JPH0867837A - A coating material for forming UV-irradiation type transparent conductive film, which has excellent conductivity, abrasion resistance, and adhesion. - Google Patents

A coating material for forming UV-irradiation type transparent conductive film, which has excellent conductivity, abrasion resistance, and adhesion.

Info

Publication number
JPH0867837A
JPH0867837A JP6203785A JP20378594A JPH0867837A JP H0867837 A JPH0867837 A JP H0867837A JP 6203785 A JP6203785 A JP 6203785A JP 20378594 A JP20378594 A JP 20378594A JP H0867837 A JPH0867837 A JP H0867837A
Authority
JP
Japan
Prior art keywords
coating material
transparent conductive
conductive film
type transparent
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6203785A
Other languages
Japanese (ja)
Inventor
Akira Nishihara
明 西原
Toshiharu Hayashi
年治 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP6203785A priority Critical patent/JPH0867837A/en
Publication of JPH0867837A publication Critical patent/JPH0867837A/en
Pending legal-status Critical Current

Links

Landscapes

  • Paints Or Removers (AREA)

Abstract

PURPOSE: To prepare a coating material for UV-irradiation type transparent conductive film which contains a titanate bearing a specific group at a specific ratio as a coating film-modifier, and is useful in the field of computers because it is excellent in abrasion resistance, adhesion and electric conductivity without adverse effect on the transparency. CONSTITUTION: This coating material is obtained by adding (A) fine particles of an electrically conductive substance and (B) a binder and further (C) a titanate bearing dialkyl phosphite groups (preferably a compound of formulas I-III) in a proportion of 0.4-10wt.% based on the component (A). As a component A, for example, particles of indium oxide doped with tin of less than 0.2μm particle sizes are preferably used in addition to the powder of tin oxide doped with antimony.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は導電性、耐摩耗性、およ
び密着性に優れたUV照射型透明導電膜の形成が可能な
塗料に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating material capable of forming a UV irradiation type transparent conductive film having excellent conductivity, abrasion resistance and adhesion.

【0002】[0002]

【従来技術】従来、一般に塗布、印刷、或いはスプレー
などによりガラス、プラスチック、或いはフィルム上に
UV照射型透明導電膜を形成することが行われている。
これらのUV照射型透明導電膜には、例えば特開平5ー
239409に記載されるように、溶剤に導電性微粉
末、および結合剤を配合してなるUV照射型透明導電膜
形成用の塗料が用いられている。
2. Description of the Related Art Conventionally, a UV irradiation type transparent conductive film is generally formed on glass, plastic, or film by coating, printing, spraying or the like.
To these UV irradiation type transparent conductive films, for example, as described in JP-A-5-239409, there is a coating material for forming UV irradiation type transparent conductive films which is prepared by mixing conductive fine powder and a binder in a solvent. It is used.

【0003】また、上記従来UV照射型透明導電膜形成
用の塗料において、導電性微粉末としてアンチモンがド
ープされた酸化スズ粉末が知られている。さらに同じく
結合剤としてテトラアルコキシシランを加水分解縮合し
て得られるシロキサン系ポリマー、溶剤としてメタノー
ル、エタノール、イソプロパノールなどのアルコール
類、アセトン、メチルエチルケトンなどのケトン類、酢
酸エチル、酢酸ブチルなどのエステル類などの一般的な
シロキサン系ポリマー合成溶剤、或いは分散相溶性のあ
る溶剤が用いられていることも知られている。
In addition, in the above-mentioned conventional coating material for forming a UV irradiation type transparent conductive film, tin oxide powder doped with antimony is known as conductive fine powder. Further, a siloxane-based polymer obtained by hydrolyzing and condensing tetraalkoxysilane as a binder, alcohols such as methanol, ethanol and isopropanol, ketones such as acetone and methyl ethyl ketone, esters such as ethyl acetate and butyl acetate as a solvent. It is also known that a general siloxane-based polymer synthesis solvent or a solvent compatible with dispersion is used.

