JPH0851296A - Device for processing semiconductor substrate - Google Patents

Device for processing semiconductor substrate

Info

Publication number
JPH0851296A
JPH0851296A JP20301394A JP20301394A JPH0851296A JP H0851296 A JPH0851296 A JP H0851296A JP 20301394 A JP20301394 A JP 20301394A JP 20301394 A JP20301394 A JP 20301394A JP H0851296 A JPH0851296 A JP H0851296A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
substrate
shooter
rotating
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20301394A
Other languages
Japanese (ja)
Other versions
JP3541326B2 (en
Inventor
Takashi Hino
隆 日野
Isao Ito
伊佐雄 伊藤
Shinya Cho
信也 長
Toshikazu Tanaka
敏和 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dowa Holdings Co Ltd
Original Assignee
Dowa Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Mining Co Ltd filed Critical Dowa Mining Co Ltd
Priority to JP20301394A priority Critical patent/JP3541326B2/en
Publication of JPH0851296A publication Critical patent/JPH0851296A/en
Application granted granted Critical
Publication of JP3541326B2 publication Critical patent/JP3541326B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Supply And Installment Of Electrical Components (AREA)

Abstract

PURPOSE:To automatically cut the periphery of a ceramic base with any thickness and size simply and easily without necessitating manual operation or jigs by energizing a reversing means and rotating means by a control means in response to the output of a rear/front detecting means. CONSTITUTION:A chamfered part is formed at one corner of a ceramic base. When a position sensor at the chamfered part detects that the substrate is reversed, the substrate is corrected by a reversing device 3. The reversing device 3 is composed of a substrate receiving part 12 which sandwiches the leading edge of the semiconductor substrate 8, a rotating means 13, which rotates the substrate receiving part 12 at 180 deg. within the vertical plane with the semiconductor substrate 8, and a rotating means 14 which rotates 180 deg., in the vertical plane, for example, at a position that the substrate receiving part 12 is rotated 90 deg.C having the rotation radius as the axis, which is in this case, a vertical shaft. When time semiconductor substrate 8 is reversed, the leading edge of the semiconductor substrate 8 is sandwiched by the substrate receiving part 12, and the substrate receiving part 12 is rotated 130 deg. by the reversing means 13 within the vertical plane.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体基板の処理装置、
特にセラミック基体の中央部に金属板を被着せしめて成
る半導体基板の処理装置に関するものである。
BACKGROUND OF THE INVENTION The present invention relates to a semiconductor substrate processing apparatus,
In particular, the present invention relates to a semiconductor substrate processing apparatus in which a metal plate is attached to the center of a ceramic substrate.

【0002】[0002]

【従来の技術】従来の半導体基板は、所望サイズの金属
板、例えば銅板をこれより十分に大きいセラミック基体
上に被着し、研磨し、パターン付けの後セラミック基体
の周縁部を治具により折り曲げ、除去している。
2. Description of the Related Art In a conventional semiconductor substrate, a metal plate of a desired size, for example, a copper plate is applied to a ceramic base sufficiently larger than this, polished, and after patterning, the peripheral edge of the ceramic base is bent by a jig. , Have been removed.

【0003】[0003]

【発明が解決しようとする課題】然しながら、従来にお
いては上記半導体基板におけるセラミック基体の周縁部
の折り曲げ除去等は人手によって行なっており、極めて
非能率的であると共に、コスト高となる欠点があった。
However, in the prior art, the removal of the peripheral portion of the ceramic substrate in the semiconductor substrate by bending and the like is performed manually, which is extremely inefficient and costly. .

【0004】本発明は上記の欠点を除くようにしたもの
である。
The present invention is designed to eliminate the above drawbacks.

【0005】[0005]

【課題を解決するための手段】本発明の半導体基板の処
理装置は、搬送された半導体基板の裏表を検知する手段
と、半導体基板の先端部を保持し、この先端部を基点と
して垂直面内で180°回転せしめる反転手段と、上記
半導体をその回転の途中で回転半径を軸としてそのまわ
りに180°回転する回転手段と、上記反転手段及び回
転手段を上記裏表検知手段の出力に応じて付勢する制御
手段とより成る半導体基板の反転装置を有することを特
徴とする。
A semiconductor substrate processing apparatus according to the present invention is a means for detecting the front and back of a conveyed semiconductor substrate, and holds the front end of the semiconductor substrate, and the front end serves as a base point in a vertical plane. A rotating means for rotating the semiconductor by 180 ° around it, a rotating means for rotating the semiconductor by 180 ° around the rotation radius of the semiconductor in the middle of its rotation, and a reversing means and a rotating means depending on the output of the front and back detecting means. It is characterized in that it has a semiconductor substrate reversing device comprising a control means for energizing.

