JPH0851172A - Ceramic package and heat dissipation board - Google Patents

Ceramic package and heat dissipation board

Info

Publication number
JPH0851172A
JPH0851172A JP6184629A JP18462994A JPH0851172A JP H0851172 A JPH0851172 A JP H0851172A JP 6184629 A JP6184629 A JP 6184629A JP 18462994 A JP18462994 A JP 18462994A JP H0851172 A JPH0851172 A JP H0851172A
Authority
JP
Japan
Prior art keywords
heat dissipation
ceramic package
thermal expansion
thermal conductivity
dissipation board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6184629A
Other languages
Japanese (ja)
Other versions
JP2973170B2 (en
Inventor
Tadashi Arikawa
正 有川
Akira Ichida
晃 市田
Tadashi Igarashi
廉 五十嵐
Yoshihiko Doi
良彦 土井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Tungsten Co Ltd
Original Assignee
Tokyo Tungsten Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Tungsten Co Ltd filed Critical Tokyo Tungsten Co Ltd
Priority to JP6184629A priority Critical patent/JP2973170B2/en
Publication of JPH0851172A publication Critical patent/JPH0851172A/en
Application granted granted Critical
Publication of JP2973170B2 publication Critical patent/JP2973170B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/884Die-attach connectors and bond wires

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

(57)【要約】 【目的】 セラミックパッケージに適した熱伝導率及び
熱膨張係数を有すると共に、加工性に優れ、且つ、安価
な異形形状を有する放熱基板を提案する。 【構成】 銅が40wt%となるようにモリブデン粉と
十分混合し、プレス成形後、水素中で1250℃×2時
間焼結したものを、熱間圧延・冷間圧延を施して、厚さ
1.2mmと2.3mmの板材を作製した。熱放熱基板
としての熱特性は、密度9.6g/cm3 、熱伝導率2
37w/m・k、熱膨張係数9.1×10-6/℃を得
た。この後、ニッケルめっきを施し、セラミックパッケ
ージの中の部品として組み立てた。図は、中央に凸部4
を形成し、ここに半導体チップ5を搭載する形式の異形
放熱基板1を示す。
(57) [Summary] [Object] To provide a heat dissipation substrate having a deformed shape, which has a thermal conductivity and a thermal expansion coefficient suitable for a ceramic package, is excellent in workability, and is inexpensive. [Constitution] Copper was sufficiently mixed with molybdenum powder so as to be 40 wt%, press-molded, and then sintered in hydrogen at 1250 ° C. for 2 hours. Plate materials of 0.2 mm and 2.3 mm were produced. The thermal characteristics of the heat dissipation substrate are: density 9.6 g / cm 3 , thermal conductivity 2
37 w / m · k and a coefficient of thermal expansion of 9.1 × 10 −6 / ° C. were obtained. After that, nickel plating was applied and the parts were assembled as parts in a ceramic package. The figure shows the convex portion 4 in the center.
The modified heat dissipation board 1 of the type in which the semiconductor chip 5 is mounted is shown.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体装置、即ち、半
導体チップを搭載するセラミックパッケージに関し、特
に、放熱基板を備えたセラミックパッケージに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, that is, a ceramic package on which a semiconductor chip is mounted, and more particularly to a ceramic package having a heat dissipation substrate.

【0002】[0002]

【従来の技術】従来、この種のセラミックパッケージで
は、素子及びその周辺から発生する熱を効率よく放散さ
せることが極めて重要であり、このため、セラミックパ
ッケージにはヒートシンクと呼ばれる放熱基板が組み込
まれているのが普通である。この放熱基板を構成する放
熱材料として、各種の放熱材料が検討され、現在もその
研究開発が継続されている。
2. Description of the Related Art Conventionally, in this type of ceramic package, it is extremely important to efficiently dissipate heat generated from the element and its surroundings. For this reason, a heat dissipation substrate called a heat sink is incorporated in the ceramic package. It is normal to have Various heat-dissipating materials have been studied as the heat-dissipating material constituting the heat-dissipating substrate, and research and development thereof are still ongoing.

