JPH0915788A - Silver halide photographic sensitive material - Google Patents
Silver halide photographic sensitive materialInfo
- Publication number
- JPH0915788A JPH0915788A JP7186186A JP18618695A JPH0915788A JP H0915788 A JPH0915788 A JP H0915788A JP 7186186 A JP7186186 A JP 7186186A JP 18618695 A JP18618695 A JP 18618695A JP H0915788 A JPH0915788 A JP H0915788A
- Authority
- JP
- Japan
- Prior art keywords
- group
- layer
- silver halide
- chemical formula
- sensitive material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 46
- -1 Silver halide Chemical class 0.000 title claims description 67
- 229910052709 silver Inorganic materials 0.000 title claims description 43
- 239000004332 silver Substances 0.000 title claims description 43
- 229920001600 hydrophobic polymer Polymers 0.000 claims abstract description 35
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 23
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 21
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 9
- 125000003118 aryl group Chemical group 0.000 claims abstract description 6
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 5
- 125000005843 halogen group Chemical group 0.000 claims abstract description 4
- 239000000126 substance Substances 0.000 claims description 54
- 125000004432 carbon atom Chemical group C* 0.000 claims description 30
- 239000000084 colloidal system Substances 0.000 claims description 19
- 239000002861 polymer material Substances 0.000 claims description 17
- 239000000839 emulsion Substances 0.000 claims description 15
- 239000011230 binding agent Substances 0.000 claims description 13
- 229910052731 fluorine Inorganic materials 0.000 claims description 12
- 125000005647 linker group Chemical group 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 229920001002 functional polymer Polymers 0.000 claims 1
- 229920000642 polymer Polymers 0.000 abstract description 29
- 238000012545 processing Methods 0.000 abstract description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 25
- 230000002265 prevention Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 129
- 239000011248 coating agent Substances 0.000 description 21
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- 229910052757 nitrogen Inorganic materials 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
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- ZQMHJBXHRFJKOT-UHFFFAOYSA-N methyl 2-[(1-methoxy-2-methyl-1-oxopropan-2-yl)diazenyl]-2-methylpropanoate Chemical compound COC(=O)C(C)(C)N=NC(C)(C)C(=O)OC ZQMHJBXHRFJKOT-UHFFFAOYSA-N 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
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- 238000011156 evaluation Methods 0.000 description 3
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- 239000003999 initiator Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000006224 matting agent Substances 0.000 description 3
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
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- 230000001235 sensitizing effect Effects 0.000 description 3
- 238000007767 slide coating Methods 0.000 description 3
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- 125000000391 vinyl group Chemical class [H]C([*])=C([H])[H] 0.000 description 3
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
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- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
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- 125000004188 dichlorophenyl group Chemical group 0.000 description 2
- WOZVHXUHUFLZGK-UHFFFAOYSA-N dimethyl terephthalate Chemical compound COC(=O)C1=CC=C(C(=O)OC)C=C1 WOZVHXUHUFLZGK-UHFFFAOYSA-N 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
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- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 2
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- 206010070834 Sensitisation Diseases 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- 235000011941 Tilia x europaea Nutrition 0.000 description 1
- ISWQCIVKKSOKNN-UHFFFAOYSA-L Tiron Chemical compound [Na+].[Na+].OC1=CC(S([O-])(=O)=O)=CC(S([O-])(=O)=O)=C1O ISWQCIVKKSOKNN-UHFFFAOYSA-L 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- JBSVNYYKRNVOME-UHFFFAOYSA-N [2,2,2-trichloro-1-(2-methylprop-2-enoyloxy)ethyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C(Cl)(Cl)Cl)OC(=O)C(C)=C JBSVNYYKRNVOME-UHFFFAOYSA-N 0.000 description 1
- AVFGEDUZRIBUFH-UHFFFAOYSA-N [2-(2-methylprop-2-enoyloxy)-2-phenylethyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(OC(=O)C(C)=C)C1=CC=CC=C1 AVFGEDUZRIBUFH-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000008272 agar Substances 0.000 description 1
- 238000007754 air knife coating Methods 0.000 description 1
- 229920000615 alginic acid Polymers 0.000 description 1
- 235000010443 alginic acid Nutrition 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 125000004212 difluorophenyl group Chemical group 0.000 description 1
- 150000004683 dihydrates Chemical class 0.000 description 1
- 125000005805 dimethoxy phenyl group Chemical group 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- DFFZYNIDEOOVAU-UHFFFAOYSA-N ethenoxymethoxyethene Chemical compound C=COCOC=C DFFZYNIDEOOVAU-UHFFFAOYSA-N 0.000 description 1
- IQIJRJNHZYUQSD-UHFFFAOYSA-N ethenyl(phenyl)diazene Chemical compound C=CN=NC1=CC=CC=C1 IQIJRJNHZYUQSD-UHFFFAOYSA-N 0.000 description 1
- 125000005670 ethenylalkyl group Chemical group 0.000 description 1
- FKIRSCKRJJUCNI-UHFFFAOYSA-N ethyl 7-bromo-1h-indole-2-carboxylate Chemical compound C1=CC(Br)=C2NC(C(=O)OCC)=CC2=C1 FKIRSCKRJJUCNI-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 229920003063 hydroxymethyl cellulose Polymers 0.000 description 1
- 229940031574 hydroxymethyl cellulose Drugs 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- YRVUCYWJQFRCOB-UHFFFAOYSA-N n-butylprop-2-enamide Chemical compound CCCCNC(=O)C=C YRVUCYWJQFRCOB-UHFFFAOYSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229960003330 pentetic acid Drugs 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000191 poly(N-vinyl pyrrolidone) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 238000001955 polymer synthesis method Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229960002796 polystyrene sulfonate Drugs 0.000 description 1
- 239000011970 polystyrene sulfonate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 238000012673 precipitation polymerization Methods 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- DOKHEARVIDLSFF-UHFFFAOYSA-N prop-1-en-1-ol Chemical group CC=CO DOKHEARVIDLSFF-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 235000018102 proteins Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000012748 slip agent Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- WVFDILODTFJAPA-UHFFFAOYSA-M sodium;1,4-dihexoxy-1,4-dioxobutane-2-sulfonate Chemical compound [Na+].CCCCCCOC(=O)CC(S([O-])(=O)=O)C(=O)OCCCCCC WVFDILODTFJAPA-UHFFFAOYSA-M 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000005156 substituted alkylene group Chemical group 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000001680 trimethoxyphenyl group Chemical group 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明はハロゲン化銀写真感光材
料、特に水洗処理後の乾燥性が改良され、迅速処理適性
に優れたハロゲン化銀写真感光材料に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a silver halide photographic light-sensitive material, and more particularly to a silver halide photographic light-sensitive material having improved drying properties after washing with water and excellent in rapid processing suitability.
【0002】[0002]
【従来の技術】迅速現像処理、例えばフィルムの先端を
自動現像機に挿入してから、現像槽、渡り部分、定着
槽、渡り部分、水洗槽、渡り部分を通過してフィルムの
先端が乾燥部から出て来た時間が15〜60秒で、か
つ、自動現像機のラインスピードが1000mm/min 以
上で処理する場合、ハロゲン化銀写真感光材料の乾燥性
を改良して乾燥時間を短縮する手段が有効である。乾燥
性改良の手段としてハロゲン化銀写真感光材料のバイン
ダー量を減らす方法があるが、この方法は、ハロゲン化
銀写真感光材料の力学強度の低下、擦り傷黒化、ローラ
ーマークの発生といった問題を生ずる。2. Description of the Related Art Rapid development processing, for example, after inserting the leading edge of a film into an automatic developing machine, the leading edge of the film passes through a developing tank, a transition portion, a fixing tank, a transition portion, a washing tank, and a transition portion, and the film portion is dried. Means for improving the drying property of the silver halide photographic light-sensitive material and shortening the drying time when the processing time is 15 to 60 seconds and the line speed of the automatic processor is 1000 mm / min or more. Is effective. As a means for improving the drying property, there is a method of reducing the binder amount of the silver halide photographic light-sensitive material, but this method causes problems such as a decrease in mechanical strength of the silver halide photographic light-sensitive material, blackening of scratches, and generation of roller marks. .
【0003】擦り傷黒化、ローラーマークは共にハロゲ
ン化銀写真感光材料の商品価値を著しく低下させてしま
う。ハロゲン化銀乳剤層が支持体の一方の側にあるハロ
ゲン化銀写真感光材料(以降「片面感材」ともいう。)
の場合にはバック面の非感光性親水性コロイド層を除去
するか、またはバック面の非感光層バインダーを疎水性
バインダーとする事で乾燥性が良化する。しかし、この
方法ではハロゲン化銀写真感光材料のカールが著しく悪
化し、自動搬送系において、搬送不良を起こすなど実用
には供せられない。Both the blackening of the scratches and the roller marks markedly reduce the commercial value of the silver halide photographic light-sensitive material. A silver halide photographic light-sensitive material having a silver halide emulsion layer on one side of a support (hereinafter also referred to as "single-sided photosensitive material").
In this case, the drying property is improved by removing the non-photosensitive hydrophilic colloid layer on the back surface or by using the non-photosensitive layer binder on the back surface as a hydrophobic binder. However, according to this method, the curl of the silver halide photographic light-sensitive material is significantly deteriorated, and a conveyance failure occurs in an automatic conveyance system, which cannot be put to practical use.
【0004】一方、環境保全の観点から多くの分野で、
資源、発生ガス、廃水、廃棄物などの見直しが行われて
いる。写真処理の分野では、省資源化、廃水量の減量、
使用容器の減量などの点から、感光材料の処理に使用す
る処理液補充量を減量する必要性が高まっている。しか
し、現像液の補充量を減らすと著しく現像速度が遅くな
り、また、定着液の補充量を減らすと著しく定着液速度
が遅くなるため、従来はかなり多量(感光材料1m2当り
現像液は250〜500ml、定着液は500〜800m
l)の補充を行っている。現像速度および定着速度を早
くするため、処理温度を高くしたり、処理時の撹拌条件
を強化することが行われるが、臭気の発生、装置コスト
の上昇を招くなど種々の問題がある。このように、迅速
処理適性を有し、かつ、処理液の補充量の軽減が可能な
ハロゲン化銀写真感光材料が強く望まれている。On the other hand, in many fields from the viewpoint of environmental protection,
Resources, generated gas, wastewater, waste, etc. are being reviewed. In the field of photographic processing, resource conservation, reduction of wastewater,
From the standpoint of reducing the amount of containers used and the like, there is an increasing need to reduce the amount of replenishing processing solution used for processing photosensitive materials. However, significantly developing speed reducing the replenishing amount of the developer becomes slow, and since the remarkable fixer rate reducing the replenishing amount of the fixing solution is slow, quite conventionally large amount (photosensitive material 1 m 2 per developer 250 ~ 500ml, fixer is 500 ~ 800m
l) is being replenished. In order to increase the development speed and the fixing speed, the processing temperature is raised and the stirring conditions during the processing are strengthened, but there are various problems such as the generation of odor and the increase of the apparatus cost. As described above, a silver halide photographic light-sensitive material having rapid processing suitability and capable of reducing the replenishment amount of the processing solution is strongly desired.
【0005】最近、特開平5- 127282号、同5-
127306号に、支持体のハロゲン化銀乳剤層が塗設
されている面と反対側の面に親水性コロイド層と疎水性
ポリマー層をこの順に塗設する技術が開示されており、
迅速処理適性を付与する有力な手段として知られるよう
になっている。しかしながら、これらについて検討した
結果、これらの発明における疎水性ポリマー層の処理液
遮断性は決して大きいものではなく、高度な迅速処理適
性付与、処理液補充量の低減を達成しようとするとき、
さらに処理液遮断性に優れた皮膜形成性のポリマー素材
が必要である。Recently, Japanese Patent Laid-Open Nos. 5-127282 and 5-12782
No. 127306 discloses a technique of coating a hydrophilic colloid layer and a hydrophobic polymer layer in this order on the surface of the support opposite to the surface on which the silver halide emulsion layer is coated,
It has become known as a powerful means for imparting rapid processing suitability. However, as a result of studying these, the treatment liquid blocking property of the hydrophobic polymer layer in these inventions is not very large, and when it is attempted to achieve high rapid treatment suitability and reduction of the treatment liquid replenishment amount,
Further, a film-forming polymer material having excellent treatment liquid blocking property is required.
【0006】より具体的には、処理液遮断性は親水性コ
ロイド層と疎水性ポリマー層との合計の膨潤度で評価で
きる。そして、この処理液遮断性が悪いと、例えば現像
槽から定着槽への現像液のもちこみ(キャリーオーバ
ー)が生じ、低補充を行うことができない。また、乾燥
性も悪化し迅速処理を行うことができない。さらに、処
理後でも、空気中の湿度の遮断も不十分となり、カール
が生じ、細線画像などの歪みを生じてしまう。More specifically, the treatment liquid blocking property can be evaluated by the total swelling degree of the hydrophilic colloid layer and the hydrophobic polymer layer. If the processing liquid blocking property is poor, for example, the developer may carry over from the developing tank to the fixing tank (carry over), and low replenishment cannot be performed. In addition, the drying property is deteriorated and rapid treatment cannot be performed. Furthermore, even after the processing, the humidity in the air is not sufficiently cut off, curling occurs, and distortion such as a fine line image occurs.
