JPH0891812A - Method for purifying nitrogen trifluoride gas - Google Patents

Method for purifying nitrogen trifluoride gas

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Publication number
JPH0891812A
JPH0891812A JP22513694A JP22513694A JPH0891812A JP H0891812 A JPH0891812 A JP H0891812A JP 22513694 A JP22513694 A JP 22513694A JP 22513694 A JP22513694 A JP 22513694A JP H0891812 A JPH0891812 A JP H0891812A
Authority
JP
Japan
Prior art keywords
gas
zeolite
temperature
present
nitrogen trifluoride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22513694A
Other languages
Japanese (ja)
Inventor
Takeki Shinozaki
武樹 篠崎
Hideo Kamata
秀男 釜田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP22513694A priority Critical patent/JPH0891812A/en
Publication of JPH0891812A publication Critical patent/JPH0891812A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To efficiently remove SF6 in gaseous NF3 and to efficiently purify the gaseous NF3 by allowing the gaseous NF3 to flow to a zeolite having specified condition under a prescribed condition. CONSTITUTION: The gaseous NF3 removed impurity content such as N2 O, CO2 , N2 F2 by a well-known method preferably and containing the SF6 as an impurity and having >=99.99vol.% purity is allowed to flow at -125 to 50 deg.C and in such a state that water content is not incorporated substantially to a synthetic zeolite (e.g. 5A type zeolite) cooled to about room temp. after being subjected previously to heat treatment at 250-500 deg.C, preferably at 300-400 deg.C. A grain size of the synthetic zeolite is preferably 2-20 mesh.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は三弗化窒素ガスの精製方
法に関する。更に詳しくは、三弗化窒素ガス中に含まれ
る六弗化イオウ(SF6)の除去方法に関する。
FIELD OF THE INVENTION The present invention relates to a method for purifying nitrogen trifluoride gas. More specifically, it relates to a method for removing sulfur hexafluoride (SF 6 ) contained in nitrogen trifluoride gas.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】三弗化
窒素(NF3)ガスは、半導体のドライエッチング剤や CVD
装置のクリーニングガスとして近年注目され、その生産
量は著しく伸びている。これらの用途に使用されるNF3
ガスは、近年、益々高純度のものが要求されて来てい
る。
2. Description of the Related Art Nitrogen trifluoride (NF 3 ) gas is used as a dry etching agent for semiconductors and CVD.
In recent years, it has attracted attention as a cleaning gas for equipment, and its production volume has increased remarkably. NF 3 used in these applications
In recent years, gas with higher purity has been required.

【0003】NF3 ガスは、種々の方法で製造される。た
とえば、アンモニウム酸弗化物の溶融塩を電解する方
法、アンモニウム酸弗化物を溶融状態において気相状の
弗素と反応させる方法、固体状の金属弗化物のアンモニ
ウム錯体と元素状弗素を反応させる方法、弗化アンモニ
ウムまたは酸性弗化アンモニウムと弗化水素を原料とす
るNH4F・HFや、さらにこれに弗化カリウムまたは酸性弗
化カリウムを該原料に加えたKF・NH4F・HF系での溶融塩
電解法などがある。しかしながら、何れの方法で得られ
たガスも殆どの場合、N2O 、CO2 、N2F2などの不純物を
比較的多量に含んでいるので、上記用途としての高純度
のNF3 ガスを得るためには精製が必要である。
NF 3 gas is produced in various ways. For example, a method of electrolyzing a molten salt of ammonium acid fluoride, a method of reacting ammonium acid fluoride with fluorine in a vapor phase in a molten state, a method of reacting an ammonium complex of a solid metal fluoride with elemental fluorine, NH 4 F ・ HF using ammonium fluoride or acidic ammonium fluoride and hydrogen fluoride as raw materials, or KF ・ NH 4 F ・ HF system in which potassium fluoride or acidic potassium fluoride is further added to the raw materials There is a molten salt electrolysis method. However, in most cases, the gas obtained by any of the methods contains a relatively large amount of impurities such as N 2 O, CO 2 , and N 2 F 2 , so that the high-purity NF 3 gas for the above-mentioned application is used. Purification is required to obtain.