【0006】本発明の半導体基板の処理装置は、半導体
基板を前、後方向に移動自在に支持する搬送手段と、こ
の搬送手段の前、後及び左、右に配置したブレイクカッ
ターと、上記搬送手段の左、右に配置した右、左基板寄
せ機構と、上記半導体基板を固定する固定手段とより成
り、上記半導体基板を前、後、左、右で位置決めした状
態で上記ブレイクカッターを駆動し、上記半導体基板に
おけるセラミック基体の周縁部を切断するようにしたセ
ラミック基体周縁部切断装置を有する。
The semiconductor substrate processing apparatus according to the present invention comprises a conveying means for movably supporting the semiconductor substrate in the front and rear directions, break cutters arranged in front of, behind, left and right of the conveying means, and the conveying means. It consists of right and left substrate shifting mechanisms arranged on the left and right of the means and fixing means for fixing the semiconductor substrate, and drives the break cutter with the semiconductor substrate positioned in front, rear, left and right. And a ceramic base peripheral edge cutting device for cutting the peripheral edge of the ceramic base in the semiconductor substrate.

【0007】本発明の半導体基板の処理装置は、下方に
傾斜して延びるシューターと、このシューターの下側に
水平に配置した支持部材と、この支持部材上に突出した
傾斜ストック面を有するストックガイドと、上記シュー
ターの下端部にその表面から突出自在に設けたストッパ
ーと、上記シューターをその下端部を中心に回動自在な
らしめる回動手段とより成る半導体基板ストック装置を
有する。
A semiconductor substrate processing apparatus according to the present invention is a stock guide having a shooter extending obliquely downward, a support member horizontally arranged below the shooter, and an inclined stock surface protruding above the support member. And a semiconductor substrate stocking device comprising a stopper provided at the lower end of the shooter so as to project from the surface of the shooter, and a rotating means for making the shooter rotatable about the lower end thereof.

【0008】[0008]

【実施例】以下図面によって本発明の実施例を説明す
る。
Embodiments of the present invention will be described below with reference to the drawings.

【0009】図1及び図2は本発明の半導体基板の処理
装置を示し、1はパターン付けのためのエッチング機、
2はエスケープ機構部、3は反転装置、4はセラミック
基体周縁部切断装置、5は半導体基板ストック装置であ
る。
1 and 2 show a semiconductor substrate processing apparatus of the present invention, in which 1 is an etching machine for patterning,
Reference numeral 2 is an escape mechanism portion, 3 is a reversing device, 4 is a peripheral edge cutting device for a ceramic substrate, and 5 is a semiconductor substrate stocking device.

【0010】図3は、金属板、例えば銅板6と、これを
被着した上記銅板6より十分に大きいセラミック基体7
とより成る半導体基板8を示し、上記セラミック基体7
は上記銅板6の外周より例えば5mm大きい枠部分に切
断用割り溝9を有し、上記銅板6に対するパターン付け
のためのエッチング処理後上記割り溝9の部分で上記セ
ラミック基体7の周縁部10が折り曲げ、除去される。
FIG. 3 shows a metal plate, for example, a copper plate 6 and a ceramic substrate 7 which is sufficiently larger than the copper plate 6 to which the copper plate 6 is attached.
The semiconductor substrate 8 consisting of
Has a slit groove 9 for cutting in a frame portion larger than the outer circumference of the copper plate 6 by, for example, 5 mm, and after the etching treatment for patterning the copper plate 6, the peripheral edge portion 10 of the ceramic substrate 7 is located at the portion of the slit groove 9. Bent and removed.

【0011】また、このようにした半導体基板8はエッ
チング処理に際し表,裏が逆になる場合もあり、その後
の処理に支障をきたすようになる。
Further, the semiconductor substrate 8 thus formed may be turned upside down during the etching process, which hinders subsequent processes.

