JPH09199517A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH09199517A
JPH09199517A JP8009124A JP912496A JPH09199517A JP H09199517 A JPH09199517 A JP H09199517A JP 8009124 A JP8009124 A JP 8009124A JP 912496 A JP912496 A JP 912496A JP H09199517 A JPH09199517 A JP H09199517A
Authority
JP
Japan
Prior art keywords
semiconductor device
lead frame
semiconductor chip
groove
mount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8009124A
Other languages
Japanese (ja)
Inventor
Takeshi Harada
毅 原田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP8009124A priority Critical patent/JPH09199517A/en
Publication of JPH09199517A publication Critical patent/JPH09199517A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/013Manufacture or treatment of die-attach connectors
    • H10W72/01308Manufacture or treatment of die-attach connectors using permanent auxiliary members, e.g. using alignment marks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/073Connecting or disconnecting of die-attach connectors
    • H10W72/07311Treating the bonding area before connecting, e.g. by applying flux or cleaning
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/073Connecting or disconnecting of die-attach connectors
    • H10W72/07351Connecting or disconnecting of die-attach connectors characterised by changes in properties of the die-attach connectors during connecting
    • H10W72/07353Connecting or disconnecting of die-attach connectors characterised by changes in properties of the die-attach connectors during connecting changes in shapes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • H10W72/331Shapes of die-attach connectors
    • H10W72/334Cross-sectional shape, i.e. in side view
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/884Die-attach connectors and bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/931Shapes of bond pads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/736Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked lead frame, conducting package substrate or heat sink

Landscapes

  • Die Bonding (AREA)

Abstract

(57)【要約】 【課題】リードフレームのマウント分にマウント材を介
して半導体チップを実装して樹脂封止を施した半導体装
置において、放熱性を確保しながら断続動作試験や温度
サイクル時の熱応力を緩和させる。 【解決手段】半導体チップ1が、マウント材3によって
溶融固着されるリードフレーム2に、直交状、放射状、
格子状などの形状の溝を設ける。これにより、マウント
材3を厚くでき、評価及び試験時に生じる熱応力を緩和
する事ができる。また部分的に溝を施すため、放熱性を
確保しながら信頼性を向上させる事ができる。また、部
分的に溝を施す為、半導体チップ1の大小に関係なく、
1種類のリードフレーム2にて対応できる。
(57) [Abstract] [PROBLEMS] In a semiconductor device in which a semiconductor chip is mounted on a mount portion of a lead frame via a mounting material and resin-sealed, a heat dissipation property is ensured while an intermittent operation test or a temperature cycle is performed. Relieves thermal stress. SOLUTION: A semiconductor chip 1 is orthogonal, radial, to a lead frame 2 melted and fixed by a mount material 3.
Grooves with a grid shape are provided. As a result, the mount material 3 can be thickened, and the thermal stress generated during the evaluation and test can be relaxed. Further, since the groove is partially provided, it is possible to improve reliability while ensuring heat dissipation. Further, since the groove is partially formed, regardless of the size of the semiconductor chip 1,
One type of lead frame 2 can be used.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、半導体装置に関
し、特に断続動作試験や温度サイクル試験での耐量を向
上させた半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, and more particularly to a semiconductor device having improved withstand capability in intermittent operation tests and temperature cycle tests.

【0002】[0002]

【従来の技術】近年、半導体装置の低オン抵抗化及び外
形の小型化に伴い、マウントアイランドに対する半導体
チップの大きさは、年々大きくなってきている。これに
伴い半導体装置の評価及び試験において、半導体装置の
受けるストレスは増加している。これらの問題に対する
対策として、図4の断面図に示すものがある。
2. Description of the Related Art In recent years, the semiconductor chip size relative to the mount island has been increasing year by year as the semiconductor device has a lower on-resistance and a smaller outer shape. Along with this, in the evaluation and testing of the semiconductor device, the stress that the semiconductor device receives is increasing. As a measure against these problems, there is one shown in the sectional view of FIG.

【0003】この半導体装置は、リードフレーム2の上
に接合材3を介して半導体チップ1を設けたものである
が、この接合材3の中に高熱伝導プレート4を入れたも
のである。この高熱伝導プレート4には、溝が施された
ものがあるが、これらは、プレート4を入れる工数やプ
レート費用が付加される為、半導体装置の原価率が悪化
する。
In this semiconductor device, the semiconductor chip 1 is provided on the lead frame 2 via the bonding material 3, and the high thermal conductive plate 4 is put in the bonding material 3. Some of the high thermal conductive plates 4 are provided with a groove, but the number of steps for inserting the plate 4 and the plate cost are added to these, so that the cost ratio of the semiconductor device is deteriorated.

