JPH0885712A - Photosensitive composition for color filter, color filter and method for producing the same - Google Patents

Abstract

(57) [Summary] (Correction) [Purpose] To provide a photosensitive composition capable of obtaining uniform spectral characteristics over the entire screen and having excellent heat resistance and light resistance. [Structure] (A) A cardo type epoxy compound represented by the following formula:
An unsaturated group-containing compound obtained by reacting a reaction product of at least one unsaturated group-containing carboxylic acid selected from methacrylic acid and acrylic acid with a polybasic carboxylic acid or an anhydride thereof, B) an ethylenically unsaturated group-containing compound other than an unsaturated group-containing carboxylic acid, and (C) an epoxy group-containing compound other than a cardo type epoxy compound,
It contains (D) a photopolymerization initiator and (E) a dye.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive composition for color filters, and more particularly to a photosensitive composition for color filters which can be suitably used for fine color separation of color sensors, color solid-state image pickup devices, color displays and the like. The present invention relates to a composition and a color filter using the composition.

[0002]

2. Description of the Related Art A color filter is an indispensable constituent element of a color display such as a color image pickup device and a color liquid crystal display device. In particular, in a color liquid crystal display device that is required to have a large screen, the spectral characteristic of the color filter is an important factor in determining the display quality.

A conventional color filter is manufactured by providing a colored layer on a transparent substrate such as glass by a dyeing method, a pigment dispersion method, a printing method, an electrodeposition method or the like. Colorants forming this colored layer are roughly classified into dyes and pigments, and have the following features.
A color filter using a pigment has excellent heat resistance, light resistance, and chemical resistance, but it is known that the display contrast ratio of a color liquid crystal display device is deteriorated due to its depolarizing effect. In addition, since pigments are generally insoluble in solvents and polymers, the composition for color filters is formed as a dispersion liquid consisting of particles of about 0.1 μm, but it is difficult to stabilize the dispersion liquid and the color with uniform spectral characteristics is obtained. It is difficult to get a filter.

On the other hand, since the dye is soluble in a solvent or a polymer system, the composition for a color filter is stable, and even in the color filter obtained from this, dye molecules are present at a molecular size, so that The filter has no depolarizing effect and has excellent spectral characteristics. However, compared to pigments, color filters using dyes
It had poor chemical resistance. For example, a water-soluble acid dye,
The heat resistance of a color filter dyed by ionic bonding with a direct dye is about 180 ° C.

To improve this, acrylic acid compounds and CI
UV-cured products containing dyes and photopolymerization initiators such as Solvent Yellow 82 and CISolvent Blue 70 are known (Japanese Patent Laid-Open No. 61-31449), but they are related to colored resins that use extremely small amounts of dyes and are required for color filters. It does not have excellent spectral characteristics.

Therefore, a method of preparing a color filter by dissolving an oil-soluble dye and a disperse dye in a non-photosensitive polyimide precursor solution and performing mask etching with a positive resist after film formation (publication 1-501973, Japanese Patent Publication No. 4-243) ) Has been proposed, but there are problems that an expensive polyimide precursor is used, the process is complicated, and the heat resistance is insufficient.

Further, a positive type resist (Japanese Patent Laid-Open No. 2-127602,
Japanese Unexamined Patent Publication (Kokai) No. 4-175753), positive resists and cross-linking agents (Japanese Unexamined Patent Publication (Kokai) No. 4-283701, Japanese Unexamined Patent Publication (Kokai) No. 4-301802, Japanese Unexamined Patent Publication (Kokai) No. 6-35183
However, the sensitivity and heat resistance were insufficient.

On the other hand, a negative resist mainly composed of a compound obtained by reacting a cardo type epoxy compound having high sensitivity, excellent heat resistance and transparency with an acrylic acid type reaction product and a polybasic carvone is overcoated. It is also known to be used as a material (Japanese Patent Application Laid-Open No. 4-363311) and to make a pigment dispersion method color filter (Japanese Patent Application Laid-Open No. 6-1938), but it is not possible to form a color filter by dissolving a dye in this resist. unknown.

[0009]

Color filters using dyes are inferior in heat resistance, light resistance and chemical resistance as compared with pigments. Moreover, a dye-dispersed color filter having good spectral characteristics has not yet been obtained.

