JPH092811A - Low oxygen porous silicon granule and method for producing the same - Google Patents
Low oxygen porous silicon granule and method for producing the sameInfo
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- JPH092811A JPH092811A JP17670495A JP17670495A JPH092811A JP H092811 A JPH092811 A JP H092811A JP 17670495 A JP17670495 A JP 17670495A JP 17670495 A JP17670495 A JP 17670495A JP H092811 A JPH092811 A JP H092811A
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Abstract
(57)【要約】
【構成】 平均粒子径が4μm以上10μm以下の金属
ケイ素粉末を造粒してなる平均粒子径0.2〜10mm
の金属ケイ素造粒物であって、該造粒物の比表面積が
0.5m2/g以上、酸素含有量が0.4重量%以下、
炭素含有量が1重量%未満で、細孔径のモードが1μm
以上2μm以下であることを特徴とする低酸素多孔質ケ
イ素造粒物。
【効果】 本発明の低酸素多孔質ケイ素造粒物は、回転
炉又は流動層反応炉において窒化反応行うと、窒化時の
反応管内への金属ケイ素粉末の付着がなく、反応率が向
上し、良質なα型窒化ケイ素を高い割合で製造すること
ができる。(57) [Summary] [Structure] An average particle diameter of 0.2 to 10 mm obtained by granulating metal silicon powder having an average particle diameter of 4 μm to 10 μm.
Of the metal silicon granules having a specific surface area of 0.5 m 2 / g or more and an oxygen content of 0.4 wt% or less,
The carbon content is less than 1% by weight and the mode of pore size is 1 μm
A low-oxygen porous silicon granule characterized by having a particle size of 2 μm or less. [Effects] The low-oxygen porous silicon granules of the present invention, when subjected to a nitriding reaction in a rotary furnace or a fluidized bed reaction furnace, do not cause deposition of metallic silicon powder in the reaction tube at the time of nitriding and the reaction rate is improved, High quality α-type silicon nitride can be produced at a high rate.
Description
【0001】[0001]
【産業上の利用分野】本発明は、特に金属ケイ素の直接
窒化法により窒化ケイ素粉末を製造する際に使用され、
α型の比率の高い窒化ケイ素粉末を効率よく生産するこ
とのできる反応性の良好な低酸素多孔質ケイ素造粒物及
びその製造方法に関する。FIELD OF THE INVENTION The present invention is particularly used for producing silicon nitride powder by a direct nitriding method of metallic silicon,
The present invention relates to a low-oxygen porous silicon granule having good reactivity capable of efficiently producing a silicon nitride powder having a high α-type ratio, and a method for producing the same.
【0002】[0002]
【従来の技術及び発明が解決しようとする課題】近年、
窒化ケイ素はその優れた耐熱性、耐衝撃性、機械的強度
等の特性が注目されているが、その製品化には窒化ケイ
素の持つ上記の優れた特性を損なわずに焼結し、各種形
状に成形する必要がある。ここで、窒化ケイ素の結晶型
にはα型とβ型とがあり、このうちβ型は焼結性がα型
より劣るとされており、窒化ケイ素の特性を損なわずに
焼結するには、できる限りα型の比率が高いことが望ま
れる。2. Description of the Related Art In recent years,
Silicon nitride has attracted attention for its excellent properties such as heat resistance, impact resistance, and mechanical strength, but when it is commercialized, it can be sintered without sacrificing the above-mentioned excellent properties of silicon nitride to obtain various shapes. Need to be molded into. Here, there are α-type and β-type crystal types of silicon nitride, and among these, β-type is said to be inferior in sinterability to α-type, and it can be sintered without impairing the characteristics of silicon nitride. It is desirable that the ratio of α-type is as high as possible.
【0003】従来より、窒化ケイ素粉末の製造方法とし
ては、金属ケイ素の直接窒化法、シリカ還元法、イミド
の熱分解法が知られている。α型の比率の高い窒化ケイ
素を得るには、これらのうちシリカ還元法、イミドの熱
分解法が容易であるが、両方法とも量産には適さないも
のである。Conventionally, as a method for producing silicon nitride powder, a direct nitriding method of metallic silicon, a silica reduction method, and a thermal decomposition method of imide are known. Among them, the silica reduction method and the imide thermal decomposition method are easy for obtaining silicon nitride having a high α-type ratio, but both methods are not suitable for mass production.
【0004】一方、金属ケイ素の直接窒化法は量産には
適しているが、この方法では、窒化ケイ素1モル当たり
176kcalという大きな反応熱の発生を伴うため非
常に高温となり、高温安定型で高温になるほど生成しや
すいβ型窒化ケイ素の割合が多くなるという欠点を有す
る。On the other hand, although the direct nitriding method of metallic silicon is suitable for mass production, this method requires a large reaction heat of 176 kcal per 1 mol of silicon nitride, resulting in an extremely high temperature. It has a drawback that the proportion of β-type silicon nitride that is easily generated increases.