【0003】ユーザの種々の要求に応えるためには、様
々な形状を備えた放熱基板を用意しておくことが必要で
ある。様々な形状の放熱基板を用意するためには、単
に、矩形形状の放熱基板だけではなく、矩形以外の形状
(ここでは、異形形状)を備えた放熱基板をも用意して
おかなければならない。このように、異形形状の放熱基
板を用意するためには、各種の加工、例えば、打抜き、
プレス、段付き加工等がしやすい放熱材料であることが
望ましい、更に、セラミックパッケージに組み込まれる
異形放熱基板では、安価であることは、実用上きわめて
重要である。
In order to meet various demands of users, it is necessary to prepare heat dissipation boards having various shapes. In order to prepare heat dissipation boards of various shapes, it is necessary to prepare not only a rectangular heat dissipation board but also a heat dissipation board having a shape other than a rectangle (here, an irregular shape). As described above, in order to prepare a heat dissipation substrate having an irregular shape, various processes such as punching,
It is desirable that the heat-dissipating material is easy to press, step, and the like. Further, it is extremely important for practical use that the deformed heat-dissipating substrate incorporated in the ceramic package is inexpensive.

【0004】このように、加工性に優れ、このため、異
形に加工することが容易であり、しかも、安価なセラミ
ックパッケージに適した放熱基板が強く望まれている。
As described above, there is a strong demand for a heat dissipating substrate which is excellent in workability and therefore can be easily processed into a different shape and is suitable for an inexpensive ceramic package.

【0005】ここで、異形形状の放熱基板には、後述す
る図に示すような様々な形状が想定されるが、切削、ス
リッティング、研摩等の加工法によることが多く、コス
トを低下する工夫をしても、これらの加工法を主とする
限り容易に行い難い。
Here, various shapes of the heat-dissipating substrate having an irregular shape are assumed as shown in the later-described figures, but it is often processed by cutting, slitting, polishing or the like, so that the cost is reduced. However, as long as these processing methods are mainly used, it is difficult to perform them easily.

【0006】従来、セラミックパッケージのヒートシン
クは、セラミック(例えば、酸化アルミニウムの熱膨張
係数6.7×10-6/℃)に近似することが望ましいと
されている。
Conventionally, it has been considered desirable that the heat sink of a ceramic package be close to a ceramic (for example, the thermal expansion coefficient of aluminum oxide is 6.7 × 10 −6 / ° C.).

【0007】しかしながら、セラミックパッケージとい
えども、半導体チップの周辺部材には、その設計上、熱
膨張係数が半導体チップの熱膨張係数(例えば、Si
4.2×10-6/℃)と比較してかなり大きいものを使
用することがある。
However, even in the case of the ceramic package, the peripheral members of the semiconductor chip have a thermal expansion coefficient (for example, Si of the semiconductor chip) due to the design.
4.2 × 10 −6 / ° C.), which is considerably larger than the above.

【0008】このような状況を考慮すると、低廉価で加
工でき、熱伝導率が高く、且つ、熱放散に優れ、更に、
熱膨張係数が9×10-6/℃以上の金属製異形ヒートシ
ンクを開発することは、セラミックパッケージの組立仕
様にフレキシブルに対応させることができるかぎとなる
技術といえるにもかかわらず、有効で、しかも、実用性
のある解決に至っていないのが実状である。
Considering such a situation, it is possible to process at a low cost, has a high thermal conductivity, and is excellent in heat dissipation.
Despite the fact that developing a metal deformed heat sink with a coefficient of thermal expansion of 9 × 10 -6 / ° C or higher is a key technology that can flexibly meet the assembly specifications of ceramic packages, it is effective. Moreover, the reality is that no practical solution has been reached.

