JPH0848768A - Polyetheresteramide and resin composition - Google Patents
Polyetheresteramide and resin compositionInfo
- Publication number
- JPH0848768A JPH0848768A JP25287894A JP25287894A JPH0848768A JP H0848768 A JPH0848768 A JP H0848768A JP 25287894 A JP25287894 A JP 25287894A JP 25287894 A JP25287894 A JP 25287894A JP H0848768 A JPH0848768 A JP H0848768A
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin composition
- resin
- acid
- polyetheresteramide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920006146 polyetheresteramide block copolymer Polymers 0.000 title claims abstract description 38
- 239000011342 resin composition Substances 0.000 title claims description 28
- 239000004721 Polyphenylene oxide Substances 0.000 claims abstract description 20
- 229920000570 polyether Polymers 0.000 claims abstract description 20
- 229920005992 thermoplastic resin Polymers 0.000 claims abstract description 14
- 229920000642 polymer Polymers 0.000 claims abstract description 13
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 11
- 239000004952 Polyamide Substances 0.000 claims abstract description 10
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 10
- 229920002647 polyamide Polymers 0.000 claims abstract description 10
- 229930185605 Bisphenol Natural products 0.000 claims abstract description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 4
- 125000005702 oxyalkylene group Chemical group 0.000 claims abstract description 4
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 22
- 229920001577 copolymer Polymers 0.000 claims description 18
- 125000003118 aryl group Chemical group 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 17
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 claims description 6
- 229920002554 vinyl polymer Polymers 0.000 claims description 6
- 229920000098 polyolefin Polymers 0.000 claims description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 3
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 claims description 3
- 150000002989 phenols Chemical class 0.000 claims description 3
- 229920000233 poly(alkylene oxides) Chemical group 0.000 claims description 3
- 229920005672 polyolefin resin Polymers 0.000 claims description 3
- 150000003440 styrenes Chemical class 0.000 claims description 3
- 125000003277 amino group Chemical group 0.000 claims description 2
- 125000003700 epoxy group Chemical group 0.000 claims description 2
- 125000000524 functional group Chemical group 0.000 claims description 2
- 125000002950 monocyclic group Chemical group 0.000 claims description 2
- 229920001225 polyester resin Polymers 0.000 claims description 2
- 239000004645 polyester resin Substances 0.000 claims description 2
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 2
- 125000006353 oxyethylene group Chemical group 0.000 claims 1
- 229920005989 resin Polymers 0.000 abstract description 21
- 239000011347 resin Substances 0.000 abstract description 21
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 abstract description 14
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract description 13
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 abstract description 12
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 abstract description 7
- 150000003951 lactams Chemical class 0.000 abstract description 3
- 238000007142 ring opening reaction Methods 0.000 abstract description 2
- 238000013329 compounding Methods 0.000 abstract 2
- 229920001890 Novodur Polymers 0.000 abstract 1
- -1 polyethylene Polymers 0.000 description 44
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 29
- 238000004519 manufacturing process Methods 0.000 description 25
- 238000000034 method Methods 0.000 description 19
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 10
- 238000004898 kneading Methods 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- 150000002009 diols Chemical class 0.000 description 8
- 229920001155 polypropylene Polymers 0.000 description 8
- 239000004594 Masterbatch (MB) Substances 0.000 description 7
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 7
- 239000004743 Polypropylene Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000001361 adipic acid Substances 0.000 description 6
- 235000011037 adipic acid Nutrition 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 6
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 235000014113 dietary fatty acids Nutrition 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000000194 fatty acid Substances 0.000 description 5
- 229930195729 fatty acid Natural products 0.000 description 5
- 230000001771 impaired effect Effects 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 229920001707 polybutylene terephthalate Polymers 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- PBLZLIFKVPJDCO-UHFFFAOYSA-N 12-aminododecanoic acid Chemical compound NCCCCCCCCCCCC(O)=O PBLZLIFKVPJDCO-UHFFFAOYSA-N 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- 239000002280 amphoteric surfactant Substances 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- TVIDDXQYHWJXFK-UHFFFAOYSA-N dodecanedioic acid Chemical compound OC(=O)CCCCCCCCCCC(O)=O TVIDDXQYHWJXFK-UHFFFAOYSA-N 0.000 description 4
- 150000002170 ethers Chemical class 0.000 description 4
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 4
- 239000002736 nonionic surfactant Substances 0.000 description 4
- LYTNHSCLZRMKON-UHFFFAOYSA-L oxygen(2-);zirconium(4+);diacetate Chemical compound [O-2].[Zr+4].CC([O-])=O.CC([O-])=O LYTNHSCLZRMKON-UHFFFAOYSA-L 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 4
- LWBHHRRTOZQPDM-UHFFFAOYSA-N undecanedioic acid Chemical compound OC(=O)CCCCCCCCCC(O)=O LWBHHRRTOZQPDM-UHFFFAOYSA-N 0.000 description 4
- 239000004698 Polyethylene Substances 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 3
- 239000003945 anionic surfactant Substances 0.000 description 3
- JPOXNPPZZKNXOV-UHFFFAOYSA-N bromochloromethane Chemical compound ClCBr JPOXNPPZZKNXOV-UHFFFAOYSA-N 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 150000004985 diamines Chemical class 0.000 description 3
- FJBFPHVGVWTDIP-UHFFFAOYSA-N dibromomethane Chemical compound BrCBr FJBFPHVGVWTDIP-UHFFFAOYSA-N 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 239000001103 potassium chloride Substances 0.000 description 3
- 235000011164 potassium chloride Nutrition 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- DJGKKYOJYUSKOU-UHFFFAOYSA-N 1,2-bis(chloromethoxy)benzene Chemical compound ClCOC1=CC=CC=C1OCCl DJGKKYOJYUSKOU-UHFFFAOYSA-N 0.000 description 2
- SUNMBRGCANLOEG-UHFFFAOYSA-N 1,3-dichloroacetone Chemical compound ClCC(=O)CCl SUNMBRGCANLOEG-UHFFFAOYSA-N 0.000 description 2
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical compound NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001339 alkali metal compounds Chemical class 0.000 description 2
- 150000008052 alkyl sulfonates Chemical class 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- NZZFYRREKKOMAT-UHFFFAOYSA-N diiodomethane Chemical compound ICI NZZFYRREKKOMAT-UHFFFAOYSA-N 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 150000002366 halogen compounds Chemical class 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000004816 latex Substances 0.000 description 2
- 229920000126 latex Polymers 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 2
- 239000012188 paraffin wax Substances 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- SUBJHSREKVAVAR-UHFFFAOYSA-N sodium;methanol;methanolate Chemical compound [Na+].OC.[O-]C SUBJHSREKVAVAR-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- TYFQFVWCELRYAO-UHFFFAOYSA-N suberic acid Chemical compound OC(=O)CCCCCCC(O)=O TYFQFVWCELRYAO-UHFFFAOYSA-N 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 125000001273 sulfonato group Chemical class [O-]S(*)(=O)=O 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- QTWCYGGQVFNKMG-UHFFFAOYSA-N 1,2,3-tris(chloromethoxy)benzene Chemical compound ClCOC1=CC=CC(OCCl)=C1OCCl QTWCYGGQVFNKMG-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- RMTXUPIIESNLPW-UHFFFAOYSA-N 1,2-dihydroxy-3-(pentadeca-8,11-dienyl)benzene Natural products CCCC=CCC=CCCCCCCCC1=CC=CC(O)=C1O RMTXUPIIESNLPW-UHFFFAOYSA-N 0.000 description 1
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical group C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 1
- FEWDXGMBVQULLN-UHFFFAOYSA-N 1-hydroxy-2-phenyl-1,5,6,7-tetrahydro-4H-benzimidazol-4-one Chemical compound ON1C=2CCCC(=O)C=2N=C1C1=CC=CC=C1 FEWDXGMBVQULLN-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- DVWQNBIUTWDZMW-UHFFFAOYSA-N 1-naphthalen-1-ylnaphthalen-2-ol Chemical compound C1=CC=C2C(C3=C4C=CC=CC4=CC=C3O)=CC=CC2=C1 DVWQNBIUTWDZMW-UHFFFAOYSA-N 0.000 description 1
- SGBXIDHAUUXLOV-UHFFFAOYSA-N 1-sulfocyclohexa-3,5-diene-1,3-dicarboxylic acid Chemical class OC(=O)C1=CC=CC(S(O)(=O)=O)(C(O)=O)C1 SGBXIDHAUUXLOV-UHFFFAOYSA-N 0.000 description 1
- GUOSQNAUYHMCRU-UHFFFAOYSA-N 11-Aminoundecanoic acid Chemical compound NCCCCCCCCCCC(O)=O GUOSQNAUYHMCRU-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- QARRXYBJLBIVAK-UEMSJJPVSA-N 3-[(8e,11e)-pentadeca-8,11-dienyl]benzene-1,2-diol;3-[(8e,11e)-pentadeca-8,11,14-trienyl]benzene-1,2-diol;3-[(8e,11e,13e)-pentadeca-8,11,13-trienyl]benzene-1,2-diol;3-[(e)-pentadec-8-enyl]benzene-1,2-diol;3-pentadecylbenzene-1,2-diol Chemical compound CCCCCCCCCCCCCCCC1=CC=CC(O)=C1O.CCCCCC\C=C\CCCCCCCC1=CC=CC(O)=C1O.CCC\C=C\C\C=C\CCCCCCCC1=CC=CC(O)=C1O.C\C=C\C=C\C\C=C\CCCCCCCC1=CC=CC(O)=C1O.OC1=CC=CC(CCCCCCC\C=C\C\C=C\CC=C)=C1O QARRXYBJLBIVAK-UEMSJJPVSA-N 0.000 description 1
