JPH09313662A - Sled and manufacture therefor - Google Patents
Sled and manufacture thereforInfo
- Publication number
- JPH09313662A JPH09313662A JP13627096A JP13627096A JPH09313662A JP H09313662 A JPH09313662 A JP H09313662A JP 13627096 A JP13627096 A JP 13627096A JP 13627096 A JP13627096 A JP 13627096A JP H09313662 A JPH09313662 A JP H09313662A
- Authority
- JP
- Japan
- Prior art keywords
- sled
- film
- gas
- sliding surface
- carbon film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 239000007789 gas Substances 0.000 claims abstract description 52
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 44
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 42
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 13
- 239000011737 fluorine Substances 0.000 claims abstract description 12
- 239000001257 hydrogen Substances 0.000 claims abstract description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000001301 oxygen Substances 0.000 claims abstract description 6
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 6
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims abstract 3
- 239000000463 material Substances 0.000 claims description 14
- 229920005989 resin Polymers 0.000 claims description 13
- 239000011347 resin Substances 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- 239000002023 wood Substances 0.000 claims description 6
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 5
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 10
- 238000012545 processing Methods 0.000 abstract description 7
- 150000002430 hydrocarbons Chemical class 0.000 abstract description 5
- 238000012423 maintenance Methods 0.000 abstract description 4
- 239000002994 raw material Substances 0.000 abstract description 3
- 238000007781 pre-processing Methods 0.000 abstract 2
- 238000012360 testing method Methods 0.000 description 24
- 239000000758 substrate Substances 0.000 description 22
- 244000025254 Cannabis sativa Species 0.000 description 14
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 5
- 229910003460 diamond Inorganic materials 0.000 description 5
- 239000010432 diamond Substances 0.000 description 5
- 229910001882 dioxygen Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- -1 etc.) Polymers 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 229910018503 SF6 Inorganic materials 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 239000004576 sand Substances 0.000 description 3
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 3
- 229960000909 sulfur hexafluoride Drugs 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 2
- MIZLGWKEZAPEFJ-UHFFFAOYSA-N 1,1,2-trifluoroethene Chemical compound FC=C(F)F MIZLGWKEZAPEFJ-UHFFFAOYSA-N 0.000 description 1
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 1
- WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 description 1
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 1
- CONKBQPVFMXDOV-QHCPKHFHSA-N 6-[(5S)-5-[[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]methyl]-2-oxo-1,3-oxazolidin-3-yl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C[C@H]1CN(C(O1)=O)C1=CC2=C(NC(O2)=O)C=C1 CONKBQPVFMXDOV-QHCPKHFHSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- JAWMENYCRQKKJY-UHFFFAOYSA-N [3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-ylmethyl)-1-oxa-2,8-diazaspiro[4.5]dec-2-en-8-yl]-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]methanone Chemical compound N1N=NC=2CN(CCC=21)CC1=NOC2(C1)CCN(CC2)C(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F JAWMENYCRQKKJY-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- NTQGILPNLZZOJH-UHFFFAOYSA-N disilicon Chemical compound [Si]#[Si] NTQGILPNLZZOJH-UHFFFAOYSA-N 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000007849 furan resin Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- IOUVKUPGCMBWBT-QNDFHXLGSA-N phlorizin Chemical compound O[C@@H]1[C@@H](O)[C@H](O)[C@@H](CO)O[C@H]1OC1=CC(O)=CC(O)=C1C(=O)CCC1=CC=C(O)C=C1 IOUVKUPGCMBWBT-QNDFHXLGSA-N 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- JMHCCAYJTTWMCX-QWPJCUCISA-M sodium;(2s)-2-amino-3-[4-(4-hydroxy-3,5-diiodophenoxy)-3,5-diiodophenyl]propanoate;pentahydrate Chemical compound O.O.O.O.O.[Na+].IC1=CC(C[C@H](N)C([O-])=O)=CC(I)=C1OC1=CC(I)=C(O)C(I)=C1 JMHCCAYJTTWMCX-QWPJCUCISA-M 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- JOHWNGGYGAVMGU-UHFFFAOYSA-N trifluorochlorine Chemical compound FCl(F)F JOHWNGGYGAVMGU-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、スキー板、スノー
ボード、ボブスレーのそり等の雪の上で用いるためのそ
りやグラススキー板等の天然又は人工の草の上で用いる
ためのそり、及びこのようなそりの製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sled for use on snow such as skis, snowboards and bobsled sleds, and a sled for use on natural or artificial grass such as grass skis, and the like. A method of manufacturing such a sled.
【0002】[0002]
【従来の技術】スキー板、スノーボード、ボブスレーの
そり、グラススキー板等のそりは、雪や草との滑りを良
くするために、通常、滑走面にワックスを塗ったものを
使用する。その際、ワックスを溶かして滑走面に塗り、
ワックス凝固後、該塗布面を研磨して滑らかにする。2. Description of the Related Art Skis such as skis, snowboards, bobsled sleds, and glass skis usually have a skid surface with a wax in order to improve sliding with snow and grass. At that time, melt the wax and apply it to the gliding surface,
After the wax is solidified, the coated surface is polished and smoothed.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、滑走面
にワックスを塗布したそりは、使用中に滑走面が雪、
草、砂等と擦れてワックス膜に傷がついたり、一部剥が
れたりするため、定期的にワックスを除去して塗り直さ
なければならず、手間がかかる。そこで本発明は、滑走
面の潤滑性が優れるとともに、その潤滑性を維持するた
めの定期的なメンテナンスを要しない、或いは殆ど要し
ないそり及びその製造方法を提供することを課題とす
る。However, the sled having the wax coated on the sliding surface has a problem that the sliding surface is covered with snow during use.
