JPH09186432A - Production of printed wiring board - Google Patents
Production of printed wiring boardInfo
- Publication number
- JPH09186432A JPH09186432A JP35314395A JP35314395A JPH09186432A JP H09186432 A JPH09186432 A JP H09186432A JP 35314395 A JP35314395 A JP 35314395A JP 35314395 A JP35314395 A JP 35314395A JP H09186432 A JPH09186432 A JP H09186432A
- Authority
- JP
- Japan
- Prior art keywords
- resin layer
- conductor
- insulating resin
- plating
- roughened
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はプリント配線板の製
造方法に関する。TECHNICAL FIELD The present invention relates to a method for manufacturing a printed wiring board.
【0002】[0002]
【従来の技術】従来、プリント配線板は一般的にサブト
ラクティブ法により製造している。この製造方法は、銅
張り絶縁基板を用い、表面に無電解めっきと電解めっき
を形成するとともにスルーホールめっきを形成し、その
後、導体回路以外の部分の銅をエッチングによって除去
して導体回路を形成する。そしてこの製造方法は、銅張
り絶縁基板を用いているため、回路と絶縁基板との密着
強度を確保するために特別な処理を必要とせず、また回
路は銅箔表面に電解めっきを設けているため信頼性が高
い長所がある。また、他の製造方法として、銅張りをし
ていない接着剤層を設けた絶縁基板を用い、無電解めっ
き処理をして導体回路を形成するアディティブ法があ
る。この製造方法は、必要な部分だけに無電解銅めっき
処理をして回路を形成すればよいため、製造工程が短く
なる。2. Description of the Related Art Conventionally, a printed wiring board is generally manufactured by a subtractive method. This manufacturing method uses a copper-clad insulating substrate, forms electroless plating and electrolytic plating on the surface, forms through-hole plating, and then forms a conductor circuit by etching away copper other than the conductor circuit. To do. Since this manufacturing method uses the copper-clad insulating substrate, no special treatment is required to secure the adhesion strength between the circuit and the insulating substrate, and the circuit is provided with electrolytic plating on the copper foil surface. Therefore, it has the advantage of being highly reliable. Further, as another manufacturing method, there is an additive method in which an insulating substrate provided with an adhesive layer without copper plating is used and electroless plating is performed to form a conductor circuit. In this manufacturing method, the circuit can be formed by performing electroless copper plating treatment only on the necessary portions, and therefore the manufacturing process is shortened.
【0003】[0003]
【発明が解決しようとする課題】しかし、前者のサブト
ラクティブ法では、回路以外の不要な銅を除去しなけれ
ばならず、エッチング処理が必要で、製造工程が多くな
る欠点がある。また、後者のアディティブ法では、特殊
な接着剤層を設けた、めっき触媒入りの絶縁基板を用い
なければならず、材料コストが高い欠点がある。However, the former subtractive method has a drawback that unnecessary copper other than the circuit must be removed, etching is required, and the number of manufacturing steps is increased. In the latter additive method, an insulating substrate containing a special adhesive layer and containing a plating catalyst must be used, which has a drawback of high material cost.
【0004】本発明は、以上の欠点を改良し、製造工程
が短く、容易にかつ安価に製造できるプリント配線板の
製造方法を提供することを課題とするものである。SUMMARY OF THE INVENTION An object of the present invention is to provide a method for manufacturing a printed wiring board, which improves the above drawbacks, has a short manufacturing process, and can be manufactured easily and inexpensively.
【0005】[0005]
【課題を解決するための手段】本発明は、絶縁基板の表
面に紫外線硬化型の絶縁樹脂層を形成する工程と、この
工程後に導体を形成する以外の部分に紫外線を照射して
前記の絶縁樹脂層を硬化する工程と、この工程後にこの
絶縁樹脂層の前記導体を形成する部分のみを粗面化する
工程と、この工程後に前記絶縁樹脂層の粗面化部分にめ
っき触媒を付着する工程と、この工程後に無電解めっき
処理をして前記導体を形成する工程とを行なうことを特
徴とするプリント配線板の製造方法である。According to the present invention, there is provided a step of forming an ultraviolet curing type insulating resin layer on a surface of an insulating substrate, and irradiating an ultraviolet ray to a portion other than a conductor to be formed after this step to irradiate the insulating layer. A step of curing the resin layer, a step of roughening only the portion of the insulating resin layer on which the conductor is formed after this step, and a step of attaching a plating catalyst to the roughened portion of the insulating resin layer after this step And a step of forming the conductor by performing electroless plating after this step.
