JPH09236884A - Silver halide photographic sensitive material and its production - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a photosensitive material excellent in image reproducibility and moreover, having excellent scratching resistance. SOLUTION: This photosensitive material has at least one layer containing a redox DIR compd. which releases a development inhibitor by oxidation and a dye layer having dispersion of a particulate solid on a base body. The layer containing a redox DIR compd., the solid dispersion dye layer, and a silver halide emulsion layer and an emulsion protective layer are formed by coating in this order on the base body. The photosensitive material also contains a hydrazine deriv. as a high contrast agent. The whole wet film thickness of coating liquids is between <=60μm and <=100μm in the coating process for from the lowest layer to the uppermost layer, and the wet film thickness of the lowermost layer is between >=5μm and <=20μm during coating.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a silver halide photographic light-sensitive material for printing plate making and a method for producing the same, and more particularly to a silver halide photographic light-sensitive material excellent in image reproducibility and scratch resistance and a method for producing the same. Regarding the provision of.

[0002]

2. Description of the Related Art In a silver halide photographic light-sensitive material for printing plate making (hereinafter simply referred to as a "light-sensitive material"), a high-contrast image without halftones has been required to record a halftone dot and a line image. In particular, high quality is required in each process of plate making. For example, quality such as enlargement (expansion), reduction (reduction) of a net photograph in a line drawing photographing process,
High resolution output exceeding 400 lines / inch, which is recently known in the scanner process, and minute D like in the FM screen system
Although the linearity of the ot output can be increased, in these processes, not only the tone is hard, but also the reproduction of fine lines and the reproducibility of the original from large points to small points are required. ing.

[0003] As a high-contrast image forming method for this purpose,
For example, a light-sensitive material containing a hydrazine derivative as disclosed in US Pat. No. 4,269,929 is known.
However, in these methods, it was necessary to use a developing solution having a pH of 11 or more, or it was necessary to treat with a developing solution containing a specific amine compound. In this case, there were a problem that the developer was easily oxidized, and a change in photographic performance was easily increased, and a problem of odor caused by the specific amine compound.

In recent years, European Patent 0,231,850, US Pat. No. 4,975,354, and JP-A-63-12404 have been disclosed.
No. 5, Japanese Unexamined Patent Publication No. 5-232616 discloses a method for forming a high-contrast photographic image using a hydrazine derivative having a high specific activity and a nucleation accelerator having a high activity, which makes the contrast high even at pH 11 or lower, as disclosed in JP-A-5-232616. I have. However, the method of hardening even with a developer having a pH of 11 or less may have poor image reproducibility due to the strong infectious development property by nucleation development as compared with the conventional method, and is particularly resistant to the influence of oxidation at a pH of less than 10.8. It was difficult to reproduce a faithful image in a system having a high degree of activity to be hardened with a liquid.

As means for improving the reproducibility faithful to an original, for example, Japanese Patent Application Laid-Open No. 61-147250 and
Redox DIR with an oxide of a developing agent as disclosed in JP-A-213847 and JP-A-4-19647.
A method using a compound (redox DIR compound) that releases a development inhibitor imagewise by a reaction is known. As means for effectively acting these redox DIR compounds, the Journal of the Photographic Society of Japan, 57 (5), 308
(1994) discloses a method in which a layer having a redox DIR compound is provided on the silver halide emulsion layer and an intermediate layer is provided between the silver halide emulsion layer for forming an image and the DIR layer.

Further, in order to improve the reproducibility of stretching and contraction, JP-A-6-148779 discloses, in a light-sensitive material containing a redox DIR compound, microcrystalline particles between a light-sensitive emulsion layer and a support. Although a method of providing an antihalation layer containing a solid dispersed dye is disclosed in these documents, the reproducibility of the original cannot be said to be sufficient by these methods, and the DIR compound is in the upper layer, so that the inhibitor is a gelatin film. There was a problem that it was easy to elute from the inside and the effect was hard to come out unless a large amount was added. In particular, when a high-definition output exceeding 400 lines / inch or an original having minute dots is used, there is a problem that reproducibility is greatly deteriorated. In addition, JP-A-6-148
According to the method disclosed in Japanese Patent No. 779, a solid disperse dye layer, an emulsion layer, an intermediate layer, a redox DIR compound-containing layer and a protective layer are formed.

Further, when a multi-layer coating is applied, the film thickness at the time of coating tends to be thick, but there is a problem of an increase in drying load due to an increase in the amount of water brought in. Therefore, there is a problem in coating property when each layer is simply thinned.

[0008]

In order to solve the above problems, an object of the present invention is to provide a silver halide photographic light-sensitive material excellent in image reproducibility and scratch resistance and a manufacturing method. Especially.

[0009]

The above object of the present invention is achieved by the following means.

Redox DIR capable of releasing a development inhibitor upon oxidation of at least one layer on a support
A photosensitive material having a compound-containing layer and a solid disperse dye layer, a redox DIR compound-containing layer on a support,
A light-sensitive material comprising a solid disperse dye layer, a silver halide emulsion layer, and an emulsion protective layer, which are applied in this order and which contains a hydrazine derivative as a contrast adjusting agent.

The light-sensitive material as described in the above item, wherein the emulsion protective layer contains a sliding agent.

[0012] The light-sensitive material described in the above item or item, wherein the redox DIR compound is present as a dispersion.

In a light-sensitive material in which a redox DIR compound-containing layer, a solid disperse dye layer, a silver halide emulsion layer, and an emulsion protective layer are coated on a support in this order, the coating solution from the bottom layer to the top layer is applied. A method for producing a photosensitive material, wherein the total wet film thickness is 60 μm or more and 100 μm or less, and the wet film thickness at the time of coating the lowermost layer is 5 μm or more and 20 μm or less.

The method for producing a light-sensitive material as described in the above item, wherein the lowermost layer contains a dispersion other than the silver halide emulsion in an amount of 10 mg / m ² or more.

Hereinafter, the present invention will be described specifically.

As an embodiment of the present invention, an embodiment in which a layer containing a redox DIR compound capable of releasing a development inhibitor upon oxidation, a solid disperse dye layer, an emulsion layer and an emulsion protective layer are applied in this order is preferable. If desired, an optional layer may be further provided between the layers. Moreover, the following aspects are mentioned as a preferable aspect of each layer.

The redox DIR compound-containing layer has a gelatin content of 0.1 g / m ^{2 to} 1.0 g / m ² , and the redox DIR compound content is 10 mg / m ² or more and 100 mg.
/ M ² or less. The redox DIR compound-containing layer is
Mainly represents a layer containing a redox DIR compound,
Specifically, it represents a layer containing 50% or more of a redox DIR compound. The layer may contain a silver halide emulsion, but the amount is preferably such that it does not affect image formation. The amount that does not affect image formation is preferably less than 10% of the coated silver amount.

In the solid disperse dye layer, the amount of gelatin is 0.5 g / m ^{2 to} 2.0 g / m ² , and the content of the solid disperse dye is 1 mg / m ² or more and 100 mg / m ² or less. .

The silver halide emulsion layer has a silver content of 2 g / m ² or more and 4 g / m ² or less, and a gelatin content of 1.0 g or more and 3.0 g / m ² or less. The term "silver halide emulsion layer" as used herein refers to a layer using a silver halide emulsion mainly forming an image. The silver halide emulsion layer may be a single layer or two or more layers.

The protective layer has a gelatin content of 0.3 g / m ² or more and 2.0 g / m ² or less.

The total amount of gelatin in all layers is 5 g / m ^2.
The following is preferable, and 4 g / m ² or less is particularly preferable.

Next, the sliding agent used in the present invention will be described. Conventionally, due to restrictions on the amount of gelatin in photosensitive materials,
Since the amount of gelatin in the protective layer cannot be made thick, there is a problem that blackening pressure is easily generated due to scratches. Therefore, it is preferable to use a slip agent as the scratch resistance improver in the protective layer. As a slip agent used in the present invention, US Pat.
42,522, British Patent No. 955,061, US Patent Nos. 3,080,317, 4,004,927,
Silicone-based sliding agents described in U.S. Pat. Nos. 4,047,958, 3,489,567, British Patent 1,143,118, etc., US Patents 2,454,043, 2,7.
32,305, 2,976,148, 3,20
No. 6,311, German Patent Nos. 1,284,295, 1,284,294, etc., higher fatty acid-based, alcohol-based, acid amide-based slip agents, and British Patent No. 1,263,7.
No. 22, metal soaps described in US Pat. No. 3,933,516 and the like, US Pat. Nos. 2,588,765, and 3,
121,060, British Patent 1,198,387, and other ester-based and ether-based lubricants, US Pat.
502,437 and 3,042,222, and taurine-based lubricants, and JP-A-53-112732, JP-B-57-009051, and JP-B-57-05163.
Colloidal silica and liquid paraffin disclosed in JP-A-4-214551 can be mentioned. Examples of preferable compounds include the compounds described in JP-A-4-214551. The preferred addition amount of these compounds varies depending on the compound, but it is preferable to add an amount such that the dynamic friction coefficient measured by the method of JP-A-4-214551 is 0.35 or less.

In coating the light-sensitive material of the present invention, the total wet film thickness of the coating liquid from the lowermost layer to the uppermost layer is 60.
It is preferable that the thickness is not less than μm and not more than 120 μm, and the wet film thickness at the time of applying the lowermost layer is not less than 5 μm and not more than 20 μm. Particularly preferably, the total wet film thickness from the lowermost layer to the uppermost layer is 90 μm or less, and the wet film thickness of the lowermost layer is preferably 6 μm or more and 12 μm or less. The coating film thickness here means the wet film thickness of the coating liquid when the coating liquid is coated on the support.

