JPH09215568A - Plastic mirror - Google Patents

Plastic mirror

Info

Publication number
JPH09215568A
JPH09215568A JP8026524A JP2652496A JPH09215568A JP H09215568 A JPH09215568 A JP H09215568A JP 8026524 A JP8026524 A JP 8026524A JP 2652496 A JP2652496 A JP 2652496A JP H09215568 A JPH09215568 A JP H09215568A
Authority
JP
Japan
Prior art keywords
layer
surface layer
hydrophilic
water
hydrophilicity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8026524A
Other languages
Japanese (ja)
Inventor
Makoto Hayakawa
信 早川
Makoto Chikuni
真 千國
Toshiya Watabe
俊也 渡部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toto Ltd
Original Assignee
Toto Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toto Ltd filed Critical Toto Ltd
Priority to JP8026524A priority Critical patent/JPH09215568A/en
Publication of JPH09215568A publication Critical patent/JPH09215568A/en
Pending legal-status Critical Current

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  • Mirrors, Picture Frames, Photograph Stands, And Related Fastening Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To maintain a hydrophilic nature of a front surface for a long time which has not been known in prior art, and which can be restored even in having been lost. SOLUTION: A solution prepared by adding trimethoxymethyl silane after silicasol is addeed to anatase type titansol (having solute concentration of 10wt.%, a nitric acid dispersion type and a pH value of 0.8) having an averaged particle size of 0.01μm and is diluted with ethanol, is applied over the surface of a transparent plastic substrate 1 which has been previously formed on its back surface with a reflective layer 2 and a protecting layer 3, and thereafter, is heated and solidified at a temperature of 100 deg.C in order to form an outer surface layer 4 having a film thickness of 0.1μm. The outer surface layer 4 exhibits a hydrophilic nature due to reaction of titanium oxide.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は防曇性、清掃性及び
自己浄化性に優れたプラスチック鏡に関する。
TECHNICAL FIELD The present invention relates to a plastic mirror excellent in antifogging property, cleaning property and self-cleaning property.

【0002】[0002]

【従来の技術】鏡の防曇性を高めるため、従来から種々
の手段が講じられている。例えば、鏡の表面温度を露
点温度以上に維持する方法。表面を多孔質層とするこ
とで結露する前に表面の水分を吸収する方法。表面に
撥水性樹脂膜を形成する方法。等が知られている。
2. Description of the Related Art Conventionally, various measures have been taken in order to improve the antifogging property of a mirror. For example, a method of maintaining the surface temperature of the mirror above the dew point temperature. A method of absorbing water on the surface before dew condensation by forming a porous layer on the surface. A method of forming a water-repellent resin film on the surface. Etc. are known.

【0003】前記したの方法による場合には、ヒータ
線を設けなけらならず、またヒータ線に通電してから除
曇効果を発揮するまでに時間がかかる。の方法による
場合には、吸水によって表面硬度が低下し傷がつきやす
く且つ像の歪みが生じやすい。の方法の場合には、撥
水性樹脂膜上で水が乾燥すると、疎水性の汚れ成分がそ
のまま残留し、この疎水性の汚れは水よりも基材表面に
なじみやすいため、水によって洗い流しにくく、却って
汚れが目立ってしまう。
In the case of the above-mentioned method, it is necessary to provide the heater wire, and it takes time from the time when the heater wire is energized to the time when the defrosting effect is exhibited. In the case of the method (1), water absorption lowers the surface hardness, easily causes scratches, and easily causes image distortion. In the case of the method, when water is dried on the water-repellent resin film, the hydrophobic stain component remains as it is, and since this hydrophobic stain is more easily adapted to the surface of the substrate than water, it is difficult to wash it off with water. On the contrary, dirt becomes conspicuous.

【0004】また、界面活性剤による表面処理、プラズ
マ放電処理或いはコロナ放電処理によって、基材表面に
親水性基を導入することも行われているが、耐摩耗性、
耐久性に劣る。そこで、実開平3−129357号公報
には、300nm以下の紫外線照射とアルカリ水溶液に
よる処理で、ハードコート層の表面に親水性の酸性基を
生成する手段が提案されている。
It has also been attempted to introduce hydrophilic groups into the surface of the substrate by surface treatment with a surfactant, plasma discharge treatment or corona discharge treatment.
Poor durability. Therefore, Japanese Utility Model Application Laid-Open No. 3-129357 proposes a means for generating hydrophilic acidic groups on the surface of the hard coat layer by irradiation with ultraviolet rays of 300 nm or less and treatment with an alkaline aqueous solution.

