JPH09258256A - Display device - Google Patents

Abstract

(57) An object of the present invention is to provide a color liquid crystal display device which is easy to manufacture and has a low assembly cost. A liquid crystal display device includes a first insulating substrate.
a, and films 16a and 16b arranged on one side of the first insulating substrate to provide predetermined segmented regions,
A second insulating substrate 10b facing the first insulating substrate with a film interposed, and a second insulating substrate 10b disposed between the first and second insulating substrates, and at least two layers between the film and the insulating substrate or between the films. And a conductive member electrically connected. As a result, the number of voltage steps required to apply a predetermined drive voltage to the pixel electrode is reduced. In addition,
Liquid crystal materials 18Y, 18C and 18M capable of displaying a predetermined color are laminated between the first insulating substrate and the film, between the films, and between the second insulating substrate and the film.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multicolor display device using a liquid crystal element in which a plurality of liquid crystal layers are laminated and a method for manufacturing the multicolor display device.

[0002]

2. Description of the Related Art As a display device capable of displaying an arbitrary color,
CRTs (cathode ray tubes or picture tubes) are widely used. However, the CRT deflects the electrons accelerated by one electron gun to all the areas on the display panel (light emitting surface), which causes a problem that the depth as a display becomes large. Moreover, it is not suitable for carrying because of its power consumption and weight.

[0003] A plasma display, an EL (electroluminescence) panel, and the like have been proposed as display devices replacing the CRT, but have not been put to practical use at present.

In a liquid crystal display device including a liquid crystal element, the thickness and weight of the device can be set to values that allow portability, and the power consumption is small.
Widely used for electronic desk calculators, wristwatches, etc. A TN (Twisted Nematic) type liquid crystal element is used as an active switching element
By forming it integrally with (thin film transistor), CR
With the development of a display device having a display characteristic equivalent to that of T, color display in a portable color television, a word processor, a personal computer, etc. has been put into practical use. In addition, GH (guest-
A liquid crystal element such as a host type liquid crystal element or a selective reflection liquid crystal element that does not use a polarizing plate has also been proposed. However, when performing full-color display using this type of liquid crystal element, it is necessary to arrange liquid crystal materials of different colors in parallel in each of the sub-pixels, or to stack three or more liquid crystal cells.

[0005]

In the above-mentioned TN type liquid crystal device, a backlight is required to compensate for the lack of brightness due to the decrease in light use efficiency due to the use of a polarizing plate. For this reason, there is a problem that the overall power consumption of the liquid crystal display device increases.

On the other hand, even when a liquid crystal element that does not use a polarizing plate, that is, a GH (guest-host) type liquid crystal element or a selective reflection liquid crystal element is used, it is practical to arrange several kinds of liquid crystals in parallel. However, there is a problem in that the colors that can be displayed are limited.

Apart from this, the method of stacking three or more layers of liquid crystal cells has many manufacturing problems such as cell assembly, liquid crystal material injection, and driver circuit mounting. In particular, a drive circuit (driver LSI) for securing electric conduction or independently using a switching element for independently driving each liquid crystal layer stacked more than three layers (driver LSI)
There is a problem that the liquid crystal display device is enlarged due to the increase in the number of the liquid crystal display devices. Although a method of stacking three single-layer liquid crystal display devices is possible in principle, there is a problem that the brightness of the liquid crystal display device cannot be secured.

The present invention has been made in view of the above-mentioned problems, and an object thereof is to provide a color liquid crystal display device which is easy to manufacture and has a low assembly cost.

[0009]

According to a first aspect of the present invention, a display device has a plurality of liquid crystal layers laminated and has three or more kinds of pixel electrodes for driving the respective liquid crystal layers. , A matrix type liquid crystal display device in which a voltage is applied to each of the pixel electrodes to drive the pixel electrodes.
It is characterized in that it has a common electrode structure in which pixel electrodes of different types are connected to each other.

According to a second aspect of the present invention, a display device has a plurality of liquid crystal layers laminated and has three or more kinds of pixel electrodes for driving the respective liquid crystal layers, and each of the pixel electrodes has a pixel electrode. In a matrix type liquid crystal display element that applies and drives a voltage, at least one kind of pixel electrodes arranged inside is electrically connected to an adjacent pixel electrode.

According to a third aspect of the present invention, a display device has a plurality of liquid crystal layers laminated and has three or more kinds of pixel electrodes for driving the respective liquid crystal layers, and each of the pixel electrodes has a pixel electrode. In a matrix type liquid crystal display element that is driven by applying a voltage, two types of pixel electrodes arranged outside are electrically connected to adjacent pixel electrodes, respectively.

According to a fourth aspect of the present invention, a display device has a plurality of liquid crystal layers laminated and has three or more kinds of pixel electrodes for driving the respective liquid crystal layers, and each of the pixel electrodes has a pixel electrode. In a matrix type liquid crystal display element which is driven by applying a voltage, two types of pixel electrodes arranged outside are electrically connected to each other.

According to a fifth aspect of the present invention, a display device has a plurality of liquid crystal layers laminated and has three or more kinds of pixel electrodes for driving the respective liquid crystal layers, and each of the pixel electrodes has a pixel electrode. In a matrix type liquid crystal display element that applies and drives a voltage, two types of pixel electrodes arranged outside are electrically connected to the other pixel electrode of an adjacent pixel.

[0014]

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a schematic view showing a color liquid crystal display device (hereinafter, simply referred to as a liquid crystal display device) including three liquid crystal layers to which the embodiment of the present invention is applied.

[0016]

First Embodiment As shown in FIG. 1, a color liquid crystal display device (hereinafter, simply referred to as a liquid crystal display device) 10 including three liquid crystal layers is a substrate 10a formed of a transparent insulating material such as glass. The substrate 10a has a counter substrate 10b arranged in parallel to and facing the substrate 10a at a predetermined interval. The counter substrate 10b is an insulating substrate that is substantially made of the same material as the insulating substrate 10a. Further, as each of the substrates 10a and 10b, glass having a thickness of 1.1 mm (hereinafter referred to as mm) is used.