【0004】さらに必要に応じて、カップリング剤とし
てビニルトリエトキシシラン、γーグリシドキシプロピ
ルトリメトキシシラン、γーメタアクロキシプロピルト
リメトキシシランなど、光増感剤としてベンジルジメチ
ルケタール、ベンゾフェノン、アセトフェノン、ベンゾ
イン、ベンゾインメチルエーテルなどが用いられている
ことも知られている。
Further, if necessary, vinyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-metaacryloxypropyltrimethoxysilane and the like as coupling agents, benzyl dimethyl ketal and benzophenone as photosensitizers, It is also known that acetophenone, benzoin, benzoin methyl ether and the like are used.

【0005】[0005]

【発明が解決しようとする課題】一方、近年のコンピユ
ーター、TV、液晶ディスプレイ、或いはタッチパネル
などの高性能化はめざましく、これに伴いこれらに用い
られるブラウン管の画像表面、或いはディスプレイ、タ
ッチパネルの電極などはより一層の導電性、耐摩耗性、
および密着性の向上が求められているが、上記塗料にお
いてはこれにより形成される塗膜の導電性、耐摩耗性、
および密着性が十分でないために、これらの要求には満
足に対応することができないのが現状である。
On the other hand, in recent years, the performance of computers, TVs, liquid crystal displays, touch panels, etc. has been remarkably improved, and accordingly, the image surface of cathode ray tubes used for them, the electrodes of displays, touch panels, etc. Further conductivity, wear resistance,
And the improvement of adhesion is required, but in the above paint, the conductivity of the coating film formed by this, abrasion resistance,
At present, it is not possible to satisfactorily meet these requirements due to insufficient adhesion.

【0006】[0006]

【課題を解決するための手段】そこで、本発明らは上記
の問題点に鑑み、導電性の向上化は勿論のこと、耐摩耗
性、および密着性に優れた塗布型の透明導電膜形成用の
塗料を開発すべく研究を行った結果、従来のUV照射型
透明導電膜形成用の塗料中に、新たにジアルキルホスフ
ァイト基を有するチタネート剤、望ましくは、上記化学
式1〜3に示されるチタネート剤を導電性微粉末に対す
る割合で0.4〜10重量%(以下、特に記載のない限
り%は重量%を示す)を含有するUV照射型透明導電膜
形成用の塗料が上記目的の達成に最適であるいう研究結
果を得たのである。
SUMMARY OF THE INVENTION In view of the above problems, therefore, the present invention is for forming a coating type transparent conductive film having excellent wear resistance and adhesiveness, as well as improved conductivity. As a result of conducting research to develop the above coating composition, a titanate agent having a new dialkylphosphite group in the conventional coating composition for forming a UV conductive transparent conductive film, preferably a titanate represented by the above Chemical Formulas 1 to 3 is used. A coating material for forming a UV irradiation type transparent conductive film, which contains 0.4 to 10% by weight (hereinafter,% means% by weight unless otherwise specified) in a ratio with respect to the conductive fine powder, achieves the above object. We obtained the optimum research results.

【0007】この発明は、上記の研究結果に基づいてな
されたものであって、溶剤に導電性微粉末、および結合
剤を配合してなるUV照射型透明導電膜形成用の塗料
で、塗膜改質剤としてジアルキルホスファイト基を有す
るチタネート剤を導電性微粉末に対する割合で0.4〜
10%を含有することを特徴とする耐磨耗性、密着性、
および導電性に優れたUV照射型透明導電膜形成用の塗
料である。
The present invention was made based on the above research results, and is a coating material for forming a UV irradiation type transparent conductive film, which is prepared by mixing conductive fine powder and a binder in a solvent. A titanate agent having a dialkyl phosphite group is used as a modifier at a ratio of 0.4 to 0.4 to the conductive fine powder.
Abrasion resistance, adhesion, characterized by containing 10%
And a coating material for forming a UV irradiation type transparent conductive film having excellent conductivity.

