JPH09263636A - Polyimide resin - Google Patents
Polyimide resinInfo
- Publication number
- JPH09263636A JPH09263636A JP7735496A JP7735496A JPH09263636A JP H09263636 A JPH09263636 A JP H09263636A JP 7735496 A JP7735496 A JP 7735496A JP 7735496 A JP7735496 A JP 7735496A JP H09263636 A JPH09263636 A JP H09263636A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- mol
- polyimide resin
- mole
- diamine represented
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 48
- 239000009719 polyimide resin Substances 0.000 title claims abstract description 45
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims abstract description 13
- -1 cyclic siloxane Chemical class 0.000 claims abstract description 13
- 239000011347 resin Substances 0.000 claims abstract description 13
- 229920005989 resin Polymers 0.000 claims abstract description 13
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 claims abstract description 8
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 4
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 3
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 3
- 150000004985 diamines Chemical class 0.000 claims description 36
- 229920001296 polysiloxane Polymers 0.000 claims description 24
- 239000003960 organic solvent Substances 0.000 claims description 20
- 150000001412 amines Chemical class 0.000 claims description 15
- 239000002253 acid Substances 0.000 claims description 14
- 150000003949 imides Chemical group 0.000 claims description 7
- 238000006798 ring closing metathesis reaction Methods 0.000 claims description 7
- 150000008065 acid anhydrides Chemical class 0.000 claims description 6
- 150000004982 aromatic amines Chemical class 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 3
- SMDGQEQWSSYZKX-UHFFFAOYSA-N 3-(2,3-dicarboxyphenoxy)phthalic acid Chemical compound OC(=O)C1=CC=CC(OC=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O SMDGQEQWSSYZKX-UHFFFAOYSA-N 0.000 claims description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 abstract description 5
- 239000012776 electronic material Substances 0.000 abstract description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 abstract 1
- 239000002904 solvent Substances 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000002966 varnish Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 229920005575 poly(amic acid) Polymers 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000002798 polar solvent Substances 0.000 description 4
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000012454 non-polar solvent Substances 0.000 description 3
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- LBPVOEHZEWAJKQ-UHFFFAOYSA-N 3-[4-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 LBPVOEHZEWAJKQ-UHFFFAOYSA-N 0.000 description 2
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 2
- WOYZXEVUWXQVNV-UHFFFAOYSA-N 4-phenoxyaniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC=C1 WOYZXEVUWXQVNV-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000005457 ice water Substances 0.000 description 2
- 125000005462 imide group Chemical group 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- KNDQHSIWLOJIGP-UMRXKNAASA-N (3ar,4s,7r,7as)-rel-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione Chemical compound O=C1OC(=O)[C@@H]2[C@H]1[C@]1([H])C=C[C@@]2([H])C1 KNDQHSIWLOJIGP-UMRXKNAASA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- XUSNPFGLKGCWGN-UHFFFAOYSA-N 3-[4-(3-aminopropyl)piperazin-1-yl]propan-1-amine Chemical compound NCCCN1CCN(CCCN)CC1 XUSNPFGLKGCWGN-UHFFFAOYSA-N 0.000 description 1
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- NMEJXGYJALHCPB-UHFFFAOYSA-N 4-[2-(4-aminophenoxy)-1,1,1,3,3,3-hexafluoropropan-2-yl]oxyaniline Chemical compound C1=CC(N)=CC=C1OC(C(F)(F)F)(C(F)(F)F)OC1=CC=C(N)C=C1 NMEJXGYJALHCPB-UHFFFAOYSA-N 0.000 description 1
- HHLMWQDRYZAENA-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 HHLMWQDRYZAENA-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- ZHBXLZQQVCDGPA-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)sulfonyl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(S(=O)(=O)C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 ZHBXLZQQVCDGPA-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 125000006159 dianhydride group Chemical group 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000000642 dynamic headspace extraction Methods 0.000 description 1
- 239000002305 electric material Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- BHAAPTBBJKJZER-UHFFFAOYSA-N p-anisidine Chemical compound COC1=CC=C(N)C=C1 BHAAPTBBJKJZER-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- UGODCLHJOJPPHP-AZGWGOJFSA-J tetralithium;[(2r,3s,4r,5r)-5-(6-aminopurin-9-yl)-4-hydroxy-2-[[oxido(sulfonatooxy)phosphoryl]oxymethyl]oxolan-3-yl] phosphate;hydrate Chemical compound [Li+].[Li+].[Li+].[Li+].O.C1=NC=2C(N)=NC=NC=2N1[C@@H]1O[C@H](COP([O-])(=O)OS([O-])(=O)=O)[C@@H](OP([O-])([O-])=O)[C@H]1O UGODCLHJOJPPHP-AZGWGOJFSA-J 0.000 description 1
- 229920006259 thermoplastic polyimide Polymers 0.000 description 1
Landscapes
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、耐熱性に優れ、か
つ有機溶剤に可溶で成形加工性に優れたポリイミド樹脂
に関するものである。TECHNICAL FIELD The present invention relates to a polyimide resin which is excellent in heat resistance, soluble in an organic solvent and excellent in moldability.
【0002】[0002]
【従来の技術】ポリイミド樹脂は耐熱性が高く難燃性で
電気絶縁性に優れていることから、電気、電子材料とし
て広く利用されている。フィルムとしてフレキシブル印
刷配線板や耐熱性接着テープの基材に、樹脂ワニスとし
て半導体の絶縁皮膜、保護皮膜に広く利用されている。
しかし、従来のポリイミド樹脂は吸湿性が高く、耐熱性
に優れている反面不溶不融であったり極めて融点が高
く、加工性の点で決して使いやすい材料とはいえなかっ
た。半導体の実装材料として層間絶縁膜、表面保護膜な
どに使用されているが、これらは有機溶剤に可溶な前駆
体ポリアミド酸を半導体表面に塗布し、加熱処理によっ
て溶剤を除去すると共にイミド化を進めている。この
時、イミド化に300℃以上の高温で1時間以上の加熱
行程を必要とし、素子を高温にさらすため、アセンブリ
行程の収率を低下させる。また、皮膜の吸湿性が高いた
め吸収した水分が高温時に一気に蒸発して膨れやクラッ
クの原因となるなどの問題点があった。2. Description of the Related Art Polyimide resins are widely used as electric and electronic materials because of their high heat resistance, flame retardancy and excellent electrical insulation. It is widely used as a film as a base material for flexible printed wiring boards and heat-resistant adhesive tapes, and as a resin varnish for insulating and protective films of semiconductors.
