JPH0968606A - Production of color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To produce a thin black matrix (light-shielding layer) having high optical density by forming a light-shielding layer from a resin compsn. for a light-shielding layer containing alcohol-soluble polyamide. SOLUTION: A resin compsn. for formation of a light-shielding layer is prepared by dispersing a light-shielding material in a soln. of an alcohol-soluble polyamide. As for the light-shielding material, a black pigment such as carbon black, iron black or a metal oxide such as iron tetraoxide, metal sulfide or mixture of these can be used. By using an alcohol-soluble polyamide having excellent alkali resistance as the resin of the light-shielding layer, development of the resist layer and etching of the light-shielding layer can be separately performed (which means that after the resist layer is developed with alkali, the light-shielding layer is etched with an acid or alcohol), so that a high accuracy pattern can be formed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter used in a color liquid crystal display device.

[0002]

2. Description of the Related Art Liquid crystal displays (hereinafter abbreviated as LCDs).
Utilizing features such as thinness, small size, and low power consumption, is currently used for display units such as watches, calculators, TVs, and personal computers. In recent years, color LCDs have been developed and OA / AV
It has begun to be used in many applications such as navigation systems and viewfinders, mainly in equipment, and the market is expected to expand rapidly in the future.

As shown in FIG. 1, a color filter for displaying an LCD in color is R (red) G (green) on a substrate 2 such as a glass plate on which a BM (black matrix) 1 having a lattice pattern is formed. ) B (blue) color pixels 3 (about 100 × 100 × 2 μm) are sequentially formed, and a transparent overcoat layer (OC) 4 is formed thereon. 5 is a polarizing plate and 6 is an ITO electrode.

[0004] In the color LCD, the color filter 7 has an LC
D, the display screen can be colored by transmitting backlight light through a color filter. 8 is an alignment film, 9 is a liquid crystal, 10 is a seal material, 11 is a top coat layer, 12 is an ITO electrode, 13 is a substrate such as a glass plate, 14
Is a polarizing plate.

At present, color filters are mainly manufactured using a dyeing method. However, in this method, a step of forming a pixel by applying a transparent photosensitive resin on a glass substrate, drying, exposing, and developing, dyeing with a dye, and then forming a color mixing prevention layer is required to be repeated three times. Therefore, the number of steps is large and the cost is high. Further, since a dye is used as a coloring agent, there is a disadvantage that reliability (weather resistance and heat resistance), which is an important issue of a color filter, is inferior.
Therefore, some color filters using a pigment as a coloring agent have been proposed, among which are an electrodeposition method, a printing method, and a photolithography method (photolithography method).

However, the electrodeposition method requires the formation of an electrode pattern. (1) The degree of freedom of the pattern is small.
(2) The cost is high, and the printing method has problems such as (1) it is difficult to align a large substrate and the resolution is low, so it is difficult to cope with miniaturization, and (2) the flatness of the pattern is poor. The photolithography method is considered to be the mainstream. For photolithography, liquid resists and films are contemplated. In the liquid resist, color pixels are formed by applying a varnish in which a pigment is dispersed in a photosensitive resin on a glass substrate with a spinner, drying, exposing, and developing. On the other hand, the film is a varnish formed into a film like the photosensitive film for printed boards, and after being laminated on a substrate, color pixels are formed by exposure and development.

[0007]

Since the photosensitive resist material containing a black material cannot increase the concentration of the black material, there is a limit in thinning the film. On the other hand, when the black matrix (light-shielding layer) is formed by the etching method, it is not necessary to impart photosensitivity to the light-shielding layer, so that the black material can be highly concentrated.
However, in the case of a system in which polyimide is used as the resin for the light-shielding layer, which is the main part of the conventional etching method, since the resist layer and the light-shielding layer having different solubilities are collectively developed and etched with alkali, a highly accurate pattern can be formed. Difficult to form. The present invention provides a method for producing a thin film and high optical density black matrix (light shielding layer).

[0008]

The present invention is a method for manufacturing a color filter in which a light-shielding layer and three colored pixels are sequentially formed on a transparent substrate, and the light-shielding layer is for forming a light-shielding layer containing alcohol-soluble polyamide. It is a method of manufacturing a color filter, which is characterized in that it is formed of a resin composition.

[0009]

BEST MODE FOR CARRYING OUT THE INVENTION In the present invention, by using an alcohol-soluble polyamide having excellent alkali resistance as a resin for a light-shielding layer, development of the resist layer and etching of the light-shielding layer can be performed separately (the resist layer is After development, the light-shielding layer is etched with acid or alcohol) to form a highly accurate pattern.