Further, it is preferable that the lowermost layer contains a compound dispersed in a solvent having a high boiling point other than the silver halide emulsion, or a solid dispersion, and particularly when the compound contains 10 mg / m ² or more, the effect of the present invention is great. The coating in which the lowermost layer contains a dispersion of the redox DIR compound is a preferred embodiment,
Coating can be carried out using various known coaters, but simultaneous multilayer coating with a slide hopper coater or curtain coater is preferred.

The hydrazine derivative used in the light-sensitive material of the present invention is preferably a compound represented by the following general formula [H].

[0026]

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In the formula, A represents an aryl group or a heterocycle containing at least one sulfur atom or oxygen atom, and G represents-.
(CO) _n -group, sulfonyl group, sulfoxy group, -P
(= O) R ₂ -group or iminomethylene group, n represents an integer of 1 or 2, and both A ₁ and A ₂ are hydrogen atoms or one is a hydrogen atom and the other is a substituted or unsubstituted alkylsulfonyl group. Represents a group or a substituted or unsubstituted acyl group, R represents a hydrogen atom, a substituted or unsubstituted alkyl group, alkenyl group, aryl group, alkoxy group, alkenyloxy group, aryloxy group, heterocyclic oxy group, amino Represents a group, a carbamoyl group, or an oxycarbonyl group. R ₂ represents a substituted or unsubstituted alkyl group, alkenyl group, alkynyl group, aryl group, alkoxy group, alkenyloxy group, alkynyloxy group, aryloxy group, amino group and the like.

Of the compounds represented by the general formula [H], the compounds represented by the following general formula [Ha] are more preferred.

[0029]

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In the formula, R ¹ is an aliphatic group (eg octyl group, decyl group), aromatic group (eg phenyl group, 2-hydroxyphenyl group, chlorophenyl group) or heterocyclic group (eg pyridyl group, thienyl group, Represents a furyl group),
These groups are preferably further substituted with an appropriate substituent. Further, R ¹ preferably contains at least one ballast group or silver halide adsorption promoting group.

The diffusion resistant group is preferably a ballast group commonly used in non-moving photographic additives such as couplers, and the ballast group having 8 or more carbon atoms is relatively inert to photographic properties, such as an alkyl group. , Alkenyl group, alkynyl group, alkoxy group, phenyl group, phenoxy group, alkylphenoxy group and the like.

As the silver halide adsorption promoting group, thiourea, thiourethane group, mercapto group, thioether group,
Examples thereof include a thione group, a heterocyclic group, a thioamide heterocyclic group, a mercapto heterocyclic group, and an adsorptive group described in JP-A-64-90439.

In the general formula [Ha], X represents a group capable of substituting for a phenyl group, m represents an integer of 0 to 4, and m
Is 2 or more, X may be the same or different.

In the general formula [Ha], A ₃ and A ₄ have the same meanings as A ₁ and A ₂ in the general formula [H], and both are preferably hydrogen atoms.

In the general formula [Ha], G represents a carbonyl group, a sulfonyl group, a sulfoxy group, a phosphoryl group or an iminomethylene group, and G is preferably a carbonyl group.

In the general formula [Ha], R ² is a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an allyl group, a heterocyclic group, an alkoxy group, a hydroxyl group, an amino group,
Represents a carbamoyl group or an oxycarbonyl group. Most preferred R ² includes a —COOR ₃ group and —CON (R ₄ )
(R ₅₎ groups (R ₃ represents an alkynyl group or a saturated heterocyclic group, R ₄ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heterocyclic group,
R ₅ represents an alkenyl group, an alkynyl group, a saturated heterocyclic group, a hydroxy group or an alkoxy group).

Next, specific examples of the compound represented by the general formula [H] are shown below, but the present invention is not limited thereto.

[0038]

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[0039]

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[0040]

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[0041]

[Chemical 6]

[0042]

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Specific examples of other preferable hydrazine derivatives are (1) to (252) described in US Pat. No. 5,229,248, columns 4 to 60.

The hydrazine derivative of the present invention can be synthesized by a known method, for example, US Pat. No. 5,22.
It can be synthesized by the method described in No. 9,248, columns 59 to 80.

The hydrazine derivative of the present invention can be used in any layer as long as it is a photographic constituent layer on the silver halide emulsion layer side.

Preferably, at least two of the silver halide emulsion layer and / or the hydrophilic colloid layer adjacent thereto are used.
Used in more than one layer.

The amount of addition is the grain size of silver halide grains,
Although the optimum amount varies depending on the halogen composition, the degree of chemical sensitization, the type of inhibitor, etc., it is generally preferably in the range of 10 ^-6 to 10 ^-1 mol per mol of silver halide, particularly 10 ^-5 to
A range of 10 ^-2 mol is preferred. The amount of the hydrazine derivative contained in the photographic constituent layer closest to the support among the photographic constituent layers containing the hydrazine derivative is 0% of the total amount of the hydrazine derivative contained in the photographic constituent layer farther from the support. .2 to 0.8 times the molar equivalent. Preferably, it is 0.4 to 0.6 times molar equivalent.

The hydrazine derivative used in the present invention is
One kind may be used, or two or more kinds may be used in combination.

In order to effectively promote the contrast increase by the hydrazine derivative, it is preferable to use a nucleation accelerator represented by the following general formula [Na] or [Nb].

[0050]

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In the general formula [Na], R ₃₁ , R ₃₂ , R
₃₃ is a hydrogen atom, an alkyl group, a substituted alkyl group, an alkenyl group, a substituted alkenyl group, an alkynyl group, an aryl group,
Represents a substituted aryl group. R ₃₁ , R ₃₂ and R ₃₃ can form a ring. Particularly preferred are aliphatic tertiary amine compounds. These compounds preferably have a diffusion-resistant group or a silver halide adsorption group in the molecule. In order to have diffusion resistance, a compound having a molecular weight of 100 or more is preferable, and a compound having a molecular weight of 300 or more is more preferable. Preferred examples of the adsorptive group include a heterocyclic ring, a mercapto group, a thioether group, a thione group, and a thiourea group. Particularly preferred as the general formula [Na] is a compound having at least one thioether group as a silver halide adsorptive group in the molecule.

Specific examples of these nucleation accelerators [Na] will be given below.

[0053]

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[0054]

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[0055]

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[0056]

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In the general formula [Nb], Ar represents a substituted or unsubstituted aromatic group or heterocyclic group. R ₃₄ is a hydrogen atom,
Represents an alkyl group, an alkynyl group, or an aryl group,
And R ₃₄ may be linked by a linking group to form a ring. These compounds preferably have a diffusion-resistant group or a silver halide adsorption group in the molecule. The molecular weight for imparting preferable diffusion resistance is preferably 120 or more, and particularly preferably 300 or more. Preferred examples of the silver halide adsorption group include groups having the same meaning as the silver halide adsorption group of the compound represented by the formula [H].

Specific examples of the compound of the general formula [Nb] include those shown below.

[0059]

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[0060]

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Specific examples of other preferable nucleation promoting compounds include compounds (2-1) to (2-20) exemplified in JP-A-6-258751 and 6-2587.
No. 51, (3-1) to (3-6), JP-A-7-27
Onium salt compounds described in 0957, JP-A-7-104
No. 420, a compound of the formula I, JP-A-2-103536.
No. 19, page 17, lower right column, line 19 to page 18, upper right column, line 4 and lower right column, lines 1 to 5, and JP-A-1-23753.
No. 8 thiosulfonic acid compound.

The nucleation accelerator used in the present invention can be used in any layer as long as it is a photographic constituent layer on the silver halide emulsion layer side, but is preferably used in the silver halide emulsion layer or its adjacent layer. Is preferred. The optimum amount to be added depends on the particle size of the silver halide grains, the halogen composition, the degree of chemical sensitization, the type of the inhibitor, etc., but is generally 10 ^-6 to 10 ^-1 per mol of silver halide. It is preferably in the range of mol, particularly preferably 10 ^-5 to 10 ^-2 mol.

The solid disperse dye used in the present invention is preferably represented by the general formulas (9) to (14).

[0064]

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In the formula, A and A'may be the same or different and each represents an acidic nucleus, B represents a basic nucleus,
Q represents an aryl group or a heterocyclic group, B ′ represents a heterocyclic group, X and Y may be the same or different, each represents an electron-withdrawing group, and L ₁ , L ₂ and L ₃ are respectively Represents a methine group. m represents 0 or 1, n represents 0, 1 or 2, and p represents 0 or 1. However, the general formula (9)
The dyes represented by (14) are carboxy groups in the molecule,
It has at least one group selected from a sulfonamide group and a sulfamoyl group.

A in the general formulas (9), (10) and (11)
And the acidic nucleus represented by A ′ is preferably 5-pyrazolone, barbituric acid, thiobarbituric acid, rhodanine, hydantoin, thiohydantoin, oxazolone, isoxazolone, indandione, pyrazolidinedione, oxazolidinedione, Hydroxypyridone,
Examples include pyrazolopyridone.

The basic nucleus represented by B in the general formulas (11) and (13) is preferably pyridine, quinoline,
Oxazole, benzoxazole, naphthoxazole, thiazole, benzothiazole, naphthothiazole, indolenine, pyrrole, indole.