However, conventional polyimide resins have high hygroscopicity and excellent heat resistance, but on the other hand, they are insoluble and infusible or have extremely high melting points, so that they cannot be said to be easy-to-use materials in terms of workability. It is used as a semiconductor mounting material for interlayer insulating films and surface protection films.For these, a precursor polyamic acid soluble in an organic solvent is applied to the semiconductor surface, and the solvent is removed by heat treatment and imidization is performed. proceeding. At this time, the imidization requires a heating step at a high temperature of 300 ° C. or more for one hour or more, and the device is exposed to a high temperature, thereby lowering the yield of the assembly step. Further, since the film has high hygroscopicity, there is a problem that the absorbed water evaporates at a stretch at a high temperature and causes swelling and cracks.
【0003】一方、これらの従来型のポリイミド樹脂の
欠点を補う目的で、多くの熱可塑性ポリイミド樹脂や溶
媒可溶性ポリイミド樹脂が提案されている。その一つと
してシリコーン変性ポリイミド樹脂がある。シリコーン
変性ポリイミド樹脂は低吸湿性と溶媒可溶性に優れてお
りエレクトロニクス用として好適ではあるが、シリコー
ン含量と密接に関連する耐熱性と溶媒可溶性、低吸湿性
はトレードオフの関係にある。より優れた信頼性を得る
には従来のシリコーン変性ポリイミド樹脂では充分とは
言えなかった。On the other hand, many thermoplastic polyimide resins and solvent-soluble polyimide resins have been proposed for the purpose of compensating for the drawbacks of these conventional polyimide resins. One of them is a silicone-modified polyimide resin. Silicone-modified polyimide resins are excellent in low hygroscopicity and solvent solubility and are suitable for electronics. However, there is a trade-off between heat resistance, solvent solubility, and low hygroscopicity, which are closely related to the silicone content. The conventional silicone-modified polyimide resin was not sufficient to obtain better reliability.
【0004】[0004]
【発明が解決しようとする課題】本発明は、耐熱性に優
れ吸湿性の低い、かつ有機溶剤に可溶な成形加工性の優
れたポリイミド樹脂を得るべく鋭意研究を重ねた結果、
特定構造のポリイミド樹脂が上記課題を解決することが
できることを見出し、本発明に到達したものである。DISCLOSURE OF INVENTION Problems to be Solved by the Invention The present invention has been earnestly studied to obtain a polyimide resin having excellent heat resistance, low hygroscopicity, and solubility in an organic solvent and excellent moldability.
The present inventors have found that a polyimide resin having a specific structure can solve the above problems, and arrived at the present invention.
【0005】[0005]
【0006】本発明のポリイミド樹脂は350℃を超え
ない温度で5分間加熱した時に式(1)で表される環状
シロキサンガスの発生量が樹脂の0.02重量%未満で
あることを特徴とし、かつ式(2)で表されるシリコー
ンジアミンと4,4’−オキシジフタル酸二無水物を必
須成分とするシリコーン変性ポリイミド樹脂である。The polyimide resin of the present invention is characterized in that the amount of the cyclic siloxane gas represented by the formula (1) is less than 0.02% by weight of the resin when heated at a temperature not exceeding 350 ° C. for 5 minutes. And a silicone-modified polyimide resin containing silicone diamine represented by the formula (2) and 4,4′-oxydiphthalic dianhydride as essential components.
【0007】[0007]
【化1】 (nは3以上の整数)Embedded image (N is an integer of 3 or more)
【0008】[0008]
【化2】 (式中R1は2価の炭化水素基)Embedded image (In the formula, R 1 is a divalent hydrocarbon group)
【0009】本発明のポリイミド樹脂は、式(2)で表
されるシリコーンジアミンaモルと式(3)で表される
シリコーンジアミンbモルおよび他のジアミンcモルを
アミン成分、4,4’−オキシジフタル酸二無水物dモ
ルと他の酸二無水物eモルを酸成分とし、かつ0.02
≦a/(a+b+c)≦0.50かつb/(a+b+
c)≦0.02かつ0.6≦d/(d+e)かつ0.9
6≦(d+e)/(a+b+c)≦1.04のモル比で
両成分を反応させイミド閉環せしめた有機溶剤に可溶な
ポリイミド樹脂あるいは該ポリイミド樹脂の分子末端を
一般式(5)で表される酸無水物fモルでエンドキャッ
プし、かつ0.02≦a/(a+b+c)≦0.50か
つb/(a+b+c)≦0.02かつ0.6≦d/(d
+e+0.5f)かつ0.002≦0.5f/(d+e
+0.5f)≦0.05かつ0.96≦(d+e+0.
5f)/(a+b+c)≦1.04のモル比で両成分を
反応させイミド閉環せしめた有機溶剤に可溶なポリイミ
ド樹脂あるいは該ポリイミド樹脂の分子末端を一般式
(6)で表される芳香族アミンgモルでエンドキャップ
し、かつ0.02≦a/(a+b+c+0.5g)≦
0.50かつb/(a+b+c+0.5g)≦0.02
かつ0.002≦0.5g/(a+b+c+0.5g)
≦0.05かつ0.6≦d/(d+e)かつ0.96≦
(d+e)/(a+b+c+0.5g)≦1.04のモ
ル比で両成分を反応させイミド閉環せしめた有機溶剤に
可溶なポリイミド樹脂である。The polyimide resin of the present invention comprises a mol of the silicone diamine represented by the formula (2), b mol of the silicone diamine represented by the formula (3) and c mol of the other diamine as the amine component, 4,4'-. Oxydiphthalic acid dianhydride (d mol) and another acid dianhydride (e mol) as acid components, and 0.02
≦ a / (a + b + c) ≦ 0.50 and b / (a + b +
c) ≤ 0.02 and 0.6 ≤ d / (d + e) and 0.9
A polyimide resin soluble in an organic solvent, which is obtained by reacting both components at a molar ratio of 6 ≦ (d + e) / (a + b + c) ≦ 1.04 and is imide-cyclized, or the molecular end of the polyimide resin is represented by the general formula (5). Endcapping with f mole of acid anhydride of 0.02 ≦ a / (a + b + c) ≦ 0.50 and b / (a + b + c) ≦ 0.02 and 0.6 ≦ d / (d
+ E + 0.5f) and 0.002 ≦ 0.5f / (d + e
+ 0.5f) ≦ 0.05 and 0.96 ≦ (d + e + 0.
5f) / (a + b + c) ≦ 1.04 molar ratio of both components are reacted to imide ring-close the polyimide resin soluble in an organic solvent or the aromatic polymer represented by the general formula (6) at the molecular end of the polyimide resin. Endcapped with g mol of amine and 0.02 ≦ a / (a + b + c + 0.5 g) ≦
0.50 and b / (a + b + c + 0.5g) ≦ 0.02
And 0.002 ≦ 0.5g / (a + b + c + 0.5g)
≦ 0.05 and 0.6 ≦ d / (d + e) and 0.96 ≦
It is a polyimide resin soluble in an organic solvent in which both components are reacted at a molar ratio of (d + e) / (a + b + c + 0.5 g) ≦ 1.04 to cause imide ring closure.