The present invention has been made in view of the above problems, and an object of the present invention is to provide a photosensitive composition for a color filter and a color filter which are excellent in heat resistance, light resistance, chemical resistance, and spectral characteristics. .

[0011]

Means for Solving the Problems As a result of intensive studies on the combination of a dye having excellent heat resistance, light resistance and chemical resistance and a photosensitive composition while maintaining the spectral characteristics, the present inventors have found the following findings. Obtained. That is, since the dye exists at a much smaller molecular level than the pigment, radicals generated at the time of exposure are easily trapped and it is difficult for photocuring to proceed, so that a pattern of a required film thickness cannot be obtained and spectral characteristics are deteriorated. Further, unless a photosensitive composition having a high crosslinking density is used, the dye will flow out from the pattern during development. Therefore, the present invention is characterized by including a dye in a photosensitive composition having a high crosslinking density.

The photosensitive composition for a color filter of the present invention comprises (A) a cardo type epoxy compound represented by the following formula (1):

Embedded image An unsaturated group-containing compound obtained by reacting a reaction product of at least one unsaturated group-containing carboxylic acid selected from methacrylic acid and acrylic acid with a polybasic carboxylic acid or an anhydride thereof, B) an ethylenically unsaturated group-containing compound other than the unsaturated group-containing carboxylic acid, (C) a compound having an epoxy group other than the cardo type epoxy compound represented by the formula (1), and (D) a photopolymerization initiator , (E)
And a dye.

Furthermore, in order to have good spectral characteristics and high heat resistance, light resistance and chemical resistance, the following dyes were found to be preferable in combination with the above-mentioned photosensitive composition. Therefore, in the present invention, the dye is a color index (CI) So
lvent Yellow 21, CI Solvent Yellow 62, CISolv
ent Yellow 81, CISolvent Yellow 82, CISolven
t Yellow 83, CISolvent Yellow 88, CISolvent
Yellow 162, CIDisperse Yellow 201, CISolvent
Orange 6, CISolvent Orange 40, CISolvent Oran
ge 45, CISolvent Orange 54, CISolvent Orange
59, CISolvent Red 18, CISolvent Red 35, CI
Solvent Red 52, CISolvent Red 89, CISolvent Re
d 119, CISolvent Red 124, CISolvent Red 125
, CISolvent Red 127, CISolvent Red 160, C.
I.Solvent Red 227, CISolvent Blue 38, CISolv
ent Blue 40, CISolvent Blue 44, CISolvent Bl
ue45, CISolvent Blue 67, CISolvent Blue 70
, CISolvent Violet 2, and CIDisperse Violet 31.

The color filter of the present invention is characterized by being formed using the above-mentioned photosensitive composition for a color filter.

Further, the method for producing a color filter of the present invention comprises a step of coating and drying a photosensitive composition for a color filter on a substrate, and a step of forming a pixel pattern by photolithography of the coated and dried photosensitive composition. In the method for producing a color filter, the photosensitive composition for a color filter uses the above-mentioned photosensitive composition for a color filter.

Each component of the photosensitive composition for a color filter of the present invention will be described. The unsaturated group-containing compound (A) used in the present invention comprises an epoxy compound represented by the formula (1) (for example, ESF-300 manufactured by Nippon Steel Chemical Co., Rss-1079 manufactured by Shell Chemical Co., Ltd.), methacrylic acid and acrylic acid. The reaction product with at least one selected unsaturated group-containing carboxylic acid can be obtained by further reacting with a polybasic carboxylic acid or an anhydride thereof.

Examples of the polybasic carboxylic acid or its anhydride include maleic acid, succinic acid, itaconic acid, phthalic acid, tehilahydrophthalic acid, hexahydrophthalic acid, methyltetrahydrophthalic acid and the like and anhydrides of these acids. ,
Acids such as pyromellitic acid, benzophenonetetracarboxylic acid, biphenyltetracarboxylic acid, biphenylethertetracarboxylic acid, trimellitic acid, and acid dianhydrides of these acids, and the like, and at least one of them may be used preferable.

