JPH0931047A - Novel xylylenedithiol derivative - Google Patents
Novel xylylenedithiol derivativeInfo
- Publication number
- JPH0931047A JPH0931047A JP18401495A JP18401495A JPH0931047A JP H0931047 A JPH0931047 A JP H0931047A JP 18401495 A JP18401495 A JP 18401495A JP 18401495 A JP18401495 A JP 18401495A JP H0931047 A JPH0931047 A JP H0931047A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- parts
- xylylenedithiol
- compound
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、良好な光学物性、
高い屈折率及び優れた耐擦傷性をもつ光学用レンズ樹脂
などの原料として有用な新規なキシリレンジチオール誘
導体に関する。TECHNICAL FIELD The present invention relates to good optical properties,
The present invention relates to a novel xylylenedithiol derivative useful as a raw material for optical lens resins having a high refractive index and excellent scratch resistance.
【0002】[0002]
【従来の技術】プラスチックレンズは、無機レンズに比
べ軽量で割れ難く、染色が可能なため近年、眼鏡レン
ズ、カメラレンズ等の光学素子に急速に普及してきてい
る。現在、これらの目的に広く用いられる樹脂として
は、ジエチレングリコールビス(アリルカーボネート)
(以下、D.A.C と言う)をラジカル重合させたものがあ
る。この樹脂は、耐熱性に優れていること、軽量である
こと、染色性に優れていること、切削性、研磨性等の加
工性が良好であること等、種々の特徴を有している。し
かしながら、この樹脂は、無機ガラスに比べ、屈折率が
小さく、ガラスレンズと同等の光学特性を得るために
は、レンズの中心厚、コバ厚及び曲率を大きくする必要
があり、全体に肉厚になることが避けられない。このた
め、より屈折率の高いレンズ用樹脂が望まれていた。2. Description of the Related Art Plastic lenses are lighter and harder to break than inorganic lenses, and can be dyed. Therefore, plastic lenses have recently been rapidly used in optical elements such as spectacle lenses and camera lenses. Currently, resins widely used for these purposes include diethylene glycol bis (allyl carbonate)
Some are radically polymerized (hereinafter referred to as DAC). This resin has various characteristics such as excellent heat resistance, light weight, excellent dyeability, and good workability such as machinability and abrasivity. However, this resin has a smaller refractive index than inorganic glass, and in order to obtain optical characteristics equivalent to those of glass lenses, it is necessary to increase the center thickness, edge thickness, and curvature of the lens, and the overall thickness is increased. It cannot be avoided. Therefore, a resin for lenses having a higher refractive index has been desired.
【0003】D.A.C 樹脂よりも屈折率が高いレンズとし
て、ポリウレタン系レンズが知られている。例えば、特
開昭63-46213号において、キシリレンジイソシアネート
化合物とポリチオール化合物とからなるポリウレタン系
レンズが提案されている。また、特開平2-270859号公報
には、特定のポリチオール化合物とイソシアネート化合
物の組み合わせにより、高屈折率で、軽量、耐衝撃性に
優れたポリウレタン系レンズが提案されている。しかし
ながら、これらの樹脂によるレンズは、耐擦傷性が十分
ではなく、レンズの表面が傷つきやすいという欠点を有
している。また、光学的に均質なレンズを得るためには
重合時間が長くなり、作業性が繁雑になることがあっ
た。このため、これらの問題点を解決すべくさらなる改
良が望まれていた。Polyurethane lenses are known as lenses having a higher refractive index than DAC resin. For example, JP-A-63-46213 proposes a polyurethane lens composed of a xylylene diisocyanate compound and a polythiol compound. Further, JP-A-2-270859 proposes a polyurethane lens having a high refractive index, light weight, and excellent impact resistance by combining a specific polythiol compound and an isocyanate compound. However, lenses made of these resins have the drawbacks that the scratch resistance is not sufficient and the surface of the lens is easily scratched. Further, in order to obtain an optically uniform lens, the polymerization time becomes long and the workability may be complicated. Therefore, further improvement has been desired to solve these problems.
【0004】[0004]
【発明が解決しようとする課題】本発明の目的は、良好
な光学物性、高い屈折率および優れた耐擦傷性をもつ光
学用レンズ樹脂などの原料として有用な新規なキシリレ
ンジチオール誘導体を提供するものである。DISCLOSURE OF THE INVENTION An object of the present invention is to provide a novel xylylenedithiol derivative useful as a raw material for an optical lens resin having good optical properties, high refractive index and excellent scratch resistance. It is a thing.
【0005】[0005]
【課題を解決するための手段】本発明者等は、上記課題
を解決するために、鋭意検討した結果、本発明に至った
ものである。即ち、本発明は、新規な式(1)(化3)
で表されるキシリレンジチオール誘導体および式(2)
(化3)で表されるキシリレンジチオール誘導体に関す
るものである。Means for Solving the Problems The inventors of the present invention have made extensive studies in order to solve the above problems, and as a result, the present invention has been achieved. That is, the present invention provides a novel formula (1)
And a xylylenedithiol derivative represented by the formula (2)
The present invention relates to a xylylenedithiol derivative represented by (Chemical Formula 3).