【0010】[0010]
【化3】 (式中R2は2価の炭化水素基、nは2〜20の整数)Embedded image (In the formula, R 2 is a divalent hydrocarbon group, n is an integer of 2 to 20)
【0011】[0011]
【化4】 Embedded image
【0012】[0012]
【化5】 Embedded image
【0013】[0013]
【化6】 (式中Yは水素原子、あるいはメチル、エチル、プロピ
ル、ブチル、フェニル、メトキシ、エトキシ、プロポキ
シ、ブトキシもしくはフェノキシ基の中から選ばれた少
なくとも1種類の基)[Chemical 6] (Wherein Y is a hydrogen atom or at least one group selected from methyl, ethyl, propyl, butyl, phenyl, methoxy, ethoxy, propoxy, butoxy or phenoxy groups).
【0014】本発明で使用する式(2)で表されるシリ
コーンジアミンは、1,3−ビス(3−アミノプロピ
ル)テトラメチルシロキサンなどであって、低吸水性、
低温加工性、溶媒への溶解性を付与するために用いる。
またこれらの短鎖シリコーンジアミンは耐熱性に優れ他
のシリコーンジアミンを用いるよりも高温での信頼性の
高い樹脂が製造できる。該シリコーンジアミンは全アミ
ン成分の2〜50モル%の範囲で用いることが好ましい
2モル%より少ないと低吸湿性、低温加工性、溶媒への
溶解性が発現せず、50モル%を越えるとガラス転移温
度が著しく低下し耐熱性に問題が生じる。より好ましい
添加量は低吸湿性、低温加工性、溶媒への溶解性、耐熱
性の点から全アミン成分の10モル%〜35モル%であ
る。The silicone diamine represented by the formula (2) used in the present invention is 1,3-bis (3-aminopropyl) tetramethylsiloxane and has a low water absorption property.
Used to impart low temperature processability and solubility in solvents.
Further, these short-chain silicone diamines are excellent in heat resistance and can produce a resin having higher reliability at high temperatures than using other silicone diamines. It is preferable to use the silicone diamine in the range of 2 to 50 mol% of the total amine component. If it is less than 2 mol%, low hygroscopicity, low temperature processability and solubility in a solvent will not be exhibited, and if it exceeds 50 mol%. The glass transition temperature is remarkably lowered, causing a problem in heat resistance. A more preferable amount of addition is 10 mol% to 35 mol% of all amine components from the viewpoint of low hygroscopicity, low-temperature processability, solubility in a solvent, and heat resistance.
【0015】本発明で使用する式(3)で表されるシリ
コーンジアミンは、α,ω−ビス(3−アミノプロピ
ル)ポリジメチルシロキサンなどであり式(2)のもの
と併用することによって低吸水性、低温加工性、溶媒へ
の溶解性を著しく向上させる。特にnが4〜13の範囲
がガラス転移温度、加工性の点から好ましい。ただしこ
のシリコーンジアミンは高温で分解し式(1)で表され
る環状シロキサンガスを発生するため樹脂の発泡や周辺
材料の汚染を引き起こすおそれがあり、樹脂の耐熱性の
点からその添加量は全アミン成分の2モル%以下でなけ
ればならない。より好ましい添加量は低吸湿性、低温加
工性、高温での耐熱性の点から全アミン成分の0.2〜
0.8モル%である。The silicone diamine represented by the formula (3) used in the present invention is α, ω-bis (3-aminopropyl) polydimethylsiloxane and the like, and when used in combination with the one represented by the formula (2), low water absorption is obtained. Properties, low-temperature processability, and solubility in solvents are significantly improved. Particularly, the range of n of 4 to 13 is preferable from the viewpoint of glass transition temperature and workability. However, since this silicone diamine decomposes at high temperature to generate the cyclic siloxane gas represented by the formula (1), it may cause foaming of the resin and contamination of surrounding materials. It should be 2 mol% or less of the amine component. The more preferable addition amount is 0.2 to 0.2% of all amine components in view of low hygroscopicity, low temperature processability, and heat resistance at high temperature.
It is 0.8 mol%.
【0016】酸成分の主要な構成成分である4,4’−
オキシジフタル酸二無水物の量比は、得られるポリイミ
ド樹脂の溶解性に極めて重要で、上記の範囲内にないと
低沸点溶剤に溶解するという本発明の特徴が失われる。4,4'- which is the main constituent of the acid component
The amount ratio of oxydiphthalic dianhydride is extremely important for the solubility of the obtained polyimide resin, and if it is not within the above range, the feature of the present invention that it is dissolved in a low boiling point solvent is lost.
【0017】また本発明で用いる他のジアミンとしては
2,2−ビス(4−(4−アミノフェノキシ)フェニ
ル)プロパン、2,2−ビス(4−(4−アミノフェノ
キシ)フェニル)ヘキサフルオロプロパン、2,2−ビ
ス(4−アミノフェノキシ)ヘキサフルオロプロパン、
ビス−4−(4−アミノフェノキシ)フェニルスルフォ
ン、ビス−4−(3−アミノフェノキシ)フェニルスル
フォン、1,3−ビス(3−アミノフェノキシ)ベンゼ
ン、1,4−ビス(3−アミノフェノキシ)ベンゼン、
1,4−ビス(4−アミノフェノキシ)ベンゼン、1,
4−ビス(3−アミノフェノキシ)ベンゼン、4,4’
−ジアミノジフェニルエーテル、3,4’−ジアミノジ
フェニルエーテル、4,4’−ジアミノジフェニルスル
フォン、3,3’−ジアミノジフェニルスルフォン、
4,4’−ジアミノジフェニルメタン、4,4’−ビス
(4−アミノフェノキシ)ビフェニルなどの中の1種類
もしくは2種類を組み合わせて用いることが出来る。中
でも接着性を重視する応用分野ではアミノフェノキシ構
造を持つジアミンを用いることが好ましい。Other diamines used in the present invention include 2,2-bis (4- (4-aminophenoxy) phenyl) propane and 2,2-bis (4- (4-aminophenoxy) phenyl) hexafluoropropane. 2,2-bis (4-aminophenoxy) hexafluoropropane,
Bis-4- (4-aminophenoxy) phenylsulfone, bis-4- (3-aminophenoxy) phenylsulfone, 1,3-bis (3-aminophenoxy) benzene, 1,4-bis (3-aminophenoxy) benzene,
1,4-bis (4-aminophenoxy) benzene, 1,
4-bis (3-aminophenoxy) benzene, 4,4 ′
-Diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylsulfone, 3,3'-diaminodiphenylsulfone,
One or two kinds of 4,4'-diaminodiphenylmethane, 4,4'-bis (4-aminophenoxy) biphenyl and the like can be used in combination. Above all, it is preferable to use a diamine having an aminophenoxy structure in an application field in which adhesiveness is important.