【0004】もう1つの対策としては、シミュレーショ
ンや実験等より、マウント材3を厚くする事によって、
半導体装置の評価や試験における断続動作試験耐量や温
度サイクル耐量を向上させる事ができるが、放熱性が悪
くなり、熱抵抗特性を満足しなくなる為、マウント材を
厚くするのには限界が生じる。
As another measure, by thickening the mount material 3 by simulation or experiment,
Although it is possible to improve the intermittent operation test resistance and the temperature cycle resistance in the evaluation and test of the semiconductor device, the heat dissipation property deteriorates and the thermal resistance characteristics are not satisfied, so that there is a limit in making the mount material thick.

【0005】[0005]

【発明が解決しようとする課題】この従来のマウント材
(接合材)3の中に高熱伝導プレート4を入れた半導体
装置では、高熱伝導プレート4を入れる為の工数や、プ
レート4の費用が付加されるため、高熱伝導プレート4
を使用しない方法を確立する必要がある。
In the conventional semiconductor device in which the high thermal conductive plate 4 is placed in the mount material (bonding material) 3, the number of steps for inserting the high thermal conductive plate 4 and the cost of the plate 4 are added. High thermal conductivity plate 4
Need to establish a method that does not use.

【0006】また、リードフレーム1のマウント部にマ
ウント材3を介して半導体チップ1を実装して樹脂封止
を施した半導体装置において、マウント材3を厚くした
半導体装置では、放熱性が悪くなる事によって、熱抵抗
特性を満足しない場合が生じる。
Further, in the semiconductor device in which the semiconductor chip 1 is mounted on the mount portion of the lead frame 1 via the mount material 3 and resin-sealed, in the semiconductor device in which the mount material 3 is thick, heat dissipation becomes poor. In some cases, the thermal resistance characteristics may not be satisfied.

【0007】この発明の目的は、この種の半導体装置の
製造工程を変更せずに、なおかつ放熱性を継持させなが
ら、半導体装置の評価や試験において、継続動作試験耐
量や温度サイクル耐量を向上できる半導体装置を提供す
る事にある。
An object of the present invention is to improve continuous operation test resistance and temperature cycle resistance in semiconductor device evaluation and testing without changing the manufacturing process of this type of semiconductor device and while maintaining heat dissipation. It is to provide a semiconductor device capable of performing.

【0008】[0008]

【課題を解決するための手段】本発明の構成は、リード
フレームのマウント部にマウント材を介して半導体チッ
プを実装して樹脂封止を施した半導体装置において、前
記マンウント材が接着される前記リードフレームの面
に、前記半導体チップの中央部とコーナ部が接合される
溝を設けたことを特徴とする。
According to the structure of the present invention, in a semiconductor device in which a semiconductor chip is mounted on a mount portion of a lead frame via a mount material and resin-sealed, the mount material is bonded. A groove for joining the central portion and the corner portion of the semiconductor chip is provided on the surface of the lead frame.

【0009】本発明においては、リードフレームに設け
た溝により、部分的にマウント材が厚くなる事で、評価
や試験における熱応力を吸収する部分が多くなり、放熱
性を確保しながら信頼性を向上させる事ができる。
In the present invention, the mounting material is partially thickened due to the groove provided in the lead frame, so that a large portion absorbs thermal stress in evaluation and testing, and reliability is ensured while ensuring heat dissipation. Can be improved.

【0010】[0010]

【発明の実施の形態】図1(a),(b)は本発明の一
実施形態である半導体装置の要部の平面図および断面図
であり、図2(a),(b),(c)は、半導体装置に
施される各溝の例を示す平面図である。本実施形態の半
導体装置は、半導体チップ1が、溝5を施したリードフ
レーム2に、マウント材3によって溶融固着されてい
る。この半導体チップ1が実装されているリードフレー
ム2の実装面は、樹脂6で覆われていてリードフレーム
2の反対側が露出している。
1 (a) and 1 (b) are a plan view and a sectional view of a main portion of a semiconductor device according to an embodiment of the present invention, and FIGS. FIG. 3C is a plan view showing an example of each groove formed in the semiconductor device. In the semiconductor device of this embodiment, the semiconductor chip 1 is melted and fixed to the lead frame 2 having the groove 5 by the mount material 3. The mounting surface of the lead frame 2 on which the semiconductor chip 1 is mounted is covered with the resin 6 and the opposite side of the lead frame 2 is exposed.