【0008】尚、本発明のUV照射型透明導電膜形成用
の塗料において、塗膜改質剤として加えたジアルキルホ
スファイト基を有するチタネート剤を導電性微粉末に対
する割合で0.4〜10%と定めたのは、その含有量が
0.4%未満でも、または10%を越えても所望の優れ
た導電性、耐摩耗性、および密着性を確保することがで
きないためである。
In the coating material for forming the UV irradiation type transparent conductive film of the present invention, the titanate agent having a dialkylphosphite group added as a coating film modifier is 0.4 to 10% in a ratio to the conductive fine powder. The reason for this is that if the content is less than 0.4% or more than 10%, the desired excellent conductivity, abrasion resistance, and adhesion cannot be secured.

【0009】また、本発明のUV照射型透明導電膜形成
用の塗料の導電性微粉末としては、従来から知られてい
るアンチモンがドープされた酸化スズ粉末のほかに、例
えば粒子径0.2μm以下の錫ドープの酸化インジウム
を用ると、更に好ましい結果が得られ、あるいはドープ
剤によって導電性を付与した酸化亜鉛を用いることも有
効であることを見出した。また、より優れた耐摩耗性、
および密着性を発現させるために、結合剤にはテトラア
ルコキシシランを加水分解縮合して得られるシロキサン
系ポリマー(以下結合剤と呼ぶ)を用い、その添加割合
(以下、結合剤添加比という)は、結合剤の量を結合剤
に含まれるシロキサン量のSiO2換算量で表現した場
合、結合剤添加比=(導電性微粉末の量)/(結合剤の
量)=95/5〜10/90の範囲内の量を加えて使用
することがが好ましい。
As the conductive fine powder of the coating material for forming the UV irradiation type transparent conductive film of the present invention, in addition to the conventionally known antimony-doped tin oxide powder, for example, the particle diameter is 0.2 μm. It has been found that more preferable results are obtained by using the following tin-doped indium oxide, or that it is also effective to use zinc oxide whose conductivity is imparted by a doping agent. It also has better wear resistance,
And, in order to develop adhesion, a siloxane-based polymer (hereinafter referred to as a binder) obtained by hydrolyzing and condensing a tetraalkoxysilane is used as a binder, and the addition ratio (hereinafter, referred to as a binder addition ratio) is When the amount of the binder is expressed as the amount of siloxane contained in the binder in terms of SiO 2 , the binder addition ratio = (amount of conductive fine powder) / (amount of binder) = 95/5 to 10 / It is preferable to add and use an amount within the range of 90.

【0010】[0010]

【実施例】以下、本発明UV照射型透明導電膜形成用の
塗料を実施例により説明する。溶剤として重量比にて9
8:2のエタノールとブタノールの混合溶剤(以下、混
合溶剤という)およびメチルエチルケトンを、導電性微
粉末としていずれも平均粒径が0.025μmにして、
Sb:10原子%含有の酸化スズ粉末(以下ATO粉末
という)、およびSn:5原子%含有の酸化インジウム
粉末(以下ITO粉末という)を、結合剤として下記の
製法により合成したシロキサン系ポリマーの結合剤1お
よび結合剤2を含む結合剤合成液1と結合剤合成液2
を、塗膜改質剤として前記化学式1〜3の組成を有する
ジアルキルホスファイト基を有するチタネート剤を、さ
らにカップリング剤として下記化学式4、5を有するメ
トキシシランを用意した。
EXAMPLES Hereinafter, the coating material for forming the UV irradiation type transparent conductive film of the present invention will be described with reference to examples. 9 by weight as solvent
A mixed solvent of 8: 2 ethanol and butanol (hereinafter referred to as a mixed solvent) and methyl ethyl ketone were used as conductive fine powders having an average particle diameter of 0.025 μm.
Sb: A tin oxide powder containing 10 atomic% (hereinafter referred to as ATO powder) and indium oxide powder containing Sn: 5 atomic% (hereinafter referred to as ITO powder) were used as binders to bond a siloxane polymer synthesized by the following production method. Binder Synthesis Solution 1 and Binder Synthesis Solution 2 Containing Agent 1 and Binder 2
A titanate agent having a dialkylphosphite group having the composition of Chemical Formulas 1 to 3 was prepared as a coating film modifier, and methoxysilane having the following Chemical Formulas 4 and 5 was prepared as a coupling agent.