Examples of the aryl group represented by Q in the general formulas (9) and (12) include a phenyl group and a naphthyl group. Further, the general formulas (9), (12) and (1
Examples of the heterocyclic group represented by Q and B'in 4) include a pyridyl group, a quinolyl group, an isoquinolyl group, a pyrrolyl group, a pyrazolyl group, an imidazolyl group, an indolyl group, a furyl group and a thienyl group. The aryl group and the heterocyclic group include those having a substituent, and examples of the substituent include substituents such as the amino group and the heterocyclic group of the compounds of the general formulas (9) to (13). And the like. These substituents may be used in combination of two or more kinds. Preferred substituents include alkyl groups having 1 to 8 carbon atoms (e.g., methyl, ethyl, t-butyl, octyl, 2-hydroxyethyl, 2-methoxyethyl, etc.), hydroxy, cyano, Halogen atom,
(Eg, a fluorine atom, a chlorine atom, etc.), an alkoxy group having 1 to 6 carbon atoms (eg, a methoxy group, an ethoxy group, a 2-hydroxyethoxy group, a methylenedioxy group, a butoxy group, etc.), a substituted amino group (eg, a dimethylamino group) , Diethylamino group, di (n-butyl) amino group, N-ethyl-
N-hydroxyethylamino group, N-ethyl-N-methanesulfonamidoethylamino group, morpholino group, piperidino group, pyrrolidino group, etc.), carboxy group, sulfonamide group (for example, methanesulfonamide group, benzenesulfonamide group, etc.) , A sulfamoyl group (eg, sulfamoyl group, methylsulfamoyl group, phenylsulfamoyl group, etc.), and these substituents may be combined.

The electron withdrawing groups represented by X and Y in the general formulas (12) and (13) may be the same or different, and the σp value of the substituent constant Hammett (edited by Toshio Fujita,
"Chemical Area Special Issue No. 122 Structure-Activity Relationship of Drugs", 96
Pp. 103- (1979) Nankodo. ) Is preferably 0.3 or more, for example, a cyano group,
Alkoxycarbonyl group (eg, methoxycarbonyl group, ethoxycarbonyl group, butoxycarbonyl group, octyloxycarbonyl group, etc.), aryloxycarbonyl group (eg, phenoxycarbonyl group, 4-hydroxyphenoxycarbonyl group), carbamoyl group (eg, carbamoyl group, dimethyl group) Carbamoyl group, phenylcarbamoyl group, 4-carboxyphenylcarbamoyl group, etc.), acyl group (for example, methylcarbonyl group, ethylcarbonyl group, butylcarbonyl group, phenylcarbonyl group, 4-ethylsulfonamidocarbonyl group, etc.), alkylsulfonyl group ( For example, methylsulfonyl group, ethylsulfonyl group, butylsulfonyl group, octylsulfonyl group, etc., arylsulfonyl group (eg, phenylsulfonyl group, 4-chlorosulfonyl group, etc. Sulfonyl group, etc.).

L ₁ , L ₂ and L in the general formulas (9) to (13)
_The methine group represented by ₃ includes those having a substituent,
Examples of the substituent include an alkyl group having 1 to 6 carbon atoms (eg, methyl group, ethyl group, hexyl group, etc.), aryl group (eg, phenyl group, tolyl group, 4-hydroxyphenyl group, etc.), aralkyl group (eg, benzyl group). Group, phenethyl group etc.), heterocyclic group (eg pyridyl group, furyl group, thienyl group etc.), substituted amino group (eg dimethylamino group, diethylamino group, anilino group etc.), alkylthio group (eg methylthio group etc.) To be

In the present invention, the general formulas (9) to (14)
Among the dyes represented by, a dye having at least one carboxyl group in the molecule is preferably used, more preferably a dye represented by the general formula (9), and particularly preferably in the general formula (9). A dye in which Q is a furyl group.

Specific examples of dyes preferably used are shown below, but the dyes are not limited to these.

[0073]

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[0074]

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[0075]

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[0076]

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[0077]

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[0078]

[Chemical 21]

[0079]

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[0080]

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[0081]

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[0082]

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Other preferable specific examples of the compounds represented by the general formulas (9) to (14) include, for example, JP-A No. 7-1.
No. 28793 (6) to (18). I-1
No. I-30, II-1 to II-12, III-1 to III-
8, IV-1 to IV-9, V-1 to V-8, VI-1 to VI-5
But are not limited to these.

A method for producing a solid fine particle dispersion of a dye according to the present invention is described in JP-A-52-92716 and JP-A-5-92716.
5-155350, 55-155351, 63
The methods described in, for example, No. 197943, No. 3-182743, and WO88 / 04794 can be used. Specifically, it can be manufactured using a fine dispersing machine such as a ball mill, a planetary mill, a vibration mill, a sand mill, a roller mill, a jet mill, and a disk impeller mill. When the compound in which solid fine particles are dispersed is water-insoluble at a relatively low pH and water-soluble at a relatively high pH, after dissolving the compound in a weak alkaline aqueous solution,
The method of precipitating fine particle solids by lowering the pH to weakly acidic or a method of preparing a fine particle solid by simultaneously mixing a weak alkaline solution of the compound and an acidic aqueous solution while adjusting the pH of the compound A dispersion can be obtained. The solid fine particle dispersion of the present invention may be used alone, or two or more kinds may be mixed and used, or may be used by mixing with a solid fine particle dispersion other than the present invention. When two or more kinds are used as a mixture, they may be dispersed individually and then mixed, or they may be dispersed simultaneously.

When the solid fine particle dispersion used in the present invention is produced in the presence of an aqueous dispersion medium, it is preferable that a surfactant coexists during or after the dispersion.
As such a surfactant, any of anionic surfactants, nonionic surfactants, cationic surfactants and amphoteric surfactants can be used, but preferably, for example, alkyl sulfonates and alkylbenzene sulfonates. , Alkylnaphthalene sulfonates, alkyl sulfates, sulfosuccinates, sulfoalkyl polyoxyethylene alkyl phenyl ethers, N
Anionic surfactants such as -acyl-N-alkyl taurines and nonionic surfactants such as saponins, alkylene oxide derivatives, alkyl esters of sugars. The above-mentioned anionic surfactants are particularly preferable. Specific examples of the surfactant include JP-A-7-
The compounds Nos. 1 to 32 described in 128793, pages (26) to (32) are mentioned, but not limited thereto.

The amount of the anionic activator and / or the nonionic activator used is not uniform depending on the kind of the activator or the conditions of the dispersion liquid of the dye, but usually 0.1 mg to 2000 mg per 1 g of the dye is preferable. , More preferably 0.5 mg to 1000 mg, particularly preferably 1
It may be mg to 500 mg.

The concentration of the dye in the dispersion is 0.01
It is preferably used so as to be about 50% by weight,
More preferably, it is 0.1 to 30% by weight. The addition position of the surfactant is preferably added before the start of dispersion of the dye,
If necessary, it may be further added to the dye dispersion after the dispersion is completed. These anionic activators and / or nonionic activators may be used alone, respectively, or two or more kinds may be combined, and both activators may be combined.

The solid fine particle dispersion used in the present invention is preferably dispersed so that the average particle diameter is 0.01 μm to 5 μm, more preferably 0.01 μm.
To 1 μm, particularly preferably 0.01 to 0.5 μm.
μm. The dispersion coefficient of the particle size distribution is preferably 50% or less, more preferably 40% or less, and particularly preferably 30% or less. Here, the variation coefficient of the particle size distribution is a value represented by the following equation.

(Standard deviation of particle size) / (Average value of particle size) × 100 The solid fine particle dispersion used in the present invention is a hydrophilic colloid used as a binder of a photographic constituent layer before or after the start of dispersion. Can be added. As the hydrophilic colloid, it is advantageous to use gelatin, but other than that, for example, gelatin derivatives such as phenylcarbamylated gelatin, acylated gelatin, phthalated gelatin and the like, and gelatin and a monomer having a polymerizable ethylene group are used. Graft polymer, carboxymethyl cellulose, hydroxymethyl cellulose, cellulose derivatives such as cellulose sulfate, polyvinyl alcohol,
Partially oxidized polyvinyl acetate, polyacrylamide, poly-N, N-dimethylacrylamide, poly-
Synthetic hydrophilic polymers such as N-vinylpyrrolidone and polymethacrylic acid, agar, gum arabic, alginic acid, albumin, casein and the like can be used. These may be used in combination of two or more. The addition amount of the hydrophilic colloid added to the solid fine particle dispersion of the present invention is preferably 0.1% to 12% by weight, more preferably 0.5% to 8%. is there.

The solid dispersion used in the present invention is
Any photographic constituent layer on the silver halide emulsion layer side can be used. It is preferably used in the silver halide emulsion layer closest to the support and / or in the non-photosensitive hydrophilic colloid layer adjacent to the support side of the emulsion layer.

The preferable amount of the solid disperse dye to be used is not uniform depending on the type of the dye and the characteristics of the photographic light-sensitive material,
The amount is preferably 1 mg to 1 g, more preferably 5 mg to 800 mg, and particularly preferably 10 mg to 500 mg per 1 m ^{2 of the} photographic light-sensitive material.

In the present invention, a photographic constituent layer containing a solid disperse dye is provided on the silver halide emulsion layer side, but any photographic constituent on the other side of the support, that is, on the opposite side of the emulsion layer from the support. It may be contained in the layer. A water-soluble dye may be contained in any layer. Further, in the present invention, dyes having other absorption wavelengths can be used together in any layer. The light-sensitive material of the present invention is most effectively used as an output light-sensitive material, and as a light source, Ar laser, HeNe laser, red laser diode, infrared semiconductor laser and red LED laser are typical, but other , Any laser such as a blue laser such as a HeCd laser can be used. Further, the effect of the present invention is not limited to the output light-sensitive material for laser, but also exerts the effect in applications such as a light-sensitive material for photographing and a light-reversed light-sensitive material.

