JPH0952015A - Solvent processing apparatus and solvent processing method - Google Patents
Solvent processing apparatus and solvent processing methodInfo
- Publication number
- JPH0952015A JPH0952015A JP7210595A JP21059595A JPH0952015A JP H0952015 A JPH0952015 A JP H0952015A JP 7210595 A JP7210595 A JP 7210595A JP 21059595 A JP21059595 A JP 21059595A JP H0952015 A JPH0952015 A JP H0952015A
- Authority
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- Japan
- Prior art keywords
- solvent
- adsorbent
- electron beam
- adsorption
- fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Treating Waste Gases (AREA)
- Separation Of Gases By Adsorption (AREA)
Abstract
(57)【要約】
【課題】 吸着剤から脱着された溶剤を処理するための
付加設備を必要とせず、且つ処理効率が良くコンパクト
な溶剤処理装置及び溶剤処理方法を提供することを課題
とする。
【解決手段】 溶剤を含む流体が導入され、吸着剤12を
流動しながら流体と接触させて該流体中の溶剤を吸着剤
12に吸着させる吸着部4 と、溶剤が除去された流体を排
出する排出口6 を有する吸着塔1 と、該吸着塔1 から移
送路7 を通って移送された溶剤を吸着した吸着剤12から
溶剤を脱着する脱着塔2 と、該脱着された吸着剤12を前
記吸着塔1 の吸着部4 に返送する返送路8 を具備する溶
剤処理装置において、前記脱着塔2 に、溶剤を含んだ吸
着剤12に電子線を照射する電子線照射装置3 が設けられ
たことを解決手段として有する。
(57) Abstract: It is an object of the present invention to provide a compact solvent treatment apparatus and a solvent treatment method which do not require additional equipment for treating a solvent desorbed from an adsorbent and have high treatment efficiency. . SOLUTION: A fluid containing a solvent is introduced, and the adsorbent 12 is brought into contact with the fluid while flowing and the solvent in the fluid is adsorbed.
From the adsorption section 4 for adsorbing to the solvent 12, the adsorption tower 1 having the discharge port 6 for discharging the solvent-free fluid, and the adsorbent 12 adsorbing the solvent transferred from the adsorption tower 1 through the transfer path 7. In a solvent treatment apparatus comprising a desorption tower 2 for desorbing a solvent, and a return passage 8 for returning the desorbed adsorbent 12 to the adsorption section 4 of the adsorption tower 1, the desorption tower 2 contains an adsorption containing a solvent. As a solution means, an electron beam irradiation device 3 for irradiating the agent 12 with an electron beam is provided.
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、工場等から排出さ
れる有機溶剤を含む有害な排ガス等を除去して、浄化ガ
スとして排出する溶剤処理装置及び溶剤処理方法の改良
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to improvements in a solvent treatment apparatus and a solvent treatment method for removing harmful exhaust gas containing an organic solvent discharged from a factory or the like and discharging it as purified gas.
【０００２】[0002]
【従来の技術】従来、塗装工場、印刷工場、化学工場及
び磁気テープ製造工場等の有機溶剤を使用する工場から
排出される溶剤を含んだガスを浄化する装置としては、
図３に示すような流動床式の溶剤処理装置が使用されて
いた。2. Description of the Related Art Conventionally, as a device for purifying a gas containing a solvent discharged from a plant using an organic solvent such as a coating plant, a printing plant, a chemical plant, and a magnetic tape manufacturing plant,
A fluidized bed type solvent treatment apparatus as shown in FIG. 3 was used.
【０００３】即ち、溶剤を含んだガス35を導入し、流動
された活性炭等の吸着剤42に向流接触させ、該吸着剤42
に溶剤を吸着させてガスを浄化し、該溶剤が除去された
ガス36を排出する吸着塔31と、該吸着塔31で溶剤を吸着
した吸着剤42を移送して、溶剤の沸点まで加熱手段34に
よって加熱して溶剤を吸着剤42から蒸発させて脱着する
脱着塔32とからなり、該脱着塔32において脱着された吸
着剤42は再び吸着塔31へ移送され吸着剤42として繰り返
し利用するものである。That is, a gas 35 containing a solvent is introduced and brought into countercurrent contact with a fluidized adsorbent 42 such as activated carbon.