【0005】また一般に、金属ケイ素の直接窒化法は、
原料である金属ケイ素粉末をトレイに仕込み、静置した
ままで窒化を行うか、ブロック形状で静置したまま窒化
を行うために、蓄熱しやすく、β型窒化ケイ素の割合が
多くなりやすい。その上、反応炉の温度上昇や反応炉内
の温度のバラツキにより、得られる窒化ケイ素のα化率
にバラツキが生じるという問題点もある。In general, the direct nitriding method of metallic silicon is
The metal silicon powder, which is the raw material, is charged in a tray, and nitriding is performed while it is left standing, or nitriding is performed while it is left in a block shape, so that heat is easily stored and the proportion of β-type silicon nitride tends to increase. In addition, there is a problem in that the α-conversion rate of the obtained silicon nitride varies due to the temperature rise in the reaction furnace and the temperature variation in the reaction furnace.
【0006】このため上記問題点を改善すべく、反応炉
としてトンネル式連続炉を用いる窒化ケイ素の製造方法
が提案されている(特開昭58−88107号公報)。
しかしながら、この方法においても炉内の温度分布を充
分にコントロールすることは困難であり、α型窒化ケイ
素の含有率のバラツキに関する問題点を充分に改善する
には至っていない。Therefore, in order to solve the above problems, a method for producing silicon nitride using a tunnel type continuous furnace as a reaction furnace has been proposed (Japanese Patent Laid-Open No. 58-88107).
However, even with this method, it is difficult to sufficiently control the temperature distribution in the furnace, and the problem regarding the variation in the content of the α-type silicon nitride has not been sufficiently improved.
【0007】一方、本発明者の検討により、ロータリー
キルン炉のような回転炉及び流動層反応炉を用いてα型
の比率の高い窒化ケイ素をバラツキを少なく、しかも効
率的に製造する方法が試みられている。しかしながら、
反応性を考慮して平均粒子径が10μm以下の金属ケイ
素粉末を原料として用いると、排出管への金属ケイ素粉
末の付着が成長し、排出管が閉塞したり、反応管内面へ
の金属ケイ素粉末の付着により流動性が不安定となり、
内部温度の変動が大きくなり、得られた窒化ケイ素粉末
の反応率、α化率にバラツキが生じ、品質が変動するこ
とがあった。On the other hand, as a result of the study by the present inventors, a method of efficiently producing silicon nitride having a high α-type ratio by using a rotary kiln such as a rotary kiln and a fluidized bed reaction furnace with less variation was attempted. ing. However,
When metal silicon powder having an average particle size of 10 μm or less is used as a raw material in consideration of reactivity, adhesion of metal silicon powder grows on the discharge pipe, the discharge pipe is blocked, and metal silicon powder on the inner surface of the reaction pipe is used. The fluidity becomes unstable due to the adherence of
In some cases, the internal temperature fluctuates greatly, the reaction rate and the α-conversion rate of the obtained silicon nitride powder vary, and the quality fluctuates.
【0008】この場合、金属ケイ素粉末を造粒すること
も検討されているが、単に有機バインダーを用いて造粒
するだけでは有機バインダーが造粒物内に残留したり、
造粒物が破壊されやすくなるので、事前に仮焼により流
動性の良好な造粒物にすることが試みられている。しか
しながら、仮焼により造粒物中の酸素含有量が多くなる
と、上記同様反応管内面への金属ケイ素粉末の付着が起
こり、排出管の閉塞原因となる。In this case, granulation of metallic silicon powder has also been studied, but the organic binder remains in the granulated product by simply granulating with an organic binder,
Since the granulated product is easily broken, it has been attempted in advance to make it into a granulated product having good fluidity by calcination. However, when the oxygen content in the granulated product increases due to the calcination, the metal silicon powder adheres to the inner surface of the reaction tube as described above, which causes clogging of the discharge tube.
【0009】しかも、仮焼の目的でもある微粉末金属ケ
イ素の融解は、比表面積を小さくさせ、結果として流動
性は良いが、反応性の悪い造粒物となってしまい、いず
れにしても未だα型の比率の高い窒化ケイ素をバラツキ
を少なくしかも効率的に生産し得る窒化原料としての金
属ケイ素造粒物を得ることは困難であった。Moreover, the melting of finely powdered metal silicon, which is also the purpose of calcination, reduces the specific surface area, resulting in good fluidity, but poorly reactive granules. It has been difficult to obtain a metal silicon granule as a nitriding raw material that can efficiently produce silicon nitride having a high α-type ratio with little variation.
