JPH09172112A - Heat dissipation device for heat generating element - Google Patents
Heat dissipation device for heat generating elementInfo
- Publication number
- JPH09172112A JPH09172112A JP7348714A JP34871495A JPH09172112A JP H09172112 A JPH09172112 A JP H09172112A JP 7348714 A JP7348714 A JP 7348714A JP 34871495 A JP34871495 A JP 34871495A JP H09172112 A JPH09172112 A JP H09172112A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- substrate
- transistor
- generating element
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/851—Dispositions of multiple connectors or interconnections
- H10W72/874—On different surfaces
- H10W72/884—Die-attach connectors and bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
- H10W90/734—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked insulating package substrate, interposer or RDL
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/754—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL
Landscapes
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
(57)【要約】
【課題】 放熱体の熱伝導板に設けた放熱板を外部に突
出させることにより、発熱性素子からの熱を外部に確実
に放熱できると共に、放熱効率を向上させることにより
放熱体の基板上の面積を小さくでき、全体を小型化でき
るようにする。
【解決手段】 支持台21に接着層23を介して固定さ
れた基板22には、熱伝導板25と各放熱板28とから
なるヒートシンク24を配設する。そして、各放熱板2
8を基板22および支持台21の各挿通穴22A,21
Aから外部に突出した状態で、熱伝導板25を半田層2
6を介して基板22上に固定する。また、熱伝導板25
上には半田層27を介してトランジスタ6を固定する。
そして、トランジスタ6のソース8,ゲート9をボンデ
ィングワイヤ29,30を介して基板22上の各配線パ
ターンに接続し、ドレイン10を熱伝導板25を介して
基板22上の配線パターンに接続する。
(57) [Abstract] [PROBLEMS] By projecting a heat dissipation plate provided on a heat conduction plate of a heat dissipation member to the outside, heat from a heat-generating element can be reliably dissipated to the outside and heat dissipation efficiency is improved. The area of the radiator on the substrate can be reduced, and the overall size can be reduced. SOLUTION: A heat sink 24 composed of a heat conduction plate 25 and each heat radiation plate 28 is arranged on a substrate 22 fixed to a support base 21 via an adhesive layer 23. And each heat sink 2
8 is the through holes 22A, 21 of the substrate 22 and the support base 21.
The heat conductive plate 25 is attached to the solder layer 2 in a state of protruding from A to the outside.
It is fixed on the substrate 22 via 6. In addition, the heat conduction plate 25
The transistor 6 is fixed on the upper side of the solder layer 27.
Then, the source 8 and the gate 9 of the transistor 6 are connected to each wiring pattern on the substrate 22 via the bonding wires 29 and 30, and the drain 10 is connected to the wiring pattern on the substrate 22 via the heat conduction plate 25.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、例えばパワートラ
ンジスタ等の発熱性素子から発生する熱を外部に放熱さ
せるのに用いて好適な発熱性素子の放熱装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heat-dissipating device heat-dissipating apparatus which is suitable for radiating heat generated from a heat-generating element such as a power transistor to the outside.
【0002】[0002]
【従来の技術】従来技術による発熱性素子の放熱装置と
して図3に基き、ベアチップ型の電界効果トランジスタ
の放熱装置を例に挙げて説明する。2. Description of the Related Art As a heat dissipation device for a heat generating element according to the prior art, a heat dissipation device for a bare chip type field effect transistor will be described as an example with reference to FIG.
【0003】図中、1は例えばコントロールユニットの
ケーシング等により構成された支持台を示し、該支持台
1は例えばアルミニウム,樹脂材料等から平板状に形成
され、該支持台1の裏面側(図3中の下面側)はコント
ロールユニット等の外側面1Aとなっている。In the figure, reference numeral 1 denotes a support base composed of, for example, a casing of a control unit. The support base 1 is made of, for example, aluminum, a resin material or the like in a flat plate shape, and the back side of the support base 1 (see FIG. The lower surface side in 3) is the outer surface 1A of the control unit or the like.
【0004】2は後述のトランジスタ6等を搭載した基
板を示し、該基板2は例えば酸化アルミニウム(Al2
O3 )等のセラミック材料から平板状に形成され、熱伝
導性の高い接着剤等からなる接着層3を介して支持台1
上に固着されている。また、基板2上には後述するトラ
ンジスタ6のソース8,ゲート9およびドレイン10と
接続される3系統の配線パターン(いずれも図示せず)
が形成されている。Reference numeral 2 denotes a substrate on which a transistor 6 to be described later is mounted. The substrate 2 is made of, for example, aluminum oxide (Al 2
The support base 1 is formed in a flat plate shape from a ceramic material such as O 3 ) and has an adhesive layer 3 made of an adhesive having a high thermal conductivity.
Fixed on top. Further, on the substrate 2, there are three wiring patterns (not shown) connected to the source 8, the gate 9 and the drain 10 of the transistor 6 described later.
Are formed.
【0005】4は基板2上に半田層5を介して固着され
た放熱体としてのヒートスプレッダを示し、該ヒートス
プレッダ4は熱伝導性の高い材料、例えば銅(Cu),
モリブデン(Mo)等の金属材料から、その外形寸法が
10mm角程度、厚さ寸法が1〜1.5mm程度の四角形状
をなす平板として形成されている。ここで、ヒートスプ
レッダ4は前記トランジスタ6の発熱量に応じて十分に
大きい面積をもつことにより、トランジスタ6が通電中
に発生する熱を基板2側に効果的に放熱(伝導)するも
のである。Reference numeral 4 denotes a heat spreader as a radiator fixed to the substrate 2 via a solder layer 5. The heat spreader 4 is made of a material having high thermal conductivity, such as copper (Cu),
It is formed of a metal material such as molybdenum (Mo) as a rectangular flat plate having an outer dimension of about 10 mm square and a thickness dimension of about 1 to 1.5 mm. Here, the heat spreader 4 has a sufficiently large area according to the amount of heat generated by the transistor 6, so that heat generated while the transistor 6 is energized is effectively radiated (conducted) to the substrate 2 side.