The solvent is adsorbed to the to purify the gas, the adsorption tower 31 that discharges the gas 36 from which the solvent has been removed, and the adsorbent 42 that adsorbs the solvent in the adsorption tower 31 are transferred, and the heating means is heated to the boiling point of the solvent. A desorption tower 32 for desorbing by heating the solvent by evaporating the solvent from the adsorbent 42, and the adsorbent 42 desorbed in the desorption tower 32 is transferred to the adsorption tower 31 again and repeatedly used as the adsorbent 42. Is.
【０００４】しかし、このような溶剤処理装置において
は、脱着塔32で吸着剤42から脱着した溶剤を凝縮させて
回収する手段、或いは燃焼により酸化分解する手段が必
要であった。However, in such a solvent treatment apparatus, a means for condensing and recovering the solvent desorbed from the adsorbent 42 in the desorption tower 32 or a means for oxidizing and decomposing by combustion is required.
【０００５】また、このような溶剤の回収、燃焼処理を
行う手段を設けた場合に装置が大型化し、広い設置スペ
ースが必要であった。Further, when the means for collecting and burning the solvent is provided, the apparatus becomes large in size and a large installation space is required.
【０００６】さらに、脱着塔32において吸着剤42から溶
剤を脱着させる際に、溶剤の蒸発する温度にまで吸着剤
42を加熱するため、特に高温で蒸発する溶剤の場合に
は、加熱により吸着剤42に熱劣化が生じ、吸着剤42を長
期間繰り返して吸着塔31において使用することは困難
で、吸着剤42の再利用回数が少なく不経済であった。Further, when the solvent is desorbed from the adsorbent 42 in the desorption tower 32, the adsorbent is brought to a temperature at which the solvent evaporates.
In order to heat 42, particularly in the case of a solvent that evaporates at a high temperature, heat deterioration occurs in the adsorbent 42 due to heating, and it is difficult to repeatedly use the adsorbent 42 in the adsorption tower 31 for a long time. It was uneconomical because it was reused a few times.
【０００７】本発明は、このような問題点を解決するた
めになされたものであり、吸着剤から脱着された溶剤を
処理するための付加設備を必要とせず、且つ処理効率が
良くコンパクトな溶剤処理装置及び溶剤処理方法を提供
することを課題とする。The present invention has been made in order to solve such a problem, does not require additional equipment for treating the solvent desorbed from the adsorbent, and has a high treatment efficiency and a compact solvent. An object is to provide a processing apparatus and a solvent processing method.
【０００８】[0008]
（構成）本発明は、このような課題を解決するために、
溶剤処理装置とその方法としてなされたもので、溶剤処
理装置としての特徴は、溶剤を含む流体が導入され、吸
着剤12を流動しながら流体と接触させて該流体中の溶剤
を吸着剤12に吸着させる吸着部4 と、溶剤が除去された
流体を排出する排出口6 を有する吸着塔1 と、該吸着塔
1 から移送路7 を通って移送された溶剤を吸着した吸着
剤12から溶剤を脱着する脱着塔2 と、該脱着された吸着
剤12を前記吸着塔1 の吸着部4 に返送する返送路8 を具
備する溶剤処理装置において、前記脱着塔2 に、溶剤を
含んだ吸着剤12に電子線を照射する電子線照射装置3 が
設けられたことにある。(Constitution) The present invention has been made in order to solve such a problem.
