JPH0915414A - Production of color filter - Google Patents

Abstract

PURPOSE: To provide a process for producing color filters which are formed with fine patterns of multiple colors having a uniform thickness and differences in level of high accuracy free from a defect in follow-up characteristic and free from missing of pixels on a substrate and have excellent heat resistance with the good follow-up characteristic of a photosensitive film and good workability. CONSTITUTION: This process for producing color filters includes 1. a stage for sticking photosensitive resin layer 2 colored to second and subsequent colors by forming spaces 5 between pixels in such a manner that these layers face the substrate 4, 2. a transfer stage of transferring the photosensitive resin layers 2 colored to the second and subsequent colors from a base film 1 to the spaces 5 between the pixels by executing heating between developing stages and a stage for (i) a stage for rinsing with developers, (ii) a stage for removing the developers by washing with water and (iii) a stage for removing the water of (ii) by heating and drying before the developing stages of the second and subsequent colors.

Description

Detailed Description of the Invention

[0001]

FIELD OF THE INVENTION The present invention relates to a method for manufacturing a color filter.

[0002]

2. Description of the Related Art A color filter is formed by forming two or more kinds of very fine stripe-like or mosaic-like patterns having different hues on a surface of an optically transparent substrate such as glass at a predetermined interval. Or they are arranged crossing each other. In these patterns, it is necessary to arrange the hues in a predetermined order and at predetermined intervals, and to form a uniform layer with less thickness unevenness, and to use a color filter such as a screen printing method, a photolithography method, and a dyeing method. Manufacturing methods have been proposed.

There is also known a method of manufacturing a color filter which can easily form a multicolor fine stripe or mosaic pattern with high accuracy using a base film and a photosensitive film having a photosensitive resin layer. I have.

As a method for preparing a color filter using a photosensitive film, a photosensitive resin composition of a photosensitive film obtained by applying a photosensitive resin composition colored in one color to a base film and drying the photosensitive resin composition on a transparent substrate is used. And then exposed to light through a predetermined pattern mask and developed to form a pattern (JP-A-61-99102 and JP-A-3-1).
JP 60454, JP-A-3-111802, JP-A-2-151805, JP-A-4-212161
JP, JP-A-4-301602, JP-A-5-2
No. 107 publication) is known.

As a method of improving the followability of the photosensitive film in order to obtain a good pattern, for example, a three-layer resist method is characterized in that even if there is a step on the substrate, the substrate can be precisely processed finely. (J.Vac.Sci.Technol., 1
Volume 6, page 1620, published in 1968, etc.), heat the photosensitive resist layer after exposure before development and under conditions of 50 to 150 ° C. for 30 to 60 seconds to accelerate the reaction of the lower layer portion which is not sufficiently exposed to UV light. The after bake method (Japanese Patent Laid-Open No. 3-196596, etc.) and the like can be mentioned. Further, in a color filter using a pigment-dispersed photopolymer, generation of a monomer radical induced by a radical of a photoinitiator and its polymerization chain reaction are promoted, and a photosensitive resist layer is coated using a spinner,
A pre-baking method (J. Photopolym. Sci. Technol., Which performs pre-baking (for example, 85 ° C. for 5 minutes) to remove the solvent.
Vol.2, No.2, 1989, pages 244 to 248) and the like.

In the conventional color filter manufacturing method, the occurrence of pinholes and white spots has become a problem, and various solutions have been proposed. As a printing method, JP-A-1-
JP-A-279205 and JP-A-2-123329 disclose a method of filling pixels by printing and then heating, and a method of filling a pinhole by heating a transparent resin layer containing a filler on the surface of the filter. Is disclosed,
Japanese Unexamined Patent Publication No. 3-156404 discloses a method of forming a pixel by printing and then heating the ink to cause the ink to flow to the pinhole portion to eliminate the pinhole. A film method is disclosed in Japanese Patent Laid-Open No. 5-341113.
Japanese Patent Laid-Open No. 5-341114 discloses a method of heating a pixel provided with a peeling layer after the pixel is formed to eliminate pinholes and white spots. A method for eliminating holes and blank areas is disclosed.

Conventional color filter manufacturing methods (eg,
Dyeing method, pigment-dispersed liquid resist method, printing method, roll coater method, pigment-dispersed film resist method, etc.), when forming the layer of the second color or later, the colored layer of the second color or later on the already formed color layer. A step is formed between the colored layer and the colored layer that is in direct contact with the substrate. This step exceeds 1.0 μm at maximum, and if ITO is directly sputtered on this step, the ITO
Since the wire breakage and the distance between the electrodes sandwiching the liquid crystal become non-uniform and a good color display cannot be obtained, a film of 2 to 5 μm generally called a protective film or an overcoat film is formed, and the surface is covered. It is being made uniform. For example, it is disclosed in Japanese Patent Application Laid-Open Nos. 2-12103 and 2-79002. In addition, M-shaped and J-shaped steps, which are the steps in the pixel by the dyeing method, are also disclosed.