Hereinafter, two lines of thin film transistors (hereinafter referred to as TFTs) 12a and 12b per pixel and a gate electrode (not shown) corresponding to each TFT are formed on the surface of the insulating substrate 10a facing the counter substrate 10b. Then, a signal line is formed, and PI (indium-phosphorus) is laminated in a thickness of 2 micrometers (hereinafter referred to as μm).

Next, the surface is dimple-processed by embossing, 100 μm of aluminum is vapor-deposited except for the TFT, and the pixel electrode (aluminum reflective electrode) is patterned. This aluminum reflective electrode is connected to the source electrode of the TFT of one system.

Subsequently, an electrode column 14a having a height of 10 μm is formed on the remaining TFT of one system by copper plating.

Next, ITO having a thickness of 20 nanometers (hereinafter referred to as nm) is sputtered on both surfaces, and a pixel electrode is patterned to form a film 16a having a thickness of 100 μm.
Is bonded to the substrate 10a together with a spacer (not shown) having a thickness of 10 μm formed in accordance with the pixel pattern. The film 16a contains conductive particles in a part of the region corresponding to the pixel in order to allow the pixel electrodes formed on both surfaces to be electrically connected to each other on a pixel-by-pixel basis. Subsequently, a film 1 in which pixel electrodes were formed on both surfaces by ITO having a thickness of 20 nm in the same manner as the film 16a
6b, together with a spacer having a thickness of 10 μm corresponding to the pixel pattern, are laminated and adhered to the film 16a previously adhered to the substrate 10a. The film 16
The pixel pattern formed on a and the pixel pattern formed on the film 16b are arranged so as to at least partially overlap each other when viewed in a direction orthogonal to the surface direction of the insulating substrate 10a. In this case, the spacer 14b having conductivity is used only in the region where each pixel pattern overlaps.

Next, the thickness 10 corresponding to the pixel pattern
IT with a thickness of 20 nm using a spacer (not shown) of μm
The counter substrate 10b on which O is sputtered is placed so that the surface on which ITO is sputtered and the film 16b face each other.

Hereinafter, between the substrate 10a and the film 16a, between the film 16a and the film 16b, and between the film 16b and the substrate 10b, respectively,
A yellow GH (guest-host containing dichroic dye) type liquid crystal material 18Y, a cyan GH type liquid crystal material 18C and a magenta GH type liquid crystal material 18M are injected. Note that the orientation direction of the liquid crystal material of each liquid crystal layer formed in this way is controlled to be vertical alignment for each liquid crystal layer by the vertical alignment process.

The liquid crystal materials 18Y, 18C and 1
The voltage transmittance characteristics, which will be described later with reference to FIG. 11, are given to each of 8M. That is, the threshold voltage of each liquid crystal material is set to 2.5 volts (hereinafter referred to as V) and the saturation voltage is set to 5V. Hereinafter, a driver IC is mounted using the TCP (tape carrier package) method, and the gap between the electrodes is 2.5 as described later with reference to FIG.
A predetermined color can be displayed by applying drive voltages of V, -2.5V, 5V and -5V. The drive voltage is
It is desirable to invert the polarity every frame period,
When using the combination of drive voltages shown in FIG. 12, simply switch the polarities (without changing the absolute value).
It can be driven efficiently only by itself.

In Example 1, a predetermined color having a contrast of about 2: 1 could be displayed.

[0025]

Embodiment 2 FIG. 2 shows a liquid crystal display device having a structure different from that of the liquid crystal display device shown in FIG.

The same insulating substrate 10a as that used in the color liquid crystal display device shown in FIG.
Gate electrodes and signal lines (not shown) corresponding to the TFTs 12a and 12b and the respective TFTs are formed, and titanium oxide is laminated to a thickness of 100 μm.

Next, ITO is sputtered to 100 μm, and the pixel electrode of ITO is patterned using a resist having a thickness of 2 μm. This pixel electrode is connected to the source electrode of one system TFT.

Subsequently, a connecting portion of the film 22 formed in a stepwise manner as described later with reference to FIG. 17 and having electrode patterns corresponding to the ITO pixel electrodes formed on both surfaces, and the remaining one system of TFTs. It is crimped with the source electrode of. In this case, the ITO pixel electrodes formed on the insulating substrate 10a and the electrode patterns formed on the film 22 are accurately aligned so that the positional relationship is within a predetermined error range. In addition, the film 22 uses what has both surfaces conducted.

Next, the film 22 is attached to the insulating substrate 10a at intervals of about 10 μm by the spacer of 10 μm thickness formed corresponding to the ITO pixel electrodes. Next, the film 2 provided with a space of approximately 10 μm.
A liquid crystal material 24Y containing a dichroic dye of yellow and a liquid crystal material 24C containing a dichroic dye of cyan are sequentially and continuously injected between the insulating film 10 and the insulating substrate 10a to form a cyan liquid crystal layer and a yellow liquid crystal layer. The overlapping liquid crystal layers are formed while the overlapping order is different every other order, that is, cyan-yellow and yellow-cyan.

Then, a PVA resin layer 24M in which a predetermined amount of a liquid crystal material containing a magenta dichroic dye is dispersed is printed on the ITO side of the counter substrate 10b on which ITO having a thickness of 20 nm is sputtered to a thickness of 10 μm by printing. After being formed, the film 22 on which the cyan layer 24C and the yellow 24Y are formed
And the counter substrate 1 so that the magenta liquid crystal layer 24M faces each other.
Stack 0b.

The liquid crystal layers 24Y, 24C and 24
Each of the Ms is given the voltage transmittance characteristic shown in FIG. Therefore, the drive voltage shown in FIG. 12 can be used for driving in the same manner as in the embodiment shown in FIG.