【0010】本発明は、上記事情に鑑みなされたもの
で、α型の比率の高い窒化ケイ素をバラツキを少なく、
しかも効率的に生産し得る、反応性の良好な低酸素多孔
質ケイ素造粒物及びその製造方法を提供することを目的
とする。The present invention has been made in view of the above circumstances, and silicon nitride having a high α-type ratio has a small variation,
Moreover, it is an object of the present invention to provide a low-oxygen porous silicon granule having good reactivity, which can be efficiently produced, and a method for producing the same.
【0011】[0011]
【課題を解決するための手段及び作用】本発明者は、上
記目的を達成するために、窒化ケイ素を製造する際の原
料である金属ケイ素粉末の造粒物及びその製造方法につ
いて鋭意検討を行った結果、金属ケイ素粉末に一定量の
カーボン粉末を添加し、有機バインダーと共に混合・造
粒し、特定の条件で加熱処理すると、意外にも平均粒子
径0.2〜10mmで比表面積が0.5m2/g以上、
細孔分布のモードが1〜2μmである低酸素多孔質ケイ
素造粒物が得られ、この造粒物を原料として回転炉や流
動層反応炉内で窒化反応を行うと、α型の比率の高い窒
化ケイ素をバラツキが少なくしかも効率的に生産し得る
ことを知見した。Means for Solving the Problems In order to achieve the above object, the present inventor has conducted extensive studies on a granulated product of metallic silicon powder, which is a raw material for manufacturing silicon nitride, and a manufacturing method thereof. As a result, when a certain amount of carbon powder was added to metallic silicon powder, mixed and granulated with an organic binder, and heat-treated under specific conditions, surprisingly, the average particle diameter was 0.2 to 10 mm and the specific surface area was 0. 5m 2 / g or more,
A low-oxygen porous silicon granule having a mode of pore distribution of 1 to 2 μm is obtained, and when this granule is used as a raw material to carry out a nitriding reaction in a rotary furnace or a fluidized bed reactor, an α-type ratio of It has been found that high silicon nitride can be efficiently produced with little variation.
【0012】即ち、平均粒子径が4〜10μmの金属ケ
イ素粉末にカーボン粉末を金属ケイ素粉末全重量に対し
5重量%未満添加し、有機バインダーと共に混合・造粒
し、次いで1250〜1400℃で0.5〜5時間、窒
素を除く不活性雰囲気下で加熱処理することにより、金
属ケイ素粉末粒子表面に存在する酸素をカーボン粉末の
有する還元作用、即ちSiO2+C→SiO+COの反
応により除去することが可能となり、得られた造粒物中
の酸素含有量を0.4重量%以下と少なくすることがで
き、この造粒物を原料として回転炉や流動層反応炉で窒
化を行うと、反応管内面への造粒物の付着による流動の
不安定化から生じる内部温度の変動をおさえることが可
能となり、良好な流動性を維持でき、その上排出管への
造粒物の付着が成長することによる排出管の閉塞の発生
を防ぐことができる。しかも添加したカーボン粉末は、
反応後細孔を形成するので、造粒物の平均粒子径が30
0μm以下で細孔径のモードが1〜2μmの微細かつ多
数の孔を有する低酸素多孔質ケイ素造粒物を得ることが
でき、この造粒物を原料として回転炉や流動層反応炉で
窒化反応を行うと、比表面積の増大により、反応性が向
上し、良好なα型の比率の高い窒化ケイ素をバラツキが
少なく、効率的に生産し得ることを見い出し、本発明を
なすに至ったものである。That is, carbon powder was added to metallic silicon powder having an average particle diameter of 4 to 10 μm in an amount of less than 5% by weight based on the total weight of the metallic silicon powder, mixed and granulated with an organic binder, and then at 0250 to 1400 ° C. By performing heat treatment for 5 to 5 hours in an inert atmosphere excluding nitrogen, oxygen existing on the surface of the metal silicon powder particles can be removed by the reducing action of the carbon powder, that is, the reaction of SiO 2 + C → SiO + CO. It becomes possible to reduce the oxygen content in the obtained granulated product to 0.4% by weight or less. When this granulated product is used as a raw material for nitriding in a rotary furnace or a fluidized bed reactor, It is possible to suppress fluctuations in the internal temperature that result from the instability of the flow due to the adherence of granules to the surface, maintain good fluidity, and also to ensure that granules adhere to the discharge pipe. The occurrence of clogging of the discharge pipe due to can be prevented. Moreover, the added carbon powder is
Since the pores are formed after the reaction, the average particle diameter of the granulated product is 30
It is possible to obtain a low-oxygen porous silicon granulated product having a fine and large number of pores with a mode of pore diameter of 0 μm or less and 1 to 2 μm, and using the granulated product as a raw material, a nitriding reaction in a rotary furnace or a fluidized bed reactor. When it is carried out, it has been found that the reactivity is improved due to the increase in the specific surface area, silicon nitride having a high ratio of a good α-type can be efficiently produced with little variation, and the present invention has been achieved. is there.