【0009】ここで、銅は、熱伝導率が380w/m・
kときわめて高く、加工性にも優れているが、熱膨張係
数が17.3×10-6/℃と大きすぎ、適切でない。ま
た、コバールは、熱膨張係数が5.3×10-6/℃で加
工性も程々でよく用いられているが、熱伝導率が17w
/m・k程度で、適切でない。
Here, copper has a thermal conductivity of 380 w / m.
k is extremely high and is excellent in workability, but the coefficient of thermal expansion is too large at 17.3 × 10 −6 / ° C., which is not suitable. Also, Kovar has a thermal expansion coefficient of 5.3 × 10 −6 / ° C. and is often used because of its moderate workability, but its thermal conductivity is 17 w.
/ M · k, which is not appropriate.

【0010】[0010]

【発明が解決しようとする課題】上述したように、従
来、セラミックパッケージ用の放熱基板に使用されてい
る材料は、熱伝導率、熱膨張係数、加工性(打抜き、切
断、プレス、段付け、せん断、パンチ穴あけ、曲げ加
工、スリッティング、切削又は研摩)及びコストの諸点
で、各種の異形の放熱基板を作製することに不向きであ
ることが判明した。
As described above, the materials conventionally used for heat dissipation substrates for ceramic packages include thermal conductivity, thermal expansion coefficient and workability (punching, cutting, pressing, stepping, Shearing, punching, bending, slitting, cutting or polishing) and cost have been found to be unsuitable for producing various types of heat dissipation substrates.

【0011】そこで、本発明の目的は、前記従来の技術
の欠点を改良し、熱膨張係数が銅の17.3×10-6
℃より小さい一定範囲内で、熱伝導率が銅の380w/
m・kから程遠くない一定以上で、加工性に優れ、安価
な異形形状放熱基板を提供することである。
Therefore, an object of the present invention is to remedy the above-mentioned drawbacks of the prior art, and the coefficient of thermal expansion of copper is 17.3 × 10 -6 /
Within a certain range below ℃, the thermal conductivity of copper is 380w /
An object is to provide an inexpensive heat dissipating substrate having a deformed shape, which is not far from m · k and has a certain level or more, excellent workability, and inexpensive.

【0012】[0012]

【課題を解決するための手段】本発明者等は、一般的な
金属の加工法を基礎に加工条件を鋭意選定することによ
り、後述する本発明の熱伝導率及び熱膨張係数を有する
材料は、打抜き、切断、プレス、段付け、せん断、パン
チ穴あけ又は曲げ加工の可能であることを確認した。ま
た、切消又は研摩の内、少なくとも切削をせずに異形に
加工できる放熱材料を使用すれば、当然の帰結として、
コストの大幅低減が可能となり、低廉価な異形ヒートシ
ンクを有するセラミックパッケージを組み立てることが
できる。
Means for Solving the Problems The inventors of the present invention diligently selected the processing conditions on the basis of a general metal processing method so that a material having a thermal conductivity and a thermal expansion coefficient of the present invention described later can be obtained. It was confirmed that punching, cutting, pressing, stepping, shearing, punching or bending were possible. In addition, if you use a heat dissipation material that can be processed into a deformed shape without cutting, among cutting or polishing, as a natural consequence,
The cost can be significantly reduced, and a ceramic package having a low-profile irregular heat sink can be assembled.

【0013】本発明によれば、前記課題を解決するた
め、銅及びモリブデンの粉末を混合し、焼結し、圧延し
て形成され、熱伝導率が200w/m・k以上で、熱膨
張係数が9〜16×10-6/℃(好ましくは、9〜13
x10-6/ ℃)で、打抜き、切断、プレス、段付け、せ
ん断、パンチ穴あけ又は曲げ加工の内の1種又は2種以
上の組合せにより、異形に加工された放熱基板を組み込
まれるセラミックパッケージが得られる。
According to the present invention, in order to solve the above-mentioned problems, powders of copper and molybdenum are mixed, sintered and rolled to have a thermal conductivity of 200 w / m · k or more, and a thermal expansion coefficient. Is 9 to 16 × 10 −6 / ° C. (preferably 9 to 13)
x10 -6 / ℃), a ceramic package that incorporates a heat dissipation substrate that has been deformed by one or a combination of punching, cutting, pressing, stepping, shearing, punching or bending. can get.