【0007】[0007]
【発明が解決しようとする課題】本発明の第1の目的は
処理液遮断性に優れた疎水性ポリマー層を形成するポリ
マー素材を用いたハロゲン化銀写真感光材料を提供する
ことである。第2の目的は水洗処理後の乾燥性が良好
で、カールが小さく、かつ搬送性が良好なハロゲン化銀
写真感光材料を提供することである。第3の目的は、迅
速処理適性を有し、かつ、処理液の補充量が軽減された
ハロゲン化銀写真感光材料を提供することである。第4
の目的は塗膜のひび割れがなく、かつ、耐付着性に優れ
たハロゲン化銀写真感光材料を提供することである。SUMMARY OF THE INVENTION A first object of the present invention is to provide a silver halide photographic light-sensitive material using a polymer material which forms a hydrophobic polymer layer having an excellent processing liquid blocking property. A second object is to provide a silver halide photographic light-sensitive material which has good drying property after washing with water, has a small curl and has good transportability. A third object is to provide a silver halide photographic light-sensitive material which has rapid processing suitability and has a reduced replenishing amount of processing solution. 4th
The purpose of is to provide a silver halide photographic light-sensitive material which is free from cracks in the coating film and has excellent adhesion resistance.
【0008】[0008]
【課題を解決するための手段】このような目的は、下記
(1)〜(4)の構成によって達成される。 (1)支持体の一方の面に少なくとも一層の親水性コロ
イドをバインダーとするハロゲン化銀乳剤層を塗設し、
支持体の前記ハロゲン化銀乳剤層が塗設されている面と
反対側の面に親水性コロイドをバインダーとする非感光
性コロイド層と、前記非感光性親水性コロイド層の最外
層に疎水性ポリマー層とが塗設されたハロゲン化銀写真
感光材料において、前記疎水性ポリマー層を形成するポ
リマー素材が下記化5、化6および化7で表される繰り
返し単位を少なくとも1種以上含むハロゲン化銀写真感
光材料。This object is achieved by the following constitutions (1) to (4). (1) One surface of a support is coated with at least one layer of a silver halide emulsion having a hydrophilic colloid as a binder,
A non-photosensitive colloid layer having a hydrophilic colloid as a binder on the surface of the support opposite to the surface on which the silver halide emulsion layer is coated, and a hydrophobic outermost layer of the non-photosensitive hydrophilic colloid layer. In a silver halide photographic light-sensitive material coated with a polymer layer, the polymer material forming the hydrophobic polymer layer contains at least one repeating unit represented by the following chemical formulas 5, 6 and 7 Silver photographic light-sensitive material.
【0009】[0009]
【化5】 Embedded image
【0010】[0010]
【化6】 [Chemical 6]
【0011】[0011]
【化7】 Embedded image
【0012】[化5において、R1 およびR2 は各々独
立に水素原子、メチル基またはフッ素原子を表す。R3
は水素原子、フッ素原子または炭素原子数1〜4のアル
キル基を表す。R1 、R2 およびR3 は各々同一であっ
ても異なっていてもよい。R4は少なくとも1個のフッ
素原子を有する一価の基を表す。化6において、R5 お
よびR6 は各々水素原子または炭素原子数1〜8のアル
キル基を表す。Zは炭素原子数6〜20のアルキル基ま
たはアリール基を表す。化7において、R7 、R8 、R
9 、R10、R11およびR12は各々独立に水素原子、炭素
原子数1〜4のアルキル基またはハロゲン原子を表わ
す。Xは2価の連結基を表す。Jは炭素数1〜12のア
ルキレン基を表す。] (2)前記ポリマー素材が前記繰り返し単位の少なくと
も1種以上を75重量%以上含有する上記(1)のハロ
ゲン化銀写真感光材料。 (3)前記化6におけるZが炭素原子数6〜12のアリ
ール基である上記(1)または(2)のハロゲン化銀写
真感光材料。 (4)前記化7における2価の連結基Xが下記化8で表
される基、−COO−または−OCO−である上記
(1)または(2)のハロゲン化銀写真感光材料。[In the formula 5, R 1 and R 2 each independently represent a hydrogen atom, a methyl group or a fluorine atom. R 3
Represents a hydrogen atom, a fluorine atom or an alkyl group having 1 to 4 carbon atoms. R 1 , R 2 and R 3 may be the same or different. R 4 represents a monovalent group having at least one fluorine atom. In Chemical formula 6 , R 5 and R 6 each represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. Z represents an alkyl group or an aryl group having 6 to 20 carbon atoms. In Chemical formula 7, R 7 , R 8 and R
9 , R 10 , R 11 and R 12 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or a halogen atom. X represents a divalent linking group. J represents an alkylene group having 1 to 12 carbon atoms. (2) The silver halide photographic light-sensitive material according to (1) above, wherein the polymer material contains 75% by weight or more of at least one of the repeating units. (3) The silver halide photographic light-sensitive material according to the above (1) or (2), wherein Z in the chemical formula 6 is an aryl group having 6 to 12 carbon atoms. (4) The silver halide photographic light-sensitive material according to the above (1) or (2), wherein the divalent linking group X in the chemical formula 7 is a group represented by the following chemical formula 8, —COO— or —OCO—.
【0013】[0013]
【化8】 Embedded image
【0014】[化8において、R13は水素原子または炭
素原子数1〜4のアルキル基を表す。][In the chemical formula 8, R 13 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. ]
【0015】[0015]
【具体的構成】以下、本発明の具体的構成について詳細
に説明する。[Specific Configuration] Hereinafter, a specific configuration of the present invention will be described in detail.
【0016】本発明のハロゲン化銀感光材料は、支持体
のハロゲン化銀乳剤層が塗設された反対側の面、いわゆ
る支持体裏面に非感光性親水性コロイド層(バック層)
を有するものであり、さらにバック層の最外層に疎水性
ポリマー層が塗設されている。The silver halide light-sensitive material of the present invention comprises a non-photosensitive hydrophilic colloid layer (back layer) on the side of the support opposite to the side coated with the silver halide emulsion layer, the so-called back side of the support.
And a hydrophobic polymer layer is coated on the outermost layer of the back layer.
【0017】この場合の疎水性ポリマー層に含有される
ポリマー素材は、化5、化6および化7で表される繰り
返し単位を少なくとも1種以上含むものである。具体的
には、化5、化6または化7の同一の繰り返し単位から
なるホモポリマー、化5同士、化6同士または化7同士
の各々異なる繰り返し単位からなるコポリマー、化5、
化6および化7で表される各々の繰り返し単位の2種以
上から選択される異なる繰り返し単位からなるコポリマ
ー、さらにこれらのポリマーにおいて、化5〜化7以外
の他の繰り返し単位を含むコポリマーが挙げられる。こ
のなかで、化5〜化7以外の他の繰り返し単位を含むコ
ポリマーであるときは、化5〜化7で表される繰り返し
単位を50重量%以上含むことが好ましく、さらには7
5重量%以上含むことが好ましい。In this case, the polymer material contained in the hydrophobic polymer layer contains at least one repeating unit represented by Chemical formula 5, Chemical formula 6 and Chemical formula 7. Specifically, a homopolymer consisting of the same repeating unit of Chemical formula 5, Chemical formula 6 or Chemical formula 7, a copolymer consisting of different repeating units of Chemical formula 5, each of Chemical formula 6 or Chemical formula 7,
Examples thereof include copolymers composed of different repeating units selected from two or more of the repeating units represented by Chemical formulas 6 and 7, and copolymers containing other repeating units other than Chemical formulas 5 to 7 in these polymers. To be Among these, in the case of a copolymer containing a repeating unit other than Chemical formulas 5 to 7, it is preferable that the repeating unit represented by Chemical formulas 5 to 7 is contained in an amount of 50% by weight or more, and
It is preferable to contain 5% by weight or more.
【0018】まず、化5について説明すると、化5で表
される少なくとも1個のフッ素原子を含む繰り返し単位
を与えるエチレン性不飽和モノマーとしては、アクリル
酸エステル類、メタクリル酸エステル類、置換アクリル
アミド類、置換メタクリルアミド類、ビニルエステル
類、置換スチレン類が好ましい。First, the chemical formula 5 will be explained. Examples of the ethylenically unsaturated monomer giving the repeating unit containing at least one fluorine atom represented by the chemical formula 5 are acrylic acid esters, methacrylic acid esters, and substituted acrylamides. , Substituted methacrylamides, vinyl esters, and substituted styrenes are preferable.
【0019】化5において、R1 およびR2 は各々独立
に水素原子、メチル基またはフッ素原子を表す。R3 は
水素原子、フッ素原子または炭素原子数1〜4のアルキ
ル基を表し、これらのアルキル基はフッ素原子等が置換
されていてもよく、例えばメチル基、エチル基、n−ブ
チル基、トリフルオロメチル基であってよく、R3 とし
て、好ましくは水素原子、メチル基、トリフルオロメチ
ル基である。R1 、R2 およびR3 は各々同一であって
も異なっていてもよい。R4 は少なくとも1個のフッ素
原子を有する一価の基を表す。R4 の好ましい例とし
て、−F、−(CF2 )n −F(n=1〜10)、−
(CH2 )k −NHSO2 (CF2 )n −F(k=1〜
4、n=1〜10)、−O−(CF2 )n −F(n=1
〜10)、−O−(CF2 )n −OC6 F5 (n=2〜
3)、−COO−(CH2 )m −(CF2 )n −F(m
=1〜4、n=1〜10)、−COO−(CH2 )m −
(CF2 )n −H(m=1〜4、n=1〜10)、−C
OO−CH(CF3 )2 、−COOCH2 CH(OH)
CH2 −(CF2 )n −F(n=1〜10)、−COO
CH2 CH(OH)CH2 −(CF2 )n −CF(CF
3 )2 (n=1〜10)、−COOCH2 CF2 CHF
CF3 、−COO−(CH2 )m N(R14)SO2 −
(CF2 )n F(m=1〜4、n=1〜10、R14は炭
素原子数1〜4のアルキル基)、−COO−CH2 CH
(OH)CH2 −N(R15)SO2 −(CF2 )n −F
(n=1〜10、R15は炭素原子数1〜4のアルキル
基)、−COO−(CH2 )m −N(R16)CO−(C
F2 )n −F(m=1〜4、n=1〜10、R16は炭素
原子数1〜4のアルキル基)、−CONH−(CH2 )
m −(CF2 )n −F(m=1〜4、n=1〜10)、
−CONH−(CH2 )m −(CF2 )n −H(m=1
〜4、n=1〜10)、−CONH−C6 F5 、化9〜
化12で表される基、In the chemical formula 5, R 1 and R 2 each independently represent a hydrogen atom, a methyl group or a fluorine atom. R 3 represents a hydrogen atom, a fluorine atom or an alkyl group having 1 to 4 carbon atoms, and these alkyl groups may be substituted with a fluorine atom and the like, and examples thereof include a methyl group, an ethyl group, an n-butyl group and a tri-group. It may be a fluoromethyl group, and R 3 is preferably a hydrogen atom, a methyl group or a trifluoromethyl group. R 1 , R 2 and R 3 may be the same or different. R 4 represents a monovalent group having at least one fluorine atom. As preferable examples of R 4 , -F,-(CF 2 ) n -F (n = 1 to 10),-
(CH 2) k -NHSO 2 ( CF 2) n -F (k = 1~
4, n = 1~10), - O- (CF 2) n -F (n = 1
~10), - O- (CF 2 ) n -OC 6 F 5 (n = 2~
3), - COO- (CH 2 ) m - (CF 2) n -F (m
= 1~4, n = 1~10), - COO- (CH 2) m -
(CF 2) n -H (m = 1~4, n = 1~10), - C
OO-CH (CF 3) 2 , -COOCH 2 CH (OH)
CH 2 - (CF 2) n -F (n = 1~10), - COO
CH 2 CH (OH) CH 2 - (CF 2) n -CF (CF
3 ) 2 (n = 1 to 10), -COOCH 2 CF 2 CHF
CF 3, -COO- (CH 2) m N (R 14) SO 2 -
(CF 2) n F (m = 1~4, n = 1~10, R 14 is an alkyl group having 1 to 4 carbon atoms), - COO-CH 2 CH
(OH) CH 2 -N (R 15) SO 2 - (CF 2) n -F
(N = 1~10, R 15 is an alkyl group having 1 to 4 carbon atoms), - COO- (CH 2) m -N (R 16) CO- (C
F 2) n -F (m = 1~4, n = 1~10, R 16 is an alkyl group having 1 to 4 carbon atoms), - CONH- (CH 2)
m - (CF 2) n -F (m = 1~4, n = 1~10),
-CONH- (CH 2) m - ( CF 2) n -H (m = 1
~4, n = 1~10), - CONH-C 6 F 5, of 9
A group represented by Chemical formula 12,
【0020】[0020]
【化9】 Embedded image
【0021】[0021]
【化10】 Embedded image
【0022】[0022]
【化11】 Embedded image
【0023】[0023]
【化12】 Embedded image
【0024】−COO−(CH2 )m −N(R17)CO
−(CF2 )n −H(m=1〜4、n=1〜10、R17
は炭素原子数1〜4のアルキル基)、−CONH−(C
H2 )m −N(R18)CO−(CF2 )n −F(m=1
〜4、n=1〜10、R18は炭素原子数1〜4のアルキ
ル基)、−OCO−(CF2 )n H(n=1〜10)、
−OCO−(CF2 )n F(n=1〜10)、化13、
化14で表される基、--COO-(CH 2 ) m --N (R 17 ) CO
- (CF 2) n -H ( m = 1~4, n = 1~10, R 17
Is an alkyl group having 1 to 4 carbon atoms), -CONH- (C
H 2) m -N (R 18 ) CO- (CF 2) n -F (m = 1
~4, n = 1~10, R 18 is an alkyl group having 1 to 4 carbon atoms), - OCO- (CF 2) n H (n = 1~10),
-OCO- (CF 2) n F ( n = 1~10), of 13,
A group represented by Chemical formula 14,
【0025】[0025]
【化13】 Embedded image
【0026】[0026]
【化14】 Embedded image
【0027】−COOCH2 CH2 OCO−(CH2 )
m −(CF2 )n −F(m=1〜4、n=1〜10)、
−COOCH2 CH2 OCO−(CH2 )m −(CF
2 )n −H(m=1〜4、n=1〜10)、−COOC
H2 CH2 OCO−(CF2 )n −F(n=1〜1
0)、−COOCH2 CH(OH)CH2 −O−CH2
(CF2 )2 H、化15で表される基が挙げられる。-COOCH 2 CH 2 OCO- (CH 2 )
m - (CF 2) n -F (m = 1~4, n = 1~10),
-COOCH 2 CH 2 OCO- (CH 2 ) m - (CF
2 ) n- H (m = 1 to 4, n = 1 to 10), -COOC
H 2 CH 2 OCO- (CF 2 ) n -F (n = 1~1
0), - COOCH 2 CH ( OH) CH 2 -O-CH 2
(CF 2 ) 2 H and groups represented by Chemical formula 15 are mentioned.