【0005】[0005]

【発明が解決しようとする課題】実開平3−12935
7号公報に開示される方法で、プラスチック鏡表面に親
水性を付与しても、親水性を維持することができず、短
期間で防曇効果が失われてしまう。また、一旦親水性の
酸性基が失われると、親水性を回復することができず、
防曇効果がなくなり、更に、汚れが付着した場合の洗浄
性も十分とは言えない。
[Problems to be Solved by the Invention] Actual Kaihei 3-12935
Even if the plastic mirror surface is made hydrophilic by the method disclosed in Japanese Patent Publication No. 7, the hydrophilicity cannot be maintained, and the antifogging effect is lost in a short period of time. Further, once the hydrophilic acidic group is lost, the hydrophilicity cannot be restored,
The antifogging effect is lost, and further, the cleanability when stains adhere is not sufficient.

【0006】[0006]

【課題を解決するための手段】本発明は、鏡表面の親水
性の維持と回復が可能で、しかも水が付着した場合には
その水分で表面を浄化する自己浄化性を備え、且つ水洗
浄による清掃性に優れたプラスチック鏡を提供すること
を目的とする。
According to the present invention, the hydrophilicity of the mirror surface can be maintained and restored, and when water adheres, it has a self-cleaning property of purifying the surface with the water, and is washed with water. It is an object of the present invention to provide a plastic mirror excellent in cleanability due to.

【0007】即ち、本発明に係るプラスチック鏡は、裏
面側に反射層を形成した透明プラスチック基板の表面側
に、直接又はハードコート層を介して光半導体を含有す
る親水性表面層を形成した。
That is, in the plastic mirror according to the present invention, a hydrophilic surface layer containing an optical semiconductor is formed directly or through a hard coat layer on the front surface side of a transparent plastic substrate having a reflective layer formed on the back surface side.

【0008】前記光半導体とは、価電子帯の電子がフォ
ノン振動程度のエネルギーでは伝導帯に励起されにくい
が、特定波長以下のフォトンが照射されると価電子帯の
電子が伝導帯に励起され、伝導電子と正孔を生成し得る
半導体をいう。具体的には、酸化チタン、酸化亜鉛、酸
化スズ、酸化第二鉄、三酸化タングステン、三酸化二ビ
スマス、チタン酸ストロンチウム等が挙げられる。
In the photo semiconductor, electrons in the valence band are hard to be excited in the conduction band at an energy of about phonon oscillation, but when a photon of a specific wavelength or less is irradiated, the electrons in the valence band are excited in the conduction band. , A semiconductor capable of generating conduction electrons and holes. Specific examples include titanium oxide, zinc oxide, tin oxide, ferric oxide, tungsten trioxide, dibismuth trioxide, and strontium titanate.

【0009】また、表面層に親水性を付与するには、前
記光半導体が親水性を呈する場合には、当該光半導体を
単独で用いることが可能であるが、光半導体が親水性を
呈さない場合には、他の親水性物質と混合して表面層を
形成する。親水性物質としては、水酸基等の極性官能基
を側鎖に多量に含有するシリコーン樹脂等が挙げられ
る。
In order to impart hydrophilicity to the surface layer, when the optical semiconductor exhibits hydrophilicity, the optical semiconductor can be used alone, but the optical semiconductor does not exhibit hydrophilicity. In some cases, the surface layer is formed by mixing with another hydrophilic substance. Examples of hydrophilic substances include silicone resins containing a large amount of polar functional groups such as hydroxyl groups in their side chains.

【0010】前記光半導体による光親水性効果は、従来
の施釉タイル等の無機親水性物質からなる親水性効果と
異なる。即ち、従来の施釉タイル等にあっては、表面の
不斉基に水以外のカルボン酸、アルコール、界面活性剤
等の両性官能基を有する汚れ成分も同等に付着しやすい
ため、製造時には親水性を有していても、親水性の維持
機構がないため経時的に疎水化されてしまう。
The photohydrophilic effect of the optical semiconductor is different from the hydrophilic effect of an inorganic hydrophilic substance such as a conventional glazed tile. That is, in the conventional glazed tiles, etc., carboxylic acids other than water, alcohols, and soiling components having amphoteric functional groups such as surfactants are easily attached to the asymmetric group on the surface, so that they are hydrophilic during production. Even if it has, since it has no mechanism for maintaining hydrophilicity, it becomes hydrophobic over time.