【0014】[0014]

【実施例】本発明の3つの実施例を図面を参照して説明
する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Three embodiments of the present invention will be described with reference to the drawings.

【0015】まず、実施例1から説明する。First, the first embodiment will be described.

【0016】銅が40wt%となるようにモリブデン粉
と十分混合し、プレス成形後、水素中で1250℃×2
時間焼結したものを、熱間圧延・冷間圧延を施して、厚
さ1.2mmと2.3mmの板材を作製した。
After sufficiently mixing with molybdenum powder so that the copper content becomes 40 wt%, and after press molding, it is carried out in hydrogen at 1250 ° C. × 2.
The material that had been sintered for a period of time was hot-rolled and cold-rolled to produce plate materials having a thickness of 1.2 mm and 2.3 mm.

【0017】厚さ1.2mmの板について金型打抜きプ
レスにより、図1及び図2の平板状異形放熱基板1を得
た。なお、2は丸み、3は切り欠きである。
By using a die punching press on a plate having a thickness of 1.2 mm, the plate-shaped irregular heat dissipation substrate 1 shown in FIGS. 1 and 2 was obtained. In addition, 2 is roundness and 3 is a notch.

【0018】また、厚さ2.3mmの板について矩形に
打抜いた後、4隅に丸みを付け、異形形状とした後、切
削により図3の凸部4について加工したところ、モリブ
デン圧延機の4〜5倍の速度で、また、無酸素銅にほぼ
近似した速度で加工できた。
Further, a 2.3 mm thick plate was punched into a rectangle, rounded at four corners to form a deformed shape, and then the convex portion 4 in FIG. 3 was machined by cutting. It could be machined at a speed of 4 to 5 times, and at a speed almost similar to that of oxygen-free copper.

【0019】よって、いずれも加工コストについては、
きわめて低廉価な方法で異形形状の放熱基板を製作でき
た。
Therefore, regarding the processing cost,
We were able to fabricate a heat-dissipating board with an irregular shape using an extremely low-cost method.

【0020】放熱基板として重要な熱特性は、本実施例
の板材についてはいずれも、密度9.6g/cm3 、熱
膨張係数9.1×10-6/℃、熱伝導率237w/m・
kを得ることができ、ユーザーの要求に応えるものであ
った。
Important thermal properties as a heat dissipation substrate are as follows: density of 9.6 g / cm 3 , thermal expansion coefficient of 9.1 × 10 -6 / ° C., thermal conductivity of 237 w / m.
It was possible to obtain k and meet the user's request.

【0021】この後、ニッケルめっきを施し、セラミッ
クパッケージの中の部品として組み立てた。セラミック
パッケージとしては、種々の構成があるが、放熱基板を
半導体チップに直接に接触させるものや、リッド(キャ
ップ)として用いるもの、金属製放熱基板としてのリッ
ドに、熱膨張差を踏まえた上に敢えて半導体チップを接
合し、パッケージ全体の熱バランス等の設計上の整合を
図るものもある。
After that, nickel plating was applied and the parts were assembled as parts in a ceramic package. Although there are various configurations of ceramic packages, the one that directly contacts the heat dissipation board with the semiconductor chip, the one that is used as the lid (cap), and the lid as the metal heat dissipation board are based on the difference in thermal expansion. There is also one that intentionally joins the semiconductor chips to achieve design matching such as heat balance of the entire package.

