. In that case, it is preferable that the total number of moles of a plurality or single diamine and the total number of moles of a plurality or single tetracarboxylic acid or its derivative are equal or almost equal. In the solution of the fluorinated polyamic acid obtained by the reaction of the diamine and the tetracarboxylic acid or its derivative, the solid content concentration of the solution is preferably 5 to 40% by weight, particularly 10 to 25% by weight. Further, when the solid content of the fluorinated polyamic acid is 15% by weight, the rotational viscosity (20 ° C.) of the n-methyl-2-pyrrolidone solution is 2000 to 8000.
It is preferably mPa · s, 4000 to 6000 mPa · s
Is more preferable.
【0015】本発明におけるフッ素化ポリイミドは、電
気光学効果、耐熱性等の点から、下記式(III)The fluorinated polyimide of the present invention has the following formula (III) from the viewpoint of electro-optical effect, heat resistance and the like.
【化11】 で表される繰り返し単位及び下記式(IV)[Chemical 11] A repeating unit represented by the following formula (IV)
【化12】 で表される繰り返し単位を有するフッ素化ポリイミドで
あることが好ましい。[Chemical 12] A fluorinated polyimide having a repeating unit represented by
【0016】本発明における電気光学材料は、耐熱性及
び電気光学効果の点から下記式(I)又は下記式(II)The electro-optical material in the present invention has the following formula (I) or formula (II) in terms of heat resistance and electro-optical effect.
【化13】 で表される化合物とされる。[Chemical 13] It is a compound represented by.
【0017】前記式(I)又は式(II)で表される化合
物は、それぞれの化合物の前駆体に相当し低沸点のカル
ボニル化合物から誘導される芳香族一級アミンのイミン
と、α,β−不飽和ケトンとの両者をほぼ等モルで混合
した後、酸性触媒の存在下又は触媒を用いることなく、
通常のエステルの交換反応により合成することが可能で
ある。The compound represented by the above formula (I) or formula (II) is an aromatic primary amine imine derived from a low boiling point carbonyl compound corresponding to the precursor of each compound, and α, β- After mixing both the unsaturated ketone and almost equimolar, in the presence of an acidic catalyst or without using a catalyst,
It can be synthesized by a usual ester exchange reaction.
【0018】本発明のアクティブ光導波路用組成物は、
例えば、フッ素化ポリアミド酸の極性有機溶媒溶液に電
気光学材料を加えて撹拌等により混合することにより容
易に製造することができる。この際、電気光学材料の使
用量は、フッ素化ポリアミド酸100重量部に対して
0.1〜10重量部の範囲とすることが好ましく、0.
5〜5重量部とすることがより好ましく、0.5〜3重
量部とすることが特に好ましい。この使用量が少なすぎ
ても多すぎても、電気光学特性、その他の光学特性、機
械特性、安定性、作業性等が劣る傾向がある。本発明の
アクティブ光導波路用組成物には、フッ素化ポリアミド
酸以外のポリマー(例えば、フッ素原子を含んでいない
ポリアミド酸、液晶ポリエステル等の液晶性ポリマ
ー)、ピンホール防止剤、レベリング剤、可塑剤、密着
性向上剤等の添加剤などを含ませることができる。The composition for active optical waveguide of the present invention is
For example, it can be easily produced by adding an electro-optical material to a polar organic solvent solution of fluorinated polyamic acid and mixing them by stirring or the like. At this time, the amount of the electro-optical material used is preferably in the range of 0.1 to 10 parts by weight with respect to 100 parts by weight of the fluorinated polyamic acid, and is preferably 0.1.
The amount is more preferably 5 to 5 parts by weight, and particularly preferably 0.5 to 3 parts by weight. If the amount used is too small or too large, electro-optical properties, other optical properties, mechanical properties, stability, workability, etc. tend to be poor. The composition for active optical waveguide of the present invention includes a polymer other than fluorinated polyamic acid (for example, polyamic acid containing no fluorine atom, liquid crystalline polymer such as liquid crystal polyester), pinhole inhibitor, leveling agent, plasticizer. An additive such as an adhesion improver can be included.
