JPH09194485A - Production of alkynylsilanes - Google Patents
Production of alkynylsilanesInfo
- Publication number
- JPH09194485A JPH09194485A JP8005349A JP534996A JPH09194485A JP H09194485 A JPH09194485 A JP H09194485A JP 8005349 A JP8005349 A JP 8005349A JP 534996 A JP534996 A JP 534996A JP H09194485 A JPH09194485 A JP H09194485A
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- general formula
- represented
- following general
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 22
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 20
- 125000003118 aryl group Chemical group 0.000 claims abstract description 17
- 125000000304 alkynyl group Chemical group 0.000 claims abstract description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 15
- 239000001257 hydrogen Substances 0.000 claims abstract description 15
- 125000002252 acyl group Chemical group 0.000 claims abstract description 9
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 8
- 125000000753 cycloalkyl group Chemical group 0.000 claims abstract description 7
- -1 acetylene hydrogen Chemical compound 0.000 claims description 51
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 9
- 239000010949 copper Substances 0.000 claims description 9
- 125000005843 halogen group Chemical group 0.000 claims description 8
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 4
- 125000005647 linker group Chemical group 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000011701 zinc Substances 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 125000000962 organic group Chemical group 0.000 claims description 3
- 150000003003 phosphines Chemical class 0.000 claims description 3
- 150000003512 tertiary amines Chemical class 0.000 claims description 3
- 150000003751 zinc Chemical class 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 abstract description 28
- GCQOYXAQVJNPQI-UHFFFAOYSA-N copper;ethynylbenzene Chemical compound [Cu]C#CC1=CC=CC=C1 GCQOYXAQVJNPQI-UHFFFAOYSA-N 0.000 abstract description 9
- UZIXCCMXZQWTPB-UHFFFAOYSA-N trimethyl(2-phenylethynyl)silane Chemical compound C[Si](C)(C)C#CC1=CC=CC=C1 UZIXCCMXZQWTPB-UHFFFAOYSA-N 0.000 abstract description 7
- 239000003795 chemical substances by application Substances 0.000 abstract description 6
- 125000006239 protecting group Chemical group 0.000 abstract description 4
- 229910052736 halogen Inorganic materials 0.000 abstract description 2
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 abstract description 2
- 239000000376 reactant Substances 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 150000002367 halogens Chemical group 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 42
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 36
- 239000002904 solvent Substances 0.000 description 14
- 238000004440 column chromatography Methods 0.000 description 12
- 239000012043 crude product Substances 0.000 description 12
- 239000002198 insoluble material Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- 238000005160 1H NMR spectroscopy Methods 0.000 description 9
- UEXCJVNBTNXOEH-UHFFFAOYSA-N Ethynylbenzene Chemical compound C#CC1=CC=CC=C1 UEXCJVNBTNXOEH-UHFFFAOYSA-N 0.000 description 6
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 6
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 description 4
- CSRZQMIRAZTJOY-UHFFFAOYSA-N trimethylsilyl iodide Chemical compound C[Si](C)(C)I CSRZQMIRAZTJOY-UHFFFAOYSA-N 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- KWYZNESIGBQHJK-UHFFFAOYSA-N chloro-dimethyl-phenylsilane Chemical compound C[Si](C)(Cl)C1=CC=CC=C1 KWYZNESIGBQHJK-UHFFFAOYSA-N 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 125000005677 ethinylene group Chemical group [*:2]C#C[*:1] 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 238000007086 side reaction Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- IBXNCJKFFQIKKY-UHFFFAOYSA-N 1-pentyne Chemical compound CCCC#C IBXNCJKFFQIKKY-UHFFFAOYSA-N 0.000 description 2
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- GOXRDDRCTHHZKR-UHFFFAOYSA-N C1=CC=C(C=C1)C#C[Si](C#CC2=CC=CC=C2)(C#CC3=CC=CC=C3)Cl Chemical compound C1=CC=C(C=C1)C#C[Si](C#CC2=CC=CC=C2)(C#CC3=CC=CC=C3)Cl GOXRDDRCTHHZKR-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- IYYIVELXUANFED-UHFFFAOYSA-N bromo(trimethyl)silane Chemical compound C[Si](C)(C)Br IYYIVELXUANFED-UHFFFAOYSA-N 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- MNKYQPOFRKPUAE-UHFFFAOYSA-N chloro(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(Cl)C1=CC=CC=C1 MNKYQPOFRKPUAE-UHFFFAOYSA-N 0.000 description 2
- ACTAPAGNZPZLEF-UHFFFAOYSA-N chloro(tripropyl)silane Chemical compound CCC[Si](Cl)(CCC)CCC ACTAPAGNZPZLEF-UHFFFAOYSA-N 0.000 description 2
- DMEXFOUCEOWRGD-UHFFFAOYSA-N chloro-[chloro(dimethyl)silyl]oxy-dimethylsilane Chemical compound C[Si](C)(Cl)O[Si](C)(C)Cl DMEXFOUCEOWRGD-UHFFFAOYSA-N 0.000 description 2
- NKKOOWNXYNKEER-UHFFFAOYSA-N chloro-dimethyl-pyridin-2-ylsilane Chemical compound C[Si](C)(Cl)c1ccccn1 NKKOOWNXYNKEER-UHFFFAOYSA-N 0.000 description 2
- GVPNBWPLCHOFMX-UHFFFAOYSA-N chloro-methyl-phenylsilane Chemical compound C[SiH](Cl)C1=CC=CC=C1 GVPNBWPLCHOFMX-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 125000004957 naphthylene group Chemical group 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 238000010189 synthetic method Methods 0.000 description 2
- BCNZYOJHNLTNEZ-UHFFFAOYSA-N tert-butyldimethylsilyl chloride Chemical compound CC(C)(C)[Si](C)(C)Cl BCNZYOJHNLTNEZ-UHFFFAOYSA-N 0.000 description 2
- MZHROOGPARRVHS-UHFFFAOYSA-N triacetylene Natural products C#CC#CC#C MZHROOGPARRVHS-UHFFFAOYSA-N 0.000 description 2
- JSQJUDVTRRCSRU-UHFFFAOYSA-N tributyl(chloro)silane Chemical compound CCCC[Si](Cl)(CCCC)CCCC JSQJUDVTRRCSRU-UHFFFAOYSA-N 0.000 description 2
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 2
- VNDYJBBGRKZCSX-UHFFFAOYSA-L zinc bromide Chemical compound Br[Zn]Br VNDYJBBGRKZCSX-UHFFFAOYSA-L 0.000 description 2
- 235000005074 zinc chloride Nutrition 0.000 description 2
- 239000011592 zinc chloride Substances 0.000 description 2
- UAYWVJHJZHQCIE-UHFFFAOYSA-L zinc iodide Chemical compound I[Zn]I UAYWVJHJZHQCIE-UHFFFAOYSA-L 0.000 description 2
- STFWYFQCNSNCOA-VAWYXSNFSA-N (e)-pentadec-4-enoic acid Chemical compound CCCCCCCCCC\C=C\CCC(O)=O STFWYFQCNSNCOA-VAWYXSNFSA-N 0.000 description 1
- CBYDUPRWILCUIC-UHFFFAOYSA-N 1,2-diethynylbenzene Chemical compound C#CC1=CC=CC=C1C#C CBYDUPRWILCUIC-UHFFFAOYSA-N 0.000 description 1
- PNXLPYYXCOXPBM-UHFFFAOYSA-N 1,3-diethynylbenzene Chemical compound C#CC1=CC=CC(C#C)=C1 PNXLPYYXCOXPBM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- MVLGANVFCMOJHR-UHFFFAOYSA-N 1,4-diethynylbenzene Chemical compound C#CC1=CC=C(C#C)C=C1 MVLGANVFCMOJHR-UHFFFAOYSA-N 0.000 description 1
- SQRXPIFWONPVFF-UHFFFAOYSA-N 1,4-diethynylnaphthalene Chemical compound C1=CC=C2C(C#C)=CC=C(C#C)C2=C1 SQRXPIFWONPVFF-UHFFFAOYSA-N 0.000 description 1
- UGTMUSVIKUIPCM-UHFFFAOYSA-N 1,5-diethynylnaphthalene Chemical compound C1=CC=C2C(C#C)=CC=CC2=C1C#C UGTMUSVIKUIPCM-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000004972 1-butynyl group Chemical group [H]C([H])([H])C([H])([H])C#C* 0.000 description 1
- LFZJRTMTKGYJRS-UHFFFAOYSA-N 1-chloro-4-ethynylbenzene Chemical compound ClC1=CC=C(C#C)C=C1 LFZJRTMTKGYJRS-UHFFFAOYSA-N 0.000 description 1
- IYSVFZBXZVPIFA-UHFFFAOYSA-N 1-ethenyl-4-(4-ethenylphenyl)benzene Chemical group C1=CC(C=C)=CC=C1C1=CC=C(C=C)C=C1 IYSVFZBXZVPIFA-UHFFFAOYSA-N 0.000 description 1
- RPFOPSZCGONCJA-UHFFFAOYSA-N 1-ethenyl-4-(4-ethenylphenyl)sulfanylbenzene Chemical compound C1=CC(C=C)=CC=C1SC1=CC=C(C=C)C=C1 RPFOPSZCGONCJA-UHFFFAOYSA-N 0.000 description 1
- RENYIDZOAFFNHC-UHFFFAOYSA-N 1-ethynyl-3-methylbenzene Chemical compound CC1=CC=CC(C#C)=C1 RENYIDZOAFFNHC-UHFFFAOYSA-N 0.000 description 1