Thereafter, a driver IC is mounted by the COG (chip on glass) method, and 2.5V, -2.5V, which will be described later with reference to FIG. 12, as in the embodiment shown in FIG.
By applying a driving voltage of 5V and -5V, a predetermined color with a contrast of approximately 3: 1 was able to be displayed.

[0033]

Third Embodiment FIG. 3 shows a liquid crystal display device having a structure different from that of the liquid crystal display device shown in FIGS. 1 and 2.

The same insulating substrate 10a as that used in the color liquid crystal display device shown in FIG.
Gate electrodes and signal lines (not shown) corresponding to the TFTs 12a and 12b and the respective TFTs are formed.
μm is laminated.

Next, the surface is dimple-processed by embossing, 100 μm of aluminum is vapor-deposited, and the aluminum reflection electrode is patterned. The aluminum reflective electrode is connected to the source electrode of the TFT of one system.

Subsequently, an electrode column 32 having a height of 20 μm is formed on the remaining TFT of one system by copper plating.

Next, 10 μ of the PVA resin layer 34Y in which a predetermined amount of yellow GH type microcapsule liquid crystal is dispersed is formed.
m.

After that, ITO is sputtered to a thickness of 20 nm and patterned into an electrode pattern as described later with reference to FIG. 18 to form a first ITO film 36.

Next, electrical connection is established between the protruding pattern portion 36a of the ITO film 36 shown in FIG.
The PVA resin layer 34M in which a predetermined amount of magenta GH type microcapsule liquid crystal is dispersed is formed on the ITO film 36 of
to form μm.

Again, ITO is sputtered to a thickness of 20 nm, and then a second ITO film 38 is formed by patterning, and electrical continuity is established between the electrode pillar 32 and the second ITO film 38.

Subsequently, a PVA resin layer 34C in which a predetermined amount of cyan GH type microcapsule liquid crystal is dispersed is formed with 10 μm.
to form m.

On this, the counter substrate 10b on which ITO is sputtered to a thickness of 20 nm is placed so as to face each other so that the ITO and the PVA resin layer are in contact with each other. Therefore, the arrangement of the pixel electrodes has a structure substantially similar to that of the liquid crystal display device of FIG. The liquid crystal layers 34Y, 34C, and 34M have the voltage transmittance characteristics shown in FIG. 11, respectively. Therefore, the drive voltage shown in FIG. 12 can be used for driving in the same manner as in the embodiment shown in FIG.

Hereinafter, the driver IC is manufactured using the TCP method.
Was mounted and the driving voltage of the combination shown in FIG. 12 was applied between the electrodes, a predetermined color with a contrast of approximately 3: 1 could be displayed.

[0044]

Fourth Embodiment FIG. 4 shows a liquid crystal display device having a structure different from that of the above-mentioned liquid crystal display device.

The same insulating substrate 10a as that used in the color liquid crystal display device shown in FIG.
Gate electrodes and signal lines (not shown) corresponding to the TFTs 12a and 12b and the respective TFTs are formed to have a thickness of 2 μm.
m m PI layer is formed.

Next, the surface is dimple-processed by embossing, 100 μm of aluminum is vapor-deposited to pattern the aluminum reflective electrode (pixel electrode), and one system of TF is used.
Connect to the source electrode of T.

Subsequently, an electrode column 42 having a height of 10 μm is formed on the remaining TFT of one system by copper plating.

Next, ITO is sputtered on both sides with a thickness of 50 μm, punched in accordance with the pattern of the electrode columns 42, and a pixel electrode is patterned, and a 100 μm-thick film 44 a with a thickness of 10 μm is formed.
It is bonded to the substrate 10a via the spacers. In addition,
As the film 44a, a film in which conductive particles are contained in a part of a region corresponding to a pixel is used so that the pixel electrodes formed on both surfaces can be electrically connected to each other in a pixel unit.

Here, an electrode pillar (not shown) formed of a conductive material is embedded in the hole portion, and an insulator is injected into the periphery.

Next, ITO is sputtered on both sides to a thickness of 20 nm and the pixel electrodes are patterned to a thickness of 100 μm.
The film 4b having a thickness of 44 μm and a film 4b already attached to the substrate 10a via a spacer having a thickness of 10 μm.
Stack on 4a. The pixel electrodes formed (patterned) on the respective surfaces of the film 44b are electrically connected to each other by, for example, through holes. In addition, the pixel electrode is formed in a pattern that overlaps with the electrode column 42 when viewed from a direction orthogonal to the surface direction of the film 44b, and the spacer provided with conductivity provides:
Electrical connection with the electrode column 42 is secured.

Next, the counter substrate 10b on which ITO having a thickness of 50 μm is sputtered is laminated so that the ITO film and the film 44b face each other.

In the following, a liquid crystal material 46Y containing a dichroic dye of yellow and 2 of cyan are provided between the substrate 10a and the film 44a, between the film 44a and the film 44b, and between the film 44b and the substrate 10b, respectively. A liquid crystal material 46C containing a chromatic dye and a liquid crystal material 46M containing a dichromatic dye of magenta are injected. The alignment direction of the liquid crystal material of each liquid crystal layer thus formed is controlled to be vertical alignment by the vertical alignment process.

The liquid crystal layers 46Y, 46C and 46
Each of the Ms is given the voltage transmittance characteristic shown in FIG. Further, in the embodiment shown in FIG. 4, each electrode and layer structure is simpler than that shown in FIGS. From this, a predetermined color can be displayed by applying a drive voltage as described later with reference to FIG.

Hereinafter, the driver IC is manufactured using the TCP method.
Was mounted and the driving voltage of the combination shown in FIG. 13 was applied between the electrodes, a predetermined color with a contrast of approximately 2: 1 was able to be displayed.

[0055]

Fifth Embodiment FIG. 5 shows a liquid crystal display device having a structure different from that of the above-mentioned liquid crystal display device.