【0006】[0006]
【化3】 (上式中、Rは水素原子またはメチル基を表す)Embedded image (In the above formula, R represents a hydrogen atom or a methyl group)
【0007】[0007]
【発明の実施の形態】以下、本発明を詳細に説明する。
式(1)で表されるキシリレンジチオール誘導体、即
ち、1,4−ビス(メルカプトプロピルチオメチル)ベ
ンゼンは、次の方法で得られる。即ち、 先ず、p−キシリレンジクロライドとチオ尿素とを、
水溶媒中で反応させて、p−キシリレンジチオールを
得、 次いで、p−キシリレンジチオールを水酸化ナトリウ
ム、水酸化カリウム等でアルカリ塩とした後、1−ブロ
モ−3−クロロプロパンを、溶媒中で反応させ、S,
S’−ビス(クロロプロピル)−p−キシリレンジチオ
エーテルを得、 得られたS,S’−ビス(クロロプロピル)−p−キ
シリレンジチオエーテルとチオ尿素とを、溶媒中で反応
させることにより、本願の式(1)で表されるキシリレ
ンジチオール誘導体を得る。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below.
The xylylenedithiol derivative represented by the formula (1), that is, 1,4-bis (mercaptopropylthiomethyl) benzene is obtained by the following method. That is, first, p-xylylene dichloride and thiourea are added.
After reacting in a water solvent to obtain p-xylylenedithiol, and then converting p-xylylenedithiol into an alkali salt with sodium hydroxide, potassium hydroxide, etc., 1-bromo-3-chloropropane in a solvent To react with S,
By obtaining S′-bis (chloropropyl) -p-xylylenedithioether and reacting the obtained S, S′-bis (chloropropyl) -p-xylylenedithioether with thiourea in a solvent, A xylylenedithiol derivative represented by the formula (1) of the present application is obtained.
【0008】反応において、チオ尿素の使用量は、p
−キシリレンジクロライド1モルに対して2〜2.5モ
ル、好ましくは2〜2.1モルであり、水の使用量は、
p−キシリレンジクロライド1モルに対して600〜1
000ml、好ましくは700〜900mlである。ま
た、反応温度は100〜105℃であり、反応時間は4
〜6時間である。反応終了後、生成物をトルエン、ベン
ゼン等の有機溶媒に溶解し、有機層をよく洗浄した後、
溶媒を留去して生成物を得る。この生成物は必要に応じ
て、公知の方法により、さらに精製することもできる。In the reaction, the amount of thiourea used is p
-2 to 2.5 mol, preferably 2 to 2.1 mol, relative to 1 mol of xylylene dichloride, and the amount of water used is
600 to 1 per mol of p-xylylene dichloride
It is 000 ml, preferably 700 to 900 ml. The reaction temperature is 100 to 105 ° C., and the reaction time is 4
~ 6 hours. After completion of the reaction, the product is dissolved in an organic solvent such as toluene or benzene, and the organic layer is washed well,
The solvent is distilled off to obtain the product. This product can be further purified by a known method, if necessary.
【0009】反応において、1−ブロモ−3−クロロ
プロパンの使用量は、p−キシリレンジチオール1モル
に対して2〜2.5モル、好ましくは2〜2.1モルで
ある。反応の際用いられる溶媒は、原料等と反応性がな
い溶媒であればよく、例えば、水、エタノール、非プロ
トン性溶剤のN,N−ジメチルホルムアミド等が挙げら
れる。溶媒の使用量は、p−キシリレンジチオール1モ
ルに対して300〜3000ml、好ましくは800〜
2000mlである。また、反応温度は5〜120℃、
好ましくは30〜100℃で、反応時間は1〜20時
間、好ましくは2〜10時間である。この時、必要に応
じて、界面活性剤や相間移動触媒等を用いても良い。反
応終了後、生成物をトルエン、ベンゼン等の有機溶媒に
溶解し、有機層をよく洗浄した後、溶媒を留去して生成
物を得る。この生成物は、必要に応じて、公知の方法に
より、さらに精製することもできる。In the reaction, the amount of 1-bromo-3-chloropropane used is 2-2.5 mol, preferably 2-2.1 mol, per 1 mol of p-xylylenedithiol. The solvent used in the reaction may be any solvent that is not reactive with the raw materials and the like, and examples thereof include water, ethanol, and an aprotic solvent N, N-dimethylformamide. The amount of the solvent used is 300 to 3000 ml, preferably 800 to 1 mol, relative to 1 mol of p-xylylenedithiol.
It is 2000 ml. The reaction temperature is 5 to 120 ° C,
The temperature is preferably 30 to 100 ° C., and the reaction time is 1 to 20 hours, preferably 2 to 10 hours. At this time, a surfactant, a phase transfer catalyst, or the like may be used if necessary. After completion of the reaction, the product is dissolved in an organic solvent such as toluene and benzene, the organic layer is washed well, and then the solvent is distilled off to obtain the product. This product can be further purified by a known method, if necessary.