- DKFHWNGVMWFBJE-UHFFFAOYSA-N 1-ethynylcyclohexene Chemical compound C#CC1=CCCCC1 DKFHWNGVMWFBJE-UHFFFAOYSA-N 0.000 description 1
- 125000006039 1-hexenyl group Chemical group 0.000 description 1
- CGHIBGNXEGJPQZ-UHFFFAOYSA-N 1-hexyne Chemical compound CCCCC#C CGHIBGNXEGJPQZ-UHFFFAOYSA-N 0.000 description 1
- 125000006023 1-pentenyl group Chemical group 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- 125000000530 1-propynyl group Chemical group [H]C([H])([H])C#C* 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- 125000000069 2-butynyl group Chemical group [H]C([H])([H])C#CC([H])([H])* 0.000 description 1
- PKZCRWFNSBIBEW-UHFFFAOYSA-N 2-n,2-n,2-trimethylpropane-1,2-diamine Chemical compound CN(C)C(C)(C)CN PKZCRWFNSBIBEW-UHFFFAOYSA-N 0.000 description 1
- 125000006024 2-pentenyl group Chemical group 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- PPWNCLVNXGCGAF-UHFFFAOYSA-N 3,3-dimethylbut-1-yne Chemical compound CC(C)(C)C#C PPWNCLVNXGCGAF-UHFFFAOYSA-N 0.000 description 1
- 125000006041 3-hexenyl group Chemical group 0.000 description 1
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 1
- RCYIWFITYHZCIW-UHFFFAOYSA-N 4-methoxybut-1-yne Chemical compound COCCC#C RCYIWFITYHZCIW-UHFFFAOYSA-N 0.000 description 1
- UXFIKVWAAMKFQE-UHFFFAOYSA-N 5-chloropent-1-yne Chemical compound ClCCCC#C UXFIKVWAAMKFQE-UHFFFAOYSA-N 0.000 description 1
- UPVHIBLXQNNITH-UHFFFAOYSA-N 5-chloropent-1-ynyl(trimethyl)silane Chemical compound C[Si](C)(C)C#CCCCCl UPVHIBLXQNNITH-UHFFFAOYSA-N 0.000 description 1
- 125000006043 5-hexenyl group Chemical group 0.000 description 1
- CRMRQTCAVPBVDQ-UHFFFAOYSA-N C(#C)C1=CC=CC2=CC(=CC=C12)C#C Chemical compound C(#C)C1=CC=CC2=CC(=CC=C12)C#C CRMRQTCAVPBVDQ-UHFFFAOYSA-N 0.000 description 1
- YNBQLJQHPVQZQQ-UHFFFAOYSA-N C1=CC=C(C=C1)C#C[Si](C#CC2=CC=CC=C2)([Si](C#CC3=CC=CC=C3)(C#CC4=CC=CC=C4)Cl)Cl Chemical compound C1=CC=C(C=C1)C#C[Si](C#CC2=CC=CC=C2)([Si](C#CC3=CC=CC=C3)(C#CC4=CC=CC=C4)Cl)Cl YNBQLJQHPVQZQQ-UHFFFAOYSA-N 0.000 description 1
- HXVLDAGKZUCJGH-UHFFFAOYSA-N C[Si](C)(C1=CC2=C(C=C1)C=C(C=C2)[Si](C)(C)Cl)Cl Chemical compound C[Si](C)(C1=CC2=C(C=C1)C=C(C=C2)[Si](C)(C)Cl)Cl HXVLDAGKZUCJGH-UHFFFAOYSA-N 0.000 description 1
- IKECPKGOIPUZSJ-UHFFFAOYSA-N ClCCCC#C[Cu] Chemical compound ClCCCC#C[Cu] IKECPKGOIPUZSJ-UHFFFAOYSA-N 0.000 description 1
- OFNANPFSUAVMFV-UHFFFAOYSA-N Cl[Si]([Si](C=C)(C)Cl)(C)C Chemical compound Cl[Si]([Si](C=C)(C)Cl)(C)C OFNANPFSUAVMFV-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000003747 Grignard reaction Methods 0.000 description 1
- 101100386054 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CYS3 gene Proteins 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001345 alkine derivatives Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- UQQPGWLIXQJUOV-UHFFFAOYSA-N bromo-[3-[bromo(dimethyl)silyl]propyl]-dimethylsilane Chemical compound C[Si](C)(Br)CCC[Si](C)(C)Br UQQPGWLIXQJUOV-UHFFFAOYSA-N 0.000 description 1
- ZTFITWMDWDIYKV-UHFFFAOYSA-N bromo-[bromo(dimethyl)silyl]oxy-dimethylsilane Chemical compound C[Si](C)(Br)O[Si](C)(C)Br ZTFITWMDWDIYKV-UHFFFAOYSA-N 0.000 description 1
- MRKKOHFJCXIAPG-UHFFFAOYSA-N bromo-[bromo(diphenyl)silyl]-diphenylsilane Chemical compound C=1C=CC=CC=1[Si]([Si](Br)(C=1C=CC=CC=1)C=1C=CC=CC=1)(Br)C1=CC=CC=C1 MRKKOHFJCXIAPG-UHFFFAOYSA-N 0.000 description 1
- OTJZCIYGRUNXTP-UHFFFAOYSA-N but-3-yn-1-ol Chemical compound OCCC#C OTJZCIYGRUNXTP-UHFFFAOYSA-N 0.000 description 1
- LLCSWKVOHICRDD-UHFFFAOYSA-N buta-1,3-diyne Chemical compound C#CC#C LLCSWKVOHICRDD-UHFFFAOYSA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FQEKAFQSVPLXON-UHFFFAOYSA-N butyl(trichloro)silane Chemical compound CCCC[Si](Cl)(Cl)Cl FQEKAFQSVPLXON-UHFFFAOYSA-N 0.000 description 1
- XRGPFNGLRSIPSA-UHFFFAOYSA-N butyn-2-one Chemical compound CC(=O)C#C XRGPFNGLRSIPSA-UHFFFAOYSA-N 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- HHRQHEVSQICRND-UHFFFAOYSA-N chloro-(chloro-methyl-phenylsilyl)-methyl-phenylsilane Chemical compound C=1C=CC=CC=1[Si](C)(Cl)[Si](Cl)(C)C1=CC=CC=C1 HHRQHEVSQICRND-UHFFFAOYSA-N 0.000 description 1
- AUWRUFAJYVQXSH-UHFFFAOYSA-N chloro-(chloro-methyl-phenylsilyl)oxy-methyl-phenylsilane Chemical compound C=1C=CC=CC=1[Si](Cl)(C)O[Si](C)(Cl)C1=CC=CC=C1 AUWRUFAJYVQXSH-UHFFFAOYSA-N 0.000 description 1
- VOBYVDQTCYHZPW-UHFFFAOYSA-N chloro-[3-[chloro(dimethyl)silyl]phenyl]-dimethylsilane Chemical compound C[Si](C)(Cl)C1=CC=CC([Si](C)(C)Cl)=C1 VOBYVDQTCYHZPW-UHFFFAOYSA-N 0.000 description 1
- VTDZAHJRMRMQNP-UHFFFAOYSA-N chloro-[[chloro(dimethyl)silyl]methyl]-dimethylsilane Chemical compound C[Si](C)(Cl)C[Si](C)(C)Cl VTDZAHJRMRMQNP-UHFFFAOYSA-N 0.000 description 1
- SFAZXBAPWCPIER-UHFFFAOYSA-N chloro-[chloro(dimethyl)silyl]-dimethylsilane Chemical compound C[Si](C)(Cl)[Si](C)(C)Cl SFAZXBAPWCPIER-UHFFFAOYSA-N 0.000 description 1
- YQULWRCMYAXEAV-UHFFFAOYSA-N chloro-[chloro(diphenyl)silyl]oxy-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(Cl)O[Si](Cl)(C=1C=CC=CC=1)C1=CC=CC=C1 YQULWRCMYAXEAV-UHFFFAOYSA-N 0.000 description 1
- NVKIZCXASJPYHS-UHFFFAOYSA-N chloro-[chloro(methyl)silyl]-methylsilane Chemical compound C[SiH](Cl)[SiH](C)Cl NVKIZCXASJPYHS-UHFFFAOYSA-N 0.000 description 1
- DDYAZDRFUVZBMM-UHFFFAOYSA-N chloro-[chloro-di(propan-2-yl)silyl]oxy-di(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(C(C)C)O[Si](Cl)(C(C)C)C(C)C DDYAZDRFUVZBMM-UHFFFAOYSA-N 0.000 description 1
- NNKJLYMBVRDUEI-UHFFFAOYSA-N chloro-tris(ethenyl)silane Chemical compound C=C[Si](Cl)(C=C)C=C NNKJLYMBVRDUEI-UHFFFAOYSA-N 0.000 description 1
- 150000004699 copper complex Chemical class 0.000 description 1
- GLRRGGBYRBOLQU-UHFFFAOYSA-N copper(1+) oct-1-yne Chemical compound [Cu+].CCCCCCC#[C-] GLRRGGBYRBOLQU-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000003074 decanoyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C(*)=O 0.000 description 1
- 125000003493 decenyl group Chemical group [H]C([*])=C([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- NJKDOKBDBHYMAH-UHFFFAOYSA-N dibutyl(dichloro)silane Chemical compound CCCC[Si](Cl)(Cl)CCCC NJKDOKBDBHYMAH-UHFFFAOYSA-N 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- UOZZKLIPYZQXEP-UHFFFAOYSA-N dichloro(dipropyl)silane Chemical compound CCC[Si](Cl)(Cl)CCC UOZZKLIPYZQXEP-UHFFFAOYSA-N 0.000 description 1
- MAYIDWCWWMOISO-UHFFFAOYSA-N dichloro-bis(ethenyl)silane Chemical compound C=C[Si](Cl)(Cl)C=C MAYIDWCWWMOISO-UHFFFAOYSA-N 0.000 description 1
- GNEPOXWQWFSSOU-UHFFFAOYSA-N dichloro-methyl-phenylsilane Chemical compound C[Si](Cl)(Cl)C1=CC=CC=C1 GNEPOXWQWFSSOU-UHFFFAOYSA-N 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LRBLIVYQOCFXPX-UHFFFAOYSA-N dimethyl-bis(2-phenylethynyl)silane Chemical compound C=1C=CC=CC=1C#C[Si](C)(C)C#CC1=CC=CC=C1 LRBLIVYQOCFXPX-UHFFFAOYSA-N 0.000 description 1
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- WMYNMYVRWWCRPS-UHFFFAOYSA-N ethynoxyethane Chemical compound CCOC#C WMYNMYVRWWCRPS-UHFFFAOYSA-N 0.000 description 1
- SSDZYLQUYMOSAK-UHFFFAOYSA-N ethynylcyclohexane Chemical compound C#CC1CCCCC1 SSDZYLQUYMOSAK-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- RSPZSDWVQWRAEF-UHFFFAOYSA-N hepta-1,6-diyne Chemical compound C#CCCCC#C RSPZSDWVQWRAEF-UHFFFAOYSA-N 0.000 description 1
- 125000005446 heptyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- YFIBSNDOVCWPBL-UHFFFAOYSA-N hexa-1,5-diyne Chemical compound C#CCCC#C YFIBSNDOVCWPBL-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 125000003104 hexanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- HWSZZLVAJGOAAY-UHFFFAOYSA-L lead(II) chloride Chemical compound Cl[Pb]Cl HWSZZLVAJGOAAY-UHFFFAOYSA-L 0.000 description 1
- 239000007788 liquid Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- ACXIAEKDVUJRSK-UHFFFAOYSA-N methyl(silyloxy)silane Chemical compound C[SiH2]O[SiH3] ACXIAEKDVUJRSK-UHFFFAOYSA-N 0.000 description 1