【0013】従って、本発明は、平均粒子径が4μm以
上10μm以下の金属ケイ素粉末を造粒してなる平均粒
子径0.2〜10mmの金属ケイ素造粒物であって、該
造粒物の比表面積が0.5m2/g以上、酸素含有量が
0.4重量%以下、炭素含有量が1重量%未満で、細孔
径のモードが1μm以上2μm以下であることを特徴と
する低酸素多孔質ケイ素造粒物、及び、平均粒子径が4
μm以上10μm以下の金属ケイ素粉末に、この金属ケ
イ素粉末全量に対して0.3重量%以上5重量%未満の
カーボン粉末を添加すると共に、有機バインダーを添加
し、これを混合・造粒して得た造粒物を窒素を除く不活
性雰囲気下において、1250℃以上1400℃以下の
温度領域で0.5時間以上5時間以下の間加熱処理する
ことを特徴とする低酸素多孔質ケイ素造粒物の製造方法
を提供する。Therefore, the present invention is a metal silicon granule having an average particle diameter of 0.2 to 10 mm obtained by granulating metal silicon powder having an average particle diameter of 4 μm or more and 10 μm or less. Low oxygen characterized by having a specific surface area of 0.5 m 2 / g or more, an oxygen content of 0.4% by weight or less, a carbon content of less than 1% by weight, and a mode of pore diameter of 1 μm or more and 2 μm or less. Porous silicon granules and average particle size is 4
To the metallic silicon powder having a particle size of 10 μm or more, 0.3% by weight or more and less than 5% by weight of carbon powder is added to the total amount of the metallic silicon powder, an organic binder is added, and the mixture is mixed and granulated. Low oxygen porous silicon granulation, characterized in that the obtained granules are heat-treated in a temperature range of 1250 ° C. or more and 1400 ° C. or less for 0.5 hours or more and 5 hours or less in an inert atmosphere excluding nitrogen. A method of manufacturing a product is provided.
【0014】以下、本発明につき更に詳しく説明する
と、本発明の低酸素多孔質ケイ素造粒物は、原料である
金属ケイ素粉末にカーボン粉末を添加し、有機バインダ
ーと共に混合・造粒し、次いで加熱処理することによっ
て得ることができるものである。この場合、原料である
金属ケイ素粉末としては、平均粒子径が4〜10μm、
特に5〜7μmであることが好ましく、平均粒子径が4
μmより小さいと微粉にする際の粉砕コストが高くなり
実用的でなくなる。一方、平均粒子径が10μmより大
きくなると難反応性となるばかりではなく、造粒しにく
くなる。また、金属ケイ素粉末は、比表面積が1〜6m
2/g、特に2〜5m2/g、酸素含有量が0.2〜1.
5重量%、特に0.2〜1重量%であることが好まし
い。The present invention will be described in more detail below. In the low oxygen porous silicon granule of the present invention, carbon powder is added to the raw material metal silicon powder, mixed and granulated with an organic binder, and then heated. It can be obtained by processing. In this case, the metal silicon powder as a raw material has an average particle size of 4 to 10 μm,
It is particularly preferably 5 to 7 μm, and the average particle size is 4
If it is smaller than μm, the crushing cost for making fine powder becomes high and it is not practical. On the other hand, when the average particle diameter is larger than 10 μm, not only does it become difficult to react, but it becomes difficult to granulate. Further, the metal silicon powder has a specific surface area of 1 to 6 m.
2 / g, especially 2-5 m 2 / g, oxygen content 0.2-1.
It is preferably 5% by weight, particularly preferably 0.2 to 1% by weight.
【0015】添加するカーボン粉末としては、特に制限
されないが、比表面積20〜500m2/g、特に50
〜300m2/gであることが好ましい。また、カーボ
ン粉末の添加量は、金属ケイ素粉末全量に対して0.3
重量%以上5重量%未満、特に0.3〜3重量%の割合
で添加することが好ましい。カーボン粉末の添加量が5
重量%以上になると造粒物中に残留する炭素含有量が1
重量%以上となってしまうために反応性が悪くなり、一
方、少なすぎても細孔形成に至らず、0.3重量%以上
添加することが比表面積を増大させ、反応性を向上させ
る上から好ましい。The carbon powder to be added is not particularly limited, but has a specific surface area of 20 to 500 m 2 / g, especially 50
It is preferably ˜300 m 2 / g. The amount of carbon powder added is 0.3 with respect to the total amount of metallic silicon powder.