【0022】ここで、図4は、中央に凸部4を形成し、
凸部4に半導体チップ5を搭載する形式の異形放熱基板
1を用いたものを示し、一方、図5は、パッケージのリ
ッドとして、周縁に凸部4を形成された異形放熱基板1
を用いたものを示す。これら凸部はプレスにより簡単に
形成することができ、いずれも、異形放熱基板として適
用できることがわかった。
Here, in FIG. 4, a convex portion 4 is formed in the center,
FIG. 5 shows a case where a modified heat dissipation board 1 of the type in which the semiconductor chip 5 is mounted on the convex portion 4 is used, while FIG. 5 shows a modified heat dissipation board 1 having a convex portion 4 formed on the periphery as a package lid.
Shows the one using. It was found that these convex portions can be easily formed by pressing, and any of them can be applied as a modified heat dissipation substrate.

【0023】次に、実施例2を説明する。Next, a second embodiment will be described.

【0024】銅が50wt%となるようにモリブデン粉
と十分混合し、プレス成形後、水素中で1200℃×2
時間焼結したものを、熱間圧延・冷間圧延を施して、厚
さ1.0mmの板材を作製した。
After sufficiently mixing with molybdenum powder so that the copper content becomes 50 wt%, and press-molding, 1200 ° C. × 2 in hydrogen.
What was sintered for time was hot-rolled and cold-rolled to produce a plate material having a thickness of 1.0 mm.

【0025】金型打抜きプレスにより、図1、図2、図
6及び図7の外周矩形部を加工した。
The peripheral rectangular portion shown in FIGS. 1, 2, 6 and 7 was processed by a die punching press.

【0026】また、図6の異形放熱基板1は、その四端
にプレス加工で穴6をあけたものであり、図7の異形放
熱基板1は、その中央にプレス又はチャックすることに
よる曲げ加工で曲げ凸状部7を設けたものである。
The deformed heat dissipation substrate 1 of FIG. 6 has holes 6 punched at its four ends, and the deformed heat dissipation substrate 1 of FIG. 7 is bent at the center by pressing or chucking. The bent convex portion 7 is provided.

【0027】熱特性は、密度9.5g/cm3 、熱膨張
係数11.0×10-6/℃、熱伝導率253w/m・k
を得ることができ、実施例1と同様に評価をし、有用性
を確認できた。
The thermal characteristics are a density of 9.5 g / cm 3 , a thermal expansion coefficient of 11.0 × 10 -6 / ° C., and a thermal conductivity of 253 w / m · k.
Was obtained and evaluated in the same manner as in Example 1, and the usefulness was confirmed.

【0028】続いて、実施例3を説明する。Next, a third embodiment will be described.

【0029】銅が60wt%となるようにモリブデン粉
と十分混合、プレス成形後、水素中で1150℃×2時
間焼結したものを、熱間圧延・冷間圧延を施して、厚さ
1.5mmの板材を作製した。
After sufficiently mixing with molybdenum powder so that the copper content is 60 wt%, press-molding, and sintering in hydrogen at 1150 ° C. for 2 hours, hot rolling and cold rolling are performed to obtain a thickness of 1. A 5 mm plate material was prepared.

【0030】半導体チップの搭載のために、ヒートシン
クの一部を凸部4にしたり(図3)、ボンディングワイ
ヤ用パッドを0.1〜0.15mm凸部にしたもので一
体プレス加工ができれば、加工コストの低減に寄与でき
るが、前記厚さ1.5mmの板材に金型プレスによる塑
性加工を施したところ、図3、図8及び図9の異形放熱
基板1が得られた。
In order to mount a semiconductor chip, if a part of the heat sink is formed into a convex portion 4 (FIG. 3) or a bonding wire pad is formed into a convex portion of 0.1 to 0.15 mm, it is possible to carry out integral press working. Although it is possible to contribute to the reduction of processing cost, when the plate material having the thickness of 1.5 mm is subjected to plastic working by a die press, the modified heat dissipation substrate 1 shown in FIGS. 3, 8 and 9 is obtained.

