JPH0855722A - Corrosion resistant high saturation magnetic flux density magnetic film and magnetic head using the same - Google Patents

Abstract

PURPOSE:To obtain a magnetic film which has a high saturation magnetic flux density, excellent soft magnetic characteristics, a excellent corrosion resistance, and an excellent wear resistance. CONSTITUTION:A magnetic film has a composition expressed by a chemical formula, FeaSicTdZeZg, wherein T represents at least one element selected from among Ti, Zi, Hf, Nb, Ta, Mo, and W, X represents at least one element selected from among Ru, Rh, Os, Ir, Pd, and Pt, Z represents at least one element selected from C and N, a, c, d, e, and g represent atomic percentages and they satisfy relations, 5<=c<=20, 2<=d<=20, 0.5<=e<=15, and 1<=g<=20 and a+c+d+e+g=100.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic film having a high saturation magnetic flux density, a high magnetic permeability, a low magnetostriction constant, and excellent corrosion resistance and wear resistance, and particularly to a head core material for a magnetic disk device or a VTR. And a magnetic film suitable for. Further, the present invention relates to a highly reliable magnetic head and magnetic recording device using this magnetic film.

[0002]

2. Description of the Related Art In recent years, the progress of high-density magnetic recording is remarkable,
Due to the increase in recording density, devices are becoming smaller and higher in performance. In order to further increase the recording density, it is necessary to use a medium having a high coercive force, and to generate a sufficiently recordable magnetic field, use a magnetic material having a high saturation magnetic flux density as the core material of the magnetic head. . As such magnetic materials, Co-based amorphous alloys, FeAlSi-based (sendust) alloys, etc. have been used. Furthermore, JP-A-3-2
Fe (Ti, Zr, H
f, Nb, Ta, Mo, W) C, a magnetic alloy containing a relatively large amount of carbon as represented by the composition formula of
No. 275605, Fe (Zr, H
f, Ti, Nb, Ta, V, Mo, W) N magnetic alloys containing a relatively large amount of nitrogen as represented by the composition formula have been proposed.

[0003]

Co-based amorphous alloys and FeAlSi-based alloy magnetic films have saturation magnetic flux densities of 1.1-
In contrast to 1.3T, the carbon-based or nitrogen-based alloy magnetic film has a high saturation magnetic flux density of 1.5 to 1.6T. However, as a result of evaluating the corrosion resistance, the above-mentioned carbon-based and nitrogen-based alloy magnetic films have a problem with the corrosion resistance, and corrosion occurs during the magnetic head manufacturing process, or dew condensation occurs on the magnetic head surface, or chlorine ions are present. It became clear that corrosion may occur easily in the environment.

When these magnetic films are applied to a VTR head, in addition to a high saturation magnetic flux density for improving recording characteristics, a high magnetic permeability, a low coercive force, and a soft magnetic field are realized in order to realize excellent reproducing characteristics. Characteristics are required. Furthermore, internal stress when formed by a thin film manufacturing method such as a sputtering method on the head substrate, processing stress received during processing of the magnetic head,
It is necessary that the absolute value of the magnetostriction constant is small so that the magnetic characteristics do not deteriorate due to thermal stress. Further, since the magnetic head slides on the magnetic tape, wear resistance is also required.

An object of the present invention is to provide a magnetic film having high saturation magnetic flux density, high magnetic permeability, low coercive force, low magnetostriction constant and excellent corrosion resistance and wear resistance as described above, and a magnetic head using the same. Especially.