【0006】6は発熱性素子としてのトランジスタを示
し、該トランジスタ6は例えば5mm角程度の四角形状を
有するベアチップ型の電界効果トランジスタ(FET)
として構成され、半田層7を介してヒートスプレッダ4
上の中央部に固着されている。そして、トランジスタ6
の入出力用端子のうち、ソース8側端子,ゲート9側端
子は互いに離間して該トランジスタ6の表面上に形成さ
れると共に、ドレイン10側端子は該トランジスタ6の
裏面側に形成され、該ドレイン10側端子はヒートスプ
レッダ4および半田層5,7を介して基板2上に形成さ
れた前記配線パターンに接続されている。Reference numeral 6 denotes a transistor as a heat generating element, and the transistor 6 is, for example, a bare chip type field effect transistor (FET) having a square shape of about 5 mm square.
As a heat spreader 4 via the solder layer 7
It is fixed to the upper center. And the transistor 6
Of the input / output terminals, the source 8 side terminal and the gate 9 side terminal are formed apart from each other on the front surface of the transistor 6, and the drain 10 side terminal is formed on the back surface side of the transistor 6. The drain 10 side terminal is connected to the wiring pattern formed on the substrate 2 via the heat spreader 4 and the solder layers 5 and 7.
【0007】11,12はボンディングワイヤで、該ボ
ンディングワイヤ11,12は、基端側が各アルミパッ
ド13を介してトランジスタ6のソース8側端子,ゲー
ト9側端子に固着され、先端側は各アルミパッド14を
介して基板2上に形成された他の各配線パターンに固着
されている。そして、ボンディングワイヤ11,12の
中間部は略円弧状の大きなたるみをもって配設され、こ
れによりボンディングワイヤ11,12は、トランジス
タ6のドレイン10に導通されたヒートスプレッダ4か
ら離間した状態で、ソース8,ゲート9と基板2上の各
配線パターンとを接続している。Reference numerals 11 and 12 are bonding wires. The bonding wires 11 and 12 are fixed to the source 8 side terminal and the gate 9 side terminal of the transistor 6 at the base end side through the aluminum pads 13, and the tip end side is made to each aluminum. It is fixed to other wiring patterns formed on the substrate 2 via the pads 14. The middle portions of the bonding wires 11 and 12 are arranged with a large slack in a substantially arc shape, whereby the bonding wires 11 and 12 are separated from the heat spreader 4 conducted to the drain 10 of the transistor 6 and the source 8 is formed. , The gate 9 and each wiring pattern on the substrate 2 are connected.
【0008】このように構成される従来技術では、基板
2上の配線パターンからボンディングワイヤ12等を介
してトランジスタ6のゲート9に電圧信号を入力する
と、この電圧信号に応じてトランジスタ6のソース8,
ドレイン10間が電気的に導通するから、ドレイン10
側に接続された基板2上の配線パターンから、ヒートス
プレッダ4,トランジスタ6およびボンディングワイヤ
11等を介してソース8側の配線パターンへと大電流が
流れる。In the conventional technology thus constructed, when a voltage signal is input from the wiring pattern on the substrate 2 to the gate 9 of the transistor 6 via the bonding wire 12 or the like, the source 8 of the transistor 6 is generated in response to the voltage signal. ,
Since the drains 10 are electrically connected, the drain 10
A large current flows from the wiring pattern on the substrate 2 connected to the side to the wiring pattern on the source 8 side via the heat spreader 4, the transistor 6, the bonding wire 11, and the like.
【0009】そして、ソース8,ドレイン10間に大き
な電流が流れることにより、トランジスタ6は通電中
(動作中)に発熱を伴うが、この熱はヒートスプレッダ
4を介して基板2に伝導され、さらに該基板2から支持
台1へと伝導されることにより、該支持台1から外部へ
と放熱される。Since a large current flows between the source 8 and the drain 10, the transistor 6 is heated during energization (during operation), and this heat is conducted to the substrate 2 via the heat spreader 4, and the heat is further transmitted. By being conducted from the substrate 2 to the support 1, the support 1 is radiated to the outside.
【0010】これにより、従来技術では、トランジスタ
6が通電中に発生する熱をヒートスプレッダ4,基板2
および支持台1等を介して外部に放熱することにより、
トランジスタ6の温度を耐久温度以下の例えば100℃
程度に保持し、トランジスタ6が通電中に高温となって
破損するのを防止している。As a result, according to the conventional technique, the heat generated while the transistor 6 is energized heats the heat spreader 4 and the substrate 2.
And by radiating heat to the outside through the support base 1 etc.,
The temperature of the transistor 6 is, for example, 100 ° C. which is lower than the endurance temperature
The transistor 6 is kept at a certain level to prevent the transistor 6 from being damaged due to high temperature during energization.
【0011】[0011]
【発明が解決しようとする課題】ところで、上述した従
来技術では、トランジスタ6から発生した熱は、半田層
7を介してヒートスプレッダ4へと伝導し、該ヒートス
プレッダ4から半田層5を介して基板2へと伝導した後
に、該基板2から接着層3を介して支持台1へと伝導
し、最終的に支持台1から外部に放熱される。By the way, in the above-mentioned prior art, the heat generated from the transistor 6 is conducted to the heat spreader 4 via the solder layer 7, and the heat spreader 4 to the substrate 2 via the solder layer 5. To the support base 1 through the adhesive layer 3 from the substrate 2, and finally the heat is radiated from the support base 1 to the outside.