【0011】この溝5の断面形状については、四角形の
ものが一般的であるが、マウント材の充填性を考慮する
と半円形のものが望ましい。また、溝5の寸法について
は、熱応力と放熱性を考え、幅については、1〜2m
m、長さについては、リードフレーム2に実装する半導
体チップ1よりも長く、深さについては、10〜80μ
mに設定するのが効果的である。
The cross-sectional shape of the groove 5 is generally quadrangular, but a semi-circular shape is desirable in consideration of the filling property of the mount material. Further, regarding the size of the groove 5, considering the thermal stress and heat dissipation, the width is 1 to 2 m.
m, the length is longer than that of the semiconductor chip 1 mounted on the lead frame 2, and the depth is 10 to 80 μm.
It is effective to set m.

【0012】図2は、リードフレーム2に施される溝5
の異なる形状を示している。半導体装置の大きさにより
図2(a),(b),(c)より最適な溝を選択でき
る。図2(a)は図1の溝5を45°回転させたもの
で、比較的放熱性に優れた配置となっている。図2
(b),(c)は溝5を放射状、又は格子状にしたもの
で、半導体装置の評価及び試験での熱応力を吸収しやす
くなっている。
FIG. 2 shows a groove 5 formed in the lead frame 2.
Shows different shapes of. The optimum groove can be selected from FIGS. 2A, 2B, and 2C depending on the size of the semiconductor device. FIG. 2A shows the groove 5 of FIG. 1 rotated by 45 °, which has a relatively excellent heat dissipation property. FIG.
(B) and (c) show the grooves 5 formed in a radial shape or a grid shape, and it is easy to absorb the thermal stress in the evaluation and test of the semiconductor device.

【0013】図3は、本発明の他の実施形態の半導体装
置の要部の断面図である。この半導体装置は図1と同様
な半導体装置であるが、リードフレーム2が樹脂6でそ
の全面が覆われたものである。
FIG. 3 is a sectional view of a main portion of a semiconductor device according to another embodiment of the present invention. This semiconductor device is the same semiconductor device as in FIG. 1, but the lead frame 2 is entirely covered with resin 6.

【0014】[0014]

【発明の効果】以上説明したように本発明によれば、リ
ードフレームのマウント部にマウント在を介して半導体
チップを実装して樹脂封止を施した半導体装置におい
て、リードフレームのマウント面に溝を施す事により、
マウント材を厚くする事ができ、半導体装置の評価及び
試験時に生じる熱応力を5〜10%緩和する事ができ、
かつ部分的に溝を施しているので、放熱性を確保しなが
ら信頼性を向上させる事ができる。さらに部分的に溝を
施しているので、半導体チップの大小にかかわらずマウ
ントする事ができるため、1種類のリードフレームで対
応でき、量産性に優れている。
As described above, according to the present invention, in the semiconductor device in which the semiconductor chip is mounted on the mount portion of the lead frame via the mount and resin sealing is performed, the groove is formed on the mount surface of the lead frame. By applying
The mount material can be made thicker, and the thermal stress generated during the evaluation and test of the semiconductor device can be relaxed by 5 to 10%.
Moreover, since the groove is partially provided, it is possible to improve reliability while ensuring heat dissipation. Furthermore, since the groove is partially formed, it can be mounted regardless of the size of the semiconductor chip, so that one type of lead frame can be used and the mass productivity is excellent.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施形態の半導体装置の要部の平面
図及び断面図である。
FIG. 1 is a plan view and a sectional view of a main part of a semiconductor device according to an embodiment of the present invention.

【図2】図1の半導体装置に施される溝の各例の平面図
である。
FIG. 2 is a plan view of each example of a groove formed in the semiconductor device of FIG.

【図3】本発明の他の実施形態の半導体装置の要部の断
面図である。
FIG. 3 is a cross-sectional view of a main part of a semiconductor device according to another embodiment of the present invention.

【図4】従来例の半導体装置の要部の断面図である。FIG. 4 is a sectional view of a main part of a conventional semiconductor device.

