JPH09295224A - Method for coating super hard tool with diamond film - Google Patents
Method for coating super hard tool with diamond filmInfo
- Publication number
- JPH09295224A JPH09295224A JP9007387A JP738797A JPH09295224A JP H09295224 A JPH09295224 A JP H09295224A JP 9007387 A JP9007387 A JP 9007387A JP 738797 A JP738797 A JP 738797A JP H09295224 A JPH09295224 A JP H09295224A
- Authority
- JP
- Japan
- Prior art keywords
- cemented carbide
- diamond film
- carbide tool
- super hard
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 51
- 239000010432 diamond Substances 0.000 title claims abstract description 51
- 239000011248 coating agent Substances 0.000 title claims abstract description 15
- 238000000576 coating method Methods 0.000 title claims abstract description 15
- 238000000034 method Methods 0.000 title claims description 30
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Substances [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims abstract description 55
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 27
- 238000005530 etching Methods 0.000 claims abstract description 22
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 7
- 239000010941 cobalt Substances 0.000 claims abstract description 7
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000000843 powder Substances 0.000 claims abstract description 7
- 239000011230 binding agent Substances 0.000 claims abstract description 6
- 238000000866 electrolytic etching Methods 0.000 claims abstract description 5
- 239000002002 slurry Substances 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims abstract description 3
- 239000007864 aqueous solution Substances 0.000 claims description 14
- 239000011259 mixed solution Substances 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 238000010899 nucleation Methods 0.000 claims 2
- 239000000463 material Substances 0.000 abstract description 15
- 239000000853 adhesive Substances 0.000 abstract description 8
- 230000001070 adhesive effect Effects 0.000 abstract description 8
- 230000000694 effects Effects 0.000 abstract description 5
- 230000003746 surface roughness Effects 0.000 abstract description 5
- 229910003556 H2 SO4 Inorganic materials 0.000 abstract 1
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 26
- 239000000243 solution Substances 0.000 description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- 239000012153 distilled water Substances 0.000 description 18
- 238000012360 testing method Methods 0.000 description 14
- -1 potassium ferricyanide Chemical compound 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 238000005520 cutting process Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 238000003486 chemical etching Methods 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 102220491117 Putative postmeiotic segregation increased 2-like protein 1_C23F_mutation Human genes 0.000 description 2
- 102220411551 c.74G>T Human genes 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- 206010003497 Asphyxia Diseases 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000001808 coupling effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- XEMZLVDIUVCKGL-UHFFFAOYSA-N hydrogen peroxide;sulfuric acid Chemical compound OO.OS(O)(=O)=O XEMZLVDIUVCKGL-UHFFFAOYSA-N 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000005088 metallography Methods 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 231100000925 very toxic Toxicity 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- ing And Chemical Polishing (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、超硬工具にダイヤ
モンド膜を蒸着させ被覆する方法に係るもので、詳しく
は、ダイヤモンド膜の蒸着前に超硬母材の表面をNaO
H又はKOH水溶液中で電解エッチングするか、又はK
MnO4 +KOH水溶液で化学エッチングして、ダイヤ
モンド膜と超硬母材との接着力を向上させた超硬工具の
ダイヤモンド膜の被覆方法に関するものである。TECHNICAL FIELD The present invention relates to a method for depositing and coating a diamond film on a cemented carbide tool.
Electrolytically etched in H or KOH aqueous solution or K
The present invention relates to a method for coating a diamond film of a cemented carbide tool in which the adhesion between the diamond film and the cemented carbide base material is improved by chemical etching with an aqueous solution of MnO 4 + KOH.
【0002】[0002]
【従来の技術】表面にダイヤモンド膜をコーティングし
た超硬工具は、一般の超硬工具に比べて性能が著しく優
れていることが知られている。2. Description of the Related Art It is known that a cemented carbide tool whose surface is coated with a diamond film is remarkably superior in performance to general cemented carbide tools.