[0006]

Means for Solving the Problems As a result of intensive investigations by the present inventors for improving the corrosion resistance of the above-mentioned carbon-based and nitrogen-based alloy magnetic films, the addition of Cr improves the corrosion resistance of these alloys. Found to get. However, Cr
When a large amount of is added, there arises a problem that the saturation magnetic flux density is reduced. to solve this problem,
Further, as a result of studying additional elements that improve the corrosion resistance, it was found that the addition of platinum group elements such as Ru and Rh has a great effect on the improvement of the corrosion resistance. Thus, R
Addition of white metal elements such as u and Rh greatly improves the corrosion resistance of the above carbon-based and nitrogen-based alloys. However, when these platinum group elements are added or when Cr is added, the problem that the magnetostriction constant increases remarkably occurs.
In order to solve this problem, the inventors of the present invention have conducted extensive studies on an element capable of reducing the magnetostriction constant, and as a result, have Fe as a main component and transition metal elements such as Ti, Zr, Hf, Ta, and Nb, and carbon and nitrogen. It was found that the magnetostriction constant can be reduced by adding Si to the alloy film containing the platinum group element.

According to the present invention, as described above, a magnetic film having a high saturation magnetic flux density, high magnetic permeability and low coercive force, excellent corrosion resistance and wear resistance, and a magnetic head using the same are provided. In addition, a magnetic film having the composition shown in the following (1) to (4) is used.

[0008] (1) the composition _{formula: Fe a Si c T d X} e Z g magnetic film having a composition represented by. However, T is Ti, Zr, H
At least one element selected from the group consisting of f, Nb, Ta, Mo and W, and X is Ru, Rh, Os, Ir, Pd, Pt.
At least one element selected from the group C, N is at least one element selected from the group C and N,
c, d, e and g represent atomic% and 5 ≦ c ≦ 20 and 2 ≦ d
≦ 20, 0.5 ≦ e ≦ 15, 1 ≦ g ≦ 20, and a +
c + d + e + g = 100.

[0009] (2) the composition _{formula: Fe a Si c T d X} e Y f Z g
A magnetic film having a composition represented by: However, T is Ti, Z
At least one element selected from the group consisting of r, Hf, Nb, Ta, Mo and W, X is Ru, Rh, Os, Ir, P
at least one element selected from the group of d and Pt, Y at least one element selected from Cr and Al, and Z at least one element selected from the group C and N, wherein a, c, d, e, f and g represent atomic% and 5 ≦ c ≦
20, 2 ≤ d ≤ 20, 0.5 ≤ e ≤ 15, f ≤ 15, 1
≦ g ≦ 20, and a + c + d + e + f + g = 100,
Is.

[0010] (3) the composition _{formula: Fe a M b Si c T} d X e Z g
A magnetic film having a composition represented by: However, M is Co, Ni
At least one of the elements selected from the group, T is Ti, Z
At least one element selected from the group consisting of r, Hf, Nb, Ta, Mo and W, X is Ru, Rh, Os, Ir, P
At least one element selected from the group of d and Pt, Z is at least one element selected from the group of C and N, and a, b, c, d, e and g represent atomic%, and b ≦ 1
5, 5 ≤ c ≤ 20, 2 ≤ d ≤ 20, 0.5 ≤ e ≤ 15,
1 ≦ g ≦ 20 and a + b + c + d + e + g = 10
0.

[0011] (4) the composition _{formula: Fe a M b Si c T} d X e Y f Z
A magnetic film having a composition represented by _g . However, M is Co, N
At least one element selected from the group of i, T is Ti,
At least one element selected from the group of Zr, Hf, Nb, Ta, Mo and W, X is Ru, Rh, Os, Ir and P
d, at least one element selected from the group of Pt, Y is at least one element selected from the group of Cr and Al, Z
Is at least one element selected from the group of C and N, a, b, c, d, e and g represent atomic%, and b ≦ 1
5, 5 ≤ c ≤ 20, 2 ≤ d ≤ 20, 0.5 ≤ e ≤ 15,
f ≦ 15, 1 ≦ g ≦ 20, and a + b + c + d + e +
f + g = 100.