- IYROWZYPEIMDDN-UHFFFAOYSA-N 3-n-pentadec-8,11,13-trienyl catechol Natural products CC=CC=CCC=CCCCCCCCC1=CC=CC(O)=C1O IYROWZYPEIMDDN-UHFFFAOYSA-N 0.000 description 1
- SLXKOJJOQWFEFD-UHFFFAOYSA-N 6-aminohexanoic acid Chemical compound NCCCCCC(O)=O SLXKOJJOQWFEFD-UHFFFAOYSA-N 0.000 description 1
- UFFRSDWQMJYQNE-UHFFFAOYSA-N 6-azaniumylhexylazanium;hexanedioate Chemical compound [NH3+]CCCCCC[NH3+].[O-]C(=O)CCCCC([O-])=O UFFRSDWQMJYQNE-UHFFFAOYSA-N 0.000 description 1
- XDOLZJYETYVRKV-UHFFFAOYSA-N 7-Aminoheptanoic acid Chemical compound NCCCCCCC(O)=O XDOLZJYETYVRKV-UHFFFAOYSA-N 0.000 description 1
- UQXNEWQGGVUVQA-UHFFFAOYSA-N 8-aminooctanoic acid Chemical compound NCCCCCCCC(O)=O UQXNEWQGGVUVQA-UHFFFAOYSA-N 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- CAHQGWAXKLQREW-UHFFFAOYSA-N Benzal chloride Chemical compound ClC(Cl)C1=CC=CC=C1 CAHQGWAXKLQREW-UHFFFAOYSA-N 0.000 description 1
- ZNSMNVMLTJELDZ-UHFFFAOYSA-N Bis(2-chloroethyl)ether Chemical compound ClCCOCCCl ZNSMNVMLTJELDZ-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerol Natural products OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical compound O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 1
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- 239000004433 Thermoplastic polyurethane Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 150000008431 aliphatic amides Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 125000005211 alkyl trimethyl ammonium group Chemical group 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000008378 aryl ethers Chemical class 0.000 description 1
- QFNNDGVVMCZKEY-UHFFFAOYSA-N azacyclododecan-2-one Chemical compound O=C1CCCCCCCCCCN1 QFNNDGVVMCZKEY-UHFFFAOYSA-N 0.000 description 1
- HRQGCQVOJVTVLU-UHFFFAOYSA-N bis(chloromethyl) ether Chemical compound ClCOCCl HRQGCQVOJVTVLU-UHFFFAOYSA-N 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- BVFSYZFXJYAPQJ-UHFFFAOYSA-N butyl(oxo)tin Chemical compound CCCC[Sn]=O BVFSYZFXJYAPQJ-UHFFFAOYSA-N 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 150000001734 carboxylic acid salts Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- MMIVZWZHLDUCKH-UHFFFAOYSA-N chloromethane;chloromethylbenzene Chemical compound ClC.ClCC1=CC=CC=C1 MMIVZWZHLDUCKH-UHFFFAOYSA-N 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- NBZNKMCGILYDFH-UHFFFAOYSA-L dipotassium;1-sulfocyclohexa-3,5-diene-1,3-dicarboxylate Chemical compound [K+].[K+].OS(=O)(=O)C1(C([O-])=O)CC(C([O-])=O)=CC=C1 NBZNKMCGILYDFH-UHFFFAOYSA-L 0.000 description 1
- LHLUQDDQLCJCFU-UHFFFAOYSA-L disodium;1-sulfocyclohexa-3,5-diene-1,3-dicarboxylate Chemical compound [Na+].[Na+].OS(=O)(=O)C1(C([O-])=O)CC(C([O-])=O)=CC=C1 LHLUQDDQLCJCFU-UHFFFAOYSA-L 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- PWSKHLMYTZNYKO-UHFFFAOYSA-N heptane-1,7-diamine Chemical compound NCCCCCCCN PWSKHLMYTZNYKO-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- OTCKOJUMXQWKQG-UHFFFAOYSA-L magnesium bromide Chemical compound [Mg+2].[Br-].[Br-] OTCKOJUMXQWKQG-UHFFFAOYSA-L 0.000 description 1
- 229910001623 magnesium bromide Inorganic materials 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- 150000002790 naphthalenes Chemical class 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- OIPPWFOQEKKFEE-UHFFFAOYSA-N orcinol Chemical compound CC1=CC(O)=CC(O)=C1 OIPPWFOQEKKFEE-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000002352 surface water Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000012974 tin catalyst Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- PVFOMCVHYWHZJE-UHFFFAOYSA-N trichloroacetyl chloride Chemical compound ClC(=O)C(Cl)(Cl)Cl PVFOMCVHYWHZJE-UHFFFAOYSA-N 0.000 description 1
- DQTMTQZSOJMZSF-UHFFFAOYSA-N urushiol Natural products CCCCCCCCCCCCCCCC1=CC=CC(O)=C1O DQTMTQZSOJMZSF-UHFFFAOYSA-N 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Polyamides (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は耐熱性と永久帯電防止性
に優れ、さらに各種熱可塑性樹脂との相溶性に優れたポ
リエーテルエステルアミドおよびこのポリエーテルエス
テルアミドを使用した樹脂組成物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polyether ester amide having excellent heat resistance and permanent antistatic property and further excellent compatibility with various thermoplastic resins, and a resin composition using the polyether ester amide. Is.
【0002】[0002]
【従来の技術】従来、ポリエーテルエステルアミドは一
部の熱可塑性樹脂用帯電防止剤として優れた帯電防止性
を付与することが知られているが、(1)ポリエーテル
成分にポリオキシアルキレングリコール(例えばポリエ
チレングリコール)を使用しているため耐熱性が低く、
高温で成形ができないという問題や;(2)ポリエーテ
ルエステルアミドと他の熱可塑性樹脂との相溶性が悪い
ため、層状剥離が起きたり、衝撃強度が劣ったりして、
望ましい機械的性質を有する樹脂組成物を得ることがで
きないという問題があった。(2)の問題を解決するた
め、ポリエーテルエステルアミドにカルボキシル基を有
する変性ビニル系重合体を相溶化剤として使用する方法
(特公平4−72855号公報)や、ヒドロキシル基を
有するビニル単量体を共重合成分とするゴム変性スチレ
ン系熱可塑性樹脂を相溶化剤として使用する方法(特開
平2−70739号公報)が知られている。しかし、こ
れらの方法によって相溶性は改良されるものの、多量の
相溶化剤の添加が必要であるため帯電防止性が低下する
という欠点があった。また、ポリエーテル成分に特定分
子量のポリオキシアルキレングリコール(例えばポリエ
チレングリコール)とビスフェノール類のアルキレンオ
キシド付加物を使用したポリエーテルエステルアミドを
用いることにより、透明でかつ永久帯電性に優れた樹脂
組成物を得る方法(特開平1−14417号公報)が提
案されているが、上記(1)の耐熱性の問題は依然解決
されていない。2. Description of the Related Art Conventionally, polyether ester amides have been known to impart excellent antistatic properties as an antistatic agent for some thermoplastic resins. (1) Polyoxyalkylene glycol is used as the polyether component. Since it uses (for example, polyethylene glycol), it has low heat resistance,
There is a problem that molding cannot be performed at high temperature; (2) Degradation of the layered structure or poor impact strength due to poor compatibility between the polyether ester amide and other thermoplastic resins,
There is a problem that a resin composition having desirable mechanical properties cannot be obtained. In order to solve the problem of (2), a method of using a modified vinyl polymer having a carboxyl group in a polyether ester amide as a compatibilizing agent (Japanese Patent Publication No. 4-72855), and a vinyl monomer having a hydroxyl group There is known a method (JP-A-2-70739) in which a rubber-modified styrene-based thermoplastic resin having a body as a copolymerization component is used as a compatibilizer. However, although the compatibility is improved by these methods, there is a drawback that the antistatic property is deteriorated because it is necessary to add a large amount of the compatibilizing agent. Further, by using a polyether ester amide using a polyoxyalkylene glycol having a specific molecular weight (for example, polyethylene glycol) and an alkylene oxide adduct of bisphenol as a polyether component, a resin composition which is transparent and has excellent permanent chargeability However, the problem of heat resistance in the above (1) has not been solved yet.
【0003】[0003]
【発明が解決しようとする課題】このため、耐熱性に優
れ、かつポリスチレン、ポリメタクリル酸メチル、スチ
レン/アクリロニトリル共重合体(SAN樹脂)、アク
リロニトリル/ブタジエン/スチレン共重合体(ABS
樹脂)、メタクリル酸メチル/ブタジエン/スチレン共
重合体(MBS樹脂)、スチレン/メタクリル酸メチル
/アクリロニトリル共重合体、ポリエチレン、ポリプロ
ピレン、ポリエチレンテレフテレート(PET樹脂)、
ポリブチレンテレフテレート(PBT樹脂)、熱可塑性
ポリウレタン、ポリ塩化ビニル等の各種熱可塑性樹脂と
の相溶性の良いポリエーテルエステルアミドが求められ
ている。Therefore, polystyrene, polymethylmethacrylate, styrene / acrylonitrile copolymer (SAN resin), acrylonitrile / butadiene / styrene copolymer (ABS) are excellent in heat resistance.
Resin), methyl methacrylate / butadiene / styrene copolymer (MBS resin), styrene / methyl methacrylate / acrylonitrile copolymer, polyethylene, polypropylene, polyethylene terephthalate (PET resin),
There is a demand for a polyetheresteramide having good compatibility with various thermoplastic resins such as polybutylene terephthalate (PBT resin), thermoplastic polyurethane and polyvinyl chloride.
【0004】[0004]
【課題を解決するための手段】本発明者らは、上記問題
を解決すべく鋭意検討した結果、特定分子量のポリアミ
ドと芳香環含有ポリエーテルから誘導される、高粘度の
ポリエーテルエステルアミドが、従来のポリエーテルエ
ステルアミドに比べ耐熱性および帯電防止性に優れるこ
と;またこのポリエーテルエステルアミドと熱可塑性樹
脂からなる樹脂組成物が耐熱性、永久帯電防止性および
機械的特性に優れることを見出し、本発明に到達した。Means for Solving the Problems As a result of intensive studies to solve the above problems, the present inventors have found that a high-viscosity polyether ester amide derived from a polyamide having a specific molecular weight and an aromatic ring-containing polyether, It has been found that it is superior in heat resistance and antistatic properties to conventional polyetheresteramides; and that a resin composition comprising this polyetheresteramide and a thermoplastic resin is superior in heat resistance, permanent antistatic properties and mechanical properties. Has reached the present invention.
【0005】すなわち本発明は、両末端にカルボキシル
基を有する数平均分子量500〜5,000のポリアミ
ド(a1)と下記一般式(1)で示される数平均分子量
500〜5,000の芳香環含有ポリエーテル(a2)
から誘導されるポリエーテルエステルアミド;ならびに
該ポリエーテルエステルアミド(A)と熱可塑性樹脂
(B)からなる樹脂組成物である。 H−{(Q)m−O−Z−O−(Q)m−X}n−(Q)m
−O−Z−O−(Q)m−H (1) (式中、Zはビスフェノール類、単環二価フェノール
類、ジヒドロキシビフェニル類、ジヒドロキシナフタレ
ン類、ビナフトール類から選ばれる二価フェノール類の
残基、Qは炭素数2〜4のオキシアルキレン基、Xは炭
素数1〜18のアルキレンジハライドのアルキレン残
基、mは1〜30の整数、nは1〜25の整数を表
す。)That is, the present invention comprises a polyamide (a1) having a carboxyl group at both ends and a number average molecular weight of 500 to 5,000, and an aromatic ring having a number average molecular weight of 500 to 5,000 represented by the following general formula (1). Polyether (a2)
And a resin composition comprising the polyether ester amide (A) and a thermoplastic resin (B). H-{(Q) m- O-Z-O- (Q) m- X} n- (Q) m
-O-Z-O- (Q) m- H (1) (In the formula, Z is a dihydric phenol selected from bisphenols, monocyclic dihydric phenols, dihydroxybiphenyls, dihydroxynaphthalene, and binaphthols. Residue, Q is an oxyalkylene group having 2 to 4 carbon atoms, X is an alkylene residue of an alkylene dihalide having 1 to 18 carbon atoms, m is an integer of 1 to 30, and n is an integer of 1 to 25.)