In the film method, this step is determined by the thickness (1 to 5 μm) of the colored layer already formed. Because of this step, the new colored layer is less likely to come into contact with the base (transparent glass), and it is adhered. Due to insufficient pressure, the new colored layer does not adhere to the base and the base film is peeled off,
When it is exposed and developed as it is, it is peeled off together with the base film, and there is a part where the new colored layer does not adhere to the base.
There is a disadvantage that a desired color filter cannot be obtained because of inconvenience such as exposure of a portion where a new colored image does not exist.

Further, on the pixels of the second and subsequent colors, a part of the colored photosensitive resin layer on the pixels of the first color flows in, and in the second color, the edge close to the pixels of the first color is lifted and the pixel The surface becomes oblique (J-shaped and n-shaped cross sections are formed). On the pixel of the third color, both ends of the pixel are lifted (M-shaped cross section) due to the inflow of the colored photosensitive resin layer from both adjacent pixels. FIG. 2 shows a schematic view of a cross section of J-shaped, n-shaped, and M-shaped pixels. If there is a J-shaped or M-shaped lift, the surface of the three-color pixels becomes non-uniform, the desired flatness cannot be obtained, and the lifted edge comes into contact with the counter electrode, causing an image defect and causing color unevenness. There are drawbacks such as generation. After heating the substrate, it is not possible to improve the film followability only by adhering the colored photosensitive resin layer to the substrate and passing (laminating) the colored photosensitive resin layer onto the substrate while peeling off the protective film of the photosensitive film.

[0010]

DISCLOSURE OF THE INVENTION The present invention solves the above-mentioned drawbacks of the prior art, and follows the following properties of the photosensitive film, the workability and the high-precision step of uniform thickness on the substrate, and the following defect. Provided is a method for producing a color filter having excellent heat resistance, in which a fine multi-color pattern having no pixels is formed.

[0011]

The present invention provides a photosensitive film comprising a base film and a photosensitive resin layer colored in one color on a transparent substrate. (1) The colored photosensitive resin layer is In a method for manufacturing a color filter in which a step of laminating so as to face a substrate, (2) exposing in a pattern, and (3) a step including a developing step are repeated to form a multicolor pattern, (a) second and subsequent colors Forming a space between the pixels so that the colored photosensitive resin layer of (1) faces the substrate and adhering the same, (b) heating between the steps (1) and (3) By carrying out (i) before the transition step of migrating the colored photosensitive resin layer of the second and subsequent colors from the base film to the space between the pixels and (c) the developing step of the third and subsequent colors (3).
It is characterized by including a step of rinsing with a developing solution, a step of (ii) washing with water to remove the developing solution, and a step of (iii) heating and drying to remove the water of (ii) above. The present invention relates to a method for manufacturing a color filter.

Between the steps (1) and (3) for flattening the surface of the pixels of the color filters of the second and subsequent colors,
The mode of the transfer step of transferring the photosensitive resin layers of the second and subsequent colors from the base film to the space on the substrate surface by heating will be described in more detail with reference to FIG. FIG. 1 is a sectional view of a film and a filter showing a production method of the present invention, in which the base film 1 is PET (polyethylene terephthalate film) and the colored photosensitive resin layers are red (R) and green (G).
The case of forming in the order of will be described as an example.

(A) shows a colored photosensitive resin layer 2 of a photosensitive film composed of a base film 1 (PET (polyethylene terephthalate film)) and a colored photosensitive resin layer (green) 2 and a front pixel (red) 3. The state where the transparent substrates 4 arranged in order are facing is shown. (B) shows the colored photosensitive resin layer 2 of the photosensitive film and the front pixel 3 of at least one color.
Shows the bonding in which the space 5 is formed between the pixel and the substrate 4 which are arranged in order.

The colored photosensitive resin layer 2 does not have to follow the front pixels 3 and the substrate 4, and remains completely flat.
It is preferably in contact with the surface of the front pixel 4. (B)
Shows a state in which the green (G) colored photosensitive resin layer 2 is in close contact with the red (R) which is the front pixel 3, and the space 5
The portion marked with is the green (G) colored photosensitive resin layer 2
Is also a portion where no red (R) colored photosensitive resin layer is present.

