JPH09169694A - Method for producing aromatic carboxylic acid - Google Patents
Method for producing aromatic carboxylic acidInfo
- Publication number
- JPH09169694A JPH09169694A JP7330206A JP33020695A JPH09169694A JP H09169694 A JPH09169694 A JP H09169694A JP 7330206 A JP7330206 A JP 7330206A JP 33020695 A JP33020695 A JP 33020695A JP H09169694 A JPH09169694 A JP H09169694A
- Authority
- JP
- Japan
- Prior art keywords
- carboxylic acid
- aromatic carboxylic
- heteropolyacid
- compound
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 239000011964 heteropoly acid Substances 0.000 claims abstract description 28
- 238000006243 chemical reaction Methods 0.000 claims abstract description 24
- 239000003054 catalyst Substances 0.000 claims abstract description 18
- 230000002950 deficient Effects 0.000 claims abstract description 17
- 150000001875 compounds Chemical class 0.000 claims abstract description 15
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 15
- 150000001491 aromatic compounds Chemical class 0.000 claims abstract description 14
- 150000003624 transition metals Chemical class 0.000 claims abstract description 14
- 239000012736 aqueous medium Substances 0.000 claims abstract description 13
- 150000001450 anions Chemical class 0.000 claims abstract description 8
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910001882 dioxygen Inorganic materials 0.000 claims abstract description 5
- 230000001590 oxidative effect Effects 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 14
- 150000002500 ions Chemical class 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Chemical group 0.000 claims description 3
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 claims description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical group [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 229910019142 PO4 Inorganic materials 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 2
- 239000010452 phosphate Substances 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 239000011574 phosphorus Substances 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical group [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 239000010937 tungsten Chemical group 0.000 claims description 2
- 229910017053 inorganic salt Inorganic materials 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 abstract description 6
- 239000000243 solution Substances 0.000 abstract description 3
- 239000012062 aqueous buffer Substances 0.000 abstract 1
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 14
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- LPNBBFKOUUSUDB-UHFFFAOYSA-N p-toluic acid Chemical compound CC1=CC=C(C(O)=O)C=C1 LPNBBFKOUUSUDB-UHFFFAOYSA-N 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000002485 combustion reaction Methods 0.000 description 5
- GWHJZXXIDMPWGX-UHFFFAOYSA-N 1,2,4-trimethylbenzene Chemical compound CC1=CC=C(C)C(C)=C1 GWHJZXXIDMPWGX-UHFFFAOYSA-N 0.000 description 4
- -1 bromine compound Chemical class 0.000 description 4
- 239000007853 buffer solution Substances 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 4
- 230000003197 catalytic effect Effects 0.000 description 4
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- RZTDESRVPFKCBH-UHFFFAOYSA-N 1-methyl-4-(4-methylphenyl)benzene Chemical group C1=CC(C)=CC=C1C1=CC=C(C)C=C1 RZTDESRVPFKCBH-UHFFFAOYSA-N 0.000 description 2
- YGYNBBAUIYTWBF-UHFFFAOYSA-N 2,6-dimethylnaphthalene Chemical group C1=C(C)C=CC2=CC(C)=CC=C21 YGYNBBAUIYTWBF-UHFFFAOYSA-N 0.000 description 2
- GOUHYARYYWKXHS-UHFFFAOYSA-N 4-formylbenzoic acid Chemical compound OC(=O)C1=CC=C(C=O)C=C1 GOUHYARYYWKXHS-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical group O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 239000000872 buffer Substances 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910001385 heavy metal Inorganic materials 0.000 description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 2
- 229920000831 ionic polymer Polymers 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- GPSDUZXPYCFOSQ-UHFFFAOYSA-N m-toluic acid Chemical compound CC1=CC=CC(C(O)=O)=C1 GPSDUZXPYCFOSQ-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000006174 pH buffer Substances 0.000 description 2
- 239000006179 pH buffering agent Substances 0.000 description 2
- CGFYHILWFSGVJS-UHFFFAOYSA-N silicic acid;trioxotungsten Chemical compound O[Si](O)(O)O.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 CGFYHILWFSGVJS-UHFFFAOYSA-N 0.000 description 2
