JPH087346A - Contact jig and contact method - Google Patents

Abstract

(57) [Summary] [Object] The present invention relates to a stamper manufacturing jig and a manufacturing method used for duplicating an optical disk by a stamper, and to realize stamper manufacturing by a high-quality contact method. [Structure] Main body, main body, UV transparent window, nitrogen gas cylinder,
It consists of a portable operation box for the vacuum pump. [Effect] There is an effect that the quality of the stamper is improved by improving the adhesiveness. The stamper manufacturing time can be shortened by shortening the working time.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a contact jig and a contact method suitable for producing a stamper used for reproducing an optical disc-shaped information recording carrier such as a video disc or a digital code disc.

Further, the present invention is a contact jig suitable for a contact exposure method, which is one of photolithography in the process of manufacturing ICs, LSIs, etc., and in the manufacturing process of photoelectric conversion elements such as solar cells and photodiodes. And the contact method.

Further, according to the present invention, in the step of producing a working mask from a photomask for IC or LSI,
The present invention relates to a contact jig and a contact method suitable for contact exposure.

[0004]

2. Description of the Related Art As a conventional technique, there is a method for manufacturing a guide groove stamper described in JP-A-1-201842 as shown in FIG. Photoresist is applied between the transparent resin substrate 42 having the guide groove and the metal thin film layer 43 on the surface of the glass substrate 44, and the two are brought into close contact with each other by a vacuum contact method, exposed, and subjected to development processing and etching to form the metal thin film layer. A guide groove is formed at 43.

Further, Japanese Patent Laid-Open No. 60-20 as shown in FIG.
In the method of manufacturing an information recording carrier described in Japanese Patent No. 337, the pressure plates 46 and 48 having grooves for vacuuming are formed in order to bond the resin base materials 45 and 49 having the recording film 50 inside by the additional layer 51. By the thickness regulating members 47 and 52,
A method of pressing and bonding while being regulated is disclosed.

[0006]

In the above-mentioned prior art, it is difficult to control the optimum adhesion force in the contacting work, and the objectives of the contacting work are the quality and work efficiency of exposure and bonding. It was not considered.

An object of the present invention is to realize a contact jig and a contact method capable of improving the contact property by a simple operation and realizing an optimum contact force in which a defect is hardly generated on a mask.

Another object of the present invention is to realize a contact jig and an operation box which are highly portable.

[0009]

In order to achieve the above-mentioned object, a substrate side made of an inert gas such as nitrogen or a liquid such as silicone oil, a pressure mechanism from both sides of the photomask side, a substrate and a photomask It is provided with an exhaust mechanism for the close contact portion.

Further, the space between the substrate and the photomask is evacuated, and pressure is applied from both sides of the substrate and the photomask by a pressure mechanism using a gas or a liquid as a medium.

Also, the operation buttons for pressurizing and exhausting, a solenoid valve, a vacuum pump, a compressor, etc. are housed in a portable box.

Further, the photomask side and the stamper side are separately provided with an adjusting mechanism for adjusting the applied pressure.

Further, the glass surface constituting the pressure chamber on the photomask side is coated with a coating for preventing reflection in the ultraviolet region.

[0014]

In FIG. 1, a photoresist (not shown) is thinly applied to the substrate 8 to be the stamper. This is mounted on the main body 7, the photomask 4 is overlaid thereon, and the main body 6 having the UV light transmitting window 3 is placed thereon and fixed with screws or the like. The O-rings 1, 2, 9 and 10 are fitted in the main bodies 6 and 7, and they are in close contact with the substrate 8 and the photomask 4, respectively, so that airtightness is maintained. In this state, the gas is exhausted from the exhaust port 105 by a vacuum pump or the like. As a result, unnecessary gas between the substrate 8 and the photomask 4 is exhausted, so that the substrate 8 and the photomask 4 are brought into close contact with each other. Further, the pressure chambers 1 on both sides of the substrate 8 and the photomask 4 are filled with an inert gas such as nitrogen.
Apply pressure from 01 and 104. This can further improve the adhesion evenly. In this state, irradiate with UV light,
A photoresist is exposed to light, information on the photomask 4 is transferred to the substrate 8, and a high-quality transfer product can be manufactured through the steps of development and etching.

Further, as shown in FIG. 2, a pressurizing device such as a nitrogen gas cylinder or a compressor, a vacuum exhaust device such as a vacuum pump, a solenoid valve, a switch and the like are provided in one control box 2.
By storing the battery pack in No. 7, the contact work can be performed by supplying only the power from the outlet plug 26.

[0016]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. FIG. 1 is a cross-sectional view of the stamper contact jig, and FIG. 2 is a bird's eye view with a handle, piping, control box, etc. attached. The configuration of FIG. 1 has a holding plate 5 and UV.
It comprises a light transmitting window 3, a main body 6, a main body 7, and the like. The configuration of FIG. 2 includes a handle 11, a main body 6, a main body 7, a pressure port 13, a control box 27, and the like.

A UV light transmitting window 3 made of quartz is fixed to the main body 6 via a O-ring 1 by a holding plate 5. The holding plate 5 is fixed to the main body 6 with four screws 14. O-rings 9 and 10 are incorporated in the main body 7. Photoresist is applied to a substrate 8 such as Si, which serves as a stamper, for photosensitivity, and then mounted on the main body 7. After that, the photomask 4 is overlaid. Further, the main body 6 is mounted via the O-ring 2 and 4
It is fixed to the main body 7 with a screw 15 of a book. Pressurized chambers 101 and 104 are formed in the main body 6 and the main body 7 in the assembled state as described above. As a procedure, from the exhaust port (not shown) attached to the exhaust port 105 to the control box 2
Exhaust is performed by a vacuum pump (not shown) housed in 7. The exhaust port 105 is connected to the upper surface of the substrate 8 such as Si and the lower surface of the photomask 4 and the circumferential groove formed in the main body 7 at one or more places. Then, by driving the vacuum pump of the control box 27 through the pipe 16, the gas between the groove and the photomask 4 and the substrate 8 such as Si is exhausted. As a result, the photomask 4 and the substrate 8 made of Si or the like are brought into close contact with each other due to the pressure difference. While maintaining this state, the pressure of the nitrogen cylinder (not shown) built in the control box is then branched to the pressurizing ports 13- (a) and 13- (b) through the pipe 17 to pressurize. Addition is made to the pressure chambers 101 and 104 through the ports 102 and 103. The pressing force at this time can be adjusted by the pressure adjuster 21,
The pressure gauge 19 of the nitrogen cylinder body and the pressure after adjustment are pressure gauge 2
Adjustment is possible while checking with 0. Since the pressurizing mechanism can set the applied pressure above the atmospheric pressure relatively freely, it is possible to select the optimum contact pressure.
This control box 27 has a vacuum pump, a nitrogen cylinder, and a compressor built therein. Therefore, when power is supplied from the outlet plug 26, a solenoid valve (not shown) also built therein is activated, and the switch 22, 23, 24 On, Off
Depending on the operation, control box, vacuum pump, pressurizing operation
It can be turned on and off. Further, the pressing force can be confirmed by the output of the lamp of the pressure switch 25 or the like. A handle 18 is attached to the control box 27 so that the control box 27 can be easily carried to any place where power can be supplied. Further, instead of the nitrogen cylinder used for the pressurizing operation, it is possible to pull out a line gas pipe and turn the solenoid valve on and off.

Handles 11 are attached to the adhesion jig at two or more places by supports 12. This makes it highly portable together with the control box 27 and can be expected to improve workability. Further, the surface of the UV light transmission window 3 is coated with an antireflection coating in order to improve the transmittance of wavelengths in the ultraviolet region. As a result, the efficiency of exposing the photoresist to light can be increased and the amount of ultraviolet light can be suppressed.

According to this embodiment, the adhesion between the photomask 4 and the substrate 8 made of Si or the like can be actively brought into contact with each other by applying a pressure equal to or higher than the atmospheric pressure. Adhesion is improved. As a result, there is an effect that the quality of the stamper produced by exposure using UV light is improved. In addition, since the pressurizing and exhausting mechanism is housed in one control box, portability is improved, and handling such as attachment and detachment of jigs can be performed easily, so that work efficiency is improved.

The second embodiment will be described with reference to FIG. FIG. 3 is a bird's eye view of the second embodiment, in which the control method of the control box 27 is added. In FIG. 1, even pressure can be expected to be even in the vertical direction, but in the present embodiment, the pressure chamber 101 on the photomask 4 side and the pressure chamber 104 on the substrate 8 side such as Si can be individually controlled. The control box 27 has pressure regulators 21 and 29 and pressure gauges 20 and 30.
It was changed so that the pressure of the nitrogen cylinder could be adjusted individually.

According to this embodiment, since the pressing force can be adjusted individually on the upper and lower sides, the substrate is bent and the substrate 8 made of Si or the like is used.
It is also possible to actively discharge unnecessary gas between the photomask 4 and the photomask 4. In addition, when the substrate is in a bent state, it can be deformed in a direction to correct it, and there is an effect that an accurate pattern can be transferred.
In addition, like making a positively bent state and exposing,
There is also an effect that a pattern correction operation can be performed.

A third embodiment will be described with reference to FIG. FIG. 4 is a front view of the third embodiment. The plate 36 protruding from the main body 7 serves as a fulcrum so that the support 33 can rotate.
Supported by. A shaft 34 is incorporated in the elongated hole 106 at an intermediate portion of the support 33, and a spring 35 is attached to the shaft end thereof. A handle 11 is attached to the end of the support 33, and when assembled and connected to the main body 6, the handles 11 provided at two or more places are grasped and pulled toward the main body 6 to project from the main body 6. Bring up to 31. A rotatable roller 32 is incorporated in the shaft 34, and the shaft 34 is passed over the projecting plate 31 by a pulling operation and is housed in the recess. In this state, the roller 35 has a spring 35
Since it is pulled toward the main body 7 by the tension of, the main body 6 is also pulled along with it and the assembly of the both is completed.

According to this embodiment, the screw tightening operation in the contacting work is unnecessary and the assembly is completed by one operation of the handle 11, so that the contacting work time can be greatly shortened and the work efficiency is improved. Has the effect of improving.

A fourth embodiment will be described with reference to FIG.
An O-ring 9 that contacts the substrate 8 is fitted into the main body 7 in a groove, and an O-ring 10 for the photomask 4 is also attached. An elastically deformable film 40 is provided under the substrate 8.
A liquid 41 such as silicone oil covered with is filled. A UV light transmission window 3 that transmits ultraviolet light through the O-ring 1 is attached to the body 6 side by a holding plate 5. Further, the photomask 4 is attached via the O-ring 2 by a presser 39 supported by a pin 38. Further, an inlet port 10 for introducing a gas for pressurization.
2 are provided.

In setting up the jig, first, the substrate 8 coated with the photoresist is placed on the main body 7, and then the photomask 4 is overlaid. At that time, the photomask 4 is held on the main body 6 side. Therefore, the jig setup operation may be performed only by stacking the main body 6 on the main body 7, and the main bodies 6 and 7 may be fixed by using a screw or the like, or by adding a mechanism for pressing the main body 6 with a constant force from above. Exhaust port 10 for close contact
From the step 5, exhaust is performed using a vacuum pump or the like to perform initial contact. Next, an inert gas such as nitrogen is introduced from the gas inlet 102. As a result, the photomask 4 is uniformly pressed toward the substrate 8. Further, since there is a region filled with the liquid 41 on the main body 7 side, it comes into contact with the substrate 8 at a uniform pressure. Therefore, the substrate 8 and the photomask 4
Makes it possible to increase the adhesion according to the pressure from the gas inlet 102. This embodiment can be applied to a pattern exposure process in photolithography, which is one of the manufacturing processes of semiconductors such as IC and LSI.
From hard contact to soft contact, it is possible to create the desired contact condition by adjusting and combining the applied pressure and vacuum. The present invention also relates to ICs and LSIs.
It is also suitable for the contact exposure method in the step of producing a working mask from a photomask for use in a photomask. It is also possible to realize a large number of exposures at one time by arranging a plurality of combinations of this jig laterally.

