JPH0848588A - Formation of metallic layer on surface of alumina ceramics - Google Patents
Formation of metallic layer on surface of alumina ceramicsInfo
- Publication number
- JPH0848588A JPH0848588A JP20420694A JP20420694A JPH0848588A JP H0848588 A JPH0848588 A JP H0848588A JP 20420694 A JP20420694 A JP 20420694A JP 20420694 A JP20420694 A JP 20420694A JP H0848588 A JPH0848588 A JP H0848588A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- metal layer
- forming
- alumina ceramics
- ceramics
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 40
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 title claims abstract description 28
- 230000015572 biosynthetic process Effects 0.000 title 1
- 229910052751 metal Inorganic materials 0.000 claims abstract description 61
- 239000002184 metal Substances 0.000 claims abstract description 60
- 238000005219 brazing Methods 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 9
- 150000004767 nitrides Chemical class 0.000 claims abstract description 8
- 239000012299 nitrogen atmosphere Substances 0.000 claims abstract description 6
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 5
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 5
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 3
- 239000011159 matrix material Substances 0.000 claims abstract description 3
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 20
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 7
- 239000010936 titanium Substances 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 238000005260 corrosion Methods 0.000 abstract description 13
- 230000007797 corrosion Effects 0.000 abstract description 13
- 229910018054 Ni-Cu Inorganic materials 0.000 abstract 1
- 229910018481 Ni—Cu Inorganic materials 0.000 abstract 1
- 239000000945 filler Substances 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 7
- 239000002253 acid Substances 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 229910000792 Monel Inorganic materials 0.000 description 3
- 239000003518 caustics Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- HZEWFHLRYVTOIW-UHFFFAOYSA-N [Ti].[Ni] Chemical compound [Ti].[Ni] HZEWFHLRYVTOIW-UHFFFAOYSA-N 0.000 description 2
- 229910000833 kovar Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910001000 nickel titanium Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- AHGIVYNZKJCSBA-UHFFFAOYSA-N [Ti].[Ag].[Cu] Chemical compound [Ti].[Ag].[Cu] AHGIVYNZKJCSBA-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Products (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、セラミックス表面に金
属層を形成する方法に関し、特にアルミナセラミックス
表面に耐食性に優れた金属層を形成する方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a metal layer on the surface of ceramics, and more particularly to a method for forming a metal layer having excellent corrosion resistance on the surface of alumina ceramics.
【０００２】[0002]
【従来の技術】アルミナセラミックスは、特性が優れて
おりしかも安価であるなどの利点から現在最も一般的に
使われているセラミックスであるが、アルミナセラミッ
クスの表面に形成された金属層は、導体として、或いは
該セラミックスと異種金属との接合のためによく用いら
れる。2. Description of the Related Art Alumina ceramics are the most commonly used ceramics at present due to their advantages such as excellent characteristics and low cost. However, the metal layer formed on the surface of alumina ceramics is used as a conductor. Alternatively, it is often used for joining the ceramics and dissimilar metals.
【０００３】従来のアルミナセラミックス表面への金属
層の形成方法は、例えば高融点金属であるＭｏ−Ｍｎや
Ｎｉ−Ｗなどから成る金属を１５００℃程度の高温でセ
ラミックス表面に焼き付けて金属層を形成する方法が採
られていた。A conventional method for forming a metal layer on the surface of alumina ceramics is to form a metal layer by baking a metal composed of a refractory metal such as Mo--Mn or Ni--W at a high temperature of about 1500.degree. The method of doing was adopted.
【０００４】そのほか金属層を低温で形成する方法とし
て、焼き付け強度はあまり高くないが、ＡｇまたはＡｇ
とＰｄなどから成る金属を８００〜１０００℃程度でセ
ラミックス表面に焼き付けて金属層を形成する方法も採
られていた。As another method for forming a metal layer at a low temperature, the baking strength is not so high, but Ag or Ag is used.
A method of forming a metal layer by baking a metal including Pd and Pd on the ceramic surface at about 800 to 1000 ° C has also been adopted.