On the insulating substrate 10a, the first TFT 12a,
A gate electrode and a signal line (not shown) are formed, and titanium oxide is laminated to a thickness of 100 μm.

Next, ITO is sputtered to 100 μm, and an electrode pillar hole for the electrode pillar is patterned using a resist having a thickness of 2 μm. This electrode pillar hole has a thickness of 10μ
An m-shaped electrode column 52 is formed and connected to the source electrode of the first TFT 12a.

Next, ITO was sputtered to a thickness of 20 nm, and pixel electrodes were patterned on both sides to a thickness of 50 μm.
The m film 54a is superposed with a 10 μm-thick spacer interposed therebetween so that the pixel electrode and the electrode column 52 are electrically connected to each other. The pixel electrodes on both sides of the film 54a are those which are electrically connected to each other.

Next, the second TFT 1 is formed on the counter electrode 10b.
2b, a gate electrode and a signal line (not shown) are formed, and ITO having a predetermined thickness is sputtered to pattern the pixel electrode.

After this, ITO is applied on both sides to a thickness of 50 μm.
The sputtered film 54b is bonded to the counter electrode 10b with a spacer having a thickness of 10 μm interposed therebetween.

Next, the insulating substrate 10a and the counter substrate 10
b with an adhesive spacer having a thickness of 10 μm,
Laminate them so that the film sides face each other.

Between the substrate 10a and the film 54a thus formed, between the film 54a and the film 54b.
Liquid crystal material 56Y containing a yellow dichroic dye, and between the film 54b and the substrate 10b.
A liquid crystal material 56C containing a cyan dichroic dye and a liquid crystal material 56M containing a magenta dichroic dye are injected. Note that the orientation direction of the liquid crystal material of each liquid crystal layer formed in this way is controlled to be vertical alignment for each liquid crystal layer by the vertical alignment process. In addition, each of the liquid crystal layers 56Y, 5
6C and 56M are provided with the voltage transmittance characteristics shown in FIG. 11, respectively.

In the following, the driver IC will be manufactured using the COG method.
Is mounted, and the electric potentials on both surfaces of the film 54b are set to the same electric potential,
By applying the predetermined driving voltage shown in FIG. 13 between the electrodes facing each other in the three layers, a predetermined color having a contrast of about 3: 1 could be displayed.

[0064]

Sixth Embodiment FIG. 6 shows a liquid crystal display device having a structure different from that of the above-mentioned liquid crystal display device.

Two lines of TFTs 12a and 12b per pixel, gate electrodes and signal lines (not shown) corresponding to the respective TFTs are formed on the insulating substrate 10a, and PI is set to 2
μm is laminated.

Next, the surface is dimple-processed by embossing, 100 μm of aluminum is vapor-deposited except the TFT, and the pixel electrode (aluminum reflective electrode) is patterned. This aluminum reflective electrode is connected to the source electrode of the TFT of one system.

Subsequently, an electrode column 62 having a height of 20 μm is formed on the remaining TFT of one system by copper plating.

Next, the PVA resin layer 64Y in which a predetermined amount of yellow GH type microcapsule liquid crystal is dispersed is formed with 10 μm.
m.

After that, ITO is sputtered to a thickness of 20 nm, and the ITO is patterned so that the electrode pillars 62 and the ITO do not come into contact with each other to form the first ITO film 66.

Next, a PVA resin layer 64C in which a predetermined amount of cyan GH type microcapsule liquid crystal is dispersed is formed to a thickness of 10 μm.
To form

After the ITO is sputtered again to a thickness of 20 nm, the ITO is patterned so that the electrode column 62 and the ITO do not come into contact with each other to form the second ITO film 68. The second ITO film 18 and the electrode column 62 are electrically connected by a wiring member (not shown).

Next, a PVA resin layer 64M in which a predetermined amount of magenta GH type microcapsule liquid crystal is dispersed is formed in a thickness of 10 μm.
to form m.

On this, the counter substrate 10b on which ITO is sputtered to a thickness of 20 nm is placed so as to face each other so that the ITO and the PVA resin layer are in contact with each other. In addition, each liquid crystal layer 64
The voltage transmittance characteristics shown in FIG. 11 are given to Y, 64C, and 64M, respectively.

Hereinafter, using the TCP method, the driver I
By mounting C and applying the predetermined drive voltage shown in FIG. 13 between the electrodes, a predetermined color with a contrast of approximately 2: 1 could be displayed.

[0075]

Embodiment 7 FIG. 7 shows a liquid crystal display device having a structure different from that of the above-mentioned liquid crystal display device.

Two lines of TFTs 12a and 12b per pixel, gate electrodes and signal lines (not shown) corresponding to the respective TFTs are formed on the insulating substrate 10a, and PI is set to 2
μm is laminated.

Next, the surface is dimple-processed by embossing, 100 μm of aluminum is vapor-deposited except the TFT, and the pixel electrode (aluminum reflective electrode) is patterned. Then, electrode columns 72a and 72b having a height of 10 μm are formed on each TFT by copper plating.

Next, ITO is sputtered on both sides with a thickness of 50 μm, and the holes are punched by corresponding to the pattern of the electrode columns 72a from one TFT (here, 12a), and the pixel electrodes are further formed. A patterned film 74a having a thickness of 100 μm is formed with a thickness of 1
It is bonded to the substrate 10a by a 0 μm spacer. Note that the hole is filled with an electrode pillar formed of a conductive member, and an insulator is injected into the periphery. Also, the film 74a
The pixel electrode formed on the above and the remaining electrode column 72b are electrically connected. Here, as the film 74a, in order to make the pixel electrodes formed on both sides conductive with each other on a pixel-by-pixel basis, a film containing conductive particles in a part of a region corresponding to a pixel is used.