【0004】従来、NF3 ガス中のこれらの不純物を除去
する精製方法としては、合成ゼオライト、活性炭、活性
アルミナ、天然ゼオライト等の吸着剤を使用して、これ
らの不純物を吸着除去する方法がよく知られている。
Conventionally, as a purification method for removing these impurities in the NF 3 gas, a method of adsorbing and removing these impurities using an adsorbent such as synthetic zeolite, activated carbon, activated alumina and natural zeolite is often used. Are known.

【0005】特に、U.S.Pat.No. 4,156,598 や本出願人
等による方法;特公平4-74285 、特願平4-198006、特願
平4-175211などの方法は、上記不純物を効率よく吸着す
るので、この点では一応好ましい吸着剤ではある。しか
しながら、近年の更なる高純度化のNF3 ガスが要求され
ている中で、更なる精製が必要であった。
In particular, the methods of US Pat. No. 4,156,598 and the applicants; Japanese Patent Publication No. 4-74285, Japanese Patent Application No. 4-98006, Japanese Patent Application No. 4-175211, etc., efficiently adsorb the above-mentioned impurities. In this respect, it is a preferable adsorbent. However, in recent years, further purification has been required while NF 3 gas with higher purification is required.

【0006】特に、六弗化イオウ(SF6) は、その他の不
純物分と比較して、従来は問題視されていなかったが、
例えば、4N(純度99.99%のものをいう)、5
N、6N等の高純度化を行う際、その含有量が、問題と
なって来る。
In particular, sulfur hexafluoride (SF 6 ) has not been regarded as a problem in the past as compared with other impurities,
For example, 4N (meaning 99.99% purity), 5
When purifying N, 6N, etc., the content thereof becomes a problem.

【0007】[0007]

【課題を解決するための手段】本発明者等はかかる状況
に鑑み、NF3 ガス中に含まれているSF6 の除去方法につ
いて種々の吸着剤を用いて鋭意検討を重ねた結果、驚く
べきことに、予め特定の温度に加熱処理した合成ゼオラ
イト層へ、特定の温度で処理しようとするNF3ガスを通
気させれば、NF3 が該ゼオライト層に、 NF3ガス中のSF
6 の吸着能力も大きいため、上記不純物を効率よく、更
には工業的かつ経済的に除去できるということを見出
し、本発明を完成するに至ったものである。
In view of the above situation, the inventors of the present invention have conducted extensive studies on various methods of removing SF 6 contained in NF 3 gas, and as a result, it was surprising. In particular, if the NF 3 gas to be treated at a specific temperature is passed through the synthetic zeolite layer that has been heat-treated at a specific temperature in advance, NF 3 is added to the zeolite layer and SF in the NF 3 gas is added.
The present inventors have completed the present invention by discovering that the above-mentioned impurities can be removed efficiently and further industrially and economically because the adsorption capacity of 6 is also large.

【0008】即ち、本発明における三弗化窒素ガスの精
製方法とは、合成ゼオライトを、予め250 〜500 ℃の範
囲の温度に加熱処理を行った後、三弗化窒素ガスを−12
5 〜50℃の温度でかつ実質的に水分の混入しない状態で
通気させることを特徴とするものである。
That is, the method for purifying nitrogen trifluoride gas according to the present invention is that synthetic zeolite is preheated to a temperature in the range of 250 to 500 ° C., and then nitrogen trifluoride gas is converted to −12.
The method is characterized in that aeration is carried out at a temperature of 5 to 50 ° C and in a state in which substantially no water is mixed.

【0009】[0009]

【発明の詳細な開示】以下本発明を詳細に説明する。DETAILED DISCLOSURE OF THE INVENTION The present invention is described in detail below.

【0010】合成ゼオライトには種々の種類のものがあ
り、本発明において使用するゼオライトとしては、特に
限定はないが、本発明者等の研究によれば、吸着しよう
とするSF6 の分子径(5.6Å)、極性を考慮し、4
A、5A、Y型、10X、13Xが好適である。
There are various kinds of synthetic zeolites, and the zeolite used in the present invention is not particularly limited, but according to the study of the present inventors, the molecular diameter of SF 6 to be adsorbed ( 5.6 Å), considering the polarity, 4
A, 5A, Y type, 10X, and 13X are suitable.