【0012】ここで、半田層5,7および接着層3は、
放熱装置の組立工程でトランジスタ6,ヒートスプレッ
ダ4,基板2および支持台1の間にそれぞれ塗布した液
状の半田,接着剤等が固化することにより形成され、例
えば接着層3では、基板2と支持台1との間に液状の接
着剤等を塗布した後に両者を衝合することにより、固化
した接着剤が接着層3を形成し、これによって基板2と
支持台1とが接着層3を介して接着されるものである。Here, the solder layers 5 and 7 and the adhesive layer 3 are
It is formed by solidifying liquid solder, adhesive or the like applied between the transistor 6, the heat spreader 4, the substrate 2 and the support 1 in the assembly process of the heat dissipation device. For example, in the adhesive layer 3, the substrate 2 and the support 2 are formed. By applying a liquid adhesive or the like between the two and the two, but abutting them, the solidified adhesive forms an adhesive layer 3, whereby the substrate 2 and the support base 1 interpose the adhesive layer 3 therebetween. It is glued.
【0013】ところが、上述した接着工程では、基板2
と支持台1とを衝合する段階で塗布した接着剤に空気が
混入し、接着層3の内部に気泡が形成されることがあ
り、接着層3内に熱伝導性の悪い気泡(空気等)が形成
されると、基板2と支持台1との間の熱伝導性が悪化す
るばかりでなく、放熱装置毎に熱伝導性にばらつきが生
じるという問題がある。However, in the above-mentioned bonding process, the substrate 2
Air may be mixed in the adhesive applied at the stage of abutting the support base 1 with the support base 1 to form air bubbles inside the adhesive layer 3, and air bubbles having poor thermal conductivity (air etc.) may be formed inside the adhesive layer 3. (3) is formed, there is a problem that not only the thermal conductivity between the substrate 2 and the support 1 is deteriorated but also the thermal conductivity varies among the heat dissipation devices.
【0014】さらに、半田層5,7の内部にも同様に気
泡が形成されることがあるため、従来技術では、トラン
ジスタ6,ヒートスプレッダ4,基板2および支持台1
の各衝合面間における熱伝導性が気泡等によって悪化
し、トランジスタ6からの熱が外部に放出されにくくな
り、トランジスタ6が通電中に高温となって破損した
り、熱で早期に劣化したりするという問題がある。Further, since bubbles may be similarly formed inside the solder layers 5 and 7, in the prior art, the transistor 6, the heat spreader 4, the substrate 2 and the support base 1 are used.
The thermal conductivity between the respective abutting surfaces of the transistor 6 is deteriorated by bubbles and the like, and the heat from the transistor 6 is less likely to be released to the outside, and the transistor 6 becomes hot during energization and is damaged, or is deteriorated early by heat. There is a problem that.
【0015】特に、支持台1が熱伝導性の低い樹脂材料
から形成されている場合には、トランジスタ6から支持
台1までの間に高い熱伝導性が要求されるため、気泡等
によってこの間の放熱性が妨げられると、トランジスタ
6が通電中にさらに高温になり易く、破損,劣化等の問
題を起こす可能性が高くなる。In particular, when the support base 1 is made of a resin material having a low thermal conductivity, a high thermal conductivity is required between the transistor 6 and the support base 1, so that air bubbles or the like cause a gap between them. If the heat dissipation property is hindered, the transistor 6 is likely to have a higher temperature during energization, and there is a high possibility of causing problems such as damage and deterioration.
【0016】また、放熱装置毎にトランジスタ6から支
持台1までの熱伝導性にばらつきがあるため、トランジ
スタ6の信頼性を確保するためには、設計段階でヒート
スプレッダ4の面積を大きく設計することによりトラン
ジスタ6から支持台1への放熱性能に余裕をもたせざる
を得ず、放熱装置全体の小型化が難しくなるという問題
がある。Further, since the heat conductivity from the transistor 6 to the support 1 varies depending on the heat dissipation device, in order to ensure the reliability of the transistor 6, the area of the heat spreader 4 should be designed large at the design stage. As a result, there is no choice but to have a margin for the heat radiation performance from the transistor 6 to the support 1, and it is difficult to reduce the size of the entire heat radiation device.
【0017】本発明は上述した従来技術の問題に鑑みな
されたもので、放熱装置毎に熱伝導性がばらつくことな
く発熱性素子からの熱を外部に確実に放熱できると共
に、基板上における放熱体の面積を小さくでき、全体を
小型化できるようにした発熱性素子の放熱装置を提供す
ることを目的としている。The present invention has been made in view of the above-mentioned problems of the prior art, and can surely radiate the heat from the heat-generating element to the outside without varying the thermal conductivity of each heat radiating device, and at the same time, dissipate the heat on the substrate. It is an object of the present invention to provide a heat-dissipating device heat-dissipating device capable of reducing the area and reducing the size of the entire device.
