JPH0964254A - Heat radiating member for semiconductor device - Google Patents
Heat radiating member for semiconductor deviceInfo
- Publication number
- JPH0964254A JPH0964254A JP24254495A JP24254495A JPH0964254A JP H0964254 A JPH0964254 A JP H0964254A JP 24254495 A JP24254495 A JP 24254495A JP 24254495 A JP24254495 A JP 24254495A JP H0964254 A JPH0964254 A JP H0964254A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- thermal expansion
- semiconductor device
- carbon fiber
- metal component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims description 13
- 229920000049 Carbon (fiber) Polymers 0.000 claims abstract description 26
- 239000004917 carbon fiber Substances 0.000 claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims abstract description 23
- 229910052802 copper Inorganic materials 0.000 claims abstract description 11
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 9
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 8
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 4
- 230000009257 reactivity Effects 0.000 claims abstract description 4
- 229910052709 silver Inorganic materials 0.000 claims abstract description 4
- 229910052718 tin Inorganic materials 0.000 claims abstract description 4
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 4
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 16
- 239000002905 metal composite material Substances 0.000 claims description 8
- 230000017525 heat dissipation Effects 0.000 claims description 7
- 239000000463 material Substances 0.000 abstract description 9
- 239000000835 fiber Substances 0.000 abstract description 8
- 150000002736 metal compounds Chemical class 0.000 abstract 4
- 239000002131 composite material Substances 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 6
- 229910001080 W alloy Inorganic materials 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000002156 mixing Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000013329 compounding Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 238000005551 mechanical alloying Methods 0.000 description 2
- AHADSRNLHOHMQK-UHFFFAOYSA-N methylidenecopper Chemical compound [Cu].[C] AHADSRNLHOHMQK-UHFFFAOYSA-N 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000001272 pressureless sintering Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Landscapes
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、各種半導体素子を
搭載する基板に装着するための半導体装置用放熱部材に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heat dissipation member for a semiconductor device to be mounted on a substrate on which various semiconductor elements are mounted.
【0002】[0002]
【従来の技術】電子機器関連製品の大きな課題の1つ
は、いかに放熱するかという点である。その目的でLS
Iパッケージや光半導体パッケージなどの半導体装置に
は、ヒートスプレッダーまたはヒートシンクと呼ばれる
放熱部材が設けられている(図2(a)、図2(b)、
図2(c)参照)。この部材に要求される特性は、熱
を放散させるために熱伝導率が高いこと(100〜20
0W/m・k程度)、セラミックスやガラス基板と接
合させるため、熱膨張率が基板と同等であること(5〜
10×10-6/k程度)の2点である。現在はこの特性
を満足する材料として、銅とタングステンとの合金(以
下、Cu−W合金と略す)が多用されている。参考に、
市販のCu−W合金の特性例を表1に示す。2. Description of the Related Art One of the major problems of electronic equipment-related products is how to dissipate heat. LS for that purpose
A semiconductor device such as an I package or an optical semiconductor package is provided with a heat dissipation member called a heat spreader or a heat sink (FIGS. 2A and 2B).
FIG. 2C). The characteristic required for this member is that it has a high thermal conductivity in order to dissipate heat (100 to 20).
0 W / m · k), and the coefficient of thermal expansion is the same as that of the substrate because it is bonded to the ceramics or glass substrate (5 to 5)
10 × 10 −6 / k). At present, an alloy of copper and tungsten (hereinafter abbreviated as Cu-W alloy) is often used as a material satisfying these characteristics. In reference,
Table 1 shows a characteristic example of a commercially available Cu-W alloy.
【0003】[0003]
【表1】 [Table 1]
【0004】[0004]
【発明が解決しようとする課題】現在多用されているC
u−W合金は、基板材料のセラミックスと接合するため
に熱膨張率を一致させ、かつ高い熱伝導性を持たせるた
めに選定された合金である。しかしながら、この材料は
タングステンを使用しているために原料コストが高く、
比重が大きいという問題点がある。また、一般に加工性
が悪いと云う問題もあり、代替材料の開発が望まれてい
た。C currently in widespread use
The u-W alloy is an alloy selected so as to have the same coefficient of thermal expansion for bonding with the ceramic of the substrate material and to have high thermal conductivity. However, since this material uses tungsten, the raw material cost is high,
There is a problem that the specific gravity is large. Further, there is a problem that workability is generally poor, and development of alternative materials has been desired.
