JPH0925585A - Manufacturing method of etched parts - Google Patents

Abstract

(57) [Abstract] [Purpose] The present invention relates to a method for manufacturing an etched part by a photoetching method. In the method for manufacturing an etching component, a means for removing cleaning water adhering to the surface of a draining roll for removing the etching liquid on the metal material is located at the metal material carrying-in port of the water cleaning means after etching. The end parts have squeegee areas that partially overlap with each other, and are arranged in parallel in parallel with the rotation axis of the draining roll, and are composed of two draining squeegees, and spread toward the rotation direction of the draining roll. A method for producing an etching component, which is provided at least at one place on a draining roll so as to have a substantially V-shape.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an etched part on a plate-shaped metal material by a photoetching method.

[0002]

2. Description of the Related Art Conventionally, a shadow mask used for a color picture tube or the like, or an etching component such as a lead frame for a semiconductor device is manufactured by corroding and melting a metal material, that is, a photoetching method. For example, a shadow mask used for a color picture tube or the like is manufactured by the process shown in the example of FIG. That is, as the metal material 1, a long strip-shaped metal plate supplied from a winding roll, for example, a low carbon steel plate having a plate thickness of 0.13 mm is used, and both surfaces thereof are degreased, smoothed,
After the cleaning treatment, a water-soluble photosensitive solution consisting of casein or polyvinyl alcohol and ammonium dichromate is applied on both surfaces and dried to form a photoresist film 10. Then, a negative pattern of a small hole image is formed on one surface of the metal material 1.
The negative pattern of the large hole image is exposed on the other surface. afterwards,
By performing a developing treatment to dissolve the unexposed and uncured photoresist film with warm water, as shown in FIG. 5 (a), the metal material 1 having the small hole resist film 10a and the large hole resist film 10b on the front and back sides is formed. can get. After that, the resist film 10 is subjected to a hardening treatment and a burning treatment.

Next, as shown in FIG. 5 (b), an etching process of bringing the etching liquid 7 into contact with the metal material 1 is performed from both front and back surfaces, and then a first etching step of washing with water and drying is performed. The etching solution used is a ferric chloride Baume concentration of 35 to 50 and a spray pressure of 1.5 to 3.5 kg /
Generally, it is performed by spray etching of cm ² .

Next, as shown in FIG. 5 (c), a resin is applied to the metal material 1 to form an etching prevention layer 11 that completely fills the small-hole-side concave portion formed by the preceding etching. Then, as shown in FIG. 5 (d), the metal material 1 is brought into contact with the etching solution 7 only from the large hole side to carry out the etching treatment, and then a second etching step of washing with water is carried out. Forming an opening penetrating through. Finally, a film stripping process for stripping the etching prevention layer 11 and the resist film 10 with an alkaline solution or the like is performed, followed by washing with water and drying to obtain the flat shadow mask 5 shown in FIG. 5 (e).

Also in the production of other etching parts using the photoetching method, for example, lead frames for semiconductor devices, the formation of a resist film on a metal material as described above, an etching treatment on a metal material and the formation of a resist film It can be said that the peeling process is a necessary step.

As described above, in the etching process, washing and washing are performed after the etching process. As shown in FIG. 3, the metal material 1 having a resist film on its surface is brought into contact with the metal material 1 in the etching chamber 6 by, for example, a spray method of spraying the etching solution 7 from the nozzle 12a. 1 is
It is to be etched.

Then, the metal material 1 is conveyed out of the etching chamber 6, and the etching liquid 7 remains on the surface of the metal material 1, particularly the upper surface of the metal material 1 which is conveyed horizontally, for example, in the form of a film. Therefore, even after leaving the etching chamber 6, the metal material 1 is continuously etched. Therefore, it is necessary to remove the etching solution 7 remaining on the surface of the metal material 1 and stop the etching of the metal material 1.

Usually, the etching stop process for the metal material 1 is performed by washing the metal material 1 with water. For example, as shown in FIG.
The cleaning water 9 is brought into contact with the metal material 1 to wash and remove the etching solution 7 remaining on the surface of the metal material 1.
Incidentally, in the example of FIG. 3, the cleaning water 9 is sprayed from the water cleaning nozzle 12b onto the metal material 1 to clean and remove the etching liquid 7.