Next, ITO was sputtered on both sides to a thickness of 20 nm, and the pixel electrodes were patterned to a thickness of 100 μm.
m film 74b is already bonded to the substrate 10a via a spacer having a thickness of 10 μm.
Stack on 4a. The pixel electrode is the film 74.
The electrode column 72a is viewed from a direction orthogonal to the plane direction of b.
Conductivity is secured between the electrode columns 72 by the spacers that are formed in a pattern that overlaps with and are given conductivity.

The counter substrate 10b, on which ITO having a thickness of 50 μm is sputtered, is then formed on the ITO film and the film 74b.
Stack so that and face each other.

Hereinafter, between the substrate 10a and the film 74a, between the film 74a and the film 74b, and between the film 74b and the substrate 10b, the liquid crystal material 76Y containing the yellow dichroic dye and the cyan 2 A liquid crystal material 76C containing a chromatic dye and a liquid crystal material 76M containing a dichromatic dye of magenta are injected. The alignment direction of the liquid crystal material of each liquid crystal layer thus formed is controlled to be vertical alignment by the vertical alignment process. The liquid crystal layers 76Y, 76C, and 76M have the voltage transmittance characteristics shown in FIG. 11, respectively. In this case, due to the characteristics of the electrodes and the layer structure, a predetermined color can be displayed by applying a drive voltage as described later with reference to FIG.

Hereinafter, the driver IC will be described using the TCP method.
By mounting and driving voltages of the combination shown in FIG. 14 were applied between the electrodes, a predetermined color with a contrast of approximately 3: 1 was able to be displayed.

[0083]

Embodiment 8 FIG. 8 shows a liquid crystal display device having a structure different from that of the above-mentioned liquid crystal display device.

On the insulating substrate 10a, two systems of TFTs 12a and 12b per pixel, gate electrodes and signal lines (not shown) corresponding to the respective TFTs are formed, and PI is set to 2
μm is laminated.

Next, the surface is dimple-processed by embossing, 100 μm of aluminum is vapor-deposited except for the TFT, and the common reflection electrode is patterned.

Subsequently, an electrode column 82 having a height of 10 μm is formed on the remaining TFT of one system by copper plating.

Next, ITO was sputtered on both sides to a thickness of 50 μm and the pixel electrodes were patterned to a thickness of 100 μm.
The m film 84a is attached to the substrate 10a with a spacer having a thickness of 10 μm. Note that the pixel electrode is formed so as to overlap with the electrode column 82 when viewed from the direction orthogonal to the surface direction of the film 84a, and the spacer provided with conductivity ensures the conduction with the electrode column 82. .
Further, as the film 84a, in order to make the pixel electrodes formed on both sides conductive with each other on a pixel-by-pixel basis, a film containing conductive particles in a part of a region corresponding to a pixel is used.

Next, ITO was sputtered on both sides to a thickness of 20 nm, and the pixel electrodes were patterned to a thickness of 100 μm.
film 84b having a thickness of 10 μm and a film 8b already bonded to the substrate 10a via a spacer having a thickness of 10 μm.
Stack on 4a. The pixel electrode is the film 84.
The pixel electrodes in the lower layer are formed in a pattern overlapping with the adjacent pixel electrodes as viewed in a direction orthogonal to the plane direction of b, and electrical continuity is secured between the pixel electrodes via the spacers to which conductivity is given. .

The counter substrate 10b, on which ITO having a thickness of 50 μm is sputtered, is formed on the ITO film and the film 84b.
Stack so that and face each other.

Hereinafter, a liquid crystal material 86Y containing a yellow dichroic dye and a chiral agent is provided between the substrate 10a and the film 84a, between the film 84a and the film 84b, and between the film 84b and the substrate 10b, respectively. Liquid crystal material 86C containing cyan, dichroic dye and chiral agent
Then, a liquid crystal material 86M containing a magenta dichroic dye and a chiral agent is injected. Note that the orientation direction of the liquid crystal material of each liquid crystal layer formed in this way is controlled to be vertical alignment for each liquid crystal layer by the vertical alignment process. Further, in each of the liquid crystal layers 86Y, 86C and 86M,
The voltage transmittance characteristics shown in FIG. 11 are given respectively.

In the following, the driver IC will be manufactured using the TCP method.
By mounting and driving voltages of the combination shown in FIG. 14 were applied between the electrodes, a predetermined color with a contrast of approximately 2: 1 could be displayed.

[0092]

[Embodiment 9] FIG. 9 shows a liquid crystal display device having a structure different from that of the above-mentioned liquid crystal display device.

On the insulating substrate 10a, for each pixel of the three liquid crystal layers, two lines of TFTs 92a and 92b per pixel, a gate electrode and a signal line (not shown) corresponding to each TFT are formed and oxidized. 100 titanium
Evaporate to a thickness of μm.

Next, ITO is sputtered to a thickness of 50 μm and 2
The pixel common electrode is patterned. Here, the two-pixel common electrode and the source electrode of the TFT of one system are connected. Then, the remaining 1 line of TFTs is copper-plated to a height of 10
The electrode pillar 94a of μm is formed.

Next, ITO was sputtered on both surfaces to a thickness of 50 μm and a common electrode for two pixels was patterned to a thickness of 100 μm.
The film 96a of m is attached to the substrate 10a by using a spacer having a thickness of 10 μm. Where the film 96
In order to allow the pixel electrodes formed on both surfaces to be electrically connected to each other on a pixel-by-pixel basis, a is used in which conductive particles are contained in a part of the region corresponding to the pixel.

Next, two lines of TFTs 92c and 92d per pixel, a gate electrode and a signal line corresponding to each TFT are formed on the counter electrode 10b, and ITO is sputtered by 50 μm to form a common electrode for two pixels. Pattern. Next, the two-pixel common electrode and the source electrode of the TFT of one system are connected. Next, an electrode column 94b having a height of 10 μm is formed on the remaining TFT of one system by copper plating.