The redox DIR compound capable of releasing the development inhibitor by being oxidized according to the present invention will be described.

The redox DIR compound of the present invention has a partial structure such as hydroquinones, catechols, naphthohydroquinones, aminophenols, pyrazolidones, hydrazines, reductones and α-aminoketones as a redox group.

Preferred redox DIR compounds are those having a —NHNH— group and the following general formula [3]:
A compound represented by [4], [5], [6], [7] or [8].

[0096]

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The DIR compound having a -NHNH- group as a redox group is represented by the following general formula [RE-a] or [RE-b].

General formula [RE-a] T-NHNHCO- (Tm) _n -PUG General formula [RE-b] T-NHNHCOCO- (Tm) _n -PUG General formula [RE-a], [RE-b] In the above, T represents an optionally substituted aryl group or an optionally substituted alkyl group. Examples of the aryl group include a benzene ring and a naphthalene ring, and these rings may be substituted with various substituents. As a preferable substituent, a linear or branched alkyl group (preferably having a carbon number of 2 to 20) is used. Such as methyl, ethyl, isopropyl group, dodecyl group, etc., alkoxy group (preferably having 2 to 21 carbon atoms, for example, methoxy group, ethoxy group etc.), aliphatic acylamino group (preferably having 2 to 21 carbon atoms) Those having a group, such as acetylamino group, heptylamino group, etc.), aromatic acylamino groups, and the like. In addition to these, the substituted or unsubstituted aromatic ring as described above is -CONH-, -O-. ,-
It also includes those linked by a linking group such as SO ₂ NH-, -NHCONH-, and -CH ₂ CHN-. Tm represents a timing group, and n represents 0 or 1. PUG becomes a compound exhibiting a development inhibitory property when released, and as the development inhibitory compound, 5-nitroindazole, 4-nitroindazole, 1-phenyltetrazole, 1- (3-sulfophenyl) tetrazole. , 5-nitrobenzotriazole, 4-nitrobenzotriazole, 5-nitroimidazole, 4-nitroimidazole and the like. These development-inhibiting compounds are TN
At the -CO- or -COCO- site to which the HNH- group is bonded, directly or via an alkylene such as a hetero atom such as N or S,
By bonding via a phenylene, aralkylene, or arylene group and further via a heteroatom of N or S, the timing until the development inhibitory property after separation can be controlled. In addition, a development inhibitor such as triazole, indazole, imidazole, thiazole or thiadiazole may be introduced into a hydroquinone compound having a ballast group. For example, 2- (dodecylethylene oxide thiopropionic acid amide) -5- (5
-Nitroindazol-2-yl) hydroquinone, 2
-(Stearylamido) -5- (1-phenyltetrazol-5-thio) hydroquinone, 2- (2,4-di-
t-amylphenoxypropionic acid amide) -5- (5
-Nitrotriazol-2-yl) hydroquinone, 2
-Dodecylthio-5- (2-mercaptothiothiadiazole-5-thio) hydroquinone and the like can be mentioned.

The above redox DIR compound can be synthesized with reference to the description in US Pat. No. 4,269,929.

The above redox DIR compound can be used in any layer as long as it is a photographic constituent layer on the silver halide emulsion layer side. In the present invention, it is used as a non-photosensitive hydrophilic colloid layer adjacent to the support side. Used.

The addition of the redox DIR compound described above
Dissolve in alcohols such as methanol and ethanol, glycols such as ethylene glycol, triethylene glycol and propylene glycol, ethers, esters such as dimethylformamide, dimethylsulfoxide, tetrahydrofuran and ethyl acetate, and ketones such as acetone and methyl ethyl ketone. Can be added later. Further, those which are difficult to dissolve in water or an organic solvent can be arbitrarily dispersed with an average particle diameter of 0.01 to 6 μm by high speed impeller dispersion, sand mill dispersion, ultrasonic dispersion, ball mill dispersion or the like. For dispersion, a surfactant such as an anion or nonion, a thickener, a latex, or the like can be added and dispersed.

The amount of the redox DIR compound added is
It is from 10 ^-6 mol to 10 ^-1 mol, preferably from 10 ^-4 mol to 10 ^-2 mol, per mol of silver halide.

Among the compounds represented by the general formula [RE-a] or [RE-b], particularly preferable compounds are shown below.

[0104]

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[0105]

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Specific examples of other preferable redox DIR compounds include 2 of JP-A-4-245243.
36 (8) page "0053" to 250 (22) page "006"
R-1 to R-50 described in "8."

Next, the general formulas [3], [4],
The redox DIR compound represented by [5], [6], [7] or [8] will be described.

General formulas [3], [4], [5], [6],
In [7] or [8], R ₁₁ represents an alkyl group, an aryl group or a heterocyclic group. R ₁₂ and R ₁₃ represent a hydrogen atom, an acyl group, a carbamoyl group, a cyano group, a nitro group, a sulfonyl group, an aryl group, an oxalyl group, a heterocyclic group, an alkoxycarbonyl group or an aryloxycarbonyl group. R ₁₄ represents a hydrogen atom. R _{15 to} R ₁₉ represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group. r ₁ , r ₂ and r ₃ represent a substituent capable of substituting on the benzene ring. X ₄ , X
₅ represents O or NH. Z represents an atomic group necessary for forming a 5- or 6-membered heterocycle. W represents N (R ₅₀ ) R ₅₁ or OH, and R ₅₀ and R ₅₁ are a hydrogen atom, an alkyl group,
It represents an aryl group or a heterocyclic group. COUP is aromatic first
Represents a coupler residue capable of causing a coupling reaction with an oxidized form of a secondary amine developing agent, and * represents a coupling site of the coupler. Tm represents a timing group. m ₁ and p ₁ represent an integer of 0 to 3. q ₁ represents an integer of 0 to 4.
n represents 0 or 1. PUG represents a group which is released and becomes a development inhibiting compound.

The above general formulas [3], [4], [5],
In the formula [6], [7] or [8], R ₁₁ , R ₁₅ to
An alkyl group represented by R ₁₉ , R ₅₀ and R ₅₁ , an aryl group,
Preferred examples of the heterocyclic group include a methyl group, a p-methoxyphenyl group, and a pyridyl group. Among the acyl group, carbamoyl group, cyano group, nitro group, sulfonyl group, aryl group, oxalyl group, heterocyclic group, alkoxycarbonyl group and aryloxycarbonyl group represented by R ₁₂ and R ₁₃ , preferably acyl group and carbamoyl group. Base,
It is a cyano group. The total carbon number of these groups is 1 to 20.
It is preferred that R _{11 to} R ₁₉ , R ₅₀ , and R ₅₁ may further have a substituent, and examples of the substituent include a halogen atom (chlorine atom, bromine atom, etc.), an alkyl group (for example, a methyl group, an ethyl group, Isopropyl group, hydroxyethyl group, methoxymethyl group, trifluoromethyl group,
t-butyl group etc.), cycloalkyl group (eg cyclopentyl group, cyclohexyl group etc.), aralkyl group (eg benzyl group, 2-phenethyl group etc.), aryl group (eg phenyl group, naphthyl group, p-tolyl group, p -Chlorophenyl group, etc.), an alkoxy group (for example, a methoxy group,
Ethoxy group, isopropoxy group, butoxy group etc.), aryloxy group (eg phenoxy group etc.), cyano group, acylamino group (eg acetylamino group, propionylamino group etc.), alkylthio group (eg methylthio group,
Ethylthio group, butylthio group etc.), arylthio group (eg phenylthio group etc.), sulfonylamino group (eg methanesulfonylamino group, benzenesulfonylamino group etc.), ureido group (eg 3-methylureido group,
3,3-dimethylureido group, 1,3-dimethylureido group, etc.), sulfamoylamino group (dimethylsulfamoylamino group, etc.), carbamoyl group (eg, methylcarbamoyl group, ethylcarbamoyl group, dimethylcarbamoyl group, etc.) , A sulfamoyl group (eg, ethylsulfamoyl group, dimethylsulfamoyl group, etc.), an alkoxycarbonyl group (eg, methoxycarbonyl group, ethoxycarbonyl group, etc.), an aryloxycarbonyl group (eg, phenoxycarbonyl group, etc.), a sulfonyl group (eg, Methanesulfonyl group, butanesulfonyl group, phenylsulfonyl group etc.), acyl group (eg acetyl group, propanoyl group, butyroyl group etc.), amino group (methylamino group, ethylamino group, dimethylamino group etc.), hydroxyl group, nitro , An imido group (e.g. phthalimido group), a Hajime Tamaki (e.g., pyridyl, benzimidazolyl group, benzothiazolyl group, benzoxazolyl group). Examples of the coupler residue represented by COUP include the following. Examples of cyan coupler residues include phenol couplers and naphthol couplers. Examples of magenta couplers include 5-pyrazolone couplers, pyrazolone couplers, cyanoacetylcoumarone couplers, open chain acylacetonitrile couplers, and indazolone couplers. Examples of the yellow coupler residue include a benzoylacetanilide coupler, a pivaloylacetanilide coupler, and a malondianilide coupler. Colorless coupler residues include open-chain or cyclic active methylene compounds (for example, indanone, cyclopentanone,
Malonic acid diester, imidazolinone, oxazolinone, thiazolinone, etc.). Further, among the coupler residues represented by COUP, those which are preferably used in the present invention are represented by the general formula (Coup-1) to the general formula (Coup-
It can be represented by 8).

[0110]

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In the formula, R ₅₆ represents an acylamido group, anilino group or ureido group, and R ₅₇ represents a phenyl group which may be substituted with one or more halogen atoms, alkyl groups, alkoxy groups or cyano groups.

[0112]

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In the formula, R ₅₈ and R _{59 each} represent a halogen atom, an acylamido group, an alkoxycarbonylamido group, a sulfourido group, an alkoxy group, an alkylthio group, a hydroxy group or an aliphatic group, and R ₆₀ and R ₆₁ each represent a fatty acid. It represents a group group, an aromatic group or a heterocyclic group. Further, one of R ₆₀ and R ₆₁ may be a hydrogen atom. a is an integer of 1 to 4, b
Represents an integer of 0 to 5. When a and b are plural, R ₅₈ may be the same or different, and R ₅₉ may be the same or different.

[0114]

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In the formula, R ₆₂ represents a tertiary alkyl group or an aromatic group, and R ₆₃ represents a hydrogen atom, a halogen atom or an alkoxy group. R ₆₄ represents an acylamide group, an aliphatic group, an alkoxycarbonyl group, a sulfamoyl group, a carbamoyl group, an alkoxy group, a halogen atom or a sulfonamide group.

[0116]

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In the formula, R ₆₅ represents an aliphatic group, an alkoxy group, an acylamino group, a sulfonamide group, a sulfamoyl group, a diacylamino group, and R ₆₆ represents a hydrogen atom, a halogen atom or a nitro group.

[0118]

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R ₆₇ and R ₆₈ represent a hydrogen atom, an aliphatic group, an aromatic group or a heterocyclic group.

As the 5- or 6-membered heterocycle represented by Z,
It may be a single ring or a condensed ring, and examples thereof include a 5- or 6-membered heterocycle having at least one kind of O, S, and N atoms in the ring. These rings may have a substituent, and specific examples thereof include the above-mentioned substituents.

The timing group represented by Tm is preferably —OCH ₂ — or another divalent timing group, for example, US Pat. Nos. 4,248,962 and 4,409,3.
No. 23, or No. 3,674,478, Research
Disclosure 21228 (December 1981)
Month), or JP-A-57-56837 and JP-A-4-43.
No. 8 and the like.

Preferred development inhibitors for PUG include, for example, US Pat. No. 4,477,563 and JP-A-60-218.
No. 644, No. 60-221750, No. 60-2336
No. 50, or the development inhibitor described in No. 61-11743.

Specific examples of the compounds represented by the general formulas [3] to [8] are listed below, but the invention is not limited thereto.

[0124]

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[0125]

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[0126]

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[0127]

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[0128]

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[0129]

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[0130]

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The compounds represented by the above general formulas [3] to [8] are used in the non-photosensitive hydrophilic colloid layer closest to the support.

The compounds represented by the above general formulas [3] to [8] are suitable water-miscible organic solvents such as alcohols,
It can be used by dissolving it in ketones, dimethyl sulfoxide, dimethylformamide, methyl cellosolve and the like. It is also possible to add it as an emulsified dispersion using a known oil. Further, the compound powder may be dispersed in water by a ball mill, a colloid mill, an impeller disperser, or ultrasonic waves according to a method known as a solid dispersion method.

The addition amount of the compounds represented by the above general formulas [3] to [8] is from 10 ^-6 to 10 ^-1 mol, preferably from 10 ^-4 to 1 per mol of silver halide.
It is in the range of 0 ^-2 mol.

In the present invention, generally known sulfur sensitization, Se, Te sensitization, reduction sensitization and noble metal sensitization methods may be appropriately selected and used in combination, and chemical sensitization is not performed. May be.

As the sulfur sensitizer, various sulfur compounds such as thiosulfates, thioureas, rhodanins and polysulfide compounds can be used in addition to the sulfur compounds contained in gelatin. As the Se sensitizer, triphenylselenophosphine or the like is preferably used.

A wide variety of selenium compounds can be used as the selenium sensitizer. For example, US Pat.
74,944, 1,602,592, 1,62
3,499, JP-A-60-150046, JP-A-4
-25832, 4-109240, 4-147.
Compounds described in No. 250 and the like can be used. As a useful selenium sensitizer, colloidal selenium metal,
Isoselenocyanates (eg, allyl isoselenocyanate), selenoureas (eg, N, N-dimethylselenourea, N, N, N′-triethylselenourea,
N, N, N'-trimethyl-N'-heptafluoroselenourea, N, N, N'-trimethyl-N'-heptafluoropropylcarbonylselenourea, N, N, N'-trimethyl-N'-4- Nitrophenylcarbonylselenourea, etc.), selenoketones (eg, selenoacetone,
Selenoacetophenone, etc.), selenoamides (eg,
Selenoacetamide, N, N-dimethylselenobenzamide, etc.), selenocarboxylic acids and selenoesters (eg, 2-selenopropionic acid, methyl-3-selenobutyrate, etc.), and selenophosphates (eg,
Tri-p-triselenophosphate and the like) and selenides (triphenylphosphine selenide, diethyl selenide, diethyl diselenide and the like). Particularly preferred selenium sensitizers are selenoureas, selenamides, selenoketones, and selenides.

The amount of the selenium sensitizer used varies depending on the selenium compound used, silver halide grains, chemical ripening conditions, etc., but is generally about 10 ^-8 to 10 ^-4 mol per mol of silver halide.

The temperature of the chemical ripening using the selenium sensitizer is 4
The range is preferably from 0 to 90 ° C, more preferably from 45 ° C to 80 ° C. The pH is 4-9 and the pAg is 6
The range of -9.5 is preferable.

As a method for adding these sensitizers, if they are water-soluble, they can be added as they are, but if they are poorly soluble in water, various methods can be adopted. For example, there is a method in which a sulfur sensitizer and / or a selenium sensitizer and / or a tellurium sensitizer are sufficiently mixed in advance with a gelatin solution and then added. Alternatively, a method of dissolving in a low-boiling organic solvent in which a sensitizer is dissolved and then emulsifying and dispersing in the presence of a surfactant to add the sensitizer can also be adopted.
In this method, it is preferable to remove the low-boiling organic solvent after emulsification and dispersion. Further, the method disclosed in JP-A-4-140739 may be added in the form of an emulsified dispersion of a mixed solution of a water-insoluble polymer and an organic solvent-soluble polymer. Also, among the noble metal sensitization methods which can employ a method of arbitrarily dispersing the average particle diameter from 0.01 to 6 μm by high-speed impeller dispersion, sand mill dispersion, ultrasonic dispersion, ball mill dispersion, etc., gold sensitization is a typical one. And a gold compound, mainly a gold complex salt. Noble metals other than gold, for example, complex salts such as platinum, palladium, and rhodium may be contained.

Examples of the reduction sensitizer include stannous salt, amines,
Formamidinesulfinic acid, silane compounds and the like can be used.

Further, in the present invention, an oxidizing agent for silver can be used in the manufacturing process of the light-sensitive material. The oxidizing agent usable in the present invention, for example, as inorganic oxidizing agent, hydrogen peroxide (water), adducts of hydrogen peroxide (e.g., _{NaBO 2 · H 2 0 2 ·} 3H 2 O, 2N
_{aCO 3 · 3H 2 O 2,} Na 4 P 2 O 7 · 2H 2 O 2, 2Na 2
SO ₄ .H ₂ O ₂ .2H ₂ O, etc., peroxy acid salts (for example, K ₂ S ₂ O ₈ , K ₂ C ₂ O ₆ , K ₄ P ₂ O ₈ ), peroxy complex compounds (for example, K ₂ [ Ti (O ₂ ) C ₂ O ₄ ] · 3H
₂ O, 4K ₂ SO ₄ .Ti (O ₂ ) .OH.SO ₄ .2H
_{2 O, Na 2 [VO (} O 2)] (C 2 O 4) 2 · 6H 2 O , etc.), oxygen, such as permanganate (e.g., KMnO _4), chromates (e.g. K ₂ CrO, etc.) Acid salts, halogen elements such as iodine and bromine, perhalates (eg, potassium periodate), high-valent metal salts (eg, potassium ferricyanide), and thiosulfonates.

Examples of the organic oxidant include quinones such as p-quinone, organic peroxides such as peracetic acid and perbenzoic acid, and compounds that release active halogen (for example, N-bromosuccinimide, chloramine T, chloramine). (B etc.) are mentioned as an example.

Particularly preferred oxidizing agents are ozone, hydrogen peroxide and its adducts, inorganic oxidizing agents of halogen elements, quinones and organic oxidizing agents releasing active halogen.

The addition amount of the oxidizing agent to silver used in the present invention is preferably 10 ^-7 to 10 ^-1 mol per mol of silver halide. More preferably, 10 ^-6 to 10
^-2 mol, particularly preferably 10 ^-5 to 10 ^-3 mol.

In order to add the oxidizing agent for silver used in the present invention during the chemical sensitization step, a method usually used when adding an additive to a photographic emulsion can be applied. For example, a water-soluble compound is prepared as an aqueous solution having an appropriate concentration, and a water-insoluble or hardly soluble compound is dissolved in a suitable organic solvent miscible with water, such as alcohols, glycols, ketones, esters, and amides. Can be dissolved in a solvent that does not adversely affect the photographic properties and can be added. Further, it can be added in a solid dispersion state.