【0019】本発明のアクティブ光導波路用組成物を用
いたアクティブ光導波路について説明する。本発明のア
クティブ光導波路は、例えば、光マトリックススイッ
チ、変調器、光偏光器、光アイソレーター等に用いられ
る。光マトリックススイッチ、変調器の基本形態を図1
に示す。光導波路の形成においては、一般的な製膜法、
例えば、スピンコート法、浸漬法、ドクターブレード
法、ワイヤーバー法、ローラー法、スプレー法等を用い
ることができる。光導波路のコア材とクラッド材の選択
は、光の波長、使用用途に適した屈折率の差になるよう
にすればよい。An active optical waveguide using the active optical waveguide composition of the present invention will be described. The active optical waveguide of the present invention is used, for example, in optical matrix switches, modulators, optical polarizers, optical isolators, and the like. Figure 1 shows the basic form of optical matrix switches and modulators.
Shown in In forming the optical waveguide, a general film forming method,
For example, a spin coating method, a dipping method, a doctor blade method, a wire bar method, a roller method, a spray method or the like can be used. The core material and the clad material of the optical waveguide may be selected so that the difference between the wavelength of light and the refractive index suitable for the intended use.
【0020】本発明のアクティブ光導波路は、アクティ
ブ光導波路用組成物を、例えば、シリコン基板上にスピ
ンコートし、窒素雰囲気下で加熱処理しアクティブ光導
波路用組成物中のフッ素化ポリアミド酸をイミド閉環し
てフッ素化ポリイミドとし、電気光学材料を配向させる
ことによりアクティブ光導波路を形成することができ
る。例えば、アクティブ光導波路の一態様である方向性
結合器型光スイッチの製造について図2を参照しつつ説
明する。1は基板、2は下部電極、3は下部クラッド
層、4はコア層、5はアルミニウム層、6はレジスト
層、7は上部クラッド層、8は上部電極を意味する。シ
リコン等の基板の上にアルミニウム等の下部電極2を蒸
着法やスパッタ法等により作製し、次に本発明のアクテ
ィブ光導波路用組成物からなるコア層4よりも屈折率の
小さい、本発明のアクティブ光導波路用組成物における
二つの必須構成要素の内の一つの構成要素であるフッ素
化ポリイミドで構成される下部クラッド層3を形成す
る。この上に本発明のアクティブ光導波路用組成物(電
気光学材料及びフッ素化ポリアミド酸を必須構成成分と
して含む)を所定の厚さに塗布し、加熱キュアすること
によりコア層4を得る。次に蒸着法等によりアルミニウ
ム層5をつけた後に、レジスト塗布、プリベーク、露
光、現像、アフターベークを行ない、パターニングされ
たレジスト層6を得る。レジスト層6により保護されて
いないアルミニウムをウェットエッチングにより除去し
た後、アルミニウム層5で保護されていないコア層4の
ポリイミド層をドライエッチングにより除去する。残っ
たアルミニウム層6をウェットエッチングで除去し、こ
の上に前記下部クラッド層3形成に用いたポリイミドを
用いて上部クラッド層7を形成する。最後にマスクパタ
ーンを通して所定のコア層4の上に上部電極8を蒸着法
やスパッタ法等により形成し方向性結合器型光スイッチ
が得られる。In the active optical waveguide of the present invention, the composition for active optical waveguide is spin-coated on, for example, a silicon substrate and heat-treated in a nitrogen atmosphere to imidize the fluorinated polyamic acid in the composition for active optical waveguide. The active optical waveguide can be formed by ring-closing the fluorinated polyimide and orienting the electro-optical material. For example, manufacturing of a directional coupler type optical switch, which is one mode of the active optical waveguide, will be described with reference to FIG. 1 is a substrate, 2 is a lower electrode, 3 is a lower clad layer, 4 is a core layer, 5 is an aluminum layer, 6 is a resist layer, 7 is an upper clad layer, and 8 is an upper electrode. A lower electrode 2 of aluminum or the like is formed on a substrate of silicon or the like by a vapor deposition method, a sputtering method, or the like, and then has a smaller refractive index than the core layer 4 made of the active optical waveguide composition of the present invention. A lower clad layer 3 composed of fluorinated polyimide, which is one of the two essential components in the composition for active optical waveguide, is formed. A core layer 4 is obtained by applying the active optical waveguide composition of the present invention (containing an electro-optical material and a fluorinated polyamic acid as essential constituents) to a predetermined thickness and heating and curing the composition. Next, after applying the aluminum layer 5 by a vapor deposition method or the like, resist coating, pre-baking, exposure, development and after-baking are performed to obtain a patterned resist layer 6. After aluminum which is not protected by the resist layer 6 is removed by wet etching, the polyimide layer of the core layer 4 which is not protected by the aluminum layer 5 is removed by dry etching. The remaining aluminum layer 6 is removed by wet etching, and an upper clad layer 7 is formed thereon by using the polyimide used for forming the lower clad layer 3. Finally, an upper electrode 8 is formed on a predetermined core layer 4 through a mask pattern by a vapor deposition method, a sputtering method, or the like to obtain a directional coupler type optical switch.