【０００５】また、最近では、従来より使用されている
銀と銅との共晶組成から成るロウ中に、活性金属である
チタンを含んだ金属ロウを使用して、８００℃前後の低
い温度で、しかもアルミナセラミックスに強固にロウ付
けする方法も開発された。Recently, a metal braze containing titanium as an active metal has been used in a conventionally used braze composed of a eutectic composition of silver and copper, at a low temperature of about 800 ° C. Moreover, a method of firmly brazing to alumina ceramics has also been developed.
【０００６】[0006]
【発明が解決しようとする課題】しかし、これらの方法
によって形成された金属層は、通常に使っていれば問題
ないが、酸などの腐食性ガス雰囲気下、あるいは腐食性
溶液中で使った場合には耐食性が良くないため、いずれ
も金属層が腐食してしまうという問題があった。例えば
酸液に接しているセラミックス表面に上記組成からなる
導体が形成された場合、セラミックスは腐食しないが導
体は腐食して使いものにならなくなってしまう。そのた
め、導体、即ち金属層の上面を耐酸性のある有機樹脂や
ガラスで覆ってやる必要があった。However, the metal layer formed by these methods has no problem if used normally, but when used in a corrosive gas atmosphere such as an acid or in a corrosive solution. However, since the corrosion resistance is poor, the metal layers are corroded. For example, when a conductor having the above composition is formed on the surface of the ceramic which is in contact with the acid solution, the ceramic does not corrode, but the conductor corrodes and becomes unusable. Therefore, it is necessary to cover the upper surface of the conductor, that is, the metal layer with an acid-resistant organic resin or glass.
【０００７】また、金属層を覆った有機樹脂について
も、耐酸性の強いものは見あたらず２５０℃以下にしか
使えないという問題があり、ガラスについても、ガラス
を覆う工程が面倒で費用が嵩むなどの問題があった。Regarding the organic resin covering the metal layer, there is no strong acid resistance, and there is a problem that it can be used only at 250 ° C. or lower. For glass, the step of covering the glass is troublesome and costly. There was a problem.
【０００８】本発明は、上述した従来技術が有する課題
に鑑みなされたものであって、その目的は、アルミナセ
ラミックス表面に、腐食性物質に対して耐食性に優れた
金属層を強固に形成する方法を提供することにある。The present invention has been made in view of the above-mentioned problems of the prior art, and an object thereof is to strongly form a metal layer having excellent corrosion resistance against a corrosive substance on the surface of alumina ceramics. To provide.
【０００９】[0009]
【課題を解決するための手段】本発明者等は、上記目的
を達成するため鋭意研究した結果、先ずアルミナセラミ
ックスの表面に窒化層を形成し、その面上に活性金属を
含む耐食性の優れたロウで金属層を形成すれば目的を達
成することができるとの知見を得て、本発明を完成し
た。Means for Solving the Problems The inventors of the present invention have conducted extensive studies to achieve the above object. As a result, a nitride layer was first formed on the surface of alumina ceramics, and an excellent corrosion resistance containing an active metal was formed on the surface. The present invention has been completed based on the finding that the object can be achieved by forming a metal layer with brazing.
【００１０】上記アルミナセラミックス表面に窒化層を
形成する方法としては、該セラミックスを窒素雰囲気中
にて１１００〜１４５０℃の温度で加熱処理するものと
した（請求項２）。アルミナセラミックスを窒素雰囲気
中にて加熱処理することにより、アルミナセラミックス
中のＡｌと窒素（Ｎ2）とが反応してセラミックス表面
にＡｌＮ層が生成されるものと思われる。加熱処理温度
が１１００℃より低いとセラミックス中のＡｌと窒素
（Ｎ2）とが反応しないので、ＡｌＮ層が形成されず、
また、１４５０℃より高いとアルミナセラミックス中の
焼結助剤が滲み出しロウ付けがしにくくなるため、これ
以上高くできない。As a method of forming a nitride layer on the surface of the alumina ceramics, the ceramics are heat-treated at a temperature of 1100 to 1450 ° C. in a nitrogen atmosphere (claim 2). It is considered that by heating the alumina ceramics in a nitrogen atmosphere, Al in the alumina ceramics reacts with nitrogen (N 2 ) to form an AlN layer on the surface of the ceramics. When the heat treatment temperature is lower than 1100 ° C., Al in the ceramic and nitrogen (N 2 ) do not react, so that the AlN layer is not formed,
On the other hand, if the temperature is higher than 1450 ° C., the sintering aid in the alumina ceramics will be exuded and it will be difficult to perform brazing.