【0003】しかし、このようなダイヤモンド膜がコー
ティングされた超硬工具は、該コーティングされたダイ
ヤモンド膜が工具から剥離すると機能を失ってしまう。However, a cemented carbide tool coated with such a diamond film loses its function when the coated diamond film is peeled off from the tool.
【0004】そして、このような剥離現象は、超硬工具
の表面とダイヤモンド膜間の接着力が不十分なとき発生
するので、該接着力を増大させる研究が盛んに行われ、
その方法の一つとして、超硬工具の表面を化学的溶液に
てエッチング処理する方法がある。Since such a peeling phenomenon occurs when the adhesive force between the surface of the cemented carbide tool and the diamond film is insufficient, research for increasing the adhesive force has been vigorously conducted.
As one of the methods, there is a method of etching the surface of the cemented carbide tool with a chemical solution.
【0005】また、このようなエッチング処理方法に
は、超硬工具の表面の結合相を酸により溶かす方法と、
炭化物相を溶かす方法とが主に用いられている。Further, such an etching treatment method includes a method of dissolving the binder phase on the surface of the cemented carbide tool with an acid,
The method of melting the carbide phase is mainly used.
【0006】ところで前者の方法は、結合相のコバルト
が、触媒作用によりダイヤモンド膜と超硬工具表面間に
非ダイヤモンド相を形成して接着力を弱化させるため、
コバルト相を所定の深さだけ除去する方法であって、こ
の方法は充分な接着力を維持しえないという短所があ
る。In the former method, cobalt in the binder phase weakens the adhesive force by forming a non-diamond phase between the diamond film and the surface of the cemented carbide tool due to the catalytic action.
This is a method of removing the cobalt phase to a predetermined depth, and this method has a disadvantage that it cannot maintain sufficient adhesive strength.
【0007】一方、後者の方法は、ムラカミ溶液を用い
て炭化物相をエッチングした後、再び前者の方法を用い
てコバルト相をエッチングする方法であって、米国特許
第5236740に記載されるように、フェリシアン化
カリウム10g+水酸化カリウム10g+水100gの
ムラカミ溶液を用いて超硬工具の表面を2分間以上エッ
チングした後、硫酸−過酸化水素溶液を用いて再び5秒
間以上エッチングして、ダイヤモンド膜で被覆された超
硬工具を製造するものである。On the other hand, the latter method is a method in which the carbide phase is etched using a Murakami solution and then the cobalt phase is etched again using the former method, as described in US Pat. No. 5,236,740. The surface of the cemented carbide tool was etched for 2 minutes or more using a solution of potassium ferricyanide 10 g + potassium hydroxide 10 g + water 100 g, and then again etched for 5 seconds or more with a sulfuric acid-hydrogen peroxide solution to be coated with a diamond film. It manufactures cemented carbide tools.
【0008】このようなムラカミ溶液を用いる方法にお
いては、次式に示すように、ムラカミ溶液中のフェリシ
アン化カリウムは、KOHと反応して発生期酸素を発生
し、フェリシアン化カリウムは酸化剤として作用して一
般の化学エッチング溶液中で酸化作用を行う成分を除去
し、エッチングを施す試片に電気的ポテンシャルを加え
るのと同様な効果を得ることができる〔Metallography
Principles and practice by George F. Vader Voort,
MacGraw-Hill Book Co. 1984参照〕ものである。In the method using such Murakami solution, as shown in the following formula, potassium ferricyanide in the Murakami solution reacts with KOH to generate nascent oxygen, and potassium ferricyanide acts as an oxidizing agent. It is possible to remove the component that oxidizes in a general chemical etching solution and obtain the same effect as adding an electrical potential to the sample to be etched [Metallography
Principles and practice by George F. Vader Voort,
See MacGraw-Hill Book Co. 1984].