As the alcohol-soluble polyamide, a copolyamide synthesized from a dibasic fatty acid and a diamine, ω-amino acid, lactam or a derivative thereof by a known method can be used. As a typical example, 6 /
66, 6/66/610, 6/66/610/12, 6
Examples include copolymer nylons such as / 66/12, copolymers with 11-aminoundecanoic acid / azelaic acid / sebacic acid / piperazine, and sebacic acid / dodecanedioic acid / piperazine.

A resin composition for forming a light-shielding layer is prepared by dispersing a light-shielding material in a solution of the above alcohol-soluble polyamide. As the light-shielding material, black pigments such as carbon black, iron black, aniline black, cyanine black and titanium black, metal oxides such as iron tetroxide and metal sulfides,
Alternatively, a mixture thereof can be used. In addition, a black dye or a pigment other than black can be used together in order to improve the light-shielding property.

The resin composition for forming a light-shielding layer of the present invention may contain a thermosetting or heat-crosslinking compound in order to improve heat resistance and film strength. Such thermosetting,
As the heat-crosslinkable compound, urea resin, melamine resin, benzoguanamine resin, epoxy resin, phenol resin,
Examples thereof include hexamethylolmelamine, alkylated hexamethylolmelamine, partially methylolated melamine and alkylated products thereof, and polyfunctional unsaturated compounds. Further, a curing agent such as an amine compound or an acid anhydride may be blended in order to accelerate the thermal curing and the thermal crosslinking reaction.

[0013]

【Example】

Example 1 Carbon black REAGAL-400 manufactured by CABOT
9.6 g of R (trade name) and 6.4 g of alcohol-soluble polyamide MX-1603 (trade name) manufactured by Nippon Rilsan Co., Ltd.
84 g of n-butanol was dispersed in a planetary mill for 2 hours to obtain a dispersion paste. This dispersion paste was spin-coated on a washed and dried glass substrate, and the temperature was maintained at 120 ° C for 10 mi.
n was dried to obtain a coating film of 0.8 μm. A positive resist PMERP-6005C-3 (trade name) manufactured by Tokyo Ohka Kogyo Co., Ltd. was spin coated thereon and dried at 90 ° C. for 10 minutes to provide a resist layer of 1.5 μm. After exposure to ultraviolet light (60 mJ) from a high-pressure mercury lamp through a mask having a light-shielding pattern, it was immersed in a 0.5% NaOH aqueous solution for 60 seconds, rinsed with pure water, and developed. After that, dipping it in IPA for 90 seconds to etch the light shielding layer, and after exposing the entire surface, 2% Na
The resist layer remaining on the light shielding layer pattern was peeled off with an OH aqueous solution. As a result, a good light-shielding layer pattern was obtained, and its optical density was 2.5.

Example 2 Carbon black REAGAL-400 manufactured by CABOT
R (trade name) 12.8 g, Nippon Rilsan Co., Ltd. alcohol-soluble polyamide MX-1603 (trade name) 3.2
126 g of n-butanol was dispersed in a planetary mill for 2 hours to obtain a dispersion paste. 3.2 g of solid content of melamine resin (trade name, Melan 2000 manufactured by Hitachi Chemical Co., Ltd.) was added to this, and mixed and stirred to obtain a dispersion paste.
Then, in the same manner as in Example 1, a light shielding layer pattern was obtained. Further, the obtained light-shielding layer pattern was applied at 200 ° C. for 30
The melamine resin was completely cured by heat treatment for min. The film thickness of the light shielding layer after curing was 0.6 μm, and the optical density was 2.5.

[0015]

According to the present invention, it is possible to produce a black matrix (light-shielding layer) with a thin film and high optical density.

[Brief description of drawings]

FIG. 1 is a sectional view of a liquid crystal display.

[Explanation of symbols]

 1. 1. BM (black matrix) Glass substrate 3. Color pixels 4. 4. Overcoat layer (OC) Polarizing plate 6. ITO electrode 7. Color filter 8. Alignment film 9. Liquid crystal 10. Seal material 11. Top coat layer 12. ITO electrode 13. Glass substrate 14. Polarizer

Front page continuation (72) Inventor Tsutomu Sato 14 Goi Minamikaigan, Ichihara City, Chiba Hitachi Chemical Co., Ltd. Goi Factory

Claims (1)

[Claims] 1. A method of manufacturing a color filter in which a light-shielding layer and three colored pixels are sequentially formed on a transparent substrate, wherein the light-shielding layer is formed of a resin composition for forming a light-shielding layer containing alcohol-soluble polyamide. And method of manufacturing color filters.