FIG. 3C is a diagram showing the state after the completion of the transfer step of the present invention. The transfer step enters between the steps (1) to (3) described above, and the colored photosensitive resin layer 2 ( This is a step of replacing G) with the space 5, and the transfer of the colored photosensitive resin layer 2 (G) to the space 5 is performed by heating. Immediately after the bonding in the state of (b), the green colored photosensitive resin layer 2 is in close contact with the base film 1, but the fluidity is increased by heating and the migration into the space 5 on the surface of the substrate 4 occurs. start. The green colored photosensitive resin layer 2 has a larger adhesion to the substrate 4 than the base film 1, and the contact angle of the green colored photosensitive resin layer 2 with respect to the substrate 4 is larger than that of PET (polyethylene terephthalate). Since it is large, when it flows down the wall of the red pre-pixel 3, it forms a droplet on the surface of the base film 1 to increase, and after contacting the substrate 4, spreads on the substrate 4 to complete the transition.

When the transfer step is completed, the green colored photosensitive resin layer 2 ends the transfer to the space 5 on the surface of the substrate 4, and a space appears on the surface, and the colored photosensitive resin layers 4 and 5 are formed. Will change. At this time, since the colored photosensitive resin layer 4 is made uniform by its surface tension, the surface flatness is excellent, and the pixel after development has almost the same cross-sectional shape as the first color. In the above, the case where the first color is red and the second color is green has been described as an example, but the order of colors is not limited to this, and in addition to the order of red, green, blue, and black, black, blue, green, and red. Alternatively, any color order such as black, red, blue, green, etc. is possible.

The heating is carried out at room temperature or above and below the temperature at which the colored photosensitive resin layer starts a thermosetting reaction, and at low temperature for a long time.
The transfer is completed at a high temperature in a short time, and the transferred colored photosensitive resin layer surface has a high degree of flatness. Examples of heating include, but are not limited to, hot plate heating, oven heating, ultrasonic heating, infrared heating, electromagnetic induction heating, and friction heating.
The transition step in the present invention is performed between the above (1) to (3), but it may be performed before or after the exposure step (2), or may be performed twice before and after the exposure step. Of course, it can also be performed in the exposure step. As the transfer step, the transfer step in the state where the base film exists has been described above, but the transfer step may be performed after the base film is peeled off. That is, even if there is no base film, the colored photosensitive resin layer can be moved to the space between pixels.

(D) shows the cross-sectional shape of the pixel of the color filter after development after exposure to the colored photosensitive resin layer (green). The base film is peeled off after the exposure step and before the development step or before the exposure step. In the present invention, a method is used in which a space is formed between the pixels so that the second and subsequent colored photosensitive resin layers face the substrate, and the layers are bonded together. If there are enough pixels, a space remains between the substrate and the photosensitive resin layer, which causes pinholes.

In order to prevent the bleeding of the developing solution into the space due to insufficient migration and the dissolution of the colored photosensitive resin layer due to the bleeding, which causes pinholes, the development of a predetermined pattern after the second color is performed. Before the step, (i) a step of rinsing with a developing solution, and (ii) a step of washing with water to remove the developing solution,
(Iii) It is necessary to perform the step of heating and drying to remove the water of the above (ii), which makes it possible to eliminate the space due to insufficient transfer.

By the laminating step and the transferring step by heating according to the present invention, the colored photosensitive resin layers of the second and subsequent colors finally have the shape shown in FIG. 1 (d) and are well adhered to the substrate. In the present invention, when the transfer of the photosensitive layer is insufficient or the heating is not uniformly performed on the entire substrate, a space remains between the colored photosensitive resin layer and the substrate, which may cause pinholes or peeling. Become. This phenomenon (insufficient migration of the colored photosensitive resin layer) is caused by (i) rinsing with a developing solution, (ii) washing with water to remove the developing solution, and (iii) heating and drying Can be excluded. The step of rinsing with the developing solution of (i) is to rinse the exposed substrate after peeling the base film with the developing solution, in which the unexposed portion of the colored photosensitive resin layer is partially dissolved and swelled. As it begins to soften, a difference in film thickness appears between the exposed and unexposed areas. If the development is continued as it is, the developing solution permeates into the space remaining between the colored photosensitive resin layer and the substrate to form pinholes or the like. The permeation of the developing solution is small when it is rinsed with the developing solution. After rinsing (ii) after washing thoroughly with water to remove the developer and (iii) heating and drying, the remaining space is eliminated and the colored photosensitive resin layer adheres to the substrate.
That is, the transfer of the colored photosensitive resin layer is performed.