【0011】[0011]

【化4】 [Chemical 4]

【0012】[0012]

【化5】 [Chemical 5]

【0013】尚、結合剤合成液1としては500mlの
ガラス製の4ツ口フラスコを用い、30ml/minの
流量で乾燥窒素を流しながらテトラエトキシシラン:1
40gとエチルアルコール:240gを加え、純水:5
0gに溶解したマレイン酸:1.5gを攪拌しながら1
時間で滴下し、その後70℃で4時間反応してSiO2
換算で結合剤1を9.1%含む結合剤合成液1を製造し
た。また、結合剤合成液2としては同様に500mlの
ガラス製の4ツ口フラスコを用い、テトラエトキシシラ
ン:140gとエチルアルコール:240gを加え、純
水:25gに溶解した12NーHCl:1.0gを攪拌
しながら一度に加え、その後80℃で6時間反応して同
様にSiO2換算で結合剤2を9.6%含む結合剤合成
液2を製造した。
As the binder synthesis liquid 1, a 500 ml four-necked flask made of glass was used, and tetraethoxysilane: 1 was used while flowing dry nitrogen at a flow rate of 30 ml / min.
40 g and ethyl alcohol: 240 g were added, and pure water: 5
Maleic acid dissolved in 0 g: 1.5 g with stirring 1
Drop by time and then react at 70 ° C for 4 hours to react with SiO 2
Binder synthesis liquid 1 containing 9.1% of binder 1 in terms of conversion was produced. Similarly, as the binder synthesis liquid 2, a 500 ml four-necked flask made of glass was used, and 140 g of tetraethoxysilane and 240 g of ethyl alcohol were added, and 12 N-HCl: 1.0 g dissolved in pure water: 25 g. Was added all at once with stirring, and then the mixture was reacted at 80 ° C. for 6 hours to similarly prepare a binder synthesis liquid 2 containing 9.6% of the binder 2 in terms of SiO 2 .

【0014】ついでこれら導電性微粉末、結合剤合成
液、溶剤、カップリング剤、光増感剤、塗膜改質剤の原
料を表1に示される割合に配合・混合することにより本
発明塗料1〜13および従来塗料1、2を製造した。な
お、導電性微粉末配合比と結合剤合成液配合比から結合
剤添加比を計算し表1に示す値を得た。
Next, the conductive fine powder, the binder synthesis solution, the solvent, the coupling agent, the photosensitizer and the raw material of the coating film modifier are blended and mixed in the proportions shown in Table 1 to prepare the coating composition of the present invention. 1 to 13 and conventional paints 1 and 2 were produced. The binder addition ratio was calculated from the conductive fine powder compounding ratio and the binder synthetic liquid compounding ratio to obtain the values shown in Table 1.

【0015】この結果得られた本発明塗料1〜13およ
び従来塗料1、2について、これをガラス基体(厚さ2
mm、可視光透過率測定値:91%、ヘーズ測定値:0
%)に塗布し、100℃で乾燥した後、5,000mJ
/cm2のUVを照射することにより透明導電膜を得
た。この結果得られた各透明導電膜について、まず、透
明性を評価する目的で、分光光度計を用いて550nm
における可視光透過率を測定し、ついでヘーズメーター
を用いてヘーズを測定し、また導電性を評価する目的で
4探針法により表面抵抗を測定し表2に示す結果を得
た。さらに摩耗性、密着性を評価する目的で消ゴム(ラ
イオン50ー50)を用いてストローク幅5cm、1k
g荷重で往復摩擦を行い、各200回、400回、およ
び600回の往復摩擦を行い、同様の方法でヘーズを測
定し摩擦前と摩擦後の塗膜のヘーズの変化:△Hについ
て表2に示す結果を得た。
With respect to the coating materials 1 to 13 of the present invention and the conventional coating materials 1 and 2 obtained as a result, these are coated on a glass substrate (thickness 2).
mm, visible light transmittance measurement value: 91%, haze measurement value: 0
%) And dried at 100 ° C., then 5,000 mJ
A transparent conductive film was obtained by irradiating with UV of / cm 2 . For each transparent conductive film obtained as a result, first, for the purpose of evaluating transparency, a spectrophotometer was used to measure 550 nm.
The visible light transmittance was measured, then the haze was measured using a haze meter, and the surface resistance was measured by the 4-probe method for the purpose of evaluating conductivity, and the results shown in Table 2 were obtained. Furthermore, a stroke width of 5 cm, 1 k is used with an eraser (Lion 50-50) for the purpose of evaluating abrasion resistance and adhesion.
Reciprocating friction under g load, 200 times, 400 times, and 600 times reciprocating friction, and measuring the haze in the same manner. Change in haze of coating film before and after rubbing: Table 2 for ΔH The results shown in are obtained.