Next, ITO was sputtered on both surfaces to a thickness of 50 μm, and a common electrode for two pixels was patterned to a thickness of 100 μm.
The m film 96b is attached to the substrate 10b by using a spacer having a thickness of 10 μm corresponding to the pixel pattern. The pixel electrodes formed on the respective surfaces of the film 96b are electrically connected to each other. In addition, the pixel electrode is formed in a pattern that overlaps with the electrode column 94b when viewed from a direction orthogonal to the surface direction of the film 96b, and the electrode column 94b is formed by a spacer having conductivity.
The continuity between and is secured.

Next, the insulating substrate 10a and the counter substrate 10
b with an adhesive spacer having a thickness of 10 μm,
Laminate them so that the film sides face each other.

Between the substrate 10a and the film 96a thus formed, the film 96a and the film 96b are formed.
Liquid crystal material 98Y containing a yellow dichroic dye, and between the film 96b and the substrate 10b.
A liquid crystal material 98C containing a cyan dichroic dye and a liquid crystal material 98M containing a magenta dichroic dye are injected. Note that the orientation direction of the liquid crystal material of each liquid crystal layer formed in this way is controlled to be vertical alignment for each liquid crystal layer by the vertical alignment process.

Here, each of the liquid crystal layers 96Y, 96C and 9
As will be described later with reference to FIG. 15, 6M is provided with voltage transmittance characteristics having a threshold voltage of 4V and a saturation voltage of 6V, respectively, and further, 2M and 6V described later with reference to FIG.
V, 8V, 10V, 12V, 14V, 18V and 20
By applying the driving voltage of V in a predetermined combination, 3
A predetermined color can be displayed on a total of 6 pixels of a layer pixel × 2 systems.

Hereinafter, a driver IC will be described using the TCP method.
16 was applied and the drive voltage shown in FIG. 16 was applied between the electrodes, whereby a predetermined color with a contrast of approximately 2: 1 could be displayed.

[0102]

[Embodiment 10] FIG. 10 shows a liquid crystal display device provided with a layer structure different from those of the various liquid crystal display devices described above.

Two lines of TFTs 12a and 12b per pixel, not shown gate electrodes and signal lines corresponding to the respective TFTs are formed on the insulating substrate 10a, and P
I is laminated in a thickness of 2 μm.

Next, the surface is dimple-processed by embossing, 100 μm of aluminum is vapor-deposited except the TFT, and the pixel electrode (aluminum reflective electrode) is patterned. This aluminum reflective electrode and one system of TFT 12a
Connected to the source electrode of, and further 30 by copper plating
An electrode column 102 of μm is formed. Also, the remaining TFT1
An electrode column 104 having a height of 20 μm is formed on 2b by copper plating.

Next, a PVA resin layer 106Y in which a predetermined amount of a liquid crystal material containing a yellow dichroic dye is dispersed is formed to a thickness of 10 μm.
Then, the first ITO 108 having a thickness of 20 nm is formed by sputtering except the region of the electrode pillar.

Subsequently, a PVA resin layer 106C in which a predetermined amount of a liquid crystal material containing a cyan dichroic dye is dispersed is formed to a thickness of 10 μm.
Formed by sputtering. 20 nm thick ITO11
Form 0. Here, the electrode pillar 104 having a height of 20 μm and the ITO 110 are connected. Next, a PVA resin layer 10 in which a liquid crystal material containing a magenta dichroic dye is dispersed in a predetermined amount.
A counter substrate 10b in which 6 μm of 10 μm is formed, ITO is sputtered to a thickness of 20 nm, and pixel electrodes are patterned.
Are overlapped with each other to ensure electrical continuity between the 30 μm electrode column 102 and the ITO. The liquid crystal layers 106Y, 106C, and 106M have the voltage transmittance characteristics shown in FIG.

In the following, a driver IC will be created using the TCP method.
16 was applied and the drive voltage shown in FIG. 16 was applied between the respective electrodes, a predetermined color with a contrast of approximately 3: 1 could be displayed on a total of 6 pixels in 2 lines × 3 layers.

19 to 35 are shown in FIGS.
Various variations are shown that function similarly to the pixel electrode array shown in FIG.

The connection between electrodes or electrode layers will be briefly described below. In each drawing, the two insulating substrates are shown as 10a and 10b for simplification, and the electrode layers (outer electrodes) in contact with the respective substrates are the first layer and the fourth layer, and the first layer and the fourth layer. Of the electrode layers (inner electrodes) disposed between the layers, the layer located above the first layer is referred to as the second layer, and the layer located above the fourth layer is referred to as the third layer. The first
If the fourth layer is divided in the same layer, the subscripts a, b, c ... Are added to the respective layers. The position of the hole for the electrode column formed in the electrode layer is indicated by H. The position of the TFT is indicated by S, and the same subscripts 1, 2, 3, ... Are added to the groups operated at the same timing. Furthermore, the height is 10 μm
Of the electrode column of I, the electrode column of 20 μm in height is J and the height of 3 is 3
Let K be the electrode column of 0 μm.

In the example shown in FIG. 19, the electrode 1 of the first layer is
Each of a, 1b, and 1c is operated by the TFT S1. Since the electrodes 2a and 2b of the second layer are connected to each other, they are operated by one TFT S2. The electrode 2c is driven by the independent TFT S2. Third
The layer electrodes 3a, 3b, 3c are each operated by a TFT S3. The electrodes 3a are the electrode columns J of the second layer.
It is driven by the electrode column J that passes through the hole H for.

In the example shown in FIG. 20, the electrode 1 of the first layer is
a is driven by an independent TFT S1. Electrode 1b
And 1c are connected to each other so that one TF
It is operated by TS1. Second layer electrodes 2a and 2b
Are likewise operated by one TFT S2. Third
The layer electrodes 3a, 3b, 3c are each operated by a TFT S3. In this case, the electrode 3a is formed by the electrode pillar J passing through the hole H for the electrode pillar J of the second layer.
b is driven by the TFTs S3 independent of each other by the electrode columns J passing through the holes H for the electrode columns J of the first layer.