Etching solution 7 from the above-mentioned metal material 1
It is desirable that the cleaning and removal be performed immediately. For example, it is assumed that the etching solution 7 is completely washed and removed by the time it leaves the water washing chamber 8, but that the etching solution 7 is slowly washed and removed from the metal material 1 in the water washing chamber 8. . In that case, the washing chamber 8
For a while, the high-concentration etching liquid 7 partially remains on the surface of the metal material 1, or the concentration dilution rate of the cleaning water 9 on the surface of the metal material 1 to the etching liquid 7 is partially different. The possibility arises.

When the cleaning solution 7 is slowly removed by cleaning as described above, the etching stop time on the surface of the metal material 1 varies depending on the part of the metal material 1, and the dimension of the etching pattern formed by etching is the metal. Different etching defects will occur depending on the part of the material. In order to prevent this, it can be said that the cleaning and removal of the etching liquid 7 from the surface of the metal material 1 is desirably performed instantaneously.

Usually, as a means for instantaneously cleaning and removing the etching liquid 7 from the surface of the metal material 1, as shown in FIG. 3, a cylinder which rotates in the conveying direction of the metal material 1 and has an elastic surface. -Shaped rotating roll (hereinafter, draining roll 2
Is provided at the carry-in port of the metal material 1 in the washing chamber 8 so as to come into contact with the metal material 1. The draining roll 2 functions as a squeegee at the contact surface with the metal material 1. That is, the etching liquid 7 remaining on the surface of the metal material 1 at the contact surface between the draining roll 2 and the metal material 1
Is pushed back to the side opposite to the transport direction of the metal material 1 to prevent the etching solution 7 from being brought into the washing chamber 8. As a result, with the contact surface with the draining roll 2 as a boundary, the liquid contacting the surface of the metal material 1 changes from the etching liquid 7 to the cleaning water 9 almost instantaneously, and the metal material 1 in the cleaning chamber 8 is changed. The cleaning and removal of the etching solution 7 from the above can be performed quickly and efficiently.

However, the following problems occur in the draining of the etching liquid 7 using the draining roll 2 described above. That is, as shown in FIG.
The washing water 9 adhered to the surface of the draining roll 2 inside, and the attached cleaning water 9 reached the contact surface between the draining roll 2 and the metal material 1 with the rotation of the draining roll 2. Therefore, the cleaning water 9 adhering to the surface of the water draining roll 2 and the etching liquid 7 are mixed at the contact surface between the water draining roll 2 and the metal material 1, and a portion where the liquid concentration of the etching liquid 7 is different occurs in the contact region This causes a problem of etching failure in which the dimensions of the etching pattern are partially different. In order to prevent this problem, conventionally, as shown in FIG. 4, a draining squeegee 3 having at least the length of the draining roll 2 is provided.
The draining roll 2 so that it contacts the surface of the draining roll 2.
It was installed parallel to the rotation axis of the. This drainage squeegee 3
Thus, the cleaning water 9 attached to the surface of the draining roll 2 is removed by squeegeeing, and the cleaning water 9 is prevented from flowing around the contact surface between the draining roll 2 and the metal material 1.

However, even if the draining squeegee 3 shown in FIG. 4 is provided, the cleaning water 9 adhering to the surface of the draining roll 2 is not completely removed by the squeegee, and the contact surface between the draining roll 2 and the metal material 1 is For example, the residual cleaning water 9 ′ in the form of streaks wraps around, which causes etching defects in which the dimensions of the etching pattern differ depending on the metal material site. Further, the squeegeeed cleaning water 9 stays at the contact portion between the draining roll 2 and the draining squeegee 3, and foreign matter such as metal powder or resist residue generated during the etching treatment and the washing with water is mixed in the staying water. There was something. There is also a problem that the foreign matter reattaches to the metal material 1 via the rotating draining roll 2 and scratches the metal material 1.