【0016】[0016]

【表1】 [Table 1]

【0017】[0017]

【表2】 [Table 2]

【0018】[0018]

【発明の効果】表2に示される結果から、本発明塗料1
〜13は、従来塗料1、2と比較して、透明性を損なう
ことなく耐摩耗性、密着性、および導電性に優れたUV
照射型透明導電膜を形成することができることが明らか
であり、本発明塗料をコンピューターあるいはTVのC
RT表面に塗布すれば長期の使用にわたって帯電防止の
効果を維持することができ、またタッチパネルの表面に
使用すれば長期間にわたって正確な入力が可能となる。
さらに、本発明の塗料を使用すれば塗布法によって高細
密液晶ディスプレイの電極を製造も可能であるので、そ
の産業上の効果は極めて大きい。
From the results shown in Table 2, the coating material of the present invention 1
Nos. 13 to 13 are UV excellent in abrasion resistance, adhesion and conductivity without impairing transparency as compared with the conventional paints 1 and 2.
It is clear that an irradiation-type transparent conductive film can be formed.
If it is applied to the RT surface, the antistatic effect can be maintained over a long period of use, and if it is used on the surface of the touch panel, accurate input can be performed over a long period of time.
Furthermore, if the coating material of the present invention is used, it is possible to manufacture electrodes of a high-definition liquid crystal display by a coating method, so that its industrial effect is extremely large.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】溶剤に導電性微粉末、および結合剤を配合
してなるUV照射型透明導電膜形成用の塗料において、
前記塗料がジアルキルホスファイト基を有するチタネー
ト剤を導電性微粉末に対する割合で0.4〜10重量%
を含有することを特徴とするUV照射型透明導電膜形成
用の塗料。
1. A coating material for forming a UV irradiation type transparent conductive film, which is prepared by mixing a solvent with conductive fine powder and a binder,
The coating material contains a titanate agent having a dialkylphosphite group in an amount of 0.4 to 10% by weight based on the conductive fine powder.
A coating material for forming a UV irradiation type transparent conductive film, which comprises:
【請求項2】ジアルキルホスファイト基を有するチタネ
ート剤が、下記化学式1からなる請求項1記載のUV照
射型透明導電膜形成用の塗料。 【化1】
2. A coating material for forming a UV irradiation type transparent conductive film according to claim 1, wherein the titanate agent having a dialkyl phosphite group has the following chemical formula 1. Embedded image
【請求項3】ジアルキルホスファイト基を有するチタネ
ート剤が、下記化学式2からなる請求項1記載のUV照
射型透明導電膜形成用の塗料。 【化2】
3. The coating material for forming a UV irradiation type transparent conductive film according to claim 1, wherein the titanate agent having a dialkyl phosphite group has the following chemical formula 2. Embedded image
【請求項4】ジアルキルホスファイト基を有するチタネ
ート剤が、下記化学式3からなる請求項1記載のUV照
射型透明導電膜形成用の塗料。 【化3】
4. A coating material for forming a UV irradiation type transparent conductive film according to claim 1, wherein the titanate agent having a dialkyl phosphite group has the following chemical formula 3. [Chemical 3]
JP6203785A 1994-08-29 1994-08-29 A coating material for forming UV-irradiation type transparent conductive film, which has excellent conductivity, abrasion resistance, and adhesion. Pending JPH0867837A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6203785A JPH0867837A (en) 1994-08-29 1994-08-29 A coating material for forming UV-irradiation type transparent conductive film, which has excellent conductivity, abrasion resistance, and adhesion.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6203785A JPH0867837A (en) 1994-08-29 1994-08-29 A coating material for forming UV-irradiation type transparent conductive film, which has excellent conductivity, abrasion resistance, and adhesion.