- OKIRBHVFJGXOIS-UHFFFAOYSA-N 1,2-di(propan-2-yl)benzene Chemical group CC(C)C1=CC=CC=C1C(C)C OKIRBHVFJGXOIS-UHFFFAOYSA-N 0.000 description 1
- UNEATYXSUBPPKP-UHFFFAOYSA-N 1,3-Diisopropylbenzene Chemical group CC(C)C1=CC=CC(C(C)C)=C1 UNEATYXSUBPPKP-UHFFFAOYSA-N 0.000 description 1
- SPPWGCYEYAMHDT-UHFFFAOYSA-N 1,4-di(propan-2-yl)benzene Chemical group CC(C)C1=CC=C(C(C)C)C=C1 SPPWGCYEYAMHDT-UHFFFAOYSA-N 0.000 description 1
- SQAINHDHICKHLX-UHFFFAOYSA-N 1-naphthaldehyde Chemical compound C1=CC=C2C(C=O)=CC=CC2=C1 SQAINHDHICKHLX-UHFFFAOYSA-N 0.000 description 1
- GISVICWQYMUPJF-UHFFFAOYSA-N 2,4-Dimethylbenzaldehyde Chemical compound CC1=CC=C(C=O)C(C)=C1 GISVICWQYMUPJF-UHFFFAOYSA-N 0.000 description 1
- DYNFCHNNOHNJFG-UHFFFAOYSA-N 2-formylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=O DYNFCHNNOHNJFG-UHFFFAOYSA-N 0.000 description 1
- UHDNUPHSDMOGCR-UHFFFAOYSA-N 3-Formylbenzoic acid Chemical compound OC(=O)C1=CC=CC(C=O)=C1 UHDNUPHSDMOGCR-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- LROJZZICACKNJL-UHFFFAOYSA-N Duryl aldehyde Chemical compound CC1=CC(C)=C(C=O)C=C1C LROJZZICACKNJL-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000003426 co-catalyst Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- OVWYEQOVUDKZNU-UHFFFAOYSA-N m-tolualdehyde Chemical compound CC1=CC=CC(C=O)=C1 OVWYEQOVUDKZNU-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- IQDQMRZGMILNMQ-UHFFFAOYSA-N naphthalene-2,6-dicarbaldehyde Chemical compound C1=C(C=O)C=CC2=CC(C=O)=CC=C21 IQDQMRZGMILNMQ-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- BTFQKIATRPGRBS-UHFFFAOYSA-N o-tolualdehyde Chemical compound CC1=CC=CC=C1C=O BTFQKIATRPGRBS-UHFFFAOYSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- FXLOVSHXALFLKQ-UHFFFAOYSA-N p-tolualdehyde Chemical compound CC1=CC=C(C=O)C=C1 FXLOVSHXALFLKQ-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Chemical group CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000008363 phosphate buffer Substances 0.000 description 1
- 239000008055 phosphate buffer solution Substances 0.000 description 1
- DHRLEVQXOMLTIM-UHFFFAOYSA-N phosphoric acid;trioxomolybdenum Chemical compound O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.OP(O)(O)=O DHRLEVQXOMLTIM-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
(57)【要約】
【課題】 水系媒体中で、アルキル基を有する芳香族化
合物を分子状酸素で酸化して芳香族カルボン酸を製造す
る方法の改良法を提供する。
【解決手段】 欠損構造部位を有するヘテロポリ酸骨格
に遷移金属を組込んだ化合物を触媒として用い、かつヘ
テロポリ酸アニオンの構造を安定に保つことのできるp
Hの緩衝水溶液中で反応を行なう。(57) Abstract: An improved method for producing an aromatic carboxylic acid by oxidizing an aromatic compound having an alkyl group with molecular oxygen in an aqueous medium is provided. A compound in which a transition metal is incorporated in a heteropolyacid skeleton having a defective structural site is used as a catalyst, and the structure of the heteropolyacid anion can be stably maintained.
The reaction is carried out in an aqueous buffer solution of H 2.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、アルキル置換基ま
たは一部酸化したアルキル置換基を有する芳香族化合物
を酸化して、樹脂原料や医農薬原料等として工業的に有
用な芳香族カルボン酸を製造する方法に関するものであ
る。TECHNICAL FIELD [0001] The present invention oxidizes an aromatic compound having an alkyl substituent or a partially oxidized alkyl substituent to produce an aromatic carboxylic acid industrially useful as a resin raw material, a raw material for medical and agricultural chemicals, and the like. The present invention relates to a manufacturing method.
【0002】[0002]
【従来の技術】従来、芳香族カルボン酸を工業的に製造
する方法としては、アルキル置換基または一部酸化した
アルキル置換基を有する芳香族化合物を、コバルト、マ
ンガンなどの重金属化合物、及び臭素又は臭素化合物か
らなる触媒の存在下、酢酸などの低級アルカン酸を溶媒
として、液相中で酸化する方法が実施されている。しか
しながら、この方法では、溶媒として用いた酢酸などの
低級アルカン酸が、燃焼等により相当量消費されるた
め、製造コストが高くなるという問題がある。2. Description of the Related Art Conventionally, as a method for industrially producing an aromatic carboxylic acid, an aromatic compound having an alkyl substituent or a partially oxidized alkyl substituent is used as a heavy metal compound such as cobalt or manganese and bromine or A method of oxidizing in a liquid phase using a lower alkanoic acid such as acetic acid as a solvent in the presence of a catalyst composed of a bromine compound is practiced. However, in this method, a lower alkanoic acid such as acetic acid used as a solvent is consumed in a considerable amount due to combustion or the like, so that there is a problem that the manufacturing cost becomes high.