【0031】また、図8における凹部8の体積が大きい
場合には、凹部8の板厚方向への片端部に凸部が発生す
ることが生じ、異形放熱基板1全体では、前記発生する
凸部を吸収することができない。このときは、この実施
例に係る板材は、加工性が極めて良いため、凸部を切削
により除去することもできる。このように、この実施例
における板材は、切削加工もできるため、結局は、異形
放熱基板1を安価に製作することができた。
Further, when the volume of the concave portion 8 in FIG. 8 is large, a convex portion may occur at one end portion of the concave portion 8 in the plate thickness direction, and the convex portion generated as a whole in the modified heat dissipation substrate 1. Cannot be absorbed. At this time, since the plate material according to this embodiment has extremely good workability, the convex portion can be removed by cutting. As described above, since the plate material in this embodiment can be cut, the deformed heat dissipation board 1 can be manufactured at low cost.

【0032】実施例3に係る板材の熱特性は、密度9.
4g/cm3 、熱膨張係数12.3×10-6/℃、熱伝
導率272w/m・kを得ることができ、実施例1と同
様に評価をし、有用性を確認できた。
The thermal characteristics of the plate material according to Example 3 are the density 9.
It was possible to obtain 4 g / cm 3 , a coefficient of thermal expansion of 12.3 × 10 −6 / ° C., and a thermal conductivity of 272 w / m · k, and evaluation was performed in the same manner as in Example 1 to confirm its usefulness.

【0033】異形放熱基板の加工性の目安として、モリ
ブデンに銅を40%、50%、及び60%含有させた粉
末を焼結することによって得られた複合材の硬度及びエ
リクセン値を下記の表1に示す。
The hardness and Erichsen value of a composite material obtained by sintering a powder containing 40%, 50%, and 60% of copper in molybdenum are used as a measure of the workability of the modified heat dissipation substrate. Shown in 1.

【0034】[0034]

【表1】 [Table 1]

【0035】表1から、上記した複合材は複合材である
にもかかわらず、エリクセン値として4以上を示すこと
が判る。
It can be seen from Table 1 that the above-mentioned composite material exhibits an Erichsen value of 4 or more, although it is a composite material.

【0036】なお、銅35wt%の複合圧延材も試みた
ところ、熱伝導率が200w/m・kには到達しなかっ
たものの、熱膨張係数は8.4×10-6/℃であり、諸
加工の内少なくとも打抜きは可能であり、切断も同様に
優れていることが判明した。
When a composite rolled material containing 35 wt% of copper was also tried, the coefficient of thermal expansion was 8.4 × 10 −6 / ° C. although the thermal conductivity did not reach 200 w / m · k. It has been found that at least punching is possible among the various processes, and cutting is also excellent.

【0037】また、マイクロ波等に係る個別半導体レー
ザ素子9用ヒートンシンクでも、酸化ベリリウムより熱
膨張係数が若干大きい銅40wt%モリブデン複合材即
ち実施例1の異形放熱基板1で、組み立て設計条件が整
えば、本発明は、対応可能となり、これを図10に示
す。
Also in the heat sink for the individual semiconductor laser device 9 relating to microwaves and the like, the assembly design condition is 40% by weight of molybdenum composite material having a coefficient of thermal expansion slightly larger than that of beryllium oxide, that is, the modified heat dissipation substrate 1 of the first embodiment. Once arranged, the present invention is adaptable, which is shown in FIG.

【0038】[0038]

【発明の効果】半導体素子を搭載するパッケージ、特に
信頼性の点で優れているセラミックパッケージは、量産
コストが高ければ、汎用化して産業の発達に寄与すると
いう究極の目標を時として妨げる。
Industrial Applicability A package on which a semiconductor element is mounted, particularly a ceramic package excellent in reliability, sometimes obstructs the ultimate goal of generalization and contribution to industrial development if the mass production cost is high.