【0011】本発明においてこれを吸着剤として使用す
るためには、ゼオライトを適当な粒度、例えば2 〜20メ
ッシュとし、使用することが好ましい。
In order to use this as an adsorbent in the present invention, it is preferable to use zeolite having an appropriate particle size, for example, 2 to 20 mesh.

【0012】本発明においては、かくして所望の粒度を
有するゼオライトを、次に250 ℃〜500 ℃、好ましくは
300 〜400 ℃に加熱処理する。上記規定の温度範囲にお
いてゼオライトを加熱処理することによってのみ、吸着
剤としての能力が格段に向上し、本発明の目的を達成す
る吸着剤とすることができるのである。
In the present invention, the zeolite having the desired particle size is then added to the range of 250 ° C to 500 ° C, preferably
Heat to 300-400 ° C. Only by heat-treating the zeolite in the above-specified temperature range, the ability as an adsorbent is remarkably improved, and the adsorbent that achieves the object of the present invention can be obtained.

【0013】加熱処理温度がこれ未満であると、いくら
長時間加熱処理してもゼオライトの吸着能力が操作開始
後急激に低下し破過時間が大幅に短くなると共に、通気
後のNF3 ガス中のSF6 含有量が、大幅に高くなるからで
ある。
[0013] heating the treatment temperature is less than this, no matter how long with Cooked adsorption capacity of the zeolite also is operated after the start abruptly decreased breakthrough time is much shorter, NF 3 gas after venting This is because the SF 6 content of is significantly increased.

【0014】その理由は必ずしも明確ではないが、本発
明者等の研究では、結晶水を含有しているゼオライトの
場合、これを本発明の吸着剤として使用すると、上記結
晶水(以下、水分と記す)が残存し、該ゼオライト層へ
NF3 ガスを通気した際に、ゼオライト単位体積当たりの
SF6 の除去能力が低下するためと考えられる。したがっ
て、ゼオライト中の水分を実質的に完全に除去するため
にも、上記温度における加熱処理を行うのである。
Although the reason is not always clear, in the study by the present inventors, in the case of a zeolite containing water of crystallization, when it was used as the adsorbent of the present invention, the water of crystallization (hereinafter referred to as water) (Noted) remains and enters the zeolite layer
When aerated with NF 3 gas,
This is probably because the SF 6 removal capacity is reduced. Therefore, the heat treatment is carried out at the above temperature in order to substantially completely remove the water content in the zeolite.

【0015】一方、ゼオライトをこれを越える温度に加
熱すると、ゼオライト自身の結晶構造が変化したり崩れ
たりする。その結果、吸着能力が著しく損なわれて仕舞
い、吸着が行われなかったり、またガス通気後短時間で
破過したりするので好ましくない。
On the other hand, if the zeolite is heated to a temperature exceeding this, the crystal structure of the zeolite itself changes or collapses. As a result, the adsorbing ability is significantly impaired and the product ends up, adsorption is not carried out, or the gas breaks through in a short time after gas is passed, which is not preferable.

【0016】ゼオライトの加熱処理は、水分を実質的に
含有しない窒素、ヘリウム、ネオン、アルゴン、クリプ
トン、キセノンガス等の不活性ガス気流中で行うことが
好ましい。また、該処理は、水分及びCO2 分を予め除去
した乾燥空気中で行うことも出来る。また、減圧下に、
これらのガスを吸引しながら加熱処理を行ってもよい。
The heat treatment of the zeolite is preferably carried out in a stream of an inert gas such as nitrogen, helium, neon, argon, krypton or xenon gas which does not substantially contain water. The treatment can also be performed in dry air from which water and CO 2 are removed in advance. Also, under reduced pressure,
The heat treatment may be performed while sucking these gases.

【0017】加熱処理は、上記の加熱温度及びガス気流
雰囲気中で10分〜80時間、好ましくは1時間〜40時間、
さらに好ましくは3時間〜10時間行われる。
The heat treatment is carried out for 10 minutes to 80 hours, preferably 1 hour to 40 hours in the above heating temperature and gas stream atmosphere.
More preferably, it is carried out for 3 hours to 10 hours.