【0009】2K3 Fe(CN)6+2KOH→2K4 F
e(CN)6+H2 O+1/2 O2 2K 3 Fe (CN) 6 + 2KOH → 2K 4 F
e (CN) 6 + H 2 O + 1/2 O 2
【0010】しかしながら、ムラカミ溶液の構成成分中
のフェリシアン化カリウムの価格は、他成分の水酸化カ
リウムよりも約10倍高価であるのみならず、該フェリ
シアン化カリウムは加熱するか又は酸及び酸の蒸気と接
触すると、極めて有毒なシアン化物のガスを発生し、窒
息死を起こすことがあるので非常に危険である。However, not only is the price of potassium ferricyanide in the constituents of the Murakami solution about 10 times more expensive than that of the other component, potassium ferricyanide, but the potassium ferricyanide is either heated or exposed to acid and acid vapors. On contact, it is extremely dangerous as it can generate a very toxic cyanide gas, causing suffocation.
【0011】[0011]
【発明が解決しようとする課題】本発明の目的は、超硬
工具の表面をエッチングするとき、人体に無害な水溶液
を用いて作業の安全を図り、廉価の水溶液を用いて製造
コストを減らしうる、超硬工具のダイヤモンド膜の被覆
方法を提供するものである。SUMMARY OF THE INVENTION It is an object of the present invention to use an aqueous solution that is harmless to the human body to ensure work safety when etching the surface of a cemented carbide tool, and to use an inexpensive aqueous solution to reduce manufacturing costs. The present invention provides a method for coating a diamond film of a cemented carbide tool.
【0012】[0012]
【課題を解決するための手段】このような本発明の目的
を達成するため、本発明に係る超硬工具のダイヤモンド
膜の被覆方法においては、本発明のエッチング液により
超硬工具母材の炭化物相をエッチングして表面の粗さを
増加させ、ダイヤモンド膜と超硬工具母材表面間の機械
的結合効果を向上させ、膜の接着力を向上させるもので
ある。In order to achieve the above object of the present invention, in the method for coating a diamond film of a cemented carbide tool according to the present invention, a carbide of a cemented carbide tool base material is formed by the etching solution of the present invention. The phase is etched to increase the surface roughness, improve the mechanical coupling effect between the diamond film and the surface of the cemented carbide tool base material, and improve the adhesive force of the film.
【0013】そこで、本発明に係る超硬工具にダイヤモ
ンド膜を被覆する第1の方法は、被エッチング材に電圧
を印加して超硬工具母材の表面をNaOH又はKOH水
溶液を用いてエッチングした後、該表面にダイヤモンド
膜をコーティングして、超硬工具母材の表面とダイヤモ
ンド膜との接着力を向上させるものである。Therefore, the first method for coating a diamond film on a cemented carbide tool according to the present invention is to apply a voltage to the material to be etched and etch the surface of the cemented carbide tool base material using an aqueous NaOH or KOH solution. After that, the surface is coated with a diamond film to improve the adhesive force between the surface of the cemented carbide tool base material and the diamond film.
【0014】また、本発明に係る超硬工具にダイヤモン
ド膜を被覆する第2の方法は、KMn4 O+KOH水溶
液をエッチング液として用いる方法であって、毒性のあ
るフェリシアン化カリウムの代わりに、KMnO4 を用
いてエッチングを施した後、表面にダイヤモンド膜をコ
ーティングして超硬工具母材の表面とダイヤモンド膜と
の接着力を向上させるものである。A second method for coating a diamond film on a cemented carbide tool according to the present invention is a method of using an aqueous solution of KMn 4 O + KOH as an etching solution, in which KMnO 4 is used instead of toxic potassium ferricyanide. After performing etching by using it, a diamond film is coated on the surface to improve the adhesive force between the surface of the cemented carbide tool base material and the diamond film.
【0015】以下、本発明に係る超硬工具にダイヤモン
ド膜を被覆する方法を説明する。The method for coating the diamond film on the cemented carbide tool according to the present invention will be described below.