【００１１】上記活性金属を含む金属ロウとしては、耐
食性が優れているニッケル、あるいはモネル（ニッケル
とＣｕとの合金）から成るマトリックス中に、チタンま
たは同様の働きを持つジルコニウム、ハフニウム等の活
性金属を含むロウであるとした（請求項３）。チタンな
どの活性金属を含有したのは、窒化層中のＮと活性金属
とが反応してその界面でＴｉＮなどを生成して強く結合
するためである。The metal wax containing the above-mentioned active metal is titanium or an active metal such as zirconium or hafnium having a similar function in a matrix made of nickel or monel (alloy of nickel and Cu) having excellent corrosion resistance. Is a wax containing (claim 3). The reason for containing an active metal such as titanium is that N in the nitride layer and the active metal react with each other to generate TiN or the like at the interface and strongly bond.
【００１２】上記金属層を形成する方法としては、形成
した窒化層の上面に金属ロウを配し、それを真空中にて
金属ロウが溶融する温度より高い温度で加熱処理するこ
ととした（請求項４）。加熱雰囲気を真空中としたの
は、少しでも水分を含むと金属層が酸化し使用に耐えな
くなるためであり、その真空度は１０-5Ｔｏｒｒ以上が
望ましい。また還元雰囲気中では金属ロウ中のＴｉなど
が水素脆化を起こしてしまい、これも使用に耐えなくな
るためである。As a method for forming the above-mentioned metal layer, a metal brazing material is arranged on the upper surface of the formed nitride layer, and the metal brazing material is heat-treated in vacuum at a temperature higher than the melting temperature of the metal brazing material. Item 4). The reason why the heating atmosphere is set to vacuum is that the metal layer is oxidized and becomes unusable if it contains a little water, and the degree of vacuum is preferably 10 -5 Torr or more. Further, in a reducing atmosphere, Ti in the metal brazing material causes hydrogen embrittlement, which also makes it unusable.
【００１３】以上の方法を採ることにより、腐食性物質
に強いニッケル、あるいはモネルの金属ロウを、アルミ
ナセラミックス表面に強固にロウ付けすることが出来る
ので、耐食性に優れた金属層をアルミナセラミックス表
面に強固に形成することが出来る。By adopting the above method, it is possible to firmly braze nickel or monel metal braze, which is resistant to corrosive substances, to the surface of alumina ceramics. Therefore, a metal layer excellent in corrosion resistance is formed on the surface of alumina ceramics. It can be firmly formed.
【００１４】[0014]
【実施例】以下、本発明の実施例を比較例と共に挙げ、
本発明をより詳細に説明する。EXAMPLES Examples of the present invention will be given below together with comparative examples.
The present invention will be described in more detail.
【００１５】（実施例１〜６）セラミックスとして１０
ｍｍ角で、厚さ３ｍｍのアルミナセラミックス〔（株）
日本セラテック社製〕を用い、そのセラミックスを窒素
雰囲気中にて表１に示す温度で加熱処理した。加熱処理
後、長さ５ｍｍ、巾１ｍｍ、厚さ０．１ｍｍの活性金属
を含有するニッケル−チタン（２４Ｎｉ−７６Ｔｉｗｔ
％）、またはモネル（１２Ｃｕ−２１Ｎｉ−６７Ｔｉｗ
ｔ％）をセラミックス上面に配し、７×１０-5Ｔｏｒｒ
の真空中にて１１００℃で加熱処理して金属層を形成し
た。形成された金属層の上面に、直径３ｍｍ、長さ３０
ｍｍのコバール〔住友特殊金属（株）社製 ＫＶ−２〕
の端面をはんだで接合し、コバールを垂直に引っ張るこ
とによりアルミナセラミックスと金属層との接合強度を
求めた。その結果を表１に示す。(Examples 1 to 6) Ceramics 10
Alumina ceramics with 3 mm thickness and 3 mm square [(Ltd.)