- ILBIXZPOMJFOJP-UHFFFAOYSA-N n,n-dimethylprop-2-yn-1-amine Chemical compound CN(C)CC#C ILBIXZPOMJFOJP-UHFFFAOYSA-N 0.000 description 1
- 125000001038 naphthoyl group Chemical group C1(=CC=CC2=CC=CC=C12)C(=O)* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- UMIPWJGWASORKV-UHFFFAOYSA-N oct-1-yne Chemical compound CCCCCCC#C UMIPWJGWASORKV-UHFFFAOYSA-N 0.000 description 1
- CKRXBCDXHHIQDX-UHFFFAOYSA-N octa-1,5-diyne Chemical compound CCC#CCCC#C CKRXBCDXHHIQDX-UHFFFAOYSA-N 0.000 description 1
- DSOJWVLXZNRKCS-UHFFFAOYSA-N octa-1,7-diyne Chemical compound C#CCCCCC#C DSOJWVLXZNRKCS-UHFFFAOYSA-N 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- GBCOTHPVQOTZKQ-UHFFFAOYSA-N pent-1-yn-3-one Chemical compound CCC(=O)C#C GBCOTHPVQOTZKQ-UHFFFAOYSA-N 0.000 description 1
- LMDDPGHBJXJGAC-UHFFFAOYSA-N pent-4-yn-1-amine Chemical compound NCCCC#C LMDDPGHBJXJGAC-UHFFFAOYSA-N 0.000 description 1
- CRWVOXFUXPYTRK-UHFFFAOYSA-N pent-4-yn-1-ol Chemical compound OCCCC#C CRWVOXFUXPYTRK-UHFFFAOYSA-N 0.000 description 1
- MLBYLEUJXUBIJJ-UHFFFAOYSA-N pent-4-ynoic acid Chemical compound OC(=O)CCC#C MLBYLEUJXUBIJJ-UHFFFAOYSA-N 0.000 description 1
- MDROPVLMRLHTDK-UHFFFAOYSA-N penta-1,4-diyne Chemical compound C#CCC#C MDROPVLMRLHTDK-UHFFFAOYSA-N 0.000 description 1
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- JKANAVGODYYCQF-UHFFFAOYSA-N prop-2-yn-1-amine Chemical compound NCC#C JKANAVGODYYCQF-UHFFFAOYSA-N 0.000 description 1
- TVDSBUOJIPERQY-UHFFFAOYSA-N prop-2-yn-1-ol Chemical compound OCC#C TVDSBUOJIPERQY-UHFFFAOYSA-N 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 101150035983 str1 gene Proteins 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- 125000002306 tributylsilyl group Chemical group C(CCC)[Si](CCCC)(CCCC)* 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- DOEHJNBEOVLHGL-UHFFFAOYSA-N trichloro(propyl)silane Chemical compound CCC[Si](Cl)(Cl)Cl DOEHJNBEOVLHGL-UHFFFAOYSA-N 0.000 description 1
- DWAWYEUJUWLESO-UHFFFAOYSA-N trichloromethylsilane Chemical compound [SiH3]C(Cl)(Cl)Cl DWAWYEUJUWLESO-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- 125000005040 tridecenyl group Chemical group C(=CCCCCCCCCCCC)* 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- IGNTWNVBGLNYDV-UHFFFAOYSA-N triisopropylphosphine Chemical compound CC(C)P(C(C)C)C(C)C IGNTWNVBGLNYDV-UHFFFAOYSA-N 0.000 description 1
- VIPCDVWYAADTGR-UHFFFAOYSA-N trimethyl(methylsilyl)silane Chemical compound C[SiH2][Si](C)(C)C VIPCDVWYAADTGR-UHFFFAOYSA-N 0.000 description 1
- RPNIKWRXCAOXLD-UHFFFAOYSA-N trimethyl(oct-1-ynyl)silane Chemical compound CCCCCCC#C[Si](C)(C)C RPNIKWRXCAOXLD-UHFFFAOYSA-N 0.000 description 1
- CWMFRHBXRUITQE-UHFFFAOYSA-N trimethylsilylacetylene Chemical compound C[Si](C)(C)C#C CWMFRHBXRUITQE-UHFFFAOYSA-N 0.000 description 1
- DAGQYUCAQQEEJD-UHFFFAOYSA-N tris(2-methylpropyl)phosphane Chemical compound CC(C)CP(CC(C)C)CC(C)C DAGQYUCAQQEEJD-UHFFFAOYSA-N 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229940102001 zinc bromide Drugs 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はアルキニル銅を用い
る1−アルキニルシラン類の製造法に関する。TECHNICAL FIELD The present invention relates to a method for producing 1-alkynylsilanes using alkynylcopper.
【0002】[0002]
【従来の技術】1−アルキニルシラン類は末端アルキン
の保護基["Silicon Reagents in Organic Synthesis",
p.45, Academic Press, New York (1988)]やカルボ
ニル化合物の位置選択的なアルキニル化剤[Synthesis,
761 (1979); ibid. 991 (1984)]をはじめとして有機
合成において広く用いられている反応剤であり[J. Org
anomet. Chem., 422, 62 (1992); ibid. 416, 63 (199
1); ibid. 374, 106 (1989); ibid. 360, 113 (1989);
ibid. 337, 273 (1987)]、その簡便かつ効率的な合成
法は重要である。2. Description of the Related Art 1-Alkynylsilanes are protective groups for terminal alkynes ["Silicon Reagents in Organic Synthesis",
p.45, Academic Press, New York (1988)] and regioselective alkynylating agents for carbonyl compounds [Synthesis,
761 (1979); ibid. 991 (1984)] and other widely used reagents in organic synthesis [J. Org.
anomet. Chem., 422, 62 (1992); ibid. 416, 63 (199
1); ibid. 374, 106 (1989); ibid. 360, 113 (1989);
ibid. 337, 273 (1987)], its simple and efficient synthetic method is important.
【0003】1−アルキニルシラン類の従来の合成法と
しては、1−アルキンをブチルリチウムやエチルグリニ
ャ−ル反応剤と処理しアルキニルメタルとした後、これ
をハロシランによりシリル化する方法[J. Organomet.
Chem., 422, 62 (1992); ibid. 416, 63 (1991); ibid.
374, 106 (1989); ibid. 360, 113 (1989); ibid. 33
7, 273 (1987)]が一般的に広く用いられている。As a conventional method for synthesizing 1-alkynylsilanes, a method of treating 1-alkyne with butyllithium or an ethyl Grignard reaction agent to form an alkynyl metal, and then silylating this with halosilane [J. Organomet.
Chem., 422, 62 (1992); ibid. 416, 63 (1991); ibid.
374, 106 (1989); ibid. 360, 113 (1989); ibid. 33
7, 273 (1987)] is generally widely used.
【0004】しかし、アルキニルリチウムやアルキニル
マグネシウムは、反応性が高く、種々の官能基と容易に
反応する。したがって、従来法では種々の官能基を有す
るアルキニルシランの汎用的な合成法としては問題が多
い。However, alkynyl lithium and alkynyl magnesium are highly reactive and easily react with various functional groups. Therefore, the conventional method has many problems as a general-purpose synthetic method of alkynylsilane having various functional groups.
【0005】本発明者等は最近、金属亜鉛を用いる1−
アルキニルシラン類の簡便な製造法を見い出した[Tetra
hedron Lett. 36, 2769 (1995)]。しかしながら、この
方法は簡便性および経済性の両面で従来法を凌駕する一
方で、高い反応温度を必要とする点および副反応として
1−アルキンの還元がしばしば起こるという点で、必ず
しも満足すべきものではなかった。The present inventors have recently used 1-metal zinc.
A simple method for producing alkynylsilanes was found [Tetra
hedron Lett. 36, 2769 (1995)]. However, while this method surpasses the conventional methods in terms of both simplicity and economy, it is not always satisfactory in that it requires a high reaction temperature and that 1-alkyne reduction often occurs as a side reaction. There wasn't.
【0006】[0006]
【発明が解決しようとする課題】本発明はかかる欠点を
有しない、1−アルキニルシラン類の効率的な製造法を
提供することを目的とする。The object of the present invention is to provide an efficient method for producing 1-alkynylsilanes, which does not have such drawbacks.
【0007】[0007]
【課題を解決するための手段】本発明者らは1−アルキ
ニルシラン類の効率的かつ工業的に適用可能な製造法に
つき検討を加えた結果、アルキニル銅をクロロトリメチ
ルシランをはじめとするハロシランと加熱攪拌すること
により、1−アルキニルシラン類が高効率かつ高収率で
得られることを見いだし、本発明を完成した。Means for Solving the Problems As a result of investigations on an efficient and industrially applicable production method of 1-alkynylsilanes, the present inventors have found that alkynylcopper is treated with halosilanes such as chlorotrimethylsilane. It was found that 1-alkynylsilanes can be obtained with high efficiency and high yield by heating and stirring, and the present invention has been completed.
【0008】すなわち、本発明は下記一般式[I]That is, the present invention has the following general formula [I]
【0009】[0009]
【化10】 Embedded image
【0010】(式中、R1は水素原子、アルキル基、ア
リ−ル基、アルケニル基またはアセチレン水素をもたな
いアルキニル基を表す。Xはハロゲン原子を表す。nは
0から3までの整数を表す。ただし、nが2以上の場
合、二つ以上のR1は互いに異なっていてもよい。)で
表されるハロシランを下記一般式[II](Wherein R 1 represents a hydrogen atom, an alkyl group, an aryl group, an alkenyl group or an alkynyl group having no acetylene hydrogen, X represents a halogen atom, and n represents an integer of 0 to 3). However, when n is 2 or more, two or more R 1's may be different from each other.) The halosilane represented by the following general formula [II]
【0011】[0011]
【化11】 Embedded image
【0012】(式中、R2はアルキル基、シクロアルキ
ル基、アリ−ル基、アルケニル基、アセチレン水素をも
たないアルキニル基、アルコキシ基、シリル基またはア
シル基を表す。)で表されるアルキニル銅と反応させる
ことからなる、下記一般式[III](Wherein R 2 represents an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group, an alkenyl group having no acetylene hydrogen, an alkoxy group, a silyl group or an acyl group). The following general formula [III] consisting of reacting with alkynyl copper
【0013】[0013]
【化12】 Embedded image
【0014】(式中、R1、R2およびnは前記と同一の
意味を表す。)で表されるアルキニルシランの製造法に
関する。(Wherein R 1 , R 2 and n have the same meanings as described above) and a process for producing an alkynylsilane.