【0018】また本発明で用いる他の酸二無水物として
は3,3’,4,4’−ジフェニルスルホンテトラカル
ボン酸二無水物、3,3’,4,4’−ビフェニルテト
ラカルボン酸二無水物、3,3’,4,4’−ベンゾフ
ェノンテトラカルボン酸二無水物、無水ピロメリット酸
などの中の1種類もしくは2種類を組み合わせて用いる
ことが出来る。Other acid dianhydrides used in the present invention include 3,3 ', 4,4'-diphenylsulfone tetracarboxylic dianhydride and 3,3', 4,4'-biphenyl tetracarboxylic dianhydride. It is possible to use one kind or a combination of two kinds of anhydrides, 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride, pyromellitic dianhydride and the like.
【0019】式(4)で表されるジアミンは1,3−ビ
ス(3−アミノフェノキシ)ベンゼンや1,4−ビス
(4−アミノフェノキシ)ベンゼンなどであり、特に
1,3−ビス(3−アミノフェノキシ)ベンゼンを用い
る事は低沸点溶媒への溶解性や低温加工性の面で好まし
い。The diamine represented by the formula (4) includes 1,3-bis (3-aminophenoxy) benzene and 1,4-bis (4-aminophenoxy) benzene, and particularly 1,3-bis (3 The use of -aminophenoxy) benzene is preferable from the viewpoint of solubility in low boiling point solvents and low temperature processability.
【0020】接着剤や成形材料等に当該ポリイミドを使
用する場合、分子末端をエンドキャップし分子量をコン
トロールする事により、接着や成形に適した溶融粘度を
得ることができ、加工性を高めることができる。エンド
キャップ剤である酸無水物、あるいは芳香族アミンの量
比は上記の範囲にあることが好ましい。この範囲より少
ないと分子量が高くなりすぎて、本発明の特徴である低
沸点溶剤への溶解性が低下し、また接着性を重視する用
途では溶融粘度の上昇により濡れ性が低下し好ましくな
い。またこの範囲以上では分子量が著しく低下し、耐熱
性に問題を生じる。さらに低温加工性、耐熱性、機械強
度の点からエンドキャップ剤が全酸成分あるいは全アミ
ン成分の0.4〜2.4モル%の範囲にあることがより
好ましい。When the polyimide is used for an adhesive or a molding material, the end of the molecule is end-capped to control the molecular weight, whereby a melt viscosity suitable for adhesion and molding can be obtained and processability can be improved. it can. The amount ratio of the acid anhydride or the aromatic amine as the end cap agent is preferably within the above range. If the amount is less than this range, the molecular weight becomes too high, and the solubility in a low boiling point solvent, which is a feature of the present invention, decreases, and in applications where importance is placed on adhesiveness, wettability decreases due to an increase in melt viscosity, which is not preferable. On the other hand, if the amount is above this range, the molecular weight will be remarkably reduced, causing a problem in heat resistance. From the viewpoints of low-temperature processability, heat resistance, and mechanical strength, the endcapping agent is more preferably in the range of 0.4 to 2.4 mol% of the total acid component or the total amine component.
【0021】エンドキャップ剤としては一般式(5)で
表される酸無水物および一般式(6)で表される芳香族
アミンが挙げられる。酸無水物としては、無水フタル
酸、無水マレイン酸、無水ナジック酸など、芳香族アミ
ンとしては、p−メチルアニリン、p−メトキシアニリ
ン、p−フェノキシアニリンなどが用いられる。Examples of the end cap agent include the acid anhydride represented by the general formula (5) and the aromatic amine represented by the general formula (6). As the acid anhydride, phthalic anhydride, maleic anhydride, nadic acid anhydride and the like are used, and as the aromatic amine, p-methylaniline, p-methoxyaniline, p-phenoxyaniline and the like are used.
【0022】重合反応における酸性分とアミン成分の等
量比は、得られるポリアミック酸の分子量を決定する重
要な因子である。ポリマの分子量と物性、特に数平均分
子量と機械的性質の間に相関があることはよく知られて
いる。数平均分子量が大きいほど機械的性質が優れてい
る。従って、実用的に優れた強度を得るためにはある程
度高分子量で有ることが必要である。本発明では酸性分
とアミン成分の当量比rが0.96≦r≦1.04のモ
ル比であることが好ましい。また0.98≦r≦1.0
2の範囲であることは機械的強度および耐熱性の両面か
らより好ましい。The equivalence ratio between the acidic component and the amine component in the polymerization reaction is an important factor that determines the molecular weight of the polyamic acid obtained. It is well known that there is a correlation between the molecular weight and physical properties of polymers, especially the number average molecular weight and mechanical properties. The larger the number average molecular weight, the better the mechanical properties. Therefore, in order to obtain practically excellent strength, it is necessary to have a high molecular weight to some extent. In the present invention, the equivalent ratio r of the acidic component and the amine component is preferably 0.96 ≦ r ≦ 1.04. 0.98 ≦ r ≦ 1.0
The range of 2 is more preferable from the viewpoint of both mechanical strength and heat resistance.