Manufactured by Nippon Ceratech Co., Ltd.] and the ceramics were heat-treated at a temperature shown in Table 1 in a nitrogen atmosphere. After the heat treatment, nickel-titanium (24Ni-76Tiwt) containing an active metal having a length of 5 mm, a width of 1 mm and a thickness of 0.1 mm.
%) Or Monel (12Cu-21Ni-67Tiw)
t%) is placed on the upper surface of the ceramic, and 7 × 10 −5 Torr
Was heated at 1100 ° C. in vacuum to form a metal layer. 3 mm in diameter and 30 in length on the upper surface of the formed metal layer.
mm Kovar [KV-2 manufactured by Sumitomo Special Metals Co., Ltd.]
The end faces of were bonded with solder and the Kovar was pulled vertically to determine the bonding strength between the alumina ceramics and the metal layer. The results are shown in Table 1.
【００１６】金属層との接合強度を求めたアルミナセラ
ミックスを、比抵抗が１×１０8Ω・ｃｍ以上の純水に
塩酸を添加して１×１０5Ω・ｃｍに調整した酸性試験
水を６０℃に暖め、その液中に５００時間浸漬し腐食試
験した。浸漬後１０倍の顕微鏡で金属層を観察し、金属
層の面が何の変化のない、即ち腐食がないものを良と
し、金属層の面が荒れて腐食が認められているものを不
良とした。その結果を表１に示す。Acidic test water prepared by adding hydrochloric acid to pure water having a specific resistance of 1 × 10 8 Ω · cm or more by adjusting the alumina ceramics for which the bonding strength with the metal layer was obtained to 1 × 10 5 Ω · cm was prepared. It was warmed to 60 ° C. and immersed in the solution for 500 hours for corrosion test. After immersing, observe the metal layer with a microscope of 10 times, and if the surface of the metal layer has no change, that is, there is no corrosion, it is good, and if the surface of the metal layer is rough and corrosion is recognized, it is bad. did. The results are shown in Table 1.
【００１７】（比較例１〜８）また、比較のため、実施
例と同じセラミックスを窒素雰囲気中にて表１に示す温
度で加熱処理した。加熱処理後ニッケル−チタン（２４
Ｎｉ−７６Ｔｉｗｔ％）、または銀−銅−チタン（７１
Ａｇ−２７Ｃｕ−２Ｔｉｗｔ％）をセラミックスの上面
に配し、それらを表１に示す真空度にした真空中にて１
１００℃の温度で加熱処理して金属層を形成した。形成
した金属層の接合強度は実施例と同じ方法で求め、腐食
試験も実施例と同じ方法で試験した。それらの結果を表
１に示す。(Comparative Examples 1 to 8) For comparison, the same ceramics as those in Examples were heat-treated at a temperature shown in Table 1 in a nitrogen atmosphere. After heat treatment, nickel-titanium (24
Ni-76Tiwt%), or silver-copper-titanium (71
Ag-27Cu-2Tiwt%) is arranged on the upper surface of the ceramics, and they are set to the vacuum degree shown in Table 1 in a vacuum.
It heat-processed at the temperature of 100 degreeC, and formed the metal layer. The bonding strength of the formed metal layer was determined by the same method as in the example, and the corrosion test was also performed by the same method as in the example. The results are shown in Table 1.