【0006】本発明のポリエーテルエステルアミド
(A)を構成する両末端にカルボキシル基を有するポリ
アミド(a1)は、(1)ラクタム開環重合体、(2)
アミノカルボン酸の重縮合体もしくは(3)ジカルボン
酸とジアミンの重縮合体であり、(1)のラクタムとし
ては、カプロラクタム、エナントラクタム、ラウロラク
タム、ウンデカノラクタム等が挙げられる。(2)のア
ミノカルボン酸としては、ω−アミノカプロン酸、ω−
アミノエナント酸、ω−アミノカプリル酸、ω−アミノ
ペルゴン酸、ω−アミノカプリン酸、11−アミノウン
デカン酸、12−アミノドデカン酸等が挙げられる。
(3)のジカルボン酸としては、アジピン酸、アゼライ
ン酸、セバシン酸、ウンデカンジ酸、ドデカンジ酸、イ
ソフタル等酸が挙げられ、またジアミンとしては、ヘキ
サメチレンジアミン、ヘプタメチレンジアミン、オクタ
メチレンジアミン、デカメチレンジアミン等が挙げられ
る。上記アミド形成性モノマーとして例示したものは二
種以上を併用してもよい。これらのうち好ましいもの
は、カプロラクタム、12−アミノドデカン酸およびア
ジピン酸−ヘキサメチレンジアミンであり、特に好まし
いものはカプロラクタムである。The polyamide (a1) having carboxyl groups at both ends constituting the polyether ester amide (A) of the present invention is (1) a lactam ring-opening polymer, (2)
It is a polycondensate of an aminocarboxylic acid or (3) a polycondensate of a dicarboxylic acid and a diamine. Examples of the lactam of (1) include caprolactam, enanthlactam, laurolactam, and undecanolactam. As the aminocarboxylic acid of (2), ω-aminocaproic acid, ω-
Examples thereof include aminoenanthic acid, ω-aminocaprylic acid, ω-aminopergonic acid, ω-aminocapric acid, 11-aminoundecanoic acid and 12-aminododecanoic acid.
Examples of the dicarboxylic acid (3) include adipic acid, azelaic acid, sebacic acid, undecanedioic acid, dodecanedioic acid and isophthalic acid, and examples of the diamine include hexamethylenediamine, heptamethylenediamine, octamethylenediamine and decamethylene. Diamine and the like can be mentioned. Two or more of the amide-forming monomers exemplified above may be used in combination. Among these, preferred are caprolactam, 12-aminododecanoic acid and adipic acid-hexamethylenediamine, and particularly preferred is caprolactam.
【0007】両末端にカルボキシル基を有するポリアミ
ド(a1)は、炭素数4〜20のジカルボン酸を分子量
調整剤として使用し、これの存在下に上記アミド形成性
モノマーを常法により開環重合あるいは重縮合させるこ
とによって得られる。炭素数4〜20のジカルボン酸と
しては、例えばコハク酸、グルタル酸、アジピン酸、ピ
メリン酸、スベリン酸、アゼライン酸、セバシン酸、ウ
ンデカンジ酸、ドデカンジ酸等の脂肪族ジカルボン酸;
テレフタル酸、イソフタル酸、フタル酸、ナフタレンジ
カルボン酸等の芳香族ジカルボン酸;1,4−シクロヘ
キサンジカルボン酸、ジシクロヘキシル−4,4−ジカ
ルボン酸等の脂環族ジカルボン酸;3−スルホイソフタ
ル酸ナトリウム、3−スルホイソフタル酸カリウム等の
3−スルホイソフタル酸アルカリ金属塩;およびこれら
の二種以上の混合物が挙げられる。これらのうち好まし
いものは脂肪族ジカルボン酸、芳香族ジカルボン酸およ
び3−スルホイソフタル酸アルカリ金属塩であり、特に
好ましいものはアジピン酸、セバシン酸、テレフタル
酸、イソフタル酸および3−スルホイソフタル酸ナトリ
ウムである。The polyamide (a1) having a carboxyl group at both ends uses a dicarboxylic acid having 4 to 20 carbon atoms as a molecular weight regulator, and in the presence of this, the above amide-forming monomer is subjected to ring-opening polymerization or a conventional method. Obtained by polycondensation. Examples of the dicarboxylic acid having 4 to 20 carbon atoms include aliphatic dicarboxylic acids such as succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, undecanedioic acid and dodecanedioic acid;
Aromatic dicarboxylic acids such as terephthalic acid, isophthalic acid, phthalic acid and naphthalenedicarboxylic acid; alicyclic dicarboxylic acids such as 1,4-cyclohexanedicarboxylic acid and dicyclohexyl-4,4-dicarboxylic acid; sodium 3-sulfoisophthalate 3-sulfoisophthalic acid alkali metal salts such as potassium 3-sulfoisophthalate; and mixtures of two or more thereof. Among these, preferred are aliphatic dicarboxylic acids, aromatic dicarboxylic acids and alkali metal salts of 3-sulfoisophthalic acid, and particularly preferred are adipic acid, sebacic acid, terephthalic acid, isophthalic acid and sodium 3-sulfoisophthalate. is there.
【0008】上記(a1)の数平均分子量は、通常50
0〜5,000、好ましくは500〜3,000であ
る。数平均分子量が500未満ではポリエーテルエステ
ルアミド自体の耐熱性が低下し、5,000を超えると
反応性が低下するためポリエーテルエステルアミド製造
時に多大な時間を要する。The number average molecular weight of the above (a1) is usually 50.
It is 0 to 5,000, preferably 500 to 3,000. When the number average molecular weight is less than 500, the heat resistance of the polyether ester amide itself is lowered, and when it exceeds 5,000, the reactivity is lowered, so that a large amount of time is required for producing the polyether ester amide.
【0009】芳香環含有ポリエーテル(a2)は前記一
般式(1)で示される化合物であり、該式(1)におい
て、Zは二価フェノール類(b1)の残基、Qは炭素数
2〜4のアルキレンオキサイド(b2)由来のオキシア
ルキレン基、Xは多官能ハロゲン化合物(c2)の残基
である。The aromatic ring-containing polyether (a2) is a compound represented by the above general formula (1), in which Z is the residue of the dihydric phenol (b1) and Q is 2 carbon atoms. To oxyalkylene group derived from alkylene oxide (b2), X is a residue of the polyfunctional halogen compound (c2).
【0010】二価フェノール類(b1)としては、ハイ
ドロキノン、カテコール、レゾルシン、オルシン、ウル
シオールなどの単環フェノール類;ビスフェノールA
(4,4’−ジヒドロキシジフェニル−2,2−プロパ
ン)、ビスフェノールF(4,4’−ジヒドロキシジフ
ェニルメタン)、ビスフェノールS(4,4’−ジヒド
ロキシジフェニルスルホン)、4,4’−ジヒドロキシ
ジフェニル−2,2−ブタンなどのビスフェノール類;
ジヒドロキシビフェニル類;ジヒドロキシナフタレン
類、ビナフトール類などのナフタレン核を有するもの等
が挙げられる。これらのうち好ましいものはビスフェノ
ール類であり、特に好ましいものはビスフェノールAで
ある。As the dihydric phenols (b1), monocyclic phenols such as hydroquinone, catechol, resorcin, orcin and urushiol; bisphenol A
(4,4'-dihydroxydiphenyl-2,2-propane), bisphenol F (4,4'-dihydroxydiphenylmethane), bisphenol S (4,4'-dihydroxydiphenylsulfone), 4,4'-dihydroxydiphenyl-2. , Bisphenols such as 2-butane;
Dihydroxybiphenyls; those having a naphthalene nucleus such as dihydroxynaphthalene and binaphthol, and the like. Among these, bisphenols are preferable, and bisphenol A is particularly preferable.
【0011】アルキレンオキサイド(b2)としては、
例えばエチレンオキサイド、プロピレンオキサイド、
1,2−もしくは1,4−ブチレンオキサイドおよびこ
れらの二種以上の混合物が挙げられる。これらのうち好
ましいものはエチレンオキサイドである。As the alkylene oxide (b2),
For example, ethylene oxide, propylene oxide,
1,2- or 1,4-butylene oxide and mixtures of two or more thereof are mentioned. Of these, preferred is ethylene oxide.
【0012】本発明における芳香環含有ポリエーテル
(a2)を構成する芳香環含有ポリエーテルジオール
(c1)は、上記(b1)に(b2)を公知の方法、例
えばアルカリ触媒存在下、100〜200℃の温度で付
加反応させることにより製造することができる。(b
2)の付加モル数は通常1〜30モル、好ましくは各2
〜20モルである。The aromatic ring-containing polyether diol (c1) constituting the aromatic ring-containing polyether (a2) in the present invention can be prepared by subjecting (b1) to (b2) to a known method such as 100 to 200 in the presence of an alkali catalyst. It can be produced by addition reaction at a temperature of ° C. (B
The addition mole number of 2) is usually 1 to 30 moles, and preferably 2 for each.
~ 20 moles.
【0013】多官能ハロゲン化合物(c2)としては、
多ハロゲン化脂肪族炭化水素類、多ハロゲン化芳香族環
含有炭化水素類、多ハロゲン化エーテル類、多ハロゲン
化ケトン類などが挙げられる。As the polyfunctional halogen compound (c2),
Examples thereof include polyhalogenated aliphatic hydrocarbons, polyhalogenated aromatic ring-containing hydrocarbons, polyhalogenated ethers, and polyhalogenated ketones.
【0014】多ハロゲン化脂肪族炭化水素類としては、
塩化メチレン、臭化メチレン、ヨウ化メチレン、モノブ
ロモモノクロロメタンなどのメチレンジハライド;1,
1−ジクロロエタン、1,2−ジクロロエタンなどのア
ルキレンジハライド;その他クロロホルム、四塩化炭素
などが挙げられる。The polyhalogenated aliphatic hydrocarbons include
Methylene dihalides such as methylene chloride, methylene bromide, methylene iodide and monobromomonochloromethane; 1,
Examples include alkylene dihalides such as 1-dichloroethane and 1,2-dichloroethane; and chloroform and carbon tetrachloride.