【0011】これに対し、本発明においては、酸化チタ
ン等の光半導体の作用により、紫外線が光半導体上に照
射されることで、正孔と電子が生成され、それらの作用
により親水性物質からなる基材表面の極性が増して、基
材表面の物理吸着水量が増加することにより、親水性が
向上する。そして、基材表面に物理吸着水層が維持され
る限り、疎水性の汚れや両性官能基を有する汚れ成分は
基材に固着していることができなくなって、親水性が維
持されるとともに防汚性が維持される。
On the other hand, in the present invention, by the action of the photo-semiconductor such as titanium oxide, the photo-semiconductor is irradiated with ultraviolet rays to generate holes and electrons. The hydrophilicity is improved by increasing the polarity of the base material surface and increasing the amount of physically adsorbed water on the base material surface. As long as the physically adsorbed water layer is maintained on the substrate surface, hydrophobic stains and stain components having amphoteric functional groups cannot adhere to the substrate, maintaining hydrophilicity and preventing Dirtyness is maintained.

【0012】また、紫外線が照射されない環境で保管さ
れることにより、疎水性の汚れや両性官能基を有する汚
れ成分が基材に固着した場合でも、紫外線を照射するだ
けで、基材表面に物理吸着水量が形成され、これが増加
することによって、前記同様汚れ成分は基材に固着して
いることができなくなって、親水性が回復するとともに
防汚性が発揮される。更に、親水性が向上し、維持或い
は回復することによって、基材表面に水滴が形成されな
くなり、したがって鏡の表面の結露が防止され、可視光
の散乱を生じることがなくなり、防曇効果が発揮され
る。
Further, by storing in an environment that is not exposed to ultraviolet rays, even if hydrophobic stains or stain components having an amphoteric functional group are fixed to the substrate, it is possible to physically expose the substrate surface by simply irradiating it with ultraviolet rays. By forming and increasing the amount of adsorbed water, the stain component cannot be fixed to the base material as described above, the hydrophilicity is restored and the antifouling property is exhibited. Furthermore, by improving the hydrophilicity and maintaining or recovering it, water droplets are not formed on the surface of the substrate, so that dew condensation on the surface of the mirror is prevented, visible light is not scattered, and the antifogging effect is exerted. To be done.

【0013】尚、表面層は透明プラスチック基板の表面
に直接形成するか、透明プラスチック基板の表面に形成
したハードコートの上に形成する。いずれにおいても、
親水性表面層はアクリレート系のハードコートに比べ帯
電しにくいため、ほこりが付着しにくい。
The surface layer is formed directly on the surface of the transparent plastic substrate or on the hard coat formed on the surface of the transparent plastic substrate. In each case,
Since the hydrophilic surface layer is less likely to be charged than an acrylate-based hard coat, dust is less likely to adhere to the hydrophilic surface layer.

【0014】一方、本発明の好ましい態様としては、前
記した酸化チタン等の光半導体の他に、シリカまたはシ
リコーン樹脂等の蓄水性物質を親水性表面層に含有せし
める。親水性表面層に蓄水性物質を含有せしめると、蓄
水性物質の構造中に蓄えた水分が徐々に放出され、より
微弱な紫外線照射で親水性向上効果が認められる。ま
た、暗所放置時の疎水化現象を遅延させることができる
ので、より長期のインターバルの紫外線照射で親水性を
維持できるようになる。
On the other hand, in a preferred embodiment of the present invention, in addition to the above-described optical semiconductor such as titanium oxide, a water-storing substance such as silica or silicone resin is contained in the hydrophilic surface layer. When the hydrophilic surface layer contains a water-storing substance, the water stored in the structure of the water-storing substance is gradually released, and the effect of improving hydrophilicity is recognized by weaker UV irradiation. In addition, since it is possible to delay the hydrophobization phenomenon when left in the dark, it becomes possible to maintain the hydrophilicity by irradiation with ultraviolet rays for a longer period of time.

【0015】特に、シリカまたはシリコーン樹脂は屈折
率が1.4〜1.5で透明プラスチック基板の屈折率
(例えばアクリルは1.49)と近似するため、鏡とし
て使用する場合に歪が生じにくい。
In particular, silica or silicone resin has a refractive index of 1.4 to 1.5, which is close to the refractive index of a transparent plastic substrate (for example, acrylic is 1.49), so that distortion is unlikely to occur when it is used as a mirror. .