【0005】また、実開昭55−141953号や実開
昭58−11254号には銅に炭素繊維を含有させた放
熱材料が開示されているが、これらは平面に編んだもの
を重ねているので、三次元的に異方性がある。従って熱
伝導率及び熱膨張率にも方向性が生じ、その取扱いが厄
介であるという問題があった。Further, Japanese Utility Model Application Laid-Open No. 55-141953 and Japanese Utility Model Application Laid-Open No. 58-11254 disclose heat-dissipating materials in which carbon fiber is contained in copper. Therefore, it is three-dimensionally anisotropic. Therefore, there is a problem that the thermal conductivity and the thermal expansion coefficient are directional, and the handling thereof is difficult.
【0006】本発明では低コストでCu−W合金と同等
の性能を有する半導体装置用放熱部材を提供することを
目的とする。An object of the present invention is to provide a heat dissipation member for a semiconductor device, which has a performance equivalent to that of a Cu-W alloy at low cost.
【0007】[0007]
【課題を解決するための手段】本発明は上記したような
従来技術の問題点に鑑みなされたものであり、その主な
目的は、長さ40μm以下の炭素繊維を65体積%乃至
90体積%と、CuまたはAlのいずれか一方からなる
金属成分とを含み、かつ熱膨張率が5×10-6〜10×
10-6以下の金属複合材料からなることを特徴とする半
導体装置用放熱部材を提供することにある。特に、前記
金属複合材料に、前記金属成分と前記炭素繊維との反応
性を向上させるべくTi、Zr、Cr及びSiのうちの
少なくとも1種類以上の金属を0.3重量%乃至5重量
%添加したり、前記金属複合材料に、焼結性を向上させ
るべくSi、Ag、Sn、P、Al及びCuのうち前記
金属成分と異なる少なくとも1種類以上の金属を0.3
重量%乃至8重量%添加すると良い。The present invention has been made in view of the problems of the prior art as described above, and its main purpose is to provide carbon fibers having a length of 40 μm or less in an amount of 65% by volume to 90% by volume. And a metal component made of either Cu or Al, and having a coefficient of thermal expansion of 5 × 10 −6 to 10 ×.
Another object of the present invention is to provide a heat dissipation member for a semiconductor device, which is made of a metal composite material of 10 −6 or less. In particular, 0.3 wt% to 5 wt% of at least one metal selected from Ti, Zr, Cr and Si is added to the metal composite material in order to improve the reactivity between the metal component and the carbon fiber. In addition, in order to improve sinterability, at least one metal different from the metal component of Si, Ag, Sn, P, Al and Cu is added to the metal composite material by 0.3.
It is advisable to add from 8% to 8% by weight.
【0008】無機材料としては熱伝導率が高くて熱膨張
率が小さく、更にコストも低い黒鉛粉と炭素繊維とが適
しているが、黒鉛粉と炭素繊維との弾性率は、20GP
aと400GPaと大きく異なっており、目的とする低
熱膨張化には弾性率の大きい炭素繊維の短繊維若しくは
その粉末の方が効果が大きい。炭素繊維については長繊
維では金属と複合化した際に異方性を生じるため、短繊
維(長さ40μm以下)もしくは粉砕して粉末とするこ
とが望ましい。短繊維または粉砕粉では繊維特有の異方
性がなくなり、3次元等方性複合材料が得られる。ま
た、複合材料の熱膨張率は、理想状態では簡便に以下の
式で求められる(参考文献 複合材料の辞典 朝倉書
店)。As the inorganic material, graphite powder and carbon fiber, which have high thermal conductivity, small thermal expansion coefficient, and low cost, are suitable, but the elastic modulus of graphite powder and carbon fiber is 20 GP.
a is significantly different from 400 GPa, and short fibers of carbon fibers or powder thereof having a large elastic modulus are more effective in achieving the desired low thermal expansion. Regarding carbon fibers, long fibers have anisotropy when compounded with a metal, and thus it is desirable to use short fibers (length 40 μm or less) or pulverize to obtain powder. Short fibers or pulverized powder eliminates the anisotropy peculiar to fibers, and a three-dimensional isotropic composite material can be obtained. In addition, the coefficient of thermal expansion of a composite material can be simply calculated by the following formula in an ideal state (reference document: Composite material dictionary Asakura Shoten).