【0021】前記アクティブ光導波路中のコア層に含ま
れる電気光学材料を配向させるには、ポーリング処理等
を行なえばよい。例えば、電場を印加しながら加熱して
イミド閉環によるイミド化を行ないながら、同時に電気
光学材料を配向させることができる。電場の印加方法に
は、電極を設けて行なう方法、コロナ放電で表面を帯電
させる方法等が挙げられる。電場の強さは、105V/cm
とすることが好ましく、106V/cm以上とすることがよ
り好ましい。また、イミド閉環によるイミド化を行ない
最終的な構造であるフッ素化ポリイミドとした後に、こ
れに電場を加えてTg以上の温度に加熱して電気光学材料
を配向させることもできる。導波路は、通常、10μm
〜15μm幅で、3μm〜4μmの高さで形成され、パ
ターン間隔は、2μm〜3μm程度である。To orient the electro-optical material contained in the core layer in the active optical waveguide, poling treatment or the like may be performed. For example, it is possible to orient the electro-optical material at the same time while heating while applying an electric field to perform imidization by imide ring closure. Examples of the method of applying the electric field include a method of providing an electrode and a method of charging the surface by corona discharge. The strength of the electric field is 10 5 V / cm
And more preferably 10 6 V / cm or more. It is also possible to orient the electro-optical material by applying an electric field to this and heating it to a temperature of Tg or higher after imidizing by imide ring closure to give a final structure of fluorinated polyimide. Waveguide is usually 10 μm
It is formed with a width of ˜15 μm and a height of 3 μm to 4 μm, and the pattern interval is about 2 μm to 3 μm.
【0022】本発明においては、プラスチック中で最も
高い耐熱性を有するフッ素化ポリイミドが光導波路のコ
ア層、クラッド層のいずれかまたは両者に用いられる。
また、耐熱性に優れる電気光学材料である式(I)又は
式(II)で表される化合物が前記フッ素化ポリイミド中
に含有される。In the present invention, fluorinated polyimide having the highest heat resistance among plastics is used for either or both of the core layer and the clad layer of the optical waveguide.
Further, the compound represented by the formula (I) or the formula (II) which is an electro-optical material having excellent heat resistance is contained in the fluorinated polyimide.
【0023】[0023]
【実施例】以下、本発明を実施例によりさらに詳細に説
明するが、本発明は、以下の実施例に限定されるもので
はない。EXAMPLES The present invention will be described in more detail with reference to examples below, but the present invention is not limited to the following examples.