【0003】このような問題点を解決するために、溶媒
として低級アルカン酸の代わりに水を用いる方法も提案
されているが(特公昭39−13921号、特開昭58
−85840号、特開昭60−18403号など)、反
応速度が遅く実用的でない。そこで、触媒として酸化ル
テニウムを用いる方法(特開平3−130247)、触
媒として重金属及び臭素化合物、助触媒としてケイタン
グステン酸やリンモリブデン酸などのヘテロポリ酸を併
用する方法(特開平2−200656)などの水溶媒で
の改良方法が提案されている。しかしながら、上記のよ
うな改良方法もまだ実用段階には至らず、更なる改良が
望まれている。本発明者らは、水溶媒法の改良として、
欠損構造部位を有するヘテロポリ酸骨格に遷移金属を組
み込んだ化合物を触媒として用いる方法を提案した。
(特願平6−190633)In order to solve such a problem, a method of using water as a solvent instead of lower alkanoic acid has been proposed (Japanese Patent Publication No. 39-13921 and Japanese Patent Laid-Open No. 58/1983).
-85840, JP-A-60-18403, etc.), the reaction rate is slow and not practical. Therefore, a method using ruthenium oxide as a catalyst (JP-A-3-130247), a method using a heavy metal and a bromine compound as a catalyst, and a heteropolyacid such as silicotungstic acid and phosphomolybdic acid as a co-catalyst (JP-A-2-200656), etc. A method for improving the above with a water solvent has been proposed. However, the above-mentioned improvement method has not yet reached the stage of practical use, and further improvement is desired. The present inventors, as an improvement of the water solvent method,
We proposed a method using a compound with a transition metal incorporated in a heteropolyacid skeleton with a defective structural site as a catalyst.
(Japanese Patent Application No. 6-190633)
【0004】[0004]
【発明が解決しようとする課題】しかしながら、上記の
特願平6−190633の方法においても、反応の進行
に伴い、触媒活性が低下していくという問題点があるこ
とが判明した。従って本発明は、高められた触媒活性を
長時間維持しつつ、芳香族カルボン酸を製造する方法を
提供せんとするものである。However, it was found that the method of Japanese Patent Application No. 6-190633 described above also has a problem that the catalytic activity decreases as the reaction progresses. Therefore, the present invention is intended to provide a method for producing an aromatic carboxylic acid while maintaining an increased catalytic activity for a long time.
【0005】[0005]
【課題を解決するための手段】本発明によれば、アルキ
ル置換基または一部酸化したアルキル置換基を有する芳
香族化合物を、水系媒体中で分子状酸素により酸化して
芳香族カルボン酸を製造する方法において、欠損構造部
位を有するヘテロポリ酸骨格に遷移金属を組み込んだ化
合物を触媒として用い、ヘテロポリ酸アニオン構造を安
定に保つことのできるpHの緩衝水溶液中で反応を行な
うことにより、高い触媒活性が長時間維持され、目的の
芳香族カルボン酸を高収率で得ることができる。According to the present invention, an aromatic compound having an alkyl substituent or a partially oxidized alkyl substituent is oxidized with molecular oxygen in an aqueous medium to produce an aromatic carboxylic acid. In the method described above, a compound in which a transition metal is incorporated in a heteropolyacid skeleton having a deficient structure site is used as a catalyst, and the reaction is carried out in a buffered aqueous solution at a pH at which the heteropolyacid anion structure can be stably maintained, thereby increasing the Is maintained for a long time, and the target aromatic carboxylic acid can be obtained in high yield.