【0009】 αc=(α1K1X1+α2K2X2)/(K1X1+K2X2) αc:複合材料の熱膨張係数 αi:i成分の熱膨張係数 Ki:i成分の体積弾性率 Xi:i成分の体積分率Α c = (α 1 K 1 X 1 + α 2 K 2 X 2 ) / (K 1 X 1 + K 2 X 2 ) α c : thermal expansion coefficient of composite material α i : thermal expansion coefficient of i component K i : bulk modulus of the i component X i : volume fraction of the i component
【0010】尚、銅と炭素繊維は反応しないため、焼結
が困難であるが、炭素繊維と銅粉とを粉砕混合(メカニ
カルアロイング)することにより、ホットプレス(以下
H/Pと略記する。)で焼結可能となる。また、炭素繊
維を40μm以下に粉砕することにより焼結性が増加
し、繊維特有の異方性を生じない三次元等方性の焼結体
が得られる。Although copper and carbon fibers do not react with each other, it is difficult to sinter them. However, by hot-pressing (hereinafter abbreviated as H / P) carbon powder and copper powder by pulverizing and mixing (mechanical alloying). ) Can be sintered. Further, by pulverizing the carbon fiber to 40 μm or less, the sinterability is increased, and a three-dimensional isotropic sintered body that does not cause the anisotropy peculiar to the fiber is obtained.
【0011】[0011]
【実施例】以下、本発明の好適実施例を添付の図面につ
いて詳しく説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A preferred embodiment of the present invention will now be described in detail with reference to the accompanying drawings.
【0012】無機材料と金属材料とからなる複合材料の
各種の組み合わせの結果を表2に示す。Table 2 shows the results of various combinations of composite materials composed of an inorganic material and a metal material.
【0013】[0013]
【表2】 [Table 2]
【0014】焼結性については以下の3段階で表示し
た。 △:H/Pで加圧してある程度焼結可能(焼結密度85%
〜90%) ○:H/Pで加圧して完全に焼結可能(焼結密度90%〜
99%) ◎:成形後に無加圧焼結可能The sinterability was expressed in the following three stages. △: Pressurized with H / P to sinter to some extent (sintered density 85%
~ 90%) ○: Can be completely sintered by pressing with H / P (sintered density 90% ~
99%) ◎: Pressureless sintering is possible after molding
【0015】上記複合材料は、鋼球を用いたボールミル
混合法(メカニカルアロイング法)により製造し、H/
Pで焼結した。焼結条件は真空中(金属成分がCuの時
1030℃、Alの時600℃)で10時間保持し、荷
重は4kgf/mm2加えた。The above composite material is manufactured by a ball mill mixing method (mechanical alloying method) using steel balls, and H /
Sintered with P. The sintering conditions were held in vacuum (1030 ° C. when the metal component was Cu, 600 ° C. when Al was used) for 10 hours, and a load of 4 kgf / mm 2 was applied.
【0016】表2により、黒鉛粉を使用した場合、目的
とする熱膨張率を得るには92体積%以上の黒鉛を必要
とするため焼結性が悪い。しかし、炭素繊維を用いた場
合には、炭素繊維の弾性率が高いので少量でも熱膨張率
を下げる効果が大きいことが分かる。According to Table 2, when graphite powder is used, the sinterability is poor because 92 vol% or more of graphite is required to obtain the desired coefficient of thermal expansion. However, when the carbon fiber is used, it can be seen that the effect of lowering the coefficient of thermal expansion is great even with a small amount because the elastic modulus of the carbon fiber is high.