It is preferable to add it in a proportion of not less than 5% by weight and not more than 5% by weight, particularly 0.3 to 3% by weight. Addition amount of carbon powder is 5
If the content is more than weight%, the residual carbon content in the granulated product is 1
The reactivity becomes worse because the content is more than 1% by weight. On the other hand, if it is too small, pore formation does not occur, and adding 0.3% by weight or more increases the specific surface area and improves the reactivity. Is preferred.
【0016】用いる有機バインダーとしては、特に制限
なく、ポリビニルアルコール(以下、PVAと称す)や
ポリブチルアルコール等のアルコール系、アクリル系等
の公知のバインダーが使用し得る。この有機バインダー
の添加量は、金属ケイ素粉末全量に対して1〜5重量
%、特に2〜3重量%の割合で添加することが好まし
い。The organic binder to be used is not particularly limited, and known binders such as polyvinyl alcohol (hereinafter referred to as PVA), polybutyl alcohol, and other alcohol-based and acrylic-based binders can be used. The amount of the organic binder added is preferably 1 to 5% by weight, more preferably 2 to 3% by weight, based on the total amount of the metal silicon powder.
【0017】次に、低酸素多孔質ケイ素造粒物の製造方
法について詳述すると、上記カーボン粉末と金属ケイ素
粉末との混合は、通常ヘンシェルミキサー等の混合機に
て予め乾式で2分ほど混合し、そこに金属ケイ素粉末全
量に対し1〜5重量%の有機バインダーの水溶液(濃度
10%)を添加し、数分間更に混合する方法を採用し得
る。また、得られた混合物は、押し出し式や撹拌式等の
造粒機にて造粒し、乾燥することができる。乾燥方法
は、特に制限されず、窒素等の通風下で100〜150
℃の温度で10〜20時間行えば十分である。なお、造
粒物の平均粒子径は0.2〜10mmであることが好ま
しい。Next, the method for producing the low-oxygen porous silicon granules will be described in detail. The carbon powder and the metal silicon powder are usually mixed in a mixer such as a Henschel mixer in a dry manner for about 2 minutes. Then, a method of adding an aqueous solution of an organic binder of 1 to 5% by weight (concentration: 10%) to the total amount of metallic silicon powder and further mixing for several minutes may be adopted. Moreover, the obtained mixture can be granulated by an extrusion type, agitation type, or other type of granulator and dried. The drying method is not particularly limited and may be 100 to 150 under ventilation such as nitrogen.
It is sufficient to carry out at a temperature of ° C for 10 to 20 hours. The average particle diameter of the granulated product is preferably 0.2 to 10 mm.
【0018】得られた乾燥物は、加熱炉にて、窒素を除
く不活性雰囲気下、1250〜1400℃、より好まし
くは1330〜1350℃の温度領域にて、0.5〜5
時間、より好ましくは1〜2時間加熱処理を行う。この
場合、1250℃より低い温度領域では造粒物中の酸素
含有量が0.4重量%を超え、反応管内面への金属ケイ
素粉末の付着により流動性に悪影響を及ぼし、内部温度
の変動が大きくなる。一方、1400℃を超える温度領
域では比表面積が0.5m2/g未満となり、反応性に
悪影響を及ぼす。また、加熱時間が0.5時間未満では
脱酸素と微粉発生率に悪影響を及ぼし、5時間を超える
場合は比表面積に悪影響を及ぼす。The dried product thus obtained is heated in a heating furnace under an inert atmosphere except for nitrogen in the temperature range of 1250 to 1400 ° C., more preferably 1330 to 1350 ° C., at 0.5 to 5 ° C.
The heat treatment is performed for an hour, more preferably 1 to 2 hours. In this case, the oxygen content in the granulated product exceeds 0.4% by weight in the temperature range lower than 1250 ° C., and the adhesion of the metal silicon powder on the inner surface of the reaction tube adversely affects the fluidity, resulting in fluctuation of the internal temperature. growing. On the other hand, in the temperature range over 1400 ° C., the specific surface area is less than 0.5 m 2 / g, which adversely affects the reactivity. If the heating time is less than 0.5 hours, deoxidization and fine powder generation rate are adversely affected, and if it exceeds 5 hours, the specific surface area is adversely affected.
【0019】加熱炉としては、特に制限されず、ボック
ス炉タイプ、トンネル炉タイプ、回転炉タイプ等が好適
に用いられる。また、雰囲気は、不活性の雰囲気であ
り、例えばヘリウム、アルゴン等の雰囲気とすることが
できるが、窒素は窒化反応が起こるため除外される。The heating furnace is not particularly limited, and a box furnace type, a tunnel furnace type, a rotary furnace type, etc. are preferably used. Further, the atmosphere is an inert atmosphere and may be an atmosphere such as helium or argon, but nitrogen is excluded because a nitriding reaction occurs.