In the example shown in FIG. 21, the first layer electrode 1 is used.
Each of a, 1b, and 1c is operated by the TFT S1. The electrodes 2a + 2b and the electrode 2c of the second layer are driven by a total of two TFTS2 which are independent of each other.
The electrode 3a of the third layer is driven by the TFT S3 via the electrode pillar J that passes through the hole H for the electrode pillar J of the second layer. On the other hand, the third-layer electrodes 3b and 3c are
Each is driven by two independent TFTS3.

In the example shown in FIG. 22, the first layer electrode 1 is used.
Each of a, 1b, and 1c is operated by the TFT S1. The electrodes 2a + 2b and the electrode 2c of the second layer are driven by a total of two TFTS2 which are independent of each other.
The electrodes 3a, 3b, 3c of the third layer are respectively formed by the TFTS.
3 and the electrodes 4a, 4b, 4c of the fourth layer are operated by the TFT S4, respectively. Note that FIG.
The arrangement of each electrode and the position of the TFT are shown in FIG.
1 is substantially the same as the example shown in FIG.

In the example shown in FIG. 23, the first layer electrode 1
Each of a, 1b, and 1c is operated by the TFT S1. The electrodes 2a + 2b and the electrode 2c of the second layer are driven by a total of two TFTS2 which are independent of each other.
The electrodes 3a, 3b, 3c of the third layer are respectively formed by the TFTS.
3 and the electrodes 4a, 4b, 4c of the fourth layer are operated by the TFT S4, respectively. The third layer electrode 3a and the fourth layer electrode 4a respectively correspond to the corresponding TFTs through the electrode columns J and K passing through the holes H of the second layer.
Connected to Note that the arrangement of the electrodes and the positions of the TFTs in FIG. 22 are substantially the same as those in the example shown in FIG.

24 to 35, as described with reference to FIGS. 19 to 22, at least a part of the pixel electrodes defining the pixels of the three layers is electrically conducted, The number of voltages (the number of voltage steps) required to apply a predetermined drive voltage to each pixel is reduced. 24 and 25, the commonly driven electrodes are 2a, 2b and 3 respectively.
b and 3c. Further, in FIG. 26, they are 2a, 2b and 4b, 4c. In FIG. 31, 3a and 2b, 3b and 2c, 3c and 2d ..., In FIGS. 32 and 33, 4a and 1b, 4b and 1c, respectively.
4c and 1d ...

As described above, in the three-layer color liquid crystal display device, a part of the pixel electrodes defining the pixels of the three layers is made common, and the threshold voltage and the saturation voltage are set to 1 between the layers. By arranging liquid crystal material in which the saturation voltage is set to twice the threshold voltage, it is possible to drive a given pixel to an arbitrary color with a smaller number (number = steps) of driving voltage than in the past. Can be displayed. Note that it is preferable that the pixel voltage has its polarity inverted every frame period. In the various examples described above,
The drive voltage whose polarity is inverted can be efficiently used. That is, the number of steps (types) of driving voltage is reduced.

The driving method and the structure of the pixel electrode described above are not governed by the types of liquid crystal material and dye. Further, the present invention can be used for both reflective and transmissive liquid crystal devices. In the case of the reflection type, it is necessary to provide a scattering surface or a directional reflection surface on the back surface of the liquid crystal display element or the reflection electrode. Further, it is desirable to provide an antireflection film on the front substrate. However,
Preferably, a liquid crystal display device having a structure that does not require a polarizing plate is used.

By using a liquid crystal material having no memory property as the liquid crystal material, high-speed and high-contrast display is possible. In addition, it is preferable to select a liquid crystal material and a layer structure in which the alignment order of the dye in the liquid crystal is set to 0.8 or more. The spectral characteristics of the dye material are set to black, dark gray, or deep blue by superposition.

[0119]

As described above, according to the liquid crystal display device of the present invention, the pixel electrode has a structure in which at least one of the pixel electrodes arranged inside is electrically connected to the adjacent pixel electrode, A structure in which two kinds of pixel electrodes arranged outside are electrically connected to adjacent pixel electrodes, a structure in which two kinds of pixel electrodes arranged outside are electrically connected to each other, or arranged outside The two types of pixel electrodes are electrically connected to the other pixel electrode of the adjacent pixel and are defined by a combination of them, which simplifies the manufacturing process (reduces the number of steps) and reduces the driving voltage. Enables reduction of types (steps).

As a result, the number of steps of the drive voltage for driving the pixel electrode can be reduced. Moreover, the structure of the liquid crystal display device can be simplified.

Therefore, the yield in manufacturing the color liquid crystal display device is improved and the manufacturing cost is reduced.

[Brief description of drawings]

FIG. 1 is a schematic diagram showing a structure of a liquid crystal display device to which an embodiment of the present invention is applied.

FIG. 2 is a schematic diagram showing a modified example of the liquid crystal display device shown in FIG.

FIG. 3 is a schematic diagram showing a modified example of the liquid crystal display device shown in FIG.

FIG. 4 is a schematic diagram showing a structure of a liquid crystal display device different from the liquid crystal display device shown in FIG.

5 is a schematic diagram showing the structure of a liquid crystal display device shown in FIG.

6 is a schematic diagram showing a modification of the liquid crystal display device shown in FIG.

7 is a schematic diagram showing a structure of a liquid crystal display device different from the liquid crystal display device shown in FIG.

8 is a schematic diagram showing a modification of the liquid crystal display device shown in FIG.

9 is a schematic diagram showing a modification of the liquid crystal display device shown in FIG.

10 is a schematic diagram showing a modification of the liquid crystal display device shown in FIG.

11 is a graph showing the relationship between the voltage and the transmittance of the liquid crystal material used in the liquid crystal display device shown in FIGS.

FIG. 12 is a schematic diagram showing an example of a driving voltage applied to each pixel electrode of the liquid crystal display device having the structure shown in FIGS.