【0024】実施例1 電気光学材料としての式(I)で表される化合物1重量
部とフッ素化ポリアミド酸OPI−1005(日立化成
工業社製商品名)15重量部をN−メチルピロリドン
(NMP)200重量部に溶解して得られたアクティブ
光導波路用組成物の溶液を100nm厚の半透明アルミ電
極を付けた石英ガラス上に回転数2000rpmでスピン
塗工し、2μm膜を形成した。NMP溶剤を除去するた
め真空下120℃で6時間ソフトベークし、続いて前記
の膜上に100nm厚の半透明アルミ電極を形成しサンド
ウィッチ型のサンプルを作製した。電極間に400Vの
電圧を印加しながら2℃/分の昇温速度で250℃(ポ
ーリング温度)にサンプルを加熱し、さらに、400V
の電圧を印加しながら同温度で1時間保持し、その後、
400Vの電圧を印加しながら室温まで冷却してアクテ
ィブ光導波路試験用サンプル(ここでは、図2における
コア層4の部分に対応するコア部のみを含み、クラッド
部にあたるものはない)を作製した。Example 1 1 part by weight of a compound represented by the formula (I) as an electro-optical material and 15 parts by weight of fluorinated polyamic acid OPI-1005 (trade name of Hitachi Chemical Co., Ltd.) were added to N-methylpyrrolidone (NMP). ) A solution of the composition for active optical waveguide obtained by dissolving in 200 parts by weight was spin-coated at a rotation speed of 2000 rpm on a quartz glass having a semi-transparent aluminum electrode having a thickness of 100 nm to form a 2 µm film. In order to remove the NMP solvent, soft baking was performed at 120 ° C. for 6 hours under vacuum, and then a 100 nm thick semitransparent aluminum electrode was formed on the film to prepare a sandwich type sample. The sample was heated to 250 ° C. (poling temperature) at a heating rate of 2 ° C./min while applying a voltage of 400 V between the electrodes, and further 400 V was applied.
Hold at the same temperature for 1 hour while applying the voltage of
While applying a voltage of 400 V, the sample was cooled to room temperature to prepare an active optical waveguide test sample (here, only the core part corresponding to the part of the core layer 4 in FIG. 2 was included, and no clad part was included).
【0025】図3に示す測定装置を用いて前記アクティ
ブ光導波路試験用サンプルについて熱安定性を調べた。
この装置は電気光学定数測定装置で、測定方法はC.C.Te
ng and H.T.Man,Appl.Phys.Lett.56(18)1734(1990)に記
載された方法とほぼ同じである。図3に示す測定装置
は、次のように構成されたものである。He−Neレー
ザ9からの光を偏光子10を通過させ、直線偏光にした
後、サンプル11の法線方向とビーム軸のなす角がθと
なるように傾けられたサンプル11を透過させ、バビネ
・ソレイユ補償子12と検光子13を通して検出器(フ
ォトダイオード)14で検出する。検出された光の強度
は電圧として、直流電圧計16とロックインアンプ15
で計測される。測定する際の検光子の透過軸の角度は、
検光子を回転して直流電圧計16で測定される直流電圧
の最大と最少の値の差の1/2の値となるよう設定す
る。発振器17で周波数1kHz、交流電圧10Vをサン
プル11に印加すると、電気光学効果によって、出力信
号も1kHzで変調される。このときの、交流成分をロッ
クインアンプ15で、直流成分を直流電圧計16で測定
する。ロックインアンプ15、直流電圧計16での測定
電圧をそれぞれVm、Vと定義すると、電気光学定数r
33は下記式(1)から求められる。The thermal stability of the active optical waveguide test sample was examined by using the measuring apparatus shown in FIG.
This device is an electro-optical constant measuring device, and the measuring method is CCTe.
ng and HTMan, Appl. Phys. Lett. 56 (18) 1734 (1990). The measuring device shown in FIG. 3 is configured as follows. The light from the He-Ne laser 9 is passed through the polarizer 10 to be linearly polarized light, and then the sample 11 tilted so that the angle formed by the normal axis of the sample 11 and the beam axis is θ is transmitted, and the Babinet is used. Detecting with a detector (photodiode) 14 through a Soleil compensator 12 and an analyzer 13. The detected light intensity is used as a voltage, and the DC voltmeter 16 and the lock-in amplifier 15 are used.
Is measured at. The angle of the transmission axis of the analyzer when measuring is
The analyzer is set to rotate so that the difference between the maximum value and the minimum value of the DC voltage measured by the DC voltmeter 16 is 1/2. When an oscillator 17 applies a frequency of 1 kHz and an AC voltage of 10 V to the sample 11, the output signal is also modulated at 1 kHz by the electro-optic effect. At this time, the AC component is measured by the lock-in amplifier 15 and the DC component is measured by the DC voltmeter 16. When the measured voltages at the lock-in amplifier 15 and the DC voltmeter 16 are defined as V m and V, respectively, the electro-optical constant r
33 is calculated from the following formula (1).