【0039】本発明は、前述した構成により、熱伝導率
が一定値以上で、熱膨張係数が一定の範囲内で、加工性
に優れ、コストが低廉価な異形放熱基板を組み込まれる
セラミックパッケージを提供することができ、利便性の
著しい向上が図れる。
According to the present invention, the ceramic package having the above-described structure, in which the irregular heat dissipation substrate having a thermal conductivity of a certain value or more and a thermal expansion coefficient of a certain range, excellent workability and low cost, is incorporated. It can be provided and the convenience can be significantly improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例1及び実施例2における第1の
異形放熱基板の正面図である。
FIG. 1 is a front view of a first variant heat dissipation board in Examples 1 and 2 of the present invention.

【図2】本発明の実施例1及び実施例2における第2の
異形放熱基板の正面図である。
FIG. 2 is a front view of a second variant heat dissipation board in Examples 1 and 2 of the present invention.

【図3】本発明の実施例1における第3の及び実施例3
における第1の異形放熱基板の正面図及び断面図であ
る。
FIG. 3 is a third and third embodiment of the first embodiment of the present invention.
FIG. 5 is a front view and a cross-sectional view of a first variant heat dissipation board in FIG.

【図4】本発明の実施例1における半導体チップを搭載
された第4の異形放熱基板の断面図である。
FIG. 4 is a sectional view of a fourth variant heat dissipation board on which a semiconductor chip according to the first embodiment of the present invention is mounted.

【図5】本発明の実施例1におけるパッケージのリッド
として用いられた第5の異形放熱基板の断面図である。
FIG. 5 is a cross-sectional view of a fifth variant heat dissipation substrate used as a package lid in the first embodiment of the present invention.

【図6】本発明の実施例2における第3の異形放熱基板
の正面図及び断面図である。
6A and 6B are a front view and a cross-sectional view of a third variant heat dissipation board in Embodiment 2 of the present invention.

【図7】本発明の実施例2における第4の異形放熱基板
の正面図及び断面図である。
FIG. 7 is a front view and a cross-sectional view of a fourth variant heat dissipation board according to a second embodiment of the present invention.

【図8】本発明の実施例3における第2の異形放熱基板
の正面図及び断面図である。
FIG. 8 is a front view and a cross-sectional view of a second variant heat dissipation board according to a third embodiment of the present invention.

【図9】本発明の実施例3における第3の異形放熱基板
の正面図及び断面図である。
9A and 9B are a front view and a cross-sectional view of a third variant heat dissipation board according to a third embodiment of the present invention.

【図10】本発明の実施例1における半導体レーザ素子
を搭載された第6の異形放熱基板の斜視図である。
FIG. 10 is a perspective view of a sixth variant heat dissipation board on which the semiconductor laser device according to the first embodiment of the present invention is mounted.

【符号の説明】[Explanation of symbols]

1 異形放熱基板 2 丸み 3 切り欠き 4 凸部 5 半導体チップ 6 穴 7 曲げ凸状部 8 凹部 9 半導体レーザ素子 1 Deformed Heat Dissipating Board 2 Roundness 3 Notch 4 Protrusion 5 Semiconductor Chip 6 Hole 7 Bending Convex 8 Recess 9 Semiconductor Laser Device

フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 23/14 C (72)発明者 土井 良彦 東京都葛飾区青戸六丁目40番1号 東京タ ングステン株式会社東京製作所内Continuation of the front page (51) Int.Cl. 6 Identification number Reference number within the agency FI Technical indication H01L 23/14 C (72) Inventor Yoshihiko Doi 6-40-1 Aoto, Katsushika-ku, Tokyo Tokyo Tangsten Co., Ltd. Inside Tokyo Works