【0015】多ハロゲン化芳香族環含有炭化水素類とし
ては、塩化ベンザル、臭化ベンザル、ビス(クロロメチ
ル)ベンゼンなどが挙げられる。多ハロゲン化エーテル
類としては、ビス(クロロメチル)エーテル、2,2’
−ジクロロエチルエーテルなどの多ハロゲン化脂肪族エ
ーテル類;4,4’−ビス(クロロメチル)ジフェニル
エーテルなどの多ハロゲン化芳香族エーテル類;ビス
(クロロメトキシ)ベンゼン、トリス(クロロメトキ
シ)ベンゼンなどの多ハロゲン化芳香脂肪族エーテル類
が挙げられる。多ハロゲン化ケトン類としては、ビス
(クロロメチル)ケトン、ビス(クロロメトキシ)ベン
ゼンなどが挙げられる。その他、ビス(クロロメチル)
ホルマールなどの多ハロゲン化アルコール類、ジクロロ
塩化アセチル酸クロライドなどの酸ハライド、ホスゲン
などが挙げられる。The polyhalogenated aromatic ring-containing hydrocarbons include benzal chloride, benzal bromide, bis (chloromethyl) benzene and the like. Polyhalogenated ethers include bis (chloromethyl) ether and 2,2 '
-Polyhalogenated aliphatic ethers such as dichloroethyl ether; polyhalogenated aromatic ethers such as 4,4'-bis (chloromethyl) diphenyl ether; bis (chloromethoxy) benzene, tris (chloromethoxy) benzene and the like Examples include polyhalogenated araliphatic ethers. Examples of polyhalogenated ketones include bis (chloromethyl) ketone and bis (chloromethoxy) benzene. Others, bis (chloromethyl)
Examples thereof include polyhalogenated alcohols such as formal, acid halides such as dichlorochloroacetyl chloride, and phosgene.
【0016】これらは単独でも2種以上併用してもよ
い。これらのうち好ましいものは多ハロゲン化脂肪族炭
化水素類、多ハロゲン化芳香族環含有炭化水素類および
多ハロゲン化エーテル類であり、とくに好ましいものは
多ハロゲン化脂肪族炭化水素類のうちのメチレンジハラ
イド(塩化メチレン、臭化メチレン、ヨウ化メチレンお
よびブロモクロロメタン)である。These may be used alone or in combination of two or more kinds. Of these, preferred are polyhalogenated aliphatic hydrocarbons, polyhalogenated aromatic ring-containing hydrocarbons and polyhalogenated ethers, and particularly preferred are methylenes among polyhalogenated aliphatic hydrocarbons. Dihalides (methylene chloride, methylene bromide, methylene iodide and bromochloromethane).
【0017】(a2)の製法はとくに限定されないが、
通常、(c1)と(c2)をアルカリ金属化合物(c
3)の存在下で40℃〜150℃の温度で反応させる方
法で製造することができる。アルカリ金属化合物(c
3)としては、水酸化ナトリウム、水酸化カリウム等の
苛性アルカリ;ナトリウムメチラート、ナトリウムエチ
ラート等の低級アルコールの金属アルコラートなどが挙
げられる。The manufacturing method of (a2) is not particularly limited,
Usually, (c1) and (c2) are replaced with an alkali metal compound (c
It can be produced by a method of reacting in the presence of 3) at a temperature of 40 ° C to 150 ° C. Alkali metal compound (c
Examples of 3) include caustic alkalis such as sodium hydroxide and potassium hydroxide; metal alcoholates of lower alcohols such as sodium methylate and sodium ethylate.
【0018】該(a2)の数平均分子量は、通常500
〜5,000、好ましくは500〜3,000である。
500未満では帯電防止性が不十分となり、5,000
を超えると反応性が低下するためポリエーテルエステル
アミド製造時に多大な時間を要する。The number average molecular weight of (a2) is usually 500.
˜5,000, preferably 500 to 3,000.
If it is less than 500, the antistatic property becomes insufficient, and 5,000
If it exceeds the range, the reactivity is lowered, so that a great amount of time is required at the time of producing the polyetheresteramide.
【0019】本発明のポリエーテルエステルアミド
(A)を構成する(a2)の使用量は、前記(a1)と
(a2)の合計重量に基づいて通常20〜80重量%、
好ましくは25〜75重量%の範囲である。(a2)の
量が20%未満では(A)の帯電防止性が劣り、80重
量%を超えると(A)の耐熱性が低下するために好まし
くない。また、必要により(a2)と共にポリアルキレ
ンオキシド(ポリエチレンオキシド等)や芳香環含有ポ
リエーテルジオール(c1)を併用してもよい。これら
を併用する場合の使用量は特に制限はないが、耐熱性の
観点から、(a2)に対してそれぞれ通常30重量%以
下である。The amount of (a2) constituting the polyether ester amide (A) of the present invention is usually 20 to 80% by weight based on the total weight of (a1) and (a2),
It is preferably in the range of 25 to 75% by weight. If the amount of (a2) is less than 20%, the antistatic property of (A) will be poor, and if it exceeds 80% by weight, the heat resistance of (A) will be reduced, such being undesirable. If necessary, a polyalkylene oxide (polyethylene oxide or the like) or an aromatic ring-containing polyether diol (c1) may be used together with (a2). When used in combination, the amount used is not particularly limited, but is usually 30% by weight or less with respect to (a2) from the viewpoint of heat resistance.
【0020】(A)の製法は特に限定されるものではな
いが、例えば下記製法または製法を例示することが
できる。 製法:アミド形成性モノマーおよびジカルボン酸を反
応させて(a1)を形成せしめ、これに(a2)を加え
て、高温、減圧下で重合反応を行う方法。 製法:アミド形成性モノマーおよびジカルボン酸と
(a2)を同時に反応槽に仕込み、水の存在下または非
存在下に、高温で加圧反応させることによって中間体と
して(a1)を生成させ、その後減圧下で(a1)と
(a2)との重合反応を行う方法。The production method of (A) is not particularly limited, but the following production method or production method can be exemplified. Production method: A method of reacting an amide-forming monomer and a dicarboxylic acid to form (a1), adding (a2) thereto, and performing a polymerization reaction at high temperature and reduced pressure. Production method: An amide-forming monomer and a dicarboxylic acid and (a2) are simultaneously charged into a reaction vessel, and pressure reaction is performed at high temperature in the presence or absence of water to produce (a1) as an intermediate, and then decompression. A method of performing a polymerization reaction of (a1) and (a2) below.
【0021】上記の重合反応には、通常、公知のエステ
ル化触媒が使用される。該触媒としては、例えば三酸化
アンチモンなどのアンチモン系触媒、モノブチルスズオ
キシドなどのスズ系触媒、テトラブチルチタネートなど
のチタン系触媒;テトラブチルジルコネートなどのジル
コニウム系触媒;酢酸ジルコニル、酢酸亜鉛などの有機
酸金属塩系触媒などが挙げられる。触媒の使用量は、
(a1)と(a2)の合計重量に対して通常0.1〜5
重量%である。In the above polymerization reaction, a known esterification catalyst is usually used. Examples of the catalyst include antimony catalysts such as antimony trioxide, tin catalysts such as monobutyltin oxide, titanium catalysts such as tetrabutyl titanate; zirconium catalysts such as tetrabutyl zirconate; zirconyl acetate and zinc acetate. Examples thereof include organic acid metal salt-based catalysts. The amount of catalyst used is
It is usually 0.1 to 5 relative to the total weight of (a1) and (a2).
% By weight.
【0022】(A)の相対粘度(0.5重量%m−クレ
ゾール溶液、25℃)は、通常1.2〜3.0、好まし
くは1.3〜2.5である。相対粘度が1.2未満では
耐熱性が悪く、3.0を超えると成形性が低下する。The relative viscosity of (A) (0.5 wt% m-cresol solution, 25 ° C.) is usually 1.2 to 3.0, preferably 1.3 to 2.5. When the relative viscosity is less than 1.2, the heat resistance is poor, and when it exceeds 3.0, the moldability is deteriorated.
【0023】本発明の樹脂組成物において熱可塑性樹脂
(B)としては、スチレン類、(メタ)アクリル酸エス
テル、(メタ)アクリロニトリル、ブタジエンからなる
群より選ばれる少なくとも一種を構成単位とする(共)
重合体(ポリスチレン、スチレン/アクリロニトリル共
重合体、アクリロニトリル/ブタジエン/スチレン共重
合体、メタクリル酸メチル/ブタジエン/スチレン共重
合体、メタクリル酸メチル/メタクリル酸エチル/ブタ
ジエン/スチレン共重合体およびスチレン/メタクリル
酸メチル/アクリロニトリル共重合体等);ポリプロピ
レン、ポリエチレン等のポリオレフィン系樹脂;ポリエ
チレンテレフテレート(PET樹脂)、ポリブチレンテ
レフテレート(PBT樹脂)等のポリエステル系樹脂;
ポリカーボネート樹脂;アクリル樹脂;熱可塑性ポリウ
レタン樹脂;ポリ塩化ビニル樹脂等が挙げられる。これ
らのうち好ましいものは、ポリスチレン、ポリメタクリ
ル酸メチル、スチレン/アクリロニトリル共重合体、ア
クリロニトリル/ブタジエン/スチレン共重合体、メタ
クリル酸メチル/ブタジエン/スチレン共重合体、スチ
レン/メタクリル酸メチル/アクリロニトリル共重合
体、ポリプロピレン、ポリエチレン、PET樹脂および
PBT樹脂である。In the resin composition of the present invention, the thermoplastic resin (B) contains at least one selected from the group consisting of styrenes, (meth) acrylic acid esters, (meth) acrylonitrile, and butadiene as a structural unit (copolymer). )
Polymer (polystyrene, styrene / acrylonitrile copolymer, acrylonitrile / butadiene / styrene copolymer, methyl methacrylate / butadiene / styrene copolymer, methyl methacrylate / ethyl methacrylate / butadiene / styrene copolymer and styrene / methacryl Methyl acid / acrylonitrile copolymer, etc.); Polyolefin resins such as polypropylene and polyethylene; Polyester resins such as polyethylene terephthalate (PET resin) and polybutylene terephthalate (PBT resin);
Polycarbonate resin; acrylic resin; thermoplastic polyurethane resin; polyvinyl chloride resin and the like. Of these, preferred are polystyrene, polymethylmethacrylate, styrene / acrylonitrile copolymer, acrylonitrile / butadiene / styrene copolymer, methyl methacrylate / butadiene / styrene copolymer, styrene / methyl methacrylate / acrylonitrile copolymer. Coalesced, polypropylene, polyethylene, PET resin and PBT resin.