【0018】なお、加熱処理の態様としては、所望の粒
度分布を有するゼオライトを乾燥器内に薄く敷き詰め
て、この薄層の表面上に不活性ガスを流してもよいが、
より好ましくは、ゼオライトにより充填層を形成し、不
活性ガスを、該充填層中に通気しつつ加熱するものが良
い。
As a mode of the heat treatment, zeolite having a desired particle size distribution may be thinly spread in a dryer and an inert gas may be flown on the surface of the thin layer.
More preferably, a packed bed is formed of zeolite and the inert gas is heated while ventilating the packed bed.

【0019】かくして加熱処理が終了したゼオライト
は、次の吸着処理にそなえて、放冷または強制冷却さ
れ、室温程度(10−40℃)の温度に冷却される。勿
論、冷却時には、ゼオライト中への水分の混入を回避す
ることが好ましい。
The zeolite thus heat-treated is cooled or forcedly cooled to a temperature of about room temperature (10-40 ° C.) in preparation for the next adsorption treatment. Of course, it is preferable to avoid mixing of water in the zeolite during cooling.

【0020】本発明においては、該加熱処理したゼオラ
イトにより充填層を形成し、不純物ガスを含む三弗化窒
素ガスを、該充填層に、−125 ℃〜50℃の温度において
通気し、精製処理を行う。
In the present invention, a packed bed is formed from the heat-treated zeolite, and nitrogen trifluoride gas containing an impurity gas is passed through the packed bed at a temperature of −125 ° C. to 50 ° C. for purification treatment. I do.

【0021】本発明のもっとも好ましい実施態様として
は、予めその他の不純物分(N20 、CO2 、N2F2分等)を
公知の方法にて除去せしめたNF3 ガスを使用すること
が、工業的及び経済的に好適である。また、N20、CO2、N2
F2分等の不純物を除き、純度99.99%程度以上にしたNF3
ガスの精製に特に有用である更には、ゼオライトの加熱
処理とNF3 ガスの吸着精製を同一の容器で行うことも好
適であり、適当な容器またはカラムに所望の粒度分布を
有するゼオライトを充填して充填層を形成させ、つぎ
に、不活性ガスを、該充填層中に通気しつつ加熱処理す
る。
In the most preferred embodiment of the present invention, NF 3 gas from which other impurities (N 2 0, CO 2 , N 2 F 2 etc.) have been removed in advance by a known method is used. It is industrially and economically suitable. In addition, N 2 0, CO 2 , N 2
NF 3 with a purity of approximately 99.99% or higher, excluding impurities such as F 2 minutes
Further, it is particularly useful for gas purification, and it is also preferable to perform heat treatment of zeolite and adsorption purification of NF 3 gas in the same container, and fill a suitable container or column with zeolite having a desired particle size distribution. To form a packed bed, and then an inert gas is passed through the packed bed for heat treatment.

【0022】加熱処理後、ゼオライトを容器外へ取り出
すことなく、そのままの状態で冷却し、引続きこのゼオ
ライトの充填層へ精製しようとするNF3 ガスを−125 ℃
〜50℃の温度において導き、通気する方法が好ましい。
After the heat treatment, the zeolite is cooled as it is without being taken out of the container, and the NF 3 gas to be purified into the packed bed of this zeolite is continuously cooled to −125 ° C.
Preference is given to directing and aeration at a temperature of -50 ° C.

【0023】NF3ガスの精製は、上記の通りカラム等に
充填されたゼオライト層に通気する方法で実施される
が、この際の通気温度は重要で50℃以下の温度であるこ
とが好ましい。この温度を越えると、本発明者等の研究
では、通気後のNF3 ガス中の不純物であるSF6の含有量
が充分低下せず、かつ、ゼオライト単位体積当たりのNF
3 ガス中のSF6 の吸着量が大きく低下するので不都合で
ある。
NF3Purification of gas can be performed in columns etc. as described above.
Performed by venting the packed zeolite layer
However, the ventilation temperature at this time is important and it must be below 50 ° C.
And are preferred. If this temperature is exceeded, research by the present inventors
Then, NF after ventilation3SF which is an impurity in gas6Content of
Does not decrease sufficiently, and NF per unit volume of zeolite
3 SF in gas6The adsorption amount of
is there.

【0024】また、温度は低温ほど好ましいが、NF3
沸点は−129 ℃であるので、この温度以下では操作が事
実上困難であり、−125 ℃以上の範囲で実施される。
Further, the lower the temperature is, the better, but since the boiling point of NF 3 is −129 ° C., it is practically difficult to operate below this temperature, and it is carried out in the range of −125 ° C. or higher.