【0020】上記製造方法で得ることができる本発明の
金属ケイ素造粒物は、その平均粒子径が0.2〜10m
m、特に0.5〜5mmが好ましい。平均粒子径が0.
2mmより小さいと流動層外へ飛散しやすくなり、一
方、10mmより大きいと流動状態が悪化する。The metallic silicon granules of the present invention which can be obtained by the above production method have an average particle diameter of 0.2 to 10 m.
m, especially 0.5 to 5 mm is preferable. The average particle size is 0.
If it is smaller than 2 mm, it tends to scatter out of the fluidized bed, while if it is larger than 10 mm, the fluidized state deteriorates.
【0021】この場合、上記造粒物は多数の微細孔を有
することが、比表面積を増大させ、反応性を向上させる
ために特に必要であり、具体的には造粒物の平均粒子径
が300μm以下において、その有する細孔径のモード
が1μm以上2μm以下の範囲である。モードが1μm
以上2μm以下の範囲をはずれると反応性の向上を図る
ことができず、造粒物が不安定で破壊しやすくなる。In this case, it is particularly necessary for the granulated product to have a large number of fine pores in order to increase the specific surface area and improve the reactivity. Specifically, the average particle size of the granulated product is When it is 300 μm or less, the mode of the pore diameter is 1 μm or more and 2 μm or less. Mode is 1 μm
If it is out of the range of 2 μm or less, the reactivity cannot be improved and the granulated product becomes unstable and easily broken.
【0022】また、本発明の造粒物の比表面積は0.5
m2/g以上、特に1〜2m2/gであることが好まし
く、比表面積が0.5m2/g未満では、十分な反応性
を得ることができない。また、酸素含有量は0.4重量
%以下、特に0〜0.3重量%であることが好ましく、
酸素含有量が0.4重量%より多くなると原料である金
属ケイ素が反応炉内に付着し、排出管閉塞を引き起こす
おそれがある。更に、炭素含有量は1重量%未満、特に
0〜0.8重量%であることが好ましい。炭素含有量が
1重量%を超えると反応性が劣化する。The specific surface area of the granulated product of the present invention is 0.5.
It is preferably m 2 / g or more, particularly preferably 1 to 2 m 2 / g. If the specific surface area is less than 0.5 m 2 / g, sufficient reactivity cannot be obtained. Further, the oxygen content is preferably 0.4% by weight or less, particularly preferably 0 to 0.3% by weight,
If the oxygen content is more than 0.4% by weight, metallic silicon as a raw material may adhere to the reaction furnace and cause clogging of the exhaust pipe. Further, the carbon content is preferably less than 1% by weight, particularly preferably 0 to 0.8% by weight. If the carbon content exceeds 1% by weight, the reactivity deteriorates.
【0023】本発明の低酸素多孔質ケイ素造粒物は直接
窒化法による窒化ケイ素の製造における原料(窒化原
料)として好適に使用することができる。この場合、こ
の造粒物を用いて窒化ケイ素を製造する方法としては、
窒化原料としてこの造粒物を用いる以外は特に制限され
ず、公知の方法を採用することができる。例えば、回転
炉又は流動層反応炉で水素を一定量含有する窒素の雰囲
気下、1150〜1400℃の温度で3〜10時間保持
しつつ窒化反応を行うものであり、連続長時間運転でも
金属ケイ素が反応管内部に付着し、排出管閉塞や流動の
不安定化による内部温度の変動を引き起こすことがな
く、得られた窒化ケイ素は反応率が高く、α型窒化ケイ
素の比率の高い優れた品質を有するものである。The low oxygen porous silicon granules of the present invention can be suitably used as a raw material (nitriding raw material) in the production of silicon nitride by the direct nitriding method. In this case, as a method for producing silicon nitride using this granulated product,
There is no particular limitation except that this granulated material is used as the nitriding raw material, and a known method can be adopted. For example, a nitriding reaction is carried out in a rotary furnace or a fluidized bed reactor in a nitrogen atmosphere containing a certain amount of hydrogen at a temperature of 1150 to 1400 ° C. for 3 to 10 hours. Adheres to the inside of the reaction tube and does not cause fluctuations in the internal temperature due to blockage of the discharge tube or instability of the flow, and the obtained silicon nitride has a high reaction rate and a high ratio of α-type silicon nitride. Is to have.
【0024】なお、本発明の低酸素多孔質ケイ素造粒物
は、窒化反応に用いる原料として有用であるが、その用
途はこれに限られない。The low oxygen porous silicon granule of the present invention is useful as a raw material for nitriding reaction, but its use is not limited to this.