【0017】また、金属成分(Al、Cu)と炭素繊維
系の金属複合材料では、金属成分と炭素繊維とが実際に
は反応しないため熱伝導率が予測値より低下する傾向が
あり、また炭素繊維の含有量が多くなると焼結性が悪く
なる。反応性と焼結性とを向上するために第3元素を添
加したところ、以下の効果が得られた。Further, in the metal component (Al, Cu) and the carbon fiber-based metal composite material, since the metal component and the carbon fiber do not actually react with each other, the thermal conductivity tends to be lower than the predicted value, and the carbon If the fiber content increases, the sinterability deteriorates. When the third element was added to improve reactivity and sinterability, the following effects were obtained.
【0018】炭素繊維と反応するような元素(Ti、
Zr、Cr、Si)を0.3重量%〜5重量%添加する
ことにより、熱伝導率が良くなった。0.3wt%未満
では効果が殆どなく、5重量%を越えると反応層が厚く
なりすぎて全体が脆くなると共にこの反応層が熱伝導率
を低下させる。 焼結時に金属成分に液層をつくる元素(Si、Ag、
Sn、P、Al、Cu)を0.3重量%〜8重量%添加
することにより、焼結性が向上した。0.3重量%未満
では焼結性向上の効果がなく、8重量%を越えて添加す
ると焼結性向上ために出現させる液相が多くなり過ぎ、
全体を溶かしてしまう恐れがある。An element (Ti,
The thermal conductivity was improved by adding 0.3 wt% to 5 wt% of Zr, Cr, Si). If it is less than 0.3 wt%, there is almost no effect, and if it exceeds 5 wt%, the reaction layer becomes too thick and the whole becomes brittle, and the reaction layer lowers the thermal conductivity. Elements that form a liquid layer in the metal component during sintering (Si, Ag,
The sinterability was improved by adding 0.3 wt% to 8 wt% of Sn, P, Al, Cu). If it is less than 0.3% by weight, there is no effect of improving sinterability, and if it is added in excess of 8% by weight, too much liquid phase appears to improve sinterability,
There is a risk of melting the whole.
【0019】また、目的とする熱膨張率を得るために、
炭素繊維の配合比を変えて検討した結果を表3に示す。
炭素繊維65体積%以上ではセラミックスと接合可能な
熱膨張率を与え、熱伝導率も要求値を満たしているが、
炭素繊維65体積%未満では熱伝導率は良好であるが、
熱膨張率はセラミックスと接合不可能な値を与える。In order to obtain the desired coefficient of thermal expansion,
Table 3 shows the results of the examination conducted by changing the compounding ratio of the carbon fibers.
If the carbon fiber content is 65% by volume or more, a coefficient of thermal expansion capable of joining with ceramics is given, and the thermal conductivity also satisfies the required value.
When the carbon fiber content is less than 65% by volume, the thermal conductivity is good,
The coefficient of thermal expansion gives a value that cannot be joined to ceramics.
【0020】[0020]
【表3】 [Table 3]
【0021】本実施例の銅−炭素繊維系複合材料の焼結
体の一例の金属組織の顕微鏡写真を図1に示す。この焼
結体は、熱伝導率203W/m・K(at R.
T.)、熱膨張率10×10-6/K(50℃〜200
℃)であり、ヒートスプレッダーに要求される特性を満
たしている。その結果、パッケージ製造時にヒートスプ
レッダーとセラミックス基板とを接合する際、セラミッ
クス基板を破壊せず、また、パッケージ作動時に加熱冷
却サイクルによる熱応力が発生しない。FIG. 1 shows a micrograph of the metal structure of an example of a sintered body of the copper-carbon fiber composite material of this example. This sintered body has a thermal conductivity of 203 W / m · K (at R.
T. ), Thermal expansion coefficient 10 × 10 −6 / K (50 ° C. to 200 ° C.)
C)), which satisfies the characteristics required for the heat spreader. As a result, when the heat spreader and the ceramics substrate are joined together during manufacturing of the package, the ceramics substrate is not destroyed, and thermal stress due to the heating / cooling cycle is not generated during the operation of the package.