FIG. 13 is a schematic diagram showing an example of a drive voltage applied to each pixel electrode of the liquid crystal display device having the structure shown in FIGS.

14 is a schematic diagram showing an example of a drive voltage applied to each pixel electrode of the liquid crystal display device having the structure shown in FIGS. 7 and 8. FIG.

15 is a graph showing the relationship between the voltage and the transmittance of the liquid crystal material used in the liquid crystal display device shown in FIGS.

16 is a schematic diagram showing an example of a drive voltage applied to each pixel electrode of the liquid crystal display device having the structure shown in FIGS. 9 and 10. FIG.

17 is a schematic view showing a shape of a pixel electrode film used to provide a liquid crystal layer of the liquid crystal display device shown in FIG.

18 is a schematic diagram showing an example of a pattern of pixel electrodes of an intermediate liquid crystal layer of the liquid crystal display device shown in FIG.

FIG. 19 is a schematic diagram showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10.

20 is a schematic view showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10. FIG.

21 is a schematic diagram showing another example of the layer structure of the liquid crystal display device shown in FIGS.

22 is a schematic diagram showing another example of the layer structure of the liquid crystal display device shown in FIGS.

23 is a schematic view showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10. FIG.

FIG. 24 is a schematic view showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10.

25 is a schematic diagram showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10. FIG.

FIG. 26 is a schematic view showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10.

27 is a schematic view showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10. FIG.

28 is a schematic diagram showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10. FIG.

29 is a schematic view showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10. FIG.

FIG. 30 is a schematic view showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10.

FIG. 31 is a schematic view showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10.

32 is a schematic diagram showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10. FIG.

FIG. 33 is a schematic diagram showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10.

34 is a schematic diagram showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10. FIG.

FIG. 35 is a schematic view showing another example of the layer structure of the liquid crystal display device shown in FIGS. 1 to 10.

[Explanation of symbols]

 10 ... Color liquid crystal display device, 10a ... Insulating substrate, 10b ... Insulating substrate, Y ... Yellow liquid crystal layer, C ... Cyan liquid crystal layer, H ... Hole for electrode column, I ... Electrode column (10 μm), J ... Electrode column ( 20 μm), K ... Electrode column (30 μm), T ... TFT (thin film transistor).

Claims (17)

[Claims] 1. A matrix-type liquid crystal display device comprising a plurality of liquid crystal layers laminated, three or more kinds of pixel electrodes for driving the respective liquid crystal layers, and applying a voltage to each pixel electrode to drive the liquid crystal layers. A display device having a common electrode structure in which two types of pixel electrodes arranged in layers are connected to each other. 2. A matrix-type liquid crystal display device comprising a plurality of liquid crystal layers laminated, having three or more kinds of pixel electrodes for driving the respective liquid crystal layers, wherein a voltage is applied to each of the pixel electrodes to drive. A display device, wherein at least one kind of the pixel electrodes arranged in the above is electrically connected to an adjacent pixel electrode. 3. A matrix-type liquid crystal display device comprising a plurality of liquid crystal layers laminated, having three or more kinds of pixel electrodes for driving the respective liquid crystal layers, and applying a voltage to each pixel electrode to drive the liquid crystal layer. 2. The display device, wherein the two types of pixel electrodes arranged in the above are electrically connected to the adjacent pixel electrodes, respectively. 4. A matrix type liquid crystal display device comprising a plurality of liquid crystal layers laminated, having three or more kinds of pixel electrodes for driving each of the liquid crystal layers, wherein a voltage is applied to each pixel electrode to drive the matrix type liquid crystal display device. 2. A display device characterized in that the two kinds of pixel electrodes arranged in the above are electrically connected to each other. 5. A matrix type liquid crystal display device comprising a plurality of liquid crystal layers laminated, having three or more kinds of pixel electrodes for driving each liquid crystal layer, wherein a voltage is applied to each pixel electrode to drive the liquid crystal layer. 2. The display device, wherein the two types of pixel electrodes arranged in the above are electrically connected to the other pixel electrode of the adjacent pixel. 6. The display device according to claim 1, wherein the liquid crystal display element comprises three liquid crystal layers and four kinds of electrodes. 7. The liquid crystal display device comprises:
6. The display device according to claim 1, wherein the display device has a common pixel electrode for each line. 8. The liquid crystal display device comprises:
6. The display device according to claim 1, wherein the display device has a common pixel electrode for each line. 9. The display device according to claim 1, wherein the liquid crystal display element has a pixel electrode connected by a conductive member penetrating at least one liquid crystal layer. 10. The display device according to claim 1, wherein the liquid crystal display element has a pixel electrode disposed inside thereof electrically connected to a switch element on a substrate. 11. The liquid crystal display device according to claim 1, further comprising a liquid crystal material provided with an electro-optical characteristic value in which a threshold voltage is set to approximately ½ of a saturation voltage. Either display device. 12. The liquid crystal display device, with respect to a standard potential,
From the potential having the difference between the threshold voltage and the saturation voltage,
6. The display device according to claim 1, wherein the pixel electrode potential is selected. 13. The display device according to claim 1, wherein in the liquid crystal display element, two types of connected pixel electrodes are electrodes of adjacent pixels. 14. A first insulating substrate, an electrode layer provided on one surface side of the first insulating substrate to provide three-layered divided regions, and the electrode layer with the electrode layer interposed therebetween. A second insulating substrate facing the first insulating substrate; and a conductive member arranged between the first and second insulating substrates and electrically connecting at least two electrode layers of the electrode layers, Display device having. 15. The display device according to claim 14, wherein the conductive member connects at least two pixel electrodes in an electrode layer on the same plane. 16. The display device according to claim 14, wherein the conductive member connects at least two pixel electrodes in electrode layers on different planes. 17. The display device according to claim 14, wherein the conductive member connects at least two pixel electrodes adjacent to each other.