【0024】本発明の樹脂組成物において、(A)と
(B)の重量比は、通常(5〜40):(95〜6
0)、好ましくは(10〜35):(90〜65)であ
る。(A)の比率が5未満では帯電防止効果が不十分と
なり、40を超えると樹脂物性を阻害することがある。In the resin composition of the present invention, the weight ratio of (A) and (B) is usually (5-40) :( 95-6).
0), preferably (10-35) :( 90-65). If the ratio of (A) is less than 5, the antistatic effect becomes insufficient, and if it exceeds 40, the physical properties of the resin may be impaired.
【0025】本発明の樹脂組成物において、(A)と
(B)の相溶性を更に向上させる目的で、相溶化剤
(C)を含有させてもよい。該相溶化剤(C)として
は、特開平3−258850号公報、特願平5−856
16号等に記載のカルボキシル基、エポキシ基、アミノ
基、ヒドロキシル基、ポリアルキレンオキシド基、スル
ホン酸基およびそれらの誘導体よりなる群から選ばれた
少なくとも一種の官能基を有する変性ビニル系重合体
(C1);特願平3−321308号等に記載の変性低
分子量ポリオレフィン(C2);および特開平2−19
9129号公報、特願平5−85616号等に記載のポ
リオレフィン部分と芳香族ビニル系重合体部分を有する
ブロック重合体(C3)等が挙げられる。これらは単独
でも二種以上を併用してもよい。The resin composition of the present invention may contain a compatibilizing agent (C) for the purpose of further improving the compatibility between (A) and (B). Examples of the compatibilizer (C) include JP-A-3-258850 and Japanese Patent Application No. 5-856.
No. 16, etc., a modified vinyl polymer having at least one functional group selected from the group consisting of a carboxyl group, an epoxy group, an amino group, a hydroxyl group, a polyalkylene oxide group, a sulfonic acid group and derivatives thereof ( C1); modified low molecular weight polyolefin (C2) described in Japanese Patent Application No. 3-321308, etc .;
Examples thereof include block polymers (C3) having a polyolefin moiety and an aromatic vinyl polymer moiety described in Japanese Patent Application No. 9129 and Japanese Patent Application No. 5-85616. These may be used alone or in combination of two or more.
【0026】これらのうち、(B)がスチレン類、(メ
タ)アクリル酸エステル、(メタ)アクリロニトリル、
ブタジエンからなる群より選ばれる少なくとも1種を構
成単位とする(共)重合体の場合の(C)としては、
(C1)(例えば、スチレン/アクリロニトリル/無水
マレイン酸共重合体、アクリロニトリル/ブタジエン/
スチレン/アクリル酸共重合体、スチレン/メタクリル
酸グリシジル/メタクリル酸メチル共重合体など)が好
ましい。(B)がポリオレフィン系樹脂の場合の(C)
としては、(C2)(例えば、数平均分子量が1,00
0〜25,000の無水マレイン酸変性低分子量ポリプ
ロピレンなど)および(C3)(例えば、数平均分子量
が1,000〜25,000のポリプロピレン/ポリス
チレンブロック重合体など)が好ましい。Of these, (B) is styrene, (meth) acrylic acid ester, (meth) acrylonitrile,
(C) in the case of a (co) polymer having a constitutional unit of at least one selected from the group consisting of butadiene,
(C1) (for example, styrene / acrylonitrile / maleic anhydride copolymer, acrylonitrile / butadiene /
Styrene / acrylic acid copolymer, styrene / glycidyl methacrylate / methyl methacrylate copolymer, etc.) are preferred. (C) when (B) is a polyolefin resin
(C2) (for example, the number average molecular weight is 1,00
Maleic anhydride modified low molecular weight polypropylene of 0 to 25,000 and (C3) (for example, polypropylene / polystyrene block polymer having a number average molecular weight of 1,000 to 25,000) are preferable.
【0027】(C)を含有させる場合の(C)の量は、
(A)と(B)の合計重量に対して通常0.1〜15重
量%、好ましくは1〜10重量%である。(C)の量が
0.1重量%未満では十分な相溶性向上効果が発現せ
ず、15重量%を超えると樹脂物性を阻害する。When (C) is contained, the amount of (C) is
It is usually 0.1 to 15% by weight, preferably 1 to 10% by weight, based on the total weight of (A) and (B). If the amount of (C) is less than 0.1% by weight, the effect of improving compatibility is not sufficiently exhibited, and if it exceeds 15% by weight, the physical properties of the resin are impaired.
【0028】また、帯電防止効果を更に向上させる目的
で、アルカリ金属および/またはアルカリ土類金属のハ
ロゲン化物からなる金属塩(D)を含有させてもよい。
該(D)としては、塩化リチウム、塩化ナトリウム、塩
化カリウム、塩化マグネシウム、塩化カルシウム、臭化
ナトリウム、臭化カリウム、臭化マグネシウムなどを挙
げることができる。これらのうち特に好ましいものは、
塩化ナトリウムおよび塩化カリウムである。Further, for the purpose of further improving the antistatic effect, a metal salt (D) comprising a halide of an alkali metal and / or an alkaline earth metal may be contained.
Examples of the (D) include lithium chloride, sodium chloride, potassium chloride, magnesium chloride, calcium chloride, sodium bromide, potassium bromide, magnesium bromide and the like. Of these, particularly preferred are:
Sodium chloride and potassium chloride.
【0029】(D)の使用量は、(A)、(B)および
(C)の合計重量に対して通常0.01〜5重量%、好
ましくは0.05〜3重量%である。(D)の量が0.
01重量%未満では効果が発現せず、5重量%を超える
と樹脂表面に析出し樹脂成形物の外観を損ねる。The amount of (D) used is usually 0.01 to 5% by weight, preferably 0.05 to 3% by weight, based on the total weight of (A), (B) and (C). The amount of (D) is 0.
If it is less than 01% by weight, the effect is not exhibited, and if it exceeds 5% by weight, it is deposited on the resin surface and the appearance of the resin molded product is impaired.
【0030】(D)を添加する方法については特に限定
はないが、組成物中へ効果的に分散させるためには、ポ
リエーテルエステルアミド(A)中に予め分散させてお
くことが好ましい。(A)中へ(D)を分散させる場
合、(A)の重合時に(D)を添加し分散させる方法が
特に好ましい。The method of adding (D) is not particularly limited, but in order to effectively disperse it in the composition, it is preferable to disperse it in the polyether ester amide (A) in advance. When (D) is dispersed in (A), a method of adding (D) and dispersing it during the polymerization of (A) is particularly preferable.
【0031】本発明の樹脂組成物に非イオン性、アニオ
ン性、カチオン性もしくは両性の界面活性剤(E)を含
有させ、帯電防止性を一層向上させてもよい。非イオン
性界面活性剤としては、高級アルコールエチレンオキサ
イド付加物、脂肪酸エチレンオキサイド付加物、高級ア
ルキルアミンエチレンオキサイド付加物、ポリプロピレ
ングリコールエチレンオキサイド付加物等のポリエチレ
ングリコール型非イオン界面活性剤、ポリエチレンオキ
サイド、グリセリンの脂肪酸エステル、ペンタエリスリ
ットの脂肪酸エステル、ソルビットおよびソルビタンの
脂肪酸エステル、多価アルコールのアルキルエーテル、
アルカノールアミン類の脂肪族アミド等の多価アルコー
ル型非イオン界面活性剤などが挙げられる。アニオン性
界面活性剤としては、高級脂肪酸のアルカリ金属塩等の
カルボン酸塩類、高級アルコール硫酸エステル塩、高級
アルキルエーテル硫酸エステル塩等の硫酸エステル塩
類、アルキルベンゼンスルホン酸塩、アルキルスルホン
酸塩、パラフィンスルホン酸塩等のスルホン酸塩類、高
級アルコールリン酸エステル塩等のリン酸エステル塩類
などが挙げられる。カチオン性界面活性剤としては、ア
ルキルトリメチルアンモニウム塩等の第4級アンモニウ
ム塩類などが挙げられる。両性界面活性剤としては、高
級アルキルアミノプロピオン酸塩等のアミノ酸型両性界
面活性剤、高級アルキルジメチルベタイン、高級アルキ
ルジヒドロキシエチルベタイン等のベタイン型両性界面
活性剤などがが挙げられる。これらは単独でも2種以上
を併用してもよい。これらのうち好ましいものはアニオ
ン性界面活性剤であり、特に好ましいものはアルキルベ
ンゼンスルホン酸塩、アルキルスルホン酸塩、パラフィ
ンスルホン酸塩等のスルホン酸塩類である。The resin composition of the present invention may contain a nonionic, anionic, cationic or amphoteric surfactant (E) to further improve the antistatic property. As the nonionic surfactant, higher alcohol ethylene oxide adduct, fatty acid ethylene oxide adduct, higher alkylamine ethylene oxide adduct, polyethylene glycol type nonionic surfactant such as polypropylene glycol ethylene oxide adduct, polyethylene oxide, Glycerin fatty acid ester, pentaerythritol fatty acid ester, sorbit and sorbitan fatty acid ester, polyhydric alcohol alkyl ether,
Examples thereof include polyhydric alcohol type nonionic surfactants such as aliphatic amides of alkanolamines. Examples of the anionic surfactant include carboxylic acid salts such as alkali metal salts of higher fatty acids, sulfuric acid ester salts such as higher alcohol sulfuric acid ester salts and higher alkyl ether sulfuric acid ester salts, alkylbenzene sulfonates, alkyl sulfonates, paraffin sulfone. Examples thereof include sulfonates such as acid salts, and phosphate ester salts such as higher alcohol phosphate ester salts. Examples of the cationic surfactant include quaternary ammonium salts such as alkyl trimethyl ammonium salt. Examples of the amphoteric surfactant include amino acid-type amphoteric surfactants such as higher alkylaminopropionate and betaine-type amphoteric surfactants such as higher alkyldimethylbetaine and higher alkyldihydroxyethylbetaine. These may be used alone or in combination of two or more. Of these, preferred are anionic surfactants, and particularly preferred are sulfonates such as alkylbenzene sulfonate, alkyl sulfonate, and paraffin sulfonate.