【0022】[0022]
【発明の効果】本発明の複合材料からなる半導体装置用
放熱部材によれば、銅またはアルミニウムをマトリクス
とすることで熱伝導率が向上し、長さ40μm以下の炭
素繊維を65体積%乃至90体積%配合することで熱膨
張率を目的の範囲内に下げることができ、しかも三次元
等方性の焼結体が得られる。ここで、接合する基板に応
じて炭素繊維の配合比を変えることで熱膨張率を調整す
ることができる。また、安価な炭素繊維を用いることで
原料コストが低廉化する。According to the heat dissipating member for a semiconductor device made of the composite material of the present invention, the heat conductivity is improved by using copper or aluminum as a matrix, and the carbon fiber having a length of 40 μm or less is 65% by volume to 90% by volume. By blending in a volume percentage, the coefficient of thermal expansion can be lowered within a target range, and a three-dimensional isotropic sintered body can be obtained. Here, the coefficient of thermal expansion can be adjusted by changing the compounding ratio of the carbon fibers depending on the substrates to be joined. Moreover, the raw material cost is reduced by using the inexpensive carbon fiber.
【図1】本発明が適用された半導体装置用放熱部材とし
ての銅−炭素繊維系金属複合材料の焼結体の金属組織を
示す顕微鏡写真。FIG. 1 is a micrograph showing a metal structure of a sintered body of a copper-carbon fiber-based metal composite material as a heat dissipation member for a semiconductor device to which the present invention is applied.
【図2】一般的な半導体装置のパッケージ構造を示す斜
視図。FIG. 2 is a perspective view showing a package structure of a general semiconductor device.
Claims (3)
積%乃至90体積%と、CuまたはAlのいずれか一方
からなる金属成分とを含み、かつ熱膨張率が5×10-6
〜10×10-6以下の金属複合材料からなることを特徴
とする半導体装置用放熱部材。1. A carbon fiber containing 65% by volume to 90% by volume of carbon fiber having a length of 40 μm or less and a metal component made of either Cu or Al, and having a coefficient of thermal expansion of 5 × 10 −6.
A heat dissipation member for a semiconductor device, which is made of a metal composite material of 10 to 10 -6 or less.
前記炭素繊維との反応性を向上させるべくTi、Zr、
Cr及びSiのうちの少なくとも1種類以上の金属が
0.3重量%乃至5重量%添加されていることを特徴と
する請求項1に記載の半導体装置用放熱部材。2. The metal composite material is provided with Ti, Zr, in order to improve the reactivity between the metal component and the carbon fiber.
The heat dissipation member for a semiconductor device according to claim 1, wherein at least one kind of metal selected from the group consisting of Cr and Si is added in an amount of 0.3% by weight to 5% by weight.
せるべくSi、Ag、Sn、P、Al及びCuのうち前
記金属成分と異なる少なくとも1種類以上の金属が0.
3重量%乃至8重量%添加されていることを特徴とする
請求項1または請求項2に記載の半導体装置用放熱部
材。3. The metal composite material contains at least one kind of metal different from the metal component of Si, Ag, Sn, P, Al and Cu for improving sinterability.
The heat dissipating member for a semiconductor device according to claim 1 or 2, wherein 3 wt% to 8 wt% is added.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24254495A JPH0964254A (en) | 1995-08-28 | 1995-08-28 | Heat radiating member for semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24254495A JPH0964254A (en) | 1995-08-28 | 1995-08-28 | Heat radiating member for semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0964254A true JPH0964254A (en) | 1997-03-07 |
Family
ID=17090695
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24254495A Pending JPH0964254A (en) | 1995-08-28 | 1995-08-28 | Heat radiating member for semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0964254A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013236010A (en) * | 2012-05-10 | 2013-11-21 | Mitsubishi Electric Corp | Semiconductor device |
| JP2015153900A (en) * | 2014-02-14 | 2015-08-24 | 島根県 | Laminate and manufacturing method of the same |
-
1995
- 1995-08-28 JP JP24254495A patent/JPH0964254A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013236010A (en) * | 2012-05-10 | 2013-11-21 | Mitsubishi Electric Corp | Semiconductor device |
| JP2015153900A (en) * | 2014-02-14 | 2015-08-24 | 島根県 | Laminate and manufacturing method of the same |
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