【0012】従って本発明においては上記セラミック基
体7の一つのコーナーに面取り11を形成し、この面取
り11の位置をセンサー(図示せず)により検出して基
板が裏向きになっていると判定された場合、上記反転装
置3によって補正せしめる。
Therefore, in the present invention, a chamfer 11 is formed at one corner of the ceramic substrate 7, and the position of the chamfer 11 is detected by a sensor (not shown) to determine that the substrate is face down. If it is, the reversing device 3 corrects it.

【0013】本発明の上記反転装置3は、図1に示すよ
うに半導体基板8の先端部を挾持する基板受け12と、
この基板受け12を半導体基板8と共に垂直面内で18
0°回転する反転手段13と、上記基板受け12を垂直
面内で例えば90°回転した位置で、回転半径を軸とし
て、この場合には垂直となった軸のまわりに180°回
転する回転手段14とより成り、上記センサーによって
半導体基板8の向きが反対となっていると判定された場
合には、上記半導体基板8の先端を基板受け12によっ
て挾持した後、この基板受け12を上記反転手段13に
より垂直面内で180°回転せしめる。これにより半導
体基板8の向きが正常となる。
As shown in FIG. 1, the reversing device 3 of the present invention includes a substrate receiver 12 for holding the tip of the semiconductor substrate 8, and
This substrate holder 12 is placed together with the semiconductor substrate 8 in a vertical plane.
The reversing means 13 which rotates by 0 °, and the rotating means which rotates the substrate receiver 12 by, for example, 90 ° in a vertical plane, and which rotates by 180 ° around the axis that is vertical in this case with the radius of rotation as an axis. When the sensor determines that the semiconductor substrate 8 is oriented in the opposite direction, the front end of the semiconductor substrate 8 is held by the substrate receiver 12, and then the substrate receiver 12 is rotated by the inversion means. Rotate 180 ° in the vertical plane by 13. As a result, the orientation of the semiconductor substrate 8 becomes normal.

【0014】また、上記半導体基板8の向きが正常であ
ると判定された場合には、半導体基板8を上記基板受け
12によって垂直面内で例えば90°回動して垂直なら
しめた状態で、上記回転手段14により上記基板受け1
2を半導体基板8と共に回転半径を軸として、この場合
には垂直となった軸の周りに180°回転し、その後上
記反転手段13によって上記基板受け12を更に垂直面
内で90°回動して上記セラミック基体周縁部切断装置
4に送るようにする。この場合には半導体基板8の向き
は正常のままとなる。
When it is determined that the semiconductor substrate 8 is in the normal orientation, the semiconductor substrate 8 is rotated by, for example, 90 ° in the vertical plane by the substrate receiver 12, and is vertically aligned. The substrate receiver 1 by the rotating means 14
2 together with the semiconductor substrate 8 about the radius of gyration as an axis and rotated by 180 ° around an axis which is vertical in this case, and then the substrate receiver 12 is further rotated by 90 ° in the vertical plane by the reversing means 13. And sends it to the peripheral edge cutting device 4 of the ceramic substrate. In this case, the orientation of the semiconductor substrate 8 remains normal.

【0015】本発明のセラミック基体周縁部切断装置4
は、図4及び図5に示すように水平方向に順次に配列さ
れた基板投入コンベアー15と、ブレイクコンベアー1
6と、基板排出コンベアー17と、上記基板投入コンベ
アー15とブレイクコンベアー16間に介挿した基板ス
トッパー18及び上流側ブレイクカッター19と、上記
ブレイクコンベアー16と基板排出コンベアー17間に
介挿した下流側ブレイクカッター20と、上記ブレイク
コンベアー16の幅方向の左右に夫々配置した左方ブレ
イクカッター21及び右方ブレイクカッター22、及び
幅方向に移動自在な右基板寄せ機構23及び左基板寄せ
機構24と、上記ブレイクコンベアー16の上方に配置
した基板押え25と、上記基板ストッパー18、ブレイ
クカッター19〜22及び基板押え25を夫々駆動する
シリンダー26〜31とにより構成する。
Peripheral cutting device 4 for ceramic substrate of the present invention
Is a substrate loading conveyor 15 and a break conveyor 1 which are sequentially arranged in a horizontal direction as shown in FIGS.
6, a substrate discharge conveyor 17, a substrate stopper 18 and an upstream break cutter 19 inserted between the substrate loading conveyor 15 and the break conveyor 16, and a downstream side interposed between the break conveyor 16 and the substrate discharge conveyor 17. A break cutter 20, a left break cutter 21 and a right break cutter 22, which are respectively arranged on the left and right in the width direction of the break conveyor 16, and a right board moving mechanism 23 and a left board moving mechanism 24 which are movable in the width direction. It is composed of a substrate retainer 25 arranged above the break conveyor 16, and cylinders 26 to 31 for driving the substrate stopper 18, the break cutters 19 to 22 and the substrate retainer 25, respectively.