Development in the present invention generally has the same meaning as development in the field of photoresists. In a negative photosensitive resin composition, the unexposed area is removed and an image of the exposed area is formed. On the other hand, in the case of a positive type photosensitive resin composition, conversely, the exposed portion is removed to form an image of the unexposed portion. Therefore, the development can be referred to as “main development”, and the rinse with the developer can be referred to as “predevelopment”. In the present invention, development (main development) and rinsing with a developing solution (pre-development) can be performed by immersion in a developing solution, spray injection of the developing solution (also simply referred to as a spray), or the like. A known developer corresponding to the photosensitive resin composition can be used as the developer in the present invention. For example, when a sodium carbonate aqueous solution which is preferable from the environmental aspect is used as the developer, the concentration is 0.01 to The amount is preferably 3% by weight, and more preferably 0.01 to 0.1% by weight.

From the viewpoint of the effect, the rinsing time when rinsing with the developing solution is preferably ⅕ to ½ of the minimum developing time. Here, the minimum development time means that when a negative photosensitive material is used, a wide unexposed area (width 200 μm) is used.
(m or more) means the minimum time required to be removed by one-time development such as dipping or spraying. When a positive-type photosensitive material is used, a wide area (width 200
(μm or more) means the minimum time necessary for being removed by one-time development such as dipping or spraying. The conditions for rinsing with a developer are appropriately determined depending on the photosensitive resin composition used, but the rinsing time is usually
The time is 5 seconds to 10 minutes, preferably 10 seconds to 5 minutes, more preferably 30 seconds to 2 minutes. The temperature of the developing solution is usually 15 to 40 ° C, preferably 20 to 30 ° C. When spraying is used for development, the spray pressure is usually 0.1 to 10 kgf / cm ² . The time from rinsing with a developing solution to washing with water is preferably 5 seconds to 5 minutes, and if left for a long time, development proceeds, leading to pinholes and overdevelopment.

In the present invention, the developing solution is removed after development.
It can be carried out by washing the developing surface with water.
As water, tap water, ion-exchanged water, pure water or the like is used. If the removal of the developer is insufficient, only the portion where the developer remains develops rapidly, and finally non-uniformity of the shape is generated between the pixels, so each time the rinse with the developer is performed,
It is preferable to wash the developing surface with water to remove the developing solution. Insufficient removal of water after rinsing with a developer causes insufficient contact of the developer with the remaining water droplets during development (main development), resulting in residual development. Defects such as enlargement of the edge of the pixel occur. Drying after washing with water can be carried out by a usual method, such as air drying or heat drying. From the viewpoint of completely removing the permeation of the developing solution, after removing the developing solution from the developing surface by washing with water, etc., the water remaining on the developing surface can be removed with a shower (spray) of a gas such as air or nitrogen. desirable. After washing with water, it is dried by heating, but this is the same as the above-mentioned transfer step, at low temperature for a long time,
At high temperature, it becomes short. The temperature is preferably 45 ° C. to 80 ° C., and the time is about 5 minutes to 15 minutes. If heating is continued for a long time, curing may proceed and a desired pixel may not be obtained.

The photosensitive film used in the present invention is formed by coating a transparent base film, for example, a film of polyethylene terephthalate or the like, with a photosensitive resin composition colored in one color, and drying it to color the film in one color. A photosensitive resin layer is formed. Since this colored photosensitive resin layer is uncured, flexible and sticky, it is desirable to further attach a protective film such as a polyethylene film thereon to prevent external damage, adhesion of foreign matter, and the like. . The colored photosensitive resin layer formed on the photosensitive film is laminated on the transparent substrate while peeling off the protective film, and the base film on the surface of the colored photosensitive resin layer is removed after being exposed through a negative mask having a predetermined pattern. .

The photosensitive resin composition includes a negative type which becomes insoluble in a developing solution upon irradiation with actinic light, a positive type which dissolves in the developing solution upon irradiation with actinic light, a solvent developing type which uses an organic solvent as a developing solution, and an alkali. There are various photosensitive resin compositions such as an alkali developing type using an aqueous solution and a semisolvent developing type using a mixed solution of an organic solvent and an alkaline aqueous solution.