【0032】(E)の使用量は、(A)、(B)および
(C)の合計重量に対して通常0.1〜5重量%、好ま
しくは0.4〜3重量%である。(E)の量が0.1重
量%未満では効果が発現せず、5重量%を超えると樹脂
表面に析出し樹脂の外観を損ねたり、樹脂物性が阻害さ
れたりするので好ましくない。The amount of (E) used is usually 0.1 to 5% by weight, preferably 0.4 to 3% by weight, based on the total weight of (A), (B) and (C). If the amount of (E) is less than 0.1% by weight, the effect is not exhibited, and if it exceeds 5% by weight, it is deposited on the surface of the resin to impair the appearance of the resin and the physical properties of the resin are impaired, which is not preferable.
【0033】(E)を添加する方法についても特に限定
はないが、組成物中へ効果的に分散させるためには、
(A)中または(B)中に予め分散させておくことが好
ましい。The method of adding (E) is not particularly limited, but in order to effectively disperse it in the composition,
It is preferable to disperse in (A) or (B) in advance.
【0034】本発明の樹脂組成物は、公知の各種混合機
を用いて上記成分を混練することによって得ることがで
きる。混合機としては、例えば押し出し機、ブラベンダ
ー、ニーダーおよびバンバリーミキサーが挙げられる。The resin composition of the present invention can be obtained by kneading the above components using various known mixers. Mixers include, for example, extruders, Brabenders, kneaders and Banbury mixers.
【0035】混練時の各成分の添加順序については特に
限定はないが、例えば、(A)〜(C)を一括ブレン
ド混練する方法、少量の(B)と、(A)および
(C)をブレンド混練した後、残りの(B)を混練する
方法、(A)と(C)とを予めブレンド混練した後
(B)を混練する方法等が挙げられる。上記および
の方法はマスターバッチまたはマスターペレットと呼ば
れる方法である。これらのうちでは、分散性が良く、永
久帯電防止性と機械的強度により優れる樹脂が得られる
の方法が特に好ましい。The order of addition of the respective components at the time of kneading is not particularly limited, but for example, a method of blending and kneading (A) to (C) at once, and a small amount of (B) and (A) and (C). Examples include a method of kneading the remaining (B) after blending and kneading, a method of previously blending and kneading (A) and (C), and then kneading (B). The above methods and are methods called master batch or master pellet. Among these, the method of obtaining a resin having good dispersibility and being excellent in permanent antistatic property and mechanical strength is particularly preferable.
【0036】マスターバッチを経由して本発明の組成物
を得る方法としては、例えば、(A)40〜90重量
部、(B)50〜10重量部および(C)0〜30重量
部をブレンド混練してマスターバッチとなし、このマス
ターバッチとさらに(B)とをブレンド混練し、本発明
の組成物を得る方法が挙げられる。この方法は、大量の
(B)中に少量の(A)を均一に分散させることが出来
るので、本発明の樹脂組成物の製法として特に好まし
い。As a method for obtaining the composition of the present invention via a masterbatch, for example, (A) 40 to 90 parts by weight, (B) 50 to 10 parts by weight and (C) 0 to 30 parts by weight are blended. Examples thereof include a method of kneading to form a masterbatch, and the masterbatch and (B) are blended and kneaded to obtain the composition of the present invention. This method is particularly preferable as a method for producing the resin composition of the present invention, since a small amount of (A) can be uniformly dispersed in a large amount of (B).
【0037】また本発明の樹脂組成物には種々の用途に
応じ、必要により該組成物の特性を阻害しない範囲で公
知の他の樹脂用添加剤を任意に添加することができる。
該添加剤としては、顔料、染料、充填剤、核剤、ガラス
繊維、滑剤、可塑剤、離型剤、酸化防止剤、難燃剤、紫
外線吸収剤等が挙げられる。According to various uses, other known additives for resins can be optionally added to the resin composition of the present invention as long as the characteristics of the composition are not impaired.
Examples of the additives include pigments, dyes, fillers, nucleating agents, glass fibers, lubricants, plasticizers, release agents, antioxidants, flame retardants, and ultraviolet absorbers.
【0038】[0038]
【実施例】以下、実施例により本発明をさらに説明する
が、本発明はこれに限定されるものではない。実施例中
の「部」は重量部、「%」は重量%を示す。なお最終的
に得られた樹脂組成物は射出成形法によって成形した
後、下記の試験法により諸物性を測定した。EXAMPLES The present invention will be further described below with reference to examples, but the present invention is not limited thereto. In the examples, "part" means part by weight and "%" means% by weight. The finally obtained resin composition was molded by an injection molding method, and then various physical properties were measured by the following test methods.
【0039】表面固有抵抗値 :厚さ2mmの角試験片
を用い、超絶縁計(アドバンテスト製)
により20℃、湿度65%RH雰囲気下で測定し
た。 アイゾット衝撃強度:ASTM D256−56Aに準
拠。 引張強度 :ASTM D638に準拠。 熱減量開始温度 :窒素下TG−DTAによって測定し
た(耐熱性の指標)。Surface specific resistance value: A super insulation meter (manufactured by Advantest) using a square test piece having a thickness of 2 mm.
Was measured in an atmosphere of 20 ° C. and a humidity of 65% RH. Izod impact strength: According to ASTM D256-56A. Tensile strength: According to ASTM D638. Thermal loss onset temperature: Measured by TG-DTA under nitrogen (heat resistance index).
【0040】[芳香環含有ポリエーテル(a2)の製
造] 製造例1 ビスフェノールA341部にエチレンオキサイド659
部を水酸化カリウム触媒の存在下に反応させて、数平均
分子量668、水酸基価168(mgKOH/g、以下
同様)の芳香環含有ポリエーテルジオールを得た。この
芳香環含有ポリエーテルジオール500部及びナトリウ
ムメチラート25%メタノール溶液170部を密閉容器
に仕込み、攪拌下120℃で減圧下にメタノールを溜去
しアルコラート化を行った。次いで塩化メチレン40部
を約30分かけて投入し、100℃で約3時間反応させ
た。この反応物をトルエン500部にて希釈し、塩化ナ
トリウムを濾別し、減圧下で揮発分を除去することによ
り精製した。このようにして粘稠な液状のポリエーテル
460部(a−1)を得た。このポリエーテルの水酸基
価は84、数平均分子量は1335であった。[Production of aromatic ring-containing polyether (a2)] Production Example 1 341 parts of bisphenol A and ethylene oxide 659
A part was reacted in the presence of a potassium hydroxide catalyst to obtain an aromatic ring-containing polyether diol having a number average molecular weight of 668 and a hydroxyl value of 168 (mgKOH / g, the same hereinafter). 500 parts of this aromatic ring-containing polyether diol and 170 parts of a 25% sodium methylate methanol solution were placed in a closed container, and methanol was distilled off under reduced pressure at 120 ° C. with stirring to perform alcoholation. Then, 40 parts of methylene chloride was added over about 30 minutes, and the reaction was carried out at 100 ° C. for about 3 hours. The reaction product was diluted with 500 parts of toluene, sodium chloride was filtered off, and the volatile matter was removed under reduced pressure for purification. Thus, 460 parts (a-1) of a viscous liquid polyether was obtained. The hydroxyl value of this polyether was 84, and the number average molecular weight was 1335.
【0041】製造例2 ビスフェノールA564部にエチレンオキサイド436
部を水酸化カリウム触媒の存在下に反応させて、数平均
分子量404、水酸基価278の芳香環含有ポリエーテ
ルジオールを得た。この芳香環含有ポリエーテルジオー
ル500部及びナトリウムメチラート25%メタノール
溶液377部を密閉容器に仕込み、攪拌下120℃で減
圧下メタノールを留去しアルコラート化を行った。次い
で臭化メチレン167部を約60分かけて投入し、10
0℃で約2時間反応させた。この反応物をトルエン50
0部にて希釈し、臭化ナトリウムを濾別し、減圧下で揮
発分を除去することにより精製した。このようにして粘
稠な液状のポリエーテル約450部(a−2)を得た。
このポリエーテルの水酸基価は82、数平均分子量は1
370であった。Production Example 2 564 parts of bisphenol A and ethylene oxide 436
Parts were reacted in the presence of a potassium hydroxide catalyst to obtain an aromatic ring-containing polyether diol having a number average molecular weight of 404 and a hydroxyl value of 278. 500 parts of this aromatic ring-containing polyether diol and 377 parts of a 25% sodium methylate methanol solution were placed in a closed container, and methanol was distilled off under reduced pressure at 120 ° C. under stirring to perform alcoholation. Then, 167 parts of methylene bromide was added over about 60 minutes and 10
The reaction was carried out at 0 ° C for about 2 hours. This reaction product was mixed with toluene 50
Diluted with 0 parts, filtered off sodium bromide and purified by removing volatiles under reduced pressure. Thus, about 450 parts (a-2) of a viscous liquid polyether was obtained.
This polyether has a hydroxyl value of 82 and a number average molecular weight of 1
It was 370.
【0042】[ポリエーテルエステルアミド(A)の製
造] 製造例3 3Lステンレス製オートクレーブに、ε−カプロラクタ
ム105部、アジピン酸17.1部、「イルガノックス
1010」(酸化防止剤;チバガイキー社製)0.3部
および水6部を仕込み、窒素置換後、220℃で加圧密
閉下4時間加熱攪拌し、両末端にカルボキシル基を有す
る酸価110(mgKOH/g、以下同様)のポリアミ
ドオリゴマー117部を得た。次いで製造例1で得た
(a−1)153部、酢酸ジルコニル0.5部および塩
化カリウム0.1部を加え、245℃、1mmHg以下
の減圧下の条件で5時間重合し、粘稠なポリマーを得
た。このポリマーをベルト上にストランド状で取り出
し、ペレタイズすることによってポリエーテルエステル
アミドを得た。このものの相対粘度は2.15(0.5
重量%m−クレゾール溶液、25℃、以下同様)であっ
た。このポリエーテルエステルアミドを以下[A−1]
と略記する。[Production of Polyether Esteramide (A)] Production Example 3 105 parts of ε-caprolactam, 17.1 parts of adipic acid and "Irganox 1010"(antioxidant; manufactured by Ciba-Gaiki) in a 3 L stainless steel autoclave. After charging 0.3 part and 6 parts of water, the mixture was replaced with nitrogen, and the mixture was heated and stirred at 220 ° C. under pressure and sealing for 4 hours, and a polyamide oligomer 117 having a carboxyl group at both ends and an acid value of 110 (mgKOH / g, the same applies hereinafter). I got a part. Next, 153 parts of (a-1) obtained in Production Example 1, 0.5 part of zirconyl acetate and 0.1 part of potassium chloride were added, and the mixture was polymerized at 245 ° C. under a reduced pressure of 1 mmHg or less for 5 hours to give a viscous product. A polymer was obtained. This polymer was taken out in a strand form on a belt and pelletized to obtain a polyether ester amide. The relative viscosity of this product is 2.15 (0.5
Wt% m-cresol solution, 25 ° C., the same below). This polyether ester amide is referred to below as [A-1]
Abbreviated.