【0018】[0018]
【課題を解決するための手段】上述した課題を解決する
ために請求項1に記載の発明は、支持台に設けられた基
板と、該基板に設けられた熱伝導性材料からなる放熱体
と、該放熱体上に熱伝導可能に設けられ、外部からの通
電により熱を発生させる発熱性素子とからなる発熱性素
子の放熱装置において、前記放熱体は、前記基板と前記
発熱性素子との間に配設された熱伝導板と、基端側が該
熱伝導板に一体的に連結され、先端側が前記基板および
前記支持台を介して該支持台の外部に突出する放熱板と
から構成したことを特徴している。In order to solve the above-mentioned problems, the invention according to claim 1 is to provide a substrate provided on a support base, and a radiator made of a heat conductive material provided on the substrate. A heat-dissipating device for heat-generating elements, which is provided on the heat-dissipating body so that heat can be conducted, and which generates heat by energization from the outside, wherein the heat-dissipating body is composed of the substrate and the heat-generating element. The heat conducting plate is disposed between the heat conducting plate and the heat conducting plate, the base side of which is integrally connected to the heat conducting plate and the tip side of which is a heat radiating plate protruding to the outside of the support through the substrate and the support. It is characterized by
【0019】このように構成することにより、放熱体上
に設けた発熱性素子が通電中に発生させる熱を該放熱体
の熱伝導板から放熱板側へと伝導させ、該放熱板の先端
側から支持台の外部へと直接放熱できるから、発熱性素
子からの熱を基板,支持台等の熱伝導性に影響されるこ
となく外部に放熱でき、該発熱性素子が通電中に高温と
なるのを防止できる。According to this structure, the heat generated by the heat-generating element provided on the radiator is conducted from the heat conducting plate of the radiator to the radiator side, and the tip side of the radiator plate is conducted. The heat from the heat generating element can be radiated to the outside without being affected by the thermal conductivity of the substrate, the support, etc., since the heat can be directly radiated from the heat generating element to the outside of the supporting table, and the heat generating element becomes high temperature during energization. Can be prevented.
【0020】また、請求項2に記載の発明では、前記放
熱体を断面略コ字状に形成し、前記熱伝導板の両端側に
は前記放熱板をそれぞれ設ける構成としている。According to the second aspect of the invention, the radiator is formed in a substantially U-shaped cross section, and the radiator plates are provided on both ends of the heat conducting plate.
【0021】これにより、発熱性素子からの熱を熱伝導
板の両端側から各放熱板側へと効率よく伝導させること
ができ、この熱を該各放熱板の先端側から支持台の外部
へと広い放熱面積をもって放熱できる。With this, heat from the heat-generating element can be efficiently conducted from both ends of the heat conducting plate to each heat radiating plate side, and this heat is transmitted from the tip end side of each heat radiating plate to the outside of the support base. With a large heat dissipation area, it can dissipate heat.
【0022】そして、請求項3に記載の発明では、前記
発熱性素子は高電圧または高電流用のパワー系ベアチッ
プからなり、前記放熱体は該ベアチップからの熱を支持
台の外部に放熱させる構成としている。In the invention according to claim 3, the heat generating element is composed of a power system bare chip for high voltage or high current, and the radiator dissipates heat from the bare chip to the outside of the support base. I am trying.
【0023】この結果、パワー系ベアチップが通電中に
発生させる熱を放熱体の熱伝導板から放熱板側へと伝導
させ、該放熱板の先端側から支持台の外部に効率よく放
熱でき、該ベアチップの温度上昇を抑えることができ
る。As a result, the heat generated by the power bare chip during conduction is conducted from the heat conducting plate of the radiator to the radiator plate side, and the tip side of the radiator plate can be efficiently radiated to the outside of the support base. The temperature rise of the bare chip can be suppressed.
【0024】[0024]
【発明の実施の形態】以下、本発明の実施の形態を添付
図面に従い、ベアチップ型の電界効果トランジスタを発
熱性素子として用いた場合を例に挙げて詳細に説明す
る。なお、実施例では、従来技術と同一の構成要素に同
一の符号を付し、その説明を省略するものとする。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below in detail with reference to the accompanying drawings, taking as an example a case where a bare chip type field effect transistor is used as a heat generating element. In the embodiments, the same components as those in the related art are denoted by the same reference numerals, and description thereof will be omitted.
【0025】図中、21は本実施例による放熱装置の支
持台を示し、該支持台21は従来技術と同様に、例えば
アルミニウム,樹脂材料等から平板状に形成され、その
表面にはトランジスタ6等を搭載した従来技術と同様の
基板22が接着層23を介して固定されているものの、
本実施例では、後述するヒートシンク24の各放熱板2
8を挿通する挿通穴21A,21Aが支持台21に、挿
通穴22A,22Aが基板22に形成されている。In the figure, reference numeral 21 denotes a support base of the heat dissipation device according to this embodiment. The support base 21 is formed in a flat plate shape from, for example, aluminum or a resin material as in the prior art, and the transistor 6 is formed on the surface thereof. Although the substrate 22 similar to that of the related art, which is mounted with the like, is fixed via the adhesive layer 23,
In this embodiment, each heat radiating plate 2 of the heat sink 24 described later is used.
Insertion holes 21A and 21A for inserting the through holes 8 are formed in the support base 21, and insertion holes 22A and 22A are formed in the substrate 22.
【0026】ここで、各挿通穴21Aは図2に示すよう
に、互いに離間したスリット状の貫通穴として支持台2
1に形成されると共に、各挿通穴22Aは該各挿通穴2
1Aの位置に対応した貫通穴として基板22に形成され
ている。そして、基板22を支持台21上に固着した状
態では、各挿通穴21A,22Aが互いに連通し、これ
によって支持台21と基板22とには、基板22の表面
側と支持台21の裏面側(外側面)とを連通する一対の
貫通穴が形成される。Here, as shown in FIG. 2, each of the through holes 21A is a slit-shaped through hole which is separated from each other, and thus the support base 2 is provided.
1 is formed, and each insertion hole 22A is formed in each insertion hole 2
It is formed in the substrate 22 as a through hole corresponding to the position of 1A. When the substrate 22 is fixed on the support 21, the insertion holes 21A and 22A communicate with each other, whereby the support 21 and the substrate 22 have a front surface side of the substrate 22 and a rear surface side of the support 21. A pair of through holes communicating with the (outer side surface) is formed.
【0027】24は本実施例による放熱体としてのヒー
トシンクを示し、該ヒートシンク24は熱伝導性の高い
材料、例えば銅(Cu),モリブデン(Mo)等の金属
材料から断面コ字状に形成され、後述の熱伝導板25
と、該熱伝導板25の両端側に一体形成された後述の放
熱板28,28とから構成されている。Reference numeral 24 denotes a heat sink as a radiator according to the present embodiment. The heat sink 24 is made of a material having high thermal conductivity, for example, a metal material such as copper (Cu) or molybdenum (Mo) and has a U-shaped cross section. The heat conducting plate 25 described later
And heat radiating plates 28, 28 which will be described later and are integrally formed on both ends of the heat conducting plate 25.
【0028】25は熱伝導板を示し、該熱伝導板25は
従来技術によるヒートスプレッダ4と同様に、図2に示
す如く四角形状の平板として形成されているものの、本
実施例による熱伝導板25は、その外形寸法がヒートス
プレッダ4よりも小さく形成されている。そして、熱伝
導板25は半田層26を介して基板22上に固着され、
これによりヒートシンク24は基板22上に固定されて
いる。また、熱伝導板25上には図1に示すように、半
田層27を介してトランジスタ6が固着され、該トラン
ジスタ6の裏面側に形成されたドレイン10側端子は、
半田層27,熱伝導板25および半田層26を介して基
板22上に形成されたドレイン接続用の配線パターン
(図示せず)に接続されている。Reference numeral 25 denotes a heat conducting plate, which is formed as a rectangular flat plate as shown in FIG. 2 like the heat spreader 4 according to the prior art, but the heat conducting plate 25 according to the present embodiment. Has an outer dimension smaller than that of the heat spreader 4. Then, the heat conduction plate 25 is fixed onto the substrate 22 via the solder layer 26,
Thereby, the heat sink 24 is fixed on the substrate 22. Further, as shown in FIG. 1, the transistor 6 is fixed on the heat conduction plate 25 via the solder layer 27, and the drain 10 side terminal formed on the back surface side of the transistor 6 is
It is connected to a wiring pattern (not shown) for drain connection formed on the substrate 22 via the solder layer 27, the heat conduction plate 25, and the solder layer 26.
【0029】28,28は放熱板を示し、該各放熱板2
8は基端側が基板22上に固着された熱伝導板25の両
端側に一体形成され、図1に示す如く互いに平行となっ
て垂直方向下向きに伸長している。そして、各放熱板2
8の先端側28Aは、基板22の各挿通穴22Aおよび
支持台21の各挿通穴21Aに順次挿通されることによ
り、該支持台21の裏面側から外部に突出した状態で配
設されている。Reference numerals 28 and 28 denote heat radiating plates, and the respective heat radiating plates 2
Reference numerals 8 are integrally formed on both end sides of a heat conduction plate 25 having base ends fixed to the substrate 22, and extend vertically downward in parallel to each other as shown in FIG. And each heat sink 2
The front end side 28A of 8 is sequentially inserted into the respective insertion holes 22A of the substrate 22 and the respective insertion holes 21A of the support base 21 so as to be provided so as to project to the outside from the back surface side of the support base 21. .
【0030】29,30は例えばアルミニウム等の金属
材料からなるボンディングワイヤで、該ボンディングワ
イヤ29,30は従来技術と同様に、トランジスタ6の
ソース8,ゲート9と、基板22に形成された該ソース
8,ゲート9接続用の配線パターン(いずれも図示せ
ず)とを各アルミパッド31,32を介して接続してい
る。しかし、本実施例では、熱伝導板25の外形寸法が
ヒートスプレッダ4よりも小さく、アルミパッド31,
32間の接続距離が従来技術に比較して短くなっている
ため、ボンディングワイヤ29,30の中間部には比較
的小さなたるみが与えられている。29 and 30 are bonding wires made of a metal material such as aluminum. The bonding wires 29 and 30 are the source 8 and the gate 9 of the transistor 6 and the source formed on the substrate 22 as in the prior art. 8 and a wiring pattern for connecting the gate 9 (neither is shown) are connected via the aluminum pads 31 and 32. However, in the present embodiment, the outer dimensions of the heat conduction plate 25 are smaller than those of the heat spreader 4, and the aluminum pad 31,
Since the connection distance between the wires 32 is shorter than that of the conventional technique, a relatively small slack is given to the middle portions of the bonding wires 29 and 30.
【0031】本実施例による接続装置は上述の如き構成
を有するもので、その基本的動作については従来技術に
よるものと格別差異はない。The connecting device according to the present embodiment has the above-mentioned structure, and its basic operation is not different from that of the prior art.
【0032】然るに、本実施例では、トランジスタ6か
らの熱を外部に放熱するヒートシンク24を、トランジ
スタ6と基板22との間に配設された熱伝導板25と、
基端側が該熱伝導板25に一体形成され、先端側28A
が基板22,支持台21を貫通して外部に突出する一対
の放熱板28とから構成したから、トランジスタ6が通
電中に発生する熱を各放熱板28の先端側28Aから十
分な露出面積をもって外部に効率よく放熱でき、ヒート
シンク24によるトランジスタ6の放熱効率を従来技術
に比較して大幅に向上させることができる。Therefore, in this embodiment, the heat sink 24 for radiating the heat from the transistor 6 to the outside is provided with the heat conducting plate 25 disposed between the transistor 6 and the substrate 22.