Publications (1)

Publication Number Publication Date
JPH0867837A true JPH0867837A (en) 1996-03-12

Family

ID=16479727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6203785A Pending JPH0867837A (en) 1994-08-29 1994-08-29 A coating material for forming UV-irradiation type transparent conductive film, which has excellent conductivity, abrasion resistance, and adhesion.

Country Status (1)

Country Link
JP (1) JPH0867837A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004090049A1 (en) * 2003-04-07 2004-10-21 Advanced Nano Products Company Limited Powder for isolating infrared rays, and isolating solution and goods using the same
EP2174989A1 (en) 2008-10-08 2010-04-14 ChemIP B.V. Aqueous metaloxide dispersions and coating materials prepared thereof.
WO2010057653A3 (en) * 2008-11-20 2010-08-26 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Conductive coatings on an ito basis

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004090049A1 (en) * 2003-04-07 2004-10-21 Advanced Nano Products Company Limited Powder for isolating infrared rays, and isolating solution and goods using the same
US7465496B2 (en) 2003-04-07 2008-12-16 Advanced Nano Products Company Limited Powder for isolating infrared rays, and isolating solution and goods using the same
EP2174989A1 (en) 2008-10-08 2010-04-14 ChemIP B.V. Aqueous metaloxide dispersions and coating materials prepared thereof.
WO2010057653A3 (en) * 2008-11-20 2010-08-26 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Conductive coatings on an ito basis

Similar Documents

Publication Publication Date Title
US4431764A (en) Antistatic transparent coating composition
EP0423337A1 (en) Coating fluid for forming transparent conductive ceramic coating, base material coated with transparent conductive ceramic and production thereof, and application of base material coated with transparent conductive ceramic
JP3302186B2 (en) Substrate with transparent conductive film, method for producing the same, and display device provided with the substrate
JPH0867837A (en) A coating material for forming UV-irradiation type transparent conductive film, which has excellent conductivity, abrasion resistance, and adhesion.
CN101101400B (en) LCD box
WO1988006331A1 (en) Coating fluid for forming electroconductive coat
JP5837292B2 (en) Composition for forming transparent conductive film, transparent conductive film, and antireflection film
JP3002327B2 (en) Paint for forming conductive / high refractive index film and transparent material laminate with conductive / high refractive index film
TWI247784B (en) Organic solvent based dispersion of conductive powder and conductive coating material
JPH0867838A (en) A coating material for forming a UV irradiation type transparent conductive film, which has excellent wear resistance, adhesion and conductivity.
JP2000191948A (en) Composition for forming film having function for improving color purity
JPH07305003A (en) A coating material for forming UV-irradiation type transparent conductive film, which has excellent conductivity, abrasion resistance, and adhesion.
JP3431726B2 (en) Conductive powder, method for producing the same, and conductive coating film
JPH0953030A (en) Clear conductive coating material and clear conductive film
JPH06200185A (en) Antistatic coating composition for plastic
KR20060062087A (en) High-transparent insulation adhesive and its adhesive coating film
JPH07102177A (en) Composition for forming conductive film
JPH06299090A (en) Antistatic coating composition for plastics
JPH06306308A (en) Antistatic coating composition for plastics
KR102841707B1 (en) Method for preparing High-transparent and High-hardness Antistatic Coating Solution and Antistatic Coating Solution prepared by the Same
JP3233742B2 (en) Antistatic coating composition for plastics
JP2000319554A (en) Coating solution for forming heat ray / ultraviolet ray shielding film and heat ray / ultraviolet ray ray shielding film using the same
JPH06228500A (en) Antistatic and antireflecting film and coating for forming thereof
JPH07196985A (en) Composition for antistatic coating and method for forming its film
JP4958143B2 (en) Composition for forming transparent conductive film, transparent conductive film and display

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20010807