【0025】[0025]
【実施例】以下、実施例と比較例を示して本発明を具体
的に説明するが、本発明は下記実施例に制限されるもの
ではない。EXAMPLES Hereinafter, the present invention will be described specifically with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples.
【0026】[実施例1、2]平均粒子径が5μmで酸
素含有量が0.6重量%の金属ケイ素粉末5kgと比表
面積50m2/gのカーボン粉末を10Lのヘンシェル
ミキサーにて乾式で混合し、そこに濃度10重量%のP
VA水溶液を1kg添加し、更に3分間混合し、平均粒
子径0.3mmに造粒した。得られた造粒物を窒素通風
下150℃にて20時間乾燥した。乾燥物は、ボックス
炉を用いてアルゴン気流下1350℃にて2時間熱処理
を行った。得られた造粒物について酸素量、炭素量、比
表面積、細孔径モード、平均粒子径を測定した。結果を
表1に示す。[Examples 1 and 2] 5 kg of metal silicon powder having an average particle diameter of 5 μm and an oxygen content of 0.6% by weight and carbon powder having a specific surface area of 50 m 2 / g were dry mixed in a 10 L Henschel mixer. Then, there is a P concentration of 10% by weight.
1 kg of a VA aqueous solution was added, and the mixture was further mixed for 3 minutes, and granulated to an average particle diameter of 0.3 mm. The obtained granulated product was dried at 150 ° C. for 20 hours under nitrogen ventilation. The dried product was heat-treated at 1350 ° C. for 2 hours in an argon stream using a box furnace. The amount of oxygen, the amount of carbon, the specific surface area, the pore size mode, and the average particle size of the obtained granulated product were measured. The results are shown in Table 1.
【0027】[比較例1、2]実施例1、2に準じ、カ
ーボン添加率のみを0重量%(比較例1)、5重量%
(比較例2)とし、得られた造粒物について同様にその
物性を測定した。結果を表1に示す。[Comparative Examples 1 and 2] According to Examples 1 and 2, only the carbon addition rate was 0% by weight (Comparative Example 1), 5% by weight.
The physical properties of the obtained granulated product were measured in the same manner as (Comparative Example 2). The results are shown in Table 1.
【0028】[比較例3]実施例1、2に準じ、窒化反
応の加熱温度のみを1240℃とし、得られた造粒物に
ついて同様にその物性を測定した。結果を表1に示す。[Comparative Example 3] In accordance with Examples 1 and 2, the heating temperature of the nitriding reaction was set to 1240 ° C., and the physical properties of the obtained granulated product were measured in the same manner. The results are shown in Table 1.
【0029】[比較例4]実施例1、2に準じ、窒化反
応の加熱時間のみを20分とし、得られた造粒物につい
て同様にその物性を測定した。結果を表1に示す。[Comparative Example 4] In accordance with Examples 1 and 2, only the heating time of the nitriding reaction was set to 20 minutes, and the physical properties of the obtained granulated product were measured in the same manner. The results are shown in Table 1.
【0030】[比較例5]実施例1、2に準じ、金属ケ
イ素粉末の平均粒子径を15μm、酸素含有量を0.1
5重量%としたものを用い、得られた造粒物について同
様にその物性を測定した。結果を表1に示す。[Comparative Example 5] In accordance with Examples 1 and 2, the average particle diameter of the metal silicon powder was 15 μm and the oxygen content was 0.1.
The physical properties of the obtained granulated product were measured in the same manner by using 5% by weight. The results are shown in Table 1.
【0031】[0031]
【表1】 [Table 1]
【0032】また、実施例1、2と比較例1、2につい
て、水銀細孔計(POROUS MATERIALS
INC.社製)による細孔分布を測定した。結果を図1
〜4に示す。For Examples 1 and 2 and Comparative Examples 1 and 2, a mercury pore meter (POROUS MATERIALS) was used.
INC. (Manufactured by the company). Figure 1 shows the results
~ 4.
【0033】次に、得られた造粒物をアルミナボートに
10g仕込み、管状炉で水素を15重量%含有する窒素
の雰囲気下、1250℃の温度を5時間保持することに
より、窒化反応を行った。得られた窒化ケイ素について
窒化反応率、窒化時の炉内への付着状況、α型窒化ケイ
素の比率を調べた。結果を表2に示す。Next, 10 g of the obtained granulated product was charged into an alumina boat, and a nitriding reaction was carried out by maintaining the temperature of 1250 ° C. for 5 hours in a tubular furnace in an atmosphere of nitrogen containing 15% by weight of hydrogen. It was With respect to the obtained silicon nitride, the nitriding reaction rate, the adhesion state in the furnace at the time of nitriding, and the ratio of α-type silicon nitride were examined. Table 2 shows the results.