The base end side is integrally formed with the heat conduction plate 25, and the tip end side 28A
Is composed of the substrate 22 and a pair of heat radiating plates 28 penetrating the support 21 and protruding to the outside. Therefore, the heat generated while the transistor 6 is energized has a sufficient exposed area from the tip side 28A of each heat radiating plate 28. The heat can be efficiently radiated to the outside, and the heat radiation efficiency of the transistor 6 by the heat sink 24 can be significantly improved as compared with the conventional technique.
【0033】従って、支持台21が例えば樹脂材料から
なる場合であっても、トランジスタ6が通電中に高熱と
なって破損したり、早期に劣化したりするのを確実に防
止でき、その安定した動作状態を長期間に亘って保持で
きると共に、トランジスタ6による電流等の制御装置と
しての信頼性を大幅に向上させることができる。Therefore, even when the support base 21 is made of, for example, a resin material, it is possible to reliably prevent the transistor 6 from being damaged due to high heat during energization or being deteriorated at an early stage. The operating state can be maintained for a long period of time, and the reliability of the control device for controlling the current by the transistor 6 can be greatly improved.
【0034】そして、トランジスタ6からの熱をヒート
シンク24の各放熱板28を介して外部に直接放熱でき
るから、ヒートシンク24の熱伝導板25と基板22と
の間や基板22と支持台21との間の熱伝導性等に影響
されることなく、トランジスタ6からの熱を支持台1の
外部に確実に放熱できると共に、トランジスタ6から支
持台1までの熱伝導性のばらつきを効果的に低減でき、
放熱装置としての信頼性を大幅に向上させることができ
る。Since the heat from the transistor 6 can be directly radiated to the outside through each heat radiating plate 28 of the heat sink 24, the heat conductive plate 25 and the substrate 22 of the heat sink 24 and the substrate 22 and the supporting base 21 are separated from each other. The heat from the transistor 6 can be surely radiated to the outside of the support 1 without being affected by the heat conductivity between them, and the variation in the heat conductivity from the transistor 6 to the support 1 can be effectively reduced. ,
The reliability of the heat dissipation device can be greatly improved.
【0035】また、ヒートシンク24の放熱効率を支持
台1の外部に露出した各放熱板28により向上できるか
ら、熱伝導板25の外形寸法を従来技術のヒートスプレ
ッダ4等の放熱部材よりも小さく形成でき、これによっ
てヒートシンク24(熱伝導板25)を基板22上に容
易に配設できると共に、当該放熱装置全体の大きさを確
実に小型化することができる。Further, since the heat dissipation efficiency of the heat sink 24 can be improved by the respective heat dissipation plates 28 exposed to the outside of the support base 1, the outer dimensions of the heat conduction plate 25 can be formed smaller than the heat dissipation members such as the heat spreader 4 of the prior art. As a result, the heat sink 24 (heat conduction plate 25) can be easily arranged on the substrate 22, and the size of the entire heat dissipation device can be surely reduced.
【0036】そして、熱伝導板25を小さく形成するこ
とにより、ボンディングワイヤ29,30によるトラン
ジスタ6側と基板22上の配線パターンとの接続距離を
短かくできるから、ボンディングワイヤ29,30が屈
曲等によりヒートシンク24と短絡(ショート)するの
を確実に防止でき、その信頼性を大幅に向上させること
ができる。By forming the heat conducting plate 25 small, the connection distance between the transistor 6 side and the wiring pattern on the substrate 22 by the bonding wires 29, 30 can be shortened, so that the bonding wires 29, 30 are bent. As a result, short circuit with the heat sink 24 can be reliably prevented, and the reliability thereof can be greatly improved.
【0037】さらに、ヒートシンク24のみを介して放
熱を行うことにより、トランジスタ6の放熱経路を簡素
化できるから、設計時に基板22,支持台21等の熱伝
導性を特別に考慮する必要がなくなり、当該放熱装置の
設計および製造管理を効率化することができる。Further, since the heat radiation path of the transistor 6 can be simplified by radiating the heat only through the heat sink 24, it is not necessary to specially consider the heat conductivity of the substrate 22, the support 21 and the like in the design. The design and manufacturing management of the heat dissipation device can be made efficient.
【0038】なお、前記実施例では、一対の放熱板28
を熱伝導板25の両端側に配設することにより、ヒート
シンク24を断面コ字状に形成したが、本発明はこれに
限らず、放熱板28等の放熱部をトランジスタ6と基板
22との間に配設した熱伝導板25から支持台1の外部
に突出させる構成とすればよい。従って、例えば1枚ま
たは3枚の放熱板と熱伝導板とからヒートシンク(放熱
体)を断面T字状または断面E字状に形成してもよく、
さらには4枚以上の放熱板や棒状の放熱部(放熱板)を
熱伝導板25に一体に設けることにより、放熱体を構成
してもよい。In the above embodiment, the pair of heat radiating plates 28 are used.
The heat sink 24 is formed in a U-shaped cross section by arranging the heat conducting plates 25 on both ends of the heat conducting plate 25. However, the present invention is not limited to this, and a heat radiating portion such as a heat radiating plate 28 may be provided between the transistor 6 and the substrate 22. The structure may be such that the heat conducting plate 25 arranged between them is projected to the outside of the support base 1. Therefore, for example, a heat sink (radiator) may be formed in a T-shape or E-shape in cross section from one or three heat dissipation plates and a heat conduction plate.