【0006】[0006]
【発明の実施の形態】本発明について詳細に説明する
と、本発明においては、原料として、アルキル置換基ま
たは一部酸化したアルキル置換基を有する芳香族化合物
が用いられる。アルキル置換基の、炭素数は通常1〜8
程度であるが、好ましいのはメチル基、エチル基、n−
プロピル基、i−プロピル基などの炭素数1から3のア
ルキル基である。また、一部酸化したアルキル基の炭素
数も通常1〜8程度である。このような一部酸化したア
ルキル基としては、例えばホルミル基、カルボキシル
基、ヒドロキシアルキル基等が挙げられる。原料の芳香
族化合物はこれらの置換基を2つ以上有していてもよ
い。複数の置換基を有する場合は、各々置換基は同一で
も異なるものでもよい。なお、芳香族化合物の芳香核に
は、ベンゼン環の様な単環のみならず、ナフタレン環の
ような多環式芳香核も含まれる。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail. In the present invention, an aromatic compound having an alkyl substituent or a partially oxidized alkyl substituent is used as a raw material. The number of carbon atoms of the alkyl substituent is usually 1 to 8
However, preferred are methyl group, ethyl group and n-
An alkyl group having 1 to 3 carbon atoms such as propyl group and i-propyl group. The carbon number of the partially oxidized alkyl group is usually about 1-8. Examples of such a partially oxidized alkyl group include a formyl group, a carboxyl group and a hydroxyalkyl group. The aromatic compound as a raw material may have two or more of these substituents. When it has a plurality of substituents, the substituents may be the same or different. The aromatic nucleus of the aromatic compound includes not only a single ring such as a benzene ring but also a polycyclic aromatic nucleus such as a naphthalene ring.
【0007】本発明で原料として用いるアルキル置換基
または一部酸化したアルキル置換基を有する芳香族化合
物のいくつかを例示すると、トルエン、イソプロピルベ
ンゼン、4,4′−ジメチルビフェニル、o−,m−,
またはp−キシレン、o−,m−,またはp−ジイソプ
ロピルベンゼン、プソイドキュメン(1,2,4−トリ
メチルベンゼン)、2,6−ジメチルナフタレン等のア
ルキル基の置換した芳香族化合物;ベンスアルデヒド、
o−,m−,またはp−トルアルデヒド、2,4−ジメ
チルベンズアルデヒド、2,4,5−トリメチルベンズ
アルデヒド、2,6−ジホルミルナフタレン、1−ホル
ミルナフタレン等のホルミル基の置換した芳香族化合
物;ベンジルアルコール等のヒドロキシアルキル基の置
換した芳香族化合物;o−,m−,またはp−トルイル
酸、o−,m−,またはp−カルボキシベンズアルデヒ
ド等のホルミル基とカルボキシル基の置換した化合物あ
るいはこれらの混合物などが挙げられる。Some of the aromatic compounds having an alkyl substituent or a partially oxidized alkyl substituent used as a raw material in the present invention are toluene, isopropylbenzene, 4,4'-dimethylbiphenyl, o-, m-. ,
Or an aromatic compound substituted with an alkyl group such as p-xylene, o-, m-, or p-diisopropylbenzene, pseudocumene (1,2,4-trimethylbenzene), and 2,6-dimethylnaphthalene; benzaldehyde,
Formyl group-substituted aromatic compounds such as o-, m-, or p-tolualdehyde, 2,4-dimethylbenzaldehyde, 2,4,5-trimethylbenzaldehyde, 2,6-diformylnaphthalene, and 1-formylnaphthalene. An aromatic compound substituted with a hydroxyalkyl group such as benzyl alcohol; a compound substituted with a formyl group and a carboxyl group such as o-, m-, or p-toluic acid, o-, m-, or p-carboxybenzaldehyde, or These mixtures etc. are mentioned.
【0008】本発明では、触媒として、欠損構造部位を
有するヘテロポリ酸骨格に遷移金属を組み込んだ化合物
を用いる。遷移金属としては、通常、第5〜10族元素
から選ばれたものが用いられるが、好ましいのは第5族
のV、第6族のCr,Mo,W、第7族のMn、第8族
のFe,Ru、第9族のCo,Rh、第10族のPdで
ある。なお、元素の周期表は、IUPAC無機化学命名
法改訂版(1989)による。これらの遷移金属は、例
えば、R.Neumanm et al.,J.Am.Chem.Soc.,112(1960)602
5.に記載の方法により、欠損構造部位を持つヘテロポリ
酸骨格中に組み込ませることができる。また、予じめ遷
移金属を組込んだヘテロポリ酸化合物触媒として反応系
に供する以外に、塩化物等の遷移金属塩と欠損型ヘテロ
ポリ酸化合物を個別に反応系に供給し、反応系中で遷移
金属を組込んだヘテロポリ酸化合物を形成させることも
可能である。In the present invention, a compound in which a transition metal is incorporated into a heteropolyacid skeleton having a defective structural site is used as a catalyst. As the transition metal, those selected from the elements of the groups 5 to 10 are usually used, and preferred are V of the group 5, Cr, Mo and W of the group 6, Mn of the group 7 and Mn of the group 8. Fe and Ru of the group, Co and Rh of the group 9, and Pd of the group 10. The periodic table of elements is based on the revised IUPAC Nomenclature of Inorganic Chemistry (1989). These transition metals are described, for example, in R. Neumanm et al., J. Am. Chem. Soc., 112 (1960) 602.
