JPH0973675A - Production of substrate for magneto-optical recording medium and substrate for magneto-optical recording medium formed by using this process - Google Patents
Production of substrate for magneto-optical recording medium and substrate for magneto-optical recording medium formed by using this processInfo
- Publication number
- JPH0973675A JPH0973675A JP7224394A JP22439495A JPH0973675A JP H0973675 A JPH0973675 A JP H0973675A JP 7224394 A JP7224394 A JP 7224394A JP 22439495 A JP22439495 A JP 22439495A JP H0973675 A JPH0973675 A JP H0973675A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- magneto
- optical recording
- less
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 52
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 238000000034 method Methods 0.000 title claims description 7
- 229920000515 polycarbonate Polymers 0.000 claims abstract description 37
- 239000004417 polycarbonate Substances 0.000 claims abstract description 37
- 239000011347 resin Substances 0.000 claims abstract description 22
- 229920005989 resin Polymers 0.000 claims abstract description 22
- 238000002347 injection Methods 0.000 claims abstract description 21
- 239000007924 injection Substances 0.000 claims abstract description 21
- 238000010438 heat treatment Methods 0.000 claims abstract description 16
- 238000001816 cooling Methods 0.000 claims abstract description 15
- 238000001746 injection moulding Methods 0.000 claims abstract description 13
- 238000000465 moulding Methods 0.000 claims description 6
- 238000002844 melting Methods 0.000 claims 2
- 230000008018 melting Effects 0.000 claims 2
- 239000010410 layer Substances 0.000 abstract description 15
- 239000011241 protective layer Substances 0.000 abstract description 7
- 230000003287 optical effect Effects 0.000 abstract description 3
- 238000009792 diffusion process Methods 0.000 abstract description 2
- 238000003848 UV Light-Curing Methods 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 230000002035 prolonged effect Effects 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
- 238000012546 transfer Methods 0.000 description 7
- 229910052723 transition metal Inorganic materials 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000005415 magnetization Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920005668 polycarbonate resin Polymers 0.000 description 2
- 239000004431 polycarbonate resin Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910017150 AlTi Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000005421 thermomagnetic effect Effects 0.000 description 1
Landscapes
- Moulds For Moulding Plastics Or The Like (AREA)
- Injection Moulding Of Plastics Or The Like (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、高密度記録の光磁
気記録媒体用基板の製造方法と、その製造方法により成
形した光磁気記録媒体用基板に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a substrate for a magneto-optical recording medium for high density recording and a substrate for a magneto-optical recording medium molded by the manufacturing method.
【0002】[0002]
【従来の技術】光磁気記録媒体を用いた情報の記録、消
去及び再生は、基板上に形成した希土類−遷移金属アモ
ルファス層に、ビーム径を1〜1.5μm程度に絞った
レーザビームを照射して熱磁気効果により行っている。
希土類−遷移金属アモルファス層はスパッタ法,イオン
プレーティング法等により形成され、ガラス板、アクリ
ル樹脂、ポリカーボネート樹脂、アルミニウム,シリコ
ンウェハのような金属等が基板として提案されている
が、ディスクの特性、取扱性、機能性、信頼性等を考慮
した結果、現在では、殆どポリカーボネートが使用され
ているのが現状である。2. Description of the Related Art For recording, erasing and reproducing information using a magneto-optical recording medium, a rare earth-transition metal amorphous layer formed on a substrate is irradiated with a laser beam having a beam diameter of about 1 to 1.5 μm. Then, the thermomagnetic effect is used.
The rare earth-transition metal amorphous layer is formed by a sputtering method, an ion plating method, or the like, and a glass plate, an acrylic resin, a polycarbonate resin, aluminum, or a metal such as a silicon wafer is proposed as a substrate. As a result of considering handleability, functionality, reliability, etc., it is the current situation that polycarbonate is mostly used at present.
【0003】ディスクを作製するには、まず、ポリカー
ボネート基板を成形する必要があるが、この基板の成形
は一般に、図1に示す射出成形(射出圧縮成形を含む。
以下同じ)によって行っている。図1(a)に示すよう
にペレット状のポリカーボネート樹脂を加熱筒温度4t
が300〜350℃に設定された加熱筒4に入れて溶解
樹脂3を作製する。次に、図1(b)に示すように、型
締シリンダ5を用いて、圧力2pでスタンパ1’を金型
1に圧縮させた状態で加熱筒4を金型1にタッチさせ、
スクリュ3cにより溶解樹脂3を金型1に充填する。最
後に、図1(c)に示すように材料をチャージし、金型
を開いて製品2を取り出す。これが、一般的な射出成形
の工程であり、この工程においては、金型1の温度1
t,溶解樹脂3の射出速度3’,スタンパ1’を圧縮す
る型締圧力2p,加熱筒温度4t及び、冷却時間が基板
の成形にとって重要なファクターとなる。To make a disc, it is first necessary to mold a polycarbonate substrate, which is typically molded by injection molding (injection compression molding) as shown in FIG.
