JPH09162011A - PTC resistor and method of manufacturing the same - Google Patents

PTC resistor and method of manufacturing the same

Info

Publication number
JPH09162011A
JPH09162011A JP7324928A JP32492895A JPH09162011A JP H09162011 A JPH09162011 A JP H09162011A JP 7324928 A JP7324928 A JP 7324928A JP 32492895 A JP32492895 A JP 32492895A JP H09162011 A JPH09162011 A JP H09162011A
Authority
JP
Japan
Prior art keywords
ptc resistor
wet mixing
rising temperature
temperature
ptc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7324928A
Other languages
Japanese (ja)
Inventor
Takao Sakai
隆夫 坂井
Kenji Kunihara
健二 国原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP7324928A priority Critical patent/JPH09162011A/en
Publication of JPH09162011A publication Critical patent/JPH09162011A/en
Pending legal-status Critical Current

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  • Emergency Protection Circuit Devices (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Thermistors And Varistors (AREA)

Abstract

(57)【要約】 【課題】限流素子となるPTC抵抗体(V1-X CrX
2 3 (但し0.0025≦X≦0.005)の抵抗
が、急速に増大しはじめる立ち上がり温度を制御する。 【解決手段】組成に応じた材料を一次湿式混合粉砕、仮
焼した後、ボールミルに入れ、二次湿式混合粉砕をして
成形、本焼成する。二次湿式混合粉砕の際、湿式混合粉
砕時間を10〜35時間に調節して、平均粒径を1.0
〜1.5μmにする。
(57) 【Abstract】 PROBLEM TO BE SOLVED: To provide a PTC resistor (V 1-X Cr X ) as a current limiting element.
The resistance of 2 O 3 (however 0.0025 ≦ X ≦ 0.005) controls the rising temperature that starts to increase rapidly. SOLUTION: A material corresponding to the composition is subjected to primary wet mixing and pulverization and calcination, and then placed in a ball mill, subjected to secondary wet mixing and pulverization, molded, and finally fired. During the secondary wet mixing and crushing, the wet mixing and crushing time was adjusted to 10 to 35 hours, and the average particle size was 1.0.
˜1.5 μm.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、過電流を抑制する
限流素子として使用される大きなPTC(正温度係数
の)特性をもつPTC抵抗体およびその製造方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a PTC resistor having a large PTC (positive temperature coefficient) characteristic used as a current limiting element for suppressing overcurrent and a method for manufacturing the same.

【0002】[0002]

【従来の技術】過電流を抑制するための限流素子とし
て、大きなPTC特性をもつセラミックスで、V2 3
(三酸化バナジウム)にCr(クロム)を添加して得ら
れる(V 1-X CrX 2 3 が知られている。〔例え
ば、飯田他、電気学会開閉保護装置研究会資料、SPD
−87−40〕 また、この限流素子を、ある種の過電流防止装置に用い
る場合には、比抵抗の立ち上がりの温度を110〜15
0℃に制御する必要があることがわかった。
2. Description of the Related Art As a current limiting device for suppressing overcurrent
And ceramics with large PTC characteristics,TwoOThree
Obtained by adding Cr (chromium) to (vanadium trioxide)
(V 1-XCrX)TwoOThreeIt has been known. 〔example
Ba, Iida et al., Institute of Electrical Engineers switchgear protection device study material, SPD
-87-40] In addition, this current limiting element is used for a kind of overcurrent protection device.
In case of
It was found necessary to control at 0 ° C.

【0003】[0003]

【発明が解決しようとする課題】(V1-X CrX 2
3 のPTC特性は、金属−絶縁体転移に基づくものであ
り、従来(V1-X CrX 2 3 の比抵抗の立ち上がり
の温度を制御するには、Crの含有量を変えたり、ある
いはFe等の添加剤の量を変えて行っていた。例えば、
Crの含有比が大きい程、比抵抗の立ち上がり温度は低
下し、立ち上がりの温度を110〜150℃に制御する
には、Crの含有比として、0.0025〜0.005
が適当である。
[Problems to be Solved by the Invention] (V 1-X Cr X ) 2 O
PTC characteristics of 3, metal - is based on insulator transition, to control a conventional (V 1-X Cr X) 2 temperature of the resistivity rise of the O 3 is changing the content of Cr, Alternatively, the amount of additives such as Fe has been changed. For example,
The higher the content ratio of Cr, the lower the rising temperature of the specific resistance. To control the rising temperature to 110 to 150 ° C., the Cr content ratio is 0.0025 to 0.005.
Is appropriate.