【0016】更に、本発明の好ましい態様としては、親
水性表面層の厚さを0.3μm以下とすることである。
このようにすることで、透明性を維持できる
Further, in a preferred embodiment of the present invention, the thickness of the hydrophilic surface layer is 0.3 μm or less.
By doing this, you can maintain transparency

【0017】[0017]

【発明の実施の形態】以下に本発明の実施の形態を添付
図面に基づいて説明する。図1は実施例1に係るプラス
チック鏡の断面図であり、プラスチック鏡は透明プラス
チック基板1の裏面側に反射層2と保護層3を予め形成
しておく。ここで、透明プラスチック基板1としては、
アクリル、ポリカーボネイト、ポリエステル、ポリスチ
レン或いは塩化ビニル等が挙げられ、反射層2は銀、ア
ルミニウム、ニッケル等を蒸着或いはめっきすることで
形成される。
Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a cross-sectional view of a plastic mirror according to the first embodiment. In the plastic mirror, a reflective layer 2 and a protective layer 3 are formed in advance on the back surface side of a transparent plastic substrate 1. Here, as the transparent plastic substrate 1,
Acrylic, polycarbonate, polyester, polystyrene, vinyl chloride and the like can be mentioned, and the reflection layer 2 is formed by vapor deposition or plating of silver, aluminum, nickel or the like.

【0018】基材がポリカーボネイトの場合には、平均
粒径0.01μmのアナターゼ型チタンゾル(溶質濃度
10重量%、硝酸分散型、pH0.8)にシリカゾルを
添加し、エタノールで希釈後、トリメトキシメチルシラ
ンを添加した溶液を前記透明プラスチック基板1の表面
に塗布した。その後、100℃で加熱固化し、膜厚0.
1μmの表面層4を形成した。ここで、表面層4中のシ
リカとトリメトキシメチルシランの固形分重量(樹脂重
量)と酸化チタン固形分重量の和に対する酸化チタンの
固形分重量の比率は50%とした。
When the base material is polycarbonate, silica sol is added to anatase type titanium sol having an average particle size of 0.01 μm (solute concentration 10% by weight, nitric acid dispersion type, pH 0.8), diluted with ethanol, and then trimethoxy. The solution containing methylsilane was applied to the surface of the transparent plastic substrate 1. After that, it is heated and solidified at 100 ° C. to obtain a film thickness of 0.
A 1 μm surface layer 4 was formed. Here, the ratio of the solid content weight of titanium oxide to the sum of the solid content weight (resin weight) of silica and trimethoxymethylsilane in the surface layer 4 and the solid content weight of titanium oxide was 50%.

【0019】図2は実施例2に係るプラスチック鏡の断
面図であり、この実施例にあっては、透明プラスチック
基板1の表面に直接表面層4を形成せずに、シリコーン
系の樹脂からなるハードコート層5を介して形成するよ
うにしている。
FIG. 2 is a cross-sectional view of the plastic mirror according to the second embodiment. In this embodiment, the transparent plastic substrate 1 is not directly formed with the surface layer 4 but is made of a silicone resin. The hard coat layer 5 is formed.

【0020】次に、前記実施例1,2と比較例1,2と
を親水性について比較する。尚、比較例1は実施例1,
2と同様の透明プラスチック基板の表面側に表面層を形
成しない構造とし、比較例2は実施例1,2と同様の透
明プラスチック基板の表面側にシリコーン樹脂からなる
表面層(光半導体を含まず)を形成した構造とした。
Next, Examples 1 and 2 and Comparative Examples 1 and 2 will be compared for hydrophilicity. In addition, Comparative Example 1 is Example 1,
A transparent plastic substrate similar to that of No. 2 has a structure in which a surface layer is not formed, and Comparative Example 2 has a transparent plastic substrate similar to that of Examples 1 and 2 in which a surface layer made of a silicone resin (not including an optical semiconductor). ) Was formed.

【0021】実施例1,2及び比較例1,2に0.5m
W/cm2BLBランプを照射し、水との接触角の時間
的変化を測定した。測定の結果、実施例1,2は200
時間以内に水との接触角が0°まで低下し、超親水化し
たが、比較例1,2の水との接触角は前者が90°、後
者が70°のまま変化なかった。
0.5 m in Examples 1 and 2 and Comparative Examples 1 and 2.
Irradiation with a W / cm 2 BLB lamp was carried out, and the time change of the contact angle with water was measured. As a result of the measurement, Examples 1 and 2 are 200
Within a time, the contact angle with water decreased to 0 ° and became superhydrophilic, but the contact angles with water of Comparative Examples 1 and 2 remained 90 ° for the former and 70 ° for the latter.