What is made as a solvent treatment apparatus and its method, the feature of the solvent treatment apparatus is that a fluid containing a solvent is introduced, and the solvent in the fluid is brought into contact with the fluid while adsorbent 12 is flowing into adsorbent 12. An adsorption section 4 for adsorbing, an adsorption tower 1 having a discharge port 6 for discharging a fluid from which a solvent has been removed, and the adsorption tower
The desorption tower 2 for desorbing the solvent from the adsorbent 12 that has adsorbed the solvent transferred from 1 to the transfer path 7, and the return path 8 for returning the desorbed adsorbent 12 to the adsorption section 4 of the adsorption tower 1. In the solvent treatment apparatus including the above, the desorption tower 2 is provided with an electron beam irradiation device 3 for irradiating the adsorbent 12 containing a solvent with an electron beam.
【０００９】また、溶剤処理方法としての特徴は、溶剤
を含む流体を、吸着部4 において流動する吸着剤12に接
触させて溶剤を吸着剤12に吸着させた後に、溶剤が除去
された流体を排出し、一方溶剤を吸着した吸着剤12から
溶剤を脱着して、その後該脱着された吸着剤12を前記吸
着部4 に返送する溶剤処理方法において、溶剤を含んだ
吸着剤12に電子線を照射することによって吸着剤12から
溶剤を脱着することにある。Further, the solvent treatment method is characterized in that the fluid containing the solvent is brought into contact with the adsorbent 12 flowing in the adsorption section 4 to adsorb the solvent to the adsorbent 12 and then the fluid from which the solvent is removed is removed. In the solvent treatment method of discharging, while desorbing the solvent from the adsorbent 12 that has adsorbed the solvent, and then returning the desorbed adsorbent 12 to the adsorption section 4, an electron beam is applied to the adsorbent 12 containing the solvent. The purpose is to desorb the solvent from the adsorbent 12 by irradiation.
【００１０】（作用）すなわち上記のように本発明で
は、吸着部４において溶剤を吸着した吸着剤12に、脱着
塔２に設けられた電子線照射装置３から電子線を照射し
て吸着剤12中の溶剤を吸着剤12から脱着させて、溶剤成
分を分解する。従って、溶剤成分は吸着剤12から脱着さ
れて分解されるため、別途溶剤の回収や分解等の処理を
行う手段を設ける必要がない。(Operation) As described above, in the present invention, the adsorbent 12 which has adsorbed the solvent in the adsorption section 4 is irradiated with an electron beam from the electron beam irradiation device 3 provided in the desorption tower 2, and the adsorbent 12 is The solvent therein is desorbed from the adsorbent 12 to decompose the solvent component. Therefore, since the solvent component is desorbed from the adsorbent 12 and decomposed, it is not necessary to separately provide a means for collecting and decomposing the solvent.
【００１１】また、電子線を吸着剤12に照射して吸着剤
12から溶剤を脱着させるため、吸着剤12が熱によって劣
化するおそれがなく、繰り返し何度も吸着塔１の吸着部
４において使用することができる。Further, the adsorbent 12 is irradiated with an electron beam to absorb the adsorbent.
Since the solvent is desorbed from the adsorbent 12, there is no risk of the adsorbent 12 deteriorating due to heat, and the adsorbent 12 can be repeatedly used in the adsorption section 4 of the adsorption tower 1.
【００１２】[0012]
【発明の実施の形態】以下、本発明の実施の形態の一例
について図面に従って説明する。先ず、溶剤処理装置の
構成について説明する。図１に示す１は、溶剤混入ガス
導入路５から溶剤を含むガスが導入され、該溶剤混入ガ
スが、吸着剤12に向流接触されるように、吸着剤12が流
動移動される吸着部としての多段式流動床４を有する吸
着塔で、該多段式流動床４には粒状の吸着剤12が流動さ
れる。該吸着剤12は除去する溶剤に対して高い吸着能を
有する高分子からなり、前記多段流動床４において最上
段から最下段に向かって移動される。６は該吸着塔１の
上部に設けられた浄化ガス排出口である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. First, the configuration of the solvent processing apparatus will be described. In FIG. 1, reference numeral 1 denotes an adsorption section in which a gas containing a solvent is introduced from a solvent-mixed gas introduction passage 5 and the adsorbent 12 is fluidized and moved so that the solvent-mixed gas comes into countercurrent contact with the adsorbent 12. In the adsorption tower having the multi-stage fluidized bed 4 as described above, the granular adsorbent 12 is fluidized in the multi-stage fluidized bed 4. The adsorbent 12 is composed of a polymer having a high adsorption ability for the solvent to be removed, and is moved from the uppermost stage to the lowermost stage in the multi-stage fluidized bed 4. 6 is a purified gas discharge port provided in the upper part of the adsorption tower 1.