Although the above description refers to the etching step, it is desirable that the removal of the stripping solution from the metal material be performed instantaneously even in the step of stripping the resist film. By the way, if the stripping solution is slowly washed and removed, there is a problem in that the surface of the metal material causes discoloration of the metal material. For this reason, the draining roll 2 and the draining squeegee 3 described above are also provided at the washing / cleaning means after the film peeling treatment, for example, at the metal material 1 carry-in inlet of the washing chamber 8, but due to the above-mentioned defective draining and contamination of foreign matter. In the film peeling process, there is a problem that the metal material 1 is discolored and scratched.

[0015]

SUMMARY OF THE INVENTION In view of the above circumstances, the present invention has devised a manufacturing method of an etching component using a photoetching method, which does not cause etching failure and discoloration of a metal material. The present invention has been accomplished, and an object of the present invention is to provide a method for producing an etched component that does not cause etching defects and discoloration of a metal material in the obtained etched component.

[0016]

That is, according to the present invention, a plate-shaped metal material on the surface of which a resist film having a partially exposed metal surface is formed according to a predetermined pattern is subjected to an etching treatment, and then washed with water. In an etching component manufacturing method, which comprises at least an etching step for performing cleaning, and a film removing step for removing the resist film from the metal material, and a film removing step for performing washing with water, the method of washing with water after the etching treatment Located at the metal material carry-in port, the means for removing the cleaning water adhering to the surface of the draining roll that removes the etching liquid remaining on the surface of the metal material by contacting the metal material being transported is the central area of the draining roll. It is composed of two draining squeegees that are arranged in parallel in parallel with the rotation axis of the draining roll so that the end portions have overlapping squeegee regions. Further, the two draining squeegees are provided at least at one place on the draining roll so as to have a substantially C-shape that spreads toward the direction of rotation of the draining roll. The above problem is solved by providing a method.

As a modification of the present invention, at least one draining squeegee having the same structure as that described above is provided on the draining roll located at the metal material carrying-in port of the washing / washing means after the film removal treatment. It can be said that providing them in some places is also effective as a means for solving the above problems.

A description will be given below with reference to the drawings showing the essential parts of an example of the method for producing an etched component according to the present invention. In the figure, a metal material 1 is a long metal plate supplied from a winding roll, and a part of the metal material is exposed according to a predetermined pattern in accordance with the steps described in the above (Prior Art). It has the resist film 10 formed as described above.

Next, as described in the above-mentioned (prior art), the metal material 1 etched by the spray method in which the etching solution 7 is sprayed from the nozzle 12a in the etching chamber 6 shown in FIG. Is transported from the etching chamber 6 and enters the washing chamber 8 having the washing nozzle 12b. Next, the washing chamber 8
The metal material 1 carry-in port is provided with a water draining roll 2 that comes into contact with the metal material 1 as described in the section (Prior Art) described above. The etching liquid 7 remaining and attached on the surface 1 is removed. The draining roll 2 rotates in the transport direction of the metal material 1 about the rotation axis.

Here, in the manufacturing method of the present invention, a draining squeegee 3 is used as a means for removing the cleaning water 9 adhering to the surface of the draining roll 2. The draining squeegee 3 is shown in FIG. Thus, two are provided. Here, as shown in the plan view of FIG. 1, the two draining squeegees 3 have a rotation shaft of the draining roll 2 so that the draining roll 2 has a squeegee region where the end portions partially overlap each other in the central region of the draining roll 2. Two are provided vertically in parallel with.
Further, the two drainage squeegees 3 are provided in a V-shape that is widened toward the end in the rotation direction of the drainage roll 2 shown by the arrow in FIG.

The squeegee 3 for draining used in the present invention
The material used in the above is a material used in a conventional drainage squeegee, that is, urethane rubber or FRP. Further, the angle formed by each draining squeegee 3 with the rotation axis of the draining roll 2, and the overlapping amount of the end portions of each draining squeegee 3 are manufacturing conditions, that is, the rotation speed of the draining roll 2, the material. It can be said that it is desirable to appropriately set it for each manufacturing condition because it depends on the size and the size.

As shown in FIG. 4, the conventional drainer squeegee is one which is parallel to the rotation axis of the drainer roll 2. Therefore, the drainage squeegee is burdened, and the blade portion of the drainage squeegee 3 is partially twisted at the contact portion between the drainage squeegee 3 and the drainage roll 2, resulting in poor drainage properties. However, in the present invention, the number of drainage squeegees 3 is two, and the load on each drainage squeegee is reduced. Thereby, the contact between the blade portion of the drainage squeegee 3 and the drainage roll 2 is increased, and the drainage property is improved.