The same shall apply hereinafter). As shown in FIG. 1 (a), pelletized polycarbonate resin is heated to a heating cylinder temperature of 4 t.
Is put in the heating cylinder 4 whose temperature is set to 300 to 350 ° C. to produce the dissolved resin 3. Next, as shown in FIG. 1 (b), using the mold clamping cylinder 5, the heating cylinder 4 is touched on the mold 1 while the stamper 1 ′ is compressed to the mold 1 at a pressure of 2 p,
The molten resin 3 is filled in the mold 1 with the screw 3c. Finally, as shown in FIG. 1C, the materials are charged, the mold is opened, and the product 2 is taken out. This is a general injection molding process, in which the temperature of the mold 1 is
t, the injection speed 3'of the molten resin 3, the mold clamping pressure 2p for compressing the stamper 1 ', the heating cylinder temperature 4t, and the cooling time are important factors for the molding of the substrate.
【0004】光磁気記録ディスクなどの記録可能な光デ
ィスクを射出成形により作製する場合は、情報を凹凸の
ピットで記録するコンパクトディスクなどの再生専用型
光ディスクに比べ、ピットではなくグルーブを形成する
のが一般的であるが、このグルーブのポリカーボネート
への転写はピットの場合より困難である。例えば、コン
パクトディスクの場合は、金型温度90℃,型締圧力3
0kg/cm2(印加する圧力を成形するディスクの面積
で除したものを型締圧力として定義する。以下同じ),
加熱筒温度335℃,射出速度150mm/s,冷却時
間3.8秒の条件でピットを90%以上で転写できる
が、同一条件でグルーブを転写しようとすると、殆ど転
写されない。そこで、主に金型温度を高くし、型締圧力
を強くし、さらに冷却時間を長くした金型温度110
℃,型締圧力100kg/cm2,加熱筒温度350℃,
射出速度150mm/s,冷却時間7秒の条件で射出成
形すると、図2に示すようなグルーブを有したポリカー
ボネート基板を成形することができる。図2は成形した
基板の表面を原子間力顕微鏡(AFM)で測定した結果
である。図2(b)のデータからグルーブの底部分のコ
ーナーとランドのコーナーでの曲率半径を計算すると1
00nmと大きい。このポリカーボネート基板上に希土
類−遷移金属アモルファスを記録層に用いた光磁気ディ
スクを作製し、この光磁気ディスクに記録した情報をD
C結合で再生した結果、図3に示すようにRF信号のエ
ンベロープの変動が大きく、信号/雑音比(CN比)が
42.1dBと小さかった。このように、RF信号のエ
ンベロープの変動が大きく、CN比が小さくなる要因を
調べた結果、上記のコーナーでの曲率半径が大きいこと
の他に、ポリカーボネート基板の複屈折が大きく(60
nm)、複屈折の周方向の変動も大きい(30nm)こ
とがわかった。When a recordable optical disk such as a magneto-optical recording disk is manufactured by injection molding, it is preferable to form a groove instead of a pit, as compared with a read-only optical disk such as a compact disk in which information is recorded with uneven pits. As is typical, transfer of this groove to polycarbonate is more difficult than in the case of pits. For example, in the case of a compact disc, the mold temperature is 90 ° C and the mold clamping pressure is 3
0 kg / cm 2 (the applied pressure divided by the area of the disk to be molded is defined as the mold clamping pressure. The same applies hereinafter),
The pits can be transferred at 90% or more under the conditions of the heating cylinder temperature of 335 ° C., the injection speed of 150 mm / s, and the cooling time of 3.8 seconds, but when the grooves are transferred under the same conditions, they are hardly transferred. Therefore, the mold temperature 110 is mainly set by increasing the mold temperature, increasing the mold clamping pressure, and further increasing the cooling time.
℃, mold clamping pressure 100kg / cm 2 , heating cylinder temperature 350 ℃,
When injection molding is performed under the conditions of an injection speed of 150 mm / s and a cooling time of 7 seconds, a polycarbonate substrate having a groove as shown in FIG. 2 can be molded. FIG. 2 shows the results of measuring the surface of the molded substrate with an atomic force microscope (AFM). When the radii of curvature at the corner of the groove and the corner of the land are calculated from the data in FIG.
