JPH0885067A - Polishing tool for polishing device for plate glass, etc. - Google Patents
Polishing tool for polishing device for plate glass, etc.Info
- Publication number
- JPH0885067A JPH0885067A JP21967294A JP21967294A JPH0885067A JP H0885067 A JPH0885067 A JP H0885067A JP 21967294 A JP21967294 A JP 21967294A JP 21967294 A JP21967294 A JP 21967294A JP H0885067 A JPH0885067 A JP H0885067A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- polishing tool
- tool
- plate glass
- polished
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 70
- 239000005357 flat glass Substances 0.000 title claims abstract description 13
- 239000004744 fabric Substances 0.000 claims abstract description 17
- 239000013013 elastic material Substances 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、板ガラス等の表面を研
磨する装置に用いる研磨工具の改良に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement of a polishing tool used in an apparatus for polishing the surface of plate glass or the like.
【０００２】[0002]
【従来の技術】板ガラスの表面を平滑に研磨する場合、
平坦な研磨面をもつ研磨用フェルトやバフ等の研磨布を
硬質基板に固着した研磨工具を使用し、酸化セリウムや
ベンガラ等の研磨剤を供給しつつ研磨している。特に、
液晶用板ガラスは、高精度の表面平坦度が要求されるた
め、研磨工具の研磨面を構成するフェルトやバフ等の研
磨布は、柔らかいものでは板ガラスの表面の凹凸に馴染
みすぎて凹部も凸部と同様に研磨されることになり、所
定の平坦度とすることが却って遅くなり、能率が低下す
る欠点があった。そこで、従来では、フェルトやバフ等
の研磨布は比較的硬いものを使用し、凸部を先行して研
磨させ、研磨能率の向上を図っている。2. Description of the Related Art When the surface of a plate glass is polished smoothly,
Polishing is performed while supplying a polishing agent such as cerium oxide or red iron oxide using a polishing tool in which a polishing cloth such as a polishing felt or buff having a flat polishing surface is fixed to a hard substrate. In particular,
Since flat glass for liquid crystal is required to have a high degree of surface flatness, a soft polishing cloth, such as felt or buff, that composes the polishing surface of a polishing tool is too familiar with the unevenness of the surface of the glass plate, and the recesses and protrusions are too convex. As a result, the polishing is carried out in the same manner as the above, and there is a drawback that the flatness is rather delayed and the efficiency is lowered. Therefore, conventionally, a relatively hard polishing cloth such as felt or buff is used, and the convex portions are polished in advance to improve the polishing efficiency.
【０００３】このように、比較的硬いフェルトやバフ等
の研磨布を硬質基板に固着した研磨工具で板ガラスを研
磨する場合、研磨工具全体を自在継手、バネ、すべり軸
受等を組み合わせた支持機構で支持させて自転させつつ
公転させて板ガラスを研磨させている。As described above, when plate glass is polished with a polishing tool having a relatively hard polishing cloth such as felt or buff fixed to a hard substrate, the entire polishing tool is supported by a universal joint, a spring, a slide bearing and the like. While supporting and rotating it, it revolves around and polishes the plate glass.
【０００４】[0004]
【発明が解決しようとする課題】上記自在継手、バネ、
すべり軸受等を組み合わせた支持機構で研磨工具全体を
支持させている理由は、研磨作業中の振動を吸収させ、
板ガラスに研磨布面を均一に圧接させるためである。し
かし、上記自在継手、バネ、すべり軸受等を組み合わせ
た複雑な構造の支持機構では、研磨剤を供給しながら研
磨する必要がある作業環境においては、故障率が高くな
り、生産効率を低下させる欠点がある。また、このよう
な機械構造をした研磨具では、非常に高価なものとな
り、製造コスト高になる欠点もある。しかし、この支持
機構を除去した場合、良好な研磨面が得られない場合が
あり、問題が残る。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention
The reason why the entire polishing tool is supported by a support mechanism that combines slide bearings, etc. is that it absorbs vibration during polishing work,
This is because the polishing cloth surface is pressed against the plate glass uniformly. However, in the support mechanism having a complicated structure in which the universal joint, the spring, the slide bearing, and the like are combined, the failure rate becomes high and the production efficiency is lowered in the working environment where it is necessary to polish while supplying the abrasive. There is. Further, the polishing tool having such a mechanical structure has a drawback that it becomes very expensive and the manufacturing cost becomes high. However, if this support mechanism is removed, a good polished surface may not be obtained, and a problem remains.