【0034】[0034]
【表2】 [Table 2]
【0035】[0035]
【発明の効果】本発明の低酸素多孔質ケイ素造粒物は、
回転炉又は流動層反応炉において窒化反応行うと、窒化
時の反応管内への金属ケイ素粉末の付着がなく、反応率
が向上し、良質なα型窒化ケイ素を高い割合で製造する
ことができる。また、本発明の製造方法によれば、かか
る低酸素多孔質ケイ素造粒物を簡単かつ確実に製造し得
る。The low oxygen porous silicon granules of the present invention are
When the nitriding reaction is carried out in a rotary furnace or a fluidized bed reactor, metal silicon powder does not adhere to the reaction tube during nitriding, the reaction rate is improved, and high-quality α-type silicon nitride can be produced at a high rate. Further, according to the production method of the present invention, such a low-oxygen porous silicon granule can be produced easily and reliably.
【図面の簡単な説明】[Brief description of drawings]
【図1】本発明の実施例1の水銀細孔計による細孔分布
を示すグラフである。FIG. 1 is a graph showing a pore distribution by a mercury porosimeter of Example 1 of the present invention.
【図2】本発明の実施例2の水銀細孔計による細孔分布
を示すグラフである。FIG. 2 is a graph showing pore distribution by a mercury porosimeter of Example 2 of the present invention.
【図3】本発明の比較例1の水銀細孔計による細孔分布
を示すグラフである。FIG. 3 is a graph showing the pore size distribution of the mercury porosimeter of Comparative Example 1 of the present invention.
【図4】本発明の比較例2の水銀細孔計による細孔分布
を示すグラフである。FIG. 4 is a graph showing the pore size distribution of the mercury porosimeter of Comparative Example 2 of the present invention.
Claims (2)
金属ケイ素粉末を造粒してなる平均粒子径0.2〜10
mmの金属ケイ素造粒物であって、該造粒物の比表面積
が0.5m2/g以上、酸素含有量が0.4重量%以
下、炭素含有量が1重量%未満で、細孔径のモードが1
μm以上2μm以下であることを特徴とする低酸素多孔
質ケイ素造粒物。1. An average particle diameter of 0.2 to 10 obtained by granulating metal silicon powder having an average particle diameter of 4 μm or more and 10 μm or less.
mm metal silicon granules having a specific surface area of 0.5 m 2 / g or more, an oxygen content of 0.4 wt% or less, a carbon content of less than 1 wt%, and a pore diameter of Mode is 1
A low-oxygen porous silicon granule characterized by having a diameter of from 1 μm to 2 μm.
金属ケイ素粉末に、この金属ケイ素粉末全量に対して
0.3重量%以上5重量%未満のカーボン粉末を添加す
ると共に、有機バインダーを添加し、これを混合・造粒
して得た造粒物を窒素を除く不活性雰囲気下において、
1250℃以上1400℃以下の温度領域で0.5時間
以上5時間以下の間加熱処理することを特徴とする低酸
素多孔質ケイ素造粒物の製造方法。2. To a metal silicon powder having an average particle size of 4 μm or more and 10 μm or less, 0.3% by weight or more and less than 5% by weight of carbon powder with respect to the total amount of the metal silicon powder, and an organic binder are added. , The granulated product obtained by mixing and granulating it under an inert atmosphere excluding nitrogen,
A method for producing a low-oxygen porous silicon granulated product, which comprises performing heat treatment in a temperature range of 1250 ° C. or more and 1400 ° C. or less for 0.5 hours or more and 5 hours or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17670495A JPH092811A (en) | 1995-06-20 | 1995-06-20 | Low oxygen porous silicon granule and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17670495A JPH092811A (en) | 1995-06-20 | 1995-06-20 | Low oxygen porous silicon granule and method for producing the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH092811A true JPH092811A (en) | 1997-01-07 |
Family
ID=16018297
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17670495A Pending JPH092811A (en) | 1995-06-20 | 1995-06-20 | Low oxygen porous silicon granule and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH092811A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7175685B1 (en) | 2002-04-15 | 2007-02-13 | Gt Solar Incorporated | Dry conversion of high purity ultrafine silicon powder to densified pellet form for silicon melting applications |
| JP2012197207A (en) * | 2011-03-23 | 2012-10-18 | Shin-Etsu Chemical Co Ltd | Method for manufacturing silicon oxide powder |
-
1995
- 1995-06-20 JP JP17670495A patent/JPH092811A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7175685B1 (en) | 2002-04-15 | 2007-02-13 | Gt Solar Incorporated | Dry conversion of high purity ultrafine silicon powder to densified pellet form for silicon melting applications |
| JP2012197207A (en) * | 2011-03-23 | 2012-10-18 | Shin-Etsu Chemical Co Ltd | Method for manufacturing silicon oxide powder |
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