As the ethylenically unsaturated group-containing compound (B) other than the unsaturated group-containing carboxylic acid used in the present invention,
For example, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, trimethylolethane tri (meth) ) Acrylate, pentaerythritol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa ( (Meth) acrylate, glycerol (meth) acrylate, tris ((meth) acryloyloxyethyl)
(Meth) acrylic acid esters such as isocyanurate may be mentioned. Here, (meth) acrylate means methacrylate and acrylate. These compounds may be used alone or in combination of two or more. Of these compounds, those having a trifunctional or higher functional (meth) acrylate group are preferable in terms of sensitivity, crosslink density, heat resistance and chemical resistance,
Dipentaerythritol penta (meth) acrylate,
Dipentaerythritol hexa (meth) acrylate and the like are particularly preferable.

The amount of the component (B) used is usually 100 parts by weight or less based on 100 parts by weight of the component (A). The amount used
If it exceeds 100 parts by weight, tackiness after prebaking will be problematic and heat resistance will be deteriorated. The preferred range is 40
~ 80 parts by weight.

The compound (C) having an epoxy group according to the present invention is important for improving the adhesion to the substrate.
Typical examples thereof include epoxy resins such as phenol novolac type epoxy resin, cresol novolac type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, biphenyl type epoxy resin, and alicyclic epoxy resin. Triglycidyl isocyanurate, glycidyl methacrylate, N,
Examples thereof include compounds having at least one epoxy group such as N, N ', N'-tetraglycidyldiaminodiphenylmethane.

The amount of the component (C) used is 5 to 50 parts by weight based on 100 parts by weight of the component (A). If the amount is less than 5 parts by weight, the adhesion to the substrate will be reduced. descend. A more preferred range is 10 to 30 parts by weight.

Further, as the photopolymerization initiator (D) used in the present invention, for example, benzoin, benzyl, benzoin methyl ether, acetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one,
1- (4-isopropylphenyl) -2-hydroxy-
2-methylpropan-1-one, 4- (2-hydroxyethoxy) phenyl- (2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexylphenylketone, 2,2-dimethoxy-2-phenylacetophenone, 2- Methyl- [4- (methylthio) phenyl] -2
-Morpholino-1-propan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, benzophenone, 4,4 '
-Bis (dimethylamino) benzophenone, 4,4'-
Bis (diethylamino) benzophenone, N, N-dimethylaminoacetophenone, 2-methylanthraquinone, 2-ethylanthraquinone, 1-chloroanthraquinone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, 2,4,6-trichloro. Methyl-s-triazine, 2- (p-chlorophenyl)-
4,6-bis (trichloromethyl) -s-triazine,
2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2,4-bis (trichloromethyl) -4'-methoxyphenyl-s-triazine, 2-
(4-Methoxy-naphth-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2-p-methoxystyryl-4,6-bis (trichloromethyl) -s
-Triazine, 2- (2 ', 4'-dimethoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2,2'-bis (o-chlorophenyl) -4,4
′, 5,5 ′,-tetraphenylbisimidazolyl,
2,2'-bis (o-chlorophenyl) -4,4'5
5 ',-tetra- (p-methoxyphenyl) bisimidazolyl, 2,4,6, -trimethylbenzoyldiphenylphosphine oxide, triphenylphosphine, triphenylphosphite, trilauryl-trithiophosphite, bis (2,6-dimethoxy) Benzoyl)-
2,4,4-Trimethylpentylphosphine oxide, (η ^{5 to} 2,4-cyclopentadien-1-yl)
[(1,2,3,4,5,6-η)-(1-methylethyl) benzene] -iron (1 +)-hexafluorophosphate (1-) and the like can be mentioned. These may be used alone or in combination of two or more. Further, the photopolymerization initiator (D) is N, N-
Dimethylaminobenzoic acid ethyl ester, N, N-dimethylaminobenzoic acid isoamyl ester, triethanolamine, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobunzoimidazole, 2-mercapto-5-methylthio-1. , 3,
Known and conventional photosensitizers such as 4-thiadiazole can be used alone or in combination of two or more kinds.

The amount of the photopolymerization initiator (D) used is preferably 0.5 to 70 parts by weight, particularly preferably 1 to 50 parts by weight, based on 100 parts by weight of the total amount of the components (A) + (B). is there.