【0025】容器やカラムの材質としては、SUS-304、SU
S-316L等のステンレス、銅、ニッケル、鉄等の通常の材
料が使用可能である。なお、鉄は空気に常時接触するカ
ラム外面が腐食され、錆易いので防錆処理を施すことが
好ましい。
As the material of the container or column, SUS-304, SU
Usual materials such as stainless steel such as S-316L, copper, nickel and iron can be used. Since iron is easily corroded on the outer surface of the column that is constantly in contact with air and rusted, it is preferable to perform rust prevention treatment.

【0026】ゼオライト充填層の通気条件についてさら
に詳しく述べると以下の如くである。ゼオライト充填層
の層径は1cm〜1m φ程度が好ましい。所望により、細
い径の充填カラムを複数束ねて使用することも可能であ
る。ここで、層径が20cmを越える場合には、例えば、通
気時に発生する吸着熱等を効率よく除熱出来るように、
伝熱フィンをカラム表面に設けたり、熱交換器を充填層
内に挿入することが好ましい。
The aeration conditions of the zeolite packed bed will be described in more detail below. The layer diameter of the zeolite packed bed is preferably about 1 cm to 1 mφ. If desired, it is possible to use a plurality of packed columns having a small diameter in a bundle. Here, when the layer diameter exceeds 20 cm, for example, in order to efficiently remove the heat of adsorption generated during ventilation,
It is preferable to provide heat transfer fins on the column surface or insert a heat exchanger in the packed bed.

【0027】充填層高は10cm〜3m 程度であり、ガス流
量は10cc/min〜100 l/min程度である。なお、層径、層
高、ガス流量の組合せは1〜500cm/min 好ましくは1〜
200cm/min と云うガス線速度を満足する範囲で自由に選
択することが可能である。
The packed bed height is about 10 cm to 3 m, and the gas flow rate is about 10 cc / min to 100 l / min. The combination of bed diameter, bed height, and gas flow rate is 1 to 500 cm / min, preferably 1 to 500 cm / min.
It is possible to freely select within a range that satisfies the gas linear velocity of 200 cm / min.

【0028】通気時の NF3ガスの圧力は特に限定はない
が、例えば、0〜5Kg/cm2(ゲージ圧)程度の圧力が操
作しやすいので好適である。
The pressure of the NF 3 gas at the time of aeration is not particularly limited, but a pressure of, for example, 0 to 5 kg / cm 2 (gauge pressure) is preferable because it is easy to operate.

【0029】本発明の対象とするNF3 ガス中の不純物ガ
ス量は、特に限定はないが、SF6 として、5〜5000
ppm 程度である。
The amount of the impurity gas in the NF 3 gas which is the object of the present invention is not particularly limited, but SF 6 is 5 to 5000.
It is about ppm.

【0030】本発明の精製処理を施されると、精製ガス
中のSF6 量は ND 〜3ppm 程度とすることが出来る。な
お、分析法は、ガスクロマトグラフィー( 検出器:PID )
によっておこなった値であり、NDは検出限界以下( 0.
1ppm 未満 )であることを示す。
When the refining treatment of the present invention is applied, the amount of SF 6 in the purified gas can be set to about ND to 3 ppm. The analysis method is gas chromatography (detector: PID).
ND is below the detection limit (0.
It is less than 1 ppm).

【0031】[0031]

【実施例】以下、実施例により本発明を更に具体的に説
明するが、これらはあくまで発明のよりよき理解を目的
とするものであり、その範囲を限定する意図にでたもの
でないことは明確に理解されなければならない。尚、以
下において%及び ppmは特記しない限り容量基準を表わ
す。
The present invention will be described in more detail with reference to the following examples, but it is clear that these are for the purpose of better understanding of the invention, and are not intended to limit the scope thereof. Must be understood by. In the following,% and ppm are based on capacity unless otherwise specified.