【0016】先ず、第1の方法は、NaOH又はKOH
水溶液をエッチング溶液に用いて電解エッチングを施す
方法である。このとき、KOH又はNaOHの濃度は5
〜50%にすることが望ましく、超硬工具は陽極に装着
する。電圧及び電流はKOH又はNaOHの濃度によっ
て適切に調節する。First, the first method is NaOH or KOH.
This is a method of performing electrolytic etching using an aqueous solution as an etching solution. At this time, the concentration of KOH or NaOH is 5
-50% is desirable, and the cemented carbide tool is mounted on the anode. The voltage and current are adjusted appropriately according to the concentration of KOH or NaOH.
【0017】第2の方法では、KMnO4 +KOH水溶
液を用いて化学エッチングを施すが、このときエッチン
グ液の組成は、KMnO4 5〜30%、KOH 1〜1
5%、H2 O 55〜94%にし、処理時間は1分以上
にする。In the second method, chemical etching is carried out using an aqueous solution of KMnO 4 + KOH. At this time, the composition of the etching solution is KMnO 4 5-30%, KOH 1-1.
5%, H 2 O 55 to 94%, and the treatment time is 1 minute or more.
【0018】このようなエッチング法は、先ず超硬工具
を蒸留水及びトリクロロエチレンなどを用いて洗浄する
ことが望ましい。本発明により超硬工具の表面をエッチ
ング処理すると、超硬工具の炭化物相が不規則に食刻さ
れて超硬工具の表面粗度が増加し、このように粗度が増
加した超硬工具の表面は、ダイヤモンド膜と機械的結合
効果を奏し、相互間の結合力を増加させる。In such an etching method, it is desirable to first wash the cemented carbide tool with distilled water and trichlorethylene. When the surface of the cemented carbide tool is etched according to the present invention, the carbide phase of the cemented carbide tool is irregularly etched to increase the surface roughness of the cemented carbide tool, thus increasing the roughness of the cemented carbide tool. The surface exerts a mechanical bonding effect with the diamond film, increasing the bonding force between them.
【0019】このようにエッチングした超硬工具を再び
蒸留水及びアセトンにて洗浄し、H2 SO4 −H2 O2
混合溶液を用いて5秒間以上エッチングし、コバルト結
合相を除去する。The thus-etched cemented carbide tool is washed again with distilled water and acetone, and H 2 SO 4 -H 2 O 2 is added.
Etching is performed for 5 seconds or more using the mixed solution to remove the cobalt binder phase.
【0020】その後、この超硬工具を再び蒸留水及びア
セトンにて洗浄し、ダイヤモンド粉末スラリー液を用い
て超音波洗浄器でシーディングを行った後、蒸留水及び
アセトンにて超音波洗浄する。Thereafter, this cemented carbide tool is washed again with distilled water and acetone, seeded with an ultrasonic cleaner using a diamond powder slurry solution, and then ultrasonically cleaned with distilled water and acetone.
【0021】次いで、処理を行った超硬工具は一般のダ
イヤモンドコーティング手段によりダイヤモンド膜をコ
ーティングする。Then, the treated cemented carbide tool is coated with a diamond film by a general diamond coating means.
【0022】以下、本発明の実施の形態に対して説明す
る。Embodiments of the present invention will be described below.
【0023】[0023]
実施例1 K20 SPGN 120308超硬工具を、蒸留水及
びアセトンを用いて超音波洗浄した。A試片は、20%
硫酸−80%過酸化水素溶液を用いて30秒間エッチン
グし、B試片は、10%KOH水溶液を電解液に用いて
8V、10Aの条件下で15分間電解エッチングを施し
た後、A試片と同様のH2 SO4 +H2O2 混合溶液で
エッチングした。Example 1 A K20 SPGN 120308 cemented carbide tool was ultrasonically cleaned with distilled water and acetone. A sample is 20%
The sample B was etched for 30 seconds using a sulfuric acid-80% hydrogen peroxide solution, and the sample B was subjected to electrolytic etching for 15 minutes under the conditions of 8V and 10A using a 10% KOH aqueous solution as an electrolytic solution, and then the sample A was used. Etching was carried out using the same H 2 SO 4 + H 2 O 2 mixed solution as described above.