The oxidizing agent may be added to silver used in the present invention at any time during the process for producing the silver halide sensitizing material, but the preferred period is from the step of preparing silver halide grains to the coating on a support. This is the process up to immediately before.

In the present invention, the halogen composition of the silver halide in the silver halide emulsion is pure silver chloride, silver chlorobromide containing 60 mol% or more of silver chloride or chloroiodo containing 60 mol% or more of silver chloride. It is preferably silver bromide. The average grain size of silver halide is preferably 0.7 μm or less, and particularly preferably 0.5 to 0.1 μm. The average particle size is a term that is commonly used by experts in the field of photographic science and is easily understood. The particle size means a particle diameter when the particles are spherical or spherical particles. If the particles are cubic, they are converted into spheres, and the diameter of the sphere is defined as the particle size. For details on how to determine the average particle size, see Mees,
James: The Theory of the Photographic Process (CE Mees & TH James)
Written by: Theory of the photog
rapic process), 3rd edition, 36-43
Pp. 1966 (published by Macmillan "Mcmillan").

The shape of silver halide grains is not limited,
The shape may be flat, spherical, cubic, tetrahedral, octahedral, or any other shape. Further, it is preferable that the particle size distribution is narrow, and in particular, the total number of particles is 9% within a particle size range of ± 40% of the average particle size.
A so-called monodisperse emulsion containing 0%, preferably 95%, is preferable.

As the method of reacting the soluble silver salt and the soluble halogen salt, any of a one-sided mixing method, a simultaneous mixing method and a combination thereof may be used. A method of forming grains in the presence of excess silver ions (a so-called reverse mixing method) can also be used. A method of maintaining a constant pAg in a liquid phase in which silver halide is formed, as one type of the double jet method;
That is, a so-called controlled double jet method can be used. According to this method, a silver halide emulsion having a regular crystal form and a nearly uniform grain size can be obtained.

The silver halide grains used in the silver halide emulsion are cadmium salt, zinc salt, lead salt, thallium salt, iridium salt, rhodium salt and ruthenium salt in at least one of the grain forming process and the growing process. It is preferable to add a complex salt containing an element of Groups 3 to 13 of the periodic table such as an osmium salt, an iron salt, a copper salt, a platinum salt, and a palladium salt. As the ligand of these complex salts, a halogen atom, a nitrosyl group, a cyano group, an aquo group, an alkyl group, a pseudohalogen group, an alkoxy group, an ammonium group, and any combination thereof can be used.

The surface of the silver halide grains can be controlled in the halogen composition by using a water-soluble halide or fine silver halide grains. This technique is known in the art as conversion and is widely known.

The silver halide grains may be uniform from the inside to the surface, or may be composed of a plurality of layers having different halogen compositions, dopant species and amounts, distribution of lattice defects and the like.

In the present invention, as the silver halide grains, the grain size, sensitivity, crystal habit, photosensitive wavelength, halogen composition, monodispersity, amount and type of doping agent, potential, pH, desalting method and the like are manufactured. A plurality of types of particles having different conditions, surface states, chemically sensitized states and the like can be used in combination. In that case, these silver halide grains may be contained in the same layer, or may be contained in a plurality of different layers.

For details of the silver halide emulsion and its preparation method, see Research Disclosure (Res).
(Earth Disclosure) 176 No. 1764
3, pages 22 to 23 (December 1978).

Sensitizing dyes that can be used in the silver halide emulsion according to the present invention include cyanine dyes, merocyanine dyes, complex cyanine dyes, complex merocyanine dyes, holopolar cyanine dyes, hemicyanine dyes, styryl dyes and hemioxonol. A dye is included. Any of nuclei usually used for cyanine dyes as basic heterocyclic nuclei can be applied to these dyes. That is, a pyrroline nucleus, an oxazoline nucleus, a thiazoline nucleus, a pyrrole nucleus, an oxazole nucleus, a thiazole nucleus, a selenazole nucleus, an imidazole nucleus, a tetrazole nucleus, a pyridine nucleus, etc .; a nucleus in which an alicyclic hydrocarbon ring is fused to these nuclei; and these Nuclei of aromatic hydrocarbon rings fused to the nuclei of indolenin, benzindolenine, indole, benzoxazole, naphthoxazole, benzothiazole, naphthothiazole, benzoselenazole, benzimidazole , Quinoline nucleus, etc. can be applied. These nuclei may be substituted on carbon atoms. In the merocyanine dye or the complex merocyanine dye, as a nucleus having a ketomethylene structure, a pyrazolin-5-one nucleus, a thiohydantoin nucleus, a 2-thiooxazolidine-2,4-dione nucleus,
A 5-6 membered heterocyclic ring such as a thiazolidine-2,4-dione nucleus, a rhodanine nucleus, a thiobarbituric acid nucleus can be applied. Specifically, Research Disclosure Vol. 176, RD-17643 (December 1978 issue) No. 2
・ Page 3, U.S. Pat. Nos. 4,425,425 and 4,42
No. 5,426 can be used. The sensitizing dye may be dissolved by using ultrasonic vibration described in U.S. Pat. No. 3,485,634. In addition, as a method of dissolving or dispersing a sensitizing dye and adding it to an emulsion, US Pat. Nos. 3,482,981 and 3,
Nos. 585,195, 3,469,987, 3,4
25,835, 3,342,605, British Patents 1,271,329, 1,038,029, 1,121,174, and U.S. Patent 3,660,101.
No. 3,658,546 can be used. These sensitizing dyes may be used alone,
Combinations of these may be used, and combinations of sensitizing dyes are often used particularly for supersensitization. Useful supersensitizing dye combinations and supersensitizing substances are described in Research Disclosure (Research).
h Disclosure) Volume 176 17643 (19
Issued December 1978), page 23, IV, section J.

The light-sensitive material used in the present invention may contain various compounds for the purpose of preventing fog during the production process of the light-sensitive material, during storage or during photographic processing, or stabilizing photographic performance. . That is, azoles such as benzothiazolium salts, nitroindazoles, nitrobenzimidazoles, chlorobenzimidazoles,
Bromobenzimidazoles, mercaptothiazoles, mercaptobenzothiazoles, mercaptobenzimidazoles, mercaptothiadiazoles, aminotriazoles, benzotriazoles, nitrobenzotriazoles, mercaptotetrazole (particularly 1-
Phenyl-5-mercaptotetrazole) and the like; mercaptopyrimidines, mercaptotriazines; thioketo compounds such as oxazoline thione; azaindenes such as triazaindenes, tetrazaindenes (particularly 4-hydroxy-substituted-1,3,3) 3a, 7-Tetrazaindenes), pentazaindenes and the like; many compounds known as antifoggants or stabilizers such as benzenethiosulfonic acid, benzenesulfinic acid, benzenesulfonic acid amide, potassium bromide and the like. Can be added. Particularly preferred are a substituted or unsubstituted heterocyclic or fused heterocyclic ring containing any of N, O, S and Se, and a water-soluble halide.

The photographic emulsion and the non-photosensitive hydrophilic colloid according to the present invention may contain an inorganic or organic hardener.
For example, chromium salts (chromium alum, chromium acetate, etc.), aldehydes (formaldehyde, glyoxal, glutaraldehyde, etc.), N-methylol compounds (dimethylolurea, methyloldimethylhydantoin, etc.), dioxane derivatives (2,3-dihydroxydioxane, etc.), Active vinyl compounds (1,3,5-triacryloyl-hexahydro-s-triazine, bis (vinylsulfonyl) methyl ether, N, N'-methylenebis- [β- (vinylsulfonyl) propionamide], etc.), active halogen compounds (2,4-dichloro-6-hydroxy-s-triazine and the like), mucohalic acids (mucochloric acid, phenoxymucochloric acid and the like) isoxazoles, dialdehyde starch, 2-chloro-6-hydroxytriazinylated gelatin , Isocyan Over preparative acids, the carboxyl group activated hardeners, etc., may be used alone or in combination.

The photosensitive emulsion layer and / or the non-photosensitive hydrophilic colloid layer used in the present invention have various purposes such as coating aid, antistatic property, slipperiness improvement, emulsion dispersion, adhesion prevention and photographic property improvement. In the above, various known surfactants may be used.

Gelatin is advantageously used as the binder or protective colloid of the photographic emulsion, but other hydrophilic colloids can also be used. For example, gelatin derivatives, graft polymers of gelatin and other polymers, proteins such as albumin and casein; cellulose derivatives such as hydroxyethylcellulose, carboxymethylcellulose and cellulose sulfates; sugar derivatives such as sodium alginate and starch derivatives; polyvinyl alcohol , Polyvinyl alcohol partial acetal, poly-N-
Various kinds of synthetic hydrophilic high-molecular substances such as homo- or copolymers such as vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide, polyvinylimidazole, and polyvinylpyrazole can be used.

Examples of gelatin include lime-processed gelatin,
Acid-treated gelatin may be used, gelatin hydrolyzate,
Enzymatic degradation products of gelatin can also be used.