Since the wax film is scratched or partially peeled off by rubbing against grass, sand, etc., the wax must be removed and reapplied periodically, which is troublesome. Therefore, it is an object of the present invention to provide a sled that has excellent lubricity on a sliding surface and does not require or requires almost regular maintenance for maintaining the lubricity, and a method for manufacturing the sled.
【0004】[0004]
【課題を解決するための手段】前記課題を解決するため
に本発明は、そり基体の滑走面に耐摩耗性、潤滑性のあ
る炭素膜が形成されていることを特徴とするそりを提供
する。また本発明は、そり基体の滑走面に耐摩耗性、潤
滑性のある炭素膜を形成する工程を含むことを特徴とす
るそりの製造方法を提供する。In order to solve the above-mentioned problems, the present invention provides a sled having a carbon film having abrasion resistance and lubricity formed on the sliding surface of a sled base. . The present invention also provides a method for manufacturing a sled, which comprises the step of forming a carbon film having wear resistance and lubricity on the sliding surface of the sled base.
【0005】本発明におけるそりには、スキー板、スノ
ーボード、ボブスレーのそり等の雪上を滑走するための
もの、グラススキー板等の天然又は人工の草の上を滑走
するためのもの等が含まれる。本発明に係るそりは、そ
り基体の滑走面に耐摩耗性及び潤滑性を有する炭素膜が
形成されているため、雪、草(人工草を含む)等との摺
動性がよく、これらの上をスムーズに滑ることができ
る。また、該炭素膜は雪、草(人工草を含む)、砂等と
の摩擦により摩耗し難いため、滑走面の潤滑性を維持す
るための定期的なメンテナンスを要しない、或いは殆ど
要しない。The sled in the present invention includes skis, snowboards, bobsled sleds, etc. for sliding on snow, grass skis, etc. for sliding on natural or artificial grass, etc. . The sled according to the present invention has a carbon film having wear resistance and lubricity formed on the sliding surface of the sled substrate, and therefore has good slidability with snow, grass (including artificial grass), etc. You can glide smoothly on the top. Further, since the carbon film is less likely to be abraded by friction with snow, grass (including artificial grass), sand, etc., it does not require regular maintenance to maintain the lubricity of the sliding surface, or hardly requires it.
【0006】本発明におけるそり基体、特にその被成膜
滑走面の材質は、そり滑走面の材質として通常採用され
ているものでよく、木材、樹脂等の1又は2以上を用い
ることができる。なお、ボブスレー等のように滑走部と
搭乗部等のその他の部分とからなるものについては、滑
走部のそり滑走面に炭素膜が形成されるため、滑走部基
体の被成膜滑走面の材質がこのようなものであればよ
い。The material of the sled base in the present invention, in particular, the sliding surface on which the film is to be formed may be one that is usually adopted as the material of the sled sliding surface, and one or more materials such as wood and resin can be used. In addition, for those consisting of the sliding part and other parts such as the riding part such as bobsled, the carbon film is formed on the sled sliding surface of the sliding part, so the material of the film-formed sliding surface of the sliding part substrate May be something like this.
【0007】被成膜滑走面を樹脂で形成する場合、熱硬
化性樹脂としては、フェノール・ホルムアルデヒド樹
脂、尿素樹脂、メラミン・ホルムアルデヒド樹脂、エポ
キシ樹脂、フラン樹脂、キシレン樹脂、不飽和ポリエス
テル樹脂、シリコン樹脂、ジアリルフタレート樹脂等を
例示できる。また、熱可塑性樹脂では、ビニル系樹脂
(ポリ塩化ビニル、ポリ2塩化ビニル、ポリビニルブチ
ラート、ポリビニルアルコール、ポリ酢酸ビニル、ポリ
ビニルホルマール等)、ポリ塩化ビニリデン、塩素化ポ
リエーテル、ポリエステル系樹脂(ポリスチレン、スチ
レン・アクリロニトリル共重合体等)、ABS、ポリエ
チレン、ポリプロピレン、ポリアセタール、アクリル系
樹脂(ポリメチルメタクリレート、変性アクリル等)、
ポリアミド系樹脂(ナイロン6、66、610、11
等)、セルロース系樹脂(エチルセルロース、酢酸セル
ロース、プロピルセルロース、酢酸・酪酸セルロース、
硝酸セルロース等)、ポリカーボネート、フェノキシ系
樹脂、フッ素系樹脂(3フッ化塩化エチレン、4フッ化
エチレン、4フッ化エチレン・6フッ化プロピレン、フ
ッ化ビニリデン等)、ポリウレタン等を例示できる。When the film-forming sliding surface is made of resin, the thermosetting resin may be phenol / formaldehyde resin, urea resin, melamine / formaldehyde resin, epoxy resin, furan resin, xylene resin, unsaturated polyester resin, or silicone. Examples thereof include resins and diallyl phthalate resins. Further, as thermoplastic resins, vinyl resins (polyvinyl chloride, polyvinyl dichloride, polyvinyl butyrate, polyvinyl alcohol, polyvinyl acetate, polyvinyl formal, etc.), polyvinylidene chloride, chlorinated polyether, polyester resins (polystyrene) , Styrene-acrylonitrile copolymer, etc.), ABS, polyethylene, polypropylene, polyacetal, acrylic resin (polymethylmethacrylate, modified acrylic, etc.),
Polyamide resin (nylon 6, 66, 610, 11
Etc.), cellulosic resins (ethyl cellulose, cellulose acetate, propyl cellulose, acetic acid / butyrate cellulose,
Examples thereof include cellulose nitrate and the like, polycarbonate, phenoxy resin, fluorine resin (ethylene trifluoride, tetrafluoroethylene, tetrafluoroethylene and hexafluoropropylene, vinylidene fluoride, etc.), polyurethane and the like.