【0016】なお、上記ブレイクコンベアー16は、例
えば搬送方向と直角方向に延びる軸を有し、搬送方向に
互いに離間した複数のローラーより成るローラーコンベ
アーであり、上記右、左基板寄せ機構23,24は、例
えば上記ローラー間を通って左、右方向に移動自在な棒
状体である。
The break conveyer 16 is, for example, a roller conveyer having a shaft extending in a direction perpendicular to the carrying direction and comprising a plurality of rollers spaced from each other in the carrying direction. The right and left substrate shifting mechanisms 23, 24 are provided. Is, for example, a rod-shaped body that can move between the rollers in the left and right directions.

【0017】本発明のセラミック基体周縁部切断装置4
は上記のような構成であるから、反転装置3を介して基
板投入コンベアー15に送られた半導体基板8を、スト
ッパー上下シリンダー26によって基板ストッパー18
を下動して停止せしめ、送り方向に整列せしめる。
Peripheral cutting device 4 for ceramic substrate of the present invention
Has the above-mentioned configuration, the semiconductor substrate 8 sent to the substrate loading conveyor 15 via the reversing device 3 is transferred to the substrate stopper 18 by the stopper upper and lower cylinders 26.
Move down to stop and align in the feed direction.

【0018】次いで上記基板ストッパー18を開き、半
導体基板8を基板投入コンベアー15及びブレイクコン
ベアー16によって移動し、下流側ブレイクカッター2
0によって半導体基板8のセラミック基体7の先端を位
置決めし、右基板寄せ機構23によってセラミック基体
7の右端を右方ブレイクカッター22に押し付け、これ
によってセラミック基体7の前端及び右端を位置決め
し、基板押えシリンダー31を付勢し、基板押え25を
下降して基板8を固定する。
Next, the substrate stopper 18 is opened, the semiconductor substrate 8 is moved by the substrate loading conveyor 15 and the break conveyor 16, and the downstream break cutter 2 is moved.
0, the tip of the ceramic substrate 7 of the semiconductor substrate 8 is positioned, and the right substrate moving mechanism 23 presses the right end of the ceramic substrate 7 against the right break cutter 22, thereby positioning the front end and the right end of the ceramic substrate 7, and pressing the substrate. The cylinder 31 is urged and the substrate retainer 25 is lowered to fix the substrate 8.

【0019】この状態でシリンダー28,30によりブ
レイクカッター20,22を上昇してセラミック基体7
の前端及び右端の周縁部10を割り溝9の部分で切断す
る。
In this state, the cylinders 28 and 30 raise the break cutters 20 and 22 to raise the ceramic substrate 7.
The peripheral edge portions 10 at the front end and the right end are cut at the split groove 9.

【0020】次いで基板押え25を上動し、ブレイクコ
ンベアー16によって半導体基板8を上流側ブレイクカ
ッター19に向かって逆走してセラミック基体7の後端
を位置決めし、また、左基板寄せ機構24によってセラ
ミック基体7の左端を左方ブレイクカッター21に押し
付けて位置決めし、ブレイクカッター19、21により
上記と同様の操作で残りの周縁部10を切断せしめる。
Next, the substrate retainer 25 is moved upward, the semiconductor substrate 8 is moved backward by the break conveyor 16 toward the upstream break cutter 19, and the rear end of the ceramic substrate 7 is positioned. The left end of the ceramic base 7 is pressed against the left break cutter 21 to be positioned, and the remaining peripheral edge portion 10 is cut by the break cutters 19 and 21 in the same manner as described above.