By the method described in 5, it can be incorporated into a heteropolyacid skeleton having a defective structural site. In addition to providing the reaction system as a heteropolyacid compound catalyst incorporating a pre-determined transition metal, a transition metal salt such as chloride and a deficient heteropolyacid compound are separately supplied to the reaction system to cause transition in the reaction system. It is also possible to form heteropolyacid compounds incorporating metals.
【0009】この欠損構造部位を持つヘテロポリ酸骨格
としては、例えば下記の一般式(1)〜(3)で示され
るものが挙げられる。 欠損型ヘキサメタレート型イオン (M5 O18)n- …(1) 欠損型ケギン型ポリ酸イオン (Y1 M11O39)n- …(2) 欠損型ドーソン型ポリ酸イオン (Y2 M17O61)n- …(3) (これらの式において、Mはモリブデン又はタングステ
ンを表わし、Yはケイ素、リン又はゲルマニウムを表わ
す。nは正の整数を表わすが、その値は通常1〜20の
範囲にある) これらの欠損構造部位を有するヘテロポリ酸骨格に遷移
金属を組込んだ化合物のカチオンには特に制限は無く、
例えばプロトン、ナトリウムイオン、カリウムイオン等
のアルカリ金属イオン、アルキル基の炭素数が1〜20
であるテトラアルキルアンモニウムカチオンなどが挙げ
られる。Examples of the heteropolyacid skeleton having this defective structure site include those represented by the following general formulas (1) to (3). Defect-type hexametallate ion (M 5 O 18 ) n -... (1) Defect-type keguin-type polyion ion (Y 1 M 11 O 39 ) n -... (2) Deletion-type Dawson-type polyacid ion (Y 2 M 17 O 61 ) n -... (3) (In these formulas, M represents molybdenum or tungsten, Y represents silicon, phosphorus or germanium. N represents a positive integer, but its value is usually 1 to There is no particular limitation on the cation of the compound in which the transition metal is incorporated in the heteropolyacid skeleton having these defective structural sites,
For example, an alkali metal ion such as a proton, sodium ion, or potassium ion, or an alkyl group having 1 to 20 carbon atoms.
And a tetraalkylammonium cation.
【0010】触媒は反応媒体中に通常10〜10,00
0ppm、好ましくは100〜5000ppmとなるよ
うに存在させる。なお、これらの遷移金属を組込んだヘ
テロポリ酸化合物触媒の安定化のため、触媒とともに欠
損型ヘテロポリ酸化合物を共存させてもよい。その共存
量は、遷移金属を組込んだヘテロポリ酸化合物に対し、
通常0.01〜10倍当量、好ましくは0.1〜5倍当
量である。本発明による芳香族化合物の酸化反応は水系
媒体中で実施されるが、水系媒体としては、水または水
を主成分とする溶液が用いられる。The catalyst is usually present in the reaction medium in the range of 10 to 100,000.
It is present at 0 ppm, preferably 100 to 5000 ppm. In order to stabilize the heteropolyacid compound catalyst incorporating these transition metals, a deficient heteropolyacid compound may coexist with the catalyst. The coexisting amount of heteropolyacid compound containing a transition metal is
It is usually 0.01 to 10 times equivalent, preferably 0.1 to 5 times equivalent. The oxidation reaction of the aromatic compound according to the present invention is carried out in an aqueous medium, and as the aqueous medium, water or a solution containing water as a main component is used.
【0011】本発明では、この水系媒体中にpH緩衝剤
を存在させて、触媒のヘテロポリ酸アニオンを安定化さ
せる。水系媒体中でのヘテロポリ酸の安定性は、そのp
Hに依存する。そして本発明者らの知見によれば、欠損
構造部位を有するヘテロポリ酸骨格に遷移金属を組込ん
だ化合物を触媒として、水系媒体中で芳香族カルボン酸
を製造する際の触媒活性低下の原因の少くとも一部は、
反応中に水系媒体のpHに影響されて、ヘテロポリ酸化
合物の構造が変化してしまうことによると考えられる。
従って、水系媒体中にpH緩衝剤を添加して、触媒のヘ
テロポリ酸アニオンの構造が安定に維持されるpH領域
で反応を行なわせると、触媒活性の低下を防止できると
考えられる。In the present invention, a pH buffer is present in this aqueous medium to stabilize the heteropolyacid anion of the catalyst. The stability of heteropolyacids in aqueous media depends on their p
Depends on H. According to the knowledge of the present inventors, a compound having a transition metal incorporated in a heteropolyacid skeleton having a defective structural site is used as a catalyst to cause a decrease in catalytic activity when an aromatic carboxylic acid is produced in an aqueous medium. At least some
It is considered that the structure of the heteropolyacid compound changes due to the influence of the pH of the aqueous medium during the reaction.