【0028】[0028]
【化15】 Embedded image
【0029】これらのうち、−COO−(CH2 )m −
(CF2 )n −F(m=1〜4、n=1〜10)、−O
CO−(CH2 )m −(CF2 )n −F(m=1〜4、
n=1〜10)、−COOCH2 CH2 OCO−(CH
2 )m −(CF2 )n −F(m=1〜4、n=1〜1
0)、−COO−CH(CF3 )2 、−COO−(CH
2 )m −(CF2 )n −H(m=1〜4、n=1〜1
0)、−C6 H4 −COO−(CH2 )m −(CF2 )
n −F(化9に記載のもの:m=1〜4、n=1〜1
0)、−CONH−(CH2 )m −(CF2 )n −F
(m=1〜4、n=1〜10)が特に好ましい。化5で
表される繰り返し単位を有するホモポリマーの例を以下
に列挙するが、本発明はこれに限定されるものではな
い。Of these, --COO-(CH 2 ) m-
(CF 2) n -F (m = 1~4, n = 1~10), - O
CO- (CH 2) m - ( CF 2) n -F (m = 1~4,
n = 1~10), - COOCH 2 CH 2 OCO- (CH
2) m - (CF 2) n -F (m = 1~4, n = 1~1
0), - COO-CH ( CF 3) 2, -COO- (CH
2) m - (CF 2) n -H (m = 1~4, n = 1~1
0), - C 6 H 4 -COO- (CH 2) m - (CF 2)
n- F (as described in Chemical formula 9: m = 1 to 4, n = 1 to 1)
0), - CONH- (CH 2 ) m - (CF 2) n -F
(M = 1 to 4, n = 1 to 10) is particularly preferable. Examples of the homopolymer having the repeating unit represented by the chemical formula 5 are listed below, but the present invention is not limited thereto.
【0030】[0030]
【化16】 Embedded image
【0031】[0031]
【化17】 Embedded image
【0032】[0032]
【化18】 Embedded image
【0033】[0033]
【化19】 Embedded image
【0034】[0034]
【化20】 Embedded image
【0035】次に化6について説明すると、化6におい
て、R5 およびR6 は各々水素原子または炭素原子数1
〜8のアルキル基を表し、好ましくは水素原子またはメ
チル基である。Zは炭素原子数6〜20の置換されても
よいアルキル基またはアリール基である。炭素原子数6
〜20の置換されてもよいアルキル基としては、例えば
n−ヘキシル基、n−ヘプチル基、n−オクチル基、2
- エチルヘキシル基、n−ノニル基、n−デシル基、n
−ドデシル基、3- (2- エチルヘキシルオキシ)プロ
ピル基、3- (ジブチルアミノ)プロピル基などが挙げ
られ、この中でもn−ヘキシル基、2- エチルヘキシル
基が好ましい。炭素原子数6〜20の置換されてもよい
アリール基の例としてはフェニル基、モノメトキシフェ
ニル基、ジメトキシフェニル基、トリメトキシフェニル
基、モノメチルフェニル基、トリメチルフェニル基、モ
ノクロロフェニル基、ジクロロフェニル基、トリクロロ
フェニル基、エトキシカルボニルフェニル基、モノフル
オロフェニル基、ジフルオロフェニル基等が挙げられ
る。この中でもフェニル基、モノメトキシフェニル基、
ジクロロフェニル基、トリクロロフェニル基が好まし
い。Next, the chemical formula 6 will be explained. In the chemical formula 6 , R 5 and R 6 are each a hydrogen atom or a carbon atom having 1 carbon atom.
Is a hydrogen atom or a methyl group. Z is an optionally substituted alkyl group or aryl group having 6 to 20 carbon atoms. 6 carbon atoms
Examples of the optionally substituted alkyl group of to 20 include n-hexyl group, n-heptyl group, n-octyl group, 2
-Ethylhexyl group, n-nonyl group, n-decyl group, n
Examples thereof include -dodecyl group, 3- (2-ethylhexyloxy) propyl group, 3- (dibutylamino) propyl group, and among them, n-hexyl group and 2-ethylhexyl group are preferable. Examples of the optionally substituted aryl group having 6 to 20 carbon atoms include phenyl group, monomethoxyphenyl group, dimethoxyphenyl group, trimethoxyphenyl group, monomethylphenyl group, trimethylphenyl group, monochlorophenyl group, dichlorophenyl group, Examples thereof include trichlorophenyl group, ethoxycarbonylphenyl group, monofluorophenyl group and difluorophenyl group. Among them, phenyl group, monomethoxyphenyl group,
A dichlorophenyl group and a trichlorophenyl group are preferred.
【0036】Zとしては炭素原子数6〜20の置換され
てもよいアリール基が好ましい。Z is preferably an optionally substituted aryl group having 6 to 20 carbon atoms.
【0037】以下に化6で表される繰り返し単位を含む
ホモポリマーの好ましい例について列挙するが、本発明
はこれらに限定されるものではない。Preferred examples of the homopolymer containing the repeating unit represented by the chemical formula 6 are listed below, but the present invention is not limited thereto.
【0038】[0038]
【化21】 Embedded image
【0039】[0039]
【化22】 Embedded image
【0040】[0040]
【化23】 Embedded image
【0041】次に化7について説明すると、化7におい
て、R7 、R8 、R9 、R10、R11およびR12はそれぞ
れ独立に水素原子、炭素原子数1〜4の低級アルキル基
(例えばメチル基、エチル基、n−プロピル基、i−プ
ロピル基、n−ブチル基、sec−ブチル基、t−ブチ
ル基)、ハロゲン原子(例えば塩素原子、フッ素原子)
を表す。Xは2価の連結基を表すが、好ましくは化8で
表される基、−COO−または−OCO−である。化8
中、R13は水素原子または炭素原子数1〜4の低級アル
キル基(例えばメチル基)を表す。Jは炭素数1〜12
までのアルキレン基または置換アルキレン基を表すが、
好ましくは炭素数1〜6のアルキレン基である。Jとし
ては、エチレン基、プロピレン基、ヒドロキシエチレン
基、ヒドロキシプロピレン基などを例示できる。Next, referring to Chemical formula 7, in Chemical formula 7 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 are each independently a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms ( For example, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, sec-butyl group, t-butyl group), halogen atom (eg chlorine atom, fluorine atom)
Represents X represents a divalent linking group, preferably a group represented by Chemical formula 8, —COO— or —OCO—. Chemical formula 8
R 13 represents a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms (for example, a methyl group). J has 1 to 12 carbon atoms
Represents an alkylene group or a substituted alkylene group up to
It is preferably an alkylene group having 1 to 6 carbon atoms. Examples of J include ethylene group, propylene group, hydroxyethylene group, and hydroxypropylene group.
【0042】以下に化7で表される繰り返し単位を含む
ホモポリマーの好ましい例について列挙するが、本発明
はこれらに限定されるものではない。Preferred examples of the homopolymer containing the repeating unit represented by the chemical formula 7 are listed below, but the present invention is not limited thereto.
【0043】[0043]
【化24】 Embedded image
【0044】[0044]
【化25】 Embedded image
【0045】本発明のポリマー素材は上述の化5〜化7
で表される繰り返し単位以外の他の繰り返し単位を含ん
でもかまわない。このような他の繰り返し単位を与える
エチレン性不飽和モノマーの好ましい例としてはアクリ
ル酸またはα−アルキルアクリル酸(例えばメタクリル
酸など)類から誘導されるエステル類もしくはアミド類
(例えば、n−ブチルアクリルアミド、t−ブチルアク
リルアミド、メチルアクリレート、エチルアクリレー
ト、n−プロピルアクリレート、i−プロピルアクリレ
ート、n−ブチルアクリレート、n−ブチルメタクリレ
ート、i−ブチルメタクリレート、sec−ブチルメタ
クリレート、ベンジルアクリレート、2−エチルヘキシ
ルアクリレートなど)、ビニルエステル類(例えば酢酸
ビニル)、アクリロニトリル、メタクリロニトリル、ジ
エン類(例えばブタジエン、イソプレン)、芳香族ビニ
ル化合物(例えばスチレン、p−クロルスチレン、t−
ブチルスチレン、α−メチルスチレン)、ビニリデンク
ロライド、ビニルアルキルエーテル類(例えばビニルエ
チルエーテル)、エチレン、プロピレン、1−ブテン、
イソブテン等が挙げられるが、本発明はこれらに限定さ
れるものではない。The polymer material of the present invention has the above chemical formulas 5 to 7.
It may contain a repeating unit other than the repeating unit represented by. Preferable examples of the ethylenically unsaturated monomer which provides such other repeating unit include esters or amides derived from acrylic acid or α-alkylacrylic acid (eg methacrylic acid) (eg n-butylacrylamide). , T-butyl acrylamide, methyl acrylate, ethyl acrylate, n-propyl acrylate, i-propyl acrylate, n-butyl acrylate, n-butyl methacrylate, i-butyl methacrylate, sec-butyl methacrylate, benzyl acrylate, 2-ethylhexyl acrylate, etc. ), Vinyl esters (eg vinyl acetate), acrylonitrile, methacrylonitrile, dienes (eg butadiene, isoprene), aromatic vinyl compounds (eg styrene, p-chloro). Styrene, t-
Butyl styrene, α-methyl styrene), vinylidene chloride, vinyl alkyl ethers (eg vinyl ethyl ether), ethylene, propylene, 1-butene,
Examples include isobutene, but the present invention is not limited thereto.
【0046】以下に、化5〜化7で表される繰り返し単
位、さらには他の繰り返し単位を含むコポリマーの好ま
しい例について列挙するが、本発明はこれらに限定され
るものではない。なお、構造式中の組成比は重量比であ
る。The preferred examples of the copolymers containing the repeating units represented by Chemical formulas 5 to 7 and other repeating units are listed below, but the invention is not limited thereto. The composition ratio in the structural formula is a weight ratio.
【0047】[0047]
【化26】 Embedded image
【0048】[0048]
【化27】 Embedded image
【0049】本発明のポリマー素材は、溶液重合、懸濁
重合、乳化重合、分散重合、沈澱重合など一般的な高分
子合成法であるラジカル重合によって合成することがで
きる。ラジカル重合法全般については大津隆行・木下雅
悦共著:高分子合成の実験法(化学同人)や大津隆行:
講座重合反応論1ラジカル重合(化学同人)に、また乳
化重合については室井宗一:高分子ラテックスの化学
(高分子刊行会)に、さらに分散重合については Barre
tt,Keih E.J.: Dispersion Polymerization in Organic
Media ( JOHN WILLEY & SONS ) にの中で各製造法が詳
細に記されている。The polymer material of the present invention can be synthesized by radical polymerization which is a general polymer synthesis method such as solution polymerization, suspension polymerization, emulsion polymerization, dispersion polymerization and precipitation polymerization. Regarding the radical polymerization method in general, Takayuki Otsu and Masayoshi Kinoshita: Experimental method of polymer synthesis (Kagaku Dojin) and Takayuki Otsu:
Lecture Polymerization Reaction Theory 1 Radical Polymerization (Chemical Doujin), Emulsion Polymerization Soichi Muroi: Chemistry of Polymer Latex (Polymer Publishing), and Dispersion Polymerization Barre
tt, Keih EJ: Dispersion Polymerization in Organic
Each manufacturing method is described in detail in Media (JOHN WILLEY & SONS).
