JPH09323014A - Treatment of gas containing ammonia and amines and treating material - Google Patents
Treatment of gas containing ammonia and amines and treating materialInfo
- Publication number
- JPH09323014A JPH09323014A JP8142405A JP14240596A JPH09323014A JP H09323014 A JPH09323014 A JP H09323014A JP 8142405 A JP8142405 A JP 8142405A JP 14240596 A JP14240596 A JP 14240596A JP H09323014 A JPH09323014 A JP H09323014A
- Authority
- JP
- Japan
- Prior art keywords
- amines
- ammonia
- dimensional
- organometallic complex
- gas containing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 title claims abstract description 114
- 150000001412 amines Chemical class 0.000 title claims abstract description 64
- 229910021529 ammonia Inorganic materials 0.000 title claims abstract description 57
- 239000000463 material Substances 0.000 title claims description 15
- 125000002524 organometallic group Chemical group 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 24
- 239000000126 substance Substances 0.000 claims description 10
- 239000011148 porous material Substances 0.000 claims description 7
- 239000011800 void material Substances 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 2
- 239000007789 gas Substances 0.000 abstract description 41
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 abstract description 10
- 229910001431 copper ion Inorganic materials 0.000 abstract description 9
- 238000006386 neutralization reaction Methods 0.000 abstract description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract description 3
- 150000004696 coordination complex Chemical class 0.000 abstract description 3
- 239000003463 adsorbent Substances 0.000 description 22
- 238000001179 sorption measurement Methods 0.000 description 16
- 238000011084 recovery Methods 0.000 description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 10
- 239000013110 organic ligand Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 229910021645 metal ion Inorganic materials 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 8
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 6
- MWVTWFVJZLCBMC-UHFFFAOYSA-N 4,4'-bipyridine Chemical group C1=NC=CC(C=2C=CN=CC=2)=C1 MWVTWFVJZLCBMC-UHFFFAOYSA-N 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 235000019645 odor Nutrition 0.000 description 5
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- -1 molybdenum ion Chemical class 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 4
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- XIMVOMJGCFSTOH-KYOXOEKESA-L [Cu++].[O-]C(=O)[C@H]1CC[C@@H](CC1)C([O-])=O Chemical compound [Cu++].[O-]C(=O)[C@H]1CC[C@@H](CC1)C([O-])=O XIMVOMJGCFSTOH-KYOXOEKESA-L 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- PKKHVZXOCVEVNP-UHFFFAOYSA-L copper;3-phenylphthalate Chemical compound [Cu+2].[O-]C(=O)C1=CC=CC(C=2C=CC=CC=2)=C1C([O-])=O PKKHVZXOCVEVNP-UHFFFAOYSA-L 0.000 description 3
- 235000019253 formic acid Nutrition 0.000 description 3
- 239000004745 nonwoven fabric Substances 0.000 description 3
- ZUCRGHABDDWQPY-UHFFFAOYSA-N pyrazine-2,3-dicarboxylic acid Chemical compound OC(=O)C1=NC=CN=C1C(O)=O ZUCRGHABDDWQPY-UHFFFAOYSA-N 0.000 description 3
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- HFDWIMBEIXDNQS-UHFFFAOYSA-L copper;diformate Chemical compound [Cu+2].[O-]C=O.[O-]C=O HFDWIMBEIXDNQS-UHFFFAOYSA-L 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- KOQMBAGMXLUQDS-UHFFFAOYSA-N 2-benzhydrylidenepropanedinitrile Chemical group C=1C=CC=CC=1C(=C(C#N)C#N)C1=CC=CC=C1 KOQMBAGMXLUQDS-UHFFFAOYSA-N 0.000 description 1
- HSSYVKMJJLDTKZ-UHFFFAOYSA-N 3-phenylphthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C=CC=CC=2)=C1C(O)=O HSSYVKMJJLDTKZ-UHFFFAOYSA-N 0.000 description 1
- NEQFBGHQPUXOFH-UHFFFAOYSA-N 4-(4-carboxyphenyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C=C1 NEQFBGHQPUXOFH-UHFFFAOYSA-N 0.000 description 1
- KAXYYLCSSXFXKR-UHFFFAOYSA-N 4-(4-cyanophenyl)benzonitrile Chemical group C1=CC(C#N)=CC=C1C1=CC=C(C#N)C=C1 KAXYYLCSSXFXKR-UHFFFAOYSA-N 0.000 description 1
- MAWKLXRVKVOYLR-UHFFFAOYSA-N 4-(4-pyridin-4-ylphenyl)pyridine Chemical compound C1=NC=CC(C=2C=CC(=CC=2)C=2C=CN=CC=2)=C1 MAWKLXRVKVOYLR-UHFFFAOYSA-N 0.000 description 1
- 229910020366 ClO 4 Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 229920005830 Polyurethane Foam Polymers 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- BHXFKXOIODIUJO-UHFFFAOYSA-N benzene-1,4-dicarbonitrile Chemical compound N#CC1=CC=C(C#N)C=C1 BHXFKXOIODIUJO-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229910001430 chromium ion Inorganic materials 0.000 description 1
- 230000009918 complex formation Effects 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- ZISLUDLMVNEAHK-UHFFFAOYSA-L copper;terephthalate Chemical compound [Cu+2].[O-]C(=O)C1=CC=C(C([O-])=O)C=C1 ZISLUDLMVNEAHK-UHFFFAOYSA-L 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical compound [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 239000011496 polyurethane foam Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- 230000001953 sensory effect Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Separation Of Gases By Adsorption (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、気体中に存在する
アンモニア、アミン類の除去方法に関し、特に空気中に
混入した悪臭の原因となるアンモニアやアミン類を除去
する方法並びにアンモニアやアミン類の除去に使用され
る処理材に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for removing ammonia and amines present in a gas, and more particularly to a method for removing ammonia and amines that cause an offensive odor mixed in the air, as well as ammonia and amines. The present invention relates to a treatment material used for removal.
【0002】[0002]
【従来の技術】悪臭の原因物質であるアンモニアやアミ
ン類を含む気体、特に空気中より前記アンモニアやアミ
ン類を除去する方法としては、活性炭による吸着を利用
した除去方法、酸性物質による中和反応を利用した除去
方法が知られている。2. Description of the Related Art Methods for removing ammonia and amines, which are substances that cause offensive odors, especially from the air, include the removal method using adsorption by activated carbon and the neutralization reaction by acidic substances. A removal method using is known.
【0003】[0003]
【発明が解決しようとする課題】しかし、活性炭による
吸着を利用した除去方法によれば、完全にアンモニアや
アミン類を除去し、悪臭を排除することは困難である。
また、酸性物質による中和反応を利用した除去方法で
は、フィルターとすべき材料に酸性物質を付着させなけ
ればならず、除去効率の高い強酸を付着させるには、そ
の強い酸性に耐える材料の選択や処理時の安全性に配慮
しなければならない。一般的に使用されるカルボン酸類
では中和反応が平衡反応であるために、平衡状態に達し
たあとはアンモニアやアミン類が解離し、酸がアンモニ
アやアミン類を等量比で100%の除去をすることがで
きない。本発明は、気体中のアンモニア、アミン類を吸
着、錯体形成、カルボン酸との中和作用により除去する
方法を提供すること、並びに前記除去法に使用される処
理材を提供することにある。However, according to the removal method utilizing adsorption by activated carbon, it is difficult to completely remove ammonia and amines and eliminate bad odors.
In addition, in the removal method using the neutralization reaction with an acidic substance, the acidic substance must be attached to the material to be used as a filter, and in order to attach a strong acid with high removal efficiency, select a material that can withstand the strong acidity. It is necessary to give consideration to safety during processing. Since neutralization reaction is an equilibrium reaction in commonly used carboxylic acids, ammonia and amines dissociate after the equilibrium state is reached, and the acid removes ammonia and amines at an equal ratio of 100%. Can't do. The present invention is to provide a method of removing ammonia and amines in a gas by adsorption, complex formation and neutralization with a carboxylic acid, and to provide a treating material used in the removal method.
【0004】[0004]
【課題を解決するための手段】本発明は、アミンを含有
する気体を、1次元若しくは3次元チャンネル構造を有
する有機金属錯体と接触させ、前記アミンを前記有機金
属錯体に吸着、除去することを特徴とする気体中のアミ
ン除去方法に関するものである。本発明に使用する有機
金属錯体は1次元若しくは3次元チャンネル構造を有す
るため、このチャンネル構造に基づく空隙にアンモニ
ア、アミン類の分子を収容することにより吸着し、また
カルボン酸との中和反応に加えて、銅イオンにアンモニ
ア、アミン類の窒素原子が配位して結合することにより
アンモニア、アミン類が除去される。このためにこれら
の化合物の除去容量が大きく、かつ除去速度も速い。According to the present invention, a gas containing an amine is brought into contact with an organometallic complex having a one-dimensional or three-dimensional channel structure to adsorb and remove the amine on the organometallic complex. The present invention relates to a characteristic method for removing amine in a gas. Since the organometallic complex used in the present invention has a one-dimensional or three-dimensional channel structure, it is adsorbed by accommodating molecules of ammonia and amines in the voids based on this channel structure, and also for neutralization reaction with carboxylic acid. In addition, ammonia and amines are removed by coordinating and bonding the nitrogen atoms of ammonia and amines to copper ions. Therefore, the removal capacity of these compounds is large and the removal rate is fast.
【0005】また、本発明は、アンモニア、アミン類を
含有する気体を処理方法であって、前記アンモニア、ア
ミンを含有する気体を1次元若しくは3次元チャンネル
構造を有する有機金属錯体と接触させ、前記アンモニ
ア、アミンを前記有機金属錯体に吸着、除去してアンモ
ニア、アミンを含まない気体を得る第1工程、及び前記
第1工程にて前記有機金属錯体に吸着されたアミンを前
記有機金属錯体より脱離させ、アミンを含む脱離気体を
捕集する第2工程の2工程を含むアミン含有気体の処理
方法にも関するものである。本発明の有機金属錯体に吸
着されたアミン類は、所定の条件にすれば脱着する。従
って、気体中に含まれるアミン類を除去する第1工程
と、これを脱着する第2工程を設けると、吸着剤である
有機金属錯体を再生し、繰り返し使用できるとともに、
アミンを濃縮し、多く含んだ気体を補集することによ
り、有効利用したり、逆に焼却処理することも可能とな
る。なお、アンモニアは有機金属錯体と錯体を形成する
作用が強く、脱着することが難しい。The present invention also provides a method for treating a gas containing ammonia and amines, wherein the gas containing ammonia and amine is brought into contact with an organometallic complex having a one-dimensional or three-dimensional channel structure, A first step of adsorbing and removing ammonia and amine to the organometallic complex to obtain a gas containing no ammonia and amine, and desorbing the amine adsorbed by the organometallic complex in the first step from the organometallic complex. The present invention also relates to a method for treating an amine-containing gas, which includes two steps of the second step of separating and collecting a desorbed gas containing an amine. The amines adsorbed on the organometallic complex of the present invention are desorbed under predetermined conditions. Therefore, by providing the first step of removing amines contained in the gas and the second step of desorbing the amines, the organometallic complex as the adsorbent can be regenerated and repeatedly used,
By concentrating the amine and collecting a gas containing a large amount, it is possible to effectively use the gas or conversely incinerate it. Ammonia has a strong action of forming a complex with an organometallic complex and is difficult to desorb.
【0006】前記の1次元若しくは3次元チャンネル構
造を有する有機金属錯体は3〜20Åの細孔径を有する
ものであることが好ましい。3Å以下の場合は細孔径が
小さすぎてアンモニアやアミン類の分子が吸着されにく
く、20Å以上になると細孔径が大きすぎてアンモニア
やアミン類の吸着速度が低下し、好ましくない。The above-mentioned organometallic complex having a one-dimensional or three-dimensional channel structure preferably has a pore diameter of 3 to 20 Å. When it is 3 Å or less, the pore diameter is too small to adsorb molecules of ammonia and amines, and when it is 20 Å or more, the pore diameter is too large and the adsorption rate of ammonia and amines decreases, which is not preferable.
【0007】本発明においては、気体が透過可能な空隙
を有する基材に前記1次元若しくは3次元チャンネル構
造を有する有機金属錯体を付着させた化学物質吸着材
に、アンモニア、アミンを含む気体を通過させることに
より、前記気体中のアンモニア、アミンを除去する方法
とすることも好ましい態様である。1次元若しくは3次
元チャンネル構造を有する有機金属錯体は、通常の反応
条件では、粉末状にて生成するものであり、このまま使
用することも可能であるが、吸着装置の設計、吸着装置
中の有機金属錯体の交換に難しい点がある。本発明のよ
うに、有機金属錯体を気体が透過可能な空隙を有する基
材に付着させた化学物質吸着材の形態とすることによ
り、装置の設計、装置中の有機金属錯体の交換を極めて
容易にすることができる。In the present invention, a gas containing ammonia and an amine is passed through a chemical substance adsorbing material in which the organometallic complex having a one-dimensional or three-dimensional channel structure is attached to a substrate having a gas permeable void. It is also a preferable embodiment to use a method of removing ammonia and amine in the gas by performing the above. The organometallic complex having a one-dimensional or three-dimensional channel structure is produced in powder form under normal reaction conditions, and although it can be used as it is, the adsorption device is designed and the organic metal in the adsorption device is used. There are difficulties in exchanging metal complexes. As in the present invention, by adopting a form of a chemical substance adsorbent in which an organometallic complex is attached to a substrate having a gas permeable void, it is extremely easy to design the device and replace the organometallic complex in the device. Can be
【0008】前述の有機金属錯体を気体が透過可能な空
隙を有する基材に付着させた化学物質吸着材は、有機金
属錯体を生成する反応溶液に、例えば、不織布やポリウ
レタンフォームのような気体が透過可能な空隙を有する
基材を浸漬し、結晶形成の核として使用することによ
り、基材上に付着させて得ることができる。In the chemical substance adsorbing material in which the above-mentioned organometallic complex is adhered to a substrate having a gas permeable void, a gas such as a nonwoven fabric or polyurethane foam is added to a reaction solution for producing the organometallic complex. The base material having permeable voids may be dipped and used as a nucleus for crystal formation to be adhered and obtained on the base material.
【0009】本発明は、上記のアンモニア、アミンを除
去する方法に使用される1次元若しくは3次元チャンネ
ル構造を有する有機金属錯体を含む処理材にも関し、気
体が透過可能な空隙を有する基材に付着させた化学物質
吸着材の形態、不織布内に収容した形態、適当なバイン
ダーを使用して適当な形に成形した形態等にて、本発明
の実施に供することができる。The present invention also relates to a treatment material containing an organometallic complex having a one-dimensional or three-dimensional channel structure, which is used in the method for removing the above-mentioned ammonia and amine, and has a substrate having a gas-permeable void. The present invention can be carried out in the form of the chemical substance adsorbing material adhered to, the form accommodated in a non-woven fabric, the form molded with a suitable binder into a suitable form, and the like.
【0010】[0010]
【発明の実施の形態】本発明は、アンモニア、アミンを
含有する気体を、1次元若しくは3次元チャンネル構造
を有する有機金属錯体と接触させ、前記アンモニア、ア
ミンを前記有機金属錯体に吸着、除去することを特徴と
する気体中のアンモニア、アミン除去方法に関するもの
である。以下に、本発明に使用する有機金属錯体並びに
除去方法の実施に当たって使用する装置の例を説明す
る。BEST MODE FOR CARRYING OUT THE INVENTION In the present invention, a gas containing ammonia and amine is brought into contact with an organometallic complex having a one-dimensional or three-dimensional channel structure to adsorb and remove the ammonia and amine to the organometallic complex. The present invention relates to a method for removing ammonia and amines in a gas, which is characterized in that Hereinafter, examples of the organometallic complex used in the present invention and an apparatus used for carrying out the removal method will be described.
【0011】本発明に使用する前記1次元若しくは3次
元チャンネル構造を有する有機金属錯体は、下記の
(A)〜(C)のいずれかに記載の有機配位子と2価の
金属イオン、特に銅塩を反応させて得られるものである
ことが好ましい。 (a)分子内の点対称位置に配置された2個のカルボキ
シル基を有するジカルボン酸。 (b)剛直な骨格の両末端に金属イオンに配位可能な原
子を有する2座配位可能な有機配位子。 (c)剛直な骨格の両末端に金属イオンに配位可能な原
子を有する2座配位可能な有機配位子及び2,3−ピラ
ジンジカルボン酸。 これらの有機配位子は、2価の銅イオンと直線状の基本
骨格を形成するため、生成する錯体が1次元若しくは3
次元チャンネル構造を有するものとなる。The organometallic complex having a one-dimensional or three-dimensional channel structure used in the present invention is an organic ligand described in any of the following (A) to (C) and a divalent metal ion, particularly It is preferably obtained by reacting a copper salt. (A) A dicarboxylic acid having two carboxyl groups arranged at point symmetrical positions in the molecule. (B) A bidentate-coordinating organic ligand having atoms capable of coordinating with a metal ion at both ends of a rigid skeleton. (C) A bidentate-coordinating organic ligand having atoms capable of coordinating with a metal ion at both ends of a rigid skeleton, and 2,3-pyrazinedicarboxylic acid. Since these organic ligands form a linear basic skeleton with divalent copper ions, the resulting complex has a one-dimensional or three-dimensional structure.
It has a dimensional channel structure.
【0012】(a)〜(c)の有機金属錯体の構造を例
を挙げて具体的に説明する。例えば(a)の錯体として
テレフタル酸銅を例にとって説明すると、銅は平面4配
位であり、2個の銅イオンをテレフタル酸4分子が90
°ごとに囲むようにして配置し、カルボキシル基の2個
の酸素原子はそれぞれ別の銅イオンに配位している。即
ち、テレフタル酸分子は格子状に配列し、その格子点に
2個の銅イオンが存在する。そして、銅イオンとジカル
ボン酸より形成される層が積層された形で結晶が構成さ
れている。その結果、格子が積層されて1次元チャンネ
ルが形成される。The structures of the organometallic complexes (a) to (c) will be specifically described with reference to examples. For example, when copper terephthalate is used as an example of the complex of (a), copper has a plane four-coordination, and two copper ions form 90 molecules of terephthalic acid.
The two oxygen atoms of the carboxyl group are coordinated to different copper ions, respectively. That is, terephthalic acid molecules are arranged in a lattice, and two copper ions exist at the lattice points. And the crystal | crystallization is comprised in the form in which the layer formed from a copper ion and a dicarboxylic acid was laminated | stacked. As a result, the lattices are stacked to form a one-dimensional channel.
【0013】(b)の錯体として、 〔Ni(bpy)1.5 (ClO4 )2 〕 (bpy=4,4’−ビピリジル)なる組成の錯体につ
いて説明すると、1個のNiイオンの周囲、平面上に9
0°ごとに4,4’−ビピリジルが4分子N原子により
配位し、4,4’−ビピリジルは他のN原子によりそれ
ぞれ別のNiイオンに配位し、平面状の格子を形成し、
この格子が、Niイオンが直線状に並ぶように積層して
結晶が構成されており、格子が積層により連続して、前
記(a)の例同様に1次元チャンネルを形成する。な
お、この錯体において過塩素酸イオンを硝酸イオンに変
更すると、3次元チャンネル構造の結晶となることが分
析の結果明らかになっている。As the complex of (b), a complex having a composition of [Ni (bpy) 1.5 (ClO 4 ) 2 ] (bpy = 4,4′-bipyridyl) will be described. To 9
At every 0 °, 4,4'-bipyridyl is coordinated by four molecular N atoms, and 4,4'-bipyridyl is coordinated by different N atoms to different Ni ions, respectively, to form a planar lattice,
Crystals are formed by stacking the lattices so that Ni ions are linearly arranged, and the lattices are continuously formed by the stacking to form a one-dimensional channel as in the example of (a). It has been clarified as a result of the analysis that the perchlorate ion in this complex is changed to the nitrate ion to form a crystal having a three-dimensional channel structure.
【0014】また、(c)の錯体として、 〔Cu(bpy)(pyzdc)2 〕 (bpy=4,4’−ビピリジル、pyzdc=2,3
−ピラジンジカルボン酸)なる組成を有する錯体を例と
して説明すると、2,3−ピラジンジカルボン酸が銅イ
オンに配位して平面状の構造を形成し、この平面を銅イ
オンに配位した4,4’−ビピリジルが結合する形で積
層し結晶が構成され、この層間にチャンネル構造が形成
される。As the complex of (c), [Cu (bpy) (pyzzdc) 2 ] (bpy = 4,4′-bipyridyl, pyzdc = 2,3)
-Pyrazinedicarboxylic acid) will be described as an example. 2,3-pyrazinedicarboxylic acid is coordinated with copper ions to form a planar structure, and this plane is coordinated with copper ions. Crystals are formed by laminating 4'-bipyridyl bound to each other, and a channel structure is formed between the layers.
【0015】(a)の錯体を構成する有機配位子であ
る、分子内の点対称位置に配置された2個のカルボキシ
ル基を有するジカルボン酸としては、テレフタル酸、フ
マル酸、1,4−トランス−シクロヘキサンジカルボン
酸、4,4’−ビフェニルジカルボン酸が例示される。
また、金属イオンとしては、銅イオン、クロムイオン、
モリブデンイオン、ロジウムイオン、パラジウムイオ
ン、タングステンイオン、が例示でき、前記ジカルボン
酸と組み合わせて錯体が形成される。Examples of the dicarboxylic acid having two carboxyl groups arranged at point symmetry positions in the molecule, which are organic ligands constituting the complex (a), include terephthalic acid, fumaric acid, and 1,4- Examples are trans-cyclohexanedicarboxylic acid and 4,4′-biphenyldicarboxylic acid.
In addition, as metal ions, copper ions, chromium ions,
Examples thereof include molybdenum ion, rhodium ion, palladium ion and tungsten ion, and a complex is formed in combination with the dicarboxylic acid.
【0016】(b)の錯体を構成する有機配位子として
は、ピラジン、4,4’−ビピリジル、トランス−1,
2−ビス(4−ピリジル)エチレン、1,4−ジシアノ
ベンゼン、4,4’−ジシアノビフェニル、1,2−ジ
シアノエチレン、1,4−ビス(4−ピリジル)ベンゼ
ンより選択されるものが好ましく、金属イオンとしては
2価の金属イオンが使用され、具体的にはCo、Ni、
Cu、Znより選択される金属のイオンの使用が好まし
い。As the organic ligand constituting the complex of (b), pyrazine, 4,4'-bipyridyl, trans-1,
Those selected from 2-bis (4-pyridyl) ethylene, 1,4-dicyanobenzene, 4,4′-dicyanobiphenyl, 1,2-dicyanoethylene, and 1,4-bis (4-pyridyl) benzene are preferred. , Divalent metal ions are used as the metal ions, specifically, Co, Ni,
It is preferable to use ions of a metal selected from Cu and Zn.
【0017】(c)の錯体を構成する有機配位子は、
(b)に使用される有機配位子の1種とピラジンジカル
ボン酸が併用され、金属イオンとしては(b)と同じも
のが使用される。The organic ligand constituting the complex (c) is
One of the organic ligands used in (b) and pyrazinedicarboxylic acid are used in combination, and the same metal ion as in (b) is used.
【0018】これらの有機金属錯体の製造は、有機配位
子の溶液と原料の金属塩の溶液を準備してこれらを混合
し、反応させることにより行う。使用される溶剤は有機
配位子、金属イオンと反応したり錯体を形成するもので
なければ特に制限されない。また、金属イオンの対イオ
ンもその金属塩の溶剤への溶解性、生成する錯体の1次
元チャンネル構造の形成を阻害するものでなければ特に
限定されない。(a)の錯体の製造においては、ジカル
ボン酸の溶液に有機酸を添加してpHを調整することが
好ましく、ギ酸、酢酸、トリフルオロ酢酸、プロピオン
酸等が使用できる。The production of these organometallic complexes is carried out by preparing a solution of an organic ligand and a solution of a metal salt as a raw material, mixing these and reacting them. The solvent used is not particularly limited as long as it does not react with an organic ligand or a metal ion or form a complex. The counter ion of the metal ion is not particularly limited as long as it does not inhibit the solubility of the metal salt in the solvent and the formation of the one-dimensional channel structure of the resulting complex. In the production of the complex (a), it is preferable to add an organic acid to the solution of dicarboxylic acid to adjust the pH, and formic acid, acetic acid, trifluoroacetic acid, propionic acid or the like can be used.
【0019】本発明のアンモニア、アミン類含有気体の
処理方法の実施に使用する気体処理装置の例を図1に基
づいて説明する。気体処理装置1は、吸着剤2を収納す
る吸着剤収納室3を備えると共に、この吸着剤収納室3
に処理対象である気体を供給し、又は供給停止を自在に
行いうる処理気体供給路4と吸着剤収納室3から排出さ
れる気体を選択的に導く第1回収路5と第2回収路6を
備えている。An example of a gas treating apparatus used for carrying out the method for treating a gas containing ammonia and amines according to the present invention will be described with reference to FIG. The gas treatment device 1 includes an adsorbent storage chamber 3 for storing the adsorbent 2 and the adsorbent storage chamber 3
The first recovery passage 5 and the second recovery passage 6 that selectively guide the gas discharged from the adsorbent storage chamber 3 and the treated gas supply passage 4 that can supply or stop the supply of the gas to be treated. Is equipped with.
【0020】前述の処理対象気体供給路4は、吸着剤収
納室3に接続されており、その途中に供給状態と供給停
止状態とを自在に切り換えるための供給側切換弁7が設
けられている。また、第1回収路5と第2回収路6も吸
着剤収納室3に接続されておりそれぞれに第1切換弁
8、第2切換弁9が設けられている。図1の例では、第
1、第2の回収路5、6は、吸着剤収納室3に接続され
た1個の接続路より分岐しているが、それぞれが別個に
接続されていても良く、1個の接続路より3方切換弁に
より接続されていても構わない。以上の処理対象気体供
給路4、吸着剤収納室3、第1回収路5並びに第2回収
路6の接続は、例えば以下のように使用される。処理す
べきアンモニア、アミン含有気体は処理対象気体供給路
4を通じ、吸着剤収納室3に導かれる。この場合、供給
側切換弁7は、開の状態であり、第1切換弁8を開、第
2切換弁9を閉とし、第1回収路5を通じ、処理され、
アンモニア、アミンを除去された気体が排出される。吸
着剤収納室3に収納された吸着剤たる有機金属錯体の吸
着能力が限界に達したときは、第1切換弁8を閉、第2
切換弁9を開とし、さらに吸着剤収納室3を有機金属錯
体が吸着したアンモニア、アミン類を脱着する条件、例
えば加熱状態とし、アンモニア、アミン類を脱着させ、
高濃度のアンモニア、アミンを含有する気体を第2回収
路6を通じて排出する。この際、供給側切換弁7は開状
態でも閉状態でもよく、例えば前述のように吸着剤収納
室3を加熱する場合には、供給側切換弁7を開状態とし
て未処理のアンモニア、アミン含有気体をキャリアーと
して使用し、脱着されたアンモニア、アミンを排出して
もよく、また、吸着剤収納室3を真空条件としてアンモ
ニア、アミンを脱着させる場合には供給側切換弁7を閉
状態とし、第2回収路6に接続される真空ポンプを作動
させる。The processing target gas supply passage 4 is connected to the adsorbent storage chamber 3, and a supply side switching valve 7 for freely switching the supply state and the supply stopped state is provided in the middle of the adsorbent storage chamber 3. . Further, the first recovery passage 5 and the second recovery passage 6 are also connected to the adsorbent storage chamber 3, and a first switching valve 8 and a second switching valve 9 are provided respectively. In the example of FIG. 1, the first and second recovery paths 5 and 6 are branched from one connection path connected to the adsorbent storage chamber 3, but they may be connected separately. It may be connected by a three-way switching valve rather than one connection path. The above-mentioned connection of the processing target gas supply path 4, the adsorbent storage chamber 3, the first recovery path 5, and the second recovery path 6 is used as follows, for example. The ammonia- and amine-containing gas to be treated is guided to the adsorbent storage chamber 3 through the treatment target gas supply passage 4. In this case, the supply-side switching valve 7 is in the open state, the first switching valve 8 is opened, the second switching valve 9 is closed, and the processing is performed through the first recovery passage 5.
The gas from which ammonia and amine have been removed is discharged. When the adsorption capacity of the organometallic complex as the adsorbent stored in the adsorbent storage chamber 3 reaches the limit, the first switching valve 8 is closed and the second switching valve 8 is closed.
The switching valve 9 is opened, and the adsorbent storage chamber 3 is further desorbed with ammonia and amines adsorbed by the organometallic complex, for example, in a heated state to desorb ammonia and amines.
A gas containing high concentrations of ammonia and amine is discharged through the second recovery passage 6. At this time, the supply-side switching valve 7 may be in an open state or a closed state. For example, when heating the adsorbent storage chamber 3 as described above, the supply-side switching valve 7 is opened to contain untreated ammonia and amine. A gas may be used as a carrier to discharge desorbed ammonia and amine. Further, when desorbing ammonia and amine under vacuum conditions in the adsorbent storage chamber 3, the supply side switching valve 7 is closed. The vacuum pump connected to the second recovery passage 6 is operated.
【0021】本発明により処理されるアミン類として
は、脂肪族、脂環族、芳香族のモノアミン類、ポリアミ
ン類はいずれも処理可能であるが、特に悪臭物質である
メチルアミン、ジメチルアミン、トリメチルアミン、エ
チルアミン等の低級脂肪族アミンの除去に有効である。As the amines to be treated by the present invention, any of aliphatic, alicyclic and aromatic monoamines and polyamines can be treated, but particularly malodorous substances such as methylamine, dimethylamine and trimethylamine. It is effective in removing lower aliphatic amines such as ethyl amine.
【0022】[0022]
(合成例1)メタノール100cm3 、ギ酸14cm3
の混合溶媒に1,4−トランス−シクロヘキサンジカル
ボン酸2.53gを溶解し、常温に冷却する。得られた
1,4−トランス−シクロヘキサンジカルボン酸溶液
に、攪拌下に、ギ酸銅3.3gをメタノール100cm
3 に溶解した溶液を滴下し、1日静置した。生成した沈
殿物を吸引濾過し、洗浄したのち120℃にて4時間乾
燥した。得られた沈殿物は1.71gであり、分析によ
り1,4−トランス−シクロヘキサンジカルボン酸銅で
あった。この有機金属錯体は比表面積480m2 /g、
細孔径は4.7Åであった。(Synthesis example 1) Methanol 100 cm 3 , formic acid 14 cm 3
2.53 g of 1,4-trans-cyclohexanedicarboxylic acid is dissolved in the mixed solvent of and cooled to room temperature. To the obtained 1,4-trans-cyclohexanedicarboxylic acid solution, 3.3 g of copper formate was added with stirring to 100 cm of methanol.
The solution dissolved in 3 was added dropwise and allowed to stand for 1 day. The formed precipitate was suction filtered, washed and then dried at 120 ° C. for 4 hours. The resulting precipitate weighed 1.71 g and was analyzed to be copper 1,4-trans-cyclohexanedicarboxylate. This organometallic complex has a specific surface area of 480 m 2 / g,
The pore size was 4.7Å.
【0023】(合成例2)ジメチルホルムアミド(DM
F)90cm3 、ギ酸0.5cm3 の混合溶媒にビフェ
ニルジカルボン酸0.25gを溶解した。室温下におい
てこの溶液にギ酸銅0.5gをメタノール25cm3 に
溶解した溶液を攪拌しつつ滴下し、室温にて静置した。
1日後、生成した沈殿物を吸引濾過し、洗浄したのち1
00℃にて4時間乾燥した。得られた沈殿物は0.24
gであり、分析の結果、ビフェニルジカルボン酸銅であ
った。この有機金属錯体は、比表面積が1200m2 /
g、細孔径が7.8Åであった。(Synthesis Example 2) Dimethylformamide (DM
F) 0.25 g of biphenyldicarboxylic acid was dissolved in a mixed solvent of 90 cm 3 and formic acid 0.5 cm 3 . A solution prepared by dissolving 0.5 g of copper formate in 25 cm 3 of methanol was added dropwise to this solution at room temperature with stirring, and the mixture was left standing at room temperature.
After 1 day, the precipitate formed was suction filtered, washed and
It was dried at 00 ° C. for 4 hours. The obtained precipitate is 0.24
It was g, and as a result of the analysis, it was copper biphenyldicarboxylate. This organometallic complex has a specific surface area of 1200 m 2 /
g, and the pore size was 7.8Å.
【0024】〔アンモニア吸着量の測定〕(合成例
1)、(合成例2)で得た有機金属錯体について、アン
モニアの吸着量を以下の方法で測定した。有機金属錯体
は、圧力10-2torr、温度110℃にて1時間前処
理を行い、次いで温度を25℃に保持してアンモニアを
段階的に導入し、各段階での錯体の重量変化を石英スプ
リングを使用した重量法により測定した。比較として繊
維状活性炭を使用して同様に測定した。結果を図2〜図
5にそれぞれ示した。この結果より、有機金属錯体は、
繊維状活性炭より吸着能力が優れているとともに、単位
重量当たりの吸着量に比べて単位体積当たりの吸着量が
大きいことが分かる。これは、吸着装置が、吸着材とし
て活性炭を使用した場合よりコンパクトに設計しうる利
点があることを示している。[Measurement of Ammonia Adsorption Amount] With respect to the organometallic complexes obtained in (Synthesis Example 1) and (Synthesis Example 2), the ammonia adsorption amount was measured by the following method. The organometallic complex was pretreated at a pressure of 10 -2 torr and a temperature of 110 ° C for 1 hour, and then the temperature was kept at 25 ° C to introduce ammonia stepwise, and the weight change of the complex at each step was converted to quartz. It was measured by a gravimetric method using a spring. The same measurement was performed using fibrous activated carbon as a comparison. The results are shown in FIGS. 2 to 5, respectively. From this result, the organometallic complex
It can be seen that the adsorption capacity is superior to the fibrous activated carbon, and the adsorption amount per unit volume is larger than the adsorption amount per unit weight. This shows that the adsorption device has an advantage that it can be designed more compactly than when activated carbon is used as the adsorbent.
【0025】(アミン含有気体の処理)図1における吸
着剤収納室に前記(合成例1)にて得られた有機金属錯
体を不織布に入れて収納し、トリメチルアミン50pp
mを含有する空気を処理対象気体供給路4を通じて吸着
剤収納室3に導入し、供給側切換弁7を開状態、第2切
換弁9を閉状態として処理し、第1回収路5より処理さ
れた気体を排出した。モニター5人による官能検査によ
って処理効果を評価したところ、処理前の空気について
はモニター5人はいずれもトリメチルアミンの強い悪臭
を感じたが、第1回収路より排出される空気について
は、全員が全く臭気を感じなかった。(合成例1)にて
得られたものに代えて(合成例2)により得られた有機
金属錯体を使用して同様の実験を行ったが、効果は同じ
であった。(Treatment of Amine-Containing Gas) The organometallic complex obtained in (Synthesis example 1) was put in a non-woven fabric and stored in the adsorbent storage chamber shown in FIG.
Air containing m is introduced into the adsorbent storage chamber 3 through the gas supply passage 4 to be treated, the supply side switching valve 7 is opened, the second switching valve 9 is closed, and the treatment is performed from the first recovery passage 5. The gas that has been discharged is discharged. When the treatment effect was evaluated by a sensory test by 5 monitors, all 5 monitors felt a strong odor of trimethylamine in the air before the treatment, but all of the air discharged from the first recovery route was completely I didn't feel any odor. A similar experiment was conducted using the organometallic complex obtained in (Synthesis example 2) instead of the one obtained in (Synthesis example 1), but the effect was the same.
【図1】アンモニア、アミン類を含有する気体の処理装
置の構成の模式図FIG. 1 is a schematic diagram of the configuration of a gas treatment device containing ammonia and amines.
【図2】1,4−トランス−シクロヘキサンジカルボン
酸銅によるアンモニアの単位重量当たりの吸着量を示す
グラフFIG. 2 is a graph showing the adsorption amount of ammonia per unit weight by copper 1,4-trans-cyclohexanedicarboxylate.
【図3】1,4−トランス−シクロヘキサンジカルボン
酸銅によるアンモニアの単位体積当たりの吸着量を示す
グラフFIG. 3 is a graph showing the amount of adsorption of ammonia per unit volume by copper 1,4-trans-cyclohexanedicarboxylate.
【図4】ビフェニルジカルボン酸銅によるアンモニアの
単位重量当たりの吸着量を示すグラフFIG. 4 is a graph showing the amount of ammonia adsorbed by copper biphenyldicarboxylate per unit weight.
【図5】ビフェニルジカルボン酸銅によるアンモニアの
単位体積当たりの吸着量を示すグラフFIG. 5 is a graph showing the adsorption amount of ammonia per unit volume by copper biphenyldicarboxylate.
1 気体処理装置 2 吸着剤(有機金属錯体) 3 吸着剤収納室 4 処理対象気体供給路 5 第1回収路 6 第2回収路 7 供給側切換弁 8 第1切換弁 9 第2切換弁 10 真空ポンプ DESCRIPTION OF SYMBOLS 1 Gas treatment device 2 Adsorbent (organic metal complex) 3 Adsorbent storage chamber 4 Treatment target gas supply path 5 First recovery path 6 Second recovery path 7 Supply side switching valve 8 First switching valve 9 Second switching valve 10 Vacuum pump
Claims (6)
を、1次元若しくは3次元チャンネル構造を有する有機
金属錯体と接触させ、前記アンモニア、アミン類を前記
有機金属錯体に吸着して分離することを特徴とするアン
モニア、アミン類含有気体の処理方法。1. A gas containing ammonia and amines is brought into contact with an organometallic complex having a one-dimensional or three-dimensional channel structure, and the ammonia and amines are adsorbed to and separated from the organometallic complex. A method for treating gas containing ammonia and amines.
処理方法であって、 前記アンモニア、アミン類を含有する気体を1次元若し
くは3次元チャンネル構造を有する有機金属錯体と接触
させ、前記アンモニア、アミン類を前記有機金属錯体に
吸着、除去してアンモニア、アミン類を含まない気体を
得る第1工程、及び前記第1工程にて前記有機金属錯体
に吸着されたアミン類を前記有機金属錯体より脱離さ
せ、アミン類を含む脱離気体を捕集する第2工程の2工
程を含むアンモニア、アミン類含有気体の処理方法。2. A method of treating a gas containing ammonia and amines, wherein the gas containing ammonia and amines is brought into contact with an organometallic complex having a one-dimensional or three-dimensional channel structure, Of the compounds adsorbed to and removed from the organometallic complex in the first step of obtaining a gas containing no ammonia or amines, and the amines adsorbed by the organometallic complex in the first step are removed from the organometallic complex. A method for treating a gas containing ammonia and amines, comprising the two steps of the second step of separating and collecting the desorbed gas containing amines.
造を有する有機金属錯体を、気体が透過可能な空隙を有
する基材に付着させた化学物質吸着材に通過させること
により接触させることを特徴とする、請求項1又は2に
記載のアンモニア、アミン類含有気体の処理方法。3. The organometallic complex having a one-dimensional or three-dimensional channel structure is brought into contact by passing through a chemical substance adsorbing material attached to a base material having a gas permeable void. The method for treating a gas containing ammonia and amines according to claim 1 or 2.
造を有する有機金属錯体が3〜20Åの細孔径を有する
ものである請求項1又は2に記載のアンモニア、アミン
類含有気体の処理方法。4. The method for treating a gas containing ammonia and amines according to claim 1, wherein the organometallic complex having a one-dimensional or three-dimensional channel structure has a pore size of 3 to 20 Å.
有する有機金属錯体をを含むアンモニア、アミン類含有
気体の処理材。5. A treatment material for a gas containing ammonia and amines, which contains an organometallic complex having a one-dimensional or three-dimensional channel structure.
造を有する有機金属錯体が3〜20Åの細孔径を有する
ものである請求項5に記載のアンモニア、アミン類含有
気体の処理材。6. The treatment material for ammonia- and amine-containing gas according to claim 5, wherein the organometallic complex having a one-dimensional or three-dimensional channel structure has a pore size of 3 to 20 Å.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8142405A JPH09323014A (en) | 1996-06-05 | 1996-06-05 | Treatment of gas containing ammonia and amines and treating material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8142405A JPH09323014A (en) | 1996-06-05 | 1996-06-05 | Treatment of gas containing ammonia and amines and treating material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09323014A true JPH09323014A (en) | 1997-12-16 |
Family
ID=15314583
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8142405A Pending JPH09323014A (en) | 1996-06-05 | 1996-06-05 | Treatment of gas containing ammonia and amines and treating material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09323014A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102029913B1 (en) * | 2018-12-04 | 2019-10-08 | 경상남도 | Synthesis device and method of 1-methylcyclopropene |
-
1996
- 1996-06-05 JP JP8142405A patent/JPH09323014A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102029913B1 (en) * | 2018-12-04 | 2019-10-08 | 경상남도 | Synthesis device and method of 1-methylcyclopropene |
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