Further, the heat radiator may be configured by integrally providing four or more heat radiation plates or rod-shaped heat radiation portions (heat radiation plates) on the heat conduction plate 25.
【0039】また、前記実施例では、熱伝導板25と各
放熱板28とを一体形成する構成とした場合を例に挙げ
て述べたが、本発明はこれに限らず、熱伝導板25と各
放熱板28とを別部材から形成し、これらを一体的に連
結することによりヒートシンク24を構成してもよい。Further, in the above embodiment, the case where the heat conducting plate 25 and each heat radiating plate 28 are integrally formed is described, but the present invention is not limited to this, and the heat conducting plate 25 and The heat sink 24 may be configured by forming each heat dissipation plate 28 from a separate member and integrally connecting them.
【0040】一方、前記実施例では、トランジスタ6の
表面側にソース8側端子およびゲート9側端子を、裏面
側にドレイン10側端子を配設する構成としたが、本発
明はこれに限らず、例えばドレイン10側端子をトラン
ジスタ6の表面側に配設し、ソース8側の端子をトラン
ジスタ6の裏面側に配設する構成としてもよく、この場
合には、ドレイン10側端子をボンディングワイヤ29
等を介して基板22上の配線パターンに接続し、ソース
8側端子をヒートシンク24の熱伝導板25等を介して
基板22上の他の配線パターンに接続する構成とすれば
よい。On the other hand, in the above embodiment, the source 8 side terminal and the gate 9 side terminal are arranged on the front surface side of the transistor 6, and the drain 10 side terminal is arranged on the rear surface side, but the present invention is not limited to this. For example, the drain 10 side terminal may be arranged on the front surface side of the transistor 6, and the source 8 side terminal may be arranged on the back surface side of the transistor 6. In this case, the drain 10 side terminal is bonded to the bonding wire 29.
The source 8 side terminal may be connected to another wiring pattern on the substrate 22 via the heat conduction plate 25 of the heat sink 24 or the like.
【0041】さらに、前記実施例においては、発熱性素
子としてベアチップ型の電界効果トランジスタを用いた
場合を例に挙げて述べたが、本発明はこれに限らず、こ
れ以外のパワートランジスタ等に適用してもよく、さら
にはトランジスタ以外のパワー系電子素子、例えばサイ
リスタ,3端子レギュレータ等に適用してもよい。Further, in the above embodiment, the case where the bare chip type field effect transistor is used as the heat generating element has been described as an example, but the present invention is not limited to this, and is applied to other power transistors and the like. Alternatively, it may be applied to power electronic devices other than transistors, such as thyristors and three-terminal regulators.
【0042】さらにまた、前記実施例では、ヒートシン
ク24の熱伝導板25上に単一の発熱性素子(トランジ
スタ6)を配設した場合を例に挙げて述べたが、本発明
はこれに限らず、複数個の発熱性素子を熱伝導板25上
に配設した発熱性素子の放熱装置に適用してもよい。Furthermore, in the above embodiment, the case where a single heat generating element (transistor 6) is arranged on the heat conducting plate 25 of the heat sink 24 has been described as an example, but the present invention is not limited to this. Instead, it may be applied to a heat dissipation device for a heat generating element in which a plurality of heat generating elements are arranged on the heat conducting plate 25.
【0043】[0043]
【発明の効果】以上詳述した通り、請求項1に記載の発
明によれば、放熱体を、発熱性素子と基板との間に配設
された熱伝導板と、基端側が該熱伝導板に一体形成さ
れ、先端側が基板および支持台を介して該支持台の外部
に突出する放熱板とから構成したので、発熱性素子が通
電中に発生する熱を放熱板の先端側から外部に効率よく
放熱でき、発熱性素子が通電中に高熱となって破損した
り、早期に劣化したりするのを確実に防止できる。ま
た、発熱性素子からの熱を放熱板を介して支持台の外部
に直接放熱できるから、発熱性素子からの熱を基板,支
持台等の熱伝導性に影響されることなく確実に放熱でき
ると共に、発熱性素子から支持台までの熱伝導性のばら
つきを効果的に低減でき、放熱装置としての信頼性を大
幅に向上させることができる。As described above in detail, according to the first aspect of the invention, the heat radiator is provided with the heat conducting plate disposed between the heat generating element and the substrate, and the heat conduction plate is provided at the base end side. Since it is formed integrally with the plate, and the tip side is composed of the substrate and the heat radiating plate protruding to the outside of the support via the support, the heat generated while the heat-generating element is energized is transferred from the tip of the heat radiating plate to the outside. It is possible to efficiently dissipate heat, and it is possible to reliably prevent the heat generating element from becoming high in heat while being energized and being damaged, or from being deteriorated early. Further, the heat from the heat-generating element can be directly radiated to the outside of the support through the heat dissipation plate, so that the heat from the heat-generating element can be reliably radiated without being affected by the thermal conductivity of the substrate, the support or the like. At the same time, it is possible to effectively reduce the variation in the thermal conductivity from the heat-generating element to the support, and it is possible to significantly improve the reliability of the heat dissipation device.
【0044】また、請求項2に記載の発明によれば、放
熱体を熱伝導板と一対の放熱板とにより断面略コ字状に
形成したから、発熱性素子からの熱を熱伝導板の両端側
から各放熱板側へと効率よく伝導させることができると
共に、この熱を該各放熱板の先端側から支持台の外部へ
と広い放熱面積をもって確実に放熱でき、発熱性素子の
温度上昇を効果的に抑えることができる。Further, according to the second aspect of the invention, since the heat radiator is formed in a substantially U-shaped cross section by the heat conducting plate and the pair of heat radiating plates, the heat from the heat generating element is transferred to the heat conducting plate. The heat can be efficiently conducted from both ends to each heat dissipation plate side, and this heat can be reliably dissipated from the tip side of each heat dissipation plate to the outside of the support with a wide heat dissipation area, and the temperature rise of the heat generating element. Can be effectively suppressed.