The photographic emulsion of the present invention may contain a dispersion of a water-insoluble or sparingly soluble synthetic polymer for the purpose of improving dimensional stability, reducing silver sludge and the like. For example, alkyl (meth) acrylate, alkoxyacryl (meth)
Acrylate, glycidyl (meth) acrylate, (meth) acrylamide, vinyl ester (for example, vinyl acetate), acrylonitrile, olefin, styrene and the like alone or in combination, or acrylic acid, methacrylic acid, α, β-unsaturated dicarboxylic acid, A polymer having a combination of hydroxyalkyl (meth) acrylate, sulfoalkyl (meth) acrylate, styrene sulfonic acid and the like as a monomer component can be used. A monomer having a plurality of ethylenically unsaturated groups may be used as a monomer component. These monomers may have a water-soluble group such as a hydroxyl group, a sulfone group, a carboxyl group, and an amide group, and may have a primary to quaternary amino group, a phosphonium group, an aliphatic group, an aromatic group, -NR ₆₁ NR ₆₂ -R ₆₃ (R ₆₁ , R ₆₂ , R
₆₃ may be different from each other hydrogen atom, aliphatic group, aromatic group, sulfinic acid residue, carbonyl group, oxalyl group, carbamoyl group, amino group, sulfonyl group, sulfoxy group, iminomethylene group, alkenyl group, alkynyl Group, aryl group, alkoxy group, alkenyloxy group,
Any group bonded via an alkynyloxy group, an aryloxy group, or the like), a cationic group, or the like. As a synthesis method, in addition to a usual synthesis method, polymerization may be performed in the presence of a water-soluble organic substance such as gelatin or polyvinyl alcohols. After completion of the synthesis, shelling may be performed with gelatin or a silane coupling agent.

Various other additives are used in the light-sensitive material used in the present invention. For example, desensitizers, plasticizers, slip agents, development accelerators, oils, colloidal silica, and the like can be used. Regarding these additives and the above-mentioned additives, specifically, Research Disclosure 17
No. 6 (supra), pages 22-31, etc. can be used.

In the light-sensitive material of the present invention, the photographic constituent layer is coated on one side or both sides of a flexible support usually used for light-sensitive materials. Useful as flexible supports are
Cellulose acetate, cellulose acetate butyrate, polystyrene,
A film made of a synthetic polymer of polyethylene terephthalate or polyethylene terephthalate (these may contain a colored pigment), or a paper support coated with a polymer such as polyethylene or polyethylene terephthalate. These supports may have a magnetic recording layer, an antistatic layer, and a release layer.

Regarding the processing of the light-sensitive material according to the present invention, various known processing, in particular, various processing agents, processing methods, and processing equipment used for light-sensitive materials for printing plate making can be used.

[0165]

EXAMPLES The effects of the present invention will be illustrated below with examples.

Example 1 (Preparation of silver halide emulsion A) Aqueous silver nitrate solution A and Na
Aqueous halide aqueous solution B consisting of Cl and KBr was added at a silver potential (EAg) of 120 mV, pH 3.0, and 35 ° C. in solution C by the simultaneous mixing method for 7 minutes to obtain 0.09 μm of AgCl _70.
Br ₃₀ nuclei were formed. After this, adjust the silver potential to 100 with NaCl.
mV, and again a silver nitrate aqueous solution D and a water-soluble halide solution E
Was added for 15 minutes, and the particle size was 0.20 μm (variation coefficient 15
%) AgCl ₇₀ Br ₃₀ was obtained. After that, the pH was adjusted to 5.6 with a 1N-NaOH aqueous solution, and S-1 was added at 2 × 1 per mol of silver.
0 ⁻⁴ mol was added and the mixture was aged at 50 ° C. for 10 minutes. After that, modified gelatin treated with phenyl isocyanate was added, and the flocs were washed with water at pH 4.2, and after washing with water, 1 mol of silver was added.
15 g of gelatin was added to adjust the pH to 5.7 and 55
Disperse at 30 ° C. for 30 minutes. The silver potential of the finished emulsion is 1
It was 90 mV (40 ° C.).

Solution A Silver nitrate 16 g Nitric acid 5% 5.3 ml Ion-exchanged water 48 ml Solution B NaCl 3.8 g KBr 3.5 g Ocein gelatin 1.7 g Ion-exchanged water 48 ml Solution C NaCl 1.4 g Ocein gelatin 7 g Nitric acid 5% 6.5 ml K ₂ RhCl ₅ (H ₂ O) 0.06 mg ion-exchanged water 700 ml D liquid silver nitrate 154 g nitric acid 5% 4.5 ml ion-exchanged water 200 ml E liquid NaCl 37 g KBr 33 g ossein gelatin 6 g K ₂ RhCl ₅ (H ₂ O) 0.04 mg ion-exchanged water 200 ml The resulting emulsion was treated with 4-hydroxy-6-methyl-1,3,3.
1.5 mol of 3a, 7-tetrazaindene per 1 mol of silver
× 10 ^-3 mol, potassium bromide 8.5 × 10 ^-4 mol
Was adjusted to pH 5.6 and EAg123mv.
Finely dispersed (saponin added and dispersed on a planetary ball mill to an average of 0.5 μm). 2 × 10 ⁻⁵ mol of sulfur white as a sulfur atom and 1.5 × 10 ⁻⁵ m of chloroauric acid.
ol was added and chemical ripening was performed at a temperature of 60 ° C. for 80 minutes, and then 4-hydroxy-6-methyl-1,3,3a, 7-tetrazaindene was added in an amount of 2 × 10 ⁻³ mol per mol of silver and 1
-Phenyl-5-mercaptotetrazole in 3 × 10 ^-4
mol and potassium iodide (1.5 × 10 ⁻³ mol) were added. After cooling to 40 ° C, sensitizing dye S-2 was added to silver 1mo.
2 × 10 ⁻⁴ mol was added per liter.

(Preparation of silver halide emulsion B) K of solution C
₂ RhCl ₅ (H ₂ O) was 0.10 mg and the mixing temperature was 40 ° C.
5 μm (coefficient of variation 15%) AgCl ₇₀ Br ₃₀ was obtained. After that, chemical sensitization and color sensitization were performed in the same manner as in Emulsion A.

(Preparation of Light-Sensitive Materials 101-105) A redox DIR compound layer, a solid disperse dye layer, and a redox DIR compound layer each having the following formulation from the support side are formed on a support subjected to an undercoating process.
After simultaneously coating each layer of [silver halide emulsion layer] and [emulsion protective layer] and cooling and setting, [backing layer] and [backing protective layer] from the support side to the undercoat layer on the opposite side.
Samples 101-105 were obtained by simultaneous multilayer coating, cooling set at -1 ° C, and drying both surfaces simultaneously.

(Preparation of coating solution) [Redox DIR compound layer] Silver halide emulsion B Ag amount 0.3 g / m ² Gelatin 0.3 g / m ² Saponin 60 mg / m ² Redox DIR compound 21 dispersion 50 mg / m ² [solid disperse dye layer] gelatin 1.0 g / m ² solid disperse dye 9-24 50 mg / m ² polymer latex L2 0.3 g / m ² sodium dodecylbenzenesulfonate 20 mg / m ² [silver halide emulsion layer] halogen Silver halide emulsion A Ag amount 3.3 g / m ² Gelatin 1.7 g / m ² Hydrazine derivative H-7 10 mg / m ² Nucleation accelerator Na-21 5 mg / m ² Polymer latex L1 (particle size 0.25 μm) 0 0.25 g / m ² sodium-iso-amyl-n-decylsulfosuccinate 2 mg / m ² sodium naphthalene sulfonate 8 mg / m ² Saponin 20 mg / m ² 2-mercapto-6-hydroxy-purine 2 mg / m ² 2-Merukafu ° topics lysine 1 mg / m ² Colloidal silica (average particle size 0.05μm) 150mg / m ² of ascorbic acid ^{20mg / m 2 EDTA 25mg / m} 2 Sodium polystyrene sulfonate 15 mg / m ^{2 The} coating solution pH was 5.2.

[Protective Layer] Gelatin 0.7 g / m ² Sodium-iso-amyl-n-decylsulfosuccinate 12 mg / m ² Matting agent: Spherical polymethylmethacrylate 25 mg / m ² average particles having an average particle diameter of 3.5 μm Diameter 8 μm Amorphous silica 12.5 mg / m ² Hydroquinone 50 mg / m ² Sliding agent Polymer latex L3 (particle size 0.10 μm) 0.25 g / m ² Hardener h1 30 mg / m ² Sodium polystyrene sulfonate 10 mg / m ² Bactericide z 0.5 mg / m ² [Backing layer formulation] Gelatin 0.6 g / m ² Sodium-i-amyl-n-decylsulfosuccinate 5 mg / m ² Polymer latex L3 0.3 g / m ² Colloidal silica (average particle size 0.05 μm) 100 mg / m ² Sodium polystyrene sulfonate 10 mg / m ² Dye f1 45 mg / m ² Dye f2 25 mg / m ² Dye f3 30 mg / m ² 1-Phenyl-5-mercaptotetrazole 10 mg / m ² Hardener h2 100 mg
/ M ² Zinc hydroxide 50 mg / m ² EDTA 50 mg / m ² [Backing protective layer formulation] Gelatin 0.4 g / m ² Matting agent: Monodisperse polymethylmethacrylate 50 mg / m ² sodium-di (2 -Ethylhexyl) sulfosuccinate 10 mg / m ² Sodium polystyrene sulfonate 10 mg / m ^{2 The} compounds used for each layer are shown below.

[0172]

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[0173]

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[0174]

[Table 1]

[0175]

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From the results shown in Table 1, it is understood that the addition of the sliding agent markedly reduces the dynamic friction coefficient.

(Preparation of Photosensitive Material 301) 301 was prepared by changing the order of the sample 101, the solid disperse dye layer and the redox DIR compound layer. Silicone A was added as the slip agent in this case at 60 mg / m ² .