Therefore, it is considered that a decrease in catalytic activity can be prevented by adding a pH buffer to the aqueous medium to carry out the reaction in a pH range in which the structure of the heteropolyacid anion of the catalyst is stably maintained.
【0012】水系媒体中でのヘテロポリ酸アニオンの安
定なpH領域は、同じタイプのヘテロポリ酸でも、構成
元素が異なると相当に大きく変化する。従って、本発明
を実施するに際しては、使用する触媒のヘテロポリ酸ア
ニオンに応じて、水系媒体に添加すべきpH緩衝剤を選
択する必要がある。しかし、ヘテロポリ酸アニオンの安
定なpH領域は、その分解率の測定から決定できるの
で、ヘテロポリ酸により安定なpH領域が異なることは
本発明を実施する際の障害とはならない(P.Souchay 著
“ Ions Mineraux Condenses”( Masson & Cie,Paris,
1969 )参照)。欠損型ケギン型ポリ酸イオンのいくつか
について、安定に使用できるpH領域を例示すると、次
の通りである。The stable pH range of the heteropolyacid anion in the aqueous medium varies considerably even with the same type of heteropolyacid when the constituent elements are different. Therefore, in carrying out the present invention, it is necessary to select a pH buffering agent to be added to the aqueous medium, depending on the heteropolyacid anion of the catalyst used. However, since the stable pH region of the heteropolyacid anion can be determined from the measurement of its decomposition rate, the difference in the stable pH region depending on the heteropolyacid does not hinder the practice of the present invention (P. Souchay “ Ions Mineraux Condenses ”(Masson & Cie, Paris,
1969)). Examples of pH regions that can be stably used for some of the defective Keggin-type polyion ions are as follows.
【0013】[0013]
【表1】 通常使用範囲 好適範囲 最適範囲 〔SiW11O39〕7- <8.2 <8.0 <7.8 〔PW11O39〕7- <7.2 <7.0 <6.8 〔PMo11O39〕7- <5.2 <5.0 <4.8 〔GeMo11O39〕8- <4.7 <4.5 <4.3 pH緩衝剤としては通常は無機塩類が用いられ、燐酸
塩、炭酸塩、ほう酸塩などを用いるのが好ましい。反応
は、触媒として欠損構造部位を有するヘテロポリ酸骨格
に遷移金属を組込んだものを用い、かつ水系媒体中にp
H緩衝剤を存在させる以外は、常法に従って行なうこと
ができる。水系媒体と反応原料である芳香族化合物との
重量比は、通常1:1〜100:1の範囲から選ばれ
る。酸化剤である酸素としては、通常は空気を用いる
が、酸素富化空気や逆に窒素などの不活性ガスで希釈し
たものを用いることもできる。また所望ならば、酸素ガ
スやこれを窒素などで希釈したものを用いることができ
る。これらの分子状酸素含有ガスは通常、連続的に反応
系に吹き込まれる。[Table 1] Normal use range Suitable range Optimal range [SiW 11 O 39 ] 7- <8.2 <8.0 <7.8 [PW 11 O 39 ] 7- <7.2 <7.0 <6. 8 [PMo 11 O 39 ] 7- <5.2 <5.0 <4.8 [GeMo 11 O 39 ] 8- <4.7 <4.5 <4.3 As a pH buffering agent, inorganic salts are usually used. Is used, and it is preferable to use phosphate, carbonate, borate and the like. The reaction uses a heteropolyacid skeleton having a defective structural site with a transition metal incorporated as a catalyst, and p
It can be carried out according to a conventional method except that the H buffer is present. The weight ratio of the aqueous medium and the aromatic compound as the reaction raw material is usually selected from the range of 1: 1 to 100: 1. As oxygen as an oxidant, air is usually used, but oxygen-enriched air or conversely diluted with an inert gas such as nitrogen can also be used. If desired, oxygen gas or a gas obtained by diluting it with nitrogen or the like can be used. These molecular oxygen-containing gases are usually continuously blown into the reaction system.
【0014】反応温度は通常100〜300℃、好まし
くは150〜230℃であり、反応圧力は、その反応温
度において反応器中で液相が保持できる圧力以上であれ
ばよく、通常は常圧〜100気圧(0.1〜10MP
a)、好ましくは10〜80気圧(1〜8MPa)であ
る。また、反応時間は、通常0.1〜8時間、好ましく
は1〜5時間の範囲で選ばれる。本発明により得られる
芳香族カルボン酸の分離精製は、濾過、遠心分離、蒸留
などの常法により実施される。なお、生成物を分離した
後の触媒を含む溶液は、反応に再度利用することができ
る。The reaction temperature is usually 100 to 300 ° C., preferably 150 to 230 ° C., and the reaction pressure is not lower than the pressure at which the liquid phase can be retained in the reactor at that reaction temperature, usually atmospheric pressure to 100 atm (0.1-10MP
a), preferably 10 to 80 atm (1 to 8 MPa). The reaction time is usually selected in the range of 0.1 to 8 hours, preferably 1 to 5 hours. Separation and purification of the aromatic carboxylic acid obtained according to the present invention is carried out by a conventional method such as filtration, centrifugation or distillation. The solution containing the catalyst after separating the product can be reused in the reaction.