【００１３】２は、前記多段式流動床４を最下段まで移
動された溶剤を吸着した吸着剤12が吸着剤移送路７を通
って導入される脱着塔で、該脱着塔２内には、吸着剤12
を落下させて移動するための移送手段としての移動部14
と、該移動部14に向かって電子線を照射する電子線照射
装置３が形成されている。Reference numeral 2 denotes a desorption column in which an adsorbent 12 having adsorbed the solvent moved to the lowermost stage of the multi-stage fluidized bed 4 is introduced through an adsorbent transfer passage 7, and in the desorption column 2, Adsorbent 12
Moving part 14 as a transfer means for dropping and moving
Then, an electron beam irradiation device 3 for irradiating the moving part 14 with an electron beam is formed.
【００１４】該脱着塔２の移動部14の下方には空気注入
路10が接続され、移動部14の下方から上方へ向かって外
部からの空気が流され、該空気は、脱着塔２の上部に形
成され、且つ前記溶剤混入ガス導入路５に接続されたガ
ス返送路９から排出される。An air injection path 10 is connected below the moving section 14 of the desorption tower 2, and air from the outside is made to flow from below the moving section 14 to above the desorption tower 2. And is discharged from the gas return passage 9 connected to the solvent mixed gas introduction passage 5.
【００１５】15は、脱着塔２において溶剤が脱着された
吸着剤12を貯留する吸着剤貯留部で、吸着剤貯留部15に
は、貯留された吸着剤12を前記吸着塔１内の多段式流動
床４の最上部に返送する吸着剤返送路８が接続されてい
る。Reference numeral 15 denotes an adsorbent storage section for storing the adsorbent 12 in which the solvent is desorbed in the desorption tower 2, and the adsorbent storage section 15 stores the adsorbent 12 stored therein in a multi-stage type in the adsorption tower 1. An adsorbent return path 8 for returning the fluid is connected to the uppermost part of the fluidized bed 4.
【００１６】次に、上記の構成からなる溶剤処理装置に
よって工場等から排出された溶剤混入ガスから溶剤を除
去する場合について説明する。Next, a description will be given of the case where the solvent is removed from the solvent-containing gas discharged from a factory or the like by the solvent treating apparatus having the above-mentioned structure.
【００１７】まず、溶剤混入ガスが前記溶剤混入ガス導
入路５から吸着塔１内に導入されると、該溶剤混入ガス
は上向きに流され、多段式流動床４を上から下に向かっ
て移動される吸着剤12と向流接触される。このように吸
着剤12と向流接触されていくうちに溶剤混入ガスに含ま
れる溶剤は吸着剤12に吸着され、吸着塔１の上部の浄化
ガス排出口６からは浄化された浄化ガスが排出される。First, when the solvent-mixed gas is introduced into the adsorption tower 1 through the solvent-mixed gas introduction passage 5, the solvent-mixed gas is caused to flow upward, and moves in the multi-stage fluidized bed 4 from top to bottom. Is brought into countercurrent contact with the adsorbent 12. The solvent contained in the solvent-containing gas is adsorbed by the adsorbent 12 while being in countercurrent contact with the adsorbent 12, and the purified gas purified is discharged from the purified gas discharge port 6 in the upper part of the adsorption tower 1. To be done.
【００１８】一方、多段式流動床４を流動されて溶剤を
吸着した吸着剤12は、最下段まで移動された後、前記吸
着剤移送路７から脱着塔２の上部へ移送される。On the other hand, the adsorbent 12 which has been fluidized in the multi-stage fluidized bed 4 and adsorbed the solvent is moved to the lowermost stage, and then transferred from the adsorbent transfer path 7 to the upper part of the desorption tower 2.
【００１９】脱着塔２に移送された吸着剤12は移動部14
内を落下され、該落下する吸着剤12に対して前記電子線
照射装置３から電子線が照射される。The adsorbent 12 transferred to the desorption tower 2 is transferred to the moving section 14
The adsorbent 12 that has fallen inside is irradiated with an electron beam from the electron beam irradiation device 3.
【００２０】電子線が照射されると、吸着剤12に吸着さ
れた溶剤成分が落下中の吸着剤12から除去され、吸着剤
12は脱着、再生される。吸着剤12から除去された溶剤
は、電子線によってＨ2 ＯやＣＯ2 等の無害な物質に分
解される。When the adsorbent 12 is irradiated with an electron beam, the solvent components adsorbed on the adsorbent 12 are removed from the adsorbent 12 which is falling.
12 is detached and regenerated. The solvent removed from the adsorbent 12 is decomposed by an electron beam into harmless substances such as H 2 O and CO 2 .
【００２１】またこの時、移動部14の下方に形成された
空気注入路10から、外部の空気が上方に向かって移動部
14内に導入される。このため例えば、電子線によって完
全に分解しきれなかった溶剤成分が残留していたとして
も、下方から上方へ流れる外気と落下する吸着剤12が向
流接触され残留溶剤成分は外気と共に上方へ運ばれ、ガ
ス返送路９から脱着塔２の外部に排出される。At this time, the outside air is moved upward from the air injection passage 10 formed below the moving portion 14.
Introduced within 14. Therefore, for example, even if the solvent component that has not been completely decomposed by the electron beam remains, the external air flowing upward from below and the falling adsorbent 12 are brought into countercurrent contact with each other and the residual solvent component is carried upward together with the external air. The spilled gas is discharged from the gas return passage 9 to the outside of the desorption tower 2.
【００２２】このガス返送路９は前記溶剤混入ガス導入
路５に接続されているため、残留溶剤成分を含んだ空気
は装置の外部に排出されることなく再び溶剤混入ガスと
共に吸着塔１内へ導入され、必ず装置内に留まるように
形成され、外気を汚染することを確実に防止できる。Since the gas return passage 9 is connected to the solvent-containing gas introduction passage 5, the air containing the residual solvent component is not discharged to the outside of the apparatus and is again introduced into the adsorption tower 1 together with the solvent-containing gas. It is introduced and formed so that it always stays in the device, and it is possible to reliably prevent pollution of the outside air.
【００２３】さらに、吸着剤12に吸着された溶剤は電子
線によって除去分解されるため、溶剤を別途回収或いは
燃焼分解する必要が全くない。Further, since the solvent adsorbed on the adsorbent 12 is removed and decomposed by the electron beam, there is no need to separately collect or combust and decompose the solvent.
【００２４】次に、脱着塔２内で溶剤を脱着された吸着
剤12は、前記吸着剤貯留部15に貯留され、さらに吸着剤
返送路８を通って吸着塔１の多段流動床の最上段に移送
され、再び吸着剤12として流動される。Next, the adsorbent 12 from which the solvent has been desorbed in the desorption tower 2 is stored in the adsorbent storage section 15 and further passes through the adsorbent return passage 8 to the uppermost stage of the multi-stage fluidized bed of the adsorption tower 1. And is again flowed as the adsorbent 12.
【００２５】尚、上記実施の形態の一例では、脱着塔２
内で吸着剤12を移送される手段として移動部14を設け、
吸着剤12を落下させながら電子線を照射して溶剤を脱着
したが、吸着剤12を移送させる手段としてはこれに限定
されるものではなく、例えば図２に示すように、脱着塔
２にベルトコンベア11を設けてもよい。In the example of the above embodiment, the desorption tower 2
A moving unit 14 is provided as a means for transferring the adsorbent 12 in the inside.
Although the solvent was desorbed by irradiating the electron beam while dropping the adsorbent 12, the means for transferring the adsorbent 12 is not limited to this, and for example, as shown in FIG. A conveyor 11 may be provided.
【００２６】この場合には、溶剤を吸着した吸着剤12は
ベルトコンベア11に移送され、該ベルトコンベア上に電
子線が照射されるように電子線照射装置が形成され、吸
着剤12はベルトコンベア11上を移送されながら電子線が
照射される。In this case, the adsorbent 12 that has adsorbed the solvent is transferred to the belt conveyor 11, and an electron beam irradiation device is formed so that the electron beam is irradiated on the belt conveyor. The electron beam is emitted while being transported over 11.
【００２７】また、このベルトコンベア11の移送方向と
対向するように外気を導入し、残留溶剤を該外気によっ
て脱着塔２の上部に移送し、上記一例と同様にガス返送
路９から吸着塔１へ返送してもよい。さらに、このよう
なベルトコンベア11や移動部14等の移送手段を脱着塔２
に設けることは条件ではないが、吸着剤を移送しながら
電子線を照射することによってより脱着を効果的に行う
ことができる。Further, outside air is introduced so as to oppose the transfer direction of the belt conveyor 11, the residual solvent is transferred to the upper part of the desorption tower 2 by the outside air, and the adsorption tower 1 is fed from the gas return passage 9 in the same manner as in the above example. You can send it back to. Further, the transfer means such as the belt conveyor 11 and the moving unit 14 is attached to the desorption tower 2
Although it is not a condition to be provided in the above, the desorption can be more effectively performed by irradiating the electron beam while transferring the adsorbent.
【００２８】また、上記実施の形態の一例では、吸着剤
として高分子からなる粒状の吸着剤を使用したが、この
他活性炭等の吸着剤を使用してもよい。Further, in the above embodiment, a granular adsorbent made of a polymer is used as the adsorbent, but an adsorbent such as activated carbon may be used instead.
【００２９】さらに、上記実施の形態の一例では、脱着
塔２に外部から空気を導入して、脱着される吸着剤12と
向流接触させて、該空気をガス返送路９により溶剤混入
ガス導入５へ移送したが、このようなガス返送路９を設
けることは条件ではない。Further, in the example of the above embodiment, air is introduced from the outside into the desorption tower 2 to make countercurrent contact with the adsorbent 12 to be desorbed, and the air is introduced through the gas return passage 9 into a solvent-containing gas. However, it is not a condition to provide such a gas return passage 9.
【００３０】[0030]
【発明の効果】叙上のように、本発明の溶剤処理装置
は、電子線を照射して溶剤を分解することによって吸着
剤の再生を行うため、溶剤を回収したり酸化分解したり
する手段が不要であり、その結果、装置全体をコンパク
トに形成することができ、保管スペースの節約を図るこ
とができる。As described above, since the solvent treatment apparatus of the present invention regenerates the adsorbent by irradiating it with an electron beam to decompose the solvent, means for recovering the solvent or oxidatively decomposing it. Is unnecessary, and as a result, the entire apparatus can be made compact and the storage space can be saved.
【００３１】また、吸着剤に電子線を照射するだけで溶
剤を脱着することが可能であるため吸着剤が熱劣化する
ことなく、吸着剤として何度も繰り返して使用すること
ができ経済的である。Further, since the solvent can be desorbed only by irradiating the adsorbent with an electron beam, the adsorbent can be repeatedly used as an adsorbent without being deteriorated by heat, which is economical. is there.
【図１】本発明の実施の形態の一例としての溶剤処理装
置の概略構成図。FIG. 1 is a schematic configuration diagram of a solvent processing apparatus as an example of an embodiment of the present invention.
【図２】他の実施の形態の例の溶剤処理装置の概略構成
図。FIG. 2 is a schematic configuration diagram of a solvent processing apparatus according to another embodiment.
【図３】従来の溶剤処理装置の概略構成図。FIG. 3 is a schematic configuration diagram of a conventional solvent processing apparatus.
１ 吸着塔 ２ 脱着塔 ３ 電子線照射装置 ４ 多段流動床（吸着部） ６ 浄化ガス排出口（排出口） ８ 吸着剤返送路（返送路） 12 吸着剤 1 adsorption tower 2 desorption tower 3 electron beam irradiation device 4 multi-stage fluidized bed (adsorption section) 6 purified gas discharge port (discharge port) 8 adsorbent return path (return path) 12 adsorbent
Claims (6)
を流動しながら流体と接触させて該流体中の溶剤を吸着
剤(12)に吸着させる吸着部(4) と、溶剤が除去された流
体を排出する排出口(6) を有する吸着塔(1) と、該吸着
塔(1) から移送路(7) を通って移送された溶剤を吸着し
た吸着剤(12)から溶剤を脱着する脱着塔(2) と、該脱着
された吸着剤(12)を前記吸着塔(1) の吸着部(4) に返送
する返送路(8) を具備する溶剤処理装置において、前記
脱着塔(2) に、溶剤を含んだ吸着剤(12)に電子線を照射
する電子線照射装置(3) が設けられたことを特徴とする
溶剤処理装置。1. An adsorbent (12) into which a fluid containing a solvent is introduced.
An adsorption tower (1) having an adsorption part (4) for adsorbing a solvent in the fluid to the adsorbent (12) by contacting the fluid with the adsorbent (12) and an outlet (6) for discharging the fluid from which the solvent has been removed. ), A desorption tower (2) for desorbing the solvent from the adsorbent (12) adsorbing the solvent transferred from the adsorption tower (1) through the transfer path (7), and the desorbed adsorbent (12 ) Is returned to the adsorption section (4) of the adsorption tower (1) in a solvent treatment apparatus comprising a return path (8), the desorption tower (2), the solvent containing adsorbent (12) electron beam An electron beam irradiation device (3) for irradiating a solvent is provided.
である請求項１に記載の溶剤処理装置。2. The solvent processing apparatus according to claim 1, wherein the adsorbent (12) is an adsorbent composed of a polymer.
である請求項１に記載の溶剤処理装置。3. The solvent treatment apparatus according to claim 1, wherein the adsorbent (12) is an adsorbent made of activated carbon.
(12)を移送する移送手段を有し、該移送手段によって移
送される吸着剤(12)に電子線が照射されるように設けら
れた請求項１乃至請求項３のいずれかに記載の溶剤処理
装置。4. The adsorbent containing a solvent in the desorption tower (2).
The solvent according to any one of claims 1 to 3, further comprising a transfer means for transferring (12), the adsorbent (12) transferred by the transfer means being provided so as to be irradiated with an electron beam. Processing equipment.
流動する吸着剤(12)に接触させて溶剤を吸着剤(12)に吸
着させた後に、溶剤が除去された流体を排出し、一方溶
剤を吸着した吸着剤(12)から溶剤を脱着して、その後該
脱着された吸着剤(12)を前記吸着部(4) に返送する溶剤
処理方法において、溶剤を含んだ吸着剤(12)に電子線を
照射することによって吸着剤(12)から溶剤を脱着するこ
とを特徴とする溶剤処理方法。5. A fluid containing a solvent is brought into contact with the adsorbent (12) flowing in the adsorption section (4) to adsorb the solvent to the adsorbent (12), and then the fluid from which the solvent has been removed is discharged. On the other hand, in the solvent treatment method of desorbing the solvent from the adsorbent (12) that adsorbed the solvent, and then returning the desorbed adsorbent (12) to the adsorption section (4), the adsorbent containing the solvent ( A solvent treatment method characterized in that the solvent is desorbed from the adsorbent (12) by irradiating 12) with an electron beam.
ながら電子線を照射する請求項５に記載の溶剤処理方
法。6. The solvent treatment method according to claim 5, wherein the electron beam is irradiated while the adsorbent (12) adsorbing the solvent is transferred.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7210595A JPH0952015A (en) | 1995-08-18 | 1995-08-18 | Solvent processing apparatus and solvent processing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7210595A JPH0952015A (en) | 1995-08-18 | 1995-08-18 | Solvent processing apparatus and solvent processing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0952015A true JPH0952015A (en) | 1997-02-25 |
Family
ID=16591931
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7210595A Pending JPH0952015A (en) | 1995-08-18 | 1995-08-18 | Solvent processing apparatus and solvent processing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0952015A (en) |
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|---|---|---|---|---|
| JP2000218140A (en) * | 1998-11-27 | 2000-08-08 | Toray Ind Inc | Module incorporating membrane and method of manufacturing the same |
| KR100339700B1 (en) * | 1999-10-14 | 2002-06-05 | 유권호 | Air pollution control device |
| KR20040019426A (en) * | 2002-08-26 | 2004-03-06 | 주식회사 비.엠 텔레콤 | air cleaning apparatus using the light catalyzer filter |
| JP2005342659A (en) * | 2004-06-04 | 2005-12-15 | Fuji Heavy Ind Ltd | Method for treating exhaust gas discharged from painting equipment and treatment device for exhaust gas |
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1995
- 1995-08-18 JP JP7210595A patent/JPH0952015A/en active Pending
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000218140A (en) * | 1998-11-27 | 2000-08-08 | Toray Ind Inc | Module incorporating membrane and method of manufacturing the same |
| KR100339700B1 (en) * | 1999-10-14 | 2002-06-05 | 유권호 | Air pollution control device |
| KR20040019426A (en) * | 2002-08-26 | 2004-03-06 | 주식회사 비.엠 텔레콤 | air cleaning apparatus using the light catalyzer filter |
| JP2005342659A (en) * | 2004-06-04 | 2005-12-15 | Fuji Heavy Ind Ltd | Method for treating exhaust gas discharged from painting equipment and treatment device for exhaust gas |
| JP2009119401A (en) * | 2007-11-16 | 2009-06-04 | Japan Atomic Energy Agency | Pollution gas purification method and purification device |
| JP2010194504A (en) * | 2009-02-27 | 2010-09-09 | Jfe Engineering Corp | System for treating exhaust gas by electron beam irradiation |
| CN103894040A (en) * | 2014-03-24 | 2014-07-02 | 中国科学院过程工程研究所 | Active coke moving bed modularizing device for flue gas desulfurization and denitrification |
| WO2018041171A1 (en) * | 2016-08-31 | 2018-03-08 | 中国石油化工股份有限公司 | Flue gas denitration method |
| US11213788B2 (en) * | 2016-08-31 | 2022-01-04 | China Petroleum & Chemical Corporation | Method of flue gas denitrification |
| WO2020034258A1 (en) * | 2018-08-13 | 2020-02-20 | 中国科学院过程工程研究所 | Activated carbon flue gas purification tower |
| CN111773915A (en) * | 2020-06-10 | 2020-10-16 | 上海交通大学 | A flue gas dry desulfurization process |
| CN111773915B (en) * | 2020-06-10 | 2022-07-15 | 上海交通大学 | Flue gas dry desulfurization process |
| KR20220067641A (en) * | 2020-11-17 | 2022-05-25 | 건국대학교 산학협력단 | Bio aerosol removal system using electron beam |
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