【0032】また、実施例及び比較例において、破過時
間とは下記に示すことを意味するものである。即ち、不
純物を含有するガスを吸着剤層に通気して不純物を吸着
除去する場合、ガスの通気開始直後は得られるガス中の
不純物含有量は少なく、かつ一定含有量かまたは僅かに
漸増する状態で推移する。吸着剤が吸着能力を喪失する
頃になると、不純物含有量が急激に増加し始める。この
急激に増加し始めるまでの通気時間を破過時間という。
実施例及び比較例においては通気後のNF3 ガス中のSF6
が5ppm を越える時間までの通気時間を破過時間とし
た。
In the examples and comparative examples, the breakthrough time means the following. That is, when a gas containing impurities is vented to the adsorbent layer to adsorb and remove the impurities, the content of impurities in the obtained gas is small immediately after the start of the venting of the gas, and the content is constant or gradually increases. Changes in. By the time the adsorbent loses its adsorption capacity, the impurity content begins to increase sharply. The breakthrough time is the ventilation time until the rapid increase.
In Examples and Comparative Examples, SF 6 in NF 3 gas after aeration was used.
The breakthrough time was defined as the aeration time until the time exceeded 5 ppm.

【0033】実施例1〜4 内径10mmのステンレス製カラムに粒度が24〜48メッシュ
の粒状の5A型ゼオライト(トソー製;銘柄SA-500) を
充填(充填高さ200mm)した後、該ゼオライトの加熱処理
を表1に示す条件で行なった。しかる後、該ゼオライト
層を冷却し、表に1示す分析値のNF3 ガスを表1に示す
条件で、破過時間まで通気した。
Examples 1 to 4 Granular 5A type zeolite (made by Tosoh; brand SA-500) having a particle size of 24 to 48 mesh was packed in a stainless steel column having an inner diameter of 10 mm (packing height 200 mm), and then the zeolite The heat treatment was performed under the conditions shown in Table 1. Then, the zeolite layer was cooled, and NF 3 gas having the analysis value shown in Table 1 was aerated under the conditions shown in Table 1 until the breakthrough time.

【0034】破過時間及び精製ガス中のSF6 含有量は、
第1表に示す通りであり、NF3 ガス中のSF6 は極めて良
好に除去され、精製せしめたNF3 中のSF6 が大幅に低下
していることがわかる。尚、NF3 ガスの分析はガスクロ
マトグラフィー(PID 法) にて行なった。(以下同様) 精製せしめたNF3 ガス中のSF6 の分析は、オンライン にて3
0分毎に実施し、その変動幅及び平均値を同様に表1に
示す。
The breakthrough time and the SF 6 content in the purified gas are
Is as shown in Table 1, NF 3 SF 6 in the gas is very well removed, SF 6 in NF 3 was allowed purification it can be seen that the greatly reduced. The NF 3 gas was analyzed by gas chromatography (PID method). (Same as below) Analysis of SF 6 in purified NF 3 gas is performed online.
The measurement was performed every 0 minutes, and the fluctuation range and the average value are also shown in Table 1.

【0035】[0035]

【表1】 [Table 1]

【0036】実施例5〜8 実施例1〜4で使用したステンレス製カラムを使用し、
合成ゼオライトの種類を4A及び13Xに変更して、実
施例1〜4と同様にして、該ゼオライトの加熱処理とNF
3 ガスの通気による精製を、表2に示す条件で破過時間
まで行なった(ゼオライトのステンレス製カラムへの充
填量は実施例1〜4と同じ)。
Examples 5-8 Using the stainless steel columns used in Examples 1-4,
The kind of synthetic zeolite was changed to 4A and 13X, and heat treatment of the zeolite and NF were performed in the same manner as in Examples 1 to 4.
Purification by aeration with 3 gases was performed under the conditions shown in Table 2 until the breakthrough time (the amount of zeolite packed in the stainless steel column was the same as in Examples 1 to 4).

【0037】その結果は表2に示す通りであり、実施例
1〜4と同様にNF3ガス中のSF6 は極めて良好に除去さ
れる。しかも破過時間も長いことが分かる。
The results are shown in Table 2, and SF 6 in NF 3 gas is removed very well as in Examples 1 to 4. Moreover, it can be seen that the breakthrough time is long.