Further, the two draining squeegees 3 are provided on the draining roll 2 in a V-shape that is widened toward the end in the rotation direction of the draining roll 2. As a result, the cleaning water 9 on the draining roll 2 squeegeeed by the draining squeegee 3 does not stay in the contact portion between the draining squeegee 3 and the draining roll 2. That is, the cleaning water 9 squeegeeed from the surface of the draining roll 2 by the draining squeegee 3 is pushed by the rotation of the draining roll 2 and is sequentially conveyed along the side surface of the draining squeegee 3 toward the end of the draining roll 2. Finally, the water is removed from the end of the draining roll 2.

Contrary to the above, when the two drainage squeegees are in the shape of a V that spreads out in the direction opposite to the direction of rotation of the drainage rolls, the wash water squeegeeed by the drainage squeegee is It can be said that it is pushed by the rotation of the draining roll, moves toward the center of the draining roll, and stays at the contact portion between the draining squeegee and the draining roll. For this reason, it can be said that it is desirable that the two drainage squeegees are provided in a C-shape that widens toward the end in the rotation direction of the drainage roll, as described above.

Next, the metal material 1 which has been washed with water and has exited the water washing chamber 8 is subjected to the conventional steps to become an etching component.

As a modification of the present invention, even in washing with water after stripping of a resist film or the like, as shown in FIG.
Is provided. Note that the configuration of the present invention is not limited to the above-described drawings, and for example, when the draining roll 2 has a large diameter and the like, and there is only one place where the pair of draining squeegees 3 described above is provided, When the drainage property is insufficient, it can be said that the pair of two drainage squeegees 3 described above may be provided on the drainage roll 2 at a plurality of locations. Further, in the above-mentioned drawings, the draining roll 2 is provided on the upper surface of the metal material 1, but it may be provided on the lower surface of the metal material 1. In that case, it can be said that the water draining roll on the lower surface may be provided with the above-described pair of water draining squeegees 3. In addition, although the strip-shaped metal material is used in the above-mentioned drawings, it can be said that the sheet-shaped metal material may be used.

[0027]

In the method for manufacturing a shadow mask according to the present invention, the number of drainage squeegees for removing the cleaning water adhering to the surface of the drainage roll is reduced to reduce the load on each drainage squeegee. As a result, the contact between the drainage squeegee and the drainage roll increases, and the drainage property of the drainage squeegee becomes good.

[0028]

EXAMPLES Examples of the present invention will be described below. <Example> As the metal material 1, a long-sized metal plate supplied from a winding roll and having a low expansion coefficient of 0.13 mm was used. Then, as mentioned above (prior art)
According to the process described in the above section, a metal material 1 (hereinafter referred to as a shadow mask material) having a small hole resist film 10a and a large hole resist film 10b on the front and back sides was obtained.

Next, as shown in FIG. 2, the shadow mask material was first etched in the first etching chamber 6. Next, in the washing chamber 8, the washing water 9 having a water temperature of 20 ° C. is sprayed from the washing nozzle 12b at a spraying pressure of 1.2 Kg / cm ² onto the shadow mask material that has left the first etching chamber 6 to form a shadow mask. The material was washed with water. At that time, as shown in FIG. 2, the etching liquid 7 remaining on the surface of the shadow mask material was removed with a draining roll 2 made of neoprene rubber and having a length of 80 cm.

Here, according to the present invention, as shown in FIG. 1, two draining squeegees 3 made of urethane rubber and having a length of 42 cm partially overlap each other in the central region of the draining roll 2. Drain roll 2 to have a squeegee area
It was provided in contact with. At that time, the angle formed by the rotating shaft of the draining roll 2 and each squeegee 3 for draining water was set to 5 °, and FIG.
As shown in (3), the draining roll 2 has a V-shape that spreads toward the end in the rotation direction. In addition, each drainage squeegee 3
It was brought into contact with the draining roll 2 with a pressing pressure of 2 Kgf.