【0022】このように、実施例1,2の表面層が超親
水化したのは、表面層中の酸化チタン(光半導体)の作
用により、トリメトキシメチルシラン樹脂中のSi−R
(Rは有機基)結合がSi−OH結合に変化するからと
考えられる。
As described above, the surface layers of Examples 1 and 2 were made superhydrophilic because the action of titanium oxide (optical semiconductor) in the surface layer caused the Si-R in the trimethoxymethylsilane resin.
It is considered that (R is an organic group) bond is changed to a Si—OH bond.

【0023】また、日中だけ紫外線を照射し、夜間は照
射しない実験を前記実施例1,2と比較例1,2に施し
た。その結果は、実施例1,2は上記の超親水化状態を
10ヵ月以上維持したが、比較例1,2には親水性の向
上は認められなかった。これは、Si−OH結合の上部
に低級カルボン酸等の親水性官能基及び界面活性剤等の
疎水性官能基の両方が付着した場合でも、Si−OH結
合の上部に吸着している親水性官能基は、酸化チタンが
生成する電子や正孔によって離脱しやすい。ところが、
Si−OH結合は強い親水性を示すので、Si−OH結合
の上部にはすぐにまた親水性官能基が吸着されやすい。
このときには、親水性官能基及び疎水性官能基の両方を
含む成分、空気中の水分、水酸化物イオン等が吸着され
得るが、空気中の水分や水酸化物イオン等の親水性官能
基のみからなる成分は、親水性官能基及び疎水性官能基
の両方を含む成分よりも吸着されやすい。その結果、上
記の離脱を繰り返すうちに表面層は親水性官能基のみで
占められるようになり、親水性を維持するからと考えら
れる。
Further, an experiment in which the ultraviolet rays were irradiated only in the daytime and not in the nighttime was carried out in Examples 1 and 2 and Comparative Examples 1 and 2. As a result, Examples 1 and 2 maintained the above superhydrophilic state for 10 months or longer, but Comparative Examples 1 and 2 showed no improvement in hydrophilicity. This is because even if both a hydrophilic functional group such as a lower carboxylic acid and a hydrophobic functional group such as a surfactant are attached to the upper part of the Si-OH bond, the hydrophilic property that is adsorbed on the upper part of the Si-OH bond. The functional group is easily released by electrons or holes generated by titanium oxide. However,
Since the Si-OH bond exhibits strong hydrophilicity, a hydrophilic functional group is likely to be immediately adsorbed on the Si-OH bond.
At this time, components containing both a hydrophilic functional group and a hydrophobic functional group, water in the air, hydroxide ions, etc. can be adsorbed, but only hydrophilic functional groups such as water in the air, hydroxide ions, etc. The component consisting of is more easily adsorbed than the component containing both the hydrophilic functional group and the hydrophobic functional group. As a result, it is considered that the surface layer becomes occupied with only the hydrophilic functional group as the above-mentioned separation is repeated, and the hydrophilicity is maintained.

【0024】また、前記した実施例1,2について、息
をかけた後に曇りの有無を確認したが認められなかっ
た。また、二重像も認められなかった。更に表面層4の
硬度は2H以上であった。
[0024] Regarding Examples 1 and 2 above, the presence or absence of cloudiness was confirmed after breathing, but it was not observed. Also, no double image was observed. Furthermore, the hardness of the surface layer 4 was 2H or more.

【0025】[0025]

【発明の効果】以上に説明した如く本発明によれば、裏
面側に反射層を形成した透明プラスチック基板の表面側
に、光半導体を含有する親水性表面層を形成したので、
防曇効果を長期間に亘って維持でき、しかも一旦親水性
を失っても、紫外線を照射することで早期に親水性を回
復できるプラスチック鏡を提供することができる。
As described above, according to the present invention, a hydrophilic surface layer containing an optical semiconductor is formed on the front surface side of a transparent plastic substrate having a reflective layer formed on the back surface side.
It is possible to provide a plastic mirror which can maintain the antifogging effect for a long period of time and can recover hydrophilicity at an early stage by irradiating with ultraviolet rays even if hydrophilicity is once lost.