【0024】その後、全てのA及びB試片を、蒸留水及
びアセトンで再び洗浄し、0.5μm のダイヤモンド粉
末をエチルアルコールに分散させた溶液で2分間超音波
処理した後、蒸留水及びアセトンで再び洗浄した。After that, all the A and B specimens were washed again with distilled water and acetone, sonicated with a solution of 0.5 μm diamond powder dispersed in ethyl alcohol for 2 minutes, and then distilled water and acetone. Washed again with.
【0025】この二つの試片にマイクロウェーヴ化学蒸
気蒸着法(CVD)を施して、メタン5%、圧力110
torr、基板温度960℃の条件下で50μm の厚さにダ
イヤモンド膜を蒸着した。Microwave chemical vapor deposition (CVD) was applied to these two test pieces to obtain methane 5% and pressure 110.
A diamond film was deposited to a thickness of 50 μm under the conditions of torr and substrate temperature of 960 ° C.
【0026】A試片は、蒸着後、常温まで冷却したとき
に膜が基板から剥離されたが、B試片は、剥離されず良
好な接着状態を維持した。The film of A test piece was peeled from the substrate when it was cooled to room temperature after vapor deposition, but the B test piece was not peeled off and maintained a good adhesion state.
【0027】実施例2 B試片を処理する電解液として、10%KOH水溶液の
代わりに、10%NaOH水溶液を用い、その他は実施
例1と同様な方法で実験した。その結果、実施例1と同
様な結果が得られた。Example 2 As an electrolytic solution for treating the B sample, a 10% NaOH aqueous solution was used instead of the 10% KOH aqueous solution, and the same experiment as in Example 1 was carried out. As a result, the same results as in Example 1 were obtained.
【0028】実施例3 K20 SPGN 120308超硬工具を蒸留水及び
アセトンにて超音波洗浄し、その後、A試片はいずれの
処理も行わず、B試片はムラカミ溶液で2時間エッチン
グし、C試片はKMnO4 5g及びKOH 10gを蒸
留水100mlに溶かした溶液で2時間エッチングした。Example 3 A K20 SPGN 120308 cemented carbide tool was ultrasonically cleaned with distilled water and acetone, and then the A sample was not subjected to any treatment and the B sample was etched with a Murakami solution for 2 hours. The test piece was etched with a solution of 5 g of KMnO 4 and 10 g of KOH in 100 ml of distilled water for 2 hours.
【0029】次いで、B試片及びC試片を蒸留水にて洗
浄した後、20%硫酸−80%過酸化水素溶液で30秒
間エッチングした。Next, the B and C test pieces were washed with distilled water and then etched with a 20% sulfuric acid-80% hydrogen peroxide solution for 30 seconds.
【0030】その後、A、B、C試片の表面粗度を、ス
チルス(stylus)のチップ半径が12μm のプロフィロ
メータにより測定した。該測定した表面粗度は、A試片
がRa 0.08μm 、B試片がRa 0.4μm であ
ったが、C試片はRa 2.0μm であった。After that, the surface roughness of the A, B and C test pieces was measured by a profilometer having a tip radius of a stylus of 12 μm. The measured surface roughness was Ra 0.08 μm for the A sample, Ra 0.4 μm for the B sample, and Ra 2.0 μm for the C sample.
【0031】これら三つの試片を用いて、実施例1と同
じ条件下でダイヤモンド膜を約50μm の厚さに蒸着し
た。Using these three test pieces, a diamond film was deposited to a thickness of about 50 μm under the same conditions as in Example 1.
【0032】その結果、A、B試片は冷却後ダイヤモン
ド膜が剥離されたが、C試片は剥離されなかった。As a result, the diamond films of the A and B test pieces were peeled off after cooling, but the C test piece was not peeled off.
【0033】実施例4 K20 SPGN 120308超硬工具を蒸留水及び
アセトンで超音波洗浄し、A試片は実施例1のA試片と
同様に処理し、B試片はKMnO4 5g及びKOH 1
0gを蒸留水100mlに溶かした溶液に浸して1時間エ
ッチングした。その後、それらA、B試片を蒸留水及び
アセトンで洗浄した後、0.5μm のダイヤモンド粉末
をエタノールに分散させた溶液で2分間超音波処理し、
再び蒸留水及びアセトンにて洗浄した。これら二つの試
片を実施例1と同様な条件下でダイヤモンド膜を50μ
m の厚さに蒸着した。その結果、実施例1と同様な結果
が得られた。Example 4 A K20 SPGN 120308 cemented carbide tool was ultrasonically cleaned with distilled water and acetone, the A sample was treated in the same manner as the A sample of Example 1, and the B sample was KMnO 4 5 g and KOH 1.
It was immersed in a solution of 0 g in 100 ml of distilled water for etching for 1 hour. After that, the A and B test pieces were washed with distilled water and acetone, and then ultrasonically treated for 2 minutes with a solution in which 0.5 μm diamond powder was dispersed in ethanol.
It was washed again with distilled water and acetone. A diamond film of 50 μm was formed from these two test pieces under the same conditions as in Example 1.
Evaporated to a thickness of m. As a result, the same results as in Example 1 were obtained.
【0034】実施例5 K20 SPGN 120308超硬工具を蒸留水及び
アセトンで超音波洗浄し、A試片は実施例1のA試片と
同様に処理し、B試片はKMnO4 5g及びKOH 1
0gを蒸留水100mlに溶かした溶液に浸して1時間エ
ッチングした。その後、A、B試片を蒸留水及びアセト
ンにて洗浄した後、0.5μm のダイヤモンド粉末をエ
タノールに分散させた溶液で2分間超音波処理し、再び
蒸留水及びアセトンで洗浄した。これら二つの試片を実
施例1と同様な条件でダイヤモンド膜を20μm の厚さ
に蒸着した。Example 5 A K20 SPGN 120308 cemented carbide tool was ultrasonically cleaned with distilled water and acetone, the A specimen was treated in the same manner as the A specimen of Example 1, and the B specimen was KMnO 4 5 g and KOH 1.
It was immersed in a solution of 0 g in 100 ml of distilled water for etching for 1 hour. After that, the A and B test pieces were washed with distilled water and acetone, then subjected to ultrasonic treatment for 2 minutes with a solution in which 0.5 μm diamond powder was dispersed in ethanol, and washed again with distilled water and acetone. A diamond film having a thickness of 20 μm was vapor-deposited on these two test pieces under the same conditions as in Example 1.
【0035】次いで、これら二つの試片を用いて、A1
−18%のSi合金を被切削材にして切削実験を行っ
た。該切削条件は切削速度=700m/min 、feed=0.
25mm/rev、depth of cut=1mm、被切削材の大きさは
直径120mm、長さ120mmのものを用い、被切削材の
直径が60mmになるまで切削した。Then, using these two test pieces, A1
A cutting experiment was performed using −18% Si alloy as a material to be cut. The cutting conditions are cutting speed = 700 m / min, feed = 0.
25 mm / rev, depth of cut = 1 mm, the size of the material to be cut was 120 mm and the length was 120 mm, and the material to be cut was cut to a diameter of 60 mm.
【0036】その結果、B試片は、ダイヤモンド膜の剥
離が発生せずにダイヤモンド膜が漸時摩耗され、4〜5
個の被切削材を加工した後、超硬工具母材の部分が現わ
れた。As a result, in the B sample, the diamond film was gradually worn without peeling of the diamond film, and the diamond film was 4 to 5 times.
After machining the individual work pieces, a portion of the cemented carbide tool base material appeared.
【0037】しかし、A試片は、1個の被切削材を加工
する途中に、ダイヤモンド膜が突発的に剥離され、切削
作業が不可能になった。However, in the sample A, the diamond film was suddenly peeled off during the processing of one material to be cut, and the cutting operation became impossible.
【0038】[0038]
【発明の効果】本発明に係る超硬工具のダイヤモンド膜
の被覆方法においては、用いるエッチング液が従来のム
ラカミ溶液よりもエッチング効果が一層大きく、毒性の
あるフェリシアン化カリウムを含有しないため人体に無
害であり、廃棄物処理が簡単であるという効果がある。
かつKMnO4 の価格はフェリシアン化カリウムの30
%にすぎないので、製造コストが低廉であるという効果
がある。In the method for coating a diamond film of a cemented carbide tool according to the present invention, the etching solution used has a greater etching effect than the conventional Murakami solution and is harmless to the human body because it does not contain toxic potassium ferricyanide. There is an effect that waste treatment is easy.
And the price of KMnO 4 is 30 for potassium ferricyanide.
%, The manufacturing cost is low.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C23F 1/28 C23F 1/28 1/40 1/40 C25F 3/02 C25F 3/02 B ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical indication C23F 1/28 C23F 1/28 1/40 1/40 C25F 3/02 C25F 3/02 B
Claims (4)
液を用いて電解エッチングする工程、 該電解エッチングされた超硬工具を、H2 SO4 +H
2 O2 混合溶液を用いてコバルト結合相をエッチングす
る工程、 前記エッチングされた超硬工具を、ダイヤモンド粉末
スラリーでシーディング処理する工程、 前記シーディング処理した超硬工具にダイヤモンド膜
を蒸着させる工程、を順次行う超硬工具のダイヤモンド
膜の被覆方法。1. A step of electrolytically etching a cemented carbide tool using an aqueous solution of NaOH or KOH, wherein the electrolytically etched cemented carbide tool is H 2 SO 4 + H.
A step of etching a cobalt binder phase using a 2 O 2 mixed solution; a step of seeding the etched cemented carbide tool with a diamond powder slurry; and a step of depositing a diamond film on the seeded cemented carbide tool. A method for coating a diamond film of a cemented carbide tool, which is sequentially performed.
KOHの水溶液の濃度が5〜50%である、請求項1記
載の超硬工具のダイヤモンド膜の被覆方法。2. The method for coating a diamond film on a cemented carbide tool according to claim 1, wherein the concentration of the aqueous solution of NaOH or KOH in the electrolytic etching step is 5 to 50%.
液を用いて化学エッチングする工程、 該化学エッチングされた超硬工具を、H2 SO4 +H
2 O2 混合溶液を用いてコバルト結合相をエッチングす
る工程、 該エッチングされた超硬工具を、ダイヤモンド粉末ス
ラリーでシーディング処理する工程、 該シーディング処理した超硬工具にダイヤモンド膜を
蒸着させる工程、を順次行う超硬工具のダイヤモンド膜
の被覆方法。3. A step of chemically etching a cemented carbide tool using an aqueous solution of KMnO 4 + KOH, the cemented carbide tool being chemically etched being H 2 SO 4 + H
A step of etching a cobalt binder phase using a 2 O 2 mixed solution; a step of seeding the etched cemented carbide tool with a diamond powder slurry; a step of depositing a diamond film on the seeded cemented carbide tool A method for coating a diamond film of a cemented carbide tool, which is sequentially performed.
が、KMnO4 5〜30%、KOH 1〜15%、H2
O 55〜94%である、請求項3記載の超硬工具のダ
イヤモンド膜の被覆方法。4. The composition of the KMnO 4 + KOH aqueous solution is such that KMnO 4 is 5 to 30%, KOH is 1 to 15%, and H 2 is 2.
The method for coating a diamond film of a cemented carbide tool according to claim 3, wherein O is 55 to 94%.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR13138/1996 | 1996-04-26 | ||
| KR1019960013138A KR0176330B1 (en) | 1996-04-26 | 1996-04-26 | Coating method of diamond film on the tool |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09295224A true JPH09295224A (en) | 1997-11-18 |
Family
ID=19456852
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9007387A Pending JPH09295224A (en) | 1996-04-26 | 1997-01-20 | Method for coating super hard tool with diamond film |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPH09295224A (en) |
| KR (1) | KR0176330B1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2937054A1 (en) * | 2008-10-13 | 2010-04-16 | Commissariat Energie Atomique | METHOD AND DEVICE FOR DECONTAMINATING A METAL SURFACE |
| CN109763165A (en) * | 2019-02-22 | 2019-05-17 | 江苏科技大学 | The electrolytic etching method of precipitation phase in a kind of cobalt-base alloys |
| CN114702033A (en) * | 2022-04-18 | 2022-07-05 | 河南工业大学 | Method for removing metal from polycrystalline diamond by electrolysis combined with acid treatment |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100311940B1 (en) * | 1999-08-10 | 2001-11-14 | 민병성 | Method for diamond like carbon coating to drill bit and router bit |
| KR101155586B1 (en) * | 2009-01-23 | 2012-06-19 | 프리시젼다이아몬드 주식회사 | Diamond tool and method of producing the same |
| DE102018208299A1 (en) * | 2018-05-25 | 2019-11-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Apparatus and method for the electrochemical machining of a material |
| CN113373453B (en) * | 2021-06-09 | 2022-07-26 | 江西江钨硬质合金有限公司 | Cleaning method used before coating of hard alloy numerical control blade |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS537795A (en) * | 1976-07-09 | 1978-01-24 | Mitsubishi Gas Chem Co Inc | Preparatin of resins having high softening point |
| JPH0338227A (en) * | 1989-07-03 | 1991-02-19 | Sumitomo Electric Ind Ltd | Method for manufacturing porous polymer membrane |
| US5236740A (en) * | 1991-04-26 | 1993-08-17 | National Center For Manufacturing Sciences | Methods for coating adherent diamond films on cemented tungsten carbide substrates |
-
1996
- 1996-04-26 KR KR1019960013138A patent/KR0176330B1/en not_active Expired - Fee Related
-
1997
- 1997-01-20 JP JP9007387A patent/JPH09295224A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS537795A (en) * | 1976-07-09 | 1978-01-24 | Mitsubishi Gas Chem Co Inc | Preparatin of resins having high softening point |
| JPH0338227A (en) * | 1989-07-03 | 1991-02-19 | Sumitomo Electric Ind Ltd | Method for manufacturing porous polymer membrane |
| US5236740A (en) * | 1991-04-26 | 1993-08-17 | National Center For Manufacturing Sciences | Methods for coating adherent diamond films on cemented tungsten carbide substrates |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2937054A1 (en) * | 2008-10-13 | 2010-04-16 | Commissariat Energie Atomique | METHOD AND DEVICE FOR DECONTAMINATING A METAL SURFACE |
| WO2010043591A1 (en) * | 2008-10-13 | 2010-04-22 | Commissariat A L'energie Atomique | Method and device for decontaminating a metal surface |
| US9932686B2 (en) | 2008-10-13 | 2018-04-03 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Method and device for decontaminating a metallic surface |
| CN109763165A (en) * | 2019-02-22 | 2019-05-17 | 江苏科技大学 | The electrolytic etching method of precipitation phase in a kind of cobalt-base alloys |
| CN114702033A (en) * | 2022-04-18 | 2022-07-05 | 河南工业大学 | Method for removing metal from polycrystalline diamond by electrolysis combined with acid treatment |
Also Published As
| Publication number | Publication date |
|---|---|
| KR970070236A (en) | 1997-11-07 |
| KR0176330B1 (en) | 1999-02-18 |
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