【0021】周縁部切断終了後、半導体基板8を基板排
出コンベアー17によって半導体基板ストック装置5に
供給する。
After the cutting of the peripheral portion, the semiconductor substrate 8 is supplied to the semiconductor substrate stocking device 5 by the substrate discharge conveyor 17.

【0022】本発明の半導体基板ストック装置5は、図
6に示すように基板排出コンベアー17の下流端から下
方に傾斜して延びるシューター32と、このシューター
32の下側に水平に配置した遊動ベルトコンベアー33
と、このベルトコンベアー33のベルト34の上側走行
部分の上流側に突出して設けた、半導体基板8を斜めに
保持するためのストックガイド35と、上記シューター
32の下端部にその表面から突出自在に設けたストッパ
ー36と、このストッパー36を上記表面から回動して
引き込めるための回動枢支軸37と、上記シューター3
2の裏面に対接し、上記シューターをその下端を基点と
して傾動せしめるための基板押し出しブロック38と、
この基板押し出しブロック38の駆動シリンダー39と
より成る。
As shown in FIG. 6, the semiconductor substrate stocking device 5 of the present invention comprises a shooter 32 extending downward from the downstream end of the substrate discharge conveyor 17 and a floating belt horizontally arranged below the shooter 32. Conveyor 33
And a stock guide 35 projecting upstream of the upper running portion of the belt 34 of the belt conveyor 33 for obliquely holding the semiconductor substrate 8 and a lower end portion of the shooter 32 projecting freely from the surface thereof. The stopper 36 provided, a pivot shaft 37 for pivoting and retracting the stopper 36 from the surface, and the shooter 3
A substrate extruding block 38 which is in contact with the back surface of 2 and tilts the shooter with its lower end as a base point;
It is composed of a drive cylinder 39 of the substrate pushing block 38.

【0023】なお、本発明の半導体基板ストック装置5
においては、シューター32にガイドされて下降した半
導体基板8は、ストッパー36により停止せしめ、その
後上記ストッパー36を上記回動枢支軸37を中心とし
て回動することによってシューター32の表面から引き
込め半導体基板8の下端が上記ベルト34迄下降し保持
されるようにする。
The semiconductor substrate stocking device 5 of the present invention
, The semiconductor substrate 8 lowered by being guided by the shooter 32 is stopped by the stopper 36, and then the stopper 36 is rotated about the rotation pivot shaft 37 to retract from the surface of the shooter 32. The lower end of the substrate 8 is lowered to and held by the belt 34.

【0024】また、この状態で駆動シリンダー39を付
勢して基板押し出しブロック38を水平方向に前進せし
め、この結果シューター32がその下端を基点として図
6において時計方向に垂直ラインを越えて回動されるよ
うにする。
Further, in this state, the drive cylinder 39 is urged to move the substrate pushing block 38 forward in the horizontal direction, and as a result, the shooter 32 pivots in the clockwise direction in FIG. To be done.

【0025】本発明の半導体基板ストック装置5は上記
のような構成であるから、基板排出コンベアー17から
シューター32上に供給された半導体基板8はシュータ
ー32の回動によってストックガイド35の傾斜ストッ
ク面により斜めに保持され、順次半導体基板8がベルト
34上に斜めに積層された状態となる。
Since the semiconductor substrate stocking device 5 of the present invention has the above-mentioned structure, the semiconductor substrate 8 supplied from the substrate discharge conveyor 17 onto the shooter 32 is rotated by the shooter 32 so that the stock guide 35 has an inclined stock surface. Thus, the semiconductor substrates 8 are held obliquely, and the semiconductor substrates 8 are sequentially stacked on the belt 34 obliquely.

【0026】なお、40は上記ベルト34を遊動自在に
支持するローラー、41はベルト34の上方走行部分を
撓まないように支持するベルトガイド、42はベルト3
4に張力を加えるための張力印加手段である。
Reference numeral 40 is a roller for movably supporting the belt 34, 41 is a belt guide for supporting the upper running portion of the belt 34 so as not to bend, and 42 is the belt 3
4 is a tension applying means for applying a tension to 4.