As the ethylenically unsaturated compound (a),
For example, a compound obtained by adding an α, β-unsaturated carboxylic acid to a polyhydric alcohol (trimethylolpropane di (meth) acrylate (means methacrylate or acrylate; hereinafter the same), trimethylolpropane triacrylate, tetra Methylol methane triacrylate, dipentaerythritol pentaacrylate,
Dipentaerythritol hexaacrylate, methacrylates corresponding thereto, etc., compounds obtained by adding α, β-unsaturated carboxylic acid to glycidyl group-containing compounds (trimethylolpropane triglycidyl ether triacrylate, bisphenol A diglycidyl ether diester) Acrylate, corresponding methacrylate, etc.),
Esterification products of polycarboxylic acids (phthalic anhydride, etc.) with compounds having a hydroxyl group and an ethylenically unsaturated group (β-hydroxyethyl acrylate, corresponding methacrylates, etc.), alkyl esters of acrylic acid or methacrylic acid (acrylic) Methyl acid, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, corresponding methacrylates, etc.), trimethylhexamethylene diisocyanate, dihydric alcohol and acrylic acid or methacrylic acid monoester The urethane diacrylate compound etc. which are mentioned are mentioned. These compounds are used alone or in combination of two or more. The blending amount of the component (a) is preferably 90 to 50 parts by weight, with the total amount of the components (a) and (b) being 100 parts by weight.

Examples of the carboxyl group-containing film imparting polymer (b) include copolymers of alkyl acrylate or alkyl methacrylate with acrylic acid or methacrylic acid, alkyl acrylate or alkyl methacrylate and acrylic methacrylate. Copolymers of an acid or methacrylic acid with a vinyl monomer copolymerizable therewith are exemplified. Examples of alkyl acrylates include methyl acrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, and the like. Examples of the methacrylic acid alkyl ester include those corresponding to the above-mentioned acrylic acid alkyl ester. Examples of the acrylic acid alkyl ester or methacrylic acid alkyl ester, acrylic acid or methacrylic acid, and vinyl monomers copolymerizable therewith include, for example, tetrahydrofurfuryl acrylate, 2,2,2-trifluoroethyl acrylate,
2,2,3,3-tetrafluoropropyl acrylate, corresponding methacrylates, acrylamides, diacetone acrylamides, styrenes, vinyltoluenes and the like can be mentioned.

Further, for example, polyester, a copolymer of butadiene and acrylonitrile, cellulose acetate, cellulose acetate butyrate, methyl cellulose, ethyl cellulose and the like can be used in combination with the carboxyl group-containing film-forming polymer (b).
By using the component (b), the coating property and the film property of the cured product are improved, and the compounding amount thereof is preferably 10 to 50 parts by weight with the total amount of the components (a) and (b) being 100 parts by weight. When the amount is less than 10 parts by weight, the photosensitivity tends to decrease because the amount of the ethylenically unsaturated compound increases, and when it exceeds 50 parts by weight, the photocured product tends to become brittle. Also,
The weight average molecular weight of the component (b) is preferably 10,000 or more in view of the coating property and the film strength.

Examples of the photopolymerization initiator (c) include aromatic ketones (benzophenone, N, N'-tetramethyl-4,4'-diaminobenzophenone (Michler's ketone), 4-methoxy-4'-dimethyl. Aminobenzophenone, 4,4'-diethylaminobenzophenone, 2-
Ethyl anthraquinone, phenanthrene quinone, etc.), benzoin ether (benzoin methyl ether, benzoin ethyl ether, benzoin phenyl ether, etc.), benzoin (methyl benzoin, ethyl benzoin, etc.), 2,4,5-triarylimidazole dimer, 2- (O-chlorophenyl) -4,5-diphenylimidazole dimer, 2- (o-chlorophenyl)-
4,5-di (m-methoxyphenyl) -4,5-diphenylimidazole dimer, 2- (o-fluorophenyl) -4,5-diphenylimidazole dimer, 2-
(O-methoxyphenyl) -4,5-diphenylimidazole dimer, 2- (p-methoxyphenyl) -4,5
-Diphenylimidazole dimer, 2,4-di (p-methoxyphenyl) -5-phenylimidazole dimer,
2- (2,4-dimethoxyphenyl) -4,5-diphenylimidazole dimer, 2- (p-methylmercaptophenyl) -4,5-diphenylimidazole dimer, etc., acridine (1,7-bis) (9-acrinidyl)
Heptane) and the like are used. These are used alone or in combination of two or more.

The compounding amount of (c) is the total amount of (a) and (b) 1
0.1 to 10 parts by weight is preferable with respect to 00 parts by weight. If the amount is less than 0.1 parts by weight, the photosensitivity tends to be insufficient, and if it exceeds 10 parts by weight, the light absorption on the surface of the composition is increased during exposure, resulting in insufficient internal photocuring. Tends to be sufficient.