【0015】また、本発明は下記一般式[IV]The present invention also has the following general formula [IV]
【0016】[0016]
【化13】 Embedded image
【0017】(式中、R1は水素原子、アルキル基、ア
リ−ル基、アルケニル基またはアセチレン水素をもたな
いアルキニル基を表す。ただし、R1は互いに異なって
いてもよい。Xはハロゲン原子を表す。)で表されるハ
ロシランと、下記一般式[V](In the formula, R 1 represents a hydrogen atom, an alkyl group, an aryl group, an alkenyl group or an alkynyl group having no acetylene hydrogen, provided that R 1's may be different from each other. X is a halogen. And a halosilane represented by the following general formula [V]
【0018】[0018]
【化14】 Embedded image
【0019】(式中、R3は単結合または二価の有機基
を表す。)で表されるアルキニル銅を反応させることを
特徴とする、下記一般式[VI]## STR1 ## wherein R 3 represents a single bond or a divalent organic group, and alkynyl copper represented by the formula is reacted.
【0020】[0020]
【化15】 Embedded image
【0021】(式中、R1およびR3は前記と同一の意味
を表す。)で表されるアルキニルシランの製造法に関す
る。(Wherein R 1 and R 3 have the same meanings as described above) and a process for producing an alkynylsilane.
【0022】さらに、本発明は下記一般式[VII]Furthermore, the present invention provides the following general formula [VII]
【0023】[0023]
【化16】 Embedded image
【0024】(式中、R1およびR4は水素原子、アルキ
ル基、アリ−ル基、アルケニル基またはアセチレン水素
をもたないアルキニル基を表す。R5は単結合または二
価の連結基を表す。Xはハロゲン原子を表す。mおよび
kは独立に0から2までの整数を表す。ただし、R1お
よびR4は各々、互いに異なっていてもよい。)で表さ
れるハロシランと、下記一般式[II](In the formula, R 1 and R 4 represent a hydrogen atom, an alkyl group, an aryl group, an alkenyl group or an alkynyl group having no acetylene hydrogen. R 5 represents a single bond or a divalent linking group. X represents a halogen atom, m and k each independently represent an integer from 0 to 2, provided that R 1 and R 4 may be different from each other. General formula [II]
【0025】[0025]
【化17】 Embedded image
【0026】(式中、R2はアルキル基、シクロアルキ
ル基、アリ−ル基、アルケニル基、アセチレン水素をも
たないアルキニル基、アルコキシ基、シリル基またはア
シル基である。)で表されるアルキニル銅を反応させる
ことを特徴とする、下記一般式[VIII](In the formula, R 2 is an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group, an alkynyl group having no acetylene hydrogen, an alkoxy group, a silyl group or an acyl group). The following general formula [VIII] is characterized in that alkynyl copper is reacted.
【0027】[0027]
【化18】 Embedded image
【0028】(式中、R1、R2、R4、R5、mおよびk
は前記と同一の意味を表す。)で表される、アルキニル
シランの製造法に関する。(Wherein R 1 , R 2 , R 4 , R 5 , m and k
Represents the same meaning as described above. ) Represented by the formula (1).
【0029】本発明の特徴は、より低い反応温度で反応
が効率よく進行するという点および副反応の進行を抑え
ることができる点である。The features of the present invention are that the reaction efficiently proceeds at a lower reaction temperature and that the progress of side reactions can be suppressed.
【0030】[0030]
【発明の実施の形態】本発明に用いる前記一般式
[I]、[IV]、または[VII]で表されるハロシ
ランは種々のものが工業的に入手容易である。これらの
一般式の式中のR1およびR4としては、メチル基、エチ
ル基、プロピル基、イソプロピル基、ブチル基、イソブ
チル基、t−ブチル基、ペンチル基、ヘキシル基等の炭
素数1〜6の低級アルキル基、エテニル基、1−プロペ
ニル基、アリル基、1−ブテニル基、2−ブテニル基、
1−ペンテニル基、2−ペンテニル基、3−ペンテニル
基、1−ヘキセニル基、3−ヘキセニル基、5−ヘキセ
ニル基等の炭素数2〜6の低級アルケニル基、1−プロ
ピニル基、1−ブチニル基、2−ブチニル基、2−ペン
チニル基、3−ヘキシニル基等の炭素数3〜6のアセチ
レン水素を有しない低級アルキニル基、フェニル基、ナ
フチル基、フリル基、ピリジル基、チエニル基等のアリ
−ル基を例示することができる。R5は、単結合または
二価の連結基であり、後者としては、たとえばメチレン
基、エチレン基、プロピレン基、ペンタメチレン基、ヘ
キサメチレン基などの炭素数1〜6の低級アルキレン
基、ビニレン基、エチニレン基などの二価の不飽和炭化
水素基、フェニレン基やナフチレン基等のアリ−ル基を
例示することができる。また、酸素原子やカルボニル基
あるいは−NR6−で示される基(ただし、R6は低級ア
ルキル基またはアリール基を表す)などの二価の連結基
をも例示することができる。BEST MODE FOR CARRYING OUT THE INVENTION Various halosilanes represented by the above general formula [I], [IV] or [VII] used in the present invention are industrially easily available. R 1 and R 4 in the formulas of these general formulas have 1 to 10 carbon atoms such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a t-butyl group, a pentyl group and a hexyl group. 6 lower alkyl group, ethenyl group, 1-propenyl group, allyl group, 1-butenyl group, 2-butenyl group,
1-pentenyl group, 2-pentenyl group, 3-pentenyl group, 1-hexenyl group, 3-hexenyl group, lower alkenyl group having 2 to 6 carbon atoms such as 5-hexenyl group, 1-propynyl group, 1-butynyl group , 2-butynyl group, 2-pentynyl group, 3-hexynyl group and the like, acetylene hydrogen-free lower alkynyl group having 3 to 6 carbon atoms, phenyl group, naphthyl group, furyl group, pyridyl group, thienyl group and the like Group can be exemplified. R 5 is a single bond or a divalent linking group, and the latter is, for example, a lower alkylene group having 1 to 6 carbon atoms such as a methylene group, an ethylene group, a propylene group, a pentamethylene group or a hexamethylene group, or a vinylene group. Examples thereof include divalent unsaturated hydrocarbon groups such as ethynylene group and aryl groups such as phenylene group and naphthylene group. Further, a divalent linking group such as an oxygen atom, a carbonyl group or a group represented by —NR 6 — (wherein R 6 represents a lower alkyl group or an aryl group) can be exemplified.
【0031】一般式[I]により表されるハロシランと
してはたとえば、ジクロロシラン、トリクロロシラン、
クロロトリメチルシラン、ジクロロジメチルシラン、ト
リクロロメチルシラン、テトラクロロシラン、クロロト
リエチルシラン、ジクロロジエチルシラン、トリクロロ
エチルシラン、クロロトリプロピルシラン、ジクロロジ
プロピルシラン、トリクロロプロピルシラン、トリブチ
ルクロロシラン、ジブチルジクロロシラン、ブチルトリ
クロロシラン、(t−ブチル)ジメチルクロロシラン、
クロロトリフェニルシラン、ジクロロジフェニルシラ
ン、トリクロロフェニルシラン、(クロロ)(フェニ
ル)ジメチルシラン、(クロロ)(フェニル)メチルシ
ラン、(ジクロロ)(フェニル)メチルシラン、クロロ
(ピリジル)ジメチルシラン、(ジクロロ)ジエテニル
シラン、クロロトリ(フェニルエチニル)シラン、ブロ
モトリメチルシラン、ヨ−ドトリメチルシラン、ジヨ−
ドジメチルシラン等を例示することができる。Examples of the halosilane represented by the general formula [I] include dichlorosilane, trichlorosilane,
Chlorotrimethylsilane, dichlorodimethylsilane, trichloromethylsilane, tetrachlorosilane, chlorotriethylsilane, dichlorodiethylsilane, trichloroethylsilane, chlorotripropylsilane, dichlorodipropylsilane, trichloropropylsilane, tributylchlorosilane, dibutyldichlorosilane, butyltri Chlorosilane, (t-butyl) dimethylchlorosilane,
Chlorotriphenylsilane, dichlorodiphenylsilane, trichlorophenylsilane, (chloro) (phenyl) dimethylsilane, (chloro) (phenyl) methylsilane, (dichloro) (phenyl) methylsilane, chloro (pyridyl) dimethylsilane, (dichloro) diethenylsilane, Chlorotri (phenylethynyl) silane, bromotrimethylsilane, iodotrimethylsilane, diio-
Examples include dodimethylsilane and the like.
【0032】また、一般式[IV]で表されるハロシラ
ンとしては、クロロトリメチルシラン、クロロトリエチ
ルシラン、クロロトリプロピルシラン、トリブチルクロ
ロシラン、(クロロ)(フェニル)ジメチルシラン、
(クロロ)(フェニル)メチルシラン、クロロトリフェ
ニルシラン、(t−ブチル)ジメチルクロロシラン、ク
ロロ(ピリジル)ジメチルシラン、クロロトリエテニル
シラン、クロロトリ(フェニルエチニル)シラン、ブロ
モトリメチルシラン、ヨ−ドトリメチルシラン等を例示
することができる。As the halosilane represented by the general formula [IV], chlorotrimethylsilane, chlorotriethylsilane, chlorotripropylsilane, tributylchlorosilane, (chloro) (phenyl) dimethylsilane,
(Chloro) (phenyl) methylsilane, chlorotriphenylsilane, (t-butyl) dimethylchlorosilane, chloro (pyridyl) dimethylsilane, chlorotriethenylsilane, chlorotri (phenylethynyl) silane, bromotrimethylsilane, iodotrimethylsilane, etc. Can be illustrated.
【0033】さらに、一般式[VII]で表されるハロ
シランとしては、1,2−ジクロロ−1,1,2,2−テト
ラメチルジシラン、1,2−ジクロロ−1,2−ジメチル
−1,2−ジフェニルジシラン、1,2−ジクロロ−1,
2−ジメチルジシラン、1,2−ジクロロ−1,1,2,2
−テトラ(フェニルエチニル)ジシラン、1,2−ジク
ロロ−1,1,2−トリメチル−2−エテニルジシラン、
1,2−ジブロモ−1,1,2,2−テトラフェニルジシラ
ン、1,3−ジクロロ−1,1,3,3−テトラメチルジシ
ロキサン、1,3−ジクロロ−1,1,3,3−テトライソ
プロピルジシロキサン、1,3−ジクロロ−1,3−ジメ
チル−1,3−ジフェニルジシロキサン、1,3−ジクロ
ロテトラフェニルジシロキサン、1,3−ジブロモ−1,
1,3,3−テトラメチルジシロキサン、ビス(クロロジ
メチルシリル)メタン、1,3−ビス(ブロモジメチル
シリル)プロパン、1,3−ビス(クロロジメチルシリ
ル)ベンゼン、2,6−ビス(クロロジメチルシリル)
ナフタレン等を例示することができる。Further, as the halosilane represented by the general formula [VII], 1,2-dichloro-1,1,2,2-tetramethyldisilane, 1,2-dichloro-1,2-dimethyl-1, 2-diphenyldisilane, 1,2-dichloro-1,
2-dimethyldisilane, 1,2-dichloro-1,1,2,2
-Tetra (phenylethynyl) disilane, 1,2-dichloro-1,1,2-trimethyl-2-ethenyldisilane,
1,2-dibromo-1,1,2,2-tetraphenyldisilane, 1,3-dichloro-1,1,3,3-tetramethyldisiloxane, 1,3-dichloro-1,1,3,3 -Tetraisopropyldisiloxane, 1,3-dichloro-1,3-dimethyl-1,3-diphenyldisiloxane, 1,3-dichlorotetraphenyldisiloxane, 1,3-dibromo-1,
1,3,3-tetramethyldisiloxane, bis (chlorodimethylsilyl) methane, 1,3-bis (bromodimethylsilyl) propane, 1,3-bis (chlorodimethylsilyl) benzene, 2,6-bis (chloro Dimethylsilyl)
Naphthalene etc. can be illustrated.