【0043】製造例4 3Lステンレス製オートクレーブに、ε−カプロラクタ
ム105部、アジピン酸17.1部、「イルガノックス
1010」0.3部および水6部を仕込み、窒素置換
後、220℃で加圧密閉下4時間加熱攪拌し、両末端に
カルボキシル基を有する酸価110のポリアミドオリゴ
マーを117部得た。次いで製造例2で得た(a−2)
142部、数平均分子量1,500のポリオキシエチレ
ングリコール16部および酢酸ジルコニル0.5部を加
え、245℃、1mmHg以下の減圧下の条件で5時間
重合し、粘稠なポリマーを得た。このポリマーをベルト
上にストランド状で取り出し、ペレタイズすることによ
ってポリエーテルエステルアミドを得た。このものの相
対粘度は2.10であった。このポリエーテルエステル
アミドを以下[A−1]と略記する。Production Example 4 105 parts of ε-caprolactam, 17.1 parts of adipic acid, 0.3 parts of "Irganox 1010" and 6 parts of water were charged into a 3 L stainless steel autoclave, and after nitrogen substitution, pressure was applied at 220 ° C. The mixture was heated and stirred for 4 hours in a sealed state to obtain 117 parts of a polyamide oligomer having a carboxyl group at both ends and an acid value of 110. Then obtained in Production Example 2 (a-2)
142 parts, 16 parts of polyoxyethylene glycol having a number average molecular weight of 1,500 and 0.5 part of zirconyl acetate were added, and the mixture was polymerized at 245 ° C. under a reduced pressure of 1 mmHg or less for 5 hours to obtain a viscous polymer. This polymer was taken out in a strand form on a belt and pelletized to obtain a polyether ester amide. This product had a relative viscosity of 2.10. This polyetheresteramide is abbreviated as [A-1] below.
【0044】[比較のポリエーテルエステルアミドの製
造] 製造例5 3Lステンレス製オートクレーブに、ε−カプロラクタ
ム105部、アジピン酸17.1部、「イルガノックス
1010」0.3部および水6部を仕込み、窒素置換
後、220℃で加圧密閉下4時間加熱攪拌し、両末端に
カルボキシル基を有する酸価110のポリアミドオリゴ
マー117部を得た。次いで数平均分子量1,500の
ポリオキシエチレングリコール175部および酢酸ジル
コニル0.5部を加え、245℃、1mmHg以下の減
圧下の条件で5時間重合し、粘稠なポリマーを得た。こ
のポリマーをベルト上にストランド状で取り出し、ペレ
タイズすることによって比較のポリエーテルエステルア
ミドを得た。このものの相対粘度は2.20であった。
このポリエーテルエステルアミドを以下[A−3]と略
記する。[Production of Comparative Polyetheresteramide] Production Example 5 A 3 L stainless steel autoclave was charged with 105 parts of ε-caprolactam, 17.1 parts of adipic acid, 0.3 parts of "Irganox 1010" and 6 parts of water. After nitrogen substitution, the mixture was heated and stirred at 220 ° C. under pressure and closed for 4 hours to obtain 117 parts of a polyamide oligomer having a carboxyl group at both ends and an acid value of 110. Next, 175 parts of polyoxyethylene glycol having a number average molecular weight of 1,500 and 0.5 part of zirconyl acetate were added, and the mixture was polymerized for 5 hours at 245 ° C. under a reduced pressure of 1 mmHg or less to obtain a viscous polymer. This polymer was taken out in a strand form on a belt and pelletized to obtain a comparative polyether ester amide. This product had a relative viscosity of 2.20.
This polyetheresteramide is abbreviated as [A-3] below.
【0045】[相溶化剤(C)の製造] 製造例6 ポリブタジエンラテックス40部の存在下でメタクリル
酸メチル68重量%、スチレン24重量%、アクリロニ
トリル4重量%、アクリル酸4重量%からなる単量体混
合物60部を乳化重合した。得られたグラフト共重合体
ラテックスを硫酸で凝固し、苛性ソーダで中和、洗浄、
濾過、乾燥し、パウダー状のグラフト共重合反応生成物
[C−1]を得た。[Production of Compatibilizer (C)] Production Example 6 A unit amount consisting of 68% by weight of methyl methacrylate, 24% by weight of styrene, 4% by weight of acrylonitrile and 4% by weight of acrylic acid in the presence of 40 parts of polybutadiene latex. 60 parts of the body mixture was emulsion polymerized. The resulting graft copolymer latex is coagulated with sulfuric acid, neutralized with caustic soda, washed,
After filtration and drying, a powdery graft copolymerization reaction product [C-1] was obtained.
【0046】製造例7 熱減成して得られた数平均分子量5,000、密度0.
92の低分子量ポリプロピレン950部と無水マレイン
酸50部を窒素ガス雰囲気下180℃で溶融し、ついで
これにジクミルパーオキサイド15部を溶解したキシレ
ン50%溶液30部を15分かけて滴下した。その後1
時間反応を行った後、キシレンを溜去して酸変性低分子
量ポリプロピレン[C−2]を得た。Production Example 7 Number average molecular weight 5,000 obtained by thermal degradation, density of 0.
950 parts of low molecular weight polypropylene No. 92 and 50 parts of maleic anhydride were melted at 180 ° C. under a nitrogen gas atmosphere, and then 30 parts of 50% xylene solution in which 15 parts of dicumyl peroxide were dissolved was added dropwise over 15 minutes. Then one
After reacting for a period of time, xylene was distilled off to obtain acid-modified low molecular weight polypropylene [C-2].
【0047】[マスターバッチの製造] 製造例8 表1に示す割合の(A)〜(C)各成分をヘンシェルミ
キサーにて3分間ブレンドした後、ベント付き2軸押出
機にて、表1に示す温度、30rpm、滞留時間5分の
条件で溶融混練しマスターバッチ(M−1)〜(M−
3)を得た。[Manufacture of Masterbatch] Manufacturing Example 8 The components (A) to (C) in the proportions shown in Table 1 were blended in a Henschel mixer for 3 minutes, and then mixed in a vented twin-screw extruder as shown in Table 1. Master batches (M-1) to (M-) were melt-kneaded under the conditions of the temperature shown, 30 rpm, and a residence time of 5 minutes.
3) was obtained.
【0048】[0048]
【表1】 (注) [B−1]:日本合成ゴム(株)製「JSR−ABS 10」 [B−2]:宇部興産(株)製 「UBEポリプロ J609H」 [B−3]:東レ(株)製「東レPBT 1401−X07」[Table 1] (Note) [B-1]: manufactured by Japan Synthetic Rubber Co., Ltd. "JSR-ABS 10" [B-2]: manufactured by Ube Industries, Ltd. "UBE Polypro J609H" [B-3]: manufactured by Toray Co., Ltd. "Toray PBT 1401-X07"
【0049】実施例1〜3 製造例8で得たマスターバッチ(M−1)〜(M−3)
と熱可塑性樹脂[B−1]〜[B−3]とを、それぞれ
表2に示す組合せで、製造例8と同様の条件でブレンド
混練し、本発明の樹脂組成物を得た。該マスターバッチ
を経由した本発明の樹脂組成物中の(A)〜(C)各成
分の最終割合を表2に示した。Examples 1 to 3 Masterbatches (M-1) to (M-3) obtained in Production Example 8
And thermoplastic resins [B-1] to [B-3] were blended and kneaded in the combinations shown in Table 2 under the same conditions as in Production Example 8 to obtain a resin composition of the present invention. Table 2 shows the final proportions of the components (A) to (C) in the resin composition of the present invention via the masterbatch.
【0050】[0050]
【表2】 [Table 2]
【0051】実施例4〜9、比較例1〜7 表3に示す(A)〜(C)各成分をを製造例8と同様の
条件でブレンド混練し、本発明の樹脂組成物および比較
の樹脂組成物を得た。Examples 4 to 9 and Comparative Examples 1 to 7 The components (A) to (C) shown in Table 3 were blended and kneaded under the same conditions as in Production Example 8 to obtain a resin composition of the present invention and a comparative example. A resin composition was obtained.
【0052】[0052]
【表3】 [Table 3]
【0053】これらの樹脂組成物をそれぞれ射出成形機
により、シリンダー温度を混練温度と同じ金型温度60
℃で試験片を成形し各物性を測定した。結果を表4に示
す。なお、表面固有抵抗は、以下の条件で試験片を処理
したものについて行った。 (a)成形後、角試験片をそのまま20℃、湿度65%
RH雰囲気下に24時間放置。 (b)成形後、角試験片を洗剤[ママレモン;ライオン
(株)製]水溶液で洗浄処理し、次いでイオン交換水で
充分洗ったのち、表面の水分を乾燥除去してから20
℃、湿度65%RH雰囲気下に24時間放置。Each of these resin compositions was subjected to an injection molding machine, and the cylinder temperature was the same as the kneading temperature.
A test piece was molded at ℃ and each physical property was measured. The results are shown in Table 4. The surface resistivity was measured on the test piece treated under the following conditions. (A) After molding, the square test piece is kept at 20 ° C. and the humidity is 65%
Leave for 24 hours in RH atmosphere. (B) After molding, the corner test piece was washed with an aqueous solution of a detergent [Mama Lemon; manufactured by Lion Co., Ltd.], and then sufficiently washed with ion-exchanged water, and then the surface water was dried to remove the water.
Leave for 24 hours in an atmosphere of 65 ° C and 65% RH.
【0054】[0054]
【表4】 NB:破断せず[Table 4] NB: Not broken
【0055】表3に示す実施例4、5と比較例1の結果
から明らかなように、本発明のポリエーテルエステルア
ミドは、従来のポリエーテルエステルアミドに比べ耐熱
性と帯電防止性に優れる。また、実施例8と比較例6の
結果から明らかなように、本発明のポリエーテルエステ
ルアミドと熱可塑性樹脂とを混練して得られる樹脂組成
物は、相溶化剤の添加量を従来に比べ少量にすることが
可能となり、このため従来技術に比べ相溶化剤を使用し
ても帯電防止性の低下がほとんどなく、かつ相溶性が良
好なため機械的強度に優れた樹脂組成物が得られた。ま
た実施例1と実施例6の比較から本発明の組成物はマス
ターバッチを経由してなることが好ましい。As is clear from the results of Examples 4 and 5 and Comparative Example 1 shown in Table 3, the polyetheresteramide of the present invention is superior in heat resistance and antistatic property to the conventional polyetheresteramide. Further, as is clear from the results of Example 8 and Comparative Example 6, the resin composition obtained by kneading the polyether ester amide of the present invention and the thermoplastic resin has a compatibilizing agent addition amount in comparison with the conventional one. It is possible to reduce the amount, and therefore, even if a compatibilizer is used as compared with the prior art, there is almost no deterioration in antistatic property, and the compatibility is good, so that a resin composition having excellent mechanical strength can be obtained. It was From the comparison between Example 1 and Example 6, it is preferable that the composition of the present invention is prepared via a masterbatch.