The dye (E) used in the present invention is required to have a spectral characteristic required for a color filter and to be dissolved in at least one of the above components (A), (B) and (C). Is. At least examples of these dyes include oil-soluble dyes, disperse dyes, acid dyes, direct dyes, and reactive dyes. However, photocurable,
In characteristics such as spectral characteristics, solubility, heat resistance, light resistance,
CISolvent Yellow 21, CISolvent Yellow 62, C.I.
I.Solvent Yellow 81, CI Solvent Yellow 82, CI
Solvent Yellow 83, CISolvent Yellow 88, CISo
lvent Yellow 162, CIDisperse Yellow 201, CISo
lvent Orange 6, CISolvent Orange 40, CISolven
t Orange 45, CISolvent Orange 54, CISolvent
Orange 59, CISolvent Red 18, CISolvent Red 3
5, CISolvent Red 52, CISolvent Red 89, CISol
vent Red 119, CISolvent Red 124, CISolvent R
ed 125, CISolvent Red 127, CISolvent Red 160
, CISolvent Red 227, CISolvent Blue 38, C.I.
I.Solvent Blue 40, CISolvent Blue 44, CISolv
entBlue 45, CISolvent Blue 67, CISolvent Blu
e 70, CISolvent Violet2, CIDisperse Violet 31
It is particularly preferred to select from the group consisting of

The amount of these dyes (E) used is 1 per 100 parts by weight of the total amount of the components (A) + (B) + (C).
0 to 200 parts by weight is preferred. If it is less than 10 parts by weight, desired spectral characteristics cannot be obtained, and if it exceeds 200 parts by weight, the adhesiveness and sensitivity of the resist film are deteriorated, which is not preferable. A more preferred range is 20 to 80 parts by weight.

In the photosensitive composition of the present invention, if necessary, an epoxy group curing accelerator, a thermal polymerization inhibitor, a plasticizer, a leveling material, a defoaming agent, an adhesion promoter, a light stabilizer, an antioxidant. Etc. can be used. Examples of the epoxy group curing accelerator include amine compounds, imidazole compounds, carboxylic acid hydrazides, dicyandiamides, carboxylic acids, phenols, quaternary ammonium salts, and methylol group-containing compounds. Further, examples of the thermal polymerization inhibitor include hydroquinone, hydroquinone monomethyl ether, pyrogallol, tertiary butyl catechol, phenothiazine and the like. Examples of the plasticizer include dibutyl phthalate, dioctyl phthalate, tricresyl and the like. Examples of the defoaming agent and leveling agent include silicon-based, fluorine-based, and alcohol-based compounds. Examples of the adhesion promoter include a silane coupling agent, examples of the light stabilizer include hindered amines, and examples of the antioxidant include an organic phosphorus compound.

The photosensitive composition of the present invention is used as a solution by dissolving or dispersing in a suitable solvent. Examples of the solvent include methyl cellosolve, ethyl cellosolve, butyl cellosolve, ethyl cellosolve acetate, ethyl carbitol, Cellosolves such as propylene glycol monomethyl ether acetate, acetone,
Examples thereof include ketones such as methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone, and polar solvents such as γ-butyrolactone, sulfolane, N, N-dimethylacetamide, N, N-dimethylimidazolidinone and N-methylpyrrolidone.

A method for producing a color filter using the photosensitive composition of the present invention will be described. First, the photosensitive composition solution of the present invention is used to form a coating film on a substrate by spin coating, roll coating, or the like transfer of red, blue, green, or any one of yellow, cyan, and magenta. . Then, a first-color pixel pattern is formed by exposing with a photolithographic means, developing with an alkali developing solution, and curing with after-baking. Continued
A color filter is completed by similarly forming a pixel pattern using the second color composition solution and the third color composition solution.

By ink jetting or printing the composition solution of the present invention, a color filter can be formed without using photolithography means.

[0030]

In the present invention, the photosensitive composition in which the dye is dispersed has a very high crosslink density, and the dye dispersed at the molecular level can be sufficiently retained in the film. It has excellent heat resistance, light resistance, and chemical resistance while maintaining it.