【0026】また、本発明に係るプラスチック鏡は、自
己浄化性と洗浄容易性に優れ、更に、親水性の表面層は
ハードコートと比較して帯電しにくいため、ほこりが付
着しにくい。
Further, the plastic mirror according to the present invention is excellent in self-cleaning property and easiness of cleaning. Furthermore, since the hydrophilic surface layer is less likely to be charged as compared with the hard coat, dust is less likely to adhere thereto.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係るプラスチック鏡の断面図FIG. 1 is a sectional view of a plastic mirror according to the present invention.

【図2】別実施例に係るプラスチック鏡の断面図FIG. 2 is a sectional view of a plastic mirror according to another embodiment.

【符号の説明】[Explanation of symbols]

1…透明プラスチック基板、2…反射層、3…保護層、
4…表面層、5…ハードコート。
1 ... Transparent plastic substrate, 2 ... Reflective layer, 3 ... Protective layer,
4 ... surface layer, 5 ... hard coat.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 裏面側に反射層を形成した透明プラスチ
ック基板の表面側に、直接又はハードコート層を介して
光半導体を含有する親水性表面層が形成されていること
を特徴とするプラスチック鏡。
1. A plastic mirror characterized in that a hydrophilic surface layer containing an optical semiconductor is formed on the front surface side of a transparent plastic substrate having a reflective layer formed on the back surface side, directly or through a hard coat layer. .
【請求項2】 請求項1に記載のプラスチック鏡におい
て、前記親水性表面層は蓄水性物質を含有することを特
徴とするプラスチック鏡。
2. The plastic mirror according to claim 1, wherein the hydrophilic surface layer contains a water storage substance.
【請求項3】 請求項2に記載のプラスチック鏡におい
て、前記蓄水性物質はシリカまたはシリコーン樹脂であ
ることを特徴とするプラスチック鏡。
3. The plastic mirror according to claim 2, wherein the water storage substance is silica or silicone resin.
【請求項4】 請求項1乃至請求項3の何れかに記載の
プラスチック鏡において、前記親水性表面層の厚さは
0.3μm以下であることを特徴とするプラスチック
鏡。
4. The plastic mirror according to claim 1, wherein the hydrophilic surface layer has a thickness of 0.3 μm or less.
JP8026524A 1996-02-14 1996-02-14 Plastic mirror Pending JPH09215568A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8026524A JPH09215568A (en) 1996-02-14 1996-02-14 Plastic mirror

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8026524A JPH09215568A (en) 1996-02-14 1996-02-14 Plastic mirror

Publications (1)

Publication Number Publication Date
JPH09215568A true JPH09215568A (en) 1997-08-19

Family

ID=12195872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8026524A Pending JPH09215568A (en) 1996-02-14 1996-02-14 Plastic mirror

Country Status (1)

Country Link
JP (1) JPH09215568A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106042530A (en) * 2016-05-31 2016-10-26 王翔 Self-cleaning glass

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50124657A (en) * 1974-03-18 1975-09-30
JPS5488449A (en) * 1977-12-24 1979-07-13 Shiseido Co Ltd Mirror in synthetic resin
JPS63100042A (en) * 1986-10-14 1988-05-02 Nippon Sheet Glass Co Ltd Glass article difficult-to be dirtied
JPH03129357U (en) * 1990-04-13 1991-12-26
JPH0417218B2 (en) * 1985-06-10 1992-03-25 Nippon Shokubai Kk
JPH06278241A (en) * 1992-09-22 1994-10-04 Takenaka Komuten Co Ltd Building material
JPH0751646A (en) * 1993-08-12 1995-02-28 Ishihara Sangyo Kaisha Ltd Method for cleaning off contaminant on solid matter surface

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50124657A (en) * 1974-03-18 1975-09-30
JPS5488449A (en) * 1977-12-24 1979-07-13 Shiseido Co Ltd Mirror in synthetic resin
JPH0417218B2 (en) * 1985-06-10 1992-03-25 Nippon Shokubai Kk
JPS63100042A (en) * 1986-10-14 1988-05-02 Nippon Sheet Glass Co Ltd Glass article difficult-to be dirtied
JPH03129357U (en) * 1990-04-13 1991-12-26
JPH06278241A (en) * 1992-09-22 1994-10-04 Takenaka Komuten Co Ltd Building material
JPH0751646A (en) * 1993-08-12 1995-02-28 Ishihara Sangyo Kaisha Ltd Method for cleaning off contaminant on solid matter surface

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106042530A (en) * 2016-05-31 2016-10-26 王翔 Self-cleaning glass

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