【0023】テトラカルボン酸二無水物とジアミンとの
反応は、非プロトン性極性溶媒中で公知の方法で行われ
る。非プロトン性極性溶媒は、N,N−ジメチルホルム
アミド(DMF)、N,N−ジメチルアセトアミド(D
MAC)、N−メチル−2−ピロリドン(NMP)、テ
トラヒドロフラン(THF)、ジグライム、シクロヘキ
サノン、1,4−ジオキサン(1,4−DO)などであ
る。非プロトン性極性溶媒は、一種類のみ用いてもよい
し、二種類以上を混合して用いてもよい。この時、上記
非プロトン性極性溶媒と相溶性がある非極性溶媒を混合
して使用しても良い。トルエン、キシレン、ソルベント
ナフサなどの芳香族炭化水素が良く使用される。混合溶
媒における非極性溶媒の割合は、30重量%以下である
ことが好ましい。これは非極性溶媒が30重量%以上で
は溶媒の溶解力が低下しポリアミック酸が析出する恐れ
があるためである。テトラカルボン酸二無水物とジアミ
ンとの反応は、良く乾燥したジアミン成分を脱水精製し
た前述反応溶媒に溶解し、これに閉環率98%、より好
ましくは99%以上の良く乾燥したテトラカルボン酸二
無水物を添加して反応を進める。The reaction between the tetracarboxylic dianhydride and the diamine is carried out by a known method in an aprotic polar solvent. Aprotic polar solvents include N, N-dimethylformamide (DMF), N, N-dimethylacetamide (D
MAC), N-methyl-2-pyrrolidone (NMP), tetrahydrofuran (THF), diglyme, cyclohexanone, 1,4-dioxane (1,4-DO) and the like. The aprotic polar solvent may be used alone or in combination of two or more. At this time, a non-polar solvent compatible with the aprotic polar solvent may be mixed and used. Aromatic hydrocarbons such as toluene, xylene and solvent naphtha are often used. The proportion of the nonpolar solvent in the mixed solvent is preferably 30% by weight or less. This is because if the nonpolar solvent is 30% by weight or more, the solvent power of the solvent may be reduced and polyamic acid may be precipitated. The reaction between the tetracarboxylic dianhydride and the diamine is carried out by dissolving the well-dried diamine component in the above-mentioned reaction solvent that has been dehydrated and purified, and adding thereto the ring-closing rate of 98%, more preferably 99% or more. The reaction is allowed to proceed by adding the anhydride.
【0024】このようにして得たポリアミック酸溶液
を、続いて有機溶剤中で加熱脱水環化してイミド化しポ
リイミドにする。イミド化反応によって生じた水は閉環
反応を妨害するため、水と相溶しない有機溶剤を系中に
加えて共沸させてディーン・スターク(Dean-Stark)管
などの装置を使用して系外に排出する。水と相溶しない
有機溶剤としてはジクロルベンゼンが知られているが、
エレクトロニクス用としては塩素成分が混入する恐れが
あるので、好ましくは前記芳香族炭化水素を使用する。
また、イミド化反応の触媒として無水酢酸、β-ピコリ
ン、ピリジンなどの化合物を使用することは妨げない。The polyamic acid solution thus obtained is subsequently heated to dehydration and cyclization in an organic solvent to give an imidized polyimide. Since the water generated by the imidization reaction interferes with the ring-closing reaction, an organic solvent that is not compatible with water is added to the system to azeotropically evaporate it and use a device such as a Dean-Stark tube to remove it from the system. To discharge. Dichlorobenzene is known as an organic solvent that is incompatible with water,
For electronics use, the above-mentioned aromatic hydrocarbons are preferably used because chlorine components may be mixed therein.
Further, it does not prevent the use of compounds such as acetic anhydride, β-picoline, and pyridine as a catalyst for the imidization reaction.
【0025】本発明において、イミド閉環は程度が高い
ほど良く、イミド化率が低いと使用時の熱でイミド化が
起こり水が発生して好ましくないため、95%以上、よ
り好ましくは98%以上のイミド化率が達成されている
ことが望ましい。In the present invention, the higher the degree of imide ring closure, the better, and if the imidization ratio is low, imidization occurs due to heat during use and water is not generated, which is not preferable. Therefore, 95% or more, more preferably 98% or more. It is desirable that the imidization ratio of is achieved.
【0026】本発明のポリイミド樹脂の使用方法や用途
は特に限定されるものではないが、樹脂ワニスをそのま
まコーティングやディッピングに用いる他にワニスを流
延成形後乾燥しフィルムにする事も可能である。また固
体で押出成形用の樹脂として使用することも可能であ
る。固体にする方法としては貧溶媒への再沈殿等があ
る。樹脂ワニスで用いる場合でも特に不純物や異物等を
嫌うエレクトロニクス用途等に使用する場合は一度再沈
殿し固体にした樹脂を再度有機溶剤に溶解し濾過をして
用いることが好ましい。The method and use of the polyimide resin of the present invention are not particularly limited, but the resin varnish can be used as it is for coating or dipping, or the varnish can be cast and dried to form a film. . It is also possible to use it as a solid resin for extrusion molding. Examples of a method for solidifying the solid include reprecipitation in a poor solvent. Even when used as a resin varnish, particularly when used for electronic applications that dislike impurities and foreign substances, it is preferable to use a resin that has been reprecipitated and solidified once again dissolved in an organic solvent and filtered.
【0027】本発明のポリイミド樹脂は、有機溶剤に可
溶な特定構造のほぼ完全にイミド化されたポリイミド樹
脂である。ポリイミドの原料であるシリコーンジアミン
の鎖長と量比を限定することによって低吸湿性、低温加
工性を維持したまま従来のシリコーン変性ポリイミドを
遥かに上回る耐熱性を達成する事ができる。以下実施例
により本発明を詳細に説明するが、これらの実施例に限
定されるものではない。The polyimide resin of the present invention is an almost completely imidized polyimide resin having a specific structure which is soluble in an organic solvent. By limiting the chain length and the amount ratio of the silicone diamine, which is the raw material of the polyimide, it is possible to achieve heat resistance far exceeding that of conventional silicone-modified polyimide while maintaining low hygroscopicity and low-temperature processability. Hereinafter, the present invention will be described in detail with reference to examples, but the present invention is not limited to these examples.
【0028】[0028]
(実施例1)乾燥窒素ガス導入管、冷却器、温度計、撹
拌機を備えた四口フラスコに脱水精製したNMP384
gを入れ、窒素ガスを流しながら10分間激しくかき混
ぜる。次に2,2−ビス(4−(4−アミノフェノキ
シ)フェニル)プロパン30.665g(0.075モ
ル)と1,3−ビス(3−アミノフェノキシ)ベンゼン
21.838g(0.075モル)と1,3−ビス(ア
ミノプロピル)テトラメチルシロキサン9.050g
(0.036モル)とα,ω−ビス(3−アミノプロピ
ル)ポリジメチルシロキサン0.782g(平均分子量
837、0.001モル)を投入し、系を60℃に加熱
し均一になるまでかき混ぜる。均一に溶解後、系を氷水
浴で5℃に冷却し、4,4’−オキシジフタル酸二無水
物45.884g(0.149モル)と3,3’,4,
4’−ベンゾフェノンテトラカルボン酸二無水物11.