【数1】 なお、屈折率nはアッベの屈折率計で測定した。熱安定
性はポーリング直後の電気光学定数r33(0)と温度15
0℃の恒温槽に250時間放置した後のサンプルの電気
光学定数r33(T)を測定し、前記r33(0)とr33(T)か
ら下記式(2)を用いて求めた保持率d(T)から評価
し、結果を表1に示した。[Equation 1] The refractive index n was measured with an Abbe refractometer. Thermal stability is determined by electro-optic constant r 33 (0) and temperature of 15 after poling.
The electro-optical constant r 33 (T) of the sample after standing in a constant temperature bath of 0 ° C. for 250 hours was measured, and the retention was calculated from the above r 33 (0) and r 33 (T) by using the following formula (2). Evaluation was made from the rate d (T), and the results are shown in Table 1.
【数2】 [Equation 2]
【0026】実施例2 実施例1において用いた式(I)で表される化合物を式
(II)で表される化合物に代えて、実施例1と同様にし
てアクティブ光導波路試験用サンプルを作製し、電気光
学特性の保持率d(T)を評価し、結果を表1に示し
た。Example 2 An active optical waveguide test sample was prepared in the same manner as in Example 1 except that the compound represented by the formula (I) used in Example 1 was replaced with the compound represented by the formula (II). Then, the retention rate d (T) of the electro-optical characteristics was evaluated, and the results are shown in Table 1.
【0027】比較例1 実施例1において用いた式(I)で表される化合物とフ
ッ素化ポリアミド酸OPI−1005に代えて、表1に
示す4−〔N−エチル−N−(2−ヒドロキシエチ
ル)〕−アミノ−4′−ニトロアゾベンゼン(Disperse
Red1)とポリメチルメタクリレ−ト(PMMA)溶液
(12重量%)を用い、ポーリング温度を150℃にし
た以外は実施例1と同様にしてアクティブ光導波路試験
用サンプルを作製し、電気光学特性の保持率d(T)を
評価し、結果を表1に示した。電気光学特性は、100
℃に加熱するだけで75%消失した。Comparative Example 1 Instead of the compound represented by the formula (I) and the fluorinated polyamic acid OPI-1005 used in Example 1, 4- [N-ethyl-N- (2-hydroxy) shown in Table 1 was used. Ethyl)]-amino-4'-nitroazobenzene (Disperse
Red1) and a polymethylmethacrylate (PMMA) solution (12% by weight) were used to prepare an active optical waveguide test sample in the same manner as in Example 1 except that the poling temperature was 150 ° C. The retention rate d (T) was evaluated, and the results are shown in Table 1. Electro-optical characteristics are 100
It only disappeared when heated to 0 ° C.
【0028】[0028]
【表1】 [Table 1]
【0029】[0029]
【発明の効果】本発明のアクティブ光導波路用組成物は
光学的に良好な透明膜を与える。本発明のアクティブ光
導波路用組成物を用いて作製したアクティブ光導波路
は、熱的に非常に安定であり、光スイッチ、変調器等の
電気光学素子を作製するのに好適なものである。耐熱性
に優れるフッ素化ポリイミド及び式(I)又は式(II)
で表される化合物を使用することにより光導波路作製時
に必要とされる熱安定性が向上される。さらにスピンコ
ート法により、容易に大面積光導波路が作製できるとい
う利点を持ち、光導波路の低価格化が可能である。The composition for active optical waveguide of the present invention gives an optically excellent transparent film. The active optical waveguide produced by using the composition for active optical waveguide of the present invention is very stable thermally and is suitable for producing electro-optical elements such as optical switches and modulators. Fluorinated polyimide having excellent heat resistance and formula (I) or formula (II)
By using the compound represented by the following formula, the thermal stability required at the time of producing the optical waveguide is improved. Furthermore, the spin coating method has an advantage that a large-area optical waveguide can be easily manufactured, and the cost of the optical waveguide can be reduced.
【図1】光マトリックススイッチ、変調器の基本形態。FIG. 1 is a basic form of an optical matrix switch and a modulator.
【図2】アクティブ光導波路作製工程の説明図。FIG. 2 is an explanatory diagram of an active optical waveguide manufacturing process.