It is as large as 00 nm. A magneto-optical disk using a rare earth-transition metal amorphous as a recording layer was prepared on this polycarbonate substrate, and the information recorded on this magneto-optical disk was recorded as D.
As a result of reproduction by C coupling, as shown in FIG. 3, the fluctuation of the envelope of the RF signal was large and the signal / noise ratio (CN ratio) was as small as 42.1 dB. As described above, as a result of investigating the factors in which the fluctuation of the RF signal envelope is large and the CN ratio is small, in addition to the large radius of curvature at the corners, the birefringence of the polycarbonate substrate is large (60
It was found that the fluctuation of birefringence in the circumferential direction was large (30 nm).
【0005】[0005]
【発明が解決しようとする課題】前述したように、希土
類−遷移金属アモルファスを記録層に用いた光磁気記録
ディスク用の基板であるポリカーボネートの射出成形に
おいては、スタンパからポリカーボネート基板へのグル
ーブの転写率が低いために、グルーブの底部分のコーナ
ーとランドのコーナーでの曲率半径が大きくなってい
た。また、従来条件では、グルーブの底部分のコーナー
とランドのコーナーでの曲率半径が小さく、ポリカーボ
ネート基板の複屈折が小さく、且つその周方向の変動が
小さいポリカーボネート基板は得られなかった。これが
結果的に再生時のRF信号のエンベロープの変動を大き
くし、記録,再生におけるCN比を小さくしていた。ま
た、この問題は、グルーブの形成幅を示すトラックピッ
チを1.4μmから0.8μmと狭くした時に、より顕
著な問題となっていた。As described above, in injection molding of polycarbonate, which is a substrate for a magneto-optical recording disk using a rare earth-transition metal amorphous as a recording layer, transfer of a groove from a stamper to a polycarbonate substrate is performed. Due to the low ratio, the radius of curvature was large at the bottom corner of the groove and at the land corner. Further, under the conventional conditions, it was not possible to obtain a polycarbonate substrate having a small radius of curvature at the corner of the groove bottom and a corner of the land, a small birefringence of the polycarbonate substrate, and a small fluctuation in the circumferential direction. As a result, the fluctuation of the RF signal envelope during reproduction was increased, and the CN ratio during recording and reproduction was decreased. Further, this problem has become more significant when the track pitch, which indicates the groove formation width, is narrowed from 1.4 μm to 0.8 μm.
【0006】従って、本発明は、トラックピッチが狭い
時に顕著になる上記の問題点を解決するためにコーナー
での曲率半径が小さく、ポリカーボネート基板の複屈折
が小さく、且つその周方向での変動が小さいポリカーボ
ネート基板の製造方法を提供し、この製造方法で成形し
たポリカーボネート基板を用いた光磁気記録ディスクに
おいて、記録、再生時のCN比が大きく、再生時のRF
信号のエンベロープの変動を小さくすることを明確にす
るものである。Therefore, according to the present invention, in order to solve the above problems which become remarkable when the track pitch is narrow, the radius of curvature at the corner is small, the birefringence of the polycarbonate substrate is small, and the fluctuation in the circumferential direction is small. Provided is a method for manufacturing a small polycarbonate substrate, and a magneto-optical recording disk using the polycarbonate substrate molded by this manufacturing method has a large CN ratio at the time of recording and reproducing, and an RF at the time of reproducing.
It is clarified to reduce the fluctuation of the signal envelope.
【0007】[0007]
【課題を解決するための手段】上述した課題を解決する
ために、従来よりポリカーボネート基板の射出成形時の
金型温度と加熱筒温度を高くし、型締圧力を強くし、樹
脂射出速度を速くし、さらに、冷却時間を長くした。In order to solve the above-mentioned problems, the mold temperature and the heating cylinder temperature at the time of injection molding of a polycarbonate substrate are made higher, the mold clamping pressure is made stronger, and the resin injection speed is made faster than before. In addition, the cooling time was extended.
【0008】[0008]
【実施の形態】本発明の実施形態を図と表を参照しつつ
説明する。ポリカーボネート基板の射出成形には、図1
に示すように金型温度1t、型締圧力2p、樹脂射出速
度3’、加熱筒温度4t、及び冷却時間が大きな影響を
与えるが、本実施例では、トラックピッチを1.4μ
m,グルーブとランドの幅を1:1とし、表1の実施例
1の条件で成形した。成形した基板の転写率をスタンパ
のグルーブ深さに対するポリカーボネート基板のグルー
ブの深さの比で表すと、90%以上と高い転写率が得ら
れた。この基板の表面状態をAFMで測定した結果を図
4に示す。図4(b)のAFMデータよりグルーブとラ
ンドのコーナーでの曲率半径を算出した結果、35nm
であった。また、この基板の複屈折を波長633nmの
He−Neレーザを用いて測定した結果、絶対値の最大
値は22nm(ダブルパス)であり、且つ、周方向の変
動は8nm以下であった。Embodiments of the present invention will be described with reference to the drawings and tables. For injection molding of a polycarbonate substrate, see Figure 1.
As shown in, the mold temperature 1t, the mold clamping pressure 2p, the resin injection speed 3 ', the heating cylinder temperature 4t, and the cooling time have great influences, but in the present embodiment, the track pitch is 1.4μ.
m, the width of the groove and the land were set to 1: 1 and molding was performed under the conditions of Example 1 in Table 1. When the transfer rate of the molded substrate was expressed by the ratio of the groove depth of the polycarbonate substrate to the groove depth of the stamper, a high transfer rate of 90% or more was obtained. The results of measuring the surface condition of this substrate by AFM are shown in FIG. As a result of calculating the radii of curvature at the corners of the groove and the land from the AFM data of FIG.
Met. The birefringence of this substrate was measured using a He-Ne laser with a wavelength of 633 nm. As a result, the maximum absolute value was 22 nm (double pass), and the fluctuation in the circumferential direction was 8 nm or less.
【0009】このポリカーボネート基板上に図5に示す
構造の光磁気記録ディスク20を作製した。即ち、基板
6上に保護層としてSiN7を1100Å、GdDyF
eCoアモルファス垂直磁化膜8を300Å、保護層と
してSiN9を500Å、反射層兼熱拡散層としてAl
Ti10を500Å、紫外線硬化型樹脂からなるオーバ
ーコート層11を10μm、順次、堆積した構造であ
る。また、SiN7,9、GdDyFeCoアモルファ
ス垂直磁化膜8、AlTi10の各層は、いずれもスパ
ッタ法により堆積し、オーバーコート層11はスピンコ
ートにより形成した。保護層としてのSiN7,9、G
dDyFeCoアモルファス垂直磁化膜8、AlTi1
0の各層のスパッタ条件を表1に示す。今回、示した条
件で作製した光磁気ディスクにおいては、ポリカーボネ
ート基板の表面状態を反映して各層が堆積することを、
グルーブの底部分のコーナーとランドのコーナーでの曲
率半径等から確認している。A magneto-optical recording disk 20 having the structure shown in FIG. 5 was produced on this polycarbonate substrate. That is, 1100Å SiN7 as a protective layer on the substrate 6, GdDyF
eCo amorphous perpendicular magnetization film 8 300 Å, SiN 9 500 Å as a protective layer, Al as a reflection layer and a heat diffusion layer
The structure is such that Ti 10 is 500 Å and an overcoat layer 11 made of an ultraviolet curable resin is sequentially deposited to 10 μm. In addition, each of the layers of SiN 7, 9 and the GdDyFeCo amorphous perpendicular magnetization film 8 and AlTi 10 was deposited by a sputtering method, and the overcoat layer 11 was formed by spin coating. SiN7,9, G as a protective layer
dDyFeCo amorphous perpendicular magnetic film 8, AlTi1
Table 1 shows the sputtering conditions for each layer of No. 0. In the magneto-optical disk manufactured under the conditions shown this time, each layer is deposited reflecting the surface condition of the polycarbonate substrate.
The radius of curvature at the corner of the groove and the corner of the land are used for confirmation.
【0010】[0010]
【表1】 [Table 1]
【0011】作製した光磁気ディスクにレーザー波長8
30nm,記録線速度2m/s,記録レーザーパワー
4.0mW,キャリア周波数500kHz,トラックピ
ッチ1.4μmの条件で光磁気記録を行い、その情報を
DC結合で再生したRF出力の出力波形は図6に示すよ
うに均一なエンベロープ波形が得られ、その変動割合
は、5%以内であった。また、CN比は45.2dB
で、光磁気記録に十分使用できる値である。A laser wavelength of 8 was added to the manufactured magneto-optical disk.
Magneto-optical recording was performed under the conditions of 30 nm, recording linear velocity 2 m / s, recording laser power 4.0 mW, carrier frequency 500 kHz and track pitch 1.4 μm, and the output waveform of the RF output obtained by reproducing the information by DC coupling is shown in FIG. As shown in (1), a uniform envelope waveform was obtained, and the variation rate was within 5%. Also, the CN ratio is 45.2 dB.
This is a value that can be sufficiently used for magneto-optical recording.
【0012】次に、トラックピッチを1.2,1.0,
0.8μmとした場合について示す。ポリカーボネート
基板の作製条件は、トラックピッチが1.2,1.0,
0.8μmに対して、それぞれ、表2の実施例2,実施
例3,実施例4が対応する。成形したポリカーボネート
基板においては、いずれの場合も実施例1と同様に90
%以上の高い転写率であった。各条件で作成したポリカ
ーボネート基板上に実施例1と同様の条件で保護層7,
9、GdDyFeCoアモルファス垂直磁化膜8、Al
Ti10等を形成し、曲率半径、CN比等の物性を測定
した結果、表3に示すように、いずれの場合も、曲率半
径は50nm以下、複屈折は25nm以下、複屈折の周
方向の変動は10nm以下であり、実施例1の場合と同
様の結果が得られた。また、記録、再生特性を表すCN
比は従来の値より大きなCN比が得られ、RF変動も5
%以下と小さい。Next, the track pitch is set to 1.2, 1.0,
The case where the thickness is 0.8 μm is shown. The conditions for producing the polycarbonate substrate are that the track pitch is 1.2, 1.0,
Example 2, Example 3, and Example 4 in Table 2 correspond to 0.8 μm, respectively. In the case of the molded polycarbonate substrate, as in Example 1, 90
The transfer rate was higher than%. Under the same conditions as in Example 1, the protective layer 7 was formed on the polycarbonate substrate prepared under the respective conditions.
9, GdDyFeCo amorphous perpendicular magnetization film 8, Al
As a result of measuring physical properties such as radius of curvature and CN ratio by forming Ti10 and the like, as shown in Table 3, in any case, the radius of curvature is 50 nm or less, the birefringence is 25 nm or less, and the birefringence changes in the circumferential direction. Is 10 nm or less, and the same result as in the case of Example 1 was obtained. In addition, CN representing recording and reproducing characteristics
The ratio is larger than the conventional value, and the RF fluctuation is 5
% Or less.
【0013】[0013]
【表2】 [Table 2]
【0014】[0014]
【表3】 [Table 3]
【0015】以上、述べたように表2の条件で成形する
ことにより、表3に示すようにトラックピッチの狭い領
域0.8〜1.4μmにおいて初期の目的を達成するこ
とができた。また、表3はスタンパのグルーブの深さが
約70nmの場合について示したが、スタンパのグルー
ブの深さが50〜140nmの範囲で表2の条件は有効
である。As described above, by molding under the conditions shown in Table 2, it was possible to achieve the initial purpose in the narrow track pitch region 0.8 to 1.4 μm as shown in Table 3. Further, although Table 3 shows the case where the depth of the groove of the stamper is about 70 nm, the conditions of Table 2 are effective when the depth of the groove of the stamper is in the range of 50 to 140 nm.
【0016】ポリカーボネート基板の射出成形の条件を
表2の条件以外にも検討した。その結果を表4に示す。
表4中の評価の欄で○はグルーブの底部分とランドのコ
ーナーでの曲率半径が50nm以下、ポリカーボネート
基板の複屈折が40nm以下、その複屈折の周方向の変
動が10nm以下であることを同時に満たすことを示
す。また、×は曲率半径が50nm以下、複屈折が40
nm以下、その複屈折の変動が10nm以下であること
のうち1つでも基準値を越える事を示す。金型温度が1
35℃,樹脂射出速度が150mm/s,冷却時間が1
0秒の場合には、型締圧力が200,250kg/cm
2では、曲率半径が50nm以下,複屈折が40nm以
下,その複屈折の変動が10nm以下を同時に満たさ
ず、300kg/cm2で、曲率半径が50nm以下,
複屈折が40nm以下,その複屈折の変動が10nm以
下を同時に満たす。しかし、この条件でも、樹脂射出速
度を150mm/sから300mm/sに速くすると曲
率半径が50nm以下,複屈折が40nm以下,その複
屈折の変動が10nm以下を同時に満たさなくなる。ま
た、金型温度が130℃,樹脂射出速度が150mm/
s,冷却時間が9秒の場合には、金型温度が135℃の
時、曲率半径が50nm以下,複屈折が40nm以下,
その複屈折の変動が10nm以下を同時に満たさなかっ
た250kg/cm2の型締圧力でも曲率半径が50n
m以下,複屈折が40nm以下,その複屈折の変動が1
0nm以下を同時に満たす。しかし、この場合も、樹脂
射出速度を150mm/sから200,300mm/s
と速くすると曲率半径が50nm以下,複屈折が40n
m以下,その複屈折の変動が10nm以下を同時に満た
さなくなる。さらに、金型温度が120℃,樹脂射出速
度が150mm/s,冷却時間が11秒の場合には、金
型温度130℃の時、曲率半径が50nm以下,複屈折
が40nm以下,その複屈折の変動が10nm以下を同
時に満たさなかった200kg/cm2の型締圧力でも
曲率半径が50nm以下,複屈折が40nm以下,その
複屈折の変動が10nm以下を同時に満たすようにな
る。この条件では、冷却時間を11秒から9秒に短縮し
ても曲率半径が50nm以下,複屈折が40nm以下,
その複屈折の変動が10nm以下を同時に満たすが、冷
却時間をさらに8.5秒に短縮すると型締圧力を25
0,300kg/cm2と強くしても曲率半径が50n
m以下,複屈折が40nm以下,その複屈折の変動が1
0nm以下を同時に満たさなくなる。金型温度が120
℃,樹脂射出速度が150mm/s,冷却時間が9秒の
条件において、樹脂射出速度を150mm/sから25
0mm/sと速くしても曲率半径が50nm以下,複屈
折が40nm以下,その複屈折の変動が10nm以下を
同時に満たす。現在、金型温度110℃においては、曲
率半径が50nm以下,複屈折が40nm以下,その複
屈折の変動が10nm以下を同時に満たす条件はない。The conditions for injection molding of the polycarbonate substrate were examined in addition to the conditions shown in Table 2. The results are shown in Table 4.
In the column of evaluation in Table 4, ◯ means that the radius of curvature at the bottom of the groove and the corner of the land is 50 nm or less, the birefringence of the polycarbonate substrate is 40 nm or less, and the fluctuation of the birefringence in the circumferential direction is 10 nm or less. Indicates that they are satisfied at the same time. Also, x has a radius of curvature of 50 nm or less and a birefringence of 40.
nm or less, and even if the fluctuation of the birefringence is 10 nm or less, it means that at least one exceeds the reference value. Mold temperature is 1
35 ℃, resin injection speed 150mm / s, cooling time 1
In the case of 0 seconds, the mold clamping pressure is 200,250 kg / cm
In 2 , the radius of curvature is 50 nm or less, the birefringence is 40 nm or less, the fluctuation of the birefringence is not 10 nm or less at the same time, and 300 kg / cm 2 , the radius of curvature is 50 nm or less,
The birefringence is 40 nm or less and the fluctuation of the birefringence is 10 nm or less at the same time. However, even under this condition, when the resin injection speed is increased from 150 mm / s to 300 mm / s, the radius of curvature is 50 nm or less, the birefringence is 40 nm or less, and the variation of the birefringence is 10 nm or less at the same time. Also, the mold temperature is 130 ° C, the resin injection speed is 150 mm /
s, when the cooling time is 9 seconds, when the mold temperature is 135 ° C., the radius of curvature is 50 nm or less, the birefringence is 40 nm or less,
Even if the mold clamping pressure of 250 kg / cm 2 where the fluctuation of the birefringence did not satisfy 10 nm or less at the same time, the radius of curvature was 50 n.
m or less, birefringence 40 nm or less, fluctuation of the birefringence is 1
0 nm or less is simultaneously satisfied. However, even in this case, the resin injection speed is changed from 150 mm / s to 200,300 mm / s.
Radius of curvature of 50 nm or less and birefringence of 40 n
m or less, the fluctuation of the birefringence does not simultaneously satisfy 10 nm or less. Further, when the mold temperature is 120 ° C., the resin injection speed is 150 mm / s, and the cooling time is 11 seconds, when the mold temperature is 130 ° C., the radius of curvature is 50 nm or less, the birefringence is 40 nm or less, and the birefringence thereof is Even when the mold clamping pressure is 200 kg / cm 2 which does not satisfy the fluctuation of 10 nm or less at the same time, the radius of curvature is 50 nm or less, the birefringence is 40 nm or less, and the fluctuation of the birefringence is 10 nm or less at the same time. Under this condition, even if the cooling time is reduced from 11 seconds to 9 seconds, the radius of curvature is 50 nm or less, the birefringence is 40 nm or less,
The fluctuation of the birefringence simultaneously satisfies 10 nm or less, but if the cooling time is further reduced to 8.5 seconds, the mold clamping pressure becomes 25
Even if it is as strong as 0,300 kg / cm 2 , the radius of curvature is 50 n.
m or less, birefringence 40 nm or less, fluctuation of the birefringence is 1
0 nm or less cannot be satisfied at the same time. Mold temperature is 120
℃, resin injection speed 150mm / s, cooling time 9 seconds, the resin injection speed from 150mm / s to 25
Even at a high speed of 0 mm / s, the radius of curvature is 50 nm or less, the birefringence is 40 nm or less, and the variation of the birefringence is 10 nm or less at the same time. At present, at a mold temperature of 110 ° C., there is no condition that the radius of curvature is 50 nm or less, the birefringence is 40 nm or less, and the variation of the birefringence is 10 nm or less at the same time.
【0017】[0017]
【表4】 [Table 4]
【0018】実際のディスクにおいては、一枚のディス
ク内での均一性が重要となる。そこで、ディスクの特性
に大きく影響を与えるポリカーボネート基板成形時の転
写率の均一性について調べた。用いたディスクの直径は
120mmΦである。本発明における転写率について
は、半径22mmで周方向のばらつきは3.0%,半径
38mmで周方向のばらつきは3.1%,半径50mm
で周方向のばらつきは2.9%であり、半径方向のばら
つきは、半径25〜55mmの範囲で5%以下であっ
た。次に、本発明と従来例におけるポリカーボネート基
板の複屈折の各半径における周方向の変動を表5に示
す。表5で変動の値は、ある半径において周方向の8点
で測定して変動値を求めた。本発明では、半径23〜5
4mmの領域で変動が11nm以下と従来例の約半分に
なることがわかった。In an actual disc, uniformity within one disc is important. Therefore, the uniformity of the transfer rate during the molding of a polycarbonate substrate, which greatly affects the characteristics of the disc, was investigated. The diameter of the disk used is 120 mmΦ. Regarding the transfer rate in the present invention, when the radius is 22 mm, the variation in the circumferential direction is 3.0%, the radius is 38 mm, the variation in the circumferential direction is 3.1%, and the radius is 50 mm.
The variation in the circumferential direction was 2.9%, and the variation in the radial direction was 5% or less in the radius range of 25 to 55 mm. Next, Table 5 shows variations in the birefringence of the polycarbonate substrate in the present invention and the conventional example in the respective radii in the circumferential direction. In Table 5, the fluctuation value was obtained by measuring the fluctuation value at eight points in the circumferential direction at a certain radius. In the present invention, a radius of 23-5
It was found that the variation was 11 nm or less in the region of 4 mm, which was about half that of the conventional example.
【0019】以上より、本発明により均一性に優れたポ
リカーボネート基板を射出成形することができる。As described above, according to the present invention, a polycarbonate substrate having excellent uniformity can be injection molded.
【0020】[0020]
【表5】 [Table 5]
【0021】[0021]
【発明の効果】本発明により、希土類−遷移金属アモル
ファスを記録層に用いた光磁気記録ディスクの記録、再
生時のCN比を大きくし、再生時のRF信号のエンベロ
ープの変動を小さくするために必要であるグルーブの底
部分のコーナーとランドのコーナーでの曲率半径が50
nm以下、ポリカーボネート基板の複屈折が40nm以
下、且つその周方向での変動が10nm以下であるポリ
カーボネート基板をトラックピッチ0.8〜1.4μm
の範囲で製造することができる。また、本発明によるポ
リカーボネート基板を用いた光磁気記録ディスクにおい
て、記録、再生時のCN比を大きくし、再生時のRF信
号のエンベロープの変動を小さくすることができる。さ
らに、均一性に優れた直径120mmΦのディスク用ポ
リカーボネート基板を射出成形することができる。According to the present invention, in order to increase the CN ratio during recording and reproducing of a magneto-optical recording disk using a rare earth-transition metal amorphous as a recording layer, and to reduce the fluctuation of the RF signal envelope during reproducing. The required radius of curvature at the bottom corner of the groove and the corner of the land is 50
nm, the polycarbonate substrate has a birefringence of 40 nm or less, and the variation in the circumferential direction thereof is 10 nm or less. The track pitch is 0.8 to 1.4 μm.
It can be manufactured in the range of. Further, in the magneto-optical recording disk using the polycarbonate substrate according to the present invention, it is possible to increase the CN ratio at the time of recording and reproducing and reduce the fluctuation of the envelope of the RF signal at the time of reproducing. Further, a polycarbonate substrate for a disc having a diameter of 120 mm and excellent in uniformity can be injection-molded.
【図1】射出成形の工程を表す図である。FIG. 1 is a diagram illustrating a process of injection molding.
【図2】従来条件でのポリカーボネート基板のAFM測
定結果である。FIG. 2 is a result of AFM measurement of a polycarbonate substrate under conventional conditions.
【図3】従来の光磁気記録ディスクの再生時のRF信号
を表す図である。FIG. 3 is a diagram showing an RF signal when reproducing from a conventional magneto-optical recording disk.
【図4】本発明におけるポリカーボネート基板のAFM
測定結果である。FIG. 4 is a polycarbonate substrate AFM according to the present invention.
It is a measurement result.
【図5】本発明における光磁気記録ディスクの断面構造
を表す図である。FIG. 5 is a diagram showing a cross-sectional structure of a magneto-optical recording disk according to the present invention.
【図6】本発明における光磁気記録ディスクの再生時の
RF信号を表す図である。FIG. 6 is a diagram showing an RF signal during reproduction of the magneto-optical recording disk of the present invention.
1・・・・・・金型 1t・・・・・金型の温度 1’・・・・・スタンパ 2・・・・・・ポリカーボネート基板 2p・・・・・圧力 3・・・・・・溶解樹脂 3c・・・・・スクリュ 3’・・・・・樹脂射出速度 4・・・・・・加熱筒 4t・・・・・加熱筒温度 5・・・・・・型締シリンダ 1 ・ ・ Mold 1t ・ ・ ・ Mold temperature 1 '・ ・ ・ Stamper 2 ・ ・ ・ ・ Polycarbonate substrate 2p ・ ・ ・ Pressure 3 ・ ・ ・ ・ ・ ・Molten resin 3c ・ ・ ・ Screw 3 '・ ・ ・ ・ ・ Resin injection speed 4 ・ ・ ・ ・ Heating cylinder 4t ・ ・ ・ Heating cylinder temperature 5 ・ ・ ・ ・ ・ Mold clamping cylinder
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 B29C 45/74 9350−4F B29C 45/74 45/77 7365−4F 45/77 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Office reference number FI technical display location B29C 45/74 9350-4F B29C 45/74 45/77 7365-4F 45/77
Claims (2)
ボネートを溶融する加熱筒と、溶融した樹脂を射出する
射出口と、型締をするための型締圧力を加える手段とか
ら成る射出成形装置を用いて光磁気記録媒体用基板を成
形する方法において、 金型温度を118〜135℃、 型締圧力を200〜300kg/cm2、 樹脂射出速度を150〜200mm/s、 加熱筒温度を310〜340℃、 冷却時間を9〜16秒、としたことを特徴とする光磁気
記録媒体用基板の製造方法。1. An injection molding device comprising a groove forming stamper, a heating cylinder for melting polycarbonate, an injection port for injecting the melted resin, and means for applying a mold clamping pressure for mold clamping is used. In the method of molding a substrate for a magneto-optical recording medium, the mold temperature is 118 to 135 ° C., the mold clamping pressure is 200 to 300 kg / cm 2 , the resin injection speed is 150 to 200 mm / s, and the heating cylinder temperature is 310 to 340. A method for producing a substrate for a magneto-optical recording medium, characterized in that the cooling time is 9 to 16 seconds.
ボネートを溶融する加熱筒と、溶融した樹脂を射出する
射出口と、型締をするための型締圧力を加える手段とか
ら成る射出成形装置を用いて光磁気記録媒体用基板を成
形する方法において、 金型温度を118〜135℃、 型締圧力を200〜300kg/cm2、 樹脂射出速度を150〜200mm/s、 加熱筒温度を310〜340℃、 冷却時間を9〜16秒、とした光磁気記録媒体用基板の
製造方法を用いて成形したことを特徴とする光磁気記録
媒体用基板。2. An injection molding device comprising a groove forming stamper, a heating cylinder for melting polycarbonate, an injection port for injecting the melted resin, and means for applying a mold clamping pressure for mold clamping. In the method of molding a substrate for a magneto-optical recording medium, the mold temperature is 118 to 135 ° C., the mold clamping pressure is 200 to 300 kg / cm 2 , the resin injection speed is 150 to 200 mm / s, and the heating cylinder temperature is 310 to 340. A substrate for a magneto-optical recording medium, which is formed by using a method for manufacturing a substrate for a magneto-optical recording medium, the temperature of which is 9 ° C. and the cooling time is 9 to 16 seconds.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7224394A JPH0973675A (en) | 1995-08-31 | 1995-08-31 | Production of substrate for magneto-optical recording medium and substrate for magneto-optical recording medium formed by using this process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7224394A JPH0973675A (en) | 1995-08-31 | 1995-08-31 | Production of substrate for magneto-optical recording medium and substrate for magneto-optical recording medium formed by using this process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0973675A true JPH0973675A (en) | 1997-03-18 |
Family
ID=16813069
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7224394A Pending JPH0973675A (en) | 1995-08-31 | 1995-08-31 | Production of substrate for magneto-optical recording medium and substrate for magneto-optical recording medium formed by using this process |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0973675A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012514280A (en) * | 2008-12-25 | 2012-06-21 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト | High-speed optical disk substrate material |
-
1995
- 1995-08-31 JP JP7224394A patent/JPH0973675A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012514280A (en) * | 2008-12-25 | 2012-06-21 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト | High-speed optical disk substrate material |
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