915g(0.037モル)を粉末状のまま10分間か
けて添加し、その後5時間撹拌を続けポリアミド酸溶液
を得た。この間フラスコは5℃に保った。(Example 1) NMP384 dehydrated and refined in a four-necked flask equipped with a dry nitrogen gas inlet tube, a condenser, a thermometer, and a stirrer.
g, and stir vigorously for 10 minutes while flowing nitrogen gas. Next, 2,2-bis (4- (4-aminophenoxy) phenyl) propane 30.665 g (0.075 mol) and 1,3-bis (3-aminophenoxy) benzene 21.838 g (0.075 mol) And 1,3-bis (aminopropyl) tetramethylsiloxane 9.050g
(0.036 mol) and 0.782 g (average molecular weight 837, 0.001 mol) of α, ω-bis (3-aminopropyl) polydimethylsiloxane are charged, and the system is heated to 60 ° C and stirred until uniform. . After being uniformly dissolved, the system was cooled to 5 ° C. in an ice water bath, and 45.884 g (0.149 mol) of 4,4′-oxydiphthalic acid dianhydride and 3,3 ′, 4,4.
4'-benzophenone tetracarboxylic dianhydride 11.
915 g (0.037 mol) was added as a powder over 10 minutes, and then stirring was continued for 5 hours to obtain a polyamic acid solution. During this time, the flask was kept at 5 ° C.
【0029】その後、窒素ガス導入管と冷却器を外し、
キシレンを満たしたディーン・スターク管をフラスコに
装着し、系にキシレンを添加した。氷水浴から油浴に替
えて系を加熱し発生する水を系外に除いた。4時間加熱
したところ、系からの水の発生は認められなくなった。
冷却後この反応溶液を大量のメタノール中に投入しポリ
イミド樹脂を析出させた。固形分を濾過後、80℃で1
2時間減圧乾燥して固形樹脂を得た。KBr錠剤法で赤
外吸収スペクトルを測定したところ、環状イミド結合に
由来5.60μmの吸収を認めたが、アミド結合に由来
する6.06μmの吸収を認めることができず、この樹
脂はほぼ100%イミド化していることが確認できた。
このポリイミド樹脂の加熱時の発生ガスをパージアンド
トラップGC−MS法で測定したところ、350℃で5
分間の加熱による式(1)で表される環状シロキサンの
発生量の総和は樹脂の0.0012重量%であった。Thereafter, the nitrogen gas introducing pipe and the cooler were removed,
A Dean Stark tube filled with xylene was attached to the flask and xylene was added to the system. The ice water bath was replaced with an oil bath to heat the system and remove the generated water outside the system. After heating for 4 hours, no water was generated from the system.
After cooling, the reaction solution was poured into a large amount of methanol to precipitate a polyimide resin. After filtering the solids,
Drying under reduced pressure for 2 hours gave a solid resin. When the infrared absorption spectrum was measured by the KBr tablet method, an absorption of 5.60 μm derived from a cyclic imide bond was observed, but an absorption of 6.06 μm derived from an amide bond could not be observed, and this resin was almost 100%. It was confirmed that the film was% imidized.
The gas generated when the polyimide resin was heated was measured by the purge-and-trap GC-MS method.
The total amount of the cyclic siloxane represented by the formula (1) generated by heating for 1 minute was 0.0012% by weight of the resin.
【0030】前記のポリイミド樹脂をシクロヘキサノン
に溶解し、固形分25%のポリイミド樹脂ワニスを得
た。このワニスをリバースロールコーターで二軸延伸ポ
リエステルフィルム(商品名ダイアホイル、厚さ50μ
m、三菱レーヨン(株)社製)に塗布し、乾燥後二軸延
伸ポリエステルフィルムから剥離し、30μmの厚みの
支持体なしの均一なフィルムを得た。乾燥温度は最高1
80℃で乾燥時間6分であった。剥離は容易で特に支障
はなかった。このフィルムをステンレス板に熱圧着して
試験片を作製し(300℃2秒間熱圧着し、圧を開放後
300℃で30秒間アニールした。接着面にかかる圧力
はゲージ圧力と接着面積から計算の結果4kgf/cm
2であった。)、この試験片の180度ピール強度は
2.0kgf/cmであり、優れた接着力を示した。ま
た貼り付け時のテープからの分解ガスによる汚染の有無
を調べるためにテープ貼り付け部近傍のステンレス面に
対する純水の接触角を貼り付け前後で測定したが前後と
も60゜で変化は見られなかった。The above polyimide resin was dissolved in cyclohexanone to obtain a polyimide resin varnish having a solid content of 25%. This varnish was coated with a reverse roll coater on a biaxially stretched polyester film (trade name: Diafoil, thickness: 50μ).
m, manufactured by Mitsubishi Rayon Co., Ltd.), dried and peeled from the biaxially stretched polyester film to obtain a uniform film having a thickness of 30 μm without a support. Maximum drying temperature is 1
The drying time was 6 minutes at 80 ° C. Peeling was easy and there was no particular problem. A test piece was prepared by thermocompression-bonding this film to a stainless steel plate (heat-compression-bonding at 300 ° C. for 2 seconds, releasing the pressure and annealing at 300 ° C. for 30 seconds. The pressure applied to the adhesive surface was calculated from the gauge pressure and the adhesive area. Result 4kgf / cm
Was 2 . ), The 180 degree peel strength of this test piece was 2.0 kgf / cm, and showed an excellent adhesive force. In addition, the contact angle of pure water to the stainless steel surface near the tape attachment part was measured before and after attachment to check the presence or absence of contamination by decomposed gas from the tape during attachment, but no change was observed at 60 ° before and after attachment. It was
【0031】(実施例2〜6)実施例1と同様にして表
1に示す配合にてポリイミド樹脂およびその有機溶剤溶
液およびフィルムを作成し、実施例1と同様の評価を行
った結果を表1に示す。(Examples 2 to 6) In the same manner as in Example 1, polyimide resin and its organic solvent solution and film were prepared with the formulations shown in Table 1, and the same evaluations as in Example 1 were performed. Shown in 1.
【0032】[0032]
【表1】 [Table 1]
【0033】なお第2表でODPAは4,4’−オキシ
ジフタル酸二無水物を、BTDAは3,3’,4,4’
−ベンゾフェノンテトラカルボン酸二無水物を、PAは
無水フタル酸を,BAPPは2,2−ビス(4−(4−
アミノフェノキシ)フェニル)プロパンを、APBは
1,3−ビス(3−アミノフェノキシ)ベンゼンを、A
PDSは1,3−ビス(アミノプロピル)テトラメチル
シロキサンを、APPSはα,ω−ビス(3−アミノプ
ロピル)ポリジメチルシロキサンを、PPAはp−フェ
ノキシアニリンをそれぞれ略記したものである。In Table 2, ODPA is 4,4'-oxydiphthalic dianhydride and BTDA is 3,3 ', 4,4'.
-Benzophenone tetracarboxylic dianhydride, PA is phthalic anhydride, BAPP is 2,2-bis (4- (4-
Aminophenoxy) phenyl) propane, APB is 1,3-bis (3-aminophenoxy) benzene, A
PDS is an abbreviation for 1,3-bis (aminopropyl) tetramethylsiloxane, APPS is an abbreviation for α, ω-bis (3-aminopropyl) polydimethylsiloxane, and PPA is an abbreviation for p-phenoxyaniline.