【0010】反応において、チオ尿素の使用量は、
S,S’−ビス(クロロプロピル)−p−キシリレンジ
チオエーテル1モルに対して2〜2.5モル、好ましく
は2〜2.1モルである。反応の際用いられる溶媒は、
原料等と反応性がない溶媒であればよく、例えば、水、
エタノール、非プロトン性溶剤のN,N−ジメチルホル
ムアミドやジメチルスルホキシド等が挙げられる。溶媒
の使用量は、S,S’−ビス(クロロプロピル)−p−
キシリレンジチオエーテル1モルに対して200〜10
00ml、好ましくは600〜900mlである。ま
た、反応温度は30〜120℃、好ましくは60〜90
℃で、反応時間は1〜15時間、好ましくは2〜5時間
である。この時、必要に応じて、ヨウ化カリウム、臭化
カリウム等のハロゲン置換剤、界面活性剤、相間移動触
媒等を用いても良い。反応終了後、生成物をトルエン、
ベンゼン等の有機溶媒に溶解し、有機層をよく洗浄した
後、溶媒を留去して生成物を得る。この生成物は、必要
に応じて、公知の方法により、さらに精製することもで
きる。In the reaction, the amount of thiourea used is
The amount is 2-2.5 mol, preferably 2-2.1 mol, per 1 mol of S, S'-bis (chloropropyl) -p-xylylenedithioether. The solvent used in the reaction is
Any solvent may be used so long as it is not reactive with the raw materials such as water,
Examples thereof include ethanol, aprotic solvent N, N-dimethylformamide, dimethyl sulfoxide, and the like. The amount of the solvent used is S, S′-bis (chloropropyl) -p-
200 to 10 per mol of xylylene dithioether
It is 00 ml, preferably 600 to 900 ml. The reaction temperature is 30 to 120 ° C., preferably 60 to 90.
At C, the reaction time is 1 to 15 hours, preferably 2 to 5 hours. At this time, if necessary, a halogen displacing agent such as potassium iodide or potassium bromide, a surfactant, a phase transfer catalyst and the like may be used. After the reaction is completed, the product is toluene,
After dissolving in an organic solvent such as benzene and thoroughly washing the organic layer, the solvent is distilled off to obtain a product. This product can be further purified by a known method, if necessary.
【0011】また、式(2)で表されるキシリレンジチ
オール誘導体、即ち、1,4−ビス(メルカプトプロピ
ルチオメチル)ベンゼンと(メタ)アクリル酸とのジエ
ステルは、上記の方法で得られた式(1)で表されるジ
チオールに、公知の方法、即ち、アクリル酸クロライド
またはメタクリル酸クロライドを、アセトン、トルエ
ン、クロロホルム等の原料等と反応性がない溶媒中で、
塩酸補集剤の存在下に反応させることにより得られる。
アクリル酸クロライドまたはメタクリル酸クロライドの
使用量は、式(1)で表されるジチオール1モルに対し
て2〜2.5モルである。反応温度は−10〜35℃に
保ち、水酸化カリウム水溶液、水酸化ナトリウム水溶
液、トリエチルアミン、ピリジン等の塩酸補集剤を加え
て反応を進める。反応終了後、生成物をトルエン、ベン
ゼン等の有機溶媒に溶解し、有機層をよく洗浄した後、
溶媒を留去して生成物を得る。この生成物は、必要に応
じて、公知の方法により、さらに精製することもでき
る。The xylylenedithiol derivative represented by the formula (2), that is, the diester of 1,4-bis (mercaptopropylthiomethyl) benzene and (meth) acrylic acid, was obtained by the above method. A known method, that is, acrylic acid chloride or methacrylic acid chloride, is added to the dithiol represented by the formula (1) in a solvent which is not reactive with raw materials such as acetone, toluene and chloroform.
It is obtained by reacting in the presence of a hydrochloric acid scavenger.
The amount of acrylic acid chloride or methacrylic acid chloride used is 2 to 2.5 mol per 1 mol of the dithiol represented by the formula (1). The reaction temperature is kept at -10 to 35 ° C, and a hydrochloric acid aqueous solution, a sodium hydroxide aqueous solution, a hydrochloric acid scavenger such as triethylamine and pyridine is added to proceed the reaction. After completion of the reaction, the product is dissolved in an organic solvent such as toluene or benzene, and the organic layer is washed well,
The solvent is distilled off to obtain the product. This product can be further purified by a known method, if necessary.