As the above-mentioned pigment or dye (d), a generally known coloring agent can be used, and compatibility with a photosensitive resin layer, particularly an ethylenically unsaturated compound or a carboxyl group-containing film-forming polymer, is targeted. It is selected in consideration of hue, light transmittance and the like. As the pigment that can be used in the color filter, various compounds can be used, and examples thereof include inorganic pigments such as barium sulfate, zinc oxide, lead sulfate, titanium oxide, red iron oxide, carbon black, graphite and chromium oxide, and the following organic pigments (color index Number) etc.

Yellow pigment: CI Pigment Yellow 20,
24, 83, 86, 93, 109, 110, 117, 1
25, 137, 138, 139, 147, 148, 15
3, 154, 166, 168 Orange pigment: CI Pigment Orange 36, 43, 5
1, 55, 59, 61 Red pigment: CI Pigment Red 9, 97, 122, 1
23, 149, 168, 177, 180, 092, 21
5, 216, 217, 220, 223, 224, 22
6, 227, 228, 240, 48: 1 Violet pigment: CI Pigment Violet 19,
23, 29, 30, 37, 40, 50 Blue pigment: CI Pigment Blue 15, 15: 6, 2,
2, 60, 64 Green pigment: CI Pigment Green 7, 36 Black pigment: CI Pigment Black 7

The compounding amount of (d) is preferably 1 to 50 parts by weight based on 100 parts by weight of the total amount of (a) and (b). If the amount is less than 1 part by weight, the coloring tends to be insufficient, and if it exceeds 50 parts by weight, the light transmittance tends to decrease.

In the colored photosensitive resin layer, a melamine resin and / or an epoxy resin which reacts thermally with the carboxyl group of the carboxyl group-containing film-forming polymer in order to enhance the heat-curing property, the component (a) and the component (b). Total amount of ingredients 10
It is preferable to add 1 to 20 parts by weight to 0 parts by weight and heat the mixture. The heating temperature is preferably 130 to 200 ° C., and the heating time is preferably 30 to 60 minutes from the viewpoint of improving the crosslink density and heat resistance of the colored layer.

[0035]

The present invention will be described below by way of examples. Example 1 (1) Production of Coating Liquid for Colored Photosensitive Resin Layer 135 parts by weight of any of the pigment pastes of Table 2 and 200 parts by weight of a solution in which the materials of Table 1 were uniformly dissolved, and melamine resin 5
Parts by weight and 5 parts by weight of a silane coupling agent were added and dissolved and dispersed to obtain a coating liquid for a colored photosensitive resin layer.

[0036]

[Table 1]

[0037]

[Table 2]

Melamine resin Cymel 300 (trade name of hexamethoxymethyl melamine manufactured by Mitsui Toatsu Chemicals, Inc.) Silane coupling agent KBM503 (manufactured by Shin-Etsu Chemical Co., Ltd.) Preparation of coating liquid Immediately before using the coating liquid Was ultrasonically dispersed for 2.5 hours for adjustment.

(2) Production of Photosensitive Film A coating solution obtained was applied to a polyethylene terephthalate film having a thickness of 23 μm (Tetron film S2 manufactured by Teijin Ltd.).
3) It was applied to a uniform thickness using a kiss-touch reverse type coating machine and dried in a dryer at 100 ° C. for 2 minutes.
A 30 μm-thick polyethylene film was laminated as a protective film to obtain a photosensitive film. The thickness of the photosensitive resin layer after drying was 2.0 μm for all of red, blue and green.

(3) Production of color filter (a) Substrate heating step A base substrate for a color filter (Corning 7074, manufactured by Corning) was heated at 80 ° C. for 10 minutes. (B) Laminating Step While peeling off the protective film of the photosensitive film, a colored photosensitive resin layer was laminated on the base substrate for the color filter under the following conditions. Roll temperature 80 ℃ Roll pressure 4.0kgf / cm ² Speed 1.5m / min (c) Exposure process Predetermined pattern (normal stripe pattern. Width 70μm, length 150mm finish, red, green and blue Through a negative mask having a stripe pattern designed in a cycle of 300 .mu.m so as to be repeated in the above order, and exposed with an exposure device HMW-201B (3 kW, ultra-high pressure mercury lamp, manufactured by Oak Manufacturing Co., Ltd.).