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 半導体装置を搭載するのに使用されるセ
ラミックパッケージにおいて、銅及びモリブデンの粉末
を混合し、焼結し、圧延して形成され、200w/m・
k以上の熱伝導率、9〜16×10-6/℃の熱膨張係数
を備え、且つ、異形形状に加工された放熱基板を具備し
ていることを特徴とするセラミックパッケージ。
1. A ceramic package used for mounting a semiconductor device, which is formed by mixing powders of copper and molybdenum, sintering and rolling, and having a thickness of 200 w / m.multidot.
A ceramic package, which has a thermal conductivity of k or more and a thermal expansion coefficient of 9 to 16 × 10 −6 / ° C., and is provided with a heat dissipation substrate processed into an irregular shape.
【請求項2】 セラミックパッケージに使用される放熱
基板において、銅及びモリブデンの粉末を混合し、焼結
し、圧延して形成され、熱伝導率が200w/m・k以
上で、熱膨張係数が9〜16×10-6/℃で、打抜き、
切断、プレス、段付け、せん断、パンチ穴あけ、曲げ加
工の内の1種又は2種以上の加工を組合せにより、異形
に加工されていることを特徴とする放熱基板。
2. A heat dissipation substrate used in a ceramic package, which is formed by mixing powders of copper and molybdenum, sintering and rolling, and having a thermal conductivity of 200 w / m · k or more and a thermal expansion coefficient of 200 w / m · k or more. Punching at 9-16 × 10 -6 / ° C.
A heat dissipation board characterized by being processed into an irregular shape by combining one or more of cutting, pressing, stepping, shearing, punching, and bending.
JP6184629A 1994-08-05 1994-08-05 Ceramic package and heat dissipation board Expired - Lifetime JP2973170B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6184629A JP2973170B2 (en) 1994-08-05 1994-08-05 Ceramic package and heat dissipation board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6184629A JP2973170B2 (en) 1994-08-05 1994-08-05 Ceramic package and heat dissipation board

Publications (2)

Publication Number Publication Date
JPH0851172A true JPH0851172A (en) 1996-02-20
JP2973170B2 JP2973170B2 (en) 1999-11-08

Family

ID=16156579

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6184629A Expired - Lifetime JP2973170B2 (en) 1994-08-05 1994-08-05 Ceramic package and heat dissipation board

Country Status (1)

Country Link
JP (1) JP2973170B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100480659B1 (en) * 2001-09-19 2005-04-07 니뽄 가이시 가부시키가이샤 Composite material
US6998180B2 (en) 2002-03-22 2006-02-14 Plansee Aktiengesellschaft Package with a substrate of high thermal conductivity
DE10251411B4 (en) * 2002-10-16 2010-02-18 Sew-Eurodrive Gmbh & Co. Kg Device comprising an electronic circuit with at least one semiconductor module
KR101944756B1 (en) * 2018-05-14 2019-02-01 세일전자 주식회사 Substrate for electronic component

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05243436A (en) * 1992-02-27 1993-09-21 Nisshin Steel Co Ltd Manufacture of heat dissipating member for semiconductor package
JPH0613494A (en) * 1992-12-04 1994-01-21 Sumitomo Electric Ind Ltd Substrate for semiconductor device
JPH0677365A (en) * 1992-08-26 1994-03-18 Toho Kinzoku Kk Heat dissipation substrate material

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05243436A (en) * 1992-02-27 1993-09-21 Nisshin Steel Co Ltd Manufacture of heat dissipating member for semiconductor package
JPH0677365A (en) * 1992-08-26 1994-03-18 Toho Kinzoku Kk Heat dissipation substrate material
JPH0613494A (en) * 1992-12-04 1994-01-21 Sumitomo Electric Ind Ltd Substrate for semiconductor device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100480659B1 (en) * 2001-09-19 2005-04-07 니뽄 가이시 가부시키가이샤 Composite material
US6998180B2 (en) 2002-03-22 2006-02-14 Plansee Aktiengesellschaft Package with a substrate of high thermal conductivity
DE10251411B4 (en) * 2002-10-16 2010-02-18 Sew-Eurodrive Gmbh & Co. Kg Device comprising an electronic circuit with at least one semiconductor module
KR101944756B1 (en) * 2018-05-14 2019-02-01 세일전자 주식회사 Substrate for electronic component

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