【0056】[0056]
【発明の効果】本発明のポリエーテルエステルアミド
は、従来のポリエーテルエステルアミドに比べ、耐熱性
および帯電防止性に優れる。またこのポリエーテルエス
テルアミドと熱可塑性樹脂からなる樹脂組成物は、耐熱
性、永久帯電防止性および機械的特性に優れ、各種成形
材料として有用である。The polyetheresteramide of the present invention is superior in heat resistance and antistatic property to the conventional polyetheresteramide. A resin composition comprising this polyether ester amide and a thermoplastic resin is excellent in heat resistance, permanent antistatic property and mechanical properties, and is useful as various molding materials.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C08L 47/00 LKK 53/00 LLY LLZ 67/02 LPG 77/12 LQR 101/00 LTA 101/02 LSY ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical indication C08L 47/00 LKK 53/00 LLY LLZ 67/02 LPG 77/12 LQR 101/00 LTA 101/02 LSY
Claims (9)
分子量500〜5,000のポリアミド(a1)と下記
一般式(1)で示される数平均分子量500〜5,00
0の芳香環含有ポリエーテル(a2)から誘導されるポ
リエーテルエステルアミド。 H−{(Q)m−O−Z−O−(Q)m−X}n−(Q)m
−O−Z−O−(Q)m−H (1) (式中、Zはビスフェノール類、単環二価フェノール
類、ジヒドロキシビフェニル類、ジヒドロキシナフタレ
ン類およびビナフトール類から選ばれる二価フェノール
類の残基、Qは炭素数2〜4のオキシアルキレン基、X
は炭素数1〜18のアルキレンジハライドのアルキレン
残基、mは1〜30の整数、nは1〜25の整数を表
す。)1. A polyamide (a1) having a carboxyl group at both ends and having a number average molecular weight of 500 to 5,000 and a number average molecular weight of 500 to 5,000 represented by the following general formula (1).
A polyether ester amide derived from a 0-containing aromatic ring-containing polyether (a2). H-{(Q) m- O-Z-O- (Q) m- X} n- (Q) m
-O-Z-O- (Q) m- H (1) (In the formula, Z is a dihydric phenol selected from bisphenols, monocyclic dihydric phenols, dihydroxybiphenyls, dihydroxynaphthalene and binaphthols. Residue, Q is an oxyalkylene group having 2 to 4 carbon atoms, X
Represents an alkylene residue of an alkylene dihalide having 1 to 18 carbon atoms, m represents an integer of 1 to 30, and n represents an integer of 1 to 25. )
ゾール溶液、25℃)の相対粘度を有する請求項1記載
のポリエーテルエステルアミド。2. The polyetheresteramide according to claim 1, which has a relative viscosity of 1.2 to 3.0 (0.5% by weight m-cresol solution, 25 ° C.).
たは2記載のポリエーテルエステルアミド。3. The polyetheresteramide according to claim 1, wherein Q is an oxyethylene group.
テルエステルアミド(A)と熱可塑性樹脂(B)とから
なる樹脂組成物。4. A resin composition comprising the polyetheresteramide (A) according to any one of claims 1 to 3 and a thermoplastic resin (B).
ル酸エステル、(メタ)アクリロニトリルおよびブタジ
エンからなる群より選ばれる少なくとも1種を構成単位
とする(共)重合体である請求項4記載の樹脂組成物。5. The (B) is a (co) polymer having a constitutional unit of at least one selected from the group consisting of styrenes, (meth) acrylic acid esters, (meth) acrylonitrile and butadiene. The resin composition described.
求項4記載の樹脂組成物。6. The resin composition according to claim 4, wherein (B) is a polyolefin resin.
項4記載の樹脂組成物。7. The resin composition according to claim 4, wherein (B) is a polyester resin.
0):(95〜60)である請求項4〜7のいずれか記
載の樹脂組成物。8. The weight ratio of (A) and (B) is (5-4).
0): (95-60), The resin composition according to any one of claims 4 to 7.
れる1種以上の相溶化剤(C)を含有してなる請求項4
〜8のいずれか記載の樹脂組成物。 (C1);カルボキシル基、エポキシ基、アミノ基、ヒ
ドロキシル基、ポリアルキレンオキシド基、スルホン酸
基およびそれらの誘導体よりなる群から選ばれる少なく
とも1種の官能基を有する変性ビニル系重合体 (C2);変性低分子量ポリオレフィン (C3);ポリオレフィン部分と芳香族ビニル系重合体
部分を有するブロック重合体9. The composition according to claim 4, further comprising at least one compatibilizing agent (C) selected from the following (C1) to (C3).
The resin composition according to any one of to 8. (C1); Modified vinyl polymer having at least one functional group selected from the group consisting of carboxyl group, epoxy group, amino group, hydroxyl group, polyalkylene oxide group, sulfonic acid group and derivatives thereof (C2) A modified low molecular weight polyolefin (C3); a block polymer having a polyolefin part and an aromatic vinyl polymer part
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25287894A JP3162919B2 (en) | 1993-09-24 | 1994-09-20 | Polyetheresteramide and resin composition |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5-261919 | 1993-09-24 | ||
| JP26191993 | 1993-09-24 | ||
| JP25287894A JP3162919B2 (en) | 1993-09-24 | 1994-09-20 | Polyetheresteramide and resin composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0848768A true JPH0848768A (en) | 1996-02-20 |
| JP3162919B2 JP3162919B2 (en) | 2001-05-08 |
Family
ID=26540926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25287894A Expired - Fee Related JP3162919B2 (en) | 1993-09-24 | 1994-09-20 | Polyetheresteramide and resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3162919B2 (en) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08120147A (en) * | 1994-09-01 | 1996-05-14 | Sanyo Chem Ind Ltd | Transparent antistatic acrylic resin composition |
| WO1999046328A1 (en) * | 1996-09-11 | 1999-09-16 | Honda Giken Kogyo Kabushiki Kaisha | Agent for both imparting electrostatic applicability and improving water resistance of film, electrostatically coated resin moldings, and process for electrostatic coating |
| WO1999064512A1 (en) * | 1997-01-31 | 1999-12-16 | Nippon A & L Inc. | Resin composition for electrostatic coating |
| WO2001014471A3 (en) * | 1999-08-25 | 2001-07-26 | Cyro Ind | Electrostatic-dissipative multipolymer compositions |
| JP2002088220A (en) * | 2000-09-14 | 2002-03-27 | Denki Kagaku Kogyo Kk | Permanent antistatic thermoplastic resin composition |
| WO2005097905A1 (en) | 2004-03-31 | 2005-10-20 | Techno Polymer Co., Ltd. | Thermoplastic resin composition and resin molding |
| JP2006052378A (en) * | 2004-03-31 | 2006-02-23 | Techno Polymer Co Ltd | Thermoplastic resin composition and resin molded body |
| US7018567B2 (en) | 2002-07-22 | 2006-03-28 | General Electric Company | Antistatic flame retardant resin composition and methods for manufacture thereof |
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| JP2014015569A (en) * | 2012-07-11 | 2014-01-30 | Riken Vitamin Co Ltd | Styrene resin composition, molding of the resin composition, and master batch for styrene resin |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08120147A (en) * | 1994-09-01 | 1996-05-14 | Sanyo Chem Ind Ltd | Transparent antistatic acrylic resin composition |
| WO1999046328A1 (en) * | 1996-09-11 | 1999-09-16 | Honda Giken Kogyo Kabushiki Kaisha | Agent for both imparting electrostatic applicability and improving water resistance of film, electrostatically coated resin moldings, and process for electrostatic coating |
| US6162545A (en) * | 1996-09-11 | 2000-12-19 | Honda Giken Kogyo Kabushiki Kaisha | Agent for providing an electrostatic coating property and improving the water resistance of a coating film, an electrostatically coated resin molded article, and an electrostatic coating method |
| WO1999064512A1 (en) * | 1997-01-31 | 1999-12-16 | Nippon A & L Inc. | Resin composition for electrostatic coating |
| US6703437B1 (en) | 1998-06-12 | 2004-03-09 | Nippon A & L Inc. | Resin composition for electrostatic coating |
| WO2001014471A3 (en) * | 1999-08-25 | 2001-07-26 | Cyro Ind | Electrostatic-dissipative multipolymer compositions |
| US6624250B2 (en) * | 1999-08-25 | 2003-09-23 | Cyro Industries | Electrostatic-dissipative multipolymer compositions |
| US6673873B1 (en) | 1999-08-25 | 2004-01-06 | Cyro Industries | Electrostatic-dissipative multipolymer compositions |
| JP2002088220A (en) * | 2000-09-14 | 2002-03-27 | Denki Kagaku Kogyo Kk | Permanent antistatic thermoplastic resin composition |
| US7018567B2 (en) | 2002-07-22 | 2006-03-28 | General Electric Company | Antistatic flame retardant resin composition and methods for manufacture thereof |
| WO2005097905A1 (en) | 2004-03-31 | 2005-10-20 | Techno Polymer Co., Ltd. | Thermoplastic resin composition and resin molding |
| JP2006052378A (en) * | 2004-03-31 | 2006-02-23 | Techno Polymer Co Ltd | Thermoplastic resin composition and resin molded body |
| KR101142813B1 (en) * | 2004-03-31 | 2012-05-08 | 테크노 폴리머 가부시키가이샤 | Thermoplastic resin composition and resin molding |
| US8563106B2 (en) | 2004-03-31 | 2013-10-22 | Techno Polymer Co., Ltd. | Thermoplastic resin composition and resin molding |
| JP2008297418A (en) * | 2007-05-31 | 2008-12-11 | Sanyo Chem Ind Ltd | Antistatic agent and antistatic resin composition |
| JP2010163630A (en) * | 2010-05-06 | 2010-07-29 | Asahi Kasei Chemicals Corp | Cover, case or housing |
| JP2014015569A (en) * | 2012-07-11 | 2014-01-30 | Riken Vitamin Co Ltd | Styrene resin composition, molding of the resin composition, and master batch for styrene resin |
| JP2024108039A (en) * | 2023-01-30 | 2024-08-09 | Psジャパン株式会社 | Styrenic resin composition, styrenic composition for masterbatch, aromatic vinyl resin composition, heat shrinkable film, non-foamable or foamable extrusion sheet, and food container |
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