Then, the washing with water was completed, and the shadow mask material that came out of the washing chamber 8 was subjected to the conventional manufacturing process, etching prevention layer formation, second etching, film removal treatment, etc. to obtain a shadow mask.

Even after the second etching treatment and the washing treatment after the film peeling treatment, two drainage squeegees were provided on the drainage roll as described above.

In the shadow masks obtained in the above-mentioned examples, etching defects due to defective drainage of the drainage squeegee, discoloration of the metal material, and scratches caused by foreign substances in the cleaning water removed by the drainage squeegee. The presence or absence was examined, but no abnormality was found.

[0034]

As described above, in the method for manufacturing a shadow mask of the present invention, it adheres to the surface of the draining roll located at the metal material carry-in port of the washing / washing means after etching treatment and the washing / washing means after film removal treatment. As a means for removing the washing water, two drainage squeegees are arranged in a column structure to reduce the load on each drainage squeegee. As a result, the contact between the drainage squeegee and the drainage roll increases, and the drainage property of the drainage squeegee becomes good. As a result, the cleaning water remaining on the draining roll is prevented from wrapping around the contact surface between the draining roll and the metal material, and the etching pattern varies in dimension depending on the metal material site. It is possible to prevent the discoloration failure.

Further, the two draining squeegees are provided on the draining roll in a C-shape that spreads toward the end in the rotation direction of the draining roll. The draining squeegee is squeegeeed from the surface of the draining roll. Is pushed by the rotation of the draining roll, and is sequentially conveyed along the side surface of the drainage squeegee toward the end of the draining roll, and is finally removed from the end of the draining roll. In the conventional drainage squeegee, the squeegeeed cleaning water stays in the contact area between the draining roll and the drainage squeegee, and foreign matter such as metal powder or resist residue generated by the etching process and the film removal process is mixed in the retained water. However, there has been a problem that the foreign matter is reattached to the metal material via the rotating draining roll and scratches the metal material. However, in the method for manufacturing a shadow mask of the present invention, the drainage squeegee is a squeegee, the cleaning water containing the foreign matter does not stay at the contact portion between the drainage roll and the drainage squeegee, as described above,
It can be said that the present invention is practically excellent in obtaining a high-quality etched part, such as being removed from the end of the draining roll at any time, and preventing the problem of scratching the metal material described above. .

[0036]

[Brief description of drawings]

FIG. 1 is a plan view showing a main part of an embodiment of a method for manufacturing an etched component of the present invention.

FIG. 2 is a side sectional view showing an essential part of an embodiment of the method for manufacturing an etched component of the present invention.

FIG. 3 is an explanatory view showing a main part of an example of a conventional method of manufacturing an etched component.

FIG. 4 is an explanatory view showing a main part of another example of a conventional method for manufacturing an etched component.

5A to 5E are explanatory views showing an example of a method for manufacturing an etched component in the order of steps.

[Explanation of symbols]

 1 Metallic Material 2 Draining Roll 3 Squeegee for Draining 4 Opening 5 Shadow Mask 6 Etching Chamber 7 Etching Solution 8 Rinsing Chamber 9 Washing Water 10 Resist Film 11 Etching Prevention Layer 12 Nozzle

Claims (2)

[Claims] 1. An etching step of carrying out an etching treatment on a plate-shaped metal material having a resist film whose surface is partially exposed according to a predetermined pattern and then washing with water, and the resist film. In a method of manufacturing an etching component having at least a film removing step of performing a water washing process after a film removing process for removing the film from the metal material, the etching process is performed at a metal material carrying-in port of the water washing process after the etching process. The means for removing the cleaning water adhering to the surface of the draining roll that removes the etching liquid remaining on the surface of the metal material by contacting the metal material of A drainage squeegee composed of two draining squeegees arranged in parallel in parallel with the axis of rotation of the draining roll so as to have a region, and the two draining squeegees. The draining so that with respect to the rotation direction of the roll a shaped substantially Ha as a divergent method of etching component characterized by comprising one place on at least draining roll. 2. The two drainage squeegees are provided in at least one location on a drainage roll located at a metal material carrying-in port of the water washing / cleaning means after the film removing treatment. Etching parts manufacturing method.