【図3】実施例及び比較例で用いた電気光学定数の測定
装置の説明図。FIG. 3 is an explanatory diagram of an electro-optical constant measuring device used in Examples and Comparative Examples.
【符号の説明】 1 基板 2 下部電極 3 下部クラッド層 4 コア層 5 アルミニウム層 6 レジスト層 7 上部クラッド層 8 上部電極 9 He−Neレーザ 10 偏光子 11 サンプル 12 ハビネ・ソレイユ補償板 13 検光子 14 検出器 15 ロックインアンプ 16 直流電圧計 17 発振器[Description of Reference Signs] 1 substrate 2 lower electrode 3 lower clad layer 4 core layer 5 aluminum layer 6 resist layer 7 upper clad layer 8 upper electrode 9 He-Ne laser 10 polarizer 11 sample 12 Habine-Soleil compensator 13 analyzer 14 Detector 15 Lock-in amplifier 16 DC voltmeter 17 Oscillator
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 G02B 6/13 G02F 1/03 501 1/313 G02B 6/12 M ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location G02B 6/13 G02F 1/03 501 1/313 G02B 6/12 M
Claims (5)
を含むアクティブ光導波路用組成物であって、電気光学
材料が下記式(I)又は下記式(II) 【化1】 で表される化合物であるアクティブ光導波路用組成物。1. A composition for an active optical waveguide, comprising a fluorinated polyamic acid and an electro-optical material, wherein the electro-optical material is represented by the following formula (I) or the following formula (II): A composition for an active optical waveguide, which is a compound represented by:
てフッ素化ポリイミドとなった時、屈折率が1.4〜
1.9(589nm)、誘電率が2.6〜3.5(1MH
z)及びガラス転移温度(Tg)が300℃以上となるも
のである請求項1記載のアクティブ光導波路用組成物。2. When the fluorinated polyamic acid is imide-closed to form a fluorinated polyimide, the refractive index is 1.4 to
1.9 (589 nm), dielectric constant 2.6-3.5 (1 MH
The composition for active optical waveguides according to claim 1, wherein z) and the glass transition temperature (Tg) are 300 ° C or higher.
1) 【化2】 で表される繰り返し単位及び式(III−2) 【化3】 で表される繰り返し単位の少なくとも1つと式(IV−
1) 【化4】 で表される繰り返し単位及び式(IV−2) 【化5】 で表される繰り返し単位の少なくとも1つとを有するフ
ッ素化ポリアミド酸である請求項1又は2記載のアクテ
ィブ光導波路用組成物。3. The fluorinated polyamic acid has the formula (III-
1) [Chemical formula 2] And a repeating unit represented by the formula (III-2): At least one of the repeating units represented by the formula (IV-
1) [Chemical 4] And a repeating unit represented by the formula (IV-2): The composition for active optical waveguides according to claim 1 or 2, which is a fluorinated polyamic acid having at least one repeating unit represented by:
導波路用組成物中のフッ素化ポリアミド酸を、イミド閉
環してフッ素化ポリイミドとし、電気光学材料を配向さ
せることを特徴とするアクティブ光導波路の製造法。4. The active optical waveguide characterized in that the fluorinated polyamic acid in the composition for active optical waveguide according to claim 1, 2 or 3 is imide ring-closed to give a fluorinated polyimide to orient an electro-optical material. Waveguide manufacturing method.
造法により製造されたアクティブ光導波路。5. An active optical waveguide manufactured by the method for manufacturing an active optical waveguide according to claim 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17582494A JPH0841330A (en) | 1994-07-27 | 1994-07-27 | Composition for active optical waveguide, production of active optical waveguide therefrom and active optical waveguide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17582494A JPH0841330A (en) | 1994-07-27 | 1994-07-27 | Composition for active optical waveguide, production of active optical waveguide therefrom and active optical waveguide |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0841330A true JPH0841330A (en) | 1996-02-13 |
Family
ID=16002869
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17582494A Pending JPH0841330A (en) | 1994-07-27 | 1994-07-27 | Composition for active optical waveguide, production of active optical waveguide therefrom and active optical waveguide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0841330A (en) |
-
1994
- 1994-07-27 JP JP17582494A patent/JPH0841330A/en active Pending
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