(D) Peeling process The polyethylene terephthalate film was removed. (E) Rinsing step with developing solution to developing step As a developing solution for all colors, a 0.08 wt% Na ₂ CO ₃ aqueous solution at 30 ° C. was used. Red was developed by spraying for 15 seconds, the unexposed portion was removed, and the first colored pattern of red was formed. Blue and green were each rinsed with a developing solution for 5 seconds (pre-development), and then washed with pure water to remove the developing solution from the developing surface, and air cleaning was performed. Then, it dried at 80 degreeC for 5 minutes. Perform development (main development) for blue and green (spray 20 seconds),
A second color blue and a third color green colored pattern was formed.

The steps of forming colored patterns (a) to (e) were repeated using the photosensitive films of respective colors in the order of red, blue and green. A multicolor pattern was formed. During the second-color blue lamination, the film was fed with the feeding direction of the film parallel to the red stripe pattern of the front pixels. The exposure amount was 50 mJ / cm ² for the red, blue and green photosensitive resin layers. The pattern of the mask used is such that the stripe forms an independent rectangle for each pixel and a gap is provided in the longitudinal direction of the stripe.
An ultraviolet irradiator (lamp H560) is applied to the obtained multicolor pattern.
After irradiation with 0 L / 2, manufactured by Toshiba Denshi Co., Ltd. at 3 J / cm ² , it was heated at 150 ° C. for 45 minutes to obtain a color filter. The obtained color filter had red, blue and green patterns arranged in an orderly manner, good followability, and no pinholes were generated.

Example 2 The procedure of Example 1 was repeated except that the materials shown in Table 3 below were used instead of the materials shown in Table 1. A black process (black is a black matrix pattern) was also performed.

[0044]

[Table 3]

The obtained color filter has a pattern of red, blue and green arranged in order, and the portion around the pixels of the three primary colors is covered with a black black matrix, and the followability is good, and pinholes are recognized. I couldn't do it.

Example 3 The procedure of Example 1 was repeated, except that the materials shown in Table 4 below were used instead of the materials shown in Table 1.

[0047]

[Table 4]

The obtained color filter had red, blue and green patterns lined up in an orderly manner and no pinholes were formed.

Example 4 (3) The procedure of Example 1 was repeated, except that the steps for producing the color filter were as follows.

(3) Step of manufacturing color filter of this example (a) Substrate heating step The base substrate for the color filter was heated at 80 ° C. for 10 minutes. (B) Laminating Step While peeling off the protective film of the photosensitive film, a colored photosensitive resin layer was laminated on the base substrate for the color filter under the following conditions. Roll temperature 80 ° C. Roll pressure 4.0 kgf / cm ² Speed 1.5 m / min (c) Transfer process Heating was performed at 60 ° C. for 20 minutes to make a transfer process. (D) Exposure step Exposure machine HMW-2 through a negative mask of a predetermined pattern
Exposure was performed with 01B (3 kW, ultra-high pressure mercury lamp, manufactured by Oak Manufacturing Co., Ltd.).

(E) Peeling step The polyethylene terephthalate film was removed. (F) Rinse step with developing solution to developing step As a developing solution for all colors, 0.05% by weight Na ₂ CO ₃ aqueous solution at 30 ° C. was used. Red was developed by spraying for 15 seconds, the unexposed portion was removed, and the first colored pattern of red was formed. Rinsing (pre-development) with a developer was performed by immersing each of blue and green for 10 seconds. Next, the developer on the developing surface was removed by washing with pure water, and air cleaning was performed. Then, it was dried by heating at 80 ° C. for 10 minutes. Then spray with developer 30
Second development (main development) was performed to form a colored pattern of blue as the second color and green as the third color.

The obtained color filter had red, blue and green patterns lined up in order, and no pinhole was generated.

Example 5 (3) The procedure of Example 1 was repeated, except that the steps for producing the color filter were as follows.

(3) Step of manufacturing color filter of this example (a) Substrate heating step The base substrate for the color filter was heated at 80 ° C. for 10 minutes. (B) Laminating Step While peeling off the protective film of the photosensitive film, a colored photosensitive resin layer was laminated on the base substrate for the color filter under the following conditions. Roll temperature 80 ° C. Roll pressure 4.0 kgf / cm ² Speed 1.5 m / min (c) Peeling step The polyethylene terephthalate film was removed.