【0034】他方の原料である前記一般式[II]で表
されるアルキニル銅は容易に合成でき、かつ工業的に入
手容易な化合物である[R. D. Stephens and C. E. Cast
ro,J. Org. Chem., 28, 3313 (1963); C. E. Castro,
E. J. Gauhan, and D. C. Owsley, J. Org. Chem., 31,
4071 (1966)]。一般式の式中のR2としてはアルキル
基、シクロアルキル基、アリ−ル基、アルケニル基、ア
セチレン水素をもたないアルキニル基、アルコキシ基、
シリル基またはアシル基を用いることができる。アルキ
ル基としては、上記の低級アルキル基の他、オクチル
基、デシル基、トリデシル基等の長鎖アルキル基を挙げ
ることができ、これらは分枝状であってもよい。また、
シクロアルキル基としては、シクロプロピル基、シクロ
ペンチル基、シクロヘキシル基等を挙げることができ、
アリ−ル基としては上記のものを挙げることができる。
アルケニル基としては、上記の低級アルケニル基の他、
オクテニル基、デセニル基、トリデセニル基等の長鎖ア
ルケニル基を挙げることができ、これらは分枝状であっ
てもよい。アセチレン水素をもたないアルキニル基とし
ては、上記のアセチレン水素をもたない低級アルキニル
基の他、1−オクチニル基、2−デシニル基、5−トリ
デシニル基等の長鎖アルケニル基を挙げることができ、
これらは分枝状であってもよい。アルコキシ基として
は、メトキシ基、エトキシ基、ブトキシ基、ヘプチルオ
キシ基等を例示することができ、これらは分枝状であっ
てもよい。シリル基としては、トリメチルシリル基、ト
リエチルシリル基、トリプロピルシリル基、トリブチル
シリル基、(t−ブチル)ジメチルシリル基、トリフェ
ニルシリル基、フェニルメチルシリル基、トリ(フェニ
ルエチニル)シリル基、(フェニル)ジメチルシリル
基、(ピリジル)ジメチルシリル基、トリエテニルシリ
ル基等を例示することができる。アシル基としては、ア
セチル基、プロピオニル基、ブタノイル基、ヘキサノイ
ル基、デカノイル基、ベンゾイル基、ナフトイル基、フ
ロイル基等を例示することができる。また、これらの基
はさらに、ハロゲン原子、水酸基、カルボキシル基、ア
ルコキシカルボニル基、アシル基、アミノ基、アルケニ
ル基、アリ−ル基、アシル基、アルコキシ基、シリル基
などで置換されていてもよい。具体的には、たとえばフ
ェニルエチン、トリメチルシリルエチン、2−プロピン
−1−オ−ル、3−ブチン−1−オ−ル、4−ペンチン
−1−オ−ル、4−ペンチン酸、4−ペンチン酸メチ
ル、1,4−ペンタデシン酸、1−デシン、1−ヘキシ
ン、1−ペンチン、1−オクチン、1−クロロ−4−ペ
ンチン、1−アミノ−4−ペンチン、3,3−ジメチル
−1−ブチン、エチルエチニルエ−テル、エチニルシク
ロヘキサン、1−エチニルシクロヘキセン、3−ブチニ
ルメチルエ−テル、1−アミノ−2−プロピン、1−ジ
メチルアミノ−2−プロピン、エチニルメチルケトン、
エチニルエチルケトン、1−エチニルベンゼン、1−エ
チニル−4−クロロベンゼン、1−エチニル−3−メチ
ルベンゼンなどを原料とするアルキニル銅を用いること
ができる。The other raw material, the alkynyl copper represented by the above general formula [II], is a compound that can be easily synthesized and is industrially easily available [RD Stephens and CE Cast.
ro, J. Org. Chem., 28, 3313 (1963); CE Castro,
EJ Gauhan, and DC Owsley, J. Org. Chem., 31,
4071 (1966)]. R 2 in the formula of the general formula is an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group, an alkenyl group having no acetylene hydrogen, an alkoxy group,
A silyl group or an acyl group can be used. Examples of the alkyl group include long-chain alkyl groups such as an octyl group, a decyl group, and a tridecyl group in addition to the above lower alkyl group, and these may be branched. Also,
Examples of the cycloalkyl group include a cyclopropyl group, a cyclopentyl group, a cyclohexyl group,
As the aryl group, those mentioned above can be mentioned.
As the alkenyl group, in addition to the above lower alkenyl group,
Examples thereof include long-chain alkenyl groups such as octenyl group, decenyl group and tridecenyl group, which may be branched. Examples of the alkynyl group having no acetylene hydrogen include the above-mentioned lower alkynyl group having no acetylene hydrogen, and long-chain alkenyl groups such as 1-octynyl group, 2-decynyl group and 5-tridecynyl group. ,
These may be branched. Examples of the alkoxy group include a methoxy group, an ethoxy group, a butoxy group, a heptyloxy group, and the like, which may be branched. Examples of the silyl group include trimethylsilyl group, triethylsilyl group, tripropylsilyl group, tributylsilyl group, (t-butyl) dimethylsilyl group, triphenylsilyl group, phenylmethylsilyl group, tri (phenylethynyl) silyl group, (phenyl Examples thereof include a dimethylsilyl group, a (pyridyl) dimethylsilyl group, and a triethenylsilyl group. Examples of the acyl group include an acetyl group, a propionyl group, a butanoyl group, a hexanoyl group, a decanoyl group, a benzoyl group, a naphthoyl group and a furoyl group. Further, these groups may be further substituted with a halogen atom, a hydroxyl group, a carboxyl group, an alkoxycarbonyl group, an acyl group, an amino group, an alkenyl group, an aryl group, an acyl group, an alkoxy group, a silyl group or the like. . Specifically, for example, phenylethyne, trimethylsilylethyne, 2-propyne-1-ol, 3-butyne-1-ol, 4-pentyn-1-ol, 4-pentynic acid, 4-pentyne. Methyl acid 1,4-pentadecenoic acid, 1-decine, 1-hexyne, 1-pentyne, 1-octyne, 1-chloro-4-pentyne, 1-amino-4-pentyne, 3,3-dimethyl-1- Butyne, ethyl ethynyl ether, ethynyl cyclohexane, 1-ethynyl cyclohexene, 3-butynyl methyl ether, 1-amino-2-propyne, 1-dimethylamino-2-propyne, ethynyl methyl ketone,
Alkynyl copper obtained from ethynyl ethyl ketone, 1-ethynylbenzene, 1-ethynyl-4-chlorobenzene, 1-ethynyl-3-methylbenzene and the like can be used.
【0035】また、前記一般式[V]におけるR3は単
結合または二価の有機基であり、後者の例として、メチ
レン基、エチレン基、プロピレン基、フェニレン基、ナ
フチレン基、エチニレン基、フェニレンメチレンフェニ
レン基、フェニレン(2,2−プロピリデン)フェニレ
ン基、フェニレン(ビストリフルオロメチルメチレン)
フェニレン基、ビフェニレン基、アントラセン−ジイル
基等の二価の炭化水素基の他、フェニレンオキシフェニ
レン基、フェニレンカルボニルフェニレン基、フェニレ
ンスルホニルフェニレン基、フェニレンフルフィニルフ
ェニレン基、フェニレン(ジメチルシリレン)フェニレ
ン基、フェニレン(ジフェニルシリレン)フェニレン
基、ピリジン−ジイル基等のヘテロ原子を含む二価の基
等を挙げることができる。具体的には1,3−ブタジイ
ン、1,4−ペンタジイン、1,5−ヘキサジイン、1,
6−ヘプタジイン、1,2−ジエチニルベンゼン、1,3
−ジエチニルベンゼン、1,4−ジエチニルベンゼン、
1,4−ジエチニルナフタレン、1,5−ジエチニルナフ
タレン、1,6−ジエチニルナフタレン、4,4´−ジエ
テニルビフェニル、ヘキサトリイン、ジ(4−エテニル
フェニル)スルフィド等を原料とするアルキニル銅が挙
げられる。R 3 in the general formula [V] is a single bond or a divalent organic group, and examples of the latter include methylene group, ethylene group, propylene group, phenylene group, naphthylene group, ethynylene group and phenylene group. Methylene phenylene group, phenylene (2,2-propylidene) phenylene group, phenylene (bistrifluoromethylmethylene)
In addition to divalent hydrocarbon groups such as phenylene group, biphenylene group, anthracene-diyl group, phenyleneoxyphenylene group, phenylenecarbonylphenylene group, phenylenesulfonylphenylene group, phenylenefurfinylphenylene group, phenylene (dimethylsilylene) phenylene group , A phenylene (diphenylsilylene) phenylene group, a divalent group containing a hetero atom such as a pyridine-diyl group, and the like. Specifically, 1,3-butadiyne, 1,4-pentadiyne, 1,5-hexadiyne, 1,
6-heptadiyne, 1,2-diethynylbenzene, 1,3
-Diethynylbenzene, 1,4-diethynylbenzene,
Alkynyl derived from 1,4-diethynylnaphthalene, 1,5-diethynylnaphthalene, 1,6-diethynylnaphthalene, 4,4'-diethenylbiphenyl, hexatriyne, di (4-ethenylphenyl) sulfide, etc. Copper is mentioned.