【0050】本発明のポリマー素材が懸濁重合、乳化重
合、分散重合によって合成される場合は、共重合モノマ
ーとしてエチレン性不飽和基を少なくとも2個含有する
エチレン性不飽和モノマーを使用することができる。エ
チレン性不飽和基を少なくとも2個有するエチレン性不
飽和モノマーの好ましい例としては、ジビニルベンゼ
ン、4,4’−イソプロピリデンジフェニレンジアクリ
レート、1,3−ブチレンジアクリレート、1,3−ブ
チレンジメタクリレート、1,4−シクロヘキシレンジ
メチレンジメタクリレート、ジエチレングリコールジメ
タクリレート、ジイソプロピリデングリコールジメタク
リレート、ジビニルオキシメタン、エチレングリコール
ジアクリレート、エチレングリコールジメタクリレー
ト、エチリデンジアクリレート、エチリデンジメタクリ
レート、1,6−ジアクリルアミドヘキサン、N,N’
−メチレンビスアクリルアミド、N,N’−(1,2−
ジヒドロキシ)エチレンビスアクリルアミド、2,2−
ジメチル−1,3−トリメチレンジメタクリレート、フ
ェニルエチレンジメタクリレート、テトラエチレングリ
コールジメタクリレート、テトラメチレンジアクリレー
ト、テトラメチレンジメタクリレート、2,2,2−ト
リクロロエチリデンジメタクリレート、トリエチレング
リコールジアクリレート、ペンタエリスリトールトリア
クリレート、トリメチロールプロパントリアクリレー
ト、テトラメチロールメタンテトラアクリレート、トリ
エチレングリコールジメタクリレート、1,3,5−ト
リアクリロイルヘキサンヒドロs−トリアジン、ビスア
クリルアミド酢酸、エチリジントリメタクリレート、プ
ロピリジントリアクリレート、ビニルアリルオキシアセ
テート等である。When the polymer material of the present invention is synthesized by suspension polymerization, emulsion polymerization or dispersion polymerization, it is preferable to use an ethylenically unsaturated monomer containing at least two ethylenically unsaturated groups as a copolymerization monomer. it can. Preferred examples of the ethylenically unsaturated monomer having at least two ethylenically unsaturated groups include divinylbenzene, 4,4′-isopropylidene diphenylene diacrylate, 1,3-butylene diacrylate, 1,3-butylene diene. Methacrylate, 1,4-cyclohexylene dimethylene dimethacrylate, diethylene glycol dimethacrylate, diisopropylidene glycol dimethacrylate, divinyloxymethane, ethylene glycol diacrylate, ethylene glycol dimethacrylate, ethylidene diacrylate, ethylidene dimethacrylate, 1,6-dimethy Acrylamide hexane, N, N '
-Methylenebisacrylamide, N, N '-(1,2-
Dihydroxy) ethylene bisacrylamide, 2,2-
Dimethyl-1,3-trimethylene dimethacrylate, phenylethylene dimethacrylate, tetraethylene glycol dimethacrylate, tetramethylene diacrylate, tetramethylene dimethacrylate, 2,2,2-trichloroethylidene dimethacrylate, triethylene glycol diacrylate, penta Erythritol triacrylate, trimethylolpropane triacrylate, tetramethylolmethane tetraacrylate, triethylene glycol dimethacrylate, 1,3,5-triacryloylhexanehydro s-triazine, bisacrylamido acetic acid, ethylidyne trimethacrylate, propyridine triacrylate, Vinyl allyloxyacetate and the like.
【0051】この中でも、ジビニルベンゼン、エチレン
グリコールジメタクリレートが特に好ましい。Among these, divinylbenzene and ethylene glycol dimethacrylate are particularly preferable.
【0052】本発明のポリマー素材が乳化重合によって
合成される場合に使用する界面活性剤好ましい例は、以
下に示されるようなアニオン性界面活性剤であるが、こ
れらに限定されるものではない。Preferred examples of the surfactant used when the polymer material of the present invention is synthesized by emulsion polymerization are, but not limited to, anionic surfactants as shown below.
【0053】[0053]
【化28】 Embedded image
【0054】本発明のポリマー素材が乳化重合によって
合成される場合には皮膜形成促進などを目的として、例
えばメタノール、エタノール、イソプロピルアルコー
ル、ブタノール、アセトン、酢酸エチル、アセトニトリ
ル、メチルエチルケトンなどの揮発性有機溶剤、および
エチレングリコール、エチレングリコールモノイソプロ
ピルエーテル、ジメチルテレフタレート、トリメチルホ
スフェートなどの可塑剤が加えられてもよい。When the polymer material of the present invention is synthesized by emulsion polymerization, a volatile organic solvent such as methanol, ethanol, isopropyl alcohol, butanol, acetone, ethyl acetate, acetonitrile or methyl ethyl ketone is used for the purpose of promoting film formation. , And a plasticizer such as ethylene glycol, ethylene glycol monoisopropyl ether, dimethyl terephthalate, and trimethyl phosphate may be added.
【0055】本発明のポリマー素材が未架橋である場合
の平均分子量は重量平均分子量MWで5,000以上
1,000,000以下であることが好ましく、さらに
好ましくは10,000以上700,000以下であ
る。When the polymer material of the present invention is uncrosslinked, the average molecular weight is preferably 5,000 or more and 1,000,000 or less, more preferably 10,000 or more and 700,000 in terms of weight average molecular weight M W. It is the following.
【0056】本発明の疎水性ポリマー層を構成するポリ
マー素材はバック層上に塗設された状態で「実質的な耐
水性」を発現させるため、ポリマー素材の25℃の溶解
度は水100g あたり5g 以下であることが好ましく、
さらに水100g あたり3g以下であることが好まし
い。The polymer material constituting the hydrophobic polymer layer of the present invention exhibits "substantial water resistance" in a state of being coated on the back layer. Therefore, the solubility of the polymer material at 25 ° C. is 5 g per 100 g of water. The following is preferable,
Further, it is preferably 3 g or less per 100 g of water.
【0057】以下に本発明の化5〜化7で表される繰り
返し単位を有するポリマーの合成例を示す。The synthesis examples of the polymers having the repeating units represented by Chemical Formulas 5 to 7 of the present invention are shown below.
【0058】合成例1 ポリトリフルオロエチルメタク
リレート(P−2)の合成 攪拌装置、温度計、還流冷却管を装着した200mlのガ
ラス製三口フラスコに、酢酸エチル78mlおよびトリフ
ルオロエチルメタクリレート25g を入れ、窒素気流下
70℃で加熱攪拌した。ジメチル−2,2’−アゾビス
イソブチレート0.125g を酢酸エチル2. 5mlに溶
解したもの(開始剤溶液)を添加し3時間攪拌した後,
同開始剤溶液を再度添加し、そのまま70℃で4時間加
熱攪拌を続けた。Synthesis Example 1 Synthesis of Polytrifluoroethyl Methacrylate (P-2) 78 ml of ethyl acetate and 25 g of trifluoroethyl methacrylate were placed in a 200 ml three-necked glass flask equipped with a stirrer, thermometer and reflux condenser. The mixture was heated and stirred at 70 ° C. under a nitrogen stream. After adding 0.125 g of dimethyl-2,2'-azobisisobutyrate in 2.5 ml of ethyl acetate (initiator solution) and stirring for 3 hours,
The same initiator solution was added again, and heating and stirring was continued for 4 hours at 70 ° C.
【0059】これを室温まで冷却後、メタノール5リッ
トルに再沈澱して精製し、重量平均分子量137,00
0(ポリスチレン換算値)のポリトリフルオロエチルメ
タクリレート14. 9g (収率59%)を得た。After cooling to room temperature, it was reprecipitated in 5 liters of methanol for purification, and the weight average molecular weight was 137,000.
14.9 g (yield 59%) of 0 (polystyrene-equivalent value) of polytrifluoroethyl methacrylate were obtained.
【0060】合成例2 ポリヘキサフルオロプロピルメ
タクリレートラテックス(P−7)の合成 攪拌装置、温度計、還流冷却管を装着した300mlのガ
ラス製三口フラスコに、界面活性剤SA−4を0.5g
および蒸留水160g 入れ、窒素気流下75℃で加熱攪
拌した。過硫酸カリウム0.16g を蒸留水10mlに溶
解したものを添加後直ちにヘキサフルオロプロピルメタ
クリレート50g を定速滴下装置を用いて2時間にわた
り滴下した。滴下完了後直ちに過硫酸カリウム0.16
g を蒸留水10mlに溶解したものを添加し、75℃で3
時間加熱攪拌を続けた。Synthesis Example 2 Synthesis of polyhexafluoropropylmethacrylate latex (P-7) 0.5 g of surfactant SA-4 was placed in a 300 ml glass three-necked flask equipped with a stirrer, a thermometer, and a reflux condenser.
Then, 160 g of distilled water was added, and the mixture was heated with stirring at 75 ° C. under a nitrogen stream. Immediately after the addition of 0.16 g of potassium persulfate dissolved in 10 ml of distilled water, 50 g of hexafluoropropyl methacrylate was added dropwise over 2 hours using a constant rate dropping device. Immediately after completion of dropping, potassium persulfate 0.16
Add 10g of distilled water dissolved in 10ml of distilled water, and add 3g at 75 ℃.
The heating and stirring were continued for an hour.
【0061】これを室温まで冷却後、ろ過して固形分1
8.2重量%、pH2.7、平均粒径91nm、変動係数
[=(粒径の標準偏差/平均粒径)×100]14%の
ラテックス211g (収率80%)を得た。重量平均分
子量は178,000(ポリスチレン換算値)であっ
た。After cooling to room temperature, it was filtered to obtain a solid content of 1
211 g (yield 80%) of latex having 8.2% by weight, pH 2.7, average particle size 91 nm, and variation coefficient [= (standard deviation of particle size / average particle size) × 100] 14% were obtained. The weight average molecular weight was 178,000 (polystyrene conversion value).
【0062】その他の乳化重合体も同様にして合成し
た。Other emulsion polymers were similarly synthesized.
【0063】合成例3 ポリo- メチルフェニルメタク
リルアミド(Q−18)の合成 o−メチルフェニルメタクリルアミドの合成 攪拌装置、温度計、還流冷却管を装着した500mlのガ
ラス製三口フラスコに、o-トルイジン50g (0.47
mol )およびジメチルアセタミド150mlを入れ、室温
下で攪拌した。これにメタクリロイルクロライド48.
8g (0.47mol )を2時間にわたり滴下した後、そ
のまま3時間攪拌を続けた。Synthesis Example 3 Synthesis of poly-o-methylphenylmethacrylamide (Q-18) Synthesis of o-methylphenylmethacrylamide In a 500 ml glass three-necked flask equipped with a stirrer, thermometer and reflux condenser, o- Toluidine 50g (0.47
mol) and dimethylacetamide (150 ml) were added, and the mixture was stirred at room temperature. Methacryloyl chloride 48.
8 g (0.47 mol) was added dropwise over 2 hours, and stirring was continued for 3 hours.
【0064】この後室温まで冷却し、氷水700g 中に
入れ結晶化させ、乾燥後63. 7gのシクロオクチルア
クリルアミドモノマーの白色結晶を得た(収率78
%)。Thereafter, the mixture was cooled to room temperature, put into 700 g of ice water for crystallization, and dried to obtain 63.7 g of white crystals of cyclooctylacrylamide monomer (yield 78.
%).
【0065】ポリo- メチルフェニルメタクリルアミド
の合成 攪拌装置、温度計、還流冷却管を装着した300mlのガ
ラス製三口フラスコに、1−メトキシ−2−プロパノー
ル200mlおよびo- メチルフェニルメタクリルアミド
50g を入れ、窒素気流下70℃で加熱攪拌した。ジメ
チル−2,2’−アゾビスイソブチレート0.5g を1
−メトキシ−2−プロパノール5mlに溶解したものを入
れ、70℃で2時間加熱攪拌後ジメチル−2,2’−ア
ゾビスイソブチレート0.5g を1−メトキシ−2−プ
ロパノール5mlに溶解したものを入れ、さらに70℃で
4時間加熱攪拌を続けた。Synthesis of poly (o-methylphenylmethacrylamide) 200 ml of 1-methoxy-2-propanol and 50 g of o-methylphenylmethacrylamide were placed in a 300 ml three-neck glass flask equipped with a stirrer, thermometer and reflux condenser. The mixture was heated and stirred at 70 ° C. under a nitrogen stream. 0.5 g of dimethyl-2,2'-azobisisobutyrate was added to 1
-Dissolve in 5 ml of methoxy-2-propanol, heat and stir at 70 ° C for 2 hours, and dissolve 0.5 g of dimethyl-2,2'-azobisisobutyrate in 5 ml of 1-methoxy-2-propanol. Was added, and heating and stirring was continued at 70 ° C. for 4 hours.
【0066】この後室温まで冷却し、蒸留水5リットル
に再沈澱して精製し,重量平均分子量14,700(ポ
リスチレン換算値)のポリo−メチルフェニルメタクリ
ルアミド45g を得た(収率90%)。DSCで測定し
たガラス転移温度は126℃であった。Then, the mixture was cooled to room temperature and reprecipitated in 5 liters of distilled water for purification to obtain 45 g of poly o-methylphenylmethacrylamide having a weight average molecular weight of 14,700 (polystyrene conversion value) (yield 90%). ). The glass transition temperature measured by DSC was 126 ° C.
【0067】その他の(メタ)アクリルアミド系溶液重
合体も同様にして合成した。Other (meth) acrylamide type solution polymers were synthesized in the same manner.