【0015】[0015]
【実施例】以下、実施例及び比較例を挙げて本発明を更
に具体的に説明するが、本発明はその要旨を越えない限
り以下の実施例に限定されるものではない。 実施例1 還流冷却器、攪拌機を備えた500mlのチタン製オー
トクレーブに、0.57M−H3 BO3 緩衝液(pH=
5.1)150mlとp−キシレン10.35gを仕込
んだ。これにRuを組込んだ欠損型ケイタングステン酸
カリK5 SiRu(H2 O)W11O39をRu濃度が16
56ppmとなるように添加した。オートクレーブ内を
窒素置換した後、200℃まで加熱昇温した。200℃
に達した時点で空気を圧入し、60気圧の加圧下、39
Nl/Hrの速度で空気を2時間連続的に供給した。次
いで、反応器を冷却し、内容物を取り出し、生成物を濾
過分離した。得られた生成物を高速液体クロマトグラフ
ィー及びガスクロマトグラフィーにより分析した。その
結果、p−キシレンの転化率が94%であり、仕込みp
−キシレンに対するテレフタル酸の収率は63%、p−
トルイル酸の収率は9%であった。なお、主な副生成物
は燃焼により生成したCO2 であった。EXAMPLES The present invention will be described in more detail with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples unless it exceeds the gist. Example 1 a reflux condenser, a titanium autoclave 500ml equipped with a stirrer, 0.57M-H 3 BO 3 buffer (pH =
5.1) 150 ml and p-xylene 10.35 g were charged. A defect type potassium silicotungstic acid K 5 SiRu (H 2 O) W 11 O 39 having Ru incorporated therein has a Ru concentration of 16
It was added so as to be 56 ppm. After replacing the inside of the autoclave with nitrogen, the temperature was raised to 200 ° C by heating. 200 ° C
At that point, pressurize air and pressurize at 60 atm.
Air was continuously supplied for 2 hours at a rate of Nl / Hr. The reactor was then cooled, the contents removed and the product filtered off. The obtained product was analyzed by high performance liquid chromatography and gas chromatography. As a result, the conversion of p-xylene was 94%, and the charged p
-63% yield of terephthalic acid based on xylene, p-
The yield of toluic acid was 9%. The main by-product was CO 2 produced by combustion.
【0016】実施例2 0.57M−H3 BO3 緩衝液(pH=5.1)を0.
57M−燐酸二水素カリウム緩衝液(pH=4.6)に
変えた以外は、実施例1と同様に反応を実施した。その
結果、p−キシレンの転化率は92%であり、仕込みp
−キシレンに対するテレフタル酸の収率は60%、p−
トルイル酸の収率は10%であった。なお、主な副生成
物は燃焼により生成したCO2 であった。Example 2 0.57M-H 3 BO 3 buffer solution (pH = 5.1) was added to 0.2%.
The reaction was carried out in the same manner as in Example 1 except that the buffer solution was changed to 57M-potassium dihydrogen phosphate buffer (pH = 4.6). As a result, the conversion rate of p-xylene was 92%, and
-60% yield of terephthalic acid based on xylene, p-
The yield of toluic acid was 10%. The main by-product was CO 2 produced by combustion.
【0017】実施例3 0.57M−H3 BO3 緩衝液(pH=5.1)を0.
057M−燐酸緩衝液(pH=2.3)に変えた以外
は、実施例1と同様に反応を実施した。その結果、p−
キシレンの転化率は90%であり、仕込みp−キシレン
に対するテレフタル酸の収率は55%、p−トルイル酸
の収率は11%であった。なお、主な副生成物は燃焼に
より生成したCO2 であった。Example 3 0.57M-H 3 BO 3 buffer solution (pH = 5.1) was added to 0.2%.
The reaction was carried out in the same manner as in Example 1 except that the 057M-phosphate buffer solution (pH = 2.3) was used. As a result, p-
The conversion rate of xylene was 90%, the yield of terephthalic acid with respect to the charged p-xylene was 55%, and the yield of p-toluic acid was 11%. The main by-product was CO 2 produced by combustion.