(D) Exposure step Exposure machine HMW-2 through a negative mask of a predetermined pattern
Exposure was performed with 01B (3 kW, ultra-high pressure mercury lamp, manufactured by Oak Manufacturing Co., Ltd.). Exposure amount at this time, red is a 50mJ / cm ^2, blue and green was 890mJ / cm ^2. (E) Transfer process After exposure, heating was carried out at 45 ° C. for 30 minutes to obtain a transfer process. (F) Rinse step with developing solution to developing step Red is 15% 0.02 wt% Na ₂ CO ₃ aqueous solution at 30 ° C.
It was developed by spraying for 2 seconds, the unexposed portion was removed, and a red colored pattern of the first color was formed. Blue and green are 0.
Rinsing with the developing solution (pre-development) was performed by spraying with a 04% by weight Na ₂ CO ₃ aqueous solution for 5 seconds. Next, the developer on the developing surface was removed by washing with pure water, and air cleaning was performed. Then, it heated at 80 degreeC for 10 minute (s). Thereafter, blue and green were developed by spraying for 20 seconds (main development) to form a second-color blue and third-color green coloring pattern.

The obtained color filter had red, blue and green patterns arranged in order and no pinholes were formed.

Example 6 (e) The same procedure as in Example 1 was carried out except that the developing step was as follows. (E) Development step Red is 15% with 0.08% by weight Na ₂ CO ₃ aqueous solution at 30 ° C.
It was developed by spraying for 2 seconds, the unexposed portion was removed, and a red colored pattern of the first color was formed. Blue and green are 0.
A 02 wt% Na ₂ CO ₃ aqueous solution was sprayed for 10 seconds to rinse with the developing solution, and then the developing surface was rinsed with pure water to remove the developing solution and air cleaning was performed. After that, heat drying was performed at 80 ° C. for 10 minutes, and the remaining space was eliminated by transferring to the photosensitive layer. After repeating this step twice for each of blue and green, development (main development) was carried out for 20 seconds by spraying to form a second colored pattern of blue and a third colored pattern of green. The obtained color filter had red, blue and green patterns arranged in order, and no pinholes were generated.

Example 7 (e) The same procedure as in Example 1 was carried out except that the developing process was as follows. (E) Rinse step with developer Development step Red is 15% with 0.08 wt% Na ₂ CO ₃ aqueous solution at 30 ° C.
It was developed by spraying for 2 seconds, the unexposed portion was removed, and a red colored pattern of the first color was formed. Blue and green are 0.
A 04 wt% Na ₂ CO ₃ aqueous solution was sprayed for 5 seconds for rinsing with the developing solution, followed by washing with pure water to remove the developing solution and air cleaning.
Then, it was heated and dried at 80 ° C. for 10 minutes. After that, 25-second development (main development) was performed on blue and green by spraying to form a coloring pattern of blue of the second color and green of the third color.

The obtained color filter had red, blue and green patterns arranged in an orderly manner and no pinholes were formed.

Comparative Example 1 (e) The same procedure as in Example 1 was carried out except that the developing step was as follows. (E) Development step Red is 15% with 0.08% by weight Na ₂ CO ₃ aqueous solution at 30 ° C.
It was developed by spraying for 2 seconds, the unexposed portion was removed, and a red colored pattern of the first color was formed. Do the same for blue and green. At this time, in blue, pinholes are generated in some places 30 μm away from the center of the pixel in front of red, and in some places, pinholes are continuously generated, and in green, some pinholes are left and right 30 μm from the center of the pixel. Pinholes occurred continuously in some areas. Peeling of pixels occurred in part.

[0061]

According to the manufacturing method of the present invention, a highly precise multicolor fine pattern having a uniform thickness is formed on a substrate with excellent followability and workability of a photosensitive film and excellent heat resistance. A color filter can be manufactured.

[Brief description of the drawings]

FIG. 1 is a schematic view showing a production method of the present invention.

FIG. 2 is a schematic view of a cross section of a pixel of a conventional color filter.

[Explanation of symbols]

 1 Base Film 2 Colored Photosensitive Resin Layer (Green) 3 Front Pixel (Red) 4 Transparent Substrate 5 Space 6 First Color Pixel 7 Second Color Pixel 8 Third Color Pixel

Claims (1)

[Claims] 1. A transparent film, on which a photosensitive film composed of a base film and a photosensitive resin layer colored in one color is attached (1) so that the colored photosensitive resin layer faces the substrate. In the method for producing a color filter in which a multi-color pattern is formed by repeating a step, (2) a step of exposing in a pattern and (3) a developing step, (a) a second and subsequent colored photosensitive resin layers To form a space between the pixels so that they face the substrate, and (b) heating the second and subsequent colors by performing heating between the steps (1) and (3). Before the transfer step of transferring the colored photosensitive resin layer of (3) from the base film to the space between the pixels and (c) the developing step of (3) after the second color, (i)
It is characterized by including a step of rinsing with a developing solution, a step of (ii) washing with water to remove the developing solution, and a step of (iii) heating and drying to remove the water of (ii) above. Color filter manufacturing method.