【0036】本発明の方法は溶媒中で行うことが反応効
率の点から望ましい。例えば、N,N−ジメチルホルム
アミド、ホルムアミド、ジメチルスルホキシド、ヘキサ
メチルリン酸トリアミド、テトラヒドロフラン、ジオキ
サン、アセトニトリル、ジエチルエ−テル、ベンゼン、
トルエン等を単独あるいは混合して用いることができ
る。反応は0〜200℃の範囲でおこなうことができる
が、反応の効率の点から室温〜150℃の間でおこなう
ことが望ましい。From the viewpoint of reaction efficiency, it is desirable to carry out the method of the present invention in a solvent. For example, N, N-dimethylformamide, formamide, dimethylsulfoxide, hexamethylphosphoric triamide, tetrahydrofuran, dioxane, acetonitrile, diethyl ether, benzene,
Toluene and the like can be used alone or in combination. The reaction can be carried out in the range of 0 to 200 ° C, but it is preferable to carry out the reaction at room temperature to 150 ° C from the viewpoint of reaction efficiency.
【0037】本発明の方法は亜鉛塩、金属亜鉛、第3級
アミン類、もしくはホスフィン類を、アルキニル銅に対
して当モル量以上共存させて行うことが反応効率の点か
ら望ましい。亜鉛塩として例えば、塩化亜鉛、臭化亜
鉛、ヨウ化亜鉛などを用いることができる。金属亜鉛は
粉末状、スポンジ状、粒状、ペレット状等いかなる形態
であってもよいが、反応効率の点で粉状のもの(亜鉛粉
末)を用いることが好ましい。第3級アミン類として例
えば、ピリジン、トリエチルアミン、トリイソプロピル
アミン、トリブチルアミン、N,N,N´,N´−テト
ラメチルエチレンジアミンなどを用いることができる。
ホスフィン類として例えば、トリメチルホスフィン、ト
リエチルホスフィン、トリイソプロピルホスフィン、ト
リイソブチルホスフィン、トリフェニルホスフィン、ト
リシクロヘキシルホスフィン、などを用いることができ
る。これらの共存させる化合物もしくは金属は、アルキ
ニル銅に対して当モル量以上用いることが望ましく、液
状のものは溶媒として使用することもできる。From the viewpoint of reaction efficiency, it is desirable that the method of the present invention is carried out by coexisting zinc salt, metallic zinc, tertiary amines or phosphines in an equimolar amount or more with respect to alkynyl copper. As the zinc salt, for example, zinc chloride, zinc bromide, zinc iodide, or the like can be used. The metallic zinc may be in any form such as powder, sponge, granules and pellets, but it is preferable to use powder (zinc powder) in terms of reaction efficiency. As the tertiary amines, for example, pyridine, triethylamine, triisopropylamine, tributylamine, N, N, N ′, N′-tetramethylethylenediamine, etc. can be used.
Examples of the phosphines that can be used include trimethylphosphine, triethylphosphine, triisopropylphosphine, triisobutylphosphine, triphenylphosphine, tricyclohexylphosphine, and the like. It is desirable that these coexisting compounds or metals be used in equimolar amounts or more with respect to alkynyl copper, and liquid compounds can also be used as a solvent.
【0038】[0038]
【実施例】以下、実施例および参考例により本発明をさ
らに詳しく説明する。ただし、本発明はそれらに限定さ
れるものではない。EXAMPLES The present invention will be described in more detail with reference to Examples and Reference Examples. However, the present invention is not limited to them.
【0039】実施例1Embodiment 1
【0040】[0040]
【化19】 Embedded image
【0041】フェニルエチニル銅(82mg、0.50
mmol)およびクロロトリメチルシラン(217m
g、2.0mmol)のアセトニトリル溶液(2.0m
l、カルシウムヒドリドより蒸留、以下同じ)にN,
N,N´,N´−テトラメチルエチレンジアミン(11
6mg、1.0mmol)を加え、ねじ付き試験管中、
80℃で、5時間攪拌した。不溶物を濾過した後、溶媒
を減圧留去し、得られた粗生成物をカラムクロマトグラ
フィ−(ヘキサン)で精製したところ、トリメチル(フ
ェニルエチニル)シラン56mgを得た(0.32mm
ol、収率64%)。Phenylethynyl copper (82 mg, 0.50
mmol) and chlorotrimethylsilane (217 m
g, 2.0 mmol) in acetonitrile (2.0 m
l, distilled from calcium hydride, the same below) N,
N, N ', N'-tetramethylethylenediamine (11
6 mg, 1.0 mmol) in a threaded test tube,
The mixture was stirred at 80 ° C for 5 hours. The insoluble material was filtered off, the solvent was evaporated under reduced pressure, and the obtained crude product was purified by column chromatography (hexane) to obtain 56 mg of trimethyl (phenylethynyl) silane (0.32 mm
ol, yield 64%).
【0042】1H−NMR(CDCl3):δ0.26
(s,9H),7.26−7.49(m,5H) IR(neat):2950,2150,1485,1
250,860,840,755,685cm-1 1 H-NMR (CDCl 3 ): δ0.26
(S, 9H), 7.26-7.49 (m, 5H) IR (neat): 2950, 2150, 1485, 1
250,860,840,755,685cm -1
【0043】実施例2Example 2
【0044】[0044]
【化20】 Embedded image
【0045】オクチニル銅(86mg、0.50mmo
l)およびクロロトリメチルシラン(217mg、2.
0mmol)のアセトニトリル溶液(2.0ml)にト
リフェニルホスフィン(263mg、1.0mmol)
を加え、ねじ付き試験管中、100℃で、7時間攪拌し
た。不溶物を濾過した後、溶媒を減圧留去し、得られた
粗生成物をカラムクロマトグラフィ−(ヘキサン)で精
製したところ(1−オクチニル)トリメチルシラン66
mgを得た(0.36mmol、収率73%)。Octynyl copper (86 mg, 0.50 mmo
1) and chlorotrimethylsilane (217 mg, 2.
0 mmol) in acetonitrile (2.0 ml) with triphenylphosphine (263 mg, 1.0 mmol).
Was added and the mixture was stirred at 100 ° C. for 7 hours in a test tube with a screw. The insoluble material was filtered off, the solvent was evaporated under reduced pressure, and the obtained crude product was purified by column chromatography (hexane) to give (1-octynyl) trimethylsilane 66.
mg was obtained (0.36 mmol, yield 73%).
【0046】1H−NMR(CDCl3):δ0.15
(s,9H),0.89(t,J=6.6Hz,3
H),1.26−1.57(m,12H),2.21
(t,J=7.0Hz,2H) IR(neat):2950,2925,2850,2
170,1250,840,755cm-1 1 H-NMR (CDCl 3 ): δ0.15
(S, 9H), 0.89 (t, J = 6.6Hz, 3
H), 1.26-1.57 (m, 12H), 2.21.
(T, J = 7.0 Hz, 2H) IR (neat): 2950, 2925, 2850, 2
170, 1250, 840, 755 cm -1
【0047】実施例3Example 3
【0048】[0048]
【化21】 [Chemical 21]
【0049】5−クロロ−ペンチニル銅(83mg、
0.50mmol)およびクロロトリメチルシラン(2
17mg、2.0mmol)のアセトニトリル溶液
(2.0ml)に亜鉛粉末(260mg、4.0mmo
l)を加え、ねじ付き試験管中、100℃で、11時間
攪拌した。不溶物を濾過した後、溶媒を減圧留去し、得
られた粗生成物をカラムクロマトグラフィ−(ヘキサ
ン)で精製したところ5−クロロ−1−トリメチルシリ
ル−1−ペンチン50mgを得た(0.29mmol、
収率57%)。5-chloro-pentynylcopper (83 mg,
0.50 mmol) and chlorotrimethylsilane (2
Zinc powder (260 mg, 4.0 mmo) in an acetonitrile solution (2.0 ml) of 17 mg, 2.0 mmol).
1) was added, and the mixture was stirred at 100 ° C. for 11 hours in a test tube with a screw. The insoluble material was filtered off, the solvent was evaporated under reduced pressure, and the obtained crude product was purified by column chromatography (hexane) to give 5-chloro-1-trimethylsilyl-1-pentyne 50 mg (0.29 mmol ,
Yield 57%).
【0050】1H−NMR(CDCl3):δ0.15
(s,9H),1.97(m,2H),2.41(t,
J=6.8Hz,2H),3.65(t,J=6.4H
z,2H) IR(neat):2950,2170,2124,8
40,755cm-1 1 H-NMR (CDCl 3 ): δ0.15
(S, 9H), 1.97 (m, 2H), 2.41 (t,
J = 6.8Hz, 2H), 3.65 (t, J = 6.4H
z, 2H) IR (neat): 2950, 2170, 2124, 8
40,755 cm -1
【0051】実施例4Example 4
【0052】[0052]
【化22】 Embedded image
【0053】5−ヒドロキシペンチニル銅(80mg、
0.50mmol)およびクロロトリメチルシラン(4
34mg、4.0mmol)のアセトニトリル溶液
(2.0ml)に亜鉛粉末(261mg、4.0mmo
l)を加え、ねじ付き試験管中、100℃で、12時間
攪拌した。不溶物を濾過した後、溶媒を減圧留去し、得
られた粗生成物をカラムクロマトグラフィー(ヘキサ
ン:酢酸エチル=3:1)で精製したところ5-(トリ
メチルシリル)-4-ペンチン-1-オール63mgを得た
(0.37mmol、収率74%)。5-hydroxypentynyl copper (80 mg,
0.50 mmol) and chlorotrimethylsilane (4
Zinc powder (261 mg, 4.0 mmo) in an acetonitrile solution (2.0 ml) of 34 mg, 4.0 mmol).
1) was added, and the mixture was stirred at 100 ° C. for 12 hours in a test tube with a screw. The insoluble material was filtered off, the solvent was evaporated under reduced pressure, and the obtained crude product was purified by column chromatography (hexane: ethyl acetate = 3: 1) to give 5- (trimethylsilyl) -4-pentyne-1-. All 63 mg was obtained (0.37 mmol, yield 74%).
【0054】1H−NMR(CDCl3):δ0.15
(s,9H),1.57(s,1H),1.77(m,
2H),2.36(t,J=6.9Hz,2H),3.
74(t,J=6.0Hz,2H) IR(neat):3350,2950,2170,1
245,1065,840,760cm-1 1 H-NMR (CDCl 3 ): δ0.15
(S, 9H), 1.57 (s, 1H), 1.77 (m,
2H), 2.36 (t, J = 6.9Hz, 2H), 3.