【００１８】[0018]
【表１】 [Table 1]
【００１９】表１から明らかなように、実施例において
は、いずれも接合強度が高く、また腐食試験も良好であ
った。これに対して比較例では、加熱処理温度が規定範
囲外にあるので、ロウ付けに満足な結果が得られず（比
較例１〜３）、焼成雰囲気が規定範囲外にあるとやはり
満足な結果が得られなかった（比較例４〜６）。また金
属ロウの種類が規定範囲外にあると接合強度は十分であ
るが金属層の金属が腐食してしまった（比較例７）。さ
らに真空度が低い真空中で処理するとロウ付けに満足な
結果が得られなかった（比較例８）。As is clear from Table 1, in each of the examples, the joint strength was high and the corrosion test was good. On the other hand, in the comparative example, since the heat treatment temperature was out of the specified range, satisfactory results could not be obtained in brazing (Comparative Examples 1 to 3), and the baking atmosphere was out of the specified range. Was not obtained (Comparative Examples 4 to 6). When the type of the metal brazing material was out of the specified range, the bonding strength was sufficient, but the metal in the metal layer was corroded (Comparative Example 7). Further, when the treatment was carried out in a vacuum having a low degree of vacuum, satisfactory results for brazing could not be obtained (Comparative Example 8).
【００２０】[0020]
【発明の効果】以上、説明した本発明にかかるアルミナ
セラミックス表面への金属層形成方法によれば、アルミ
ナセラミックスの表面に接合強度が高く、かつ腐食性物
質に対して耐食性に優れた金属層を形成することが出来
る。According to the above-described method for forming a metal layer on the surface of alumina ceramics according to the present invention, a metal layer having high bonding strength and excellent corrosion resistance to corrosive substances is formed on the surface of alumina ceramics. Can be formed.
Claims (4)
成し、その面上に活性金属を含む金属ロウをロウ付けし
て金属層を形成することを特徴とするアルミナセラミッ
クス表面への金属層形成方法。1. A method for forming a metal layer on an alumina ceramic surface, comprising forming a nitride layer on the alumina ceramic surface and brazing a metal braze containing an active metal on the surface to form a metal layer.
成する方法が、該セラミックスを窒素雰囲気中にて１１
００〜１４５０℃の温度で加熱処理することを特徴とす
る請求項１記載のアルミナセラミックス表面への金属層
形成方法。2. A method for forming a nitride layer on the surface of alumina ceramics is the method of forming the nitrided ceramics in a nitrogen atmosphere.
The method for forming a metal layer on the surface of an alumina ceramics according to claim 1, wherein the heat treatment is performed at a temperature of 00 to 1450 ° C.
はニッケルと銅から成るマトリックス中に、チタン、ジ
ルコニウム、ハフニウムの活性金属を含むロウであるこ
とを特徴とする請求項１又は２記載のアルミナセラミッ
クス表面への金属層形成方法。3. The alumina according to claim 1, wherein the wax containing an active metal is a wax containing an active metal of titanium, zirconium or hafnium in a matrix of nickel or nickel and copper. Method for forming metal layer on ceramic surface.
層の上面に金属ロウを配し、それを真空中にて金属ロウ
が溶融する温度より高い温度で加熱処理することを特徴
とする請求項１、２又は３記載のアルミナセラミックス
表面への金属層形成方法。4. The method for forming a metal layer is characterized in that a metal brazing material is arranged on the upper surface of the formed nitrided layer and heat treatment is performed at a temperature higher than the melting temperature of the metal brazing material in vacuum. The method for forming a metal layer on the surface of the alumina ceramic according to claim 1, 2, or 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20420694A JPH0848588A (en) | 1994-08-08 | 1994-08-08 | Formation of metallic layer on surface of alumina ceramics |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20420694A JPH0848588A (en) | 1994-08-08 | 1994-08-08 | Formation of metallic layer on surface of alumina ceramics |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0848588A true JPH0848588A (en) | 1996-02-20 |
Family
ID=16486595
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20420694A Withdrawn JPH0848588A (en) | 1994-08-08 | 1994-08-08 | Formation of metallic layer on surface of alumina ceramics |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0848588A (en) |
-
1994
- 1994-08-08 JP JP20420694A patent/JPH0848588A/en not_active Withdrawn
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20041202 |