【0006】本発明によれば、銅張り絶縁基板を用いる
ことなく、回路状の導体を形成でき、エッチング処理や
それに付随する処理を必要とせず、製造が比較的容易に
なり、製造コストを低減できる。また、フルアディティ
ブ法に特有な絶縁基板を用いる必要がなく、一般的に用
いられている積層板をベースの絶縁基板に用いることが
でき、比較的安価なプリント配線板が得られる。According to the present invention, a circuit-shaped conductor can be formed without using a copper-clad insulating substrate, and an etching process and a process associated therewith are not required, and the manufacturing is relatively easy and the manufacturing cost is reduced. it can. Further, it is not necessary to use an insulating substrate peculiar to the full additive method, and a commonly used laminated board can be used as a base insulating substrate, and a relatively inexpensive printed wiring board can be obtained.
【0007】[0007]
【発明の実施の形態】本発明の絶縁基板としては、紙エ
ポキシ樹脂積層板や、紙フェノール樹脂積層板、ガラス
エポキシ樹脂積層板等を用いる。そしてこの絶縁基板の
表面に、カーテンコート法等によって紫外線硬化型の、
エポキシ樹脂やニトリルブタジェンゴム等を成分とする
絶縁樹脂を塗布して絶縁樹脂層を形成する。次に、この
絶縁樹脂層の表面に、導体の逆パターンネガフィルムを
当ててマスクとし、紫外線を照射する。紫外線を照射
後、粗化液を用いて絶縁樹脂層を粗化する。この際、紫
外線を照射した絶縁樹脂層の部分は硬化していて粗化さ
れず、マスクをして紫外線を照射しなかった未硬化の部
分が粗化される。粗化後、めっき触媒処理液を用いて絶
縁樹脂層の表面にめっき触媒を付着する。なお、めっき
触媒は、絶縁樹脂層の粗化されていない平滑な面には付
着することなく、粗化された面に引っ掛り付着する。め
っき触媒と付着後、硫酸銅やEDTA等を組成とする無
電解銅めっき液を用いて無電解銅めっき処理をして、め
っき触媒を付着した絶縁樹脂層の粗化面に銅めっきを析
出して導体を形成する。BEST MODE FOR CARRYING OUT THE INVENTION As the insulating substrate of the present invention, a paper epoxy resin laminated plate, a paper phenol resin laminated plate, a glass epoxy resin laminated plate or the like is used. Then, on the surface of this insulating substrate, an ultraviolet curable type, such as a curtain coat method,
An insulating resin containing epoxy resin or nitrile butadiene rubber as a component is applied to form an insulating resin layer. Then, a negative film having a reverse pattern of a conductor is applied to the surface of this insulating resin layer to form a mask, which is then irradiated with ultraviolet rays. After irradiation with ultraviolet rays, the insulating resin layer is roughened using a roughening liquid. At this time, the portion of the insulating resin layer irradiated with ultraviolet rays is hardened and is not roughened, and the uncured portion which has been masked and is not irradiated with ultraviolet rays is roughened. After roughening, a plating catalyst is applied to the surface of the insulating resin layer using a plating catalyst treatment liquid. Note that the plating catalyst does not adhere to the smooth surface of the insulating resin layer that is not roughened, but catches and adheres to the roughened surface. After adhering to the plating catalyst, electroless copper plating is performed using an electroless copper plating solution having a composition such as copper sulfate or EDTA to deposit copper plating on the roughened surface of the insulating resin layer to which the plating catalyst is attached. To form a conductor.
【0008】[0008]
【実施例】以下、本発明の実施例を図面に基づいて説明
する。図1(イ)において、1は、絶縁基板であり、ガ
ラスエポキシ樹脂積層板E−67(日立化成工業株式会
社製商品名)を用いる。Embodiments of the present invention will be described below with reference to the drawings. In FIG. 1A, 1 is an insulating substrate, and a glass epoxy resin laminated plate E-67 (trade name, manufactured by Hitachi Chemical Co., Ltd.) is used.