【0068】合成例4 ポリフェノキシエチルアクリレ
ート(R−1)の合成 攪拌装置、温度計、還流冷却管を装着した200mlのガ
ラス製三口フラスコに、酢酸エチル78mlおよびフェノ
キシエチルアクリレート(25g を入れ、窒素気流下7
0℃で加熱攪拌した。ジメチル−2,2’−アゾビスイ
ソブチレート0.125g を酢酸エチル2. 5mlに溶解
したもの(開始剤溶液)を添加し3時間攪拌した後,同
開始剤溶液を再度添加し、そのまま70℃で4時間加熱
攪拌を続けた。Synthesis Example 4 Synthesis of polyphenoxyethyl acrylate (R-1) In a 200 ml three-necked glass flask equipped with a stirrer, a thermometer and a reflux condenser, 78 ml of ethyl acetate and phenoxyethyl acrylate (25 g) were placed, and nitrogen was added. Under airflow 7
The mixture was heated and stirred at 0 ° C. A solution of 0.125 g of dimethyl-2,2'-azobisisobutyrate dissolved in 2.5 ml of ethyl acetate (initiator solution) was added, and the mixture was stirred for 3 hours. The heating and stirring were continued at 4 ° C for 4 hours.
【0069】これを室温まで冷却後、メタノール5リッ
トルに再沈澱して精製し、重量平均分子量40,400
(ポリスチレン換算値)のポリフェノキシエチルアクリ
レート(16. 8g (収率67%))を得た。After cooling to room temperature, it was reprecipitated in 5 liters of methanol for purification, and the weight average molecular weight was 40,400.
Polyphenoxyethyl acrylate (in terms of polystyrene) (16.8 g (yield 67%)) was obtained.
【0070】その他の(メタ)アクリレート系溶液重合
体も同様にして合成した。Other (meth) acrylate-based solution polymers were similarly synthesized.
【0071】本発明の疎水性ポリマー層における上記ポ
リマーの含有量は30wt% 以上、さらには50wt% 以上
とすることが好ましい。このような含有量とすることで
本発明の効果が向上する。これに対し、含有量が少なく
なると本発明の実効が得られなくなる。また、感材1m2
あたりの上記ポリマーの塗布量は0.01〜10g 、さ
らには0.1〜3g とすることが好ましい。このような
塗布量とすることで、本発明の効果が向上する。これに
対し、塗布量が少なくなると本発明の実効がなく、塗布
量が多くなりすぎると、疎水性ポリマー層が厚くなって
しまい、感光材料にカールが生じやすくなる。The content of the above polymer in the hydrophobic polymer layer of the present invention is preferably 30 wt% or more, more preferably 50 wt% or more. With such a content, the effects of the present invention are improved. On the other hand, if the content is too small, the effect of the present invention cannot be obtained. In addition, 1m 2 of sensitive material
The coating amount of the above polymer is preferably 0.01 to 10 g, more preferably 0.1 to 3 g. With such a coating amount, the effect of the present invention is improved. On the other hand, when the coating amount is small, the present invention is not effective, and when the coating amount is too large, the hydrophobic polymer layer becomes thick and the photosensitive material is apt to curl.
【0072】本発明の疎水性ポリマー層には、必要に応
じてマット剤、界面活性剤、染料、すべり剤、架橋剤、
増粘剤、UV吸収剤、コロイダルシリカ等の無機微粒子
などの写真用添加剤を添加してもよい。これらの添加剤
については、例えば、リサーチ・ディスクロージャー誌
176巻17643項(1978年12月)の記載を参
考にすることができる。In the hydrophobic polymer layer of the present invention, a matting agent, a surfactant, a dye, a slip agent, a crosslinking agent, and
Photographic additives such as thickeners, UV absorbers and inorganic fine particles such as colloidal silica may be added. Regarding these additives, for example, the description of Research Disclosure Vol. 176, Item 17643 (December 1978) can be referred to.
【0073】本発明の疎水性ポリマー層は1層であって
も2層以上であっても良い。本発明の疎水性ポリマー層
の厚みには特に制限はない。しかし疎水性ポリマー層の
厚みが小さ過ぎる場合、疎水性ポリマー層の耐水性が不
充分となり、バック層が処理液に膨潤する様になってし
まい不適切である。逆に疎水性ポリマー層の厚みが大き
過ぎる場合、疎水性ポリマー層の水蒸気透過性が不充分
となり、バック層の親水性コロイド層の吸脱湿が阻害さ
れて感光材料に大きなカールを発生させてしまう。勿論
疎水性ポリマー層の厚みは用いるバインダーの物性値に
も依存する。従って疎水性ポリマー層厚みは、この両者
を考慮して決定する必要がある。疎水性ポリマー層の好
ましい厚みは、疎水性ポリマー層のバインダー種にもよ
るが、0.05〜10μm 、より好ましくは0.1〜5
μm の範囲である。なお本発明の疎水性ポリマー層が2
層以上から構成される場合には、すべての疎水性ポリマ
ー層の厚みの和を本発明のハロゲン化銀写真感光材料の
ポリマー層の厚みとする。The hydrophobic polymer layer of the present invention may be one layer or two or more layers. There is no particular limitation on the thickness of the hydrophobic polymer layer of the present invention. However, if the thickness of the hydrophobic polymer layer is too small, the water resistance of the hydrophobic polymer layer becomes insufficient, and the back layer swells in the treatment liquid, which is inappropriate. On the other hand, if the thickness of the hydrophobic polymer layer is too large, the water vapor permeability of the hydrophobic polymer layer will be insufficient, and the moisture absorption / desorption of the hydrophilic colloid layer of the back layer will be inhibited, causing a large curl in the photosensitive material. I will end up. Of course, the thickness of the hydrophobic polymer layer also depends on the physical properties of the binder used. Therefore, it is necessary to determine the thickness of the hydrophobic polymer layer in consideration of both of them. The preferred thickness of the hydrophobic polymer layer depends on the binder species of the hydrophobic polymer layer, but it is 0.05 to 10 μm, more preferably 0.1 to 5 μm.
It is in the μm range. The hydrophobic polymer layer of the present invention is 2
When it is composed of more than one layer, the sum of the thicknesses of all the hydrophobic polymer layers is the thickness of the polymer layer of the silver halide photographic light-sensitive material of the present invention.
【0074】本発明の疎水性ポリマー層を塗設する方法
に特に制限はない。バック層を塗布乾燥した後に、バッ
ク層上に疎水性ポリマー層を塗布しその後乾燥しても良
いし、バック層と疎水性ポリマー層を同時に塗布し、そ
の後乾燥してもよい。The method for applying the hydrophobic polymer layer of the present invention is not particularly limited. After coating and drying the back layer, the hydrophobic polymer layer may be coated on the back layer and then dried, or the back layer and the hydrophobic polymer layer may be coated simultaneously and then dried.
【0075】本発明において疎水性ポリマー層が塗設さ
れるバック層は、親水性コロイドをバインダーとする層
であるが、これについて述べる。バック層に用いられる
親水性コロイドとしては、カールの観点からハロゲン化
銀乳剤層が塗設されている面の写真層のバインダーに近
い吸湿率、吸湿速度を持つものが好ましい。本発明のバ
ック層のバインダーに用いる親水性コロイドとして最も
好ましいものはゼラチンである。ゼラチンとしては、い
わゆる石灰処理ゼラチン、酸処理ゼラチン、酵素処理ゼ
ラチン、ゼラチン誘導体及び変性ゼラチン等、当業界で
一般に用いられているものはいずれも用いることができ
る。これらのゼラチンのうち、最も好ましく用いられる
のは石灰処理ゼラチン、酸処理ゼラチンである。ゼラチ
ン以外の親水性コロイドとしてコロイド状アルブミン、
カゼイン等の蛋白質、寒天、アルギン酸ナトリウム、デ
ンプン誘導体等の糖誘導体、カルボキシメチルセルロー
ス、ヒドロキシメチルセルロース等のセルロース化合
物、ポリビニルアルコール、ポリ−N−ビニルピロリド
ン、ポリアクリルアミド等の合成親水性高分子等を挙げ
ることができる。合成親水性高分子の場合、他の成分を
共重合してもよいが、疎水性共重合成分が多過ぎる場
合、バック層の吸湿量、吸湿速度が小さくなり、カール
の観点から不適当である。これらの親水性コロイドは、
単独で用いてもよいし、2種以上を混合して用いてもよ
い。The back layer to which the hydrophobic polymer layer is applied in the present invention is a layer using a hydrophilic colloid as a binder, which will be described below. From the viewpoint of curling, it is preferable that the hydrophilic colloid used for the back layer has a moisture absorption rate and a moisture absorption rate that are close to those of the binder of the photographic layer on which the silver halide emulsion layer is coated. The most preferred hydrophilic colloid used as the binder in the back layer of the present invention is gelatin. As the gelatin, so-called lime-processed gelatin, acid-processed gelatin, enzyme-processed gelatin, gelatin derivatives and modified gelatin, and any of those commonly used in the art can be used. Among these gelatins, lime-treated gelatin and acid-treated gelatin are most preferably used. Colloidal albumin as a hydrophilic colloid other than gelatin,
Examples include proteins such as casein, agar, sugar alginates, sugar derivatives such as starch derivatives, cellulose compounds such as carboxymethyl cellulose and hydroxymethyl cellulose, and synthetic hydrophilic polymers such as polyvinyl alcohol, poly-N-vinylpyrrolidone, and polyacrylamide. You can In the case of a synthetic hydrophilic polymer, other components may be copolymerized, but when the amount of the hydrophobic copolymerization component is too large, the moisture absorption amount and moisture absorption rate of the back layer become small, which is unsuitable from the viewpoint of curling. . These hydrophilic colloids are
They may be used alone or as a mixture of two or more.
【0076】本発明のバック層には、バインダー以外、
マット剤、界面活性剤、染料、架橋剤、増粘剤、防腐
剤、UV吸収剤、コロイダルシリカ等の無機微粒子等の
写真用添加剤を添加しても良い。これらの添加剤につい
ては、疎水性ポリマー層同様、例えばリサーチ・ディス
クロージャー誌176巻17643項(1978年12
月)の記載を参考にすることができる。In the back layer of the present invention, other than the binder,
A photographic additive such as a matting agent, a surfactant, a dye, a crosslinking agent, a thickener, a preservative, a UV absorber, and inorganic fine particles such as colloidal silica may be added. Regarding these additives, similar to the hydrophobic polymer layer, for example, Research Disclosure Vol. 176, Item 17643 (December 1978).
Month) can be referred to.
【0077】本発明のバック層は1層でもよいし2層以
上であってもよい。また本発明のバック層の厚みに特に
制限はなく、適用する写真感光材料の種類によるが、カ
ールの観点からは感光性ハロゲン化銀乳剤層側の厚みに
対応させるかあるいは近くすることが望ましく、一般的
には0. 2〜20μm であることが好ましく、0. 5〜
10μm であることがさらに好ましい。バック層が2層
以上からなる場合には全てのバック層の厚みの和を本発
明のハロゲン化銀写真感光材料のバック層の厚みとす
る。The back layer of the present invention may be one layer or two or more layers. Further, the thickness of the back layer of the present invention is not particularly limited, and it depends on the type of the photographic light-sensitive material to be applied, but from the viewpoint of curling, it is desirable to correspond to or be close to the thickness on the side of the photosensitive silver halide emulsion layer, Generally, it is preferably 0.2 to 20 μm, and 0.5 to 20 μm.
More preferably, it is 10 μm. When the back layer is composed of two or more layers, the sum of the thicknesses of all the back layers is the thickness of the back layer of the silver halide photographic light-sensitive material of the present invention.
【0078】本発明のバック層はバック層の外側の層に
疎水性ポリマー層が塗設されることによって実質的に耐
水性であることが必要である。「実質的に耐水性」とは
本発明においてバック層と疎水性ポリマー層が積層され
た場合、バック層と疎水性ポリマー層の合計厚みに対し
て38℃の水に1分間浸漬した後の合計厚みが浸漬前の
合計厚みの1.5倍以下であることを意味する。浸漬後
の合計厚みはさらに1.45倍以下となることが好まし
い。本発明では水に浸漬した後の厚みの増加(膨潤厚
み)が2μm 以下であり、1. 5μm 以下であることが
好ましい。The back layer of the present invention needs to be substantially water resistant by coating a layer outside the back layer with a hydrophobic polymer layer. “Substantially water resistant” means, in the present invention, when the back layer and the hydrophobic polymer layer are laminated, the total after immersing in water at 38 ° C. for 1 minute with respect to the total thickness of the back layer and the hydrophobic polymer layer. It means that the thickness is 1.5 times or less of the total thickness before immersion. The total thickness after immersion is preferably 1.45 times or less. In the present invention, the increase in thickness (swelling thickness) after immersion in water is 2 μm or less, and preferably 1.5 μm or less.
【0079】本発明のバック層を塗設する方法について
は特に制限はない。従来ハロゲン化銀写真感光材料の親
水性コロイド層を塗設する公知の方法を用いることがで
きる。例えばディップコート法、エアーナイフコート
法、カーテンコート法、ローラーコート法、ワイヤーバ
ーコート法、グラビアコート法、あるいは、米国特許第
2681294号記載のホッパーを使用するエクストル
ージョンコート法、または米国特許第2761418
号、同3508947号、同2761791号記載の多
層同時塗布方法を用いることができる。The method of applying the back layer of the present invention is not particularly limited. Conventionally, a known method for coating a hydrophilic colloid layer of a silver halide photographic light-sensitive material can be used. For example, a dip coating method, an air knife coating method, a curtain coating method, a roller coating method, a wire bar coating method, a gravure coating method, or an extrusion coating method using a hopper described in US Pat. No. 2,681,294, or US Pat. No. 2,761,418.
Nos. 3,508,947 and 2,761,791 can be used.
【0080】本発明に用いるハロゲン化銀乳剤等、感光
性ハロゲン化銀写真感光材料のバック面以外の要素につ
いては、例えば特開平5- 127282号の欄8以降の
記載を使用することができる。For elements other than the back surface of the light-sensitive silver halide photographic light-sensitive material such as the silver halide emulsion used in the present invention, for example, those described in JP-A No. 5-127282, column 8 and thereafter can be used.
【0081】本発明の感光材料に用いられる各種添加
剤、現像処理方法等に関しては、特に制限はないが、印
刷感材の場合には例えば下記箇所に記載されたものを好
ましく用いることができる。There are no particular restrictions on the various additives used in the light-sensitive material of the present invention, the development processing method, and the like, but in the case of printing light-sensitive materials, those described in the following sections can be preferably used.
【0082】 項目 該当箇所 1)ヒドラジン造核剤 平成2−12236号公報第2頁右上欄19行目から同第7 頁右上欄3行目の記載、同3−174143号公報第20頁 右下欄1行目から同第27頁右上欄20行目の一般式(II) および化合物II−1ないしII−54。 2)造核促進剤 特開平2−103536号公報第9頁右上欄13行目から同 第16頁左上欄10行目の一般式(II−m)ないし(II−p )および化合物例II−1ないしII−22、特開平1−179 939号公報に記載の化合物。 3)ハロゲン化銀乳剤とその製法 特開平2−97937号公報第20頁右下欄12行目から同 第21頁左下欄14行目、特開平2−12236号公報第7 頁右上欄19行目から同第8頁左下欄12行目、および特願 平3−189532号に記載のセレン増感法。 4)分光増感色素 特開平2−12236号公報第8頁左下欄13行目から同右 下欄4行目、同2−103536号公報第16頁右下欄3行 目から同第17頁左下欄20行目、さらに特開平1−112 235号、同2−124560号、同3−7928号、特願 平3−189532号および同3−411064号に記載の 分光増感色素。 5)界面活性剤 特開平2−12236号公報第9頁右上欄7行目から同右下 欄7行目、および特開平2−18542号公報第2頁左下欄 13行目から同第4頁右下欄18行目。 6)カブリ防止剤 特開平2−103536号公報第17頁右下欄19行目から 同第18頁右上欄4行目および同右下欄1行目から5行目、 さらに特開平1−237538号公報に記載のチオスルフィ ン酸化合物。 7)ポリマーラテックス(バック面以外) 特開平2−103536号公報第18頁左下欄12行目から 同20行目。 8)酸基を有する化合物 特開平2−103536号公報第18頁右下欄6行目から同 第19頁左上欄1行目。 9)マット剤、滑り剤、可塑剤 特開平2−103536号公報第19頁左上欄15行目から 同第19頁右上欄15行目。 10)硬膜剤 特開平2−103536号公報第18頁右上欄5行目から同 第17行目。 11)染料 特開平2−103536号公報第17頁右下欄1行目から同 18行目の染料、同2−294638号公報および特願平3 −185773号に記載の固体染料。 12)バインダー 特開平2−18542号公報第3頁右下欄1行目から20行 目。 13)黒ポツ防止剤 米国特許第4956257号および特開平1−118832 号公報に記載の化合物。 14)レドックス化合物 特開平2−301743号公報の一般式(I)で表される化 合物(特に化合物例1ないし50)、同3−174143号 公報第3頁ないし第20頁に記載の一般式(R−1)、(R −2)、(R−3)、化合物例1ないし75、さらに特願平 3−69466号、同3−15648号に記載の化合物。 15)モノメチン化合物 特開平2−287532号公報の一般式(II)の化合物(特 に化合物例II−1ないしII−26)。 16)ジヒドロキシベンゼン類 特開平3−39948号公報第11頁左上欄から第12頁左 下欄の記載、およびEP452772A号公報に記載の化合 物。 17)現像液および現像方法 特開平2−103536号公報第19頁右上欄16行目から 同第21頁左上欄8行目。Item Relevant part 1) Hydrazine nucleating agent No. 2-12236, Heisei 2-122236, page 2, upper right column, line 19 to page 7, upper right column, line 3, line 3-174143, page 20, lower right Column 1, line 1 to page 27, upper right column, line 20 General formula (II) and compounds II-1 to II-54. 2) Nucleation accelerator JP-A-2-103536, page 9, upper right column, line 13 to page 16, upper left column, line 10 General formulas (II-m) to (II-p) and compound example II- 1 to II-22, compounds described in JP-A-1-179939. 3) Silver halide emulsion and its manufacturing method JP-A-2-97937, page 20, lower right column, line 12 to page 21, left lower column, line 14; JP-A-2-12236, page 7, upper right column, line 19 From the eye to the selenium sensitization method described on page 8, lower left column, line 12, and Japanese Patent Application No. 3-189532. 4) Spectral sensitizing dye JP-A-2-12236, page 8, lower left column, line 13 to right lower column, line 4, and JP-A 2-103536, page 16, lower right column, line 3 to page 17, lower left Spectral sensitizing dyes described in column 20, line 20 and JP-A-1-112235, JP-A-2-124560, JP-A-3-7928, and Japanese Patent Application Nos. 3-189532 and 3-411064. 5) Surfactants JP-A-2-12236, page 9, upper right column, line 7 to lower right column, line 7, and JP-A-2-18542, page 2, lower left column, line 13 to page 4, right Lower column, line 18 6) Antifoggant JP-A-2-103536, page 17, lower right column, line 19 to page 18, upper right column, line 4 and lower right column, lines 1 to 5; JP-A 1-237538 A thiosulfinic acid compound described in the official gazette. 7) Polymer latex (other than back surface) JP-A-2-103536, page 18, lower left column, lines 12 to 20. 8) Compound having an acid group JP-A-2-103536, page 18, lower right column, line 6 to page 19, upper left column, line 1 9) Matting agent, lubricant, plasticizer JP-A-2-103536, page 19, upper left column, line 15 to page 19, upper right column, line 15 10) Hardener JP-A-2-103536, page 18, upper right column, line 5 to line 17 thereof. 11) Dyes Dyes in the lower right column, lines 17 to 18 of JP-A-2-103536, solid dyes described in JP-A-2-294638 and JP-A-3-185773. 12) Binder JP-A-2-18542, page 3, lower right column, lines 1 to 20. 13) Black spot preventing agent Compounds described in U.S. Pat. No. 4,956,257 and JP-A-1-118832. 14) Redox compounds Compounds represented by the general formula (I) in JP-A No. 2-301743 (particularly compound examples 1 to 50), and compounds described in JP-A No. 3-174143, pages 3 to 20 The compounds described in Formulas (R-1), (R-2), (R-3), Compound Examples 1 to 75, and Japanese Patent Application Nos. 3-69466 and 3-15648. 15) Monomethine compounds Compounds of general formula (II) described in JP-A-2-287532 (particularly compound examples II-1 to II-26). 16) Dihydroxybenzenes Compounds described in JP-A-3-39948, page 11, upper left column to page 12, lower left column, and EP 452772A. 17) Developer and developing method JP-A-2-103536, page 19, upper right column, line 16 to page 21, upper left column, line 8
【0083】また、スキャナー感材の場合には例えば下
記に示す該当箇所に記載されたものを好ましく用いるこ
とができる。Further, in the case of a scanner light-sensitive material, for example, the materials described in the corresponding portions shown below can be preferably used.
【0084】 項目 該当箇所 1)ハロゲン化銀乳剤とその製法 特開平2−97937号公報第20頁右下欄12行目から同 第21頁左下欄14行目および特開平2−12236号公報 第7頁右上欄19行目から同第8頁左下欄12行目、特願平 3−116573号。 2)分光増感色素 特開平2−55349号公報第7頁左上欄8行目から同第8 頁右下欄8行目、同2−39042号公報第7頁右下欄8行 目から同第13頁右下欄5行目。 3)界面活性剤、帯電防止剤 特開平2−12236号公報第9頁右上欄7行目から同右下 欄7行目および特開平2−18542号公報第2頁左下欄1 3行目から同第4頁右下欄18行目。 4)カブリ防止剤、安定剤 特開平2−103526号公報第17頁右下欄19行目から 同第18頁右上欄4行目および同右下欄1行目から5行目。 5)ポリマーラテックス(バック面以外) 特開平2−103526号公報第18頁左下欄12行目から 同20行目。 7)酸基を有する化合物 特開平2−103526号公報第18頁右下欄6行目から同 第19頁左上欄1行目、および同2−55349号公報第8 頁右下欄13行目から同第11頁左上欄8行目。Item Relevant part 1) Silver halide emulsion and its manufacturing method JP-A-2-97937, page 20, lower right column, line 12 to page 21, left lower column, line 14 and JP-A-2-12236. Page 7, upper right column, line 19 to page 8, lower left column, line 12; Japanese Patent Application No. 3-116573. 2) Spectral sensitizing dyes JP-A-2-55349, page 7, upper left column, line 8 to page 8, lower right column, line 8 and JP-A 2-39042, page 7, lower right column, line 8 Page 13, lower right column, line 5. 3) Surfactants and antistatic agents JP-A-2-12236, page 9, upper right column, line 7 to the same, lower right column, line 7 and JP-A-2-18542, page 2, lower left column, the same from line 3 Page 4, lower right column, line 18. 4) Antifoggant, Stabilizer JP-A-2-103526, page 17, lower right column, line 19 to page 18, upper right column, line 4 and lower right column, line 1 to line 5. 5) Polymer latex (other than the back surface) JP-A-2-103526, page 18, lower left column, lines 12 to 20. 7) Compounds having an acid group JP-A-2-103526, page 18, lower right column, line 6 to page 19, upper left column, line 1 and JP-A 2-55349, page 8, lower right column, line 13 To page 11, upper left column, line 8 of the same.
【0085】なお、本発明に好適な低補充迅速処理と
は、例えば現像、定着、水洗の処理工程に従う黒白感光
材料では、現像液および定着液の各補充量が感材1m2当
たり225ml以下、好ましくは30〜225ml、特に好
ましくは50〜180mlであり、現像は20〜50℃程
度の温度で5〜60秒程度、定着は20〜50℃程度の
温度で5〜60秒程度行う。また、水洗液の補充量は感
材1m2当たり20リットル以下、好ましくは3リットル
以下であり、水洗は0〜50℃程度の温度で5〜60秒
程度行う。また、乾燥工程も含め、現像開始から乾燥終
了までの全処理時間は20〜100秒程度である。The low-replenishment rapid processing suitable for the present invention means, for example, in a black-and-white light-sensitive material which follows the processing steps of development, fixing and washing, the replenishment amount of each of the developing solution and the fixing solution is 225 ml or less per 1 m 2 of the light-sensitive material, The amount is preferably 30 to 225 ml, and particularly preferably 50 to 180 ml. The development is performed at a temperature of about 20 to 50 ° C. for about 5 to 60 seconds, and the fixing is performed at a temperature of about 20 to 50 ° C. for about 5 to 60 seconds. The replenishing amount of the washing solution is 20 liters or less, preferably 3 liters or less, per 1 m 2 of the light-sensitive material, and washing is performed at a temperature of about 0 to 50 ° C. for about 5 to 60 seconds. Also, the total processing time from the start of development to the end of drying is about 20 to 100 seconds including the drying step.
【0086】[0086]
【実施例】以下、実施例を挙げて、本発明を更に詳細に
説明するが、本発明はこれに限定されるものではない。EXAMPLES The present invention will be described in more detail with reference to the following Examples, but it should not be construed that the invention is limited thereto.
【0087】実施例1 両面に下引き層を塗布した厚さ100μm のポリエチレ
ンテレフタレート支持体の一方の面に下記処方のバック
層をスライドコートにより塗布した。Example 1 A back layer having the following formulation was applied by slide coating to one side of a 100 μm thick polyethylene terephthalate support having both sides coated with an undercoat layer.
【0088】 バック層処方 ゼラチン 2.5g/m2 ドデシルベンゼンスルホン酸ナトリウム 10mg/m2 ポリスチレンスルホン酸ナトリウム 30mg/m2 N,N’−エチレンビス−(ビニルスルホンアセトアミド) 25mg/m2 Back layer formulation Gelatin 2.5 g / m 2 Sodium dodecylbenzene sulfonate 10 mg / m 2 Sodium polystyrene sulfonate 30 mg / m 2 N, N′-ethylenebis- (vinyl sulfone acetamide) 25 mg / m 2
【0089】バック層のpHは1規定の塩酸により調整
し、5.7とした。用いたゼラチンの等電点のpHは
4.8であった。The pH of the back layer was adjusted to 5.7 by adjusting with 1N hydrochloric acid. The gelatin used had an isoelectric point pH of 4.8.
【0090】バック層を塗布後25℃65%RHで1週
間放置してゼラチンの架橋硬膜を進めたのち、以下の塗
布量となるようにポリマー層をワイアバーで塗布し35
℃30%RHの条件で乾燥した。塗布液中のポリマー濃
度は18重量%になるように調製した。なお、比較例の
重合体は化29に示すものである。After coating the back layer, the mixture was allowed to stand at 25 ° C. and 65% RH for 1 week to proceed with cross-linking hardening of gelatin, and then the polymer layer was coated with a wire bar so that the coating amount was as follows.
It was dried under the condition of 30 ° C RH. The polymer concentration in the coating solution was adjusted to 18% by weight. The polymer of Comparative Example is shown in Chemical formula 29.
【0091】 表1に記載の溶液重合体または乳化重合体 2.0g/m2 ドデシルベンゼンスルホン酸ナトリウム 16.5mg/m2 ポリメチルメタクリレート微粒子(平均粒径3μ) 10mg/m2 C8 F17SO3 K 5mg/m2 Solution polymer or emulsion polymer described in Table 1 2.0 g / m 2 sodium dodecylbenzenesulfonate 16.5 mg / m 2 polymethylmethacrylate fine particles (average particle size 3 μ) 10 mg / m 2 C 8 F 17 SO 3 K 5mg / m 2
【0092】[0092]
【化29】 Embedded image
【0093】このようにして得られた試料を25℃60
%RH の雰囲気下で1週間保存した後、以下の評価を実施
した。The sample thus obtained was placed at 25 ° C. 60
After being stored for one week in an atmosphere of% RH, the following evaluation was carried out.
【0094】(1)バック層の膨潤率 安立電気(株)製電子マイクロメーターで膨潤前の膜厚
は測定力30±5g 、膨潤した膜厚は測定力2±0.5
g で25℃、38℃の2点で測定を行った。(1) Swelling ratio of back layer With an electronic micrometer manufactured by Anritsu Electric Co., Ltd., the film thickness before swelling was 30 ± 5 g, and the film thickness after swelling was 2 ± 0.5.
The measurement was performed at two points of 25 ° C. and 38 ° C. in g.
【0095】(2)カール回復速度 長さ5cm、巾1cmに裁断した試料を25℃、60%RH の
条件下で3日間保存し、ついで25℃10%RH の雰囲気
下に移しその後のカールを測定した。カール値は以下の
式で定義した。(2) Curling recovery speed A sample cut into a length of 5 cm and a width of 1 cm was stored for 3 days under the conditions of 25 ° C. and 60% RH, and then transferred to an atmosphere of 25 ° C. and 10% RH for subsequent curling. It was measured. The curl value was defined by the following formula.
【0096】カール値=1/(試料の曲率半径(cm)) カール回復速度はカール値を以下の式に代入して算出し
た。 カール回復速度={(20秒後のカール値)/(2時間
後のカール値)}×100(%) カール回復速度の大きいものほど好ましく、実用上60
%以上が必要である。得られた結果を表1に示す。Curl value = 1 / (curvature radius of sample (cm)) The curl recovery speed was calculated by substituting the curl value into the following formula. Curl recovery speed = {(curl value after 20 seconds) / (curl value after 2 hours)} × 100 (%) The higher the curl recovery speed is, the more practical it is 60.
% Or more is required. Table 1 shows the obtained results.
【0097】[0097]
【表1】 [Table 1]
【0098】表1から明らかなように、本発明の溶液重
合体または乳化重合体は比較例と比べ、膨潤厚み、特に
処理液の温度に相当する38℃での膨潤厚みを抑えるの
に有効であり、かつカール回復性も維持していることが
わかる。As is clear from Table 1, the solution polymer or emulsion polymer of the present invention is more effective in suppressing the swelling thickness, particularly the swelling thickness at 38 ° C. which corresponds to the temperature of the treatment liquid, as compared with Comparative Examples. It can be seen that the curl recovery property is maintained.
【0099】実施例2 支持体として両面にゼラチン下塗層を施した厚み100
μm のポリエチレンテレフタレートを用いた。上記支持
体の一方の面に下記処方のバック層を下層にポリマー層
を上層にして、スライドコートにより塗布した。スライ
ドコートによる塗布条件としては、注液器の先端から支
持体までの距離が0.25mm、支持体の搬送速度が15
0m/分であった。Example 2 A thickness of 100 with a gelatin subbing layer on both sides as a support.
μm polyethylene terephthalate was used. One surface of the support was coated by slide coating with a back layer having the following formulation as a lower layer and a polymer layer as an upper layer. As the coating conditions by slide coating, the distance from the tip of the liquid injector to the support is 0.25 mm, and the transport speed of the support is 15 mm.
It was 0 m / min.
【0100】 バック層処方 ゼラチン 2.5g/m2 ドデシルベンゼンスルホン酸ナトリウム 10mg/m2 ポリスチレンスルホン酸ナトリウム 30mg/m2 N,N’−エチレンビス−(ビニルスルホンアセトアミド) 25mg/m2 Back layer formulation Gelatin 2.5 g / m 2 Sodium dodecylbenzene sulfonate 10 mg / m 2 Sodium polystyrene sulfonate 30 mg / m 2 N, N′-ethylenebis- (vinyl sulfone acetamide) 25 mg / m 2
【0101】バック層のpHは1規定の塩酸により調整
し、5.7とした。用いたゼラチンの等電点のpHは
4.8であった。また、バック層塗布液の温度は35
℃、剪断速度10(1/秒)における粘度は50〜6mP
a・s であった。The pH of the back layer was adjusted to 5.7 by adjusting with 1N hydrochloric acid. The gelatin used had an isoelectric point pH of 4.8. The temperature of the back layer coating solution is 35
Viscosity at 50 ℃ and shear rate 10 (1 / sec) is 50-6mP
It was a ・ s.
【0102】 ポリマー層 表2に記載の乳化重合体 2.0g/m2 ドデシルベンセンスルホン酸ナトリウム 16.5mg/m2 ポリメチルメタクリレート微粒子 10mg/m2 C8 F17SO3 K 5mg/m2 Polymer layer Emulsion polymer described in Table 2 2.0 g / m 2 Sodium dodecyl benzene sulfonate 16.5 mg / m 2 Polymethylmethacrylate fine particles 10 mg / m 2 C 8 F 17 SO 3 K 5 mg / m 2
【0103】塗布後引き続いてチリングゾーンにて乾球
温度が20℃、湿球温度が15℃の風を吹き当てて塗布
膜をゲル化した後、乾球温度が35℃で湿球温度が20
℃の乾燥風を吹き当てて乾燥させた。After application, the coating film was gelled by blowing air with a dry bulb temperature of 20 ° C. and a wet bulb temperature of 15 ° C. in a chilling zone, and then the dry bulb temperature was 35 ° C. and the wet bulb temperature was 20 ° C.
Drying air at 0 ° C. was blown to dry.
【0104】このようにして得られた試料を25℃60
%RH の雰囲気下で1週間保存した後、以下の評価を実施
した。The sample thus obtained was placed at 25 ° C. 60
After being stored for one week in an atmosphere of% RH, the following evaluation was carried out.
【0105】(1)バック層の膨潤率 安立電気(株)製電子マイクロメーターで膨潤前の膜厚
は測定力30±5g 、膨潤した膜厚は測定力2±0.5
g で38℃で測定を行った。(1) Swelling ratio of back layer With an electronic micrometer manufactured by Anritsu Electric Co., Ltd., the film thickness before swelling was 30 ± 5 g, and the film thickness after swelling was 2 ± 0.5.
Measurements were made at 38 ° C. in g.
【0106】(2)塗膜のひび割れ(クラック) 塗膜の割れの程度を以下の3段階で評価した。 ○:割れなし △:長さ2mm以下の細かい割れが発生 ×:長さ2mm以上の割れが発生(2) Cracking of coating film The degree of cracking of the coating film was evaluated according to the following three grades. ◯: No cracks Δ: Fine cracks with a length of 2 mm or less occurred ×: Cracks with a length of 2 mm or more occurred
【0107】(3)耐付着性 長さ5cm、巾5cmに裁断した試料各2枚を塗布面同士を
重ね合わせ、100kg/cm2の加重下で16時間放置し、
付着の程度を以下の4段階で評価した。 ◎:付着面積 0〜5% ○:付着面積 6〜30% △:付着面積 31〜60% ×:付着面積 61〜100%(3) Adhesion resistance Two samples each having a length of 5 cm and a width of 5 cm were put on each other with their coated surfaces overlapped with each other, and left under a load of 100 kg / cm 2 for 16 hours.
The degree of adhesion was evaluated according to the following four grades. ◎: Adhesion area 0-5% ○: Adhesion area 6-30% △: Adhesion area 31-60% ×: Adhesion area 61-100%
【0108】実施例1と同様に膨潤率、耐接着性、クラ
ックを評価した。結果を表2に示した。The swelling rate, adhesion resistance and cracks were evaluated in the same manner as in Example 1. The results are shown in Table 2.
【0109】[0109]
【表2】 [Table 2]
【0110】表2から明らかなように、本発明の乳化重
合体は同時塗布においても耐水性、耐接着性、クラック
の点で優れた性能を示すことがわかる。As is clear from Table 2, the emulsion polymer of the present invention exhibits excellent performances in terms of water resistance, adhesion resistance and cracks even in simultaneous coating.
【0111】実施例3 二軸延伸したポリエチレンテレフタレート支持体(厚み
100μm )の両面に下記組成の下塗層第1層および第
2層を塗布した後、一方の面に下記組成の導電層(表面
抵抗率:25℃10%RH で2×1010Ω)を塗布し
た。こののち実施例2と同様にバック層とポリマー層の
同時塗布を行った。Example 3 A biaxially stretched polyethylene terephthalate support (thickness: 100 μm) was coated on both sides with the first and second subbing layers of the following composition, and then on one side, a conductive layer (surface Resistivity: 2 × 10 10 Ω) was applied at 25 ° C. and 10% RH. After that, the back layer and the polymer layer were simultaneously coated in the same manner as in Example 2.
【0112】ポリマー素材は表2における乳化重合体中
から選択して使用した。比較例としてはポリマー層なし
でバック層のみの試料、バック層のない試料およびポリ
マー層に本発明以外のポリマー素材を使用した試料を作
製し、使用に供した。The polymer material was selected from the emulsion polymers shown in Table 2 and used. As comparative examples, a sample having only a back layer without a polymer layer, a sample having no back layer, and a sample using a polymer material other than the present invention for the polymer layer were prepared and used.
【0113】 <下塗層第1層> 塩化ビニリデン/メチルメタクリレート/アクリロニトリル/メタクリル酸( 90/8/1/1重量比)の共重合体の水性分散物 15重量部 2,4−ジクロル−6−ヒドロキシ−s−トリアジン 0.25重量部 ポリスチレン微粒子(平均粒径3μm ) 0.05重量部 化合物−1(化30に記載) 0.20重量部 水を加えて 100重量部<Undercoat first layer> Aqueous dispersion of vinylidene chloride / methyl methacrylate / acrylonitrile / methacrylic acid (90/8/1/1 weight ratio) copolymer 15 parts by weight 2,4-dichloro-6 -Hydroxy-s-triazine 0.25 part by weight Polystyrene fine particles (average particle size 3 μm) 0.05 part by weight Compound-1 (described in Chemical formula 30) 0.20 part by weight Water 100 parts by weight
【0114】さらに、10重量%のKOHを加え、pH
=6に調整した塗布液を乾燥温度180℃2分間で、乾
燥膜厚が0.9μm になる様に塗布した。Further, 10% by weight of KOH was added to adjust the pH.
The coating solution adjusted to 6 was applied at a drying temperature of 180 ° C. for 2 minutes so that the dry film thickness was 0.9 μm.
【0115】 <下塗層第2層> ゼラチン 1重量部 メチルセルロース 0.05重量部 化合物−2(化30に記載) 0.02重量部 C12H25O(CH2 CH2 O)10H 0.03重量部 化合物−3(化30に記載) 3.5×10-3重量部 酢酸 0.2重量部 水を加えて 100重量部<Undercoat Layer Second Layer> Gelatin 1 part by weight Methylcellulose 0.05 part by weight Compound-2 (described in Chemical formula 30) 0.02 part by weight C 12 H 25 O (CH 2 CH 2 O) 10 H 0 0.03 parts by weight Compound-3 (described in Chemical formula 30) 3.5 × 10 −3 parts by weight Acetic acid 0.2 parts by weight Water 100 parts by weight
【0116】この塗布液を乾燥温度170℃2分間で、
乾燥膜厚が0.1μm になるように塗布した。This coating solution was dried at 170 ° C. for 2 minutes,
The coating was applied so that the dry film thickness was 0.1 μm.