【0027】[0027]

【発明の効果】本発明の半導体基板の処理装置は上記の
ような構成であるから、反転装置3により半導体基板を
常時正しい向きでセラミック基体周縁部切断装置4に供
給でき、ここで人手や治具を用いることなくいかなる厚
さ、サイズのものでも簡単且つ容易に自動的にセラミッ
ク基体周縁部を切断でき、更に処理後の半導体基板8を
半導体基板ストック装置5により、そのベルト34上に
斜めに傾斜して載置するようにしたので各半導体基板8
として厚さやサイズの異なったものが混入していてもそ
の保持は容易であり、ストック用のカセットが不要であ
り、また半導体基板をストッパー36で一端停止した後
ベルト34上に突き当たるようにしたので落下する半導
体基板の端部によって、ストックされている半導体基板
が傷付く等のおそれが全く無い大きな利益がある。
Since the semiconductor substrate processing apparatus of the present invention is constructed as described above, the semiconductor substrate can always be supplied to the ceramic substrate peripheral edge cutting apparatus 4 in the correct direction by the reversing apparatus 3, where the manual operation and the curing are performed. The peripheral edge of the ceramic substrate can be easily and easily cut automatically with any thickness and size without using a tool, and the processed semiconductor substrate 8 is obliquely placed on the belt 34 by the semiconductor substrate stocking device 5. Since each of the semiconductor substrates 8 is mounted so as to be inclined.
As a result, even if different thicknesses and sizes are mixed, it is easy to hold them, a cassette for stock is not required, and the semiconductor substrate is once stopped by the stopper 36 and then abutted on the belt 34. There is a great advantage that there is no possibility that the stocked semiconductor substrates will be scratched by the edges of the falling semiconductor substrates.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の半導体処理装置の正面図である。FIG. 1 is a front view of a semiconductor processing apparatus of the present invention.

【図2】本発明の半導体処理装置の平面図である。FIG. 2 is a plan view of a semiconductor processing apparatus of the present invention.

【図3】本発明の半導体処理装置によって処理する半導
体基板の平面図である。
FIG. 3 is a plan view of a semiconductor substrate processed by the semiconductor processing apparatus of the present invention.

【図4】本発明のセラミック基体周縁部切断装置の正面
図である。
FIG. 4 is a front view of a ceramic base peripheral edge cutting device of the present invention.

【図5】本発明のセラミック基体周縁部切断装置の側面
図である。
FIG. 5 is a side view of the ceramic base peripheral edge cutting device of the present invention.

【図6】本発明の半導体基板ストック装置の正面図であ
る。
FIG. 6 is a front view of the semiconductor substrate stocking device of the present invention.

【符号の説明】[Explanation of symbols]

1 エッチング機 2 エスケープ機構部 3 反転装置 4 セラミック基体周縁部切断装置 5 半導体基板ストック装置 6 銅板 7 セラミック基体 8 半導体基板 9 切断用割り溝 10 周縁部 11 面取り 12 基板受け 13 反転手段 14 回転手段 15 基板投入コンベアー 16 ブレイクコンベアー 17 基板排出コンベアー 18 基板ストッパー 19 上流側ブレイクカッター 20 下流側ブレイクカッター 21 左方ブレイクカッター 22 右方ブレイクカッター 23 右基板寄せ機構 24 左基板寄せ機構 25 基板押え 26 シリンダー 27 シリンダー 28 シリンダー 29 シリンダー 30 シリンダー 31 シリンダー 32 シューター 33 ベルトコンベアー 34 ベルト 35 ストックガイド 36 ストッパー 37 回動枢支軸 38 基板押し出しブロック 39 駆動シリンダー 40 ローラー 41 ベルトガイド 42 張力印加手段 DESCRIPTION OF SYMBOLS 1 Etching machine 2 Escape mechanism part 3 Reversing device 4 Ceramic substrate peripheral edge cutting device 5 Semiconductor substrate stocking device 6 Copper plate 7 Ceramic substrate 8 Semiconductor substrate 9 Cutting slit 10 Peripheral edge 11 Chamfering 12 Substrate receiving 13 Reversing means 14 Rotating means 15 Substrate loading conveyor 16 Break conveyor 17 Substrate discharging conveyor 18 Substrate stopper 19 Upstream side break cutter 20 Downstream side break cutter 21 Left side break cutter 22 Right side break cutter 23 Right side board moving mechanism 24 Left side board moving mechanism 25 Board pressing 26 cylinder 27 cylinder 28 Cylinder 29 Cylinder 30 Cylinder 31 Cylinder 32 Shooter 33 Belt Conveyor 34 Belt 35 Stock Guide 36 Stopper 37 Rotating Pivot Shaft 38 Board Push Out block 39 drives the cylinder 40 roller 41 belt guide 42 tensioning means