【0009】そして、図1(ロ)に示す通り、この絶縁
基板1の両面に、紫外線硬化型の絶縁樹脂をカーテンコ
ート法によって塗布して、絶縁樹脂層2を形成する。こ
の紫外線硬化型の絶縁樹脂層2は、アクリル変性エポキ
シ樹脂50wt%と、ニトリルブタジェンゴム35wt%、
炭酸カルシウム10wt%、イミダゾール系硬化剤5wt%
とからなる。Then, as shown in FIG. 1B, an ultraviolet curable insulating resin is applied to both surfaces of the insulating substrate 1 by a curtain coating method to form an insulating resin layer 2. This UV-curable insulating resin layer 2 is composed of acrylic modified epoxy resin 50 wt%, nitrile butadiene rubber 35 wt%,
Calcium carbonate 10 wt%, imidazole-based curing agent 5 wt%
Consists of
【0010】次に、温度80℃で30分間乾燥した後、
図1(ハ)に示す通り、導体の逆パターンネガフィルム
をマスク3として、絶縁樹脂層2の表面に当て、超高圧
水銀灯を有する露光機を用い、1J/cm2 の光量で紫外
線4を絶縁樹脂層2に照射する。Next, after drying at a temperature of 80 ° C. for 30 minutes,
As shown in FIG. 1C, the negative film of the reverse pattern of the conductor is used as the mask 3 and is applied to the surface of the insulating resin layer 2, and an ultraviolet ray 4 is insulated with a light amount of 1 J / cm 2 by using an exposure device having an ultrahigh pressure mercury lamp. The resin layer 2 is irradiated.
【0011】紫外線4を照射後、絶縁基板1を膨潤用液
OPC−1050(奥野製薬工業株式会社製商品名)、
粗化液OPC−1200(奥野製薬工業株式会社商品
名)、中和液OPC−1300(奥野製薬工業株式会社
製商品名)に順次浸漬して、絶縁樹脂2の表面を粗化す
る。この際、図1(ニ)に示す通り、絶縁樹脂層2の紫
外線を照射した部分は粗化されず、マスク3によって照
射されなかった部分だけが粗化される。After irradiating with ultraviolet rays 4, the insulating substrate 1 is swelled with a liquid OPC-1050 (trade name of Okuno Pharmaceutical Co., Ltd.),
The surface of the insulating resin 2 is roughened by sequentially immersing it in a roughening solution OPC-1200 (trade name of Okuno Pharmaceutical Industry Co., Ltd.) and a neutralizing solution OPC-1300 (trade name of Okuno Pharmaceutical Industry Co., Ltd.). At this time, as shown in FIG. 1D, the portion of the insulating resin layer 2 which is irradiated with ultraviolet rays is not roughened, and only the portion which is not irradiated by the mask 3 is roughened.
【0012】粗化処理後、絶縁基板1を無電解めっき用
の触媒処理液HS−201B(日立化成工業株式会社製
商品名)6ml/l の濃度の液中に5分間浸漬し、めっき
触媒を付着する。この際、めっき触媒5は、図1(ホ)
に示す通り、絶縁樹脂層2の粗化面6のみに付着し、平
滑な面7には付着しない。After the roughening treatment, the insulating substrate 1 was immersed in a catalyst treatment liquid HS-201B (trade name of Hitachi Chemical Co., Ltd.) having a concentration of 6 ml / l for 5 minutes for electroless plating to give a plating catalyst. Adhere to. At this time, the plating catalyst 5 is as shown in FIG.
As shown in (3), it adheres only to the roughened surface 6 of the insulating resin layer 2 and does not adhere to the smooth surface 7.