【０００５】本発明の目的は、従来技術の上記問題点を
解消し、構造が簡単で故障がなく生産効率の向上が図
れ、この種の研磨装置を安価に構成できるようにし、製
品の製造コストを安価となし得る板ガラス等の研磨装置
用研磨工具を提供することにある。The object of the present invention is to solve the above problems of the prior art, to simplify the structure, to improve the production efficiency without failure, to make it possible to construct a polishing apparatus of this kind at a low cost, and to reduce the manufacturing cost of the product. An object of the present invention is to provide a polishing tool for a polishing device for plate glass or the like that can be made inexpensive.
【０００６】[0006]
【課題を解決するための手段】上記目的を達成するた
め、本発明は、複数の剛性部材の間に弾性材を介在させ
て基板を構成し、この基板に研磨布を固着して板ガラス
等の研磨装置用研磨工具を構成したものである。In order to achieve the above object, the present invention comprises a substrate in which an elastic material is interposed between a plurality of rigid members, and a polishing cloth is fixed to the substrate to fix a plate glass or the like. A polishing tool for a polishing apparatus is configured.
【０００７】[0007]
【作用】本発明の研磨工具は、基板を構成する複数の剛
性部材の間に弾性材を介在させたから、この弾性材によ
り、研磨布面が少し自在に動作できるため、研磨装置の
組み立て精度や被研磨面の平坦度が完全でない場合で
も、これらを吸収させることができ、傾斜面でも研磨圧
力の不均一を防止し、装置の振動も吸収させることがで
きる。特に、研磨布は剛性部材に固着してあるため、比
較的硬く、凸部を先行して研磨させ得るため、研磨効率
がよく、良好な研磨面を得ることができ、しかも、構造
が簡単で故障がなく生産効率の向上が図れる。In the polishing tool of the present invention, the elastic material is interposed between the plurality of rigid members constituting the substrate, and the elastic cloth allows the polishing cloth surface to move a little freely. Even if the flatness of the surface to be polished is not perfect, they can be absorbed, unevenness of the polishing pressure can be prevented even on the inclined surface, and the vibration of the apparatus can be absorbed. In particular, since the polishing cloth is fixed to the rigid member, it is relatively hard, and the protrusions can be polished in advance, so that the polishing efficiency is good, a good polishing surface can be obtained, and the structure is simple. There are no breakdowns and production efficiency can be improved.
【０００８】[0008]
【実施例】図１は本発明の研磨工具の側面図、図２及び
図３は本発明の研磨工具の動作説明図である。本発明の
研磨工具は、図１に示すように、複数の剛性部材１、２
の間に弾性材３を介在させて基板４を構成し、この基板
４に研磨布５を固着したものである。剛性部材１、２
は、円盤状の金属板で構成され、弾性材３は、軟質ゴ
ム、スポンジゴム等で構成し、剛性部材１、２に接着剤
で固着するものである。研磨布５は、従来と同様にフェ
ルトやバフで構成し、上記した基板４に接着剤で固着す
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a side view of a polishing tool of the present invention, and FIGS. 2 and 3 are operation explanatory views of the polishing tool of the present invention. The polishing tool of the present invention, as shown in FIG.