【0004】しかし、その場合、材料の組成を決めた時
点で、立ち上がりの温度がきまることにになり、この抵
抗体を機器に組み込んだ場合に周囲温度の高低により、
PTC特性のタイミングがずれ、二次側の機器に損傷を
与えることがあった。また、材料の組成のずれが、その
まま立ち上がりの温度に影響することになる。従って、
立ち上がり温度を決める主要因子としては、材料組成に
よるとしても、その材料の組成でなお、立ち上がりの温
度が制御できる方法があれば望ましい。
In that case, however, the rising temperature is determined at the time when the composition of the material is determined, and when this resistor is incorporated in equipment, the ambient temperature is high or low.
The timing of the PTC characteristic may be shifted, and the secondary device may be damaged. Further, the deviation of the composition of the material directly affects the rising temperature. Therefore,
As a main factor that determines the rising temperature, even if it depends on the material composition, it is desirable to have a method that can control the rising temperature by the composition of the material.

【0005】以上の問題に鑑みて本発明の目的は、容易
に立ち上がりの温度が制御できるPTC抵抗体およびそ
の製造方法を提供することにある。
In view of the above problems, it is an object of the present invention to provide a PTC resistor whose rising temperature can be easily controlled and a method for manufacturing the PTC resistor.

【0006】[0006]

【課題を解決するための手段】上記の課題解決のため本
発明のPTC抵抗体は、(V1-X CrX 2 3 (但
し、0.0025≦X≦0.005)を主成分とするP
TC抵抗体であって、平均粒径が1.0〜1.5μmの
範囲にあるものとする。また、そのようなPTC抵抗体
の製造方法として、仮焼後の粉砕混合時間を変え、特に
仮焼後の粉砕混合時間を10〜35時間とするものとす
る。
In order to solve the above problems, the PTC resistor of the present invention comprises (V 1-X Cr X ) 2 O 3 (where 0.0025 ≦ X ≦ 0.005) as a main component. Let P
It is a TC resistor having an average particle size of 1.0 to 1.5 μm. As a method of manufacturing such a PTC resistor, the pulverization and mixing time after calcination is changed, and the pulverization and mixing time after calcination is set to 10 to 35 hours.

【0007】そのようにすれば、PTC抵抗体の立ち上
がり温度を調節でき、過電流防止装置に用いる場合に適
当な110〜150℃に制御できる。また、上記以外の
範囲では、立ち上がり温度が、最適温度から外れてしま
う。
By doing so, the rising temperature of the PTC resistor can be adjusted, and can be controlled to 110 to 150 ° C., which is suitable for use in an overcurrent prevention device. In addition, in the range other than the above, the rising temperature deviates from the optimum temperature.

【0008】[0008]

【発明の実施の形態】BEST MODE FOR CARRYING OUT THE INVENTION

[実施例1]先に述べたように、PTC抵抗体(V1-X
CrX 2 3 の比抵抗の立ち上がり温度を110〜1
50℃に制御するための主要因子としてCr含有比X
は、0.0025≦X≦0.005が適当である。この
実施例では、X=0.0035とする。
Example 1 As described above, the PTC resistor (V 1-X
The cr X) 2 rising temperature of the specific resistance of the O 3 one hundred ten to one
Cr content ratio X as a main factor for controlling at 50 ° C
Is preferably 0.0025 ≦ X ≦ 0.005. In this embodiment, X = 0.0035.