【0045】そして、請求項3に記載の発明によれば、
発熱性素子をパワー系ベアチップから構成し、該ベアチ
ップからの熱を放熱体により外部に放熱する構成とした
から、該放熱体の放熱板によりベアチップが通電中に発
生する熱を支持台の外部に効果的に放熱することがで
き、ベアチップが通電中に温度上昇するのを確実に防止
することができる。According to the invention described in claim 3,
Since the heat-generating element is composed of the power bare chip and the heat from the bare chip is radiated to the outside by the radiator, the heat generated by the radiator plate of the radiator while the bare chip is energized is transferred to the outside of the support base. It is possible to effectively dissipate heat, and it is possible to reliably prevent the temperature of the bare chip from rising during energization.
【図1】本発明の実施例による電界効果トランジスタの
放熱装置を示す縦断面図である。FIG. 1 is a vertical cross-sectional view showing a heat dissipation device for a field effect transistor according to an embodiment of the present invention.
【図2】図1中の電界効果トランジスタの放熱装置を示
す平面図である。FIG. 2 is a plan view showing a heat dissipation device for the field effect transistor in FIG.
【図3】従来技術による電界効果トランジスタの放熱装
置を示す縦断面図である。FIG. 3 is a vertical cross-sectional view showing a heat dissipation device for a field effect transistor according to a conventional technique.
6 トランジスタ(発熱性素子) 8 ソース 9 ゲート 10 ドレイン 21 支持台 22 基板 24 ヒートシンク(放熱体) 25 熱伝導板 28 放熱板 6 Transistor (Exothermic Element) 8 Source 9 Gate 10 Drain 21 Support 22 Substrate 24 Heat Sink (Heat Radiator) 25 Heat Conduction Plate 28 Heat Radiation Plate
Claims (3)
けられた熱伝導性材料からなる放熱体と、該放熱体上に
熱伝導可能に設けられ、外部からの通電により熱を発生
させる発熱性素子とからなる発熱性素子の放熱装置にお
いて、 前記放熱体は、前記基板と前記発熱性素子との間に配設
された熱伝導板と、基端側が該熱伝導板に一体的に連結
され、先端側が前記基板および前記支持台を介して該支
持台の外部に突出する放熱板とから構成したことを特徴
とする発熱性素子の放熱装置。1. A substrate provided on a support, a heat radiator made of a heat conductive material provided on the substrate, and heat radiator provided on the heat radiator so as to generate heat by energization from the outside. In the heat dissipation device for a heat-generating element including a heat-generating element, the heat-dissipating body includes a heat-conducting plate disposed between the substrate and the heat-generating element, and a base end side of the heat-conducting plate is integrated with the heat-conducting plate. A heat dissipation device for a heat-generating element, characterized in that the heat dissipation element is connected to the front end side of the substrate and the heat dissipation plate protruding to the outside of the support base through the support base.
記熱伝導板の両端側には前記放熱板をそれぞれ設ける構
成としてなる請求項1に記載の発熱性素子の放熱装置。2. The heat dissipating device for a heat-generating element according to claim 1, wherein the heat dissipating member is formed in a substantially U-shaped cross section, and the heat dissipating plates are respectively provided on both ends of the heat conducting plate.
のパワー系ベアチップからなり、前記放熱体は該ベアチ
ップからの熱を前記支持台の外部に放熱させる構成とし
てなる請求項1または2に記載の発熱性素子の放熱装
置。3. The heat-generating element comprises a power system bare chip for high voltage or high current, and the radiator dissipates heat from the bare chip to the outside of the support base. A heat dissipation device for the heat-generating element described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7348714A JPH09172112A (en) | 1995-12-19 | 1995-12-19 | Heat dissipation device for heat generating element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7348714A JPH09172112A (en) | 1995-12-19 | 1995-12-19 | Heat dissipation device for heat generating element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09172112A true JPH09172112A (en) | 1997-06-30 |
Family
ID=18398879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7348714A Pending JPH09172112A (en) | 1995-12-19 | 1995-12-19 | Heat dissipation device for heat generating element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09172112A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003031742A (en) * | 2001-07-16 | 2003-01-31 | Rohm Co Ltd | Chip array module |
| US7746659B2 (en) | 2007-03-13 | 2010-06-29 | Seiko Epson Corporation | Electro-optical device and electronic apparatus |
| WO2018051499A1 (en) * | 2016-09-16 | 2018-03-22 | 三菱電機株式会社 | Refrigeration cycle device |
-
1995
- 1995-12-19 JP JP7348714A patent/JPH09172112A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003031742A (en) * | 2001-07-16 | 2003-01-31 | Rohm Co Ltd | Chip array module |
| US7746659B2 (en) | 2007-03-13 | 2010-06-29 | Seiko Epson Corporation | Electro-optical device and electronic apparatus |
| WO2018051499A1 (en) * | 2016-09-16 | 2018-03-22 | 三菱電機株式会社 | Refrigeration cycle device |
| JPWO2018051499A1 (en) * | 2016-09-16 | 2019-06-24 | 三菱電機株式会社 | Refrigeration cycle device |
| US11112130B2 (en) | 2016-09-16 | 2021-09-07 | Mitsubishi Electric Corporation | Refrigeration cycle apparatus |
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