【0018】比較例1 0.57M−H3 BO3 緩衝液(pH=5.1)を用い
ず溶媒として水150mlを用いた以外は、実施例1と
同様に反応を実施した。その結果、p−キシレンの転化
率は87%であり、仕込みp−キシレンに対するテレフ
タル酸の収率は51%、p−トルイル酸の収率は13%
であった。なお、主な副生成物は燃焼により生成したC
O2 であった。Comparative Example 1 A reaction was carried out in the same manner as in Example 1 except that 150 ml of water was used as the solvent without using the 0.57M-H 3 BO 3 buffer solution (pH = 5.1). As a result, the conversion rate of p-xylene was 87%, the yield of terephthalic acid with respect to the charged p-xylene was 51%, and the yield of p-toluic acid was 13%.
Met. The main by-product is C generated by combustion.
It was O 2.
Claims (4)
キル置換基を有する芳香族化合物を、水系媒体中で分子
状酸素により酸化して芳香族カルボン酸を製造する方法
において、欠損構造部位を有するヘテロポリ酸骨格に遷
移金属を組み込んだ化合物を触媒として用い、ヘテロポ
リ酸アニオンの構造を安定に保つことのできるpHの緩
衝水溶液中で反応を行なうことを特徴とする芳香族カル
ボン酸の製造方法。1. A method for producing an aromatic carboxylic acid by oxidizing an aromatic compound having an alkyl substituent or a partially oxidized alkyl substituent with molecular oxygen in an aqueous medium to provide a heteropolyone having a defective structural site. A method for producing an aromatic carboxylic acid, which comprises using a compound having a transition metal incorporated in an acid skeleton as a catalyst and performing the reaction in a buffered aqueous solution having a pH capable of maintaining a stable structure of the heteropolyacid anion.
が、下記の一般式(1)〜(3); 欠損型ヘキサメタレート型イオン (M5 O18)n- …(1) 欠損型ケギン型ポリ酸イオン (YM11O39)n- …(2) 欠損型ドーソン型ポリ酸イオン (Y2 M17O61)n- …(3) (これらの式において、Mはモリブデン又はタングステ
ンを表わし、Yはケイ素、リン又はゲルマニウムを表わ
す。nは正の整数を表わす)のいずれかで表わされるも
のであることを特徴とする請求項1に記載の芳香族カル
ボン酸の製造方法。2. A heteropolyacid skeleton having a deficient structure site is represented by the following general formulas (1) to (3); deficient hexametallate ion (M 5 O 18 ) n -... (1) deficient Keggin type Polyacid ion (YM 11 O 39 ) n -... (2) Defective Dawson type polyacid ion (Y 2 M 17 O 61 ) n -... (3) (In these formulas, M represents molybdenum or tungsten, Y represents silicon, phosphorus or germanium, and n represents a positive integer.) The process for producing an aromatic carboxylic acid according to claim 1, wherein
れたものであることを特徴とする請求項1又は2に記載
の芳香族カルボン酸の製造方法。3. The method for producing an aromatic carboxylic acid according to claim 1, wherein the transition metal is selected from Group 5 to 10 elements.
酸塩からなる少なくとも1種の無機塩類を溶解している
ことを特徴とする請求項1ないし3のいずれかに記載の
芳香族カルボン酸の製造方法。4. The aromatic carboxylic acid according to claim 1, wherein the buffered aqueous solution dissolves at least one inorganic salt consisting of a phosphate, a carbonate and a borate. Manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7330206A JPH09169694A (en) | 1995-12-19 | 1995-12-19 | Method for producing aromatic carboxylic acid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7330206A JPH09169694A (en) | 1995-12-19 | 1995-12-19 | Method for producing aromatic carboxylic acid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09169694A true JPH09169694A (en) | 1997-06-30 |
Family
ID=18230037
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7330206A Pending JPH09169694A (en) | 1995-12-19 | 1995-12-19 | Method for producing aromatic carboxylic acid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09169694A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6506932B2 (en) | 2000-11-10 | 2003-01-14 | Nippon Shokubai Co., Ltd. | Method for production of oxygen-containing aromatic compound |
| JP2008031147A (en) * | 2006-06-30 | 2008-02-14 | Kimoto & Co Ltd | Modified free-acid type heteropolyacid, modified heteropolyacid salt and free-acid type heteropolyacid-based polymer |
-
1995
- 1995-12-19 JP JP7330206A patent/JPH09169694A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6506932B2 (en) | 2000-11-10 | 2003-01-14 | Nippon Shokubai Co., Ltd. | Method for production of oxygen-containing aromatic compound |
| JP2008031147A (en) * | 2006-06-30 | 2008-02-14 | Kimoto & Co Ltd | Modified free-acid type heteropolyacid, modified heteropolyacid salt and free-acid type heteropolyacid-based polymer |
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