【0013】めっき触媒を付着後、絶縁基板1を温度7
0℃の無電解銅めっき液中に浸漬し、図1(ヘ)に示す
通り、粗化面6に銅めっきを析出し導体8を形成し、プ
リント配線板9とする。なお、無電解銅めっき液の組成
は、硫酸銅・五水和物0.04mol/lと、水酸化ナトリ
ウム0.05mol/l、37%ホルムアルデヒド水溶液
0.04mol/l、エチレンジアミン四酢酸0.15mol
/l、α、α’−ジピリジル30mg/l、ポリエチレング
リコール(分子量1000)1g/lとからなる。After depositing the plating catalyst, the insulating substrate 1 is heated to a temperature of 7
The printed wiring board 9 is formed by immersing in an electroless copper plating solution at 0 ° C., depositing copper plating on the roughened surface 6 to form a conductor 8 as shown in FIG. The composition of the electroless copper plating solution was copper sulfate pentahydrate 0.04 mol / l, sodium hydroxide 0.05 mol / l, 37% formaldehyde aqueous solution 0.04 mol / l, ethylenediaminetetraacetic acid 0.15 mol.
/ L, α, α'-dipyridyl 30 mg / l, and polyethylene glycol (molecular weight 1000) 1 g / l.
【0014】[0014]
【発明の効果】以上の通り、本発明の製造方法によれ
ば、絶縁基板の表面に紫外線硬化型の絶縁樹脂層を形成
し、導体を形成する以外の部分を紫外線硬化し、この部
分を粗化し、めっき触媒を付着し、無電解めっき処理に
より導体を形成しているため、容易に製造でき安価なプ
リント配線板が得られる。As described above, according to the manufacturing method of the present invention, an ultraviolet-curing type insulating resin layer is formed on the surface of an insulating substrate, and a portion other than a conductor is ultraviolet-cured, and this portion is roughened. Since a conductor is formed by electroplating, applying a plating catalyst, and forming a conductor by electroless plating, an inexpensive printed wiring board can be easily manufactured.
【図1】本発明の実施例の製造工程の図を示す。FIG. 1 is a diagram showing a manufacturing process according to an embodiment of the present invention.
1…絶縁基板、 2…絶縁樹脂層、 4…紫外線、 5
…めっき触媒、6…粗化面、 8…導体、 9…プリン
ト配線板。1 ... Insulating substrate, 2 ... Insulating resin layer, 4 ... Ultraviolet ray, 5
... plating catalyst, 6 ... roughened surface, 8 ... conductor, 9 ... printed wiring board.
Claims (1)
脂層を形成する工程と、この工程後に導体を形成する以
外の部分に紫外線を照射して前記の絶縁樹脂層を硬化す
る工程と、この工程後にこの絶縁樹脂層の前記導体を形
成する部分のみを粗面化する工程と、この工程後に前記
絶縁樹脂層の粗面化部分にめっき触媒を付着する工程
と、この工程後に無電解めっき処理をして前記導体を形
成する工程とを行なうことを特徴とするプリント配線板
の製造方法。1. A step of forming an ultraviolet curable insulating resin layer on the surface of an insulating substrate, and a step of irradiating the portion other than the conductor to be formed with ultraviolet rays after this step to cure the insulating resin layer. After this step, a step of roughening only the portion of the insulating resin layer on which the conductor is formed, a step of attaching a plating catalyst to the roughened portion of the insulating resin layer after this step, and an electroless plating after this step And a step of forming the conductor by processing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35314395A JPH09186432A (en) | 1995-12-28 | 1995-12-28 | Production of printed wiring board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35314395A JPH09186432A (en) | 1995-12-28 | 1995-12-28 | Production of printed wiring board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09186432A true JPH09186432A (en) | 1997-07-15 |
Family
ID=18428853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP35314395A Pending JPH09186432A (en) | 1995-12-28 | 1995-12-28 | Production of printed wiring board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09186432A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015020332A1 (en) * | 2013-08-09 | 2015-02-12 | 주식회사 엘지화학 | Method of forming conductive pattern through direct irradiation of electromagnetic waves, and resin structure having conductive pattern |
-
1995
- 1995-12-28 JP JP35314395A patent/JPH09186432A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015020332A1 (en) * | 2013-08-09 | 2015-02-12 | 주식회사 엘지화학 | Method of forming conductive pattern through direct irradiation of electromagnetic waves, and resin structure having conductive pattern |
| US10344385B2 (en) | 2013-08-09 | 2019-07-09 | Lg Chem, Ltd. | Method for forming conductive pattern by direct radiation of electromagnetic wave, and resin structure having conductive pattern thereon |
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