【0034】(比較例1〜5)実施例1と同様にして表
2に示す配合にてポリイミド樹脂およびその有機溶剤溶
液およびフィルムの作成を試みた。得られた評価結果を
表2に示す。(Comparative Examples 1 to 5) In the same manner as in Example 1, preparation of a polyimide resin, an organic solvent solution thereof and a film was attempted with the formulations shown in Table 2. Table 2 shows the obtained evaluation results.
【0035】[0035]
【表2】 [Table 2]
【0036】以上の実施例から本発明により有機溶剤に
可溶で低温加工性および高温での耐熱性の両立したポリ
イミド樹脂が得られることが示される。The above examples show that the present invention makes it possible to obtain a polyimide resin which is soluble in an organic solvent and has both low-temperature processability and high-temperature heat resistance.
【0037】[0037]
【発明の効果】本発明によれば、耐熱性と低温加工性を
両立させたポリイミド樹脂を提供することが可能であ
る。低沸点溶媒に可溶であるため残留溶媒をほぼ完全に
なくすことが可能で、また既にイミド化されているた
め、加工時にイミド化のための高温過程が不要で水分の
発生も無い。このため高信頼性と耐熱性を要求するエレ
クトロニクス用材料として工業的に極めて利用価値が高
い。According to the present invention, it is possible to provide a polyimide resin having both heat resistance and low temperature processability. Since it is soluble in a low boiling point solvent, the residual solvent can be almost completely eliminated, and since it has already been imidized, a high-temperature process for imidization is unnecessary during processing, and no water is generated. For this reason, it is extremely useful industrially as a material for electronics requiring high reliability and heat resistance.
Claims (7)
た時に式(1)で表される環状シロキサンガスの発生量
が樹脂の0.02重量%未満であることを特徴とし、か
つ式(2)で表されるシリコーンジアミンと4,4’−
オキシジフタル酸二無水物を必須成分とするシリコーン
変性ポリイミド樹脂。 【化1】 (nは3以上の整数) 【化2】 (式中R1は2価の炭化水素基)1. The amount of cyclic siloxane gas represented by the formula (1) generated when heated for 5 minutes at a temperature not exceeding 350 ° C. is less than 0.02% by weight of the resin, and the formula (1) Silicone diamine represented by 2) and 4,4'-
Silicone-modified polyimide resin containing oxydiphthalic dianhydride as an essential component. Embedded image (N is an integer of 3 or more) (In the formula, R 1 is a divalent hydrocarbon group)
aモルと式(3)で表されるシリコーンジアミンbモル
および他のジアミンcモルをアミン成分、4,4’−オ
キシジフタル酸二無水物dモルと他の酸二無水物eモル
を酸成分とし、かつ0.02≦a/(a+b+c)≦
0.50かつb/(a+b+c)≦0.02かつ0.6
≦d/(d+e)かつ0.96≦(d+e)/(a+b
+c)≦1.04のモル比で両成分を反応させイミド閉
環せしめた有機溶剤に可溶な請求項1記載のポリイミド
樹脂。 【化3】 (式中R2は2価の炭化水素基、nは2〜20の整数)2. An amine component comprising a mol of the silicone diamine represented by the formula (2), b mol of the silicone diamine represented by the formula (3) and c mol of the other diamine, 4,4′-oxydiphthalic acid dianhydride. d mol and another mol of acid dianhydride as an acid component, and 0.02 ≦ a / (a + b + c) ≦
0.50 and b / (a + b + c) ≦ 0.02 and 0.6
≤d / (d + e) and 0.96≤ (d + e) / (a + b
The polyimide resin according to claim 1, which is soluble in an organic solvent in which both components are reacted at a molar ratio of + c) ≦ 1.04 to cause imide ring closure. Embedded image (In the formula, R 2 is a divalent hydrocarbon group, n is an integer of 2 to 20)
aモルと式(3)で表されるシリコーンジアミンbモル
および式(4)で表されるジアミンcモルをアミン成
分、4,4’−オキシジフタル酸二無水物dモルを酸成
分とし、かつ0.02≦a/(a+b+c)≦0.50
かつb/(a+b+c)≦0.02かつ0.5≦c/
(a+b+c)かつ0.96≦d/(a+b+c)≦
1.04のモル比で両成分を反応させイミド閉環せしめ
た有機溶剤に可溶な請求項1記載のポリイミド樹脂。 【化4】 3. An amine component, 4,4 ′, wherein a mole of the silicone diamine represented by the formula (2), b mole of the silicone diamine represented by the formula (3) and c mole of the diamine represented by the formula (4) are used. -Using d mol of oxydiphthalic dianhydride as an acid component and 0.02≤a / (a + b + c) ≤0.50
And b / (a + b + c) ≦ 0.02 and 0.5 ≦ c /
(A + b + c) and 0.96 ≦ d / (a + b + c) ≦
The polyimide resin according to claim 1, which is soluble in an organic solvent in which both components are reacted at a molar ratio of 1.04 to cause imide ring closure. Embedded image
aモルと式(3)で表されるシリコーンジアミンbモル
および他のジアミンcモルをアミン成分、4,4’−オ
キシジフタル酸二無水物dモルと他の酸二無水物eモル
を酸成分とし、該ポリイミド樹脂の分子末端を一般式
(5)で表される酸無水物fモルでエンドキャップし、
かつ0.02≦a/(a+b+c)≦0.50かつb/
(a+b+c)≦0.02かつ0.6≦d/(d+e+
0.5f)かつ0.002≦0.5f/(d+e+0.
5f)≦0.05かつ0.96≦(d+e+0.5f)
/(a+b+c)≦1.04かつのモル比で両成分を反
応させイミド閉環せしめた有機溶剤に可溶な請求項1記
載のポリイミド樹脂。 【化5】 4. A mole of the silicone diamine represented by the formula (2), b mole of the silicone diamine represented by the formula (3) and c mole of the other diamine as an amine component, 4,4′-oxydiphthalic acid dianhydride. d mol and another e dianhydride acid are used as acid components, and the molecular end of the polyimide resin is end-capped with f mol of the acid anhydride represented by the general formula (5).
And 0.02 ≦ a / (a + b + c) ≦ 0.50 and b /
(A + b + c) ≦ 0.02 and 0.6 ≦ d / (d + e +
0.5f) and 0.002 ≦ 0.5f / (d + e + 0.