74 (t, J = 6.0 Hz, 2H) IR (neat): 3350, 2950, 2170, 1
245, 1065, 840, 760cm -1
【0055】実施例5Example 5
【0056】[0056]
【化23】 Embedded image
【0057】フェニルエチニル銅(51mg、0.50
mmol)およびクロロ(ジメチル)(フェニル)シラ
ン(171mg、1.0mmol)のアセトニトリル溶
液(2.0ml)にN,N,N´,N´−テトラメチル
エチレンジアミン(116mg、1.0mmol)を加
え、ねじ付き試験管中、100℃で、12時間攪拌し
た。不溶物を濾過した後、溶媒を減圧留去し、得られた
粗生成物をカラムクロマトグラフィ−(ヘキサン)で精
製したところ1−[ジメチル(フェニル)シリル]−2
−フェニルエチン109mgを得た(0.46mmo
l、収率92%)。Phenylethynyl copper (51 mg, 0.50
mmol) and chloro (dimethyl) (phenyl) silane (171 mg, 1.0 mmol) in acetonitrile solution (2.0 ml), N, N, N ′, N′-tetramethylethylenediamine (116 mg, 1.0 mmol) was added, Stirred in a threaded test tube at 100 ° C. for 12 hours. The insoluble material was filtered off, the solvent was evaporated under reduced pressure, and the obtained crude product was purified by column chromatography (hexane) to give 1- [dimethyl (phenyl) silyl] -2.
-109 mg of phenylethyne were obtained (0.46 mmo
1, yield 92%).
【0058】1H−NMR(CDCl3):δ0.49
(s,6H),7.32−7.52(m,10H) IR(neat):2970,2170,1495,1
435,1260,1125,840,800,710
cm-1 1 H-NMR (CDCl 3 ): δ0.49
(S, 6H), 7.32-7.52 (m, 10H) IR (neat): 2970, 2170, 1495, 1
435, 1260, 1125, 840, 800, 710
cm -1
【0059】実施例6Example 6
【0060】[0060]
【化24】 Embedded image
【0061】フェニルエチニル銅(247mg、1.5
mmol)およびジクロロジメチルシラン(108m
g、0.5mmol)のアセトニトリル溶液(2.0m
l)にN,N,N´,N´−テトラメチルエチレンジア
ミン(348mg、3.0mmol)を加え、ねじ付き
試験管中、100℃で、12時間攪拌した。不溶物を濾
過した後、溶媒を減圧留去し、得られた粗生成物をカラ
ムクロマトグラフィ−(ヘキサン)で精製したところジ
メチルジ(フェニルエチニル)シラン127mgを得た
(0.49mmol、収率98%)。Phenylethynyl copper (247 mg, 1.5
mmol) and dichlorodimethylsilane (108 m
g, 0.5 mmol) in acetonitrile (2.0 m
N) N, N ', N'-tetramethylethylenediamine (348 mg, 3.0 mmol) was added to 1), and the mixture was stirred at 100 ° C. for 12 hours in a test tube with a screw. The insoluble material was filtered off, the solvent was evaporated under reduced pressure, and the obtained crude product was purified by column chromatography (hexane) to obtain 127 mg of dimethyldi (phenylethynyl) silane (0.49 mmol, yield 98%). ).
【0062】1H−NMR(CDCl3):δ0.48
(s,6H),7.22−7.46(m,10H)13 C−NMR(CDCl3,CHCl3):δ0.5,9
0.5,105.9,122.7,128.2,12
8.8,132.1 IR(neat):2950,2150,1485,1
250,845,750,685cm-1 1 H-NMR (CDCl 3 ): δ0.48
(S, 6H), 7.22-7.46 (m, 10H) 13 C-NMR (CDCl 3 , CHCl 3 ): δ 0.5,9
0.5, 105.9, 122.7, 128.2, 12
8.8, 132.1 IR (neat): 2950, 2150, 1485, 1
250,845,750,685cm -1
【0063】実施例7Example 7
【0064】[0064]
【化25】 Embedded image
【0065】フェニルエチニル銅(247mg、1.5
mmol)および1,2−ジクロロ−1,1,2,2−
テトラメチルジシラン(94mg、0.5mmol)の
アセトニトリル溶液(2.0ml)にN,N,N´,N
´−テトラメチルエチレンジアミン(348mg、3.
0mmol)を加え、ねじ付き試験管中、100℃で、
12時間攪拌した。不溶物を濾過した後、溶媒を減圧留
去し、得られた粗生成物をカラムクロマトグラフィ−
(ヘキサン)で精製したところ1,2−ビス(トリメチ
ルシリルエチニル)−1,1,2,2−テトラメチルジ
シラン91mgを得た(0.28mmol、収率57
%)。Phenylethynyl copper (247 mg, 1.5
mmol) and 1,2-dichloro-1,1,2,2-
N, N, N ', N was added to an acetonitrile solution (2.0 ml) of tetramethyldisilane (94 mg, 0.5 mmol).
′ -Tetramethylethylenediamine (348 mg, 3.
0 mmol) and at 100 ° C. in a threaded test tube,
It was stirred for 12 hours. After filtering the insoluble matter, the solvent was distilled off under reduced pressure, and the obtained crude product was subjected to column chromatography.
After purification with (hexane), 91 mg of 1,2-bis (trimethylsilylethynyl) -1,1,2,2-tetramethyldisilane was obtained (0.28 mmol, yield 57).
%).
【0066】1H−NMR(CDCl3):δ0.39
(s,12H),7.26−7.48(m,10H) IR(neat):2950,2150,1485,1
240,840,790,750,685cm-1 1 H-NMR (CDCl 3 ): δ0.39
(S, 12H), 7.26-7.48 (m, 10H) IR (neat): 2950, 2150, 1485, 1
240,840,790,750,685cm -1
【0067】実施例8Example 8
【0068】[0068]
【化26】 Embedded image
【0069】フェニルエチニル銅(204mg、2.0
mmol)および1,3−ジクロロ−1,1,3,3−
テトラメチルジシロキサン(102mg、0.5mmo
l)のアセトニトリル溶液(2.0ml)にN,N,N
´,N´−テトラメチルエチレンジアミン(348m
g、3.0mmol)を加え、ねじ付き試験管中、10
0℃で、12時間攪拌した。不溶物を濾過した後、溶媒
を減圧留去し、得られた粗生成物をカラムクロマトグラ
フィ−(ヘキサン)で精製したところ1,3−ビス(ト
リメチルシリルエチニル)−1,1,3,3−テトラメ
チルジシロキサン56mgを得た(0.17mmol、
収率34%)。Phenylethynyl copper (204 mg, 2.0
mmol) and 1,3-dichloro-1,1,3,3-
Tetramethyldisiloxane (102 mg, 0.5 mmo
l) acetonitrile solution (2.0 ml) in N, N, N
′, N′-Tetramethylethylenediamine (348m
g, 3.0 mmol), and in a test tube with a screw, 10
The mixture was stirred at 0 ° C for 12 hours. The insoluble material was filtered off, the solvent was evaporated under reduced pressure, and the obtained crude product was purified by column chromatography (hexane) to give 1,3-bis (trimethylsilylethynyl) -1,1,3,3-tetrahydrofuran. 56 mg of methyldisiloxane was obtained (0.17 mmol,
Yield 34%).
【0070】1H−NMR(CDCl3):δ0.39
(s,12H),7.26−7.49(m,10H) IR(neat):2,975,2,170,1495,
1260,1050,855,800,760,695
cm-1 1 H-NMR (CDCl 3 ): δ0.39
(S, 12H), 7.26-7.49 (m, 10H) IR (neat): 2,975, 2,170, 1495,
1260, 1050, 855, 800, 760, 695
cm -1
【0071】実施例9Example 9
【0072】[0072]
【化27】 Embedded image
【0073】フェニルエチニル銅(82mg、0.50
mmol)およびクロロトリメチルシラン(217m
g、2.0mmol)のアセトニトリル溶液(2.0m
l)に塩化亜鉛(136mg、1.0mmol)を加
え、ねじ付き試験管中、100℃で、5時間攪拌した。
不溶物を濾過した後、溶媒を減圧留去し、得られた粗生
成物をカラムクロマトグラフィ−(ヘキサン)で精製し
たところトリメチル(フェニルエチニル)シラン75m
gを得た(0.43mmol、収率86%)。このもの
のスペクトルは実施例1で得たものと一致した。Phenylethynyl copper (82 mg, 0.50
mmol) and chlorotrimethylsilane (217 m
g, 2.0 mmol) in acetonitrile (2.0 m
Zinc chloride (136 mg, 1.0 mmol) was added to l), and the mixture was stirred at 100 ° C. for 5 hours in a test tube with a screw.
The insoluble material was filtered off, the solvent was distilled off under reduced pressure, and the obtained crude product was purified by column chromatography (hexane) to give 75 m of trimethyl (phenylethynyl) silane.
g was obtained (0.43 mmol, yield 86%). The spectrum of this product coincided with that obtained in Example 1.
【0074】実施例10Example 10
【0075】[0075]
【化28】 Embedded image
【0076】フェニルエチニル銅(82mg、0.50
mmol)およびクロロトリメチルシラン(217m
g、2.0mmol)のアセトニトリル溶液(2.0m
l)に亜鉛粉末(260mg、4.0mmol)を加
え、ねじ付き試験管中、100℃で、5時間攪拌した。
不溶物を濾過した後、溶媒を減圧留去し、得られた粗生
成物をカラムクロマトグラフィ−(ヘキサン)で精製し
たところトリメチル(フェニルエチニル)シラン85m
gを得た(0.49mmol、収率98%)。このもの
のスペクトルは実施例1で得たものと一致した。 実施例11Phenylethynyl copper (82 mg, 0.50
mmol) and chlorotrimethylsilane (217 m
g, 2.0 mmol) in acetonitrile (2.0 m
Zinc powder (260 mg, 4.0 mmol) was added to l), and the mixture was stirred at 100 ° C. for 5 hours in a test tube with a screw.
The insoluble material was filtered off, the solvent was evaporated under reduced pressure, and the obtained crude product was purified by column chromatography (hexane). Trimethyl (phenylethynyl) silane 85 m
g was obtained (0.49 mmol, yield 98%). The spectrum of this product coincided with that obtained in Example 1. Example 11
【0077】[0077]
【化29】 Embedded image
【0078】フェニルエチニル銅(82mg、0.50
mmol)およびクロロトリメチルシラン(217m
g、2.0mmol)のピリジン溶液(2.0ml)を
ねじ付き試験管中、100℃で、11時間攪拌した。不
溶物を濾過した後、溶媒を減圧留去し、得られた粗生成
物をカラムクロマトグラフィ−(ヘキサン)で精製した
ところトリメチル(フェニルエチニル)シラン62mg
を得た(0.36mmol、収率72%)。このものの
スペクトルは実施例1で得たものと一致した。Phenylethynyl copper (82 mg, 0.50
mmol) and chlorotrimethylsilane (217 m
g, 2.0 mmol) in pyridine (2.0 ml) was stirred in a test tube with a screw at 100 ° C. for 11 hours. The insoluble material was filtered off, the solvent was evaporated under reduced pressure, and the obtained crude product was purified by column chromatography (hexane). Trimethyl (phenylethynyl) silane 62 mg
Was obtained (0.36 mmol, yield 72%). The spectrum of this product coincided with that obtained in Example 1.