【0012】[0012]
【実施例】次に、本発明を実施例によりさらに詳細に説
明するが、本発明はこれによりなんら制限されるもので
はない。尚、例中に示す部はすべて重量部を示す。 実施例1 反応:p−キシリレンジチオールの合成 p−キシリレンジクロライド78.5部、チオ尿素7
1.5部、水275部を混合し、反応液温102℃に保
ち、5時間攪拌した。反応終了後、冷却し、窒素雰囲気
下で、50wt%水酸化ナトリウム水溶液144部を加
え、反応液温100℃に保ち、30分間攪拌した。次い
で、反応液を40℃に冷却し、濃塩酸180部を加え、
そのまま30分間攪拌した。反応終了後、トルエン20
0部を加え、抽出し、有機層を分離した。有機層を水1
50部で洗浄した後、濃縮、蒸留を行い、蒸留物として
p−キシリレンジチオールを得た。無色の固体、収量5
9部。EXAMPLES Next, the present invention will be described in more detail by way of examples, which should not be construed as limiting the invention thereto. All parts shown in the examples are parts by weight. Example 1 Reaction: Synthesis of p-xylylene dithiol 78.5 parts of p-xylylene dichloride, thiourea 7
1.5 parts and 275 parts of water were mixed, and the reaction liquid temperature was kept at 102 ° C. and stirred for 5 hours. After completion of the reaction, the mixture was cooled, and under a nitrogen atmosphere, 144 parts of a 50 wt% sodium hydroxide aqueous solution was added, the reaction liquid temperature was kept at 100 ° C., and the mixture was stirred for 30 minutes. Then, the reaction solution was cooled to 40 ° C., 180 parts of concentrated hydrochloric acid was added,
It was stirred for 30 minutes as it was. After completion of the reaction, toluene 20
0 part was added, extraction was carried out, and the organic layer was separated. Organic layer with water 1
After washing with 50 parts, concentration and distillation were performed to obtain p-xylylenedithiol as a distillate. Colorless solid, yield 5
9 copies.
【0013】反応:S,S’−ビス(クロロプロピ
ル)−p−キシリレンジチオエーテルの合成 1−ブロモ−3−クロロプロパン112部、エタノール
130部に、反応で得られたp−キシリレンジチオー
ル59部と水酸化カリウム47部をエタノール300部
中で反応させた溶液を、反応液温60〜70℃に保ちな
がら、1.5時間かけて滴下した。滴下後、還流下で3
0分間反応した。反応終了後、水460部、トルエン4
00部を加え、抽出し、有機層を分離した。有機層を水
350部で洗浄した後、濃縮した。濃縮物をクロマトグ
ラフ法で精製し、淡赤色のシロップ状のS,S’−ビス
(クロロプロピル)−p−キシリレンジチオエーテル8
1部を得た。Reaction: Synthesis of S, S'-bis (chloropropyl) -p-xylylenedithioether 112 parts of 1-bromo-3-chloropropane and 130 parts of ethanol were added to 59 parts of p-xylylenedithiol obtained by the reaction. A solution obtained by reacting 47 parts of potassium hydroxide with 300 parts of ethanol was added dropwise over 1.5 hours while maintaining the reaction solution temperature at 60 to 70 ° C. After dropping, 3 under reflux
The reaction was performed for 0 minutes. After the reaction was completed, 460 parts of water and 4 parts of toluene
00 parts was added and extracted, and the organic layer was separated. The organic layer was washed with 350 parts of water and then concentrated. The concentrate was purified by a chromatographic method to give a pale red syrupy S, S'-bis (chloropropyl) -p-xylylenedithioether 8
One part was obtained.
【0014】反応:式(1)で表されるジチオールの
合成 反応で得られたS,S’−ビス(クロロプロピル)−
p−キシリレンジチオエーテル19.5部、チオ尿素
9.5部、N,N−ジメチルホルムアミド35部を、液
温80〜85℃に保ち、5時間攪拌し、反応させた。反
応終了後、10wt%水酸化ナトリウム水溶液300部
を加え、常温で30分間攪拌した。次いで、10wt%
塩酸250部を加え、常温で30分間攪拌した。その
後、トルエン160部を加え、抽出し、有機層を分離し
た。有機層を水250部で洗浄した後、濃縮した。濃縮
物をクロマトグラフ法で精製して、無色のシロップ状の
下記式(1)(化4)で表されるジチオール8部を得
た。Reaction: Synthesis of dithiol represented by formula (1) S, S'-bis (chloropropyl) -obtained by reaction
19.5 parts of p-xylylene dithioether, 9.5 parts of thiourea, and 35 parts of N, N-dimethylformamide were kept at a liquid temperature of 80 to 85 ° C. and stirred for 5 hours to cause a reaction. After the reaction was completed, 300 parts of a 10 wt% sodium hydroxide aqueous solution was added, and the mixture was stirred at room temperature for 30 minutes. Next, 10 wt%
250 parts of hydrochloric acid was added, and the mixture was stirred at room temperature for 30 minutes. Then, 160 parts of toluene was added and extraction was carried out to separate the organic layer. The organic layer was washed with 250 parts of water and then concentrated. The concentrate was purified by a chromatographic method to obtain 8 parts of dithiol represented by the following formula (1) (formula 4) in the form of a colorless syrup.
【0015】[0015]
【化4】 Embedded image
【0016】実施例2 ジメタクリレートの合成 実施例1で得られた式(1)で表されるジチオール8
部、アセトン40部、20wt%水酸化ナトリウム1
1.6部を混合し、反応液温10〜20℃に保ちなが
ら、メタクリル酸クロライド5.7部を滴下した。滴下
終了後、30分間攪拌した。次いで、水200部、トル
エン80部を加え、抽出し、有機層を分離した。有機層
を5wt%炭酸水素ナトリウム水溶液100部、水15
0部で洗浄した後、濃縮した。濃縮物をクロマトグラフ
法で精製して、無色のシロップ状の下記式(3)(化
5)で表されるジメタクリレート1.6部を得た。Example 2 Synthesis of dimethacrylate Dithiol 8 represented by the formula (1) obtained in Example 1
Parts, acetone 40 parts, 20 wt% sodium hydroxide 1
1.6 parts were mixed, and 5.7 parts of methacrylic acid chloride was added dropwise while maintaining the reaction solution temperature at 10 to 20 ° C. After the completion of dropping, the mixture was stirred for 30 minutes. Next, 200 parts of water and 80 parts of toluene were added and extracted, and the organic layer was separated. The organic layer is 100 parts of a 5 wt% sodium hydrogen carbonate aqueous solution and 15 parts of water.
After washing with 0 part, it was concentrated. The concentrate was purified by a chromatographic method to obtain 1.6 parts of a colorless syrupy dimethacrylate represented by the following formula (3) (formula 5).
【0017】[0017]
【化5】 Embedded image
【0018】実施例3 ジアクリレートの合成 実施例2のメタクリル酸クロライド5.7部をアクリル
酸クロライド5.0部に代え、反応温度を5℃にした以
外は、実施例2と同様にして、無色のシロップ状の下記
式(4)(化6)で表されるジアクリレート0.5部を
得た。Example 3 Synthesis of diacrylate The procedure of Example 2 was repeated except that 5.7 parts of methacrylic acid chloride of Example 2 was replaced with 5.0 parts of acrylic acid chloride and the reaction temperature was 5 ° C. 0.5 parts of a colorless syrupy diacrylate represented by the following formula (4) (formula 6) was obtained.
【0019】[0019]
【化6】 [Chemical 6]
【0020】参考例1 実施例2で得られたジメタクリレート35部に対して、
ラジカル重合開始剤としてt−ブチルパーオキシ−2−
エチルヘキサノエート35mgを添加してよく混合し
た。これを十分脱泡した後、ガラスモールドとガスケッ
トよりなるモールド型に注入した。30〜120℃まで
1時間かけて昇温し、さらに120℃で1時間加熱し
た。重合終了後、徐々に冷却し、成形体をモールドより
取り出した。得られた成形体は、無色透明であり、屈折
率nd =1.63、アッベ数νd =40であった。ま
た、耐擦傷性についても非常に優れており、評価は○で
あった。尚、屈折率、アッベ数、耐擦傷性、外観、耐衝
撃性は以下の試験法により評価した。 *屈折率、アッベ数:プルフリッヒ屈折計を用いて20
℃で測定した。 *耐擦傷性:樹脂の表面を#0000のスチールウール
で摩擦して、表面の傷つき難さを調べ、次のように判定
した。 ○:強く摩擦しても全く傷つかない △:強く摩擦すると少し傷つく ×:弱い摩擦でも傷つく *外観:目視により観察した。 *耐衝撃性:作製したレンズの中心部に高さ127cm
から鉄球を落下させて耐衝撃性を評価した。Reference Example 1 With respect to 35 parts of the dimethacrylate obtained in Example 2,
T-butylperoxy-2- as a radical polymerization initiator
35 mg of ethyl hexanoate was added and mixed well. After sufficiently defoaming this, it was poured into a mold composed of a glass mold and a gasket. The temperature was raised to 30 to 120 ° C over 1 hour, and further heated at 120 ° C for 1 hour. After the completion of the polymerization, the mixture was gradually cooled and the molded product was taken out of the mold. The obtained molded product was colorless and transparent, and had a refractive index n d = 1.63 and an Abbe number ν d = 40. The scratch resistance was also very good, and the evaluation was good. The refractive index, Abbe number, scratch resistance, appearance and impact resistance were evaluated by the following test methods. * Refractive index, Abbe number: 20 using Pulfrich refractometer
Measured in ° C. * Scratch resistance: The surface of the resin was rubbed with # 0000 steel wool to examine the scratch resistance of the surface, and judged as follows. ◯: No scratch even if strongly rubbed Δ: Slightly scratched if strongly rubbed ×: Damaged even if weakly rubbed * Appearance: visually observed. * Impact resistance: Height 127 cm at the center of the manufactured lens
The impact resistance was evaluated by dropping an iron ball from the.
【0021】参考例2 実施例3で得られたジアクリレート35部に対して、ラ
ジカル重合開始剤としてt−ブチルパーオキシ−2−エ
チルヘキサノエート17.5mg、増感剤として2−ヒ
ドロキシ−2−メチル−1−フェニルプロパン−1−オ
ン35mgを添加してよく混合した。これを十分脱泡し
た後、ガラスモールドとガスケットよりなるモールド型
に注入した。冷却しながら、紫外線を5分間照射した
後、30〜120℃まで1時間かけて昇温し、さらに1
20℃で1時間加熱した。重合終了後、徐々に冷却し、
成形体をモールドより取り出した。得られた成形体は、
無色透明であり、屈折率nd =1.64、アッベ数νd
=35であった。また、耐擦傷性については非常に優れ
ており、評価は○であった。Reference Example 2 With respect to 35 parts of the diacrylate obtained in Example 3, 17.5 mg of t-butylperoxy-2-ethylhexanoate was used as a radical polymerization initiator, and 2-hydroxy- was used as a sensitizer. 35 mg of 2-methyl-1-phenylpropan-1-one were added and mixed well. After sufficiently defoaming this, it was poured into a mold composed of a glass mold and a gasket. After irradiating with ultraviolet rays for 5 minutes while cooling, the temperature was raised to 30 to 120 ° C. over 1 hour, and further 1
Heated at 20 ° C. for 1 hour. After the completion of polymerization, gradually cool,
The molded body was taken out of the mold. The obtained molded body is
Colorless and transparent, refractive index n d = 1.64, Abbe number ν d
= 35. The scratch resistance was very good, and the evaluation was good.
【0022】参考例3 実施例2で得られたジメタクリレート32部に対して、
ポリエチレングリコールジメタクリレート〔n=9、新
中村化学工業(株)製:NKエステル9G〕8g、ラジ
カル重合開始剤としてt−ブチルパーオキシ−2−エチ
ルヘキサノエート17.5mg、増感剤として2−ヒド
ロキシ−2−メチル−1−フェニルプロパン−1−オン
70mgを添加してよく混合した。これを十分脱泡した
後、ガラスモールドとガスケットよりなるモールド型に
注入した。冷却しながら、紫外線を5分間照射した後、
30〜120℃まで1時間かけて昇温し、さらに120
℃で1時間加熱した。重合終了後、徐々に冷却し、成形
体をモールドより取り出した。得られた成形体は、無色
透明であり、屈折率nd =1.59、アッベ数νd=4
2であった。また、耐擦傷性については非常に優れてお
り、評価は○であった。さらに、参考例1で得られた成
形体よりも耐衝撃性は向上していた。Reference Example 3 With respect to 32 parts of dimethacrylate obtained in Example 2,
8 g of polyethylene glycol dimethacrylate [n = 9, manufactured by Shin-Nakamura Chemical Co., Ltd .: NK ester 9G], 17.5 mg of t-butylperoxy-2-ethylhexanoate as a radical polymerization initiator, 2 as a sensitizer 70 mg of -hydroxy-2-methyl-1-phenylpropan-1-one were added and mixed well. After sufficiently defoaming this, it was poured into a mold composed of a glass mold and a gasket. After irradiating with ultraviolet rays for 5 minutes while cooling,
The temperature is raised to 30 to 120 ° C over 1 hour, and further 120
Heated at 0 ° C. for 1 hour. After the completion of the polymerization, the mixture was gradually cooled and the molded product was taken out of the mold. The obtained molded body is colorless and transparent, has a refractive index n d = 1.59, and an Abbe number ν d = 4.
It was 2. The scratch resistance was very good, and the evaluation was good. Furthermore, the impact resistance was higher than that of the molded body obtained in Reference Example 1.
【0023】参考例4 実施例3で得られたジアクリレート35部に対して、ポ
リエチレングリコールジメタクリレート〔n=9、新中
村化学工業(株)製:NKエステル9G〕15g、ラジ
カル重合開始剤としてt−ブチルパーオキシ−2−エチ
ルヘキサノエート17.5mg、増感剤として2−ヒド
ロキシ−2−メチル−1−フェニルプロパン−1−オン
70mgを添加してよく混合した。これを十分脱泡した
後、ガラスモールドとガスケットよりなるモールド型に
注入した。冷却しながら、紫外線を5分間照射した後、
30〜120℃まで1時間かけて昇温し、さらに120
℃で1時間加熱した。重合終了後、徐々に冷却し、成形
体をモールドより取り出した。得られた成形体は、無色
透明であり、屈折率nd =1.60、アッベ数νd=4
0であった。また、耐擦傷性については非常に優れてお
り、評価は○であった。さらに、参考例2で得られた成
形体よりも耐衝撃性は向上していた。Reference Example 4 To 35 parts of the diacrylate obtained in Example 3, 15 g of polyethylene glycol dimethacrylate [n = 9, manufactured by Shin-Nakamura Chemical Co., Ltd .: NK ester 9G] was used as a radical polymerization initiator. 17.5 mg of t-butylperoxy-2-ethylhexanoate and 70 mg of 2-hydroxy-2-methyl-1-phenylpropan-1-one as a sensitizer were added and mixed well. After sufficiently defoaming this, it was poured into a mold composed of a glass mold and a gasket. After irradiating with ultraviolet rays for 5 minutes while cooling,
The temperature is raised to 30 to 120 ° C over 1 hour, and further 120
Heated at 0 ° C. for 1 hour. After the completion of the polymerization, the mixture was gradually cooled and the molded product was taken out of the mold. The obtained molded product is colorless and transparent, has a refractive index n d = 1.60 and an Abbe number ν d = 4.
It was 0. The scratch resistance was very good, and the evaluation was good. Furthermore, the impact resistance was higher than that of the molded product obtained in Reference Example 2.
【0024】参考比較例1 下記式(5)(化7)で表されるジメタクリレート35
部に対して、ラジカル重合開始剤としてt−ブチルパー
オキシ−2−エチルヘキサノエート35mgを添加して
よく混合した。これを十分脱泡した後、ガラスモールド
とガスケットよりなるモールド型に注入した。30〜1
20℃まで1時間かけて昇温し、さらに120℃で1時
間加熱した。重合終了後、徐々に冷却し、成形体をモー
ルドより取り出した。得られた成形体は、無色透明であ
り、屈折率nd =1.63、アッベ数νd =34であ
り、耐擦傷性の評価は△であった。Reference Comparative Example 1 Dimethacrylate 35 represented by the following formula (5)
To the parts, 35 mg of t-butylperoxy-2-ethylhexanoate was added as a radical polymerization initiator and mixed well. After sufficiently defoaming this, it was poured into a mold composed of a glass mold and a gasket. 30-1
The temperature was raised to 20 ° C over 1 hour, and further heated at 120 ° C for 1 hour. After the completion of the polymerization, the mixture was gradually cooled and the molded product was taken out of the mold. The obtained molded product was colorless and transparent, had a refractive index n d = 1.63, an Abbe number ν d = 34, and had a scratch resistance evaluation of Δ.
【0025】[0025]
【化7】 [Chemical 7]
【0026】参考比較例2 p−ベンゼンジチオールジメタクリレート35部に対し
て、ラジカル重合開始剤としてt−ブチルパーオキシ−
2−エチルヘキサノエート35mgを添加してよく混合
した。これを十分脱泡した後、ガラスモールドとガスケ
ットよりなるモールド型に注入した。30〜120℃ま
で1時間かけて昇温し、さらに120℃で1時間加熱し
た。重合終了後、徐々に冷却し、成形体をモールドより
取り出した。得られた成形体は、無色透明であり、屈折
率nd =1.66、アッベ数νd=24であり、耐擦傷
性の評価は×であった。Reference Comparative Example 2 With respect to 35 parts of p-benzenedithiol dimethacrylate, t-butylperoxy- was used as a radical polymerization initiator.
35 mg of 2-ethylhexanoate was added and mixed well. After sufficiently defoaming this, it was poured into a mold composed of a glass mold and a gasket. The temperature was raised to 30 to 120 ° C over 1 hour, and further heated at 120 ° C for 1 hour. After the completion of the polymerization, the mixture was gradually cooled and the molded product was taken out of the mold. The obtained molded product was colorless and transparent, had a refractive index n d = 1.66, an Abbe number ν d = 24, and was rated x for scratch resistance.
【0027】[0027]
【発明の効果】本発明の式(1)表されるジチオールお
よび式(2)で表されるそのジ(メタ)アクリレート
は、良好な光学物性、高い屈折率および優れた耐擦傷性
をもつ光学用レンズ樹脂を与えることができる。INDUSTRIAL APPLICABILITY The dithiol represented by the formula (1) and the di (meth) acrylate represented by the formula (2) of the present invention are optical materials having good optical properties, high refractive index and excellent scratch resistance. Lens resin can be provided.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 小林 誠一 神奈川県横浜市栄区笠間町1190番地 三井 東圧化学株式会社内 (72)発明者 笹川 勝好 神奈川県横浜市栄区笠間町1190番地 三井 東圧化学株式会社内 (72)発明者 藤井 謙一 神奈川県横浜市栄区笠間町1190番地 三井 東圧化学株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Seiichi Kobayashi 1190 Kasama-cho, Sakae-ku, Yokohama-shi, Kanagawa Mitsui Toatsu Chemical Co., Ltd. (72) Inventor Katsuyoshi Sasagawa 1190, Kasama-cho, Sakae-ku, Yokohama, Kanagawa Chemicals Co., Ltd. (72) Inventor Kenichi Fujii 1190 Kasama-cho, Sakae-ku, Yokohama-shi, Kanagawa Mitsui Toatsu Chemicals Co., Ltd.
Claims (2)
ジチオール誘導体。 【化1】 1. A xylylenedithiol derivative represented by formula (1) (formula 1). Embedded image
ジチオール誘導体。 【化2】 (式中、Rは水素原子またはメチル基を表す)2. A xylylenedithiol derivative represented by formula (2) (formula 2). Embedded image (In the formula, R represents a hydrogen atom or a methyl group)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18401495A JP3688021B2 (en) | 1995-07-20 | 1995-07-20 | Novel xylylenedithiol derivatives |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18401495A JP3688021B2 (en) | 1995-07-20 | 1995-07-20 | Novel xylylenedithiol derivatives |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0931047A true JPH0931047A (en) | 1997-02-04 |
| JP3688021B2 JP3688021B2 (en) | 2005-08-24 |
Family
ID=16145831
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18401495A Expired - Lifetime JP3688021B2 (en) | 1995-07-20 | 1995-07-20 | Novel xylylenedithiol derivatives |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3688021B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002097223A (en) * | 2000-09-22 | 2002-04-02 | Mitsui Chemicals Inc | Sulfur-containing (meth)acrylic acid thioester compound and their use |
| JP2008174757A (en) * | 2008-03-12 | 2008-07-31 | Tokuyama Corp | Sulfur-containing polymerizable adamantane compound |
| JP2012031090A (en) * | 2010-07-30 | 2012-02-16 | Sumitomo Seika Chem Co Ltd | Method of producing (meth)acrylic acid thioester |
| JP2012233046A (en) * | 2011-04-28 | 2012-11-29 | Mitsubishi Gas Chemical Co Inc | Curable composition and optical adhesive |
| JP2012233047A (en) * | 2011-04-28 | 2012-11-29 | Mitsubishi Gas Chemical Co Inc | Curable composition and optical adhesive |
| JP2013155144A (en) * | 2012-01-31 | 2013-08-15 | Sumitomo Seika Chem Co Ltd | Method of producing dithiol compound and cyclic disulfide compound |
-
1995
- 1995-07-20 JP JP18401495A patent/JP3688021B2/en not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002097223A (en) * | 2000-09-22 | 2002-04-02 | Mitsui Chemicals Inc | Sulfur-containing (meth)acrylic acid thioester compound and their use |
| JP2008174757A (en) * | 2008-03-12 | 2008-07-31 | Tokuyama Corp | Sulfur-containing polymerizable adamantane compound |
| JP2012031090A (en) * | 2010-07-30 | 2012-02-16 | Sumitomo Seika Chem Co Ltd | Method of producing (meth)acrylic acid thioester |
| JP2012233046A (en) * | 2011-04-28 | 2012-11-29 | Mitsubishi Gas Chemical Co Inc | Curable composition and optical adhesive |
| JP2012233047A (en) * | 2011-04-28 | 2012-11-29 | Mitsubishi Gas Chemical Co Inc | Curable composition and optical adhesive |
| JP2013155144A (en) * | 2012-01-31 | 2013-08-15 | Sumitomo Seika Chem Co Ltd | Method of producing dithiol compound and cyclic disulfide compound |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3688021B2 (en) | 2005-08-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5834621A (en) | Novel sulfur-containing compound and method for preparing the same | |
| US6646104B1 (en) | Process for production of sulfur compounds | |
| JPH1112273A (en) | Episulfide compound and its compound | |
| JP4375643B2 (en) | Sulfur-containing (meth) acrylic acid thioester compounds and uses thereof | |
| JPH0931047A (en) | Novel xylylenedithiol derivative | |
| JP2570776B2 (en) | Sulfur-containing aliphatic acrylic compound | |
| JPS61127712A (en) | Resin for lens having high refractive index | |
| US6528601B1 (en) | Polymerizable sulfur-containing (meth) acrylate, polymerizable composition and optical lens | |
| JP4704550B2 (en) | Sulfur-containing (meth) acrylic acid thioester compounds and uses thereof | |
| JPH05170702A (en) | New bisphenol derivative and its production | |
| JPH0931136A (en) | Composition for molding plastic lens and plastic lens using the same | |
| JP2804840B2 (en) | Polymer and optical product using the same | |
| JP2656109B2 (en) | Triazine compound and method for producing the same | |
| JP2002030082A (en) | Polymerizable thio (meth) acrylate compound | |
| JP3647158B2 (en) | Resin composition, casting composition and cured product thereof | |
| JPH0665190A (en) | Vinylbenzyl compound | |
| KR100357685B1 (en) | Aromatic Acrylic or Methacrylic Compounds and Process for Preparing the Same, Their Polymerisable Composition, and Method for Preparing a High Reflective Plastic Material | |
| JP2002020433A (en) | Monomer composition and cured product thereof | |
| JP2002128826A (en) | Sulfur-containing (meth)acrylic acid thioester compound and its use | |
| JPH0786131B2 (en) | Polymer and optical product using the same | |
| JPS6315257B2 (en) | ||
| JP2893933B2 (en) | Sulfur-containing acrylic oligomer composition | |
| JPH09302029A (en) | Styrene monomer, styrene polymer and plastic material for optical use | |
| JP2893940B2 (en) | Sulfur-containing acrylic oligomer composition | |
| JP3981602B2 (en) | Radical polymerizable sulfur-containing adamantane compound and cured product |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20040106 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20050607 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20050607 |
|
| R150 | Certificate of patent (=grant) or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080617 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090617 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100617 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100617 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110617 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120617 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120617 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130617 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130617 Year of fee payment: 8 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |