JPH0971410A - Highly hygroscopic silica gel - Google Patents
Highly hygroscopic silica gelInfo
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- JPH0971410A JPH0971410A JP22684595A JP22684595A JPH0971410A JP H0971410 A JPH0971410 A JP H0971410A JP 22684595 A JP22684595 A JP 22684595A JP 22684595 A JP22684595 A JP 22684595A JP H0971410 A JPH0971410 A JP H0971410A
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- silica gel
- relative humidity
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- water
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- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Silicon Compounds (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、高吸湿性能を有す
るシリカゲルに関する。TECHNICAL FIELD The present invention relates to silica gel having high hygroscopicity.
【０００２】[0002]
【従来の技術】従来、一般的シリカゲルとしては、小細
孔直径、小細孔容積のＡ型シリカゲルと、大細孔直径、
大細孔容積のＢ型シリカゲルの２種が知られている。Ａ
型シリカゲルは、低湿度領域での水分吸着量が大きく、
Ｂ型シリカゲルは高湿度領域における水分吸着量が大き
いことを特徴としている。それぞれ、ＢＥＴ法による細
孔構造および２５℃における水分吸着平衡値として、概
略以下のような数値を有している。2. Description of the Related Art Conventionally, general silica gel has a small pore diameter and a small pore volume of A type silica gel, a large pore diameter,
Two types of large pore volume B-type silica gel are known. A
Type silica gel has a large amount of water adsorption in the low humidity range,
B-type silica gel is characterized in that it has a large water adsorption amount in a high humidity region. Each of them has the following numerical values as the pore structure by the BET method and the water adsorption equilibrium value at 25 ° C.
【０００３】[0003]
【表１】 Ａ型シリカゲル Ｂ型シリカゲル 細孔容積（ｃｍ3 ／ｇ） ０．４〜０．５ ０．６〜０．９５ 比表面積（ｍ2 ／ｇ） ７００〜８００ ４００〜６００ 平均細孔直径（ｎｍ） ２．０〜４．０ ５．０〜７．５[Table 1] A type silica gel B type silica gel Pore volume (cm 3 / g) 0.4 to 0.5 0.6 to 0.95 Specific surface area (m 2 / g) 700 to 800 400 to 600 Average pores Diameter (nm) 2.0-4.0 5.0-7.5
【０００４】[0004]
【表２】 ２５℃における水分平衡吸着値（重量％） Ａ型シリカゲル Ｂ型シリカゲル 相対湿度２０％ ９．０〜１２．０ ３．５〜 ６．５ 相対湿度５０％ ２５．０〜３１．０ ７．５〜１８．０ 相対湿度９０％ ３２．０〜４２．０ ４５．０〜７０．０[Table 2] Moisture equilibrium adsorption value (wt%) at 25 ° C A type silica gel B type silica gel 20% relative humidity 9.0 to 12.0 3.5 to 6.5 relative humidity 50% 25.0 to 31.0 7.5-18.0 Relative humidity 90% 32.0-42.0 45.0-70.0
【０００５】従来のシリカゲルにおいては、Ａ型シリカ
ゲルは高湿度領域での水分吸着量が小さいという欠点が
あった。Ｂ型シリカゲルは高湿度領域での吸湿量はＡ型
より大きいが、２５℃で相対湿度９０％での水分吸着量
は７０％に留まっている。Among the conventional silica gels, the A-type silica gel has a drawback that it has a small moisture adsorption amount in a high humidity region. The B-type silica gel has a higher moisture absorption amount in the high humidity region than that of the A-type silica gel, but the moisture adsorption amount at 25 ° C. and 90% relative humidity is 70%.
【０００６】[0006]
【発明が解決しようとする課題】本発明は、従来のシリ
カゲルに比較して、水分吸着量、特に高湿度での水分吸
着量の大きいシリカゲルを得ることを目的とする。SUMMARY OF THE INVENTION It is an object of the present invention to obtain a silica gel having a large amount of adsorbed water, particularly an amount of adsorbed water at high humidity, as compared with conventional silica gel.
【０００７】[0007]
【課題を解決するための手段】本発明は、ＢＥＴ式に基
づく窒素吸脱着法による細孔構造測定において、細孔容
積が１．０〜１．３ｃｍ3 ／ｇ、比表面積が７００〜８
００ｍ2 ／ｇ、平均細孔直径が５〜７．５ｎｍであり、
ＪＩＳ Ｚ０７０１に基づく２５℃における水分吸着平
衡値が相対湿度２０％において６．０〜１０．５重量
％、相対湿度５０％において１２．０〜２２．０重量
％、相対湿度９０％において８０．０〜１２０．０重量
％であるシリカゲルを提供する。Means for Solving the Problems The present invention has a pore volume of 1.0 to 1.3 cm 3 / g and a specific surface area of 700 to 8 in a pore structure measurement by a nitrogen adsorption / desorption method based on the BET formula.
00 m 2 / g, the average pore diameter is 5 to 7.5 nm,
The water adsorption equilibrium value at 25 ° C. based on JIS Z0701 is 6.0 to 10.5 wt% at 20% relative humidity, 12.0 to 22.0 wt% at 50% relative humidity, and 80.0 at 90% relative humidity. -120.0% by weight silica gel is provided.
【０００８】細孔構造はＢＥＴ式に基づく窒素吸脱着法
（以下、単にＢＥＴ法という）によって測定する。水分
吸着平衡値はＪＩＳ Ｚ０７０１に規定するところに従
い、温度２５±２．５℃において相対湿度がそれぞれ２
０％、５０％、９０％で４８時間シリカゲルを保持し、
シリカゲルの乾燥質量に対する吸着水分の質量を求め
る。The pore structure is measured by a nitrogen adsorption / desorption method based on the BET formula (hereinafter, simply referred to as BET method). The moisture adsorption equilibrium value is in accordance with JIS Z0701, and the relative humidity is 2 at a temperature of 25 ± 2.5 ° C.
Keep silica gel at 0%, 50%, 90% for 48 hours,
Calculate the mass of adsorbed water relative to the dry mass of silica gel.
【０００９】[0009]
【発明の実施の形態】本発明のシリカゲルは、上記物性
を有するものであれば製造方法は特に限定されないが、
具体的には次のような方法で製造できる。まず、ケイ酸
ナトリウム溶液に硫酸水溶液を混合し、直ちに噴霧ノズ
ルを用いて空気中に噴霧し液滴化し、それが空気中に浮
遊している間に液滴をゲル化させる。この、ゲル粒子を
水中でｐＨ６．０〜７．０に保ちながら、４５〜６５℃
で０．５〜１．５時間程度熟成を行う。次に、硫酸水溶
液でスラリーのｐＨを０．７〜１．３に保ちながら、温
度５〜３０℃で、２．５〜４．０時間程度中和を行う。
この結果含水シリカゲル（以下、生ゲルという）が得ら
れる。この後、中和生成塩を除去するために生ゲルを水
洗し、さらに固液分離し、乾燥してシリカゲルを得る。The method of producing the silica gel of the present invention is not particularly limited as long as it has the above physical properties.
Specifically, it can be manufactured by the following method. First, an aqueous solution of sulfuric acid is mixed with a sodium silicate solution, immediately sprayed in air using a spray nozzle to form droplets, and the droplets are gelled while they are suspended in the air. While maintaining the pH of the gel particles in water at 6.0 to 7.0, 45 to 65 ° C
And aging for 0.5 to 1.5 hours. Next, while maintaining the pH of the slurry at 0.7 to 1.3 with an aqueous sulfuric acid solution, neutralization is performed at a temperature of 5 to 30 ° C. for about 2.5 to 4.0 hours.
As a result, hydrous silica gel (hereinafter referred to as raw gel) is obtained. After that, the raw gel is washed with water to remove the salt produced by neutralization, and further solid-liquid separated, and dried to obtain silica gel.
【００１０】乾燥方法としては、数秒間で乾燥される気
流乾燥装置（フラッシュドライヤー）、数分〜数十分間
で乾燥される回転乾燥機（ロータリードライヤー）、数
時間で乾燥される皿型容器にシリカゲルをいれて箱型乾
燥機で乾燥させる方法が採用される。本発明のシリカゲ
ルの製造においては、上記細孔特性、水分吸着特性を付
与するためには、特に回転乾燥機が好適である。As a drying method, an air flow drying device (flash dryer) for drying in several seconds, a rotary dryer (rotary dryer) for drying in several minutes to several tens of minutes, and a dish type container for drying in several hours A method in which silica gel is put in and dried in a box dryer is adopted. In the production of the silica gel of the present invention, a rotary dryer is particularly suitable for imparting the above-mentioned pore characteristics and water adsorption characteristics.
【００１１】本発明のシリカゲルは、上記のような方法
で作成したシリカゲルと、公知のＡ型シリカゲルなどと
混合しても製造できる。この場合、低湿度領域における
水分吸着性能をさらに向上させることができる。The silica gel of the present invention can also be produced by mixing the silica gel prepared by the above method with a known A-type silica gel. In this case, the water adsorption performance in the low humidity region can be further improved.
【００１２】[0012]
例１ ケイ酸ナトリウム水溶液（ＳｉＯ2 ／Ｎａ2 Ｏ＝３．０
（モル比）、ＳｉＯ2換算濃度２０重量％）を１．４７
ｋｇ／ｍｉｎの流量で、２０重量％硫酸水溶液１．２６
ｋｇ／ｍｉｎの流量で連続的に供給混合して、直ちに噴
霧ノズルから空気中に噴霧し、噴霧された液滴が空気中
に浮遊中にゲル化させ、ゲル粒子を室温の水中に捕集し
た。この操作を５時間連続して行った。得られたゲル粒
子を、容量２ｍ3 の撹拌槽へ入れ、撹拌しながら、ｐＨ
約６．５、温度６０℃に保ちつつバッチ式で１時間熟成
を行った。次に、室温まで冷却し、上記撹拌槽に２０重
量％硫酸を添加して硫酸濃度を３重量％に調整し、温度
１０℃で３時間保持して中和した。Example 1 aqueous solution of sodium silicate (SiO 2 / Na 2 O = 3.0
(Molar ratio), SiO 2 conversion concentration 20% by weight) 1.47
20% by weight sulfuric acid aqueous solution 1.26 at a flow rate of kg / min
The mixture was continuously supplied and mixed at a flow rate of kg / min, and immediately sprayed into the air from a spray nozzle, and the sprayed droplets were gelated while floating in the air, and the gel particles were collected in water at room temperature. . This operation was continuously performed for 5 hours. The obtained gel particles are put into a stirring tank having a volume of 2 m 3 and stirred to adjust the pH.
While maintaining the temperature at about 6.5 and the temperature at 60 ° C., the aging was carried out in a batch system for 1 hour. Next, the mixture was cooled to room temperature, 20 wt% sulfuric acid was added to the stirring tank to adjust the sulfuric acid concentration to 3 wt%, and the mixture was kept at a temperature of 10 ° C. for 3 hours for neutralization.
【００１３】中和生成塩を除去するために、含水ゲルを
充分洗浄し、さらに固液分離して湿ケーキ（乾燥重量基
準の含水率３５０％）を得た。さらに回転乾燥機を用い
乾燥シリカゲル粉末を得た。乾燥機としては、円筒内径
０．４ｍ、円筒長さ４ｍの外熱式回転乾燥機（ロータリ
ードライヤー）を用い、湿ケーキを供給量４５ｋｇ／ｈ
で連続的に供給しながら、乾燥機内の平均滞留時間約２
０分、シリカゲルの温度（最高部）約１２０℃で連続的
に乾燥した。さらに、それを篩分けして、平均粒子径１
５０μｍ（粒子径幅４２〜２１０μｍ）のシリカゲル粉
末を得た。In order to remove the salt formed by neutralization, the hydrous gel was thoroughly washed, and solid-liquid separation was performed to obtain a wet cake (water content on a dry weight basis of 350%). Further, using a rotary dryer, dried silica gel powder was obtained. As the dryer, an external heat type rotary dryer (rotary dryer) having a cylinder inner diameter of 0.4 m and a cylinder length of 4 m was used, and a wet cake supply rate was 45 kg / h.
The average residence time in the dryer is about 2
It was continuously dried at a temperature of silica gel (maximum) of about 120 ° C. for 0 minutes. Furthermore, it is sieved and the average particle size is 1
A silica gel powder having a particle size of 50 μm (particle diameter width of 42 to 210 μm) was obtained.
【００１４】このシリカゲルについてＢＥＴ法細孔構造
測定では（日本ベル株式会社製、商品名ベルソープ２８
使用）細孔容積１．２４５ｃｍ3 ／ｇ、比表面積７３０
ｍ2ｇ、平均細孔直径６．８ｎｍであった。２５℃にお
ける水分平衡吸着値は、相対湿度２０％において９．９
重量％、相対湿度５０％において１８．７重量％、相対
湿度９０％において１０３．０重量％であった。For this silica gel, the BET method was used to measure the pore structure.
Use) Pore volume 1.245 cm 3 / g, specific surface area 730
m 2 g, average pore diameter 6.8 nm. Moisture equilibrium adsorption value at 25 ° C is 9.9 at 20% relative humidity.
It was 18.7% by weight at 50% relative humidity and 103.0% by weight at 90% relative humidity.
【００１５】例２ 生ゲルの生成工程において、熟成温度を５０℃、中和温
度を２５℃にした以外は例１と同様にして生ゲルを生成
し、中和生成塩を除去し固液分離して湿ケーキ（乾燥重
量基準の含水率３８０％）を得た。例１と同じ条件で乾
燥し、篩分けして、平均粒子径２５０μｍ（粒子径幅２
１０〜３５０μｍ）のシリカゲル粉末を得た。Example 2 A raw gel was produced in the same manner as in Example 1 except that the aging temperature was 50 ° C. and the neutralization temperature was 25 ° C. in the step of producing the raw gel. Thus, a wet cake (water content based on dry weight of 380%) was obtained. It was dried under the same conditions as in Example 1 and sieved to obtain an average particle size of 250 μm (particle size width 2
A silica gel powder of 10 to 350 μm) was obtained.
【００１６】このシリカゲルのＢＥＴ法細孔構造は、細
孔容積１．２６０ｃｍ3 ／ｇ、比表面積７４４ｍ2 ／
ｇ、平均細孔直径６．７ｎｍであった。２５℃における
水分平衡吸着値は、相対湿度２０％において７．１重量
％、相対湿度５０％において１７．４重量％、相対湿度
９０％において１０１．０重量％であった。The BET method pore structure of this silica gel has a pore volume of 1.260 cm 3 / g and a specific surface area of 744 m 2 /
g, and the average pore diameter was 6.7 nm. The water equilibrium adsorption value at 25 ° C. was 7.1% by weight at 20% relative humidity, 17.4% by weight at 50% relative humidity, and 101.0% by weight at 90% relative humidity.
【００１７】例３ 生ゲルの生成工程において、熟成温度を５５℃、中和温
度を２０℃にした以外は例１と同様にして生ゲルを生成
し、中和生成塩を除去し固液分離して湿ケーキ（乾燥重
量基準の含水率３５０％）を得た。例１と同じ条件で乾
燥し、篩分けして、平均粒子径１０５μｍ（粒子径幅４
２〜２１０μｍ）のシリカゲル粉末を得た。Example 3 In the step of producing a raw gel, a raw gel was produced in the same manner as in Example 1 except that the aging temperature was 55 ° C. and the neutralization temperature was 20 ° C. The neutralized salt was removed and solid-liquid separation was performed. A wet cake (water content on a dry weight basis of 350%) was obtained. It was dried under the same conditions as in Example 1 and sieved to obtain an average particle size of 105 μm (particle size width of 4 μm).
2 to 210 μm) of silica gel powder was obtained.
【００１８】このシリカゲルのＢＥＴ法細孔構造は、細
孔容積１．２１０ｃｍ3 ／ｇ、比表面積７４８ｍ2 ／
ｇ、平均細孔直径６．５ｎｍであった。２５℃における
水分平衡吸着値は、相対湿度２０％において６．８重量
％、相対湿度５０％において１７．２重量％、相対湿度
９０％において１１７．８重量％であった。The BET method pore structure of this silica gel has a pore volume of 1.210 cm 3 / g and a specific surface area of 748 m 2 /
g, and the average pore diameter was 6.5 nm. The water equilibrium adsorption value at 25 ° C. was 6.8% by weight at 20% relative humidity, 17.2% by weight at 50% relative humidity, and 117.8% by weight at 90% relative humidity.
【００１９】例４ 生ゲルの生成工程において、熟成温度を６０℃、中和温
度を２６℃にした以外は例１と同様にして生ゲルを生成
し、中和生成塩を除去し固液分離して湿ケーキ（乾燥重
量基準の含水率３５０％）を得た。例１と同じ条件で乾
燥し、篩分けして、平均粒子径７５μｍ（粒子径幅４２
〜１０５μｍ）のシリカゲル粉末を得た。Example 4 A raw gel was produced in the same manner as in Example 1 except that the aging temperature was 60 ° C. and the neutralization temperature was 26 ° C. in the step of producing the raw gel. A wet cake (water content on a dry weight basis of 350%) was obtained. It was dried under the same conditions as in Example 1 and sieved to give an average particle size of 75 μm (particle size width 42
˜105 μm) silica gel powder was obtained.
【００２０】このシリカゲルのＢＥＴ法細孔構造は、細
孔容積１．０８ｃｍ3 ／ｇ、比表面積７９７ｍ2 ／ｇ、
平均細孔直径５．４ｎｍであった。２５℃における水分
平衡吸着値は、相対湿度２０％において７．５重量％、
相対湿度５０％において１３．８重量％、相対湿度９０
％において１０４．６重量％であった。The BET method pore structure of this silica gel has a pore volume of 1.08 cm 3 / g, a specific surface area of 797 m 2 / g,
The average pore diameter was 5.4 nm. The moisture equilibrium adsorption value at 25 ° C is 7.5% by weight at a relative humidity of 20%,
13.8 wt% at 50% relative humidity, 90 relative humidity
% Was 104.6% by weight.
【００２１】例５ 生ゲルの生成工程において、熟成温度を５５℃、中和温
度を１７℃にした以外は例１と同様にして生ゲルを生成
し、中和生成塩を除去し固液分離して湿ケーキ（乾燥重
量基準の含水率３４０％）を得た。例１と同じ条件で乾
燥し、篩分けして、平均粒子径３５０μｍ（粒子径幅２
１０〜５００μｍ）のシリカゲル粉末を得た。Example 5 A raw gel was produced in the same manner as in Example 1 except that the aging temperature was 55 ° C. and the neutralization temperature was 17 ° C. in the step of producing the raw gel. Thus, a wet cake (water content based on dry weight of 340%) was obtained. It was dried under the same conditions as in Example 1 and sieved to obtain an average particle size of 350 μm (particle size width 2
10-500 μm) of silica gel powder was obtained.
【００２２】このシリカゲルのＢＥＴ法細孔構造は、細
孔容積１．２９ｃｍ3 ／ｇ、比表面積７００ｍ2 ／ｇ、
平均細孔直径７．４ｎｍであった。２５℃における水分
平衡吸着値は、相対湿度２０％において６．０重量％、
相対湿度５０％において１２．２重量％、相対湿度９０
％において８２．０重量％であった。The BET method pore structure of this silica gel has a pore volume of 1.29 cm 3 / g, a specific surface area of 700 m 2 / g,
The average pore diameter was 7.4 nm. The moisture equilibrium adsorption value at 25 ° C. was 6.0% by weight at a relative humidity of 20%,
12.2 wt% at 50% relative humidity, 90 relative humidity
% Was 82.0% by weight.
【００２３】例６ 例１のシリカゲル７０重量部に対し、平均粒子径２１０
μｍのＡ型シリカゲル（細孔容積０．４７ｃｍ3 ／ｇ、
比表面積７５０ｍ2 ／ｇ、平均細孔直径２．５ｎｍ）３
０重量部を混合して、平均粒子径１７０μｍのシリカゲ
ル粉末を得た。Example 6 70 parts by weight of the silica gel of Example 1 was used and the average particle size was 210
μm type A silica gel (pore volume 0.47 cm 3 / g,
Specific surface area 750 m 2 / g, average pore diameter 2.5 nm) 3
0 parts by weight were mixed to obtain a silica gel powder having an average particle diameter of 170 μm.
【００２４】このシリカゲルのＢＥＴ法細孔構造は、細
孔容積１．０１ｃｍ3 ／ｇ、比表面積７３６ｍ2 ／ｇ、
平均細孔直径５．５ｎｍであった。２５℃における水分
平衡吸着値は、相対湿度２０％において１０．３重量
％、相対湿度５０％において２１．５重量％、相対湿度
９０％において８２．５重量％であった。The BET pore structure of this silica gel has a pore volume of 1.01 cm 3 / g, a specific surface area of 736 m 2 / g,
The average pore diameter was 5.5 nm. The moisture equilibrium adsorption value at 25 ° C. was 10.3% by weight at 20% relative humidity, 21.5% by weight at 50% relative humidity, and 82.5% by weight at 90% relative humidity.
【００２５】[0025]
【発明の効果】本発明のシリカゲルは、低湿度領域およ
び中湿度領域での水分吸着量が一般のシリカゲルと比較
して同等以上であり、特に高湿度領域での水分吸着量が
大きい。吸着水分の脱着、再生を、常温でいわゆる天日
乾燥により効率良く行うのに適する。EFFECTS OF THE INVENTION The silica gel of the present invention has a water adsorption amount in the low humidity region and the medium humidity region which is equal to or more than that of general silica gel, and in particular, has a large water adsorption amount in the high humidity region. It is suitable for efficient desorption and regeneration of adsorbed water by so-called sun drying at room temperature.
フロントページの続き (72)発明者 藤原 賢二 福岡県北九州市若松区北湊町13番１号 洞 海化学工業株式会社内 (72)発明者 小野 英一 福岡県北九州市若松区北湊町13番１号 洞 海化学工業株式会社内 (72)発明者 山下 久雄 福岡県北九州市若松区北湊町13番１号 洞 海化学工業株式会社内Front page continuation (72) Kenji Fujiwara 13-1 Kitaminato-cho, Wakamatsu-ku, Kitakyushu-shi, Fukuoka Prefecture Dokai Chemical Industry Co., Ltd. (72) Eiichi Ono 13-1 Kitaminato-cho, Wakamatsu-ku, Kitakyushu, Fukuoka (72) Inventor Hisao Yamashita 13-1 Kitaminato-cho, Wakamatsu-ku, Kitakyushu City, Fukuoka Prefecture In-kai Chemical Industry Co., Ltd.
Claims (1)
構造測定において、細孔容積が１．０〜１．３ｃｍ3 ／
ｇ、比表面積が７００〜８００ｍ2 ／ｇ、平均細孔直径
が５〜７．５ｎｍであり、ＪＩＳ Ｚ０７０１に基づく
２５℃における水分吸着平衡値が相対湿度２０％におい
て６．０〜１０．５重量％、相対湿度５０％において１
２．０〜２２．０重量％、相対湿度９０％において８
０．０〜１２０．０重量％であるシリカゲル。1. In the pore structure measurement by the nitrogen adsorption / desorption method based on the BET formula, the pore volume is 1.0 to 1.3 cm 3 /
g, specific surface area is 700 to 800 m 2 / g, average pore diameter is 5 to 7.5 nm, and water adsorption equilibrium value at 25 ° C. based on JIS Z0701 is 6.0 to 10.5 weight at a relative humidity of 20%. %, Relative humidity 50% 1
8 at 2.0 to 22.0 wt% and 90% relative humidity
Silica gel of 0.0-120.0% by weight.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22684595A JPH0971410A (en) | 1995-09-04 | 1995-09-04 | Highly hygroscopic silica gel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22684595A JPH0971410A (en) | 1995-09-04 | 1995-09-04 | Highly hygroscopic silica gel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0971410A true JPH0971410A (en) | 1997-03-18 |
Family
ID=16851475
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22684595A Pending JPH0971410A (en) | 1995-09-04 | 1995-09-04 | Highly hygroscopic silica gel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0971410A (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1070679A1 (en) * | 1999-07-23 | 2001-01-24 | Asahi Glass Company Ltd. | Fine particulate silica gel and fine particulate silical gel internally containing microparticles of a metal compound |
| JP2005034838A (en) * | 2003-07-03 | 2005-02-10 | Matsushita Electric Ind Co Ltd | Dehumidifier |
| WO2005123225A1 (en) * | 2004-06-17 | 2005-12-29 | Matsushita Electric Industrial Co., Ltd. | Dehumidifier |
| JP2008048650A (en) * | 2006-08-23 | 2008-03-06 | Daicel Chem Ind Ltd | Tobacco filter material composed of polysaccharide containing amino group and silica gel, and tobacco filter using the same. |
| JP2008154509A (en) * | 2006-12-25 | 2008-07-10 | Daicel Chem Ind Ltd | Filter material made of porous material and cigarette filter using the same |
| JP2013053063A (en) * | 2012-11-15 | 2013-03-21 | Nichias Corp | Method for producing silica gel |
| JP2014172771A (en) * | 2013-03-07 | 2014-09-22 | Ube Exsymo Co Ltd | Composite particle and production method thereof |
| US9057008B2 (en) | 2012-08-24 | 2015-06-16 | Panasonic Intellectual Property Management Co., Ltd. | Porous silica material and optical microphone |
-
1995
- 1995-09-04 JP JP22684595A patent/JPH0971410A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1070679A1 (en) * | 1999-07-23 | 2001-01-24 | Asahi Glass Company Ltd. | Fine particulate silica gel and fine particulate silical gel internally containing microparticles of a metal compound |
| US6495257B1 (en) | 1999-07-23 | 2002-12-17 | Asahi Glass Company, Limited | Fine particulate silica gel and fine particulate silica gel internally containing microparticles of a metal compound |
| JP2005034838A (en) * | 2003-07-03 | 2005-02-10 | Matsushita Electric Ind Co Ltd | Dehumidifier |
| WO2005123225A1 (en) * | 2004-06-17 | 2005-12-29 | Matsushita Electric Industrial Co., Ltd. | Dehumidifier |
| JP2008048650A (en) * | 2006-08-23 | 2008-03-06 | Daicel Chem Ind Ltd | Tobacco filter material composed of polysaccharide containing amino group and silica gel, and tobacco filter using the same. |
| JP2008154509A (en) * | 2006-12-25 | 2008-07-10 | Daicel Chem Ind Ltd | Filter material made of porous material and cigarette filter using the same |
| US9057008B2 (en) | 2012-08-24 | 2015-06-16 | Panasonic Intellectual Property Management Co., Ltd. | Porous silica material and optical microphone |
| JP2013053063A (en) * | 2012-11-15 | 2013-03-21 | Nichias Corp | Method for producing silica gel |
| JP2014172771A (en) * | 2013-03-07 | 2014-09-22 | Ube Exsymo Co Ltd | Composite particle and production method thereof |
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