【0008】また、本発明における炭素膜は、代表的に
はDLC(Diamond Like Carbon) 膜であることが考えら
れる。DLC膜は、潤滑性良好であり、また、雪、草
(人工の草を含む)、砂等との摩擦により摩耗し難く、
且つ、その厚さを調整することにより該膜で被覆された
そり基体の可撓性を損なわないようにできる程度の適度
な硬度を有する炭素膜であり、さらに、比較的低温で形
成できる等、成膜を容易に行うことができる。The carbon film in the present invention is typically considered to be a DLC (Diamond Like Carbon) film. The DLC film has good lubricity and is less likely to wear due to friction with snow, grass (including artificial grass), sand, etc.
Also, by adjusting the thickness thereof, it is a carbon film having an appropriate hardness such that the flexibility of the sled substrate covered with the film is not impaired, and can be formed at a relatively low temperature. The film can be easily formed.
【0009】また、前記炭素膜の膜厚は、そり基体上に
密着性良く形成でき、また、そり基体本来の可撓性を損
なわないとともに、そり基体の保護膜として十分機能で
きる範囲内であればよい。また、本発明方法において、
前記炭素膜形成に先立ち、前処理として、そり基体の滑
走面をフッ素(F)含有ガス、水素(H2 )ガス及び酸
素(O2 )ガスから選ばれた少なくとも1種のガスのプ
ラズマに曝すことが考えられる。この場合、本発明のそ
りにおいて、そり基体は、このような前処理を施された
ものである。Further, the thickness of the carbon film should be within a range in which the carbon film can be formed on the sled substrate with good adhesion, the original flexibility of the sled substrate is not impaired, and the carbon film can sufficiently function as a protective film for the sled substrate. Good. In the method of the present invention,
Prior to the carbon film formation, as a pretreatment, the sliding surface of the sled substrate is exposed to plasma of at least one gas selected from fluorine (F) -containing gas, hydrogen (H 2 ) gas and oxygen (O 2 ) gas. It is possible. In this case, in the sled of the present invention, the sled base body has been subjected to such pretreatment.
【0010】前記フッ素含有ガスとしては、フッ素(F
2 )ガス、3フッ化窒素(NF3 )ガス、6フッ化硫黄
(SF6 )ガス、4フッ化炭素(CF4 )ガス、4フッ
化ケイ素(SiF4 )ガス、6フッ化2ケイ素(Si2
F6 )ガス、3フッ化塩素(ClF3 )ガス、フッ化水
素(HF)ガス等を挙げることができる。そり基体の被
成膜滑走面を、前記前処理用ガスのプラズマに曝すこと
により、該滑走面が清浄化され、又はさらに該面の粗度
が向上する。これらは、炭素膜の密着性向上に寄与し、
高密着性炭素膜を得ることができる。As the fluorine-containing gas, fluorine (F
2 ) gas, nitrogen trifluoride (NF 3 ) gas, sulfur hexafluoride (SF 6 ) gas, carbon tetrafluoride (CF 4 ) gas, silicon tetrafluoride (SiF 4 ) gas, disilicon hexafluoride ( Si 2
F 6 ) gas, chlorine trifluoride (ClF 3 ) gas, hydrogen fluoride (HF) gas and the like. By exposing the film-forming sliding surface of the sled substrate to the plasma of the pretreatment gas, the sliding surface is cleaned or the roughness of the surface is further improved. These contribute to improving the adhesion of the carbon film,
A highly adherent carbon film can be obtained.
【0011】フッ素含有ガスプラズマを採用するとき
は、これによって被成膜滑走面がフッ素終端され、水素
ガスプラズマを採用するときはこれによって被成膜滑走
面が水素終端される。フッ素−炭素結合及び水素−炭素
結合は安定であるため、前記のように終端処理すること
で膜中の炭素原子が被成膜滑走面部分のフッ素原子又は
水素原子と安定に結合を形成する。そしてこれらのこと
から、その後形成する炭素膜とそり基体との密着性を向
上させることができる。また、酸素ガスプラズマを採用
するときは、被成膜滑走面に付着した有機物等の汚れを
特に効率良く除去でき、これらのことからその後形成す
る炭素膜とそり基体との密着性を向上させることができ
る。When the fluorine-containing gas plasma is adopted, the film-deposited sliding surface is terminated with fluorine, and when the hydrogen gas plasma is adopted, the film-deposited sliding surface is terminated with hydrogen. Since the fluorine-carbon bond and the hydrogen-carbon bond are stable, the carbon atom in the film stably forms a bond with the fluorine atom or the hydrogen atom in the portion of the sliding surface on which the film is formed by terminating as described above. From these facts, it is possible to improve the adhesion between the carbon film to be subsequently formed and the sled base. Further, when oxygen gas plasma is adopted, stains such as organic substances adhering to the surface on which the film is to be formed can be removed particularly efficiently, and for this reason, the adhesion between the carbon film to be formed later and the sled substrate can be improved. You can
【0012】本発明において、炭素膜形成に先立って行
うプラズマによる被成膜滑走面の前処理は、同種類のプ
ラズマを用いて或いは異なる種類のプラズマを用いて複
数回行っても構わない。例えば、該滑走面を酸素ガスプ
ラズマに曝した後、フッ素含有ガスプラズマ又は水素ガ
スプラズマに曝し、さらにその上に炭素膜を形成すると
きには、該滑走面がクリーニングされた後、該面がフッ
素終端又は水素終端されて、その後形成する炭素膜とそ
り基体滑走面との密着性は非常に良好なものとなる。In the present invention, the pretreatment of the surface to be film-formed by plasma, which is performed prior to the formation of the carbon film, may be performed a plurality of times using the same type of plasma or different types of plasma. For example, when the sliding surface is exposed to oxygen gas plasma, and then exposed to fluorine-containing gas plasma or hydrogen gas plasma, and a carbon film is further formed thereon, after cleaning the sliding surface, the surface is terminated with fluorine. Alternatively, the adhesion between the carbon film, which is terminated with hydrogen and subsequently formed, and the sled base body sliding surface becomes very good.
【0013】また、本発明における炭素膜形成方法とし
ては、木材、樹脂等の比較的耐熱性に劣る材料からなる
そり基体に熱的損傷を与えない温度範囲で膜形成できる
方法として、プラズマCVD法、スパッタリング法、イ
オンプレーティング法等を挙げることができるが、特に
プラズマCVD法を用いる場合は、そり基体のプラズマ
による前処理と炭素膜形成とを同一の装置で行うことが
できる。As the carbon film forming method in the present invention, a plasma CVD method can be used as a method capable of forming a film in a temperature range that does not cause thermal damage to a sled base made of a material having relatively poor heat resistance such as wood and resin. The sputtering method, the ion plating method and the like can be mentioned. Especially when the plasma CVD method is used, the pretreatment of the sled substrate with plasma and the carbon film formation can be performed in the same apparatus.
【0014】プラズマCVD法により炭素膜を形成する
場合のプラズマ原料ガスとしては、炭素膜形成に一般に
用いられるメタン(CH4 )、エタン(C2 H6 )、プ
ロパン(C3 H8 )、ブタン(C4 H10)、アセチレン
(C2 H2 )、ベンゼン(C 6 H6 )等の炭化水素化合
物ガス、及び必要に応じて、これらの炭化水素化合物ガ
スにキャリアガスとして水素ガス、不活性ガス等を混合
したものを用いることができる。A carbon film is formed by the plasma CVD method.
In this case, the plasma source gas is generally used for carbon film formation.
Methane used (CHFour), Ethane (CTwoH6),
Lopin (CThreeH8), Butane (CFourHTen),acetylene
(CTwoHTwo), Benzene (C 6H6) Hydrocarbon compounds such as
Gas and, if necessary, these hydrocarbon compounds
Mixed with hydrogen gas and inert gas as carrier gas
Can be used.
【0015】本発明の炭素膜はそり基体の滑走面に形成
されているが、必要に応じ、滑走面に加えてその他の部
分の一部又は全部にわたって形成されていてもよい。Although the carbon film of the present invention is formed on the sliding surface of the sled substrate, it may be formed over part or all of the other portions in addition to the sliding surface, if necessary.
【0016】[0016]
【発明の実施の形態】以下、本発明の実施の形態を図面
を参照して説明する。図1は本発明に係るそりの製造に
用いることができる成膜装置の概略構成を示す図であ
る。図2は、本発明に係るそりの1例(スキー板)の側
面図である。図1の装置は、排気装置11が付設された
真空チャンバ1を有し、チャンバ1内には電極2及びこ
れに対向する位置に電極3が設置されている。電極3は
接地され、電極2にはマッチングボックス22を介して
高周波電源23が接続されている。また、電極2にはそ
の上に接触して支持される被成膜基体Sを成膜温度に加
熱するためのヒータ21が付設されている。また、チャ
ンバ1にはガス供給部4が付設されて、内部にプラズマ
原料ガスを導入できるようになっている。ガス供給部4
には、マスフローコントローラ411、412・・・及
び弁421、422・・・を介して接続された1又は2
以上のプラズマ原料ガスのガス源431、432・・・
が含まれる。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a diagram showing a schematic configuration of a film forming apparatus that can be used for manufacturing a sled according to the present invention. FIG. 2 is a side view of an example of a sled (ski) according to the present invention. The apparatus of FIG. 1 has a vacuum chamber 1 to which an exhaust device 11 is attached, and inside the chamber 1, an electrode 2 and an electrode 3 are installed at a position facing the electrode 2. The electrode 3 is grounded, and a high frequency power supply 23 is connected to the electrode 2 via a matching box 22. Further, the electrode 2 is provided with a heater 21 for heating the deposition target substrate S which is in contact therewith and supported to a deposition temperature. Further, the chamber 1 is provided with a gas supply unit 4 so that a plasma source gas can be introduced therein. Gas supply unit 4
1 and 2 connected via mass flow controllers 411, 412 ... And valves 421, 422.
Gas sources 431, 432 ...
Is included.
【0017】この装置を用いて本発明に係るそりを製造
するにあたっては、そり基体Sをそり基体トレーTで支
持して真空チャンバ1内に搬入し、そり基体の滑走面S
1を電極3の方に向けて該トレーごと電極2上に配置
し、排気装置11の運転にてチャンバ1内部を所定の真
空度にする。次いで、ガス供給部4からチャンバ1内に
フッ素含有ガス、水素ガス及び酸素ガスのうち1種以上
のガスを前処理用ガスとして導入するとともに高周波電
源23からマッチングボックス22を介して電極2に高
周波電力を供給し、これにより前記導入した前処理用ガ
スをプラズマ化し、該プラズマの下でそり基体Sの滑走
面S1の表面処理を行う。なお、この表面処理(前処
理)は行うことが望ましいが、必ずしも要しない。In manufacturing the sled according to the present invention using this apparatus, the sled substrate S is supported by the sled substrate tray T and carried into the vacuum chamber 1, and the sliding surface S of the sled substrate is supported.
1 is placed on the electrode 2 with the tray facing the electrode 3, and the exhaust device 11 is operated to bring the inside of the chamber 1 to a predetermined vacuum degree. Then, at least one of fluorine-containing gas, hydrogen gas and oxygen gas is introduced as a pretreatment gas from the gas supply unit 4 into the chamber 1, and a high frequency power is supplied from the high frequency power supply 23 to the electrode 2 via the matching box 22. Electric power is supplied, whereby the introduced pretreatment gas is made into plasma, and the surface of the sliding surface S1 of the sled base S is surface-treated under the plasma. It is desirable to perform this surface treatment (pretreatment), but it is not always necessary.
【0018】次いで、必要に応じてチャンバ1内を再び
真空引きした後、ガス供給部4からチャンバ1内に成膜
用原料ガスとして炭化水素化合物ガスを導入するととも
に高周波電源23から電極2に高周波電力を供給し、こ
れにより前記導入した炭化水素化合物ガスをプラズマ化
し、該プラズマの下で基体Sの滑走面S1に炭素膜Fを
形成する。Then, after the chamber 1 is evacuated again if necessary, a hydrocarbon compound gas is introduced into the chamber 1 from the gas supply unit 4 as a film forming raw material gas, and a high frequency power is supplied from the high frequency power supply 23 to the electrode 2. Electric power is supplied, whereby the introduced hydrocarbon compound gas is turned into plasma, and the carbon film F is formed on the sliding surface S1 of the substrate S under the plasma.
【0019】なお、上記表面処理及び炭素膜形成処理に
おいては、図示しない基体駆動手段によりそり基体Sを
トレーTごと適宜動かして、基体Sの被成膜滑走面S1
全体に均一に表面処理及び炭素膜形成が行われるように
する。このようにして、図2に示すように、そり基体S
の滑走面S1に炭素膜Fが形成された炭素膜被覆そり
(ここではスキー板)が得られる。In the above surface treatment and carbon film forming treatment, the sled substrate S is appropriately moved together with the tray T by the substrate driving means (not shown) to form the film-forming sliding surface S1 of the substrate S.
The surface treatment and carbon film formation should be performed uniformly on the entire surface. In this way, as shown in FIG.
A carbon film-covered sled (here, a ski) in which the carbon film F is formed on the sliding surface S1 is obtained.
【0020】次に、図1の装置を用いて、木材からなる
スキー板基体と同材質の試験片の滑走面相当表面にDL
C膜を形成した実施例を説明する。 実験例1 前処理用ガスプラズマによる試験片の前処理を行わず、
試験片表面に直接DLC膜を形成した。Next, using the apparatus shown in FIG. 1, DL is formed on the surface corresponding to the sliding surface of the test piece made of the same material as the ski base body made of wood.
An example in which the C film is formed will be described. Experimental Example 1 Without pretreatment of the test piece with the pretreatment gas plasma,
A DLC film was formed directly on the surface of the test piece.
【0021】 試験片材質 木材 サイズ 10cm×30cm×厚さ1cm 高周波電極2サイズ 40cm×40cm 成膜条件 成膜用原料ガス メタン(CH4 ) 100sccm 高周波電力 周波数13.56MHz、300W 成膜真空度 0.1Torr 成膜速度 500Å/min 成膜時間 20min 実験例2 前記実験例1において、成膜に先立ち、試験片に次の条
件で水素ガスプラズマによる前処理を施した。成膜条件
は前記実験例1と同様とした。Test piece material Wood size 10 cm × 30 cm × thickness 1 cm High frequency electrode 2 size 40 cm × 40 cm Film forming conditions Membrane source gas methane (CH 4 ) 100 sccm High frequency power frequency 13.56 MHz, 300 W Film forming vacuum degree 0.1. 1 Torr Film forming speed 500Å / min Film forming time 20 min Experimental Example 2 In Experimental Example 1, the test piece was pretreated with hydrogen gas plasma under the following conditions prior to film formation. The film forming conditions were the same as in Experimental Example 1 above.
【0022】 前処理条件 前処理用ガス 水素(H2 ) 100sccm 高周波電力 周波数13.56MHz、300W 処理真空度 0.1Torr 処理時間 5min 実験例3 前記実験例1において、成膜に先立ち、試験片に次の条
件でフッ素化合物ガスプラズマによる前処理を施した。
成膜条件は前記実験例1と同様とした。Pretreatment Condition Hydrogen for Pretreatment Hydrogen (H 2 ) 100 sccm High Frequency Power Frequency 13.56 MHz, 300 W Processing Vacuum Degree 0.1 Torr Processing Time 5 min Experimental Example 3 In Experimental Example 1, the test piece was formed before film formation. Pretreatment with a fluorine compound gas plasma was performed under the following conditions.
The film forming conditions were the same as in Experimental Example 1 above.
【0023】 前処理条件 前処理用ガス 6フッ化硫黄(SF6 ) 100sccm 高周波電力 周波数13.56MHz、300W 処理真空度 0.1Torr 処理時間 5min 実験例4 前記実験例1において、成膜に先立ち、試験片に次の条
件で酸素ガスプラズマによる第1の前処理を施し、さら
に水素ガスプラズマによる第2の前処理を施した。成膜
条件は前記実験例1と同様とした。Pretreatment Conditions Pretreatment Gas Sulfur Hexafluoride (SF 6 ) 100 sccm High Frequency Power Frequency 13.56 MHz, 300 W Treatment Vacuum Degree 0.1 Torr Treatment Time 5 min Experimental Example 4 In Experimental Example 1, prior to film formation, The test piece was subjected to a first pretreatment with oxygen gas plasma under the following conditions, and a second pretreatment with hydrogen gas plasma. The film forming conditions were the same as in Experimental Example 1 above.
【0024】 第1前処理条件 前処理用ガス 酸素(O2 ) 100sccm 高周波電力 周波数13.56MHz、300W 処理真空度 0.1Torr 処理時間 5min 第2前処理条件 前処理用ガス 水素(H2 ) 100sccm 高周波電力 周波数13.56MHz、300W 処理真空度 0.1Torr 処理時間 5min 実験例5 前記実験例1において、成膜に先立ち、試験片に次の条
件で酸素ガスプラズマによる第1の前処理を施し、さら
にフッ素化合物ガスプラズマによる第2の前処理を施し
た。成膜条件は前記実験例1と同様とした。First Pretreatment Condition Pretreatment Gas Oxygen (O 2 ) 100 sccm High Frequency Power Frequency 13.56 MHz, 300 W Treatment Vacuum Degree 0.1 Torr Treatment Time 5 min Second Pretreatment Condition Pretreatment Gas Hydrogen (H 2 ) 100 sccm High-frequency power Frequency 13.56 MHz, 300 W Processing vacuum degree 0.1 Torr Processing time 5 min Experimental Example 5 In Experimental Example 1, the test piece was subjected to a first pretreatment with oxygen gas plasma under the following conditions prior to film formation, Further, a second pretreatment with a fluorine compound gas plasma was performed. The film forming conditions were the same as in Experimental Example 1 above.
【0025】 第1前処理条件 前処理用ガス 酸素(O2 ) 100sccm 高周波電力 周波数13.56MHz、300W 処理真空度 0.1Torr 処理時間 5min 第2前処理条件 前処理用ガス 6フッ化硫黄(SF6 ) 100sccm 高周波電力 周波数13.56MHz、300W 処理真空度 0.1Torr 処理時間 5min 次に、前記実験例1、2、3、4、5により得られたD
LC膜被覆試験片、DLC膜を形成していない未処理の
同様の試験片(比較例1)及び同様の試験片の表面に市
販のワックスを塗布し、凝固後、該塗布面を研磨したも
の(比較例2)について、滑走面相当表面の、アルミニ
ウム材との摩擦係数及びダイアモンド材との摩耗特性を
それぞれ評価した。また、実験例1、2、3、4、5に
より得られた各DLC膜被覆試験片についてDLC膜と
試験片との密着性を評価した。また、比較例2により得
られたワックス膜被覆試験片のワックス膜の密着性も評
価した。First pretreatment condition Pretreatment gas Oxygen (O 2 ) 100 sccm High frequency power frequency 13.56 MHz, 300 W Treatment vacuum degree 0.1 Torr Treatment time 5 min Second pretreatment condition Pretreatment gas Sulfur hexafluoride (SF 6 ) 100 sccm high frequency power, frequency 13.56 MHz, 300 W processing vacuum degree 0.1 Torr processing time 5 min Next, D obtained by the above Experimental Examples 1, 2, 3, 4, and 5
LC film-covered test piece, untreated similar test piece not having a DLC film formed thereon (Comparative Example 1), and the same test piece were coated with a commercially available wax, solidified, and then the coated surface was polished. Regarding (Comparative Example 2), the coefficient of friction with the aluminum material and the wear characteristics with the diamond material on the surface corresponding to the sliding surface were evaluated. In addition, the adhesion between the DLC film and the test piece was evaluated for each of the DLC film-coated test pieces obtained in Experimental Examples 1, 2, 3, 4, and 5. The wax film adhesion of the wax film-coated test piece obtained in Comparative Example 2 was also evaluated.
【0026】摩擦係数は、試験片表面上でアルミニウム
からなるピン状物品を10gの荷重をかけた状態で20
mm/secの速度で移動させたときの値を測定し、摩
耗特性は、試験片表面上でダイアモンドからなるピン状
物品を200gの荷重をかけた状態で20mm/sec
の速度で移動させ、単位時間あたりに摩耗した厚さを測
定することで評価した。膜密着性は、円柱状部材を接着
剤を用いて膜表面に接合させ、該円柱状部材を膜に対し
て垂直方向に引っ張って該膜を試験片本体から剥離さ
せ、剥離に要した力を測定する引っ張り法により評価し
た。The friction coefficient was 20 when a load of 10 g was applied to a pin-shaped article made of aluminum on the surface of the test piece.
The value when the sample was moved at a speed of mm / sec was measured, and the abrasion property was 20 mm / sec when a pin-shaped article made of diamond was applied on the surface of the test piece under a load of 200 g.
Evaluation was performed by moving the sample at a speed of 1 and measuring the worn thickness per unit time. The film adhesion is obtained by bonding the columnar member to the film surface using an adhesive, pulling the columnar member in a direction perpendicular to the film, and separating the film from the test piece main body. It was evaluated by the tensile method for measurement.
【0027】結果を次表に示す。 摩擦係数 摩耗特性(μm/h) 膜密着強度(kg/mm2) 実験例1 1.5 1.2 2 実験例2 1 1.1 3 実験例3 1 1.1 3 実験例4 1 0.8 4 実験例5 1 0.8 4 比較例1 8 9.5 ─ 比較例2 2 5.3 1 このように、DLC膜を被覆した実験例1から5の試験
片では、アルミニウム材との間の摩擦係数はDLC膜を
形成していない比較例1の試験片より小さく、そり基体
滑走面にDLC膜を被覆することにより潤滑性が向上す
ることが分かる。また、ダイアモンド材との間の摩耗特
性値は、前記比較例1及びワックスを塗布した比較例2
の試験片より著しく小さかった。The results are shown in the following table. Friction coefficient Abrasion characteristics (μm / h) Film adhesion strength (kg / mm 2 ) Experimental example 1 1.5 1.2 2 Experimental example 2 1 1.1 3 Experimental example 3 1 1.1 3 Experimental example 4 1 0.8 4 Experimental Example 5 1 0.8 4 Comparative Example 1 8 9.5 − Comparative Example 2 2 5.3 1 As described above, in the test pieces of Experimental Examples 1 to 5 coated with the DLC film, friction with the aluminum material was observed. The coefficient is smaller than that of the test piece of Comparative Example 1 in which the DLC film is not formed, and it can be seen that the lubricity is improved by coating the sled base body sliding surface with the DLC film. In addition, the wear characteristic value between the diamond material and the diamond material is the same as that of Comparative Example 1 and Comparative Example 2 in which wax is applied.
It was significantly smaller than the test piece.
【0028】また、前記実験例1から5の各DLC膜の
試験片への密着強度は、DLC膜形成に先立ち試験片表
面に対しプラズマによる前処理を施した実施例2から5
の試験片の方が、前処理を施さない実験例1の試験片よ
りも大きかった。以上のことから、そり基体滑走面に炭
素膜(特にDLC膜)を形成したそりは、摺動性及び耐
摩耗性が優れることが分かる。なお、炭素膜と雪や草と
の摺動性は、アルミニウムとの摺動性より良好であるた
め、本発明のそりは雪や草との摺動性が優れるものと考
えられる。また、前処理を施して形成した炭素膜は密着
性が優れることが分かる。The adhesion strength of each DLC film to the test piece of Experimental Examples 1 to 5 was the same as in Examples 2 to 5 in which the surface of the test piece was pretreated with plasma prior to the formation of the DLC film.
The test piece of No. 1 was larger than the test piece of Experimental Example 1 not subjected to the pretreatment. From the above, it can be seen that the sled having the carbon film (in particular, the DLC film) formed on the sliding surface of the sled substrate has excellent slidability and wear resistance. Since the slidability between the carbon film and snow or grass is better than the slidability with aluminum, the sled of the present invention is considered to have excellent slidability against snow or grass. Further, it can be seen that the carbon film formed by performing the pretreatment has excellent adhesion.
【0029】[0029]
【発明の効果】以上のように本発明によると、滑走面の
潤滑性が優れるとともに、その潤滑性を維持するための
定期的なメンテナンスを要しない、或いは殆ど要しない
そり及びその製造方法を提供できる。As described above, according to the present invention, there is provided a sled having excellent lubricity of the sliding surface and requiring no or almost no periodic maintenance for maintaining the lubricity, and a method of manufacturing the sled. it can.
【図1】本発明に係るそりの製造に用いることができる
成膜装置の概略構成を示す図である。FIG. 1 is a diagram showing a schematic configuration of a film forming apparatus that can be used for manufacturing a sled according to the present invention.
【図2】本発明に係るそりの1例の側面図である。FIG. 2 is a side view of an example of a sled according to the present invention.
1 真空チャンバ 11 排気装置 2 高周波電極 21 ヒータ 22 マッチングボックス 23 高周波電源 3 接地電極 4 プラズマ原料ガス供給部 S 被成膜そり基体 S1 基体Sの被成膜滑走面 F 炭素膜 DESCRIPTION OF SYMBOLS 1 Vacuum chamber 11 Exhaust device 2 High frequency electrode 21 Heater 22 Matching box 23 High frequency power supply 3 Grounding electrode 4 Plasma raw material gas supply section S Film-forming sled substrate S1 Film-forming sliding surface of substrate S F Carbon film
Claims (10)
ある炭素膜が形成されていることを特徴とするそり。1. A sled characterized in that a carbon film having wear resistance and lubricity is formed on a sliding surface of a sled base.
(F)含有ガス、水素(H2 )ガス及び酸素(O2 )ガ
スから選ばれた少なくとも1種のガスのプラズマに曝さ
れたものである請求項1記載のそり。2. A film-forming surface of the sled base is exposed to plasma of at least one gas selected from a fluorine (F) -containing gas, hydrogen (H 2 ) gas and oxygen (O 2 ) gas. The sled according to claim 1, wherein
形成されたものである請求項1又は2記載のそり。3. The sled according to claim 1, wherein the carbon film is formed by a plasma CVD method.
2又は3記載のそり。4. The method according to claim 1, wherein the carbon film is a DLC film.
The sled according to 2 or 3.
樹脂から選ばれた少なくとも1種の材料からなるもので
ある請求項1、2、3又は4記載のそり。5. The sled according to claim 1, 2, 3 or 4, wherein the film-forming sliding surface of the sled base is made of at least one material selected from wood and resin.
ある炭素膜を形成する工程を含むことを特徴とするそり
の製造方法。6. A method of manufacturing a sled, comprising the step of forming a carbon film having wear resistance and lubricity on the sliding surface of the sled base.
て、前記そり基体の滑走面をフッ素(F)含有ガス、水
素(H2 )ガス及び酸素(O2 )ガスから選ばれた少な
くとも1種のガスのプラズマに曝す請求項6記載のそり
の製造方法。7. Prior to the carbon film formation, as a pretreatment, at least one selected from a fluorine (F) -containing gas, hydrogen (H 2 ) gas and oxygen (O 2 ) gas on the sliding surface of the sled base. The method for manufacturing a sled according to claim 6, wherein the sled is exposed to plasma of the gas.
成する請求項6又は7記載のそりの製造方法。8. The method for manufacturing a sled according to claim 6, wherein the carbon film is formed by a plasma CVD method.
7又は8記載のそりの製造方法。9. The carbon film is a DLC film, 6.
7. The method for manufacturing a sled according to 7 or 8.
び樹脂から選ばれた少なくとも1種の材料からなるもの
である請求項6、7、8又は9記載のそりの製造方法。10. The method for producing a sled according to claim 6, 7, 8 or 9, wherein the film-forming sliding surface of the sled base is made of at least one material selected from wood and resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13627096A JP3760507B2 (en) | 1996-05-30 | 1996-05-30 | Sled and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13627096A JP3760507B2 (en) | 1996-05-30 | 1996-05-30 | Sled and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09313662A true JPH09313662A (en) | 1997-12-09 |
| JP3760507B2 JP3760507B2 (en) | 2006-03-29 |
Family
ID=15171274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13627096A Expired - Fee Related JP3760507B2 (en) | 1996-05-30 | 1996-05-30 | Sled and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3760507B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT412068B (en) * | 1999-03-05 | 2004-09-27 | Creavac Creative Vakuumbeschic | OUTSOLE FOR WINTER SPORTS EQUIPMENT |
| WO2015100463A3 (en) * | 2014-01-02 | 2015-09-24 | Huber Ski-Con Kg | Anti-static sports equipment, sports system having an anti-static function and sports clothing system for a sports system |
-
1996
- 1996-05-30 JP JP13627096A patent/JP3760507B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT412068B (en) * | 1999-03-05 | 2004-09-27 | Creavac Creative Vakuumbeschic | OUTSOLE FOR WINTER SPORTS EQUIPMENT |
| WO2015100463A3 (en) * | 2014-01-02 | 2015-09-24 | Huber Ski-Con Kg | Anti-static sports equipment, sports system having an anti-static function and sports clothing system for a sports system |
| US10143262B2 (en) | 2014-01-02 | 2018-12-04 | Markus HARML | Anti-static sports equipment, sports system having an anti-static function and sports clothing system for a sports system |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3760507B2 (en) | 2006-03-29 |
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