【0009】本発明のPTC抵抗体の製造工程のフロー
チャートを図3に示す。この図に基づいて製造方法を説
明する。まず、出発原料として、V2 5 とCr2 3
とを、(V0.9965Cr0.0035 2 3 が得られるように
秤量し、焼結助剤としてFeを5重量%添加する。これ
をボールミルに入れ、純水を加えて48時間、一次湿式
混合粉砕を行った。これを乾燥して得られた粉末を、水
素気流の還元雰囲気中で、1100℃、2時間、仮焼を
行った。
Flow of manufacturing process of PTC resistor of the present invention
The chart is shown in FIG. The manufacturing method is explained based on this figure.
I will tell. First, as a starting material, VTwoOFiveAnd CrTwoOThree
And, (V0.9965Cr0.0035) TwoOThreeTo get
Weigh and add 5% by weight of Fe as a sintering aid. this
Put in a ball mill, add pure water for 48 hours, primary wet
Mixed and pulverized. The powder obtained by drying this, water
Calcination at 1100 ° C for 2 hours in a reducing atmosphere
went.

【0010】仮焼した塊をボールミルに入れ、純水を加
えて二次湿式混合粉砕を行った。このとき、二次湿式混
合粉砕時間を、5、24、48時間と三条件で行った。
これら三種類の試料を乾燥し、1.5ton/cm2
圧力で加圧成形を行い、成形体を作成した。昇、降温速
度は800℃/hとし、1600℃、C02 /H2 比が
0.01の気流中で焼成を行い、PTC抵抗体試料1〜
3を得、それらの比抵抗−温度特性を比較した。
The calcinated mass was placed in a ball mill, pure water was added, and secondary wet mixing and pulverization was performed. At this time, the secondary wet mixing and pulverizing time was 5, 24 and 48 hours under three conditions.
These three types of samples were dried and pressure-molded at a pressure of 1.5 ton / cm 2 to prepare a molded body. The temperature rising / falling rate was 800 ° C./h, firing was performed at 1600 ° C. in an air stream having a C0 2 / H 2 ratio of 0.01, and PTC resistor samples 1 to
3 were obtained and their specific resistance-temperature characteristics were compared.

【0011】これら試料のPTC特性を図4に示す。二
次湿式混合粉砕時間が長い程、立ち上がり温度が低くな
っている。立ち上がり温度のまとめを表1に示す。
The PTC characteristics of these samples are shown in FIG. The longer the secondary wet mixing and crushing time, the lower the rising temperature. Table 1 shows a summary of rising temperatures.

【0012】[0012]

【表1】 これら試料のPTC特性の違いの原因は、二次湿式混合
粉砕時間によるものであるから、二次湿式混合粉砕後の
粉の粒度分布に起因するものと考え、比表面積法により
平均粒径を測定した。その結果も表1に記した。二次湿
式混合粉砕時間が長くなる程、平均粒径が小さくなって
いることがわかる。
[Table 1] Since the cause of the difference in PTC characteristics of these samples is due to the secondary wet mixing and pulverizing time, it is considered to be due to the particle size distribution of the powder after the secondary wet mixing and pulverizing, and the average particle size was measured by the specific surface area method. did. The results are also shown in Table 1. It can be seen that the average particle size decreases as the secondary wet mixing and pulverization time increases.

【0013】比抵抗の立ち上がり温度と平均粒径との関
係を図1に示す。この図から、比抵抗の立ち上がり温度
を110℃〜150℃にするには、平均粒径としては
1.0から1.5μmに制御すればよいことがわかる。
図2に立ち上がり温度と二次湿式混合粉砕時間との関係
を示す。この図から、比抵抗の立ち上がり温度を110
℃〜150℃にするには、二次湿式混合粉砕時間として
は10〜35時間にすればよいことがわかる。
FIG. 1 shows the relationship between the rising temperature of the specific resistance and the average particle size. From this figure, it can be seen that the average particle diameter can be controlled to 1.0 to 1.5 μm in order to make the rising temperature of the specific resistance 110 ° C. to 150 ° C.
FIG. 2 shows the relationship between the rising temperature and the secondary wet mixing and pulverizing time. From this figure, the rising temperature of the resistivity is 110
It can be seen that the secondary wet mixing and pulverizing time may be 10 to 35 hours in order to adjust the temperature to 150 to 150 ° C.

【0014】以上説明したように本発明によれば、一定
の組成の材料を混合した後でも、容易に立ち上がりの温
度が制御できるPTC抵抗体が得られ、再現性があるこ
とが確かめられた。
As described above, according to the present invention, it was confirmed that a PTC resistor whose rise temperature can be easily controlled even after mixing materials having a certain composition was obtained and was reproducible.

【0015】[0015]

【発明の効果】本発明によれば、(V1-X CrX 2
3 (但し、0.0025≦X≦0.005)を主成分と
するPTC抵抗体において、例えば仮焼後の混合粉砕時
間を変化させるなどして平均粒径を変えることによっ
て、比抵抗の立ち上がり温度を適温に制御することがで
き、信頼性を高めたPTC抵抗素子が得られる。
According to the present invention, (V 1-X Cr X ) 2 O
In a PTC resistor whose main component is 3 (however, 0.0025 ≦ X ≦ 0.005), the average particle diameter is changed by changing the mixing and pulverizing time after calcination, for example, to increase the specific resistance. The temperature can be controlled to an appropriate temperature, and a PTC resistance element with improved reliability can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】立ち上がり温度と粒径との関係を示す図FIG. 1 is a diagram showing a relationship between a rising temperature and a particle size.

【図2】立ち上がり温度と二次混合粉砕時間との関係を
示す図
FIG. 2 is a diagram showing a relationship between a rising temperature and a secondary mixing and pulverizing time.

【図3】PTC抵抗体の製造工程のフロー図FIG. 3 is a flow chart of a manufacturing process of a PTC resistor.

【図4】PTC特性の混合粉砕時間依存性を示す図FIG. 4 is a graph showing the dependency of PTC characteristics on mixing and grinding time.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】(V1-X CrX 2 3 (但し、0.00
25≦X≦0.005)を主成分とするPTC抵抗体で
あって、平均粒径が1.0〜1.5μmの範囲内にある
ことを特徴とするPTC抵抗体。
(1) (V 1-X Cr X ) 2 O 3 (however, 0.00
25 ≦ X ≦ 0.005) as a main component, wherein the PTC resistor has an average particle size in the range of 1.0 to 1.5 μm.
【請求項2】(V1-X CrX 2 3 (但し、0.00
25≦X≦0.005)を主成分とするPTC抵抗体の
製造方法において、仮焼後の粉砕混合時間を変えること
によって、抵抗立ち上がり温度を制御することを特徴と
するPTC抵抗体の製造方法。
2. (V 1-X Cr X ) 2 O 3 (provided that 0.00
25 ≦ X ≦ 0.005) as a main component, wherein the resistance rising temperature is controlled by changing the grinding and mixing time after calcination. .
【請求項3】仮焼後の粉砕混合時間を10〜35時間と
することを特徴とする請求項2に記載のPTC抵抗体の
製造方法。
3. The method for producing a PTC resistor according to claim 2, wherein the crushing and mixing time after calcination is 10 to 35 hours.
JP7324928A 1995-12-14 1995-12-14 PTC resistor and method of manufacturing the same Pending JPH09162011A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7324928A JPH09162011A (en) 1995-12-14 1995-12-14 PTC resistor and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7324928A JPH09162011A (en) 1995-12-14 1995-12-14 PTC resistor and method of manufacturing the same

Publications (1)

Publication Number Publication Date
JPH09162011A true JPH09162011A (en) 1997-06-20

Family

ID=18171183

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7324928A Pending JPH09162011A (en) 1995-12-14 1995-12-14 PTC resistor and method of manufacturing the same

Country Status (1)

Country Link
JP (1) JPH09162011A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6680527B1 (en) 1998-11-11 2004-01-20 Murata Manufacturing Co. Ltd. Monolithic semiconducting ceramic electronic component

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6680527B1 (en) 1998-11-11 2004-01-20 Murata Manufacturing Co. Ltd. Monolithic semiconducting ceramic electronic component

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