A substrate 4 is formed by interposing an elastic material 3 between them, and a polishing cloth 5 is fixed to the substrate 4. Rigid members 1, 2
Is made of a disk-shaped metal plate, the elastic member 3 is made of soft rubber, sponge rubber or the like, and is fixed to the rigid members 1 and 2 with an adhesive. The polishing cloth 5 is made of felt or buff as in the conventional case, and is fixed to the substrate 4 with an adhesive.
【０００９】本発明の研磨工具は、研磨ヘッド（図示省
略）に単独で取り付けたり、或いは、図２に示すよう
に、複数個で取り付けて使用する。この場合、個々の研
磨工具は、自転しながら公転するように遊星歯車機構等
を介して回転駆動され、かつ、常時、一定の研磨圧力が
付与され、しかも、板ガラス等の被研磨面６には酸化セ
リウムやベンガラ等の研磨剤が供給される。そして、個
々の研磨工具と被研磨面との間に段差がある場合、個々
の研磨工具の剛性部材１、２間に介在させた弾性材３が
図２のように変形して段差を吸収し、研磨圧力差を少な
くする。また、研磨工具と被研磨面６との関係が斜め等
になっている場合、図３に示すように、１個の研磨工具
内の弾性材３の厚みの変化量が異なり、斜めの誤差を吸
収させることができる。上記弾性材３は、研磨加工中の
機械の振動等も吸収し、能率よく研磨させることができ
る。The polishing tool of the present invention may be used alone or attached to a polishing head (not shown), or as shown in FIG. In this case, each polishing tool is rotatably driven through a planetary gear mechanism or the like so as to revolve while revolving, and a constant polishing pressure is constantly applied to the polishing tool. An abrasive such as cerium oxide or red iron oxide is supplied. When there is a step between each polishing tool and the surface to be polished, the elastic material 3 interposed between the rigid members 1 and 2 of each polishing tool deforms as shown in FIG. 2 to absorb the step. , Reduce the polishing pressure difference. Further, when the relationship between the polishing tool and the surface 6 to be polished is slanted or the like, as shown in FIG. Can be absorbed. The elastic material 3 absorbs the vibration of the machine during polishing and the like, and can efficiently polish.
【００１０】上記した本発明の研磨工具は、板ガラスの
表面の研磨に好適であるが、板状物であれば、いずれで
も同様に適用できるものである。The above-mentioned polishing tool of the present invention is suitable for polishing the surface of a plate glass, but any plate-like material can be similarly applied.
【００１１】[0011]
【発明の効果】本発明によれば、基板を構成する複数の
剛性部材の間に弾性材を介在させたから、この弾性材に
より、研磨布面が少し自在に動作できるため、研磨装置
の組み立て精度や被研磨面の平坦度が完全でない場合で
も、これらを吸収させることができ、傾斜面でも研磨圧
力の不均一を防止し、装置の振動も吸収させることがで
きる。特に、研磨布は剛性部材に固着してあるため、比
較的硬く、凸部を先行して研磨させ得るため、研磨効率
がよく、良好な研磨面を得ることができ、しかも、構造
が簡単で故障がなく生産効率の向上が図れ、この種の研
磨装置を安価に構成し、製品の製造コストを安価となし
得る利点がある。According to the present invention, since the elastic material is interposed between the plurality of rigid members forming the substrate, the elastic cloth allows the polishing cloth surface to move a little freely. Even if the surface to be polished or the flatness of the surface to be polished is not perfect, they can be absorbed, unevenness of the polishing pressure can be prevented even on the inclined surface, and vibration of the apparatus can be absorbed. In particular, since the polishing cloth is fixed to the rigid member, it is relatively hard, and the protrusions can be polished in advance, so that the polishing efficiency is good, a good polishing surface can be obtained, and the structure is simple. There is an advantage that the production efficiency can be improved without any failure, the polishing apparatus of this kind can be configured at low cost, and the manufacturing cost of the product can be reduced.
【図１】本発明の研磨工具の側面図。FIG. 1 is a side view of a polishing tool of the present invention.