According to this embodiment, since the photomask 4 can be attached to the main body 6 side from the beginning, the setup process can be shortened, the contact work time can be shortened, and the working efficiency can be improved. Further, since the photomask 4 and the substrate 8 can be positioned with high accuracy by the spigot structure of the end portions of the photomask main body 6 and the main body 7, the pattern transferred onto the substrate 8 is also of high quality with little eccentricity. It also has an effect. Further, since the adjustment of the pressing force is required only at one gas introduction port 102, there is an effect that the device configuration can be simplified and the reliability is improved.

[0027]

According to the present invention, the adhesion method for transferring the information of the photomask onto the substrate is performed by the superposition effect of vacuum evacuation and pressurization of the inert gas and the adjustment of the adhesion force. Since this is possible, there is an effect that uniform adhesion can be obtained and a high quality transfer product can be manufactured.

As a secondary effect of vacuuming,
Since the gas generated from the photoresist can be removed,
Adhesion is improved, and there is an effect that a high quality transfer product can be manufactured.

[Brief description of drawings]

FIG. 1 is a front sectional view of an embodiment of the present invention.

FIG. 2 is a bird's eye view of the first embodiment.

FIG. 3 is a bird's eye view of the second embodiment.

FIG. 4 is a front view of the third embodiment.

FIG. 5 is a sectional view of a fourth embodiment.

FIG. 6 is a sectional view of a known example 1.

FIG. 7 is a sectional view of a second known example.

[Explanation of symbols]

1 ... O-ring, 2 ... O-ring, 3 ... UV light transmitting window, 4 ... photo mask, 5 ... holding plate, 6 ... main body, 7 ... main body, 8 ... substrate, 9 ... O ring, 10 ... O ring, 11 ... handle grip, 12 ... support, 13
… Pressure port, 14… Window fixing screw, 15… Main body holding screw, 16
… Piping, 17… Piping, 18… Handle, 19… Pressure gauge, 20… Pressure gauge, 21… Pressure regulator, 22… Switch, 23… Switch, 24
… Switch, 25… Pressure switch, 26… Outlet plug, 27… Control box, 28… Piping, 29… Pressure regulator, 30
… Pressure gauge, 31… Overhang plate, 32… Roller, 33… Support, 34
... Axis, 35 ... Spring, 36 ... Axis, 37 ... Plate, 38 ... Pin, 39 ... Presser, 40 ... Film, 41 ... Liquid, 42 ... Transparent resin substrate, 43 ... Metal thin film layer, 44 ... Glass substrate, 45 ... Resin base material, 46 ... Pressure plate, 47
... thickness control member, 48 ... pressure plate, 49 ... resin base material, 50 ... recording film, 51 ... additional layer, 52 ... thickness control member, 101 ... pressure chamber, 102 ... pressure port, 103 ... Pressurizing port, 104 ... Pressurizing chamber, 105 ... Exhaust port.

Claims (5)

[Claims] 1. A method for producing a transfer product by exposing a pattern of a photomask to a substrate in close contact with the substrate, wherein a vacuum exhaust system is provided between the substrate coated with a photoresist and the photomask, and both sides of the substrate and the photomask are provided. A contact jig equipped with a pressure mechanism that uses compressed gas or liquid. 2. The contact method according to claim 1, further comprising the operation of evacuating the space between the substrate and the photomask and applying pressure with gas or liquid from both sides of the substrate and the photomask. 3. A contact jig and a contact method according to claim 1, wherein a compressed gas generator for pressurization, a pump for vacuum exhaust, a solenoid valve, a switch and the like are housed in one box. 4. The contact jig and the contact method according to claim 1, wherein the pressure applied to each of the substrate side and the photomask side can be adjusted individually. 5. An ultraviolet wavelength region of 350 n is formed on the surface of a plate which has the purpose of transmitting UV light and maintaining airtightness.
The adhesion jig and the adhesion method according to claim 1, wherein an antireflection coating in the range of m to 450 nm is applied.