[0031]

Embodiments will be specifically described below with reference to embodiments. Example of Synthesis of Unsaturated Group-Containing Compound (a) Cardo type epoxy compound ESF-30 was added to a 500 ml flask.
0 (Nippon Steel Chemical Co., Ltd., trade name, epoxy equivalent 231) 231g
And 0.45 g of triethylbenzylammonium chloride, 0.1 g of 2,6-diisobutylphenol and acrylic acid 7
After adding 2 g and mixing, the mixture was heated at 120 ° C. for 8 hours while blowing air and reacted to obtain a colorless transparent solid. Next, 303 g of this solid was dissolved in 2000 ml of ethyl cellosolve acetate, and then 1,2,3,6-tetrahydrophthalic anhydride was dissolved.
38 g and biphenyl tetracarboxylic dianhydride 73.5
g, and 1 g of tetraethylammonium bromide were added,
The reaction was carried out at 0 ° C for 2 hours to obtain a photopolymerizable unsaturated group-containing compound (a).

Example 1 The photopolymerizable unsaturated group-containing compound (a) thus obtained was used as the component (A), and the following (B)
The photosensitive composition 1 was prepared by blending the components, the component (C), the component (D), the component (E) and the solvent in the following proportions.

Ingredients Ratio (parts by weight) Photopolymerizable unsaturated compound (a) [(A) component] 20.0 Dipentaerythritol hexaacrylate [(B) component] 7.8 Dipentaerythritol pentaacrylate [(B) component] 4.2 Tetramethyl biphenyl epoxy resin [(C) component] 4.2 4,4'-bis (diethylamino) benzophenone [(D) component] 0.2 Irgacure 369 [(D) component] 2.0 ClSolvent Red 119 [(E) component] 15.0 ClSolvent Yellow 21 [Component (E)] 9.0 Ethyl Cellosolve Acetate [Solvent Component] 70.0 Next, the photosensitive composition 1 was applied to the glass substrate at 2000 rpm at 1 rpm.
It was applied for 0 seconds and exposed at 400 mJ / cm ² . Prebaking
After 5 minutes at 80 ℃, development with 0.4 wt% sodium carbonate aqueous solution, and after-baking at 200 ℃ for 1 hour, a red film pattern with a residual film ratio of 90% and a resolution of 2 μm was obtained. Was given.

The obtained red pixel pattern was subjected to a light resistance test with a xenon fade meter, and the color difference (ΔEab ^* ) from the initial value after 1000 hours was found.
It was small and excellent at 1.8. Further heat resistance test (250 ℃,
Even after 1 hour, the color difference (ΔEab ^* ) was as good as 2.5.

Example 2 ClSolvent Red 119 and ClSolvent Yellow of Example 1
A good green pattern was obtained in the same manner as in Example 1 except that 10 parts by weight of ClSolvent Blue 40 and 12 parts by weight of ClSolvent Yellow 82 were used instead of 21. Color difference in the light resistance test (AEab ^*) 2.8, the color difference of a heat resistance test (AEab ^*) was less good as 2.3.

Example 3 ClSolvent Red 119 and ClSolvent Yellow of Example 1
A good blue pattern was obtained in the same manner as in Example 1 except that 8 parts by weight of ClSolvent Blue 70 and 5 parts by weight of ClSolvent Red 35 were used instead of 21. Color difference in the light resistance test (AEab ^*) 1.7, the color difference of a heat resistance test (AEab ^*) was less good as 2.5.

Comparative Example 1 Instead of the photopolymerizable unsaturated compound (a) of Example 1, SM was used.
A-2625 (product of Arco Chemical, trade name, styrene-
Maleic acid copolymerized half ester) The same procedure as in Example 1 was carried out except that 20 parts by weight was used. When exposed to 400 mJ / cm ² , the coating film peeled off during development. When the exposure amount was increased stepwise, a pattern was finally obtained at 4000 mJ / cm ² , but the dye was eluted so much that the spectral characteristics required for the color filter were not satisfied.

Examples 4 to 18 and Comparative Example 2 The photopolymerizable unsaturated group-containing compound (a) was used as the component (A).
20.0 parts by weight, 12.0 parts by weight of dipentaerythritol hexaacrylate as the component (B), 4.2 parts by weight of tetramethylbiphenyl epoxy resin as the component (C),
1.2 parts by weight of benzophenone as component (D) 4,4
Example 1 was prepared using 0.2 parts by weight of ′ -bis (diethylamino) benzophenone, 1.2 parts by weight of Irgacure 907, the dye shown in Table 1 as the component (E), and 12.0 parts by weight of propylene glycol monomethyl ether acetate as the solvent component. Each pixel pattern was obtained under the same conditions.