【0038】[0038]

【表2】 [Table 2]

【0039】比較例1〜4 実施例1〜4と同一のカラム及び合成ゼオライトを用い
て、実施例1〜4と同様の方法でゼオライトの加熱処理
とNF3 ガスの通気による精製を、表3に示す条件で破過
時間まで行なった(ゼオライトのカラムへの充填量は実
施例1〜4と同じ)。
Comparative Examples 1 to 4 Using the same column and synthetic zeolite as in Examples 1 to 4, heat treatment of zeolite and purification by aeration of NF 3 gas were carried out in the same manner as in Examples 1 to 4, and Table 3 It carried out until the breakthrough time under the conditions shown in (the amount of zeolite packed in the column is the same as in Examples 1 to 4).

【0040】結果は表3に示す通りであり、比較例1及
び比較例2のように本発明で特定する条件未満の温度で
加熱処理した天然ゼオライトを使用した場合は、たとえ
長時間加熱処理してもゼオライトの吸着能力が低下し破
過時間が大幅に短くなると共に、通気後のNF3 ガス中の
SF6の含有量も高くなることが分かる。
The results are shown in Table 3, and when using natural zeolite heat-treated at a temperature lower than the conditions specified in the present invention as in Comparative Example 1 and Comparative Example 2, even if it was heat-treated for a long time, However, it can be seen that the adsorption capacity of zeolite is reduced, the breakthrough time is significantly shortened, and the content of SF 6 in the NF 3 gas after aeration is increased.

【0041】また、比較例3及び比較例4のように NF3
ガスのゼオライト層への通気温度が本発明で特定する温
度よりも高いと、比較例1及び比較例2程ではないもの
の破過時間が短くなり、かつ、通気後のNF3 ガス中のS
6の含有量も高くなることが分かる。
Further, as in Comparative Example 3 and Comparative Example 4, NF 3
When the gas aeration temperature to the zeolite layer is higher than the temperature specified in the present invention, the breakthrough time is shortened, though not so much as in Comparative Example 1 and Comparative Example 2, and S in the NF 3 gas after aeration is reduced.
It can be seen that the content of F 6 is also high.

【0042】比較例5〜6 加熱処理温度を本発明で特定する条件を越える高温度で
処理した以外は、比較例5は、実施例5と同一の方法に
て、また比較例6は、実施例8と同一の方法にて実験を
行った。
Comparative Examples 5 to 6 Comparative Example 5 was carried out in the same manner as Example 5 except that the heat treatment was carried out at a high temperature exceeding the conditions specified in the present invention, and Comparative Example 6 was carried out. The experiment was conducted in the same manner as in Example 8.

【0043】結果は表3に示す通りであり、比較例5及
び6のように本発明で特定する条件を越える高温で加熱
処理した合成ゼオライトを使用した場合は、おそらくそ
の結晶構造が破壊されるためか、吸着能力が大幅に低下
し破過時間が5分未満と殆ど産業上の利用可能性はなく
なって仕舞う。また破過に到るまでにSF6の吸着も殆
ど行われないことが分かる。
The results are shown in Table 3, and when the synthetic zeolite heat-treated at a high temperature exceeding the conditions specified in the present invention as in Comparative Examples 5 and 6 is used, its crystal structure is probably destroyed. Perhaps because of this, the adsorption capacity drops significantly and the breakthrough time is less than 5 minutes, leaving almost no industrial applicability. Further, it is understood that SF 6 is hardly adsorbed until the breakthrough is reached.

【0044】[0044]

【表3】 [Table 3]

【0045】比較例7〜9 吸着剤として合成ゼオライトの代りに、天然ゼオライト
(比較例7)、活性炭(比較例8)、活性アルミナ(比
較例9)を使用して、実施例1と同様に該吸着剤の加熱
処理とNF3 ガスの通気による精製を、表4に示す条件で
破過時間まで行なった(吸着剤のステンレス製カラムへ
の充填量は実施例1〜4と同じ)。
Comparative Examples 7 to 9 As in Example 1, natural zeolite (Comparative Example 7), activated carbon (Comparative Example 8) and activated alumina (Comparative Example 9) were used instead of the synthetic zeolite as the adsorbent. The heat treatment of the adsorbent and the purification by aeration of NF 3 gas were performed under the conditions shown in Table 4 until the breakthrough time (the amount of adsorbent packed in the stainless steel column was the same as in Examples 1 to 4).