【図２】本発明の研磨工具の動作説明図。FIG. 2 is an operation explanatory view of the polishing tool of the present invention.
【図３】本発明の研磨工具の動作説明図。FIG. 3 is an operation explanatory view of the polishing tool of the present invention.
１ 剛性部材 ２ 剛性部材 ３ 弾性材 ４ 基板 ５ 研磨布 ６ 被研磨面 1 Rigid member 2 Rigid member 3 Elastic material 4 Substrate 5 Polishing cloth 6 Surface to be polished
Claims (1)
て基板を構成し、この基板に研磨布を固着したことを特
徴とする板ガラス等の研磨装置用研磨工具。1. A polishing tool for a polishing apparatus, such as a plate glass, characterized in that an elastic material is interposed between a plurality of rigid members to form a substrate, and a polishing cloth is fixed to the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21967294A JPH0885067A (en) | 1994-09-14 | 1994-09-14 | Polishing tool for polishing device for plate glass, etc. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21967294A JPH0885067A (en) | 1994-09-14 | 1994-09-14 | Polishing tool for polishing device for plate glass, etc. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0885067A true JPH0885067A (en) | 1996-04-02 |
Family
ID=16739174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21967294A Withdrawn JPH0885067A (en) | 1994-09-14 | 1994-09-14 | Polishing tool for polishing device for plate glass, etc. |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0885067A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009214278A (en) * | 2008-03-13 | 2009-09-24 | Nikon Corp | Grinding wheel |
| CN105290988A (en) * | 2015-10-23 | 2016-02-03 | 上虞市自远磨具有限公司 | Leather abrasive paper capable of polishing curved surface materials and preparation method thereof |
-
1994
- 1994-09-14 JP JP21967294A patent/JPH0885067A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009214278A (en) * | 2008-03-13 | 2009-09-24 | Nikon Corp | Grinding wheel |
| CN105290988A (en) * | 2015-10-23 | 2016-02-03 | 上虞市自远磨具有限公司 | Leather abrasive paper capable of polishing curved surface materials and preparation method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4934102A (en) | System for mechanical planarization | |
| JP2000015557A (en) | Polishing device | |
| JP2000218482A (en) | Single wafer type end face polishing machine | |
| TW380075B (en) | Polishing apparatus | |
| JPS61192460A (en) | Grinding method for end face of optical connector core into convex spherical surface | |
| JP3334817B2 (en) | Polishing method of glass plate | |
| JPH11333677A (en) | Polishing device for substrate | |
| JPH11254302A (en) | Both side polishing device | |
| JP2575489B2 (en) | Wafer polishing method and polishing apparatus | |
| JP2006324417A (en) | Wafer polishing apparatus and wafer polishing method | |
| JP2000198068A (en) | Single wafer polishing machine | |
| KR100926025B1 (en) | Double side polishing apparatus and double side polishing method of rectangular substrate | |
| JP3358716B2 (en) | Wafer polishing apparatus and method | |
| JP2001157960A (en) | Polishing method, polishing device, and bearing device | |
| JPH11226861A (en) | Abrasive cloth and surface polishing device | |
| JPH1126405A (en) | Polishing equipment | |
| JP2714160B2 (en) | Wet whetstone with pedestal and method of manufacturing the same | |
| CN213439026U (en) | A New Type of Reversible Backlight Glass Scanner | |
| KR100851505B1 (en) | Pad conditioner for chemical mechanical polishing equipment | |
| JPS6393561A (en) | Method of grinding one side by both-side grinding device | |
| JPH11320424A (en) | Grinding wheel for polishing substrate and polishing device | |
| JPH05234969A (en) | Wafer polishing device | |
| JPH05116069A (en) | Cleaning device for polishing cloth in polishing device | |
| JPH11239964A (en) | Back pad, its manufacture and waxless mounting type polishing device using it | |
| JP2008006555A (en) | Polishing equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20011120 |