───────────────────────────────────────────────────── フロントページの続き (72)発明者 田中 敏和 東京都千代田区丸の内一丁目8番2号 同 和鉱業株式会社内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Toshikazu Tanaka 1-8-2 Marunouchi, Chiyoda-ku, Tokyo Dowa Mining Co., Ltd.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 搬送された半導体基板の裏表を検知する
手段と、半導体基板の先端部を保持し、この先端部を基
点として垂直面内で180°回転せしめる反転手段と、
上記半導体をその回転の途中で回転半径を軸としてその
まわりに180°回転する回転手段と、上記反転手段及
び回転手段を上記裏表検知手段の出力に応じて付勢する
制御手段とより成る半導体基板の反転装置を有すること
を特徴とする半導体基板の処理装置。
1. A means for detecting the front and back of a conveyed semiconductor substrate, and a reversing means for holding the front end of the semiconductor substrate and rotating the front end by 180 ° in a vertical plane with the front end as a reference point.
A semiconductor substrate comprising rotating means for rotating the semiconductor about the radius of gyration by 180 ° around it in the course of rotation, and control means for urging the reversing means and the rotating means according to the output of the front and back detecting means. An apparatus for processing a semiconductor substrate, comprising:
【請求項2】 半導体基板を前、後方向に移動自在に支
持する搬送手段と、この搬送手段の前、後及び左、右に
配置したブレイクカッターと、上記搬送手段の左、右に
配置した右、左基板寄せ機構と、上記半導体基板を固定
する固定手段とより成り、上記半導体基板を前、後、
左、右で位置決めした状態で上記ブレイクカッターを駆
動し、上記半導体基板におけるセラミック基体の周縁部
を切断するようにしたセラミック基体周縁部切断装置を
有することを特徴とする半導体基板の処理装置。
2. A conveying means for supporting a semiconductor substrate so as to be movable forward and backward, a break cutter arranged in front of, behind, left and right of this conveying means, and arranged on the left and right of the conveying means. It consists of a right and left substrate shifting mechanism and a fixing means for fixing the semiconductor substrate.
An apparatus for processing a semiconductor substrate, comprising a ceramic base peripheral edge cutting device configured to drive the break cutter in a state of being positioned on the left and right to cut the peripheral edge of the ceramic base in the semiconductor substrate.
【請求項3】 下方に傾斜して延びるシューターと、こ
のシューターの下側に水平に配置した支持部材と、この
支持部材上に突出した傾斜ストック面を有するストック
ガイドと、上記シューターの下端部にその表面から突出
自在に設けたストッパーと、上記シューターをその下端
部を中心に回動自在ならしめる回動手段とより成る半導
体基板ストック装置を有することを特徴とする半導体基
板の処理装置。
3. A shooter extending obliquely downward, a support member horizontally arranged below the shooter, a stock guide having an inclined stock surface protruding above the support member, and a lower end portion of the shooter. An apparatus for processing a semiconductor substrate, comprising: a semiconductor substrate stocking device comprising a stopper provided so as to project from the surface thereof and a rotating means for making the shooter rotatable about its lower end.
JP20301394A 1994-08-05 1994-08-05 Semiconductor substrate processing equipment Expired - Fee Related JP3541326B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20301394A JP3541326B2 (en) 1994-08-05 1994-08-05 Semiconductor substrate processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20301394A JP3541326B2 (en) 1994-08-05 1994-08-05 Semiconductor substrate processing equipment

Publications (2)

Publication Number Publication Date
JPH0851296A true JPH0851296A (en) 1996-02-20
JP3541326B2 JP3541326B2 (en) 2004-07-07

Family

ID=16466898

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20301394A Expired - Fee Related JP3541326B2 (en) 1994-08-05 1994-08-05 Semiconductor substrate processing equipment

Country Status (1)

Country Link
JP (1) JP3541326B2 (en)

Also Published As

Publication number Publication date
JP3541326B2 (en) 2004-07-07

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