【0046】その結果は表4に示す通りである。活性
炭、活性アルミナの場合はSF6の吸着能力が小さく、
従って破過時間が短い。
The results are shown in Table 4. In the case of activated carbon and activated alumina, the adsorption capacity of SF 6 is small,
Therefore, the breakthrough time is short.

【0047】[0047]

【表4】 [Table 4]

【0048】[0048]

【発明の効果】以上詳細に説明したように本発明は、精
製しようとするNF3 ガス中のSF6 を吸着剤を使用して除
去し、更なる高純度のNF3 の製造方法において、吸着剤
として合成ゼオライトを予め特定の温度に加熱して脱水
処理し、このゼオライトにNF3ガスを特定の条件で通気
するという、極めて簡単な方法である。
INDUSTRIAL APPLICABILITY As described in detail above, according to the present invention, SF 6 in NF 3 gas to be purified is removed by using an adsorbent, and in a method for producing NF 3 with higher purity, adsorption is performed. This is an extremely simple method in which synthetic zeolite as an agent is previously heated to a specific temperature for dehydration treatment, and NF 3 gas is passed through the zeolite under specific conditions.

【0049】ゼオライトを使用する本発明の方法によっ
て、従来達成することが出来なかった高純度のNF3 の製
造法も本発明の方法によって、容易に実施することが可
能となった。
By the method of the present invention using zeolite, it has become possible to easily carry out a method of producing high-purity NF 3 which could not be achieved by the conventional method.

【0050】以上のように本発明の方法は、ゼオライト
を使用してNF3 中のSF6分を効率よく、かつ経済的に除
去することができることで、本発明の工業的かつ経済的
効果は極めて大なるものがある。
As described above, since the method of the present invention can efficiently and economically remove SF 6 content in NF 3 by using zeolite, the industrial and economic effects of the present invention are There is an extremely large one.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 合成ゼオライトを、予め250 〜500 ℃
の範囲の温度に加熱処理をおこなった後、三弗化窒素ガ
スを−125 〜50℃の温度でかつ実質的に水分の混入しな
い状態で通気させることを特徴とする三弗化窒素ガスの
精製方法。
1. Synthetic zeolite is preheated at 250 to 500 ° C.
After the heat treatment at a temperature in the range of, the nitrogen trifluoride gas is aerated at a temperature of -125 to 50 ° C and in a state in which substantially no water is mixed. Method.
【請求項2】 上記被処理三弗化窒素ガスが、純度9
9.99 容量%以上であり、不純物として六弗化イオウを
含む請求項1記載の三弗化窒素ガスの精製方法。
2. The nitrogen trifluoride gas to be treated has a purity of 9%.
The method for purifying nitrogen trifluoride gas according to claim 1, which is 9.99% by volume or more and contains sulfur hexafluoride as an impurity.
JP22513694A 1994-09-20 1994-09-20 Method for purifying nitrogen trifluoride gas Pending JPH0891812A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22513694A JPH0891812A (en) 1994-09-20 1994-09-20 Method for purifying nitrogen trifluoride gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22513694A JPH0891812A (en) 1994-09-20 1994-09-20 Method for purifying nitrogen trifluoride gas

Publications (1)

Publication Number Publication Date
JPH0891812A true JPH0891812A (en) 1996-04-09

Family

ID=16824530

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22513694A Pending JPH0891812A (en) 1994-09-20 1994-09-20 Method for purifying nitrogen trifluoride gas

Country Status (1)

Country Link
JP (1) JPH0891812A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001322806A (en) * 2000-05-12 2001-11-20 Showa Denko Kk Manufacturing method for nitrogen trifluoride and application therefor
JP2002068717A (en) * 2000-08-31 2002-03-08 Nippon Sanso Corp Purification method of nitrogen trifluoride
KR20050054560A (en) * 2003-12-05 2005-06-10 주식회사 효성 Method for refining nitrogen trifluoride gas using synthetic zeolite

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001322806A (en) * 2000-05-12 2001-11-20 Showa Denko Kk Manufacturing method for nitrogen trifluoride and application therefor
JP2002068717A (en) * 2000-08-31 2002-03-08 Nippon Sanso Corp Purification method of nitrogen trifluoride
KR20050054560A (en) * 2003-12-05 2005-06-10 주식회사 효성 Method for refining nitrogen trifluoride gas using synthetic zeolite

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