【0117】 <導電層> SnO2 /Sb(9/1重量比、平均粒径0.25μm ) 300mg/m2 ゼラチン(Ca2+含有量30ppm ) 170mg/m2 化合物−3(化30に記載) 7mg/m2 ドデシルベンゼンスルホン酸ナトリウム 10mg/m2 ジヘキシル−α−スルホサクシナートナトリウム塩 40mg/m2 ポリスチレンスルホン酸ナトリウム塩 9mg/m2 <Conductive Layer> SnO 2 / Sb (9/1 weight ratio, average particle size 0.25 μm) 300 mg / m 2 Gelatin (Ca 2+ content 30 ppm) 170 mg / m 2 Compound-3 (described in Chemical formula 30) ) 7 mg / m 2 sodium dodecylbenzene sulfonate 10 mg / m 2 dihexyl-α-sulfosuccinate sodium salt 40 mg / m 2 polystyrene sulfonate sodium salt 9 mg / m 2
【0118】[0118]
【化30】 Embedded image
【0119】さらにこの支持体のバック層と反対側に特
開平5−127282号の実施例3に記載の感光性層
(染色層、乳剤層および保護層上下層)を同時塗布し、
25℃60%RH の雰囲気下で1週間保存した後、以下の
評価を実施した。Further, the photosensitive layer (dyeing layer, emulsion layer and protective layer upper and lower layers) described in Example 3 of JP-A-5-127282 was coated simultaneously on the side opposite to the back layer of this support,
After storing in an atmosphere of 25 ° C. and 60% RH for 1 week, the following evaluations were carried out.
【0120】(1)バック層、ポリマー層の処理液の膨
潤度 バック層、ポリマー層の水洗工程終了後の膜厚dの測
定:下記の現像処理の水洗工程の終了した試料を、液体
窒素により凍結乾燥する。その切片の走査型電子顕微鏡
観察により、バック層、ポリマー層につきそれぞれdを
求める。バック層、ポリマー層の乾燥後の膜厚d0 の測
定:下記の現像処理の乾燥工程終了後の試料の切片の走
査型電子顕微鏡観察により、バック層、ポリマー層につ
きそれぞれd0 を求める。(1) Swelling degree of treatment liquid for back layer and polymer layer Measurement of film thickness d of the back layer and polymer layer after washing with water: A sample after the washing with water of the following developing treatment was completed with liquid nitrogen. Lyophilize. By observing the section with a scanning electron microscope, d is determined for each of the back layer and the polymer layer. Measurement of the film thickness d 0 of the back layer and the polymer layer after drying: d 0 of each of the back layer and the polymer layer is obtained by observing the section of the sample after the completion of the drying step of the development processing described below with a scanning electron microscope.
【0121】(2)乳剤層+保護層の膨潤率 安立電気(株)製電子マイクロメーターで膨潤前の膜厚
は測定力30±5g 、膨潤した膜厚は測定力2±0.5
g で38℃で測定を行った。(2) Swelling ratio of emulsion layer + protective layer The film thickness before swelling was 30 ± 5 g and the swollen film thickness was 2 ± 0.5 with an electronic micrometer manufactured by Anritsu Electric Co., Ltd.
Measurements were made at 38 ° C. in g.
【0122】(3)カール 長さ5cm、巾1cmに裁断した試料を25℃、60%RH の
条件下で3日間保存し、ついで25℃10%RH の雰囲気
下に移しその後2時間後のカールを測定した。カール値
は以下の式で定義した。 カール値=1/(試料の曲率半径(cm)) 但し、乳剤面が内側のときのカール値を正、外側のとき
のカール値を負とする。実用上許容されるカール値は−
0.02から+0.02の範囲である。(3) Curl A sample cut into a length of 5 cm and a width of 1 cm was stored under the conditions of 25 ° C. and 60% RH for 3 days, then moved to an atmosphere of 25 ° C. and 10% RH, and then curled after 2 hours. Was measured. The curl value was defined by the following formula. Curl value = 1 / (curvature radius (cm) of sample) However, the curl value when the emulsion surface is inside is positive and the curl value when it is outside is negative. The practically acceptable curl value is-
It is in the range of 0.02 to +0.02.
【0123】(4)乾燥性 25℃60%RH の雰囲気下でFG−710NH自動現像
機(富士写真フイルム(株)製)を用いて、乾燥温度5
0℃で、ラインスピードを変えることにより、乾燥時間
を変えて大全サイズ(51cm×61cm)の試料を現像処
理し、処理直後の試料が完全に乾いている最短の乾燥時
間を求めた。(4) Drying property Using an FG-710NH automatic developing machine (manufactured by Fuji Photo Film Co., Ltd.) under an atmosphere of 25 ° C. and 60% RH, a drying temperature of 5
A sample of large size (51 cm × 61 cm) was developed by changing the drying time by changing the line speed at 0 ° C., and the shortest drying time when the sample immediately after processing was completely dried was determined.
【0124】(5)ジャミング 前記FG−710NH自動現像機の乾燥部のローラーを
フェノール樹脂製平滑ローラーに変えて、四つ切サイズ
(25.4cm×30.5cm)の試料20枚を下記の処理
条件で通し、ジャミングの発生を調べた。(5) Jamming The roller in the drying section of the FG-710NH automatic developing machine was changed to a smooth roller made of phenol resin, and 20 pieces of four-cut size (25.4 cm × 30.5 cm) samples were treated as follows. The occurrence of jamming was examined under the conditions.
【0125】 処理条件 現像 38℃ 14.0秒 定着 38℃ 9.7秒 水洗 25℃ 9.0秒 スクイズ 2.4秒 乾燥 55℃ 8.3秒 合計 43.4秒 ラインスピード 2800mm/minProcessing conditions Development 38 ° C. 14.0 seconds Fixing 38 ° C. 9.7 seconds Washing 25 ° C. 9.0 seconds Squeeze 2.4 seconds Dry 55 ° C. 8.3 seconds Total 43.4 seconds Line speed 2800 mm / min
【0126】なお、現像液および定着液は下記組成のも
のを使用し、補充量はフィルム1m2あたり200mlで行
った。A developing solution and a fixing solution having the following compositions were used, and the replenishing amount was 200 ml per 1 m 2 of the film.
【0127】 現像液組成(処理温度38℃) 1,2−ジヒドロキシベンゼン−3,5−ジスルホン酸ソーダ 0.5g ジエチレントリアミン−五酢酸 2.0g 炭酸ナトリウム 5.0g ホウ酸 10.0g 亜硫酸カリウム 85.0g 臭化ナトリウム 6.0g ジエチレングリコール 40.0g 5−メチルベンゾトリアゾール 0.2g ハイドロキノン 30.0g 4−ヒドロキシメチル−4−メチル−1−フェニル−3−ピラゾリドン 1.6g 2,3,5,6,7,8−ヘキサヒドロ−2−チオキソ−4−(1H)−キナ ゾリノン 0.05g 2−メルカプトベンツイミダゾール−5−スルホン酸ナトリウム 0.3g 水酸化カリウムを加え、水を加えて1リットルとしpHを10.7にあわせるDeveloper composition (processing temperature 38 ° C.) 1,2-dihydroxybenzene-3,5-disulfonic acid sodium salt 0.5 g diethylenetriamine-pentaacetic acid 2.0 g sodium carbonate 5.0 g boric acid 10.0 g potassium sulfite 85. 0 g sodium bromide 6.0 g diethylene glycol 40.0 g 5-methylbenzotriazole 0.2 g hydroquinone 30.0 g 4-hydroxymethyl-4-methyl-1-phenyl-3-pyrazolidone 1.6 g 2,3,5,6,6 7,8-Hexahydro-2-thioxo-4- (1H) -quinazolinone 0.05 g 2-Mercaptobenzimidazole-5-sodium sulfonate 0.3 g Potassium hydroxide was added, and water was added to adjust the pH to 1 liter. Set to 10.7
【0128】 定着液(処理温度38℃) チオ硫酸ナトリウム 160g/l 1,4,5−トリメチル−1,2,4−トリアゾリウム−3−チオレート 0.25mol/l 重亜硫酸ナトリウム 30g/l エチレンジアミン四酢酸二ナトリウム・二水液 0.25mol/l 水酸化ナトリウムでpH=6.0に調整する 得られた結果を表3に示す。Fixing solution (processing temperature 38 ° C.) Sodium thiosulfate 160 g / l 1,4,5-trimethyl-1,2,4-triazolium-3-thiolate 0.25 mol / l Sodium bisulfite 30 g / l Ethylenediaminetetraacetic acid Disodium / dihydrate solution 0.25 mol / l The pH is adjusted to 6.0 with sodium hydroxide. The obtained results are shown in Table 3.
【0129】[0129]
【表3】 [Table 3]
【0130】結果から明らかなように、本発明による試
料は比較例と異なり、乾燥性が良好でカール、ジャミン
グとも問題のないことがわかる。As is apparent from the results, the sample according to the present invention is different from the comparative example in that the drying property is good and there is no problem in curling and jamming.
【0131】[0131]
【発明の効果】本発明により疎水性ポリマー層の耐水性
(処理液遮断性)を改良することができ、水洗処理後の
乾燥性が良好で、カールが小さく、かつ搬送性が良好な
ハロゲン化銀写真感光材料を提供することができる。ま
た、迅速処理適性を有し、かつ、処理液の補充量が軽減
されたハロゲン化銀写真感光材料を提供することができ
る。Industrial Applicability According to the present invention, the water resistance of the hydrophobic polymer layer (treatment liquid blocking property) can be improved, the drying property after washing with water is good, the curl is small, and the halogenation is excellent in the transportability. A silver photographic light-sensitive material can be provided. Further, it is possible to provide a silver halide photographic light-sensitive material having suitability for rapid processing and reducing the replenishment amount of the processing solution.
【化31】 Embedded image
【化32】 Embedded image
【化33】 Embedded image
Claims (4)
水性コロイドをバインダーとするハロゲン化銀乳剤層を
塗設し、支持体の前記ハロゲン化銀乳剤層が塗設されて
いる面と反対側の面に親水性コロイドをバインダーとす
る非感光性コロイド層と、前記非感光性親水性コロイド
層の最外層に疎水性ポリマー層とが塗設されたハロゲン
化銀写真感光材料において、前記疎水性ポリマー層を形
成するポリマー素材が下記化1、化2および化3で表さ
れる繰り返し単位を少なくとも1種以上含むハロゲン化
銀写真感光材料。 【化1】 【化2】 【化3】 [化1において、R1 およびR2 は各々独立に水素原
子、メチル基またはフッ素原子を表す。R3 は水素原
子、フッ素原子または炭素原子数1〜4のアルキル基を
表す。R1 、R2 およびR3 は各々同一であっても異な
っていてもよい。R4は少なくとも1個のフッ素原子を
有する一価の基を表す。化2において、R5 およびR6
は各々水素原子または炭素原子数1〜8のアルキル基を
表す。Zは炭素原子数6〜20のアルキル基またはアリ
ール基を表す。化3において、R7 、R8 、R9 、
R10、R11およびR12は各々独立に水素原子、炭素原子
数1〜4のアルキル基またはハロゲン原子を表わす。X
は2価の連結基を表す。Jは炭素数1〜12のアルキレ
ン基を表す。]1. A silver halide emulsion layer having at least one hydrophilic colloid as a binder is coated on one surface of a support, which is opposite to the surface of the support on which the silver halide emulsion layer is coated. In the silver halide photographic light-sensitive material, a non-photosensitive colloid layer having a hydrophilic colloid as a binder is coated on the side surface, and a hydrophobic polymer layer is coated on the outermost layer of the non-photosensitive hydrophilic colloid layer. A silver halide photographic light-sensitive material in which the polymer material forming the functional polymer layer contains at least one or more repeating units represented by the following chemical formulas 1, 2 and 3. Embedded image Embedded image Embedded image [In Chemical Formula 1, R 1 and R 2 each independently represent a hydrogen atom, a methyl group or a fluorine atom. R 3 represents a hydrogen atom, a fluorine atom or an alkyl group having 1 to 4 carbon atoms. R 1 , R 2 and R 3 may be the same or different. R 4 represents a monovalent group having at least one fluorine atom. In Chemical formula 2, R 5 and R 6
Each represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. Z represents an alkyl group or an aryl group having 6 to 20 carbon atoms. In Chemical formula 3, R 7 , R 8 , R 9 ,
R 10 , R 11 and R 12 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or a halogen atom. X
Represents a divalent linking group. J represents an alkylene group having 1 to 12 carbon atoms. ]
少なくとも1種以上を75重量%以上含有する請求項1
のハロゲン化銀写真感光材料。2. The polymer material contains 75% by weight or more of at least one kind of the repeating units.
Silver halide photographic material.
2のアリール基である請求項1または2のハロゲン化銀
写真感光材料。3. Z in the chemical formula 2 has 6 to 1 carbon atoms.
The silver halide photographic light-sensitive material according to claim 1 or 2, wherein 2 is an aryl group.
化4で表される基、−COO−または−OCO−である
請求項1または2のハロゲン化銀写真感光材料。 【化4】 [化4において、R13は水素原子または炭素原子数1〜
4のアルキル基を表す。]4. The silver halide photographic light-sensitive material according to claim 1, wherein the divalent linking group X in the chemical formula 3 is a group represented by the following chemical formula 4, —COO— or —OCO—. Embedded image [In Chemical Formula 4, R 13 represents a hydrogen atom or a carbon atom of 1 to
4 represents an alkyl group. ]
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7186186A JPH0915788A (en) | 1995-06-29 | 1995-06-29 | Silver halide photographic sensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7186186A JPH0915788A (en) | 1995-06-29 | 1995-06-29 | Silver halide photographic sensitive material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0915788A true JPH0915788A (en) | 1997-01-17 |
Family
ID=16183901
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7186186A Pending JPH0915788A (en) | 1995-06-29 | 1995-06-29 | Silver halide photographic sensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0915788A (en) |
-
1995
- 1995-06-29 JP JP7186186A patent/JPH0915788A/en active Pending
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |