JPH09506324A - 石英ガラスからなる成形体及びその製造法 - Google Patents
石英ガラスからなる成形体及びその製造法Info
- Publication number
- JPH09506324A JPH09506324A JP7512896A JP51289695A JPH09506324A JP H09506324 A JPH09506324 A JP H09506324A JP 7512896 A JP7512896 A JP 7512896A JP 51289695 A JP51289695 A JP 51289695A JP H09506324 A JPH09506324 A JP H09506324A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- transparent
- quartz glass
- molded body
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22C—FOUNDRY MOULDING
- B22C9/00—Moulds or cores; Moulding processes
- B22C9/12—Treating moulds or cores, e.g. drying, hardening
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/429—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to measurement of ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
- Y10T428/1317—Multilayer [continuous layer]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Glass Melting And Manufacturing (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Silicon Compounds (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Producing Shaped Articles From Materials (AREA)
- Glass Compositions (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Optical Measuring Cells (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.透明石英ガラスからなる少なくとも一つの表面領域を有し、その露出表面 は滑らかであり、且つ8μm未満の表面ミクロ粗さを有する、石英ガラスからな る成形体において、該成形体は基材からなり、該基材の材料は少なくとも99. 9%の化学純度且つ最高1%のクリストバライト含有量を有し、ガス不透過性で 、不透明であり且つ気孔を有し、1mmの壁厚において、λ=190〜2650 nmの波長範囲で実質的に一定の、10%未満の直接分光透過率を有し、少なく とも2.15g/cm3の密度を有すること;および透明表面領域は、1650℃ 以上の温度に熱処理された基材材料から成形され、その厚さは少なくとも0.5 mmであり、その直接分光透過率はλ=600〜2650nmの波長範囲で、1 mmの層厚さにおいて少なくとも60%の値であることを特徴とする石英ガラス からなる成形体。 2.単一基材からなる請求項1記載の成形体。 3.前記基材材料の気孔の少なくとも80%が20μm未満、好ましくは10 μm未満の最大気孔寸法を有する請求項1又は2記載の成形体。 4.前記基材材料中の気孔含有量が単位体積当たり0.5〜2.5%の範囲に ある請求項1〜3のいずれかに記載の成形体。 5.前記透明表面領域がフランジ表面を形成している請求項1〜4のいずれか に記載の成形体。 6.前記基材が中空部材として形成され、その外部及び/又は内部の少なくと も一部領域が透明表面領域を形成している請求項1〜4のいずれかに記載の成形 体。 7.前記外部及び/又は内部表面の全体が透明に形成されている請求項6記載 の成形体。 8.前記透明表面領域が基材の全壁厚さに亙って透明に形成されている請求項 1〜7のいずれかに記載の成形体。 9.前記基材がるつぼとして形成され、その全内部表面が少なくとも1.0m mの壁厚さまで透明に形成されている請求項1〜4記載の成形体。 10.前記基材が容器部材として形成され、透明表面領域が全壁厚さに亙って 透明に形成されており、且つのぞき窓を形成する請求項1〜4及び請求項6〜8 のいずれかに記載の成形体。 11.前記基材が軽量鏡素材のような鏡素材の部材として形成され、透明表面 領域が、反射被覆を備えるための該鏡素材の表面を形成する請求項1〜4記載の 成形体。 12.前記透明表面領域が少なくとも1.0mmの厚さを有する請求項1〜8 及び請求項10〜11のいずれかに記載の成形体。 13.透明石英ガラスからなる少なくとも一つの表面領域を有し、その露出表 面は滑らかであり、且つ8μm未満の表面ミクロ粗さを有する、石英ガラスから なる成形体を製造する方法において、基材をスリップキャスト法により製造し、 その際少なくとも99.9%の純度の石英ガラスは70μm未満の粒度の粉末に 粉砕されて、該粉末からなるスリップを形成し、永続運動を維持することにより 1〜240時間の間に亙って安定化され、安定化されたスリップは基材に対応す る気孔型中に装入され、そこで予め決められた時間保持され、型から除去した後 基材素材を乾燥し、ついで炉の中で5〜60K/分の加熱速度で、1350〜1 450℃の範囲の焼結温度に加熱し、ついで少なくとも40分間、1300℃を 越える温度にし、焼結された基材を冷却すること;および透明表面領域の厚さが 少なくとも0.5mmであり、その直接分光透過率がλ=600〜2650nm の波長範囲で、1mmの層厚さにおいて少なくとも60%の値を有するまで、基 材を形成する不透明で、多孔質で、ガス不透過性の基材材料の表面領域を熱源に より1650〜2200℃の範囲の温度に局部的に加熱して、多孔質で、不透明 な基材材料を透明な石英ガラスへ変換させることを特徴とする成形体の製造法。 14.前記熱源として、天然ガス又は水素−酸素バーナーのようなバーナー、 プラズマバーナー、アーク、またはCO2レーザにようなレーザが使用される請 求項13記載の方法。 15.前記熱源及び表面領域が互いに相対的に移動される請求項13又は14 記載の方法。 16.前記熱源が前記表面領域に亙って前後に移動される請求項15記載の方 法。 17.前記基材がフランジとして形成されている請求項13〜16のいずれか に記載の方法。 18.前記基材が中空部材として形成され、その外部及び/又は内部の少なく とも一部領域が熱源により加熱される請求項13〜16のいずれかに記載の方法 。 19.前記中空部材が、その外部及び/又は内部表面の一部領域が加熱される ように回転される請求項15又は18記載の方法。 20.前記外部及び/又は内部表面の全体が熱源により加熱される請求項18 又は19記載の方法。 21.基材の全壁厚さが透明になるまで、表面領域における基材の加熱が行わ れる請求項13〜20のいずれかに記載の方法。 22.前記基材がるつぼとして形成され、少なくとも1.0mmの厚さの透明 層が形成されるように、その内部表面全体が熱源により加熱される請求項13〜 16記載のいずれかに記載の方法。 23.前記基材が軽量鏡素材のような鏡素材の部材として形成され、熱源が反 射被覆として意図された鏡表面に亙って移動される請求項13〜16記載のいず れかに記載の方法。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4338807.8 | 1993-11-12 | ||
| DE4338807A DE4338807C1 (de) | 1993-11-12 | 1993-11-12 | Formkörper mit hohem Gehalt an Siliziumdioxid und Verfahren zur Herstellung solcher Formkörper |
| PCT/EP1994/003722 WO1995013248A1 (de) | 1993-11-12 | 1994-11-10 | Formkörper aus quarzglas und verfahren zur herstellung eines formkörpers aus quarzglas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09506324A true JPH09506324A (ja) | 1997-06-24 |
| JP3241046B2 JP3241046B2 (ja) | 2001-12-25 |
Family
ID=6502525
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27653794A Expired - Lifetime JP3763420B2 (ja) | 1993-11-12 | 1994-11-10 | 高含量の二酸化珪素を有する造形物およびその製造法 |
| JP51289695A Expired - Fee Related JP3241046B2 (ja) | 1993-11-12 | 1994-11-10 | 石英ガラスからなる成形体及びその製造法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27653794A Expired - Lifetime JP3763420B2 (ja) | 1993-11-12 | 1994-11-10 | 高含量の二酸化珪素を有する造形物およびその製造法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US5736206A (ja) |
| EP (1) | EP0653381B1 (ja) |
| JP (2) | JP3763420B2 (ja) |
| KR (2) | KR100321284B1 (ja) |
| CN (1) | CN1066696C (ja) |
| CA (1) | CA2135542C (ja) |
| DE (4) | DE4338807C1 (ja) |
| WO (1) | WO1995013248A1 (ja) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09183624A (ja) * | 1995-12-27 | 1997-07-15 | Shinetsu Quartz Prod Co Ltd | 石英ガラス製フランジ及びその製造方法 |
| US7081290B2 (en) | 2002-04-04 | 2006-07-25 | Tosoh Corporation | Quartz glass thermal sprayed parts and method for producing the same |
| JP2006290666A (ja) * | 2005-04-08 | 2006-10-26 | Shinetsu Quartz Prod Co Ltd | シリカガラス製品の製造方法 |
| JP2012214357A (ja) * | 2011-03-31 | 2012-11-08 | Raytheon Co | 溶融シリカ本体における硝子質状の内層の生成装置及びその動作方法 |
| JP2012214358A (ja) * | 2011-03-31 | 2012-11-08 | Raytheon Co | 硝子質状のシリカ内層を有する溶融シリカ本体とその製造方法 |
| KR101409283B1 (ko) * | 2010-12-01 | 2014-06-18 | 쟈판 스파 쿼츠 가부시키가이샤 | 실리카 유리 도가니의 제조 방법, 실리카 유리 도가니 |
| WO2023167030A1 (ja) | 2022-03-01 | 2023-09-07 | 東ソ-・エスジ-エム株式会社 | 不透明石英ガラスおよびその製造方法 |
| WO2026164121A1 (ja) * | 2025-01-28 | 2026-08-06 | 東ソー株式会社 | 石英ガラス |
Families Citing this family (69)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19523954C2 (de) * | 1995-07-05 | 1998-01-29 | Heraeus Quarzglas | Rohrförmiges Bauteil aus transparentem Quarzglas |
| GB9603128D0 (en) * | 1996-02-15 | 1996-04-17 | Tsl Group Plc | Improved vitreous silica product and method of manufacture |
| DE69716822T2 (de) * | 1996-07-04 | 2003-09-11 | Tosoh Corp., Shinnanyo | Opakes Quarzglas und Verfahren zu dessen Herstellung |
| DE19738464A1 (de) * | 1997-09-03 | 1999-03-04 | Basf Ag | Verwendung von Formkörpern als Katalysator zur Herstellung von Caprolactam |
| US6405563B1 (en) | 1997-10-16 | 2002-06-18 | Tosoh Corporation | Opaque silica glass article having transparent portion and process for producing same |
| DE69803643T3 (de) * | 1997-10-16 | 2006-11-30 | Tosoh Corp., Shinnanyo | Undurchsichtiger Silikatglasgegenstand mit durchsichtigem Bereich und Verfahren zu dessen Herstellung |
| DE19801454C2 (de) * | 1998-01-16 | 1999-12-09 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zur Bestimmung eines UV-Strahlungs-Indexes |
| JP3793553B2 (ja) * | 1999-03-31 | 2006-07-05 | 京セラ株式会社 | 黒色SiO2質耐食性部材及びその製造方法 |
| DE19930817C1 (de) * | 1999-07-01 | 2001-05-03 | Sico Jena Gmbh Quarzschmelze | Verfahren zur Herstellung von Verbundkörpern aus Quarzmaterial |
| DE19943103A1 (de) * | 1999-09-09 | 2001-03-15 | Wacker Chemie Gmbh | Hochgefüllte SiO2-Dispersion, Verfahren zu ihrer Herstellung und Verwendung |
| DE19962451C1 (de) * | 1999-12-22 | 2001-08-30 | Heraeus Quarzglas | Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat |
| DE19962452B4 (de) * | 1999-12-22 | 2004-03-18 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung von opakem Quarzglas |
| DE19962449C2 (de) * | 1999-12-22 | 2003-09-25 | Heraeus Quarzglas | Quarzglastiegel und Verfahren für seine Herstellung |
| DE10019693B4 (de) * | 2000-04-20 | 2006-01-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben |
| EP1187170B1 (en) * | 2000-08-29 | 2007-05-09 | Heraeus Quarzglas GmbH & Co. KG | Plasma resistant quartz glass jig |
| DE10044163A1 (de) * | 2000-09-07 | 2002-04-04 | Wacker Chemie Gmbh | Elektrophoretisch nachverdichtete SiO2-Formkörper, Verfahren zu ihrer Herstellung und Verwendung |
| AUPR054000A0 (en) * | 2000-10-04 | 2000-10-26 | Austai Motors Designing Pty Ltd | A planetary gear apparatus |
| DE10052072B4 (de) * | 2000-10-19 | 2005-06-16 | Heraeus Tenevo Ag | Verfahren zur Bearbeitung eines langgestreckten hohlzylindrischen Bauteils aus Quarzglas mittels Laserstrahlung |
| US20020083740A1 (en) * | 2000-12-29 | 2002-07-04 | Pandelisev Kiril A. | Process and apparatus for production of silica grain having desired properties and their fiber optic and semiconductor application |
| US20020083739A1 (en) * | 2000-12-29 | 2002-07-04 | Pandelisev Kiril A. | Hot substrate deposition fiber optic preforms and preform components process and apparatus |
| US7797966B2 (en) * | 2000-12-29 | 2010-09-21 | Single Crystal Technologies, Inc. | Hot substrate deposition of fused silica |
| DE10158521B4 (de) * | 2001-11-29 | 2005-06-02 | Wacker-Chemie Gmbh | In Teilbereichen oder vollständig verglaster SiO2-Formkörper und Verfahren zu seiner Herstellung |
| US6829908B2 (en) * | 2002-02-27 | 2004-12-14 | Corning Incorporated | Fabrication of inclusion free homogeneous glasses |
| DE10260320B4 (de) * | 2002-12-20 | 2006-03-30 | Wacker Chemie Ag | Verglaster SiO2-Formkörper, Verfahren zu seiner Herstellung und Vorrichtung |
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| WO2015099659A1 (en) | 2013-12-23 | 2015-07-02 | Heraeus Quartz America Llc | Method for forming opaque quartz glass components |
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Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US506303A (en) * | 1893-10-10 | Joseph j | ||
| DE543957C (de) * | 1928-03-01 | 1932-02-12 | Heraeus Gmbh W C | Verfahren zum Herstellen von Rohren oder anderen Hohlkoerpern aus Quarz und anderen schwer schmelzbaren Stoffen |
| US3972704A (en) * | 1971-04-19 | 1976-08-03 | Sherwood Refractories, Inc. | Apparatus for making vitreous silica receptacles |
| GB1384319A (en) * | 1971-04-19 | 1975-02-19 | Sherwood Refractories | Vitreous silica and process and apparatus for making same |
| DE2218766C2 (de) * | 1971-04-19 | 1982-06-03 | Sherwood Refractories Inc., Cleveland, Ohio | Verfahren und Vorrichtung zum Herstellen dünnwandiger Gefäße aus feinzerkleinerten Teilchen glasiger Kieselsäure hohen Reinheitsgrades |
| CH566077A5 (ja) * | 1972-08-05 | 1975-08-29 | Heraeus Schott Quarzschmelze | |
| US4040795A (en) * | 1974-06-04 | 1977-08-09 | Lothar Jung | Method for the conversion of crystalline silica raw materials into amorphous silica |
| US4086489A (en) * | 1977-02-04 | 1978-04-25 | Piltingsrud Harley V | Ultra violet radiation personnel hazard meter |
| JPS5812280A (ja) * | 1981-07-16 | 1983-01-24 | 松下電器産業株式会社 | シ−ズヒ−タ |
| US5389582A (en) * | 1985-11-06 | 1995-02-14 | Loxley; Ted A. | Cristobalite reinforcement of quartz glass |
| US4703173A (en) * | 1986-03-06 | 1987-10-27 | Fusion Systems Corporation | Probe for collecting light for a radiation monitoring device |
| US4935046A (en) * | 1987-12-03 | 1990-06-19 | Shin-Etsu Handotai Company, Limited | Manufacture of a quartz glass vessel for the growth of single crystal semiconductor |
| DE8800850U1 (de) * | 1988-01-25 | 1988-03-24 | Gerstel, Eberhard, 4330 Muelheim | UV-Sensor |
| CN1045758A (zh) * | 1989-03-22 | 1990-10-03 | 长沙市电子材料二厂 | 气炼法生产不透明乳白石英玻璃 |
| DD300159A7 (de) * | 1990-09-03 | 1992-05-27 | Universal Quarzgut Schmelze | Verfahren zur Herstellung von Erzeugnissen mit hohem SiO2-Gehalt |
| US5330941A (en) * | 1991-07-24 | 1994-07-19 | Asahi Glass Company Ltd. | Quartz glass substrate for polysilicon thin film transistor liquid crystal display |
-
1993
- 1993-11-12 DE DE4338807A patent/DE4338807C1/de not_active Expired - Lifetime
-
1994
- 1994-08-31 EP EP94113614A patent/EP0653381B1/de not_active Expired - Lifetime
- 1994-09-29 DE DE4434858A patent/DE4434858C2/de not_active Expired - Lifetime
- 1994-10-13 DE DE59404672T patent/DE59404672D1/de not_active Expired - Lifetime
- 1994-11-09 KR KR1019940029261A patent/KR100321284B1/ko not_active Expired - Lifetime
- 1994-11-10 WO PCT/EP1994/003722 patent/WO1995013248A1/de not_active Ceased
- 1994-11-10 JP JP27653794A patent/JP3763420B2/ja not_active Expired - Lifetime
- 1994-11-10 DE DE4440104A patent/DE4440104C2/de not_active Expired - Lifetime
- 1994-11-10 CA CA002135542A patent/CA2135542C/en not_active Expired - Fee Related
- 1994-11-10 US US08/640,759 patent/US5736206A/en not_active Expired - Lifetime
- 1994-11-10 KR KR1019960702414A patent/KR100349412B1/ko not_active Expired - Lifetime
- 1994-11-10 JP JP51289695A patent/JP3241046B2/ja not_active Expired - Fee Related
- 1994-11-11 CN CN94117916A patent/CN1066696C/zh not_active Expired - Lifetime
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09183624A (ja) * | 1995-12-27 | 1997-07-15 | Shinetsu Quartz Prod Co Ltd | 石英ガラス製フランジ及びその製造方法 |
| US7081290B2 (en) | 2002-04-04 | 2006-07-25 | Tosoh Corporation | Quartz glass thermal sprayed parts and method for producing the same |
| JP2006290666A (ja) * | 2005-04-08 | 2006-10-26 | Shinetsu Quartz Prod Co Ltd | シリカガラス製品の製造方法 |
| KR101409283B1 (ko) * | 2010-12-01 | 2014-06-18 | 쟈판 스파 쿼츠 가부시키가이샤 | 실리카 유리 도가니의 제조 방법, 실리카 유리 도가니 |
| JP2012214357A (ja) * | 2011-03-31 | 2012-11-08 | Raytheon Co | 溶融シリカ本体における硝子質状の内層の生成装置及びその動作方法 |
| JP2012214358A (ja) * | 2011-03-31 | 2012-11-08 | Raytheon Co | 硝子質状のシリカ内層を有する溶融シリカ本体とその製造方法 |
| US9079792B2 (en) | 2011-03-31 | 2015-07-14 | Raytheon Company | Fused silica body with vitreous silica inner layer and method for making the same |
| US9193620B2 (en) | 2011-03-31 | 2015-11-24 | Raytheon Company | Fused silica body with vitreous silica inner layer, and method for making same |
| US9221709B2 (en) | 2011-03-31 | 2015-12-29 | Raytheon Company | Apparatus for producing a vitreous inner layer on a fused silica body, and method of operating same |
| WO2023167030A1 (ja) | 2022-03-01 | 2023-09-07 | 東ソ-・エスジ-エム株式会社 | 不透明石英ガラスおよびその製造方法 |
| WO2026164121A1 (ja) * | 2025-01-28 | 2026-08-06 | 東ソー株式会社 | 石英ガラス |
Also Published As
| Publication number | Publication date |
|---|---|
| CA2135542A1 (en) | 1995-05-13 |
| KR100349412B1 (ko) | 2002-11-14 |
| DE4440104C2 (de) | 1996-04-25 |
| DE4440104A1 (de) | 1995-05-18 |
| JPH07267724A (ja) | 1995-10-17 |
| KR100321284B1 (ko) | 2002-06-28 |
| KR960705742A (ko) | 1996-11-08 |
| CN1105650A (zh) | 1995-07-26 |
| DE4338807C1 (de) | 1995-01-26 |
| CA2135542C (en) | 2007-10-23 |
| EP0653381A1 (de) | 1995-05-17 |
| KR950014027A (ko) | 1995-06-15 |
| WO1995013248A1 (de) | 1995-05-18 |
| DE4434858A1 (de) | 1995-05-18 |
| DE59404672D1 (de) | 1998-01-08 |
| JP3241046B2 (ja) | 2001-12-25 |
| CN1066696C (zh) | 2001-06-06 |
| JP3763420B2 (ja) | 2006-04-05 |
| DE4434858C2 (de) | 1997-05-22 |
| US5736206A (en) | 1998-04-07 |
| EP0653381B1 (de) | 1998-04-29 |
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