In the above magnetic films (1) to (4), X
Is preferably at least one element selected from the group consisting of Ru, Rh, Ir and Os. Further, in any of the above magnetic films, the concentration of the element X is more preferably in the range of 3 ≦ e ≦ 15, further preferably in the range of 3 ≦ e ≦ 10. The Si concentration is more preferably in the range of 10 ≦ c ≦ 15. The concentration of the element T is more preferably in the range of 2 ≦ d ≦ 10. The concentration of the element Z is more preferably in the range of 3 ≦ g ≦ 10. The concentration of the element Y is more preferably f ≦ 10. The concentration of the element M is more preferably b ≦ 10. When the element Y is added in addition to the element X, the sum of the concentrations is preferably 15% or less. When the element M is added in addition to the element X, the sum of the concentrations is preferably 15% or less. When the element Y and the element M are added in addition to the element X, the sum of the concentrations thereof is preferably 15% or less.

The alloy magnetic film of the present invention is produced by a thin film forming technique such as a sputtering method or a vacuum evaporation method. In particular, it is preferably manufactured by a sputtering method such as a bipolar sputtering method, a magnetron sputtering method or an ion beam sputtering method. After forming the magnetic film,
Heat treatment is performed at a temperature of 400 ° C. or higher. The average crystal grain size in the magnetic film is 50 nm or less, more preferably 20 nm or less.

The magnetic head is formed by using the above-mentioned magnetic film in at least a part of the magnetic core near the cap. This magnetic head can be used as a thin film magnetic head for a magnetic disk. Further, it can be used for a MIG head used for a magnetic disk and a VTR, in which a high saturation magnetic flux density magnetic film is formed on a gap surface of a ferrite head. Further, it can be used for a VTR composite head in which a high saturation magnetic flux density magnetic film is formed near the gap of the ferrite head so that the interface between the ferrite and the magnetic film is not parallel to the gap surface. Further, it can be used as a magnetic head for a VTR by forming a magnetic film on a non-magnetic substrate to form a magnetic path. The magnetic film is 1 μm
Since the above thick film exhibits preferable magnetic characteristics, it is suitable for a VTR head that requires a thick magnetic film.

In the magnetic recording apparatus, by using at least one of the above magnetic heads, in an environment where corrosion is particularly problematic, for example, an environment where high humidity is experienced or an environment where corrosive substances such as chlorine ions are present. Therefore, the reliability of the device operation can be significantly increased.

[0016]

The transition metal T composed of Ti, Zr, Hf, Nb, Ta, Mo and W is C or N by heat treatment after forming the magnetic film.
Binds with and mainly precipitates at Fe crystal grain boundaries to suppress crystal growth. As a result, the magnetic film is at least 50 nm or less,
Usually, it has a structure composed of fine crystal grains of about 20 nm or less, and it becomes a magnetic film having a high magnetic permeability, a low coercive force, and an excellent soft magnetic property, and exhibits high heat resistance. In order to obtain this effect, the total concentration of the transition metal T needs to be 2% (atomic%, the same applies hereinafter) or more. On the other hand, when the total concentration of T is increased, the saturation magnetic flux density decreases. Further, when the total concentration of T is high and the amount of T component that does not bind to C or N is increased, deterioration of soft magnetic characteristics and deterioration of corrosion resistance are observed. Therefore, the total concentration of T needs to be 20% or less, and more preferably 10% or less.

The element group Z composed of C or N is combined with the transition metal T as described above and contributes to the refinement of crystal grains.
To obtain this effect, a total concentration of 1% or more, preferably 3% or more is required. If the concentration is made too high, the saturation magnetic flux density will decrease, and the internal stress at the time of film formation will increase, causing peeling of the magnetic film, substrate cracking, etc., so the concentration is preferably 20% or less, more preferably Is 1
It should be 0% or less.

The element group X consisting of Ru, Rh, Os, Ir, Pt and Pd increases the corrosion resistance of the crystal grains containing Fe as a main component. Moreover, the addition may not cause the saturation magnetic flux density to be lowered so much, and may rather increase the saturation magnetic flux density. In order to obtain the effect of improving the corrosion resistance, the concentration of X is 0.
It should be 5% or more, and preferably 3% or more in order to enhance the effect of improving the corrosion resistance. However, X
Since the magnetostriction constant increases remarkably when the number of elements is increased, the addition amount must be 15% or less, more preferably 10% or less. Among these elements, Ru, Rh, I
r or Os is particularly effective in improving the corrosion resistance.

The addition of Al or Cr as the Y element group in addition to the X element group is effective for improving the corrosion resistance. However, addition of these elements lowers the saturation magnetic flux density and increases the magnetostriction constant, so the addition amount must be 15% or less, preferably 10% or less. Further, when the Y element group is added in addition to the X element group, the magnetostriction constant increases when the sum of these concentrations is large. Therefore, the sum of the X element group and the Y element group should be 15% or less. Is preferred.

The element group M composed of Co and Ni has the effects of increasing the saturation magnetic flux density and also improving the corrosion resistance. However, since these elements also increase the magnetostriction constant as they are added, the addition amount must be 15% or less, preferably 10% or less. In addition, when the element group M is added in addition to the element group X, the magnetostriction constant increases when the sum of these concentrations is large. Therefore, the sum of the X element group and the M element group may be set to 15% or less. preferable. Further, when the element groups Y and M are added in addition to the element group X, the magnetostriction constant increases when the sum of these concentrations is large, so that the X element group, Y
The total sum of the element group and the M element group is preferably 15% or less.

Si has the effect of reducing the magnetostriction constant, but since this effect is produced from a relatively large amount of addition, it is necessary to add at least 5% or more.
It is preferably 0% or more. However, if the addition amount is too large, the saturation magnetic flux density is largely reduced. Therefore, the addition amount needs to be 20% or less, and more preferably 15% or less.

After the magnetic film is formed, a heat treatment is carried out at a temperature of 400 ° C. or higher, and at least about 50 nm containing Fe as a main component is formed due to the film structure in which the respective elements are dispersed almost uniformly.
After that, the structure usually changes to a structure in which a fine crystal grain of about 20 nm or less and a fine compound of the element group T and N or / and C exist around the crystal grain, and the soft magnetic property of high magnetic permeability and low coercive force. And the properties of low magnetostriction constant, high saturation magnetic flux density and high heat resistance are developed.

[0023]

The present invention will be described in detail below with reference to examples. Example 1 A magnetic film was produced using a high frequency bipolar sputtering device. The sputtering conditions are as follows. Sputtering gas Ar or Ar + N ₂ Gas pressure during sputtering 0.66 Pa High frequency power 400 W Target substrate distance 50 mm Substrate temperature 50 to 100 ° C. (water cooling)

In the present example, films of various compositions were prepared using a composite target in which chips of the additional element were attached to the Fe target. When N was added, the N concentration was changed by controlling the ratio of N _{2 in} the sputtering gas. Crystallized glass with a diameter of 10 mm was used for the substrate, and the film thickness of the magnetic film was about 2 μm. After the film was formed, heat treatment was performed in an Ar gas atmosphere at 575 ° C. for 1 hour to measure magnetic properties and perform a corrosion resistance test. The composition of the magnetic film is EPMA
Method, the saturation magnetic flux density was measured using a sample vibrating magnetometer (VSM), the coercive force was measured using a BH curve tracer and VSM, the magnetostriction constant was measured using an optical lever method, and the magnetic permeability was measured using a figure-8 coil method. The corrosion resistance was evaluated by immersing the sample in a 1/2 normal NaCl aqueous solution and measuring the time from the immersion until the start of corrosion as the corrosion resistance time. In addition,
The initiation of corrosion was judged by observation with an optical microscope when the ratio of the area of the corroded portion to the surface area of the sample exceeded 0.1%. The results are shown in Table 1.

[0025]

[Table 1]

As shown in Table 1, FeTa of Comparative Examples 1 to 3
The C, FeZrN, FeHfC magnetic film has a large saturation magnetic flux density of 1.5 to 1.6 T, a small coercive force and a magnetostriction constant, and exhibits excellent magnetic characteristics. However, 1/2 normal Na
Corrosion occurrence time when immersed in Cl solution is 0.
Corrosion easily occurred for 1 hour, and there was a problem in corrosion resistance. Further, the sample of Comparative Example 4 in which Cr is added to improve the corrosion resistance of these magnetic films has an effect of improving the corrosion resistance but is not sufficient, and Comparative Example 5 in which Cr or Al is added in a large amount.
The samples of Nos. 6 and 6 had significantly improved corrosion resistance, and no corrosion occurred even after 100 hours of immersion, but the saturation magnetic flux density was 1.
It was significantly reduced to less than 3T, and the magnetostriction constant was significantly increased to 5 to 8 × 10 ^-6 .

In the magnetic film of this example, sample numbers 1 to 12 were used.
As described above, by adding Ru, Rh, Ir, Os, Pd, and Pt, the corrosion resistance time was significantly improved to 10 hours or more, and by adding Si, the absolute value of the magnetostriction constant was 4 ×. 10 ^-6 or less, 2 × 1 in most cases
0 ^-6 have the following small value, it was possible to obtain a magnetic film further has a saturation magnetic flux density than 1.3 T.

Further, as shown in Table 1, Ru, Rh, I
In the group of r, Os, Pd, and Pt, it was found that Ru, Rh, Ir, and Os had a greater effect of improving corrosion resistance than Pd and Pt. On the other hand, as in sample numbers 13 to 15, S
When the i concentration is less than 5%, the effect of reducing the magnetostriction constant is small, when the Si concentration exceeds 20%, the saturation magnetic flux density becomes less than 1.3 T, and when Ru is added in excess of 15%. The magnetostriction constant exceeded 4 × 10 ⁻⁶ and was large, and the saturation magnetic flux density decreased to less than 1.3T.

Example 2 By the same method as in Example 1, one or more elements selected from the group of Ru, Rh, Ir, Os, Pd and Pt, one or more elements of Cr and Al and S.
A sample to which i was added at the same time was prepared, and its magnetic properties and corrosion resistance were investigated. Table 2 shows the results.

[0030]

[Table 2]

As shown in Table 2, in the samples Nos. 16 to 20, at least one element selected from the group consisting of Ru, Rh, Ir, Os, Pd and Pt, at least one element selected from Cr and Al, and Si at the same time. By adding it, the corrosion resistance is significantly improved to 10 hours or more, and the absolute value of the magnetostriction constant is 4
× 10 ^-6 or less, having a most small value of 2 × 10 ^-6 or less in the case, it was possible to obtain a magnetic film further has a saturation magnetic flux density than 1.3 T. On the other hand, Cr or Al is 1
In the samples Nos. 21 and 22 exceeding 5%, the saturation magnetic flux density was less than 1.3 T, and the magnetostriction constant was 4 × 1.
It increased beyond 0 ^-6.

Example 3 By the same method as in Example 1, one or more elements selected from the group of Ru, Rh, Ir, Os, Pd and Pt, one or more elements of Ni and Co, and Si
A sample to which was added at the same time was prepared, and its magnetic characteristics and corrosion resistance were investigated. The results are shown in Table 3.

[0033]

[Table 3]

As shown in Table 3, in the samples Nos. 23 to 27, at least one element selected from the group of Ru, Rh, Ir, Os, Pd and Pt, at least one element selected from Ni and Co, and Si at the same time. By adding it, the corrosion resistance is significantly improved to 10 hours or more, and the absolute value of the magnetostriction constant is 4
× 10 ^-6 or less, having a most small value of 2 × 10 ^-6 or less in the case, it was possible to obtain a magnetic film further has a saturation magnetic flux density than 1.3 T. On the other hand, Co or Ni is 1
In the samples of sample numbers 28 and 29 exceeding 5%, the magnetostriction constant exceeded 4 × 10 ⁻⁶ and became extremely large.

Example 4 By the same method as in Example 1, one or more elements selected from the group of Ru, Rh, Ir, Os, Pd and Pt, one or more elements of Ni and Co, Cr and A
A sample was prepared by simultaneously adding one or more of 1 and Si, and the magnetic properties and corrosion resistance were investigated. The results are shown in Table 4.

[0036]

[Table 4]

As shown in Table 4, in samples Nos. 30 to 34, one or more elements selected from the group of Ru, Rh, Ir, Os, Pd and Pt, one or more elements of Ni and Co, A
By simultaneously adding 1 or more of Cr and 1 and Si, the corrosion resistance is significantly improved to 10 hours or more, and the absolute value of the magnetostriction constant is 4 × 10 ⁻⁶ or less, which is 2 × in most cases. ^Has a small value of 10 ^-6 or less, and further 1.3
A magnetic film having a saturation magnetic flux density of T or more could be obtained.

On the other hand, Pd of the element group X, Al of the element group Y,
Also, in the sample of Sample No. 35 in which the sum of the Ni concentrations of the element group M exceeded 15%, the magnetostriction constant exceeded 4 × 10 ⁻⁶ and became extremely large. The sample numbers 1 to 12, 16 to 20,
As a result of observing the samples 23 to 27 and 30 to 34 by X-ray diffraction and a transmission electron microscope, each magnetic film has fine crystal grains containing Fe as a main component and Zr, which exists around the crystal grains, It is composed of a compound of an element group T such as Hf, Ta, Nb and the like, and a compound of an element group Z of C, N, and the average grain size of crystal grains containing Fe as a main component is 10 to 20 nm, nitride and carbide. Had a crystal grain size of 3 to 8 nm.

As shown in each of the above embodiments, the magnetic film according to the present invention is excellent in magnetic characteristics such as saturation magnetic flux density and coercive force and corrosion resistance, and is suitable as a core material for magnetic heads for VTRs and magnetic disks. Is.

Example 5 Using the magnetic film of the present invention, as shown in FIG. 1, a so-called MIG head was produced in which the magnetic film 3 was formed in the vicinity of the gap 2 of the ferrite head using the ferrite substrate 1. . The thickness of the magnetic film 3 is 5 μm
And Reference numerals 4 and 5 are low melting point bonding glasses. When the magnetic tape is slid on the magnetic tape when the magnetic head is used, a step d is formed between the ferrite 1 and the magnetic film 3 due to the difference in the abrasion speed due to the material, as shown in FIG. As a result, spacing loss occurs and the output decreases in the high frequency region. These heads have coercive force of 1500 Oe
Using the metal tape of, the step d between the ferrite substrate 1 and the magnetic film 3 after traveling for 1 hour at a relative speed of 3.75 m / s,
And the recording / reproducing output at 7 MHz was measured. The results are shown in Table 5.

[0041]

[Table 5]

As can be seen from Table 5, the magnetic head using the magnetic film of the present invention has a smaller step d between the ferrite 1 and the magnetic film 3 as compared with the conventional example, and as a result, the recording / reproducing output is greatly improved. There is. It is considered that this is because the magnetic film of the present invention has excellent corrosion resistance, and thus has significantly improved wear resistance. As described above, when a magnetic head having excellent corrosion resistance and abrasion resistance and little deterioration in recording / reproducing output during use is used in a magnetic recording apparatus, a highly reliable apparatus can be realized. Further, it is excellent as a device having improved reliability especially when used in an environment where corrosion is a problem, for example, an environment where high humidity is experienced or an environment where corrosive substances such as chlorine are present.

[0043]

As described in detail above, the magnetic film according to the present invention has excellent saturation magnetic flux density, low coercive force and low magnetostriction constant and excellent soft magnetic properties, and further has high corrosion resistance and wear resistance. Have By using this in a magnetic head core, it is possible to realize a magnetic head and a magnetic recording device having excellent recording / reproducing characteristics and reliability.

[Brief description of drawings]

FIG. 1 is a diagram showing a structure of a magnetic head.

FIG. 2 is a diagram showing a step between a ferrite substrate and a magnetic film on a tape sliding surface.

[Explanation of symbols]

1 ... Ferrite substrate, 2 ... Gap, 3 ... Magnetic film, 4,
5 ... Low melting glass

Claims (17)

[Claims] 1. A composition _{formula: Fe a Si c T d X} e Z g, where
T is at least one element selected from the group consisting of Ti, Zr, Hf, Nb, Ta, Mo and W, and X is Ru, Rh, O.
at least one element selected from the group consisting of s, Ir, Pd, and Pt, Z is at least one element selected from the group consisting of C and N, and a, c, d, e, and g represent atomic%, 5
≤c≤20, 2≤d≤20, 0.5≤e≤15, 1≤g
A magnetic film having a composition represented by ≦ 20 and a + c + d + e + g = 100. 2. A composition _{formula: Fe a Si c T d X} e Y f Z g, where, T is Ti, Zr, Hf, Nb, Ta, Mo, at least one element selected from the group of W, X is Ru, Rh,
At least one element selected from the group of Os, Ir, Pd, and Pt, Y at least one element selected from the group of Cr and Al, and Z at least one element selected from the group of C and N, a, c, d, e, f, g represent atomic%, 5 ≦ c ≦ 20, 2 ≦ d ≦ 20, 0.5 ≦ e ≦ 1
5, f ≦ 15, 1 ≦ g ≦ 20, and a + c + d + e +
A magnetic film having a composition represented by f + g = 100. 3. A composition _{formula: Fe a M b Si c T} d X e Z g, provided that at least one element M selected Co, from the group of Ni, T is Ti, Zr, Hf, Nb, Ta, At least one element selected from the group consisting of Mo and W, X is Ru and R
at least one element selected from the group of h, Os, Ir, Pd, and Pt, Z is at least one element selected from the group of C and N, and a, b, c, d, e, and g are atoms. %
, B ≦ 15,5 ≦ c ≦ 20, 2 ≦ d ≦ 20,0.
5 ≦ e ≦ 15, 1 ≦ g ≦ 20, and a + b + c + d +
A magnetic film having a composition represented by e + g = 100. 4. A composition formula: Fe _a M _b Si _c T _d X _e Y _f Z _g ,
However, M is at least one element selected from the group of Co and Ni, and T is Ti, Zr, Hf, Nb, Ta, Mo and W.
At least one element selected from the group of X, Ru is R, R
h, Os, Ir, Pd, at least one element selected from the group of Pt, Y is at least one element selected from the group of Cr and Al, Z is at least one element selected from the group of C and N And a, b, c, d, e, g represent atomic%, b ≦ 15, 5 ≦ c ≦ 20, 2 ≦ d ≦ 20,
0.5 ≦ e ≦ 15, f ≦ 15, 1 ≦ g ≦ 20, and a
A magnetic film having a composition represented by + b + c + d + e + f + g = 100. 5. The magnetic film according to claim 1, wherein X comprises at least one element selected from the group consisting of Ru, Rh, Ir and Os. 6. The magnetic film according to claim 1, wherein the concentration of the element X is in the range of 3 ≦ e ≦ 15. 7. The magnetic film according to claim 1, wherein the Si concentration is in the range of 10 ≦ c ≦ 15. 8. The concentration of the elements T, X and Z is 2 ≦ d ≦ 1.
The magnetic film according to claim 1, wherein 0,3 ≦ e ≦ 10 and 3 ≦ g ≦ 10. 9. The magnetic film according to claim 2, wherein the concentration of the element Y is f ≦ 10. 10. The magnetic film according to claim 3, wherein the concentration of the element M is b ≦ 10. 11. The sum of the concentrations of element X and element Y is e + f
The magnetic film according to claim 2, 4 or 9, wherein ≦ 15. 12. The sum of the concentrations of the element M and the element X is b + e.
The magnetic film according to claim 3, 4 or 10, wherein ≦ 15. 13. The sum of the concentrations of the element M, the element X and the element Y is b + e + f ≦ 15.
The magnetic film described. 14. The magnetic film according to claim 1, which has an average crystal grain size of 50 nm or less. 15. The magnetic film according to claim 1, which has an average crystal grain size of 20 nm or less. 16. A magnetic head, wherein the magnetic film according to claim 1 is used for at least a part of a magnetic core. 17. A magnetic recording apparatus comprising at least one magnetic head according to claim 16.