5f) ≦ 0.05 and 0.96 ≦ (d + e + 0.5f)
The polyimide resin according to claim 1, which is soluble in an organic solvent in which both components are reacted at a molar ratio of /(a+b+c)≦1.04 and imide ring-closed. Embedded image
aモルと式(3)で表されるシリコーンジアミンbモル
および他のジアミンcモルをアミン成分、4,4’−オ
キシジフタル酸二無水物dモルと他の酸二無水物eモル
を酸成分とし、該ポリイミド樹脂の分子末端を一般式
(6)で表される芳香族アミンgモルでエンドキャップ
し、かつ0.02≦a/(a+b+c+0.5g)≦
0.50かつb/(a+b+c+0.5g)≦0.02
かつ0.002≦0.5g/(a+b+c+0.5g)
≦0.05かつ0.6≦d/(d+e)かつ0.96≦
(d+e)/(a+b+c+0.5g)≦1.04のモ
ル比で両成分を反応させイミド閉環せしめた有機溶剤に
可溶な請求項1記載のポリイミド樹脂。 【化6】 (式中Yは水素原子、あるいはメチル、エチル、プロピ
ル、ブチル、フェニル、メトキシ、エトキシ、プロポキ
シ、ブトキシもしくはフェノキシ基の中から選ばれた少
なくとも1種類の基)5. A mole of the silicone diamine represented by the formula (2), b mole of the silicone diamine represented by the formula (3) and c mole of the other diamine are used as an amine component and 4,4′-oxydiphthalic dianhydride. d mol and another mol of acid dianhydride as an acid component, the molecular end of the polyimide resin is end-capped with g mol of the aromatic amine represented by the general formula (6), and 0.02 ≦ a / ( a + b + c + 0.5g) ≦
0.50 and b / (a + b + c + 0.5g) ≦ 0.02
And 0.002 ≦ 0.5g / (a + b + c + 0.5g)
≦ 0.05 and 0.6 ≦ d / (d + e) and 0.96 ≦
The polyimide resin according to claim 1, which is soluble in an organic solvent in which both components are reacted at a molar ratio of (d + e) / (a + b + c + 0.5 g) ≦ 1.04 to cause imide ring closure. [Chemical 6] (Wherein Y is a hydrogen atom or at least one group selected from methyl, ethyl, propyl, butyl, phenyl, methoxy, ethoxy, propoxy, butoxy or phenoxy groups).
aモルと式(3)で表されるシリコーンジアミンbモル
および式(4)で表されるジアミンcモルをアミン成
分、4,4’−オキシジフタル酸二無水物dモルを酸成
分とし、該ポリイミド樹脂の分子末端を一般式(5)で
表される酸無水物fモルでエンドキャップし、かつ0.
02≦a/(a+b+c)≦0.50かつb/(a+b
+c)≦0.02かつ0.5≦c/(a+b+c)かつ
0.002≦0.5f/(d+0.5f)≦0.05か
つ0.96≦(d+0.5f)/(a+b+c)≦1.
04のモル比で両成分を反応させイミド閉環せしめた有
機溶剤に可溶な請求項1記載のポリイミド樹脂。6. An amine component containing 4,4 ′ of a silicone diamine represented by the formula (2), b mole of the silicone diamine represented by the formula (3) and c mole of the diamine represented by the formula (4). -Using d mol of oxydiphthalic dianhydride as an acid component, end-capping the molecular end of the polyimide resin with f mol of the acid anhydride represented by the general formula (5), and
02 ≦ a / (a + b + c) ≦ 0.50 and b / (a + b
+ C) ≦ 0.02 and 0.5 ≦ c / (a + b + c) and 0.002 ≦ 0.5f / (d + 0.5f) ≦ 0.05 and 0.96 ≦ (d + 0.5f) / (a + b + c) ≦ 1 .
The polyimide resin according to claim 1, which is soluble in an organic solvent in which both components are reacted at a molar ratio of 04 to cause imide ring closure.
aモルと式(3)で表されるシリコーンジアミンbモル
および式(4)で表されるジアミンcモルをアミン成
分、4,4’−オキシジフタル酸二無水物dモルを酸成
分とし、該ポリイミド樹脂の分子末端を一般式(6)で
表される芳香族アミンgモルでエンドキャップし、かつ
0.02≦a/(a+b+c+0.5g)≦0.50か
つb/(a+b+c+0.5g)≦0.02かつ0.5
≦c/(a+b+c+0.5g)かつ0.002≦0.
5g/(a+b+c+0.5g)≦0.05かつ0.9
6≦d/(a+b+c+0.5g)≦1.04のモル比
で両成分を反応させイミド閉環せしめた有機溶剤に可溶
な請求項1記載のポリイミド樹脂。7. An amine component, 4,4 ′, wherein a mole of the silicone diamine represented by the formula (2), b mole of the silicone diamine represented by the formula (3) and c mole of the diamine represented by the formula (4) are used. -Using d mol of oxydiphthalic acid dianhydride as an acid component, end-capping the molecular end of the polyimide resin with g mol of the aromatic amine represented by the general formula (6), and 0.02≤a / (a + b + c + 0.5 g ) ≦ 0.50 and b / (a + b + c + 0.5g) ≦ 0.02 and 0.5
≤c / (a + b + c + 0.5g) and 0.002≤0.
5g / (a + b + c + 0.5g) ≦ 0.05 and 0.9
The polyimide resin according to claim 1, which is soluble in an organic solvent in which both components are reacted at a molar ratio of 6 ≦ d / (a + b + c + 0.5 g) ≦ 1.04 to cause imide ring closure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP07735496A JP3646947B2 (en) | 1996-03-29 | 1996-03-29 | Polyimide resin |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP07735496A JP3646947B2 (en) | 1996-03-29 | 1996-03-29 | Polyimide resin |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09263636A true JPH09263636A (en) | 1997-10-07 |
| JP3646947B2 JP3646947B2 (en) | 2005-05-11 |
Family
ID=13631583
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP07735496A Expired - Fee Related JP3646947B2 (en) | 1996-03-29 | 1996-03-29 | Polyimide resin |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3646947B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1328784C (en) * | 2002-03-13 | 2007-07-25 | 三井金属矿业株式会社 | COF flexible printed circuit board and method for manufacturing the same |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2025133519A (en) | 2024-03-01 | 2025-09-11 | 味の素株式会社 | Photosensitive resin composition |
| JP2025146153A (en) | 2024-03-22 | 2025-10-03 | 味の素株式会社 | Photosensitive resin composition |
-
1996
- 1996-03-29 JP JP07735496A patent/JP3646947B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1328784C (en) * | 2002-03-13 | 2007-07-25 | 三井金属矿业株式会社 | COF flexible printed circuit board and method for manufacturing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3646947B2 (en) | 2005-05-11 |
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