(Preparation of Light-Sensitive Materials 201-204) A solid dispersion dye layer, a silver halide emulsion layer, an intermediate layer having the following formulation from the support side is formed on a support which has been subjected to an undercoating process. [Redox DIR compound layer], [Emulsion protective layer]
After simultaneous multilayer coating of each layer as shown in Table 1 and cooling and setting, the same [backing layer] and [backing protective layer] as those of Samples 101 to 105 were simultaneously multilayer coated at -1 ° C.
Sample 20 by cooling and setting on both sides and drying both sides simultaneously
We obtained 1-204.

(Preparation of coating liquid) [Solid disperse dye layer] Gelatin 0.5 g / m ² Solid disperse dye 9-24 50 mg / m ² Polymer latex L2 0.3 g / m ² Sodium dodecylbenzenesulfonate 20 mg / m ² [Silver Halide Emulsion Layer] Silver Halide Emulsion A Ag amount 3.3 g / m ² Gelatin 1.7 g / m ² Hydrazine derivative H-7 10 mg / m ² Nucleation accelerator Na-21 5 mg / m ² Polymer latex L1 (Particle size 0.25 μm) 0.25 g / m ² Sodium-iso-amyl-n-decylsulfosuccinate 2 mg / m ² sodium naphthalenesulfonate 8 mg / m ² saponin 20 mg / m ² 2-mercapto-6-hydroxypurine 2 mg / m ² 2-mercaptopyridine 1 mg / m ² colloidal silica (average particle size 0.05 μm) 150 mg / m ² Ascorbic acid 20 mg / m ² EDTA 25 mg / m ² Sodium polystyrene sulfonate 15 mg / m ² Coating solution pH was 5.2.

[Intermediate Layer] Gelatin 1.0 g / m ² Polymer latex L2 0.3 g / m ² Sodium dodecylbenzenesulfonate 20 mg / m ² [Redox DIR compound layer] Silver halide emulsion B Ag amount 0.3 g / m ² Gelatin 0.3 g / m ² Saponin 60 mg / m ² Redox DIR compound 21 dispersion (Sample No. 201 to 203) 50 mg / m ² (Sample No. 204) 100 mg / m ² [Protective layer] Gelatin 0.2 g / M ² Sodium-iso-amyl-n-decyl sulfosuccinate 12 mg / m ² Matting agent: spherical polymethylmethacrylate having an average particle diameter of 3.5 μm 25 mg / m ² Average particle diameter 8 μm amorphous silica 12.5 mg / m ² hydroquinone 50 mg / m ² lubricant silicone A 60 mg / m ² polymer latex L3 (particle size 0. 0 .mu.m) strikes the coating of 0.25 g / m ² hardener h1 30 mg / m ² Sodium polystyrenesulfonate 10 mg / m ² fungicide z 0.5 mg / m ² each sample, the wet film thickness, redox DIR layer 15μm , Solid disperse dye layer 20 μm,
The silver halide emulsion layer was 25 μm, the protective layer was 15 μm, and the total film thickness was 75 μm.

[Backing layer] and [Backing protection layer] are the same as 101.

Incidentally, 101-105, 201-204, 3
01, the redox compound 21 is the following (dispersion A)
It was dispersed by the method.

(Dispersion A) Redox compound 21 (5 g) was dissolved in ethyl acetate (100 ml) to prepare gelatin (20 g) and water (2).
00 ml and 0.5 g of isopropyl naphthalene sulfonic acid sodium salt were added, and ethyl acetate was distilled off under reduced pressure while dispersing using a PD disperser to obtain a dispersion.

(Treatment) The following treatments were performed on each of the obtained samples.

Developer composition Per 1 liter of working solution Diethyltriamine pentaacetic acid / 5 sodium salt 1 g Sodium sulfite 42.5 g Potassium sulfite 17.5 g Potassium carbonate 55 g Hydroquinone 20 g 1-Phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone 0.85 g potassium bromide 4 g 5-methylbenzotriazole 0.2 g boric acid 8 g diethylene glycol 40 g 8-mercaptoadenine 0.07 g KOH was added in an amount such that the working solution had a pH of 10.4.

Fixer Composition Per 1 liter of solution used Ammonium thiosulfate (70% aqueous solution) 200 ml Sodium sulfite 22 g Boric acid 9.8 g Sodium acetate trihydrate 34 g Acetic acid (90% aqueous solution) 14.5 g Tartaric acid 3.0 g Aluminum sulfate (27 % Aqueous solution) 25 ml sulfuric acid was used to adjust the pH of the working solution to 4.9.

[0187] (Evaluation of Sample) The following evaluation was performed on each of the obtained samples, and the results shown in Table 2 were obtained.

[Measurement of Sensitivity] The obtained sample was brought into close contact with a step wedge, and the sample was exposed to 3200 ° K tungsten light for 3 times.
It was exposed for a second and processed with an automatic processor GR-27 (manufactured by Konica Corp.) under the above conditions using the developing solution and the fixing solution having the above compositions. The blackened density of the developed sample thus obtained was measured with a PDA-65 (Konica Digital Densitometer). 1
The reciprocal of the exposure amount at which 01 gives a blackening density of 1.0 is expressed as relative sensitivity with 100 as the reciprocal.

[Confirmation of stretchability] He manufactured by Konica Corporation
5% and 95% at 400L with SG747 manufactured by Dainippon Screen Co., Ltd. using a scanner film SH-2 for Ne.
% Of halftone dots is output, and this is used as a manuscript. A fine zoom C-880F manufactured by Dainippon Screen Co., Ltd. is used so that the magnification factor is 120%, and 95% of the manuscript becomes 5%. As described above, the exposure was performed by changing the exposure amount, and the same processing as the measurement of the sensitivity was performed. The halftone% of the obtained developed sample was measured by X-Rite 361T, and the crushing of halftone dots in the 5% portion of the original was visually observed at an exposure amount (proper exposure) at which 95% of the original became 5%. evaluated. A completely crushed item was ranked 1 rank, a barely practical level that could be judged to be uncrushed was 3 ranks, and a level considered to reproduce the manuscript was 5 ranks.

[Scratch resistance] Tribogear TYPE: 18 manufactured by Shinto Kagaku Co., Ltd. was used under an environment of 23 ° C. and RH of 50%, and a continuous load of up to 100 g was applied by a 0.1φ sapphire scratching needle to 600 mm / min. Move at the speed of
The load was evaluated when the blackening started.

[0191]

[Table 2]

From the results shown in Table 2, it can be seen that the present invention has high sensitivity, good stretchability and good scratch resistance.

Example 2 The sample No. prepared in Example 1 was used. With the formulation of 103, the coating wet film thickness is changed as shown in Table 3 and the coating speed is 100 m.
/ Min, simultaneous multi-layer coating, cooling set at -1 ° C, drying at a drying temperature of 30 ° C, dew point temperature of 5 ° C for 5 minutes, then drying at a drying temperature of 25 ° C, dew point temperature of 14 ° C for 10 minutes, and visual inspection of coating properties evaluated. The wet film thickness was changed by changing the dilution rate.

Regarding the evaluation, those with no coating failure were evaluated as ◯, and those with coating failure but no practical problem were evaluated as Δ,
The practically impossible level was marked with x. Other evaluations were made in the same manner as in Example 1. The results are shown in Table 3.

The viscosity of each coating liquid was adjusted to 10 cp for the protective layer and 20 cp for the other layers at 35 ° C. using polystyrene sulfonic acid.

Dispersion of the redox compound was carried out by the above-mentioned two methods (dispersion A) and (dispersion B).

(Dispersion B) 5 g of the redox compound 21 was dissolved in 100 ml of ethyl acetate and 50 g of the high-boiling solvent D to obtain a dispersion in the same manner as in A.

[0198]

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[0199]

[Table 3]

From the results shown in Table 3, it can be seen that the samples of the present invention have good coatability and dryability, and also have good stretchability.

[0201]

According to the present invention, it is possible to provide a light-sensitive material excellent in image reproducibility and scratch resistance and a manufacturing method.

Claims (5)

[Claims] 1. A layer containing at least one layer of a redox DIR compound capable of releasing a development inhibitor by being oxidized on a support, and a fine particle solid-dispersed dye (hereinafter referred to as a solid disperse dye) layer. In a silver halide photographic light-sensitive material having, a redox DIR compound-containing layer, a solid disperse dye layer, a silver halide emulsion layer and an emulsion protective layer are coated in this order on a support, and a hydrazine derivative is contained as a contrast adjusting agent. A silver halide photographic light-sensitive material characterized by: 2. The silver halide photographic light-sensitive material according to claim 1, wherein the emulsion protective layer contains a sliding agent. 3. The silver halide photographic light-sensitive material according to claim 1, wherein the redox compound is present as a dispersion. 4. A silver halide photographic light-sensitive material in which a redox DIR compound-containing layer, a solid disperse dye layer, a silver halide emulsion layer, and an emulsion protective layer are coated in this order on a support.
A silver halide characterized in that the total wet film thickness of the coating solution at the time of coating from the lowermost layer to the uppermost layer is 60 μm or more and 100 μm or less, and the wet film thickness at the time of coating the lowermost layer is 5 μm or more and 20 μm or less. Manufacturing method of photographic light-sensitive material. 5. The method for producing a silver halide photographic light-sensitive material according to claim 4, wherein the lowermost layer contains a dispersion other than the silver halide emulsion in an amount of 10 mg / m ² or more.