【0079】実施例12Example 12
【0080】[0080]
【化30】 Embedded image
【0081】1,7−オクタジインの銅錯体(116m
g、0.5mmol)およびクロロトリメチルシラン
(434mg、4.0mmol)のアセトニトリル溶液
(2.0ml)にN,N,N´,N´−テトラメチルエ
チレンジアミン(232mg、2.0mmol)を加
え、ねじ付き試験管中、100℃で、15時間攪拌し
た。不溶物を濾過した後、溶媒を減圧留去し、得られた
粗生成物をカラムクロマトグラフィ−(ヘキサン)で精
製したところ1,8−ビス(トリメチルシリル)−1,
7−オクタジイン69mgを得た(0.28mmol、
収率55%)。Copper complex of 1,7-octadiyne (116 m
g, 0.5 mmol) and chlorotrimethylsilane (434 mg, 4.0 mmol) in acetonitrile (2.0 ml) were added N, N, N ', N'-tetramethylethylenediamine (232 mg, 2.0 mmol), and screwed. Stirred at 100 ° C. for 15 hours in an attached test tube. The insoluble material was filtered off, the solvent was evaporated under reduced pressure, and the obtained crude product was purified by column chromatography (hexane) to give 1,8-bis (trimethylsilyl) -1,
69 mg of 7-octadiyne was obtained (0.28 mmol,
Yield 55%).
【0082】1H−NMR(CDCl3):δ0.15
(s,12H),1.63(m,4H),2.25
(m,4H)13 C−NMR(CDCl3,CHCl3):δ0.1,1
9.4,27.6,84.6,107.0 IR(neat):2970,2190,1435,1
255,850,765,645cm-1 1 H-NMR (CDCl 3 ): δ0.15
(S, 12H), 1.63 (m, 4H), 2.25
(M, 4H) 13 C-NMR (CDCl 3 , CHCl 3 ): δ0.1,1
9.4, 27.6, 84.6, 107.0 IR (neat): 2970, 2190, 1435, 1
255,850,765,645cm -1
【0083】比較例1Comparative Example 1
【0084】[0084]
【化31】 Embedded image
【0085】フェニルエチン(51mg、0.50mm
ol)およびクロロトリメチルシラン(217mg、
2.0mmol)のアセトニトリル溶液(2.0ml)
に亜鉛粉末(261mg、4.0mmol)を加え、ね
じ付き試験管中、80℃で、5時間攪拌した。目的物で
あるトリメチル(フェニルエチニル)シランは全く得ら
れなかった。Phenylethyne (51 mg, 0.50 mm
ol) and chlorotrimethylsilane (217 mg,
2.0 mmol) in acetonitrile (2.0 ml)
Zinc powder (261 mg, 4.0 mmol) was added to and the mixture was stirred at 80 ° C. for 5 hours in a test tube with a screw. The desired product, trimethyl (phenylethynyl) silane, was not obtained at all.
【0086】比較例2Comparative Example 2
【0087】[0087]
【化32】 Embedded image
【0088】フェニルエチン(51mg、0.50mm
ol)およびクロロトリメチルシラン(217mg、
2.0mmol)のアセトニトリル溶液(2.0ml)
に亜鉛粉末(261mg、4.0mmol)および塩化
鉛(5.6mg、0.02mmol)を加え、ねじ付き
試験管中、80℃で、5時間攪拌した。目的物であるト
リメチル(フェニルエチニル)シランは全く得られなか
った。Phenylethyne (51 mg, 0.50 mm
ol) and chlorotrimethylsilane (217 mg,
2.0 mmol) in acetonitrile (2.0 ml)
Zinc powder (261 mg, 4.0 mmol) and lead chloride (5.6 mg, 0.02 mmol) were added to and the mixture was stirred at 80 ° C. for 5 hours in a test tube with a screw. The desired product, trimethyl (phenylethynyl) silane, was not obtained at all.
【0089】[0089]
【発明の効果】本発明の方法により、1−アルキニルシ
ラン類が、比較的温和な条件で、一段階かつ収率良く製
造される。本方法においては、1−アルキンの還元等の
副反応を抑えることができる。従って、本発明の方法
は、1−アルキンへの保護基の導入方法として有用であ
ると共に、得られる1−アルキニルシラン類は、アルキ
ニル化剤などの有機合成反応剤として有用である。INDUSTRIAL APPLICABILITY According to the method of the present invention, 1-alkynylsilanes can be produced in a single step and in good yield under relatively mild conditions. In this method, side reactions such as reduction of 1-alkyne can be suppressed. Therefore, the method of the present invention is useful as a method for introducing a protective group into 1-alkyne, and the obtained 1-alkynylsilanes are useful as organic synthetic reaction agents such as alkynylating agents.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 B01J 27/138 B01J 27/138 X 31/02 102 31/02 102X 31/24 31/24 X // C07B 61/00 300 C07B 61/00 300 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification number Office reference number FI technical display location B01J 27/138 B01J 27/138 X 31/02 102 31/02 102X 31/24 31/24 X / / C07B 61/00 300 C07B 61/00 300
Claims (4)
ルケニル基またはアセチレン水素をもたないアルキニル
基を表す。Xはハロゲン原子を表す。nは0から3まで
の整数を表す。ただし、nが2以上の場合、二つ以上の
R1は互いに異なっていてもよい。)で表されるハロシ
ランと、下記一般式[II] 【化2】 (式中、R2はアルキル基、シクロアルキル基、アリ−
ル基、アルケニル基、アセチレン水素をもたないアルキ
ニル基、アルコキシ基、シリル基またはアシル基を表
す。)で表されるアルキニル銅を反応させることを特徴
とする、下記一般式[III] 【化3】 (式中、R1、R2およびnは前記と同一の意味を表
す。)で表されるアルキニルシランの製造法。[Claim 1] The following general formula [I] (In the formula, R 1 represents a hydrogen atom, an alkyl group, an aryl group, an alkenyl group, or an alkynyl group having no acetylene hydrogen. X represents a halogen atom. N represents an integer of 0 to 3. However, when n is 2 or more, two or more R 1's may be different from each other.) And a halosilane represented by the following general formula [II] (In the formula, R 2 is an alkyl group, a cycloalkyl group or an aryl group.
Represents an alkyl group, an alkenyl group, an alkynyl group having no acetylene hydrogen, an alkoxy group, a silyl group or an acyl group. ) Alkynylcopper represented by the following general formula [III] (In the formula, R 1 , R 2 and n have the same meanings as described above.) A method for producing an alkynylsilane.
ルケニル基またはアセチレン水素をもたないアルキニル
基を表す。ただし、R1は互いに異なっていてもよい。
Xはハロゲン原子を表す。)で表されるハロシランと、
下記一般式[V] 【化5】 (式中、R3は単結合または二価の有機基を表す。)で
表されるアルキニル銅を反応させることを特徴とする、
下記一般式[VI] 【化6】 (式中、R1およびR3は前記と同一の意味を表す。)で
表されるアルキニルシランの製造法。2. The following general formula [IV]: (In the formula, R 1 represents a hydrogen atom, an alkyl group, an aryl group, an alkenyl group or an alkynyl group having no acetylene hydrogen. However, R 1 may be different from each other.
X represents a halogen atom. ) Represented by halosilane,
The following general formula [V] (Wherein R 3 represents a single bond or a divalent organic group), and is reacted with an alkynyl copper represented by the following:
The following general formula [VI] (In the formula, R 1 and R 3 have the same meaning as described above.) A method for producing an alkynylsilane.
ル基、アルケニル基またはアセチレン水素をもたないア
ルキニル基を表す。R5は単結合または二価の連結基を
表す。Xはハロゲン原子を表す。Xはハロゲン原子を表
す。mおよびkは独立に0から2までの整数を表す。た
だし、R1およびR4は各々、互いに異なっていてもよ
い。)で表されるハロシランと、下記一般式[II] 【化8】 (式中、R2はアルキル基、シクロアルキル基、アリ−
ル基、アルケニル基、アセチレン水素をもたないアルキ
ニル基、アルコキシ基、シリル基またはアシル基であ
る。)で表されるアルキニル銅を反応させることを特徴
とする、下記一般式[VIII] 【化9】 (式中、R1、R2、R4、R5、mおよびkは前記と同一
の意味を表す。)で表される、アルキニルシランの製造
法。3. The following general formula [VII]: (In the formula, R 1 and R 4 are a hydrogen atom, an alkyl group, and an aryl group.
Represents an alkyl group, an alkenyl group or an alkynyl group having no acetylene hydrogen. R 5 represents a single bond or a divalent linking group. X represents a halogen atom. X represents a halogen atom. m and k independently represent an integer of 0 to 2. However, R 1 and R 4 may be different from each other. ) And a halosilane represented by the following general formula [II] (In the formula, R 2 is an alkyl group, a cycloalkyl group or an aryl group.
Group, alkenyl group, alkenyl group having no acetylene hydrogen, alkoxy group, silyl group or acyl group. ) Alkynylcopper represented by the formula: (In the formula, R 1 , R 2 , R 4 , R 5 , m and k have the same meanings as described above.) A process for producing an alkynylsilane.
よびホスフィン類から選択される1または2以上の化合
物もしくは金属の共存下に反応させることを特徴とす
る、請求項1、2、または3記載のアルキニルシランの
製造法。4. The reaction according to claim 1, wherein the reaction is carried out in the presence of one or more compounds or metals selected from zinc salts, metallic zinc, tertiary amines, and phosphines. Alternatively, the method for producing an alkynylsilane according to the item 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8005349A JPH09194485A (en) | 1996-01-17 | 1996-01-17 | Production of alkynylsilanes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8005349A JPH09194485A (en) | 1996-01-17 | 1996-01-17 | Production of alkynylsilanes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09194485A true JPH09194485A (en) | 1997-07-29 |
Family
ID=11608731
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8005349A Pending JPH09194485A (en) | 1996-01-17 | 1996-01-17 | Production of alkynylsilanes |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09194485A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2724877C1 (en) * | 2019-12-26 | 2020-06-26 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Кубанский государственный университет" (ФГБОУ ВО "КубГУ") | Method of producing tetraalkynylsilanes |
-
1996
- 1996-01-17 JP JP8005349A patent/JPH09194485A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2724877C1 (en) * | 2019-12-26 | 2020-06-26 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Кубанский государственный университет" (ФГБОУ ВО "КубГУ") | Method of producing tetraalkynylsilanes |
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