The obtained pixel pattern was subjected to a light resistance test and a heat resistance test with a xenon fade meter under the same conditions as in Example 1. The results are shown in Table 1. All of Examples 4 to 18 were superior to Comparative Example 2.

[0040]

[Table 1] Example 19 A method for manufacturing a full-color filter of the present invention will be described with reference to FIG.

The transparent substrate 1 on which the pattern of the black matrix 2 was previously formed was washed (FIG. 1 (a)), and the photosensitive composition used in Example 1 was applied and dried under the conditions of Example 1 (FIG. 1). (B)), exposure, development and after-baking were performed to obtain a red pixel pattern 3 (FIG. 1 (c)). The red pixel pattern 3 was formed every two patterns of the black matrix 2.

Next, using the photosensitive composition of Example 2, the green pixel pattern 4 was formed on one side of the red pixel pattern 3 under the same conditions as the formation of the red pixel pattern (FIG. 1).
(D)).

Thereafter, using the photosensitive composition of Example 3, a blue pixel pattern 5 was formed between the red pixel pattern 3 and the green pixel pattern 4 under the same conditions as in the formation of the red pixel pattern (FIG. 1). (E)).

Finally, an overcoat layer 6 was formed and a transparent electrode 7 was formed to obtain a full color filter.

The obtained full-color filter showed excellent spectral characteristics, and showed the same characteristics as the monochromatic filter in both the light resistance test and the heat resistance test.

[0046]

The photosensitive composition for a color filter of the present invention has high photocurability even though it contains a dye as a colorant, and the sensitivity is good. And light resistance.

[Brief description of drawings]

FIG. 1 is a diagram showing a manufacturing process of a full-color filter.

[Explanation of symbols]

1 ... Transparent substrate, 2 ... Black matrix, 3
……… Red pixel pattern, 4… Green pixel pattern,
5: Blue pixel pattern, 6: Overcoat layer,
7 ... Transparent electrode.

Claims (4)

[Claims] 1. An epoxy compound represented by the following formula (1): An unsaturated group-containing compound obtained by reacting a reaction product of at least one unsaturated group-containing carboxylic acid selected from methacrylic acid and acrylic acid with a polybasic carboxylic acid or an anhydride thereof, B) an ethylenically unsaturated group-containing compound other than the unsaturated group-containing carboxylic acid, (C) a compound having an epoxy group other than the epoxy compound represented by the formula (1), and (D) a photopolymerization initiator , (E) a dye, and a photosensitive composition for a color filter. 2. The photosensitive composition for a color filter according to claim 1, wherein the dye is Color Index (CI) Solv.
ent Yellow 21, CISolvent Yellow 62, CISolven
t Yellow 81, CISolvent Yellow 82, CISolvent
Yellow 83, CISolvent Yellow 88, CISolvent Ye
llow 162, CIDisperse Yellow 201, CISolvent Ora
nge 6, CISolvent Orange 40, CISolvent Orange
45, CISolvent Orange 54, CISolvent Orange 59
, CISolvent Red 18, CISolvent Red 35, CISol
vent Red 52, CISolvent Red 89, CISolvent Red11
9, CISolvent Red 124, CISolvent Red 125, C.I.
I.Solvent Red 127, CISolvent Red 160, CISolv
ent Red 227, CISolvent Blue 38, CISolvent Bl
ue 40, CISolvent Blue 44, CISolvent Blue 45
, CISolventBlue 67, CISolventBlue 70, CI
A photosensitive composition for a color filter, which is selected from the group consisting of Solvent Violet 2 and CIDisperse Violet 31. 3. A color filter formed using the photosensitive composition for a color filter according to claim 1 or 2. 4. A method for producing a color filter, which comprises a step of coating and drying a photosensitive composition for a color filter on a substrate, and a step of forming a pixel pattern by photolithography of the photosensitive composition coated and dried, The method for producing a color filter, wherein the photosensitive composition for a color filter uses the photosensitive composition for a color filter according to claim 1 or 2.