【符号の説明】[Explanation of symbols]

1 半導体チップ 2 リードフレーム 3 マウント材(接合材) 4 高熱伝導プレート 5 溝 6 樹脂 1 Semiconductor Chip 2 Lead Frame 3 Mounting Material (Joining Material) 4 High Thermal Conductive Plate 5 Groove 6 Resin

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 リードフレームのマウント部にマウント
材を介して半導体チップを実装して樹脂封止を施した半
導体装置において、前記マンウント材が接着される前記
リードフレームの面に、前記半導体チップの中央部とコ
ーナ部が接合される溝を設けたことを特徴とする半導体
装置。
1. In a semiconductor device in which a semiconductor chip is mounted on a mount portion of a lead frame via a mount material and resin-sealed, the semiconductor chip is attached to a surface of the lead frame to which the mount material is adhered. A semiconductor device having a groove for joining a central portion and a corner portion.
【請求項2】 溝の形状がX文字、十文字、放射状ある
いは格子状である請求項1記載の半導体装置。
2. The semiconductor device according to claim 1, wherein the grooves are X-shaped, cross-shaped, radial or lattice-shaped.
【請求項3】 樹脂封止がリードフレームの上面または
全面に施されたものである請求項1記載の半導体装置。
3. The semiconductor device according to claim 1, wherein resin encapsulation is performed on the upper surface or the entire surface of the lead frame.
JP8009124A 1996-01-23 1996-01-23 Semiconductor device Pending JPH09199517A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8009124A JPH09199517A (en) 1996-01-23 1996-01-23 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8009124A JPH09199517A (en) 1996-01-23 1996-01-23 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH09199517A true JPH09199517A (en) 1997-07-31

Family

ID=11711899

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8009124A Pending JPH09199517A (en) 1996-01-23 1996-01-23 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH09199517A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100499606B1 (en) * 2000-06-13 2005-07-07 앰코 테크놀로지 코리아 주식회사 Substrate for manufacturing semiconductor package
CN1319023C (en) * 1998-12-17 2007-05-30 株式会社日立制作所 Semiconductor device and manufacturing method thereof
JP2008159742A (en) * 2006-12-22 2008-07-10 Fujitsu Component Ltd Mounting structure of semiconductor elements
JP2009009957A (en) * 2007-06-26 2009-01-15 Nec Electronics Corp Semiconductor device
JP2011155286A (en) * 2011-03-22 2011-08-11 Rohm Co Ltd Semiconductor device
JP2016188763A (en) * 2015-03-30 2016-11-04 株式会社フジクラ Semiconductor package and pressure sensor package
US20200051880A1 (en) * 2018-08-10 2020-02-13 Infineon Technologies Ag Semiconductor device comprising a recess and method of fabricating the same
CN114203645A (en) * 2020-09-18 2022-03-18 力特半导体(无锡)有限公司 Packaging structure for low-capacity TVS
JP2023045874A (en) * 2021-09-22 2023-04-03 株式会社東芝 Semiconductor device

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1319023C (en) * 1998-12-17 2007-05-30 株式会社日立制作所 Semiconductor device and manufacturing method thereof
KR100499606B1 (en) * 2000-06-13 2005-07-07 앰코 테크놀로지 코리아 주식회사 Substrate for manufacturing semiconductor package
JP2008159742A (en) * 2006-12-22 2008-07-10 Fujitsu Component Ltd Mounting structure of semiconductor elements
US7948091B2 (en) 2006-12-22 2011-05-24 Fujitsu Component Limited Mounting structure for semiconductor element
JP2009009957A (en) * 2007-06-26 2009-01-15 Nec Electronics Corp Semiconductor device
US8076771B2 (en) 2007-06-26 2011-12-13 Renesas Electronics Corporation Semiconductor device having metal cap divided by slit
JP2011155286A (en) * 2011-03-22 2011-08-11 Rohm Co Ltd Semiconductor device
JP2016188763A (en) * 2015-03-30 2016-11-04 株式会社フジクラ Semiconductor package and pressure sensor package
US20200051880A1 (en) * 2018-08-10 2020-02-13 Infineon Technologies Ag Semiconductor device comprising a recess and method of fabricating the same
CN114203645A (en) * 2020-09-18 2022-03-18 力特半导体(无锡)有限公司 Packaging structure for low-capacity TVS
JP2023045874A (en) * 2021-09-22 2023-04-03 株式会社東芝 Semiconductor device
US12087672B2 (en) 2021-09-22 2024-09-10 Kabushiki Kaisha Toshiba Semiconductor device with reduced thermal resistance for improved heat dissipation

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